WO2020052038A1 - 显示面板及显示面板的制作方法 - Google Patents

显示面板及显示面板的制作方法 Download PDF

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Publication number
WO2020052038A1
WO2020052038A1 PCT/CN2018/114519 CN2018114519W WO2020052038A1 WO 2020052038 A1 WO2020052038 A1 WO 2020052038A1 CN 2018114519 W CN2018114519 W CN 2018114519W WO 2020052038 A1 WO2020052038 A1 WO 2020052038A1
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WO
WIPO (PCT)
Prior art keywords
color
color resist
block
region
resist
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Application number
PCT/CN2018/114519
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English (en)
French (fr)
Inventor
黄北洲
Original Assignee
惠科股份有限公司
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Application filed by 惠科股份有限公司 filed Critical 惠科股份有限公司
Priority to US16/225,687 priority Critical patent/US11009740B2/en
Publication of WO2020052038A1 publication Critical patent/WO2020052038A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

Definitions

  • the present application relates to the field of display technology, and in particular, to a display panel and a manufacturing method of the display panel.
  • Liquid crystal display (Liquid Crystal Display, LCD) is a commonly used electronic device, because of its low power consumption, small size, light weight and other characteristics, it is widely favored by users.
  • liquid crystal display devices are mainly based on thin film transistor (TFT) liquid crystal displays (TFT-LCD).
  • TFT thin film transistor
  • the liquid crystal display mainly includes a liquid crystal display panel and a backlight module.
  • the liquid crystal display panel is mainly composed of a thin film transistor substrate (Thin Film Transistor Substrate, TFT substrate), a color filter substrate (Color Filter Substrate, CF substrate), and a liquid crystal layer sandwiched between the two substrates.
  • TFT substrate Thin Film Transistor Substrate
  • CF substrate Color Filter Substrate
  • the TFT When a voltage is applied between the two substrates, the TFT is turned on or off according to the scanning signal, which acts as a switch on the transmission of the data signal.
  • the liquid crystal molecules of the liquid crystal layer rotate according to different data voltage signals to transmit or block light. The light is transmitted out to form an image of the corresponding data signal.
  • the CF substrate of the liquid crystal display panel is provided with a plurality of spaced color resist blocks corresponding to the opening areas of multiple sub-pixels.
  • a black matrix (BM) is provided between the color resist blocks and corresponds to the non-open areas of the sub-pixels.
  • columnar spacers are arranged on the common electrode layer and corresponding to the black matrix to support the thickness of the box.
  • the columnar spacers are divided into main spacers and The auxiliary septum is supported between the two substrates. When the liquid crystal panel is compressed and the main septum is compressed, the auxiliary septum further functions to support the thickness of the box.
  • the manufacturing process includes BM, red / green / blue resist, common electrode, main spacer and There are a total of seven process steps for the auxiliary septum. The number of process steps is large and the process is complicated. Each process involves etching and removal, resulting in waste of raw materials and excessive cost.
  • An object of the present application is to provide a display panel, including, but not limited to, a technical problem of a complicated and expensive manufacturing process of a color filter substrate in the display panel.
  • a display panel including:
  • a color filter substrate includes a substrate base layer, including a first color resist region, a second color resist region, and a third color resist region corresponding to the opening regions of a plurality of sub-pixels, and a plurality of sub-pixels A fourth region of a pixel's non-opening region; a color-resistance composite layer provided on the substrate base layer, including a first color-resistance layer, a second color-resistance layer, and a third color-resistance layer; the first color-resistance layer
  • the first color resist block includes at least the first color resist region, the first color resist film in the fourth region, the first color resist pillar in the fourth region, and the second color resist layer.
  • the third color resist layer includes a second color resist block located at least in the second color resist area, a second color resist film in the fourth area, and a second color resist pillar in the fourth area. Including at least a third color resist block located in the third color resist region, a third color resist film located in the fourth region, and a third color resist pillar located in the fourth region; The first color resist film, the second color resist film, and the third color resist film are superimposed to form a black matrix, and the first color resist pillars in the fourth region Second color resist, and a third color filter column at least two superposed column spacer is formed.
  • the color filter substrate includes a substrate base layer including a first color resist region corresponding to an opening region of a plurality of sub-pixels, and a second A color-blocking region and a third color-blocking region, and a fourth region corresponding to a non-opening region of a plurality of sub-pixels;
  • a color-blocking composite layer is provided on the substrate base layer and includes a first color-blocking layer and a second color-blocking layer And a third color resist layer;
  • the first color resist layer includes a first color resist block located in the first color resist area, a first color resist film located in the fourth area, and a A first color resist pillar
  • the second color resist layer includes a second color resist block located in the second color resist area, a second color resist film located in the fourth area, and a first color resist layer located in the fourth area
  • the two-color resist pillar, the third color resist layer includes a third color resist block located in the third color resist
  • the first auxiliary color resisting column part, the second auxiliary color resisting column part and the third auxiliary color resisting column part are superposed to form an auxiliary septum; the first color resisting block, the second color resisting block and the third The height of the color resist block is 2 ⁇ m; the height of the first color resist film, the second color resist film, and the third color resist film is 0.33 ⁇ m; the first main color resist pillar portion and the second main color resist pillar portion And the height of the third main color resisting pillar portion is 1.83 ⁇ m; the heights of the first auxiliary color resisting pillar portion, the second auxiliary color resisting pillar portion, and the third auxiliary color resisting pillar portion are 1.75 ⁇ m.
  • Another object of the present application is to provide a method for manufacturing a display panel, including a step of manufacturing a color filter substrate.
  • the step of manufacturing a color filter substrate includes:
  • a substrate base layer is provided.
  • the substrate base layer includes a first color resist region, a second color resist region, and a third color resist region corresponding to an open region of a plurality of sub-pixels, and a fourth Area;
  • a first color resist material is deposited on the substrate base layer, and the first color resist layer is obtained after exposure, development, and etching through a half-tone mask.
  • the first color resist layer includes at least the first color resist region.
  • a height of the first color resist pillar is greater than a height of the first color resist film
  • a second color resist material is deposited on the substrate base layer and the first color resist layer, and is exposed, developed, and etched through a half-tone photomask to obtain a second color resist layer.
  • the second color resist layer includes at least A second color resist block in the second color resist region, a second color resist film in the fourth region, and a second color resist pillar in the fourth region;
  • a height of the second color resist pillar is greater than a height of the second color resist film
  • a third color resist material is deposited on the substrate base layer, the first color resist layer, and the second color resist layer. After exposure, development, and etching through a half-tone mask, a third color resist layer is obtained.
  • the resist layer includes a third color resist block located at least in the third color resist region, a third color resist film in the fourth region, and a third color resist pillar in the fourth region;
  • a height of the third color resist pillar is greater than a height of the third color resist film
  • the first color resist film, the second color resist film, and the third color resist film located in the fourth region are stacked to form a black matrix, and the first color resist pillar, the second color resist pillar, and the third At least two of the color blocking pillars are superimposed to form a spacer.
  • a color resist composite layer is provided on the base layer of the color filter substrate.
  • the first color resist layer includes a first color resist block, a first color resist film, and a first color resist pillar.
  • the two-color resist layer includes a second color resist block, a second color resist film, and a second color resist pillar.
  • the third color resist layer includes a third color resist block, a third color resist film, and a third color resist pillar.
  • the color-resistance film, the second color-resistance film, and the third color-resistance film are stacked to form a black matrix.
  • At least two of the first color-resistance column, the second color-resistance column, and the third color-resistance column are stacked to form a spacer.
  • the mat, the black matrix and the first to third color resists are formed at the same time, eliminating the process of the black matrix and the process of the spacer, saving the number of processes and the complexity of the process, and reducing the cost of raw materials and production.
  • a spacer is formed by superposing at least two of the first, second, and third color resist columns, and the spacer, black matrix, and first to third color resists are stacked.
  • the blocks are formed at the same time, eliminating the process of the black matrix and the process of the spacer, saving the number of processes and the complexity of the process, and reducing the cost of raw materials and production.
  • FIG. 1 is a schematic diagram of superposition of an island-shaped photoresist block and a black matrix of a display panel according to a first embodiment of the present application;
  • FIG. 2 is a schematic structural diagram of a substrate base layer of a color filter substrate of a display panel according to a first embodiment of the present application
  • FIG. 3 and FIG. 4 are cross-sectional structural schematic diagrams along a line A-A of a color filter substrate of a display panel according to a first embodiment of the present application;
  • FIG. 5 is a schematic diagram of a superposition of a strip photoresist band and a black matrix of a display panel according to a second embodiment of the present application;
  • FIG. 6 is a schematic cross-sectional structure view of a color filter substrate of a display panel along a line B-B according to a second embodiment of the present application;
  • FIG. 7 is a flowchart of a method for manufacturing a color filter substrate of a display panel provided by the third embodiment and the fourth embodiment of the present application;
  • step S2 is a schematic diagram of step S2 of a method for manufacturing a color filter substrate of a display panel according to a third embodiment of the present application.
  • step S3 is a schematic diagram of step S3 of a method for manufacturing a color filter substrate of a display panel according to a third embodiment of the present application.
  • step S4 of a method for manufacturing a color filter substrate of a display panel according to a third embodiment of the present application
  • step S2 is a schematic diagram of step S2 of a method for manufacturing a color filter substrate of a display panel according to a fourth embodiment of the present application;
  • step S3 is a schematic diagram of step S3 of a method for manufacturing a color filter substrate of a display panel according to a fourth embodiment of the present application;
  • FIG. 13 is a schematic diagram of step S4 of a method for manufacturing a color filter substrate of a display panel according to a fourth embodiment of the present application.
  • the present application provides a display panel including a color filter substrate 100 and an array substrate (not shown) disposed opposite to the color filter substrate 100.
  • the color filter substrate 100 The substrate base layer 1 and a color resist composite layer 2 provided on the substrate base layer 1 are included.
  • the substrate base layer 1 includes a first color resist region 11, a second color resist region 12 and a third color corresponding to the opening regions of a plurality of sub-pixels.
  • the color resistive composite layer 2 includes a first resistive layer 21, a second resistive layer 22, and a third resistive layer 23;
  • the layer 21 includes a first color resist block 211 at least in the first color resist region 11, a first color resist film 212 in the fourth region 14, and a first color resist pillar 213 in the fourth region 14.
  • the second The color resist layer 22 includes a second color resist block 221 at least in the second color resist region 12, a second color resist film 222 in the fourth region 14, and a second color resist pillar 223 in the fourth region 14.
  • the resist layer 23 includes a first color resist block 211 at least in the third color resist region 13, a third color resist film 232 in the fourth region 14, and a Three color resist columns 233; wherein the height R0 of the first color resist block 211 is greater than the height R2 of the first color resist column 213, and the height R2 of the first color resist column 213 is greater than the height R1 of the first color resist film 212;
  • the height G0 of the color block 221 is greater than the height G2 of the second color block 223, and the height G2 of the second color block 223 is greater than the height G1 of the second color block film 222;
  • the height B0 of the third color block 231 is greater than the third The height B2 of the color resist pillar 233, the height B2 of the third color resist pillar 233 is greater than the height B1 of the third color resist film 232, and the first color resist film 212, the second color resist film 222, and the third The color resist film 232 is stacked to form a black matrix 26, and
  • the color resist composite layer 2 includes a first color resist layer 21, a second color resist layer 22, and a third color resist layer 23.
  • the first color resist layer 21 includes at least The first color resist block 211 in the first color resist region 11, the first color resist film 212 in the fourth region 14, and the first color resist pillar 213 in the fourth region 14.
  • the second color resist layer 22 The second color resist block 221 at least in the second color resist region 12, the second color resist film 222 in the fourth region 14, and the second color resist pillar 223 in the fourth region 14.
  • the third color resist layer 23 includes At least the third color resist block 231 located in the third color resist region 13, the third color resist film 232 located in the fourth region 14, and the third color resist pillar 233 located in the fourth region 14 are formed by the first A color resist film 212, a second color resist film 222, and a third color resist film 232 are superimposed as a black matrix 26.
  • the first color resist pillar 213, the second color resist pillar 223, and the third color resist are located in the fourth region 14.
  • At least two of the pillars 233 are superimposed, and as the spacer 27, the black matrix 26 and the spacer 27 are simultaneously formed with the first color block 211, the second color block 221, and the third color block 231 Therefore, the separate processes of the black matrix 26 and the spacer 27 are omitted, the waste of the raw materials of the black matrix 26 and the spacer 27 in the process is avoided, and the raw material cost and the manufacturing cost are reduced.
  • the first color resist layer 21 is a red color resist layer
  • the second color resist layer 22 is a green color resist layer
  • the third color resist layer 23 is a blue color resist layer.
  • the colors of the first color resist layer 21, the second color resist layer 22, and the third color resist layer 23 can be arbitrarily exchanged, which is not limited.
  • FIG. 1 to FIG. 4 is a color filter substrate 100 for a display panel according to a first embodiment of the present application.
  • the first color resist block 211, the second color resist block 221, and the third color resist block 231 are island-shaped. .
  • the first color resist block 211 is disposed corresponding to the first color resist region 11 of the substrate base layer 1
  • the second color resist block 221 is disposed corresponding to the second color resist region 12
  • the third color resist block 231 is disposed corresponding to the third color resist region 13.
  • the first color block 211, the second color block 221, and the third color block 231 correspond to the open areas of the red, green, and blue sub-pixels as the red, green, and blue filter units, respectively.
  • the first color resist film 212, the second color resist film 222, and the third color resist film 232 absorb red light, green light, and blue light, respectively, and can block the passage of light.
  • the first color resist film 212, the second color resist film 222, and the third color resist film 232 can be stacked as a black matrix 26, and surround the first color resist block 211, the second color resist block 221, and the third color resist block 231. Around, corresponding to the non-opening area of the sub-pixel.
  • the height R0 of the first color resist block 211 is greater than the height R2 of the first color resist post 213 and less than three times the height R2 of the first color resist post 213;
  • the height G0 is greater than the height G2 of the second color resistance pillar 223 and less than three times the height G2 of the second color resistance pillar 223;
  • the height B0 of the third color resistance block 231 is greater than the height B2 of the third color resistance pillar 233 and less than the third
  • the color-resistance pillar 233 is three times the height B2.
  • the range of the height R0 of the first color resist block 211, the height G0 of the second color resist block 221, and the height B0 of the third color resist block 231 are 2 ⁇ 0.5 ⁇ m.
  • the range of the height R1 of the first color resist film 212, the height G1 of the second color resist film 222, and the height B1 of the third color resist film 232 is 0.33 ⁇ 0.2 ⁇ m.
  • the first color barrier pillar 213 includes a first main color barrier pillar portion 2131 and a first auxiliary color barrier pillar portion 2132.
  • the height R21 of the first main color barrier pillar portion 2131 is greater than the first auxiliary color barrier pillar portion 2131.
  • the height R22 of 2132 is provided between the first main color resisting column portion 2131 and the first auxiliary color resisting column portion 2132 with the first color resist block 211 or the second color resist block 221 or the third color resist block 231, for example, the first A main color resisting post portion 2131 is disposed between the second color resisting block 221 and the third color resisting block 231, and a first auxiliary color resisting column portion 2132 is disposed between the first and second color resisting blocks 211 and 221. .
  • the positions of the first main color resisting column portion 2131 and the first auxiliary color resisting column portion 2132 may be changed, for example, the first main color resisting column portion 2131 is located between two adjacent third color resist blocks 231
  • the first auxiliary color resist pillar portion 2132 is located between the two second color resist blocks 221, which is not limited.
  • the second color blocking pillar 223 includes a second main color blocking pillar portion 2231 on the first main color blocking pillar portion 2131 and a second auxiliary color blocking pillar portion 2232 on the first auxiliary color blocking pillar portion 2132.
  • the height G21 of the color blocking column portion 2231 is greater than the height G22 of the second auxiliary color blocking column portion 2232.
  • the third color blocking column 233 includes a third main color blocking column portion 2331 on the second main color blocking portion and a second auxiliary color blocking column portion 2331.
  • the height of the third auxiliary color resisting column portion 2332 and the third main color resisting column portion 2331 on the color resisting column portion 2232 is greater than the height B22 of the third auxiliary color resisting column portion 2332.
  • the first main color resist pillar portion 2131, the second main color resist pillar portion 2231, and the third main color resist pillar portion 2331 are superimposed to form a main spacer between the second color resist block 221 and the third color resist block 231.
  • the range of the height R22 of the first auxiliary color column portion 2132, the height G22 of the second auxiliary color column portion 2232, and the height B22 of the third auxiliary color column portion 2332 are 1.75 ⁇ 0.05 ⁇ m.
  • FIG. 5 and FIG. 6 is a color filter substrate 100 of a display panel according to a second embodiment of the present application.
  • the first color resist block 211, the second color resist block 221, and the third color resist block 231 are in a strip shape.
  • the first color resist block 211 corresponds to a plurality of first color resist regions 11 and a portion of the fourth region 14 between two adjacent first color resist regions 11, and the second color resist block 221 corresponds to a plurality of second color resist regions 12 and a portion between two adjacent second color resist regions 12 and a fourth region 14 is provided, and the third color resist block 231 corresponds to a plurality of third color resist regions 13 and a portion between two adjacent third color resist regions 13 The fourth area 14 is provided.
  • a portion of the first color resist block 211 corresponding to the plurality of first color resist regions 11 is used to correspond to an opening area of the red sub-pixel.
  • a second color resist block 221 corresponds to a plurality of second color resist regions 12
  • the opening area corresponding to the green sub-pixel is used as a green filter unit
  • the portion of the third color blocking block 231 corresponding to the plurality of third color blocking areas 13 is used to correspond to the opening area of the blue sub-pixel as a blue filter unit. .
  • the first color resist film 212, the second color resist film 222, and the third color resist film 232 transmit red light, green light, and blue light, respectively, and can finally block The light passes through, so that the first color resist film 212, the second color resist film 222, and the third color resist film 232 are superimposed and can be used as the black matrix 26, corresponding to the non-opening area of the sub-pixel.
  • the first color resisting post 213, the second color resisting post 223, and the third color resisting post 233 are disposed between the two first color resisting regions 11 and the two second color resisting regions 12. Between the two third color resistive regions 13 or between the two third color resistive regions 13. The purpose of this arrangement is because the first color resistive block 211 and the two second color resistive regions 12 can be arranged between the two first color resistive regions 11. The thickness of the second color resist block 221 or the third color resist block 231 between the two third color resist regions 13 is used to form the spacer 27, which saves a part of the color resist material and reduces the production cost.
  • the first color resisting post 213, the second color resisting post 223, and the third color resisting post 233 may be disposed on the first color resist block 211 and the second between the strips between the color resist blocks 221 and the third color resist blocks 231, at this time, the formation of the spacers 27 is the same as in the first embodiment, and details are not described herein again.
  • the spacer 27 of the second embodiment is formed by superposing color resisting columns of two colors on color resisting blocks of another color.
  • the first color barrier pillar 213 includes a first main color barrier pillar portion 2131 and a first auxiliary color barrier pillar portion 2132.
  • the height R21 of the first main color barrier pillar portion 2131 is greater than the height of the first auxiliary color barrier pillar portion 2132.
  • the first main color resist pillar portion 2131 is disposed between two adjacent third color resist regions 13 and the first auxiliary color resist pillar portion 2132 is disposed between two adjacent second color resist regions 12;
  • the color-resistance pillar 223 is disposed on the first main color-resistance pillar portion 2131, and its height G2 is equal to the height R21 of the first main color-resistance pillar portion 2131;
  • the two-color resisting block 221 has a height B2 equal to the height R22 of the first auxiliary color resisting pillar portion 2132.
  • the third color resist block 231, the first main color resist pillar portion 2131, and the second color resist pillar 223 are superimposed to form a main spacer between two adjacent third color resist regions 13. 28.
  • the range of the height R0 of the first color resist block 211, the height G0 of the second color resist block 221, and the height B0 of the third color resist block 231 are 2 ⁇ 0.5 ⁇ m.
  • the range of the height R22 of the first auxiliary color resisting pillar portion 2132 and the height B2 of the third color resisting pillar 233 is 1.75 ⁇ 0.05 ⁇ m.
  • the present application further provides a method for manufacturing a display panel, which includes a step of manufacturing a color filter substrate and a step of manufacturing an array substrate, and a step of aligning the color filter substrate with the array substrate.
  • the steps of the color filter substrate include:
  • a substrate base layer 1 is provided.
  • the substrate base layer 1 includes a first color resist region 11, a second color resist region 12, and a third color resist region 13 corresponding to opening regions of a plurality of sub-pixels, and a plurality of sub-pixels.
  • Step S2 depositing a layer of a first color resist material, such as a red color resist material, on the substrate base layer 1, and exposing, developing, and etching the half-tone photomask to obtain a first color resist layer 21 and a first color resist layer 21
  • the first color resist block 211 at least in the first color resist region 11, the first color resist film 212 in the fourth region 14, and the first color resist pillar 213 in the fourth region 14;
  • the height R0 is greater than the height R2 of the first color resist pillar 213, and the height R2 of the first color resist pillar 213 is greater than the height R1 of the first color resist film 212;
  • Step S3 depositing a second color resist material, such as a green color resist material, on the substrate base layer 1 and the first color resist layer 21, and exposing, developing, and etching the half-tone mask to obtain a second color resist layer 22
  • the second color resist layer 22 includes a second color resist block 221 at least in the second color resist region 12, a second color resist film 222 in the fourth region 14, and a second color resist pillar 223 in the fourth region 14;
  • the height B0 of the second color resist block 221 is greater than the height B2 of the second color resist pillar 223, and the height B2 of the second color resist pillar 223 is greater than the height B1 of the second color resist film 222;
  • Step S4 depositing a layer of a third color resist material, such as a blue color resist material, on the substrate base layer 1, the first color resist layer 21, and the second color resist layer 22, after exposure, development, and etching through a halftone mask, A third color resist layer 23 is obtained.
  • the third color resist layer 23 includes a third color resist block 231 at least in the third color resist region 13, a third color resist film 232 in the fourth region 14, and a third color resist film 232 in the fourth region 14.
  • the height B0 of the third color resist block 231 is greater than the height B2 of the third color resist pillar 233, and the height B2 of the third color resist pillar 233 is greater than the height B1 of the third color resist film 232;
  • the first color-resistive film 212, the second color-resistive film 222, and the third color-resistive film 232 in the fourth region 14 are superimposed as a black matrix 26, and the first color-resistive pillars 213 and the second color-resistive pillars in the fourth region 14 are stacked. At least two of 223 and the third color resist pillar 233 are superimposed.
  • the colors of the first color resist layer 21, the second color resist layer 22, and the third color resist layer 23 can be arbitrarily exchanged, which is not limited.
  • the first color resist block 211 is in an island shape and is disposed corresponding to the first color resist region 11.
  • a first color resist film 212 and a second color resist pillar 223 are formed, wherein the first color resist pillar 213 is divided into a first main color resist pillar portion 2131 and a first auxiliary color.
  • the height R21 of the first resistive column portion 2132 and the first main resistive column portion 2131 is greater than the height R22 of the first auxiliary resistive column portion 2132.
  • the first main resistive column portion 2131 and the first auxiliary resistive column portion 2132 are spaced apart, for example In the third embodiment, the first main color resisting column portion 2131 is disposed between the second color resisting region 12 and the third color resisting region 13, and the first auxiliary color resisting column portion 2132 is disposed in the first color resisting region 11. And the second color resistance region 12.
  • the positions of the first main color resister pillar portion 2131 and the first auxiliary color resister pillar portion 2132 may be changed, for example, the first main color resister pillar portion 2131 is located in two adjacent third color resist regions 13 In between, the first auxiliary color resisting pillar portion 2132 is located between the two second color resisting regions 12, which is not limited.
  • the second color resist block 221 is in an island shape and is disposed corresponding to the second color resist region 12.
  • a second color resist film 222 and a second color resist pillar 223 are formed in the fourth region 14 of the substrate base layer 1.
  • the second color resist film 222 covers the second color resist film 222
  • the second color resist pillar 223 includes The height of the second main color pillar portion 2231 on the first main color pillar portion 2131 and the second auxiliary color pillar portion 2232 on the first auxiliary color pillar portion 2132 and the height of the second main color pillar portion 2231 G21 is larger than the height G22 of the second auxiliary color resist pillar portion 2232.
  • the third color resist block 231 is in an island shape and is disposed corresponding to the third color resist region 13.
  • a third color resist film 232 and a third color resist film 233 are formed on the fourth region 14 of the substrate base layer 1.
  • the third color resist film 232 covers the second color resist film 222.
  • the third color resist film 233 includes The height of the third main color pillar portion 2331 on the second main color pillar portion 2231 and the third auxiliary color pillar portion 2332 on the second auxiliary color pillar portion 2232, and the height of the third main color pillar portion 2331 B21 is greater than the height B22 of the third auxiliary color blocking pillar portion 2332.
  • the first color block 211, the second color block 221, and the third color block 231 correspond to the open areas of the red, green, and blue sub-pixels as the red, green, and blue filter units, respectively.
  • FIGS. 11 to 13 are steps of fabricating a color filter substrate in a method for fabricating a display panel according to a fourth embodiment of the present application.
  • the first color resist block 211 is in a strip shape, and the first color resist block 211 corresponds to a plurality of first color resist regions 11 and a portion of a fourth region between the two first color resist regions 11. 14 is provided, and the portion of the first color resist block 211 corresponding to the plurality of first color resist regions 11 is used to correspond to the opening area of the red sub-pixel as a red filter unit.
  • the first color resist pillar 213 includes a first main color resist pillar portion 2131 and a first auxiliary color resist.
  • the column part 2132 wherein the first main color resist column part 2131 is located between the two third color resist regions 13, the first auxiliary color resist column part 2132 is located between the two second color resist regions 12, and the first main color resist
  • the height R21 of the pillar portion 2131 is greater than the height R22 of the first auxiliary color blocking pillar portion 2132.
  • the second color resist block 221 is in a strip shape, and is disposed corresponding to the plurality of second color resist regions 12 and a portion of the fourth region 14 between the two second color resist regions 12.
  • the second color A portion of the blocking block 221 corresponding to the plurality of second color blocking regions 12 is used to correspond to an opening region of a green sub-pixel, and serves as a green filter unit.
  • a portion of the second color resist block 221 located between the two second color resist regions 12 also covers the first auxiliary color resist pillar portion 2132.
  • a second color resist film 222 and a second color resist pillar 223 are formed, the second color resist film 222 covers the first color resist film 212, and the second color resist pillar 223 covers the first main color resister pillar portion 2131, and the height G2 of the second main color resister pillar 223 may be equal to the height R21 of the first main color resister pillar portion 2131.
  • the thickness of the second color resist block 221 is the same everywhere, so the area corresponding to the first auxiliary color resist pillar portion 2132 is higher than other areas of the second color resist block 221.
  • the third color resist block 231 is in a stripe shape, corresponding to the plurality of third color resist regions 13 and a portion of the fourth region 14 between the two third color resist regions 13.
  • the third color The portion of the blocking block 231 corresponding to the plurality of third color blocking regions 13 is used to correspond to the opening region of the blue sub-pixel, and serves as a blue filter unit.
  • a portion of the third color resist block 231 located between the two third color resist regions 13 also covers the second color resist pillar 223.
  • a third color resist film 232 and a third color resist pillar 233 are also formed.
  • the third color resist film 233 covers the second color resist film 222, and the third color resist film
  • the resistive pillar 233 covers the second color resistive block 221 and the first auxiliary resistive pole portion 2132, and the height B2 of the third resistive resistive pole 233 may be equal to the height R22 of the first auxiliary resistive pole portion 2132.
  • the thickness of the third color resist block 231 is the same everywhere, so the areas corresponding to the first main color resist pillar portion 2131 and the second color resist pillar 223 are higher than other areas of the third color resist block 231.

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Abstract

一种显示面板，包括彩色滤光片基板(100)，包括第一色阻层(21)、第二色阻层(22)和第三色阻层(23)，第一、第二和第三色阻层部分叠加形成黑色矩阵(26)，第一、第二和第三色阻层部分叠加形成隔垫物(27)。

Description

显示面板及显示面板的制作方法 技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板及显示面板的制作方法。
背景技术
液晶显示器(Liquid Crystal Display，LCD)是一种常用的电子设备，由于其具有功耗低、体积小、重量轻等特性，因此广泛受到用户青睐。目前的液晶显示装置主要是以薄膜晶体管(Thin Film Transistor,TFT)液晶显示器(TFT-LCD)为主。
液晶显示器主要包括液晶显示面板及背光模组。其中，液晶显示面板主要由一薄膜晶体管基板(Thin Film Transistor Substrate，TFT基板)、一彩色滤光片基板(Color Filter Substrate，CF基板)，以及夹设于两基板之间的一液晶层构成。
在两基板之间施加电压，TFT根据扫描信号对应开启或关闭，对数据信号的传递起开关作用，液晶层的液晶分子根据不同数据电压信号旋转，以透光或遮光，将背光模组所提供的光线透射出来以形成对应数据信号的图像。
液晶显示面板的CF基板上设有多个间隔设置的色阻块，分别对应多个子像素的开口区域，黑色矩阵(Black Matrix，BM)设置于色阻块之间，对应子像素的非开口区域，用于防止不同颜色的子像素的漏光或串光，柱状隔垫物设置于公共电极层上并对应黑色矩阵设置，用于支撑盒厚，其中柱状隔垫物又分为主隔垫物和辅隔垫物，主隔垫物支撑于两基板之间，当液晶面板受压使主隔垫物被压缩后，辅隔垫物进一步起支撑盒厚的功能。不论是对于条状光阻带与 黑色矩阵叠加还是岛状光阻块与黑色矩阵叠加的CF基板，其制作过程均包括BM、红/绿/蓝色阻层、公共电极、主隔垫物和辅隔垫物共七道工艺制程，工艺制程数量较多，制程复杂，在每一制程中均涉及蚀刻去除，造成原料浪费及成本过高。
基于以上所述，有必要提供一种能够节省制程的CF基板及其制作方法。
申请内容
本申请一目的在于提供一种显示面板，包括但不限于解决显示面板中彩色滤光片基板的制程复杂及成本过高的技术问题。
为解决上述技术问题，本申请实施例采用的技术方案是：一种显示面板，包括：
彩色滤光片基板，所述彩色滤光片基板包括：衬底基层，包括对应多个子像素的开口区的第一色阻区、第二色阻区和第三色阻区，以及对应多个子像素的非开口区的第四区；色阻复合层，设于所述衬底基层上，包括第一色阻层、第二色阻层和第三色阻层；所述第一色阻层包括至少位于所述第一色阻区的第一色阻块、位于所述第四区的第一色阻薄膜以及位于所述第四区的第一色阻柱，所述第二色阻层包括至少位于所述第二色阻区的第二色阻块、位于所述第四区的第二色阻薄膜以及位于所述第四区的第二色阻柱，所述第三色阻层包括至少位于所述第三色阻区的第三色阻块、位于所述第四区的第三色阻薄膜以及位于所述第四区的第三色阻柱；位于所述第四区的第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵，位于所述第四区的第一色阻柱、第二色阻柱和第三色阻柱中的至少两个叠加形成隔垫物。
本申请的另一目的在于提供一种显示面板，包括彩色滤光片基板，所述彩色滤光片基板包括：衬底基层，包括对应多个子像素的开口区的第一色阻区、第二色阻区和第三色阻区，以及对应多个子像素的非开口区的第四区；色阻复合层，设于所述衬底基层上，包括第一色阻层、第二色阻层和第三色阻层；所述第一色阻层包括位于所述第一色阻区的第一色阻块、位于所述第四区的第一 色阻薄膜以及位于所述第四区的第一色阻柱，所述第二色阻层包括位于所述第二色阻区的第二色阻块、位于所述第四区的第二色阻薄膜以及位于所述第四区的第二色阻柱，所述第三色阻层包括位于所述第三色阻区的第三色阻块、位于所述第四区的第三色阻薄膜以及位于所述第四区的第三色阻柱；所述第一色阻柱包括第一主色阻柱部分和第一辅色阻柱部分，所述第二色阻柱包括第二主色阻柱部分和第二辅色阻柱部分，所述第三色阻柱包括第三主色阻柱部分和第三辅色阻柱部分；位于所述第四区的第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵；所述第一主色阻柱部分、第二主色阻柱部分和第三主色阻柱部分叠加形成主隔垫物，所述第一辅色阻柱部分、第二辅色阻柱部分和第三辅色阻柱部分叠加形成辅隔垫物；所述第一色阻块、第二色阻块和第三色阻块的高度为2μm；所述第一色阻薄膜、第二色阻薄膜和第三色阻薄膜的高度为0.33μm；所述第一主色阻柱部分、第二主色阻柱部分和第三主色阻柱部分的高度为1.83μm；所述第一辅色阻柱部分、第二辅色阻柱部分和第三辅色阻柱部分的高度为1.75μm。
本申请的再一目的在于提供一种显示面板的制作方法，包括制作彩色滤光片基板的步骤，所述制作彩色滤光片基板的步骤包括：
提供衬底基层，所述衬底基层上包括对应多个子像素的开口区的第一色阻区、第二色阻区和第三色阻区，以及对应多个子像素的非开口区的第四区；
在所述衬底基层上沉积第一色阻材料，经半色调光罩曝光、显影及蚀刻后，得到第一色阻层，所述第一色阻层包括至少位于所述第一色阻区的第一色阻块、位于所述第四区的第一色阻薄膜以及位于所述第四区的第一色阻柱；
所述第一色阻柱的高度大于所述第一色阻薄膜的高度；
在所述衬底基层和第一色阻层上沉积第二色阻材料，经半色调光罩曝光、显影及蚀刻后，得到第二色阻层，所述第二色阻层包括至少位于所述第二色阻区的第二色阻块、位于所述第四区的第二色阻薄膜以及位于所述第四区的第二色阻柱；
所述第二色阻柱的高度大于所述第二色阻薄膜的高度；
在所述衬底基层、第一色阻层和第二色阻层上沉积第三色阻材料，经半色调光罩曝光、显影及蚀刻后，得到第三色阻层，所述第三色阻层包括至少位于所述第三色阻区的第三色阻块、位于所述第四区的第三色阻薄膜以及位于所述第四区的第三色阻柱；
所述第三色阻柱的高度大于所述第三色阻薄膜的高度；
位于所述第四区的第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵，位于所述第四区的第一色阻柱、第二色阻柱和第三色阻柱中的至少两个叠加形成隔垫物。
本申请实施例提供的显示面板，彩色滤光片基板的衬底基层上设有色阻复合层，第一色阻层包括第一色阻块、第一色阻薄膜以及第一色阻柱，第二色阻层包括第二色阻块、第二色阻薄膜以及第二色阻柱，第三色阻层包括第三色阻块、第三色阻薄膜以及第三色阻柱，由第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵，由第一色阻柱、第二色阻柱和第三色阻柱中的至少两个叠加形成隔垫物，隔垫物、黑矩阵与第一至第三色阻块同时形成，省去了黑矩阵的制程和隔垫物的制程，节省了制程数量和工艺复杂度，降低了原料成本和制作成本。显示面板的制作方法中，由第一色阻柱、第二色阻柱和第三色阻柱中的至少两个叠加形成隔垫物，隔垫物、黑矩阵与第一至第三色阻块同时形成，省去了黑矩阵的制程和隔垫物的制程，节省了制程数量和工艺复杂度，降低了原料成本和制作成本。
附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其它的附图。
图1是本申请第一实施例提供的显示面板的岛状光阻块与黑矩阵的叠加 示意图；
图2是本申请第一实施例提供的显示面板的彩色滤光片基板的衬底基层的结构示意图；
图3和图4是本申请第一实施例提供的显示面板的彩色滤光片基板的沿A-A线的剖面结构示意图；
图5是本申请第二实施例提供的显示面板的条状光阻带与黑矩阵的叠加示意图；
图6是本申请第二实施例提供的显示面板的彩色滤光片基板的沿B-B线的剖面结构示意图；
图7是本申请第三实施例和第四实施例提供的显示面板的彩色滤光片基板的制作方法的流程图；
图8是本申请第三实施例提供的显示面板的彩色滤光片基板的制作方法的步骤S2的示意图；
图9是本申请第三实施例提供的显示面板的彩色滤光片基板的制作方法的步骤S3的示意图；
图10是本申请第三实施例提供的显示面板的彩色滤光片基板的制作方法的步骤S4的示意图；
图11是本申请第四实施例提供的显示面板的彩色滤光片基板的制作方法的步骤S2的示意图；
图12是本申请第四实施例提供的显示面板的彩色滤光片基板的制作方法的步骤S3的示意图；
图13是本申请第四实施例提供的显示面板的彩色滤光片基板的制作方法的步骤S4的示意图。
具体实施方式
为了使本申请的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本申请进行进一步详细说明。应当理解，此处所描述的具体实施例仅 用以解释本申请，并不用于限定本申请。
需说明的是，当部件被称为“固定于”或“设置于”另一个部件，它可以直接在另一个部件上或者间接在该另一个部件上。当一个部件被称为是“连接于”另一个部件，它可以是直接或者间接连接至该另一个部件上。术语“上”、“下”、“左”、“右”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本专利的限制，对于本领域的普通技术人员而言，可以根据具体情况理解上述术语的具体含义。术语“第一”、“第二”仅用于便于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明技术特征的数量。“多个”的含义是两个或两个以上，除非另有明确具体的限定。
为了说明本申请所述的技术方案，以下结合具体附图及实施例进行详细说明。
请参阅图1至图6，本申请提供一种显示面板，包括彩色滤光片基板100和与该彩色滤光片基板100相对设置的阵列基板(未图示)，该彩色滤光片基板100包括衬底基层1以及设于衬底基层1上的色阻复合层2，衬底基层1包括对应多个子像素的开口区的第一色阻区11、第二色阻区12和第三色阻区13，以及对应多个子像素的非开口区的第四区14；色阻复合层2包括第一色阻层21、第二色阻层22和第三色阻层23；第一色阻层21包括至少位于第一色阻区11的第一色阻块211、位于第四区14的第一色阻薄膜212以及位于第四区14的第一色阻柱213，同样地，第二色阻层22包括至少位于第二色阻区12的第二色阻块221、位于第四区14的第二色阻薄膜222以及位于第四区14的第二色阻柱223，第三色阻层23包括至少位于第三色阻区13的第一色阻块211、位于第四区14的第三色阻薄膜232以及位于第四区14的第三色阻柱233；其中，第一色阻块211的高度R0大于第一色阻柱213的高度R2，第一色阻柱213的高度R2大于第一色阻薄膜212的高度R1；第二色阻块221的高度G0 大于第二色阻柱223的高度G2，第二色阻柱223的高度G2大于第二色阻薄膜222的高度G1；第三色阻块231的高度B0大于第三色阻柱233的高度B2，第三色阻柱233的高度B2大于第三色阻薄膜232的高度B1，位于第四区14的第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232叠加形成黑色矩阵26，位于第四区14的第一色阻柱213、第二色阻柱223和第三色阻柱233中的至少两个叠加形成隔垫物27，用于显示面板中支撑阵列基板以保持盒厚。
本申请提供的显示面板的彩色滤光片基板100中，色阻复合层2包括第一色阻层21、第二色阻层22和第三色阻层23，第一色阻层21包括至少位于第一色阻区11的第一色阻块211、位于第四区14的第一色阻薄膜212以及位于第四区14的第一色阻柱213，同样地，第二色阻层22包括至少位于第二色阻区12的第二色阻块221、位于第四区14的第二色阻薄膜222以及位于第四区14的第二色阻柱223，第三色阻层23包括至少位于第三色阻区13的第三色阻块231、位于第四区14的第三色阻薄膜232以及位于第四区14的第三色阻柱233，由位于第四区14的第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232叠加作为黑色矩阵26，由位于第四区14的第一色阻柱213、第二色阻柱223和第三色阻柱233中的至少两个叠加，作为隔垫物27，黑色矩阵26和隔垫物27与第一色阻块211、第二色阻块221和第三色阻块231同时形成，省去了黑色矩阵26和隔垫物27的单独制程，避免了制程中黑色矩阵26的原料和隔垫物27的原料的浪费，降低了原料成本和制作成本。
在本申请第一和第二实施例中，第一色阻层21为红色色阻层，第二色阻层22为绿色色阻层，第三色阻层23为蓝色色阻层。在其他实施例中，第一色阻层21、第二色阻层22和第三色阻层23的颜色可以任意交换，对此不作限制。
请参阅图1至图4，为本申请第一实施例的显示面板的彩色滤光片基板100，第一色阻块211、第二色阻块221和第三色阻块231均呈岛状。第一色阻块211对应衬底基层1的第一色阻区11设置，第二色阻块221对应第二色 阻区12设置，第三色阻块231对应第三色阻区13设置，第一色阻块211、第二色阻块221和第三色阻块231分别对应红色、绿色和蓝色子像素的开口区作为红色、绿色和蓝色滤光单元。
在衬底基层1的第四区14，第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232分别对红色光、绿色光和蓝色光吸收，能够阻挡光线的通过，因而第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232叠加后可以作为黑色矩阵26，围绕于第一色阻块211、第二色阻块221和第三色阻块231的周围，对应子像素的非开口区。
在本申请第一实施例中，第一色阻块211的高度R0大于第一色阻柱213的高度R2且小于第一色阻柱213的高度R2的3倍；第二色阻块221的高度G0大于第二色阻柱223的高度G2且小于第二色阻柱223的高度G2的3倍；第三色阻块231的高度B0大于第三色阻柱233的高度B2且小于第三色阻柱233的高度B2的3倍。
具体地，第一色阻块211的高度R0、第二色阻块221的高度G0和第三色阻块231的高度B0的范围为2±0.5μm，可选地，R0＝G0＝B0。第一色阻薄膜212的高度R1、第二色阻薄膜222的高度G1和第三色阻薄膜232的高度B1的范围为0.33±0.2μm，可选地，R1＝G1＝B1＝0.33μm。
在一个实施例中，第一色阻柱213包括第一主色阻柱部分2131和第一辅色阻柱部分2132，第一主色阻柱部分2131的高度R21大于第一辅色阻柱部分2132的高度R22，第一主色阻柱部分2131和第一辅色阻柱部分2132之间间隔第一色阻块211或第二色阻块221或第三色阻块231设置，例如，第一主色阻柱部分2131设于第二色阻块221和第三色阻块231之间，第一辅色阻柱部分2132设于第一色阻块211和第二色阻块221之间。
在其他实施例中，第一主色阻柱部分2131和第一辅色阻柱部分2132的位置可以变化，如第一主色阻柱部分2131位于相邻两个第三色阻块231之间，第一辅色阻柱部分2132位于两个第二色阻块221之间，对此不作限制。
第二色阻柱223包括位于第一主色阻柱部分2131上的第二主色阻柱部分2231和位于第一辅色阻柱部分2132上的第二辅色阻柱部分2232，第二主色阻柱部分2231的高度G21大于第二辅色阻柱部分2232的高度G22；第三色阻柱233包括位于第二主色阻部分上的第三主色阻柱部分2331和位于第二辅色阻柱部分2232上的第三辅色阻柱部分2332，第三主色阻柱部分2331的高度B21大于第三辅色阻柱部分2332的高度B22。
由第一主色阻柱部分2131、第二主色阻柱部分2231和第三主色阻柱部分2331叠加形成位于第二色阻块221和第三色阻块231之间的主隔垫物28，主隔垫物28的高度H1＝R21+G21+B21，由第一辅色阻柱部分2132、第二辅色阻柱部分2232和第三辅色阻柱部分2332叠加形成位于第一色阻块211和第二色阻块221之间的辅隔垫物29，辅隔垫物29的高度H2＝R22+G22+B22，辅隔垫物29的高度小于主隔垫物28的高度。
第一主色阻柱部分2131的高度R21、第二主色阻柱部分2231的高度G21和第三主色阻柱部分2331的高度B21的范围为1.83±0.05μm，可选地，R21＝G21＝B21＝1.83μm。
第一辅色阻柱部分2132的高度R22、第二辅色阻柱部分2232的高度G22、第三辅色阻柱部分2332的高度B22的范围为1.75±0.05μm。可选地，R22＝G22＝B22＝1.75μm。
请参阅图5和图6，为本申请第二实施例的显示面板的彩色滤光片基板100，第一色阻块211、第二色阻块221和第三色阻块231均呈条状；第一色阻块211对应多个第一色阻区11以及两相邻第一色阻区11之间的部分第四区14设置，第二色阻块221对应多个第二色阻区12以及两相邻第二色阻区12之间的部分第四区14设置，第三色阻块231对应多个第三色阻区13以及两相邻第三色阻区13之间的部分第四区14设置。
第一色阻块211对应多个第一色阻区11的部分用于对应红色子像素的开口区，作为红色滤光单元，第二色阻块221对应多个第二色阻区12的部分用 于对应绿色子像素的开口区，作为绿色滤光单元，第三色阻块231对应多个第三色阻区13的部分用于对应蓝色子像素的开口区，作为蓝色滤光单元。
同样地，在衬底基层1的第四区14，第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232分别对红色光、绿色光和蓝色光透过，最终能够阻挡光线的通过，因而第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232叠加后可以作为黑色矩阵26，对应子像素的非开口区。
在第二实施例中，如图8，第一色阻柱213、第二色阻柱223和第三色阻柱233设置在两第一色阻区11之间、两第二色阻区12之间或两第三色阻区13之间，这样设置的目的是因为，可以借由设置在两第一色阻区11之间的第一色阻块211、两第二色阻区12之间的第二色阻块221或两第三色阻区13之间的第三色阻块231的本身的厚度来形成隔垫物27，节省一部分色阻材料，降低生产成本。在其他实施例中，在衬底基层1的第四区14，第一色阻柱213、第二色阻柱223和第三色阻柱233均可以设置在第一色阻块211、第二色阻块221和第三色阻块231之间的条状之间，此时，隔垫物27的形成与第一实施例相同，在此不再赘述。
如图6所示，第二实施例的隔垫物27由两种颜色的色阻柱叠加在另一种颜色的色阻块上形成。
具体地，第一色阻柱213包括第一主色阻柱部分2131和第一辅色阻柱部分2132，第一主色阻柱部分2131的高度R21大于第一辅色阻柱部分2132的高度R22，第一主色阻柱部分2131设置在相邻的两第三色阻区13之间，第一辅色阻柱部分2132设置在两相邻的第二色阻区12之间；第二色阻柱223设置于第一主色阻柱部分2131上，且其高度G2等于第一主色阻柱部分2131的高度R21；第三色阻柱233设置于位于第二色阻区12的第二色阻块221上，且其高度B2等于第一辅色阻柱部分2132的高度R22。
在第二实施例中，由第三色阻块231、第一主色阻柱部分2131和第二色阻柱223叠加形成位于两相邻的第三色阻区13之间的主隔垫物28，其高度 H1＝B0+R21+G2，由第二色阻块221、第一辅色阻柱部分2132和第三色阻柱233叠加形成位于两相邻的第二色阻区12之间的辅隔垫物29，其高度H2＝G0+R22+B2。具体地，第一色阻块211的高度R0、第二色阻块221的高度G0和第三色阻块231的高度B0的范围为2±0.5μm，可选地，R0＝G0＝B0。第一色阻薄膜212的高度R1、第二色阻薄膜222的高度G1和第三色阻薄膜232的高度B1的范围为0.33±0.2μm，可选地，R1＝G1＝B1＝0.33μm。
第一主色阻柱部分2131的高度R21和第二色阻柱223的高度G2范围为1.83±0.05μm，可选地，R21＝G2＝1.83μm。
第一辅色阻柱部分2132的高度R22和第三色阻柱233的高度B2的范围为1.75±0.05μm。可选地，R22＝B2＝1.75μm。
请参阅图7，本申请还提供一种显示面板的制作方法，包括制作彩色滤光片基板的步骤和制作阵列基板的步骤，以及将彩色滤光片基板与阵列基板对盒的步骤，其中制作彩色滤光片基板的步骤包括：
步骤S1，提供衬底基层1，衬底基层1上包括对应多个子像素的开口区的第一色阻区11、第二色阻区12和第三色阻区13，以及对应多个子像素的非开口区的第四区14；
步骤S2：在衬底基层1上沉积一层第一色阻材料，如红色色阻材料，经半色调光罩曝光、显影及蚀刻后，得到第一色阻层21，第一色阻层21包括至少位于第一色阻区11的第一色阻块211、位于第四区14的第一色阻薄膜212以及位于第四区14的第一色阻柱213；第一色阻块211的高度R0大于第一色阻柱213的高度R2，且第一色阻柱213的高度R2大于第一色阻薄膜212的高度R1；
步骤S3：在衬底基层1和第一色阻层21上沉积一层第二色阻材料，如绿色色阻材料，经半色调光罩曝光、显影及蚀刻后，得到第二色阻层22，第二色阻层22包括至少位于第二色阻区12的第二色阻块221、位于第四区14的第二色阻薄膜222以及位于第四区14的第二色阻柱223；
第二色阻块221的高度B0大于第二色阻柱223的高度B2，且第二色阻柱223的高度B2大于第二色阻薄膜222的高度B1；
步骤S4：在衬底基层1、第一色阻层21和第二色阻层22上沉积一层第三色阻材料，如蓝色色阻材料，经半色调光罩曝光、显影及蚀刻后，得到第三色阻层23，第三色阻层23包括至少位于第三色阻区13的第三色阻块231、位于第四区14的第三色阻薄膜232以及位于第四区14的第三色阻柱233；
第三色阻块231的高度B0大于第三色阻柱233的高度B2，且第三色阻柱233的高度B2大于第三色阻薄膜232的高度B1；
位于第四区14的第一色阻薄膜212、第二色阻薄膜222和第三色阻薄膜232叠加作为黑色矩阵26，位于第四区14的第一色阻柱213、第二色阻柱223和第三色阻柱233中的至少两个叠加。
在其他实施例中，第一色阻层21、第二色阻层22和第三色阻层23的颜色可以任意交换，对此不作限制。
具体地，请参阅图8至图10所示的第三实施例。
图8所示的步骤S2中，第一色阻块211呈岛状，对应第一色阻区11设置。在衬底基层1的第四区14，形成了第一色阻薄膜212和第二色阻柱223，其中，第一色阻柱213分为第一主色阻柱部分2131和第一辅色阻柱部分2132，第一主色阻柱部分2131的高度R21大于第一辅色阻柱部分2132的高度R22，第一主色阻柱部分2131和第一辅色阻柱部分2132间隔设置，例如，在第三实施例中，第一主色阻柱部分2131设于第二色阻区12和第三色阻区13之间，第一辅色阻柱部分2132设于第一色阻区11和第二色阻区12之间。
当然，在其他实施例中，第一主色阻柱部分2131和第一辅色阻柱部分2132的位置可以变化，如第一主色阻柱部分2131位于相邻两个第三色阻区13之间，第一辅色阻柱部分2132位于两个第二色阻区12之间，对此不作限制。
图9所示的步骤S3中，第二色阻块221呈岛状，对应第二色阻区12设置。在衬底基层1的第四区14，形成了第二色阻薄膜222和第二色阻柱223，第二 色阻薄膜222覆盖于第二色阻薄膜222上，第二色阻柱223包括位于第一主色阻柱部分2131上的第二主色阻柱部分2231和位于第一辅色阻柱部分2132上的第二辅色阻柱部分2232，第二主色阻柱部分2231的高度G21大于第二辅色阻柱部分2232的高度G22。
图10所示的步骤S4中，第三色阻块231呈岛状，对应第三色阻区13设置。在衬底基层1的第四区14，形成了第三色阻薄膜232和第三色阻柱233，第三色阻薄膜232覆盖于第二色阻薄膜222上，第三色阻柱233包括位于第二主色阻柱部分2231上的第三主色阻柱部分2331和位于第二辅色阻柱部分2232上的第三辅色阻柱部分2332，第三主色阻柱部分2331的高度B21大于第三辅色阻柱部分2332的高度B22。
第一色阻块211、第二色阻块221和第三色阻块231分别对应红色、绿色和蓝色子像素的开口区作为红色、绿色和蓝色滤光单元。
请参阅图11至图13，为本申请第四实施例提供的显示面板的制作方法中制作彩色滤光片基板的步骤。
在图11所示的步骤S2中，第一色阻块211呈条状，第一色阻块211对应多个第一色阻区11以及两第一色阻区11之间的部分第四区14设置，第一色阻块211对应多个第一色阻区11的部分用于对应红色子像素的开口区，作为红色滤光单元。
同时，在衬底基层1的第四区14，形成了第一色阻薄膜212和第一色阻柱213，第一色阻柱213包括第一主色阻柱部分2131和第一辅色阻柱部分2132，其中第一主色阻柱部分2131位于两个第三色阻区13之间，第一辅色阻柱部分2132位于两个第二色阻区12之间，第一主色阻柱部分2131的高度R21大于第一辅色阻柱部分2132的高度R22。
在图12所示的步骤S3中，第二色阻块221呈条状，对应多个第二色阻区12以及两第二色阻区12之间的部分第四区14设置，第二色阻块221对应多个第二色阻区12的部分用于对应绿色子像素的开口区，作为绿色滤光单元。 第二色阻块221位于两第二色阻区12之间的部分还覆盖了第一辅色阻柱部分2132。
同时，在衬底基层1的第四区14，形成了第二色阻薄膜222和第二色阻柱223，第二色阻薄膜222覆盖于第一色阻薄膜212上，第二色阻柱223覆盖于第一主色阻柱部分2131上，且第二色阻柱223的高度G2可以等于第一主色阻柱部分2131的高度R21。第二色阻块221各处厚度一致，因此与第一辅色阻柱部分2132对应的区域高于第二色阻块221的其他区域。
在图13所示的步骤S4中，第三色阻块231呈条状，对应多个第三色阻区13以及两第三色阻区13之间的部分第四区14设置，第三色阻块231对应多个第三色阻区13的部分用于对应蓝色子像素的开口区，作为蓝色滤光单元。第三色阻块231位于两第三色阻区13之间的部分还覆盖了第二色阻柱223。
同样地，在衬底基层1的第四区14，还形成了第三色阻薄膜232和第三色阻柱233，第三色阻薄膜233覆盖于第二色阻薄膜222上，第三色阻柱233覆盖于第二色阻块221和第一辅色阻柱部分2132上，且第三色阻柱233的高度B2可以等于第一辅色阻柱部分2132的高度R22。同理，第三色阻块231的各处厚度一致，因此其对应第一主色阻柱部分2131和第二色阻柱223的区域高于第三色阻块231的其他区域。
以上仅为本申请的可选实施例而已，并不用于限制本申请。对于本领域的技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的权利要求范围之内。

Claims (20)

  1. 一种显示面板，包括彩色滤光片基板，所述彩色滤光片基板包括：
    衬底基层，包括对应多个子像素的开口区的第一色阻区、第二色阻区和第三色阻区，以及对应多个子像素的非开口区的第四区；色阻复合层，设于所述衬底基层上，包括第一色阻层、第二色阻层和第三色阻层；
    所述第一色阻层包括至少位于所述第一色阻区的第一色阻块、位于所述第四区的第一色阻薄膜以及位于所述第四区的第一色阻柱，所述第二色阻层包括至少位于所述第二色阻区的第二色阻块、位于所述第四区的第二色阻薄膜以及位于所述第四区的第二色阻柱，所述第三色阻层包括至少位于所述第三色阻区的第三色阻块、位于所述第四区的第三色阻薄膜以及位于所述第四区的第三色阻柱；
    位于所述第四区的第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵，位于所述第四区的第一色阻柱、第二色阻柱和第三色阻柱中的至少两个叠加形成隔垫物。
  2. 如权利要求1所述的显示面板，其中，所述第一色阻块的高度大于所述第一色阻柱的高度，所述第一色阻柱的高度大于所述第一色阻薄膜的高度；
    所述第二色阻块的高度大于所述第二色阻柱的高度，所述第二色阻柱的高度大于所述第二色阻薄膜的高度；
    所述第三色阻块的高度大于所述第三色阻柱的高度，所述第三色阻柱的高度大于所述第三色阻薄膜的高度。
  3. 如权利要求1所述的显示面板，其中，所述第一色阻块、第二色阻块和第三色阻块均呈岛状；所述第一色阻块对应所述第一色阻区设置，所述第二色阻块对应所述第二色阻区设置，所述第三色阻块对应所述第三色阻区设置。
  4. 如权利要求3所述的显示面板，其中，位于所述第四区的第一色阻柱、第二色阻柱和第三色阻柱叠加形成隔垫物；
    所述第一色阻柱包括第一主色阻柱部分和第一辅色阻柱部分，所述第一主 色阻柱部分的高度大于所述第一辅色阻柱部分的高度；
    所述第二色阻柱包括第二主色阻柱部分和第二辅色阻柱部分，所述第二主色阻柱部分的高度大于所述第二辅色阻柱部分的高度；
    所述第三色阻柱包括第三主色阻柱部分和第三辅色阻柱部分，所述第三主色阻柱部分的高度大于所述第三辅色阻柱部分的高度；
    所述第一主色阻柱部分、第二主色阻柱部分和第三主色阻柱部分叠加形成主隔垫物，所述第一辅色阻柱部分、第二辅色阻柱部分和第三辅色阻柱部分叠加形成辅隔垫物。
  5. 如权利要求1所述的显示面板，其中，所述第一色阻块的高度为2±0.5μm，所述第二色阻块的高度为2±0.5μm，所述第三色阻块的高度为2±0.5μm；所述第一色阻薄膜的高度为0.33±0.2μm，所述第二色阻薄膜的高度为0.33±0.2μm，所述第三色阻薄膜的高度为0.33±0.2μm。
  6. 如权利要求4所述的显示面板，其中，所述第一主色阻柱部分和第一辅色阻柱部分之间间隔所述第一色阻块或第二色阻块或第三色阻块设置。
  7. 如权利要求6所述的显示面板，其中，所述第一主色阻柱部分设于所述第二色阻块和第三色阻块之间，所述第一辅色阻柱部分设于第一色阻块和第二色阻块之间。
  8. 如权利要求6所述的显示面板，其中，所述第一主色阻柱部分位于相邻两个第三色阻块之间，所述第一辅色阻柱部分位于两个第二色阻块之间。
  9. 如权利要求1所述的显示面板，其中，所述第一色阻块、第二色阻块和第三色阻块呈条状；所述第一色阻块对应所述第一色阻区以及两所述第一色阻区之间的部分第四区设置，所述第二色阻块对应所述第二色阻区以及两所述第二色阻区之间的部分第四区设置，所述第三色阻块对应所述第三色阻区以及两所述第三色阻区之间的部分第四区设置。
  10. 如权利要求9所述的显示面板，其中，位于所述第四区的第一色阻柱、第二色阻柱和第三色阻柱叠加形成隔垫物；
    所述第一色阻柱包括第一主色阻柱部分和第一辅色阻柱部分，所述第一主色阻柱部分的高度大于所述第一辅色阻柱部分的高度；
    所述第二色阻柱包括第二主色阻柱部分和第二辅色阻柱部分，所述第二主色阻柱部分的高度大于所述第二辅色阻柱部分的高度；
    所述第三色阻柱包括第三主色阻柱部分和第三辅色阻柱部分，所述第三主色阻柱部分的高度大于所述第三辅色阻柱部分的高度；
    所述第一主色阻柱部分、第二主色阻柱部分和第三主色阻柱部分叠加形成主隔垫物，所述第一辅色阻柱部分、第二辅色阻柱部分和第三辅色阻柱部分叠加形成辅隔垫物。
  11. 如权利要求10所述的显示面板，其中，所述第一主色阻柱部分和第一辅色阻柱部分之间间隔所述第一色阻块或第二色阻块或第三色阻块设置。
  12. 如权利要求11所述的显示面板，其中，所述第一主色阻柱部分设于所述第二色阻块和第三色阻块之间，所述第一辅色阻柱部分设于第一色阻块和第二色阻块之间。
  13. 如权利要求11所述的显示面板，其中，所述第一主色阻柱部分位于相邻两个第三色阻块之间，所述第一辅色阻柱部分位于两个第二色阻块之间。
  14. 如权利要求9所述的显示面板，其中，所述第一色阻柱、第二色阻柱和第三色阻柱中的两个与所述第一色阻块、第二色阻块、第三色阻块中颜色不相同的一个位于所述第四区的部分叠加形成隔垫物。
  15. 如权利要求14所述的显示面板，其中，所述第一色阻柱包括第一主色阻柱部分和第一辅色阻柱部分，所述第一主色阻柱部分的高度大于所述第一辅色阻柱部分的高度；所述第二色阻柱的高度等于所述第一主色阻部分的高度；所述第三色阻柱的高度等于所述第一辅色阻柱部分的高度；
    所述第二色阻块、第一辅色阻柱和所述第三色阻柱叠加形成主隔垫物，所述第三色阻块、第一主色阻柱部分和所述第二色阻柱叠加形成辅隔垫物。
  16. 如权利要求15所述的显示面板，其中，所述第一主色阻柱部分设置 在相邻的两第三色阻区之间，所述第一辅色阻柱部分设置在两相邻的第二色阻区之间；所述第二色阻柱设置于第一主色阻柱部分上，所述第三色阻柱设置于位于第二色阻区的第二色阻块上。
  17. 一种显示面板，包括彩色滤光片基板，所述彩色滤光片基板包括：
    衬底基层，包括对应多个子像素的开口区的第一色阻区、第二色阻区和第三色阻区，以及对应多个子像素的非开口区的第四区；色阻复合层，设于所述衬底基层上，包括第一色阻层、第二色阻层和第三色阻层；
    所述第一色阻层包括位于所述第一色阻区的第一色阻块、位于所述第四区的第一色阻薄膜以及位于所述第四区的第一色阻柱，所述第二色阻层包括位于所述第二色阻区的第二色阻块、位于所述第四区的第二色阻薄膜以及位于所述第四区的第二色阻柱，所述第三色阻层包括位于所述第三色阻区的第三色阻块、位于所述第四区的第三色阻薄膜以及位于所述第四区的第三色阻柱；
    所述第一色阻柱包括第一主色阻柱部分和第一辅色阻柱部分，所述第二色阻柱包括第二主色阻柱部分和第二辅色阻柱部分，所述第三色阻柱包括第三主色阻柱部分和第三辅色阻柱部分；
    位于所述第四区的第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵；所述第一主色阻柱部分、第二主色阻柱部分和第三主色阻柱部分叠加形成主隔垫物，所述第一辅色阻柱部分、第二辅色阻柱部分和第三辅色阻柱部分叠加形成辅隔垫物。
    所述第一色阻块、第二色阻块和第三色阻块的高度为2μm；所述第一色阻薄膜、第二色阻薄膜和第三色阻薄膜的高度为0.33μm；所述第一主色阻柱部分、第二主色阻柱部分和第三主色阻柱部分的高度为1.83μm；所述第一辅色阻柱部分、第二辅色阻柱部分和第三辅色阻柱部分的高度为1.75μm。
  18. 一种显示面板的制作方法，包括制作彩色滤光片基板的步骤，所述制作彩色滤光片基板的步骤包括：
    提供衬底基层，所述衬底基层包括对应多个子像素的开口区的第一色阻 区、第二色阻区和第三色阻区，以及对应多个子像素的非开口区的第四区；
    在所述衬底基层上形成第一色阻层，所述第一色阻层包括至少位于所述第一色阻区的第一色阻块、位于所述第四区的第一色阻薄膜以及位于所述第四区的第一色阻柱，所述第一色阻柱的高度大于所述第一色阻薄膜的高度；
    在所述衬底基层和第一色阻层上形成第二色阻层，所述第二色阻层包括至少位于所述第二色阻区的第二色阻块、位于所述第四区的第二色阻薄膜以及位于所述第四区的第二色阻柱，所述第二色阻柱的高度大于所述第二色阻薄膜的高度；
    在所述衬底基层、第一色阻层和第二色阻层上形成第三色阻层，所述第三色阻层包括至少位于所述第三色阻区的第三色阻块、位于所述第四区的第三色阻薄膜以及位于所述第四区的第三色阻柱，所述第三色阻柱的高度大于所述第三色阻薄膜的高度；
    其中，位于所述第四区的第一色阻薄膜、第二色阻薄膜和第三色阻薄膜叠加形成黑色矩阵，位于所述第四区的第一色阻柱、第二色阻柱和第三色阻柱中的至少两个叠加形成隔垫物。
  19. 如权利要求18所述的显示面板的制作方法，其中，所述第一色阻块、第二色阻块和第三色阻块均呈岛状；
    所述第一色阻块对应所述第一色阻区设置，所述第二色阻块对应所述第二色阻区设置，所述第三色阻块对应所述第三色阻区设置。
  20. 如权利要求18所述的显示面板的制作方法，其中，所述第一色阻块、第二色阻块和第三色阻块均呈条状；
    所述第一色阻块对应所述第一色阻区以及两相邻所述第一色阻区之间的部分第四区设置，所述第二色阻块对应所述第二色阻区以及两相邻所述第二色阻区之间的部分第四区设置，所述第三色阻块对应所述第三色阻区以及两相邻所述第三色阻区之间的部分第四区设置。
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CN104597656A (zh) * 2015-02-13 2015-05-06 深圳市华星光电技术有限公司 彩膜基板、制造方法及液晶面板
CN105652508A (zh) * 2016-03-07 2016-06-08 武汉华星光电技术有限公司 彩膜基板的制作方法及制得的彩膜基板
CN106200105A (zh) * 2016-09-26 2016-12-07 合肥鑫晟光电科技有限公司 一种彩膜基板及其制备方法、显示面板、显示装置

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