WO2015043219A1 - 彩膜基板、触控显示装置及彩膜基板的制作方法 - Google Patents

彩膜基板、触控显示装置及彩膜基板的制作方法 Download PDF

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Publication number
WO2015043219A1
WO2015043219A1 PCT/CN2014/078852 CN2014078852W WO2015043219A1 WO 2015043219 A1 WO2015043219 A1 WO 2015043219A1 CN 2014078852 W CN2014078852 W CN 2014078852W WO 2015043219 A1 WO2015043219 A1 WO 2015043219A1
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Prior art keywords
color filter
substrate
pattern
electrode
forming
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PCT/CN2014/078852
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English (en)
French (fr)
Inventor
邹祥祥
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京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/428,822 priority Critical patent/US9874777B2/en
Publication of WO2015043219A1 publication Critical patent/WO2015043219A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • Color film substrate touch display device and method for manufacturing color film substrate
  • Embodiments of the present disclosure relate to the field of touch display technologies, and in particular, to a color film substrate of a touch screen, a touch display device, and a method of manufacturing a color filter substrate of the touch screen. Background technique
  • the touch screen is separately produced from the display screen and then attached together.
  • This technique has the disadvantages of high manufacturing cost, low light transmittance, and thick modules.
  • embedded touch screen technology has gradually become a new favorite of research and development.
  • the so-called embedded touch screen technology refers to: The driving electrode line and the detecting electrode line for implementing the touch function are arranged on the substrate of the display screen. Compared with the external touch display device, the touch display device with the embedded touch screen technology has the advantages of thinner thickness, higher performance and lower cost.
  • the color filter substrate of the in-cell touch panel known by the applicant includes: a transparent substrate 10, and a driving electrode 11 and a detecting electrode line 12, which are sequentially formed on the transparent substrate 10, and a first passivation layer 13 a metal bridge 14, a second passivation layer 15, a black matrix 16, a color filter 17, a flat layer 18, and a spacer 19, wherein the driving electrodes 11 are overlapped by the metal bridge 14 to constitute a driving electrode line, and the driving electrode line is
  • the probe electrode lines 12 are disposed across each other and insulated at the intersection by the first passivation layer 13.
  • the defect in the technology is that the color filter substrate needs to be fabricated by using at least six mask patterning processes, and each patterning process usually includes processes such as photoresist coating, exposure, development, etching, and photoresist stripping. This requires at least six masks, and the overall fabrication process of the color filter substrate is complicated, and the manufacturing cost is high. Summary of the invention
  • One of the objectives of the embodiments of the present disclosure is to provide a color film substrate of a built-in touch screen, a touch display device, and a method for manufacturing a color film substrate of an in-cell touch panel, so as to simplify the manufacturing process of the color film substrate in the touch screen. , reduce production costs.
  • a color film substrate of an in-cell touch panel includes: a substrate substrate; a black matrix, which is located above the substrate substrate and includes a light transmitting region and a light shielding region; a color filter located in the light transmitting region of the black matrix;
  • first electrode lines including a plurality of first electrodes connected in series by a bridge wire
  • the second electrode wire comprising a plurality of second electrodes connected in series by a connection line
  • the bridge wires and the connection lines are disposed at intersection and the intersection area and the black matrix are shielded The location of the area corresponds
  • the spacer of the color filter substrate is used to insulate the bridge wire of the first electrode line from the connection line of the second electrode line, compared with the technique known to the inventors, between the bridge wire and the connection line.
  • the first passivation layer is not required to be formed by a patterning process, which greatly simplifies the fabrication process of the color filter substrate in the touch screen, reduces the number of use of the mask, and reduces the manufacturing cost.
  • the first electrode, the second electrode and the connecting line are in the same layer; the bridge wire is located above the connecting line, or the connecting line is located above the bridge wire.
  • the layer structure of the first electrode, the second electrode and the connecting line is interchangeable with the position of the layer structure of the bridge line, regardless of which structure is used, the color film substrate is fabricated. The process is simplified and the production cost is low.
  • the color filter substrate further includes: a structure disposed above the black matrix and the color filter and located under the structure of the set of first electrode lines, a set of second electrode lines, and spacers Covering the first planar layer of the substrate.
  • the first planar layer can planarize the surface of the black matrix and color filter to facilitate the next patterning process thereon.
  • the color filter substrate further includes: a second planar layer covering the substrate over the structure of the set of first electrode lines, the set of second electrode lines, and the spacers.
  • the second flat layer can planarize the surface of the color filter substrate and can function as a protective electrode.
  • At least one embodiment of the present disclosure further provides a touch display device comprising the color filter substrate of the in-cell touch panel according to any of the foregoing technical solutions, which has a low manufacturing cost.
  • At least one embodiment of the present disclosure also provides a method of fabricating a color film substrate of the aforementioned in-cell touch screen, comprising:
  • a pattern of bridge lines is formed over the spacer by a patterning process.
  • the technical solution can use at least five patterning processes to form a color film substrate of the in-cell touch panel. Compared with the technology known to the inventors, the manufacturing process is simplified, the number of masks used is reduced, and the manufacturing cost is reduced.
  • the method further includes: forming a first planar layer covering the substrate; forming a bridge wire
  • the method further includes: forming a second planar layer covering the substrate.
  • the first flat layer and the second flat layer may function to planarize the substrate and protect the electrodes.
  • the patterning of the color filter by the patterning process comprises: ??? sequentially forming color filter patterns of respective colors by using the same mask, and each color filter pattern of one color is used.
  • the mask is offset by a set distance. It takes only one mask to make a color filter, which has a lower production cost.
  • At least one embodiment of the present disclosure further provides another method of fabricating a color filter substrate of the foregoing touch screen, including:
  • a pattern of the first electrode, the second electrode, and the connecting line is formed over the layer structure of the spacer by a patterning process.
  • the technical solution can form a color film substrate of the touch screen by using at least five patterning processes, which simplifies the manufacturing process, reduces the number of masks used, and reduces the manufacturing cost compared with the technology known to the inventors.
  • the method after forming the pattern of the color filter, before forming the pattern of the bridge line, the method still further includes: forming a first planar layer covering the substrate; after forming the pattern of the first electrode, the second electrode, and the connection line, the method further comprising: forming a second planar layer covering the substrate.
  • the patterning of the color filter by the patterning process comprises: ??? sequentially forming color filter patterns of respective colors by using the same mask, and each color filter pattern of one color is used.
  • the mask is offset by a set distance.
  • FIG. 1 is a schematic cross-sectional view of a color film substrate of an existing touch screen (electrode line intersection area);
  • FIG. 2 is a schematic top plan view of an embodiment of a color film substrate of the touch screen of the present disclosure;
  • Figure 3 is a schematic cross-sectional view of Figure 2 at A-A;
  • FIG. 4 is a schematic cross-sectional view of another embodiment of a color filter substrate of the touch panel of the present disclosure (electrode line intersection region);
  • FIG. 5 is a schematic flow chart of a method for fabricating a color filter substrate of the embodiment shown in FIG. 4;
  • 6a is a schematic cross-sectional view of a substrate substrate before forming a black matrix
  • 6b is a schematic cross-sectional view of a substrate after forming a black matrix
  • 6c is a schematic cross-sectional view of a substrate after forming a red color filter
  • 6d is a schematic cross-sectional view of a substrate after forming a red, green and blue color filter
  • 6e is a schematic cross-sectional view of a substrate after forming a first flat layer
  • 6f is a schematic cross-sectional view of a substrate after forming a bridge wire
  • Figure 6g is a schematic cross-sectional view of the substrate after forming the spacer
  • 6h is a schematic cross-sectional view of the substrate after forming the first electrode, the second electrode, and the connecting line. detailed description
  • At least one embodiment of the present disclosure provides a color film substrate of the touch screen, a touch display device, and a color film substrate of the touch screen.
  • the bridge wire of the first electrode line and the connection line of the second electrode line are insulated and insulated by the spacer of the color filter substrate, and the bridge wire is compared with the technology known to the inventors.
  • There is no need to separately form a first passivation layer between the connection lines and the connection line which greatly simplifies the fabrication process of the color filter substrate in the touch screen, reduces the number of use of the mask, and reduces the manufacturing cost.
  • a color filter substrate of a touch screen includes:
  • the black matrix 16 located above the base substrate 20, the black matrix 16 includes a light transmitting region and a light blocking region; a color filter 17 located in the light transmitting region of the black matrix 16;
  • the first electrode line 21 including a plurality of first electrodes 24 connected in series by a bridge line 23
  • the second electrode line 22 includes a plurality of second electrodes 26 connected in series by a connection line 25, and the bridge lines 23 and the connection lines 25 are disposed to intersect and the intersection area corresponds to the position of the light shielding area of the black matrix 16;
  • a spacer 19 which is insulated between the bridge wire 23 and the connecting wire 25 to insulate the bridge wire 23 from the connecting wire 25.
  • the material of the base substrate 20 is not limited, and for example, transparent glass, resin, or the like can be selected.
  • the main function of the black matrix 16 is to block stray light by using a light-shielding region to prevent light leakage between pixels corresponding to the light-transmitting region; the color filter 17 includes R (Red, red) color filter, G (Green, green) color filter. And B (Blue, blue) color filter, the main function is to use the filter to produce three primary colors of red, green and blue, and then mix the three primary colors of red, green and blue in different strengths and weaknesses, thus showing various colors, making the film
  • the transistor LCD screen can display full color.
  • the color filter is not limited to three colors of RGB (Red Green Blue), but also RGBW (ed Green Blue White, red green blue white), RGBY ( ed Green Blue Yellow, red Green, blue and yellow) or CMYK (Cyan Magenta Yellow Black, green red, yellow, black) and other color combinations.
  • RGB Red Green Blue
  • RGBW Green Blue White, red green blue white
  • RGBY ed Green Blue Yellow, red Green, blue and yellow
  • CMYK Cyan Magenta Yellow Black, green red, yellow, black
  • the in-cell touch panel refers to a driving electrode line and a detecting electrode line for implementing a touch function, which are disposed on a substrate of the display screen.
  • the first electrode line 21 and the second electrode line 22 are both disposed on the color filter substrate, the first electrode line 21 may be a driving electrode line, and the second electrode line 22 is a detecting electrode line; or, the first The electrode line 21 is a detecting electrode line, and the second electrode line 22 is a driving electrode line, which is not specifically limited herein.
  • the specific material of the bridge wire 23 is not limited.
  • the bridge wire 23 is made of a metal such as copper (also referred to as a metal bridge), which is advantageous for reducing the resistance of the driving electrode wire.
  • the connecting line 25 can be made of the same material as the first electrode 24 and the second electrode 26, such as a transparent conductive material such as indium tin oxide.
  • the spacer is an auxiliary used in the assembly process of the display device, and is mainly used for controlling the gap between the color filter substrate and the array substrate. If a liquid crystal layer having a large area and a uniform thickness is desired, the color filter substrate is required. A spacer is uniformly disposed between the array substrate and the array substrate.
  • the spacer 19 is formed in the process of fabricating the color filter substrate, and the spacer 19 is disposed at an intersection of the first electrode line 21 and the second electrode line 22, and is located at the bridge line 23
  • the bridge wire 23 and the connecting wire 25 are insulated from each other and the connecting wire 25 is insulated to form a mutual inductance capacitance between the bridge wire 23 and the connecting wire 25.
  • the spacers 19 of the color filter substrate are used to insulate the bridge wires 23 of the first electrode wire 21 and the connection wires 25 of the second electrode wire 22, which is compared with the inventor.
  • the bridge wiring 23 and the connecting line 25 need not separately form a first passivation layer by a patterning process, which greatly simplifies the manufacturing process of the color film substrate in the touch screen, reduces the use of the mask board, and reduces the manufacturing cost. .
  • the first electrode 24, the second electrode 26 and the connecting line 25 may be located in the same layer; the bridge wire 23 may be located above the connecting line 25 (as shown in FIG. 3), or the connecting line 25 is located above the bridge wire 23 (as shown in the figure) 4)).
  • the first electrode 24, the second electrode 26, and the connection line 25 can be formed in the same patterning process.
  • the layer structure of the bridge wire 23 is located above the layer structure where the first electrode 24, the second electrode 26 and the connection line 25 are located; when the connection line 25 is located above the bridge wire 23,
  • the layer structure in which the first electrode 24, the second electrode 26, and the connecting line 25 are located is located above the layer structure of the bridge line 23.
  • the layer structure of the first electrode 24, the second electrode 26 and the connecting line 25 and the layer structure of the bridge line 23 The positions are interchangeable, no matter which structure is used, the manufacturing process of the color film substrate is simplified, and the manufacturing cost is low.
  • the color filter substrate further includes a first flat layer 27, and the first flat layer 27 is located above the black matrix 16 and the color filter 17, and is located at the first electrode line 21 and the second electrode line. 22 and underlying the structure of the spacer 19 and covering the substrate.
  • the first flat layer 27 can planarize the surfaces of the black matrix 16 and the color filter 17, facilitating the next patterning process thereon.
  • the first electrode 24, the second electrode, and the connecting line 25 can be formed on the same plane, and the manufacturing process is greatly reduced in difficulty.
  • the color filter substrate further includes a second flat layer 28, and the second flat layer 28 is located above the structure composed of the first electrode line 21, the second electrode line 22, and the spacer 19 and covers the substrate.
  • the second flat layer 28 can planarize the surface of the color filter substrate and can protect the electrodes.
  • the material of the first flat layer 27 and the second flat layer 28 is not limited, and may be, for example, resin, silicon nitride or the like.
  • At least one embodiment of the present disclosure further provides a touch display device, including the color filter substrate of the touch screen of any of the foregoing embodiments, because the manufacturing process of the color film substrate is simplified compared to the technique known to the inventor, and has a lower The manufacturing cost is therefore low, and the touch display device including the color film substrate also has a low manufacturing cost.
  • At least one embodiment of the present disclosure further provides a method of fabricating a color film substrate, including the following steps:
  • Step 101 forming a pattern of a black matrix including a light transmitting region and a light shielding region on the base substrate by a patterning process;
  • Step 102 Form a pattern of a color filter covering at least a light-transmitting region of the black matrix by a patterning process
  • Step 103 forming a pattern of the bridge wire above the black matrix and the color filter by a patterning process
  • Step 104 forming a pattern of the spacer material over the layer structure of the bridge wire by a patterning process
  • Step 105 by a patterning process on the spacer A pattern of the first electrode, the second electrode, and the connecting line is formed over the layer structure of the object.
  • the method may further include: forming a first planar layer covering the substrate; after the step 105, the method may further comprise: forming a second planar layer covering the substrate.
  • the first flat layer and the second flat layer can function as a flat substrate surface and a protective substrate, which is advantageous for patterning of the color filter substrate.
  • step 102 may include: sequentially fabricating color filter patterns of respective colors by using the same mask, and each mask color offset pattern is created after each color filter pattern is created. distance. The color filter thus produced uses only one mask, which has a low manufacturing cost.
  • the color film substrate of the embodiment shown in FIG. 4 can be specifically obtained by: depositing a black photoresist film on a glass substrate (ie, the substrate substrate 20 shown in FIG. 6a).
  • the pattern of the black matrix 16 is formed by the first patterning process (the first mask is used here) as shown in Figure 6b.
  • a red color filter film layer is deposited on the substrate on which the above steps are completed, and the red color filter film layer is exposed using a second mask to obtain a red color filter pattern as shown in Fig. 6c.
  • the color filter can be a positive-sensing material (removed after the exposed area is developed, and remains after the unexposed area is developed), or can be a negative-sensitive material (removed after the unexposed area is developed, after the exposed area is developed) Reserved), the specific structure of the second mask needs to be specifically designed according to the material of the color filter.
  • a green color filter film layer is deposited on the substrate on which the above steps are completed, the second mask plate is offset by a set distance, and then the green color filter film layer is exposed, and a green color filter pattern is obtained after development.
  • the set distance is related to the width of the black matrix light-transmissive region, for example, the second mask is offset by the width of the light-transmissive region along the length of the color filter substrate.
  • a pattern of the bridge wires 23 is formed by a third patterning process (where a third mask is used), as shown in Fig. 6f;
  • a pattern of the spacers 19 is formed by a fourth patterning process (where a fourth mask is used), as shown in Fig. 6g;
  • a pattern of the first electrode 24, the second electrode (not shown) and the connection line 25 is formed by a fifth patterning process (where a fifth mask is required), the first electrode And the second electrode is located on the substrate, and the connecting line is located on the spacer 19, at this time, the bridge wiring 23 laps the first electrodes 24 on both sides as shown in Fig. 6h.
  • the second flat layer 28 is coated on the substrate on which the above steps are completed, and the fabrication of the color filter substrate is completed.
  • the structure of the color filter substrate is as shown in FIG.
  • the process uses only five patterning processes to form the color filter substrate of the touch screen. Compared with the technique known to the inventors, the manufacturing process is simplified, the number of masks used is reduced, and the manufacturing cost is reduced.
  • At least one embodiment of the present disclosure also provides a method of fabricating the color filter substrate shown in FIG. 3, including the following steps:
  • a pattern of bridge lines is formed over the layer structure of the spacer by a patterning process.
  • the technical solution can form a color filter substrate of the touch screen by using five patterning processes, which simplifies the manufacturing process and reduces the mask plate compared with the technique known to the inventors.
  • the number of uses reduces the cost of production.
  • the method further includes: forming a first planar layer covering the substrate; forming a bridge wire
  • the method further includes: forming a second planar layer covering the substrate.
  • the first flat layer and the second flat layer may function to planarize the substrate and protect the electrodes.
  • the pattern of the color filter is formed by a patterning process, including: ⁇ sequentially forming the color filter patterns of the respective colors by using the same mask, and each time the color filter pattern of one color is made, the mask is biased Move the set distance. Making a color filter uses only one mask, which has a lower manufacturing cost.

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  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
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  • General Engineering & Computer Science (AREA)
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  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
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  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Filters (AREA)

Abstract

一种内嵌式触摸屏的彩膜基板，包括：衬底基板（20）；位于衬底基板（20）上方的黑矩阵（16），黑矩阵（16）包括透光区域和遮光区域；位于黑矩阵（16）的透光区域内的滤色器（17）；位于黑矩阵（16）和滤色器（17）上方且交叉设置的一组第一电极线（21）和一组第二电极线（22），第一电极线（21）包括通过桥接线（23）串接的多个第一电极（24），第二电极线（22）包括通过连接线（25）串接的多个第二电极（26），桥接线（23）和连接线（25）交叉设置且交叉区域与黑矩阵（16）的遮光区域位置相对应；位于桥接线（23）和连接线（25）之间将桥接线（23）和连接线（25）绝缘隔离的隔垫物（19）。该结构方案简化了内嵌式触摸屏中彩膜基板的制作工艺，减少了掩模板的使用数量，降低了制作成本。

Description

彩膜基板、 触控显示装置及彩膜基板的制作方法 技术领域
本公开的实施例涉及触控显示技术领域， 特别是涉及一种触摸屏的彩膜 基板、 触控显示装置及触摸屏的彩膜基板的制作方法。 背景技术
目前， 大多数互电容式触摸屏为外挂式， 即触摸屏与显示屏分开制作， 然后贴合在一起。 这种技术存在制作成本较高、 光透过率较低、 模组较厚的 缺点。 随着科技的发展， 内嵌触摸屏技术逐渐成为研发新宠， 所谓内嵌触摸 屏技术指的是： 用于实现触控功能的驱动电极线和探测电极线设置在显示屏 的基板上。 釆用内嵌触摸屏技术的触控显示装置相比外挂式触控显示装置， 具有厚度更薄、 性能更高、 成本更低的优势。
如图 1所示，申请人已知的内嵌式触摸屏的彩膜基板包括：透明基板 10， 以及在透明基板 10之上依次形成的驱动电极 11和探测电极线 12、第一钝化 层 13、 金属桥 14、 第二钝化层 15、 黑矩阵 16、 滤色器 17、 平坦层 18和隔 垫物 19， 其中， 驱动电极 11通过金属桥 14搭接组成驱动电极线， 驱动电极 线与探测电极线 12交叉设置并在交叉处通过第一钝化层 13绝缘隔离。 该技 术中存在的缺陷在于， 彩膜基板需要至少釆用六次掩模构图工艺制作完成， 每一次构图工艺通常包括光刻胶涂敷、 曝光、 显影、 刻蚀、 光刻胶剥离等工 序， 这就对应需要至少六张掩模板， 彩膜基板的整体制作工艺不但复杂， 并 且制作成本较高。 发明内容
本公开的实施例的目的之一是提供了一种内嵌式触摸屏的彩膜基板、 触 控显示装置及内嵌式触摸屏的彩膜基板的制作方法， 以简化触摸屏中彩膜基 板的制作工艺， 降低制作成本。
本公开的至少一个实施例提供的内嵌式触摸屏的彩膜基板， 包括： 衬底基板； 黑矩阵， 其位于所述衬底基板上方并包括透光区域和遮光区域； 滤色器， 其位于所述黑矩阵的透光区域内；
一组第一电极线和一组第二电极线， 所述第一电极线和所述第二电极线 位于所述黑矩阵和所述滤色器上方且交叉设置， 所述第一电极线包括通过桥 接线串接的多个第一电极， 所述第二电极线包括通过连接线串接的多个第二 电极， 所述桥接线和所述连接线交叉设置且交叉区域与黑矩阵的遮光区域位 置相对应； 以及
隔垫物， 位于所述桥接线和所述连接线之间将所述桥接线和所述连接线 绝缘隔离。
在该技术方案中， 利用彩膜基板的隔垫物将第一电极线的桥接线和第二 电极线的连接线绝缘隔离， 相比于发明人已知的技术， 桥接线和连接线之间 无需另外通过构图工艺形成第一钝化层， 这大大简化了触摸屏中彩膜基板的 制作工艺， 减少了掩模板的使用数量， 降低了制作成本。
在一个实施例中， 所述第一电极、 第二电极和所述连接线位于同层； 所 述桥接线位于所述连接线的上方，或者，所述连接线位于所述桥接线的上方。 作为可选方案， 在一个实施例中， 第一电极、 第二电极和连接线所在层结构 与桥接线所在层结构的位置可互换， 无论釆用哪一种结构形式， 彩膜基板的 制作工艺均较为简化， 制作成本较低。
在一个实施例中， 彩膜基板还包括： 位于所述黑矩阵和所述滤色器上方 且位于所述一组第一电极线、 一组第二电极线和隔垫物所组成的结构下方的 覆盖基板的第一平坦层。 第一平坦层可以将黑矩阵和滤色器的表面平坦化， 以有助于在其上进行下一步构图工艺。
在一个实施例中， 彩膜基板还包括： 位于所述一组第一电极线、 一组第 二电极线和隔垫物所组成的结构上方的覆盖基板的第二平坦层。 第二平坦层 可以使彩膜基板表面平坦化， 并能够起到保护电极的作用。
本公开的至少一个实施例还提供了一种触控显示装置， 包括前述任一技 术方案所述的内嵌式触摸屏的彩膜基板， 具有较低的制作成本。
本公开的至少一个实施例还提供了一种制作前述内嵌式触摸屏的彩膜基 板的方法， 包括：
通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的 图案；
通过构图工艺形成至少覆盖黑矩阵的透光区域的滤色器的图案； 通过构图工艺在黑矩阵和滤色器的上方形成第一电极、 第二电极和连接 线的图案；
通过构图工艺在连接线上方形成隔垫物的图案；
通过构图工艺在隔垫物上方形成桥接线的图案。
该技术方案最少可釆用五次构图工艺形成内嵌式触摸屏的彩膜基板， 相 比于发明人已知的技术， 简化了制作工艺， 减少了掩模板的使用数量， 降低 了制作成本。
在一个实施例中， 在形成滤色器的图案之后， 形成第一电极、 第二电极 和连接线的图案之前， 该方法还进一步包括： 形成覆盖基板的第一平坦层； 在形成桥接线的图案之后， 该方法还进一步包括： 形成覆盖基板的第二平坦 层。 第一平坦层和第二平坦层可以起到平坦化基板和保护电极的作用。
在一个实施例中， 所述通过构图工艺形成滤色器的图案， 包括： 釆用同 一张掩模板依次制作各个颜色的滤色器图案， 且每制作一种颜色的滤色器图 案后， 所述掩模板偏移设定距离。 制作滤色器仅需釆用一张掩模板， 具有较 低的制作成本。
本公开的至少一个实施例还提供了另一种制作前述触摸屏的彩膜基板的 方法， 包括：
通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的 图案；
通过构图工艺形成至少覆盖黑矩阵的透光区域的滤色器的图案； 通过构图工艺在黑矩阵和滤色器的上方形成桥接线的图案；
通过构图工艺在桥接线的层结构上方形成隔垫物的图案；
通过构图工艺在隔垫物的层结构上方形成第一电极、 第二电极和连接线 的图案。
同理， 该技术方案最少可釆用五次构图工艺形成触摸屏的彩膜基板， 相 比于发明人已知的技术， 简化了制作工艺， 减少了掩模板的使用数量， 降低 了制作成本。
在一个实施例中， 在形成滤色器的图案之后， 形成桥接线的图案之前， 该方法还进一步包括： 形成覆盖基板的第一平坦层； 在形成第一电极、 第二 电极和连接线的图案之后， 该方法还进一步包括： 形成覆盖基板的第二平坦 层。 其有益效果与前述同理。
在一个实施例中， 所述通过构图工艺形成滤色器的图案， 包括： 釆用同 一张掩模板依次制作各个颜色的滤色器图案， 且每制作一种颜色的滤色器图 案后， 所述掩模板偏移设定距离。 其有益效果与前述同理。 附图说明
为了更清楚地说明本公开实施例的技术方案， 下面将对实施例的附图作 简单地介绍，显而易见地，下面描述中的附图仅仅涉及本公开的一些实施例， 而非对本公开的限制。
图 1为现有触摸屏的彩膜基板截面结构示意图 （电极线交叉区域） ； 图 2为本公开触摸屏的彩膜基板一实施例的俯视结构示意图；
图 3为图 2在 A-A处的截面结构示意图；
图 4本公开触摸屏的彩膜基板另一实施例的截面结构示意图 （电极线交 叉区域） ；
图 5为制作图 4所示实施例的彩膜基板的方法流程示意图；
图 6a为形成黑矩阵之前的衬底基板截面结构示意图；
图 6b为形成黑矩阵之后的基板截面结构示意图；
图 6c为形成红色滤色器后的基板截面结构示意图；
图 6d为形成红绿蓝三色滤色器后的基板截面结构示意图；
图 6e为形成第一平坦层后的基板截面结构示意图；
图 6f为形成桥接线后的基板截面结构示意图；
图 6g为形成隔垫物后的基板截面结构示意图； 以及
图 6h为形成第一电极、 第二电极和连接线后的基板截面结构示意图。 具体实施方式
为使本公开实施例的目的、 技术方案和优点更加清楚， 下面将结合本公 开实施例的附图， 对本公开实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本公开的一部分实施例， 而不是全部的实施例。 基于所描 述的本公开的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本公开保护的范围。
为了简化触摸屏中彩膜基板的制作工艺， 降低制作成本， 本公开的至少 一个实施例提供了一种触摸屏的彩膜基板、 触控显示装置及触摸屏的彩膜基 板的制作方法。 在本公开的实施例的技术方案中， 利用彩膜基板的隔垫物将 第一电极线的桥接线和第二电极线的连接线绝缘隔离， 相比于发明人已知的 技术， 桥接线和连接线之间无需另外通过构图工艺形成第一钝化层， 这大大 简化了触摸屏中彩膜基板的制作工艺， 减少了掩模板的使用数量， 降低了制 作成本。 为使本公开的目的、 技术方案和优点更加清楚， 以下举实施例对本 公开作进一步详细说明。
如图 2和图 3所示的一实施例， 其中， 图 2为彩膜基板的俯视结构示意 图； 图 3为图 2在 A-A处的截面结构示意图。才艮据本公开的一个实施例的触 摸屏的彩膜基板， 包括：
衬底基板 20;
位于衬底基板 20上方的黑矩阵 16，黑矩阵 16包括透光区域和遮光区域； 位于黑矩阵 16的透光区域内的滤色器 17;
位于黑矩阵 16和滤色器 17上方且交叉设置的一组第一电极线 21和一组 第二电极线 22， 第一电极线 21包括通过桥接线 23串接的多个第一电极 24， 第二电极线 22包括通过连接线 25串接的多个第二电极 26， 桥接线 23和连 接线 25交叉设置且交叉区域与黑矩阵 16的遮光区域位置相对应； 以及
位于桥接线 23和连接线 25之间将桥接线 23和连接线 25绝缘隔离的隔 垫物 19。
衬底基板 20的材质不限， 例如可以选用透明的玻璃、树脂等等。 黑矩阵 16的主要作用是利用遮光区域遮挡杂散光，防止透光区域所对应的像素之间 产生漏光； 滤色器 17包括 R ( Red, 红色）滤色器、 G ( Green, 绿色）滤色 器和 B ( Blue, 蓝色）滤色器， 主要作用是利用滤光的方式产生红绿蓝三原 色， 再将红绿蓝三原色以不同的强弱比例混合， 从而呈现出各种色彩， 使薄 膜晶体管液晶显示屏可以显示出全彩。 这里需要说明的是， 在液晶显示领域 中， 滤色器并不限于 RGB ( Red Green Blue， 红绿蓝）三色，还可以是 RGBW ( ed Green Blue White, 红绿蓝白） 、 RGBY ( ed Green Blue Yellow, 红 绿蓝黄 )或 CMYK ( Cyan Magenta Yellow Black, 青品红黄黑 )等多种颜色 组合。
内嵌式触摸屏指的是用于实现触控功能的驱动电极线和探测电极线设置 在显示屏的基板上。 在本方案中， 第一电极线 21和第二电极线 22均设置在 彩膜基板上， 第一电极线 21可以为驱动电极线， 则第二电极线 22为探测电 极线； 或者， 第一电极线 21为探测电极线， 则第二电极线 22为驱动电极线， 在此不作具体限定。 桥接线 23的具体材质不限， 当第一电极线 21为驱动电 极线时， 桥接线 23釆用铜等金属（也称为金属桥）， 这样有利于降低驱动电 极线的电阻。 而连接线 25则可以釆用与第一电极 24、 第二电极 26相同的材 质， 例如氧化铟锡等透明导电材料。
隔垫物是在显示装置的装配过程中用到的辅助物， 主要用于控制彩膜基 板和阵列基板之间的间隙， 如果想要获得大面积、 均匀厚度的液晶层， 需要 在彩膜基板和阵列基板之间均匀地设置隔垫物。 在本公开的一个实施例的方 案中， 隔垫物 19在彩膜基板的制作过程中形成， 隔垫物 19设置在第一电极 线 21和第二电极线 22的交叉区域， 位于桥接线 23和连接线 25之间并将桥 接线 23和连接线 25绝缘隔离， 从而使桥接线 23和连接线 25之间形成互感 电容。
在本公开的一个实施例的技术方案中，利用彩膜基板的隔垫物 19将第一 电极线 21的桥接线 23和第二电极线 22的连接线 25绝缘隔离， 相比于发明 人已知的技术， 桥接线 23和连接线 25之间无需另外通过构图工艺形成第一 钝化层， 这大大简化了触摸屏中彩膜基板的制作工艺， 减少了掩模板的使用 数量， 降低了制作成本。
第一电极 24、 第二电极 26和连接线 25可以位于同层； 桥接线 23可以 位于连接线 25的上方（如图 3所示）， 或者， 连接线 25位于桥接线 23的上 方（如图 4所示）。 在具有该结构的彩膜基板中， 第一电极 24、 第二电极 26 和连接线 25可以在同一次构图工艺中形成。当桥接线 23位于连接线 25的上 方时， 桥接线 23的层结构位于第一电极 24、 第二电极 26和连接线 25所在 层结构的上方； 当连接线 25位于桥接线 23的上方时， 第一电极 24、 第二电 极 26和连接线 25所在层结构位于桥接线 23的层结构上方。 作为可选方案， 第一电极 24、 第二电极 26和连接线 25所在层结构与桥接线 23所在层结构 的位置可互换，无论釆用哪一种结构形式，彩膜基板的制作工艺均较为简化， 制作成本较低。
如图 3和图 4所示， 例如， 彩膜基板还包括第一平坦层 27， 第一平坦层 27位于黑矩阵 16和彩色滤色器 17上方且位于第一电极线 21、 第二电极线 22和隔垫物 19所组成的结构下方并覆盖基板。第一平坦层 27可以将黑矩阵 16和彩色滤色器 17的表面平坦化， 有利于在其上进行下一步构图工艺。 如 图 3所示实施例， 当设置第一平坦层 27后， 第一电极 24、 第二电极和连接 线 25可以形成在同一平面， 制作工艺的难度大大降低。
进一步， 彩膜基板还包括第二平坦层 28， 第二平坦层 28位于第一电极 线 21、 第二电极线 22和隔垫物 19所组成的结构上方并覆盖基板。 第二平坦 层 28可以使彩膜基板表面平坦化， 并能够保护电极。 第一平坦层 27和第二 平坦层 28的材质不限， 例如可以为树脂、 氮化硅等。
本公开的至少一个实施例还提供了一种触控显示装置， 包括前述任一实 施例的触摸屏的彩膜基板， 由于彩膜基板的制作工艺较发明人已知的技术简 化， 具有较低的制作成本， 因此， 包含该彩膜基板的触控显示装置也具有较 低的制作成本。
如图 5所示， 本公开的至少一个实施例还提供了一种制作彩膜基板的方 法， 包括以下步骤：
步骤 101、 通过构图工艺在衬底基板之上形成包括透光区域和遮光区域 的黑矩阵的图案；
步骤 102、 通过构图工艺形成至少覆盖黑矩阵的透光区域的滤色器的图 案；
步骤 103、 通过构图工艺在黑矩阵和滤色器的上方形成桥接线的图案； 步骤 104、 通过构图工艺在桥接线的层结构上方形成隔垫物的图案； 步骤 105、 通过构图工艺在隔垫物的层结构上方形成第一电极、 第二电 极和连接线的图案。
其中， 在步骤 102之后， 步骤 103之前， 该方法还可进一步包括： 形成 覆盖基板的第一平坦层； 在步骤 105之后， 该方法还可进一步包括： 形成覆 盖基板的第二平坦层。 第一平坦层和第二平坦层能够起到平坦基板表面及保 护基板的作用， 有利于彩膜基板的构图制作。 为了进一步降低彩膜基板的制作成本， 步骤 102可包括： 釆用同一张掩 模板依次制作各个颜色的滤色器图案， 且每制作一种颜色的滤色器图案后， 掩模板偏移设定距离。 这样制作滤色器仅釆用一张掩模板， 具有较低的制作 成本。
如图 6a至图 6h所示， 制作图 4所示实施例的彩膜基板可具体通过如下 过程实现： 在玻璃基板（即图 6a所示的衬底基板 20 )上沉积黑色光阻膜层， 通过第一次构图工艺形成黑矩阵 16的图案 （这里需要使用第一张掩模板） ， 如图 6b所示。
在完成上述步骤的基板上沉积红色滤色器膜层， 使用第二张掩模板对红 色滤色器膜层进行曝光， 经显影后得到红色滤色器的图案， 如图 6c所示。 这 里需要说明的是， 彩色滤色器可以为正性感光材质 （曝光区域显影后去除， 未曝光区域显影后保留）， 也可以为负性感光材质（未曝光区域显影后去除， 曝光区域显影后保留） ， 第二张掩模板的具体结构需要根据滤色器的材质进 行具体设计， 这些均为惯常技术， 这里不再赘述。
在完成上述步骤的基板上沉积绿色滤色器膜层， 将第二张掩模板偏移设 定距离，然后对绿色滤色器膜层进行曝光，经显影后得到绿色滤色器的图案。 该设定距离与黑矩阵透光区域的宽度相关， 例如将第二张掩模板沿彩膜基板 的长度方向偏移一个透光区域的宽度。
在完成上述步骤的基板上沉积蓝色滤色器膜层， 将第二张掩模板再次偏 移设定距离， 然后对蓝色滤色器膜层进行曝光， 经显影后得到蓝色滤色器的 图案， 如图 6d所示。 以上形成彩色滤色器 17的过程只需使用一张掩模板， 因此， 该过程可称为第二次构图工艺。
在完成上述步骤的基板上旋涂第一平坦层 27， 如图 6e所示；
在完成上述步骤的基板上， 通过第三次构图工艺 （这里需要使用第三张 掩模板）形成桥接线 23的图案， 如图 6f所示；
在完成上述步骤的基板上， 通过第四次构图工艺 （这里需要使用第四张 掩模板）形成隔垫物 19的图案， 如图 6g所示；
在完成上述步骤的基板上， 通过第五次构图工艺 （这里需要使用第五张 掩模板）形成第一电极 24、 第二电极（图中未示出）和连接线 25的图案， 第一电极和第二电极位于基板上， 连接线位于隔垫物 19 上， 此时， 桥接线 23将两侧的第一电极 24搭接， 如图 6h所示。
在完成上述步骤的基板上涂覆第二平坦层 28， 至此完成彩膜基板的制 作， 彩膜基板的结构如图 4所示。
可见， 该过程仅釆用五次构图工艺形成触摸屏的彩膜基板， 相比于发明 人已知的技术， 简化了制作工艺， 减少了掩模板的使用数量， 降低了制作成 本。
本公开的至少一个实施例还提供了一种制作图 3所示彩膜基板的方法， 包括以下步骤：
通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的 图案；
通过构图工艺形成至少覆盖黑矩阵的透光区域的滤色器的图案； 通过构图工艺在黑矩阵和滤色器的上方形成第一电极、 第二电极和连接 线的图案；
通过构图工艺在连接线上方形成隔垫物的图案； 以及
通过构图工艺在隔垫物的层结构上方形成桥接线的图案。
与图 5所示的方法实施例同理， 该技术方案釆用五次构图工艺即可形成 触摸屏的彩膜基板， 相比于发明人已知的技术， 简化了制作工艺， 减少了掩 模板的使用数量， 降低了制作成本。
在一个实施例中， 在形成滤色器的图案之后， 形成第一电极、 第二电极 和连接线的图案之前， 该方法还进一步包括： 形成覆盖基板的第一平坦层； 在形成桥接线的图案之后， 该方法还进一步包括： 形成覆盖基板的第二平坦 层。 第一平坦层和第二平坦层可以起到平坦化基板和保护电极的作用。
在一个实施例中， 通过构图工艺形成滤色器的图案， 包括： 釆用同一张 掩模板依次制作各个颜色的滤色器图案，且每制作一种颜色的滤色器图案后， 掩模板偏移设定距离。制作滤色器仅釆用一张掩模板，具有较低的制作成本。
以上所述仅是本公开的示范性实施方式， 而非用于限制本公开的保护范 围， 本公开的保护范围由所附的权利要求确定。
本申请要求于 2013年 9月 30日递交的中国专利申请第 201310461367.9 号的优先权， 在此全文引用上述中国专利申请公开的内容以作为本申请的一 部分。

Claims

权利要求书
1、 一种内嵌式触摸屏的彩膜基板， 包括：
衬底基板；
黑矩阵， 所述黑矩阵位于所述衬底基板上方， 并包括透光区域和遮光区 域；
滤色器， 位于所述黑矩阵的透光区域内；
一组第一电极线和一组第二电极线， 第一电极线和第二电极线位于所述 黑矩阵和所述滤色器上方且交叉设置， 所述第一电极线包括通过桥接线串接 的多个第一电极， 所述第二电极线包括通过连接线串接的多个第二电极， 所 述桥接线和所述连接线交叉设置且交叉区域与黑矩阵的遮光区域位置相对； 以及
隔垫物， 所述隔垫物位于所述桥接线和所述连接线之间将所述桥接线和 所述连接线绝缘隔离。
2、 如权利要求 1所述的彩膜基板， 其中， 所述第一电极、 第二电极和所 述连接线位于同层； 以及所述桥接线位于所述连接线的上方。
3、如权利要求 1或 2所述的彩膜基板，还包括： 位于所述黑矩阵和所述 滤色器上方， 且位于所述一组第一电极线、 一组第二电极线和隔垫物所组成 的结构下方的覆盖基板的第一平坦层。
4、如权利要求 1至 3中任何一项所述的彩膜基板，还包括： 位于所述一 组第一电极线、 一组第二电极线和隔垫物所组成的结构上方的覆盖基板的第 二平坦层。
5、一种触控显示装置， 包括如权利要求 1至 4任何一项所述的触摸屏的 彩膜基板。
6、 一种制作内嵌式触摸屏的彩膜基板的方法， 包括：
通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的 图案；
通过构图工艺形成至少覆盖黑矩阵的透光区域的滤色器的图案； 通过构图工艺在黑矩阵和滤色器的上方形成第一电极、 第二电极和连接 线的图案； 通过构图工艺在连接线上方形成隔垫物的图案； 以及
通过构图工艺在隔垫物的上方形成桥接线的图案。
7、 如权利要求 6所述的方法， 其中，
在形成滤色器的图案之后， 形成第一电极、 第二电极和连接线的图案之 前， 该方法还进一步包括： 形成覆盖基板的第一平坦层；
在形成桥接线的图案之后， 该方法还进一步包括： 形成覆盖基板的第二 平坦层。
8、如权利要求 6或 7所述的方法， 其中， 所述通过构图工艺形成滤色器 的图案， 包括：
釆用同一张掩模板依次制作各个颜色的滤色器图案， 且每制作一种颜色 的滤色器图案后， 所述掩模板偏移设定距离。
9、 一种制作内嵌式触摸屏的彩膜基板的方法， 包括：
通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的 图案；
通过构图工艺形成至少覆盖黑矩阵的透光区域的滤色器的图案； 通过构图工艺在黑矩阵和滤色器的上方形成桥接线的图案；
通过构图工艺在桥接线上方形成隔垫物的图案；
通过构图工艺在隔垫物上方形成第一电极、 第二电极和连接线的图案。
10、 如权利要求 9所述的方法， 其中，
在形成滤色器的图案之后， 形成桥接线的图案之前， 该方法还进一步包 括： 形成覆盖基板的第一平坦层；
在形成第一电极、第二电极和连接线的图案之后，该方法还进一步包括： 形成覆盖基板的第二平坦层。
11、如权利要求 9或 10所述的方法， 其中， 所述通过构图工艺形成滤色 器的图案包括：
釆用同一张掩模板依次制作各个颜色的滤色器图案， 且每制作一种颜色 的滤色器图案后， 所述掩模板偏移设定距离。
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