WO2019098142A1 - 吸着方法 - Google Patents
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- WO2019098142A1 WO2019098142A1 PCT/JP2018/041728 JP2018041728W WO2019098142A1 WO 2019098142 A1 WO2019098142 A1 WO 2019098142A1 JP 2018041728 W JP2018041728 W JP 2018041728W WO 2019098142 A1 WO2019098142 A1 WO 2019098142A1
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- contact
- collet
- adsorption
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- fabry
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
- B25J15/065—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum provided with separating means for releasing the gripped object after suction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
Definitions
- One aspect of the present invention relates to an adsorption method.
- Patent Document 1 As a conventional Fabry-Perot interference filter, one including a substrate, a fixed mirror and a movable mirror facing each other via a gap on the substrate, and an intermediate layer defining the gap is known (for example, Patent Document 1) reference).
- one aspect of the present invention is to provide an adsorption method that enables stable adsorption and holding while suppressing breakage of a Fabry-Perot interference filter.
- An adsorption method is a substrate, a laminated structure including a main surface provided on the substrate and facing the opposite side from the substrate, and a position outside the laminated structure viewed from a direction intersecting the main surface
- the adsorption collet is disposed to face the bottom surface, and in the second step, the contact surface is brought into contact with the bottom surface while forming a space between the surface and the main surface, and in the third step, air intake through the opening Exhaust the space by
- a first mirror portion and a second mirror portion which face each other with a gap between them and have a variable distance with respect to the laminated structure on the substrate.
- a membrane structure having the Therefore for example, when a general adsorption jig is used to adsorb and transport the Fabry-Perot interference filter, the membrane structure may be damaged by the contact. And if it is going to adsorb in parts other than a membrane structure part in order to avoid that, there is a possibility that adsorption and holding may become unstable.
- the contact portion provided on the surface of the main body portion of the suction collet in the first and second steps is a thin portion of the thinning portion outside the laminated structure on the contact surface. While being in contact with the bottom surface, a space is formed between the surface of the main body and the main surface of the laminated structure. Then, in the third step, the space is exhausted and adsorption is performed by suction through the opening. That is, according to this adsorption method, the contact surface of the contact portion is brought into contact with and supported by the Fabry-Perot interference filter on the outside of the laminated structure portion, and exhaust of the space on the main surface partially included in the membrane structure portion Adsorb Fabry-Perot interference filter. As a result, when adsorbing the Fabry-Perot interference filter, stable adsorption and holding can be performed while suppressing damage to the membrane structure.
- the contact portion extends so as to surround the area facing the space in the surface as viewed from the direction crossing the surface, and the contact surface contacts the bottom surface at the contact portion.
- a communication portion that communicates the space to the outside is formed, and in the third step, air may be introduced into the space through the communication portion by suction through the opening.
- air since air is introduced into the space to be taken in from the outside via the communication part, appropriate adsorption can be realized.
- the Fabry-Perot interference filter can be stably detached.
- the contact portion is composed of a plurality of portions arranged to be separated from each other so as to surround the area when viewed from the direction crossing the surface, and the communication portion is an air gap between the portions It may be formed by In this case, the communication portion can be configured with a simple configuration.
- the laminated structure portion is provided with an electrode terminal located on the outside of the membrane structure portion as viewed from the direction intersecting the main surface and protruding from the main surface
- the adsorption collet may be disposed such that the communication portion is at a position corresponding to the electrode terminal outside the electrode terminal in a state where the contact surface is in contact with the bottom surface.
- at least a part of the air flow introduced into the space from the communicating portion is directed away from the main surface when passing over the electrode terminal protruding from the main surface of the laminated structure, and therefore, to the membrane structure The adverse effect of air flow can be reduced.
- the laminated structure has a rectangular shape as viewed from the direction intersecting the main surface, and in the first step, the communication portion is in contact with the bottom surface.
- the suction collet may be disposed at a position corresponding to each of the four rectangular corners of the laminated structure. In this case, stable intake is possible.
- the contact portion may be integrally formed so as to continuously surround the area facing the space on the surface as viewed from the direction intersecting the surface.
- the space to be sucked in is continuously surrounded by the contact portion, the space can be uniformly sucked regardless of the position of the opening of the intake hole. For this reason, the degree of freedom of the position of the opening of the intake hole is improved.
- the adsorptive power can be increased without intensifying the intake.
- a plurality of openings are formed on the surface, and in the first step, the plurality of openings are at the center of the membrane structure as viewed from the direction intersecting the main surface.
- the suction collet may be arranged to be symmetrically distributed. In this case, more stable adsorption and retention become possible.
- FIG. 2 is a bottom view of the Fabry-Perot interference filter shown in FIG. 1;
- FIG. 3 is a cross-sectional view of a Fabry-Perot interference filter taken along the line III-III of FIG. It is a figure which shows the adsorption
- FIG.4 It is a schematic diagram which shows the state which the adsorption
- the adsorption method according to the present embodiment performs adsorption of the Fabry-Perot interference filter using an adsorption collet. Therefore, first, an embodiment of a Fabry-Perot interference filter to be adsorbed will be described. [Configuration of Fabry-Perot interference filter]
- FIG. 1 is a plan view of a Fabry-Perot interference filter according to the present embodiment.
- FIG. 2 is a bottom view of the Fabry-Perot interference filter shown in FIG.
- FIG. 3 is a cross-sectional view of the Fabry-Perot interference filter taken along line III-III of FIG.
- Fabry-Perot interference filter 1 comprises a substrate 11.
- the substrate 11 has a first surface 11 a and a second surface 11 b opposite to the first surface 11 a.
- the antireflection layer 21, the first laminate 22, the intermediate layer 23, and the second laminate 24 are stacked in this order on the first surface 11 a.
- An air gap S is defined between the first laminate 22 and the second laminate 24 by the frame-like intermediate layer 23.
- the first stacked body 22, the intermediate layer 23, and a portion of the second stacked body 24 located on the first stacked body 22 when viewed from the direction intersecting (orthogonal to) the first surface 11a constitute the stacked structure portion 20.
- the stacked structure unit 20 includes a major surface 20 s provided on the first surface 11 a of the substrate 11 and facing the substrate 11.
- the major surface 20s is a part of the surface 24a of the second stacked body 24.
- the shape and positional relationship of each part in the case of being viewed from the direction perpendicular to the first surface 11 a is as follows.
- the outer edge of the substrate 11 is, for example, rectangular.
- the outer edge of the substrate 11 and the outer edge of the second stacked body 24 coincide with each other.
- the outer edge of the antireflective layer 21, the outer edge of the first laminate 22, and the outer edge of the intermediate layer 23 coincide with each other. Therefore, the laminated structure portion 20 is also rectangular in plan view (as viewed from the direction intersecting (orthogonal to) the main surface 20s).
- the substrate 11 has an outer edge 11 c located outside the center of the air gap S than the outer edge of the intermediate layer 23.
- the outer edge portion 11c is, for example, in a frame shape, and surrounds the intermediate layer 23 when viewed in a direction perpendicular to the first surface 11a.
- the Fabry-Perot interference filter 1 transmits light having a predetermined wavelength in the light transmission region 1a defined in the central portion thereof.
- the light transmission area 1a is, for example, a cylindrical area.
- the substrate 11 is made of, for example, silicon, quartz or glass.
- the antireflective layer 21 and the intermediate layer 23 are made of, for example, silicon oxide.
- the thickness of the intermediate layer 23 is, for example, several tens of nm or more and several tens of ⁇ m or less.
- a portion of the first stacked body 22 corresponding to the light transmission area 1 a functions as the first mirror portion 31.
- the first mirror portion 31 is disposed on the first surface 11 a via the anti-reflection layer 21.
- the first stacked body 22 is configured by alternately laminating a plurality of polysilicon layers 25 and a plurality of silicon nitride layers 26 one by one.
- the polysilicon layer 25a, the silicon nitride layer 26a, the polysilicon layer 25b, the silicon nitride layer 26b, and the polysilicon layer 25c are stacked on the antireflection layer 21 in this order.
- each of the polysilicon layer 25 and the silicon nitride layer 26 constituting the first mirror portion 31 can be an integral multiple of 1 ⁇ 4 of the central transmission wavelength.
- the first mirror portion 31 may be disposed directly on the first surface 11 a without the antireflective layer 21.
- a portion of the second stacked body 24 corresponding to the light transmission region 1 a functions as the second mirror portion 32.
- the second mirror portion 32 is opposed to the first mirror portion 31 via the air gap S on the side opposite to the substrate 11 with respect to the first mirror portion 31.
- the second stacked body 24 is disposed on the first surface 11 a via the antireflective layer 21, the first stacked body 22, and the intermediate layer 23.
- the second stacked body 24 is configured by alternately stacking a plurality of polysilicon layers 27 and a plurality of silicon nitride layers 28 one by one.
- the polysilicon layer 27a, the silicon nitride layer 28a, the polysilicon layer 27b, the silicon nitride layer 28b, and the polysilicon layer 27c are stacked on the intermediate layer 23 in this order.
- the optical thickness of each of the polysilicon layer 27 and the silicon nitride layer 28 constituting the second mirror portion 32 can be an integral multiple of 1 ⁇ 4 of the central transmission wavelength.
- a silicon oxide layer may be used instead of the silicon nitride layer.
- titanium oxide, tantalum oxide, a zirconium oxide, magnesium fluoride, aluminum oxide, calcium fluoride, silicon, germanium, zinc sulfide etc. are mentioned. It may be used.
- the surface on the air gap S side of the first mirror portion 31 (the surface of the polysilicon layer 25c) and the surface on the air gap S side of the second mirror portion 32 (the surface of the polysilicon layer 27a) It is directly opposite through.
- an electrode layer (not constituting a mirror) or a protective layer may be formed on the surface on the air gap S side of the first mirror portion 31 and on the surface on the air gap S side of the second mirror portion 32.
- the first mirror portion 31 and the second mirror portion 32 face each other via the air gap S, with the layers interposed therebetween. In other words, even in such a case, the facing between the first mirror portion 31 and the second mirror portion 32 via the air gap S can be realized.
- a plurality of through holes extending from the surface 24a (main surface 20s of the laminated structure 20) opposite to the intermediate layer 23 of the second laminate 24 to the void S 24b is formed.
- the plurality of through holes 24 b are formed to an extent that they do not substantially affect the function of the second mirror portion 32.
- the plurality of through holes 24 b are used to form a void S by removing a part of the intermediate layer 23 by etching.
- the second stacked body 24 further includes a covering portion 33 and a peripheral portion 34 in addition to the second mirror portion 32.
- the second mirror portion 32, the covering portion 33, and the peripheral portion 34 are integrally formed so as to have a part of the same laminated structure and be continuous with each other.
- the covering portion 33 surrounds the second mirror portion 32 when viewed from the direction perpendicular to the first surface 11 a.
- the covering portion 33 is a surface 23 a of the intermediate layer 23 opposite to the substrate 11, a side surface 23 b of the intermediate layer 23 (outer side surface, that is, a side opposite to the air gap S side), a first laminate 22 And the side surface 21a of the antireflective layer 21 and reach the first surface 11a. That is, the covering portion 33 covers the outer edge of the intermediate layer 23, the outer edge of the first laminate 22, and the outer edge of the antireflective layer 21.
- the peripheral portion 34 surrounds the covering portion 33 when viewed in the direction perpendicular to the first surface 11 a.
- the peripheral edge portion 34 is located on the first surface 11 a of the outer edge portion 11 c.
- the outer edge of the peripheral portion 34 coincides with the outer edge of the substrate 11 when viewed in the direction perpendicular to the first surface 11 a.
- the peripheral portion 34 is thinned along the outer edge of the outer edge portion 11 c. That is, the portion of the peripheral portion 34 along the outer edge of the outer edge portion 11 c is thinner than the other portions of the peripheral portion 34 excluding the portion along the outer edge.
- the peripheral portion 34 is thinned by removing a part of the polysilicon layer 27 and the silicon nitride layer 28 constituting the second stacked body 24.
- the peripheral portion 34 has a non-thinned portion 34 a continuous with the covering portion 33 and a thinned portion 34 b surrounding the non-thinned portion 34 a. In the thinned portion 34b, the polysilicon layer 27 and the silicon nitride layer 28 other than the polysilicon layer 27a provided directly on the first surface 11a are removed.
- the Fabry-Perot interference filter 1 is located outside the laminated structure 20 as viewed from the direction intersecting (orthogonal to) the main surface 20s, and the substrate 11 is larger than the main surface 20s. It further comprises a thinned portion 34b recessed to the side.
- the thinned portion 34 b is formed in an annular shape (here, a rectangular annular shape) so as to surround the laminated structure portion 20 as viewed from the direction intersecting (orthogonal to) the major surface 20 s.
- the thinned portion 34 b is used, for example, when cutting a wafer in which a plurality of regions corresponding to the Fabry-Perot interference filter 1 are formed for each Fabry-Perot interference filter 1.
- the thinned portion 34 b is formed, for example, by etching the laminated structure for the second laminated body 24.
- the height from the first surface 11 a of the surface 34 c opposite to the substrate 11 of the non-thinned portion 34 a is lower than the height from the first surface 11 a of the surface 23 a of the intermediate layer 23.
- the height of the surface 34c of the non-thinned portion 34a from the first surface 11a is, for example, 100 nm to 5000 nm.
- the height from the first surface 11a of the surface 23a of the intermediate layer 23 is, for example, in the range of 500 nm to 20000 nm, higher than the height from the first surface 11a of the surface 34c of the non-thinned portion 34a.
- the width of the thinned portion 34 b (the distance between the outer edge of the non-thinned portion 34 a and the outer edge of the outer edge portion 11 c) is at least 0.01 times the thickness of the substrate 11.
- the width of the thinned portion 34b is, for example, 5 ⁇ m to 400 ⁇ m.
- the thickness of the substrate 11 is, for example, 500 ⁇ m to 800 ⁇ m.
- the first electrode 12 is formed in the first mirror portion 31 so as to surround the light transmission region 1a.
- the first electrode 12 is formed by doping the polysilicon layer 25c with an impurity to reduce the resistance.
- the second electrode 13 is formed in the first mirror portion 31 so as to include the light transmission region 1 a.
- the second electrode 13 is formed by doping the polysilicon layer 25c with an impurity to reduce the resistance.
- the size of the second electrode 13 may be a size including the entire light transmission area 1a, but may be substantially the same as the size of the light transmission area 1a.
- the third electrode 14 is formed on the second mirror portion 32.
- the third electrode 14 faces the first electrode 12 and the second electrode 13 with the air gap S therebetween.
- the third electrode 14 is formed by doping the polysilicon layer 27a with an impurity to reduce the resistance.
- the terminal (electrode terminal) 15 is provided in a pair so as to face each other with the light transmission region 1a interposed therebetween. Each terminal 15 is disposed in the through hole extending from the surface 24 a of the second stacked body 24 (the main surface 20 s of the stacked structure portion 20) to the first stacked body 22. Each terminal 15 is electrically connected to the first electrode 12 through the wiring 12 a.
- the terminal 15 is formed of, for example, a metal film such as aluminum or an alloy thereof.
- the terminal (electrode terminal) 16 is provided in a pair so as to face each other with the light transmission region 1a interposed therebetween. Each terminal 16 is disposed in a through hole extending from the surface 24 a of the second stacked body 24 (the main surface 20 s of the stacked structure portion 20) to the first stacked body 22. Each terminal 16 is electrically connected to the second electrode 13 through the wiring 13 a and electrically connected to the third electrode 14 through the wiring 14 a.
- the terminal 16 is formed of, for example, a metal film such as aluminum or an alloy thereof. The direction in which the pair of terminals 15 face and the direction in which the pair of terminals 16 face are orthogonal to each other (see FIG. 1).
- Trenches 17 and 18 are provided on the surface 22 b of the first stacked body 22.
- the trench 17 extends annularly so as to surround a connection portion of the wiring 13 a with the terminal 16.
- the trench 17 electrically insulates the first electrode 12 and the wiring 13a.
- the trench 18 extends annularly along the inner edge of the first electrode 12.
- the trench 18 electrically insulates the first electrode 12 and the region (second electrode 13) inside the first electrode 12.
- the area within each trench 17, 18 may be an insulating material or an air gap.
- a trench 19 is provided on the surface 24 a of the second stacked body 24 (the main surface 20 s of the stacked structure portion 20). Trench 19 extends annularly to surround terminal 15. The trench 19 electrically insulates the terminal 15 and the third electrode 14. The region in the trench 19 may be an insulating material or an air gap.
- the antireflection layer 41, the third stacked body 42, the intermediate layer 43 and the fourth stacked body 44 are stacked in this order.
- the antireflective layer 41 and the intermediate layer 43 have the same configuration as that of the antireflective layer 21 and the intermediate layer 23, respectively.
- the third stacked body 42 and the fourth stacked body 44 each have a stacked structure symmetrical to the first stacked body 22 and the second stacked body 24 with respect to the substrate 11.
- the antireflective layer 41, the third stacked body 42, the intermediate layer 43 and the fourth stacked body 44 have a function of suppressing the warpage of the substrate 11.
- the third laminate 42, the intermediate layer 43, and the fourth laminate 44 are thinned along the outer edge of the outer edge portion 11c. That is, the portion of the third laminate 42, the intermediate layer 43 and the fourth laminate 44 along the outer edge of the outer edge 11c is the portion of the third laminate 42, the intermediate layer 43 and the fourth laminate 44 along the outer edge It is thinner than other parts except.
- the third stacked body 42, the intermediate layer 43, and the fourth stacked body 44 are the third stacked body 42 in the portion overlapping the thinned portion 34b when viewed from the direction perpendicular to the first surface 11a. It is thinned by removing all of the layer 43 and the fourth laminate 44.
- An opening 40 a is provided in the third stacked body 42, the intermediate layer 43, and the fourth stacked body 44 so as to include the light transmitting region 1 a.
- the opening 40a has a diameter substantially the same as the size of the light transmission area 1a.
- the opening 40 a is open on the light emission side, and the bottom surface of the opening 40 a reaches the anti-reflection layer 41.
- a light shielding layer 45 is formed on the surface on the light emission side of the fourth stacked body 44.
- the light shielding layer 45 is made of, for example, aluminum or the like.
- a protective layer 46 is formed on the surface of the light shielding layer 45 and the inner surface of the opening 40 a.
- the protective layer 46 covers the outer edge of the third laminate 42, the intermediate layer 43, the fourth laminate 44, and the light shielding layer 45, and also covers the antireflective layer 41 on the outer edge portion 11c.
- the protective layer 46 is made of, for example, aluminum oxide. When the thickness of the protective layer 46 is set to 1 nm to 100 nm (for example, about 30 nm), the optical influence of the protective layer 46 can be ignored.
- the electrostatic force corresponding to the voltage is It occurs between the first electrode 12 and the third electrode 14.
- the second mirror 32 is attracted to the side of the first mirror 31 fixed to the substrate 11, and the distance between the first mirror 31 and the second mirror 32 is adjusted.
- the distance between the first mirror unit 31 and the second mirror unit 32 is variable.
- the wavelength of light transmitted through the Fabry-Perot interference filter 1 depends on the distance between the first mirror portion 31 and the second mirror portion 32 in the light transmission region 1a. Therefore, by adjusting the voltage applied between the first electrode 12 and the third electrode 14, the wavelength of light to be transmitted can be appropriately selected.
- the second electrode 13 is at the same potential as the third electrode 14. Therefore, the second electrode 13 functions as a compensation electrode for keeping the first mirror portion 31 and the second mirror portion 32 flat in the light transmission region 1a.
- Fabry-Perot interference filter 1 for example, while changing the voltage applied to Fabry-Perot interference filter 1 (that is, while changing the distance between first mirror portion 31 and second mirror portion 32 in Fabry-Perot interference filter 1) By detecting the light transmitted through the light transmission region 1 a of the Fabry-Perot interference filter 1 by the light detector, a spectrum can be obtained.
- the first mirror portion 31 and the second mirror portion 32 which mutually face each other via the air gap S and in which the distance between them is variable, and a part of the main surface 20s (
- a membrane structure portion M which has a center-side circular area).
- the membrane structure portion M is a portion which does not overlap with the intermediate layer 23 in the laminated structure portion 20 as viewed in the direction intersecting (orthogonal to) the major surface 20s. That is, the outer shape of the membrane structure M as viewed from the direction intersecting (orthogonal to) the main surface 20s is defined by the inner edge of the intermediate layer 23, and is circular here (see FIG. 1).
- the membrane structure M is located between the pair of terminals 15, between the pair of terminals 16, and between the terminals 15 and 16 when viewed from the direction intersecting (orthogonal to) the main surface 20s. It is provided to intervene.
- the pair of terminals 15, the pair of terminals 16, and the terminals 15 and 16 are disposed to face each other with the membrane structure M interposed therebetween.
- the terminals 15 and 16 are located outside the membrane structure M as viewed in the direction intersecting (orthogonal to) the major surface 20s.
- the terminals 15 and 16 are provided at each of the four corner portions of the rectangular laminated structure 20 as viewed in the direction intersecting (orthogonal to) the main surface 20s.
- the terminals 15 and 16 protrude from the main surface 20s.
- the suction collet according to the present embodiment is placed, for example, when picking up one chip from the chip group of the Fabry-Perot interference filter 1 manufactured by cutting a wafer and transporting it to a predetermined position, or at a predetermined position.
- the Fabry-Perot interference filter 1 can be used to pick up and further transport it to the mounting location.
- FIGS. 4 and 5 are views showing a suction collet according to the present embodiment.
- FIG. 4 is a bottom view
- FIG. 5 is a cross-sectional view taken along the line VV of FIG.
- the suction collet 100 includes a main body portion 110, an extension portion 120 and a contact portion 130.
- the main body portion 110, the extension portion 120, and the contact portion 130 are integrally formed with each other, but may be separately configured and joined to each other.
- the main body 110 has, for example, a rectangular parallelepiped shape.
- Body portion 110 has a surface 111 and a surface 112 opposite to surface 111.
- the extension portion 120 is provided on the surface 111 so as to protrude from the surface 111 and extends along a direction intersecting the surface 111.
- the extension portion 120 is, for example, a cylindrical shape having a diameter shorter than the length of one side of the main body portion 110 as viewed in the direction intersecting the surface 111, and is disposed inside the outer edge of the surface 111.
- the surface 111 has a rectangular outer shape and an annular inner edge having a circular shape.
- the extension portion 120 can be used, for example, when connecting the suction collet 100 to a device (not shown) for driving the suction collet 100.
- the surface 112 has a shape corresponding to the outer shape of the Fabry-Perot interference filter 1 and is, for example, rectangular (square as an example).
- the contact portion 130 is provided on the surface 112 so as to protrude from the surface 112.
- the contact portion 130 is a portion that contacts the Fabry-Perot interference filter 1 when the Fabry-Perot interference filter 1 is adsorbed.
- An intake hole 140 is provided in the main body portion 110 and the extension portion 120 so as to extend over the entire length of the main body portion 110 and the extension portion 120.
- the intake hole 140 opens to the surface 112 and opens to the end of the extension 120 opposite to the main body 110.
- the intake hole 140 can be connected to an intake device (not shown) such as a pump via an opening on the extension portion 120 side.
- the intake hole 140 may not be provided to extend over the entire length of the main body portion 110 and the extension portion 120.
- the intake holes 140 may extend to the outer surface (surface intersecting the surface 112) of the main body 110 to form an opening.
- the intake hole 140 may be connected to the intake device through the opening of the outer side surface of the main body 110.
- the contact portion 130 is composed of a plurality of (here four) portions 131. Each portion 131 is formed in a long rectangular parallelepiped shape. The portions 131 are arranged such that their longitudinal directions are along rectangular sides which are different from each other. Further, an air gap 132 is formed between the portions 131. Here, the air gap 132 is set to a position corresponding to four rectangular corners.
- the intake hole 140 opens in an area A surrounded by the portion 131 (contact portion 130) in the surface 112 as viewed in a direction intersecting (orthogonal) the surface 112.
- the surface 112 is provided with a plurality of (here, five) openings 141 of the intake holes 140.
- the intake holes 140 extend from each of the plurality of openings 141 toward the surface 111 and are connected and integrated into one in the main body portion 110 and reach the extension portion 120. Therefore, the opening on the extension portion 120 side of the intake hole 140 is one.
- FIGS. 6 and 7 are schematic views showing a state in which the adsorptive collet shown in FIGS. 4 and 5 has adsorbed the Fabry-Perot interference filter.
- FIG. 6 is a bottom view (viewed from the surface 112 side), and a part of the Fabry-Perot interference filter is simplified and shown by a broken line.
- FIG. 7 is a schematic cross-sectional view along the line VII-VII in FIG. In FIG. 7, a layer structure of the first stacked body 22 and the second stacked body 24, an electrode and the like are omitted.
- the contact portion 130 has a contact surface 133 in contact with the bottom surface (surface) 34 s of the thinned portion 34 b of the Fabry-Perot interference filter 1.
- the contact surface 133 is the surface opposite to the surface 112 in each portion 131 of the contact portion 130.
- the distance D1 between the surface 112 and the contact surface 133 (the height of the contact portion 130 from the surface 112) is larger than the distance D2 between the bottom surface 34s and the major surface 20s of the multilayer structure 20.
- the contact portion 130 has the surface 112 and the main surface 20s (and the top surfaces of the terminals 15 and 16) Are spaced apart from each other to form a space R between the surface 112 and the major surface 20s.
- the contact portion 130 extends so as to surround the stacked structure portion 20 as viewed in the direction intersecting (orthogonal to) the surface 112. More specifically, here, each portion 131 of the contact portion 130 is arranged along the outer edge of the laminated structure 20 in the contact state. Therefore, the above-mentioned area A is a rectangular area facing the main surface 20s in the contact state in the surface 112, and is an area facing the space R. In the contact state, the surface 112 and the major surface 20s are substantially parallel to each other.
- An opening 141 of the intake hole 140 in the surface 112 is formed in the area A.
- the openings 141 are symmetrically distributed with respect to the center C of the area A as viewed in the direction intersecting (orthogonal to) the surface 112.
- one opening 141 is disposed at the center C, and four openings 141 are disposed at positions corresponding to the corners of the square centered on the center C, respectively.
- the plurality of openings 141 are mainly formed by arranging the suction collet 100 so that the center of the membrane structure M and the center C of the area A coincide with each other when viewed from the direction intersecting (orthogonal to) the main surface 20s. It will be dispersed symmetrically with respect to the center of the membrane structure M as viewed in the direction intersecting (orthogonal to) the plane 20s.
- the contact portion 130 is formed with a communication portion 135 which communicates the space R to the outside in the contact state.
- the communication portion 135 is formed by the air gap 132 between the portions 131 of the contact portion 130 (here, the air gap 132). Therefore, here, four communicating parts 135 are formed at positions corresponding to four corners of the area in which the rectangularly extending contact part 130 is disposed. In the contact state, the corner of the contact portion 130 and the corner of the laminated structure 20 correspond to each other.
- each of the communication parts 135 is disposed at a position corresponding to the terminals 15 and 16 in a one-to-one correspondence on the outside of the terminals 15 and 16 at the corners of the laminated structure 20. More specifically, the pair of communication portions 135 is disposed outside the terminal 15 with respect to the center C of the area A on the axis passing through the pair of terminals 15, and the other pair of communication portions 135 is a pair of terminals It is disposed outside the terminal 16 with respect to the center C of the area A on an axis passing through the axis 16.
- the communication portion 135 When the communication portion 135 is disposed outside the terminals 15 and 16 in the contact state, the communication portion 135 is disposed on the opposite side of the air gap S (that is, the membrane structure portion M) in the terminals 15 and 16.
- the side of the air gap S that is, the membrane structure portion M
- the side of the air gap S is inner than the terminals 15 and 16 than the terminals 15 and 16; It is assumed that it is outside.
- FIG. 8 is a schematic cross-sectional view showing the steps of the adsorption method according to the present embodiment.
- the layer structure of the first stacked body 22 and the second stacked body 24, the electrodes, and the like are omitted as in FIG. 7.
- the adsorption collet 100 is placed on the Fabry-Perot interference filter 1 (first step).
- each of the contact surfaces 133 is a thinned portion so that the surface 112 of the main body portion 110 of the suction collet 100 faces the major surface 20s of the laminated structure portion 20 (and the membrane structure portion M).
- the suction collet 100 is disposed to face the bottom surface 34s of 34b.
- the adsorption collet 100 is brought into contact with the Fabry-Perot interference filter 1 (second step).
- the contact surface 133 is brought into contact with the bottom surface 34s.
- the distance D1 between the surface 112 and the contact surface 133 (the height of the contact portion 130 from the surface 112) is larger than the distance D2 between the bottom surface 34s and the major surface 20s of the laminated structure 20. Therefore, when the contact surface 133 is brought into contact with the bottom surface 34s, the state in which the surface 112 and the major surface 20s are separated from each other is maintained, and a space R is formed between the surface 112 and the major surface 20s. That is, in the second step, the contact surface 133 is brought into contact with the bottom surface 34s while forming a space R between the surface 112 and the major surface 20s.
- the communicating portion 135 is in a position corresponding to the terminals 15 and 16 outside the terminals 15 and 16 in the contact state. Further, in the contact state, the communication portion 135 is at a position corresponding to each of the four rectangular corner portions of the stacked structure portion 20. Furthermore, the plurality of openings 141 are arranged so as to be distributed symmetrically with respect to the center of the membrane structure M as viewed in the direction intersecting the major surface 20s. These arrangement relationships are realized by the structure of the adsorption collet 100 and the relative arrangement in the first step.
- communication portion 135 in the contact state, is at a position corresponding to terminals 15 and 16 outside terminals 15 and 16, and four rectangular corner portions of laminated structure portion 20. It will arrange so that it may become a position corresponding to each. Furthermore, in the first step, by making the center C of the area A substantially coincide with the center of the membrane structure M as described above, the membrane 141 viewed from the direction in which the plurality of openings 141 intersect the major surface 20s.
- the adsorption collet 100 is arranged to be dispersed symmetrically with respect to the center of the structure M.
- the Fabry-Perot interference filter 1 is adsorbed by the adsorption collet 100 (third step).
- the space R is exhausted by suction through the opening 141.
- the space R is in communication with the outside through the communication portion 135.
- air is introduced into the space R through the communication portion 135 by the intake through the opening 141.
- the Fabry-Perot interference filter 1 is transported to a predetermined position for each suction collet 100 as required, and then the intake via the opening 141 is released, and the Fabry-Perot interference filter 1 is detached from the suction collet 100.
- the laminated structure 20 on the substrate 11 is opposed to each other via the air gap S and the mutual distance
- a membrane structure portion M having a first mirror portion 31 and a second mirror portion 32 which are variable is provided. Therefore, for example, when the Fabry-Perot interference filter 1 is adsorbed and transported, if a general adsorption jig is used, the membrane structure M may be broken due to the contact. And if it is going to adsorb in parts other than membrane structure part M in order to avoid that, there is a possibility that adsorption and holding may become unstable.
- the contact portion 130 provided on the surface 112 of the main body portion 110 of the suction collet 100 in the first and second steps is formed on the contact surface 133 of the laminated structure 20.
- a space is formed between the surface 112 of the main body portion 110 and the main surface 20s of the laminated structure portion 20 while being in contact with the bottom surface 34s of the outer thinned portion 34b. Then, in the third step, the space R is exhausted and suction is performed by suction through the opening 141.
- the Fabry-Perot interference filter 1 is adsorbed by the exhaust of R.
- the contact portion 130 extends so as to surround the area A facing the space R in the surface 112 when viewed in the direction intersecting the surface 112. Further, the contact portion 130 is formed with a communication portion 135 which communicates the space R to the outside in a state where the contact surface 133 is in contact with the bottom surface 34s. Then, in the third step, air is introduced into the space R through the communicating portion 135 by suction through the opening 141. As a result, air is introduced from the outside into the space R to be taken in through the communicating portion 135, so that appropriate adsorption can be realized. As a result, when the adsorption is released, the Fabry-Perot interference filter 1 can be stably detached.
- the contact portion 130 is composed of a plurality of portions 131 arranged to be separated from each other so as to surround the area A when viewed from the direction crossing the surface 112.
- the communication portion 135 is formed by the air gap 132 between the portions 131. As described above, the communication portion 135 is configured with a simple configuration.
- terminals 15 and 16 are provided so as to be located outside the membrane structure portion M as viewed from the direction intersecting the main surface 20s and to protrude from the main surface 20s.
- the communication portion 135 is located at a position corresponding to the terminals 15 and 16 outside the terminals 15 and 16 with respect to the center C of the area A, with the contact surface 133 in contact with the bottom surface 34s.
- the suction collet 100 is placed. Therefore, at least a part of the air flow introduced from the communicating portion 135 into the space R is directed away from the main surface 20s when passing over the terminals 15 and 16 protruding from the main surface 20s of the laminated structure 20 . For this reason, the adverse effect of the air flow on the membrane structure M is reduced.
- the laminated structure part 20 is exhibiting the rectangular shape seeing from the direction which cross
- the surface 112 is formed with a plurality of openings 141 of the intake hole 140.
- the adsorption collet 100 is disposed such that the plurality of openings 141 are dispersed symmetrically with respect to the center of the membrane structure M as viewed from the direction intersecting the major surface 20s. Therefore, more stable adsorption and retention become possible.
- the above embodiment describes one embodiment of the adsorption method according to one aspect of the present invention. Therefore, the adsorption method according to one aspect of the present invention is not limited to the above-described adsorption collet 100, and can be a method using an arbitrary modification of the above-described adsorption collet 100. Subsequently, a modification of the suction collet will be described.
- FIG. 9 is a schematic view showing a state in which the adsorption collet according to the modification adsorbs the Fabry-Perot interference filter.
- FIG. 9 is a bottom view (viewed from the surface 112 side), and a part of the Fabry-Perot interference filter is simplified and shown by a broken line.
- the contact portion 130 and the contact surface 133 are integrally formed so as to continuously surround the area A as viewed in the direction intersecting (orthogonal to) the surface 112.
- the contact portion 130 and the contact surface 133 are formed in a rectangular ring shape so as to correspond to the thinned portion 34 b when viewed from the direction intersecting (orthogonal to) the surface 112.
- the contact portion 130 and the contact surface 133 there is a recess 136 that is recessed from the inner edge side toward the outer edge side as viewed from the direction intersecting (orthogonal to) the surface 112 It is formed.
- the recess 136 is arranged to correspond to the corner of the laminated structure 20 in the contact state.
- the suction method using the suction collet 100 since the space R to be sucked in is continuously surrounded by the contact portion 130, the position R of the suction hole 140 does not depend on the position.
- the space R can be uniformly inhaled. Therefore, the degree of freedom of the position of the opening 141 of the intake hole 140 is improved. Therefore, in the example of FIG. 9, as in the case of FIG. 6, the plurality of openings 141 are disposed symmetrically distributed with respect to the center C of the area A. It can be freely set without being limited to.
- the number of the openings 141 may be one, or a plurality of the openings 141 may be arranged to have a bias in the area A.
- the position and the number of the openings 141 are not limited to the case of FIG. 6, and various modifications are possible.
- the thinned portion 34b is illustrated as the thinned portion which is located outside the laminated structure and is recessed to the substrate side with respect to the main surface. Moreover, the aspect which the contact surface 133 contacts the bottom 34s of the thin part 34b was illustrated. However, the mode of contact between the thinned portion and the contact surface is not limited to this. For example, as shown in FIG. 3, the non-thinned portion 34 a is also recessed closer to the substrate 11 than the main surface 20 s. Therefore, for example, if the width of the non-thinned portion 34a is expanded to a degree sufficient for contact with the contact surface 133, it can be a thinned portion.
- the contact surface 133 is in contact with the bottom surface (the surface opposite to the substrate 11) of the non-thinned portion 34a. It is also assumed that only the non-thinned portion 34 a is formed without forming the thinned portion 34 b. Also in this case, the non-thinned portion 34 a is a thinned portion with which the contact surface 133 is in contact. Furthermore, the first surface 11a of the substrate 11 may be exposed from the second stacked body 24 without the thickness of the thinned portion 34b being zero, that is, without forming the thinned portion 34b. In this case, the exposed portion becomes a thinned portion in contact with the contact surface 133. As described above, the contact aspect of the thinned portion and the contact surface can be variously modified.
- FIG. 10 is a bottom view showing a suction collet according to another modification.
- the contact part 130 is comprised from the part 131 of plurality (four) similarly to the example shown by FIG.
- Each portion 131 is formed in an L shape.
- Each portion 131 is arranged along a pair of rectangular sides of area A and a corner connecting the pair of sides.
- a recess 136 is formed which is recessed from the inner edge side toward the outer edge side as viewed from the direction intersecting (orthogonal to) the surface 112.
- the recess 136 is arranged to correspond to the corner of the laminated structure 20 in the contact state.
- An air gap 132 is formed between the portions 131.
- the air gaps 132 are provided at positions corresponding to the four sides of the rectangle of the area A.
- Each of the air gaps 132 functions as a communication portion 135 which communicates the space R to the outside in the contact state.
- the position (and the number) of the communication parts 135 can be arbitrarily changed.
- a substrate a laminate structure including a main surface provided on the substrate and facing the opposite side from the substrate, and located outside the laminate structure as viewed from a direction intersecting the main surface, and more than the main surface
- An adsorption collet for adsorbing a Fabry-Perot interference filter comprising: a thinned portion recessed in the substrate side, A body portion having a surface and provided with an intake hole opened in the surface; A contact portion provided on the surface so as to protrude from the surface and having a contact surface contacting the bottom surface of the thinned portion; Equipped with The laminated structure portion is provided with a membrane structure portion including a first mirror portion and a second mirror portion which are opposed to each other via a gap and whose distance is made variable and a part of the main surface.
- the contact portion is configured such that the distance between the surface and the contact surface is greater than the distance between the main surface and the bottom surface so that the surface and the main surface are in a state where the contact surface is in contact with the bottom surface.
- Form a space between the surface and The opening of the intake hole is formed in an area facing the space on the surface, Adsorption collet.
- the contact portion extends to surround the area as viewed in a direction intersecting the surface;
- the contact portion is formed with a communicating portion that communicates the space to the outside when the contact surface is in contact with the bottom surface.
- the adsorptive collet according to appendix 1.
- the contact portion includes a plurality of portions arranged to be separated from each other so as to surround the area as viewed in the direction intersecting the surface,
- the communication portion is formed by an air gap between the portions.
- the laminated structure portion is provided with an electrode terminal which is located on the outer side of the membrane structure portion when viewed from the direction crossing the main surface, and which protrudes from the main surface,
- the communication portion is provided at a position corresponding to the electrode terminal outside the electrode terminal in a state where the contact surface is in contact with the bottom surface.
- the adsorptive collet according to Appendix 2 or 3.
- the laminated structure has a rectangular shape when viewed from the direction intersecting the main surface, A plurality of the communication portions are provided to correspond to the four rectangular corner portions of the laminated structure in a state where the contact surface is in contact with the bottom surface.
- the adsorptive collet according to any one of supplementary notes 2 to 4.
- the contact portion is integrally formed so as to continuously surround the area as viewed in a direction intersecting the surface.
- the adsorptive collet according to appendix 1.
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Abstract
Description
[ファブリペロー干渉フィルタの構成]
[吸着コレットの構成]
[吸着方法の実施形態]
[変形例]
[付記1]
基板と、前記基板上に設けられ、前記基板と反対側に臨む主面を含む積層構造部と、前記主面に交差する方向からみて前記積層構造部の外側に位置し、前記主面よりも前記基板側に窪む薄化部と、を備えるファブリペロー干渉フィルタを吸着するための吸着コレットであって、
表面を有し、前記表面に開口する吸気孔が設けられた本体部と、
前記表面から突出するように前記表面に設けられ、前記薄化部の底面に接触する接触面を有する接触部と、
を備え、
前記積層構造部には、空隙を介して互いに対向し且つ互いの距離が可変とされた第1ミラー部及び第2ミラー部と前記主面の一部とを含むメンブレン構造部が設けられており、
前記接触部は、前記表面と前記接触面との距離が前記主面と前記底面との間の距離よりも大きくされることにより、前記接触面が前記底面に接触した状態において前記表面と前記主面との間に空間を形成し、
前記吸気孔の開口は、前記表面における前記空間に臨むエリアに形成されている、
吸着コレット。
[付記2]
前記接触部は、前記表面に交差する方向からみて前記エリアを囲うように延在し、
前記接触部には、前記接触面が前記底面に接触した状態において前記空間を外部に連通する連通部が形成されている、
付記1に記載の吸着コレット。
[付記3]
前記接触部は、前記表面に交差する方向からみて前記エリアを囲うように互いに離間しつつ配列された複数の部分からなり、
前記連通部は、前記部分の間の空隙により形成されている、
付記2に記載の吸着コレット。
[付記4]
前記積層構造部には、前記主面に交差する方向からみて前記メンブレン構造部の外側に位置すると共に、前記主面から突出する電極端子が設けられており、
前記連通部は、前記接触面が前記底面に接触した状態において、前記電極端子の外側において前記電極端子に対応する位置に設けられている、
付記2又は3に記載の吸着コレット。
[付記5]
前記積層構造部は、前記主面に交差する方向からみて矩形状を呈しており、
前記連通部は、前記接触面が前記底面に接触した状態において、前記積層構造部の前記矩形状の4つの角部のそれぞれに対応するように複数設けられている、
付記2~4のいずれか一項に記載の吸着コレット。
[付記6]
前記接触部は、前記表面に交差する方向からみて前記エリアを連続的に囲うように一体的に形成されている、
付記1に記載の吸着コレット。
[付記7]
前記表面には、前記吸気孔の複数の開口が形成されており、
前記複数の開口は、前記エリアの中心に対して対称的に分散されて配置されている、
付記1~6のいずれか一項に記載の吸着コレット。
Claims (7)
- 基板と、前記基板上に設けられ、前記基板と反対側に臨む主面を含む積層構造部と、前記主面に交差する方向からみて前記積層構造部の外側に位置し、前記主面よりも前記基板側に窪む薄化部と、を備えるファブリペロー干渉フィルタを吸着コレットを用いて吸着する吸着方法であって、
前記主面に対向するように前記吸着コレットを配置する第1工程と、
前記第1工程の後に、前記吸着コレットを前記ファブリペロー干渉フィルタに接触させる第2工程と、
前記第2工程の後に、前記吸着コレットによって前記ファブリペロー干渉フィルタを吸着する第3工程と、
を備え、
前記吸着コレットは、吸気のための開口が形成された表面を有する本体部と、前記表面から突出するように前記表面に設けられ、接触面を有する接触部と、
を備え、
前記積層構造部には、空隙を介して互いに対向し且つ互いの距離が可変とされた第1ミラー部及び第2ミラー部と前記主面の一部とを含むメンブレン構造部が設けられており、
前記第1工程においては、前記接触面が前記薄化部の底面に対向するように前記吸着コレットを配置し、
前記第2工程においては、前記表面と前記主面との間に空間を形成しつつ前記接触面を前記底面に接触させ、
前記第3工程においては、前記開口を介した吸気により前記空間内を排気する、
吸着方法。 - 前記接触部は、前記表面に交差する方向からみて、前記表面における前記空間に臨むエリアを囲うように延在し、
前記接触部には、前記接触面が前記底面に接触した状態において前記空間を外部に連通する連通部が形成されており、
前記第3工程においては、前記開口を介した吸気によって前記連通部を介して前記空間内に空気を導入する、
請求項1に記載の吸着方法。 - 前記接触部は、前記表面に交差する方向からみて前記エリアを囲うように互いに離間しつつ配列された複数の部分からなり、
前記連通部は、前記部分の間の空隙により形成されている、
請求項2に記載の吸着方法。 - 前記積層構造部には、前記主面に交差する方向からみて前記メンブレン構造部の外側に位置すると共に、前記主面から突出する電極端子が設けられており、
前記第1工程においては、前記連通部が、前記接触面が前記底面に接触した状態において、前記電極端子の外側において前記電極端子に対応する位置になるように、前記吸着コレットを配置する、
請求項2又は3に記載の吸着方法。 - 前記積層構造部は、前記主面に交差する方向からみて矩形状を呈しており、
前記第1工程においては、前記連通部が、前記接触面が前記底面に接触した状態において、前記積層構造部の前記矩形状の4つの角部のそれぞれに対応する位置となるように、前記吸着コレットを配置する、
請求項2~4のいずれか一項に記載の吸着方法。 - 前記接触部は、前記表面に交差する方向からみて、前記表面における前記空間に臨むエリアを連続的に囲うように一体的に形成されている、
請求項1に記載の吸着方法。 - 前記表面には、複数の前記開口が形成されており、
前記第1工程においては、前記複数の開口が、前記主面に交差する方向からみて前記メンブレン構造部の中心に対して対称的に分散されるように前記吸着コレットを配置する、
請求項1~6のいずれか一項に記載の吸着方法。
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Also Published As
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JP7348069B2 (ja) | 2023-09-20 |
TWI810221B (zh) | 2023-08-01 |
US20210362351A1 (en) | 2021-11-25 |
EP3712929A1 (en) | 2020-09-23 |
JP7506801B2 (ja) | 2024-06-26 |
FI3712929T3 (fi) | 2023-11-09 |
CN111357091B (zh) | 2023-09-22 |
KR20200086690A (ko) | 2020-07-17 |
TW201933524A (zh) | 2019-08-16 |
EP3712929A4 (en) | 2021-08-25 |
CN111357091A (zh) | 2020-06-30 |
JP2023115036A (ja) | 2023-08-18 |
US11865701B2 (en) | 2024-01-09 |
KR102659311B1 (ko) | 2024-04-22 |
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EP3712929B1 (en) | 2023-09-13 |
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