CN105158962A - Color filter and manufacturing method thereof - Google Patents
Color filter and manufacturing method thereof Download PDFInfo
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- CN105158962A CN105158962A CN201510522935.0A CN201510522935A CN105158962A CN 105158962 A CN105158962 A CN 105158962A CN 201510522935 A CN201510522935 A CN 201510522935A CN 105158962 A CN105158962 A CN 105158962A
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- spacer portion
- color blocking
- black matrix
- mask plate
- chock insulator
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a color filter and a manufacturing method thereof. The manufacturing method comprises forming black matrixes on a substrate, forming first color resistors on the substrate through a first masking plate and first interval portions on the black matrixes, forming second color resistors which are arranged on the substrate with alternate first color resistors through a second masking plate and second interval portions on the first interval portions, forming third color resistors which are arranged on the substrate with alternate first and second color resistors through a third masking plate. The black matrixes, the first interval portions and the second interval portions overlap to form insulation pads of a color filter. By adopting the above technical scheme, an extra photomask for making insulation pads is needless, the manufacturing cost of a color filter is reduced, and the insulation pads are formed by overlapped black matrixes, the first interval portions and the second interval portions, so the insulation pads will not fall into a transparent area of pixels to cause mura when a panel is pressed.
Description
Technical field
The present invention relates to field of liquid crystals, particularly relate to a kind of colored filter and preparation method thereof.
Background technology
Traditional LTPS (LowTemperaturePoly-silicon, low temperature polycrystalline silicon) panel construction design in, colored filter often deposits separately one deck PS (PostSpacer, chock insulator matter), wherein, PS is mainly used in providing the support of upper and lower layer glass substrate in LTPS panel.
In general, PS comprises highly different MainPS (main chock insulator matter) and SubPS (auxiliary chock insulator matter), MainPS and SubPS often needs employing two optical cover process to make, thus makes that the CT Cycle Time of colored filter is elongated, processing procedure cost uprises.
In addition, the shape of existing PS is generally trapezoidal, and its end away from colored filter spherically shape.In actual use, when after LTPS panel pressurized, PS is easy to the photic zone that landing enters pixel, thus causes the situation of mura also i.e. display brightness inequality.
Summary of the invention
The technical matters that the present invention mainly solves is to provide a kind of colored filter and preparation method thereof, the light shield number of times in colored filter manufacture process can be reduced, thus reduce the manufacturing cost of colored filter, occur after panel pressurized can being improved that chock insulator matter slips down to the photic zone of pixel and the situation of brightness disproportionation that causes simultaneously.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: the method for making providing a kind of colored filter, and the method comprises: on substrate, form black matrix"; On substrate, form the first color blocking by the first mask plate and on black matrix", form the first spacer portion; Formed with spaced second color blocking of the first color blocking on substrate by the second mask plate and form the second spacer portion in the first spacer portion; Formed on substrate and the first color blocking, spaced 3rd color blocking of the second color blocking by the 3rd mask plate; Wherein, black matrix", the first spacer portion and the second spacer portion overlap form the chock insulator matter of colored filter afterwards.
Wherein, black matrix" comprises the first black matrix" and the second black matrix", chock insulator matter comprises the first chock insulator matter and the second chock insulator matter, wherein, first black matrix" and the second black matrix" interval arrange and have different height, form the first chock insulator matter after first black matrix", the first spacer portion and the second spacer portion overlap, after the second black matrix", the first spacer portion and the second spacer portion overlap, form the second chock insulator matter.
Wherein, the first spacer portion is connected with the first color blocking, and the second spacer portion is connected with the second color blocking, and the first spacer portion and the second spacer portion are formed between the first color blocking and the second color blocking.
Wherein, first mask plate and the second mask plate are half-penetration type mask plate, wherein, first mask plate include the first photic zone for the formation of the first color blocking, the second photic zone for the formation of the first spacer portion and with the first spaced shading region, photic zone, the second mask plate include the first photic zone for the formation of the second color blocking, the second photic zone for the formation of the second spacer portion and with the first spaced shading region, photic zone.
Wherein, the 3rd mask plate is half-penetration type mask plate, and wherein, the 3rd mask plate includes semi-opaque region for the formation of the 3rd color blocking and shading region spaced with semi-opaque region.
For solving the problems of the technologies described above, another technical solution used in the present invention is: provide a kind of colored filter, and this colored filter comprises: black matrix", is arranged on substrate; First color blocking, the second color blocking and the 3rd color blocking, to be arranged on substrate and repeated arrangement successively; First spacer portion, is obtained by same processing procedure with the first color blocking, is arranged on black matrix"; Second spacer portion, is obtained by same processing procedure with the second color blocking, is arranged in the first spacer portion; Wherein, black matrix", the first spacer portion and the second spacer portion overlap form the chock insulator matter of colored filter afterwards.
Wherein, black matrix" comprises the first black matrix" and the second black matrix", chock insulator matter comprises the first chock insulator matter and the second chock insulator matter, wherein, first black matrix" and the second black matrix" interval arrange and have different height, form the first chock insulator matter after first black matrix", the first spacer portion and the second spacer portion overlap, after the second black matrix", the first spacer portion and the second spacer portion overlap, form the second chock insulator matter.
Wherein, the first spacer portion is connected with the first color blocking, and the second spacer portion is connected with the second color blocking, and the first spacer portion and the second spacer portion are arranged between the first color blocking and the second color blocking.
Wherein, the first spacer portion and the second spacer portion are the one in red color resistance, green color blocking and blue color blocking.
Wherein, the first chock insulator matter and the unsettled end of the second chock insulator matter are plane.
The invention has the beneficial effects as follows: colored filter of the present invention and preparation method thereof is formed on the first color blocking and black matrix" by the first mask plate and forms the first spacer portion on substrate, formed with spaced second color blocking of the first color blocking on substrate by the second mask plate and form the second spacer portion in the first spacer portion, wherein, black matrix", the first spacer portion and the second spacer portion overlap form the chock insulator matter of colored filter afterwards.By the way, the present invention does not need extra optical cover process to manufacture chock insulator matter, decrease the processing procedure cost of colored filter, chock insulator matter is overlapped to form by black matrix", the first color blocking and the second color blocking simultaneously, when panel is squeezed, chock insulator matter landing can not enter the photic zone of pixel thus causes mura situation.
Accompanying drawing explanation
Fig. 1 is the structural representation forming the mask plate that color blocking adopts in color filter producing process of the present invention;
Fig. 2 is the schematic flow sheet of the method for making of colored filter of the present invention;
Fig. 3 A-3F is the structural representation in the present invention in color filter producing process;
Fig. 4 is the first cross-sectional view of colored filter of the present invention;
Fig. 5 is the second cross-sectional view of colored filter of the present invention.
Embodiment
In the middle of instructions and claims, employ some vocabulary to censure specific assembly, one of skill in the art should understand, and same assembly may be called with different nouns by manufacturer.This specification and claims book is not used as with the difference of title the mode distinguishing assembly, but is used as the benchmark of differentiation with assembly difference functionally.Below in conjunction with drawings and Examples, the present invention is described in detail.
Fig. 1 is the structural representation forming the mask plate that color blocking adopts in color filter producing process of the present invention.As shown in Figure 1, mask plate comprises the first mask plate 100, second mask plate 200 and the 3rd mask 300.
Wherein, the first mask plate 100 is half-penetration type mask plate, and it is specially HTM (half-tonemask) half-penetration type mask plate.First mask plate 100 include the first photic zone 101 for the formation of the first color blocking, the second photic zone 102 for the formation of the first spacer portion and with the first spaced shading region 103, photic zone 101.Wherein, the light transmission capacity of the first photic zone 101 is less than the light transmission capacity of the second photic zone 102.Preferably, the first photic zone 101 is semi-opaque region, and the second photic zone 102 is full photic zone.Change an angle, the first photic zone 101 corresponds to the first color blocking deposition region on colored filter, and the second photic zone 102 corresponds to the deposition region of the first spacer portion.
Wherein, the second mask plate 200 is half-penetration type mask plate, and it is specially HTM half-penetration type mask plate.Second mask plate 200 include the first photic zone 201 for the formation of the second color blocking, the second photic zone 202 for the formation of the second spacer portion and with the first spaced shading region 203, photic zone 201.Wherein, the light transmission capacity of the first photic zone 201 is less than the light transmission capacity of the second photic zone 202.Preferably, the first photic zone 201 is semi-opaque region, and the second photic zone 202 is full photic zone.Change an angle, the first photic zone 201 corresponds to the second color blocking deposition region on colored filter, and the second photic zone 202 corresponds to the deposition region of the second spacer portion.
Wherein, the 3rd mask plate 300 is half-penetration type mask plate, and it is specially HTM half-penetration type mask plate.3rd mask plate 300 includes semi-opaque region 301 for the formation of the 3rd color blocking and shading region 302 spaced with semi-opaque region 301.Change an angle, semi-opaque region 301 corresponds to the 3rd color blocking deposition region on colored filter.In other embodiments, the 3rd mask plate 300 also can be full-transparency type mask plate, it comprise for the formation of the 3rd color blocking full photic zone and with spaced shading region, full impregnated light district.
Preferably, when the first mask plate 100 and the second mask plate 200 overlap, second photic zone 102 of the first mask plate 100 and the second photic zone 202 of the second mask plate 200 have identical position and shape, to make the first spacer portion and the cross section of the second spacer portion be identical shape such as rectangle, and mutually completely overlapping on colored filter.
It is the schematic flow sheet of the method for making of colored filter of the present invention please also refer to Fig. 2, Fig. 2.Fig. 3 A-3F is the structural representation in color filter producing process of the present invention.If it is noted that there is result identical in fact, method of the present invention is not limited with the flow sequence shown in Fig. 2.As shown in Figure 2, the method comprises the steps:
Step S101: form black matrix" on substrate;
In step S101, first painting black matrix material on substrate, is then exposed black-matrix material by half-penetration type mask plate, finally develops to the black-matrix material after exposure, to form multiple black matrix".
Wherein, black matrix" comprises the first black matrix" and the second black matrix", and the first black matrix" and the second black matrix" are spaced, and the first black matrix" and the second black matrix" have different height.
Step S102: form the first color blocking by the first mask plate on substrate and form the first spacer portion on black matrix";
In step s 102, continue on substrate, be coated with the first material, then by the first mask plate, the first material is exposed, finally the first material after exposure is developed, to form multiple first color blocking and form the first spacer portion on the transmission region of colored filter on black matrix".
Please also refer to Fig. 3 A, 3B and 3C.Wherein, Fig. 3 A is the cross-sectional view of the first mask plate 100.Fig. 3 B is the cross-sectional view being coated with the substrate 10 of the first material, black matrix" 20 and the first material layer 30.Fig. 3 C be by the first mask plate 100, first material is exposed, develop after the cross-sectional view of the first color blocking 31 of obtaining and the first spacer portion 32.
Step S103: formed with spaced second color blocking of the first color blocking on substrate by the second mask plate and form the second spacer portion in the first spacer portion;
In step s 103, continue on substrate, be coated with the second material, then by the second mask plate, the second material is exposed, finally the second material after exposure is developed, to be formed with spaced multiple second color blocking of the first color blocking at the transmission region of colored filter and form the second spacer portion in the first spacer portion.
Please also refer to Fig. 3 D, 3E and 3F, wherein, Fig. 3 D is the cross-sectional view of the second mask plate 200.Fig. 3 E is the cross-sectional view being coated with the substrate 10 of the second material, black matrix" 20 and the first color blocking 31 and the second material layer 40.Fig. 3 F be by the second mask plate 200, second material is exposed, develop after the cross-sectional view of the second spacer portion 42 that obtains.
Wherein, the overlapping rear chock insulator matter forming layer glass substrate up and down in support LTPS panel of black matrix" 20, first spacer portion 32, second spacer portion 42.
Specifically, chock insulator matter comprises the first chock insulator matter and the second chock insulator matter, the first chock insulator matter is formed after first black matrix", the first spacer portion and the second spacer portion overlap, form the second chock insulator matter after second black matrix", the first spacer portion and the second spacer portion overlap, the first chock insulator matter and the second chock insulator matter have different height.
Step S104: formed on substrate and the first color blocking, spaced 3rd color blocking of the second color blocking by the 3rd mask plate.
In step S104, continue to be coated with the 3rd material on substrate, then by the 3rd mask plate, the 3rd material is exposed, finally the 3rd material after exposure is developed, to be formed and the first color blocking, spaced 3rd color blocking of the second color blocking on the substrate of colored filter.
Please also refer to the first cross-sectional view that Fig. 4 and Fig. 5, Fig. 4 are colored filter of the present invention, Fig. 5 is the structural representation of the second section of colored filter of the present invention.As shown in Figure 4 and Figure 5, colored filter comprises substrate 10, black matrix" 20, first color blocking 31, first spacer portion 32, second color blocking 41, second spacer portion 42 and the 3rd color blocking 51.
Black matrix" 20 is arranged on the substrate 10.Specifically, black matrix" 20 comprises the first black matrix" 21 (see Fig. 4) and the second black matrix" 22 (see Fig. 5), first black matrix" 21 and the second black matrix" 22 have different height, wherein, the first black matrix" 21 and the second black matrix" 22 adopt half-penetration type mask plate to be obtained by same processing procedure.
First color blocking 31, second color blocking 41 and the 3rd color blocking 51 to be arranged on substrate 10 and repeated arrangement successively.Specifically, repeated arrangement is in the transmission region of colored filter successively for the first color blocking 31, second color blocking 41 and the 3rd color blocking 51, and the first color blocking 31, second color blocking 41 and the 3rd color blocking 51 can be R, G, B color blocking respectively.
First spacer portion 32 is arranged on black matrix" 20, and the second spacer portion 42 is arranged in the first spacer portion 32.First spacer portion 32 and the first color blocking 31 adopt half-penetration type mask plate to be obtained by same processing procedure, and the second spacer portion 42 and the second color blocking 41 adopt half-penetration type mask plate to be obtained by same processing procedure.First spacer portion 32 and the second spacer portion 42 are the color blocking of different colours, and the first spacer portion 32 and the second spacer portion 42 are specially the one in red color resistance, green color blocking and blue color blocking.
Preferably, the first spacer portion 32 is connected with the first color blocking 31, and the second spacer portion 42 is connected with the second color blocking 41, and the first spacer portion 32 and the second spacer portion 42 are arranged between the first color blocking 31 and the second color blocking 41.
Wherein, black matrix" 20, first spacer portion 32 and the overlapping rear chock insulator matter forming colored filter of the second spacer portion 42.Specifically, chock insulator matter comprises the first chock insulator matter and the second chock insulator matter, first black matrix" 21, first spacer portion 32 and the overlapping rear formation of the second spacer portion 42 first chock insulator matter, form the second chock insulator matter after the second black matrix" 22, first spacer portion 32 and the second spacer portion 42 overlap.Preferably, namely the first chock insulator matter and the unsettled end of the second chock insulator matter are also plane away from the end of black matrix" 20.
The invention has the beneficial effects as follows: colored filter of the present invention and preparation method thereof forms the first color blocking by the first mask plate and on black matrix", forms the first spacer portion on substrate, formed with spaced second color blocking of the first color blocking on substrate by the second mask plate and form the second spacer portion in the first spacer portion, wherein, black matrix", the first spacer portion and the second spacer portion overlap form the chock insulator matter of colored filter afterwards.By the way, the present invention does not need extra optical cover process to manufacture chock insulator matter, thus decrease the processing procedure cost of colored filter, chock insulator matter is overlapped to form by black matrix", the first color blocking and the second color blocking simultaneously, when panel is squeezed, chock insulator matter landing can not enter the photic zone of pixel thus causes mura situation.
The foregoing is only embodiments of the present invention; not thereby the scope of the claims of the present invention is limited; every utilize instructions of the present invention and accompanying drawing content to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical fields, be all in like manner included in scope of patent protection of the present invention.
Claims (10)
1. a method for making for colored filter, is characterized in that, described method comprises:
Substrate forms black matrix";
Form the first color blocking on the substrate by the first mask plate and form the first spacer portion on described black matrix";
Formed with spaced second color blocking of described first color blocking on the substrate by the second mask plate and form the second spacer portion in described first spacer portion;
Formed on the substrate and described first color blocking, spaced 3rd color blocking of the second color blocking by the 3rd mask plate;
Wherein, described black matrix", described first spacer portion and described second spacer portion overlap form the chock insulator matter of described colored filter afterwards.
2. method according to claim 1, it is characterized in that, described black matrix" comprises the first black matrix" and the second black matrix", described chock insulator matter comprises the first chock insulator matter and the second chock insulator matter, wherein, described first black matrix" and described second black matrix" interval arrange and have different height, form described first chock insulator matter after described first black matrix", described first spacer portion and described second spacer portion overlap, after described second black matrix", described first spacer portion and described second spacer portion overlap, form described second chock insulator matter.
3. method according to claim 2, it is characterized in that, described first spacer portion is connected with described first color blocking, and described second spacer portion is connected with described second color blocking, and described first spacer portion and described second spacer portion are formed between described first color blocking and described second color blocking.
4. method according to claim 3, it is characterized in that, described first mask plate and described second mask plate are half-penetration type mask plate, wherein, described first mask plate include the first photic zone for the formation of described first color blocking, the second photic zone for the formation of described first spacer portion and with described first spaced shading region, photic zone, described second mask plate include the first photic zone for the formation of described second color blocking, the second photic zone for the formation of described second spacer portion and with described first spaced shading region, photic zone.
5. method according to claim 4, is characterized in that, described 3rd mask plate is half-penetration type mask plate, and wherein, described 3rd mask plate includes semi-opaque region for the formation of described 3rd color blocking and shading region spaced with described semi-opaque region.
6. a colored filter, is characterized in that, described colored filter comprises:
Black matrix", is arranged on substrate;
First color blocking, the second color blocking and the 3rd color blocking, to be arranged on described substrate and repeated arrangement successively;
First spacer portion, is obtained by same processing procedure with described first color blocking, is arranged on described black matrix";
Second spacer portion, is obtained by same processing procedure with described second color blocking, is arranged in described first spacer portion;
Wherein, described black matrix", described first spacer portion and described second spacer portion overlap form the chock insulator matter of described colored filter afterwards.
7. colored filter according to claim 6, it is characterized in that, described black matrix" comprises the first black matrix" and the second black matrix", described chock insulator matter comprises the first chock insulator matter and the second chock insulator matter, wherein, described first black matrix" and described second black matrix" interval arrange and have different height, form described first chock insulator matter after described first black matrix", described first spacer portion and described second spacer portion overlap, after described second black matrix", described first spacer portion and described second spacer portion overlap, form described second chock insulator matter.
8. colored filter according to claim 7, it is characterized in that, described first spacer portion is connected with described first color blocking, and described second spacer portion is connected with described second color blocking, and described first spacer portion and described second spacer portion are arranged between described first color blocking and described second color blocking.
9. colored filter according to claim 7, is characterized in that, described first spacer portion and described second spacer portion are the one in red color resistance, green color blocking and blue color blocking.
10. colored filter according to claim 7, is characterized in that, described first chock insulator matter and the unsettled described end of described second chock insulator matter are plane.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510522935.0A CN105158962A (en) | 2015-08-24 | 2015-08-24 | Color filter and manufacturing method thereof |
| PCT/CN2015/088373 WO2017031771A1 (en) | 2015-08-24 | 2015-08-28 | Color filter and method for manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510522935.0A CN105158962A (en) | 2015-08-24 | 2015-08-24 | Color filter and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105158962A true CN105158962A (en) | 2015-12-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510522935.0A Pending CN105158962A (en) | 2015-08-24 | 2015-08-24 | Color filter and manufacturing method thereof |
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| CN (1) | CN105158962A (en) |
| WO (1) | WO2017031771A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105182680A (en) * | 2015-10-22 | 2015-12-23 | 深圳市华星光电技术有限公司 | Color-resistor mask plate and application method thereof |
| CN106526948A (en) * | 2016-11-09 | 2017-03-22 | 惠科股份有限公司 | Light shield applied to display panel manufacturing process |
| CN107272232A (en) * | 2017-07-20 | 2017-10-20 | 深圳市华星光电半导体显示技术有限公司 | A kind of manufacture method of liquid crystal display panel |
| CN112198706A (en) * | 2020-10-28 | 2021-01-08 | 武汉华星光电技术有限公司 | Color film substrate, manufacturing method thereof and display panel |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110967861A (en) * | 2018-09-28 | 2020-04-07 | 咸阳彩虹光电科技有限公司 | Liquid crystal display panel, color film substrate and preparation method thereof |
| CN111158183A (en) * | 2020-01-16 | 2020-05-15 | 福建华佳彩有限公司 | Panel structure, panel and manufacturing method |
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| CN103744222A (en) * | 2013-12-11 | 2014-04-23 | 京东方科技集团股份有限公司 | Color filter, manufacturing method and display device |
| CN104793405B (en) * | 2015-04-28 | 2018-06-19 | 深圳市华星光电技术有限公司 | Liquid crystal display and liquid crystal display panel |
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| CN102213857A (en) * | 2010-04-07 | 2011-10-12 | 上海广电富士光电材料有限公司 | Color filtering base plate and manufacturing method thereof |
| CN103091905A (en) * | 2011-10-31 | 2013-05-08 | 京东方科技集团股份有限公司 | Color film substrate and manufacturing method thereof |
| CN103033981A (en) * | 2013-01-09 | 2013-04-10 | 深圳市华星光电技术有限公司 | Color filter substrate and manufacturing method thereof as well as liquid crystal panel |
| CN104423084A (en) * | 2013-09-09 | 2015-03-18 | 上海仪电显示材料有限公司 | Mask and manufacturing method of filter plate |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105182680A (en) * | 2015-10-22 | 2015-12-23 | 深圳市华星光电技术有限公司 | Color-resistor mask plate and application method thereof |
| CN105182680B (en) * | 2015-10-22 | 2019-12-17 | 深圳市华星光电技术有限公司 | Color resistance mask plate and using method thereof |
| CN106526948A (en) * | 2016-11-09 | 2017-03-22 | 惠科股份有限公司 | Light shield applied to display panel manufacturing process |
| WO2018086316A1 (en) * | 2016-11-09 | 2018-05-17 | 惠科股份有限公司 | Photomask applicable in display panel process |
| US11137674B2 (en) | 2016-11-09 | 2021-10-05 | HKC Corporation Limited | Mask adopted to manufacturing process of display panel |
| CN107272232A (en) * | 2017-07-20 | 2017-10-20 | 深圳市华星光电半导体显示技术有限公司 | A kind of manufacture method of liquid crystal display panel |
| WO2019015020A1 (en) * | 2017-07-20 | 2019-01-24 | 深圳市华星光电半导体显示技术有限公司 | Liquid crystal display panel manufacturing method |
| CN107272232B (en) * | 2017-07-20 | 2020-12-25 | 深圳市华星光电半导体显示技术有限公司 | Manufacturing method of liquid crystal display panel |
| CN112198706A (en) * | 2020-10-28 | 2021-01-08 | 武汉华星光电技术有限公司 | Color film substrate, manufacturing method thereof and display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017031771A1 (en) | 2017-03-02 |
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Application publication date: 20151216 |