WO2016029516A1 - Cf基板的对组标记的制作方法 - Google Patents

Cf基板的对组标记的制作方法 Download PDF

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Publication number
WO2016029516A1
WO2016029516A1 PCT/CN2014/086590 CN2014086590W WO2016029516A1 WO 2016029516 A1 WO2016029516 A1 WO 2016029516A1 CN 2014086590 W CN2014086590 W CN 2014086590W WO 2016029516 A1 WO2016029516 A1 WO 2016029516A1
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substrate
pair
marks
organic material
material layer
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PCT/CN2014/086590
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English (en)
French (fr)
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熊源
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深圳市华星光电技术有限公司
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Priority to US14/426,984 priority Critical patent/US20160246109A1/en
Publication of WO2016029516A1 publication Critical patent/WO2016029516A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a method for fabricating a pair of marks of a CF substrate.
  • LCD Liquid crystal display
  • PDA personal digital assistant
  • digital camera computer screen or laptop screen.
  • a liquid crystal display device includes a housing, a liquid crystal display panel disposed in the housing, and a backlight module disposed in the housing.
  • the structure of the liquid crystal display panel is mainly composed of a Thin Film Transistor Array Substrate (TFT Array Substrate), a color filter substrate (Color Filter, CF), and a liquid crystal layer disposed between the two substrates ( Liquid Crystal Layer) is constructed by controlling the rotation of the liquid crystal molecules of the liquid crystal layer by applying a driving voltage on the two glass substrates, and refracting the light of the backlight module to produce a picture.
  • the first process of the CF substrate 100 In order to form a black matrix (BM) 200, the black matrix 200 forms a light shielding structure of the pixel region, and the first track process also forms a pair mark of the same material as the black matrix 200 on the periphery of the pixel region. 300, used to provide a registration reference when the CF substrate 100 and the TFT substrate are paired.
  • BM black matrix
  • the present invention provides a method for fabricating a pair of marks of a CF substrate, comprising the following steps:
  • Step 1 Providing a CF substrate
  • Step 2 forming an organic material layer on the CF substrate, and forming a plurality of pairs of the same material as the organic material layer on the peripheral region of the effective display region on the CF substrate, for pairing with the TFT substrate Counterpoint
  • Step 3 Perform blackening processing on the pair of group marks, so that the recognition degree of the pair of group marks is improved when the CCD is detected.
  • the CF substrate is a CF substrate in a BOA-structured liquid crystal display panel.
  • the organic material layer in the step 2 is a first organic material layer formed on the CF substrate.
  • the organic material layer in the step 2 is a photoresist spacer layer.
  • the step 3 sets a position and a size of a processing area by corresponding to each pair of group marks, and performs blackening processing on the pair of group marks in an enhanced manner within a range of the processing area.
  • the processing area completely covers the pair of group marks, and the area of the processing area is larger than Describe the area of the group mark.
  • the enhancement mode is laser burning, ultraviolet exposure, or carbonization.
  • the pair of group marks are disposed at intersections of each adjacent two sides of the CF substrate.
  • a pair mark of the same material as the organic material layer is formed on the CF substrate, and the pair mark is blackened to improve the pair.
  • the optical density of the group mark can improve the recognition of the group mark when the CCD is detected, so that the pair mark can provide a clear alignment reference for the subsequent process.
  • FIG. 1 is a schematic view of a CF substrate of a conventional liquid crystal display panel
  • FIG. 2 is a schematic view of a CF substrate of a conventional BOA structure liquid crystal display panel
  • FIG. 3 is a flow chart showing a method of fabricating a pair mark of a CF substrate according to the present invention
  • FIG. 4 is a schematic view showing a step 2 of a method for fabricating a group mark of a CF substrate according to the present invention
  • FIG. 5 to FIG. 7 are schematic diagrams showing the third step of the method for fabricating the group mark of the CF substrate of the present invention.
  • the present invention provides a method for fabricating a pair mark of a CF substrate, including the following steps:
  • Step 1 The CF substrate 1 is provided.
  • the CF substrate 1 is a CF substrate in a BOA-structured liquid crystal display panel. Since the liquid crystal display panel of the BOA structure fabricates the black matrix on the TFT substrate, the CF substrate 1 in the step 1 does not have a material having a high optical density, and does not have the same pair mark as the conventional structure liquid crystal display panel.
  • Step 2 as shown in FIG. 4, while the organic material layer 2 is formed on the CF substrate 1, a plurality of peripheral regions of the effective display region on the CF substrate 1 are formed in the same manner as the organic material layer 2.
  • the qualitative pair is labeled 3.
  • the organic material layer 2 may be any organic structural layer on the CF substrate 1, such as a photoresist spacer layer, a color resist layer, or the like, and form a pair using the same material as the organic material layer 2. Mark 3. Further, in order to ensure the accuracy of the subsequent process, the organic material layer 2 is selected as the first organic layer formed on the CF substrate 1. Preferably, the organic material layer 2 is a photoresist spacer layer.
  • the pair of mark 3 is located at the intersection of each adjacent side of the CF substrate 1. Since the material of the group mark 3 is the same organic material as the organic material layer 2, the optical density value is very low, and the CCD is very It is difficult to identify, so it is necessary to blacken the pair of markers 3 in a subsequent step.
  • Step 3 Please refer to FIG. 5 to FIG. 7 simultaneously, and perform blackening processing on the pair of group marks 3 so that the recognition degree of the pair of group marks 3 during CCD detection is improved.
  • the specific implementation process of the step 3 is: first, a processing area 4 is set corresponding to each pair of group marks 3, and the coordinate information is provided by the machine platform, and then the coordinate information is calibrated by the reticle to finally determine the The location and size of the processing area 4. Then, as shown in FIG. 6, in the range of the processing region 4, the group mark 3 is blackened by using a laser burning, ultraviolet exposure, or carbonization enhancement method to increase the optical density value of the pair of marks 3, Thereby improving CCD detection The recognition of the pair of markers 3 provides a clear alignment benchmark for subsequent processes.
  • the size of the processing region 4 is determined by the positioning accuracy of the machine platform, the yellow light processing accuracy of the organic material layer 2, and the like. As shown in FIG. 7, in order to completely blacken the group mark 3, the processing area 4 completely covers the pair of marks 3, and the area of the processing area 4 is larger than the area of the pair of marks 3. It is worth mentioning that, when the blackening process is performed, the pair of group marks 3 are not necessarily located at the center of the processing area 4, and it is only necessary to ensure that the group mark 3 is within the range of the processing area 4, and the processing area 4 is Complete coverage, can be completely blackened.
  • the method for fabricating the pair mark of the CF substrate forms a pair mark on the CF substrate in the same material as the organic material layer, and blackens the pair mark to improve the pair.
  • the optical density of the mark can improve the recognition of the set of marks during CCD detection, so that the pair of marks can provide a clear alignment reference for subsequent processes.

Abstract

一种CF基板的对组标记的制作方法，包括：步骤1、提供CF基板（1）；步骤2、在所述CF基板（1）上形成有机材料层（2）的同时，于CF基板（1）上有效显示区的外围区域形成数个与所述有机材料层（2）同样材质的对组标记（3），用于与TFT基板对组时对位；步骤3、对所述对组标记（3）进行黑化处理，使得该对组标记（3）在CCD探测时的识别度提高。该方法能够提高CCD探测时对对组标记的识别度，从而使得此种对组标记能为后续制程提供明确的对位基准。

Description

CF基板的对组标记的制作方法 技术领域
本发明涉及液晶显示技术领域，尤其涉及一种CF基板的对组标记的制作方法。
背景技术
液晶显示装置(Liquid Crystal Display，LCD，)具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。如：液晶电视、移动电话、个人数字助理(PDA)、数字相机、计算机屏幕或笔记本电脑屏幕等。
通常液晶显示装置包括壳体、设于壳体内的液晶显示面板及设于壳体内的背光模组(Backlight module)。其中，液晶显示面板的结构主要是由一薄膜晶体管阵列基板(Thin Film Transistor Array Substrate，TFT Array Substrate)、一彩色滤光片基板(Color Filter，CF)、以及配置于两基板间的液晶层(Liquid Crystal Layer)所构成，其工作原理是通过在两片玻璃基板上施加驱动电压来控制液晶层的液晶分子的旋转，将背光模组的光线折射出来产生画面。
如图1所示，在传统液晶显示面板架构中，CF基板100的第一道制程 为形成黑色矩阵(Black Matrix，BM)200，所述黑色矩阵200会形成像素区的遮光结构，同时该第一道制程还在像素区外围形成与所述黑色矩阵200的材质相同的对组标记300，用于为该CF基板100与TFT基板对组时提供对位基准。
随着液晶显示技术的发展，出现了一系列能够提高液晶显示面板的开口率的新技术，将黑色矩阵设置于TFT基板上的BOA(BM on Array)技术便是其中的一种。
但BOA技术也存在一些问题，如图2所示，由于BOA架构的面板中，黑色矩阵制作于TFT基板上，会导致另一侧的CF基板100’上仅剩色阻、光阻间隔物(Photo spacer，PS)200’、ITO像素电极等结构，而缺少高光学密度(Optical Density，OD)的材料，由于感光耦合探测器(Charge Coupled Device，CCD)对光学密度低的材料识别度不高，导致不能在CF基板上形成与传统架构液晶显示面板相同的对组标记，无法为后续制程提供明确的对位基准。
发明内容
本发明的目的在于提供一种CF基板的对组标记的制作方法，能够提高CCD探测时对对组标记的识别度，从而使得此种对组标记能为后续制程提 供明确的对位基准。
为实现上述目的，本发明提供一种CF基板的对组标记的制作方法，包括如下步骤：
步骤1、提供CF基板；
步骤2、在所述CF基板上形成有机材料层的同时，于CF基板上有效显示区的外围区域形成数个与所述有机材料层同样材质的对组标记，用于与TFT基板对组时对位；
步骤3、对所述对组标记进行黑化处理，使得该对组标记在CCD探测时的识别度提高。
所述CF基板为BOA架构液晶显示面板中的CF基板。
所述步骤2中有机材料层为CF基板上的任意有机结构层。
所述步骤2中有机材料层为所述CF基板上所形成的第一层有机材料层。
所述步骤2中有机材料层为光阻间隔物层。
所述步骤3通过对应每一对组标记设定一处理区域的位置与尺寸，在所述处理区域的范围内采用增强方式对所述对组标记进行黑化处理。
所述处理区域完全覆盖所述对组标记，且所述处理区域的面积大于所 述对组标记的面积。
通过由机台平台提供坐标信息，再通过光罩对所述坐标信息进行校准来最终确定所述处理区域的位置与尺寸，所述处理区域的尺寸由机台平台的定位精度、所述有机材料层的黄光制程精度共同决定。
所述增强方式为激光灼烧、紫外曝光、或碳化。
所述对组标记设于所述CF基板每相邻两边的相交处。
本发明的有益效果：本发明提供的CF基板的对组标记的制作方法，在CF基板上形成与有机材料层同样材质的对组标记，并对该对组标记进行黑化处理，提高了对组标记的光学密度，能够提高CCD探测时对对组标记的识别度，从而使得此种对组标记能为后续制程提供明确的对位基准。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其他有益效果显而易见。
附图中，
图1为传统液晶显示面板CF基板的示意图；
图2为现有BOA架构液晶显示面板CF基板的示意图；
图3为本发明CF基板的对组标记的制作方法的流程图；
图4为本发明CF基板的对组标记的制作方法的步骤2的示意图；
图5-图7为本发明CF基板的对组标记的制作方法的步骤3的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术处理及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图2至图7，本发明提供一种CF基板的对组标记的制作方法，包括如下步骤：
步骤1、提供CF基板1。
所述CF基板1为BOA架构液晶显示面板中的CF基板。由于BOA架构的液晶显示面板将黑色矩阵制作于TFT基板上，因此该步骤1中的CF基板1上不具有高光密度的材料，也不具有与传统架构液晶显示面板相同的对组标记。
步骤2、如图4所示，在所述CF基板1上形成有机材料层2的同时，于CF基板1上有效显示区的外围区域形成数个与所述有机材料层2同样材 质的对组标记3。
具体的，所述有机材料层2可以是所述CF基板1上的任意有机结构层，如光阻间隔物层、色阻层等，并且使用与所述有机材料层2相同的材质形成对组标记3。进一步的，为了保证后续制程的精度，选择该有机材料层2为CF基板1上所形成的第一层有机层。优选的，所述有机材料层2为光阻间隔物层。
所述对组标记3位于所述CF基板1每相邻两边的相交处由于此时对组标记3的材质为与有机材料层2同样的有机材料，其光学密度值很低，在CCD下很难识别，因此需要在后续步骤中对所述对组标记3进行黑化处理。
步骤3、请同时参阅图5-图7，对所述对组标记3进行黑化处理，使得该对组标记3在CCD探测时的识别度提高。
该步骤3的具体实施过程为：首先，对应每一对组标记3设定一处理区域4，通过由机台平台提供坐标信息，再通过光罩对所述坐标信息进行校准来最终确定所述处理区域4的位置与尺寸。然后如图6所示，在该处理区域4的范围内采用激光灼烧、紫外曝光、或碳化等增强方式对对组标记3进行黑化处理，提高所述对组标记3的光学密度值，从而提高CCD探测时 对所述对组标记3的识别度，为后续制程提供明确的对位基准。
所述处理区域4的尺寸由机台平台的定位精度、所述有机材料层2的黄光制程精度等共同决定。如图7所示，为了使对组标记3完全得到黑化处理，所述处理区域4完全覆盖所述对组标记3，且所述处理区域4的面积大于所述对组标记3的面积。值得一提的是，在进行黑化处理时，所述对组标记3不一定位于处理区域4的正中心位置，只需保证对组标记3在处理区域4的范围内，被该处理区域4完全覆盖，能够被黑化完全即可。
综上所述，本发明提供的CF基板的对组标记的制作方法，在CF基板上形成与有机材料层同样材质的对组标记，并对该对组标记进行黑化处理，提高了对组标记的光学密度，能够提高CCD探测时对对组标记的识别度，从而使得此种对组标记能为后续制程提供明确的对位基准。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (11)

  1. 一种CF基板的对组标记的制作方法，包括如下步骤：
    步骤1、提供CF基板；
    步骤2、在所述CF基板上形成有机材料层的同时，于CF基板上有效显示区的外围区域形成数个与所述有机材料层同样材质的对组标记，用于与TFT基板对组时对位；
    步骤3、对所述对组标记进行黑化处理，使得该对组标记在CCD探测时的识别度提高。
  2. 如权利要求1所述的CF基板的对组标记的制作方法，其中，所述CF基板为BOA架构液晶显示面板中的CF基板。
  3. 如权利要求1所述的CF基板的对组标记的制作方法，其中，所述步骤2中有机材料层为CF基板上的任意有机结构层。
  4. 如权利要求3所述的CF基板的对组标记的制作方法，其中，所述步骤2中有机材料层为所述CF基板上所形成的第一层有机材料层。
  5. 如权利要求4所述的CF基板的对组标记的制作方法，其中，所述步骤2中有机材料层为光阻间隔物层。
  6. 如权利要求1所述的CF基板的对组标记的制作方法，其中，所述 步骤3通过对应每一对组标记设定一处理区域的位置与尺寸，在所述处理区域的范围内采用增强方式对所述对组标记进行黑化处理。
  7. 如权利要求6所述的CF基板的对组标记的制作方法，其中，所述处理区域完全覆盖所述对组标记，且所述处理区域的面积大于所述对组标记的面积。
  8. 如权利要求6所述的CF基板的对组标记的制作方法，其中，通过由机台平台提供坐标信息，再通过光罩对所述坐标信息进行校准来最终确定所述处理区域的位置与尺寸，所述处理区域的尺寸由机台平台的定位精度、所述有机材料层的黄光制程精度共同决定。
  9. 如权利要求6所述的CF基板的对组标记的制作方法，其中，所述增强方式为激光灼烧、紫外曝光、或碳化。
  10. 如权利要求1所述的CF基板的对组标记的制作方法，其中，所述对组标记设于所述CF基板每相邻两边的相交处。
  11. 一种CF基板的对组标记的制作方法，包括如下步骤：
    步骤1、提供CF基板；
    步骤2、在所述CF基板上形成有机材料层的同时，于CF基板上有效显示区的外围区域形成数个与所述有机材料层同样材质的对组标记，用于 与TFT基板对组时对位；
    步骤3、对所述对组标记进行黑化处理，使得该对组标记在CCD探测时的识别度提高；
    其中，所述CF基板为BOA架构液晶显示面板中的CF基板；
    其中，所述步骤2中有机材料层为CF基板上的任意有机结构层；
    其中，所述步骤2中有机材料层为所述CF基板上所形成的第一层有机材料层；
    其中，所述步骤2中有机材料层为光阻间隔物层；
    其中，所述步骤3通过对应每一对组标记设定一处理区域的位置与尺寸，在所述处理区域的范围内采用增强方式对所述对组标记进行黑化处理；
    其中，所述处理区域完全覆盖所述对组标记，且所述处理区域的面积大于所述对组标记的面积；
    其中，通过由机台平台提供坐标信息，再通过光罩对所述坐标信息进行校准来最终确定所述处理区域的位置与尺寸，所述处理区域的尺寸由机台平台的定位精度、所述有机材料层的黄光制程精度共同决定；
    其中，所述增强方式为激光灼烧、紫外曝光、或碳化；
    其中，所述对组标记设于所述CF基板每相邻两边的相交处。
PCT/CN2014/086590 2014-08-26 2014-09-16 Cf基板的对组标记的制作方法 WO2016029516A1 (zh)

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