WO2016125832A1 - ポリイミド及び/又はポリアミドイミド多孔質体並びにその製造方法、分離及び/又は吸着を行う方法、分離材、吸着材、フィルターメディア、積層体、並びに、フィルターデバイス - Google Patents
ポリイミド及び/又はポリアミドイミド多孔質体並びにその製造方法、分離及び/又は吸着を行う方法、分離材、吸着材、フィルターメディア、積層体、並びに、フィルターデバイス Download PDFInfo
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- WO2016125832A1 WO2016125832A1 PCT/JP2016/053255 JP2016053255W WO2016125832A1 WO 2016125832 A1 WO2016125832 A1 WO 2016125832A1 JP 2016053255 W JP2016053255 W JP 2016053255W WO 2016125832 A1 WO2016125832 A1 WO 2016125832A1
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- WIPO (PCT)
- Prior art keywords
- polyimide
- porous body
- polyamideimide
- imide
- group
- Prior art date
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 209
- 239000004642 Polyimide Substances 0.000 title claims abstract description 149
- 239000004962 Polyamide-imide Substances 0.000 title claims abstract description 122
- 229920002312 polyamide-imide Polymers 0.000 title claims abstract description 122
- 238000000034 method Methods 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 239000000463 material Substances 0.000 title claims abstract description 27
- 238000001179 sorption measurement Methods 0.000 title claims abstract description 19
- 238000003795 desorption Methods 0.000 title abstract 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 59
- -1 diamine compound Chemical class 0.000 claims description 55
- 239000011148 porous material Substances 0.000 claims description 43
- 238000004891 communication Methods 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 10
- 238000000926 separation method Methods 0.000 claims description 10
- 238000001914 filtration Methods 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 239000003463 adsorbent Substances 0.000 claims description 4
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- 238000002955 isolation Methods 0.000 claims description 4
- 238000000746 purification Methods 0.000 claims description 3
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- 125000003277 amino group Chemical group 0.000 claims description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 55
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- 239000003960 organic solvent Substances 0.000 description 38
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 36
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- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
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- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 5
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- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
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- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
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- SMEJCQZFRMVYGC-UHFFFAOYSA-N cyclohexane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C(C(O)=O)C1C(O)=O SMEJCQZFRMVYGC-UHFFFAOYSA-N 0.000 description 1
- GEQHKFFSPGPGLN-UHFFFAOYSA-N cyclohexane-1,3-diamine Chemical compound NC1CCCC(N)C1 GEQHKFFSPGPGLN-UHFFFAOYSA-N 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical class CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- GBASTSRAHRGUAB-UHFFFAOYSA-N ethylenetetracarboxylic dianhydride Chemical compound O=C1OC(=O)C2=C1C(=O)OC2=O GBASTSRAHRGUAB-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- QPPQHRDVPBTVEV-UHFFFAOYSA-N isopropyl dihydrogen phosphate Chemical compound CC(C)OP(O)(O)=O QPPQHRDVPBTVEV-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- IIGMITQLXAGZTL-UHFFFAOYSA-N octyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCCCCCCC IIGMITQLXAGZTL-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011238 particulate composite Substances 0.000 description 1
- UMSVUULWTOXCQY-UHFFFAOYSA-N phenanthrene-1,2,7,8-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C2C3=CC=C(C(=O)O)C(C(O)=O)=C3C=CC2=C1C(O)=O UMSVUULWTOXCQY-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920000205 poly(isobutyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical class OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
- B01D71/641—Polyamide-imides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
- B01J20/26—Synthetic macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
- B01J20/26—Synthetic macromolecular compounds
- B01J20/262—Synthetic macromolecular compounds obtained otherwise than by reactions only involving carbon to carbon unsaturated bonds, e.g. obtained by polycondensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
- B01J20/28033—Membrane, sheet, cloth, pad, lamellar or mat
- B01J20/28035—Membrane, sheet, cloth, pad, lamellar or mat with more than one layer, e.g. laminates, separated sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
- B01J20/28042—Shaped bodies; Monolithic structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/305—Addition of material, later completely removed, e.g. as result of heat treatment, leaching or washing, e.g. for forming pores
- B01J20/3057—Use of a templating or imprinting material ; filling pores of a substrate or matrix followed by the removal of the substrate or matrix
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2201/00—Foams characterised by the foaming process
- C08J2201/04—Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
- C08J2201/042—Elimination of an organic solid phase
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2205/00—Foams characterised by their properties
- C08J2205/04—Foams characterised by their properties characterised by the foam pores
- C08J2205/05—Open cells, i.e. more than 50% of the pores are open
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Definitions
- the present invention relates to a polyimide and / or polyamideimide porous body and a method for producing the same, a method for performing separation and / or adsorption using the porous body, a separation material comprising the porous body, an adsorbent and a filter medium, and
- the present invention also relates to a laminate including the porous body and a filter device.
- a chemical solution such as a protective film forming chemical solution for imparting hydrophobicity to a substrate and a chemical solution such as a silicon wafer cleaning solution do not contain a contaminating metal such as iron or nickel.
- Such a chemical solution used in the semiconductor device manufacturing process is previously cleaned by a filter device or the like in order to remove contaminating metals such as iron and nickel.
- the filter device usually includes a filter medium using a porous membrane.
- the porous film can remove fine substances such as nano particles.
- filter membranes that can remove impurities from chemicals and resin materials used in applications such as semiconductor devices, nylon, polyethylene, polypropylene, PTFE, etc. are common, for example, by using a filter membrane such as nylon, It is known that organic impurities are also removed (for example, Patent Document 1).
- the membrane made of nylon has low acid resistance, it is difficult to wash with acid, and it is difficult to remove impurities mixed in or attached to the filter itself.
- membrane which consists of polyethylene had the problem that the removal rate of impurities, such as iron and nickel which should be removed from the chemical
- the porous film used for the filter media is repeatedly used in the industry, it is preferable that the film has durability such as high stress and high elongation at break.
- the present invention has been made in view of the above circumstances, and is a polyimide and / or polyamide-imide porous body excellent in the performance of removing impurities such as metals and excellent in stress, elongation at break, etc. It is an object of the present invention to provide a method for separating and / or adsorbing using a porous material, a separating material composed of the porous material, an adsorbing material and a filter medium, and a laminate and a filter device including the porous material. .
- the inventors of the present invention provide a polyimide and / or polyamideimide porous body having at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond, and stress caused by the polyimide and / or polyamideimide,
- the present inventors have found that the metal removal performance is excellent by at least the porous structure without impairing the elongation at break and the present invention has been completed.
- the first aspect of the present invention is a polyimide and / or polyamideimide porous body, wherein the polyimide and / or polyamideimide has at least one selected from the group consisting of a carboxy group, a salt-type carboxy group and an —NH— bond. It is.
- the second aspect of the present invention includes the step of forming a carboxy group or a salt-type carboxy group from a part of the imide bond in the polyimide and / or polyamideimide, and the polyimide and / or polyamideimide of the first aspect of the present invention. It is a manufacturing method of a porous body.
- the third aspect of the present invention is at least selected from the group consisting of filtration, isolation, removal, capture, purification and sieving using the polyimide and / or polyamideimide porous body of the first aspect of the present invention.
- a method of performing separation and / or adsorption that may include one.
- the fourth aspect of the present invention is a separating material comprising the polyimide and / or polyamideimide porous body according to the first aspect of the present invention.
- the fifth aspect of the present invention is an adsorbent comprising the polyimide and / or polyamideimide porous body according to the first aspect of the present invention.
- the sixth aspect of the present invention is a filter medium comprising the polyimide and / or polyamideimide porous body according to the first aspect of the present invention.
- the seventh aspect of the present invention is a laminate including another filter medium and the filter medium according to the sixth aspect of the present invention.
- the eighth aspect of the present invention is a filter device including the polyimide and / or polyamideimide porous body according to the first aspect of the present invention.
- a polyimide and / or polyamide-imide porous body excellent in metal removal performance, stress and rupture elongation, and a method for producing the same, and separation and / or adsorption are performed using the porous body. It is possible to provide a method, a separating material comprising the porous material, an adsorbing material and a filter medium, and a laminate and a filter device including the porous material.
- the polyimide and / or polyamide-imide porous body according to the first aspect of the present invention comprises at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond. Have.
- the polyimide and / or polyamide-imide porous body of the present invention contains a resin, and may be substantially composed only of a resin. Specifically, it is 95% by mass or more, preferably 98% by mass. % Or more, more preferably 99% by mass or more is the resin.
- a resin contained in the polyimide and / or polyamide-imide porous body of the present invention polyimide and / or polyamide-imide is preferable, a resin containing polyimide is more preferable, and only polyimide may be used.
- polyimide and / or polyamideimide may be referred to as “polyimide resin”.
- polyimide resin porous body is carboxy. And at least one selected from the group consisting of a group, a salt-type carboxy group, and an —NH— bond.
- the polyimide and / or polyamideimide preferably has a carboxy group, salt-type carboxy group and / or —NH— bond other than the main chain terminal of the polyimide and / or polyamideimide.
- the “salt-type carboxy group” means a group in which a hydrogen atom in a carboxy group is substituted with a cation component.
- the “cationic component” may be a cation itself that is in a completely ionized state, or a cation component that is ionically bonded to —COO 2 — and is in an essentially uncharged state. It may be a cation component having a partial charge which is an intermediate state between the two.
- the “cation component” is an M ion component composed of an n-valent metal M
- the cation itself is represented as M n +
- the cation component is represented by “M” in “ ⁇ COOM 1 / n ”. Element.
- the “cationic component” includes a cation when the compound mentioned as a compound contained in the chemical etching solution described later is ionically dissociated, and typically includes an ionic component or an organic alkali ion component. It is done.
- the alkali metal ion component is a sodium ion component
- the cation itself is a sodium ion (Na + )
- the cation component is an element represented by “Na” in “—COONa”.
- the charged cation component is Na ⁇ + .
- the cation component is not particularly limited, and may be any of inorganic components, organic components such as NH 4 + , N (CH 3 ) 4 +, and the like.
- Examples of the inorganic component include metal elements such as alkali metals such as Li, Na, and K, and alkaline earth metals such as Mg and Ca.
- Examples of the organic component, especially the organic alkali ion component include quaternary ammonium cations represented by NH 4 + , for example, NR 4 + (four Rs are the same or different and each represents an organic group). It is done.
- the organic group as R is preferably an alkyl group, more preferably an alkyl group having 1 to 6 carbon atoms.
- Examples of the quaternary ammonium cation include N (CH 3 ) 4 + .
- the state of the “salt-type carboxy group” and “cationic component” is not particularly limited, and is usually in an environment where polyimide and / or polyamideimide is present, for example, in an aqueous solution, It may depend on whether it is in an organic solvent, dried or the like.
- the cation component is a sodium ion component, for example, if it is in an aqueous solution, it may be dissociated into —COO 2 — and Na +, and if it is in an organic solvent or dried, There is a high possibility that COONa is not dissociated.
- the polyimide and / or polyamideimide in the present invention has at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond, and usually has a carboxy group and / or a salt-type carboxy group and — Both have NH-bonds.
- the carboxy group and / or the salt-type carboxy group the polyimide and / or the polyamide-imide may have only a carboxy group, or may have only a salt-type carboxy group, or a carboxy group and a salt type. You may have both of a carboxy group.
- the ratio of the carboxy group and the salt-type carboxy group possessed by the polyimide and / or polyamide imide varies depending on the environment in which the polyimide and / or polyamide imide is present, even for the same polyimide and / or polyamide imide. It is also affected by the concentration of the cation component.
- the total number of moles of carboxy groups and salt-type carboxy groups possessed by the polyimide and / or polyamideimide in the present invention is usually equimolar to the —NH— bond.
- a carboxy group and / or a salt-type carboxy group is formed from a part of the imide bond in the polyimide, a —NH— bond is also formed at substantially the same time, and the total of the formed carboxy group and the salt-type carboxy group The number of moles is equimolar to the —NH— bond formed.
- the total number of carboxy groups and salt-type carboxy groups in the polyamideimide is not necessarily equimolar with the —NH— bond, but depends on the conditions of the imide bond ring opening step such as chemical etching described later.
- the —NH— bond is preferably part of an amide bond (—NH—C ( ⁇ O) —).
- the polyimide and / or polyamideimide in the present invention preferably has at least one selected from the group consisting of structural units represented by the following formulas (3) to (6).
- it is a polyimide, it preferably has a structural unit represented by the following formula (3) and / or (4), and when it is a polyamideimide, it is represented by the following formula (5) and / or (6). It is preferable to have a unit.
- X is the same or different and is a hydrogen atom or a cation component.
- Ar is an aryl group, and Ar is bonded to a carbonyl group in each of the repeating unit represented by the formula (1) constituting the polyamic acid described later or the repeating unit represented by the formula (2) constituting the aromatic polyimide. It may be the same as the aryl group represented by Y is a divalent residue excluding the amino group of the diamine compound, and the repeating unit represented by the formula (1) constituting the polyamic acid described later or the repeating represented by the formula (2) constituting the aromatic polyimide. It may be the same as the aryl group represented by Ar to which N is bonded in each unit.
- a part of the imide bond ([—C ( ⁇ O)] 2 —N—) of a general polyimide and / or polyamideimide is ring-opened.
- the structural unit represented by the above formula (3) and / or (4) and polyamideimide those having the structural unit represented by the above formula (5) are preferable.
- the object of the present invention can be achieved only by having an amide bond (—NH—C ( ⁇ O) —) originally possessed without opening the imide bond of general polyamide-imide. We have found that this can be achieved.
- a part of the imide bond originally possessed by the polyamideimide is ring-opened to have the structural unit represented by the above (5).
- the polyimide and / or polyamideimide in the present invention is a polyimide having at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond by opening a part of the imide bond and / or Or it is good also as a polyamide-imide porous body.
- the rate of change in the case where a part of the imide bond is opened is determined as follows.
- the area of the peak representing the imide bond measured with a Fourier transform infrared spectroscopic (FT-IR) apparatus is the same as the peak representing the benzene measured with the FT-IR apparatus.
- a value (X2) represented by a value divided by the area is obtained.
- Unchangeable rate (%) (X2) ⁇ (X1) ⁇ 100
- the unchanged rate is preferably 60% or more, more preferably 70% to 99.5%, and more preferably 80 to 99%. Further preferred.
- a porous body containing polyamide-imide contains an —NH— bond that constitutes an amide bond (—NH—C ( ⁇ O) —) that is originally possessed without ring opening of the imide bond.
- the rate of change may be 100%.
- the area of the peak representing the imide bond measured by a Fourier transform infrared spectroscopy (FT-IR) apparatus is also FT.
- FT-IR Fourier transform infrared spectroscopy
- the imidization ratio in the case of polyimide, (X2) in the above description is preferably 1.2 or more, and 1.2 to 2 Is more preferably 1.3 to 1.6, still more preferably 1.30 to 1.55, and particularly preferably 1.35 to less than 1.5.
- the imidation ratio indicates that the larger the number, the greater the number of imide bonds, that is, the smaller the above-mentioned ring-opened imide bonds.
- the polyimide and / or polyamideimide porous body of the present invention is preferably a porous body containing pores having a curved surface on the inner surface, and many (preferably substantially all) of the pores in the porous body are curved. More preferably, it is formed.
- “having a curved surface on the inner surface” means that at least an inner surface of the hole that provides the porosity has a curved surface on at least a part of the inner surface.
- it is preferable that at least substantially all of the inner surface is a curved surface.
- the pores in the porous body have a curved surface on the inner surface
- the fluid when the fluid is allowed to pass through the polyimide and / or polyamideimide porous body of the present invention, the fluid sufficiently reaches the inside of the pores in the porous body. It is possible to make sufficient contact with the inner surface and possibly cause convection along the curved surface of the inner surface.
- minute substances such as metal particles existing in the fluid are easily adsorbed to the pores or the concave portions that may be present on the inner surfaces of the pores in the porous body of the present invention.
- the above-described inner surface has a curved hole forming a communication hole.
- the communication hole is formed by connecting a plurality of holes having a curved surface on the inner surface to form a communication hole as a whole, and a portion formed by adjoining a hole having a curved surface on the inner surface is a communication hole.
- the communication hole is a hole formed in a portion where fine particles used in a method for producing a polyimide resin porous body described later are in contact with each other.
- the communication hole has an opening on the surface of the porous body so that fluid can pass through the porous body of the present invention, and is connected so that a flow path is secured inside the porous body. Are preferred.
- the polyimide and / or polyamideimide porous body of the present invention preferably has a communication hole in which pores having curved surfaces are continuously formed on the inner surface, when the fluid is passed through the porous body, the fluid becomes porous.
- the contact area with the inner surface of the hole increases by passing while contacting the curved surfaces of the individual holes, and the metal particles present in the fluid in the holes in the porous material It is considered that minute substances such as these are easily adsorbed.
- the polyimide and / or polyamideimide porous body of the present invention is a step of forming a carboxy group and / or a salt-type carboxy group from a part of the imide bond in the polyimide and / or polyamideimide (hereinafter referred to as “imide bond ring-opening step”). In some cases).
- imide bond ring-opening step as described above, when a carboxy group and / or a salt-type carboxy group is formed from a part of the imide bond, in theory, these groups are theoretically equimolar with —NH— bond. Is also formed.
- the imide bond ring-opening step is preferably performed by chemical etching described later.
- the resin contained in the polyimide and / or polyamide-imide porous material is substantially composed of polyamide-imide, it already has —NH— bonds even without the imide bond ring-opening step, and has a good adsorption power.
- the imide bond ring-opening step is not necessarily required in order to achieve the object of the present invention. It is preferable to perform a ring-opening step.
- the method for producing a polyimide and / or polyamide-imide porous body according to the first aspect of the present invention comprises a carboxy group and / or a part of an imide bond in the polyimide and / or polyamide-imide.
- a step of forming a salt-type carboxy group (imide bond ring-opening step) is included.
- a molded body such as a film mainly containing polyimide and / or polyamide-imide (hereinafter referred to as “polyimide and / or polyamide-imide molding”). It is preferable to perform an imide bond ring-opening step after preparing the “body”.
- the polyimide and / or polyamide-imide molded body, which is the target for the imide bond ring-opening step, may be porous or non-porous, and the shape is not particularly limited.
- the polyimide and / or polyamideimide molded body is preferably porous in that the degree of porosity in the polyimide and / or polyamideimide porous body of the first aspect of the present invention can be increased, and / It is preferable that it is thin shapes, such as a film
- the polyimide and / or polyamideimide molded body may be non-porous when the imide bond ring-opening step is performed.
- a method of making the polyimide and / or polyamideimide molded body porous before or after the imide bond ring-opening step a composite of polyimide and / or polyamideimide and fine particles (hereinafter, “ It is sometimes referred to as “polyimide resin-fine particle composite”), and a method including a fine particle removing step of removing the fine particles to make them porous is preferable.
- a method for producing a polyimide and / or polyamide-imide porous body As a method for producing a polyimide and / or polyamide-imide porous body according to the first aspect of the present invention, (a) imide bond ring-opening is performed on a composite of polyimide and / or polyamide-imide and fine particles before the fine particle removing step. A step may be applied, or (b) after the fine particle removal step, a polyimide and / or polyamideimide molded body made porous by the step may be subjected to an imide bond ring-opening step. And the latter method (b) is preferred in that the degree of porosity in the polyamideimide porous body can be increased.
- the production method of the polyimide and / or polyamide-imide porous body according to the first aspect of the present invention will be described in detail mainly taking the case of taking the form of a film (porous film) as a preferred aspect.
- the membrane can be suitably manufactured using varnish.
- the varnish is produced by mixing an organic solvent in which fine particles are dispersed in advance with polyamic acid, polyimide or polyamideimide in an arbitrary ratio, or by polymerizing tetracarboxylic dianhydride and diamine in an organic solvent in which fine particles are dispersed in advance. It can be manufactured by using an acid or further imidizing to a polyimide, and the viscosity is preferably 300 to 2000 cP (0.3 to 2 Pa ⁇ s), and preferably 400 to 1800 cP (0.4 to The range of 1.8 Pa ⁇ s is more preferable. If the viscosity of the varnish is within this range, it is possible to form a film uniformly.
- the fine particle / polyimide resin ratio is 1 to 4 (mass ratio).
- the resin fine particles can be mixed with polyamic acid or polyimide or polyamideimide, and the ratio of fine particles / polyimide resin is preferably 1.1 to 3.5 (mass ratio). Furthermore, it is preferable to mix fine particles and polyamic acid or polyimide or polyamideimide so that the volume ratio of fine particles / polyimide resin is 1.1 to 5 when the polyimide resin-fine particle composite is formed.
- the ratio of fine particles / polyimide resin is more preferably 1.1 to 4.5 (volume ratio).
- volume% and volume ratio are values at 25 ° C.
- the material of the fine particles used in the present invention is not particularly limited as long as it is insoluble in the organic solvent used for the varnish and can be selectively removed after film formation.
- inorganic materials include silica (silicon dioxide), titanium oxide, alumina (Al 2 O 3 ), metal oxides such as calcium carbonate, and organic materials include high molecular weight olefins (polypropylene, polyethylene, etc.), polystyrene, acrylic Organic polymer fine particles (resin fine particles) such as epoxy resins (methyl methacrylate, isobutyl methacrylate, polymethyl methacrylate (PMMA), etc.), epoxy resins, cellulose, polyvinyl alcohol, polyvinyl butyral, polyester, polyether, polyethylene, etc. .
- Preferred examples of the inorganic material that can be used in the production of the polyimide resin porous material include silica such as colloidal silica or organic polymer fine particle PMMA. Among these, it is preferable to select these spherical particles in order to form minute holes having a curved surface on the inner surface.
- the resin fine particles used in the present invention can be selected from, for example, ordinary linear polymers and known depolymerizable polymers without particular limitation depending on the purpose.
- a normal linear polymer is a polymer in which polymer molecular chains are randomly cut during thermal decomposition
- a depolymerizable polymer is a polymer in which the polymer is decomposed into monomers during thermal decomposition. Any of them can be removed from the polyimide resin film by decomposition to a monomer, a low molecular weight substance, or CO 2 at the time of heating.
- the decomposition temperature of the resin fine particles used is preferably 200 to 320 ° C., more preferably 230 to 260 ° C. When the decomposition temperature is 200 ° C.
- film formation can be performed even when a high boiling point solvent is used for the varnish, and the range of selection of the baking conditions for the polyimide resin is widened. If the decomposition temperature is 320 ° C. or lower, only the resin fine particles can be lost without causing thermal damage to the polyimide resin.
- methyl methacrylate or isobutyl methacrylate alone (polymethyl methacrylate or polyisobutyl methacrylate) having a low thermal decomposition temperature, or a copolymer having a main component thereof is preferable for handling during pore formation. .
- the fine particles used in the present invention are preferably those having a high true sphericity in that they tend to have curved surfaces on the inner surfaces of the pores in the formed porous body.
- the particle size (average diameter) of the fine particles to be used for example, those having a particle size of 50 to 2000 nm, preferably 200 to 1000 nm can be used.
- the polyimide resin porous body obtained by removing the fine particles allows the fluid to uniformly contact the inner surface of the pores in the porous body when passing the fluid as a separating material or an adsorbing material, the metal contained in the fluid Adsorption of minute substances such as particles can be performed efficiently, which is preferable.
- the particle size distribution index (d25 / 75) may be 1 to 6, preferably 1.6 to 5, and more preferably 2 to 4.
- the particle size distribution index (d25 / 75) of the fine particles is 1 or more, even if the particle size distribution index (d25 / 75) is less than 1.6, the flow rate and adsorption rate are good, and the elongation at break tends to improve.
- d25 and d75 are values of particle diameters in which the cumulative frequency of the particle size distribution is 25% and 75%, respectively, and in this specification, d25 is the larger particle diameter.
- the fine particles (B1) used for the first varnish and the fine particles (B2) used for the second varnish are the same. A thing different from each other may be used.
- the fine particles of (B1) preferably have a smaller or the same particle size distribution index as the fine particles of (B2).
- the fine particles of (B1) it is preferable that the fine particles of (B1) have a smaller sphericity or the same as the fine particles of (B2).
- the fine particles of (B1) preferably have a smaller particle size (average diameter) than the fine particles of (B2), and in particular, (B1) is 100 to 1000 nm (more preferably 100 to 600 nm), (B2 ) Is preferably 500 to 2000 nm (more preferably 700 to 2000 nm).
- (B2) is 100 to 1000 nm (more preferably 100 to 600 nm)
- (B2 ) Is preferably 500 to 2000 nm (more preferably 700 to 2000 nm).
- a dispersant may be further added together with the fine particles.
- the dispersant By adding the dispersant, the polyamic acid, polyimide or polyamideimide and the fine particles can be mixed more uniformly, and furthermore, the fine particles in the formed or formed precursor film can be uniformly distributed.
- the front and back surfaces of the porous body are made efficient so that dense openings are provided on the surface of the finally obtained polyimide resin porous body and the air permeability of the polyimide resin porous body is improved. It is possible to form a communication hole that communicates well.
- the dispersant used in the present invention is not particularly limited, and known ones can be used.
- Anionic surfactants such as nate salt, isopropyl phosphate, polyoxyethylene alkyl ether phosphate salt, polyoxyethylene allyl phenyl ether phosphate salt; oleylamine acetate, lauryl pyridinium chloride, cetyl pyridinium chloride, lauryl trimethyl ammonium chloride, stearyl trimethyl ammonium chloride , Behenyltrimethylammonium
- polyamic acid used in the present invention those obtained by polymerizing any tetracarboxylic dianhydride and diamine can be used without any particular limitation.
- the amount of tetracarboxylic dianhydride and diamine used is not particularly limited, but 0.50 to 1.50 mol of diamine is preferably used relative to 1 mol of tetracarboxylic dianhydride, and 0.60 to 1. It is more preferable to use 30 mol, and it is particularly preferable to use 0.70 to 1.20 mol.
- the tetracarboxylic dianhydride can be appropriately selected from tetracarboxylic dianhydrides conventionally used as raw materials for polyamic acid synthesis.
- the tetracarboxylic dianhydride may be an aromatic tetracarboxylic dianhydride or an aliphatic tetracarboxylic dianhydride. From the viewpoint of the heat resistance of the resulting polyimide resin, the aromatic tetracarboxylic dianhydride may be used. Preference is given to using carboxylic dianhydrides. Tetracarboxylic dianhydride may be used in combination of two or more.
- aromatic tetracarboxylic dianhydride examples include pyromellitic dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, bis (2,3-dicarboxy Phenyl) methane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,3,3 ′, 4′- Biphenyltetracarboxylic dianhydride, 2,2,6,6-biphenyltetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2 , 3-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) -1,1,1,3,3,3-hexafluoropropane dianhydride, 2,2
- Examples of the aliphatic tetracarboxylic dianhydride include ethylene tetracarboxylic dianhydride, butane tetracarboxylic dianhydride, cyclopentane tetracarboxylic dianhydride, cyclohexane tetracarboxylic dianhydride, 1, Examples include 2,4,5-cyclohexanetetracarboxylic dianhydride, 1,2,3,4-cyclohexanetetracarboxylic dianhydride, and the like. Among these, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and pyromellitic dianhydride are preferable from the viewpoints of price and availability. These tetracarboxylic dianhydrides can be used alone or in combination of two or more.
- the diamine can be appropriately selected from diamines conventionally used as a raw material for synthesizing polyamic acid.
- This diamine may be an aromatic diamine or an aliphatic diamine, but an aromatic diamine is preferred from the viewpoint of the heat resistance of the resulting polyimide resin.
- These diamines may be used in combination of two or more.
- aromatic diamines include diamino compounds in which one or about 2 to 10 phenyl groups are bonded. Specifically, phenylenediamine and derivatives thereof, diaminobiphenyl compounds and derivatives thereof, diaminodiphenyl compounds and derivatives thereof, diaminotriphenyl compounds and derivatives thereof, diaminonaphthalene and derivatives thereof, aminophenylaminoindane and derivatives thereof, diaminotetraphenyl Compounds and derivatives thereof, diaminohexaphenyl compounds and derivatives thereof, and cardo-type fluorenediamine derivatives.
- Phenylenediamine is m-phenylenediamine, p-phenylenediamine, etc., and phenylenediamine derivatives include diamines to which alkyl groups such as methyl group and ethyl group are bonded, such as 2,4-diaminotoluene, 2,4-triphenylene. Diamines and the like.
- the diaminobiphenyl compound is a compound in which two aminophenyl groups are bonded to each other.
- the diaminobiphenyl compound is a compound in which two aminophenyl groups are bonded to each other.
- the diaminodiphenyl compound is a compound in which two aminophenyl groups are bonded to each other via other groups.
- the bond is an ether bond, a sulfonyl bond, a thioether bond, a bond by alkylene or a derivative group thereof, an imino bond, an azo bond, a phosphine oxide bond, an amide bond, a ureylene bond, or the like.
- the alkylene bond has about 1 to 6 carbon atoms, and the derivative group has one or more hydrogen atoms in the alkylene group substituted with halogen atoms or the like.
- diaminodiphenyl compounds include 3,3′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, 3,3′-diaminodiphenyl sulfone, 3,4′-diaminodiphenyl sulfone, 4,4'-diaminodiphenylsulfone, 3,3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl ketone 3,4′-diaminodiphenyl ketone, 2,2-bis (p-aminophenyl) propane, 2,2′-bis (p-aminophenyl) hexafluor
- p-phenylenediamine p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, and 4,4'-diaminodiphenyl ether are preferable from the viewpoint of price and availability.
- the diaminotriphenyl compound is one in which two aminophenyl groups and one phenylene group are bonded via another group, and the other groups are the same as those of the diaminodiphenyl compound.
- Examples of diaminotriphenyl compounds include 1,3-bis (m-aminophenoxy) benzene, 1,3-bis (p-aminophenoxy) benzene, 1,4-bis (p-aminophenoxy) benzene, and the like. be able to.
- diaminonaphthalene examples include 1,5-diaminonaphthalene and 2,6-diaminonaphthalene.
- aminophenylaminoindane examples include 5 or 6-amino-1- (p-aminophenyl) -1,3,3-trimethylindane.
- diaminotetraphenyl compounds examples include 4,4′-bis (p-aminophenoxy) biphenyl, 2,2′-bis [p- (p′-aminophenoxy) phenyl] propane, 2,2′-bis [ and p- (p′-aminophenoxy) biphenyl] propane, 2,2′-bis [p- (m-aminophenoxy) phenyl] benzophenone, and the like.
- cardo-type fluorenediamine derivatives include 9,9-bisaniline fluorene.
- the aliphatic diamine preferably has about 2 to 15 carbon atoms, and specific examples include pentamethylene diamine, hexamethylene diamine, and heptamethylene diamine.
- a compound in which the hydrogen atom of these diamines is substituted with at least one substituent selected from the group such as a halogen atom, a methyl group, a methoxy group, a cyano group, and a phenyl group may be used.
- the means for producing the polyamic acid used in the present invention is not particularly limited, and for example, a known method such as a method of reacting an acid and a diamine component in an organic solvent can be used.
- the reaction between tetracarboxylic dianhydride and diamine is usually carried out in an organic solvent.
- the organic solvent used for the reaction of the tetracarboxylic dianhydride and the diamine is particularly capable of dissolving the tetracarboxylic dianhydride and the diamine and not reacting with the tetracarboxylic dianhydride and the diamine. It is not limited. An organic solvent can be used individually or in mixture of 2 or more types.
- organic solvents used in the reaction of tetracarboxylic dianhydride with diamine include N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N Nitrogen-containing polar solvents such as N, diethylformamide, N-methylcaprolactam, N, N, N ′, N′-tetramethylurea; ⁇ -propiolactone, ⁇ -butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone Lactone polar solvents such as ⁇ -caprolactone and ⁇ -caprolactone; dimethyl sulfoxide; acetonitrile; fatty acid esters such as ethyl lactate and butyl lactate; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dioxane, tetrahydrofuran, methyl cellosolve acetate,
- organic solvents can be used alone or in admixture of two or more. Of these, a combination of the nitrogen-containing polar solvent and the lactone polar solvent is preferable.
- the amount of the organic solvent used is not particularly limited, but it is desirable that the content of the polyamic acid to be produced is 5 to 50% by mass.
- N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N, N- Nitrogen-containing polar solvents such as diethylformamide, N-methylcaprolactam, N, N, N ′, N′-tetramethylurea are preferred.
- it may be a mixed solvent to which a lactone polar solvent such as ⁇ -butyrolactone is added, and is preferably added in an amount of 1 to 20% by mass with respect to the whole organic solvent. % Is more preferable.
- the polymerization temperature is generally ⁇ 10 to 120 ° C., preferably 5 to 30 ° C.
- the polymerization time varies depending on the raw material composition used, but is usually 3 to 24 Hr (hour).
- the intrinsic viscosity of the polyamic acid solution obtained under such conditions is preferably in the range of 1000 to 100,000 cP (centipoise), and more preferably in the range of 5000 to 70000 cP.
- the polyimide used in the present invention is not limited to its structure and molecular weight as long as it is a soluble polyimide that can be dissolved in the organic solvent used in the varnish according to the present invention.
- a polyimide you may have a functional group which accelerates
- a monomer to introduce a flexible bending structure into the main chain in order to obtain a polyimide soluble in an organic solvent for example, ethylenediamine, hexamethylenediamine, 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, Aliphatic diamines such as 4,4′-diaminodicyclohexylmethane; 2-methyl-1,4-phenylenediamine, o-tolidine, m-tolidine, 3,3′-dimethoxybenzidine, 4,4′-diaminobenzanilide, etc.
- an organic solvent for example, ethylenediamine, hexamethylenediamine, 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, Aliphatic diamines such as 4,4′-diaminodicyclohexylmethane; 2-methyl-1,4-phenylenediamine
- Aromatic diamines such as polyoxyethylene diamine, polyoxypropylene diamine and polyoxybutylene diamine; polysiloxane diamines; 2,3,3 ′, 4′-oxydiphthalic anhydride, 3,4,3 ′, 4′-oxydiphthalic anhydride, 2,2-bis (4- Hydroxyphenyl) propane dibenzoate-3,3 ', use of such 4,4'-tetracarboxylic dianhydride is valid.
- a monomer having a functional group that improves the solubility in an organic solvent for example, 2,2′-bis (trifluoromethyl) -4,4′-diaminobiphenyl, 2-trifluoromethyl-1,4 It is also effective to use a fluorinated diamine such as phenylenediamine.
- a monomer having a functional group that improves the solubility in an organic solvent for example, 2,2′-bis (trifluoromethyl) -4,4′-diaminobiphenyl, 2-trifluoromethyl-1,4
- a fluorinated diamine such as phenylenediamine.
- the same monomers as those described in the column for the polyamic acid can be used in combination as long as the solubility is not inhibited.
- polyimide which can be melt
- well-known methods such as the method of making a polyamic acid chemically imidize or heat imidize, and making it melt
- polyimide include aliphatic polyimide (total aliphatic polyimide), aromatic polyimide and the like, and aromatic polyimide is preferable.
- the aromatic polyimide is obtained by thermally or chemically obtaining a polyamic acid having a repeating unit represented by the formula (1) by a ring-closing reaction or by dissolving a polyimide having a repeating unit represented by the formula (2) in a solvent.
- Ar represents an aryl group.
- any known polyamide-imide can be used as long as it is a soluble polyamide-imide that can be dissolved in the organic solvent used in the varnish according to the present invention without being limited to its structure and molecular weight.
- the polyamideimide may have a functional group capable of condensing such as a carboxy group in the side chain or a functional group that promotes a crosslinking reaction or the like during firing.
- the polyamideimide used in the present invention is obtained by reacting any trimellitic anhydride and diisocyanate, or a precursor polymer obtained by reacting any reactive trimellitic anhydride derivative with diamine. Those obtained by imidization can be used without any particular limitation.
- trimellitic anhydride and acid or a reactive derivative thereof examples include, for example, trimellitic anhydride halides such as trimellitic anhydride and trimellitic anhydride chloride, trimellitic anhydride ester, and the like.
- optional diisocyanate examples include metaphenylene diisocyanate, p-phenylene diisocyanate, o-tolidine diisocyanate, p-phenylene diisocyanate, m-phenylene diisocyanate, 4,4′-oxybis (phenylisocyanate), and 4,4′-diisocyanate.
- Diphenylmethane bis [4- (4-isocyanatophenoxy) phenyl] sulfone, 2,2'-bis [4- (4-isocyanatophenoxy) phenyl] propane, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate 4,4′-diphenylmethane diisocyanate, 3,3′-dimethyldiphenyl-4,4′-diisocyanate, 3,3′-diethyldiphenyl-4,4′-diisocyanate, isophor Diisocyanate, hexamethylene diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, m- xylene diisocyanate, p- xylene diisocyanate, naphthalene diisocyanate, and the like.
- Examples of the arbitrary diamine include those similar to those exemplified in the description of the polyamic acid.
- Organic solvent used for the varnish is not particularly limited as long as it can dissolve the polyamic acid and / or the polyimide-based resin and does not dissolve the fine particles.
- the reaction between the tetracarboxylic dianhydride and the diamine What was illustrated as a solvent to be used is mentioned.
- a solvent may be used independently and may be used in combination of 2 or more type.
- the content of the mixed solvent (S) is preferably 50 to 95% by mass, more preferably 60 to 85% by mass.
- the solid content concentration in the varnish is preferably 5 to 50% by mass, more preferably 15 to 40% by mass.
- the volume ratio of the polyamic acid, polyimide or polyamideimide (A1) and fine particles (B1) in the first varnish is set to It is preferably 19:81 to 45:65. If the volume of the fine particles is 65 or more when the whole is 100, the particles are uniformly dispersed, and if the volume is within 81, the particles are dispersed without agglomeration. The holes can be formed uniformly.
- the volume ratio of polyamic acid, polyimide or polyamideimide (A2) and fine particles (B2) is preferably 20:80 to 50:50.
- the fine particle volume is 50 or more when the total volume is 100, the single particles are uniformly dispersed, and if they are within 80, the particles do not aggregate with each other, and cracks and the like may occur on the surface. Therefore, it is possible to stably form a polyimide resin porous body having good mechanical properties such as stress and elongation at break.
- a 2nd varnish is a thing with a fine particle content ratio lower than said 1st varnish, and by satisfy
- fine-particles are in a polyamic acid, a polyimide, or a polyamideimide. Even if it is highly filled, the strength and flexibility of the unfired composite, the polyimide resin-fine particle composite, and the polyimide resin porous body can be ensured. Further, by providing a layer having a low fine particle content ratio, it is possible to reduce the manufacturing cost.
- antistatic agents In addition to the above components, antistatic agents, flame retardants, chemical imidizing agents, condensing agents, mold release agents, surfaces for the purpose of antistatic, imparting flame retardancy, low-temperature firing, releasability, coatability, etc.
- a known component such as a regulator can be appropriately contained as necessary.
- the release layer can be produced by applying a release agent on a substrate and drying or baking.
- a release agent known release agents such as alkyl phosphate ammonium salt, fluorine-based or silicone can be used without particular limitation.
- the release agent remains slightly on the peeled surface of the unfired composite film. Since this remaining mold release agent can affect the wettability of the polyimide resin porous body surface and the contamination of impurities, it is preferable to remove this.
- the cleaning method can be selected from known methods such as a method of taking out the unfired composite after immersing it in the cleaning liquid and a method of performing shower cleaning. Furthermore, in order to dry the unfired complex after washing, the known method such as air-drying the unfired complex after washing at room temperature or heating to an appropriate set temperature in a thermostatic bath is not limited. Applicable. For example, a method of preventing deformation by fixing the end of the unfired composite to a SUS formwork or the like can also be employed.
- the step of forming the release layer and the step of cleaning the unfired composite film can be omitted.
- the first varnish is applied as it is on a substrate such as a glass substrate, and 0 to 120 ° C. (preferably 0 to 90 ° C.) under normal pressure or vacuum. ), More preferably 10 to 100 ° C. (more preferably 10 to 90 ° C.) under normal pressure to form a first unfired composite having a thickness of 1 to 5 ⁇ m.
- the second varnish is applied onto the formed first unfired composite, and similarly, 0 to 80 ° C. (preferably 0 to 50 ° C.), more preferably normal pressure 10 to 80 ° C. ( More preferably, drying is performed at 10 to 30 ° C. to form a second unfired composite having a film thickness of 5 to 30 ⁇ m to obtain a two-layer unfired composite.
- the dried unfired composite (or two-layer unfired composite, hereinafter the same) is subjected to post-treatment (baking) by heating to form a composite film composed of polyimide resin and fine particles (polyimide resin-fine particle composite) ).
- baking post-treatment
- the varnish contains polyamic acid
- a baking process is an arbitrary process. In particular, when polyimide or polyamideimide is used for the varnish, the firing step may not be performed.
- the firing temperature varies depending on the structure of the polyamic acid or polyimide resin contained in the unfired composite and the presence or absence of a condensing agent, but is preferably 120 to 400 ° C, more preferably 150 to 375 ° C.
- the thickness of the completed polyimide resin-fine particle composite can be obtained by measuring the thickness of a plurality of locations with a micrometer or the like and averaging the measured thicknesses.
- What average thickness is preferable depends on the use of the polyimide resin-fine particle composite or the polyimide resin porous material, but for example, when used as a separation material, an adsorbent, etc., the thinner one is preferable, For example, it may be 1 ⁇ m or more, preferably 5 to 500 ⁇ m, and more preferably 8 to 100 ⁇ m.
- a polyimide resin porous body having fine pores can be produced with good reproducibility.
- the polyimide resin-fine particle composite can be made porous by dissolving and removing the silica with low-concentration hydrogen fluoride water (HF) or the like.
- HF hydrogen fluoride water
- the resin fine particles can be removed by heating to a temperature not lower than the thermal decomposition temperature of the resin fine particles as described above and lower than the thermal decomposition temperature of the polyimide resin.
- the method for producing a polyimide resin porous body of the present invention includes an imide bond ring-opening step. Specifically, (a) before the fine particle removal step, the polyimide resin porous body is formed into a polyimide resin-particle composite. An imide bond ring-opening step may be performed, or (b) after the fine particle removal step, the polyimide resin molded body made porous by the step may be subjected to a method including performing an imide bond ring-opening step.
- the former method (a) can open the imide bond existing on the outer surface of the polyimide-based resin molded body and in the vicinity thereof, thereby achieving the object of the present invention.
- the latter (b) is preferable in that the degree of porosity in the obtained polyimide resin porous body can be increased.
- the imide bond ring-opening step can be performed by a chemical etching method, a physical removal method, or a combination thereof. It does not specifically limit as a chemical etching method, For example, a conventionally well-known method can be used.
- Examples of the chemical etching method include treatment with a chemical etching solution such as an inorganic alkali solution or an organic alkali solution.
- a chemical etching solution such as an inorganic alkali solution or an organic alkali solution.
- Inorganic alkaline solutions are preferred.
- examples of inorganic alkaline solutions include hydrazine solutions containing hydrazine hydrate and ethylenediamine, solutions of alkali metal hydroxides such as potassium hydroxide, sodium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammonia solutions, alkali hydroxides And an etching solution mainly containing hydrazine and 1,3-dimethyl-2-imidazolidinone.
- Organic alkaline solutions include primary amines such as ethylamine and n-propylamine; secondary amines such as diethylamine and di-n-butylamine; tertiary amines such as triethylamine and methyldiethylamine; dimethylethanolamine And alcohol amines such as triethanolamine; quaternary ammonium salts such as tetramethylammonium hydroxide and tetraethylammonium hydroxide; and alkaline solutions such as cyclic amines such as pyrrole and pihelidine.
- primary amines such as ethylamine and n-propylamine
- secondary amines such as diethylamine and di-n-butylamine
- tertiary amines such as triethylamine and methyldiethylamine
- dimethylethanolamine And alcohol amines such as triethanolamine
- quaternary ammonium salts such as tetra
- the solvent of each solution pure water and alcohols can be selected as appropriate. Moreover, what added a suitable amount of surfactant can also be used.
- the alkali concentration is, for example, 0.01 to 20% by mass.
- plasma oxygen, argon, etc.
- dry etching by corona discharge, etc. can be used.
- the above-described method is preferable because it can be applied to any imide bond ring-opening step before or after the fine particle removal step.
- it is easy to form the communicating hole inside a polyimide resin porous body, and can improve an aperture ratio.
- the polyimide resin porous body of the present invention is a porous body mainly composed of polyimide and / or polyamideimide having at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond.
- the degree of porosity is represented by the following physical property values, for example.
- the polyimide resin porous body of the present invention can be obtained, for example, as a porous body having an average pore diameter of 100 to 2000 nm, and the average pore diameter is preferably 200 to 1000 nm, more preferably 300 to 900 nm.
- the average pore diameter is a value obtained by obtaining a size change amount of an average communication hole by a porometer for a chemical etching treatment, and obtaining an actual average pore diameter from the value.
- the average particle diameter of the fine particles used in the production of the porous body can be set as the average pore diameter.
- the polyimide resin porous body of the present invention can be obtained as a porous body having a porosity of, for example, 50 to 90% by mass, preferably 55 to 80% by mass, determined by the method described later.
- the Gurley air permeability of the porous polyimide resin of the present invention can be, for example, within 1000 seconds, preferably within 600 seconds, more preferably within 500 seconds, and most preferably within 300 seconds.
- the lower limit is not particularly set because it is preferably as low as possible. However, for example, 30 seconds or more is preferable in that the metal removal or the like is efficiently performed while maintaining the flow rate of the fluid passing through the polyimide resin porous body to a certain level. If the Gurley air permeability is within 1000 seconds, the degree of porosity is sufficiently high, so that it can be suitably used as, for example, a separating material or an adsorbing material.
- the polyimide resin porous body of the present invention is a porous body mainly composed of polyimide and / or polyamideimide having at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond. Since it is a porous body having a high degree of porosity as described above, it can be suitably used as, for example, a separating material and an adsorbing material.
- the polyimide-based resin porous body of the present invention is a porous body and, as described above, is preferably a porous body containing pores having a curved surface on the inner surface, and the pores having the curved surface are communication holes.
- the polyimide resin porous body of the present invention further has at least one selected from the group consisting of a carboxy group, a salt-type carboxy group, and an —NH— bond, the charge or Coulomb force provided by these groups.
- metal particles for example, metal ions or metal aggregates (for example, metal oxide aggregates, metal-organic aggregates) contained in the fluid, and pores and / or porous bodies in the porous body It is thought that it can promote adsorption on the surface, and can also function as an ion exchange resin.
- the polyimide resin porous body of the present invention is a porous body having a high degree of porosity as described above, the polyimide resin and / or polyamideimide porous body is used for the separation and / or adsorption method. It can be preferably used.
- “separation” may include at least one selected from the group consisting of filtration, isolation, removal, capture, purification, and sieving. Can be used for various industrially used treatments including "", for example, wastewater treatment.
- the polyimide-based resin porous body of the present invention is a process of separating the fine substance from the fluid containing the fine substance by, for example, adsorbing the fine substance into pores and / or communication holes of the porous body. Thus, it can use suitably also for the process which will perform both isolation
- Such a separating material and / or adsorbing material made of a porous polyimide resin is also one aspect of the present invention.
- the polyimide resin porous body of the present invention is preferably a porous body containing pores having an average pore diameter of several hundred nanometer units. It can be adsorbed or trapped in the pores and / or communication holes in the material. Therefore, the polyimide-based resin porous body of the present invention can be used also in electronic materials that are required to remove very precise impurities, particularly in the field of semiconductor manufacturing. For example, separation and / or adsorption is performed in semiconductor manufacturing. For example, a protective film-forming chemical solution for modifying a substrate, a chemical solution such as a silicon wafer cleaning solution, a chemical solution containing a photosensitive material such as a resist composition, and a resin solution can be used. Impurities contained in the raw material chemical solution of the photosensitive material, for example, contaminating metals such as iron and nickel can be removed with a very high removal rate.
- the polyimide resin porous body of the present invention can be suitably used for, for example, filter media and other filter media.
- the polyimide resin porous body may be used alone, or may be used as a filter media and other functional layers (membranes). ) Or may be used as a membrane to be combined with other filter media. For example, it may be used as a membrane used in a filter device or the like.
- the functional layer that can be used in combination with the polyimide resin porous body of the present invention is not particularly limited.
- nylon film polytetrafluoroethylene (PTFE) film, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer
- PTFE polytetrafluoroethylene
- tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer examples thereof include a (PFA) film or a film having a chemical or physicochemical function such as a film obtained by modifying these.
- the polyimide resin porous body of the present invention is suitable for filter media such as metal filters used in the field of semiconductor manufacturing, for example, and can also be used for laminates containing the filter media and other filter media. And can be suitably used for a filter device.
- the polyimide resin porous body of this invention is arrange
- the liquid flow path may be disposed in parallel with the flow path or may be disposed so as to intersect.
- the region before and after passing through the polyimide resin porous body is appropriately sealed so that the supply liquid is separated from the filtrate.
- the polyimide resin porous body of the present invention may be bonded by light (UV) curing or heat bonding (including bonding by an anchor effect (such as heat welding)), if necessary), or
- the polyimide resin porous body of the present invention and other filter medium (filter) can be bonded and used, for example, by an incorporation method or the like.
- the resin porous body is further provided in an outer container made of a thermoplastic resin such as polyethylene, polypropylene, tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer (PFA), polyethersulfone (PES), polyimide, polyamideimide and the like. Can be used.
- the polyimide resin porous body of the present invention can be suitably used for removing the metal contained in the above-described chemical solution used in the semiconductor manufacturing field, and as the metal, particularly, the removal rate of iron and nickel is high.
- the metal removal rate described later can be 90% or more, preferably 95% or more, more preferably 97% or more for iron, and for nickel, for example, 90% or more, preferably 95% or more, more preferably Can be 97% or more.
- the upper limit of the metal removal rate is not particularly set because it is preferably as high as possible. However, for iron, for example, it may be less than 100%, usually 99% or less, for nickel, for example, 100% or less. % Or less.
- the polyimide-based resin porous body of the present invention preferably has a communication hole, more preferably a communication hole having an opening on the outer surface of the porous body communicates with the inside of the porous body.
- a communication hole is provided so as to ensure a fluid flow path for allowing the porous body to pass therethrough so that an opening is also formed on the outer surface on the opposite side (back side) of the substrate. That the polyimide resin porous body of the present invention has such a communication hole can be represented by, for example, Gurley air permeability, and the Gurley air permeability can be, for example, 30 to 1000 seconds.
- the metal removal treatment is performed while maintaining a high flow rate of the fluid such as the chemical solution.
- the flow rate is not particularly limited.
- the flow rate of pure water when pressurized at 0.08 MPa at room temperature may be 1 ml / min or more, and preferably 3 ml / min or more. More preferably, it is 5 ml / min or more, and particularly preferably 10 ml / min or more.
- An upper limit is not specifically limited, For example, it can be 50 ml / min or less.
- the polyimide resin porous body of the present invention is a porous body mainly composed of polyimide and / or polyamideimide, it is excellent in mechanical properties such as stress and elongation at break.
- it is preferably 10 MPa or more, more preferably 15 MPa or more, still more preferably 15 to 50 MPa
- the breaking elongation can be, for example, 10% GL or more, preferably 15% GL or more.
- the upper limit of the breaking elongation can be, for example, 50% GL, preferably 45% GL, and more preferably 40% GL.
- the breaking elongation tends to increase.
- the particle size distribution index (d25 / 75) of silica (1) is about 3.3
- the particle size distribution index (d25 / 75) of silica (2) is about 1.5.
- Tetracarboxylic acid dianhydride pyromellitic dianhydride ⁇ Diamine: 4,4′-diaminodiphenyl ether ⁇ Polyamide acid solution: Reaction product of pyromellitic dianhydride and 4,4′-diaminodiphenyl ether (solid content) 21.9% by mass (organic solvent: N, N-dimethylacetamide)) Polyamideimide solution: Polyamideimide containing trimellitic anhydride and o-tolidine diisocyanate as polymerization components (Mw: about 30,000; solid content: 14.0% by mass (organic solvent: N-methyl-2-pyrrolidone)).
- the varnish was formed into a film using a applicator on a polyethylene terephthalate (PET) film as a base material.
- Prebaking was performed at 90 ° C. for 5 minutes to produce an unfired composite (non-fired composite film) having a thickness of 40 ⁇ m.
- the unfired composite film was pressed through the unfired composite film between two rolls. At that time, the roll holding pressure was 3.0 kg / cm 2 , the roll temperature was 80 ° C., and the moving speed of the unfired composite film was 0.5 m / min.
- the green composite was peeled from the substrate to obtain a green composite.
- Polyimide porous body formation The polyimide-fine particle composite obtained above was immersed in a 10% HF solution for 10 minutes to remove the fine particles contained in the film, and then washed with water and dried to obtain a polyimide porous body.
- Example 5 Polyamideimide porous material [Preparation of silica dispersion-2] Silica (2) 19.3 parts by mass, organic solvent (3) 19.3 parts by mass and dispersant 0.1 part by mass were mixed and stirred to prepare a silica dispersion.
- the varnish was formed on a PET film using an applicator. Prebaking was performed at 90 ° C. for 5 minutes to produce an unfired composite (non-fired composite film) having a thickness of 40 ⁇ m. After being immersed in water for 3 minutes, the unfired composite film was pressed through the unfired composite film between two rolls. At that time, the roll holding pressure was 3.0 kg / cm 2 , the roll temperature was 80 ° C., and the moving speed of the unfired composite film was 0.5 m / min. The unfired composite was peeled from the substrate to obtain a polyamideimide-fine particle composite. The polyamideimide-fine particle composite was heat-treated (baked) at 280 ° C. for 15 minutes to obtain a polyamideimide-fine particle composite.
- Metal removal rate A metal impurity-containing liquid prepared by adding iron and nickel to pure water was measured for each content (A) of iron and nickel in the liquid, and then passed through each prepared porous membrane as a filter. The amount of metal impurities (B) in the liquid after passing was measured, and the value represented by the following formula was defined as the metal removal rate (%). The results are shown in Table 1. (AB) / B ⁇ 100
- Example 1 From Table 1, it was found that each example had a metal removal rate far superior to that of the comparative example. From Example 1 and Example 2, it was found that when the average pore size is large, both the flow rate and the metal removal rate (adsorption rate) can be improved. From Example 2 and Example 3, it was found that the condition of the condition 1 was better than the condition 2 which was relatively weak as the condition of chemical etching as the imide bond ring-opening step. From Example 2 and Example 4, when the imidization rate is lowered under the condition 1 of chemical etching as the imide bond ring opening step, the flow rate can be improved while maintaining the metal removal rate (adsorption rate) well. I understood it.
- the polyamide-imide porous body can improve the metal removal rate (adsorption rate) while maintaining the same flow rate as the comparative example without performing chemical etching as an imide bond ring-opening step. I found out that This is considered to be due to the —NH— bond of the polyamideimide.
- polyimide porous body was resistant to butyl acetate and cyclohexanone.
- butyl acetate is not used in polyethylene filters
- cyclohexanone is used in polyethylene filters and nylon filters. Therefore, when purifying these solvents, polyimide porous The body may be applicable as a separator.
- Example 6 A filter device including the same polyimide porous body as that of Example 2 was prepared.
- Example 7 A polyimide porous body was obtained in the same manner as in Example 2 except that the etching solution (3) was used as the chemical etching solution. The imidation ratio of X2 of the obtained polyimide porous body was 1.51. The Gurley air permeability was 230 seconds. A filter device provided with the polyimide porous body was prepared.
- Each filter device prepared in Examples 6 and 7 and Comparative Example 3 was subjected to the following evaluation using the liquid passing target shown in Table 2.
- Metal removal rate The following resin solutions and chemically amplified resist compositions were prepared, and the metal removal rate was evaluated. The metal removal rate was calculated
- the iron content of the resin solution or chemically amplified resist composition before passing through was designated as (A), and the amount of iron impurities in the solution after passing through each prepared filter device was taken as (B).
- the filtration conditions were a filtration pressure of 1.0 kgf / cm 2 (9.8 N / cm 2 ) at room temperature.
- each example had a metal removal rate far superior to that of the comparative example even when the liquid passing target was a resin solution or a resist composition.
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Abstract
Description
本明細書において、例えば「ポリイミド及び/又はポリアミドイミド」等のように「P及び/又はQ」との記載、また、例えば「カルボキシ基、塩型カルボキシ基及び/又は-NH-結合」等のように「P、Q及び/又はR」との記載は、それぞれ「P及びQからなる群より選択される少なくとも1つ」、「P、Q及びRからなる群より選択される少なくとも1つ」を意味し、「及び/又は」を用いる他の記載もこれに準じる。ここでP、Q及びRは任意の用語である。
もっともポリアミドイミドの場合、一般のポリアミドイミドが有するイミド結合の開環によらずに元々有しているアミド結合(-NH-C(=O)-)を有することのみによっても本発明の目的を達成することができることを本発明者らは見出した。とはいえポリアミドイミドにおいても、ポリアミドイミドが本来有するイミド結合の一部が開環して上記(5)で表される構成単位を有することが好ましい。
(1)後述のイミド結合開環工程を行わないポリイミド及び/又はポリアミドイミド多孔質体(ただし、当該多孔質体を作成するためのワニスがポリアミド酸を含む場合、焼成工程において、実質的にイミド化反応が完結しているものとする。)について、フーリエ変換型赤外分光(FT-IR)装置により測定したイミド結合を表すピークの面積を、同じくFT-IR装置により測定したベンゼンを表すピークの面積で除した値で表される値(X1)を求める。
(2)前記値(X1)を求めた多孔質体と同一のポリマー(ワニス)を用いて、得られたポリイミド及び/又はポリアミドイミド多孔質体に対し、後述のイミド結合開環工程を行った後のポリイミド及び/又はポリアミドイミド多孔質体について、フーリエ変換型赤外分光(FT-IR)装置により測定したイミド結合を表すピークの面積を、同じくFT-IR装置により測定したベンゼンを表すピークの面積で除した値で表される値(X2)を求める。
(3)不変化率(%)=(X2)÷(X1)×100
本発明におけるポリイミド及び/又はポリアミドイミド多孔質体について、不変化率は、60%以上であることが好ましく、70%~99.5%であることがより好ましく、80~99%であることが更に好ましい。
ポリアミドイミドを含む多孔質体の場合は、イミド結合の開環によらずに元々有しているアミド結合(-NH-C(=O)-)を構成する-NH-結合を含むため、不変化率は100%であってもよい。
ポリイミド及び/又はポリアミドイミド成形体をイミド結合開環工程の前であるか後であるかに関わりなく多孔質化する方法としては、ポリイミド及び/又はポリアミドイミドと微粒子との複合体(以下、「ポリイミド系樹脂-微粒子複合体」ということがある。)から該微粒子を取り除いて多孔質化する微粒子除去工程を含む方法が好ましい。
ワニス製造は、予め微粒子が分散した有機溶剤とポリアミド酸、ポリイミド又はポリアミドイミドを任意の比率で混合するか、微粒子を予め分散した有機溶剤中でテトラカルボン酸二無水物及びジアミンを重合してポリアミド酸とするか、更にイミド化してポリイミドとすることで製造でき、最終的に、その粘度を300~2000cP(0.3~2Pa・s)とすることが好ましく、400~1800cP(0.4~1.8Pa・s)の範囲がより好ましい。ワニスの粘度がこの範囲内であれば、均一に成膜をすることが可能である。
本発明で用いられる微粒子の材質は、ワニスに使用する有機溶剤に不溶で、成膜後選択的に除去可能なものなら、特に限定されることなく使用することができる。例えば、無機材料としては、シリカ(二酸化珪素)、酸化チタン、アルミナ(Al2O3)、炭酸カルシウム等の金属酸化物、有機材料としては、高分子量オレフィン(ポリプロピレン、ポリエチレン等)、ポリスチレン、アクリル系樹脂(メタクリル酸メチル、メタクリル酸イソブチル、ポリメチルメタクリレート(PMMA)等)、エポキシ樹脂、セルロース、ポリビニルアルコール、ポリビニルブチラール、ポリエステル、ポリエーテル、ポリエチレン等の有機高分子微粒子(樹脂微粒子)が挙げられる。
本発明に用いるポリアミド酸は、任意のテトラカルボン酸二無水物とジアミンを重合して得られるものが、特に限定されることなく使用できる。テトラカルボン酸二無水物及びジアミンの使用量は特に限定されないが、テトラカルボン酸二無水物1モルに対して、ジアミンを0.50~1.50モル用いるのが好ましく、0.60~1.30モル用いるのがより好ましく、0.70~1.20モル用いるのが特に好ましい。
本発明に用いるポリイミドは、本発明に係るワニスに使用する有機溶剤に溶解可能な可溶性ポリイミドなら、その構造や分子量に限定されることなく、公知のものが使用できる。ポリイミドについて、側鎖にカルボキシ基等の縮合可能な官能基又は焼成時に架橋反応等を促進させる官能基を有していてもよい。
本発明に用いるポリアミドイミドは、本発明に係るワニスに使用する有機溶剤に溶解可能な可溶性ポリアミドイミドなら、その構造や分子量に限定されることなく、公知のものが使用できる。ポリアミドイミドについて、側鎖にカルボキシ基等の縮合可能な官能基又は焼成時に架橋反応等を促進させる官能基を有していてもよい。
ワニスに用いられる有機溶剤としては、ポリアミド酸及び/又はポリイミド系樹脂を溶解することができ、微粒子を溶解しないものであれば、特に限定されず、テトラカルボン酸二無水物とジアミンとの反応に用いる溶剤として例示したものが挙げられる。溶剤は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。
ポリアミド酸又はポリイミド系樹脂と微粒子とを含有する未焼成複合体の成形は、成膜の場合、基板上へ上記のワニスを塗布し、常圧又は真空下で0~120℃(好ましくは0~100℃)、より好ましくは常圧下60~95℃(更に好ましくは65~90℃)で乾燥して行う。なお、基板上には必要に応じて離型層を設けてもよい。また、未焼成複合体の製造において、後述のポリイミド系樹脂-微粒子複合体の製造(焼成工程)の前に、水を含む溶剤への浸漬工程、プレス工程、当該浸漬工程後の乾燥工程をそれぞれ任意の工程として設けてもよい。
上記乾燥後の未焼成複合体(又は2層状の未焼成複合体、以下同様)に加熱による後処理(焼成)を行ってポリイミド系樹脂と微粒子とからなる複合膜(ポリイミド系樹脂-微粒子複合体)とすることができる。ワニスにポリアミド酸を含む場合、焼成工程においてはイミド化を完結させることが好ましい。なお、焼成工程は任意の工程である。特にワニスにポリイミド又はポリアミドイミドが用いられる場合、焼成工程は行われなくてもよい。
ポリイミド系樹脂-微粒子複合体から、微粒子を適切な方法を選択して除去することにより、微細孔を有するポリイミド系樹脂多孔質体を再現性よく製造することができる。例えば、微粒子として、シリカを採用した場合、ポリイミド系樹脂-微粒子複合体を低濃度のフッ化水素水(HF)等によりシリカを溶解除去することで、多孔質とすることが可能である。また、微粒子が樹脂微粒子の場合は、上述のような樹脂微粒子の熱分解温度以上で、ポリイミド系樹脂の熱分解温度未満の温度に加熱し、樹脂微粒子を分解させてこれを取り除くことができる。
本発明のポリイミド系樹脂多孔質体の製造方法は、上述のようにイミド結合開環工程を含むが、具体的には、(a)微粒子除去工程の前に、ポリイミド系樹脂-微粒子複合体にイミド結合開環工程を施すか、又は、(b)微粒子除去工程の後に、該工程により多孔質化したポリイミド系樹脂成形体にイミド結合開環工程を施すことを含む方法により行うことができる。上記製造方法としては、前者の(a)の方法であっても、ポリイミド系樹脂成形体の外表面及びその近傍に存在するイミド結合を開環することができ、本発明の目的を達成することができるが、得られるポリイミド系樹脂多孔質体における多孔質の程度を高めることができる点で、後者の(b)の方が好ましい。
ケミカルエッチング後の洗浄としては、水洗単独でもよいが、酸洗浄及び/又は水洗を組み合わせることが好ましい。
また、ポリイミド系樹脂多孔質体の表面の有機溶媒への濡れ性向上及び残存有機物除去のため、ポリイミド系樹脂多孔質体の再度焼成工程を行ってもよい。焼成条件は、[ポリイミド系樹脂-微粒子複合体の製造(焼成工程)]における焼成条件と同様、適宜設定すればよい。
本発明のポリイミド系樹脂多孔質体は、カルボキシ基、塩型カルボキシ基及び-NH-結合からなる群より選択される少なくとも1つを有するポリイミド及び/又はポリアミドイミドを主成分とする多孔質体であり、その多孔質の程度としては例えば下記の物性値等により表される。
本発明のポリイミド系樹脂多孔質体は、カルボキシ基、塩型カルボキシ基及び-NH-結合からなる群より選択される少なくとも1つを有するポリイミド及び/又はポリアミドイミドを主成分とする多孔質体であり、上記のように多孔質の程度の高い多孔質体であるので、例えば、分離材、吸着材として好適に使用することができる。本発明のポリイミド系樹脂多孔質体は、多孔質体であり、上述のように、好ましくは、内面に曲面を有する孔を含有する多孔質体であり、また、該曲面を有する孔が連通孔を形成している多孔質体であるので、例えば、該多孔質体に流体を通過させると、流体に存在する金属粒子等の微小な物質が該孔及び/又は連通孔に吸着しやすいものと考えられる。本発明のポリイミド系樹脂多孔質体は、また、更に、カルボキシ基、塩型カルボキシ基及び-NH-結合からなる群より選択される少なくとも1つを有するので、これらの基が備える電荷又はクーロン力により、流体に含まれる金属粒子、例えば金属イオンや金属凝集体(例えば、金属酸化物の凝集体、金属と有機物との凝集体)を吸引しやすく、多孔質体における孔及び/又は多孔質体への吸着を助長することができるものと考えられ、また、イオン交換樹脂としても機能することができるものと考えられる。
・テトラカルボン酸二無水物:ピロメリット酸二無水物
・ジアミン:4,4’-ジアミノジフェニルエーテル
・ポリアミド酸溶液:ピロメリット酸二無水物と4,4’-ジアミノジフェニルエーテルとの反応物(固形分21.9質量%(有機溶剤:N,N-ジメチルアセトアミド))
・ポリアミドイミド溶液:重合成分として無水トリメリット酸及びo-トリジンジイソシアネートを含むポリアミドイミド(Mw:約3万;固形分14.0質量%(有機溶剤:N-メチル-2-ピロリドン))。
・有機溶剤(1):N,N-ジメチルアセトアミド(DMAc)
・有機溶剤(2):ガンマブチロラクトン
・有機溶剤(3):N-メチル-2-ピロリドン(NMP)
・分散剤:ポリオキシエチレン二級アルキルエーテル系分散剤
・微粒子 :シリカ(1):平均粒径700nmのシリカ
シリカ(2):平均粒径300nmのシリカ
・エッチング液(1):
メタノール:水(質量比3:7)の混合液のNaOH 1.1質量%溶液
・エッチング液(2):
メタノール:水(質量比1:9)の混合液のNaOH 0.5質量%溶液
・エッチング液(3):
メタノール:水(質量比4:6)の混合液の水酸化テトラメチルアンモニウム(TMAH) 1.0質量%溶液
[シリカ分散液の調製-1]
有機溶剤(1)23.1質量部及び分散剤 0.1質量部の混合物に、表1に示すシリカ(1)又はシリカ(2)を23.1質量部添加し、撹拌してシリカ分散液を調製した。
ポリアミド酸溶液41.1質量部に、シリカ分散液の調製-1で得たシリカ分散液を42.0質量部添加し、更に有機溶剤(1)及び(2)をワニス全体における溶剤組成が有機溶剤(1):有機溶剤(2)=90:10となるようにそれぞれ追加し、撹拌してワニスを調製した。なお、得られたワニスにおけるポリアミド酸とシリカとの体積比は40:60(質量比は30:70)である。
上記のワニスを、基材としてポリエチレンテレフタレート(PET)フィルムにアプリケーターを用い成膜した。90℃で5分間プリベークして、膜厚40μmの未焼成複合体(未焼成複合膜)を製造した。水に3分間浸漬したのち、2本のロール間に未焼成複合膜を通して、未焼成複合膜をプレスした。その際、ロール抑え圧は3.0kg/cm2、ロール温度は80℃、未焼成複合膜の移動速度は0.5m/minであった。基材から未焼成複合体を剥離して未焼成複合体を得た。
上記未焼成複合膜を表1に記載した温度で各15分間加熱処理(焼成)を施し、イミド化させ、ポリイミド-微粒子複合体を得た。
上記で得たポリイミド-微粒子複合体を、10%HF溶液中に10分間浸漬することで、膜中に含まれる微粒子を除去した後水洗及び乾燥を行い、ポリイミド多孔質体を得た。
イミド結合開環工程として、表1の「CE」欄に示すケミカルエッチング条件に従い、ポリイミド多孔質体を所定のケミカルエッチング液に所定時間浸漬してイミド結合開環工程を施し、ポリイミド多孔質体としてポリイミド多孔質膜を得た。表1に示すケミカルエッチング条件は下記のとおりである。その後、表1に示す温度及び時間で再焼成を行った。
条件1:エッチング液(1)中に2分間浸漬する
条件2:エッチング液(2)中に5分間浸漬する
[シリカ分散液の調製-2]
シリカ(2)19.3質量部、有機溶剤(3)19.3質量部及び分散剤 0.1質量部を混合し撹拌してシリカ分散液を調製した。
ポリアミドイミド溶液53.6質量部に、シリカ分散液の調製-2で得たシリカ(2)分散液を35.0質量部添加し、更に有機溶剤(1)及び(3)をワニス全体における溶剤組成が有機溶剤(1):有機溶剤(3)=5:95となるようにそれぞれ追加し、撹拌してワニスを調製した。なお、得られたワニスにおけるポリアミドイミドとシリカ(2)との体積比は40:60(質量比は30:70)である。
上記のワニスを、PETフィルム上にアプリケーターを用い成膜した。90℃で5分間プリベークして、膜厚40μmの未焼成複合体(未焼成複合膜)を製造した。水に3分間浸漬したのち、2本のロール間に未焼成複合膜を通して、未焼成複合膜をプレスした。その際、ロール抑え圧は3.0kg/cm2、ロール温度は80℃、未焼成複合膜の移動速度は0.5m/minであった。基材から未焼成複合体を剥離してポリアミドイミド-微粒子複合体を得た。ポリアミドイミド-微粒子複合体に対し280℃で15分間加熱処理(焼成)を施し、ポリアミドイミド-微粒子複合体を得た。
上記で得たポリアミドイミド-微粒子複合体を、10%HF溶液中に10分間浸漬することで、膜中に含まれる微粒子を除去した後水洗及び乾燥を行い、多孔質ポリアミドイミド膜を得た。その後、イミド結合開環工程としてのケミカルエッチング及び再焼成は行わず、ポリアミドイミド多孔質体(ポリアミドイミド多孔質膜)とした。
比較例1としてポリアミド(ナイロン)製多孔質膜(孔サイズ:約10nm以下、膜厚約75μm)、比較例2としてポリエチレン製多孔質膜(孔サイズ:約10nm以下、膜厚約50μm)をそれぞれ用意した。
上記により用意した各多孔質膜について下記評価を行った。
[空隙率]
各多孔質膜の製造において使用した各樹脂と微粒子との合計質量に対する、微粒子の質量を空隙率(質量%)とした。
イミド結合開環工程としてケミカルエッチング処理を行った多孔質膜については表1に示す温度で15分間再焼成したのち、フーリエ変換型赤外分光(FT-IR)装置により測定したイミド結合を表すピークの面積を、同じくFT-IR装置により測定したベンゼンを表すピークの面積で除した値(前記X2)を求めた。各多孔質膜と同様のワニスにより作成した多孔質膜(実質的にイミド化反応が完結した、ケミカルエッチング処理を行わない膜)について測定した値(前記X1)を求め、不変化率(%)を求めた。各不変化率とX2の値について、それぞれ表1に併記する。
用意した各多孔質膜を3cm×3mmの大きさに切り出して短冊状のサンプルを得た。このサンプルの破断時の応力(MPa;引張強度)及び破断伸度(%GL)を、EZ Test(島津製作所社製)を用いて評価した。結果を表1に表す。
鉄及びニッケルを純水に添加して調製した金属不純物含有液を、該液の鉄、ニッケルの各含有量(A)を測定したのち、用意した各多孔質膜をフィルターとして用いて通液し、通液後の液の金属不純物量(B)を測定し、下記式で表される値をメタル除去率(%)とした。結果を表1に表す。
(A-B)/B×100
用意した各多孔質膜を直径47mmの円形に切り取って濾材として用い、0.08MPaで窒素加圧しながら純水を通液し、流速(ml/分)を測定した。結果を表1に表す。
上記の各多孔質膜に対して、厚さ約40μmのサンプルを、5cm角に切り出した。ガーレー式デンソメーター(東洋精機社製)を用いて、JIS P 8117に準じて、100mlの空気が上記サンプルを通過する時間を測定した。結果を表1に表す。
実施例1及び2と同じポリイミド多孔質体の試験片を用意し、酢酸ブチルとシクロヘキサノンに室温で24時間浸漬した後の影響を確認した。具体的に、浸漬前の引張強度を100%とした場合の浸漬後の引張強度の低下率を求めた。引張強度は、上述の破断時の応力の測定方法と同様にして測定した。引張強度の低下率はいずれの溶媒でも1%未満であり、溶剤による影響がほとんどないことが確認できた。
実施例1と実施例2から、平均空孔サイズが大きいと、流速及びメタル除去率(吸着率)の両方の向上が可能になることがわかった。
実施例2及び実施例3から、イミド結合開環工程としてのケミカルエッチングの条件としては比較的弱い条件2よりも条件1の方が結果が良好であることがわかった。
実施例2及び実施例4から、イミド結合開環工程としてのケミカルエッチングの条件1によりイミド化率を下げると、メタル除去率(吸着率)を良好に維持したまま、流速の向上が可能になることがわかった。
実施例5から、ポリアミドイミド多孔質体は、イミド結合開環工程としてのケミカルエッチングを行わなくても、比較例と同等の流速を維持しつつ、メタル除去率(吸着率)の向上が可能になることがわかった。これは、ポリアミドイミドが有する-NH-結合によるものと考えられる。
実施例2と同様のポリイミド多孔質体を備えるフィルターデバイスを用意した。
ケミカルエッチング液としてエッチング液(3)を用いた他は、実施例2と同様にしてポリイミド多孔質体を得た。得られたポリイミド多孔質体の前記X2のイミド化率は、1.51であった。ガーレー透気度は230秒であった。そのポリイミド多孔質体を備えるフィルターデバイスを用意した。
ポリアミド(ナイロン)製多孔質膜(孔サイズ:約20nm)を備えるフィルターデバイス(Pall社製、Dispo)を用意した。
実施例6及び7並びに比較例3により用意した各フィルターデバイスについて、表2に示す通液対象を用いて、下記評価を行った。
[メタル除去率]
以下の樹脂溶液及び化学増幅型レジスト組成物を調製し、メタル除去率を評価した。メタル除去率は、上述のメタル除去率の評価と同様の式により求めた。通液前の樹脂溶液又は化学増幅型レジスト組成物の鉄含有量を(A)とし、用意した各フィルターデバイスによる通液後の液の鉄不純物量を(B)とした。ろ過条件は、いずれの場合も、室温で濾過圧1.0kgf/cm2(9.8N/cm2)とした。
下記高分子化合物(1)~(3)をそれぞれ、プロピレングリコールモノメチルエーテルアセテート:プロピレングリコールモノメチルエーテル=60:40(質量比)の混合溶剤に溶解した4質量%の樹脂溶液。
上記高分子化合物(1)100質量部と、下記酸発生剤(1)3.6質量部と、トリ-n-オクチルアミン0.4質量部とを、プロピレングリコールモノメチルエーテルアセテート:プロピレングリコールモノメチルエーテル=60:40(質量比)の混合溶剤と、混合し、高分子化合物(1)の固形分濃度が約7%になるように調製して化学増幅型レジスト組成物(以下、「レジスト(1)」ということがある。)を得た。
Claims (12)
- ポリイミド及び/又はポリアミドイミドがカルボキシ基、塩型カルボキシ基及び-NH-結合からなる群より選択される少なくとも1つを有する、ポリイミド及び/又はポリアミドイミド多孔質体。
- 内面に曲面を有する孔を含有する多孔質体である、請求項1記載のポリイミド及び/又はポリアミドイミド多孔質体。
- 前記曲面を有する孔が連通孔を形成している、請求項2記載のポリイミド及び/又はポリアミドイミド多孔質体。
- ポリイミド及び/又はポリアミドイミドにおけるイミド結合の一部からカルボキシ基及び/又は塩型カルボキシ基を形成する工程を含む、請求項1~4のいずれか1項記載のポリイミド及び/又はポリアミドイミド多孔質体の製造方法。
- 請求項1~4のいずれか1項記載のポリイミド及び/又はポリアミドイミド多孔質体を用いて、ろ過、単離、除去、捕捉、精製及び篩いからなる群より選択される少なくとも1つを含むものであってもよい分離並びに/又は吸着を行う方法。
- 半導体製造において行う、請求項6記載の方法。
- 請求項1~4のいずれか1項記載のポリイミド及び/又はポリアミドイミド多孔質体からなる分離材。
- 請求項1~4のいずれか1項記載のポリイミド及び/又はポリアミドイミド多孔質体からなる吸着材。
- 請求項1~4のいずれか1項記載のポリイミド及び/又はポリアミドイミド多孔質体からなるフィルターメディア。
- 他の濾材と請求項10記載のフィルターメディアとを含む積層体。
- 請求項1~4のいずれか1項記載のポリイミド及び/又はポリアミドイミド多孔質体を含むフィルターデバイス。
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KR1020177022060A KR102048131B1 (ko) | 2015-02-06 | 2016-02-03 | 폴리이미드 및/또는 폴리아미드이미드 다공질체 및 그의 제조 방법, 분리 및/또는 흡착을 수행하는 방법, 분리재, 흡착재, 필터 미디어, 적층체 및 필터 디바이스 |
CN201680009021.7A CN107207760B (zh) | 2015-02-06 | 2016-02-03 | 聚酰亚胺及/或聚酰胺酰亚胺多孔质体及其制造方法和用途 |
JP2016573402A JP6426209B2 (ja) | 2015-02-06 | 2016-02-03 | ポリイミド及び/又はポリアミドイミド多孔質体並びにその製造方法、分離及び/又は吸着を行う方法、分離材、吸着材、フィルターメディア、積層体、並びに、フィルターデバイス |
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US11043718B2 (en) | 2019-02-14 | 2021-06-22 | Fujifilm Business Innovation Corp. | Porous polyimide film and battery |
JPWO2019239865A1 (ja) * | 2018-06-13 | 2021-07-08 | 東洋紡株式会社 | ポリマーブレンドフィルムおよび積層体 |
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WO2020176742A1 (en) * | 2019-02-27 | 2020-09-03 | Entegris | Polyimide-containing filtration membrane, filters, and methods |
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CN112111219B (zh) * | 2019-06-20 | 2023-04-14 | 东京应化工业株式会社 | 清漆组合物、聚酰亚胺多孔质膜的前体膜及其制造方法、以及聚酰亚胺多孔质膜的制造方法 |
US20220363829A1 (en) * | 2019-10-11 | 2022-11-17 | Aerogel Technologies, Llc | Hydrophobic polyimide aerogels |
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KR102048131B1 (ko) | 2019-11-22 |
US10576432B2 (en) | 2020-03-03 |
KR20170103896A (ko) | 2017-09-13 |
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