WO2018232864A1 - 内嵌式触摸屏 - Google Patents

内嵌式触摸屏 Download PDF

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Publication number
WO2018232864A1
WO2018232864A1 PCT/CN2017/096426 CN2017096426W WO2018232864A1 WO 2018232864 A1 WO2018232864 A1 WO 2018232864A1 CN 2017096426 W CN2017096426 W CN 2017096426W WO 2018232864 A1 WO2018232864 A1 WO 2018232864A1
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WIPO (PCT)
Prior art keywords
layer
prepared
common electrode
planarization layer
glass substrate
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PCT/CN2017/096426
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English (en)
French (fr)
Inventor
黄耀立
贺兴龙
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武汉华星光电技术有限公司
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Priority to US15/572,805 priority Critical patent/US10423258B2/en
Publication of WO2018232864A1 publication Critical patent/WO2018232864A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes

Definitions

  • the present invention relates to the field of liquid crystal display technologies, and in particular, to an in-cell touch panel.
  • the touch screen is usually integrated in a liquid crystal display panel to form various electronic products, such as a mobile phone, a notebook computer, an MP3/MP4, and the like.
  • the display device has been widely integrated with the touch screen.
  • the touch screen includes a touch electrode for sensing a touch position. Since the touch layer is a common electrode layer, the common electrode layer is patterned into a plurality of common electrode plates insulated from each other, and each common electrode plate is electrically connected to the through via holes. Inductive electrode lines, sensing electrode lines are used as leads, and a plurality of common electrode plates are electrically connected to the touch display chip; conventional touch electrodes are made of ITO (Indium) Tin Oxides, made of indium tin oxide, has poor conductivity of ITO, which increases the impedance of the common electrode plate and increases the load delay, which leads to poor touch performance of the touch screen.
  • ITO Indium
  • Tin Oxides made of indium tin oxide
  • the in-cell touch panel of the prior art has poor conductivity due to poor conductivity of the common electrode plate of the touch electrode, thereby causing poor touch performance of the touch screen.
  • the invention provides an in-cell touch panel, which can enhance the conductivity of the common electrode plate, thereby reducing the load delay of the touch signal; and solving the prior art in-cell touch panel, the common electrode plate as the touch electrode is poor in conductivity The delay of the touch signal is increased or decreased, which in turn leads to technical problems of poor touch performance of the touch screen.
  • the invention provides an in-cell touch screen, comprising:
  • a color filter substrate comprising a first glass substrate, and a color resist layer and a black matrix prepared on a surface of the first glass substrate;
  • An array substrate disposed opposite to the color filter substrate; the array substrate includes:
  • a buffer layer is prepared on the surface of the second glass substrate
  • An insulating layer is prepared on the surface of the gate insulating layer
  • a first planarization layer prepared on a surface of the interlayer insulating layer
  • the grid metal line prepared on the surface of the common electrode layer; the grid metal line coincides with a coverage area of the black matrix;
  • a second planarization layer is prepared on the surface of the mesh metal line, and a plurality of via holes are formed on the second planarization layer;
  • a sensing electrode line is prepared on the surface of the second planarization layer and connected to the mesh metal line through the via.
  • the film thickness of the first planarization layer is a normal thickness
  • the film thickness of the second planarization layer is twice the film thickness of the first planarization layer
  • the common electrode layer is patterned to form a plurality of array-distributed common electrode plates, and each of the common electrode plates is connected to the touch chip through the corresponding sensing electrode lines.
  • the grid metal wire is patterned to form a plurality of metal mesh plates distributed in an array, the metal mesh plate having the same aspect ratio as the common electrode plate, and each of the wires The metal mesh plate is located on the surface of the corresponding common electrode plate.
  • the invention also provides an in-cell touch screen comprising:
  • a color filter substrate comprising a first glass substrate, and a color resist layer and a black matrix prepared on a surface of the first glass substrate;
  • An array substrate disposed opposite to the color filter substrate; the array substrate includes:
  • a buffer layer is prepared on the surface of the second glass substrate
  • An insulating layer is prepared on the surface of the gate insulating layer
  • a first planarization layer prepared on a surface of the interlayer insulating layer
  • a second planarization layer is prepared on the surface of the mesh metal line, and a plurality of via holes are formed on the second planarization layer;
  • a sensing electrode line is prepared on the surface of the second planarization layer and connected to the mesh metal line through the via.
  • the film thickness of the first planarization layer is a normal thickness
  • the film thickness of the second planarization layer is twice the film thickness of the first planarization layer
  • the common electrode layer is patterned to form a plurality of array-distributed common electrode plates, and each of the common electrode plates is connected to the touch chip through the corresponding sensing electrode lines.
  • the grid metal wire is patterned to form a plurality of metal mesh plates distributed in an array, the metal mesh plate having the same aspect ratio as the common electrode plate, and each of the wires The metal mesh plate is located on the surface of the corresponding common electrode plate.
  • an in-cell touch panel including:
  • a color filter substrate comprising a first glass substrate, and a color resist layer and a black matrix prepared on a surface of the first glass substrate;
  • An array substrate disposed opposite to the color filter substrate; the array substrate includes:
  • a buffer layer is prepared on the surface of the second glass substrate
  • An insulating layer is prepared on the surface of the gate insulating layer
  • a first planarization layer prepared on a surface of the interlayer insulating layer
  • sensing electrode line prepared on a surface of the first planarization layer
  • a second planarization layer is prepared on the surface of the first planarization layer, and a plurality of via holes are formed on the second planarization layer;
  • a common electrode layer prepared on a surface of the second planarization layer; the common electrode layer and the sensing electrode line being connected through the via;
  • the grid metal lines coincide with the coverage area of the black matrix.
  • the film thickness of the first planarization layer is a normal thickness
  • the film thickness of the second planarization layer is twice the film thickness of the first planarization layer
  • the common electrode layer is patterned to form a plurality of array-distributed common electrode plates, and each of the common electrode plates is connected to the touch chip through the corresponding sensing electrode lines.
  • the grid metal wire is patterned to form a plurality of metal mesh plates distributed in an array, the metal mesh plate having the same aspect ratio as the common electrode plate, and each of the wires The metal mesh plate is located on the surface of the corresponding common electrode plate.
  • the invention has the beneficial effects that the in-cell touch panel provided by the present invention adds a metal mesh plate on the surface of the common electrode plate to enhance the conductivity of the common electrode plate and further reduce the touch.
  • the control signal delay is used to enhance the touch effect of the touch screen; the embedded touch screen of the prior art is solved, and the common electrode plate as the touch electrode has poor conductivity, which causes the delay of the touch signal to increase or decrease, thereby causing the touch performance of the touch screen to be insufficient. Good technical issues.
  • 1 is a structural layer structure of a prior art in-cell touch panel
  • FIG. 2 is a schematic diagram of a touch of a prior art in-cell touch panel
  • FIG. 3 is a structural diagram of a film layer of the first embodiment of the in-cell touch panel of the present invention.
  • FIG. 4 is a schematic diagram of touch control according to Embodiment 1 of the in-cell touch panel of the present invention.
  • FIG. 5 is a structural diagram of a film layer of Embodiment 2 of the in-cell touch panel of the present invention.
  • the present invention is directed to the conventional touch panel, and the common electrode plate of the touch electrode is poor in conductivity, which causes the delay of the touch signal to increase or decrease, thereby causing a technical problem of poor touch performance of the touch screen; the embodiment of the present invention can solve the defect.
  • the array substrate of the prior art in-cell touch panel includes: a substrate 101; a buffer layer 102 prepared on the surface of the substrate 101; a gate insulating layer 103 prepared on the surface of the buffer layer 102; The layer 104 is prepared on the surface of the gate insulating layer 103; the first planarization layer 105 is prepared on the surface of the interlayer insulating layer 104; the common electrode layer 106 is prepared on the surface of the first planarization layer 105; and the dielectric layer 107 Prepared on the surface of the common electrode layer 106; a sensing electrode line 110 prepared on the surface of the dielectric layer 107; a passivation layer 108 prepared on the surface of the dielectric layer 107; and a pixel electrode 109 prepared for the passivation Layer 108 surface.
  • the sensing electrode line 110 is electrically connected to the common electrode layer 106 through a via 111 on the dielectric layer 107.
  • the pixel electrode 109 passes through the passivation layer 108, the dielectric layer 107, and the common electrode layer in sequence.
  • 106 and the drain 112 of the thin film transistor electrically connected to the via 113 of the first planarization layer 105.
  • a prior art in-cell touch panel includes a planarization layer 201 having a surface on which a common electrode layer is formed, and the common electrode layer is patterned to form a plurality of common electrodes insulated from each other.
  • Each of the common electrodes 202 is electrically connected to one sensing electrode line 203 , and the other end of the sensing electrode line 203 is connected to the touch display chip 204 .
  • the in-cell touch panel includes: a color filter substrate, the color film substrate includes a first glass substrate 300, and a color resist layer 301 prepared on a surface of the first glass substrate 300 and a black matrix 302; an array substrate disposed opposite to the color filter substrate, the array substrate includes: a second glass substrate 303; a metal light shielding layer 304 prepared on the surface of the second glass substrate 303; and a buffer layer 305, prepared The surface of the second glass substrate 303 and the metal light shielding layer 304; the gate insulating layer 306 is prepared on the surface of the buffer layer 305; the insulating layer 307 is prepared on the surface of the gate insulating layer 306; the first planarization layer 308, prepared on the surface of the interlayer insulating layer 307; a common electrode layer 309, prepared on the surface of the first planarization layer 308; a grid metal line 310, prepared on the surface of the common electrode layer 309; a second planarization layer 311, prepared
  • a surface of the passivation layer 314 is prepared with a pixel electrode 315, and the pixel electrode 315 passes through the passivation layer 314, the second planarization layer 311, the common electrode layer 309, and the first through
  • the pixel electrode via 316 of the planarization layer 308 is electrically coupled to the drain 318 of the corresponding thin film transistor 317.
  • the grid metal line 310 coincides with the coverage area of the black matrix 302; that is, the grid metal line 310 is hidden directly below the black matrix 302 to prevent the grid metal line 310 from blocking light. , thereby reducing the aperture area of the pixel.
  • the film thickness of the first planarization layer 308 is a normal thickness
  • the film thickness of the second planarization layer 311 is twice the film thickness of the first planarization layer 308; by adding the second planarization layer
  • the film thickness of 308 can increase the distance between the common electrode layer 309 and the sensing electrode line 313, thereby avoiding the common electrode plate formed by the patterning of the common electrode layer 309, and the adjacent common electrode plate A capacitance is formed between the corresponding sensing electrode lines 313, resulting in crosstalk of the touch signal.
  • the in-cell touch panel of the present invention is prepared on the common electrode layer on the surface of the second planarization layer 401, and is patterned to form a plurality of common electrode plates 402 distributed in an array.
  • the common electrode plates 402 are insulated from each other.
  • the grid metal wire is patterned to form a plurality of metal mesh plates 405 distributed in an array, the aspect ratio of the metal mesh plate 405 is the same as that of the common electrode plate 402, and one of the metal mesh plates 405 corresponds to Located on the surface of one of the common electrode plates 402.
  • Each of the metal grids 405 is connected to one of the sensing electrode lines 403, and the other end of the sensing electrode line 403 is electrically connected to the touch display chip 404.
  • the touch display chip 404 can determine the touch position by detecting a change in the voltage value between the common electrode plate 402 and the sensing electrode line 403 of the touch area in the touch state; when the human body does not touch the screen.
  • the voltage between the common electrode plate 402 and the sensing electrode line 403 is a fixed value, and no touch signal is generated.
  • the present invention further provides another in-cell touch panel, including: a color filter substrate, the color film substrate includes a first glass substrate, and a color resist layer 501 located on a surface of the first glass substrate; a black matrix 502; an array substrate disposed opposite to the color filter substrate, the array substrate includes: a second glass substrate 503; a metal light shielding layer 504 prepared on the surface of the second glass substrate 503; and a buffer layer 505, prepared The surface of the second glass substrate 503 and the metal light shielding layer 504; the gate insulating layer 506 is prepared on the surface of the buffer layer 505; the insulating layer 507 is prepared on the surface of the gate insulating layer 506; the first planarization layer 508, prepared on the surface of the interlayer insulating layer 507; a sensing electrode line 509 is prepared on the surface of the first planarization layer 508; a second planarization layer 510 is prepared on the first planarization layer 508 and the sensing a surface of the electrode line
  • the touch screen touch control principle of the preferred embodiment is consistent with the working principle of the touch screen of the preferred embodiment.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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Abstract

一种内嵌式触摸屏，包括彩膜基板与相对设置的阵列基板；阵列基板包括层叠设置的基板、缓冲层、栅绝缘层、间绝缘层、第一平坦化层、公共电极层、网格金属线、第二平坦化层以及感应电极线；感应电极线通过过孔与网格金属线相连。

Description

内嵌式触摸屏 技术领域
本发明涉及液晶显示技术领域，尤其涉及一种内嵌式触摸屏。
 背景技术
触摸屏通常集成于液晶显示面板中形成各种电子产品，例如手机、笔记本电脑、MP3/MP4等。为了提高显示装置的用户体验效果，显示装置已经广泛集成触摸屏。
触摸屏包括用以感测触碰位置的触控电极，传统方案由于触控层是公共电极层，公共电极层被图案化成若干彼此绝缘的公共电极板，每一公共电极板通过过孔电连接至感应电极线，感应电极线用做引线，把多个公共电极板电连接至触控显示芯片；传统的触控电极采用ITO（Indium Tin Oxides,氧化铟锡）制作，ITO的导电性能较差，使得公共电极板的阻抗增加，负载延迟增大，进而导致触摸屏触控性能欠佳。
综上所述，现有技术的内嵌式触摸屏，作为触控电极的公共电极板因导电性差，使得触控信号延迟增减，进而导致触摸屏的触控性能欠佳。
 技术问题
本发明提供一种内嵌式触摸屏，能够增强公共电极板的导电性，进而减少触控信号的负载延迟；以解决现有技术的内嵌式触摸屏，作为触控电极的公共电极板因导电性差，使得触控信号延迟增减，进而导致触摸屏的触控性能欠佳的技术问题。
 技术解决方案
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种内嵌式触摸屏，包括：
彩膜基板，包括第一玻璃基板，以及制备于所述第一玻璃基板表面的色阻层及黑色矩阵；
阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
第二玻璃基板；
缓冲层，制备于所述第二玻璃基板表面；
栅绝缘层，制备于所述缓冲层表面；
间绝缘层，制备于所述栅绝缘层表面；
第一平坦化层，制备于所述间绝缘层表面；
公共电极层，制备于所述第一平坦化层表面；以及
网格金属线，制备于所述公共电极层表面；所述网格金属线与所述黑色矩阵的覆盖区域相重合；
第二平坦化层，制备于所述网格金属线表面，所述第二平坦化层上制备有多个过孔；
感应电极线，制备于所述第二平坦化层表面，且与所述网格金属线通过所述过孔相连接。
根据本发明一优选实施例，所述第一平坦化层的膜厚为正常厚度，所述第二平坦化层的膜厚为所述第一平坦化层的两倍膜厚。
根据本发明一优选实施例，所述公共电极层，经图形化处理后形成若干阵列分布的公共电极板，每一所述公共电极板通过相应的所述感应电极线连接于触控芯片。
根据本发明一优选实施例，所述网格金属线，经图形化处理后形成若干阵列分布的金属网板，所述金属网板的长宽比与所述公共电极板相同，且每一所述金属网板位于相应的所述公共电极板表面。
本发明还提供一种内嵌式触摸屏，包括：
彩膜基板，包括第一玻璃基板，以及制备于所述第一玻璃基板表面的色阻层及黑色矩阵；
阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
第二玻璃基板；
缓冲层，制备于所述第二玻璃基板表面；
栅绝缘层，制备于所述缓冲层表面；
间绝缘层，制备于所述栅绝缘层表面；
第一平坦化层，制备于所述间绝缘层表面；
公共电极层，制备于所述第一平坦化层表面；以及
网格金属线，制备于所述公共电极层表面；
第二平坦化层，制备于所述网格金属线表面，所述第二平坦化层上制备有多个过孔；
感应电极线，制备于所述第二平坦化层表面，且与所述网格金属线通过所述过孔相连接。
根据本发明一优选实施例，所述第一平坦化层的膜厚为正常厚度，所述第二平坦化层的膜厚为所述第一平坦化层的两倍膜厚。
根据本发明一优选实施例，所述公共电极层，经图形化处理后形成若干阵列分布的公共电极板，每一所述公共电极板通过相应的所述感应电极线连接于触控芯片。
根据本发明一优选实施例，所述网格金属线，经图形化处理后形成若干阵列分布的金属网板，所述金属网板的长宽比与所述公共电极板相同，且每一所述金属网板位于相应的所述公共电极板表面。
根据本发明的上述目的，还提供一种内嵌式触摸屏，包括：
彩膜基板，包括第一玻璃基板，以及制备于所述第一玻璃基板表面的色阻层及黑色矩阵；
阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
第二玻璃基板；
缓冲层，制备于所述第二玻璃基板表面；
栅绝缘层，制备于所述缓冲层表面；
间绝缘层，制备于所述栅绝缘层表面；
第一平坦化层，制备于所述间绝缘层表面；
感应电极线，制备于第一平坦化层表面；
第二平坦化层，制备于所述第一平坦化层表面，所述第二平坦化层上制备有多个过孔；
公共电极层，制备于所述第二平坦化层表面；所述公共电极层与所述感应电极线通过所述过孔相连接；以及
网格金属线，制备于所述公共电极层表面；
根据本发明一优选实施例，所述网格金属线与所述黑色矩阵的覆盖区域相重合。
根据本发明一优选实施例，所述第一平坦化层的膜厚为正常厚度，所述第二平坦化层的膜厚为所述第一平坦化层的两倍膜厚。
根据本发明一优选实施例，所述公共电极层，经图形化处理后形成若干阵列分布的公共电极板，每一所述公共电极板通过相应的所述感应电极线连接于触控芯片。
根据本发明一优选实施例，所述网格金属线，经图形化处理后形成若干阵列分布的金属网板，所述金属网板的长宽比与所述公共电极板相同，且每一所述金属网板位于相应的所述公共电极板表面。
 有益效果
本发明的有益效果为：相较于现有的内嵌式触摸屏，本发明所提供的内嵌式触摸屏，在公共电极板表面增设金属网板，以增强公共电极板的导电性，进一步减少触控信号延迟，增强触摸屏的触控效果；解决了现有技术的内嵌式触摸屏，作为触控电极的公共电极板因导电性差，使得触控信号延迟增减，进而导致触摸屏的触控性能欠佳的技术问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有技术内嵌式触摸屏的膜层结构构图；
图2为现有技术内嵌式触摸屏的触控原理图；
图3为本发明内嵌式触摸屏实施例一的膜层结构图；
图4为本发明内嵌式触摸屏实施例一的触控原理图；
图5为本发明内嵌式触摸屏实施例二的膜层结构图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明针对现有的触摸屏，作为触控电极的公共电极板因导电性差，使得触控信号延迟增减，进而导致触摸屏的触控性能欠佳的技术问题；本发明实施例能够解决该缺陷。
如图1所示，现有技术的内嵌式触摸屏的阵列基板包括：基板101；缓冲层102，制备于所述基板101表面；栅绝缘层103，制备于所述缓冲层102表面；间绝缘层104，制备于所述栅绝缘层103表面；第一平坦化层105，制备于所述间绝缘层104表面；公共电极层106，制备于所述第一平坦化层105表面；介质层107，制备于所述公共电极层106表面；感应电极线110，制备于所述介质层107表面；钝化层108，制备于所述介质层107表面；以及像素电极109，制备于所述钝化层108表面。
所述感应电极线110通过所述介质层107上的过孔111与所述公共电极层106电性连接；所述像素电极109通过依次贯穿所述钝化层108、介质层107、公共电极层106以及第一平坦化层105的过孔113电连接的薄膜晶体管的漏极112。
如图2所示，现有技术的内嵌式触摸屏，包括平坦化层201，所述平坦化层201表面制备有公共电极层，所述公共电极层经图案化后形成若干彼此绝缘的公共电极板202，每一所述公共电极202电性连接一条感应电极线203，所述感应电极线203的另一端连接至触控显示芯片204。
如图3所示，本发明提供的内嵌式触摸屏，包括：彩膜基板，所述彩膜基板包括第一玻璃基板300，以及制备于所述第一玻璃基板300表面的色阻层301及黑色矩阵302；阵列基板，与所述彩膜基板相对设置，所述阵列基板包括：第二玻璃基板303；金属遮光层304，制备于所述第二玻璃基板303表面；缓冲层305，制备于所述第二玻璃基板303及所述金属遮光层304表面；栅绝缘层306，制备于所述缓冲层305表面；间绝缘层307，制备于所述栅绝缘层306表面；第一平坦化层308，制备于所述间绝缘层307表面；公共电极层309，制备于所述第一平坦化层308表面；网格金属线310，制备于所述公共电极层309表面；第二平坦化层311，制备于所述公共电极层309表面，所述第二平坦化层311上制备有多个感应电极过孔312；感应电极线313，制备于所述第二平坦化层311表面，且与所述网格金属线310通过所述感应电极过孔312相连接；钝化层314，制备于所述第二平坦化层311表面。
所述钝化层314表面制备有像素电极315，所述像素电极315通过依次贯穿的所述钝化层314、所述第二平坦化层311、所述公共电极层309、以及所述第一平坦化层308的像素电极过孔316电连接至对应的薄膜晶体管317的漏极318。
所述网格金属线310与所述黑色矩阵302的覆盖区域相重合；即所述网格金属线310被隐藏于所述黑色矩阵302的正下方，以避免所述网格金属线310遮挡光线，进而缩小像素的开口面积。
所述第一平坦化层308的膜厚为正常厚度，所述第二平坦化层311的膜厚为所述第一平坦化层308的两倍膜厚；通过增加所述第二平坦化层308的膜厚，能够增加所述公共电极层309与所述感应电极线313之间的距离，从而避免由所述公共电极层309图形化后形成的公共电极板，与相邻公共电极板所对应的感应电极线313之间形成电容，导致触控信号串扰。
如图4所示，本发明的内嵌式触摸屏，制备于所述第二平坦化层401表面的公共电极层，经图形化处理后形成若干个呈阵列分布的公共电极板402，各所述公共电极板402相互绝缘。
所述网格金属线，经图形化处理后形成若干阵列分布的金属网板405，所述金属网板405的长宽比与所述公共电极板402相同，且一所述金属网板405对应位于一所述公共电极板402表面。
每一所述金属网板405对应连接一条所述感应电极线403，所述感应电极线403的另一端与触控显示芯片404电性连接。所述触控显示芯片404可在触控状态时，通过检测触控区域的所述公共电极板402与感应电极线403之间的电压值变化来判断触控位置；当人体未触碰屏幕时，所述公共电极板402与感应电极线403之间电压值为一固定值，不产生触控信号。
如图5所示，本发明还提供另一种内嵌式触摸屏，包括：彩膜基板，所述彩膜基板包括第一玻璃基板，以及位于所述第一玻璃基板表面的色阻层501及黑色矩阵502；阵列基板，与所述彩膜基板相对设置，所述阵列基板包括：第二玻璃基板503；金属遮光层504，制备于所述第二玻璃基板503表面；缓冲层505，制备于所述第二玻璃基板503及所述金属遮光层504表面；栅绝缘层506，制备于所述缓冲层505表面；间绝缘层507，制备于所述栅绝缘层506表面；第一平坦化层508，制备于所述间绝缘层507表面；感应电极线509，制备于所述第一平坦化层508表面；第二平坦化层510，制备于所述第一平坦化层508以及所述感应电极线509表面，所述第二平坦化层510上制备有多个感应电极过孔516；公共电极层511，制备于所述第二平坦化层510表面；网格金属线512，制备于所述公共电极层511表面；钝化层513，制备于所述网格金属线512及所述公共电极层511表面；像素电极514，制备于所述钝化层513表面，所述像素电极514通过依次贯穿所述钝化层513、所述公共电极层511、所述第二平坦化层510、以及所述第一平坦化层508的像素电极过孔515，电性连接至对应的薄膜晶体管517的漏极518；所述感应电极线509与所述公共电极层511通过所述感应电极过孔516相连接。
本优选实施例的触摸屏触控原理跟上述优选实施例触摸屏的工作原理一致，具体可参考上述优选实施例的工作原理，此处不再做赘述。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (13)

  1. 一种内嵌式触摸屏，其包括：
    彩膜基板，包括第一玻璃基板，以及制备于所述第一玻璃基板表面的色阻层及黑色矩阵；
    阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
    第二玻璃基板；
    缓冲层，制备于所述第二玻璃基板表面；
    栅绝缘层，制备于所述缓冲层表面；
    间绝缘层，制备于所述栅绝缘层表面；
    第一平坦化层，制备于所述间绝缘层表面；
    公共电极层，制备于所述第一平坦化层表面；以及
    网格金属线，制备于所述公共电极层表面；所述网格金属线与所述黑色矩阵的覆盖区域相重合；
    第二平坦化层，制备于所述网格金属线表面，所述第二平坦化层上制备有多个过孔；
    感应电极线，制备于所述第二平坦化层表面，且与所述网格金属线通过所述过孔相连接。
  2. 根据权利要求1所述的内嵌式触摸屏，其中，所述第二平坦化层的膜厚为所述第一平坦化层的两倍膜厚。
  3. 根据权利要求1所述的内嵌式触摸屏，其中，所述公共电极层，经图形化处理后形成若干阵列分布的公共电极板，每一所述公共电极板通过相应的所述感应电极线连接于触控芯片。
  4. 根据权利要求1所述的内嵌式触摸屏，其中，所述网格金属线，经图形化处理后形成若干阵列分布的金属网板，所述金属网板的长宽比与所述公共电极板相同，且每一所述金属网板位于相应的所述公共电极板表面。
  5. 一种内嵌式触摸屏，其包括：
    彩膜基板，包括第一玻璃基板，以及制备于所述第一玻璃基板表面的色阻层及黑色矩阵；
    阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
    第二玻璃基板；
    缓冲层，制备于所述第二玻璃基板表面；
    栅绝缘层，制备于所述缓冲层表面；
    间绝缘层，制备于所述栅绝缘层表面；
    第一平坦化层，制备于所述间绝缘层表面；
    公共电极层，制备于所述第一平坦化层表面；以及
    网格金属线，制备于所述公共电极层表面；
    第二平坦化层，制备于所述网格金属线表面，所述第二平坦化层上制备有多个过孔；
    感应电极线，制备于所述第二平坦化层表面，且与所述网格金属线通过所述过孔相连接。
  6. 根据权利要求5所述的内嵌式触摸屏，其中，所述第二平坦化层的膜厚为所述第一平坦化层的两倍膜厚。
  7. 根据权利要求5所述的内嵌式触摸屏，其中，所述公共电极层，经图形化处理后形成若干阵列分布的公共电极板，每一所述公共电极板通过相应的所述感应电极线连接于触控芯片。
  8. 根据权利要求5所述的内嵌式触摸屏，其中，所述网格金属线，经图形化处理后形成若干阵列分布的金属网板，所述金属网板的长宽比与所述公共电极板相同，且每一所述金属网板位于相应的所述公共电极板表面。
  9. 一种内嵌式触摸屏，其包括：
    彩膜基板，包括第一玻璃基板，以及制备于所述第一玻璃基板表面的色阻层及黑色矩阵；
    阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
    第二玻璃基板；
    缓冲层，制备于所述第二玻璃基板表面；
    栅绝缘层，制备于所述缓冲层表面；
    间绝缘层，制备于所述栅绝缘层表面；
    第一平坦化层，制备于所述间绝缘层表面；
    感应电极线，制备于第一平坦化层表面；
    第二平坦化层，制备于所述第一平坦化层表面，所述第二平坦化层上制备有多个过孔；
    公共电极层，制备于所述第二平坦化层表面；所述公共电极层与所述感应电极线通过所述过孔相连接；以及
    网格金属线，制备于所述公共电极层表面。
  10. 根据权利要求9所述的内嵌式触摸屏，其中，所述网格金属线与所述黑色矩阵的覆盖区域相重合。
  11. 根据权利要求9所述的内嵌式触摸屏，其中，所述第二平坦化层的膜厚为所述第一平坦化层的两倍膜厚。
  12. 根据权利要求9所述的内嵌式触摸屏，其中，所述公共电极层，经图形化处理后形成若干阵列分布的公共电极板，每一所述公共电极板通过相对应的所述感应电极线连接于触控芯片。
  13. 根据权利要求9所述的内嵌式触摸屏，其中，所述网格金属线，经图形化处理后形成若干阵列分布的金属网板，所述金属网板的长宽比与所述公共电极板相同，且每一所述金属网板位于相应的所述公共电极板表面。
PCT/CN2017/096426 2017-06-19 2017-08-08 内嵌式触摸屏 WO2018232864A1 (zh)

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