WO2018166953A1 - Vorrichtung zum abscheiden einer strukturierten schicht auf einem substrat sowie verfahren zum einrichten der vorrichtung - Google Patents
Vorrichtung zum abscheiden einer strukturierten schicht auf einem substrat sowie verfahren zum einrichten der vorrichtung Download PDFInfo
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- WO2018166953A1 WO2018166953A1 PCT/EP2018/056033 EP2018056033W WO2018166953A1 WO 2018166953 A1 WO2018166953 A1 WO 2018166953A1 EP 2018056033 W EP2018056033 W EP 2018056033W WO 2018166953 A1 WO2018166953 A1 WO 2018166953A1
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- WO
- WIPO (PCT)
- Prior art keywords
- mask
- arm
- substrate
- support frame
- vertical
- Prior art date
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- Ceased
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
Definitions
- the invention relates to a device for depositing a layer structured by the application of a mask on a substrate, having a jig device for adjusting the position of a mask carrier with respect to a support frame.
- the invention further relates to a method for setting up such a device.
- the device according to the invention is used for depositing OLEDs on flat, for example made of glass substrates.
- a source arrangement as described for example in WO 2012/175128 AI
- powdered organic starting materials are converted into a vapor.
- the vaporized starting materials are transported with a carrier gas to a gas inlet member, as described for example in DE 10 2014 116 991 AI.
- the gas inlet organ is a showerhead. It has a surface extension which extends substantially over the substrate to be coated overall.
- a gas outlet plane of the gas inlet member is a plurality of gas outlet openings through which the steam enters the process chamber. To avoid condensation of the vapor in the region of the gas inlet member, the gas inlet member is heated.
- the process chamber Under the gas inlet member is the process chamber, the bottom of which is formed by a substrate holder. On the substrate holder is the substrate.
- the substrate holder can, as it is in the DE 10 2010 000 447 AI is described, are brought in a vertical direction of a loading position in a process position. In the process position, a mask held by a frame lies on the substrate. It is a shadow mask, which rests during the coating process in touching contact on the facing to the gas inlet member wide side surface of the substrate. As a result, a structured layer is deposited.
- the deposition process is essentially a condensation of the vapor at the points of the surface of the substrate not covered by the mask.
- the substrate holder according to the invention is actively cooled, for example by passing a coolant therethrough.
- the contact of the mask is lifted to the substrate, resulting in that the heat flow is reduced and the mask heats up. This results in distortion of the mask geometry due to the thermal expansion.
- the aforementioned DE 10 2010 000 447 A1 proposes a shielding plate which is brought between the inlet member and the substrate holder during the substrate change or during the mask change.
- the fiction, contemporary device is used for the deposition of organic see substances on a flat substrate, for example, for the production of optically active planar elements such as screens, displays or solar cells.
- the device has a reactor housing in which there is a gas inlet member, in particular in the form of a showerhead, which is heated to an elevated temperature, so that the vaporous starting materials introduced thereby into a process chamber do not condense on the gas inlet member.
- the substrate lies on a substrate holder, which can be moved from a loading position, in which the substrate holder is vertically spaced from the showerhead, into a process position, in which the substrate holder is arranged at a small vertical distance from the gas outlet surface of the gas inlet member.
- a mask For structuring the layer deposited on the substrate, a mask is provided, which is carried by a carrier device, wherein the mask carrier device has a mask carrier, which carries the mask arrangement and which is displaceable within the reactor housing in the vertical direction of a mask change position in a process position.
- the mask In the process position, the mask is in a contact position on the substrate surface.
- the mask must be adjusted in the horizontal direction prior to contacting the substrate surface so that alignment marks of the substrate are placed in an alignment position with alignment marks of the mask.
- the vertical position of the mask In the case of a mask change, the vertical position of the mask must also be adjusted. Different masks have tolerance-related differences that can lead to a tilted position of the mask surface relative to the substrate surface. This tilted position is compensated by a vertical adjustment. While the areal extent of the mask and the substrate is in the decimeter or in the meter range, the vertical adjustment and the horizontal be carried out in the micrometer range. Disturbing here are not unavoidable vibrations
- One of the objects of the invention is to specify measures with which the adjustment of the mask relative to the substrate holder or the mask carrier can be made more vibration-resistant.
- an adjusting device is provided.
- the adjustment device is seated on a support frame which is the support of the mask wearer, on which the mask arrangement rests, the mask arrangement having a frame which tensions the mask.
- the mask frame may be tied to the mask wearer by suitable means such that it retains a defined position with respect to the mask wearer.
- the adjusting device preferably has an adjusting lever, which is rotatably mounted about a rotational axis of a rotary bearing. Since the adjustment lever preferably has a short arm and preferably a long arm and engages the mask carrier with the short arm, it forms a lever transmission.
- the transmission ratio is preferably at least 5: 1, preferably at least 6: 1. On the long arm attacks a vertically displaceable control rod.
- the control rod extends through an opening of the reactor housing in an area outside the gas-tight reactor housing, where there is an actuator with which the control rod can be displaced in its direction of extension.
- an adjusting device can be designed as a vertical adjustment device or as a horizontal adjustment device.
- a preferred device has both a Vertikaljustier coupled, as well as a Horizontaljustier gifted.
- the short arm and the long arm extend substantially in the horizontal direction, and the arms may be aligned at a zero-degree angle or 180 ° angle to each other. It can thus be a rectified motion transmission from the control rod to a pestle engaging the mask wearer, or a direction-in-motion.
- the plunger may be hingedly attached to the end of the short arm as well as hinged to the mask wearer.
- the long arm likewise preferably extends in the horizontal direction, so that a control rod can articulate on it.
- the short arm is preferably at a 90 ° angle to the long arm and is articulated with a handlebar on the mask wearer.
- the link and the two arms of the adjusting lever preferably extend in substantially the same direction.
- the handlebar can according to a preferred development of the invention, which also has independent significance, be a prismatic joint. It has a push rod which engages in opposing tips in a particular at least at its lowest point dome-like depression. The depressions are formed by an end piece.
- One of the two end pieces is preferably connected to the short arm.
- the other end piece is connected to a bucket, which is connected to the mask wearer.
- For holding the end pieces on the push rod supporting elements are provided, which are supported on the opposite side of the tail. This can also be done by engaging a tip in a recess, in particular a dome-shaped depression.
- the support elements are in turn connected to each other with a tension member, wherein the tension member may be formed by one or more tie rods or tensile bodies. It is provided a spring element which generates the tensile force.
- the spring may be a tension spring or a compression spring.
- a pull rod can for example protrude through an opening of a support element.
- the tension members may in particular be formed by nested tension members, wherein a tension member has a cavity through which the push rod protrudes. This can overlap the spring element or be overlapped by the spring member.
- the tensile force can be applied by a helical compression spring which sits on the radially inner tension element, there is supported on a projection, for example.
- the leaf spring bearing has two sections each having a circular outline, which are arranged axially adjacent to one another with respect to an axis drawn through the centers of the circles.
- the two sections of the leaf spring are connected to each other via bending webs which pass through the center.
- the two sections lying axially next to one another can be rotated against each other frictionlessly and without backlash, whereby the essential webs extending straightly through the axis bend.
- the leaf spring bearing has a central portion on which the adjusting lever is mounted and two axially projecting stub axle, which are mounted in the support frame.
- the middle section and the two axially outer sections are journalled so that they do not rotate when the lever is rotated.
- the rotation of the lever about its axis allows the solid state bending of the spring element.
- the invention further relates to a mask lifting device with which the mask carrier can be displaced vertically in a gas-tight closed reactor housing in the vertical direction.
- the support frame, the mask support and the at least one adjusting lever are preferably displaced simultaneously in the vertical direction.
- One or more support columns which engage the support frame can be displaced with drive means arranged outside the reactor housing.
- gas-tight motion transmission means are provided which, for example, as Faltenbalganordnun can be formed.
- the support columns can be displaced in the vertical direction and vertically shift control rods of the adjusting lever.
- the control rods extend within the support columns.
- the control rods preferably extend within control rod guides.
- the control rod guides are preferably tubes which are arranged inside the support columns.
- the mask lifting device may comprise a mask lifting plate.
- the mask lifting plate is preferably guided on guide rails or the like, which are fastened to a frame.
- the frame is located outside the reactor housing and can support the reactor housing.
- Verticaljustier dressed and Horizontaljustier votes are provided in pairs.
- An adjusting lever for vertical adjustment is preferably in each case arranged adjacent to an adjusting lever for horizontal adjustment.
- the axes of rotation of the adjusting levers are preferably aligned with a common point, which may be located in the surface of the support frame.
- the axes of rotation are each offset by the same angle to each other. However, it is sufficient if the angle at which the axes of rotation are offset from each other, in the range between 100 ° and 160 °.
- the two points at which intersect the axes of rotation of the adjustment lever for vertical adjustment and the adjustment lever for horizontal adjustment can coincide, but they can also be different.
- control rods By the control rods are guided in control rod guides, there is a certain independence of the position of the actuator unit, which is located at a lower end of the control rod guide.
- the control rods may be fixedly attached to the support frame with its upper end and be connected at its lower end fixed to a housing of the actuator unit.
- An actuator for adjusting the adjusting lever of the vertical adjusting device and an actuator for adjusting the adjusting lever of the horizontal adjusting device are preferably located in the actuator unit.
- the control rods are preferably tie-rods, so that it is essential if the control rod guides are mounted on the support frame or on the housing of the actuator unit. They are preferably but also tensile strength connected to the support frame or the housing of the actuator, so that the control rod can act as a train-push rod.
- the mask lifting plate on which, in particular, the support columns are supported for supporting the support frame, can have an opening through which the control rod guides connected to the actuator unit project freely in the vertical direction. This arrangement allows the support frame to be displaced relative to the mask lift plate, such as to mechanically decouple the support post from the mask lift plate.
- a further aspect of the invention relates to a device for depositing a layer structured by the application of a mask on a substrate with a horizontal alignment device and a vertical adjustment device.
- the adjusting devices also attack here preferably at exactly three angularly offset locations on the mask wearer. But it can also be more jobs.
- Vertikaljustier can be the vertical position of the mask, but also adjust their Verkipptwinkel.
- the horizontal adjustment device With the horizontal adjustment device, the lateral position of the mask can be changed. It can be moved in the two directions of the plane, but also rotate in the plane. The mask can thus be brought into an adjustment position to the mask wearer, the support frame or the substrate holder.
- the mask is preferably adjustable with respect to the substrate, alignment marks of the mask being brought into an adjustment position with alignment marks of the substrate. This can be done by an optical image capture. In the case of a mask change, in addition, a possible tilt angle of the mask surface with respect to the substrate surface must be compensated.
- the mask plane and the substrate retainer plane, on which the substrate rests, must be brought into a parallel position.
- Distance sensors are provided according to the invention, which are arranged in particular where the means for vertical adjustment are located.
- the distance sensors are preferably proximity switches. Inductive or capacitive proximity switches can be used. However, it is also possible to use optical distance measuring devices which determine the distance via reflection.
- the distance sensors can be arranged on the support frame.
- a mask assembly comprising a mask frame that excites a mask onto the mask carrier
- the vertical and / or horizontal adjustment via the adjustment lever described above In a subsequent coating of the substrate usually the vertical position of the mask need not be adjusted because the tilt angle usually does not change. The tilt angle is thus compensated without substrate.
- the horizontal adjustment is mandatory with resting on the substrate holder substrate.
- the substrate holder is brought by a separate lifting device from its loading position in the process position.
- a substrate subplate is preferably provided, which can be displaced in the vertical direction by a drive device arranged outside the reactor housing.
- the substrate subplate carries a support column. But it can also be several support columns.
- the support column protrudes through a passage in the reactor housing. If the substrate subplate sits below the mask lifting plate, then the mask lifting plate has an opening through which the support column of the substrate lifting device engages.
- the captive means may be a V-groove and a spherical surface.
- the spherical surface is preferably formed by ball elements that are locally associated with the support frame. These ball elements are supported on the flanks of the V-groove which are at an angle to each other. A static certain Fes selungs position is achieved in that three ball elements cooperate with three V-grooves, wherein the apex lines of the V-grooves preferably intersect at a common point.
- Fig. 1 roughly schematically and to illustrate the essential structural elements and their interaction in the
- Type of vertical section An embodiment of a device in which a mask lifting device is in a mask change position and a substrate holder lifting device is in a loading position,
- FIG. 2 shows an illustration according to FIG. 1, but with a mask lifting device displaced into a process position
- FIG. 3 is a sequential view of FIG. 2, but with a substrate displacing device displaced into a process position, FIG.
- FIG. 4 is a sequential illustration to FIG. 3, wherein a substrate lifting plate 12 is raised slightly or a mask lifting plate 9 is slightly offset, so that a gap 14 is formed
- 5 shows a sequence illustration of FIG. 4, but after the substrate holder 10 has been loaded with a substrate 13 and the substrate holder 10 brought into a process position and the mask 4 lowered onto the substrate surface of the substrate 13 to be coated, FIG.
- FIG. 6 schematically shows a plan view of the support frame 7 for illustrating the arrangement of vertical adjustment devices 100 and horizontal adjustment devices 200, with which the horizontal position and the vertical position of a mask carrier 6 can be set with respect to the support frame 7,
- FIG. 7 shows schematically an adjustment plane 201 of a horizontal alignment device 200
- FIG. 11 schematically enlarges the detail XI in FIG. 4, FIG.
- FIG. 12 schematically enlarges the detail XII in FIG. 11, FIG.
- 13 is a perspective view of a subframe of a device according to the invention
- 14 is a plan view of the support frame 7 and in pockets of the support frame 7 arranged adjusting devices 100, 200,
- FIG. 15 is an exploded view of some components of the device shown in Fig. 13, Fig. 16 is a section along the line XVI-XVI in Fig. 14,
- FIG. 17 enlarges the detail XVII in FIG. 16, FIG.
- FIG. 18 enlarges the detail XVIII in FIG. 16, FIG.
- FIG. 19 enlarges the section XIX in FIG. 16, FIG.
- FIG. 20 enlarges the area shown in FIG. 19, but along the section line XX-XX in FIG. 14, FIG.
- 21 is a perspective view of a leaf spring 27 for forming a pivot bearing 106, 206,
- FIG. 23 is a perspective view of a section along the line XXIII-XXIII in FIG. 21, FIG. 24, a vertical adjustment device 100, FIG.
- 25 is a plan view of the adjustment lever 101
- FIG. 26 shows the section according to the line XXVI-XXVI in FIG. 25
- FIG. 27 is a horizontal alignment device 200 in perspective view
- FIG. 29 shows the section according to the line XXIX-XXIX in FIG. 28, FIG.
- Fig. 31 is a plan view of the Horizontaljustier Too according to
- FIGS. 1 to 12 schematically show some details relevant for explaining the mode of operation and the construction of a device according to the invention, which are explained below:
- a manufactured from steel reactor housing 2 is gas-tight closed to the outside and can be evacuated.
- a vacuum pump not shown
- the reactor housing 2 moreover has closable openings through which a mask arrangement 3, consisting of a mask 4 and a mask frame 5, can be introduced into the reactor housing 2.
- the wall of the reactor housing 2 also has an opening, not shown, through which it can be loaded with substrates.
- the Substratububplatte 12 carries a support column 11 which projects through an opening in the reactor housing 2.
- There it carries a substrate holder 10 which has cooling channels 23, through which cooling means can flow to cool the substrate support surface of the substrate holder 10.
- Movement transfer means for example a bellows, may be provided in order to allow the support column 11 to act in a gastight manner through an opening of the reactor housing 2.
- a gas inlet element 1 in the form of a showerhead, which may have heating elements not shown, in order to heat the gas inlet element 1 to a temperature at which the steam introduced through the gas inlet element into a process chamber arranged below it of organic starting material not condensed.
- a Maskhubplatte 9 which can also be displaced in the vertical direction.
- the support column 11 can protrude through an opening of the mask lifting plate 9.
- suitable motion transmission means can be provided in order to transmit the movement of the mask lifting plate 9 in a gastight manner into the reactor housing 2.
- the Maskhubplatte 9 carries support columns 8, which protrude through openings in the reactor housing 2.
- the support columns 8 carry the support frame 7 in which three vertical adjustment devices 100 and three horizontal adjustment devices 200 are arranged. These are shown only symbolically in FIGS. 1-6 and functionally symmetrical in FIGS.
- the lower ends of the support columns 8 are based on the mask lifting plate 9 only. They are connected to the mask lifting plate 9 with a spring element 22 such that they can move away from the mask lifting plate 9 in the vertical direction so that the gap shown in FIG. 14 can be adjusted.
- the support columns 8 are then decoupled from the mask lifting plate 9.
- Control rod guides 109 for a control rod 108 of the vertical adjustment device and control rod guides 209 extend in the cavities of the mask support columns with control rods 208 of the horizontal adjustment device 200 Actuator 16 connected.
- the actuator unit 16 is thus not directly connected to the mask lifting plate 9.
- the Vertikaljustier worn 100 has the Justier lever 101, each having a pivot bearing 106.
- the axes of rotation 107 of the rotary bearing 106 intersect at point Pi (see FIG. 6) which lies in the area surrounded by the support frame 7.
- the horizontal adjustment device 200 has three adjustment lever 201, which are arranged approximately where the three adjustment lever 101 sit.
- the adjusting lever 201 are rotatable about a pivot bearing 206.
- the axes of rotation 207 of the pivot bearing 206 intersect at the point P 2 .
- the position of the points Pi and P 2 can be basically arbitrary. Preferably, however, the points Pi and P 2 almost fall together.
- the axes 107, 207 shown in phantom in FIG. 6 have an angle ⁇ of 120 ° to one another. The angle can also be in a range between 100 and 160 °.
- Fig. 7 shows schematically the structure of a single element of a Horizontaljustier Anlagen 200.
- a pivot bearing 206 which is fixedly connected to the support frame 7, stored in particular clearance-free using a leaf spring bearing the adjusting lever 201, which is designed here as an angle lever.
- a long lever arm 202 which is about five times as long as a short lever arm 203, extends in the horizontal direction, whereas the short lifting arm 203 extends in a vertical direction.
- the control rod 208 is articulated, which can be moved in the vertical direction within the tubular control rod guide 209.
- a link 210 is articulated at a pivot point 205, which in turn is articulated to a bucket 222 which is fixedly connected to the mask carrier 6.
- Fig. 8 shows an example of a preferred embodiment of the handlebar 210.
- the handlebar is connected to the end pieces 213 and 214 with the pivot point 205 of the short arm 203 and the bucket 222.
- the facing each other sides of the end pieces 213, 214 have recesses 216 in which support the facing away from each other tips 215 of a push rod 211.
- the depressions 216 each have a dome-shaped deepest Point at which the tip 215 is supported.
- the end pieces 213, 214 also have recesses 216 ', in which support elements 217, 217' are supported.
- the support elements 217, 217 ' are connected to each other by means of tension members 212.
- tie rods which are fastened at one end to the support element 217. Its other end extends through a passage 218 of the other support element 217 '.
- tension members 212 On the opposite side of the top are based on the support member 217 'from the tension members 212 penetrated spring elements 220, which are compression springs, from, in turn, are acted upon by a connecting piece 219, to which the ends of the tension members 212 are attached, so that the spring elements 220 form a tensile force that hold the tips 215 in their associated recesses 216.
- Fig. 9 shows schematically the structure and the mounting of an adjusting lever 101 of an element of the Vertikaljustier Road 100. It is a two-armed lever with a long lever arm 102, which is about five times as long as a short arm 103. The two Arms 102 and 103 extend horizontally at a 180 ° angle. But they can also extend at a 90 ° angle to each other.
- a control rod 108 is articulated at a pivot point 104, which is guided by the tubular control rod guide 109.
- a plunger 110 is articulated at a pivot point 105, which engages under the mask carrier 6.
- the plunger 110 engages at a Anlenk point 111 sliding or hinged to the mask carrier 6. If the control rod 108 is displaced in the vertical direction, this vertical displacement is reduced to a vertical displacement of the plunger 110.
- an optional spring element 120 is additionally provided which, in the case of a single sliding connection of the sliding connection of the plunger 110 on the mask carrier 6, applies an additional tensile force in the vertical direction.
- Figures 11 and 12 show an upper portion of the substrate holder 10.
- the substrate holder 10 has a captive element 24 in the form of a V-groove.
- the V-groove 21 is shown here only schematically. It is associated with an extension 24. There are a total of three V-grooves 21 are provided. The divisional lines of the V-grooves 21 intersect at a common point.
- the V-grooves 21 extend in a horizontal plane.
- the V-grooves 21 are open at the top.
- the mask frame 7 has on its underside a ball which forms a spherical surface 20 which is supported on the flanks of the V-groove. With this binding means formed by the V-groove 21 and the ball surface 20, the support frame 7 can be statically determined to be supported directly by the substrate holder 10. The result is a rigid and in particular vibration-resistant connection between substrate holder 10 and support frame 7. About the adjustment lever 101 and 201 of the support frame 7 is mechanically rigidly coupled to the Maskenrah- men 5 wearing mask carrier 6.
- the device of a device after a mask change is preferably carried out with the following steps:
- both the substrate holder 10 and the mask support device formed by the support frame, the mask support 6 and the adjustment devices 100, 200 each assume a changeover position.
- a substrate On the support surface 10 'forming top of the substrate holder 10, a substrate can be placed.
- another mask with its mask frame 5 can be placed.
- the thin, perforations mask 4 is stretched so that it extends almost in one plane.
- a mask carrier 6 provided with a changed mask arrangement 3 is displaced upwardly by displacing the mask lifting plate 9 into the process position shown in FIG.
- the substrate holder 10 is brought by displacing the Substrat- hubplatte 12 upwards into a position in which the spherical surfaces 20 are not yet supported in the V-grooves 21, as shown in FIG. 3.
- the substrate holder 10 is displaced upwards relative to the mask lifting plate 9, or the mask lifting plate 9 is displaced slightly downwards.
- the ball surfaces 20 enter the V-grooves 21.
- the distance between Maskhubplatte 9 and support frame 7 increases. Since the support columns 8 are not connected to the mask lifting plate 9 in a manner that is resistant to tension, a gap is formed between the support columns 8 and the mask lifting plate 9 of the gap designated by the reference numeral 14 in FIG. 4.
- the support frame 7 is now no longer supported by the mask lifting plate 9, but only by the substrate holder 10, namely at three support points at each of which a spherical surface 20 is supported on the flanks of the V-groove 21.
- a distance sensor 25 shown in FIG. 11, which may be an approximate switch at least three locations, preferably at the three locations where an element of the vertical alignment device 100 is located, which determines the vertical distance of the edge of the mask 4 to the substrate holder 10.
- the adjustment lever 101 of the Vertikaljustier Sk 100 By means of the adjustment lever 101 of the Vertikaljustier Sk 100, the vertical distances are changed until they are the same.
- the mask 4 is then parallel to the substrate holder 10th
- the distance sensor 25 is fixed to the support frame 7.
- the substrate holder 10 can be lowered again into its loading position (FIG. 2) in order to be loaded with a substrate 13. He is then brought into the process position, wherein initially the mask 4 still has a slight distance of, for example, 0.5 mm to the top of the substrate 13.
- the horizontal alignment device 200 and not shown imaging adjusting aids the mask 4 can be adjusted relative to the substrate 13 in the horizontal direction.
- alignment marks, not shown in the drawings, of the mask are brought into coincidence with alignment marks, not shown, of the substrate.
- Adjustment aids may comprise lasers which are fastened to the substrate holder and whose laser beams are directed in the direction of the mask.
- FIGS. 13-32 show details of a device according to the invention for depositing organic molecules on a substrate.
- FIG. 13 shows in perspective a base frame with a frame in which a mask lifting plate 9 and a substrate lifting plate 12 can be displaced substantially independently of one another in the vertical direction.
- electrical drives are provided for the displacement of the mask lifting plate 9 or the substrate lifting plate 12 electrical drives.
- a support frame 7 can be displaced vertically, which carries a mask support 6, which in turn carries a mask frame 7, on which a shadow mask, not shown, is attached.
- the shadow mask is clamped in such a way in relation to the mask frame 5 that it can only Slightly sagging in the vertical direction.
- the substrate holder and a substrate resting thereon are hidden in this illustration as well as the gas-tight reactor housing.
- FIG. 14 shows the plan view of the support frame 7 when the mask support 6 has been broken away.
- the support frame 7 has a rectangular basic crack and pockets 28 in which horizontal adjustment devices 200 are arranged.
- the pockets 28 are also open at the top like pockets 29 in which vertical adjustment devices 100 are arranged.
- the vertical adjustment devices 100 each have a plunger 110.
- the plungers 110 are arranged on the points of a triangle.
- the horizontal adjuster 200 has a pad 22 which can be displaced in the horizontal direction.
- the blocks 22 are also arranged on the points of a triangle.
- a vertical adjustment device 100 extends in alignment with a horizontal alignment device 200.
- the plunger 110 and the block 222 are seated at the two ends of the arrangement formed by the vertical alignment device 100 and the horizontal alignment device 200.
- each of a vertical adjustment device 100 and a horizontal adjustment device 200 are located in the corner regions of the other short frame limb.
- each a Vertikaljustier worn 100 next to a Horizontaljustier gifted 200 wherein also here the plunger 110 is disposed on the side facing away from the block 222 side.
- the arrangement of the vertical adjustment devices 100 and the horizontal adjustment devices 200 are such that the rotation axes 107, 207 of the rotary bearing 106, 206 of the adjusting lever 101, 201 each point at a point within the area surrounded by support frame 7 area.
- Fig. 15 shows bearing recesses 30 in which the pivot bearings 206, 106 of the adjusting devices 100, 200 are stored. These are each aligned with each other semicircular recesses in which the
- Fig. 17 shows the section through a Vertikaljustier Anlagen 100.
- An adjustment lever 101 is rotatably mounted about a pivot bearing 106.
- the adjuster 1 has a long arm which extends in the horizontal direction.
- a control rod 108 is articulated, which extends through a control rod guide 109.
- On the short arm 102 also sits a plunger 110, which is supported on the mask carrier 6.
- FIG. 18 shows one of the several exemplary embodiments of a horizontal alignment device 200.
- a lever arm 201 is mounted about a pivot bearing 206. It has a long lever arm 202 and a short lever arm 203.
- the long lever arm 202 extends in the horizontal direction and is articulated at an articulation point 204 to a control rod 208 which extends in the vertical direction through a control rod guide 209.
- the short lever arm 203 extends vertically upward.
- a handlebar 210 is articulated.
- the link 210 has a push rod 211 and a tension member in the form of a spring element 220.
- the pressure rod ge 211 is supported with its one end on the short arm 203 and with its other end on a little piece 222, which is rigidly connected to the mask carrier 6.
- a spring element 226 urges the block 222 downwards. It is attached to the bottom of the bag 28.
- Fig. 19 shows the passage 17 through the Maskhubplatte 9.
- a component 35 is fixed on which an end plate 33 can be supported.
- a movement transmitting means in the form of a bellows 26 is attached.
- the ring pieces 26 are each end portions of bellows 223, 123 which form at their other end ring pieces 124, 224 which are fixedly connected to the push rod 108 and 208, respectively.
- the bellows 123, 223 thus constitute motion transmitting means for the control rods 108 and 208.
- Within the bellows 123, 223 is atmospheric pressure. Outside the bellows 123, 223 is vacuum or low pressure.
- the control rod guides 109, 209 are based, which are both tubular.
- the control rods 109, 209 may perform the function of support columns to support the support frame 7 with the mask lift plate 9 when the end plate 33 is seated on the component 35.
- the web 32 is then preferably rigidly connected to the end plate 33.
- the two lower ends of the control rods 108, 208 are connected to actuators 121, 221.
- the actuator housing which are not shown in FIG. 19, are fixedly connected to the end plate 33 and thus also firmly connected to the web 32.
- the bottom section 33 is supported here via balls 37 relative to the component 35, which here forms two V-grooves 38, which are opposite and in which the balls hedge 37.
- Fig. 21 shows in perspective a leaf spring element 27, as it is used as a pivot bearing 106 and 206.
- a middle section 42 supports the adjusting lever 101 or 201.
- the adjusting lever has a related, circular opening which can be narrowed by a clamping screw, so that the central region 42 rotatably in the bearing opening of the pivot bearing 106 and 206 rests.
- the stub axles 41, 43 protrude from the broad sides of the adjusting lever 101, 201.
- a joint 44 extends between two sections of the leaf spring 27. End sections of the leaf spring 27 are connected to webs 39 and 40, respectively Webs 39 in the stub axle area 41, 43 are located and the web 40 in the central area 42. If the central area 42 is rotated relative to the two outer stub axle areas 41, 43, then they bend the webs 39, 40, so that a rotational movement without friction, can be done only by a bend. In the region of the joint 44 then move the sections 42, 43 of the leaf spring in the direction of rotation relative to each other.
- FIGS. 24-26 show the adjustment lever 101 of the vertical adjustment device.
- the plunger 110 is inserted in an opening 126.
- the leaf spring, which forms the pivot bearing 106, can be inserted into a bearing eye 127.
- FIGS. 27-29 show an exemplary embodiment of a horizontal adjustment device.
- the adjusting lever 201 has a long arm 202, at the end of the pivot point 204 is located. In a bearing eye 227 inserted the leaf spring bearing 27.
- a short lever arm 203 carries an end piece 213, which effectively forms the short lever arm 203.
- a tension member 212 is supported on one side of the tail.
- a push rod 211 is supported.
- the Switzerland Federation 212 has a cavity through which the pressure catch 211 is passed.
- the push rod 211 is supported with its other tip on an end piece 214 which sits on a little piece 222 which is fixedly connected to the mask carrier 6.
- a portion 228 of the tension member 212 engages behind a spring element 22 designed as a compression spring, which is supported on a projection 229 of a further tension element 230.
- the tension element 230 has the shape of a tube and supports the spring element 220 on its outer wall.
- the tension element 230 is fastened to the end piece 214.
- the tension member is formed here by two mutually sprung tension elements.
- Figures 30 - 32 show a further embodiment of a Horizontaljustier Anlagen 200, in which the tension member 212 consists of two tie rods which are parallel to each other.
- the adjusting lever 201 also has here a bearing eye for forming the pivot bearing 206, in which a leaf spring ger 27 is inserted.
- the bearing eye is aufpressbar 27 on the central region of the leaf spring bearing.
- a device which is characterized in that the adjusting device 100, 200 has a first arm 102, 202 and a second arm 103, 203 mounted rotatably on the support frame 7 about a rotation axis 107, 207 of a pivot bearing 106, 206 having adjusting lever 101, 201, wherein the second arm 103, 203 engages the mask carrier 6 and on the first arm 102, 202 a of an actuator 121, 221 vertically displaceable control rod 108, 208 attacks.
- the first arm is a long arm of the adjusting lever 101, 201 and the second arm is a short arm of the adjusting lever 101, 201.
- a device characterized in that the handlebar 210 of the Horizontaljustier worn 200 is a prismatic joint in which opposing tips 215 of a push rod 211 each supported in a recess 216 of an end piece 213, 214 and in which at the end pieces 213rd , 214 a tension member 212 engages, which acts on the tips 215 in the recesses 216.
- a device characterized in that the tension member 212 is fixedly connected to an end piece 213 at an attachment point 217, wherein a force acting on the tension member spring element 220 is provided, which is supported on the tension member 212 to the one end piece 214th in the direction of the other end piece 213 force.
- a device characterized in that the tension member 212 has a cavity, is guided by the push rod 211.
- a device characterized in that the pivot bearing 106, 206 is a frictionless leaf spring bearing.
- a device which is characterized in that the axis of rotation 107, 207 of the adjusting levers 101, 201 are directed at a common point Pi, P 2 , which is located in a surface framed by the supporting frame 7.
- a device which is characterized in that in each case three Horizontaljustier streetsen 200 and / or three Vertikaljustier streetsen 100 are provided, each having Justierhebel 101, 201, whose axes of rotation 106, 206 by an angle between 100 ° and 160 ° relative to the common point Pi, P 2 are arranged offset to one another.
- a device which is characterized in that the control rods 108, 208 are guided in control rod guides 109, 209, the control rod guides 109, 209 being fastened to the support frame 7 with an upper end in a pressure-transmitting manner and with their lower end transmitting pressure to an
- the actuator unit 16 has an actuator 121 for displacing the control rod 108 of the vertical adjustment device and an actuator 221 of the horizontal alignment device 200.
- a device which is characterized in that one of a drive unit in the vertical direction displaceable Maskhubplatte 9 has an opening 17 through which engage the actuator unit connected to the control rod guides 109, 209.
- a device which is characterized in that at the locations where the Vertikaljustier Hughes 10 engages the mask carrier 6, distance sensors 25 are provided which are adapted to the vertical distance of an edge of the mask 4 to the substrate holder 10 or the support frame. 7 to investigate.
- a method which is characterized in that the vertical adjustment device 100 and / or the horizontal adjustment device 200 have adjusting levers 101, 201 which allow vertical movement of a control rod 108, 208, which is provided by an actuator 121 arranged outside the reactor housing, 221 are displaceable, and which acts on a plunger 110 or handlebar 210 which is connected to the mask carrier 6.
- a device which is characterized in that a central support column 11 carries the substrate holder 10 and a plurality of support columns 8 arranged in a periphery to the support column 11 support the support frame 7.
- a device characterized by captive means 20, 21, which tie the substrate holder 10 in the process position on the support frame 7.
- a device characterized in that the captive means comprise a V-groove 21 and a spherical surface 20.
- a device characterized in that the ball elements are provided, each cooperating with a V-groove 21, wherein the V-grooves 21 are aligned to a common point.
- a device which is characterized in that the mask lifting device has at least one support column 8 which is displaceable in the vertical direction by a drive device arranged outside the reactor housing 2.
- a device which is characterized in that the substrate holder lifting device has at least one support column 11, which can be displaced in the vertical direction by a drive device arranged outside the reactor housing 2.
- a device which is characterized in that the mask lifting device and / or the Substrathalterhub noisy has a extending in a horizontal device Maskhubplatte 9 or Substrate plate 12, which is guided on a connected to the reactor housing 2 frame.
- a device which is characterized in that dense motion transmission means, in particular Faltenbalgan onionen are provided with which a vertical movement of the drive means is transmitted to the support column 8, 11.
- a device which is characterized in that the support column 8 of the mask lifting device in a process position of the mask assembly 3, in which the mask 4 rests in contact on the surface of the substrate 13, of a mask lifting plate 9, which at one with the reactor housing 2 mechanically coupled frame is fixed, is mechanically decoupled, so that the support frame 7 is supported only by the substrate holder 10.
- a device which is characterized in that the mechanical decoupling of the support column 8 is achieved by the mask lifting plate 9 by generating a gap 14 between support column 8 and mask lifting plate 9.
- a device or a method characterized in that a central support column 11 carries the substrate holder 10 and a plurality of support columns 8 arranged in a periphery to the support column 11 support the support frame 7.
- a device characterized by an adjusting device 100, 200 for adjusting the position of the mask carrier 6 relative to the support frame 7, to which the adjusting device 100, 200 engages a control rod 108, 208 vertically displaceable by an actuator 121, 221.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Springs (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201880031347.9A CN110621802B (zh) | 2017-03-14 | 2018-03-12 | 用于将结构化的层沉积在衬底上的装置和用于设置该装置的方法 |
| KR1020197029764A KR102604080B1 (ko) | 2017-03-14 | 2018-03-12 | 기판 상에 구조화된 층을 증착하기 위한 장치, 및 상기 장치를 설정하기 위한 방법 |
| US16/493,737 US11396697B2 (en) | 2017-03-14 | 2018-03-12 | Device for separating a structured layer on a substrate, and method for setting up the device |
| JP2019550737A JP7161485B2 (ja) | 2017-03-14 | 2018-03-12 | 基板上に構造化層を堆積するための装置及びその装置のセッティング方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017105374.3A DE102017105374A1 (de) | 2017-03-14 | 2017-03-14 | Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat sowie Verfahren zum Einrichten der Vorrichtung |
| DE102017105374.3 | 2017-03-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2018166953A1 true WO2018166953A1 (de) | 2018-09-20 |
Family
ID=61627115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2018/056033 Ceased WO2018166953A1 (de) | 2017-03-14 | 2018-03-12 | Vorrichtung zum abscheiden einer strukturierten schicht auf einem substrat sowie verfahren zum einrichten der vorrichtung |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11396697B2 (de) |
| JP (1) | JP7161485B2 (de) |
| KR (1) | KR102604080B1 (de) |
| CN (1) | CN110621802B (de) |
| DE (1) | DE102017105374A1 (de) |
| TW (1) | TWI765983B (de) |
| WO (1) | WO2018166953A1 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102807685B1 (ko) | 2019-10-15 | 2025-05-13 | 주식회사 엘지에너지솔루션 | 배터리 팩 |
| JP7361671B2 (ja) * | 2020-09-30 | 2023-10-16 | キヤノントッキ株式会社 | 成膜装置、調整装置、調整方法、及び電子デバイスの製造方法 |
| JP7185674B2 (ja) * | 2020-09-30 | 2022-12-07 | キヤノントッキ株式会社 | 成膜装置、調整方法及び電子デバイスの製造方法 |
| CN112641291B (zh) * | 2020-11-28 | 2021-12-21 | 西安双德喜信息科技有限公司 | 一种科技成果普及用展示柜 |
| KR102895917B1 (ko) * | 2020-12-21 | 2025-12-05 | 삼성디스플레이 주식회사 | 마스크 프레임 및 마스크 프레임의 제조 방법 |
| CN113088915B (zh) * | 2021-03-30 | 2022-07-22 | 京东方科技集团股份有限公司 | 驱动设备和蒸镀系统 |
| CN113964078B (zh) * | 2021-09-06 | 2025-06-24 | 信利(惠州)智能显示有限公司 | 一种防止基板表面存在摩擦灰尘的装置 |
| CN114775048B (zh) * | 2022-04-13 | 2024-01-26 | 无锡先为科技有限公司 | 旋转轴固持装置及薄膜气相沉积设备 |
| CN117976509B (zh) * | 2024-04-02 | 2024-06-04 | 浙江求是创芯半导体设备有限公司 | 调节组件及晶圆驱动装置 |
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- 2018-03-12 JP JP2019550737A patent/JP7161485B2/ja active Active
- 2018-03-12 CN CN201880031347.9A patent/CN110621802B/zh active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| US20200010950A1 (en) | 2020-01-09 |
| TW201841404A (zh) | 2018-11-16 |
| TWI765983B (zh) | 2022-06-01 |
| CN110621802B (zh) | 2023-01-24 |
| DE102017105374A1 (de) | 2018-09-20 |
| KR102604080B1 (ko) | 2023-11-17 |
| JP2020515064A (ja) | 2020-05-21 |
| CN110621802A (zh) | 2019-12-27 |
| US11396697B2 (en) | 2022-07-26 |
| KR20190127810A (ko) | 2019-11-13 |
| JP7161485B2 (ja) | 2022-10-26 |
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