WO2016061851A1 - 用于氧化物半导体薄膜晶体管的行驱动电路 - Google Patents
用于氧化物半导体薄膜晶体管的行驱动电路 Download PDFInfo
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- WO2016061851A1 WO2016061851A1 PCT/CN2014/090286 CN2014090286W WO2016061851A1 WO 2016061851 A1 WO2016061851 A1 WO 2016061851A1 CN 2014090286 W CN2014090286 W CN 2014090286W WO 2016061851 A1 WO2016061851 A1 WO 2016061851A1
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- 239000010409 thin film Substances 0.000 title claims abstract description 44
- 239000004065 semiconductor Substances 0.000 title claims abstract description 36
- 239000003990 capacitor Substances 0.000 claims description 17
- 244000208734 Pisonia aculeata Species 0.000 claims 2
- 230000003247 decreasing effect Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 16
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
- G09G3/3611—Control of matrices with row and column drivers
- G09G3/3674—Details of drivers for scan electrodes
- G09G3/3677—Details of drivers for scan electrodes suitable for active matrices only
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
- G09G3/3611—Control of matrices with row and column drivers
- G09G3/3696—Generation of voltages supplied to electrode drivers
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
- G11C19/28—Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
- G11C19/287—Organisation of a multiplicity of shift registers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/01—Details
- H03K3/012—Modifications of generator to improve response time or to decrease power consumption
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2230/00—Details of flat display driving waveforms
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/04—Structural and physical details of display devices
- G09G2300/0404—Matrix technologies
- G09G2300/0408—Integration of the drivers onto the display substrate
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/08—Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
- G09G2300/0809—Several active elements per pixel in active matrix panels
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/08—Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
- G09G2300/0809—Several active elements per pixel in active matrix panels
- G09G2300/0842—Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2320/00—Control of display operating conditions
- G09G2320/02—Improving the quality of display appearance
- G09G2320/0209—Crosstalk reduction, i.e. to reduce direct or indirect influences of signals directed to a certain pixel of the displayed image on other pixels of said image, inclusive of influences affecting pixels in different frames or fields or sub-images which constitute a same image, e.g. left and right images of a stereoscopic display
- G09G2320/0214—Crosstalk reduction, i.e. to reduce direct or indirect influences of signals directed to a certain pixel of the displayed image on other pixels of said image, inclusive of influences affecting pixels in different frames or fields or sub-images which constitute a same image, e.g. left and right images of a stereoscopic display with crosstalk due to leakage current of pixel switch in active matrix panels
Definitions
- the present invention relates to the field of liquid crystal display, and more particularly to a row driving circuit for an oxide semiconductor thin film transistor.
- GOA Gate Drive On Array
- a gate scan driving signal circuit is fabricated on a thin film transistor array substrate by using a thin film transistor liquid crystal display Array process to realize Gate progressive scanning.
- the threshold voltage Vth of the amorphous silicon thin film transistor is generally greater than 0 V, and the voltage of the subthreshold region is relatively large with respect to the current swing, even some transistors in the circuit design
- the leakage current generated by the voltage Vgs between the gate and the source of the transistor at a frequency equal to 0V during operation is also small.
- the threshold voltage Vth of the thin film transistor is sometimes less than 0V, and the voltage of the subthreshold region is relative to the current.
- the row driver circuit for the oxide semiconductor thin film transistor needs to adopt some special design schemes to avoid some important thin film transistor operations in the vicinity of Vgs equal to 0V.
- FIG. 1 it is a conventional row driving circuit applied to an amorphous silicon thin film transistor, wherein the main structure of the circuit includes: a pull-up control portion 100, a pull-up portion 200, a downlink portion 300, and a first pull-down. Portion 400, bootstrap capacitor 500 and pull-down sustain portion 600.
- the control signal source applied to the row driving circuit of the amorphous silicon thin film transistor mainly includes a high frequency clock signal CK(n), a constant voltage low potential source VSS, and a low frequency clock signal LC1 and LC2, wherein LC1 and LC2 are two phases completely.
- the opposite source of low frequency signals In general, the low potential of CK(n), LC1, and LC2 will be less than VSS, but the critical nodes Q(N) and G(N) in the circuit will be pulled down to VSS during the inactive period.
- the off-state operating voltage Vgs ⁇ 0V, and Q(N) also has high and low fluctuations, That is to say, if there is a case where Vgs>0V, if the circuit is directly applied to the driving circuit design of the oxide semiconductor thin film transistor, there is a large leakage current, and it is impossible to ensure that the output terminal G(N) is maintained during the inactive period. At low potentials, this can result in poor output at the output G(N) and poor functionality of the GOA circuit.
- T31 and T41 of the first pull-down portion 400 there is a problem with the thirty-first transistor T31 and the forty-first transistor T41 of the first pull-down portion 400, that during the action of Q(N) and G(N) being at a high potential, T31 and T41 Leakage can cause distortion of the output waveforms of Q(N) and G(N), resulting in poor functionality of the GOA circuit under severe conditions (eg, high temperature operation).
- the circuit design uses the low potential of LC1 or LC2 to control the pull-down of P(N) or K(N) during the action, it is ensured that during the action period P(N) and K( The low potential of N) is less than VSS, ensuring that the Vgs ⁇ 0V of the thirty-second, thirty-three, forty-two, and forty-three transistors T32, T33, T42, and T43 are in a good off state, thereby reducing the pull-down sustain circuit portion.
- the bridge TFT T55 of the pull-down sustaining circuit portion has Vgs>0V during the inactive period, which causes the high potential of P(N) or K(N) during the inactive period to be unacceptably high, thereby It will affect the pull-down maintenance effect of T32, T33, T42 and T43 on Q(N) and G(N).
- this can be improved in the design by adjusting the size of the element, there is also a problem of an increase in leakage current due to an increase in size.
- the present invention provides a row driving circuit for an oxide semiconductor thin film transistor, comprising a plurality of cascaded GOA units, wherein N is a positive integer, and the Nth-level GOA unit comprises: a pull-up control portion, a a pull-up portion, a next-pass portion, a first pull-down portion, a bootstrap capacitor portion, and a pull-down sustain circuit portion;
- the pull-up control portion includes an eleventh transistor, and a gate of the eleventh transistor is electrically connected to a driving signal end of the N-2th GOA unit of the first two stages of the GOA unit of the Nth stage GOA unit, and a source
- the output terminal of the Nth-level GOA unit of the first two stages of the GOA unit of the Nth stage GOA unit is electrically connected to the first node.
- the pull-up portion includes a twenty-first transistor, the gate of the twenty-first transistor is electrically connected to the first node, the source is electrically connected to the high-frequency clock signal, and the drain is electrically connected to the output end;
- the lower pass portion includes a twenty-second transistor, the gate of the second twelve transistor is electrically connected to the first node, the source is electrically connected to the high frequency clock signal, and the drain is electrically connected to the driving output end;
- the first pull-down portion includes a forty-first transistor, and the gate of the forty-first transistor is electrically The output is connected to the output terminal of the N+3th GOA unit of the lower third-stage GOA unit of the Nth-level GOA unit, the drain is electrically connected to the first node, and the source is electrically connected to the output end.
- the bootstrap capacitor portion includes a capacitor, one end of the capacitor is electrically connected to the first node, and the other end is electrically connected to the output end.
- the pull-down sustaining portion includes: a forty-second transistor, the gate of the forty-second transistor is electrically connected to the second node, the source is electrically connected to the first node, and the drain is electrically connected to the second constant voltage Negative potential source;
- the gate of the thirty-second transistor is electrically connected to the second node, the source is electrically connected to the output end, and the drain is electrically connected to the first constant voltage negative potential source;
- the gate and the source of the fifty-first transistor are electrically connected to the first low frequency signal source, and the drain is electrically connected to the fourth node;
- the gate of the fifty-second transistor is electrically connected to the first node, the source is electrically connected to the fourth node, and the drain is electrically connected to the first constant voltage negative potential source;
- the gate of the fifty-third transistor is electrically connected to the fourth node, the source is electrically connected to the first low-frequency signal source, and the drain is electrically connected to the second node;
- the gate of the fifty-fourth transistor is electrically connected to the second low-frequency signal source, the source is electrically connected to the first low-frequency signal source, and the drain is electrically connected to the second node;
- the gate of the fifty-fifth transistor is electrically connected to the first node, the source is electrically connected to the second node, and the drain is electrically connected to the third node;
- the gate of the 64th transistor is electrically connected to the first low frequency signal source, the source is electrically connected to the second low frequency signal source, and the drain is electrically connected to the third node;
- the gate of the 63rd transistor is electrically connected to the fifth node, the source is electrically connected to the second low frequency signal source, and the drain is electrically connected to the third node;
- the gate of the sixty-second transistor is electrically connected to the first node, the source is electrically connected to the fifth node, and the drain is electrically connected to the first constant voltage negative potential source;
- the gate and the source of the sixty-first transistor are electrically connected to the second low frequency signal source, and the drain is electrically connected to the fifth node;
- the gate of the thirty-third transistor is electrically connected to the third node, the source is electrically connected to the output end, and the drain is electrically connected to the first constant voltage negative potential source;
- the gate of the forty-third transistor is electrically connected to the third node, the source is electrically connected to the first node, and the drain is electrically connected to the second constant voltage negative potential source;
- the first constant voltage negative potential source is higher than the second constant voltage negative potential source.
- the gate of the eleventh transistor is electrically connected to the start signal end, and the source is electrically connected to the start signal end.
- the gate and the source of the eleventh transistor are electrically connected to the startup signal end of the circuit.
- the gate of the forty-first transistor is electrically connected to the startup signal terminal.
- the source of the forty-first transistor in the first pull-down portion may also be electrically connected to the second constant voltage negative potential source.
- a gate of the fifty-fifth transistor in the pull-down maintaining portion is electrically connected to the driving output end, and the pull-down maintaining portion further includes a fifty-seventh transistor, wherein a gate of the fifty-seventh transistor is electrically connected to the first The driving output end of the N-th GOA unit of the first two stages of the GOA unit of the N-stage GOA unit, the source is electrically connected to the second node, and the drain is electrically connected to the third node.
- the pull-down maintaining portion further includes a seventy-second transistor, the gate of the seventy-second transistor is electrically connected to the second node, the source is electrically connected to the driving output end, and the drain is electrically connected to the second constant voltage a negative potential source; a seventy-third transistor, the gate of the seventy-third transistor is electrically connected to the third node, the source is electrically connected to the driving output end, and the drain is electrically connected to the second constant voltage negative potential source .
- the first low frequency signal source and the second low frequency signal source are two low frequency clock signal sources whose phases are completely opposite.
- the low frequency signals of the high frequency clock signal, the first low frequency signal source and the second low frequency signal source are both lower than the second constant voltage negative potential source.
- the row driving circuit for the oxide semiconductor thin film transistor is a row driving circuit of the IGZO thin film transistor.
- the row driving circuit for an oxide semiconductor thin film transistor of the present invention ensures the non-active period by setting two successively decreasing constant voltage negative potential sources and a high frequency clock signal and a low potential of a low frequency clock signal
- the pull-up circuit portion can be in a good off state, not affected by the high frequency clock signal, thereby ensuring the normal operation of the circuit; further, by redesigning the first pull-down circuit portion to avoid its operation to the first node and during operation
- the effect of the output of the output ensures that the first node and the output can output normally without signal distortion.
- 1 is a conventional row driving circuit applied to an amorphous silicon thin film transistor
- FIG. 2 is a first implementation of a row driving circuit for an oxide semiconductor thin film transistor of the present invention Circuit diagram of an example
- FIG. 3 is a circuit diagram of a first stage GOA unit of the first embodiment of the present invention.
- FIG. 4 is a circuit diagram of a second stage GOA unit of the first embodiment of the present invention.
- Figure 5 is a circuit diagram of a third-order third-stage GOA unit of the first embodiment of the present invention.
- Figure 6 is a circuit diagram of a penultimate stage GOA unit of the first embodiment of the present invention.
- Figure 7 is a circuit diagram of a final stage GOA unit of the first embodiment of the present invention.
- Figure 8 is a circuit diagram of a second embodiment of a row driving circuit for an oxide semiconductor thin film transistor of the present invention.
- Figure 9 is a circuit diagram of a third embodiment of a row driving circuit for an oxide semiconductor thin film transistor of the present invention.
- Figure 10 is a circuit diagram of a fourth embodiment of a row driving circuit for an oxide semiconductor thin film transistor of the present invention.
- Figure 11 is a schematic diagram showing the input and output waveforms of the nodes of the circuit shown in Figure 2 or Figure 8.
- the row driving circuit for the oxide semiconductor thin film transistor is a row driving circuit of an Indium Gallium Zinc Oxide (IGZO) thin film transistor, which includes a plurality of cascaded GOA units, and N is a positive integer,
- the N-stage GOA unit includes a pull-up control portion 100, a pull-up portion 200, a next-pass portion 300, a first pull-down portion 400, a bootstrap capacitor portion 500, and a pull-down sustain circuit portion 600.
- the pull-up control portion 100 includes an eleventh transistor T11.
- the gate of the eleventh transistor T11 is electrically connected to the driving signal end of the first two-stage GOA unit of the Nth stage GOA unit.
- ST(N-2) the source is electrically connected to the output terminal G(N-2) of the first two-stage GOA unit of the Nth stage GOA unit, and the drain is electrically connected to the first Node Q(N).
- the pull-up portion 200 includes a twenty-first transistor T21.
- the gate of the twenty-first transistor T21 is electrically connected to the first node Q(N), and the source is electrically connected to the high-frequency clock signal CK(n).
- the drain is electrically connected to the output terminal G(N).
- the downstream portion 300 includes a twenty-second transistor T22.
- the gate of the second twelve-transistor T22 is electrically connected to the first node Q(N), and the source is electrically connected to the high-frequency clock signal CK(n).
- the drain is electrically connected to the drive output terminal ST(N).
- the first pull-down portion 400 includes a forty-first transistor T41, and the gate of the forty-first transistor T41 is electrically connected to the N+3th GOA unit of the lower three-level GOA unit of the Nth-stage GOA unit.
- the output terminal G(N+3) has a drain electrically connected to the first node Q(N) and a source electrically connected to the output terminal G(N).
- the bootstrap capacitor portion 500 includes a capacitor Cb. One end of the capacitor Cb is electrically connected to the first node Q(N), and the other end is electrically connected to the output terminal G(N).
- the pull-down maintaining portion 600 includes a forty-second transistor T42.
- the gate of the forty-second transistor T42 is electrically connected to the second node P(N), and the source is electrically connected to the first node Q(N).
- the drain is electrically connected to the second constant voltage negative potential source VSS2; the thirty-second transistor T32, the gate of the thirty-second transistor T32 is electrically connected to the second node P(N), and the source is electrically connected to The output terminal G(N), the drain is electrically connected to the first constant voltage negative potential source VSS1; the fifty-first transistor T51, the gate and the source of the fifty-first transistor T51 are electrically connected to the first low frequency
- the signal source LC1 the drain is electrically connected to the fourth node S(N); the fifty-second transistor T52, the gate of the fifty-second transistor T52 is electrically connected to the first node Q(N), and the source is electrically Connected to the fourth node S(N), the drain is electrically connected to the first constant
- the gate of the 64th transistor T64 is electrically connected to the first low frequency signal source LC1, the source is electrically connected to the second low frequency signal source LC2, and the drain is electrically connected to the third node K(N); a transistor of the sixty-third transistor T63, the gate of the sixty-third transistor T63 is electrically connected to the fifth node T(N), the source is electrically connected to the second low-frequency signal source LC2, and the drain is electrically connected to the third node.
- a sixty-second transistor T62 the gate of the sixty-second transistor T62 is electrically connected to the first node Q (N), the source is electrically connected to the fifth node T (N), the drain Electrically connected to the first constant voltage negative potential source VSS1; the 61st transistor T61, the gate and the source of the 61st transistor T61 are electrically connected to the second low frequency signal source LC2, and the drain is electrically Connected to the fifth node T(N); the thirty-third transistor T33, the gate of the thirty-third transistor T33 is electrically connected to the third node K(N), and the source is electrically connected to the output terminal G(N).
- the drain is electrically connected to the first constant voltage negative potential source VSS1; the forty-third transistor T43, the gate of the forty-third transistor T43 is electrically connected to the third node K(N), and the source is electrically Connected to the first node Q(N), the drain is electrically connected to the second constant voltage negative potential source VSS2.
- the first constant voltage negative potential source VSS1 is higher than the second constant voltage negative potential source VSS2, and the first low frequency signal source LC1 and the second low frequency signal source LC2 are two low frequency clock signal sources whose phases are completely opposite.
- the low potentials of the high frequency clock signal CK(n), the first low frequency signal source LC1 and the second low frequency signal source LC2 are both lower than the second constant voltage negative potential source VSS2.
- this embodiment introduces a second constant voltage negative potential source VSS2 based on the prior art, through the forty-second transistor T42, The forty-third transistor T43 pulls the potential of the first node Q(N) to the second constant voltage negative potential source VSS2, and passes the output terminal G(N) through the thirty-second transistor T32 and the thirty-third transistor T33.
- the potential is pulled down to the first constant voltage negative potential source VSS1, and VSS1>VSS2, so that the voltage Vgs ⁇ 0V between the gate and the source of the twenty-first transistor T21 can be ensured, so that the twenty-first transistor T21 can be reduced. Leakage current during the action.
- the source of the forty-first transistor T41 is connected to the output terminal G(N), so that during the action of the output of the output terminal G(N), since the source terminal of the forty-first transistor T41 is a high potential, then the fourth The overall leakage current of the eleven transistor T41 is significantly reduced, and can also enhance the potential of the first node Q(N).
- the gate of the forty-first transistor T41 is connected to the N-th stage GOA.
- the output terminal G(N+3) of the N+3th GOA unit of the lower third-stage GOA unit of the unit ensures that the first node Q(N) forms a potential of a "convex" shape, and the second eleventh transistor T21 is used. Pull the output G(N) low for a time.
- the gate of the eleventh transistor T11 is electrically connected to the startup signal terminal STV, and the source is electrically connected to the startup signal terminal STV.
- the gate and the source of the eleventh transistor T11 are electrically connected to the start signal terminal STV of the circuit.
- the gate of the forty-first transistor T41 is electrically connected to the start. Signal terminal STV.
- FIG. 8 is a circuit diagram of a second embodiment of a row driving circuit for an oxide semiconductor thin film transistor of the present invention.
- the second embodiment is different from the first embodiment in that the source terminal of the forty-first transistor T41 in the pull-down portion 400 is directly connected to the second constant voltage negative potential source VSS2 for pulling down the first node during the inactive period.
- the potential of Q(N) is to the second constant voltage negative potential source VSS2 to ensure that the Vgs of the twenty-first transistor T21 is ⁇ 0V.
- the components, the connection relationship, the function and the operation principle of the same reference numerals in FIG. 8 and FIG. 2 are the same, and are not described herein again.
- FIG. 9 is a diagram of a row driving circuit for an oxide semiconductor thin film transistor of the present invention.
- the third embodiment is different from the first embodiment in that the gate of the fifty-fifth transistor in the pull-down maintaining portion 600 is electrically connected to the driving output terminal ST(N), and the pull-down maintaining portion 600 further includes The fifty-seventh transistor T57, the gate of the fifty-seventh transistor T57 is electrically connected to the driving output terminal ST(N-2) of the N-2th GOA unit of the first two stages of the GOA unit of the Nth stage GOA unit
- the source is electrically connected to the second node P(N)
- the drain is electrically connected to the third node K(N).
- the components, the connection relationship, the function and the operation principle of the same reference numerals in FIG. 9 and FIG. 2 are the same, and are not described herein again.
- This third embodiment is an improvement for the pull-down sustain circuit portion 600 based on the circuit of the first embodiment shown in Fig. 2, since the potential of the first node Q(N) during the inactive period is subjected to the twenty-first transistor.
- the influence of the parasitic capacitance of T21 and the twenty-second transistor T22 fluctuates greatly, which causes the potentials of the second node P(N) and the third node K(N) to fluctuate accordingly.
- the third embodiment changes the fifth transistor T55 of the bridge transistor controlled by the first node Q(N) in the first embodiment into two first GOA units of the first two stages of the N-th GOA unit.
- FIG. 10 is a circuit diagram of a fourth embodiment of the present invention.
- the components, the connection relationship, the function and the operation principle of the same reference numerals in FIG. 10 and FIG. 9 are the same, and are not described herein again.
- the difference between the fourth embodiment and the third embodiment is that the pull-down maintaining portion 600 further includes a seventy-third transistor T73, and the gate of the seventy-third transistor T73 is electrically connected to the third node K(N).
- the source is electrically connected to the driving output terminal ST(N), the drain is electrically connected to the second constant voltage negative potential source VSS2, and further includes a seventy-second transistor T72, and the gate electrical property of the seventy-second transistor Connected to the second node P(N), the source is electrically connected to the driving output terminal ST(N), and the drain is electrically connected to the second constant voltage negative potential source VSS2.
- This fourth embodiment is an improvement made in the above-described third embodiment.
- the fourth embodiment adds a seventy-third transistor T73 and a seventy-second transistor T72 to the third embodiment.
- the potential of the driving output terminal ST(N) is processed by the seventy-third transistor T73 and the seventy-second transistor T72, thereby ensuring that ST(N) can be at a relatively stable low potential during the non-active period, reducing Fluctuations in P(N) and K(N).
- FIG. 11 is a schematic diagram of input and output waveforms of respective nodes according to the first embodiment or the second embodiment of the present invention.
- the STV signal is the start signal of the GOA circuit
- CK1-4 is the high frequency clock signal for driving the GOA circuit
- the low frequency clock signal sources with the opposite phases of LC1 and LC2 are opposite
- VSS1 and VSS2 are the constant voltages of the two sets of potentials decreasing sequentially Negative potential source.
- the pull-up circuit portion 200 is in a good off state, and the first node Q(N) and The output G(N) is output normally without signal distortion.
- the row driving circuit for an oxide semiconductor thin film transistor of the present invention ensures the non-active period by setting two successively decreasing constant voltage negative potential sources and a high frequency clock signal and a low potential of the low frequency clock signal.
- the pull circuit portion can be in a good off state, not affected by the high frequency clock signal, thereby ensuring the normal operation of the circuit; further, by redesigning the first pull down circuit portion to avoid its first node and output during operation The effect of the output of the terminal ensures that the first node and the output can output normally without signal distortion.
Abstract
Description
Claims (11)
- 一种用于氧化物半导体薄膜晶体管的行驱动电路,包括级联的多个GOA单元,设N为正整数,第N级GOA单元包括:一上拉控制部分、一上拉部分、一下传部分、一第一下拉部分、一自举电容部分和一下拉维持电路部分;所述上拉控制部分包括第十一晶体管,该第十一晶体管的栅极电性连接于该第N级GOA单元的前两级GOA单元第N-2级GOA单元的驱动讯号端,源极电性连接于该第N级GOA单元的前两级GOA单元第N-2级GOA单元的输出端,漏极电性连接于第一节点;所述上拉部分包括第二十一晶体管,该第二十一晶体管的栅极电性连接于第一节点,源极电性连接于高频时钟讯号,漏极电性连接于输出端;所述下传部分包括第二十二晶体管,该第二十二晶体管的栅极电性连接于第一节点,源极电性连接于高频时钟讯号,漏极电性连接于驱动输出端;所述第一下拉部分包括第四十一晶体管,该第四十一晶体管的栅极电性连接于该第N级GOA单元的下三级GOA单元第N+3级GOA单元的输出端,漏极电性连接于第一节点,源极电性连接于输出端;所述自举电容部分包括一电容,该电容的一端电性连接于第一节点,另一端电性连接于输出端;所述下拉维持部分包括:第四十二晶体管,该第四十二晶体管的栅极电性连接于第二节点,源极电性连接于第一节点,漏极电性连接于第二恒压负电位源;第三十二晶体管,该第三十二晶体管的栅极电性连接于第二节点,源极电性连接于输出端,漏极电性连接于第一恒压负电位源;第五十一晶体管,该第五十一晶体管的栅极与源极均电性连接于第一低频讯号源,漏极电性连接于第四节点;第五十二晶体管,该第五十二晶体管的栅极电性连接于第一节点,源极电性连接于第四节点,漏极电性连接于第一恒压负电位源;第五十三晶体管,该第五十三晶体管的栅极电性连接于第四节点,源极电性连接于第一低频讯号源,漏极电性连接于第二节点;第五十四晶体管,该第五十四晶体管的栅极电性连接于第二低频讯号源,源极电性连接于第一低频讯号源,漏极电性连接于第二节点;第五十五晶体管,该第五十五晶体管的栅极电性连接于第一节点,源极电性连接于第二节点,漏极电性连接于第三节点;第六十四晶体管,该第六十四晶体管的栅极电性连接于第一低频讯号源,源极电性连接于第二低频讯号源,漏极电性连接于第三节点;第六十三晶体管,该第六十三晶体管的栅极电性连接于第五节点,源极电性连接于第二低频讯号源,漏极电性连接于第三节点;第六十二晶体管,该第六十二晶体管的栅极电性连接于第一节点,源极电性连接于第五节点,漏极电性连接于第一恒压负电位源;第六十一晶体管,该第六十一晶体管的栅极与源极均电性连接于第二低频讯号源,漏极电性连接于第五节点;第三十三晶体管,该第三十三晶体管的栅极电性连接于第三节点,源极电性连接于输出端,漏极电性连接于第一恒压负电位源;第四十三晶体管,该第四十三晶体管的栅极电性连接于第三节点,源极电性连接于第一节点,漏极电性连接于第二恒压负电位源;所述第一恒压负电位源高于第二恒压负电位源。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述行驱动电路的第一级GOA单元中,第十一晶体管的栅极电性连接于启动讯号端,源极电性连接于启动讯号端。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述行驱动电路的第二级GOA单元中,第十一晶体管的栅极与源极均电性连接于电路的启动讯号端。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述行驱动电路的倒数第三级、倒数第二级以及最后一级GOA单元中,第四十一晶体管的栅极均电性连接于启动讯号端。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述第一下拉部分中第四十一晶体管的源极电性连接于第二恒压负电位源。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述下拉维持部分中的第五十五晶体管的栅极电性连接于驱动输出端;该下拉维持部分还包括第五十七晶体管,该第五十七晶体管的栅极电性连接于该第N级GOA单元的前两级GOA单元第N-2级GOA单元的驱动输出端,源极电性连接于第二节点,漏极电性连接于第三节点。
- 如权利要求6所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述下拉维持部分还包括第七十二晶体管,该第七十二晶体管的栅 极电性连接于第二节点,源极电性连接于驱动输出端,漏极电性连接于第二恒压负电位源;第七十三晶体管,该第七十三晶体管的栅极电性连接于第三节点,源极电性连接于驱动输出端,漏极电性连接于第二恒压负电位源。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述第一低频讯号源与第二低频讯号源是两个相位完全相反的低频时钟讯号源。
- 如权利要求8所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述高频时钟讯号、第一低频讯号源与第二低频讯号源的低电位均低于第二恒压负电位源。
- 如权利要求1所述的用于氧化物半导体薄膜晶体管的行驱动电路,其中,所述用于氧化物半导体薄膜晶体管的行驱动电路为IGZO薄膜晶体管的行驱动电路。
- 一种用于氧化物半导体薄膜晶体管的行驱动电路,包括级联的多个GOA单元,设N为正整数,第N级GOA单元包括:一上拉控制部分、一上拉部分、一下传部分、一第一下拉部分、一自举电容部分和一下拉维持电路部分;所述上拉控制部分包括第十一晶体管,该第十一晶体管的栅极电性连接于该第N级GOA单元的前两级GOA单元第N-2级GOA单元的驱动讯号端,源极电性连接于该第N级GOA单元的前两级GOA单元第N-2级GOA单元的输出端,漏极电性连接于第一节点;所述上拉部分包括第二十一晶体管,该第二十一晶体管的栅极电性连接于第一节点,源极电性连接于高频时钟讯号,漏极电性连接于输出端;所述下传部分包括第二十二晶体管,该第二十二晶体管的栅极电性连接于第一节点,源极电性连接于高频时钟讯号,漏极电性连接于驱动输出端;所述第一下拉部分包括第四十一晶体管,该第四十一晶体管的栅极电性连接于该第N级GOA单元的下三级GOA单元第N+3级GOA单元的输出端,漏极电性连接于第一节点,源极电性连接于输出端;所述自举电容部分包括一电容,该电容的一端电性连接于第一节点,另一端电性连接于输出端;所述下拉维持部分包括:第四十二晶体管,该第四十二晶体管的栅极电性连接于第二节点,源极电性连接于第一节点,漏极电性连接于第二恒压负电位源;第三十二晶体管,该第三十二晶体管的栅极电性连接于第二节点,源极电性连接于输出端,漏极电性连接于第一恒压负电位源;第五十一晶体管,该第五十一晶体管的栅极与源极均电性连接于第一低频讯号源,漏极电性连接于第四节点;第五十二晶体管,该第五十二晶体管的栅极电性连接于第一节点,源极电性连接于第四节点,漏极电性连接于第一恒压负电位源;第五十三晶体管,该第五十三晶体管的栅极电性连接于第四节点,源极电性连接于第一低频讯号源,漏极电性连接于第二节点;第五十四晶体管,该第五十四晶体管的栅极电性连接于第二低频讯号源,源极电性连接于第一低频讯号源,漏极电性连接于第二节点;第五十五晶体管,该第五十五晶体管的栅极电性连接于第一节点,源极电性连接于第二节点,漏极电性连接于第三节点;第六十四晶体管,该第六十四晶体管的栅极电性连接于第一低频讯号源,源极电性连接于第二低频讯号源,漏极电性连接于第三节点;第六十三晶体管,该第六十三晶体管的栅极电性连接于第五节点,源极电性连接于第二低频讯号源,漏极电性连接于第三节点;第六十二晶体管,该第六十二晶体管的栅极电性连接于第一节点,源极电性连接于第五节点,漏极电性连接于第一恒压负电位源;第六十一晶体管,该第六十一晶体管的栅极与源极均电性连接于第二低频讯号源,漏极电性连接于第五节点;第三十三晶体管,该第三十三晶体管的栅极电性连接于第三节点,源极电性连接于输出端,漏极电性连接于第一恒压负电位源;第四十三晶体管,该第四十三晶体管的栅极电性连接于第三节点,源极电性连接于第一节点,漏极电性连接于第二恒压负电位源;所述第一恒压负电位源高于第二恒压负电位源;其中,所述行驱动电路的第一级GOA单元中,第十一晶体管的栅极电性连接于启动讯号端,源极电性连接于启动讯号端;其中,所述行驱动电路的第二级GOA单元中,第十一晶体管的栅极与源极均电性连接于电路的启动讯号端;其中,所述行驱动电路的倒数第三级、倒数第二级以及最后一级GOA单元中,第四十一晶体管的栅极均电性连接于启动讯号端;其中,所述第一低频讯号源与第二低频讯号源是两个相位完全相反的低频时钟讯号源;其中,所述高频时钟讯号、第一低频讯号源与第二低频讯号源的低电 位均低于第二恒压负电位源;其中,所述用于氧化物半导体薄膜晶体管的行驱动电路为IGZO薄膜晶体管的行驱动电路。
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- 2014-11-05 GB GB1702109.8A patent/GB2543700B/en active Active
- 2014-11-05 KR KR1020177003727A patent/KR101940933B1/ko active IP Right Grant
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KR20170030609A (ko) | 2017-03-17 |
CN104269152A (zh) | 2015-01-07 |
JP6440224B2 (ja) | 2018-12-19 |
US20160248402A1 (en) | 2016-08-25 |
GB201702109D0 (en) | 2017-03-29 |
US9461627B2 (en) | 2016-10-04 |
CN104269152B (zh) | 2017-01-18 |
GB2543700A (en) | 2017-04-26 |
JP2017534913A (ja) | 2017-11-24 |
GB2543700B (en) | 2020-07-15 |
KR101940933B1 (ko) | 2019-04-10 |
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