WO2019047358A1 - 光罩 - Google Patents

光罩 Download PDF

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Publication number
WO2019047358A1
WO2019047358A1 PCT/CN2017/109594 CN2017109594W WO2019047358A1 WO 2019047358 A1 WO2019047358 A1 WO 2019047358A1 CN 2017109594 W CN2017109594 W CN 2017109594W WO 2019047358 A1 WO2019047358 A1 WO 2019047358A1
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WO
WIPO (PCT)
Prior art keywords
groove
photomask
central portion
reticle
common electrode
Prior art date
Application number
PCT/CN2017/109594
Other languages
English (en)
French (fr)
Inventor
安立扬
徐向阳
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US15/577,322 priority Critical patent/US10481487B2/en
Publication of WO2019047358A1 publication Critical patent/WO2019047358A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134318—Electrodes characterised by their geometrical arrangement having a patterned common electrode

Definitions

  • the present invention relates to the field of array substrate fabrication technology, and more particularly to a photomask for fabricating a common electrode on an array substrate.
  • the liquid crystal display panel industry has undergone several decades of development.
  • the vertical alignment (VA) display mode has become a film for large-sized televisions (TVs) with its wide viewing angle, high contrast and no friction.
  • the content of a display screen can only be displayed by the difference between pixels and pixels, and the simplest difference is light and dark. The greater the difference between them, the more the human eye perceives.
  • the pupil of the person will be scaled according to the brightness of the environment to control the amount of light entering the eye.
  • the pupil As long as it is within the normal brightness range, when the brightness of the surrounding environment is large, the pupil will shrink to make the amount of incoming light smaller. On the contrary, When the brightness of the surrounding environment is low, the pupil is enlarged to increase the amount of incoming light. Therefore, in contrast, contrast affects the human eye more than the brightness value itself.
  • the intersection area of the common electrode lines forms a connection of two cross lines.
  • the hypotenuse (such as the 45° bevel) makes it easy to appear dark in the intersection area in the VA display mode, resulting in poor display.
  • the present invention provides a photomask for forming a common electrode of an array substrate, which can reduce the risk of display failure of a liquid crystal display panel to which the array substrate is applied.
  • a photomask for fabricating a common electrode of an array substrate comprising a central portion, a first portion and a second portion, the first portion connecting the central portion and extending in a first direction, the second portion connecting the a central portion extending in a second direction, the first direction intersecting the second direction, a boundary between the first portion and the central portion forming a first groove, the second portion and the central portion
  • the junction forms a second recess, and the second recess communicates with the first recess to collectively form a first recessed region.
  • the photomask further includes a third portion, the third portion is connected to the central portion and extends in a third direction, the third direction is opposite to the first direction, and the second portion is connected to the a third groove is formed at the junction of the central portion, the third groove is disposed opposite to the second groove, and the third portion is connected to the boundary of the central portion to form a fourth groove, the first portion Four grooves communicate with the third grooves to collectively form a second recessed region.
  • the photomask further includes a fourth portion, the fourth portion is connected to the central portion and extends in a fourth direction, the fourth direction is opposite to the second direction, and the third portion is connected to the a junction of the central portion further forms a fifth groove, the fifth groove is disposed opposite to the fourth groove, and a junction of the first portion and the central portion further forms a sixth groove, the first portion a sixth groove is disposed opposite to the first groove, and a boundary between the fourth portion and the central portion forms a seventh groove and an eighth groove opposite to each other, and the seventh groove communicates with the first groove
  • the five grooves collectively form a third recessed region, and the eighth recess communicates with the sixth recess to form a fourth recessed region.
  • an angle between 60° and 90° is formed between the first direction and the second direction.
  • first direction is perpendicular to the second direction.
  • the shape of the first groove is the same as the shape of the second groove and is symmetrically arranged with each other.
  • the third groove and the second groove have the same shape and are symmetrically arranged with each other.
  • the first recessed area and the second recessed area are symmetrically disposed with respect to the second portion.
  • a depth of the first groove is less than or equal to a width of the first portion of one-half.
  • a depth of the second groove is less than or equal to a width of the second portion of the second portion.
  • the first recessed area is provided in common with the boundary of the second portion and the central portion, so when the common electrode is formed by the photomask, the first recessed area corresponds to the intersection of the common electrode a region, an additional metal appearing in the etching process can be complementary to the first recessed region to form a regular, standard common electrode, such that the common electrode can be disposed in a display region of the array substrate, Moreover, the risk of display failure of the liquid crystal display panel to which the array substrate is applied can be reduced.
  • FIG. 1 is a schematic structural view of an embodiment of a photomask provided by an embodiment of the present invention.
  • Figure 2 is an enlarged schematic view showing the structure of the reticle of the reticle of Figure 1.
  • Fig. 3 is a schematic view showing the structure of a common electrode formed by the reticle shown in Fig. 1.
  • FIG. 4 is a schematic structural view of another embodiment of a photomask provided by an embodiment of the present invention.
  • Fig. 5 is an enlarged schematic view showing the structure of a portion B of the reticle shown in Fig. 4.
  • Fig. 6 is a schematic view showing the structure of a common electrode formed by the reticle shown in Fig. 4.
  • FIG. 7 is a schematic structural view of still another embodiment of a reticle according to an embodiment of the present invention.
  • Fig. 8 is an enlarged schematic view showing the structure of a portion C of the reticle shown in Fig. 7.
  • Fig. 9 is a schematic view showing the structure of a common electrode formed by the reticle shown in Fig. 7.
  • FIG. 10 is an array substrate provided by an embodiment of the present invention.
  • FIG. 11 is a schematic structural view of still another embodiment of a reticle according to an embodiment of the present invention.
  • FIG. 12 is a schematic structural view of still another embodiment of a reticle according to an embodiment of the present invention.
  • the fixed connection may also be detachably connected or integrally connected; it may be a mechanical connection; it may be directly connected, or may be indirectly connected through an intermediate medium, and may be internal communication between the two elements.
  • the specific meaning of the above terms in the present invention can be understood in a specific case by those skilled in the art.
  • an embodiment of the present invention provides a photomask 100 for fabricating a common electrode 300 of the array substrate 200 .
  • the reticle 100 includes a central portion 10, a first portion 1 and a second portion 2.
  • the first portion 1 connects the central portion 10 and extends in a first direction X1.
  • the second portion 2 is connected to the central portion 10 and extends along a second direction Y1, and the first direction X1 intersects with the second direction Y1 (that is, the first direction X1 and the second direction Y1 Form an angle between them).
  • a first groove 11 is formed at a boundary between the first portion 1 and the central portion 10, and a second groove 21 is formed at a boundary between the second portion 2 and the central portion 10, the second groove 21
  • the first grooves 11 are connected to collectively form the first recessed regions 101.
  • the first portion is commonly provided at the boundary between the first portion 1 of the reticle 100 and the central portion 10 and the boundary between the second portion 2 and the central portion 10
  • the recessed region 101 therefore, when the common electrode 300 is formed by the reticle 100, the first recessed region 101 corresponds to an intersection region of the common electrode 300, and additional metal that occurs during etching can Complementing the first recessed region 101 to form a regular, standard common electrode 300 such that the common electrode 300 can be disposed in the display area of the array substrate 200 (as shown in FIG. 10). And the risk of display failure of the liquid crystal display panel to which the array substrate 200 is applied can be reduced.
  • the common electrode 300 on the array substrate 200 can be formed by a yellow light process, and the reticle 100 is a reticle applied to the yellow light process.
  • the yellow light process is performed by exposing (providing the photomask 100) to a photosensitive material (also referred to as a photoresist or photoresist) coated on the surface of the substrate, and the portion left after development is applied to the substrate. The process of protection, then etching the substrate and finally obtaining a patterned structure.
  • FIG. 1 is a schematic structural view of an embodiment of the reticle 100
  • FIG. 2 is an enlarged schematic view showing a structure of the reticle 100 of FIG.
  • FIG. 3 is a schematic structural view of the common electrode 300 formed by the reticle 100 shown in FIG.
  • the photomask 100 is provided with the first recessed area 101.
  • the area of the common electrode 300 corresponding to the first part 1 is the first area 301.
  • the common electrode 300 corresponds to a central area of the central portion of 30, and the area of the common electrode 300 corresponding to the second portion 2 is a second area 302.
  • the first region 301 is identical in size to the central region 30, and in the vertical direction of the second direction Y1, the second region 302 is in the vertical direction
  • the central region has a uniform size of 30, and the shape of the common electrode 300 is regular and standard, and it is possible to prevent the common electrode 300 from having a beveled edge or the like in the intersecting region.
  • FIG. 4 is a schematic structural view of another embodiment of the reticle 100
  • FIG. 5 is a structural view of the reticle 100 of FIG.
  • FIG. 6 is a schematic view showing the structure of the common electrode 300 formed by the reticle 100 shown in FIG.
  • the reticle 100 further includes a third portion 3 that connects the central portion 10 and extends in a third direction X2 that is opposite the first direction X1.
  • the junction of the second portion 2 to the central portion 10 also forms a third recess 22, which is disposed opposite the second recess 21.
  • the third portion 3 is connected to the boundary of the central portion 10 to form a fourth recess 31, and the fourth recess 31 communicates with the third recess 22 to collectively form the second recessed region 102.
  • the second recessed area 102 and the first recessed area 101 are spaced apart.
  • the photomask 100 is provided with the first recessed area 101 and the second recessed area 102.
  • the common electrode 300 further includes a portion corresponding to the third portion 33.
  • the first region 301, the central region 30, and the third region 303 have the same size
  • the second The area 302 is the same size as the center area 30, and the shape of the common electrode 300 is regular and standard, and it is possible to prevent the common electrode 300 from having a problem such as a bevel in the intersection area.
  • the third direction X2 may also be other directions different from the first direction X1 and the second direction Y1.
  • FIG. 7 is a schematic structural view of still another embodiment of the reticle 100
  • FIG. 8 is a structural structure of the reticle 100 of FIG. 7
  • FIG. 9 is a schematic view showing the structure of the common electrode 300 formed by the reticle 100 shown in FIG.
  • the reticle 100 further includes a fourth portion 4 that connects the central portion 10 and extends in a fourth direction Y2 that is opposite the second direction Y1.
  • the junction of the third portion 3 to the central portion 10 also forms a fifth recess 32, which is disposed opposite the fourth recess 31.
  • the junction of the first portion 1 to the central portion 10 also forms a sixth recess 12, which is disposed opposite the first recess 11.
  • the fourth portion 4 is connected to the intersection of the central portion 10 to form a relatively disposed seventh groove 41 and an eighth groove 42.
  • the seventh groove 41 communicates with the fifth groove 32 to form a first
  • the third recessed area 103 communicates with the sixth recess 12 to form a fourth recessed area 104.
  • the first recessed region 101, the second recessed region 102, the third recessed region 103, and the fourth recessed region 104 are spaced apart from each other.
  • the photomask 100 is provided with the first recessed region 101, the second recessed region 102, the third recessed region 103, and the fourth recessed region 104.
  • the common electrode 300 further includes a fourth region 304.
  • the first region 301, the central region 30, and the third region 303 have the same size
  • the second The size of the region 302, the central region 30, and the fourth region 304 are the same, and the shape of the common electrode 300 is regular and standard, and it is possible to prevent the common electrode 300 from having a problem such as a bevel in the intersection region.
  • the fourth direction Y2 may be other directions different from the first direction X1, the second direction Y1, and the third direction X2.
  • the reticle 100 of the present invention includes the structure shown in FIG. 1 , the structure shown in FIG. 4 or One or more of the structures illustrated in FIG.
  • an angle of 60° to 90° is formed between the first direction X1 and the second direction Y1.
  • the size of the angle between the first direction X1 and the second direction Y1 can be designed according to specific requirements, which is not limited in the present invention.
  • the first direction X1 is perpendicular to the second direction Y1.
  • the first portion 1, the center portion 10, and the second portion 2 substantially form a right angle.
  • the first portion 1, the central portion 10, the second portion 2, and the third portion 3 generally form a T shape.
  • the first portion 1, the central portion 10, the second portion 2, the third portion 3, and the fourth portion 4 generally form a cross shape.
  • the shape of the first groove 11 is the same as the shape of the second groove 21 and is symmetrically arranged with each other. If the angle between the first direction and the second direction is ⁇ , between the axis of symmetry 1010 of the first groove 11 and the second groove 21 and the first direction X1 Forming an angle of ⁇ /2 and forming an angle of ⁇ /2 with the second direction Y1, and the axis of symmetry 1010 of the first groove 11 and the second groove 21 passes through The center point of the center portion 10.
  • the shape of the third groove 22 is the same as the shape of the second groove 21 and is symmetrically arranged to each other (the axis of symmetry is the center line of the second portion 2).
  • the remaining grooves are disposed with reference to the first groove 11, the second groove 21, and the third groove 31.
  • the first recessed area 101 and the second recessed area 102 are symmetrically disposed with respect to the second portion 2 (ie, the center line of the second portion 2).
  • the third recessed area 103 and the second recessed area 102 are symmetrically disposed with respect to the third portion 3 (ie, the center line of the third portion 3).
  • the fourth recessed area 104 and the third recessed area 103 are symmetrically disposed with respect to the fourth portion 4 (ie, the center line of the fourth portion 4).
  • the first recessed area 101 and the fourth recessed area 104 are symmetrically disposed with respect to the first portion 1 (ie, the center line of the first portion 1).
  • the first recessed area 101 is substantially rectangular (as shown in FIGS. 1 to 9), square (as shown in FIG. 11) or curved (as shown in FIG. 12).
  • the depth h1 of the first groove 11 is less than or equal to one-half of the first Part 1 has a width H1.
  • the reticle 100 can prevent the central region 30 of the common electrode 300
  • the size of the first region 301 of the common electrode 300 is larger than the size of the first recessed region 101, and the size of the central region 30 of the common electrode 300 is significantly smaller than that of the first recessed region 101.
  • the size of the area of the first region 301 of the common electrode 300, the size of the common electrode 300 is regular.
  • the third portion 3 is designed with reference to a portion of the described.
  • the depth h2 of the second groove 21 is less than or equal to one-half of the first
  • the width of the two parts 2 is H2.
  • the reticle 100 can prevent the size of the central region 30 of the common electrode 300 from being larger than the size of the second region 302 of the common electrode 300, and can also avoid the second recessed region 102
  • the size of the region of the central portion 30 of the common electrode 300 is significantly smaller than the size of the second region 302 of the common electrode 300, and the size of the common electrode 300 is regular.
  • the fourth portion 4 is designed with reference to the second portion 2.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

一种光罩（100），用于制作阵列基板（200）的公共电极（300），包括中心部分（10）、第一部分（1）以及第二部分（2），第一部分（1）连接中心部分（10）且沿第一方向（X1）延伸，第二部分（2）连接中心部分（10）且沿第二方向（Y1）延伸，第一方向（X1与第二方向（Y1）交叉，第一部分（1）与中心部分（10）的交界处形成第一凹槽（11），第二部分（2）与中心部分（10）的交界处形成第二凹槽（21），第二凹槽（21）连通第一凹槽（11）以共同形成第一凹陷区（101）。光罩（100）能够降低应用阵列基板（200）的液晶显示面板出现显示不良的风险。

Description

光罩
本发明要求2017年9月11日递交的发明名称为“光罩”的申请号201710816146.7的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及阵列基板制备技术领域，尤其涉及一种用于制作阵列基板上公共电极的光罩。
背景技术
液晶显示面板行业已经历了数十年的发展，垂直配向(vertical alignment，VA)显示模式以其宽视野角、高对比度和无须摩擦配相等优势，成为大尺寸电视机(Television，TV)用薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display，TFT-LCD)的常见显示模式。对比度可以用最亮情况的亮度与最暗情况的亮度之比率来衡量。一个显示画面的内容，只有由像素与像素之间的差别来表现才能显示出来，而最简单的差别是亮与暗，其间的差别越大，人眼便越能感知到。人的瞳孔会随着所处环境的亮度而缩放来控制进入眼睛的光量，只要是在正常的亮度范围之内，当周围环境的亮度大时，瞳孔会缩小使进入光量变小，相反的，当周围环境的亮度低时，瞳孔会放大而使进入光量变大。因此，相较之下，对比度对于人眼感觉的影响更甚于亮度值本身的大小。
现有液晶显示面板的像素中，如果在显示区域内设有交叉的公共电极线时，由于交叉区域容易在蚀刻过程中出现额外的金属，使得公共电极线的交叉区域形成连接两个交叉走线的斜边(如45°斜边)，因此在VA显示模式下容易在交叉区域出现暗态亮纹，从而导致显示不良。
发明内容
本发明提供一种光罩，所述光罩用于制作阵列基板的公共电极，所述光罩能够降低应用所述阵列基板的液晶显示面板出现显示不良的风险。
本发明实施例采用如下技术方案：
提供一种光罩，用于制作阵列基板的公共电极，包括中心部分、第一部分以及第二部分，所述第一部分连接所述中心部分且沿第一方向延伸，所述第二部分连接所述中心部分且沿第二方向延伸，所述第一方向与所述第二方向交叉，所述第一部分与所述中心部分的交界处形成第一凹槽，所述第二部分与所述中心部分的交界处形成第二凹槽，所述第二凹槽连通所述第一凹槽以共同形成第一凹陷区。
其中，所述光罩还包括第三部分，所述第三部分连接所述中心部分且沿第三方向延伸，所述第三方向与所述第一方向相反，所述第二部分连接所述中心部分的交界处还形成第三凹槽，所述第三凹槽与所述第二凹槽相对设置，所述第三部分连接所述中心部分的交界处形成第四凹槽，所述第四凹槽连通所述第三凹槽以共同形成第二凹陷区。
其中，所述光罩还包括第四部分，所述第四部分连接所述中心部分且沿第四方向延伸，所述第四方向与所述第二方向相反，所述第三部分连接所述中心部分的交界处还形成第五凹槽，所述第五凹槽与所述第四凹槽相对设置，所述第一部分连接所述中心部分的交界处还形成第六凹槽，所述第六凹槽与所述第一凹槽相对设置，所述第四部分连接所述中心部分的交界处形成相对设置的第七凹槽和第八凹槽，所述第七凹槽连通所述第五凹槽以共同形成第三凹陷区，所述第八凹槽连通所述第六凹槽以形成第四凹陷区。
其中，所述第一方向与所述第二方向之间形成60°～90°的夹角。
其中，所述第一方向垂直于所述第二方向。
其中，所述第一凹槽的形状与所述第二凹槽的形状相同且彼此对称设置。
其中，所述第三凹槽与所述第二凹槽的形状相同且彼此对称设置。
其中，所述第一凹陷区和所述第二凹陷区相对于所述第二部分对称设置。
其中，在所述第一方向的垂直方向上，所述第一凹槽的深度小于等于二分之一的所述第一部分的宽度。
其中，在所述第二方向的垂直方向上，所述第二凹槽的深度小于等于二分之一的所述第二部分的宽度。
在本发明中，由于所述光罩的所述第一部分与所述中心部分的交界处和所 述第二部分与所述中心部分的交界处共同设有所述第一凹陷区，因此在通过所述光罩形成所述公共电极时，所述第一凹陷区对应于所述公共电极的交叉区域，蚀刻过程中出现的额外金属能够与所述第一凹陷区进行互补，以形成规则的、标准的所述公共电极，从而使得所述公共电极可设于所述阵列基板的显示区内，且能够降低应用所述阵列基板的液晶显示面板出现显示不良的风险。
附图说明
为了更清楚地说明本发明的技术方案，下面将对实施方式中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以如这些附图获得其他的附图。
图1是本发明实施例提供的光罩的一种实施方式的结构示意图。
图2是图1所示光罩的A处结构的放大示意图。
图3是通过图1所示光罩所形成的公共电极的结构示意图。
图4是本发明实施例提供的光罩的另一种实施方式的结构示意图。
图5是图4所示光罩的B处结构的放大示意图。
图6是通过图4所示光罩所形成的公共电极的结构示意图。
图7是本发明实施例提供的光罩的再一种实施方式的结构示意图。
图8是图7所示光罩的C处结构的放大示意图。
图9是通过图7所示光罩所形成的公共电极的结构示意图。
图10是通过本发明实施例提供的一种阵列基板。
图11是本发明实施例提供的光罩的再另一种实施方式的结构示意图。
图12是本发明实施例提供的光罩的再再一种实施方式的结构示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
此外，以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明中所提到的方向用语，例如，“上”、“下”、“前”、“后”、“左”、“右”、“内”、“外”、“侧面”等，仅是参考附加图式的方向，因此，使用的方向用语是为了更好、更清楚地说明及理解本发明，而不是指示或暗指所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。
在本发明的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“设置在……上”应做广义理解，例如，可以是固定连接，也可以是可拆卸地连接，或者一体地连接；可以是机械连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本发明中的具体含义。
此外，在本发明的描述中，除非另有说明，“多个”的含义是两个或两个以上。若本说明书中出现“工序”的用语，其不仅是指独立的工序，在与其它工序无法明确区别时，只要能实现该工序所预期的作用则也包括在本用语中。另外，本说明书中用“～”表示的数值范围是指将“～”前后记载的数值分别作为最小值及最大值包括在内的范围。在附图中，结构相似或相同的单元用相同的标号表示。
请一并参阅1至图10，本发明实施例提供一种光罩100，所述光罩100用于制作阵列基板200的公共电极300。所述光罩100包括中心部分10、第一部分1以及第二部分2。所述第一部分1连接所述中心部分10且沿第一方向X1延伸。所述第二部分2连接所述中心部分10且沿第二方向Y1延伸，所述第一方向X1与所述第二方向Y1交叉(也即所述第一方向X1与所述第二方向Y1之间形成夹角)。所述第一部分1与所述中心部分10的交界处形成第一凹槽11，所述第二部分2与所述中心部分10的交界处形成第二凹槽21，所述第二凹槽21连通所述第一凹槽11以共同形成第一凹陷区101。
在本实施例中，由于所述光罩100的所述第一部分1与所述中心部分10的交界处和所述第二部分2与所述中心部分10的交界处共同设有所述第一凹陷区101，因此在通过所述光罩100形成所述公共电极300时，所述第一凹陷区101对应于所述公共电极300的交叉区域，蚀刻过程中出现的额外金属能够 与所述第一凹陷区101进行互补，以形成规则的、标准的所述公共电极300，从而使得所述公共电极300可设于所述阵列基板200的显示区内(如图10所示)，且能够降低应用所述阵列基板200的液晶显示面板出现显示不良的风险。
可以理解的，可通过黄光制程形成所述阵列基板200上的所述公共电极300，所述光罩100为应用于所述黄光制程中的光罩。所述黄光制程是通过对涂覆在基材表面的光敏性物质(又称光刻胶或光阻)，经曝光(设所述光罩100)、显影后留下的部分对基材起保护作用，然后对基材进行刻蚀并最终获得图案化结构的过程。
在一种实施方式中，如图1至图3所示，图1是所述光罩100的一种实施方式的结构示意图，图2是图1所示光罩100的A处结构的放大示意图，图3是通过图1所示光罩100所形成的公共电极300的结构示意图。如图1和图2所示，所述光罩100设有所述第一凹陷区101，如图3所示，所述公共电极300对应于所述第一部分1的区域为第一区域301，所述公共电极300对应于所述中心部分的中心区域为30，所述公共电极300对应于所述第二部分2的区域为第二区域302。在所述第一方向X1的垂直方向上，所述第一区域301与所述中心区域为30的尺寸一致，在所述第二方向Y1的垂直方向上，所述第二区域302与所述中心区域为30的尺寸一致，所述公共电极300的形状规则且标准，能够避免所述公共电极300在交叉区域出现斜边等不良。
在另一种实施方式中，如图4至图6所示，图4是所述光罩100的另一种实施方式的结构示意图，图5是图4所示光罩100的B处结构的放大示意图，图6是通过图4所示光罩100所形成的公共电极300的结构示意图。
所述光罩100还包括第三部分3，所述第三部分3连接所述中心部分10且沿第三方向X2延伸，所述第三方向X2与所述第一方向X1相反。所述第二部分2连接所述中心部分10的交界处还形成第三凹槽22，所述第三凹槽22与所述第二凹槽21相对设置。所述第三部分3连接所述中心部分10的交界处形成第四凹槽31，所述第四凹槽31连通所述第三凹槽22以共同形成第二凹陷区102。所述第二凹陷区102和所述第一凹陷区101间隔设置。
如图4和图5所示，所述光罩100设有所述第一凹陷区101和所述第二凹陷区102。如图6所示，所述公共电极300还包括对应于所述第三部分33的 第三区域303。在所述第一方向X1的垂直方向上，所述第一区域301、所述中心区域为30以及第三区域303的尺寸一致，在所述第二方向Y1的垂直方向上，所述第二区域302与所述中心区域为30的尺寸一致，所述公共电极300的形状规则且标准，能够避免所述公共电极300在交叉区域出现斜边等不良。
可以理解的是，在其他实施方式中，所述第三方向X2也可以是不同于所述第一方向X1和所述第二方向Y1的其他方向。
在再一种实施方式中，如图7至图9所示，图7是所述光罩100的再一种实施方式的结构示意图，图8是图7所示光罩100的C处结构的放大示意图，图9是通过图7所示光罩100所形成的公共电极300的结构示意图。
所述光罩100还包括第四部分4，所述第四部分4连接所述中心部分10且沿第四方向Y2延伸，所述第四方向Y2与所述第二方向Y1相反。所述第三部分3连接所述中心部分10的交界处还形成第五凹槽32，所述第五凹槽32与所述第四凹槽31相对设置。所述第一部分1连接所述中心部分10的交界处还形成第六凹槽12，所述第六凹槽12与所述第一凹槽11相对设置。所述第四部分4连接所述中心部分10的交界处形成相对设置的第七凹槽41和第八凹槽42，所述第七凹槽41连通所述第五凹槽32以共同形成第三凹陷区103，所述第八凹槽42连通所述第六凹槽12以形成第四凹陷区104。所述第一凹陷区101、所述第二凹陷区102、所述第三凹陷区103以及所述第四凹陷区104彼此间隔设置。
如图7和图8所示，所述光罩100设有所述第一凹陷区101、所述第二凹陷区102、所述第三凹陷区103以及所述第四凹陷区104。如图9所示，所述公共电极300还包括第四区域304。在所述第一方向X1的垂直方向上，所述第一区域301、所述中心区域为30以及第三区域303的尺寸一致，在所述第二方向Y1的垂直方向上，所述第二区域302、所述中心区域为30以及所述第四区域304的尺寸一致，所述公共电极300的形状规则且标准，能够避免所述公共电极300在交叉区域出现斜边等不良。
可以理解的是，在其他实施方式中，所述第四方向Y2也可以是不同于所述第一方向X1、所述第二方向Y1及所述第三方向X2的其他方向。
可以理解的是，本发明所述光罩100包括图1所示结构、图4所示结构或 图7所述结构中的一种或多种。
请一并参阅图1至图9，作为一种可选实施例，所述第一方向X1与所述第二方向Y1之间形成60°～90°的夹角。所述第一方向X1和所述第二方向Y1之间的夹角的大小可以依据具体的需求进行设计，本发明对此不作限定。
可选的，所述第一方向X1垂直于所述第二方向Y1。此时，如图1所示，所述第一部分1、所述中心部分10及所述第二部分2大致构成直角形。如图4所示，所述第一部分1、所述中心部分10、所述第二部分2及所述第三部分3大致构成T形。如图7所示，所述第一部分1、所述中心部分10、所述第二部分2、所述第三部分3及所述第四部分4大致构成十字形。
请一并参阅图1至图9、图11以及图12，作为一种可选实施例，所述第一凹槽11的形状与所述第二凹槽21的形状相同且彼此对称设置。若所述第一方向与所述第二方向之间的夹角大小为α，则所述第一凹槽11与所述第二凹槽21的对称轴1010与所述第一方向X1之间形成大小为α/2夹角、且与所述第二方向Y1之间形成大小为α/2夹角，所述第一凹槽11与所述第二凹槽21的对称轴1010经过所述中心部分10的中心点。
所述第三凹槽22的形状与所述第二凹槽21的形状相同且彼此对称设置(对称轴为所述第二部分2的中心线)。其余凹槽参考所述第一凹槽11、所述第二凹槽21及所述第三凹槽31设置。
可选的，所述第一凹陷区101和所述第二凹陷区102相对于所述第二部分2(也即所述第二部分2的中心线)对称设置。所述第三凹陷区103和所述第二凹陷区102相对于所述第三部分3(也即所述第三部分3的中心线)对称设置。所述第四凹陷区104和所述第三凹陷区103相对于所述第四部分4(也即所述第四部分4的中心线)对称设置。所述第一凹陷区101和所述第四凹陷区104相对于所述第一部分1(也即所述第一部分1的中心线)对称设置。
所述第一凹陷区101大致呈直角尺形(如图1至图9所示)、方形(如图11所示)或弧形(如图12所示)。
请一并参阅图1至图12，作为一种可选实施例，在所述第一方向X1的垂直方向上，所述第一凹槽11的深度h1小于等于二分之一的所述第一部分1的宽度H1。此时，所述光罩100能够防止所述公共电极300的所述中心区域30 的尺寸大于所述公共电极300的所述第一区域301的尺寸，也能够避免因所述第一凹陷区101的尺寸过大而导致所述公共电极300的所述中心区域30的尺寸明显小于所述公共电极300的所述第一区域301的区域的尺寸，所述公共电极300的尺寸规则。所述第三部分3参考所述的一部分设计。
请一并参阅图1至图12，作为一种可选实施例，在所述第二方向Y1的垂直方向上，所述第二凹槽21的深度h2小于等于二分之一的所述第二部分2的宽度H2。此时，所述光罩100能够防止所述公共电极300的所述中心区域30的尺寸大于所述公共电极300的所述第二区域302的尺寸，也能够避免因所述第二凹陷区102的尺寸过大而导致所述公共电极300的所述中心区域30的区域的尺寸明显小于所述公共电极300的所述第二区域302的尺寸，所述公共电极300的尺寸规则。所述第四部分4参考所述第二部分2设计。
以上对本发明实施例进行了详细介绍，本文中应用了具体个例对本发明的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本发明的方法及其核心思想；同时，对于本领域的一般技术人员，依据本发明的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本发明的限制。

Claims (20)

  1. 一种光罩，用于制作阵列基板的公共电极，其中，包括中心部分、第一部分以及第二部分，所述第一部分连接所述中心部分且沿第一方向延伸，所述第二部分连接所述中心部分且沿第二方向延伸，所述第一方向与所述第二方向交叉，所述第一部分与所述中心部分的交界处形成第一凹槽，所述第二部分与所述中心部分的交界处形成第二凹槽，所述第二凹槽连通所述第一凹槽以共同形成第一凹陷区。
  2. 如权利要求1所述的光罩，其中，所述光罩还包括第三部分，所述第三部分连接所述中心部分且沿第三方向延伸，所述第三方向与所述第一方向相反，所述第二部分连接所述中心部分的交界处还形成第三凹槽，所述第三凹槽与所述第二凹槽相对设置，所述第三部分连接所述中心部分的交界处形成第四凹槽，所述第四凹槽连通所述第三凹槽以共同形成第二凹陷区。
  3. 如权利要求2所述的光罩，其中，所述光罩还包括第四部分，所述第四部分连接所述中心部分且沿第四方向延伸，所述第四方向与所述第二方向相反，所述第三部分连接所述中心部分的交界处还形成第五凹槽，所述第五凹槽与所述第四凹槽相对设置，所述第一部分连接所述中心部分的交界处还形成第六凹槽，所述第六凹槽与所述第一凹槽相对设置，所述第四部分连接所述中心部分的交界处形成相对设置的第七凹槽和第八凹槽，所述第七凹槽连通所述第五凹槽以共同形成第三凹陷区，所述第八凹槽连通所述第六凹槽以形成第四凹陷区。
  4. 如权利要求1所述的光罩，其中，所述第一方向与所述第二方向之间形成60°～90°的夹角。
  5. 如权利要求2所述的光罩，其中，所述第一方向与所述第二方向之间形成60°～90°的夹角。
  6. 如权利要求3所述的光罩，其中，所述第一方向与所述第二方向之间形成60°～90°的夹角.
  7. 如权利要求4所述的光罩，其中，所述第一方向垂直于所述第二方向。
  8. 如权利要求5所述的光罩，其中，所述第一方向垂直于所述第二方向。
  9. 如权利要求6所述的光罩，其中，所述第一方向垂直于所述第二方向。
  10. 如权利要求1所述的光罩，其中，所述第一凹槽的形状与所述第二凹槽的形状相同且彼此对称设置。
  11. 如权利要求2所述的光罩，其中，所述第一凹槽的形状与所述第二凹槽的形状相同且彼此对称设置。
  12. 如权利要求3所述的光罩，其中，所述第一凹槽的形状与所述第二凹槽的形状相同且彼此对称设置。
  13. 如权利要求2所述的光罩，其中，所述第三凹槽与所述第二凹槽的形状相同且彼此对称设置。
  14. 如权利要求3所述的光罩，其中，所述第三凹槽与所述第二凹槽的形状相同且彼此对称设置。
  15. 如权利要求2所述的光罩，其中，所述第一凹陷区和所述第二凹陷区相对于所述第二部分对称设置。
  16. 如权利要求3所述的光罩，其中，所述第一凹陷区和所述第二凹陷区相对于所述第二部分对称设置。
  17. 如权利要求1所述的光罩，其中，在所述第一方向的垂直方向上，所述第一凹槽的深度小于等于二分之一的所述第一部分的宽度。
  18. 如权利要求2所述的光罩，其中，在所述第一方向的垂直方向上，所述第一凹槽的深度小于等于二分之一的所述第一部分的宽度。
  19. 如权利要求3所述的光罩，其中，在所述第一方向的垂直方向上，所述第一凹槽的深度小于等于二分之一的所述第一部分的宽度。
  20. 如权利要求17所述的光罩，其中，在所述第二方向的垂直方向上，所述第二凹槽的深度小于等于二分之一的所述第二部分的宽度。
PCT/CN2017/109594 2017-09-11 2017-11-06 光罩 WO2019047358A1 (zh)

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CN109143774A (zh) * 2018-07-18 2019-01-04 深圳市华星光电半导体显示技术有限公司 掩膜板及金属线的制作方法
CN111413846A (zh) * 2020-04-21 2020-07-14 Tcl华星光电技术有限公司 一种掩膜板、显示面板及其制备方法
CN111580318B (zh) * 2020-05-28 2023-10-17 深圳市华星光电半导体显示技术有限公司 阵列基板及显示面板

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