WO2018209760A1 - 彩色滤光片基板及其制备方法 - Google Patents

彩色滤光片基板及其制备方法 Download PDF

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Publication number
WO2018209760A1
WO2018209760A1 PCT/CN2017/089936 CN2017089936W WO2018209760A1 WO 2018209760 A1 WO2018209760 A1 WO 2018209760A1 CN 2017089936 W CN2017089936 W CN 2017089936W WO 2018209760 A1 WO2018209760 A1 WO 2018209760A1
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WIPO (PCT)
Prior art keywords
spacer
black matrix
substrate
mask region
mask
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Ceased
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PCT/CN2017/089936
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English (en)
French (fr)
Inventor
邓竹明
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US15/576,975 priority Critical patent/US20190011766A1/en
Publication of WO2018209760A1 publication Critical patent/WO2018209760A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes

Definitions

  • the present invention relates to the field of liquid crystal panels, and more particularly to a color filter substrate and a method of fabricating the same.
  • Liquid crystal display devices typically include a pair of substrates that maintain a spaced apart and parallel relationship with each other.
  • the space between the substrates is generally referred to as a liquid crystal cell gap or a cell gap (cell Gap).
  • the cell gap is filled with liquid crystal and spacers are also provided.
  • the spacer is to maintain the uniformity of the liquid crystal thickness between the liquid crystal display panels, and to prevent the display image blurring caused by the uneven thickness of the liquid crystal.
  • the conventional spacer is a spherical spacer. Since the spacer is not fixed on the substrate, if a pressure is applied to the panel of the display, the conventional spherical spacer may be displaced, and the liquid crystal in the cell gap will also flow, resulting in the thickness of the liquid crystal. Uneven, which causes uneven brightness or color change on the display panel.
  • the preparation process of the traditional spherical spacer adopts coating type, and the distribution density is extremely difficult to control effectively, resulting in uneven density of the traditional spherical spacer, and the size of the traditional spherical spacer is unevenly distributed, which affects the flatness of the panel and affects the whole. Quality performance.
  • the column spacers replace the conventional spherical spacers by virtue of their high contrast, uniformity, and the ability to reduce scratches on the color filters due to vibration.
  • the existing liquid crystal display panel adopts two kinds of spacers having a height difference on the top surface, and the spacer having a higher top surface height is used to maintain the uniformity of the liquid crystal in the cell gap, and when the liquid crystal display panel is under pressure (such as artificial pressing), Spacers with a lower top surface can act as a buffer to reduce the effects of pressure on image quality.
  • the exposure development process is an important stage in the spacer preparation process, and the photoresist material is subjected to light curing to form a photocuring reaction, and the photomask plate controls the formation of the spacer by controlling the light transmittance to control the exposure depth. height.
  • the preparation process of the black matrix pattern and the spacers having the difference in height between the two top surfaces is combined into one step, and the photomask sheet which requires the above preparation process has three kinds of light transmittance, and the required exposure and development process is difficult to adjust, and the light mask is masked.
  • the diaphragm is expensive to manufacture.
  • the technical problem to be solved by the present invention is to provide a color filter substrate and a preparation method thereof, which can simplify the exposure and development process and reduce the manufacturing cost.
  • a technical solution adopted by the present invention is to provide a method for preparing a color filter substrate.
  • the method includes: providing a substrate; forming a lower liner layer on the substrate, and performing a patterning process to form a depressed portion on the lower liner layer;
  • first spacer is located outside the recessed portion
  • second spacer is located at the recessed portion
  • a top surface of the first spacer and a top surface of the second spacer have A height difference.
  • another technical solution adopted by the present invention is to provide a color filter substrate.
  • the color filter substrate includes a substrate, a lower liner layer formed on the substrate, a black matrix pattern formed on the lower liner layer, and a first spacer and a first spacer integrally formed on the black matrix pattern a spacer, wherein the lower liner layer is provided with a recessed portion, the first spacer is located outside the recessed portion, the second spacer is located in the recessed portion, and the first spacer is There is a height difference between the top surface and the top surface of the second spacer.
  • the invention has the beneficial effects that: by patterning the underlying layer, the two spacers having the difference in height on the top surface and the black matrix pattern are combined into one step, which simplifies the exposure and development process and reduces the manufacturing cost;
  • a photomask having three kinds of light transmittances is used, and the present invention can reduce the requirements on the photomask by simplifying the exposure and development process and reducing the manufacturing cost by performing patterning treatment on the underlying layer.
  • FIG. 1 is a schematic flow chart of an embodiment of a method for preparing a color filter substrate of the present invention
  • FIG. 2 is a schematic structural view of a color filter substrate in each step of the preparation method shown in FIG. 1;
  • FIG. 3 is a schematic structural view of a color filter substrate finally obtained by the preparation method shown in FIG. 1;
  • FIG. 4 is a schematic flow chart of another embodiment of a method for preparing a color filter substrate of the present invention.
  • FIG. 5 is a schematic structural view of a color filter substrate in each step of the preparation method shown in FIG. 4;
  • Fig. 6 is a schematic view showing the structure of a color filter substrate finally obtained by the preparation method shown in Fig. 4.
  • FIG. 1 is a schematic flow chart of an embodiment of a method for preparing a color filter substrate according to the present invention
  • FIG. 2 is a schematic structural view of a color filter substrate in each step of the preparation method shown in FIG. .
  • a substrate 201 is provided, and a color resist pattern 202 and a protective layer 203 covering the color resist pattern 202 are formed on the substrate 201.
  • the recessed portion 204 may be formed by dicing the protective layer 203 by a conventional exposure and development process or other processes, and the pattern of the recessed portion 204 may be a polygon, a circle, an ellipse or the like.
  • the black matrix material layer 205 is formed by coating a negative photoresist material on the protective layer 203 and the recess portion 204; the negative photoresist material may be photocured by the light irradiation portion. Soluble matter.
  • the mask plate 206 is provided with a first mask region 208 corresponding to the first spacer 207, a second mask region 210 corresponding to the second spacer 209, and a black matrix pattern 211 corresponding to the black mask pattern 211.
  • a third mask region 212 of the first spacer 207 and other regions other than the second spacer 209, and the first mask region 208 and the second mask region 210 have a light transmittance of 100%.
  • the third mask region 212 has a light transmittance of 20%.
  • the black matrix material layer 205 may be a positive photoresist material, and the mask 206 is correspondingly disposed according to the characteristics of the positive photoresist material. It is only necessary to ensure that the first mask region 208 corresponding to the first spacer 207 has the same light transmission characteristics as the second mask region 210 corresponding to the second spacer 209, and is different from the corresponding The third mask region 212 of the black matrix pattern 211 except for the first spacer 207 and the second spacer 209.
  • the mask plate 206 is irradiated with light to the back surface of the black matrix material layer 205.
  • the light is ultraviolet light.
  • the exposed black matrix material layer 205 is developed, integrally forming a black matrix pattern 211, a first spacer 207 and a second spacer 209;
  • the first spacer 207 is located outside the recess 204, the second spacer 209 is located at the recess 204, and the top surface of the first spacer 207 and the second spacer There is a height difference between the top surfaces of 209.
  • FIG. 3 is a schematic structural view of a color filter substrate finally obtained by the preparation method shown in FIG. 1.
  • the color filter substrate of the present embodiment includes a substrate 31, a lower liner layer 32 formed on the substrate, a black matrix pattern 33 formed on the lower liner layer 32, and integrally formed on the black matrix pattern 33. a first spacer 34 and a second spacer 35, wherein the lower liner layer 32 is provided with a recess 36, the first spacer 34 is located outside the recess 36, and the second spacer 35 Located in the recessed portion 36, and having a height difference between the top surface of the first spacer 34 and the top surface of the second spacer 35.
  • the underlying layer 32 includes a color resist pattern 37 formed on the substrate and a protective layer 38 covering the color resist pattern.
  • the recessed portion 36 is disposed on the protective layer 38 and is developed by conventional exposure.
  • the protective layer 38 is etched to form the recess 36 by a process or other process.
  • the overall height H1 of the first spacer 34 and the black matrix pattern 33 below it is equal to the overall height H2 of the second spacer 35 and the black matrix pattern 33 below it.
  • the present invention combines the black matrix pattern and the spacers having the difference in height between the two top surfaces into one step by performing the boring design on the protective layer, thereby reducing the requirement of the photomask layer by the exposure and development process. Simplify the exposure and development process and reduce manufacturing costs.
  • FIG. 4 is a schematic flow chart of another embodiment of a method for preparing a color filter substrate according to the present invention
  • FIG. 5 is a structure of a color filter substrate in each step of the preparation method shown in FIG. schematic diagram.
  • a substrate 501 is provided, and a color resist material layer 502 is formed on the substrate 501.
  • the recessed portion 504 may be formed by dicing the color resist pattern 503 by a conventional exposure and development process or other processes, and the recessed portion 504 may be polygonal, circular, elliptical or the like.
  • the black matrix material layer 505 is formed by coating a negative photoresist material on the color resist pattern 503 and the recess portion 504; the negative photoresist material is photocured by a light irradiation portion. Insoluble matter.
  • the mask plate 506 is provided with a first mask region 508 corresponding to the first spacer 507, a second mask region 510 corresponding to the second spacer 509, and a black matrix pattern 511 corresponding to the black mask pattern 511.
  • a third mask region 512 of the first spacer 507 and other regions other than the second spacer 509, and the first mask region 508 and the second mask region 510 have a light transmittance of 100%.
  • the third mask region 512 has a light transmittance of 20%.
  • the black matrix material layer 505 can adopt a positive photoresist material, and the mask 506 is correspondingly disposed according to the characteristics of the positive photoresist material. It is only necessary to ensure that the first mask region 508 corresponding to the first spacer 507 has the same light transmission characteristics as the second mask region 510 corresponding to the second spacer 509, and is different from the corresponding The third mask region 512 of the black matrix pattern 511 except for the first spacer 507 and the second spacer 509.
  • S405 performing exposure processing on the black matrix material layer 505 by using the mask 506;
  • the mask 506 is irradiated with light toward the back surface of the black matrix material layer 505.
  • the light is ultraviolet light.
  • the exposed black matrix material layer 505 is developed to integrally form a black matrix pattern 511, a first spacer 507 and a second spacer 509;
  • the first spacer 507 is located outside the recess 504, the second spacer 509 is located at the recess 504, and the top surface of the first spacer 507 and the second spacer There is a height difference between the top surfaces of 509.
  • FIG. 6 is a schematic structural view of a color filter substrate finally prepared by the preparation method shown in FIG. 4.
  • the color filter substrate of the present embodiment includes a substrate 61, a lower liner layer 62 formed on the substrate 61, a black matrix pattern 63 formed on the lower liner layer 62, and a black matrix pattern 63 integrally formed on the substrate.
  • a first spacer 64 and a second spacer 65 wherein the lower liner layer 62 is provided with a recess 66, the first spacer 64 is located outside the recess 66, and the second spacer 65 is located in the recessed portion 66, and a height difference is between the top surface of the first spacer 64 and the top surface of the second spacer 65.
  • the underlying layer 62 includes a color resist pattern 67 formed on the substrate, and the recessed portion 66 is disposed on the color resist pattern 67, and the color resist is processed by a conventional exposure developing process or other processes.
  • the pattern 67 is punctured to form the recessed portion 66.
  • the overall height H3 of the first spacer 64 and the black matrix pattern 63 below it is equal to the overall height H4 of the second spacer 65 and the black matrix pattern 63 below it.
  • the present invention combines the black matrix pattern and the spacers having the height difference between the two top surfaces into one step by patterning the color resist pattern, thereby reducing the requirement of the photomask layer by the exposure and development process.
  • Large simplified exposure development process reduces manufacturing costs.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

一种彩色滤光片基板及其制备方法。该制备方法包括：提供一基板(201,31,501,61)；在基板(201,31,501,61)上形成下衬层(32,62)，并进行图案化处理，以在下衬层(32,62)上形成凹陷部(204,36,504,66)；在下衬层(32,62)上以及凹陷部(204,36,504,66)内形成黑色矩阵材料层(205,505)，并进行图案化处理，以形成黑色矩阵图案(211,33,511,63)以及一体形成于黑色矩阵图案(211,33,511,63)上的第一间隔物(207,34,507,64)和第二间隔物(209,35,509,65)，其中第一间隔物(207,34,507,64)位于凹陷部(204,36,504,66)的外部，第二间隔物(209,35,509,65)位于凹陷部(204,36,504,66)，且第一间隔物(207,34,507,64)的顶面与第二间隔物(209,35,509,65)的顶面之间具有一高度差。通过上述方式能够简化曝光显影工艺，降低制造成本。

Description

彩色滤光片基板及其制备方法
【技术领域】
本发明涉及液晶面板领域，特别是涉及彩色滤光片基板及其制备方法。
【背景技术】
液晶显示器装置一般包含一对基板，该对基板彼此维持隔开且平行的关系。该基板间的空间一般被称为液晶单元间隙或单元间隙（cell gap）。单元间隙里填充有液晶，还设置有间隔物。
间隔物是保持液晶显示器面板之间液晶厚度的均一性，防止因液晶厚度不均所产生的显示影像模糊缺失。
传统间隔物为球状间隔物，由于间隔物并非固定在基板上，因此若对显示器的面板施加压力，则传统球状间隔物会有位移情形，而单元间隙里的液晶也会跟着流动，导致液晶厚度不均匀，进而造成显示器面板亮光不均或颜色改变等现象。
传统球状间隔物制备过程采用涂布式，分布密度极难做到有效控制，造成传统球状间隔物密度不均，并且传统球状间隔物尺寸不一大小分布不均，影响面板平坦性，进而影响整体画质表现。柱状间隔物凭借其高对比度，均匀性佳以及能够减少因震动对彩色滤光片的刮伤替换了传统球状间隔物。
现有液晶显示器面板采用两种顶面具有高度差的间隔物，顶面高度较高的间隔物用以保持单元间隙内的液晶的均一性，在液晶显示器面板受到压力时（如人为按压），顶面高度较低的间隔物可以起到缓冲作用，降低由于压力对画质造成的影响。
曝光显影工艺是间隔物制备流程中的重要阶段，光阻材料接受光线照射发生光固化反应形成所述间隔物，光掩膜板通过控制透光率以控制曝光深度进而控制形成所述间隔物的高度。
将黑色矩阵图案与两种顶面具有高度差的间隔物的制备工艺合并为一步完成，需要上述制备工艺的光掩膜板具有三种透光率，所需曝光显影工艺较难调节，光掩膜板制造成本昂贵。
【发明内容】
本发明主要解决的技术问题是提供一种彩色滤光片基板及其制备方法，能够简化曝光显影工艺，降低制造成本。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种彩色滤光片基板的制备方法。
所述方法包括：提供一基板；在所述基板上形成下衬层，并进行图案化处理，以在所述下衬层上形成凹陷部；
在所述下衬层上以及所述凹陷部内形成黑色矩阵材料层，并进行图案化处理，以形成黑色矩阵图案以及一体形成于所述黑色矩阵图案上的第一间隔物和第二间隔物，其中所述第一间隔物位于所述凹陷部的外部，所述第二间隔物位于所述凹陷部，且所述第一间隔物的顶面与所述第二间隔物的顶面之间具有一高度差。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种彩色滤光片基板。
所述彩色滤光片基板包括基板、形成于所述基板上的下衬层、形成于所述下衬层上的黑色矩阵图案以及一体形成于所述黑色矩阵图案上的第一间隔物和第二间隔物，其中所述下衬层上设置有凹陷部，所述第一间隔物位于所述凹陷部的外部，所述第二间隔物位于所述凹陷部内，且所述第一间隔物的顶面与所述第二间隔物的顶面之间具有一高度差。
本发明的有益效果是：通过对下衬层进行图案化处理，将两种顶面具有高度差的间隔物与黑色矩阵图案合并为一步形成，简化了曝光显影工艺，降低了制造成本；相比于现有技术采用拥有三种透光率的光掩膜板，本发明通过在下衬层进行图案化处理，能够降低对光掩膜板的要求，简化曝光显影工艺，降低制造成本。
【附图说明】
图1是本发明彩色滤光片基板的制备方法一实施例的流程示意图；
图2是图1所示的制备方法的各步骤中的彩色滤光片基板的结构示意图；
图3是图1所示的制备方法最终制得的彩色滤光片基板的结构示意图；
图4是本发明彩色滤光片基板的制备方法另一实施例的流程示意图；
图5是图4所示的制备方法的各步骤中的彩色滤光片基板的结构示意图；
图6是图4所示的制备方法最终制得的彩色滤光片基板的结构示意图。
【具体实施方式】
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述。
请参阅图1-2，图1是本发明彩色滤光片基板的制备方法一实施例的流程示意图，图2是图1所示的制备方法的各步骤中的彩色滤光片基板的结构示意图。
S101：提供一基板201，在基板201上形成色阻图案202以及覆盖色阻图案202的保护层203。
S102：对保护层203进行图案化处理，在保护层203上形成凹陷部204；
其中，可通过传统曝光显影工艺或其他工艺对所述保护层203进行挖孔来形成所述凹陷部204，所述凹陷部204图案可以为多边形，圆形，椭圆形等。
S103：在保护层203上以及凹陷部204内形成黑色矩阵材料层205；
其中，通过在所述保护层203上以及所述凹陷部204涂布负型光阻材料形成所述黑色矩阵材料层205；所述负型光阻材料受到光线照射部位会发生光固化反应形成不可溶物质。
S104：提供一掩膜板206；
其中，所述掩膜板206设置有对应于第一间隔物207的第一掩膜区域208、对应于第二间隔物209的第二掩膜区域210以及对应于黑色矩阵图案211的除所述第一间隔物207和所述第二间隔物209以外的其他区域的第三掩膜区域212，所述第一掩膜区域208和所述第二掩膜区域210的透光率为100%，所述第三掩膜区212域透光率为20%。
当然，如本领域技术人员所理解的，所述黑色矩阵材料层205可以采用正型光阻材料，此时所述掩膜板206则根据所述正光阻材料的特性进行相应设置。只需确保对应于所述第一间隔物207的所述第一掩膜区域208与对应于所述第二间隔物209的第二掩膜区域210的透光特性相同，同时不同于对应于所述黑色矩阵图案211的除所述第一间隔物207和所述第二间隔物209以外的其他区域的所述第三掩膜区域212。
S105：利用掩膜板206对黑色矩阵材料层205进行曝光处理；
其中，对所述掩膜板206相对所述黑色矩阵材料层205的背面进行光线照射，可选地，所述光线为紫外线。
S106：对曝光后的黑色矩阵材料层205进行显影，一体形成黑色矩阵图案211、第一间隔物207和第二间隔物209；
其中，所述第一间隔物207位于所述凹陷部204的外部，所述第二间隔物209位于所述凹陷部204，且所述第一间隔物207的顶面与所述第二间隔物209的顶面之间具有一高度差。
请参阅图3，图3是图1所示的制备方法最终制得的彩色滤光片基板的结构示意图。本实施例的彩色滤光片基板包括基板31、形成于所述基板上的下衬层32、形成于所述下衬层32上的黑色矩阵图案33以及一体形成于所述黑色矩阵图案33上的第一间隔物34和第二间隔物35，其中所述下衬层32上设置有凹陷部36，所述第一间隔物34位于所述凹陷部36的外部，所述第二间隔物35位于所述凹陷部36内，且所述第一间隔物34的顶面与所述第二间隔物35的顶面之间具有一高度差。
其中，所述下衬层32包括形成于所述基板上的色阻图案37以及覆盖所述色阻图案的保护层38，所述凹陷部36设置于所述保护层38上，通过传统曝光显影工艺或其他工艺所述保护层38进行挖孔来形成所述凹陷部36。
其中，所述第一间隔物34及其下方的所述黑色矩阵图案33的整体高度H1等于所述第二间隔物35及其下方的所述黑色矩阵图案33的整体高度H2。
以上可以看出，本发明通过在保护层进行挖孔设计，将黑色矩阵图案以及两种顶面具有高度差的间隔物合并为一步形成，降低曝光显影工艺对光掩膜板的要求，极大简化曝光显影工艺，降低制造成本。
请参阅图4-5，图4是本发明彩色滤光片基板的制备方法另一实施例的流程示意图，图5是图4所示的制备方法的各步骤中的彩色滤光片基板的结构示意图。
S401：提供一基板501，在基板501上形成色阻材料层502。
S402：对色阻材料层502进行图案化处理，形成色阻图案503以及位于色阻图案503上的凹陷部504；
其中，可通过传统的曝光显影工艺或其他工艺对所述色阻图案503进行挖孔来形成所述凹陷部504，所述凹陷部504图案可以为多边形，圆形，椭圆形等。
S403：在色阻图案503上以及凹陷部504内形成黑色矩阵材料层505；
其中，通过在所述色阻图案503上以及所述凹陷部504涂布负型光阻材料形成所述黑色矩阵材料层505；所述负型光阻材料受到光线照射部位会发生光固化反应形成不可溶物质。
S404：提供一掩膜板506；
其中，所述掩膜板506设置有对应于第一间隔物507的第一掩膜区域508、对应于第二间隔物509的第二掩膜区域510以及对应于黑色矩阵图案511的除所述第一间隔物507和所述第二间隔物509以外的其他区域的第三掩膜区域512，所述第一掩膜区域508和所述第二掩膜区域510的透光率为100%，所述第三掩膜区域512透光率为20%。
当然，如本领域技术人员所理解的，所述黑色矩阵材料层505可以采用正型光阻材料，此时所述掩膜板506则根据所述正光阻材料的特性进行相应设置。只需确保对应于所述第一间隔物507的所述第一掩膜区域508与对应于所述第二间隔物509的第二掩膜区域510的透光特性相同，同时不同于对应于所述黑色矩阵图案511的除所述第一间隔物507和所述第二间隔物509以外的其他区域的所述第三掩膜区域512。
S405：利用掩膜板506对黑色矩阵材料层505进行曝光处理；
其中，对所述掩膜板506相对黑色矩阵材料层505的背面进行光线照射，可选地，所述光线为紫外线。
S406：对曝光后的黑色矩阵材料层505进行显影，一体形成黑色矩阵图案511、第一间隔物507和第二间隔物509；
其中，所述第一间隔物507位于所述凹陷部504的外部，所述第二间隔物509位于所述凹陷部504，且所述第一间隔物507的顶面与所述第二间隔物509的顶面之间具有一高度差。
请参阅图6，图6是图4所示的制备方法最终制得的彩色滤光片基板的结构示意图。本实施例的彩色滤光片基板包括基板61、形成于所述基板61上的下衬层62、形成于所述下衬层62上的黑色矩阵图案63以及一体形成于所述黑色矩阵图案63上的第一间隔物64和第二间隔物65，其中所述下衬层62上设置有凹陷部66，所述第一间隔物64位于所述凹陷部66的外部，所述第二间隔物65位于所述凹陷部66内，且所述第一间隔物64的顶面与所述第二间隔物65的顶面之间具有一高度差。
其中，所述下衬层62包括形成于所述基板上的色阻图案67，所述凹陷部66设置于所述色阻图案67上，通过传统的曝光显影工艺或其他工艺对所述色阻图案67进行挖孔来形成所述凹陷部66。
其中，所述第一间隔物64及其下方的所述黑色矩阵图案63的整体高度H3等于所述第二间隔物65及其下方的所述黑色矩阵图案63的整体高度H4。
以上可以看出，本发明通过在色阻图案进行图案化处理，将黑色矩阵图案以及两种顶面具有高度差的间隔物合并为一步形成，降低曝光显影工艺对光掩膜板的要求，极大简化曝光显影工艺，降低制造成本。
在上述实施例中，仅以保护层和色阻图案为例对本发明的具体实施例进行了详细描述，但如本领域技术人员的所理解的，可以对黑色矩阵材料层下方的任意下衬层进行挖孔来形成凹陷部，并配合上文描述的方法均可以实现本发明的目的。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (16)

  1. 一种彩色滤光片基板的制备方法，其中，所述方法包括：
    提供一基板；
    在所述基板上形成下衬层，并进行图案化处理，以在所述下衬层上形成凹陷部；
    在所述下衬层上以及所述凹陷部内形成黑色矩阵材料层，并进行图案化处理，以形成黑色矩阵图案以及一体形成于所述黑色矩阵图案上的第一间隔物和第二间隔物，其中所述第一间隔物位于所述凹陷部的外部，所述第二间隔物位于所述凹陷部，且所述第一间隔物的顶面与所述第二间隔物的顶面之间具有一高度差;
    所述第一间隔物及其下方的所述黑色矩阵图案的整体高度等于所述第二间隔物及其下方的所述黑色矩阵图案的整体高度。
  2. 根据权利要求1所述的方法，其中，所述在所述基板上形成下衬层，并进行图案化处理的步骤包括：
    在所述基板上形成色阻图案以及覆盖所述色阻图案的保护层，并对所述保护层进行图案化处理，以在所述保护层上形成所述凹陷部。
  3. 根据权利要求1所述的方法，其中，所述在所述基板上形成下衬层，并进行图案化处理的步骤包括：
    在所述基板上形成色阻材料层，并对所述色阻材料层进行图案化处理，以形成色阻图案以及位于所述色阻图案上的所述凹陷部。
  4. 根据权利要求 1 所述的方法，其中，所述在所述下衬层上以及所述凹陷部内形成黑色矩阵材料层，并进行图案化处理的步骤包括：
    提供一掩膜板，所述掩膜板设置有对应于所述第一间隔物的第一掩膜区域、对应于所述第二间隔物的第二掩膜区域以及对应于所述黑色矩阵图案的除所述第一间隔物和所述第二间隔物以外的其他区域的第三掩膜区域，其中所述第一掩膜区域和所述第二掩膜区域的透光特性相同且不同于所述第三掩膜区域；
    利用所述掩膜板对所述黑色矩阵材料层进行曝光处理；
    对曝光后的所述黑色矩阵材料层进行显影，以形成所述黑色矩阵图案、所述第一间隔物和所述第二间隔物。
  5. 根据权利要求4所述的方法，其中，所述黑色矩阵材料层为负型光阻材料，所述第一掩膜区域和所述第二掩膜区域的透光率相同且大于所述第三掩膜区域。
  6. 根据权利要求5所述的方法，其中，所述第一掩膜区域和所述第二掩膜区域的透光率为100%。
  7. 一种彩色滤光片基板的制备方法，其中，所述方法包括：
    提供一基板；
    在所述基板上形成下衬层，并进行图案化处理，以在所述下衬层上形成凹陷部；
    在所述下衬层上以及所述凹陷部内形成黑色矩阵材料层，并进行图案化处理，以形成黑色矩阵图案以及一体形成于所述黑色矩阵图案上的第一间隔物和第二间隔物，其中所述第一间隔物位于所述凹陷部的外部，所述第二间隔物位于所述凹陷部，且所述第一间隔物的顶面与所述第二间隔物的顶面之间具有一高度差。
  8. 根据权利要求7所述的方法，其中，所述在所述基板上形成下衬层，并进行图案化处理的步骤包括：
    在所述基板上形成色阻图案以及覆盖所述色阻图案的保护层，并对所述保护层进行图案化处理，以在所述保护层上形成所述凹陷部。
  9. 根据权利要求7所述的方法，其中，所述在所述基板上形成下衬层，并进行图案化处理的步骤包括：
    在所述基板上形成色阻材料层，并对所述色阻材料层进行图案化处理，以形成色阻图案以及位于所述色阻图案上的所述凹陷部。
  10. 根据权利要求7所述的方法，其中，所述在所述下衬层上以及所述凹陷部内形成黑色矩阵材料层，并进行图案化处理的步骤包括：
    提供一掩膜板，所述掩膜板设置有对应于所述第一间隔物的第一掩膜区域、对应于所述第二间隔物的第二掩膜区域以及对应于所述黑色矩阵图案的除所述第一间隔物和所述第二间隔物以外的其他区域的第三掩膜区域，其中所述第一掩膜区域和所述第二掩膜区域的透光特性相同且不同于所述第三掩膜区域；
    利用所述掩膜板对所述黑色矩阵材料层进行曝光处理；
    对曝光后的所述黑色矩阵材料层进行显影，以形成所述黑色矩阵图案、所述第一间隔物和所述第二间隔物。
  11. 根据权利要求10所述的方法，其中，所述黑色矩阵材料层为负型光阻材料，所述第一掩膜区域和所述第二掩膜区域的透光率相同且大于所述第三掩膜区域。
  12. 根据权利要求11所述的方法，其中，所述第一掩膜区域和所述第二掩膜区域的透光率为100%。
  13. 一种彩色滤光片基板，其中，所述彩色滤光片基板包括基板、形成于所述基板上的下衬层、形成于所述下衬层上的黑色矩阵图案以及一体形成于所述黑色矩阵图案上的第一间隔物和第二间隔物，其中所述下衬层上设置有凹陷部，所述第一间隔物位于所述凹陷部的外部，所述第二间隔物位于所述凹陷部内，且所述第一间隔物的顶面与所述第二间隔物的顶面之间具有一高度差。
  14. 根据权利要求13所述的彩色滤光片基板，其中，所述下衬层包括形成于所述基板上的色阻图案以及覆盖所述色阻图案的保护层，所述凹陷部设置于所述保护层上。
  15. 根据权利要求13所述的彩色滤光片基板，其中，所述下衬层包括形成于所述基板上的色阻图案，所述凹陷部设置于所述色阻图案上。
  16. 根据权利要求13所述的彩色滤光片基板，其中，所述第一间隔物及其下方的所述黑色矩阵图案的整体高度等于所述第二间隔物及其下方的所述黑色矩阵图案的整体高度。
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