WO2017059772A1 - 一种含芴肟酯类光引发剂、其合成、含有其的感光性树脂组合物及其应用 - Google Patents
一种含芴肟酯类光引发剂、其合成、含有其的感光性树脂组合物及其应用 Download PDFInfo
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- WO2017059772A1 WO2017059772A1 PCT/CN2016/099745 CN2016099745W WO2017059772A1 WO 2017059772 A1 WO2017059772 A1 WO 2017059772A1 CN 2016099745 W CN2016099745 W CN 2016099745W WO 2017059772 A1 WO2017059772 A1 WO 2017059772A1
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- WIPO (PCT)
- Prior art keywords
- group
- substituted
- linear
- branched alkyl
- oxime ester
- Prior art date
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- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- WPOPOPFNZYPKAV-UHFFFAOYSA-N cyclobutylmethanol Chemical compound OCC1CCC1 WPOPOPFNZYPKAV-UHFFFAOYSA-N 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- GTBGXKPAKVYEKJ-UHFFFAOYSA-N decyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C(C)=C GTBGXKPAKVYEKJ-UHFFFAOYSA-N 0.000 description 1
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 description 1
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 1
- AQNSVANSEBPSMK-UHFFFAOYSA-N dicyclopentenyl methacrylate Chemical compound C12CC=CC2C2CC(OC(=O)C(=C)C)C1C2.C12C=CCC2C2CC(OC(=O)C(=C)C)C1C2 AQNSVANSEBPSMK-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- YCUBDDIKWLELPD-UHFFFAOYSA-N ethenyl 2,2-dimethylpropanoate Chemical compound CC(C)(C)C(=O)OC=C YCUBDDIKWLELPD-UHFFFAOYSA-N 0.000 description 1
- GLVVKKSPKXTQRB-UHFFFAOYSA-N ethenyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC=C GLVVKKSPKXTQRB-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- USPLKTKSLPLUJG-UHFFFAOYSA-N hexan-2-yl 2-methylprop-2-enoate Chemical compound CCCCC(C)OC(=O)C(C)=C USPLKTKSLPLUJG-UHFFFAOYSA-N 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- FSQQTNAZHBEJLS-UPHRSURJSA-N maleamic acid Chemical compound NC(=O)\C=C/C(O)=O FSQQTNAZHBEJLS-UPHRSURJSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- KKHUSADXXDNRPW-UHFFFAOYSA-N malonic anhydride Chemical compound O=C1CC(=O)O1 KKHUSADXXDNRPW-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LUCXVPAZUDVVBT-UHFFFAOYSA-N methyl-[3-(2-methylphenoxy)-3-phenylpropyl]azanium;chloride Chemical compound Cl.C=1C=CC=CC=1C(CCNC)OC1=CC=CC=C1C LUCXVPAZUDVVBT-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- HDZGCSFEDULWCS-UHFFFAOYSA-N monomethylhydrazine Chemical compound CNN HDZGCSFEDULWCS-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- BSCJIBOZTKGXQP-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCCO BSCJIBOZTKGXQP-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- IIXYEVUNJFXWEB-UHFFFAOYSA-N n-hydroxy-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NO IIXYEVUNJFXWEB-UHFFFAOYSA-N 0.000 description 1
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- SFBTTWXNCQVIEC-UHFFFAOYSA-N o-Vinylanisole Chemical compound COC1=CC=CC=C1C=C SFBTTWXNCQVIEC-UHFFFAOYSA-N 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- GHJOIQFPDMIKHT-UHFFFAOYSA-N propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCC(O)CO GHJOIQFPDMIKHT-UHFFFAOYSA-N 0.000 description 1
- FZYDVDRIQZXXIW-UHFFFAOYSA-N propanoic acid;prop-2-enoic acid Chemical compound CCC(O)=O.OC(=O)C=C FZYDVDRIQZXXIW-UHFFFAOYSA-N 0.000 description 1
- RZWZRACFZGVKFM-UHFFFAOYSA-N propanoyl chloride Chemical compound CCC(Cl)=O RZWZRACFZGVKFM-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Definitions
- the invention belongs to the field of organic chemistry, and in particular relates to an oxime ester-containing photoinitiator, a synthesis thereof, a photosensitive resin composition containing the same, and an application thereof.
- a liquid crystal layer is usually disposed between two substrates, and each of the substrates is provided with opposing electrodes, and on the inner side of one of the substrates, opposite to the liquid crystal layer, red (R) is prepared.
- a color filter layer formed of each of green (G), blue (B), and black. Among them, the color weights of the respective colors of R, G, and B are usually distinguished in the form of a setting matrix.
- the methods for producing color filters mainly include dyeing method, printing method, pigment dispersion method and anode method, and the pigment dispersion method is most widely used.
- the pigment dispersion method is to apply a photosensitive resin composition containing a coloring material on a transparent substrate, and then perform image exposure, development, and post-cure as necessary, and repeat the processes to form a color filter image.
- the color filter pixels obtained by this method have high positioning accuracy and film thickness precision, excellent durability (such as light resistance and heat resistance), and few pinhole defects.
- BM is usually arranged in a grid, strip shape or mosaic between red, green and blue patterns to prevent the thin film transistor from malfunctioning due to light leakage or to prevent color mixing between colors. Contrast, which requires BM to have a high opacity. Therefore, how to form a high-efficiency BM using a photosensitive resin dispersed with a light-shielding pigment or a dye at low cost has become a research hot spot.
- the main performance is: the difference in crosslink density between the exposed portion and the unexposed portion and the exposed portion; the pigment insoluble in the developer lowers the developability, thereby causing the linearity of the pattern to be lowered, or the pattern to be peeled off, causing residue; .
- oxime ester compounds as photoinitiators has been well known to those skilled in the art and their activity is outstanding in color filter films (RGB), black matrix (BM), photo-spacers, ribs (rib). ) and other applications in the field of high-end photoresist.
- the commonly used oxime ester photoinitiator is mainly composed of carbazole or diphenyl sulfide group, and the cost is high, and the solubility with the matrix resin is often insufficient, so that the sensitivity is not affected. A lower cost and better solubility photoinitiator is the goal pursued.
- the object of the present invention is to provide a photoinitiator containing an oxime ester, a synthesis thereof, a photosensitive resin composition containing the same, and an application thereof, which is simple in synthesis, low in cost, and good in solubility, and is applied to a photocuring combination. Excellent storage stability and film forming properties.
- an oxime ester-containing photoinitiator having the structure represented by the following formula (I): Wherein R 1 each independently represents hydrogen, halogen, C 1 -C 20 linear or branched alkyl, C 4 -C 20 cycloalkylalkyl, C 2 -C 20 alkenyl, these groups -CH 2 - in the group may be optionally substituted by -O-; R 2 represents a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group or an alkylcycloalkyl group, or represents -R 4 -COO-R 5 , wherein R 4 represents a C 1 -C 10 alkylene group, a C 3 -C 10 cycloalkylene group, a C 6 -C 20 arylene group or a substituted arylene group, alkylene group wherein the non-terminal -
- R 1 each independently represents hydrogen, halogen, a C 1 -C 10 linear or branched alkyl group, a C 4 -C 10 cycloalkylalkyl group, and -CH 2 - in these groups may be It is optionally substituted by -O-.
- R 1 each independently represents hydrogen, a C 1 -C 6 straight or branched alkyl group, and one or two non-adjacent -CH 2 - in the alkyl group may be optionally -O - replaced.
- R 2 above represents a C 3 -C 10 cycloalkyl group, a C 4 -C 10 cycloalkylalkyl group or an alkylcycloalkyl group.
- R 2 represents a C 3 -C 6 cycloalkyl group, a C 1 -C 4 linear or branched alkyl group substituted at the end with a C 3 -C 6 cycloalkyl group, and a C 1 -C 4 alkane A substituted C 3 -C 6 cycloalkyl group.
- R 4 represents a C 1 -C 8 alkylene group, a C 3 -C 8 cycloalkylene group, a phenylene group, a substituted phenylene group, wherein the non-terminal-CH 2 - in the alkylene group and -CH 2 - in the cycloalkyl group may be optionally substituted by -O-, and CH in the phenyl group may be optionally substituted by N.
- R 4 represents a C 1 -C 4 alkylene group, a C 3 -C 6 cycloalkylene group, a phenylene group or a pyridylene group.
- R 5 above represents a C 1 -C 10 linear or branched alkyl group, a C 3 -C 10 cycloalkyl group, a C 4 -C 10 alkylcycloalkyl group or a cycloalkylalkyl group.
- R 5 represents a C 1 -C 6 linear or branched alkyl group, and a C 1 -C 4 linear or branched alkyl group substituted by a C 3 -C 6 cycloalkyl group.
- R 3 represents a C 1 -C 10 linear or branched alkyl group, a C 4 -C 10 cycloalkylalkyl group, a phenyl group or a C 2 -C 8 alkenyl group.
- R 3 represents a C 1 -C 6 linear or branched alkyl group, and a C 1 -C 4 linear or branched alkyl group having a terminal substituted with a C 3 -C 6 cycloalkyl group.
- a photosensitive resin composition comprising the following components: (A) a compound having an ethylenically unsaturated bond, and the compound having an ethylenically unsaturated bond is used for radical polymerization a reaction; (B) a photoinitiator which is at least one of the compounds having a quinone compound represented by the formula (I):
- X represents a linker or a carbonyl group;
- R 1 can form a ring;
- R 2 and R 3 independently of each other represent a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group,
- the photosensitive resin composition includes, in parts by mass, 0.1 to 100 parts of a compound having an ethylenically unsaturated bond, 1 to 5 parts of a photoinitiator, and 0 to 50 parts of a coloring agent, preferably having an ethylenically unsaturated bond.
- the mass portion of the compound is 30 to 80 parts, more preferably 40 to 70 parts; and preferably the mass part of the coloring agent is more than 0 and 80 parts or less, more preferably 5 to 40 parts.
- the compound having the quinone compound represented by the formula (I) as a main structure has the following structure:
- A represents hydrogen, nitro, C 1 -C 10 linear or branched alkyl
- X represents a linker or carbonyl
- the compound having the quinone compound represented by the formula (I) as a main structure includes the structure shown below:
- the derivative compound having the oxime compound represented by the formula (I) as a main structure is a compound represented by the formula (III), (IV), (V):
- M represents a linking group formed by dimerization of R 1 , R 2 and R 3
- M is an empty, C 1 -C 24 linear or branched alkylene group, and a C 6 -C 36 arylene group Or a heteroarylene group, -CH 2 - in M is optionally substituted by sulfur, oxygen, NH or a carbonyl group, and the hydrogen atom is optionally substituted by OH or NO 2 .
- the derivative compound having the oxime compound represented by the formula (I) as a main structure is a compound having the following structure:
- the photosensitive resin composition contains an alkali-soluble resin (D), and preferably the mass-soluble resin is used in an amount of more than 0 and not more than 80 parts, more preferably 20 to 60 parts.
- D alkali-soluble resin
- Another object of the present invention is to provide a process for the preparation of the above-mentioned oxime ester-containing photoinitiator having the structure of the formula (I), wherein R 2 in the formula (I) represents a C 3 - C 20 cycloalkyl group, C 4 when -C 20 cycloalkylalkyl or alkylcycloalkyl, the preparation process comprises the steps of:
- the raw material b is R 2 '-CO-Cl, wherein R 2 ' represents R 2 or R 2 -CH 2 -, specifically, when X in the formula (I) is empty, R 2 ' represents R 2 , when X Is a carbonyl group, then R 2 ' represents R 2 -CH 2 -;
- intermediate b when X is empty, intermediate a undergoes deuteration reaction under the action of hydroxylamine hydrochloride and sodium acetate to form intermediate b; when X is a carbonyl group, it exists in organic solvent and concentrated hydrochloric acid. Next, intermediate a and nitrite or nitrite at room temperature to carry out the oximation reaction to form intermediate b;
- R 2 in the formula (I) represents -R 4 -COO-R 5 , wherein R 4 represents a C 1 -C 10 alkylene group, a C 3 -C 10 cycloalkylene group, a C 6 -C 20 arylene or substituted arylene group, alkylene group wherein the non-terminal -CH 2 - cycloalkyl and the -CH 2 - can optionally be replaced by -O-, aryl group may be CH Optionally substituted by N; R 5 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 alkylcycloalkyl group or a cycloalkyl group; An alkyl group, a C 6 -C 30 aryl or substituted aryl group, a C 7 -C 30 aralkyl group, a C 2 -C 20 alkenyl group, wherein -
- R 2 ' represents R 4 or CH 2 -R 4 , specifically, when X in the formula (I) is empty, R 2 ' represents R 4 , and when X is a carbonyl group, R 2 ' Represents CH 2 -R 4 ;
- intermediate b' is heated and refluxed with starting material c, ie, alcohol R 5 OH in the presence of concentrated sulfuric acid or heteropoly acid, to effect an esterification reaction to obtain intermediate b',
- the raw materials used are all known compounds in the prior art, and can be easily prepared commercially or by a known synthesis method.
- steps (1)-(3) and (1')-(4') are conventional reactions in the art for synthesizing similar compounds.
- the specific reaction conditions are readily ascertainable to those skilled in the art on the basis of the synthetic idea disclosed in the present invention.
- the reaction temperature is usually -10 to 30 °C.
- the organic solvent to be used is not particularly limited as long as it can dissolve the raw material and has no adverse effect on the reaction, such as dichloromethane, dichloroethane, benzene, toluene, xylene, and the like.
- the reaction temperature may be normal temperature, and the organic solvent to be used is not particularly limited as long as it can dissolve the raw materials and has no adverse effect on the reaction, such as dichloromethane, dichloroethane, Benzene, toluene, xylene, etc.
- Aluminum trichloride or zinc chloride can be introduced into the reaction system by dropwise addition or in portions.
- the deuteration reaction in the step (2) is carried out in a solvent system, and the solvent to be used is not particularly limited as long as the raw material can be dissolved and the reaction is not adversely affected.
- the esterification reaction in the step (2') may or may not be carried out as needed.
- a solvent the kind thereof is not particularly limited as long as it can dissolve the raw material and has no adverse effect on the reaction.
- the deuteration reaction in the step (2) and the step (3') is carried out in a solvent system, and the solvent to be used is not particularly limited as long as the raw material can be dissolved and the reaction is not adversely affected.
- the solvent used may be a mixed solvent of an alcohol and water, preferably a mixed solvent of ethanol and water.
- the reaction is carried out under reflux with heating.
- X is a carbonyl group
- the organic solvent used may be dichloromethane, benzene, toluene, tetrahydrofuran or the like
- the nitrite used may be selected from the group consisting of ethyl nitrite, isoamyl nitrite, isooctyl nitrite, etc.
- the nitrate may be selected from sodium nitrite, potassium nitrite, and the like.
- the esterification reaction in the step (3) is carried out in an organic solvent, and the kind of the solvent is not particularly limited as long as it can dissolve the raw material and has no adverse effect on the reaction, such as dichloromethane, dichloroethane, benzene, toluene, and Toluene, etc.
- the esterification reaction in the step (4') is carried out in an organic solvent, and the type of the solvent is not particularly limited as long as the raw material can be dissolved and the reaction is not adversely affected, and dichloromethane, dichloroethane, benzene, and xylene are preferable. .
- the oxime ester-containing compound represented by the above formula (I) may also be polymerized by R 1 (one or two), R 2 or R 3 to form a dimer. These dimerization products are believed to exhibit similar application properties to the oxime ester-containing photoinitiators represented by formula (I).
- Another object of the present invention is to provide the use of the oxime ester-containing photoinitiator represented by the above formula (I) in a photocurable composition (i.e., a photosensitive composition).
- a photocurable composition i.e., a photosensitive composition
- the photoinitiator can be applied to color resists (RGB), black matrix (BM), photo-spacers, ribs, dry films, semiconductor photoresists, inks, and the like. aspect.
- the photoinitiator has excellent solubility in application, good storage stability, low exposure requirement (ie, high sensitivity), and exhibits good developability and pattern integrity.
- the polymerizable composition of the present invention may be used in combination with an alkali-soluble resin.
- the alkali-soluble resin (D) preferably functions as a binder, and is preferably soluble alkali-developed for the developer used in the development treatment step when forming an image pattern.
- the liquid is preferably an alkali-soluble resin containing a carboxyl group-containing copolymer, and particularly preferably a copolymer of an ethylenically unsaturated monomer having one or more carboxyl groups and another copolymerizable ethylenically unsaturated monomer.
- Another object of the present invention is to provide an application of the above photosensitive resin composition for preparing a color filter film, a black matrix, a photo spacer, a rib gate, and a photoresist for a dry film.
- composition of the photosensitive resin composition of the present invention is reasonable in composition, and the composition has a very high sensitivity, and can be cross-linked and cured well at a very low exposure dose, and the curing effect is excellent.
- the film made of the composition has a flat edge without defects, no scum, a clear and clear pattern, and high hardness.
- the prepared filter has high optical transparency, no light leakage, and is produced at a very low exposure dose, and has high precision, flatness and durability.
- an exemplary embodiment of the present application provides an oxime ester-containing photoinitiator. It has the structure shown by the following formula (I): Wherein R 1 each independently represents hydrogen, halogen, C 1 -C 20 linear or branched alkyl, C 4 -C 20 cycloalkylalkyl, C 2 -C 20 alkenyl, these groups -CH 2 - in the group may be optionally substituted by -O-; R 2 represents a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group or an alkylcycloalkyl group, or represents -R 4 -COO-R 5 , wherein R 4 represents a C 1 -C 10 alkylene group, a C 3 -C 10 cycloalkylene group, a C 6
- the above compounds are simple in synthesis, low in cost, and have good solubility, and have excellent storage stability and film forming properties when applied to a photocurable composition.
- a photosensitive resin composition comprising the following components: (A) a compound having an ethylenically unsaturated bond, and a compound having an ethylenically unsaturated bond for use in freedom a base polymerization reaction; (B) a photoinitiator, wherein the photoinitiator is at least one of a compound having a quinone compound represented by the formula (I):
- X represents a linker or a carbonyl group;
- R 1 can form a ring;
- R 2 and R 3 independently of each other represent a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group,
- the compound having the above structure (I) is simple in synthesis, low in cost, and good in solubility, it has excellent storage stability and film forming properties when applied to a photocurable composition.
- the components of the photosensitive resin composition are reasonable in combination, and the composition has a very high sensitivity, and can be cross-linked and cured at a very low exposure dose, and the curing effect is excellent.
- the film made of the composition has a flat edge without defects, no scum, a clear and clear pattern, and high hardness.
- the prepared filter has high optical transparency, no light leakage, and is produced at a very low exposure dose, and has high precision, flatness and durability.
- the photosensitive resin composition of the present invention has high sensitivity and good developability, high resolution, and excellent adhesion to a substrate, and is very suitable for preparing a black matrix having high light-shielding property, high-definition and high-quality color filter. And liquid crystal display devices, and can also be applied to photo spacers and ribs.
- the photosensitive resin composition of the present invention contains the components (A), (B) and optional components (C), (D), which will be described in more detail below.
- the component (A) is a compound having a radically polymerizable ethylenically unsaturated bond or/and an epoxy compound.
- the compound having a radically polymerizable ethylenically unsaturated bond may have a monomer, an oligomer, a polymer, etc. as long as it has at least one radically polymerizable ethylenically unsaturated bond in the molecule. Chemical form.
- Examples of such a compound having a radically polymerizable ethylenically unsaturated bond include unsaturated carboxylic acids such as acrylates, methacrylates, itaconic acid, crotonic acid, isocrotonic acid, and maleic acid. And its salts, esters, carbamates, amides and anhydrides, acrylonitrile, styrene, vinyl ethers, as well as various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, unsaturated polyurethanes and other free radicals
- the polymerizable compound is not limited to the invention.
- the acrylic compound of the present invention may be exemplified by methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, isoamyl acrylate, hexyl acrylate, acrylic acid-2- Ethylhexyl ester, octyl acrylate, decyl acrylate, dodecyl acrylate, octadecyl acrylate, isobornyl acrylate, cyclohexyl acrylate, dicyclopentenyl acrylate, dicyclopentenyl oxyacrylate Ester, benzyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxy-3-chloropropyl acrylate, 2-hydroxy-3-phenoxypropyl acrylate, acrylic acid 2-hydroxy-3-allyloxypropyl ester, 2-acryloyloxyethyl-2-hydroxypropyl
- the methacrylic compound of the present invention may be exemplified by methyl methacrylate, ethyl methacrylate, hydroxyethyl methacrylate, propyl methacrylate, isopropyl methacrylate, Butyl methacrylate, isoamyl methacrylate, hexyl methacrylate, 2-hexyl methacrylate, 2-ethylhexyl methacrylate, octyl methacrylate, decyl methacrylate , lauryl methacrylate, octadecyl methacrylate, isobornyl methacrylate, cyclohexyl methacrylate, dicyclopentenyl methacrylate, dicyclopentenyloxy methacrylate Ester, benzyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxy-3-chloropropyl methacrylate, 2-hydroxy
- the present invention may also be exemplified by allyl glycidyl ether, diallyl phthalate, triallyl trimellitate, triallyl isocyanurate, acrylamide, N-hydroxyl Methacrylamide, diacetone acrylamide, N,N-dimethylacrylamide, N,N-diethylacrylamide, N-isopropylacrylamide, acryloylmorpholine, styrene, p-hydroxystyrene , p-chlorostyrene, p-bromostyrene, p-methylstyrene, vinyl acetate, vinyl chloride, vinyl benzoate, vinyl pivalate, vinyl butyrate, vinyl laurate, hexan Acid divinyl ester and the like.
- the radically polymerizable compound (A) of the present invention may be used singly or in combination of two or more kinds in any ratio in order to improve desired properties.
- the component (A) may be used in the photosensitive resin composition in an amount of from 0.1 to 100 parts by mass, preferably from 30 to 80 parts by mass, more preferably from 40 to 70 parts by mass.
- the component (B) photoinitiator used in the present invention is selected from the group consisting of an anthracene compound represented by the formula (I) or the formula (II) and a derivative compound having a compound represented by the formula (I) or the formula (II) as a main structure. At least one.
- the photoinitiator may be composed only of an anthracene compound represented by the formula (I) or the formula (II) or a derivative compound having a main structure thereof, or a combination of two types of compounds.
- X represents a linker or a carbonyl group;
- R 1 can form a ring;
- R 2 and R 3 independently of each other represent a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group,
- the quinone compound represented by the formula (I) or the formula (II) includes the compounds 1' to 30' represented by the following structures:
- the above-mentioned derivative compound having a compound represented by the formula (I) or the formula (II) as a main structure means that the main structure of the compound of the formula (I) or the formula (II) is maintained, and the branches are substituted or linked to each other. And the resulting derivative.
- the derivative compound having a compound represented by the formula (I) or the formula (II) as a main structure is represented by the following formulas (III), (IV), (V), (VI). , the compound shown in (VIII):
- M represents a linking group formed by dimerization of R 1 , R 2 , R 3 , R 6 , R 7 and R 8 , and M is an empty, C 1 -C 24 linear or branched alkylene group,
- An arylene or heteroarylene group of C 6 -C 36 , -CH 2 - in M is optionally substituted by sulfur, oxygen, NH or a carbonyl group, and the hydrogen atom is optionally substituted by OH or NO 2 .
- the above derivative compound may be a compound of the following structure:
- the amount of the component (B) used in the photosensitive resin composition is preferably from 1 to 5 parts by mass.
- the photosensitive resin composition of the present invention may further contain a component (C) colorant.
- C component
- the composition of the present invention can be used to form a color filter of a liquid crystal display by containing a colorant; and when an opacifier is used as a colorant, the composition can be used to form a black matrix in a color filter of a display device. Picture tube.
- the present invention is not particularly limited to the kind of the component (C) coloring agent, and may be those classified as a pigment in a color index (CI; published by The Society of Dyers and Colourists), preferably having The colorant of the following CI number, such as CI Pigment Yellow 1 (hereinafter, "CI Pigment Yellow” is the same, only the serial number is described), 3, 11, 12, 13, 14, 15, 16, 17, 20, 24 , 31, 53, 55, 60, 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113 , 114, 116, 117, 119, 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168 , 175, 180, 185; CI Pigment Orange 1
- a black pigment As an opacifier, it is preferred to use a black pigment as an opacifier.
- the black pigment include carbon black, titanium black, metal oxides such as copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, and silver, composite oxides, metal sulfides, and metal sulfuric acid. Salt or metal carbonate, etc.
- carbon black having high light-shielding property is preferably used, and it may be a common carbon black such as channel black, furnace black, thermal black, or lampblack, and it is preferable to use a grooved carbon having excellent light shielding properties. Black; carbon black can also be coated with a resin.
- the component (C) is used in the photosensitive resin composition in an amount of 0 to 50 parts by mass, preferably 5 to 40 parts by mass.
- the polymerizable composition of the present invention may be used in combination with an alkali-soluble resin.
- the alkali-soluble resin (D) preferably functions as a binder, and is preferably soluble alkali-developed for the developer used in the development treatment step when forming an image pattern.
- the liquid is preferably an alkali-soluble resin as a carboxyl group-containing copolymer, particularly preferably an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as "carboxy group-containing unsaturated monomer” (P)) and other copolymerizable olefins.
- a copolymer of a saturated monomer hereinafter referred to as "copolymerizable unsaturated monomer" (Q)) (hereinafter referred to as "carboxyl-containing copolymer” (R)).
- carboxyl group-containing unsaturated monomer examples include the following compounds: unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, ⁇ -chloroacrylic acid, and cinnamic acid; maleic acid, maleic anhydride, fumaric acid, and itaconol.
- unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, ⁇ -chloroacrylic acid, and cinnamic acid
- maleic acid maleic anhydride
- fumaric acid and itaconol.
- An unsaturated dicarboxylic acid such as acid, itaconic anhydride, citraconic acid, citraconic anhydride or mesaconic acid or an anhydride thereof; a trivalent or higher unsaturated polycarboxylic acid or an anhydride thereof; succinic acid mono(2-acryloyl) Oxyethyl), succinic acid mono(2-methacryloyloxyethyl), phthalic acid mono(2-acryloyloxyethyl), phthalic acid mono(2-methacryloyl) Mono[(meth)acryloyloxyalkyl]esters of divalent or higher polycarboxylic acids such as oxyethyl); ⁇ -carboxypolycaprolactone monoacrylate, ⁇ -carboxypolycaprolactone monomethyl A mono(meth)acrylate or the like of a polymer having a carboxyl group and a hydroxyl group at both terminals, such as a acrylate.
- examples of the copolymerizable unsaturated monomer include styrene, ⁇ -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, and o-methoxystyrene.
- An aromatic vinyl compound such as benzyl glycidyl ether or p-vinylbenzyl glycidyl ether; an unsaturated carboxylic acid glycidyl ester such as hydrazine glycidyl acrylate or glycidyl methacrylate such as hydrazine or 1-methyl hydrazine; Vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate, unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether, acrylonitrile , cyan
- carboxyl group-containing copolymer (R)) in the present invention is obtained by polymerizing (P) and (Q); the (P) is acrylic acid and/or methacrylic acid.
- it may further contain, depending on the case, succinic acid mono(2-acryloyloxyethyl), succinic acid mono(2-methacryloyloxyethyl), ⁇ -carboxypolycaprolactone monoacrylate And a carboxyl group-containing unsaturated monomer component of at least one compound of ⁇ -carboxypolycaprolactone monomethacrylate; said (Q) being selected from the group consisting of styrene, methyl acrylate, methyl methacrylate, and acrylic acid 2-hydroxyethyl ester, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, glycerin monoacrylate, glycerol monomethacrylate At least one of N-phenylmaleimide, polystyrene macromonomer, and polymethyl methacrylate macromonomer.
- carboxyl group-containing copolymer (R) examples include (meth)acrylic acid/methyl (meth)acrylate copolymer, (meth)acrylic acid/benzyl (meth)acrylate copolymer, and (methyl).
- the alkali-soluble resin (D) may be used singly or in combination of two or more.
- the component (D) is used in the photosensitive resin composition in an amount of from 0 to 80 parts by mass, preferably from 20 to 60 parts by mass.
- one or more macromolecules or polymer compounds may be added to the composition as needed to improve the application performance of the composition during use.
- the macromolecular or high molecular compound may be a polyol or Polyester polyols may also be optionally added to polymers which do not contain reactive functional groups. These polymers are usually resins containing acidic functional groups such as phenolic hydroxyl groups and hydroxyl groups, and may also be used in combination with other photoinitiators.
- auxiliary agents conventionally used in the art, including but not limited to sensitizers, dispersants, surfactants, solvents and the like, may be optionally added to the photosensitive resin composition of the present invention.
- the polymerizable composition of the present invention is polymerized by imparting energy generated by ultraviolet rays, visible rays, near infrared rays, or the like during the polymerization reaction, and a target polymer can be obtained.
- a light source for imparting energy a light source having a dominant wavelength that emits light in a wavelength region of 250 nm to 450 nm is preferable.
- Examples of the light source having a dominant wavelength of light emitted in a wavelength region of 250 nm to 450 nm include an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a medium pressure mercury lamp, a mercury xenon lamp, a metal halide lamp, and a high power metal halide lamp.
- xenon lamp pulsed xenon lamp, xenon lamp, Led lamp, fluorescent lamp, Nd-YAG3 double-wave laser, He-Cd laser, nitrogen laser, Xe-Cl excimer laser, Xe-F excimer laser, semiconductor excited solid laser, etc.
- kind of light source
- the photosensitive resin composition of the present invention can be obtained by weighing each component by weight and uniformly mixing it, which is a well-known conventional technique to those skilled in the art.
- the method generally comprises the steps of: i) dissolving the photosensitive resin composition in a suitable organic solvent, mixing uniformly to obtain a liquid composition; ii) using a coater such as a spin coater, a wire bar coater, a shaft a coating machine or a spray coater or the like, uniformly coating the liquid composition on the substrate; iii) performing pre-baking drying to remove the solvent; iv) attaching the mask to the sample for exposure, and then developing to remove the unexposed area ; v) post-baking to obtain a dry film of photoresist having a desired shape.
- a coater such as a spin coater, a wire bar coater, a shaft a coating machine or a spray coater or the like
- a photoresist film containing a black pigment is a black matrix BM
- a photoresist film containing red, green, and blue pigments is a corresponding R, G, and B photoresist.
- the material was slowly poured into diluted hydrochloric acid of 800 g of ice water and 100 mL of concentrated hydrochloric acid (37%), and stirred while stirring. Pour into the separatory funnel, separate the lower layer of methylene chloride, and continue to wash the aqueous layer with 50 mL of dichloromethane, and combine the methylene chloride layer, and wash with a 5% aqueous solution of sodium bicarbonate (300 mL each time, 3 times) The methylene chloride layer was washed with water to a neutral pH. The methylene chloride layer was dried over 150 g of anhydrous magnesium sulfate. After filtration, the methylene chloride product solution was evaporated. The methanol was recrystallized and dried in an oven at 70 ° C for 2 h to obtain 141 g. intermediate 1a, yield 78%, purity 98%, MS (m / z ): 364 (m + 1) +.
- the structure of the product was confirmed by nuclear magnetic resonance spectroscopy and mass spectrometry.
- the material was slowly poured into diluted hydrochloric acid of 800 g of ice water and 100 mL of concentrated hydrochloric acid (37%), and stirred while stirring. Pour into the separatory funnel, separate the lower layer of methylene chloride, and continue to wash the aqueous layer with 50 mL of dichloromethane, and combine the methylene chloride layer, and wash with a 5% aqueous solution of sodium bicarbonate (300 mL each time, 3 times) The methylene chloride layer was washed with water to a neutral pH. The methylene chloride layer was dried over 150 g of anhydrous magnesium sulfate. After filtration, the methylene chloride product solution was evaporated. The crystals were recrystallized from methanol and dried at 70 ° C for 2 h to give 127 g. intermediate 2a, yield 79%, purity 98%, MS (m / z ): 322 (m + 1) +.
- the structure of the product was confirmed by nuclear magnetic resonance spectroscopy and mass spectrometry.
- the methylene chloride layer was washed with a 5% aqueous sodium hydrogencarbonate solution (300 mL each time), and then the methylene chloride layer was washed with water until the pH was neutral.
- the methylene chloride layer was dried over 150 g of anhydrous magnesium sulfate. After filtration, the methylene chloride product solution was evaporated, and then recrystallized from methanol, and dried in an oven at 70 ° C for 2 h to obtain 143 g of intermediate 13a, yield 87%, purity 99%, MS ( m/z): 326(M+1) + .
- the structure of the product was confirmed by nuclear magnetic resonance spectroscopy and mass spectrometry.
- the aqueous layer was further washed with 50 mL of dichloromethane, and the methylene chloride layer was combined.
- the methylene chloride layer was washed with a 5% aqueous sodium hydrogencarbonate solution (300 mL each time), and then the methylene chloride layer was washed with water until the pH was neutral.
- the methylene chloride layer was dried over 150 g of anhydrous magnesium sulfate. After filtration, the methylene chloride product solution was evaporated, and then recrystallized from methanol and dried in oven at 70 ° C for 2 h to obtain 134 g of intermediate 14a, yield 86%, purity 99%, MS (m /z): 312(M+1) + .
- the structure of the product was confirmed by nuclear magnetic resonance spectroscopy and mass spectrometry.
- the solubility of the photoinitiator in PGMEA is one of the index parameters representing its solubility properties and the performance of the photoinitiator.
- the compounds of the formula (I) of the present invention were compared with the existing nitrooxazolium ester-based photoinitiators as compared, and their solubility in PGMEA at 25 ° C was tested, respectively, and the results are shown in Table 2.
- the two existing nitrooxazolium ester-based photoinitiators as comparative compounds are substantially insoluble in PGMEA, while the compounds of the present invention have good solubility in PGMEA. Both meet the requirements of more than 8% by weight of solubility in industrial applications.
- the storage stability and film forming properties of the photoinitiator represented by the formula (I) of the present invention were evaluated by formulating an exemplary photocurable composition.
- the photoinitiator is an oxime ester-containing compound represented by the formula (I) disclosed in the present invention or a photoinitiator known in the prior art (for comparison).
- the degree of precipitation of the substance was visually evaluated according to the following criteria: A: no precipitation was observed; B: precipitation was slightly observed; C: significant precipitation was observed.
- An exemplary photocurable composition having the above composition was stirred under a yellow light, and a film was formed by roll coating on a PET template, and dried at 90 ° C for 2 minutes to obtain a coating film having a dry film thickness of 2 ⁇ m.
- the substrate on which the coating film was formed was cooled to room temperature, a mask was attached, and a long-wavelength radiation was realized by a FWHM filter using a high-pressure mercury lamp 1 PCS light source.
- the coating film was exposed to ultraviolet light at a wavelength of 370-420 nm through a slit of a mask, and then immersed in a 2.5% sodium carbonate solution for 20 s at 25 ° C, washed with ultrapure water, air-dried, and hard baked at 220 ° C. Bake for 30 minutes to fix the pattern and evaluate the obtained pattern.
- the minimum exposure amount at which the residual film ratio is 90% or more after development in the light irradiation region in the exposure step is evaluated as the exposure demand amount.
- the substrate pattern was observed with a scanning electron microscope (SEM) to evaluate developability and pattern integrity.
- the developability was evaluated according to the following criteria: ⁇ : no residue was observed in the unexposed portion; ⁇ : a small amount of residue was observed in the unexposed portion, but the residue was acceptable; ⁇ : Obvious residue was observed in the unexposed portion.
- the pattern integrity was evaluated according to the following criteria: ⁇ : no pattern defects were observed; ⁇ : a small portion of the pattern was observed to be somewhat defective; ⁇ : Many pattern defects were clearly observed.
- the photocurable composition containing the oxime ester-containing photoinitiator of the present invention has good storage stability and exposure requirements compared to the existing nitrooxazolium ester-based photoinitiator.
- the amount is low, both lower than 60 mJ/cm 2 , and the development effect and pattern integrity are better, and the film forming property is very excellent.
- the oxime ester-containing photoinitiator of the formula (I) disclosed in the present invention has superior application performance, low raw material and low preparation cost, and has a good application prospect.
- the photosensitive resin composition prepared according to the formulation shown in Table 4 was dissolved in 100 parts by mass of solvent propylene glycol monomethyl ether acetate (PGMEA), and uniformly mixed to form a liquid composition;
- PGMEA solvent propylene glycol monomethyl ether acetate
- the liquid composition was coated on a glass substrate by a spin coater, and then the solvent was removed by drying at 100 ° C for 5 minutes to form a coating film having a film thickness of 10 ⁇ m; in order to obtain the coating film of the above thickness, the coating process may be completed once. Can also be divided into multiple times;
- LED light source Ilethora LED UV curing irradiation device, maximum irradiation intensity 400mW/cm 2 ), pass the gap of the mask plate at the wavelength of 370-420nm Exposing the coating film under ultraviolet irradiation;
- the minimum exposure amount at which the residual film ratio is 90% or more after development in the light irradiation region in the exposure step is evaluated as the exposure demand amount, and the smaller the exposure demand amount, the higher the sensitivity.
- the pattern on the substrate was observed with a scanning electron microscope (SEM) to evaluate developability and pattern integrity.
- the developability was evaluated according to the following criteria:
- Pattern integrity is evaluated according to the following criteria:
- Evaluation is carried out in accordance with GB/T 6739-1996 "Coating film hardness pencil measurement method". Use a film pencil scratch hardness tester to observe the scratch marks of the paint film, and use a pencil with no scratches as the pencil hardness of the coating film.
- the filter photoresists produced by the compositions of Examples 53-60 have excellent developability and pattern integrity, and are excellent in adhesion and hardness, and Comparative Example 5 -8 is clearly insufficient in these areas. It is to be noted that the exposure doses of Examples 53 to 60 were each not higher than 70 mJ/cm 2 , which was far lower than Comparative Examples 5 to 8, and exhibited extremely excellent photosensitivity.
- the photosensitive resin composition of the present invention exhibits very excellent application properties and has broad application prospects.
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Abstract
Description
Claims (24)
- 一种含芴肟酯类光引发剂,其特征在于,具有如下式(I)所示结构:其中,R1各自独立地代表氢、卤素、C1-C20的直链或支链烷基、C4-C20的环烷基烷基、C2-C20的链烯基,这些基团中的-CH2-可任选地被-O-取代;R2代表C3-C20的环烷基、C4-C20的环烷基烷基或烷基环烷基,或者代表-R4-COO-R5,其中,R4代表C1-C10的亚烷基、C3-C10的亚环烷基、C6-C20的亚芳基或取代亚芳基,其中亚烷基中的非末端-CH2-和环烷基中的-CH2-可任选地被-O-所取代,芳基中的CH可任选地被N所取代;R5代表C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的烷基环烷基或环烷基烷基、C6-C30的芳基或取代芳基、C7-C30的芳烷基、C2-C20的链烯基,其中的-CH2-可任选地被-O-、-S-或-NH-所取代;R3代表C1-C20的直链或支链烷基、C3-C20环烷基、C4-C20的烷基环烷基或环烷基烷基、C6-C30的芳基或取代芳基、C7-C30的芳烷基、C2-C20的链烯基;A代表氢、卤素、硝基、C1-C10的直链或支链烷基、C4-C10的烷基环烷基或环烷基烷基;X代表空或羰基,其中空表示X两端的两个原子直接相连。
- 根据权利要求1所述的含芴肟酯类光引发剂,其特征在于:所述R1各自独立地代表氢、卤素、C1-C10的直链或支链烷基、C4-C10的环烷基烷基,这些基团中的-CH2-可任选地被-O-取代。
- 根据权利要求1或2所述的含芴肟酯类光引发剂,其特征在于:所述R1各自独立地代表氢、C1-C6的直链或支链烷基,且烷基中的一个或两个不相邻的-CH2-可任选地被-O-取代。
- 根据权利要求1所述的含芴肟酯类光引发剂,其特征在于:所述R2代表C3-C10的环烷基、C4-C10的环烷基烷基或烷基环烷基。
- 根据权利要求1或4所述的含芴肟酯类光引发剂,其特征在于:所述R2代表C3-C6的环烷基、末端被C3-C6环烷基取代的C1-C4的直链或支链烷基、被C1-C4烷基取代的C3-C6环烷基。
- 根据权利要求1所述的含芴肟酯类光引发剂,其特征在于:所述R4代表C1-C8的亚烷基、C3-C8的亚环烷基、亚苯基、取代亚苯基,其中亚烷基中的非末端-CH2-和环烷基中的-CH2-可任选地被-O-所取代,苯基中的CH可任选地被N所取代。
- 根据权利要求1或6所述的含芴肟酯类光引发剂,其特征在于:所述R4代表C1-C4的亚烷基、C3-C6的亚环烷基、亚苯基、亚吡啶基。
- 根据权利要求1所述的含芴肟酯类光引发剂,其特征在于:所述R5代表C1-C10的直链或支链烷基、C3-C10的环烷基、C4-C10的烷基环烷基或环烷基烷基。
- 根据权利要求1或8所述的含芴肟酯类光引发剂,其特征在于:所述R5代表C1-C6的直链或支链烷基、被C3-C6环烷基取代的C1-C4的直链或支链烷基。
- 根据权利要求1所述的含芴肟酯类光引发剂,其特征在于:所述R3代表C1-C10的直链或支链烷基、C4-C10的环烷基烷基、苯基、C2-C8的链烯基。
- 根据权利要求1或10所述的含芴肟酯类光引发剂,其特征在于:所述R3代表C1-C6的直链或支链烷基、末端被C3-C6环烷基取代的C1-C4的直链或支链烷基。
- 根据权利要求1所述的含芴肟酯类光引发剂,其特征在于:所述A是硝基。
- 一种感光性树脂组合物,其特征在于,包含下列组分:(A)具有烯属不饱和键的化合物,所述具有烯属不饱和键的化合物用于自由基聚合反应;(B)光引发剂,所述光引发剂为以式(I)所示的芴类化合物为主体结构的化合物中的至少一种:其中,A代表氢、卤素、硝基、C1-C10的直链或支链烷基、C3-C10的烷基环烷基、C4-C10的烷基环烷基或环烷基烷基,A中的-CH2-能够被O、N、S或C(=O)所取代;X代表连接符或羰基;R1代表氢、卤素、C1-C20的直链或支链烷基、C4-C20的环烷基烷基或C2-C20的链烯 基,R1中的-CH2-能够被O、N、S或C(=O)所取代,R1之间能够成环;R2和R3相互独立地表示C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基或C4-C20的烷基环烷基,R2和R3中的-CH2-能够被O、N、S或C(=O)所取代;(C)着色剂。
- 根据权利要求13所述的感光性树脂组合物,其特征在于,A代表氢、硝基、C1-C10的直链或支链烷基;X代表连接符或羰基;R1代表氢、C1-C20的直链或支链烷基或被O、N、S或C(=O)所取代的C1-C20的直链或支链烷基;R2和R3相互独立地表示C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基或C4-C20的烷基环烷基,R2和R3中的-CH2-能被O、N、S或C(=O)所取代。
- 权利要求1所述的感光性树脂组合物,其特征在于,所述感光性树脂组合物进一步含有碱溶性树脂(D),优选所述碱溶性树脂的质量份为大于0且小于等于80份,更优选为20~60份。
- 权利要求1-12中任一项所述的含芴肟酯类光引发剂的制备方法,其特征在于,式(I)中的R2代表C3-C20的环烷基、C4-C20的环烷基烷基或烷基环烷基,所述制备方法包括以下步骤:(1)中间体a的合成原料a与原料b在三氯化铝或氯化锌的催化作用下于有机溶剂中发生傅克酰基化反应,得到中间体a,原料b即R2’-CO-Cl中,其中R2’表示R2或者R2-CH2-,具体是,当式(I)中X为空,则R2’表示R2,当X为羰基,则R2’表示R2-CH2-;(2)中间体b的合成当X为空时,中间体a在盐酸羟胺、醋酸钠的作用下进行肟化反应,生成中间体b;当X为羰基时,在有机溶剂和浓盐酸存在下,中间体a与亚硝酸酯或亚硝酸盐于常温下进行肟化反应,生成中间体b;(3)式(I)化合物的合成中间体b与酸酐(R3-CO)2O或酰氯化合物R3-CO-Cl进行酯化反应,得到目标产物;式(I)中的R2代表-R4-COO-R5,其中,R4代表C1-C10的亚烷基、C3-C10的亚环烷基、C6-C20的亚芳基或取代亚芳基,其中亚烷基中的非末端-CH2-和环烷基中的-CH2-可任选地被-O-所取代,芳基中的CH可任选地被N所取代;R5代表C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的烷基环烷基或环烷基烷基、C6-C30的芳基或取代芳基、C7-C30的芳烷基、C2-C20的链烯基,其中的-CH2-可任选地被-O-、-S-或-NH-所取代(1)中间体a的合成,所述制备方法包括:(1’)中间体a的合成原料a与原料b’在三氯化铝或氯化锌的催化作用下于有机溶剂中发生傅克反应,生成中间体a’,原料b’的结构中,R2’表示R4或者CH2-R4,具体是,当式(I)中X为空,则R2’表示R4,当X为羰基,则R2’表示CH2-R4;(2’)中间体b’的合成中间体a’在浓硫酸或杂多酸存在条件下与原料c即醇R5OH加热回流,发生酯化反应,得到中间体b’,(3’)中间体c’的合成当X为空时,中间体b’在盐酸羟胺、醋酸钠的作用下进行肟化反应,生成中间体c’;当X为羰基时,在有机溶剂和浓盐酸存在下,中间体b’与亚硝酸酯或亚硝酸盐于常温下进行肟化反应,生成中间体c’;(4’)式(I)化合物的合成中间体c’与酸酐(R3-CO)2O或酰氯化合物R3-CO-Cl进行酯化反应,得到目标产物;
- 根据权利要求19的制备方法,其特征在于:所述步骤(2)和所述步骤(3’)中,当X为空时,使用的溶剂是醇和水的混合溶剂,反应在加热回流状态下进行。
- 根据权利要求19所述的制备方法,其特征在于:所述步骤(2)和所述步骤(3’)中,当X为羰基时,所用亚硝酸酯选自亚硝酸乙酯、亚硝酸异戊酯、亚硝酸异辛酯,所用亚硝酸盐选自亚硝酸钠、亚硝酸钾。
- 权利要求1-12中任一项所述的具有式(I)结构的含芴肟酯类光引发剂在光固化领域中的应用。
- 根据权利要求22所述的应用,其特征在于:所述光固化领域包括彩色光阻、黑色矩阵、光间隔物、肋栅、干膜、半导体光刻胶、油墨的制备。
- 权利要求13-18中任一项所述的感光性树脂组合物在制备彩色滤光片膜、光刻、黑色矩阵、光间隔物、肋栅、湿膜和干膜中的应用。
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