WO2017118086A1 - 触摸屏及其制作方法、显示器件 - Google Patents

触摸屏及其制作方法、显示器件 Download PDF

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Publication number
WO2017118086A1
WO2017118086A1 PCT/CN2016/098995 CN2016098995W WO2017118086A1 WO 2017118086 A1 WO2017118086 A1 WO 2017118086A1 CN 2016098995 W CN2016098995 W CN 2016098995W WO 2017118086 A1 WO2017118086 A1 WO 2017118086A1
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WO
WIPO (PCT)
Prior art keywords
metal bridge
transparent conductive
touch
touch electrode
touch screen
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Application number
PCT/CN2016/098995
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English (en)
French (fr)
Inventor
曲连杰
吕志超
石广东
刘帅
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/525,932 priority Critical patent/US20180081471A1/en
Publication of WO2017118086A1 publication Critical patent/WO2017118086A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to the field of touch display technologies, and in particular, to a touch screen, a manufacturing method thereof, and a display device.
  • capacitive touch screens are the mainstream touch technology.
  • the capacitive touch screen is further divided into a self-inductive touch screen and a mutual-sensing touch screen.
  • the mutual-sensing touch screen is further divided into a single-layer mutual-sensing touch screen and a double-layer mutual-sensing touch screen.
  • the driving electrode and the sensing electrode of the single-layer mutual-sensitivity touch screen are formed by the same transparent conductive layer, and the driving electrodes and the sensing electrodes of the double-layer mutual-sensitivity touch screen are formed by two different transparent conductive layers. In comparison, the manufacturing process of the single-layer mutual-sensing touch screen is relatively simple.
  • a first transparent conductive portion distributed in a row direction and a second transparent conductive portion distributed in a column direction are formed by the same transparent conductive layer.
  • the metal bridge wires 11 are formed to connect the broken first transparent conductive portions together to form the drive electrodes 1.
  • the second transparent conductive portion is not broken throughout, and the sensing electrode 2 is formed.
  • the width of the metal bridge wiring is required to be large, and the width is generally maintained at about 10 ⁇ m.
  • the width of the metal bridge wiring is too large, and the light reflected from the side of the display screen enters the human eye, causing visibility problems, as shown in Fig. 1b.
  • an embodiment of the present invention provides a touch screen including a first touch electrode and a second touch electrode disposed on a substrate and intersecting in different directions, the first touch electrode and the second The touch electrodes are insulated at the intersection.
  • One of the first touch electrode and the second touch electrode includes a metal bridge connection and a plurality of spaced apart openings Ming conductive part.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions at the intersecting locations.
  • the touch screen further includes an opaque pattern, the metal bridge wiring corresponding to a position of the opaque pattern.
  • embodiments of the present invention also provide a display device including the touch screen as described above.
  • the opaque pattern of the touch screen is located on a side of the metal bridge wiring that is adjacent to the display screen of the display device.
  • an embodiment of the present invention further provides a method for fabricating a touch screen, including forming first and second touch electrodes that are cross-distributed in different directions on a substrate.
  • the first touch electrode and the second touch electrode are insulated from each other at an intersection position.
  • One of the first touch electrode and the second touch electrode includes a metal bridge wire and a plurality of transparent conductive portions disposed at intervals.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions at the intersecting locations.
  • the manufacturing method further includes: forming an opaque pattern, the metal bridge wiring corresponding to a position of the opaque pattern.
  • the touch screen includes a first touch electrode and a second touch electrode that are cross-distributed.
  • One of the first touch electrode and the second touch electrode includes a metal bridge wire and a plurality of transparent conductive portions disposed at intervals.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions at the intersection locations.
  • the touch screen also includes an opaque pattern, and the metal bridge wiring corresponds to the position of the opaque pattern.
  • the opaque pattern of the touch screen is located on the side of the metal bridge wiring close to the display screen of the display device.
  • the touch screen and the display device With the touch screen and the display device according to the embodiment of the present invention, it is possible to reduce the light reflected from the metal bridge wiring toward the display screen side, and to make the reflected light not be discerned by the human eye, thereby reducing the influence of the metal bridge wiring on the visibility. Further, the width of the metal bridge wiring can be appropriately increased to reduce its resistance. Therefore, there is a contradiction between the reduction of the metal bridge wiring resistance and the reduction of the influence on visibility.
  • FIG. 1a is a schematic diagram showing the distribution of driving electrodes and sensing electrodes of a single-layer mutual-capacitive touch screen in the prior art
  • Figure 1b shows a schematic diagram of the principle of the visibility of the metal bridge wiring of Figure 1a;
  • 2a is a schematic diagram showing the distribution of driving electrodes and sensing electrodes of a single-layer mutual capacitive touch panel according to an embodiment of the present invention
  • FIG. 2b is a partial structural view showing the position of the metal bridge connection of the touch electrode of FIG. 2a;
  • FIG. 3 and FIG. 5 to FIG. 7 are schematic diagrams showing a manufacturing process of a driving electrode and a sensing electrode of a single-layer mutual capacitive touch panel according to an embodiment of the present invention
  • Figure 4 is a cross-sectional view along line A-A of Figure 3;
  • FIG. 8 is a rear view 1 of a single-layer mutual capacitive touch screen in an embodiment of the present invention.
  • FIG. 9 is a rear view view of a single-layer mutual capacitive touch screen in an embodiment of the present invention.
  • FIG. 10 shows a rear view III of a single-layer mutual capacitive touch screen in an embodiment of the present invention.
  • a mutual capacitive touch screen For a mutual capacitive touch screen, it generally includes a drive electrode and a sense electrode for generating mutual capacitance.
  • the driving electrode and the sensing electrode are cross-distributed, and a detection capacitance matrix is formed at the intersection.
  • the extending direction of the driving electrode may be set to be a first direction, and the extending direction of the sensing electrode is a second direction.
  • the drive and sense electrodes are formed from the same transparent conductive layer.
  • the touch screen provided by the embodiment of the present invention may be a single-layer mutual capacitive touch screen.
  • the touch screen includes a first touch electrode and a second touch electrode that are distributed across different directions.
  • the first touch electrode and the second touch electrode are insulated from each other at the intersection position.
  • One of the first touch electrode and the second touch electrode includes a metal bridge wire and a plurality of transparent conductive portions disposed at intervals.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions at the intersection locations.
  • the touch screen also includes an opaque graphic.
  • the metal bridge wiring corresponds to the position of the opaque pattern. When the touch screen described above is applied to a display device, the opaque pattern of the touch screen is located on the side of the metal bridge wiring that is adjacent to the display screen of the display device.
  • the touch screen and the display device With the touch screen and the display device according to the embodiment of the invention, it is possible to reduce the light reflected from the metal bridge wiring to the display screen side, and to prevent the reflected light from being recognized by the human eye, thereby reducing the influence of the metal bridge wiring on the visibility. . Further, the width of the metal bridge wiring can be appropriately increased to reduce its resistance. Therefore, there is a contradiction between the reduction of the metal bridge wiring resistance and the reduction of the influence on visibility.
  • the first touch electrode may be a driving electrode of the touch screen
  • the second touch electrode may be Think of the sensing electrode of the touch screen.
  • the first touch electrode can also be the sensing electrode of the touch screen
  • the second touch electrode is the driving electrode of the touch screen.
  • the first touch electrode is used as the driving electrode of the touch screen, and the driving electrode includes a metal bridge wire and a plurality of transparent conductive portions disposed at intervals, and the technical solution according to the embodiment of the present invention is specifically introduced.
  • the touch screen includes a transparent substrate 100, and a driving electrode 1 extending in a first direction and a sensing electrode 2 extending in a second direction disposed on the substrate 100.
  • the drive electrode 1 and the sense electrode 2 are cross-distributed and insulated from each other at the intersection.
  • the drive electrode 1 includes a plurality of first transparent conductive portions 10 and metal bridge wires 11 distributed in a first direction.
  • the adjacent first transparent conductive portions 10 are spaced apart by a certain distance.
  • the metal bridge wires 11 are located between the adjacent first transparent conductive portions 10 for electrically connecting adjacent spaced apart first transparent conductive portions 10.
  • the metal bridge wire 11 corresponds to the intersection position of the drive electrode 1 and the sense electrode 2.
  • the touch screen also includes an opaque pattern 12 that corresponds to the location of the opaque pattern 12.
  • the opaque pattern 12 is located on the side of the metal bridge line 11 near the display screen of the display device. Thereby, it is possible to reduce the light reflected from the metal bridge wire 11 to the display screen side, thereby reducing or avoiding the influence of the metal bridge wire 11 on visibility, as shown in Fig. 2b.
  • the touch screen can include a plurality of metal bridge wires and a plurality of opaque patterns, depending on the particular application and needs.
  • the arrangement of the opaque pattern mitigates or avoids the effects of metal bridge wiring on visibility.
  • the width of the metal bridge wiring By appropriately increasing the width of the metal bridge wiring, its resistance can be reduced. Thereby, there is a mitigation or avoidance of the contradiction between the reduction of the metal bridge wiring resistance and the reduction of the influence on visibility.
  • the touch screen may further include a light shielding area located around the touch area.
  • a light shielding area located around the touch area.
  • the opaque pattern 12 and the light-shielding pattern 13 of the light-shielding region can be formed by a patterning process for the same film layer, as shown in FIG.
  • the opaque pattern 12 may be formed on the metal bridge line 11, or may be formed on the opaque pattern 12.
  • the metal bridge wire 11 is disposed on the opaque pattern 12.
  • the surface of the opaque pattern 12 includes a slope that is not parallel to the substrate 100 and that is not perpendicular to the substrate 100.
  • the metal bridge wire 11 includes a portion that covers the slope. The slope has an angle greater than 0° with the first line.
  • the first straight line is parallel to the substrate 100, and the extending direction of the first straight line is perpendicular to the extending direction of the driving electrode 1. Therefore, in the case where the projection of the metal bridge wire 11 on the substrate 100 is constant, the width of the metal bridge wire 11 can be increased, thereby reducing the electrical resistance of the metal bridge wire 11.
  • the design of the bevel is advantageous for the climbing of the metal bridge wire 11 to prevent the metal bridge wire 11 from being broken.
  • the metal bridge wire 11 has a width extending in a direction perpendicular to the direction in which the drive electrode 1 extends.
  • the width d 1 of the first projection of the metal bridge wire 11 on the substrate 100 is greater than the opaque pattern 12 on the substrate 100 in a direction perpendicular to the direction in which the drive electrode 1 extends.
  • the width d 2 of the second projection For example, 1 ⁇ m ⁇ d 1 -d 2 ⁇ 3 ⁇ m.
  • the opaque pattern 12 does not completely block the metal bridge wire 11, but ensures that the light reflected from the metal bridge wire 11 to the display side is not discerned by the human eye, thereby reducing or avoiding the influence of the metal bridge wire 11 on visibility. , as shown in Figure 2b.
  • the above described technical solution can reduce the area of the opaque pattern 12 as compared to the solution in which the first projection of the metal bridge wire 11 on the substrate 100 is completely within the second projection of the opaque pattern 12 on the substrate 100.
  • the metal bridge wire 11 is disposed on the opaque pattern 12, and the opaque pattern 12 includes the above-described slope which can increase the line width of the metal bridge line 11.
  • the width d 1 of the first projection of the metal bridge wire 11 on the substrate 100 is greater than the width d 2 of the second projection of the opaque pattern 12 on the substrate 100, so that the resistance of the metal bridge wire 11 can be more effectively reduced. And reducing the area of the opaque pattern 12.
  • the line width of the metal bridge line 11 is limited by the aperture ratio of the display device, which cannot be too large, thus resulting in the size of the opaque pattern 12. Also small. Therefore, the manner in which the lithography process is performed by exposure of a multi-gray mask to form the above-described slope is difficult to achieve.
  • the inventors have found that when the size of the opaque pattern 12 is close to the resolution of the lithographic apparatus or smaller, it is possible to form the opaque pattern 12 whose edge is beveled and whose entire thickness can be reduced much.
  • the metal bridge wire 11 covering the opaque pattern 12 is formed on the opaque pattern 12, it is advantageous The climbing of the metal bridge wire 11 prevents the metal bridge wire 11 from being broken.
  • the slope of the opaque pattern 12 is located at the edge of the opaque pattern 12, thereby facilitating the process.
  • the lithographic resolution of the opaque film layer is about 8 to 10 ⁇ m.
  • the width of the opaque pattern 12 d 2 of the embodiment of the present invention satisfies: 5 ⁇ m ⁇ d 2 ⁇ 10 ⁇ m, thereby forming a desired slope, impervious reduced The overall thickness of the light pattern 12.
  • the slope can increase the line width of the metal bridge line 11 disposed on the opaque pattern 12, effectively reducing the resistance of the metal bridge line 11, and preventing the metal bridge line 11 from being broken due to the climbing.
  • the width of the opaque pattern 12 is its extension distance in a direction perpendicular to the direction in which the drive electrodes 1 extend. Further, in order to ensure that the size of the opaque pattern 12 satisfies the requirements and lower the resistance of the metal bridge line 11, according to another embodiment, the metal bridge line 11 may be disposed on the opaque pattern 12. Thereby, the size of the opaque pattern 12 can be reduced, and the line width of the metal bridge line 11 can be increased by the slope of the surface of the opaque pattern 12, and the electric resistance of the metal bridge line 11 can be effectively reduced.
  • the metal bridge wire 11 can be made to correspond to the position of the at least two opaque patterns 12. Thereby, the size of the opaque pattern 12 can be reduced, and the overall thickness of the opaque pattern 12 and the slope angle of the edge slope can be effectively reduced, as shown in FIGS. 9 and 10 (only metal bridges are shown by way of example). The case where the wire 11 corresponds to the position of the two opaque patterns 12). As shown in FIG.
  • the arrangement direction of the at least two opaque patterns 12 coincides with the extending direction of the metal bridge wires 11 (consistent with the extending direction of the entire driving electrode 1), which requires higher precision for the lithographic apparatus. .
  • the arrangement direction of the at least two opaque patterns 12 is perpendicular to the extending direction of the metal bridge wires 11, which does not require too high precision for the lithographic apparatus, and thus is more adaptable.
  • the gap width between the opaque patterns 12 and the width of the opaque pattern 12 can be much smaller than the precision of the lithographic apparatus, thereby effectively reducing the overall thickness of the opaque pattern 12 and the slope angle of the edge slope.
  • the metal bridge wires 11 of the drive electrodes 1 may be disposed on at least two opaque patterns 12.
  • the width d 2 of the opaque pattern 12 satisfies: 5 ⁇ m ⁇ d 2 ⁇ 10 ⁇ m.
  • the arrangement direction of the at least two opaque patterns 12 is perpendicular to the extending direction of the metal bridge wires 11.
  • the width d 1 of the first projection of the metal bridge wire 11 on the substrate 100 is greater than the width d 2 of the second projection of all the opaque patterns 12 and the gap therebetween on the substrate 100, 1 ⁇ m ⁇ d 1 - d 2 ⁇ 3 ⁇ m. Therefore, it is possible to ensure that the edge of the opaque pattern 12 is a flat bevel and increase the width of the metal bridge wire 11 to effectively reduce its electric resistance. In addition, the effect of the metal bridge wiring 11 on visibility can also be mitigated or avoided.
  • the opaque pattern and the first touch electrode and the second touch electrode may be located in a touch area of the touch screen.
  • the first touch electrode may include a metal bridge wire and a plurality of transparent conductive portions disposed at intervals, and the plurality of transparent conductive portions are distributed in the row direction.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions in the row direction.
  • the second touch electrode may include a plurality of additional transparent conductive portions. A plurality of additional transparent conductive portions extend in the column direction. The plurality of transparent conductive portions and the plurality of additional transparent conductive portions are disposed in the same layer.
  • the touch screen may further include an insulating layer disposed on the metal bridge wiring.
  • the touch screen may specifically include the following components.
  • the opaque pattern 12 is located in the touch area and the light-shielding pattern 13 is located around the touch area.
  • the size of the opaque pattern 12 is smaller than the resolution of the lithographic apparatus, whereby the overall thickness of the opaque pattern 12 and the slope angle of the edge slope can be effectively reduced, as shown in FIGS. 3 and 4.
  • a metal bridge line 11 disposed on the opaque pattern 12 and a signal line 14 for applying a voltage to the drive electrodes are shown in conjunction with FIGS. 3 and 5.
  • the insulating layer 15 disposed on the metal bridge wire 11 is shown in conjunction with FIGS. 5 and 6.
  • a plurality of first transparent conductive portions 10 distributed in the row direction of the touch region and a plurality of second transparent conductive portions for forming the sensing electrodes 2 are as shown in FIG.
  • the first transparent conductive portions 10 are distributed in the row direction, and adjacent transparent conductive portions 10 are disposed at a certain distance.
  • the metal bridge wires 11 electrically connect the adjacent first transparent conductive portions 10, thereby forming the drive electrodes 1, as shown in FIGS. 7 and 8.
  • the second transparent conductive portion extends in the column direction to form the sensing electrode 2, which is distributed across the driving electrode 1, as shown in FIG.
  • the first transparent conductive portion 10 and the sensing electrode 2 of the drive electrode 1 may be formed of the same transparent conductive layer.
  • the opaque pattern 12 and the light-shielding pattern 13 may be formed of the same opaque film layer.
  • the metal bridge wires 11 and the signal wires 14 may be formed of the same metal film layer.
  • the material of the first transparent conductive portion 10 and the sensing electrode 2 may be indium zinc oxide or indium tin oxide such as one or more of ZnO, IGO, IZO, ITO or IGZO.
  • the material of the metal bridge wire 11 may be a metal such as Cu, Al, Ag, Mo, Cr, Nd, Ni, Mn, Ti, Ta or W and an alloy of these metals.
  • the opaque pattern 12 and the light-shielding pattern 13 may be made of a black organic resin form.
  • the material of the insulating layer 15 may be an oxynitride.
  • Embodiments of the present invention also provide a display device, which may include the above touch screen.
  • the opaque pattern of the touch screen is located on the side of the metal bridge wiring that is adjacent to the display of the display device.
  • the embodiment of the invention further provides a method for manufacturing a touch screen, comprising forming a cross-distributed first touch electrode and a second touch electrode on a substrate (for example, a glass substrate, a quartz substrate or an organic resin substrate).
  • the first touch electrode and the second touch electrode are insulated from each other at the intersection position.
  • One of the first touch electrode and the second touch electrode includes a metal bridge wire and a plurality of transparent conductive portions disposed at intervals.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions at the intersection locations.
  • the manufacturing method further includes: forming an opaque pattern, and the metal bridge wiring corresponds to a position of the opaque pattern.
  • the opaque pattern and the first touch electrode and the second touch electrode may be located in a touch area of the touch screen.
  • the first touch electrode includes a metal bridge wire and a plurality of transparent conductive portions disposed at intervals, and the plurality of transparent conductive portions are distributed in a row direction.
  • the metal bridge wires electrically connect adjacent spaced apart transparent conductive portions in the row direction.
  • the second touch electrode includes a plurality of additional transparent conductive portions.
  • a plurality of additional transparent conductive portions extend in the column direction.
  • the plurality of transparent conductive portions and the plurality of additional transparent conductive portions may be formed by a patterning process for the same transparent conductive layer.
  • the fabrication method may further include forming an insulating layer on the metal bridge wiring.
  • the opaque pattern obtained by the above manufacturing method can be located on the side of the metal bridge wiring close to the display screen, thereby reducing the light reflected from the metal bridge wiring to the display screen side, and making the reflected light not discerned by the human eye. Thereby, the influence of the metal bridge wiring on visibility can be reduced. Further, the width of the metal bridge wiring can be appropriately increased to reduce its resistance. Therefore, there is a contradiction between the reduction of the metal bridge wiring resistance and the reduction of the influence on visibility.
  • the method for fabricating the touch screen may specifically include the following steps.
  • the opaque pattern 12 is formed in the touch area, and the light shielding pattern 13 is formed on the periphery of the touch area.
  • the opaque pattern 12 and the opaque pattern 13 may be formed by a photolithography process for the same opaque film layer.
  • the opaque pattern 12 is smaller in size than the lithographic apparatus The resolution, whereby the overall thickness of the opaque pattern 12 and the slope angle of the edge slope can be effectively reduced.
  • a metal bridge line 11 is formed on the opaque pattern 12, and a signal line 14 is formed on the periphery of the touch area.
  • the metal bridge wiring 11 and the signal line 14 can be formed by a photolithography process for the same metal film layer.
  • Signal line 14 is used to apply a voltage signal to the drive electrodes.
  • an insulating layer 15 is formed on the metal bridge wiring 11.
  • a plurality of first transparent conductive portions 10 and a plurality of second transparent conductive portions for forming the sensing electrodes 2 may be formed in the touch region by a patterning process on the same transparent conductive layer.
  • the first transparent conductive portions 10 are distributed in the row direction, and adjacent first transparent conductive portions 10 are disposed at a certain distance. In the row direction, the metal bridge wires 11 electrically connect the adjacent first transparent conductive portions 10, thereby forming the drive electrodes 1.
  • the second transparent conductive portion extends in the column direction to form the sensing electrode 2.
  • the sensing electrode 2 is distributed across the driving electrode 1.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

一种触摸屏及其制作方法、显示器件。触摸屏包括设置在基底（100）上的沿不同方向交叉分布的第一触控电极和第二触控电极。第一触控电极和第二触控电极在交叉位置彼此绝缘。第一触控电极和第二触控电极中的一个包括金属桥接线（11）和间隔设置的多个透明导电部（10）。金属桥接线（11）在交叉位置电连接相邻的间隔设置的透明导电部（10）。触摸屏还包括不透光图形（12）。金属桥接线（11）与不透光图形（12）的位置相对应。不透光图形（12）可以位于金属桥接线（11）靠近显示画面的一侧。由此，能够减少金属桥接线（11）向显示画面侧反射的光线，从而减少金属桥接线（11）对于可视性的影响。进一步地，可以适当增加金属桥接线（11）的宽度，降低其电阻。因此，减轻或避免了金属桥接线（11）电阻的降低和减少对于可视性的影响之间存在的矛盾。

Description

触摸屏及其制作方法、显示器件 技术领域
本发明涉及触控显示技术领域，特别是涉及一种触摸屏及其制作方法、显示器件。
背景技术
由于电容式触摸屏具有高敏感、长寿命且支持多点触摸的优点，成为时下的主流触摸技术。而电容式触摸屏又分为自感式触摸屏和互感式触摸屏。互感式触摸屏又分为单层互感式触摸屏和双层互感式触摸屏。其中，单层互感式触摸屏的驱动电极和感应电极由同一透明导电层形成，双层互感式触摸屏的驱动电极和感应电极由两个不同的透明导电层形成。相比较而言，单层互感式触摸屏的制作工艺较简单。
如图1a所示，对于单层互容式触摸屏，由同一透明导电层形成沿行方向分布的第一透明导电部和沿列方向分布的第二透明导电部。形成金属桥接线11将断开的第一透明导电部连接在一起，以形成驱动电极1。第二透明导电部为整条不断开，形成了感应电极2。金属桥接线和感应电极2之间具有绝缘层。
目前主流的触摸屏生产厂，要减少横向的触控电阻，即金属桥接线的电阻。因此，需要金属桥接线的宽度较大，一般宽度都维持在10μm左右。但是金属桥接线的宽度太大，其向显示画面侧反射的光线会进入人眼，造成可视性问题，如图1b所示。为了减少对于可视性的影响，需要降低金属桥接线的宽度。因此，金属桥接线电阻的降低和减少对于可视性的影响之间存在矛盾。
发明内容
因此，所期望的是减轻或避免金属桥接线电阻的降低和减少对于可视性的影响之间存在的矛盾。
根据一个方面，本发明实施例提供了一种触摸屏，包括设置在基底上的沿不同方向交叉分布的第一触控电极和第二触控电极，所述第一触控电极和所述第二触控电极在交叉位置相绝缘。所述第一触控电极和所述第二触控电极中的一个包括金属桥接线和间隔设置的多个透 明导电部。所述金属桥接线在所述交叉位置电连接相邻的间隔设置的透明导电部。所述触摸屏还包括不透光图形，所述金属桥接线与所述不透光图形的位置相对应。
根据另一方面，本发明的实施例还提供了一种显示器件，包括如上所述的触摸屏。所述触摸屏的不透光图形位于金属桥接线靠近显示器件的显示画面的一侧。
根据又一方面，本发明的实施例还提供了一种触摸屏的制作方法，包括在基底上形成沿不同方向交叉分布的第一触控电极和第二触控电极。所述第一触控电极和所述第二触控电极在交叉位置彼此绝缘。所述第一触控电极和所述第二触控电极中的一个包括金属桥接线和间隔设置的多个透明导电部。所述金属桥接线在所述交叉位置电连接相邻的间隔设置的透明导电部。所述制作方法还包括：形成不透光图形，所述金属桥接线与所述不透光图形的位置相对应。
根据本发明的实施例，触摸屏包括交叉分布的第一触控电极和第二触控电极。第一触控电极和第二触控电极中的一个包括金属桥接线和间隔设置的多个透明导电部。金属桥接线在交叉位置电连接相邻的间隔设置的透明导电部。触摸屏还包括不透光图形，金属桥接线与不透光图形的位置相对应。在包括上述触摸屏的显示器件中，触摸屏的不透光图形位于金属桥接线靠近显示器件的显示画面的一侧。通过根据本发明实施例的触摸屏和显示器件，能够减少金属桥接线向显示画面侧反射的光线，并使得反射的光线不会被人眼分辨出来，从而减少金属桥接线对于可视性的影响。进一步地，可以适当增加金属桥接线的宽度，降低其电阻。因此，减轻或避免了金属桥接线电阻的降低和减少对于可视性的影响之间存在的矛盾。
附图说明
为了更清楚地说明本发明的实施例，下面将对实施例描述中所需要使用的附图作简单地介绍。显而易见地，下面描述的附图仅仅是本发明的一些实施例。对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。
图1a示出了现有技术中单层互容式触摸屏的驱动电极和感应电极的分布示意图；
图1b示出了图1a中的金属桥接线存在可视性问题的原理示意图；
图2a示出了本发明实施例中单层互容式触摸屏的驱动电极和感应电极的分布示意图；
图2b示出了图2a中触控电极的金属桥接线所在位置的局部结构示意图；
图3、图5-图7示出了本发明实施例中单层互容式触摸屏的驱动电极和感应电极的制作过程示意图；
图4示出了图3沿线A-A的剖视图；
图8示出了本发明实施例中单层互容式触摸屏的后视图一；
图9示出了本发明实施例中单层互容式触摸屏的后视图二；
图10示出了本发明实施例中单层互容式触摸屏的后视图三。
具体实施方式
对于互容式触摸屏，其一般包括用于产生互电容的驱动电极和感应电极。驱动电极和感应电极交叉分布，在交叉处形成检测电容矩阵。可以设定驱动电极的延伸方向为第一方向，感应电极的延伸方向为第二方向。对于单层互容式触摸屏而言，驱动电极和感应电极由同一层透明导电层形成。
本发明实施例提供的触摸屏可以为单层互容式触摸屏。该触摸屏包括沿不同方向交叉分布的第一触控电极和第二触控电极。第一触控电极和第二触控电极在交叉位置彼此绝缘。第一触控电极和第二触控电极中的一个包括金属桥接线和间隔设置的多个透明导电部。金属桥接线在交叉位置电连接相邻的间隔设置的透明导电部。触摸屏还包括不透光图形。金属桥接线与不透光图形的位置相对应。在将上述触摸屏应用于显示器件时，触摸屏的不透光图形位于金属桥接线靠近显示器件的显示画面的一侧。通过根据本发明实施例的触摸屏和显示器件，能够减少金属桥接线向显示画面侧反射的光线，并使得反射的光线不会被人眼能分辨出来，从而减少金属桥接线对于可视性的影响。进一步地，可以适当增加金属桥接线的宽度，降低其电阻。因此，减轻或避免了金属桥接线电阻的降低和减少对于可视性的影响之间存在的矛盾。
例如，第一触控电极可以为触摸屏的驱动电极，第二触控电极可 以为触摸屏的感应电极。当然，第一触控电极也可以为触摸屏的感应电极，第二触控电极为触摸屏的驱动电极。
下面将结合附图，对本发明的具体实施例作进一步详细描述。以下实施例用于说明本发明，但不用来限制本发明的范围。
本发明实施例中以第一触控电极为触摸屏的驱动电极且该驱动电极包括金属桥接线和间隔设置的多个透明导电部为例，来具体介绍根据本发明实施例的技术方案。
结合图2a和2b所示，触摸屏包括透明基底100，以及设置在基底100上的沿第一方向延伸的驱动电极1和沿第二方向延伸的感应电极2。驱动电极1和感应电极2交叉分布且在交叉位置彼此绝缘。驱动电极1包括多个沿第一方向分布的第一透明导电部10和金属桥接线11。相邻的第一透明导电部10间隔一定距离。金属桥接线11位于相邻的第一透明导电部10之间，用于电连接相邻的间隔设置的第一透明导电部10。金属桥接线11对应于驱动电极1和感应电极2的交叉位置。
触摸屏还包括不透光图形12，金属桥接线11与不透光图形12的位置相对应。在将该触摸屏应用于显示器件时，不透光图形12位于金属桥接线11靠近显示器件的显示画面的一侧。由此，能够减少金属桥接线11反射至显示画面侧的光线，从而减轻或避免金属桥接线11对于可视性的影响，如图2b所示。
尽管在图2a和2b中示出了一个金属桥接线11与一个不透光图形12，但金属桥接线与不透光图形的数目不限于此。根据具体的应用和需求，触摸屏可以包括多个金属桥接线和多个不透光图形。
在本实施例中，不透光图形的设置减轻或避免了金属桥接线对于可视性的影响。通过适当增加金属桥接线的宽度，能够降低其电阻。由此，减轻或避免了金属桥接线电阻的降低和减少对于可视性的影响之间存在的矛盾。
根据另一实施例，触摸屏还可以包括位于触控区域周边的遮光区域。在将该触摸屏应用于显示器件时，能够进一步防止显示器件的周边漏光。不透光图形12和遮光区域的遮光图形13可以通过对同一膜层的构图工艺形成，如图3所示。
为了实现金属桥接线11与不透光图形12的位置相对应，可以在金属桥接线11上形成不透光图形12，也可以在不透光图形12上形成 金属桥接线11。
在一个具体的实施方式中，如图2b所示，金属桥接线11设置在不透光图形12上。不透光图形12的表面包括不与基底100平行且不与基底100垂直的斜面。金属桥接线11包括覆盖该斜面的部分。该斜面与第一直线之间具有大于0°的夹角。第一直线与基底100平行，且第一直线的延伸方向垂直于驱动电极1的延伸方向。因此，在金属桥接线11在基底100上投影不变的情况下，能够增加金属桥接线11的宽度，从而降低金属桥接线11的电阻。而且，斜面的设计有利于金属桥接线11的爬坡，从而防止金属桥接线11发生断线。金属桥接线11在垂直于驱动电极1延伸方向的方向上的延伸距离为其宽度。
为了进一步减小金属桥接线11的电阻，在垂直于驱动电极1延伸方向的方向上，金属桥接线11在基底100上的第一投影的宽度d1大于不透光图形12在基底100上的第二投影的宽度d2。例如，1μm≤d1-d2≤3μm。不透光图形12不完全遮挡金属桥接线11，但是却能够保证金属桥接线11反射至显示画面侧的光线不会被人眼分辨出来，从而减轻或避免金属桥接线11对于可视性的影响，如图2b所示。此外，还能够有效增加金属桥接线11的宽度，降低其电阻。与金属桥接线11在基底100上的第一投影完全位于不透光图形12在基底100上的第二投影内的技术方案相比，上述技术方案能够减小不透光图形12的面积。
在实际应用过程中，可以结合“斜面”和“不完全遮挡”两个特征。即，金属桥接线11设置在不透光图形12上，且不透光图形12包括上述能够增加金属桥接线11线宽的斜面。同时，金属桥接线11在基底100上的第一投影的宽度d1大于不透光图形12在基底100上的第二投影的宽度d2，从而能够更有效地降低金属桥接线11的电阻，并减小不透光图形12的面积。
虽然可以通过增加金属桥接线11线宽的方式来降低其电阻，但是金属桥接线11的线宽会受到显示器件开口率的限制，其不能够太大，因此，导致不透光图形12的尺寸也较小。因此，通过多灰阶掩膜板曝光进行光刻工艺来形成上述斜面的方式很难实现。但是，发明人发现，当不透光图形12的尺寸接近于光刻设备的分辨率或者更小一些时，就能够形成边缘为斜面且整个厚度也能够降低很多的不透光图形12。当在不透光图形12上形成覆盖不透光图形12的金属桥接线11时，有利 于金属桥接线11的爬坡，从而防止金属桥接线11发生断线。
因此，根据本发明的另一实施例，不透光图形12的斜面位于不透光图形12的边缘，从而便于工艺上的实现。
目前，不透光膜层的光刻分辨率为8～10μm左右。为了在不透光图形12的边缘形成斜面，需要保证不透光图形12的尺寸小于8～10μm。但是，考虑到尺寸过小容易造成尺寸波动，因此，本发明实施例中设定不透光图形12的宽度d2满足：5μm≤d2≤10μm，从而形成所需的斜面，减小不透光图形12的整体厚度。该斜面能够增加设置在不透光图形12上的金属桥接线11的线宽，有效降低金属桥接线11的电阻，并防止金属桥接线11因爬坡发生断线。不透光图形12的宽度为其在垂直于驱动电极1延伸方向的方向上的延伸距离。进一步地，为了保证不透光图形12的尺寸满足需求并降低金属桥接线11的电阻，根据另一实施例，可以将金属桥接线11设置在不透光图形12上。由此，能够减小不透光图形12的尺寸，并利用不透光图形12表面的斜面来增加金属桥接线11的线宽，有效降低金属桥接线11的电阻。
在某些情形下，当不透光图形12的尺寸仍过大，以至于不能有效减小不透光图形12的整体厚度以及边缘坡度角时，为了保证不透光图形12的尺寸满足上述条件，可以使金属桥接线11与至少两个不透光图形12的位置相对应。由此，能够减小不透光图形12的尺寸，有效减小不透光图形12的整体厚度及边缘斜面的坡度角，如图9和图10所示(作为举例，仅示出了金属桥接线11与两个不透光图形12的位置相对应的情况)。如图9所示，至少两个不透光图形12的排布方向与金属桥接线11的延伸方向一致(与整个驱动电极1的延伸方向一致)，这对光刻设备的精度要求更高些。如图10所示，至少两个不透光图形12的排布方向与金属桥接线11的延伸方向垂直，这对光刻设备没有太高的精度要求，因此适应性更广。不透光图形12之间的缝隙宽度和不透光图形12的宽度可以远小于光刻设备的精度，从而有效减小不透光图形12的整体厚度及边缘斜面的坡度角。
根据本发明的另一实施例，驱动电极1的金属桥接线11可以设置在至少两个不透光图形12上。不透光图形12的宽度d2满足：5μm≤d2≤10μm。至少两个不透光图形12的排布方向与金属桥接线11的延伸方向垂直。金属桥接线11在基底100上的第一投影的宽度d1大于所 有不透光图形12及其之间的缝隙在基底100上的第二投影的宽度d2，1μm≤d1-d2≤3μm。因此，可以保证不透光图形12的边缘为平坦的斜面，并增加金属桥接线11的宽度，有效降低其电阻。此外，还能够减轻或避免金属桥接线11对于可视性的影响。
根据另一实施例，不透光图形以及第一触控电极和第二触控电极可以位于触摸屏的触控区域。第一触控电极可以包括金属桥接线和间隔设置的多个透明导电部，多个透明导电部沿行方向分布。金属桥接线在行方向上电连接相邻的间隔设置的透明导电部。并且，第二触控电极可以包括多个另外的透明导电部。多个另外的透明导电部沿列方向延伸。多个透明导电部和多个另外的透明导电部同层设置。
根据另一实施例，触摸屏还可以包括设置在金属桥接线上的绝缘层。
根据本发明的另一实施例，触摸屏具体可以包括如下部件。
位于触控区域的不透光图形12和位于触控区域周边的遮光图形13。不透光图形12的尺寸小于光刻设备的分辨率，由此，能够有效减小不透光图形12的整体厚度及边缘斜面的坡度角，结合图3和图4所示。
设置在不透光图形12上的金属桥接线11和用于向驱动电极施加电压的信号线14，结合图3和图5所示。
设置在金属桥接线11上的绝缘层15，结合图5和图6所示。
位于触控区域的沿行方向分布的多个第一透明导电部10和用于形成感应电极2的多个第二透明导电部，如图7所示。第一透明导电部10沿行方向分布，相邻的透明导电部10之间间隔一定距离设置。在行方向上，金属桥接线11电连接相邻的第一透明导电部10，从而形成驱动电极1，结合图7和图8所示。第二透明导电部沿列方向延伸，形成感应电极2，其与驱动电极1交叉分布，如图7所示。
驱动电极1的第一透明导电部10和感应电极2可以由同一透明导电层形成。不透光图形12和遮光图形13可以由同一不透光膜层形成。金属桥接线11和信号线14可以由同一金属膜层形成。第一透明导电部10和感应电极2的材料可以为铟锌氧化物或铟锡氧化物，如：ZnO、IGO、IZO、ITO或IGZO中的一种或多种。金属桥接线11的材料可以为Cu，Al，Ag，Mo，Cr，Nd，Ni，Mn，Ti，Ta或W等金属以及这些金属的合金。不透光图形12和遮光图形13可以由黑色的有机树脂 形成。绝缘层15的材料可以为氮氧化合物。
本发明实施例还提供了一种显示器件，其可以包括上述触摸屏。触摸屏的不透光图形位于金属桥接线靠近显示器件的显示画面的一侧。由此，能够减轻或避免金属桥接线电阻的降低和减少对于可视性的影响之间的矛盾，从而提高显示器件的显示品质。
本发明实施例还提供了一种触摸屏的制作方法，包括在基底(例如，玻璃基底、石英基底或有机树脂基底)上形成交叉分布的第一触控电极和第二触控电极。第一触控电极和第二触控电极在交叉位置彼此绝缘。第一触控电极和第二触控电极中的一个包括金属桥接线和间隔设置的多个透明导电部。金属桥接线在交叉位置电连接相邻的间隔设置的透明导电部。该制作方法还包括：形成不透光图形，金属桥接线与不透光图形的位置相对应。
根据另一实施例，不透光图形以及第一触控电极和第二触控电极可以位于触摸屏的触控区域。第一触控电极包括金属桥接线和间隔设置的多个透明导电部，多个透明导电部沿行方向分布。金属桥接线在行方向上电连接相邻的间隔设置的透明导电部。并且，第二触控电极包括多个另外的透明导电部。多个另外的透明导电部沿列方向延伸。多个透明导电部和多个另外的透明导电部可以通过对同一透明导电层的构图工艺形成。
根据另一实施例，制作方法还可以包括在金属桥接线上形成绝缘层。
通过上述制作方法得到的不透光图形可以位于金属桥接线靠近显示画面的一侧，从而能够减少金属桥接线反射至显示画面侧的光线，并使得反射的光线不会被人眼分辨出来。由此，可以减少金属桥接线对于可视性的影响。进一步地，可以适当增加金属桥接线的宽度，降低其电阻。因此，减轻或避免了金属桥接线电阻的降低和减少对于可视性的影响之间存在的矛盾。
根据本发明的另一实施例，触摸屏的制作方法具体可以包括如下步骤。
如图3和图4所示，在触控区域形成不透光图形12，并在触控区域的周边形成遮光图形13。不透光图形12和遮光图形13可以通过对同一不透光膜层的光刻工艺形成。不透光图形12的尺寸小于光刻设备 的分辨率，由此，能够有效减小不透光图形12的整体厚度及边缘斜面的坡度角。
结合图3和图5所示，在不透光图形12上形成金属桥接线11，并且在触控区域的周边形成信号线14。金属桥接线11和信号线14可以通过对同一金属膜层的光刻工艺形成。信号线14用于向驱动电极施加电压信号。
如图6所示，在金属桥接线11上形成绝缘层15。
如图7和图8所示，可以通过对同一透明导电层的构图工艺在触控区域形成多个第一透明导电部10和用于形成感应电极2的多个第二透明导电部。第一透明导电部10沿行方向分布，且相邻的第一透明导电部10之间间隔一定距离设置。在行方向上，金属桥接线11电连接相邻的第一透明导电部10，从而形成驱动电极1。第二透明导电部沿列方向延伸，以形成感应电极2。感应电极2与驱动电极1交叉分布。
至此，完成了触摸屏的制作。
以上所述仅是本发明的实施例。应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明技术原理的前提下，可以做出若干改进和替换。这些改进和替换也应视为落入本发明的保护范围之内。

Claims (16)

  1. 一种触摸屏，包括设置在基底上的沿不同方向交叉分布的第一触控电极和第二触控电极，所述第一触控电极和所述第二触控电极在交叉位置彼此绝缘，
    其中，所述第一触控电极和所述第二触控电极中的一个包括金属桥接线和间隔设置的多个透明导电部，所述金属桥接线在所述交叉位置电连接相邻的间隔设置的透明导电部，并且
    其中，所述触摸屏还包括不透光图形，所述金属桥接线与所述不透光图形的位置相对应。
  2. 根据权利要求1所述的触摸屏，其中，所述金属桥接线设置在所述不透光图形上，所述不透光图形的表面包括不与所述基底平行且不与所述基底垂直的斜面，所述斜面与第一直线之间具有大于0°的夹角，所述第一直线与所述基底平行且所述第一直线的延伸方向垂直于所述第一触控电极和所述第二触控电极中的所述一个的延伸方向，所述金属桥接线包括覆盖所述斜面的部分。
  3. 根据权利要求2所述的触摸屏，其中，所述斜面位于所述不透光图形的边缘。
  4. 根据权利要求3所述的触摸屏，其中，在垂直于所述第一触控电极和所述第二触控电极中的所述一个的延伸方向的方向上，所述金属桥接线在所述基底上的第一投影的宽度d1大于所述不透光图形在所述基底上的第二投影的宽度d2，其中，1μm≤d1-d2≤3μm。
  5. 根据权利要求3所述的触摸屏，其中，在垂直于所述第一触控电极和所述第二触控电极中的所述一个的延伸方向的方向上，所述不透光图形的宽度为d2，其中，5μm≤d2≤10μm。
  6. 根据权利要求1所述的触摸屏，其中，所述不透光图形的个数为多个，并且所述金属桥接线与至少两个不透光图形的位置相对应。
  7. 根据权利要求6所述的触摸屏，其中，所述至少两个不透光图形的排布方向与所述金属桥接线的延伸方向一致。
  8. 根据权利要求6所述的触摸屏，其中，所述至少两个不透光图形的排布方向与所述金属桥接线的延伸方向垂直。
  9. 根据权利要求1所述的触摸屏，其中，所述不透光图形以及所 述第一触控电极和所述第二触控电极位于触控区域。
  10. 根据权利要求9所述的触摸屏，其中，所述第一触控电极包括所述金属桥接线和所述间隔设置的多个透明导电部，所述多个透明导电部沿行方向分布，所述金属桥接线在行方向上电连接相邻的间隔设置的透明导电部，并且，所述第二触控电极包括多个另外的透明导电部，所述多个另外的透明导电部沿列方向延伸，所述多个透明导电部和所述多个另外的透明导电部同层设置。
  11. 根据权利要求1所述的触摸屏，还包括设置在所述金属桥接线上的绝缘层。
  12. 一种显示器件，包括如权利要求1-11中任一项所述的触摸屏，其中，所述触摸屏的不透光图形位于金属桥接线靠近显示器件的显示画面的一侧。
  13. 一种触摸屏的制作方法，包括在基底上形成沿不同方向交叉分布的第一触控电极和第二触控电极，所述第一触控电极和所述第二触控电极在交叉位置彼此绝缘，所述第一触控电极和所述第二触控电极中的一个包括金属桥接线和间隔设置的多个透明导电部，所述金属桥接线在所述交叉位置电连接相邻的间隔设置的透明导电部，
    其中，所述制作方法还包括：形成不透光图形，所述金属桥接线与所述不透光图形的位置相对应。
  14. 根据权利要求13所述的制作方法，其中，所述不透光图形以及所述第一触控电极和所述第二触控电极位于触控区域。
  15. 根据权利要求14所述的制作方法，其中，所述第一触控电极包括所述金属桥接线和所述间隔设置的多个透明导电部，所述多个透明导电部沿行方向分布，所述金属桥接线在行方向上电连接相邻的间隔设置的透明导电部，并且，所述第二触控电极包括多个另外的透明导电部，所述多个另外的透明导电部沿列方向延伸，所述多个透明导电部和所述多个另外的透明导电部通过对同一透明导电层的构图工艺形成。
  16. 根据权利要求13所述的制作方法，还包括在所述金属桥接线上形成绝缘层。
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