WO2017031771A1

WO2017031771A1 - Color filter and method for manufacture thereof

Info

Publication number: WO2017031771A1
Application number: PCT/CN2015/088373
Authority: WO
Inventors: 汪丽芳; 王聪
Original assignee: 武汉华星光电技术有限公司
Priority date: 2015-08-24
Filing date: 2015-08-28
Publication date: 2017-03-02
Also published as: CN105158962A

Abstract

A color filter and a method for manufacture thereof are disclosed. The method comprises: forming a black matrix (20) on a substrate (10); by means of a first mask (100), forming a first color resistor (31) on the substrate (10) and forming a first spacer part (32) on the black matrix (20); by means of a second mask (200), forming a second color resistor (41) arranged with an interval from the first color resistor (31) on the substrate (10) and forming a second spacer part (42) on the first spacer part (32); and by means of a third mask (300), forming a third color resistor (51) arranged with an interval from either of the first color resistor (31) and the second color resistor (41) on the substrate (10). The black matrix (20), the first spacer part (32) and the second spacer part (42) overlap to form a spacer for the color filter, thereby forming the spacer without extra manufacture processes of masks, reducing the manufacture cost, and the spacer not sliding down into light-transmitting areas of pixels to induce the Mura phenomenon when panels are pressed.

Description

Color filter and manufacturing method thereof

【技术领域】[Technical Field]

The present invention relates to the field of liquid crystals, and in particular to a color filter and a method of fabricating the same.

【背景技术】【Background technique】

Traditional LTPS (Low Temperature Poly-silicon, low-temperature polysilicon) panel structure design, a layer of PS is often deposited on the color filter (Post) Spacer, spacer, wherein PS is mainly used to provide support for the upper and lower glass substrates in the LTPS panel.

In general, PS includes a different height of Main PS (main spacer) and Sub PS (auxiliary spacer), Main PS and Sub The PS often needs to be fabricated by using two mask processes, which makes the color filter process cycle longer and the process cost higher.

In addition, the shape of the conventional PS is generally trapezoidal, and its end away from the color filter is spherical. In actual use, when the LTPS panel is pressed, the PS easily slips into the light-transmissive area of the pixel, thereby causing a situation in which the mura is also uneven in brightness of the display.

【发明内容】 [Summary of the Invention]

The technical problem to be solved by the present invention is to provide a color filter and a manufacturing method thereof, which can reduce the number of masks in the color filter manufacturing process, thereby reducing the manufacturing cost of the color filter, and at the same time improving the panel pressure. Then, there is a situation in which the spacers slide down to the light-transmitting area of the pixel to cause uneven brightness.

In order to solve the above technical problem, a technical solution adopted by the present invention is to provide a color filter comprising: a black matrix disposed on a substrate; a first color resist, a second color resist, and a third The color resistance is disposed on the substrate and is repeatedly arranged in sequence; the first spacer portion is obtained by the same process as the first color resist and is disposed on the black matrix; and the second spacer portion is obtained by the same process as the second color resist. a first spacer; wherein the black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter; wherein the black matrix comprises a first black matrix and a second black matrix, the spacer The first spacer and the second spacer are disposed, wherein the first black matrix and the second black matrix are spaced apart and have different heights, and the first black matrix, the first spacer, and the second spacer are overlapped to form a first a spacer, the second black matrix, the first spacer and the second spacer overlap to form a second spacer; wherein the first spacer is connected to the first color resist, the second spacer and the second color resist Connected, first Partition portion and the second spacer portion disposed between the first color and a second color resist barrier; one of them, the first spacer and the second spacer portion is a red color filter, green color filter and the blue color filter.

Wherein, the ends of the first spacer and the second spacer are suspended in a planar shape.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a method for fabricating a color filter, the method comprising: forming a black matrix on a substrate; forming a first on the substrate by using the first mask Color resistance and forming a first spacer on the black matrix; forming a second color resist arranged at intervals from the first color resist on the substrate through the second mask; and forming a second spacer on the first spacer; The third mask forms a third color resist arranged on the substrate at intervals from the first color resist and the second color resist; wherein the black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter Things.

The black matrix includes a first black matrix and a second black matrix, and the spacer includes a first spacer and a second spacer, wherein the first black matrix and the second black matrix are spaced apart and have different heights, The first black matrix, the first spacer portion and the second spacer portion are overlapped to form a first spacer, and the second black matrix, the first spacer portion and the second spacer portion are overlapped to form a second spacer.

The first spacer is connected to the first color resist, the second spacer is connected to the second color resist, and the first spacer and the second spacer are formed between the first color resist and the second color resist.

Wherein, the first mask and the second mask are semi-transmissive masks, wherein the first mask comprises a first light-transmissive region for forming a first color resist, and is used for forming the first spacer a second light-transmissive region and a light-shielding region spaced apart from the first light-transmitting region, the second mask plate includes a first light-transmissive region for forming a second color resist, and a second transparent portion for forming the second spacer portion a light zone and a light shielding zone spaced apart from the first light transmission zone.

The third mask is a semi-transmissive mask, wherein the third mask comprises a semi-transmissive region for forming a third color resist and a light-shielding region spaced apart from the semi-transmissive region.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a color filter comprising: a black matrix disposed on a substrate; a first color resist, a second color resist, and a first color resist The three color resists are disposed on the substrate and are repeatedly arranged in sequence; the first spacer portion is obtained by the same process as the first color resist and is disposed on the black matrix; and the second spacer portion is obtained by the same process as the second color resist. And forming a spacer of the color filter after the black matrix, the first spacer and the second spacer overlap.

The first spacer is connected to the first color resist, the second spacer is connected to the second color resist, and the first spacer and the second spacer are disposed between the first color resist and the second color resist.

The first spacer portion and the second spacer portion are one of a red color resist, a green color resist, and a blue color resist.

The color filter of the present invention and the manufacturing method thereof have the first mask formed on the substrate by the first mask and the first spacer formed on the black matrix, and the substrate is disposed on the substrate through the second mask Forming a second color resist arranged at intervals from the first color resist and forming a second spacer on the first spacer, wherein the black matrix, the first spacer and the second spacer overlap to form a color filter spacer Pad. In the above manner, the present invention does not require an additional mask process to manufacture the spacer, which reduces the manufacturing cost of the color filter, and the spacer is formed by overlapping the black matrix, the first color resist and the second color resist. When the panel is squeezed, the spacer does not slip into the light transmissive area of the pixel to cause a mura condition.

【附图说明】 [Description of the Drawings]

1 is a schematic structural view of a mask used for forming a color resist in a color filter process of the present invention;

2 is a schematic flow chart of a method for fabricating a color filter of the present invention;

3A-3F are schematic structural views of a color filter in the process of the present invention;

4 is a first sectional structural view of a color filter of the present invention;

Figure 5 is a schematic view showing the second cross-sectional structure of the color filter of the present invention.

【具体实施方式】【detailed description】

Certain terms are used throughout the description and the claims to refer to the particular embodiments. It will be understood by those skilled in the art that the <RTIgt; The present specification and claims do not use the difference in names as a means of distinguishing components, but rather as a basis for distinguishing between functional differences of components. The invention will now be described in detail in conjunction with the drawings and embodiments.

1 is a schematic view showing the structure of a mask used for forming a color resist in the color filter process of the present invention. As shown in FIG. 1, the mask includes a first mask 100, a second mask 200, and a third mask 300.

Wherein, the first mask 100 is a semi-transparent mask, which is specifically HTM (half-tone) Mask) Semi-transparent mask. The first mask 100 includes a first light transmitting region 101 for forming a first color resist, a second light transmitting region 102 for forming a first spacer, and a light blocking region 103 spaced apart from the first light transmitting region 101. . The amount of light transmitted by the first light transmitting region 101 is smaller than the amount of light transmitted by the second light transmitting region 102. Preferably, the first transparent region 101 is a semi-transmissive region, and the second transparent region 102 is a fully transparent region. In other words, the first light transmitting region 101 corresponds to the first color resist deposition region on the color filter, and the second light transmitting region 102 corresponds to the deposition region of the first spacer portion.

The second mask 200 is a semi-transparent mask, which is specifically a HTM semi-transparent mask. The second mask 200 includes a first light transmissive region 201 for forming a second color resist, a second light transmissive region 202 for forming a second spacer, and a light blocking region 203 spaced apart from the first light transmissive region 201. . The amount of light transmitted by the first light transmitting region 201 is smaller than the amount of light transmitted by the second light transmitting region 202. Preferably, the first light transmitting region 201 is a semi-transmissive region, and the second light transmitting region 202 is a fully transparent region. In other words, the first light transmitting region 201 corresponds to the second color resist deposition region on the color filter, and the second light transmitting region 202 corresponds to the deposition region of the second spacer portion.

The third mask 300 is a semi-transparent mask, which is specifically an HTM semi-transparent mask. The third mask 300 includes a semi-transmissive region 301 for forming a third color resist and a light blocking region 302 spaced apart from the semi-transmissive region 301. In other words, the semi-transmissive region 301 corresponds to a third color resist deposition region on the color filter. In other embodiments, the third mask 300 may also be a full-transmissive mask including a fully transparent region for forming a third color resist and a light-shielding region spaced apart from the fully transparent region.

Preferably, when the first mask 100 and the second mask 200 overlap, the second transparent region 102 of the first mask 100 and the second transparent region 202 of the second mask 200 have the same The position and shape are such that the cross sections of the first spacer and the second spacer have the same shape, for example, a rectangle, and completely overlap each other on the color filter.

Please refer to FIG. 2 together. FIG. 2 is a schematic flow chart of a method for fabricating the color filter of the present invention. 3A-3F are schematic views showing the structure of the color filter of the present invention. It should be noted that the method of the present invention is not limited to the sequence of the flow shown in FIG. 2 if substantially the same result is obtained. As shown in FIG. 2, the method includes the following steps:

Step S101: forming a black matrix on the substrate;

In step S101, a black matrix material is first coated on the substrate, then the black matrix material is exposed through a semi-transparent mask, and finally the exposed black matrix material is developed to form a plurality of black matrices.

The black matrix includes a first black matrix and a second black matrix, and the first black matrix and the second black matrix are spaced apart, and the first black matrix and the second black matrix have different heights.

Step S102: forming a first color resist on the substrate through the first mask and forming a first spacer on the black matrix;

In step S102, the first material is continuously coated on the substrate, then the first material is exposed through the first mask, and finally the exposed first material is developed to be in the transparent region of the color filter. A plurality of first color resists are formed thereon and a first spacer is formed on the black matrix.

Please refer to Figures 3A, 3B and 3C together. FIG. 3A is a schematic cross-sectional view of the first mask 100. 3B is a schematic cross-sectional view of the substrate 10, the black matrix 20, and the first material layer 30 coated with the first material. FIG. 3C is a schematic cross-sectional view showing the first color resist 31 and the first spacer 32 obtained by exposing and developing the first material through the first mask 100.

Step S103: forming a second color resist arranged at intervals from the first color resist on the substrate through the second mask, and forming a second spacer on the first spacer;

In step S103, the second material is continuously coated on the substrate, then the second material is exposed through the second mask, and finally the exposed second material is developed to be in the transparent region of the color filter. Forming a plurality of second color resists spaced apart from the first color resist and forming a second spacer on the first spacer.

Please refer to FIG. 3D, 3E and 3F together, wherein FIG. 3D is a schematic cross-sectional view of the second mask 200. 3E is a schematic cross-sectional view of the substrate 10 coated with the second material, the black matrix 20, and the first color resist 31 and the second material layer 40. FIG. 3F is a cross-sectional structural view of the second spacer 42 obtained by exposing and developing the second material through the second mask 200.

The black matrix 20, the first spacer 32, and the second spacer 42 are overlapped to form a spacer for supporting the upper and lower glass substrates in the LTPS panel.

Specifically, the spacer includes a first spacer and a second spacer, and the first black matrix, the first spacer and the second spacer overlap to form a first spacer, and the second black matrix, the first The spacer and the second spacer overlap to form a second spacer, and the first spacer and the second spacer have different heights.

Step S104: forming a third color resistance arranged on the substrate and spaced apart from the first color resist and the second color resist by the third mask.

In step S104, the third material is continuously coated on the substrate, then the third material is exposed through the third mask, and finally the exposed third material is developed to form on the substrate of the color filter. a third color resistance arranged at intervals from the first color resistance and the second color resistance.

4 and FIG. 5, FIG. 4 is a first cross-sectional structural view of a color filter of the present invention, and FIG. 5 is a schematic structural view of a second cross-section of the color filter of the present invention. As shown in FIGS. 4 and 5, the color filter includes a substrate 10, a black matrix 20, a first color resist 31, a first spacer 32, a second color resist 41, a second spacer 42 and a third color resist 51. .

The black matrix 20 is disposed on the substrate 10. Specifically, the black matrix 20 includes a first black matrix 21 (see FIG. 4) and a second black matrix 22 (see FIG. 5), and the first black matrix 21 and the second black matrix 22 have different heights, wherein The black matrix 21 and the second black matrix 22 are obtained by the same process using a semi-transparent mask.

The first color resist 31, the second color resist 41, and the third color resist 51 are disposed on the substrate 10 and are sequentially arranged in sequence. Specifically, the first color resist 31, the second color resist 41, and the third color resist 51 are sequentially arranged in the light-transmitting region of the color filter, and the first color resist 31, the second color resist 41, and the third color are sequentially arranged. Resistor 51 can be R, G, B color resistance, respectively.

The first spacer 32 is disposed on the black matrix 20, and the second spacer 42 is disposed on the first spacer 32. The first spacer 32 and the first color resist 31 are obtained by the same process using a semi-transparent mask, and the second spacer 42 and the second color resist 41 are obtained by the same process using a semi-transparent mask. The first spacer portion 32 and the second spacer portion 42 are color resists of different colors, and the first spacer portion 32 and the second spacer portion 42 are specifically one of a red color resist, a green color resist, and a blue color resist.

Preferably, the first spacer 32 is connected to the first color resist 31, the second spacer 42 is connected to the second color resist 41, and the first spacer 32 and the second spacer 42 are disposed on the first color resist 31 and the second Between color resistance 41.

The black matrix 20, the first spacer 32, and the second spacer 42 overlap to form a spacer of the color filter. Specifically, the spacer includes a first spacer and a second spacer, and the first black matrix 21, the first spacer 32, and the second spacer 42 overlap to form a first spacer, and the second black matrix 22. The first spacer 32 and the second spacer 42 overlap to form a second spacer. Preferably, the ends of the first spacer and the second spacer that are suspended, that is, the ends away from the black matrix 20 are planar.

The color filter of the present invention and the manufacturing method thereof have the first mask formed on the substrate by the first mask and the first spacer formed on the black matrix, and the second mask is passed through the second mask. Forming a second color resist arranged at intervals from the first color resist and forming a second spacer on the first spacer, wherein the black matrix, the first spacer and the second spacer overlap to form a color filter Spacer. In the above manner, the present invention does not require an additional mask process to fabricate the spacer, thereby reducing the manufacturing cost of the color filter, and the spacer is formed by overlapping the black matrix, the first color resist and the second color resist. When the panel is squeezed, the spacer does not slip into the light transmissive area of the pixel to cause a mura condition.

The above is only the embodiment of the present invention, and is not intended to limit the scope of the invention, and the equivalent structure or equivalent process transformations made by the description of the invention and the drawings are directly or indirectly applied to other related technologies. The fields are all included in the scope of patent protection of the present invention.

Claims

A color filter, wherein the color filter comprises:

a black matrix disposed on the substrate;

The first color resist, the second color resist, and the third color resist are disposed on the substrate and are repeatedly arranged in sequence;

The first spacer is obtained by the same process as the first color resist, and is disposed on the black matrix;

The second spacer is obtained by the same process as the second color resist, and is disposed on the first spacer;

Wherein the black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter;

Wherein the black matrix comprises a first black matrix and a second black matrix, the spacer comprises a first spacer and a second spacer, wherein the first black matrix and the second black matrix The first black matrix, the first spacer, and the second spacer overlap to form the first spacer, the second black matrix, the first Forming the second spacer after the spacer portion and the second spacer portion overlap;

The first spacer is connected to the first color resist, the second spacer is connected to the second color resist, and the first spacer and the second spacer are disposed on the first Between a color resistance and the second color resistance;

The first spacer and the second spacer are one of a red color resist, a green color resist, and a blue color resist.
The color filter according to claim 1, wherein said end portion of said first spacer and said second spacer are suspended in a planar shape.
A method of fabricating a color filter, wherein the method comprises:

Forming a black matrix on the substrate;

Forming a first color resist on the substrate through a first mask and forming a first spacer on the black matrix;

Forming, by the second mask, a second color resist arranged at intervals from the first color resist and forming a second spacer on the first spacer;

Forming, by the third mask, a third color resistance arranged on the substrate and spaced apart from the first color resist and the second color resist;

The black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter.
The method of claim 3, wherein the black matrix comprises a first black matrix and a second black matrix, the spacer comprising a first spacer and a second spacer, wherein the first The black matrix and the second black matrix are spaced apart and have different heights, and the first black matrix, the first spacer and the second spacer overlap to form the first spacer, The second black matrix, the first spacer and the second spacer overlap to form the second spacer.
The method according to claim 4, wherein said first spacer is connected to said first color resist, said second spacer is connected to said second color resist, said first spacer and said The second spacer is formed between the first color resist and the second color resist.
The method of claim 5 wherein said first mask and said second mask are semi-transmissive masks, wherein said first mask comprises means for forming said first a first light-transmitting region of a color resist, a second light-transmitting region for forming the first spacer, and a light-shielding region spaced apart from the first light-transmitting region, the second mask comprising And forming a first light-transmissive region of the second color resist, a second light-transmitting region for forming the second spacer, and a light-shielding region spaced apart from the first light-transmitting region.
The method of claim 6 wherein said third mask is a semi-transmissive mask, wherein said third mask comprises a semi-transmissive region for forming said third color resist And a light shielding region spaced apart from the semi-transmissive region.
A color filter, wherein the color filter comprises:

a black matrix disposed on the substrate;

The first color resist, the second color resist, and the third color resist are disposed on the substrate and are repeatedly arranged in sequence;

The first spacer is obtained by the same process as the first color resist, and is disposed on the black matrix;

The second spacer is obtained by the same process as the second color resist, and is disposed on the first spacer;

The black matrix, the first spacer and the second spacer overlap to form a spacer of the color filter.
The color filter according to claim 8, wherein the black matrix comprises a first black matrix and a second black matrix, and the spacer comprises a first spacer and a second spacer, wherein The first black matrix and the second black matrix are spaced apart and have different heights, and the first black matrix, the first spacer and the second spacer overlap to form the first spacer The second black matrix, the first spacer and the second spacer overlap to form the second spacer.
The color filter according to claim 9, wherein the first spacer is connected to the first color resist, the second spacer is connected to the second color resist, and the first spacer And the second spacer is disposed between the first color resist and the second color resist.
The color filter according to claim 9, wherein the first spacer and the second spacer are one of a red color resist, a green color resist, and a blue color resist.
The color filter according to claim 9, wherein said end portion of said first spacer and said second spacer are suspended in a planar shape.