WO2016158309A1 - 画像処理システムおよび画像処理方法 - Google Patents

画像処理システムおよび画像処理方法 Download PDF

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WO2016158309A1
WO2016158309A1 PCT/JP2016/057720 JP2016057720W WO2016158309A1 WO 2016158309 A1 WO2016158309 A1 WO 2016158309A1 JP 2016057720 W JP2016057720 W JP 2016057720W WO 2016158309 A1 WO2016158309 A1 WO 2016158309A1
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data
wavelet
mask
image
roi
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French (fr)
Japanese (ja)
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水野　雄介
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MegaChips Corp
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MegaChips Corp
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    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/102—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the element, parameter or selection affected or controlled by the adaptive coding
    • H04N19/12—Selection from among a plurality of transforms or standards, e.g. selection between discrete cosine transform [DCT] and sub-band transform or selection between H.263 and H.264
    • H04N19/122—Selection of transform size, e.g. 8x8 or 2x4x8 DCT; Selection of sub-band transforms of varying structure or type
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/60—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using transform coding
    • H04N19/63—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using transform coding using sub-band based transform, e.g. wavelets
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/102—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the element, parameter or selection affected or controlled by the adaptive coding
    • H04N19/132—Sampling, masking or truncation of coding units, e.g. adaptive resampling, frame skipping, frame interpolation or high-frequency transform coefficient masking
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/134—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the element, parameter or criterion affecting or controlling the adaptive coding
    • H04N19/136—Incoming video signal characteristics or properties
    • H04N19/14—Coding unit complexity, e.g. amount of activity or edge presence estimation
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/134—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the element, parameter or criterion affecting or controlling the adaptive coding
    • H04N19/167—Position within a video image, e.g. region of interest [ROI]
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/169—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding
    • H04N19/17—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding the unit being an image region, e.g. an object
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/169—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding
    • H04N19/18—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding the unit being a set of transform coefficients
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/10—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding
    • H04N19/169—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding
    • H04N19/1883—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using adaptive coding characterised by the coding unit, i.e. the structural portion or semantic portion of the video signal being the object or the subject of the adaptive coding the unit relating to sub-band structure, e.g. hierarchical level, directional tree, e.g. low-high [LH], high-low [HL], high-high [HH]
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/48—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using compressed domain processing techniques other than decoding, e.g. modification of transform coefficients, variable length coding [VLC] data or run-length data

Definitions

  • the present invention relates to an image processing system and an image processing method.
  • Patent Documents 1 to 3 disclose techniques for detecting a moving object in a moving image.
  • Patent Documents 4 and 5 disclose techniques for tracking moving objects using a particle filter. By using such a moving object detection technique, a moving object in an image can be cut out as an ROI (region of interest).
  • a technique for separating a foreground image and a background image from an entire image by graph cut for a still image taken by a digital camera is known.
  • a foreground image can be cut out as an ROI.
  • JP 2013-254291 A Japanese Patent Laid-Open No. 2007-088897 JP 2006-093784 A JP 2009-199363 A JP 2005-165688 A JP 2006-203409 A JP-T-2001-520466 JP 2003-324613 A
  • the ROI may be set with a portion that locally protrudes from the intended region, or conversely, a portion that locally erodes the intended region.
  • the ROI may be set with a defect in the intended region. That is, where the entire region of the intended region is supposed to be set as the ROI, it is determined that a non-ROI exists in the region, and the non-ROI forms a ROI defect. Combining an insufficient ROI with such defects in the outline and / or interior with another image will feel unnatural.
  • an image processing system includes an image synthesis system that synthesizes an ROI (region of interest) in a first target image with a second target image.
  • the second target image is similar to the first target image, and a similarity ratio of the second target image to the first target image is 1 or less.
  • the image composition system includes an encoded bitstream for first target image data that is data of the first target image and second basic image data that is data of a second basic image that is a source of the second target image. And synthesis control data for controlling the degree of synthesis.
  • first wavelet coefficient data is generated by performing wavelet transform on the first target image data to a preset initial decomposition level.
  • mask data which is mask data for discriminating between the wavelet transform processing and the ROI coefficient related to the ROI and the non-ROI coefficient related to the non-ROI for the first wavelet coefficient data
  • the ROI coefficient and the non-ROI coefficient in the first wavelet coefficient data are discriminated, and the first wavelet coefficient data is determined so that the non-ROI coefficient becomes zero.
  • the quantization process thereby generating quantized wavelet coefficient data, and the amount Including reduction and coding processing wavelet coefficient data is encoded to generate encoded data, the bit stream generation process for generating the coded bit stream from the encoded data.
  • the image synthesis system includes: a bit stream analysis unit that extracts the encoded data from the encoded bit stream; a decoding unit that decodes the encoded data to generate the quantized wavelet coefficient data; By determining whether the value of each data constituting the quantized wavelet coefficient data is 0, the ROI coefficient and the non-ROI coefficient in the quantized wavelet coefficient data are determined, and the determination result
  • a mask reproduction unit that reproduces the mask data at the initial decomposition level based on the first wavelet coefficient at the initial decomposition level by performing inverse quantization on the quantized wavelet coefficient data;
  • An inverse quantization unit that generates data, and the first wavelet coefficient data and the mask data are A decomposition level conversion unit that performs a decomposition level conversion process for converting the decomposition level to a first decomposition level specified by the synthesis control data, and second target image data that is data of the second target image And a wavelet transform unit that generates second wavelet coefficient data by performing the wavelet transform up to a second decomposition level
  • the first decomposition level of the first wavelet coefficient data is P1
  • the second decomposition level of the second wavelet coefficient data is P2
  • the similarity ratio is 1/2 P3.
  • P2 P1-P3.
  • the image composition system further determines the ROI coefficient and the non-ROI coefficient for the first wavelet coefficient data at the first decomposition level based on the mask data at the first decomposition level; Coefficient synthesis processing is performed to synthesize the ROI coefficient in the first wavelet coefficient data at the first decomposition level and the coefficient in the second wavelet coefficient data, whereby the image size and the decomposition level are reduced.
  • a synthesis execution unit that generates synthesized coefficient data that is the same as the second wavelet coefficient data, and inverse wavelet transformation is performed on the synthesized coefficient data until a decomposition level reaches a predetermined end level.
  • an inverse wavelet transform unit for generating composite image data.
  • the first target image data and the second wavelet coefficient obtained by converting the first target image data and the second target image data are combined with the ROI in the first target image and the second target image. This is done using the data. Also, the ROI in the first target image is determined by determining the ROI coefficient for the first wavelet coefficient data. For this reason, even if insufficient ROI is used, a repaired ROI can be provided on the composite image. That is, a better composite image can be obtained as compared with the case where the first target image data and the second target image data are combined as they are. Further, by controlling the decomposition level of the wavelet transform with the synthesis control data, the degree of synthesis (ROI restoration, ROI expansion, etc.) can be adjusted. In addition, the image size of the composite image can be adjusted.
  • FIG. 1 is a conceptual diagram of an image processing system according to Embodiment 1.
  • FIG. 1 is a block diagram illustrating an image processing system according to Embodiment 1.
  • FIG. 1 is a block diagram illustrating a data supply system according to Embodiment 1.
  • FIG. It is a figure explaining a Mallat type wavelet plane about Embodiment 1 (decomposition level 1). It is a figure explaining a Mallat type wavelet plane about Embodiment 1 (decomposition level 2). It is a figure explaining a Mallat type wavelet plane about Embodiment 1 (decomposition level 3).
  • 5 is a block diagram illustrating a mask generation unit in the first embodiment.
  • FIG. 6 is a diagram illustrating an example of a first basic image in the first embodiment.
  • FIG. 1 is a block diagram illustrating an image processing system according to Embodiment 1.
  • FIG. 1 is a block diagram illustrating an image processing system according to Embodiment 1.
  • FIG. 1 is a block diagram illustrating
  • FIG. 6 is a diagram illustrating an example of a basic mask in the first embodiment.
  • FIG. It is a figure explaining a development mask about Embodiment 1 (decomposition level 1). It is a figure explaining the expansion
  • 5 is a flowchart for explaining mask development processing in the first embodiment.
  • FIG. 10 is a diagram for explaining mask development processing when a 5 ⁇ 3 filter is used for wavelet transformation in the first embodiment.
  • FIG. 10 is a diagram for describing mask development processing when a Daubechies 9 ⁇ 7 filter is used for wavelet transformation in the first embodiment.
  • FIG. 4 is a flowchart for explaining the operation of the data supply system according to the first embodiment.
  • 1 is a block diagram illustrating an image composition system according to Embodiment 1.
  • FIG. 6 is a flowchart illustrating mask reproduction processing according to the first embodiment.
  • 4 is a block diagram illustrating a decomposition level conversion unit in the first embodiment.
  • FIG. 6 is a flowchart illustrating mask restoration processing according to the first embodiment.
  • FIG. 10 is a diagram for explaining mask restoration processing when a 5 ⁇ 3 filter is used for wavelet transformation in the first embodiment.
  • FIG. 10 is a diagram for explaining mask restoration processing when a Daubechies 9 ⁇ 7 filter is used for wavelet transformation in the first embodiment.
  • FIG. 6 is a flowchart for explaining a coefficient synthesis process (first coefficient synthesis process) in the first embodiment.
  • 5 is a flowchart for explaining a coefficient synthesis process (second coefficient synthesis process) in the first embodiment.
  • 4 is a flowchart for explaining the operation of the image composition system in the first embodiment. 4 is a flowchart for explaining the operation of the image composition system in the first embodiment.
  • FIG. 10 is a block diagram illustrating a decomposition level conversion unit in the second embodiment. 10 is a flowchart for explaining the operation of a decomposition level conversion unit in the second embodiment. 10 is a block diagram illustrating a data supply system according to Embodiment 3.
  • FIG. 10 is a block diagram illustrating an image composition system according to Embodiment 3.
  • FIG. 14 is a flowchart for explaining the operation of the data supply system according to the third embodiment.
  • 10 is a flowchart for explaining the operation of the image composition system in the third embodiment.
  • FIG. 10 is a block diagram illustrating a data supply system according to a fourth embodiment.
  • FIG. 10 is a block diagram illustrating an image composition system according to a fourth embodiment.
  • FIG. 10 is a block diagram illustrating an image composition system according to a fifth embodiment.
  • FIG. 20 is a diagram for explaining a cut-out range in the sixth embodiment.
  • FIG. 20 is a diagram for explaining a cut-out range in the sixth embodiment.
  • FIG. 20 is a diagram for explaining a cut-out range in the sixth embodiment.
  • FIG. 20 is a diagram for explaining a cut-out range in the sixth embodiment.
  • FIG. 20 is a diagram for explaining a cut-out range in the sixth embodiment.
  • FIG. 20 is a diagram for explaining a cut-out range in the sixth embodiment.
  • FIG. 20 is a flowchart for explaining cutout range determination processing in the sixth embodiment. It is a figure explaining the range of the pixel required in order to obtain the output for 1 pixel by wavelet transformation about Embodiment 6.
  • FIG. It is a figure explaining the range of the pixel required in order to obtain the output for 1 pixel by wavelet transformation about Embodiment 6.
  • FIG. It is a figure explaining the range of the pixel required in order to obtain the output for 1 pixel by wavelet transformation about Embodiment 6 (Daubechies 9x7 filter).
  • Daubechies 9x7 filter It is a figure explaining the range of the pixel required in order to obtain the output for 1 pixel by wavelet transformation about Embodiment 6 (Daubechies 9x7 filter).
  • 20 is a diagram for explaining a minimum tracking range in the sixth embodiment. It is a flowchart explaining how to obtain the upper left coordinates of the minimum tracking range in the sixth embodiment (5 ⁇ 3 filter). It is a flowchart explaining how to obtain the lower right corner coordinates of the minimum tracking range in the sixth embodiment (5 ⁇ 3 filter). It is a flowchart explaining how to obtain the upper left corner coordinates of the minimum tracking range in the sixth embodiment (Daubechies 9 ⁇ 7 filter). It is a flowchart explaining how to obtain the lower right corner coordinates of the minimum tracking range in the sixth embodiment (Daubechies 9 ⁇ 7 filter). It is a flowchart explaining how to obtain
  • FIG. 10 is a block diagram illustrating a data supply system according to a sixth embodiment.
  • FIG. 10 is a block diagram illustrating a mask generation unit in the sixth embodiment.
  • FIG. 10 is a block diagram illustrating an image composition system according to a sixth embodiment.
  • 24 is a flowchart for explaining the operation of the data supply system in the sixth embodiment.
  • 24 is a flowchart for explaining the operation of the data supply system in the sixth embodiment.
  • 20 is a flowchart for explaining the operation of the image composition system in the sixth embodiment.
  • 20 is a flowchart for explaining the operation of the image composition system in the sixth embodiment.
  • FIG. 20 is a conceptual diagram of image composition in the seventh embodiment.
  • FIG. 20 is a block diagram illustrating an inverse wavelet transform unit in the seventh embodiment.
  • FIG. 20 is a conceptual diagram of image composition in the eighth embodiment.
  • FIG. 20 is a conceptual diagram of image composition in the eighth embodiment.
  • FIG. 20 is a conceptual diagram of image composition in the eighth embodiment.
  • FIG. 20 is a block diagram illustrating an image composition system according to an eighth embodiment. 42 is a flowchart for explaining the operation of the image composition system in the eighth embodiment.
  • FIG. 19 is a conceptual diagram of image composition in the ninth embodiment.
  • FIG. 10 is a block diagram illustrating a supply system according to a tenth embodiment.
  • FIG. 20 is a hardware configuration diagram illustrating an image processing apparatus according to a tenth embodiment.
  • FIG. 1 shows a conceptual diagram of an image processing system 1 according to the first embodiment.
  • the image processing system 1 includes two image processing systems 10 and 20.
  • One image processing system 10 includes a data supply system 11
  • the other image processing system 20 includes an image composition system 21.
  • the image composition system 21 executes image composition processing.
  • the data supply system 11 outputs data used for image composition processing.
  • the image processing system 1 may be referred to as an overall system 1
  • the data supply system 11 may be referred to as a supply system 11
  • the image composition system 21 may be referred to as a composition system 21.
  • the image processing system 10 may be configured only by the supply system 11 or may further include another processing system.
  • the image processing system 20 may be configured by only the synthesis system 21 or may further include another processing system.
  • the supply system 11 is included in the image processing system 10 and also in the overall system 1.
  • the composition system 21 is included in the image processing system 20 and also in the overall system 1.
  • the image processing systems 10 and 20 are provided by a semiconductor integrated circuit. That is, the various functions and processes of the image processing systems 10 and 20 are realized in a circuit, in other words, in hardware. However, part or all of the functions and processes can be realized by a program that causes the microprocessor to function, in other words, by software.
  • FIG. 2 shows an application example of the entire system 1.
  • the image processing system 10 is provided in the data supply side device 30, and the image processing system 20 is provided in the image composition side device 40.
  • the data supply device 30 may be referred to as a supply device 30 and the image composition device 40 may be referred to as a composition device 40.
  • the user of the supply side device 30 is different from the user of the composition side device 40, but is not limited to this example.
  • the supply side device 30 includes a display unit 31, an operation unit 32, an external interface 33, and an image input unit 34.
  • the composition side device 40 includes a display unit 41, an operation unit 42, an external interface 43, and an image input unit 44.
  • the external interfaces 33 and 43 may be referred to as I / Fs 33 and 43.
  • the display units 31 and 41 are configured by, for example, a liquid crystal display device, but the display units 31 and 41 may be configured by different types of display devices.
  • the operation units 32 and 42 are operation media for the user to input instructions, data, and the like to the devices 30 and 40, in other words, the image processing systems 10 and 20.
  • the operation units 32 and 42 are configured by one or a plurality of devices such as a keyboard, a mouse, a button, and a switch.
  • the I / F 33 is a part where the supply side device 30 inputs and outputs signals with the outside of the device.
  • the I / F 43 is a part where the synthesizing apparatus 40 inputs and outputs signals with the outside of the apparatus.
  • the I / Fs 33 and 43 include a communication interface, so that the supply side device 30 and the composition side device 40 can communicate with each other through the I / Fs 33 and 43.
  • the communication method between the devices 30 and 40 may be any of wired, wireless, and combinations thereof.
  • a medium 50 is interposed for information transmission between the devices 30 and 40. In the case of communication as described above, the medium 50 is a wireless or wired communication medium (in other words, a communication path).
  • the I / Fs 33 and 34 may include an interface for an external storage medium in addition to or instead of the communication interface.
  • information transmission between the supply-side device 30 and the composition-side device 40 can be performed via an external storage medium, and the external storage medium corresponds to the medium 50 interposed between the devices 30 and 40. .
  • the image input unit 34 is configured by a digital camera. Alternatively, the image input unit 34 may be a storage device that supplies image data. The image input unit 44 is similarly configured. The image input units 34 and 44 may be configured by different types of devices.
  • combination side apparatus 40 is not limited to the example of FIG. That is, some of the above components may be omitted, or other components may be added.
  • FIG. 3 shows a configuration example of the supply system 11.
  • the supply system 11 has an image data encoding function as described below. With such an encoding function, the first target image data A20 that is the data of the first target image supplied to the synthesis system 21 is encoded to generate encoded image data A50.
  • the encoded image data A50 may be simply referred to as encoded data A50.
  • encoding is generally used for compression of image data.
  • compression and “encoding” are used synonymously.
  • image compression may be expressed as image encoding or image compression encoding.
  • decompression and “decoding” are used synonymously.
  • image expansion may be expressed as image decoding or image expansion decoding.
  • the encoded data A50 is output from the supply system 11 by the bit stream (hereinafter also referred to as encoded bitstream) Abs for the encoded data A50, and is supplied to the synthesis system 21.
  • bit stream hereinafter also referred to as encoded bitstream
  • the image input to the supply system 11 is an image that is a source of the first target image, and therefore, the input image may be referred to as a first basic image.
  • the first basic image data which is the data of the first basic image, is assigned a reference A10 different from the reference A20 of the first target image data.
  • the first target image is an image including an ROI (region of interest), and provides a main image in the image synthesis in the synthesis system 21.
  • the ROI in the first target image is also present in the first basic image.
  • the first basic image and the first target image may be images taken with a digital camera or the like, or may be computer graphics.
  • the supply system 11 includes a preprocessing unit 1020, a wavelet transform unit 1030, a quantization unit 1040, a mask generation unit 1050, an encoding unit 1060, and a bit stream generation unit 1070. Is included.
  • the preprocessing unit 1020 performs predetermined preprocessing on the first target image data A20.
  • the preprocessing unit 1020 includes a DC level shift unit 1021, a color space conversion unit 1022, and a tiling unit 1023.
  • the DC level shift unit 1021 converts the DC level of the first target image data A20 as necessary.
  • the color space conversion unit 1022 converts the color space of the image data after DC level conversion. For example, the RGB component is converted into a YCbCr component (consisting of a luminance component Y and color difference components Cb and Cr).
  • the tiling unit 1023 divides the image data after color space conversion into a plurality of rectangular region components called “tiles”. Then, the tiling unit 1023 supplies the image data to the wavelet conversion unit 1030 for each tile. Note that it is not always necessary to divide the image data into tiles, and the image data for one frame output from the color space conversion unit 1022 may be supplied to the wavelet conversion unit 1030 as it is.
  • the wavelet conversion unit 1030 performs wavelet conversion processing. Specifically, the wavelet transform unit 1030 performs an integer type or real number type discrete wavelet transform (DWT) on the pre-processed first target image data A20, and obtains a transform coefficient obtained as a result. Output.
  • the transform coefficient may be referred to as, for example, a wavelet transform coefficient or a wavelet coefficient.
  • data (a group of wavelet coefficients) generated by performing wavelet transformation on the first target image data A20 will be referred to as first wavelet coefficient data A21.
  • a high frequency component in other words, a high frequency component
  • a low frequency component in other words, a low frequency component
  • Such frequency decomposition is also called, for example, band division.
  • Each band component obtained by frequency decomposition that is, each of a low-frequency component and a high-frequency component
  • a subband is also called.
  • JPEG Joint-Photographic Experts Group 2000
  • the octave division method is adopted, in which only the band components that are divided in the low frequency side in both the vertical and horizontal directions are recursively divided. It shall be.
  • the number of recursive band divisions is called a decomposition level.
  • the first target image data A20 is decomposed to a predetermined decomposition level.
  • a predetermined decomposition level In general, when the decomposition level is about 3 to 5, good coding efficiency can be obtained.
  • the predetermined decomposition level in the wavelet conversion unit 1030 may be referred to as an initial decomposition level.
  • FIGS. 4 to 6 show Mallat wavelet planes 61 to 63 for two-dimensional wavelet transformation.
  • the input image two-dimensional image
  • the input image is subjected to frequency decomposition for each of the vertical direction and the horizontal direction at decomposition level 1 (see FIG. 4).
  • decomposition level 1 see FIG. 4
  • the band component LL1 obtained at the decomposition level 1 is further decomposed into four band components HH2, HL2, LH2, and LL2 at the decomposition level 2 (see the wavelet plane 62 in FIG. 5).
  • the band component LL2 obtained at the decomposition level 2 is further decomposed into four band components HH3, HL3, LH3 and LL3 at the decomposition level 3 (see the wavelet plane 63 in FIG. 6).
  • HL1 is a band component composed of a horizontal high-frequency component H and a vertical low-frequency component L at decomposition level 1.
  • the notation is generalized as “XYm” (X and Y are either H or L. m is an integer of 1 or more). That is, the band component composed of the horizontal band component X and the vertical band component Y at the decomposition level m is denoted as “XYm”.
  • the wavelet plane (see FIGS. 4 to 6) is a two-dimensional map in which the wavelet transform calculation result data is associated with a sequence of pixels in the original image (an image in which the wavelet transform is not performed).
  • a group of data arranged.
  • the calculation result data (LL component data) obtained by using a certain pixel in the original image as the target pixel is the value of the target pixel in the original image. It is arranged according to the position.
  • the wavelet plane is sometimes called a wavelet space, a wavelet region, or a wavelet image.
  • the band component LL1 corresponds to the essential information of the image. Note that according to the band component LL1, it is possible to provide an image having a quarter size of the image before decomposition (in other words, an image having a reduction ratio of 1/2 with respect to the image before decomposition).
  • the band component HL1 corresponds to edge information extending in the vertical direction
  • the band component LH1 corresponds to edge information extending in the horizontal direction
  • the band component HH corresponds to information on an edge extending in an oblique direction.
  • an original image that has not been subjected to wavelet conversion may be associated with decomposition level 0, and the original image may be expressed as a decomposition level 0 wavelet plane.
  • the band component most decomposed in the wavelet plane will be referred to as the highest band component.
  • the highest band components are LL3, HL3, LH3, and HH3.
  • the highest band components are LLk, HLk, LHk, and HHk.
  • the band component LL is referred to as the lowest band component and the band component HH is referred to as the highest band component.
  • the LL component is recursively decomposed by the same number of times in each of the horizontal direction and the vertical direction.
  • band components are synthesized in the reverse order of the decomposition.
  • the upper left corner is taken as the origin of the coordinate system, the origin is treated as 0, the wavelet transform L component output is treated as an even number, and the H component output is treated as an odd number. However, it is also possible to treat the L component output as an odd number and the H component output as an even number.
  • the wavelet plane (see FIGS. 4 to 6) is a conceptual plane in which the even-numbered and odd-numbered outputs of the wavelet transform are rearranged for each band component.
  • the quantization unit 1040 performs quantization processing. Specifically, the quantization unit 1040 performs scalar quantization on the first wavelet coefficient data A21 supplied from the wavelet transform unit 1030 based on the quantization step size, and thereby the quantization wave The let coefficient data A22 is generated.
  • the quantization step size is set according to the target image quality, for example.
  • the quantization unit 1040 uses, as the data constituting the first wavelet coefficient data A21 (in other words, each coefficient value), coefficients related to the ROI in the first target image (hereinafter also referred to as ROI coefficients). Then, a coefficient discrimination process for discriminating coefficients related to non-ROI (hereinafter also referred to as non-ROI coefficients) is performed. Then, the quantization unit 1040 quantizes the first wavelet coefficient data A21 so that the non-ROI coefficient after quantization becomes zero.
  • Such quantization can be realized by, for example, a technique (see Patent Document 6) that determines a quantization value based on a norm.
  • the quantization unit 1040 performs coefficient determination processing based on the mask data B21 supplied from the mask generation unit 1050.
  • the mask data B21 provides a mask for discriminating ROI coefficients and non-ROI coefficients for the first wavelet coefficient data A21.
  • the mask generation unit 1050 performs mask generation processing. Specifically, the mask generation unit 1050 generates mask data B21 that is mask data for discriminating between the ROI coefficient and the non-ROI coefficient for the first wavelet coefficient data A21.
  • FIG. 7 shows a configuration example of the mask generation unit 1050.
  • the mask generation unit 1050 includes a basic mask generation unit 1051 and a mask development unit 1052.
  • the basic mask generation unit 1051 performs basic mask generation processing. Specifically, the basic mask generation unit 1051 generates basic mask data B10, which is basic mask data for determining ROI and non-ROI in the range of the first basic image, based on the first basic image data A10. Generate.
  • the basic mask generation unit 1051 can be configured by various mask generation techniques. For example, a technique for detecting a moving object in a moving image is known. By using this moving object detection technique, a mask in which a moving object in an image is set to ROI can be generated. See, for example, Patent Documents 1 to 3 regarding the moving object detection technology. For example, Patent Documents 4 and 5 describe a technique for tracking a moving object using a particle filter. According to such a moving object tracking technique, the accuracy of detecting a moving object can be improved and the amount of calculation can be reduced.
  • a technique for separating a foreground image and a background image from an entire image by graph cut for a still image taken by a digital camera is known. If the basic mask generation unit 1051 is configured using this image separation technique, a mask in which the foreground image is set to ROI can be generated.
  • the basic mask generation unit 1051 performs preprocessing as appropriate when generating a mask.
  • the first basic image data A10 is image data (Bayer data) captured by a digital camera
  • the Bayer data is converted into RGB color data.
  • reduction processing is performed to reduce the amount of calculation.
  • color space conversion to black and white, YUV, HSV, or the like is performed in order to extract feature amounts.
  • the part of the moving person is set to the ROI 60a, and the other part is set to the non-ROI 60b.
  • the basic mask 70 corresponding to the entire range of the first image 60 is shown in FIG.
  • the basic mask 70 can be understood as an image indicating whether each pixel in the first basic image 60 belongs to the ROI 60a or the non-ROI 60b.
  • the basic mask 70 has an ROI corresponding portion 70a and a non-ROI corresponding portion 70b corresponding to the ROI 60a and the non-ROI 60b in the first basic image 60.
  • the white portion is the ROI corresponding portion 70a
  • the black portion is the non-ROI corresponding portion 70b.
  • the basic mask 70 may be generated for all the frame images, or the basic mask 70 may be generated, for example, every fixed frame or every fixed time. The same applies to the case where still images are sequentially input.
  • the mask development unit 1052 performs mask development processing. Specifically, the mask development unit 1052 uses the ROI corresponding portion and the non-ROI corresponding portion of the basic mask for each band component included in the first wavelet coefficient data A21 (in other words, the first wavelet coefficient data). (For each band component included in the wavelet plane corresponding to A21). By such mask development processing, a development mask which is a mask for the first wavelet coefficient data A21 is generated. Regarding the development of the mask, see, for example, Patent Documents 6 and 7 and Non-Patent Document 1.
  • the development mask generated by the mask development unit 1052 is the above-described mask for discriminating between the ROI coefficient and the non-ROI coefficient for the first wavelet coefficient data A21. That is, the mask generation unit 1050 generates and outputs development mask data as the mask data B21.
  • FIGS. 10 to 12 show unfolded masks 71, 72, and 73, respectively, in which the basic mask 70 of FIG.
  • ROI corresponding portions 71a, 72a, 73a are illustrated in white
  • non-ROI corresponding portions 71b, 72b, 73b are illustrated in black.
  • FIG. 13 shows a flowchart of the mask development process.
  • a process of increasing the mask decomposition level by one step (hereinafter also referred to as a level increase unit process) S202 is performed.
  • the level increase unit process S202 is repeated until a mask of the decomposition level is obtained (see step S201).
  • the first mask for the first wavelet plane is converted into a second mask for the second wavelet plane whose decomposition level is one step higher than that of the first wavelet plane.
  • the first mask to be developed is an original mask
  • the original image before wavelet conversion corresponds to the first wavelet plane.
  • the repetition of the level increase unit process S202 is performed recursively. That is, the level increase unit process S202 is performed again by setting the second mask as a new first mask.
  • the level increase unit process S202 is repeated according to the wavelet conversion method. For example, when the above Mallat type method is adopted (see FIGS. 4 to 6), the wavelet plane recursively decomposes only the lowest band component LL. For this reason, mask development is also performed recursively only for the portion corresponding to the band component LL.
  • the level increase unit process S202 is performed based on a predetermined mask development condition, and the mask development condition depends on the number of taps of the wavelet transform filter.
  • the mask development condition includes two conditions (referred to as a first development condition and a second development condition) based on FIG.
  • the decomposition-side low-pass filter has 5 taps
  • the decomposition-side high-pass filter has 3 taps.
  • n can be expressed as 2nth, where n is an integer
  • the second mask is formed so that the nth data of the component (corresponding to the output data on the low-pass filter side) is associated with the ROI.
  • a second mask is formed so that the ⁇ n ⁇ 1 ⁇ th and nth data of the high-frequency component (corresponding to the output data on the high-pass filter side) are associated with the ROI in the second wavelet plane.
  • Second development condition When the ⁇ 2n + 1 ⁇ th data on the first wavelet plane is associated with the ROI by the first mask, the nth and ⁇ n + 1 ⁇ th of the low-frequency component in the second wavelet plane and The second mask is formed so that the ⁇ n ⁇ 1 ⁇ th to ⁇ n + 1 ⁇ th data of the high frequency components are associated with the ROI.
  • the mask development condition includes two conditions (referred to as a third development condition and a fourth development condition) based on FIG.
  • the decomposition-side low-pass filter has 9 taps
  • the decomposition-side high-pass filter has 7 taps.
  • the mask generation unit 1050 When the decomposition level of the first wavelet coefficient data A21 is 3, the mask generation unit 1050 generates a decomposition level 73 expansion mask 73 (see FIG. 12), and supplies the expansion mask 73 to the quantization unit 1040. Based on the distinction between the ROI-corresponding portion 73a and the non-ROI-corresponding portion 73b in the development mask 73, the quantization unit 1040 decomposes the first wavelet coefficient data A21 at the decomposition level 3, in other words, the wavelet plane 63 at the decomposition level 3. The coefficient discrimination process (see FIG. 6) is performed.
  • the quantization unit 1040 performs the quantization at the decomposition level 3 so that the value after quantization of the non-ROI coefficient in the first wavelet coefficient data A21 becomes 0 based on the coefficient discrimination result. Wavelet coefficient data A22 is generated.
  • the encoding unit 1060 performs an encoding process. Specifically, the encoding unit 1060 performs predetermined encoding on the quantized wavelet coefficient data A22 generated by the quantization unit 1040, thereby generating encoded data A50. In the predetermined encoding, for example, entropy encoding is performed according to EBCOT (Embedded Block Coding with Optimized Truncation) that performs bit-plane encoding. In the example of FIG. 3, the encoding unit 1060 includes a coefficient bit modeling unit 1061 and an entropy encoding unit 1062.
  • EBCOT Embedded Block Coding with Optimized Truncation
  • the coefficient bit modeling unit 1061 performs bit modeling processing on the quantized wavelet coefficients.
  • bit modeling process uses a known technique, and detailed description thereof is omitted.
  • the coefficient bit modeling unit 1061 divides the input band component into regions called “code blocks” of about 32 ⁇ 32 or 64 ⁇ 64. Coefficient bit modeling section 1061 assigns each bit value constituting the binary value of each quantized wavelet coefficient in the code block to a separate bit plane. The bit modeling process is performed in units of such bit planes.
  • the entropy encoding unit 1062 performs entropy encoding on the data generated by the coefficient bit modeling unit 1061 to generate encoded image data.
  • entropy coding for example, known arithmetic coding is used.
  • the coding unit 1060 may control the code amount by performing rate control on the coded image data generated by the entropy coding unit 1062.
  • bit stream generation unit 1070 performs a bit stream generation process. Specifically, the bit stream generation unit 1070 multiplexes the encoded data A50 output from the encoding unit 1060 with additional information, thereby generating an encoded bit stream Abs compliant with JPEG2000. Examples of the additional information include header information, layer configuration, scalability information, quantization table, and the like.
  • the bit stream generation unit 1070 acquires the synthesis control data C50 and embeds the synthesis control data C50 in the encoded bit stream Abs.
  • the composition control data C50 is data for controlling the degree of composition in the image composition processing in the composition system 21.
  • the synthesis control data C50 is supplied to the supply system 11 when the user inputs the operation unit 32 provided on the supply system 11 side.
  • the encoded bitstream Abs has an area that does not affect the encoded data, and the bitstream generation unit 1070 embeds the synthesis control data C50 in that area.
  • an area of the encoded bit stream Abs for example, a header area, a comment area in the format of the encoded stream, an application marker (APP marker) area, and the like can be used.
  • APP marker application marker
  • FIG. 16 shows a flowchart for explaining the operation of the supply system 11. According to the operation flow S1000 of FIG. 16, when the first basic image data A10 is input to the supply system 11, the pre-processing unit 1020 and the mask generation unit 1050 acquire the first basic image data A10 (step S1001).
  • the pre-processing unit 1020 performs predetermined pre-processing on the first basic image data A10, in other words, the first target image data A20 (step S1101).
  • the wavelet transform unit 1030 performs wavelet transform on the first target image data A20 after the preprocessing up to a predetermined decomposition level, thereby generating the first wavelet coefficient data A21 (step S1102). .
  • the mask generation unit 1050 generates, based on the first basic image data A10, a mask for the first wavelet coefficient data A21, that is, development mask data B21 corresponding to the decomposition level of the first wavelet coefficient data A21. (Step S1200). Specifically, the basic mask generation unit 1051 performs the basic mask generation process (step S1201), and the mask expansion unit 1052 performs the mask expansion process (step S1202).
  • step S1200 is executed in parallel with steps S1101 and S1102, but step S1200 can also be executed before or after steps S1101 and S1102.
  • the first wavelet coefficient data A21 generated in step S1102 and the mask data B21 generated in step S1200 are input to the quantization unit 1040.
  • the quantization unit 1040 based on the mask data B21, sets the first wavelet coefficient data A21 so that the value after quantization of the non-ROI coefficient in the first wavelet coefficient data A21 becomes zero. Is quantized (step S1002). Thereby, quantized wavelet coefficient data A22 is generated.
  • the quantized wavelet coefficient data A22 is encoded by the encoding unit 1060, and encoded data A50 is generated (step S1003).
  • the encoded data A50 is converted into the encoded bitstream Abs for the first target image by the bitstream generation unit 1070 (step S1004).
  • the bit stream generation unit 1070 acquires the synthesis control data C50 and embeds the synthesis control data C50 in the encoded bit stream Abs as described above (step S1005). Note that the composition control data C50 may be input in step S1005, or the composition control data C50 input and held in advance may be used in step S1005.
  • the encoded bitstream Abs is output from the bitstream generation unit 1070 (step S1006).
  • the encoded bit stream Abs is output from the supply system 11 with the synthesis control data C50 embedded as described above, and is output from the I / F 33 to the outside of the supply-side device 30 in the example of FIG.
  • the encoded bit stream Abs is input to the synthesis system 21 via the I / F 43 in a state where the synthesis control data C50 is embedded.
  • the medium 50 (see FIG. 2) is used.
  • the synthesis control data C50 is embedded in the encoded bit stream Abs for the encoded data A50, the encoded data A50 and the synthesis control data C50 are transmitted by the same medium 50 (for example, a communication medium or an external storage medium). , Supplied to the synthesis system 21.
  • FIG. 17 shows a configuration example of the synthesis system 21.
  • the synthesis system 21 includes a bitstream analysis unit 1210, a decoding unit 1220, a mask reproduction unit 1230, an inverse quantization unit 1240, a decomposition level conversion unit 1250, and a wavelet conversion unit. 1260, a synthesis execution unit 1270, an inverse wavelet conversion unit 1280, and a post-processing unit 1290.
  • the bit stream analysis unit 1210 performs a bit stream analysis process. Specifically, the bitstream analysis unit 1210 analyzes the encoded bitstream Abs in accordance with the JPEG2000 specification, and extracts the encoded data A50, the additional information, and the synthesis control data C50 from the encoded bitstream Abs. To do.
  • the encoded data A50 is supplied to the decoding unit 1220. Various kinds of additional information are respectively supplied to predetermined processing units.
  • the composition control data C50 is supplied to the decomposition level conversion unit 1250 and the wavelet conversion unit 1260.
  • the decryption unit 1220 performs decryption processing. Specifically, the decoding unit 1220 performs predetermined decoding on the encoded data A50.
  • the predetermined decoding is basically the reverse of the encoding in the encoding unit 1060 in FIG. 3 except for the code amount control.
  • quantized wavelet coefficient data A22 is generated from the encoded data A50.
  • the decoding unit 1220 includes an entropy decoding unit 1221 and a coefficient bit modeling unit 1222.
  • the entropy decoding unit 1221 performs entropy decoding on the encoded data A50 to generate bit data. Entropy decoding is the reverse of the entropy encoding in the entropy encoding unit 1062 in FIG.
  • the coefficient bit modeling unit 1222 performs bit modeling processing on the bit data generated by the entropy decoding unit 1221 to restore the quantized wavelet coefficient data A22.
  • the bit modeling process here corresponds to a process opposite to that in the coefficient bit modeling unit 1061 in FIG.
  • the quantized wavelet coefficient data A22 generated by the coefficient bit modeling unit 1222 is supplied to the mask reproduction unit 1230 and the inverse quantization unit 1240.
  • the mask reproduction unit 1230 performs a mask reproduction process. Specifically, the mask reproduction unit 1230 discriminates the value of each data constituting the quantized wavelet coefficient data A22, so that the developed mask applied when the quantized wavelet coefficient data A22 is generated in the supply system 11 To reproduce.
  • the quantized wavelet coefficient data A22 is generated so that the value after quantization of the non-ROI coefficient in the first wavelet coefficient data A21 becomes zero.
  • the mask reproduction unit 1230 determines whether or not the value of each data constituting the quantized wavelet coefficient data A22 is 0, and thereby determines the ROI coefficient in the quantized wavelet coefficient data A22.
  • a non-ROI coefficient is discriminated (see step S11 of the mask reproduction process S10 in FIG. 18).
  • the mask reproduction unit 1230 reproduces the mask data B21 that is the data of the expansion mask corresponding to the quantized wavelet coefficient data A22 (steps S12 and S13 of the mask reproduction process S10 in FIG. 18). reference).
  • the inverse quantization unit 1240 performs an inverse quantization process. Specifically, the inverse quantization unit 1240 performs inverse quantization on the quantized wavelet coefficient data A22.
  • the inverse quantization here corresponds to the reverse process of the quantization in the quantization unit 1040 of FIG.
  • the quantized wavelet coefficient data A22 is converted into the first wavelet coefficient data A21.
  • the decomposition level conversion unit 1250 acquires the first wavelet coefficient data A21 from the inverse quantization unit 1240, acquires the mask data B21 from the mask reproduction unit 1230, and acquires the synthesis control data C50 from the bitstream analysis unit 1210. Then, the decomposition level conversion unit 1250 performs a decomposition level conversion process that is a process of converting the decomposition levels of the first wavelet coefficient data A21 and the mask data B21.
  • the decomposition level after conversion is specified by the synthesis control data C50.
  • the decomposition level specified by the synthesis control data C50 may be referred to as a first decomposition level.
  • the first decomposition level is an integer of 1 or more.
  • the decomposition level of the first wavelet coefficient data A21 and the mask data B21 is a level set by the supply system 11 at this time (in other words, when supplied to the synthesis system 21).
  • the decomposition level conversion unit 1250 converts this initial decomposition level into the first decomposition level designated by the synthesis control data C50. That is, the decomposition level conversion unit 1250 converts the first wavelet coefficient data A21 and the mask data B21 at the decomposition level set by the supply system 11 into the first wavelet coefficient data A61 and the mask data at the first decomposition level. Convert to B61.
  • FIG. 19 shows a configuration example of the decomposition level conversion unit 1250.
  • the decomposition level conversion unit 1250 includes a decomposition level reduction unit 1251 and a decomposition level increase unit 1256.
  • the decomposition level reduction unit 1251 determines the first wavelet coefficient data when the first decomposition level specified by the synthesis control data C50 is smaller than the initial decomposition levels of the first wavelet coefficient data A21 and the mask data B21. A decomposition level reduction process for reducing the decomposition levels of A21 and mask data B21 is performed. Conversely, the decomposition level increasing unit 1256 performs a decomposition level increasing process for increasing the decomposition levels of the first wavelet coefficient data A21 and the mask data B21 when the first decomposition level is higher than the initial decomposition level.
  • decomposition level conversion section 1250 keeps input first wavelet coefficient data A21 and mask data B21 as they are, and first wavelet coefficient data A61 and mask. Assume that data B61 is output.
  • the decomposition level reduction unit 1251 includes an inverse wavelet conversion unit 1252 and a mask restoration unit 1253.
  • the inverse wavelet transform unit 1252 acquires the first wavelet coefficient data A21 and the synthesis control data C50, and sets the first wavelet coefficient data A21 to the first decomposition level specified by the synthesis control data C50. Inverse wavelet transform (IDWT) is performed until Thereby, the first wavelet coefficient data A61 of the first decomposition level is generated.
  • IDLT Inverse wavelet transform
  • the reverse wavelet conversion is a process opposite to the wavelet conversion performed by the wavelet conversion unit 1030 of the supply system 11.
  • band components are recursively synthesized.
  • the number of synthesis in the inverse wavelet transform is called a synthesis level. Note that the synthesis level in the state before the inverse wavelet transform is expressed as 0.
  • the reverse wavelet conversion unit 1252 and the later-described reverse wavelet conversion unit 1280 may be realized by the same circuit, or may be realized by separate circuits.
  • the mask restoration unit 1253 acquires the mask data B21 and the synthesis control data C50, and performs mask restoration processing.
  • the mask restoration process is a process for restoring a mask having a lower decomposition level from a given mask, and is the reverse process of the mask development process (see FIGS. 13 to 15). More specifically, the mask data B21 is included in the first wavelet coefficient data A61 that is to be generated by the decomposition level conversion unit 1250 (that is, has the first decomposition level specified by the synthesis control data C50). Convert for each band component. Thereby, mask data B61 of the first decomposition level is generated.
  • FIG. 20 shows a flowchart of the mask restoration process.
  • a process of lowering the mask decomposition level by one step (hereinafter also referred to as level reduction unit process) S222 is performed. If the difference between the initial decomposition level and the first decomposition level is 2 or more, the level reduction unit process S222 is repeated until a mask of the first decomposition level is obtained (see step S221).
  • the first mask for the first wavelet plane is converted into a second mask for the second wavelet plane whose decomposition level is one step lower than that of the first wavelet plane. Since the first decomposition level specified by the synthesis control data C50 is an integer of 1 or more as described above, the restored second mask is not an original mask.
  • the repetition of the level reduction unit process S222 is performed recursively. That is, the level reduction unit processing S222 is performed again by setting the second mask as a new first mask. Further, the level reduction unit process S222 is repeated according to the inverse wavelet transform method. For example, when the above Mallat type method is adopted (see FIGS. 4 to 6), only the highest band component (LLk, HLk, LHk, HHk at the decomposition level k) in the wavelet plane is recursively decomposed. I will do it. For this reason, mask restoration is recursively performed only for the portion corresponding to the highest band component.
  • the level reduction unit process S222 is performed based on a predetermined mask restoration condition.
  • the mask restoration condition is that, when the data of the designated position on the first wavelet plane is associated with the ROI by the first mask, the data on the position associated with the designated position on the second wavelet plane becomes the ROI. It is defined that the second mask is formed so as to be associated with each other.
  • the mask restoration condition depends on the number of taps of the inverse wavelet transform filter. For example, when a 5 ⁇ 3 filter is used in the inverse wavelet transform processing, the mask restoration condition is based on FIG. When a Daubechies 9 ⁇ 7 filter is used in the inverse wavelet transform calculation process, the mask restoration condition is based on FIG.
  • the mask restoration conditions are roughly classified into two conditions (referred to as a first restoration condition and a second restoration condition). That is, the first restoration condition is for forming the second mask so that the 2n-th (n is an integer) data is associated with the ROI in the second wavelet plane. The second restoration condition is for forming the second mask so that the ⁇ 2n + 1 ⁇ th data is associated with the ROI in the second wavelet plane.
  • the first restoration condition and the second restoration condition also impose a condition that the data at the specified position on the first wavelet plane is associated with the ROI by the first mask (referred to as a restoration execution condition). is doing.
  • the specified position is a position associated with the 2n-th position on the second wavelet plane.
  • the position may be referred to as a first designated position.
  • candidates for the first designated position are the n-th and high-frequency components (high-pass components) of the low-frequency component (corresponding to input data on the low-pass filter side) on the first wavelet plane. ⁇ N ⁇ 1 ⁇ th and nth) corresponding to the input data on the filter side.
  • the specified position is a position associated with the ⁇ 2n + 1 ⁇ th position on the second wavelet plane.
  • the position may be referred to as a second designated position.
  • candidates for the second designated position are nth and ⁇ n + 1 ⁇ th of the low frequency component and ⁇ n ⁇ 1 ⁇ th of the high frequency component from the ⁇ n ⁇ 1 ⁇ th in the first wavelet plane. n + 1 ⁇ th.
  • the first restoration condition and the second restoration condition can be variously defined according to the usage mode of these candidates at the designated position.
  • the second mask can be adjusted in various ways.
  • the usage mode of the candidate for the designated position is set by a user instruction.
  • this user instruction will be referred to as a mask adjustment instruction.
  • the composition control data C50 includes a mask adjustment instruction, and thereby the mask adjustment instruction is supplied to the level reduction unit process S222 in the composition system 21 (see FIG. 20).
  • the mask adjustment instruction includes three instructions, that is, a mode instruction, a low-frequency selection instruction, and a high-frequency selection instruction.
  • the mode instruction relates to which band component is to be used among the low frequency component and the high frequency component of the first wavelet plane.
  • the low range selection instruction relates to whether or not to impose a restoration execution condition on all candidates included in the low frequency component of the first wavelet plane.
  • LSEL AND is expressed.
  • LSEL OR is expressed.
  • the high frequency selection instruction relates to whether or not the restoration execution condition is imposed on all candidates included in the high frequency component of the first wavelet plane.
  • HSEL AND is expressed.
  • mode instruction MODE the low-frequency selection instruction LSEL, and the high-frequency selection instruction HSEL can be supplied to the mask restoration unit 1253 (see FIG. 19) by three signals assigned for each instruction. is there.
  • Table 1 shows some specific examples of mask adjustment instructions. However, the content of the mask adjustment instruction is not limited to the example in Table 1.
  • the mask adjustment instruction # 1 is for lossless compression. That is, when the image compression (more specifically, quantization of ROI coefficient) in the supply system 11 is lossless, the mask adjustment instruction # 1 is suitable. According to lossless compression, the ROI coefficient after quantization does not become zero.
  • Mask adjustment instruction # 2 is for near lossless compression. Near lossless compression results in a data loss that is greater than lossless compression, but can provide image quality comparable to lossless compression. In view of this point, near-lossless compression is irreversible in terms of data but can be regarded as lossless in terms of image quality. However, in the two major categories of lossless and lossy, near lossless is often classified as lossy.
  • Mask adjustment instructions # 3 to # 7 are for lossy compression. According to the lossy compression, the ROI coefficient after quantization tends to be 0 in the high frequency component. As this tendency becomes stronger (in other words, when the quantized value is larger (that is, the compression ratio is larger) and the high frequency component has more ROI coefficients with a value after quantization of 0), # 4, # 7, It is preferable to apply the instructions in the order of # 3, # 6, and # 5.
  • n-th data of the low-frequency component of the first wavelet plane is associated with the ROI by the first mask, and the ⁇ n-1 ⁇ -th and n-th data of the high-frequency component of the first wavelet plane
  • the second mask is formed so that the 2n-th data is associated with the ROI in the second wavelet plane.
  • Second restoration condition All the nth and ⁇ n + 1 ⁇ th data of the low frequency component of the first wavelet plane are associated with the ROI by the first mask, and the high frequency component of the first wavelet plane
  • the ⁇ 2n + 1 ⁇ th data is associated with the ROI in the second wavelet plane.
  • a second mask is formed.
  • First restoration condition When the n-th data of the low frequency component of the first wavelet plane is associated with the ROI by the first mask, the 2n-th data is associated with the ROI in the second wavelet plane. Next, a second mask is formed.
  • Second restoration condition When all of the nth and ⁇ n + 1 ⁇ th data of the low frequency components of the first wavelet plane are associated with the ROI by the first mask, ⁇ 2n + 1 ⁇ in the second wavelet plane A second mask is formed so that the second data is associated with the ROI.
  • First restoration condition When the n-th data of the low frequency component of the first wavelet plane is associated with the ROI by the first mask, the 2n-th data is associated with the ROI in the second wavelet plane. Next, a second mask is formed.
  • this first restoration condition is the same as the mask adjustment instruction # 3 described above.
  • Second restoration condition when at least one of the nth and ⁇ n + 1 ⁇ th data of the low frequency component of the first wavelet plane is associated with the ROI by the first mask, the second wavelet plane A second mask is formed so that the ⁇ 2n + 1 ⁇ th data is associated with the ROI.
  • n-th data of the low-frequency component of the first wavelet plane is associated with the ROI by the first mask, and the ⁇ n-1 ⁇ -th and n-th data of the high-frequency component of the first wavelet plane
  • the second mask is formed so that the 2n-th data is associated with the ROI in the second wavelet plane.
  • Second restoration condition All the nth and ⁇ n + 1 ⁇ th data of the low frequency component of the first wavelet plane are associated with the ROI by the first mask, and the high frequency component of the first wavelet plane
  • the ⁇ 2n + 1 ⁇ th data is associated with the ROI in the second wavelet plane.
  • n-th data of the low-frequency component of the first wavelet plane is associated with the ROI by the first mask, and the ⁇ n-1 ⁇ -th and n-th data of the high-frequency component of the first wavelet plane
  • the second mask is formed so that the 2n-th data is associated with the ROI in the second wavelet plane.
  • the first restoration condition is the same as the mask adjustment instruction # 6 described above.
  • Second restoration condition At least one of the n-th and ⁇ n + 1 ⁇ -th low-frequency components of the first wavelet plane is associated with the ROI by the first mask, and the height of the first wavelet plane If at least one of the ⁇ n-1 ⁇ th to ⁇ n + 1 ⁇ th data of the band component is associated with the ROI by the first mask, the ⁇ 2n + 1 ⁇ th data becomes the ROI in the second wavelet plane.
  • a second mask is formed so as to be associated with each other.
  • Second restoration condition all the ⁇ n-1 ⁇ to ⁇ n + 2 ⁇ -th data of the low frequency components of the first wavelet plane are associated with the ROI by the first mask, and the height of the first wavelet plane
  • the ⁇ 2n + 1 ⁇ th data is associated with the ROI in the second wavelet plane.
  • First restoration condition When all the ⁇ n-1 ⁇ to ⁇ n + 1 ⁇ -th data of the low frequency components of the first wavelet plane are associated with the ROI by the first mask, the second wavelet plane A second mask is formed so that the 2n-th data is associated with the ROI.
  • Second restoration condition when all the ⁇ n-1 ⁇ to ⁇ n + 2 ⁇ -th data of the low frequency components of the first wavelet plane are associated with the ROI by the first mask, A second mask is formed so that the ⁇ 2n + 1 ⁇ th data is associated with the ROI.
  • First restoration condition when at least one of the ⁇ n ⁇ 1 ⁇ th to ⁇ n + 1 ⁇ th low-frequency components of the first wavelet plane is associated with the ROI by the first mask, the second wave A second mask is formed so that the 2n-th data is associated with the ROI in the let plane.
  • Second restoration condition when at least one of the ⁇ n ⁇ 1 ⁇ th to ⁇ n + 2 ⁇ th low-frequency components of the first wavelet plane is associated with the ROI by the first mask, the second wave A second mask is formed so that the ⁇ 2n + 1 ⁇ -th data is associated with the ROI in the let plane.
  • First restoration condition All the ⁇ n-1 ⁇ to ⁇ n + 1 ⁇ -th data of the low frequency components of the first wavelet plane are associated with the ROI by the first mask and the first wavelet plane height
  • the 2nth data is associated with the ROI in the second wavelet plane.
  • a second mask is formed.
  • Second restoration condition all the ⁇ n-1 ⁇ to ⁇ n + 2 ⁇ -th data of the low frequency components of the first wavelet plane are associated with the ROI by the first mask, and the height of the first wavelet plane If at least one of the ⁇ n-2 ⁇ th to ⁇ n + 2 ⁇ th of the band components is associated with the ROI by the first mask, the ⁇ 2n + 1 ⁇ th data becomes the ROI in the second wavelet plane.
  • a second mask is formed so as to be associated with each other.
  • First restoration condition At least one data of ⁇ n ⁇ 1 ⁇ th to ⁇ n + 1 ⁇ th of the low frequency components of the first wavelet plane is associated with the ROI by the first mask, and the first wavelet If at least one of ⁇ n ⁇ 2 ⁇ to ⁇ n + 1 ⁇ th of the high frequency components of the plane is associated with the ROI by the first mask, the 2n th data in the second wavelet plane is the ROI.
  • a second mask is formed so as to be associated with.
  • Second restoration condition At least one data of ⁇ n ⁇ 1 ⁇ th to ⁇ n + 2 ⁇ th of the low frequency components of the first wavelet plane is associated with the ROI by the first mask, and the first wavelet When at least one of ⁇ n ⁇ 2 ⁇ to ⁇ n + 2 ⁇ th of the high frequency components of the plane is associated with the ROI by the first mask, the ⁇ 2n + 1 ⁇ th data in the second wavelet plane The second mask is formed so that is associated with the ROI.
  • ⁇ Mask adjustment instructions> the designated position in the first restoration condition and the second restoration condition can be designated by the mask adjustment instruction.
  • the user can input a mask adjustment instruction by inputting a mode instruction (MODE), a low-frequency selection instruction (LSEL), and a high-frequency selection instruction (HSEL).
  • a plurality of mask adjustment instructions are defined in advance by combining a mode instruction (MODE), a low-frequency selection instruction (LSEL), and a high-frequency selection instruction (HSEL), and the user can Alternatively, a mask adjustment instruction may be selected.
  • the decomposition level increasing unit 1256 includes a wavelet converting unit 1257 and a mask developing unit 1258.
  • the wavelet transform unit 1257 acquires the first wavelet coefficient data A21 and the synthesis control data C50, and becomes the first decomposition level designated by the synthesis control data C50 with respect to the first wavelet coefficient data A21. Wavelet transformation is performed until. Thereby, the first wavelet coefficient data A61 of the first decomposition level is generated.
  • the wavelet conversion unit 1257 and a wavelet conversion unit 1260 described later may be realized by the same circuit or may be realized by separate circuits.
  • the mask development unit 1258 acquires the mask data B21 and the synthesis control data C50, and performs mask development processing. Specifically, the mask data B21 is generated by the decomposition level conversion unit 1250 (that is, each of the first wavelet coefficient data A61 included in the first wavelet coefficient data A61 having the first decomposition level specified by the synthesis control data C50). Convert for band component. Thereby, mask data B61 of the first decomposition level is generated.
  • the mask developing unit 1258 operates in the same manner as the mask developing unit 1052 of the supply system 11 (see FIGS. 7 and 13 to 15). For this reason, redundant description is omitted here.
  • the decomposition level decrease unit 1251 or the decomposition level increase unit 1256 may be omitted.
  • the decomposition level conversion unit 1250 has the first decomposition level designated by the synthesis control data C50 as the initial decomposition level of the first wavelet coefficient data A21 and the mask data B21.
  • Specialized in use conditions that are: On the contrary, when only the decomposition level increasing unit 1256 is provided, the decomposition level converting unit 1250 is specialized in a use condition that the first decomposition level is equal to or higher than the initial decomposition level.
  • the wavelet conversion unit 1260 obtains the second target image data D50, which is the data of the second target image, and the synthesis control data C50.
  • the second target image is an image that is combined with the ROI of the first target image, and provides a background image for image combination.
  • the second basic image data D10 that is the data of the second basic image serving as the source of the second target image is input to the synthesis system 21.
  • the entire second basic image constitutes the second target image that is, a case where the second basic image and the second target image are the same will be described.
  • the second basic image data D10 is supplied from, for example, the image input unit 44 provided on the synthesis system 21 side or another system of the image processing system 20 (see FIG. 1).
  • the second basic image and the second target image may be images captured by a digital camera or the like, or may be computer graphics.
  • the wavelet conversion unit 1260 performs wavelet conversion on the second target image data D50 up to a predetermined decomposition level (referred to as a second decomposition level), thereby generating second wavelet coefficient data D61. Generate.
  • the wavelet conversion unit 1260 operates according to the same specifications as the wavelet conversion unit 1030 (see FIG. 3) of the supply system 11. In the first embodiment, it is assumed that the decomposition level (second decomposition level) of the second wavelet coefficient data D61 is equal to the first decomposition level specified by the combination control data C50.
  • the wavelet conversion unit 1260 of the synthesis system 21 when the wavelet conversion unit 1260 of the synthesis system 21 is distinguished from the wavelet conversion unit 1030 of the supply system 11, the wavelet conversion unit 1030 of the supply system 11 is referred to as the first wavelet conversion unit 1030 and is combined.
  • the wavelet conversion unit 1260 of the system 21 may be referred to as the second wavelet conversion unit 1260. Not only in this example, but by adding the first, second,..., Similar names can be more clearly distinguished.
  • the synthesis execution unit 1270 obtains the first wavelet coefficient data A61 and the mask data B61 of the first decomposition level from the decomposition level conversion unit 1250, and the second decomposition level (here, the first decomposition level (here, the first decomposition level) 2nd wavelet coefficient data D61 (equal to the decomposition level) is acquired. Then, the composition execution unit 1270 performs image composition of the ROI in the first target image and the second target image based on the data A61, B61, and D61 (composition execution processing).
  • the synthesis execution unit 1270 determines the ROI coefficient and the non-ROI coefficient for the first wavelet coefficient data A61 at the first decomposition level based on the mask data B61 at the first decomposition level (coefficient Discrimination process). Then, based on the determination result, the synthesis execution unit 1270 synthesizes the ROI coefficient in the first wavelet coefficient data A61 and the coefficient in the second wavelet coefficient data D61 (coefficient synthesis process). Thereby, the synthesis execution unit 1270 generates synthesized coefficient data E61.
  • the non-ROI coefficient is set as the second wavelet.
  • the coefficient data D61 is replaced with data existing at the same position on the wavelet plane. According to this, the first wavelet coefficient data A61 is converted into the combined coefficient data E61.
  • FIG. 23 shows a flowchart for explaining the coefficient synthesis process. 23, first, one wavelet coefficient to be inspected is selected from the first wavelet coefficient data A61 (step S301). Then, it is determined whether the inspection object coefficient is an ROI coefficient or a non-ROI coefficient (step S302). That is, in step S302, coefficient determination processing is performed.
  • step S303 When the inspection target coefficient is a non-ROI coefficient, the inspection target coefficient is replaced with the corresponding wavelet coefficient in the second wavelet coefficient data D61 (step S303). On the other hand, when the inspection target coefficient is an ROI coefficient, step S303 is not performed. Steps S301 to S303 are repeated until all the wavelet coefficients in the first wavelet coefficient data A61 are inspected (step S304).
  • FIG. 24 shows another flowchart for explaining the coefficient synthesis process.
  • step S303B is provided instead of step S303. That is, when it is determined in the coefficient determination processing step S302 that the inspection target coefficient is an ROI coefficient, the ROI coefficient in the first wavelet coefficient data A61 is associated with the corresponding one in the second wavelet coefficient data D61 in step S303B. Embed in position. According to this, the second wavelet coefficient data D61 is converted into the combined coefficient data E61.
  • composition of the ROI coefficient in the first wavelet coefficient data A61 and the wavelet coefficient in the second wavelet coefficient data D61 includes two specific methods (first coefficient synthesis process and second coefficient). (Referred to as synthesis processing).
  • First coefficient synthesis process (see S300 in FIG. 23): The non-ROI coefficient in the first wavelet coefficient data A61 is replaced with the corresponding wavelet coefficient in the second wavelet coefficient data D61.
  • Second coefficient synthesis process (see S300B in FIG. 24): The ROI coefficient in the first wavelet coefficient data A61 is embedded in the corresponding position in the second wavelet coefficient data D61.
  • the inverse wavelet transform unit 1280 performs inverse wavelet transform on the combined coefficient data E61 generated by the composition execution unit 1270 until the decomposition level becomes zero. Thereby, synthesized image data E80 is generated from the synthesized coefficient data E61.
  • the post-processing unit 1290 acquires the composite image data E80 from the inverse wavelet transform unit 1280, and performs predetermined post-processing on the composite image data E80.
  • the predetermined post-process corresponds to a process opposite to the predetermined pre-process performed in the pre-processing unit 1020 of the supply system 11 in FIG.
  • the post-processing unit 1290 includes a tiling unit 1291, a color space conversion unit 1292, and a DC level shift unit 1293.
  • the tiling unit 1291 performs the reverse process of the tiling unit 1023 of the supply system 11 of FIG. Specifically, the tiling unit 1291 synthesizes the tile-unit composite image data E80 output from the inverse wavelet transform unit 1280 to generate image data for one frame. If the composite image data E80 is not supplied in units of tiles, in other words, if wavelet conversion has not been performed in units of tiles in the supply system 11, processing by the tiling unit 1291 is omitted. Alternatively, the tiling part 1291 itself may be omitted.
  • the color space conversion unit 1292 performs the reverse process of the color space conversion unit 1022 of the supply system 11 in FIG.
  • the image data output from the tiling unit 1291 is converted into RGB components.
  • the DC level shift unit 1293 converts the DC level of the image data output from the color space conversion unit 1292 as necessary.
  • the composite image data E100 output from the DC level shift unit 1293 is output image data of the composite system 21.
  • FIG. 25 and 26 are flowcharts for explaining the operation of the synthesis system 21.
  • FIG. 25 and FIG. 26 are connected by a connector C1.
  • the bitstream analysis unit 1210 acquires the encoded bitstream Abs (step S2101), and the encoded bitstream Encoded data A50 and synthesis control data C50 are extracted from Abs (step S2102).
  • the encoded data A50 is decoded by the decoding unit 1220, and the quantized wavelet coefficient data A22 is generated (step S2103).
  • the quantized wavelet coefficient data A22 is input to the inverse quantization unit 1240 and the mask reproduction unit 1230 (see FIG. 17).
  • the inverse quantization unit 1240 performs inverse quantization on the quantized wavelet coefficient data A22 to generate first wavelet coefficient data A21 (step S2104).
  • the mask reproduction unit 1230 reproduces the mask data B21 applied when the quantized wavelet coefficient data A22 is generated in the supply system 11 based on the quantized wavelet coefficient data A22 (step S2105). ).
  • steps S2104 and S2105 are executed in parallel, but step S2104 can also be executed before or after step S2105.
  • the decomposition level conversion unit 1250 converts the decomposition levels of the first wavelet coefficient data A21 and the mask data B21 to the first decomposition level designated by the synthesis control data C50 (step S2106).
  • first wavelet coefficient data A61 and mask data B21 of the first decomposition level are generated.
  • the wavelet transform unit 1260 acquires the second basic image data D10 (step S2201), and the second basic image data D10 is second with respect to the second basic image data D10. Wavelet transformation is performed up to the decomposition level (step S2202). As a result, second wavelet coefficient data D61 is generated.
  • the second decomposition level is equal to the first decomposition level specified by the synthesis control data C50. For this reason, step S2202 of wavelet conversion is executed after step S2102 in which the synthesis control data C50 is acquired.
  • the second basic image data D10 is handled as the second target image data D50 used for image synthesis.
  • the synthesis execution unit 1270 synthesizes the first wavelet coefficient data A61 and the second wavelet coefficient data D61 to generate synthesized coefficient data E61 (step S2301). Then, the inverse wavelet transform unit 1280 performs inverse wavelet transform on the combined coefficient data E61 up to the decomposition level 0 (step S2302). Thereby, the composite image data E80 is generated.
  • the post-processing unit 1290 performs predetermined post-processing on the composite image data E80 (step S2303), and the composite image data E100 after step S2303 is output from the composite system 21 (step S2304).
  • the synthesis of the ROI in the first target image and the second target image is performed using the first wavelet coefficient data A61 and the second wavelet coefficient data D61. Also, the ROI in the first target image is determined by determining the ROI coefficient for the first wavelet coefficient data A61. Such coefficient discrimination is performed based on the development mask data B61 for the first wavelet coefficient data A61.
  • the synthesis condition (ROI repair, ROI expansion, etc.) can be adjusted.
  • the quantization unit 1040 of the supply system 11 quantizes the first wavelet coefficient data A21 so that the non-ROI coefficient after quantization becomes zero. Therefore, it is not necessary to output the mask data B61 itself from the supply system 11. For this reason, when the supply system 11 and the synthesizing system 21 communicate with each other by wire or wirelessly, the communication amount can be reduced, which is useful for immediate transmission. As a result, the speed of image composition, in other words, the immediacy of image composition is improved.
  • Max-shift method As a technique for reflecting the mask data in the quantized wavelet coefficients, there is a Max-shift method which is an optional function of JPEG2000. According to the Max-shift method, scale-up and scale-down of wavelet coefficients are performed in quantization and inverse quantization. On the other hand, in the quantization, the inverse quantization, and the mask reproduction according to the first embodiment, such a scaling process is not necessary.
  • the synthesis control data C50 is embedded in an area that does not affect the encoded data A50 of the first target image in the bit stream Abs for the first target image. For this reason, the backward compatibility with respect to the existing encoded stream can be ensured.
  • the mask data B21 is reflected in the quantized wavelet coefficient data A22.
  • the quantization unit 1040 of the supply system 11 quantizes the first wavelet coefficient data A21 so that the non-ROI coefficient after quantization becomes zero. According to such a method, there is a case where the value after quantization of the ROI coefficient in the first wavelet coefficient becomes zero when trying to encode efficiently. In particular, the tendency is large for the ROI coefficient having a small value.
  • FIGS. 17 and 19 are a block diagram and a flowchart for explaining the decomposition level conversion unit 1250B according to the second embodiment.
  • the decomposition level conversion unit 1250B is supplied to the mask restoration unit 1253, but not supplied to the mask development unit 1258, as can be seen from the comparison with FIG. 19 described above. Further, the synthesis control data C50 is supplied to the mask development unit 1258, but is not supplied to the mask restoration unit 1253.
  • the mask restoration unit 1253 performs mask restoration processing on the mask data B21 until the decomposition level becomes zero. Thereby, a mask of decomposition level 0, that is, an original mask is generated.
  • the original mask data is input to the mask development unit 1258, and mask development processing is performed on the original mask data up to the first decomposition level specified by the synthesis control data C50 (see steps S201 and S202 in FIG. 28). .
  • the process flow S240 is executed regardless of the magnitude relationship between the first decomposition level specified by the synthesis control data C50 and the initial decomposition level of the first wavelet coefficient data A21. In order to solve the above problem, it is preferable that the processing flow S240 is executed even when the first decomposition level is equal to the initial decomposition level.
  • the inverse wavelet transform unit 1252 and the wavelet transform unit 1257 depend on the magnitude relationship between the first decomposition level specified by the synthesis control data C50 and the initial decomposition level of the first wavelet coefficient data A21. The operation is the same as in the first embodiment. Then, output data of one of the inverse wavelet conversion unit 1252 and the wavelet conversion unit 1257 is supplied to the synthesis execution unit 1270 as the first wavelet coefficient data A61.
  • FIGS. 29 and 30 show configuration examples of the supply system 11C and the synthesis system 21C according to the third embodiment.
  • the supply system 11C and the composition system 21C can be applied to the image processing systems 1, 10, 20 and the like instead of the supply system 11 and the composition system 21 according to the first embodiment.
  • the supply system 11C and the synthesis system 21C basically have the same configuration as the supply system 11 and the synthesis system 21 (see FIGS. 3 and 17) according to the first embodiment. is doing. However, the supply system 11C outputs the synthesis control data C50 input by the user without being embedded in the encoded bitstream Abs. Therefore, the bit stream generation unit 1070 of the supply system 11C does not embed the synthesis control data C50, and the bit stream analysis unit 1210 of the synthesis system 21C does not extract the synthesis control data C50.
  • FIG. 31 shows a flowchart for explaining the operation of the supply system 11C.
  • step S1005 is deleted from the operation flow S1000 (see FIG. 16) according to the first embodiment.
  • step S1006C which is provided instead of step S1006, the encoded bit dream Abs and the synthesis control data C50 are output.
  • FIG. 32 shows a flowchart for explaining the operation of the synthesis system 21C.
  • step S2102 is deleted from the operation flow S2000 (see FIG. 25) according to the first embodiment.
  • step S2101C provided instead of step S2101
  • the encoded bit dream Abs and the synthesis control data C50 are acquired.
  • the encoded bitstream Abs and the synthesis control data C50 may be acquired in different steps, in other words, at different timings.
  • the encoded bit stream Abs that is, the encoded data A50
  • the synthesis control data C50 are supplied to the synthesis system 21C by the same medium 50 (for example, a communication medium or an external storage medium).
  • a different medium 50 may be used.
  • a communication medium may be used to supply the encoded data A50
  • an external storage medium may be used to supply the synthesis control data C50.
  • the same effect as in the first embodiment can be obtained.
  • the third embodiment can be combined with the second embodiment, whereby the same effect as the second embodiment can be obtained.
  • ⁇ Embodiment 4> 33 and 34 show configuration examples of the supply system 11D and the synthesis system 21D according to the fourth embodiment.
  • Supply system 11D and composition system 21D can be applied to image processing systems 1, 10, 20 and the like instead of supply system 11 and composition system 21 according to the first embodiment.
  • the supply system 11D and the synthesis system 21D basically have the same configuration as the supply system 11 and the synthesis system 21 (see FIGS. 3 and 17) according to the first embodiment. is doing.
  • the synthesis control data C50 is supplied to the synthesis system 21D when the user inputs the operation unit 42 (see FIG. 2) provided on the synthesis system 21D side.
  • the supply system 11D does not accept the input of the synthesis control data C50 and output it outside the system.
  • the encoded bit stream Abs (that is, the encoded data A50) is supplied to the synthesis system 21D by the medium 50 (for example, a communication medium or an external storage medium) as in the third embodiment.
  • the synthesizing system 21D acquires the synthesizing control data C50 by a medium different from the medium that supplies the encoded data A50.
  • the same effect as in the first embodiment can be obtained.
  • the synthesis control data C50 can be input on the synthesis system 21D side
  • the synthesis condition can be adjusted on the synthesis system 21D side.
  • the fourth embodiment can be combined with the second embodiment, whereby the same effect as the second embodiment can be obtained.
  • FIG. 35 shows a configuration example of the synthesis system 21E according to the fifth embodiment.
  • the synthesizing system 21E can be applied to the image processing systems 1, 20 and the like instead of the synthesizing system 21 according to the first embodiment.
  • the synthesis system 21E is combined with the supply system 11 (see FIG. 3) according to the first embodiment.
  • the synthesis system 21E has a configuration in which a selector 1300 is added to the synthesis system 21 according to the first embodiment.
  • the selector 1300 selectively supplies one of the plurality of synthesis control data to the decomposition level conversion unit 1250 and the wavelet conversion unit 1260.
  • two synthesis control data C41 and C42 are input to the selector 1300, and one of the synthesis control data is output as synthesis control data C50.
  • combination control data C41 is supplied to the selector 1300 when the user of the synthetic
  • the second synthesis control data C42 is supplied from the supply system 11 to the selector 1300 by the medium 50. More specifically, the second synthesis control data C42 is embedded in the encoded bit stream Abs in the supply system 11, and the encoded bit stream Abs is supplied to the bit stream analyzing unit 1210 by the medium 50. The second synthesis control data C42 is extracted by the bitstream analysis unit 1210 and input to the selector 1300. That is, the second synthesis control data C42 is supplied by a medium different from the first synthesis control data C41.
  • the selector 1300 is set to preferentially select and output the first synthesis control data C41. According to this, as in the fourth embodiment, the composition level can be adjusted on the synthesis system 21E side. On the other hand, when the first synthesis control data C41 is not input, the second synthesis control data C42 is output, so that the labor on the synthesis system 21E side can be saved.
  • the selection priority of a plurality of composition control data may be fixed or may be changeable. For example, it is assumed that the selection priority is changed by one or both of the operation unit 42 provided on the synthesis system 21E side and the operation unit 32 provided on the supply system 11 side.
  • the same effect as in the first embodiment can be obtained.
  • the fifth embodiment can be combined with the second embodiment and the like, and thereby, the same effect as the second embodiment can be obtained.
  • FIG. 35 it is possible to realize a form in which a first decomposition level instruction is input to the supply system 11 and a mask adjustment instruction is input to the synthesis system 21D, and vice versa.
  • the size of the encoded data A50 for the first target image can be reduced, and thus the size of the encoded bitstream can be reduced. For this reason, when the encoded bit stream is transmitted by wired or wireless communication, the reduction of the encoded data A50 can reduce the amount of communication and is useful for immediate transmission. Further, as the first target image becomes smaller, the second target image becomes smaller, so that the calculation load in the synthesis system can be reduced. This is useful for speeding up image synthesis. In view of these, the immediacy of image synthesis is improved.
  • the size of the encoded data output from the supply system can be reduced. Therefore, basically, an arbitrary range including the ROI in the first basic image can be set as the first target image. In order to greatly reduce the data size, the first target image is preferably as small as possible.
  • the ROI range is not distorted also in the wavelet coefficient data (in other words, on the wavelet plane). It is necessary to determine the cutting range.
  • FIG. 36 shows a rectangular minimum range 81 including the ROI 60a by taking the first basic image 60 of FIG. 8 as an example. Since the minimum range 81 is set to a rectangle, the position and range of the minimum range 81 can be specified by the upper left coordinates (AX1, AY1) and the lower right coordinates (BX1, BY1) of the minimum range 81.
  • the upper left corner of the first basic image 60 is taken as the origin O (0, 0) of the coordinate system, and two axes orthogonal to the horizontal direction and the vertical direction of the first basic image 60 are taken.
  • FIG. 37 shows a range 83 to be cut out as the first target image.
  • the cut-out range 83 includes the minimum range 81 and is larger than the minimum range 81.
  • the upper left corner coordinates are (AX3, AY3), and the lower right corner coordinates are (BX3, BY3).
  • 38 and 39 are diagrams showing the minimum range 81 and the cutout range 83 on the basic mask 70 corresponding to the first basic image.
  • FIG. 40 shows a flowchart of the process for determining the cutout range 83.
  • the minimum range specifying process is performed in step S501
  • the tracking process is performed in step S502
  • the necessary range specifying process is performed in step S503.
  • a rectangular minimum range 81 including the ROI 60a is specified in the first basic image 60 that is the original image before cutting.
  • the minimum range 81 is specified based on an original mask for the first basic image 60, that is, the basic mask 70.
  • each row of the basic mask 70 is selected in order from the top, and it is determined whether or not the selected row has pixels belonging to the ROI corresponding portion 70a.
  • the position of the row that is first determined to have pixels belonging to the ROI corresponding portion 70a corresponds to AY1.
  • BY1 can be obtained by selecting each row of the basic mask 70 sequentially from the bottom.
  • AX1 can be obtained by selecting each column of the basic mask 70 in order from the left, and BX1 can be obtained by selecting each column of the basic mask 70 in order from the right.
  • ⁇ Tracking process> In order to prevent the ROI range from being distorted on the wavelet plane, it is necessary to be able to perform wavelet transformation on the entire area of the minimum range 81. In the wavelet transform, not only the data of the pixel of interest but also the data of the pixels on both sides thereof are used. For this reason, when performing wavelet transform on pixels near the outer edge of the minimum range 81, data of pixels outside the minimum range 81 is required. For this reason, the cutout range 83 is larger than the minimum range 81.
  • Patent Document 8 can be referred to for obtaining a pixel range necessary outside the minimum range 81.
  • the range of pixels required outside the minimum range 81 depends on the number of taps of the wavelet transform division filter.
  • the range of pixels required outside the minimum range 81 also depends on the decomposition level of the wavelet transform. This is because, for the highest band component (that is, the most decomposed band component) in the wavelet plane, the processing by the division filter is repeated for the number of decomposition levels.
  • step S502 of the tracking process the range corresponding to the minimum range 81 is specified as the minimum tracking range in the highest band component of the final wavelet plane.
  • the wavelet conversion is performed in the wavelet conversion unit 1030 (see FIG. 3 and the like) of the supply system. Further, when the first decomposition level specified by the combination control data C50 is larger than the initial decomposition level on the supply system side, the decomposition level conversion unit 1250 of the combining system (see FIGS. 17 and 27). Wavelet transformation is also performed at. In view of this point, the range of the ROI is distorted by assuming the wavelet plane having the higher decomposition level among the initial decomposition level and the first decomposition level as the final wavelet plane. Can be avoided more reliably. It should be noted that the higher one of the initial decomposition level and the first decomposition level is referred to as the highest decomposition level.
  • FIG. 45 shows a diagram for explaining the minimum tracking range.
  • the highest band components LL3, HL3, LH3, and HH3 in the wavelet plane 63 at the decomposition level 3 are shown enlarged.
  • FIG. 45 shows a case where the minimum tracking range 82 corresponding to the minimum range 81 is specified in the lowest band component LL3 among the highest band components LL3, HL3, LH3, and HH3.
  • the origin O (0, 0) of the wavelet plane corresponds to the origin O of the original image (that is, the first basic image 60).
  • the upper left corner coordinates are (AX2, AY2)
  • the lower right corner coordinates are (BX2, BY2).
  • 46 and 47 show flowcharts for obtaining the minimum tracking range 82 when a 5 ⁇ 3 filter is used for wavelet transformation. 46 shows how to obtain the upper left corner coordinates (AX2, AY2), and FIG. 47 shows how to obtain the lower right coordinates (BX2, BY2).
  • the upper left corner coordinates (AX1, AY1) of the minimum range 81 are set in the parameter q in step S511.
  • q AX1 is set first.
  • step S515 if it is determined in step S515 that the current decomposition level has reached the maximum decomposition level, the value of p at that time is set to AX2 of the minimum tracking range 82 in step S518.
  • the tracking process when a 5 ⁇ 3 filter is used for wavelet conversion can be expressed as follows.
  • AX1 is an even number
  • AX1 / 2 is set to a new AX1
  • ⁇ AX1-1 ⁇ / 2 is set to a new AX1 (referred to as a first recursive process).
  • the designated number of times designated by the value of the highest decomposition level is performed, and finally obtained AX1 is set to AX2.
  • AY1 is an even number
  • AY1 / 2 is set to a new AY1
  • ⁇ AY1-1 ⁇ / 2 is set to a new AY1 (hereinafter referred to as a second recursion process). The specified number of times is performed, and finally obtained AY1 is set to AY2.
  • BX1 is an even number
  • BX1 / 2 is set to a new BX1
  • a process of setting ⁇ BX1 + 1 ⁇ / 2 to a new BX1 (referred to as a third recursion process) is performed for the specified number of times.
  • BX1 finally obtained is set to BX2.
  • BY1 is an even number
  • BY1 / 2 is set to a new BY1.
  • ⁇ BY1 + 1 ⁇ / 2 is set to a new BY1 (referred to as a fourth recursion process).
  • the BY1 finally obtained is set to BY2.
  • 48 and 49 are flowcharts for obtaining the minimum tracking range 82 when the Daubechies 9 ⁇ 7 filter is used for wavelet transformation.
  • 48 shows how to obtain the upper left corner coordinates (AX2, AY2)
  • FIG. 49 shows how to obtain the lower right corner coordinates (BX2, BY2).
  • the tracking process when the Daubechies 9 ⁇ 7 filter is used for wavelet conversion can also be expressed as follows.
  • AX1 is an even number
  • ⁇ AX1 / 2-1 ⁇ is set to a new AX1
  • ⁇ AX1-3 ⁇ / 2 is set to a new AX1 (referred to as a ninth recursion process). ) Is performed the designated number of times designated by the value of the highest resolution level, and the finally obtained AX1 is set to AX2.
  • AY1 is an even number
  • ⁇ AY1 / 2-1 ⁇ is set to a new AY1
  • ⁇ AY1-3 ⁇ / 2 is set to a new AY1 (referred to as a tenth recursive process). ) Is performed the number of times specified above, and finally obtained AY1 is set to AY2.
  • BX1 is an even number
  • ⁇ BX1 + 2 ⁇ / 2 is set to a new BX1
  • ⁇ BX1 + 3 ⁇ / 2 is set to a new BX1 (referred to as the eleventh recursive process). The designated number of times is performed, and finally obtained BX1 is set to BX2.
  • BY1 is an even number
  • ⁇ BY1 + 2 ⁇ / 2 is set to a new BY1
  • ⁇ BY1 + 3 ⁇ / 2 is set to a new BY1 (referred to as the 12th recursion process). This is performed the specified number of times, and finally obtained BY1 is set to BY2.
  • steps S513, S514, S523, S524, S533, S534, S543, and S544 are defined according to the number of taps of the filter. Also, in consideration of ease of calculation, carry to even number units is performed.
  • step S503 of the necessary range specifying process it is specified in which range of the first basic image 60 before cutting the data necessary for calculating the wavelet coefficient within the minimum tracking range 82 is specified. To do.
  • the specified necessary range becomes the cutout range 83.
  • FIG. 50 shows a flowchart for obtaining the cut-out range 83 from the minimum tracking range 82 when a 5 ⁇ 3 filter is used for wavelet conversion.
  • step S551 AX2, AY2, BX2, and BY2 of the minimum tracking range 82 are set in the parameter r in step S551.
  • r AX2 is set first.
  • step S555 determines whether the current decomposition level has reached 0 or not. If it is determined in step S555 that the current decomposition level has reached 0, the value of s at that time is set to AX3 of the cut-out range 83 in step S558.
  • the necessary range specifying process when a 5 ⁇ 3 filter is used for wavelet conversion can be expressed as follows.
  • the process of setting ⁇ AX2 ⁇ 2-2 ⁇ to a new AX2 (referred to as the fifth recursion process) is performed a specified number of times specified by the value of the highest decomposition level, and the finally obtained AX2 is Set to AX3.
  • the process of setting ⁇ BX2 ⁇ 2 + 2 ⁇ to a new BX2 (referred to as the seventh recursion process) is performed for the specified number of times, and the finally obtained BX2 is set to BX3.
  • the process of setting ⁇ BY2 ⁇ 2 + 2 ⁇ to a new BY2 (referred to as the 8th recursion process) is performed the specified number of times, and finally obtained BY2 is set to BY3.
  • FIG. 51 shows a flowchart for obtaining the cut-out range 83 from the minimum tracking range 82 when a Daubechies 9 ⁇ 7 filter is used for wavelet conversion.
  • the necessary range specifying process when the Daubechies 9 ⁇ 7 filter is used for wavelet conversion can be expressed as follows.
  • the process of setting ⁇ AX2 ⁇ 2-4 ⁇ to a new AX2 (referred to as the thirteenth recursion process) is performed the designated number of times specified by the value of the highest decomposition level, and the finally obtained AX2 is Set to AX3.
  • the process of setting ⁇ BX2 ⁇ 2 + 4 ⁇ to a new BX2 (referred to as the fifteenth recursion process) is performed for the specified number of times, and the finally obtained BX2 is set to BX3.
  • the process of setting ⁇ BY2 ⁇ 2 + 4 ⁇ to a new BY2 (referred to as the 16th recursion process) is performed the specified number of times, and finally obtained BY2 is set to BY3.
  • FIG. 52 shows a configuration example of a supply system 11F according to the sixth embodiment.
  • the supply system 11F can be applied to the image processing systems 1, 10 and the like instead of the supply system 11 according to the first embodiment.
  • a mask generation unit 1050F is provided instead of the mask generation unit 1050, and a first image cropping unit 1080 is added.
  • Other configurations of the supply system 11F are the same as those of the supply system 11 according to the first embodiment.
  • FIG. 53 shows a configuration example of the mask generation unit 1050F.
  • the mask generation unit 1050F includes the basic mask generation unit 1051 and the mask development unit 1052, the cut range determination unit 1053, and the mask cut unit 1054 described above.
  • the cut range determination unit 1053 determines the cut range 83. Specifically, the cut range determining unit 1053 performs the cut range determining process S500 (see FIG. 40), the basic mask data B10, the first decomposition level designated by the synthesis control data C50, and the wavelet transform unit 1030. Based on the initial decomposition level (given by the initial setting data H50). Then, the cut range determination unit 1053 generates cut range specifying data F50, which is data for specifying the cut range 83.
  • the cut area specifying data F50 is specifically data of the upper left corner coordinates (AX3, AY3) and the lower right corner coordinates (BX3, BY3) of the cut area 83.
  • the mask cut-out unit 1054 Based on the cut-out range specifying data F50, the mask cut-out unit 1054 converts the data in the cut-out range 83 (see FIG. 39) from the basic mask data B10 to the expansion mask data B21 (in other words, the expansion mask). (As original mask data B20).
  • the mask that has been cut out is developed by the mask development unit 1052 to the initial decomposition level specified by the initial setting data H50. That is, expanded mask data B21 is generated from original mask data B20.
  • the mask data B21 generated by the mask generation unit 1050F is supplied to the quantization unit 1040 as in the first embodiment.
  • the cut range specifying data F50 is supplied to the bit stream generation unit 1070 and embedded in the encoded bit stream Abs together with the synthesis control data C50. Further, the cropping range specifying data F50 is supplied to the first image cropping unit 1080.
  • the first image cutout unit 1080 cuts out the data in the cutout area 83 from the first basic image data A10 based on the cutout area specifying data F50 (see FIG. 37).
  • the cut data is supplied to the preprocessing unit 1020 as the first target image data A20.
  • FIG. 54 shows a configuration example of the synthesis system 21F according to the sixth embodiment.
  • the synthesizing system 21F can be applied to the image processing systems 1 and 20 instead of the synthesizing system 21 according to the first embodiment.
  • a second image cutout unit 1310 and an embedding unit 1320 are added.
  • the other configuration of the synthesis system 21F is the same as that of the synthesis system 21 according to the first embodiment.
  • the second image cutout unit 1310 acquires the second basic image data D10, the cutout range specifying data F50, and the composite position designation data G50.
  • the cut range specifying data F50 is extracted from the encoded bit stream Abs by the bit stream analysis unit 1210 and supplied to the second image cut unit 1310.
  • the synthesis position designation data G50 is data for designating a position where the ROI in the first target image is synthesized in the second basic image.
  • the composite position designation data G50 can be understood as, for example, embedded position data of the composite image data E80 as described later. More specifically, the embedding position of the composite image data E80 can be specified by the position of the upper left end of the embedding range of the composite image data E80, the center position of the embedding range, or the like.
  • the composition position designation data G50 is supplied to the second image cropping unit 1310 when the user of the composition system 21F inputs the operation unit 42 (see FIG. 2) provided on the composition system 21F side.
  • the second image cutout unit 1310 sets a synthesis destination range in the second basic image based on the synthesis position designation data G50.
  • the synthesis destination range is a range having the same shape and size as the first target image, and is therefore congruent with the first target image.
  • the composition destination range may be expressed as a similar shape range having a similarity ratio of 1 to the first target image.
  • the synthesis destination range is specified by the cut range specifying data F50.
  • the same shape and size of the first target image may be specified from the encoded data A50 instead of the cut-out range specifying data F50.
  • the second image cutout unit 1310 cuts out data within the synthesis destination range from the second basic image data D10. The cut data is supplied to the wavelet conversion unit 1260 as the second target image data D50.
  • the embedding unit 1320 embeds the synthesized image data E80 generated by the inverse wavelet transform unit 1280 and processed by the post-processing unit 1290 in the synthesis destination range in the second basic image data D10.
  • the second basic image data D10 into which the composite image data E80 is inserted is output as composite image data E100 that is output data of the composite system 21F.
  • ⁇ Operation> 55 and 56 are flowcharts for explaining the operation of the supply system 11F. 55 and 56 are connected by a connector C2.
  • the operation flow S1000F of FIGS. 55 and 56 is basically the same as the operation flow S1000 (see FIG. 16) according to the first embodiment, except for the following points.
  • a mask generation step S1200F is provided instead of the mask generation step S1200.
  • a first basic image cutting step S1103 is added.
  • a data embedding step S1005F is provided instead of the data embedding step S1005.
  • the basic mask generation unit 1051 generates the basic mask data B10.
  • the cut range determination unit 1053 determines the cut range 83.
  • the mask cutting unit 1054 generates original mask data B20 for a development mask from the basic mask data B10.
  • the mask development unit 1052 performs mask development processing on the original mask data B20 to generate development mask data B21.
  • the first image cutting unit 1080 cuts the first target image data A20 from the first basic image data A10 based on the cutting range specifying data F50 generated in step S1203. For this reason, step S1103 is executed after step S1203. After step S1103, preprocessing step S1101 is executed.
  • the bit stream generation unit 1070 embeds the synthesis control data C50 and the cut range specifying data F50 in the encoded bit stream Abs.
  • FIGS. 57 and 58 are flowcharts for explaining the operation of the synthesis system 21F. 57 and 58 are connected by a connector C3.
  • the operation flow S2000F of FIGS. 57 and 58 is basically the same as the operation flow S2000 (see FIGS. 25 and 26) according to the first embodiment, except for the following points.
  • a data extraction step S2102F is provided instead of the data extraction step S2102 (see FIG. 25).
  • a second basic image cutting step S2203 and an image embedding step S2305 are added.
  • the bit stream analysis unit 1210 extracts the encoded data A50, the synthesis control data C50, and the cut range specifying data F50 from the encoded bitstream Abs.
  • step S2203 the second image cutting unit 1310 cuts the second target image data D50 from the second basic image data D10 based on the cutting range specifying data F50 extracted in step S2102F. For this reason, step S2203 is executed after step S2102F. After step S2203, a wavelet conversion step S2203 is executed.
  • the image embedding step S2305 is executed after the post-processing step S2303.
  • the embedding unit 1320 embeds post-processed composite image data E80 in the composite destination range in the second basic image data D10.
  • output step S2304 is executed.
  • the supply system 11F cuts and outputs the first target image from the first basic image. For this reason, the size of the encoded data A50 can be reduced, and therefore the size of the encoded bitstream Abs can be reduced. Therefore, when the encoded bit stream Abs is transmitted by wired or wireless communication, the amount of communication can be reduced, which is useful for immediate transmission. Moreover, since the size of the first target image and the second target image is reduced, the calculation load in the synthesis system 21F can be reduced. This is useful for speeding up image synthesis. In view of these, the immediacy of image synthesis is improved.
  • the highest band component to be tracked Is the lowest band component LL3 in the wavelet plane at the highest resolution level.
  • the wavelet transform adopts a method of recursively decomposing the highest band component of the wavelet plane, the highest band component in the wavelet plane at the highest decomposition level is subject to tracking processing. become.
  • the high-frequency component that is, the high-pass filter side
  • the output on the left side (equivalent to the upper side) of the high frequency component is p
  • q 2n + 1
  • p n ⁇ 1
  • Solving this results in p (q ⁇ 3) / 2 (Formula 6).
  • the high-frequency component that is, the high-pass filter side
  • the output on the left side (equivalent to the upper side) of the high frequency component is p
  • q 2n
  • p n ⁇ 1
  • n p.
  • r p (Formula 13)
  • s 2p-2 (Formula 14)
  • Solving this results in s 2r-2 (Equation 15). This is an equation according to step S553.
  • the high-frequency component that is, the high-pass filter side
  • the output on the left side (equivalent to the upper side) of the high frequency component is p
  • q 2n + 1
  • p n ⁇ 2
  • Solving this results in p (q-5) / 2 (Equation 32).
  • the high-frequency component that is, the high-pass filter side
  • the output on the left side (equivalent to the upper side) of the high frequency component is p
  • q 2n
  • Solving this results in p q / 2-2 (Equation 38).
  • n p.
  • r p (Formula 39)
  • s 2p-4 (Formula 40)
  • Solving this results in s 2r-4 (Equation 41). This is an equation related to step S563.
  • n p.
  • r p (Formula 42)
  • s 2p-2 (Formula 43)
  • Solving this results in s 2r-2 (formula 44).
  • the second basic image is larger than the first target image and the second target image.
  • the second basic image itself may be the same size as the first target image and the second target image.
  • the second image cutout unit 1310 may be deleted.
  • the lowest band component LL1 at the decomposition level 1 can provide an image with a reduction ratio of 1/2 with respect to the original image (in other words, an image with an image size of 1/4).
  • the lowest band component LLm at the decomposition level m can provide an image having a reduction ratio of 1/2 m with respect to the original image (see FIG. 59).
  • m is an integer equal to or greater than 0 by associating an original image in a state where wavelet transformation is not performed with the decomposition level 0 as described above.
  • the image size when the original image is reduced by 1/2 m is equal to the image size provided by the lowest band component LLm when the original image is decomposed to the decomposition level m.
  • the size of a 1/2 m reduced image may be expressed as an image size corresponding to the decomposition level m. Note that this representation of image size can also be used when a reduced image is compared with another image having the same image size as the original image.
  • FIG. 60 is a block diagram illustrating an inverse wavelet transform unit 1280G according to the seventh embodiment.
  • the inverse wavelet conversion unit 1280G can be applied to Embodiments 1 to 5 instead of the inverse wavelet conversion unit 1280 (see FIG. 17 and the like) of the synthesis system 21 and the like.
  • the inverse wavelet transform unit 1280G performs inverse wavelet transform on the synthesized coefficient data E61 until the decomposition level reaches a predetermined end level.
  • the lowest band component LL is set in the composite image data E80.
  • the end level of the inverse wavelet conversion in other words, the image size of the composite image is instructed to the inverse wavelet conversion unit 1280G by the image size control data C60.
  • the image size control data C60 is input to the composition system by the user of the composition system.
  • the image size control data C60 may be supplied from the supply system in the same manner as the synthesis control data C50 (see FIGS. 3 and 29).
  • the image size control data C60 is, for example, a numerical value that directly indicates the end level of the inverse wavelet conversion.
  • the image size control data C60 may be data that can derive the end level of the inverse wavelet transform. Examples of data from which the end level of the inverse wavelet transform can be derived include a numerical value indicating the number of inverse wavelet conversions, a numerical value indicating a reduction ratio with respect to the original image size, and the like.
  • the end level of the inverse wavelet transform can be set within a range of the decomposition level 0 or more and the decomposition level of the synthesized coefficient data E61 (that is, the decomposition level specified by the synthesis control data C50).
  • the end level of inverse wavelet transformation is set to decomposition level 0
  • a composite image of the original image size can be obtained as in the first to fifth embodiments.
  • Embodiments 1 to 5 are examples in which the end level of inverse wavelet transformation is fixed to 0
  • Embodiment 7 is an example in which the end level of inverse wavelet transformation is variable.
  • the image size of the composite image can be controlled, and a composite image not only having the same size as the original image but also smaller than the original image can be obtained.
  • FIG. 61 shows a conceptual diagram of image composition according to the eighth embodiment.
  • the first basic image is used as it is as the first target image, and the first wavelet coefficient data is generated from the first target image.
  • the decomposition level of the first wavelet coefficient data is 3.
  • the entire second basic image is reduced, and the reduced image is used as the second target image.
  • the second basic image has the same size and shape as the first basic image (in other words, the second basic image is congruent with the first basic image), and the entire second basic image. Is reduced with a reduction ratio of 1/2. That is, the reduction ratio of the second target image to the second basic image and the first basic image is 1 ⁇ 2. In other words, the image size of the second target image is 1/4 with respect to the second basic image and the first basic image.
  • second wavelet coefficient data is generated from the second target image.
  • the first wavelet coefficient data and the second wavelet coefficient data are synthesized in the same manner as in the first embodiment.
  • synthesis is performed according to the range of the second target image having a small image size, in other words, according to the range of the second wavelet coefficient data.
  • a part of the first wavelet coefficient data (the part corresponding to the second wavelet coefficient data) and the whole of the second wavelet coefficient data are used for the coefficient synthesis process.
  • the part of the first wavelet coefficient data is the most decomposed band components (that is, the highest band components) LL3, HL3, LH3, HH3 in the first wavelet coefficient data.
  • the bands HL2, LH2, and HH2 are one level lower than the highest band component.
  • synthesized coefficient data having the same decomposition level as the second wavelet coefficient data (here, decomposition level 2) is generated.
  • composite image data is generated by performing inverse wavelet transform to the decomposition level 0 on the combined coefficient data.
  • a composite image having the same size and shape as the second target image in other words, a composite image having a reduction ratio of 1/2 with respect to the second basic image and the first basic image is provided.
  • the first wavelet coefficient data (in the example of FIG. 62, the highest band components LL3, HL3, LH3, and HH3 among the first wavelet coefficient data) and the second wavelet coefficient data are combined. .
  • synthesized coefficient data having the same decomposition level (here, decomposition level 1) as the second wavelet coefficient data is generated.
  • composite image data is generated by performing inverse wavelet transform to the decomposition level 0 on the combined coefficient data.
  • FIG. 63 shows an example in which the decomposition level of the first wavelet coefficient is 4, and the reduction ratio of the second target image to the second basic image is 1/2.
  • the first wavelet coefficient data data in the range from the highest band components LL4, HL4, LH4, and HH4 to the bands HL2, LH2, and HH2 that are two levels lower than the highest band component, Used for synthesis.
  • the composite image is provided with the same image size as the second target image, in other words, with a reduction ratio of 1/2 with respect to the second basic image and the first basic image.
  • the image size of the composite image can be controlled by controlling the image size of the second target image.
  • the following knowledge is obtained from the examples of FIGS.
  • the second target image has a similar shape to the first target image, and the similarity ratio of the second target image to the first target image is less than 1.
  • a similarity ratio of less than 1 may be referred to as a reduction ratio.
  • P1, P2, and P3 are natural numbers.
  • the coefficient synthesis process is performed in accordance with the range of the second wavelet coefficient data. For this reason, as the first wavelet coefficient data, band component data within a predetermined number of levels counted from the most significant band component is used, and the predetermined number of levels represents the decomposition level of the second wavelet coefficient data. Given as a number.
  • the decomposition level of the synthesized coefficient data is the same as that of the second wavelet coefficient data.
  • a composite image having the same image size as that of the second target image is obtained by performing inverse wavelet transform on the combined coefficient data up to the decomposition level 0.
  • FIG. 64 shows a configuration example of the synthesis system 21H with respect to an example in which the above knowledge is applied to the first embodiment.
  • the composition system 21H has a configuration in which an image reduction unit 1330 is added to the composition system 21 (see FIG. 17) according to the first embodiment.
  • the image reducing unit 1330 obtains the second basic image data D10 and reduces the second basic image to generate a second target image that is similar to the first target image.
  • the generated second target image data D50 is supplied to the wavelet conversion unit 1260.
  • the image reduction unit 1330 performs wavelet transform on the second basic image data D10 by resolving the lowest band component LL recursively. Repeat until level P3. Then, the image reduction unit 1330 extracts the lowest band component LL at the decomposition level P3 as the second target image data D50.
  • the image reduction unit 1330 may be configured to generate the second target image by a general image reduction process using an average filter. In that case, 1/2 reduction may be performed P3 times, or 1/2 P3 may be reduced at a time.
  • the image size of the second target image in other words, the image size of the composite image is instructed to the image reduction unit 1330 by the image size control data C70.
  • the image size control data C70 is input to the composition system 21H by the user of the composition system 21H.
  • the image size control data C70 may be supplied from the supply system in the same manner as the synthesis control data C50 (see FIGS. 3 and 29).
  • the image size control data C70 is set to a value of P3 when the similarity ratio of the second target image to the first target image is expressed as 1/2 P3 as described above.
  • the image size control data C70 may be data from which the value of P3 can be derived. Examples of data that can derive a value of P3, the value or the like of the similarity ratio (1/2 P3) and the like.
  • the image size control data C70 is also supplied to the wavelet conversion unit 1260.
  • the wavelet transform unit 1260 can acquire the first decomposition level designated for the first wavelet coefficient data A61, that is, the value of P1 from the above-described synthesis control data C50.
  • the wavelet conversion unit 1260 performs wavelet conversion on the second target image data D50 up to the decomposition level (second decomposition level) indicated by the obtained P2.
  • the image size control data C70 is also supplied to the synthesis execution unit 1270, and is used to specify a range to be used for coefficient synthesis processing in the first wavelet coefficient data A61.
  • the range of the first wavelet coefficient data A61 is determined according to the numerical value indicating the decomposition level P2 of the second wavelet coefficient data as described above.
  • the composition execution unit 1270 calculates the value of P2.
  • the synthesis execution unit 1270 may acquire the calculated value of P2 from the wavelet conversion unit 1260. In this case, the supply of the image size control data C70 to the composition execution unit 1270 can be omitted.
  • the image size control data C70 is also supplied to the inverse wavelet conversion unit 1280, and is used to set the number of inverse wavelet conversions, in other words, to know the decomposition level of the combined coefficient data E61.
  • FIG. 65 shows a flowchart for explaining the operation of the synthesis system 21H.
  • step S2204 is added to the operation flow S2000 (see FIG. 25) according to the first embodiment.
  • the image reduction unit 1330 reduces the second basic image to generate a second target image.
  • the image size of the composite image can be controlled, and a composite image having a size smaller than that of the original image can be obtained.
  • the eighth embodiment can be combined with the second embodiment and the like, whereby the same effect as the second embodiment can be obtained.
  • the second target image is generated by reducing the entire second basic image.
  • the second target image can be generated by reducing a part of the second basic image.
  • the second basic image before reduction may not be similar to the first target image.
  • the horizontal and vertical reduction ratios of the second basic image may be made different.
  • the similarity ratio of the second target image to the first target image is less than 1. That is, when the similarity ratio is expressed as 1/2 P3 , P3 is a natural number. However, when the similarity ratio is 1 (P3 is 0 at this time), that is, when the second target image is congruent with the first target image, the synthesis system 21H can be used.
  • the image reducing unit 1330 outputs the second basic image. May be supplied to the wavelet conversion unit 1260 without being reduced.
  • a composite image of the original image size can be obtained as in the first to fifth embodiments.
  • Embodiments 1 to 5 are examples specialized when the similarity ratio of the second target image to the first target image is 1.
  • a second target image having a similar shape to the first target image is generated by reducing at least a part of the second basic image (see FIGS. 61 to 63).
  • FIG. 66 an example will be described in which a part of the second basic image is cut out as a second target image having a similar shape to the first target image. That is, as long as the requirement that the second target image is similar to the first target image is satisfied, the second target image can be generated by cutting.
  • FIG. 67 shows a configuration example of the synthesis system 21I according to the ninth embodiment.
  • the composition system 21I has a configuration in which a second image cutout unit 1340 is provided instead of the image reduction unit 1330 in the composition system 21H (see FIG. 64) according to the eighth embodiment.
  • the other configuration of the synthesis system 21I is the same as that of the synthesis system 21H according to the eighth embodiment.
  • the second image cutout unit 1340 obtains the second basic image data D10, and uses the first target image in the second basic image with the similarity ratio (that is, the similarity ratio of the second target image to the first target image).
  • a similar shape range that forms a similar shape is set, and data in the similar shape range is cut out as second target image data D50 from the second basic image data D10.
  • the generated second target image data D50 is supplied to the wavelet conversion unit 1260.
  • the image size of the second target image in other words, the image size of the composite image is instructed to the second image cutout unit 1340 by the image size control data C70.
  • the image size control data C70 includes data indicating the position of the similar shape range cut out as the second target image.
  • FIG. 68 shows a flowchart for explaining the operation of the synthesis system 21I.
  • an image cutting step S2205 is provided instead of the image reduction step S2204.
  • the second image cutout unit 1340 cuts the second target image data D50 from the second basic image data D10 as described above.
  • Other steps in the operation flow S2000I are the same as those in the operation flow S2000H in FIG.
  • the image size of the composite image can be controlled, and a composite image having a size smaller than that of the original image can be obtained.
  • the eighth embodiment can be combined with the second embodiment and the like, whereby the same effect as the second embodiment can be obtained.
  • the synthesis system 21I can be used not only when the similarity ratio is less than 1 but also when it is 1 or less.
  • the second image cutout unit 1340 The image may be supplied to the wavelet conversion unit 1260 without being cut out. In this case, a composite image of the original image size can be obtained as in the first to fifth embodiments.
  • FIG. 69 shows a configuration example of a supply system 11J according to the tenth embodiment.
  • the supply system 11J can be applied to the image processing systems 1, 10 and the like instead of the supply system 11 according to the first embodiment.
  • the supply system 11J has a configuration in which a combining unit 1100 is added to the supply system 11 according to the first embodiment.
  • the synthesizing unit 1100 has a configuration in which the bit stream analyzing unit 1210 and the decoding unit 1220 are deleted from the synthesizing system 21 (see FIG. 17), and operates in the same manner as the synthesizing system 21 to generate synthesized image data E100. . Specifically, the synthesizing unit 1100 performs mask reproduction processing and inverse quantization processing based on the quantized wavelet coefficient data A22 generated by the quantization unit 1040, and generates a result of the mask reproduction processing and inverse quantization processing. Based on this, the decomposition level conversion process is performed. The synthesizing unit 1100 performs wavelet conversion processing on the second target image data.
  • the 2nd basic image data D10 used as the source of 2nd object image data is acquirable from the synthetic
  • the synthesis unit 1100 performs a synthesis execution process and an inverse wavelet conversion process based on the results of the decomposition level conversion process and the wavelet conversion process. Post-processing is performed on the data after the inverse wavelet conversion processing as necessary. Thereby, the composite image data E100 is generated.
  • the display unit 31 Based on the synthesized image data E100 generated by the synthesizing unit 1100, the display unit 31 (see FIG. 2) on the supply system 11J side performs a display operation, whereby the ROI and the second target image in the first target image are displayed. And a composite image can be displayed. For this reason, for example, before supplying the encoded bit stream Abs to the synthesis system 21 (in other words, before supplying the encoded data A22), the synthesized image can be confirmed on the supply system 11J side. In particular, it is possible to confirm the degree of composition according to the composition control data C50.
  • the supply side device 30 (see FIG. 2) can be applied alone as an image processing device having an image synthesis function.
  • a hardware configuration example of such an image processing device 30J is shown in FIG.
  • the image processing apparatus 30J includes an image processing system 90, a display unit 31, and an operation unit 32. Similar to the supply-side device 30, the image processing device 30J may include one or both of the I / F 33 and the image input unit 34.
  • the image processing system 90 includes an image composition system 91, and the image composition system 91 includes a composition unit 1100, a data preparation unit 1110, and a semiconductor memory (hereinafter also referred to as a memory) 1120.
  • the combining unit 1100, the data preparation unit 1110, and the memory 1120 are connected via a bus (which is an example of a wired communication medium).
  • the image processing system 90 can be formed as a single semiconductor integrated circuit, in other words, as a single chip.
  • the image processing system 90 may be configured only by the image composition system 91 or may further include another processing system.
  • the data preparation unit 1110 has a configuration in which the encoding unit 1060 and the bitstream generation unit 1070 are deleted from the supply system 11 (see FIG. 3), and acquires the first basic image data A10. Accordingly, the data preparation unit 1110 operates in the same manner as the supply system 11 and generates the quantized wavelet coefficient data A22 for the first target image.
  • the memory 1120 stores the first basic image data A10 and the second basic image data D10 supplied to the image composition system 91. Accordingly, the data preparation unit 1110 reads the first basic image data A10 from the memory 1120, and generates quantized wavelet coefficient data A22 based on the first basic image data A10. The synthesizing unit 1100 reads the second basic image data D10 from the memory 1120 and uses it for image synthesis.
  • the composition control data C50 is supplied to the composition unit 1100 when the user inputs it to the operation unit 32. Further, the display unit 31 displays a composite image based on the composite image data E100 generated by the composite unit 1100.
  • composition of the composition system according to the second embodiment or the like can be applied to the composition unit 1100.
  • the configuration formed by the memory 1120 and the data preparation unit 1110 can be regarded as a data supply system that supplies the quantized wavelet coefficient data A22.
  • the synthesizing unit 1100 is further regarded as an image synthesizing system
  • the configuration of FIG. 70 is such that the data supply system and the image synthesizing system are connected via a bus (an example of a wired communication medium as described above). It is possible to grasp that
  • a combination of the data supply system 11 and the synthesis system 21 can be formed by a single semiconductor integrated circuit.
  • the data supply system 11 and the synthesis system 21 are connected via a bus.
  • the data supply system 11 and the synthesizing system 21 communicate without going through the external I / Fs 33 and 43, unlike FIG. 2, but communicate through the bus corresponding to the medium 50.
  • encoding and decoding of the transfer data can be omitted. .
  • the encoding unit 1060, the bit stream generation unit 1070, the bit stream analysis unit 1210, and the decoding unit 1220 may not be used.
  • the encoding unit 1060, the bit stream generation unit 1070, the bit stream analysis unit 1210, and the decoding unit 1220 can be omitted.
  • other combinations of the data supply system 11B and the like and the synthesis system 21B and the like can be formed by a single semiconductor integrated circuit.
  • Image processing system (overall system) 10, 20, 90 Image processing system 11, 11C, 11D, 11F, 11J Data supply system 21, 21C to 21F, 21H, 21I, 91 Image composition system 32, 42 Operation unit (operation medium) 50 Medium 60 First basic image 60a ROI 60b non-ROI 61-63 Wavelet plane 70 Basic mask 71-73 Development mask 70a, 71a, 72a, 73a, 70aS ROI corresponding part 70b, 71b, 72b, 73b, 70bS Non-ROI corresponding part 81 Minimum range 82 Tracking minimum range 83 Cutout range 1030 Wavelet transform unit 1040 Quantization unit 1050, 1050F Mask generation unit 1051 Basic mask generation unit 1052 Mask expansion unit 1053 Clipping range determination unit 1054 Mask cutout unit 1060 Coding unit 1070 Bit stream generation unit 1080 First image cutout unit 1100 Synthesis unit 1110 Data preparation unit 1120 Semiconductor memory 1210 Bit stream analysis unit 1220 Decoding unit 1230 Mask reproduction unit 1240 Inverse quantization unit 1250, 12

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  • General Physics & Mathematics (AREA)
  • Compression Of Band Width Or Redundancy In Fax (AREA)
  • Compression Or Coding Systems Of Tv Signals (AREA)
  • Image Processing (AREA)
  • Processing Or Creating Images (AREA)
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