WO2016076111A1 - ガスパージ用フィルタ - Google Patents
ガスパージ用フィルタ Download PDFInfo
- Publication number
- WO2016076111A1 WO2016076111A1 PCT/JP2015/080349 JP2015080349W WO2016076111A1 WO 2016076111 A1 WO2016076111 A1 WO 2016076111A1 JP 2015080349 W JP2015080349 W JP 2015080349W WO 2016076111 A1 WO2016076111 A1 WO 2016076111A1
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- WO
- WIPO (PCT)
- Prior art keywords
- gas
- filter
- pad
- purge
- gas purge
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0002—Casings; Housings; Frame constructions
- B01D46/0005—Mounting of filtering elements within casings, housings or frames
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/42—Auxiliary equipment or operation thereof
- B01D46/4272—Special valve constructions adapted to filters or filter elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/52—Particle separators, e.g. dust precipitators, using filters embodying folded corrugated or wound sheet material
- B01D46/521—Particle separators, e.g. dust precipitators, using filters embodying folded corrugated or wound sheet material using folded, pleated material
- B01D46/525—Particle separators, e.g. dust precipitators, using filters embodying folded corrugated or wound sheet material using folded, pleated material which comprises flutes
- B01D46/526—Particle separators, e.g. dust precipitators, using filters embodying folded corrugated or wound sheet material using folded, pleated material which comprises flutes in stacked arrangement
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K15/00—Check valves
- F16K15/02—Check valves with guided rigid valve members
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K15/00—Check valves
- F16K15/02—Check valves with guided rigid valve members
- F16K15/025—Check valves with guided rigid valve members the valve being loaded by a spring
- F16K15/026—Check valves with guided rigid valve members the valve being loaded by a spring the valve member being a movable body around which the medium flows when the valve is open
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K15/00—Check valves
- F16K15/02—Check valves with guided rigid valve members
- F16K15/025—Check valves with guided rigid valve members the valve being loaded by a spring
- F16K15/026—Check valves with guided rigid valve members the valve being loaded by a spring the valve member being a movable body around which the medium flows when the valve is open
- F16K15/028—Check valves with guided rigid valve members the valve being loaded by a spring the valve member being a movable body around which the medium flows when the valve is open the valve member consisting only of a predominantly disc-shaped flat element
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2279/00—Filters adapted for separating dispersed particles from gases or vapours specially modified for specific uses
- B01D2279/35—Filters adapted for separating dispersed particles from gases or vapours specially modified for specific uses for venting arrangements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2279/00—Filters adapted for separating dispersed particles from gases or vapours specially modified for specific uses
- B01D2279/45—Filters adapted for separating dispersed particles from gases or vapours specially modified for specific uses for electronic devices, e.g. computers, hard-discs, mobile phones
Definitions
- the present invention relates to a gas purge filter used for a storage container used when storing, storing, transporting, transporting, or the like, a substrate made of a semiconductor wafer or the like.
- the container body has a cylindrical wall part in which an opening part of the container body is formed at one end and the other end is closed.
- the lid can be attached to and detached from the container body opening, and the container body opening can be closed.
- a storage space for storing a substrate or the like is formed in the storage container.
- the storage space is formed by being surrounded by the wall portion of the container body and the inner surface of the lid, and can store a plurality of substrates.
- a front retainer is provided in a portion of the lid that faces the storage space when the container body opening is closed.
- the front retainer can support the edges of the plurality of substrates when the container main body opening is closed by the lid.
- the back substrate support portion is provided on the wall portion so as to be paired with the front retainer.
- the back side substrate support part can support the edges of a plurality of substrates.
- the container body is provided with a filter.
- a check valve is provided inside the filter as necessary. Gas purge is performed with dry air (hereinafter referred to as purge gas) from which inert gas such as nitrogen or moisture has been removed (1% or less) through the filter to the storage space from the outside of the storage container.
- purge gas dry air
- the check valve prevents the gas filled in the storage space by the gas purge from leaking (see Patent Documents 3 to 4).
- the filter is attached to a through hole (access opening) provided for attaching the filter to the container body.
- the filter housing (grommet) is made of an elastic material (Patent Document 5).
- Patent Document 5 in order to make a container main body and a filter into a sealing structure, the filter housing (grommet) is made of an elastic material (Patent Document 5).
- Patent Document 5 in order to perform the gas purge, it is necessary to closely contact the purge port of the gas purge device and the filter.
- the filter housing is formed of an elastic material. Therefore, when the purge port is pressed against the filter, the filter housing at the portion where the purge port abuts is elastically deformed, and the tip of the purge port and the filter are It can adhere. Thereby, the storage space of the storage container can be efficiently purged with the purge gas.
- Japanese Patent No. 4204302 Japanese Patent No. 4201583 Japanese Patent No. 5241607 JP 2007-533166 A Japanese Patent No. 5213440
- the storage container and the filter can be easily sealed, and the adhesion between the filter and the purge port can be secured, so that efficient gas purging can be performed.
- the ventilation space through which the purge gas of the filter housing passes is also formed of an elastic material, and the purge gas touches the elastic material and flows into the storage space.
- the elastic material is a material that has high moisture absorption and water absorption and has a lot of outgas.
- the purge gas is purged with the purge gas, the purge gas passes through the ventilation space of the filter housing formed of an elastic material, so that moisture contained in the elastic material and outgas not good for the semiconductor wafer are included in the purge gas.
- the environment inside the storage container could not be kept clean. Because of this problem, there is a problem that the yield of the semiconductor chip is lowered.
- the filter housing is made of low outgas, low moisture absorption and low water absorption resin, the above problem can be solved.
- the elasticity decreases, so the adhesion with the purge port decreases, and the purge port
- the purge gas leaks from the front end of the purge port due to a decrease in the adhesion between the filter housing and the purge port, and the gas purge efficiency decreases. Therefore, there has conventionally been a problem that the above problems cannot be solved simultaneously.
- An object of the present invention is to provide a gas purge filter that can efficiently replace the gas in the storage space of the storage container with a purge gas and maintain the cleanliness inside the storage container.
- the present invention provides a container main body having a container main body opening at one end, and a storage in which a storage space is formed by a lid that is detachable from the container main body opening and can close the container main body opening.
- a gas purge filter attached to an access opening capable of communicating the space outside the storage container and the storage space formed in at least one of the container main body and the lid in the container, and the space outside the storage container
- a filter housing having a ventilation space capable of venting the gas and the gas in the storage space, and an outer peripheral surface of a nozzle portion formed outside the storage space of the filter housing and forming a part of the ventilation space.
- the filter housing is made of a thermoplastic resin, and the pad is made of an elastic body. And features.
- a gas purge comprising a nozzle tip formed at the tip of the nozzle in the outer direction of the storage space and a pad outer tip formed at the tip of the pad in the outer direction of the storage space.
- the position of the pad outer tip is the same as the position of the nozzle tip or projects outward in the storage space. .
- the position of the nozzle tip protrudes outward from the position of the pad outer tip.
- the shape of the inner diameter of the pad outer tip in the state of the single pad is smaller than the outer diameter of the nozzle tip.
- the ventilation space of the filter housing has a check valve mechanism for restricting the gas flow direction to a certain direction.
- the present invention it is possible to provide a gas purging filter capable of efficiently replacing the gas in the storage space of the storage container with the purge gas and maintaining the cleanliness inside the storage container. Therefore, since the rate at which the semiconductor wafer is exposed to an inert gas or dry air can be increased, the yield of semiconductor chips fabricated on the semiconductor wafer can be improved. Furthermore, since the gas replacement by the purge gas can be performed efficiently in a short time, the process time can be shortened and the cost can be reduced.
- FIG. 2 is an exploded perspective view showing a state in which a gas purging filter 80 according to the first embodiment of the present invention is attached to a storage container 1 and a substrate W is stored.
- FIG. 3 is a lower perspective view showing a state where the gas purge filter 80 according to the first embodiment of the present invention is attached to the storage container 1. It is a top perspective view showing filter 80 for gas purge concerning a 1st embodiment of the present invention. It is a downward perspective view showing filter 80 for gas purge concerning a 1st embodiment of the present invention. It is a disassembled perspective view which shows the filter 80 for gas purges concerning 1st Embodiment of this invention.
- FIG. 3 is a cross-sectional view showing a portion where the gas purging filter 80 according to the first embodiment of the present invention is attached to the storage container 1.
- FIG. FIG. 6 is an enlarged cross-sectional view of the vicinity of a gas purge filter tip 406 in FIG. 5.
- FIG. 8 is an enlarged cross-sectional view of the vicinity of a gas purge filter tip 406A of a gas purge filter 80A according to a second embodiment of the present invention, showing a state before coming into contact with a purge port 800.
- FIG. 10 is an enlarged cross-sectional view of the vicinity of a gas purge filter tip 406A of a gas purge filter 80A according to a second embodiment of the present invention, showing a state in contact with a purge port 800.
- FIG. 10 is an enlarged cross-sectional view of the vicinity of a gas purge filter tip 406B of a gas purge filter 80B according to a third embodiment of the present invention, showing a state before coming into contact with a purge port 800B.
- FIG. 9 is an enlarged cross-sectional view of the vicinity of a gas purge filter tip 406B of a gas purge filter 80B according to a third embodiment of the present invention, showing a state in contact with a purge port 800B.
- It is a disassembled perspective view which shows 80 C of gas purge filters which concern on 4th Embodiment of this invention.
- It is sectional drawing of the gas purge filter for supply of the gas purge filter 80C which concerns on 4th Embodiment of this invention.
- It is sectional drawing of the gas purge filter for exhaust of the gas purge filter 80C which concerns on 4th Embodiment of this invention.
- FIG. 1 is an exploded perspective view showing a state in which a gas purging filter 80 according to a first embodiment of the present invention is attached to a storage container 1 and a substrate W is stored.
- FIG. 2 is a lower perspective view showing the gas purge filter 80 according to the first embodiment of the present invention attached to the storage container 1.
- FIG. 3A is an upper perspective view showing the gas purge filter 80 according to the first embodiment of the present invention.
- FIG. 3B is a lower perspective view showing the gas purge filter 80 according to the first embodiment of the present invention.
- FIG. 4 is an exploded perspective view showing the gas purge filter 80 according to the first embodiment of the present invention.
- FIG. 5 is a cross-sectional view showing a portion where the gas purging filter 80 according to the first embodiment of the present invention is attached to the storage container 1.
- FIG. 6 is an enlarged cross-sectional view of the vicinity of the gas purge filter tip 406 in FIG.
- a direction from the container body 2 described later to the lid 3 is defined as the front direction, and the opposite direction is defined as the rear direction. Also defined as the front-rear direction.
- a direction (upward direction in FIG. 1) from the lower wall 24 described later to the upper wall 23 is defined as an upward direction, the opposite direction is defined as a downward direction, and these are collectively defined as an up-down direction.
- a direction from the second side wall 26 to the first side wall 25 to be described later is defined as the left direction, and the opposite direction is defined as the right direction. Left and right direction.
- the substrate W (see FIG. 1) stored in the storage container 1 is a disk-shaped silicon wafer, glass wafer, sapphire wafer, etc., and is a thin one used in the industry.
- the substrate W in this embodiment is a silicon wafer having a diameter of 300 mm to 450 mm.
- the storage container 1 is used as an in-process container for storing a substrate W made of a silicon wafer as described above and transporting it in a process in a factory, or by land transportation means / air transportation means / sea transportation means.
- a transportation means such as a container body 2, a lid 3, a substrate support plate-like portion 5 as a side substrate support portion, and a back side substrate support portion. (Not shown) and a front retainer (not shown) as a lid side substrate support portion.
- the container body 2 has a cylindrical wall portion 20 in which a container body opening 21 is formed at one end and the other end is closed.
- a storage space 27 is formed in the container body 2.
- the storage space 27 is formed so as to be surrounded by the wall portion 20.
- the substrate support plate-like portion 5 is disposed in a portion of the wall portion 20 that forms the storage space 27. As shown in FIG. 1, a plurality of substrates W can be stored in the storage space 27.
- the substrate support plate-like portion 5 is provided on the wall portion 20 so as to form a pair in the storage space 27.
- the substrate support plate-like portion 5 abuts the edges of the plurality of substrates W to separate the adjacent substrates W at a predetermined interval.
- the edges of the plurality of substrates W can be supported in a state where they are aligned in parallel.
- a back side substrate support part (not shown) is provided on the back side of the substrate support plate-like part 5.
- the back substrate support (not shown) is provided on the wall 20 so as to be paired with a front retainer (not shown) in the storage space 27.
- the back substrate support (not shown) abuts the edges of the plurality of substrates W, thereby The rear part can be supported.
- the lid 3 can be attached to and detached from the opening peripheral edge portion 31 (FIG. 1 and the like) forming the container body opening 21 and can close the container body opening 21.
- the front retainer (not shown) is provided in a portion of the lid 3 that faces the storage space 27 when the container main body opening 21 is closed by the lid 3.
- the front retainer (not shown) is disposed inside the storage space 27 so as to be paired with the back side substrate support portion (not shown).
- the front retainer (not shown) supports the front part of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. Is possible.
- the front retainer (not shown) supports the plurality of substrates W in cooperation with the back side substrate support portion (not shown) when the container body opening 21 is closed by the lid 3.
- a plurality of substrates W are held in a state in which adjacent substrates W are separated from each other at a predetermined interval and arranged in parallel.
- the storage container 1 is made of a resin such as a plastic material.
- the resin of the material include polycarbonate, cycloolefin polymer, polyetherimide, polyetherketone, and polybutylterephthalate. And thermoplastic resins such as polyetheretherketone and liquid crystal polymer, and alloys thereof.
- conductive substances such as carbon fibers, carbon powder, carbon nanotubes, and conductive polymers are selectively added. It is also possible to add glass fiber, carbon fiber or the like in order to increase the rigidity.
- the wall portion 20 of the container body 2 includes a back wall 22, an upper wall 23, a lower wall 24, a first side wall 25, and a second side wall 26.
- the back wall 22, the upper wall 23, the lower wall 24, the first side wall 25, and the second side wall 26 are made of the above-described materials and are integrally formed.
- the first side wall 25 and the second side wall 26 face each other, and the upper wall 23 and the lower wall 24 face each other.
- the rear end of the upper wall 23, the rear end of the lower wall 24, the rear end of the first side wall 25, and the rear end of the second side wall 26 are all connected to the back wall 22.
- the front end of the upper wall 23, the front end of the lower wall 24, the front end of the first side wall 25, and the front end of the second side wall 26 have a positional relationship facing the back wall 22 and have a substantially rectangular shape.
- the opening peripheral part 31 which forms is comprised.
- the opening periphery 31 is provided at one end of the container body 2, and the back wall 22 is located at the other end of the container body 2.
- the outer shape of the container body 2 formed by the outer surface of the wall portion 20 is box-shaped.
- the inner surface of the wall 20, that is, the inner surface of the back wall 22, the inner surface of the upper wall 23, the inner surface of the lower wall 24, the inner surface of the first side wall 25, and the inner surface of the second side wall 26 are surrounded by the storage space 27. Is forming.
- the container main body opening 21 formed in the opening peripheral edge portion 31 is surrounded by the wall portion 20 and communicates with a storage space 27 formed inside the container main body 2. A maximum of 25 substrates W can be stored in the storage space 27.
- latch engaging recesses 40 ⁇ / b> A and 40 ⁇ / b> B that are recessed toward the outside of the storage space 27 in the upper wall 23 and the lower wall 24 and in the vicinity of the opening peripheral edge 31. 41A and 41B are formed. A total of four latch engagement recesses 40A, 40B, 41A, 41B are formed in the vicinity of the left and right ends of the upper wall 23 and the lower wall 24, one each.
- a rib 28 is provided integrally with the upper wall 23.
- the rib 28 is provided to increase the rigidity of the container body.
- top flange 29 is fixed to the central portion of the upper wall 23.
- the top flange 29 is a member that is a portion that is hung and suspended in the storage container 1 when the storage container 1 is suspended in an AMHS (automatic wafer transfer system), a PGV (wafer substrate transfer carriage), or the like.
- through holes 45 as access openings are formed at the four corners of the lower wall 24 as ventilation paths.
- the two through holes 45 in front of the lower wall 24 are exhaust holes for discharging the gas inside the container, and the two through holes 45 in the rear are gas inside the container. It is an air supply hole for supplying air.
- Gas purge filters 80 are respectively disposed in the through holes 45 of the air supply holes and the exhaust holes.
- the gas purge filter 80 includes a first housing 100, a second housing 200, a filter body 150, and a pad 300 as the filter housing 90.
- the first housing 100 includes an upper first housing 101 and a lower first housing 102, and a filter body 150 is sandwiched between the upper first housing 101 and the lower first housing 102.
- the upper first housing 101 and the lower first housing 102 are welded and fixed by ultrasonic waves.
- the gas purge filter 80 is disposed on the lower wall 24 of the container body 2 so that the upper first housing 101 is on the storage space 27 side.
- the gas purge filter 80 may be attached to a wall portion other than the lower wall 24 or a lid.
- a storage space side opening 120 is formed in the upper first housing 101 disposed on the storage space 27 side of the gas purge filter 80, and a storage space outside opening is formed on the gas purge filter 80 on the space side outside the storage container 1. 121 is formed. These openings allow the inside and outside of the storage container 1 to communicate with each other through the ventilation space 110 inside the gas purge filter 80.
- the gas purge filter 80 passes through the filter body 150 from the space outside the container body 2 to the storage space 27 (hereinafter, defined as “inside direction of the storage space”) or from the storage space 27 to the container body.
- the gas can pass in the direction toward the external space 2 (hereinafter, defined as “outside direction of the storage space”).
- the filter body 150 prevents the particles contained in the gas from passing through.
- the upper first housing 101 is provided with an upper ventilation space 111 communicating with the storage space side opening 120.
- the lower first housing 102 is formed with a nozzle portion 103 having a substantially annular cylindrical shape that protrudes toward the outer side of the storage space (downward in FIG. 5).
- a nozzle tip portion 106 is formed at the tip portion in the outer direction of the storage space of the nozzle portion 103.
- a lower ventilation space 112 connected to the upper ventilation space 111 is formed in the lower first housing 102 and is connected to a nozzle portion ventilation space 113 formed inside the nozzle portion 103. Accordingly, the upper ventilation space 111, the lower ventilation space 112, and the nozzle portion ventilation space 113 form a ventilation space 110 that connects the storage space side opening 120 and the storage space outer opening 121 of the gas purge filter 80.
- a screw part 104 is formed in the lower first housing 102 so as to cover the outer side of the nozzle part 103 in the radial direction.
- a space for holding a pad 300, which will be described later, is formed between the nozzle portion 103 and the screw portion 104.
- the inside of the storage space (upward direction in FIG. 5).
- a pad abutting portion 105 with which the pad abuts is provided.
- a substantially cylindrical elastic pad 300 is provided so as to cover the outer peripheral surface of the nozzle portion 103 of the lower first housing 102.
- a pad outer front end 306 is formed in the outer direction of the storage space of the pad 300 on the substantially cylindrical shape, and a pad inner front end 305 is formed in the inner direction of the storage space.
- a pad shoulder portion 304 that is a step is formed inwardly of the storage space with respect to the pad outer front end portion 306.
- a pad inner diameter convex portion 310 that abuts on the outer periphery of the nozzle tip portion 106 of the nozzle portion 103 of the lower first housing 102 is formed on the pad outer tip portion 306.
- the pad inner diameter convex portion 310 seals the pad 300 and the nozzle portion 103. Therefore, the inner diameter of the pad inner diameter convex portion 310 of the pad 300 (the inner diameter of the pad outer front end portion 306) is formed smaller than the outer diameter of the nozzle front end portion 106. Therefore, the pad 300 is assembled so that the pad outer front end portion 306 is press-fitted into the nozzle front end portion 106 by utilizing its elasticity.
- the nozzle tip portion 106 and the pad outer tip portion 306 constitute a gas purge filter tip portion 406, which is in contact with the purge port 800 of the gas purge device, and gas purge is executed.
- the positions of the nozzle tip 106 and the pad outer tip 306 are the same.
- the outer surface of the storage space has the same height.
- the inner surface of the second housing 200 is provided with a screw that engages with the screw portion 104 of the lower first housing 102.
- the pad shoulder 304 of the pad 300 is pushed by the second housing holding portion 210 of the second housing 200, and the pad inner front end portion 305 of the pad 300 is pushed to the lower first housing 102.
- the pad 300 is fixed to the first housing 100 by being pressed against the pad contact portion 105.
- the direction in which the second housing retainer 210 of the second housing 200 of the pad shoulder 304 is pushed is the moving direction when the second housing 200 is screwed into the first housing 100, and when the second housing 200 is screwed in.
- a force applied to the pad 300 (second housing fixing force) is received by the pad contact portion 105 of the lower first housing 102. For this reason, even if the pad 300 is fixed to the first housing 100, the airtightness of the pad outer front end portion 306 and the nozzle front end portion 106 is ensured.
- the second housing 200 is used not only to fix the pad 300 to the first housing 100 but also to fix the gas purge filter 80 to the lower wall 24.
- an O-ring 114 is used between the gas purging filter 80 and the through hole 45 of the lower wall 24 for sealing.
- a cycloolefin polymer that generates a small amount of outgas and has low water absorption and hygroscopicity was used.
- any thermoplastic resin having a predetermined water absorption or moisture absorption or less and a predetermined outgas generation amount or less may be used.
- a resin such as polycarbonate, polyetherimide, or polyetheretherketone should be used.
- the pad 300 is made of polyolefin elastomer as an elastic member.
- resins such as polybutylene terephthalate and polyethylene, elastomers such as polyethylene elastomer, and rubber materials such as silicon rubber and fluororubber can be used.
- gas replacement (gas purge) by the gas purge device is performed as follows.
- the storage container 1 is used as an in-process container in a process in a factory
- the lower wall 24 is located in the lower part
- the upper wall 23 is located in the upper part in the container body 2.
- the gas purging method using the gas purging filter 80 of the storage container 1 is performed with the lid 3 closing the container body opening 21 of the container body 2 and with the lid 3 removed from the storage container 1.
- the gas purging device is connected to the gas purge filter tip 406 of the gas purge filter 80 provided in the through hole 45 of the lower wall 24 of the container body 2.
- the purge port tip 802 of the purge port 800 contacts. Since the pad 300 that is an elastic body is provided in the periphery of the opening of the nozzle portion 103 of the first housing 100, the purge port tip 802 and the gas purge filter tip 406 when the purge port 800 comes into contact. Airtightness (sealing) between the two can be reliably performed.
- the purge gas is supplied from the gas purge device, and the purge gas supplied from the purge gas flow passage 801 passes through the nozzle portion ventilation space 113, the lower ventilation space 112, and the upper ventilation space 111, which are the ventilation spaces 110, and passes through the storage container 1. It is supplied to the storage space 27. At this time, unnecessary particles do not enter the storage space 27 by passing through the filter body 150.
- the gas inside the storage container 1 is discharged to the outside of the storage container 1 from another gas purge filter 80, and the gas purge is performed.
- the diameter of the purge gas flow passage 801 is smaller than the storage space outer opening 121 of the gas purge filter 80, and the outer shape of the purge port is larger than the outer shape of the nozzle tip portion 106.
- the discharged purge gas is all supplied to the nozzle portion ventilation space 113, and the purge gas is not touched at all to the pad 300, which is an elastic body, and the gas purge is performed.
- the elastic pad 300 is useful.
- the pad 300 is an elastic body, when the purge gas contacts the pad 300 of the elastic body, the moisture contained in the pad 300 and a substance that adversely affects the substrate, which is a stored item, are included in the purge gas, which is stored. It will be discharged into the storage space 27 of the container 1.
- the inner diameter of the pad outer front end portion 306 is set to be smaller than the outer diameter of the nozzle front end portion 106 when the pad 300 is a single body (that is, before the pad 300 is incorporated into the gas purge filter 80). And the nozzle part 103 are improved in adhesion. Therefore, in a state where the pad 300 is attached to the first housing 100 by the second housing 200, the lower first housing 102 and the pad 300 are ensured to be airtight. Accordingly, it is possible to prevent the cleaning liquid from entering the gap 301 between the lower first housing 102 and the pad 300 when cleaning the gas purge filter 80, and to shorten the subsequent drying time.
- FIG. 7A is an enlarged cross-sectional view of the vicinity of the gas purge filter tip 406A of the gas purge filter 80A according to the second embodiment of the present invention, showing a state before coming into contact with the purge port 800.
- FIG. 7B is an enlarged cross-sectional view of the vicinity of the gas purge filter tip 406A of the gas purge filter 80A according to the second embodiment of the present invention, showing a state in contact with the purge port 800.
- the gas purge filter according to the second embodiment is an example in which the shape of the gas purge filter tip is different from the gas purge filter according to the first embodiment. Since the configuration other than this is the same as the configuration of the gas purge filter 80 according to the first embodiment, the same configuration as each configuration in the first embodiment is denoted by the same reference numeral, and the description thereof is omitted.
- the pad outer front end portion 306A has a larger storage space than the nozzle front end portion 106 of the nozzle portion 103 of the first housing 100. Projects outward.
- the pad 300A which is an elastic body, is pushed by the purge port 800 and part of the pad outer front end portion 306A. Is deformed (pad outer tip deforming portion 307A). Due to this deformation, the purge port tip 802 of the purge port 800 comes into contact with the nozzle portion 103.
- the nozzle tip portion 106 of the nozzle portion 103 and the purge port tip portion 802 of the purge port 800 come into contact with each other, and the outer periphery of the purge port 800 is sealed by the pad outer side tip deformed portion 307A. Therefore, in this embodiment, before the purge port 800 and the gas purge filter 80A are brought into contact with each other, even when the pad outer front end portion 306A protrudes outward from the nozzle front end portion 106, the gas purge is performed.
- the purge gas does not touch the pad 300A, which is an elastic body, and moisture discharged from the pad 300A during gas purge and substances that adversely affect the substrate are stored in the storage space in the storage container 1.
- the storage space 27 in the storage container 1 can be provided with a low humidity and a clean environment.
- the pad outer front end portion 306A is deformed and the purge port 800 is brought into contact with the nozzle portion 103, the adhesion between the purge port 800 and the pad outer front end portion 306A is improved, and the purge gas from the purge port 800 is more efficient. It can be discharged well into the storage space 27.
- FIG. 8A is an enlarged cross-sectional view of the vicinity of the gas purge filter tip 406B of the gas purge filter 80B according to the third embodiment of the present invention, showing a state before coming into contact with the purge port 800.
- FIG. 8B is an enlarged cross-sectional view of the vicinity of the gas purge filter tip 406B of the gas purge filter 80B according to the third embodiment of the present invention, showing a state in contact with the purge port 800.
- the gas purge filter according to the third embodiment is an example different from the case of the first embodiment in the shape of the gas purge filter tip and the shape of the purge port tip. Since the configuration other than this is the same as the configuration of the gas purge filter 80 according to the first embodiment, the same configuration as each configuration in the first embodiment is denoted by the same reference numeral, and the description thereof is omitted.
- the nozzle tip portion 106 of the nozzle portion 103 of the first housing 100 protrudes outward in the storage space from the pad outer tip portion 306B of the pad 300B.
- the purge port tip 802B is not a flat surface but is formed with a purge port annular convex portion 803B having an inner diameter larger than the outer diameter of the nozzle portion 103.
- the portion of the purge port tip 802B inside the purge port annular convex portion 803B of the purge port 800B is the nozzle. It abuts on the nozzle tip 106 of the portion 103. At that time, the purge port annular convex portion 803B bites into and deforms a part of the pad outer front end portion 306B of the pad 300B which is an elastic body recessed inward of the storage space from the nozzle front end portion (pad outer front end deforming portion 307B). .
- the nozzle tip portion 106 of the nozzle portion 103 and the purge port tip portion 802B of the purge port 800B come into contact with each other, and the outer periphery of the purge port 800B is sealed by the pad outer tip deformation portion 307B. Therefore, in this embodiment, even if the pad outer front end portion 306B protrudes more outwardly from the nozzle front end portion 106 than the nozzle front end portion 106 before the purge port 800B and the gas purge filter 80B abut, In the same way as in the first embodiment, the purge gas does not touch the pad 300B, which is an elastic body, and moisture discharged from the pad 300B during gas purge and substances that adversely affect the substrate are stored in the storage space in the storage container 1. It is possible to provide a clean environment with low humidity in the storage space 27 in the storage container 1.
- FIG. 9 is an exploded perspective view showing a gas purge filter 80C according to the fourth embodiment of the present invention.
- FIG. 10 is a cross-sectional view of the gas purge filter for supplying air in the gas purge filter 80C according to the fourth embodiment of the present invention.
- FIG. 11 is a cross-sectional view of an exhaust gas purge filter of the gas purge filter 80D according to the fourth embodiment of the present invention.
- the gas purge filters 80C and 80D according to the fourth embodiment are examples in the case where an operation member 500C that is a check valve mechanism for controlling the flow direction of the purge gas in a certain direction is added to the gas purge filter of the first embodiment. is there. Since the configuration other than this is the same as the configuration of the gas purge filter 80 according to the first embodiment, the same configuration as each configuration in the first embodiment is denoted by the same reference numeral, and the description thereof is omitted.
- 9 and 10 is a gas purge filter for supplying purge gas from the space outside the storage container 1 to the storage space 27.
- an operation member 500C which is a check valve mechanism that controls the flow direction of the purge gas in a certain direction, is disposed in the middle of the ventilation space 110 of the first filter housing 100C.
- the lower first housing 102C from which the nozzle portion of the lower first housing of the first embodiment is deleted is held inside the operating member 500C.
- a housing 400C was provided.
- a nozzle tip portion 106C is formed in the outer direction of the storage space of the inner housing 400C, and a pad 300C is provided so as to cover the outer peripheral portion thereof.
- a pad shoulder 304C is formed on the pad 300C as in the first embodiment. In order to fix the pad 300C to the first housing, the pad shoulder 304C of the pad 300C is pushed by the second housing pressing portion 210 of the second housing 200, and the inner housing 400C and the inner space of the lower first housing are moved inward. Push it in.
- the actuating member 500C which is a check valve mechanism, includes a valve body 502C and a spring 501C for biasing the valve body 502C in a certain direction.
- the valve body 502C is arranged in the outside direction of the storage space in the ventilation space 110 inside the inner housing 400C, and a spring 501C for urging the valve body 502C toward the inner surface of the inner housing 400C is used as the valve.
- the body 502C is disposed between the lower first housing 102C.
- the positional relationship between the pad outer front end portion 306C of the pad 300C and the nozzle front end portion 106C of the inner housing 400C is the same as that in the first embodiment, and thus the description thereof is omitted.
- purge gas is supplied to the storage space 27 by the same method as the purge method of the first embodiment.
- the valve body 502 ⁇ / b> C moves toward the inside of the storage space, passes through the ventilation space 110, and purge gas is supplied from the outside of the storage container 1 to the storage space 27.
- the valve body 502C closes the ventilation space 110 by the spring 501C. Therefore, the release of gas from the storage space 27 to the outside of the storage container 1 is prevented.
- valve 11 is a gas purge filter for discharging the purge gas from the storage space 27 to the outside of the storage container 1.
- the only difference from the gas purge filter 80C of FIGS. 9 and 10 is that the valve body 502C and the spring 501C of the actuating member which is a check valve mechanism are reversed in the vertical direction.
- the valve body 502C of the operating member 500D of the gas purge filter 80D moves to the outside of the storage space, and is stored. Gas is released from the space 27 to the outside of the storage container 1. Thereafter, when the pressure becomes a certain pressure or lower, the valve body 502C returns to the original position, and the release of gas from the storage space 27 to the outside of the storage container 1 stops.
- the gas purge filter according to the fourth embodiment having the above configuration, in addition to the effects of the first embodiment, it is possible to incorporate a check valve mechanism inside the filter, and purge gas into the storage space 27 of the storage container 1. Supply or discharge from the storage space 27 can be controlled, and more efficient gas purging can be performed.
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Abstract
Description
以下、本発明の第1実施形態によるガスパージ用フィルタ80について、図面を参照しながら説明する。図1は、本発明の第1実施形態に係るガスパージ用フィルタ80が収納容器1に取り付けられ、基板Wが収納された様子を示す分解斜視図である。図2は、本発明の第1実施形態に係るガスパージ用フィルタ80が収納容器1に取り付けられた様子を示す下方斜視図である。図3Aは、本発明の第1実施形態に係るガスパージ用フィルタ80を示す上方斜視図である。図3Bは、本発明の第1実施形態に係るガスパージ用フィルタ80を示す下方斜視図である。図4は、本発明の第1実施形態に係るガスパージ用フィルタ80を示す分解斜視図である。図5は、本発明の第1実施形態に係るガスパージ用フィルタ80を収納容器1に取り付けた部分を示す断面図である。図6は、図5におけるガスパージ用フィルタ先端部406の近傍を拡大した断面図である。
図1等に示すように、容器本体2の壁部20は、奥壁22と上壁23と下壁24と第1側壁25と第2側壁26とを有する。奥壁22、上壁23、下壁24、第1側壁25、及び第2側壁26は、上述した材料により構成されており、一体成形されて構成されている。
工場内の工程において収納容器1が工程内容器として用いられているときには、容器本体2において下壁24は下部に位置し上壁23は上部に位置している。この収納容器1のガスパージ用フィルタ80を用いたガスパージの方法は、蓋体3で容器本体2の容器本体開口部21を塞いで行う場合と、収納容器1から蓋体3を外した状態で行う場合の2通りがある。以下、蓋体3で容器本体2を塞いだ状態での説明を行う。
パージポート800とガスパージ用フィルタ80との当接時の気密性を確実に取るためには、弾性体のパッド300が有用である。しかし、パッド300が弾性体であるため、この弾性体のパッド300にパージガスが接触すると、パッド300の含まれる水分や収納物である基板に悪影響を及ぼす物質がパージガス中に含まれ、それが収納容器1の収納空間27に放出されてしまう。そのため、ガスパージの目的である、収納容器1の収納空間内の水分(湿度)の低下を阻害する可能性があるが、本実施形態においては、パージガスが通過する通気空間中に、弾性体が介在することがないので、ガスパージ中にパッド300から放出される水分や基板に悪影響を及ぼす物質を収納容器1内の収納空間27に放出することがなく、収納容器1内の収納空間27を低湿度でクリーンな環境を提供することができる。
次に、本発明の第2実施形態によるガスパージ用フィルタ80Aについて図7Aと図7Bを参照しながら説明する。図7Aは、本発明の第2実施形態に係るガスパージ用フィルタ80Aのガスパージ用フィルタ先端部406Aの近傍を拡大した断面図で、パージポート800と当接する前の状態を示す図である。図7Bは、本発明の第2実施形態に係るガスパージ用フィルタ80Aのガスパージ用フィルタ先端部406Aの近傍を拡大した断面図で、パージポート800と当接した状態を示す図である。
次に、本発明の第3実施形態によるガスパージ用フィルタ80Bについて図8Aと図8Bを参照しながら説明する。図8Aは、本発明の第3実施形態に係るガスパージ用フィルタ80Bのガスパージ用フィルタ先端部406Bの近傍を拡大した断面図で、パージポート800と当接する前の状態を示す図である。図8Bは、本発明の第3実施形態に係るガスパージ用フィルタ80Bのガスパージ用フィルタ先端部406Bの近傍を拡大した断面図で、パージポート800と当接した状態を示す図である。
次に、本発明の第4実施形態によるガスパージ用フィルタ80C、80Dについて図9から図11を参照しながら説明する。図9は、本発明の第4実施形態に係るガスパージ用フィルタ80Cを示す分解斜視図である。図10は、本発明の第4実施形態に係るガスパージ用フィルタ80Cの給気用のガスパージ用フィルタの断面図である。図11は、本発明の第4実施形態に係るガスパージ用フィルタ80Dの排気用のガスパージ用フィルタの断面図である。
2 容器本体
3 蓋体
24 下壁
45 貫通孔(アクセス開口)
80、80A、80B、80C、80D ガスパージ用フィルタ
90 フィルタハウジング
100、100C 第1ハウジング
101、101C 上部第1ハウジング
102、102C 下部第1ハウジング
103 ノズル部
105 パッド当接部
106、106C ノズル先端部
110 通気空間
111 上部通気空間
112 下部通気空間
113 ノズル部通気空間
120 収納空間側開口
121 収納空間外側開口
150 フィルタ体
200 第2ハウジング
210 第2ハウジング押え部
300、300A、300B、300C パッド
305 パッド内側先端部
306、306A 306B、306C パッド外側先端部
307A、307B パッド外側先端変形部
310、310A、310B パッド内径凸部
400C 内部ハウジング
406、406A、406B、406C ガスパージ用フィルタ先端部
500C、500D 作動部材(逆止弁機構)
501C バネ
502C 弁体
800、800B パージポート
801、801B パージガス流通路
802、802B パージポート先端部
803B パージポート環状凸部
W 基板
Claims (6)
- 一端部に容器本体開口部を有した容器本体と前記容器本体開口部に対して着脱可能であり前記容器本体開口部を閉塞可能な蓋体により内部に収納空間が形成された収納容器に前記容器本体あるいは前記蓋体の少なくともどちらか一方に形成された前記収納容器の外部の空間と前記収納空間を連通可能なアクセス開口に取り付けられるガスパージ用フィルタにおいて、
前記収納容器の外部の空間の気体と前記収納空間の気体を通気可能な通気空間を有するフィルタハウジングと、
前記フィルタハウジングの前記収納空間の外側に形成され前記通気空間の一部を形成するノズル部の外周面を覆うように形成されたパッドを有し、
前記フィルタハウジングは熱可塑性樹脂により形成され、
前記パッドは弾性体により形成されていることを特徴とするガスパージ用フィルタ。 - 前記ノズル部の先端部で前記収納空間の外側方向に形成されたノズル先端部と、
前記パッドの先端部で前記収納空間の外側方向に形成されたパッド外側先端部とから構成されるガスパージ用フィルタ先端部において、
前記収納容器の内部のガスをパージするためのガスパージ装置のパージポートが前記ガスパージ用フィルタ先端部に当接し、ガスパージが実行される際に、前記ノズル先端部の位置が、前記ガスパージ用フィルタ先端部に当接する前記パッド外側先端部の位置と同一、あるいは前記収納空間の外側方向に突出していることを特徴とする請求項1に記載のガスパージ用フィルタ。 - 前記パージポートが前記ガスパージ用フィルタ先端部に当接する前において、
前記パッド外側先端部の位置が、前記ノズル先端部の位置と同一、あるいは前記収納空間の外側方向に突出していることを特徴とする請求項2に記載のガスパージ用フィルタ。 - 前記パージポートが前記ガスパージ用フィルタ先端部に当接する前において、
前記ノズル先端部の位置が、前記パッド外側先端部の位置よりも前記収納空間の外側方向に突出していることを特徴とする請求項2に記載のガスパージ用フィルタ。 - 前記パッドが単体の状態における前記パッド外側先端部の内径の形状は、前記ノズル先端部の外径よりも小さいことを特徴とする請求項2から請求項4のいずれかに記載のガスパージ用フィルタ。
- 前記フィルタハウジングの前記通気空間に、気体の流通方向を一定方向に制限する逆止弁機構を有することを特徴とする請求項1から請求項5のいずれかに記載のガスパージ用フィルタ。
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CN201580061235.4A CN107004623B (zh) | 2014-11-12 | 2015-10-28 | 气体清洗用过滤器 |
US15/523,852 US10453723B2 (en) | 2014-11-12 | 2015-10-28 | Gas purge filter |
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Also Published As
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US10453723B2 (en) | 2019-10-22 |
KR20170084122A (ko) | 2017-07-19 |
CN107004623B (zh) | 2020-08-28 |
JP2016096184A (ja) | 2016-05-26 |
TWI686232B (zh) | 2020-03-01 |
TW201625347A (zh) | 2016-07-16 |
US20180308733A1 (en) | 2018-10-25 |
KR102386695B1 (ko) | 2022-04-14 |
JP6450156B2 (ja) | 2019-01-09 |
CN107004623A (zh) | 2017-08-01 |
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