WO2017031771A1 - 一种彩色滤光片及其制作方法 - Google Patents

一种彩色滤光片及其制作方法 Download PDF

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Publication number
WO2017031771A1
WO2017031771A1 PCT/CN2015/088373 CN2015088373W WO2017031771A1 WO 2017031771 A1 WO2017031771 A1 WO 2017031771A1 CN 2015088373 W CN2015088373 W CN 2015088373W WO 2017031771 A1 WO2017031771 A1 WO 2017031771A1
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WO
WIPO (PCT)
Prior art keywords
spacer
black matrix
color resist
color
mask
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/088373
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English (en)
French (fr)
Inventor
汪丽芳
王聪
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Publication of WO2017031771A1 publication Critical patent/WO2017031771A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

Definitions

  • the present invention relates to the field of liquid crystals, and in particular to a color filter and a method of fabricating the same.
  • LTPS Low Temperature Poly-silicon, low-temperature polysilicon
  • PS is mainly used to provide support for the upper and lower glass substrates in the LTPS panel.
  • PS includes a different height of Main PS (main spacer) and Sub PS (auxiliary spacer), Main PS and Sub
  • Main PS main spacer
  • Sub PS auxiliary spacer
  • the shape of the conventional PS is generally trapezoidal, and its end away from the color filter is spherical.
  • the PS easily slips into the light-transmissive area of the pixel, thereby causing a situation in which the mura is also uneven in brightness of the display.
  • the technical problem to be solved by the present invention is to provide a color filter and a manufacturing method thereof, which can reduce the number of masks in the color filter manufacturing process, thereby reducing the manufacturing cost of the color filter, and at the same time improving the panel pressure. Then, there is a situation in which the spacers slide down to the light-transmitting area of the pixel to cause uneven brightness.
  • a technical solution adopted by the present invention is to provide a color filter comprising: a black matrix disposed on a substrate; a first color resist, a second color resist, and a third The color resistance is disposed on the substrate and is repeatedly arranged in sequence; the first spacer portion is obtained by the same process as the first color resist and is disposed on the black matrix; and the second spacer portion is obtained by the same process as the second color resist.
  • first spacer wherein the black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter; wherein the black matrix comprises a first black matrix and a second black matrix, the spacer
  • the first spacer and the second spacer are disposed, wherein the first black matrix and the second black matrix are spaced apart and have different heights, and the first black matrix, the first spacer, and the second spacer are overlapped to form a first a spacer, the second black matrix, the first spacer and the second spacer overlap to form a second spacer; wherein the first spacer is connected to the first color resist, the second spacer and the second color resist Connected, first Partition portion and the second spacer portion disposed between the first color and a second color resist barrier; one of them, the first spacer and the second spacer portion is a red color filter, green color filter and the blue color filter.
  • the ends of the first spacer and the second spacer are suspended in a planar shape.
  • another technical solution adopted by the present invention is to provide a method for fabricating a color filter, the method comprising: forming a black matrix on a substrate; forming a first on the substrate by using the first mask Color resistance and forming a first spacer on the black matrix; forming a second color resist arranged at intervals from the first color resist on the substrate through the second mask; and forming a second spacer on the first spacer;
  • the third mask forms a third color resist arranged on the substrate at intervals from the first color resist and the second color resist; wherein the black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter Things.
  • the black matrix includes a first black matrix and a second black matrix
  • the spacer includes a first spacer and a second spacer, wherein the first black matrix and the second black matrix are spaced apart and have different heights,
  • the first black matrix, the first spacer portion and the second spacer portion are overlapped to form a first spacer
  • the second black matrix, the first spacer portion and the second spacer portion are overlapped to form a second spacer.
  • the first spacer is connected to the first color resist
  • the second spacer is connected to the second color resist
  • the first spacer and the second spacer are formed between the first color resist and the second color resist.
  • the first mask and the second mask are semi-transmissive masks, wherein the first mask comprises a first light-transmissive region for forming a first color resist, and is used for forming the first spacer a second light-transmissive region and a light-shielding region spaced apart from the first light-transmitting region, the second mask plate includes a first light-transmissive region for forming a second color resist, and a second transparent portion for forming the second spacer portion a light zone and a light shielding zone spaced apart from the first light transmission zone.
  • the third mask is a semi-transmissive mask, wherein the third mask comprises a semi-transmissive region for forming a third color resist and a light-shielding region spaced apart from the semi-transmissive region.
  • a color filter comprising: a black matrix disposed on a substrate; a first color resist, a second color resist, and a first color resist
  • the three color resists are disposed on the substrate and are repeatedly arranged in sequence; the first spacer portion is obtained by the same process as the first color resist and is disposed on the black matrix; and the second spacer portion is obtained by the same process as the second color resist. And forming a spacer of the color filter after the black matrix, the first spacer and the second spacer overlap.
  • the black matrix includes a first black matrix and a second black matrix
  • the spacer includes a first spacer and a second spacer, wherein the first black matrix and the second black matrix are spaced apart and have different heights,
  • the first black matrix, the first spacer portion and the second spacer portion are overlapped to form a first spacer
  • the second black matrix, the first spacer portion and the second spacer portion are overlapped to form a second spacer.
  • the first spacer is connected to the first color resist
  • the second spacer is connected to the second color resist
  • the first spacer and the second spacer are disposed between the first color resist and the second color resist.
  • the first spacer portion and the second spacer portion are one of a red color resist, a green color resist, and a blue color resist.
  • the ends of the first spacer and the second spacer are suspended in a planar shape.
  • the color filter of the present invention and the manufacturing method thereof have the first mask formed on the substrate by the first mask and the first spacer formed on the black matrix, and the substrate is disposed on the substrate through the second mask Forming a second color resist arranged at intervals from the first color resist and forming a second spacer on the first spacer, wherein the black matrix, the first spacer and the second spacer overlap to form a color filter spacer Pad.
  • the present invention does not require an additional mask process to manufacture the spacer, which reduces the manufacturing cost of the color filter, and the spacer is formed by overlapping the black matrix, the first color resist and the second color resist. When the panel is squeezed, the spacer does not slip into the light transmissive area of the pixel to cause a mura condition.
  • FIG. 1 is a schematic structural view of a mask used for forming a color resist in a color filter process of the present invention
  • FIG. 2 is a schematic flow chart of a method for fabricating a color filter of the present invention
  • 3A-3F are schematic structural views of a color filter in the process of the present invention.
  • FIG. 4 is a first sectional structural view of a color filter of the present invention.
  • Figure 5 is a schematic view showing the second cross-sectional structure of the color filter of the present invention.
  • the mask includes a first mask 100, a second mask 200, and a third mask 300.
  • the first mask 100 is a semi-transparent mask, which is specifically HTM (half-tone) Mask) Semi-transparent mask.
  • the first mask 100 includes a first light transmitting region 101 for forming a first color resist, a second light transmitting region 102 for forming a first spacer, and a light blocking region 103 spaced apart from the first light transmitting region 101. .
  • the amount of light transmitted by the first light transmitting region 101 is smaller than the amount of light transmitted by the second light transmitting region 102.
  • the first transparent region 101 is a semi-transmissive region
  • the second transparent region 102 is a fully transparent region.
  • the first light transmitting region 101 corresponds to the first color resist deposition region on the color filter
  • the second light transmitting region 102 corresponds to the deposition region of the first spacer portion.
  • the second mask 200 is a semi-transparent mask, which is specifically a HTM semi-transparent mask.
  • the second mask 200 includes a first light transmissive region 201 for forming a second color resist, a second light transmissive region 202 for forming a second spacer, and a light blocking region 203 spaced apart from the first light transmissive region 201. .
  • the amount of light transmitted by the first light transmitting region 201 is smaller than the amount of light transmitted by the second light transmitting region 202.
  • the first light transmitting region 201 is a semi-transmissive region
  • the second light transmitting region 202 is a fully transparent region.
  • the first light transmitting region 201 corresponds to the second color resist deposition region on the color filter
  • the second light transmitting region 202 corresponds to the deposition region of the second spacer portion.
  • the third mask 300 is a semi-transparent mask, which is specifically an HTM semi-transparent mask.
  • the third mask 300 includes a semi-transmissive region 301 for forming a third color resist and a light blocking region 302 spaced apart from the semi-transmissive region 301.
  • the semi-transmissive region 301 corresponds to a third color resist deposition region on the color filter.
  • the third mask 300 may also be a full-transmissive mask including a fully transparent region for forming a third color resist and a light-shielding region spaced apart from the fully transparent region.
  • the second transparent region 102 of the first mask 100 and the second transparent region 202 of the second mask 200 have the same The position and shape are such that the cross sections of the first spacer and the second spacer have the same shape, for example, a rectangle, and completely overlap each other on the color filter.
  • FIG. 2 is a schematic flow chart of a method for fabricating the color filter of the present invention.
  • 3A-3F are schematic views showing the structure of the color filter of the present invention. It should be noted that the method of the present invention is not limited to the sequence of the flow shown in FIG. 2 if substantially the same result is obtained. As shown in FIG. 2, the method includes the following steps:
  • Step S101 forming a black matrix on the substrate
  • step S101 a black matrix material is first coated on the substrate, then the black matrix material is exposed through a semi-transparent mask, and finally the exposed black matrix material is developed to form a plurality of black matrices.
  • the black matrix includes a first black matrix and a second black matrix, and the first black matrix and the second black matrix are spaced apart, and the first black matrix and the second black matrix have different heights.
  • Step S102 forming a first color resist on the substrate through the first mask and forming a first spacer on the black matrix
  • step S102 the first material is continuously coated on the substrate, then the first material is exposed through the first mask, and finally the exposed first material is developed to be in the transparent region of the color filter.
  • a plurality of first color resists are formed thereon and a first spacer is formed on the black matrix.
  • FIG. 3A is a schematic cross-sectional view of the first mask 100.
  • 3B is a schematic cross-sectional view of the substrate 10, the black matrix 20, and the first material layer 30 coated with the first material.
  • FIG. 3C is a schematic cross-sectional view showing the first color resist 31 and the first spacer 32 obtained by exposing and developing the first material through the first mask 100.
  • Step S103 forming a second color resist arranged at intervals from the first color resist on the substrate through the second mask, and forming a second spacer on the first spacer;
  • step S103 the second material is continuously coated on the substrate, then the second material is exposed through the second mask, and finally the exposed second material is developed to be in the transparent region of the color filter. Forming a plurality of second color resists spaced apart from the first color resist and forming a second spacer on the first spacer.
  • FIG. 3D is a schematic cross-sectional view of the second mask 200.
  • 3E is a schematic cross-sectional view of the substrate 10 coated with the second material, the black matrix 20, and the first color resist 31 and the second material layer 40.
  • FIG. 3F is a cross-sectional structural view of the second spacer 42 obtained by exposing and developing the second material through the second mask 200.
  • the black matrix 20, the first spacer 32, and the second spacer 42 are overlapped to form a spacer for supporting the upper and lower glass substrates in the LTPS panel.
  • the spacer includes a first spacer and a second spacer, and the first black matrix, the first spacer and the second spacer overlap to form a first spacer, and the second black matrix, the first The spacer and the second spacer overlap to form a second spacer, and the first spacer and the second spacer have different heights.
  • Step S104 forming a third color resistance arranged on the substrate and spaced apart from the first color resist and the second color resist by the third mask.
  • step S104 the third material is continuously coated on the substrate, then the third material is exposed through the third mask, and finally the exposed third material is developed to form on the substrate of the color filter.
  • a third color resistance arranged at intervals from the first color resistance and the second color resistance.
  • FIG. 4 is a first cross-sectional structural view of a color filter of the present invention
  • FIG. 5 is a schematic structural view of a second cross-section of the color filter of the present invention.
  • the color filter includes a substrate 10, a black matrix 20, a first color resist 31, a first spacer 32, a second color resist 41, a second spacer 42 and a third color resist 51. .
  • the black matrix 20 is disposed on the substrate 10.
  • the black matrix 20 includes a first black matrix 21 (see FIG. 4) and a second black matrix 22 (see FIG. 5), and the first black matrix 21 and the second black matrix 22 have different heights, wherein The black matrix 21 and the second black matrix 22 are obtained by the same process using a semi-transparent mask.
  • the first color resist 31, the second color resist 41, and the third color resist 51 are disposed on the substrate 10 and are sequentially arranged in sequence. Specifically, the first color resist 31, the second color resist 41, and the third color resist 51 are sequentially arranged in the light-transmitting region of the color filter, and the first color resist 31, the second color resist 41, and the third color are sequentially arranged. Resistor 51 can be R, G, B color resistance, respectively.
  • the first spacer 32 is disposed on the black matrix 20, and the second spacer 42 is disposed on the first spacer 32.
  • the first spacer 32 and the first color resist 31 are obtained by the same process using a semi-transparent mask, and the second spacer 42 and the second color resist 41 are obtained by the same process using a semi-transparent mask.
  • the first spacer portion 32 and the second spacer portion 42 are color resists of different colors, and the first spacer portion 32 and the second spacer portion 42 are specifically one of a red color resist, a green color resist, and a blue color resist.
  • the first spacer 32 is connected to the first color resist 31
  • the second spacer 42 is connected to the second color resist 41
  • the first spacer 32 and the second spacer 42 are disposed on the first color resist 31 and the second Between color resistance 41.
  • the black matrix 20, the first spacer 32, and the second spacer 42 overlap to form a spacer of the color filter.
  • the spacer includes a first spacer and a second spacer, and the first black matrix 21, the first spacer 32, and the second spacer 42 overlap to form a first spacer, and the second black matrix 22.
  • the first spacer 32 and the second spacer 42 overlap to form a second spacer.
  • the ends of the first spacer and the second spacer that are suspended, that is, the ends away from the black matrix 20 are planar.
  • the color filter of the present invention and the manufacturing method thereof have the first mask formed on the substrate by the first mask and the first spacer formed on the black matrix, and the second mask is passed through the second mask. Forming a second color resist arranged at intervals from the first color resist and forming a second spacer on the first spacer, wherein the black matrix, the first spacer and the second spacer overlap to form a color filter Spacer.
  • the present invention does not require an additional mask process to fabricate the spacer, thereby reducing the manufacturing cost of the color filter, and the spacer is formed by overlapping the black matrix, the first color resist and the second color resist.
  • the spacer does not slip into the light transmissive area of the pixel to cause a mura condition.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

公开了一种彩色滤光片及其制作方法，方法包括：在基板（10）上形成黑色矩阵（20）；通过第一掩膜板（100）在基板（10）上形成第一色阻（31）以及在黑色矩阵（20）上形成第一间隔部（32）；通过第二掩膜板（200）在基板（10）上形成与第一色阻（31）间隔排列的第二色阻（41）以及在第一间隔部（32）上形成第二间隔部（42）；通过第三掩膜板（300）在基板（10）上形成与第一色阻（31）、第二色阻（41）间隔排列的第三色阻（51）。黑色矩阵（20）、第一间隔部（32）和第二间隔部（42）重叠后形成彩色滤光片的隔垫物。以这种方式，不需要额外的光罩制程来制造隔垫物，减少了制造成本，且当面板受到挤压时，隔垫物不会滑落入像素的透光区从而造成mura状况。

Description

一种彩色滤光片及其制作方法
【技术领域】
本发明涉及液晶领域，特别是涉及一种彩色滤光片及其制作方法。
【背景技术】
传统的LTPS（Low Temperature Poly-silicon，低温多晶硅）面板结构设计中，在彩色滤光片上往往会单独沉积一层PS（Post Spacer，隔垫物），其中，PS主要用于提供LTPS面板中上下两层玻璃基板的支撑。
一般来说，PS包括高度不同的Main PS（主隔垫物）和Sub PS（辅助隔垫物），Main PS和Sub PS往往需要采用两张光罩制程来制作，从而使得彩色滤光片的制程周期变长、制程成本变高。
另外，现有PS的形状一般为梯形，且其远离彩色滤光片的末端呈球面状。在实际使用中，当LTPS面板受压后，PS很容易滑落入像素的透光区，从而造成mura也即显示器亮度不均的状况。
【发明内容】
本发明主要解决的技术问题是提供一种彩色滤光片及其制作方法，能够减少彩色滤光片制造过程中的光罩次数，从而降低彩色滤光片的制造成本，同时能够改善面板受压后出现隔垫物下滑到像素的透光区而造成的亮度不均的状况。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种彩色滤光片，该彩色滤光片包括：黑色矩阵，设置于基板上；第一色阻、第二色阻和第三色阻，设置于基板上且依次重复排列；第一间隔部，与第一色阻由同一制程得到，设置于黑色矩阵上；第二间隔部，与第二色阻由同一制程得到，设置于第一间隔部上；其中，黑色矩阵、第一间隔部和第二间隔部重叠后形成彩色滤光片的隔垫物；其中，黑色矩阵包括第一黑色矩阵和第二黑色矩阵，隔垫物包括第一隔垫物和第二隔垫物，其中，第一黑色矩阵和第二黑色矩阵间隔设置且具有不同的高度，第一黑色矩阵、第一间隔部和第二间隔部重叠后形成第一隔垫物，第二黑色矩阵、第一间隔部和第二间隔部重叠后形成第二隔垫物；其中，第一间隔部和第一色阻相连，第二间隔部和第二色阻相连，第一间隔部和第二间隔部设置于第一色阻和第二色阻之间；其中，第一间隔部和第二间隔部为红色色阻、绿色色阻和蓝色色阻中的一种。
其中，第一隔垫物和第二隔垫物悬空的端部呈平面状。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种彩色滤光片的制作方法，该方法包括：在基板上形成黑色矩阵；通过第一掩膜板在基板上形成第一色阻以及在黑色矩阵上形成第一间隔部；通过第二掩膜板在基板上形成与第一色阻间隔排列的第二色阻以及在第一间隔部上形成第二间隔部；通过第三掩膜板在基板上形成与第一色阻、第二色阻间隔排列的第三色阻；其中，黑色矩阵、第一间隔部和第二间隔部重叠后形成彩色滤光片的隔垫物。
其中，黑色矩阵包括第一黑色矩阵和第二黑色矩阵，隔垫物包括第一隔垫物和第二隔垫物，其中，第一黑色矩阵和第二黑色矩阵间隔设置且具有不同的高度，第一黑色矩阵、第一间隔部和第二间隔部重叠后形成第一隔垫物，第二黑色矩阵、第一间隔部和第二间隔部重叠后形成第二隔垫物。
其中，第一间隔部和第一色阻相连，第二间隔部和第二色阻相连，第一间隔部和第二间隔部形成于第一色阻和第二色阻之间。
其中，第一掩膜板和第二掩膜板为半透式掩膜板，其中，第一掩膜板包括有用于形成第一色阻的第一透光区、用于形成第一间隔部的第二透光区以及与第一透光区间隔设置的遮光区，第二掩膜板包括有用于形成第二色阻的第一透光区、用于形成第二间隔部的第二透光区以及与第一透光区间隔设置的遮光区。
其中，第三掩膜板为半透式掩膜板，其中，第三掩膜板包括有用于形成第三色阻的半透光区以及与半透光区间隔设置的遮光区。
为解决上述技术问题，本发明采用的又一个技术方案是：提供一种彩色滤光片，该彩色滤光片包括：黑色矩阵，设置于基板上；第一色阻、第二色阻和第三色阻，设置于基板上且依次重复排列；第一间隔部，与第一色阻由同一制程得到，设置于黑色矩阵上；第二间隔部，与第二色阻由同一制程得到，设置于第一间隔部上；其中，黑色矩阵、第一间隔部和第二间隔部重叠后形成彩色滤光片的隔垫物。
其中，黑色矩阵包括第一黑色矩阵和第二黑色矩阵，隔垫物包括第一隔垫物和第二隔垫物，其中，第一黑色矩阵和第二黑色矩阵间隔设置且具有不同的高度，第一黑色矩阵、第一间隔部和第二间隔部重叠后形成第一隔垫物，第二黑色矩阵、第一间隔部和第二间隔部重叠后形成第二隔垫物。
其中，第一间隔部和第一色阻相连，第二间隔部和第二色阻相连，第一间隔部和第二间隔部设置于第一色阻和第二色阻之间。
其中，第一间隔部和第二间隔部为红色色阻、绿色色阻和蓝色色阻中的一种。
其中，第一隔垫物和第二隔垫物悬空的端部呈平面状。
本发明的有益效果是：本发明的彩色滤光片及其制作方法通过第一掩膜板在基板上形成第一色阻以及黑色矩阵上形成第一间隔部，通过第二掩膜板在基板上形成与第一色阻间隔排列的第二色阻以及在第一间隔部上形成第二间隔部，其中，黑色矩阵、第一间隔部和第二间隔部重叠后形成彩色滤光片的隔垫物。通过上述方式，本发明不需要额外的光罩制程来制造隔垫物，减少了彩色滤光片的制程成本，同时隔垫物由黑色矩阵、第一色阻和第二色阻重叠形成，当面板受到挤压时，隔垫物不会滑落入像素的透光区从而造成mura状况。
【附图说明】
图1是本发明彩色滤光片制程中形成色阻所采用的掩膜板的结构示意图;
图2是本发明彩色滤光片的制作方法的流程示意图；
图3A-3F是本发明中彩色滤光片制程中的结构示意图；
图4是本发明彩色滤光片的第一剖面结构示意图；
图5是本发明彩色滤光片的第二剖面结构示意图。
【具体实施方式】
在说明书及权利要求书当中使用了某些词汇来指称特定的组件，所属领域中的技术人员应可理解，制造商可能会用不同的名词来称呼同样的组件。本说明书及权利要求书并不以名称的差异来作为区分组件的方式，而是以组件在功能上的差异来作为区分的基准。下面结合附图和实施例对本发明进行详细说明。
图1是本发明彩色滤光片制程中形成色阻所采用的掩膜板的结构示意图。如图1所示，掩膜板包括第一掩膜板100、第二掩膜板200和第三掩膜300。
其中，第一掩膜板100为半透式掩膜板，其具体为HTM（half-tone mask）半透式掩膜板。第一掩膜板100包括有用于形成第一色阻的第一透光区101、用于形成第一间隔部的第二透光区102以及与第一透光区101间隔设置的遮光区103。其中，第一透光区101的透光量小于第二透光区102的透光量。优选地，第一透光区101为半透光区，第二透光区102为全透光区。换个角度来说，第一透光区101对应于彩色滤光片上第一色阻沉积区域，第二透光区102对应于第一间隔部的沉积区域。
其中，第二掩膜板200为半透式掩膜板，其具体为HTM半透式掩膜板。第二掩膜板200包括有用于形成第二色阻的第一透光区201、用于形成第二间隔部的第二透光区202以及与第一透光区201间隔设置的遮光区203。其中，第一透光区201的透光量小于第二透光区202的透光量。优选地，第一透光区201为半透光区，第二透光区202为全透光区。换个角度来说，第一透光区201对应于彩色滤光片上第二色阻沉积区域，第二透光区202对应于第二间隔部的沉积区域。
其中，第三掩膜板300为半透式掩膜板，其具体为HTM半透式掩膜板。第三掩膜板300包括有用于形成第三色阻的半透光区301以及与半透光区301间隔设置的遮光区302。换个角度来说，半透光区301对应于彩色滤光片上第三色阻沉积区域。在其它实施例中，第三掩膜板300也可以为全透式掩膜板，其包括用于形成第三色阻的全透光区以及与全透光区间隔设置的遮光区。
优选地，当第一掩膜板100和第二掩膜板200重叠时，第一掩膜板100的第二透光区102和第二掩膜板200的第二透光区202具有相同的位置和形状，以使得第一间隔部和第二间隔部的截面呈相同的形状例如长方形，且在彩色滤光片上相互完全重叠。
请一并参考图2，图2是本发明彩色滤光片的制作方法的流程示意图。图3A-3F是本发明彩色滤光片制程中的结构示意图。需注意的是，若有实质上相同的结果，本发明的方法并不以图2所示的流程顺序为限。如图2所示，该方法包括如下步骤：
步骤S101：在基板上形成黑色矩阵；
在步骤S101中，首先在基板上涂布黑色矩阵材料，接着通过半透式掩膜板对黑色矩阵材料进行曝光，最后对曝光后的黑色矩阵材料进行显影，以形成多个黑色矩阵。
其中，黑色矩阵包括第一黑色矩阵和第二黑色矩阵，第一黑色矩阵和第二黑色矩阵间隔排列，且第一黑色矩阵和第二黑色矩阵具有不同的高度。
步骤S102：通过第一掩膜板在基板上形成第一色阻以及在黑色矩阵上形成第一间隔部；
在步骤S102中，继续在基板上涂布第一材料，接着通过第一掩膜板对第一材料进行曝光，最后对曝光后的第一材料进行显影，以在彩色滤光片的透光区域上形成多个第一色阻以及在黑色矩阵上形成第一间隔部。
请一并参考图3A、3B和3C。其中，图3A为第一掩膜板100的剖面结构示意图。图3B为涂布了第一材料的基板10、黑色矩阵20和第一材料层30的剖面结构示意图。图3C为通过第一掩膜板100对第一材料进行曝光、显影后得到的第一色阻31和第一间隔部32的剖面结构示意图。
步骤S103：通过第二掩膜板在基板上形成与第一色阻间隔排列的第二色阻以及在第一间隔部上形成第二间隔部；
在步骤S103中，继续在基板上涂布第二材料，接着通过第二掩膜板对第二材料进行曝光，最后对曝光后的第二材料进行显影，以在彩色滤光片的透光区域形成与第一色阻间隔排列的多个第二色阻以及在第一间隔部上形成第二间隔部。
请一并参考图3D、3E和3F，其中，图3D为第二掩膜板200的剖面结构示意图。图3E为涂布了第二材料的基板10、黑色矩阵20和第一色阻31和第二材料层40的剖面结构示意图。图3F为通过第二掩膜板200对第二材料进行曝光、显影后得到的第二间隔部42的剖面结构示意图。
其中，黑色矩阵20、第一间隔部32、第二间隔部42重叠后形成支撑LTPS面板中上下两层玻璃基板的隔垫物。
具体来说，隔垫物包括第一隔垫物和第二隔垫物，第一黑色矩阵、第一间隔部和第二间隔部重叠后形成第一隔垫物，第二黑色矩阵、第一间隔部和第二间隔部重叠后形成第二隔垫物，第一隔垫物和第二隔垫物具有不同的高度。
步骤S104：通过第三掩膜板在基板上形成与第一色阻、第二色阻间隔排列的第三色阻。
在步骤S104中，继续在基板上涂布第三材料，接着通过第三掩膜板对第三材料进行曝光，最后对曝光后的第三材料进行显影，以在彩色滤光片的基板上形成与第一色阻、第二色阻间隔排列的第三色阻。
请一并参考图4和图5，图4为本发明彩色滤光片的第一剖面结构示意图，图5是本发明彩色滤光片的第二剖面的结构示意图。如图4和图5所示，彩色滤光片包括基板10、黑色矩阵20、第一色阻31、第一间隔部32、第二色阻41、第二间隔部42和第三色阻51。
黑色矩阵20设置在基板10上。具体来说，黑色矩阵20包括第一黑色矩阵21（见图4）和第二黑色矩阵22（见图5），第一黑色矩阵21和第二黑色矩阵22具有不同的高度，其中，第一黑色矩阵21和第二黑色矩阵22采用半透式掩膜板由同一制程得到。
第一色阻31、第二色阻41和第三色阻51设置于基板10上且依次重复排列。具体来说，第一色阻31、第二色阻41和第三色阻51依次重复排列于彩色滤光片的透光区域，且第一色阻31、第二色阻41和第三色阻51可分别是R、G、B色阻。
第一间隔部32设置在黑色矩阵20上，第二间隔部42设置在第一间隔部32上。第一间隔部32与第一色阻31采用半透式掩膜板由同一制程得到，第二间隔部42与第二色阻41采用半透式掩膜板由同一制程得到。第一间隔部32和第二间隔部42为不同颜色的色阻，第一间隔部32和第二间隔部42具体为红色色阻、绿色色阻和蓝色色阻中的一种。
优选地，第一间隔部32和第一色阻31相连，第二间隔部42和第二色阻41相连，第一间隔部32和第二间隔部42设置于第一色阻31和第二色阻41之间。
其中，黑色矩阵20、第一间隔部32和第二间隔部42重叠后形成彩色滤光片的隔垫物。具体来说，隔垫物包括第一隔垫物和第二隔垫物，第一黑色矩阵21、第一间隔部32和第二间隔部42重叠后形成第一隔垫物，第二黑色矩阵22、第一间隔部32和第二间隔部42重叠后形成第二隔垫物。优选地，第一隔垫物和第二隔垫物悬空的端部，也即远离黑色矩阵20的端部呈平面状。
本发明的有益效果是：本发明的彩色滤光片及其制作方法通过第一掩膜板在基板上形成第一色阻以及在黑色矩阵上形成第一间隔部，通过第二掩膜板在基板上形成与第一色阻间隔排列的第二色阻以及在第一间隔部上形成第二间隔部，其中，黑色矩阵、第一间隔部和第二间隔部重叠后形成彩色滤光片的隔垫物。通过上述方式，本发明不需要额外的光罩制程来制造隔垫物，从而减少了彩色滤光片的制程成本，同时隔垫物由黑色矩阵、第一色阻和第二色阻重叠形成，当面板受到挤压时，隔垫物不会滑落入像素的透光区从而造成mura状况。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (12)

  1. 一种彩色滤光片，其中，所述彩色滤光片包括：
    黑色矩阵，设置于基板上；
    第一色阻、第二色阻和第三色阻，设置于所述基板上且依次重复排列；
    第一间隔部，与所述第一色阻由同一制程得到，设置于所述黑色矩阵上；
    第二间隔部，与所述第二色阻由同一制程得到，设置于所述第一间隔部上；
    其中，所述黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述彩色滤光片的隔垫物；
    其中，所述黑色矩阵包括第一黑色矩阵和第二黑色矩阵，所述隔垫物包括第一隔垫物和第二隔垫物，其中，所述第一黑色矩阵和所述第二黑色矩阵间隔设置且具有不同的高度，所述第一黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述第一隔垫物，所述第二黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述第二隔垫物；
    其中，所述第一间隔部和所述第一色阻相连，所述第二间隔部和所述第二色阻相连，所述第一间隔部和所述第二间隔部设置于所述第一色阻和所述第二色阻之间；
    其中，所述第一间隔部和所述第二间隔部为红色色阻、绿色色阻和蓝色色阻中的一种。
  2. 根据权利要求1所述的彩色滤光片，其中，所述第一隔垫物和所述第二隔垫物悬空的所述端部呈平面状。
  3. 一种彩色滤光片的制作方法，其中，所述方法包括：
    在基板上形成黑色矩阵；
    通过第一掩膜板在所述基板上形成第一色阻以及在所述黑色矩阵上形成第一间隔部；
    通过第二掩膜板在所述基板上形成与所述第一色阻间隔排列的第二色阻以及在所述第一间隔部上形成第二间隔部；
    通过第三掩膜板在所述基板上形成与所述第一色阻、第二色阻间隔排列的第三色阻；
    其中，所述黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述彩色滤光片的隔垫物。
  4. 根据权利要求3所述的方法，其中，所述黑色矩阵包括第一黑色矩阵和第二黑色矩阵，所述隔垫物包括第一隔垫物和第二隔垫物，其中，所述第一黑色矩阵和所述第二黑色矩阵间隔设置且具有不同的高度，所述第一黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述第一隔垫物，所述第二黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述第二隔垫物。
  5. 根据权利要求4所述的方法，其中，所述第一间隔部和所述第一色阻相连，所述第二间隔部和所述第二色阻相连，所述第一间隔部和所述第二间隔部形成于所述第一色阻和所述第二色阻之间。
  6. 根据权利要求5所述的方法，其中，所述第一掩膜板和所述第二掩膜板为半透式掩膜板，其中，所述第一掩膜板包括有用于形成所述第一色阻的第一透光区、用于形成所述第一间隔部的第二透光区以及与所述第一透光区间隔设置的遮光区，所述第二掩膜板包括有用于形成所述第二色阻的第一透光区、用于形成所述第二间隔部的第二透光区以及与所述第一透光区间隔设置的遮光区。
  7. 根据权利要求6所述的方法，其中，所述第三掩膜板为半透式掩膜板，其中，所述第三掩膜板包括有用于形成所述第三色阻的半透光区以及与所述半透光区间隔设置的遮光区。
  8. 一种彩色滤光片，其中，所述彩色滤光片包括：
    黑色矩阵，设置于基板上；
    第一色阻、第二色阻和第三色阻，设置于所述基板上且依次重复排列；
    第一间隔部，与所述第一色阻由同一制程得到，设置于所述黑色矩阵上；
    第二间隔部，与所述第二色阻由同一制程得到，设置于所述第一间隔部上；
    其中，所述黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述彩色滤光片的隔垫物。
  9. 根据权利要求8所述的彩色滤光片，其中，所述黑色矩阵包括第一黑色矩阵和第二黑色矩阵，所述隔垫物包括第一隔垫物和第二隔垫物，其中，所述第一黑色矩阵和所述第二黑色矩阵间隔设置且具有不同的高度，所述第一黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述第一隔垫物，所述第二黑色矩阵、所述第一间隔部和所述第二间隔部重叠后形成所述第二隔垫物。
  10. 根据权利要求9所述的彩色滤光片，其中，所述第一间隔部和所述第一色阻相连，所述第二间隔部和所述第二色阻相连，所述第一间隔部和所述第二间隔部设置于所述第一色阻和所述第二色阻之间。
  11. 根据权利要求9所述的彩色滤光片，其中，所述第一间隔部和所述第二间隔部为红色色阻、绿色色阻和蓝色色阻中的一种。
  12. 根据权利要求9所述的彩色滤光片，其中，所述第一隔垫物和所述第二隔垫物悬空的所述端部呈平面状。
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