WO2017045238A1 - 一种触控面板及其制备方法 - Google Patents

一种触控面板及其制备方法 Download PDF

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Publication number
WO2017045238A1
WO2017045238A1 PCT/CN2015/091890 CN2015091890W WO2017045238A1 WO 2017045238 A1 WO2017045238 A1 WO 2017045238A1 CN 2015091890 W CN2015091890 W CN 2015091890W WO 2017045238 A1 WO2017045238 A1 WO 2017045238A1
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black matrix
touch
touch electrode
touch panel
photoresist
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PCT/CN2015/091890
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English (en)
French (fr)
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王俊
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深圳市华星光电技术有限公司
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Priority to US14/897,700 priority Critical patent/US20180157082A1/en
Publication of WO2017045238A1 publication Critical patent/WO2017045238A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a touch panel and a method of fabricating the same.
  • Touch Panel As a kind of input device for human-computer interaction, Touch Panel (TP) is widely used in mobile phones, personal digital assistants (PDAs), multimedia, public information inquiry systems, and the like.
  • PDAs personal digital assistants
  • the user can touch and touch the touch panel with a finger or a special pen to identify and select characters, symbols, menus, and the like displayed on the display panel behind the touch panel, thereby implementing an input function.
  • the capacitive touch panel generally realizes the preparation of the touch electrode by forming a transparent conductive layer on the base substrate, and then exposing and etching the transparent conductive layer by using a corresponding mask. Thereafter, a black color resist layer is formed on the transparent conductive layer, and a black matrix is formed by a process such as exposure, etching, or the like by using a photomask corresponding to the black matrix.
  • the exposure processes of the transparent conductive layer and the black color resist layer are performed separately, they correspond to different masks.
  • the error caused by replacing the mask will affect the relative position of the touch electrode and the black matrix.
  • the steps of photoresist coating, soft baking, hard baking, exposure, development, etching, and photoresist removal are required in the mask process, which requires more processing time and reduces the production efficiency of the touch panel. Increase the production cost of the touch panel.
  • An object of the present invention is to provide a touch panel and a method for fabricating the same, which can improve the production efficiency of the touch panel and reduce the production cost of the touch panel.
  • a first aspect of the present invention provides a touch panel, the touch panel includes a base substrate, and further includes:
  • a black matrix on the base substrate a black matrix on the touch electrode, the black matrix and the touch electrode are in the same pattern, and the black matrix and the touch The electrodes are completely coincident.
  • the black matrix and the touch electrode comprise a horizontal row and a column, and the horizontal row and the column are perpendicular to each other.
  • the black matrix is continuously disposed; where the touch electrodes are intermittent, the black matrix is intermittently disposed.
  • the black matrix and/or the touch electrode are intermittently located at a position where the horizontal row and the column are connected.
  • the black matrix is located on the touch electrode, is identical to the pattern of the touch electrode, and completely overlaps, and the material of the black matrix is different from the touch electrode. Therefore, the black matrix not only has a light-shielding effect, but can also be used as a mask of the touch electrode when the touch electrode is formed. This not only improves the alignment accuracy of the black matrix and the touch electrodes, but also eliminates the mask of the black matrix or the touch electrodes. Therefore, the technical solution provided by the embodiments of the present invention is advantageous for simplifying the preparation process of the touch panel, saving the manufacturing cost of the touch panel, and improving the production efficiency of the touch panel.
  • a second aspect of the present invention provides a method for manufacturing a touch panel, the method comprising:
  • the transparent conductive layer is etched based on the pattern of the formed black matrix to form the touch electrode.
  • the black color resist layer is patterned by using a photomask forming a touch electrode, and forming a black matrix includes:
  • the black color resist layer is etched to form a black matrix based on the pattern of the photoresist formed after the development process.
  • the black matrix and the touch electrode comprise a horizontal row and a column, and the horizontal row and the column are perpendicular to each other.
  • the black matrix is continuously disposed; where the touch electrodes are intermittent, the black matrix is intermittently disposed.
  • the black matrix and/or the touch electrode are intermittently located at a position where the horizontal row and the column are connected.
  • FIG. 1 is a schematic structural diagram of a touch panel according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a pattern of a black matrix according to an embodiment of the present invention.
  • FIG. 3 is a schematic flow chart of a method for preparing a touch panel according to an embodiment of the present invention
  • FIG. 4 to FIG. 6 are schematic diagrams showing a process of preparing a touch panel according to an embodiment of the present invention.
  • the touch panel can be designed as an in-line structure, so that the touch panel can be integrated with the display panel.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • Such a structure can reduce the thickness of the entire display device to some extent and simplify the production process.
  • a TFT-LCD For a TFT-LCD, it generally includes a TFT array substrate, a color filter substrate (CF) bonded to the TFT array substrate, and a liquid crystal layer disposed therebetween. Since a large number of conductive structures are disposed on the TFT array substrate, the structure of the touch panel is generally disposed on the color filter substrate.
  • CF color filter substrate
  • the embodiment of the present invention provides a touch panel disposed on a color film substrate, the touch panel includes a base substrate 1, a touch electrode 2, and a black matrix 3, wherein the touch electrode 2 is located in the lining Above the base substrate 1, the black matrix 3 is located above the touch electrode 2. Specifically, as shown in FIG. 1 , the black matrix 3 and the touch electrode 2 have the same pattern, and the black matrix 3 completely overlaps the touch electrode 2 .
  • the touch electrode 2 includes horizontal rows and columns perpendicular to each other.
  • the touch panel used in the embodiment of the present invention is self-contained, so the touch electrodes 2 are not continuous. Where the touch electrode 2 is disconnected, the cross sections of the two opposite touch electrodes 2 form a capacitance. When the user has a touch action, the charge in the capacitor changes, and the touch panel detects the user's touch action.
  • the black matrix 3 in the embodiment of the present invention has the same pattern and completely coincides with the pattern of the touch electrodes 2. Therefore, the black matrix 3 also includes horizontal rows and columns, and the horizontal rows and the vertical columns are perpendicular to each other. In the embodiment of the present invention, the black matrix 3 is also continuously disposed where the touch electrodes 2 are continuous; correspondingly, the black matrix 3 is also intermittently disposed where the touch electrodes 2 are interrupted.
  • the place where the touch electrode 2 is interrupted is located where the horizontal row and the column are connected. Therefore, as shown in the dotted line frame of Fig. 2, the place where the black matrix 3 is interrupted is also located where the horizontal row and the column are connected.
  • the black matrix 3 is located on the touch electrode 2 and is identical to the pattern of the touch electrode 2 and completely overlaps, and the material of the black matrix 3 is different from the touch electrode 2 . Therefore, the black matrix 3 not only has a light blocking effect, but can also be used as a mask of the touch electrode 2 when the touch electrode 2 is formed. In this way, not only the alignment accuracy of the black matrix 3 and the touch electrode 2 can be improved, but also the mask of the black matrix 3 or the touch electrode 2 can be omitted. Therefore, the technical solution provided by the embodiments of the present invention is advantageous for simplifying the preparation process of the touch panel, saving the manufacturing cost of the touch panel, and improving the production efficiency of the touch panel.
  • the embodiment of the present invention further provides a method for preparing a touch panel. As shown in FIG. 3, the method includes:
  • Step S101 providing a substrate.
  • the base substrate 1 is a base substrate 1 of a color filter substrate, and can be prepared from a material having high transparency, low cost, and easy availability, such as tempered glass.
  • Step S102 sequentially forming a transparent conductive layer and a black color resist layer on the substrate.
  • a transparent conductive layer 4 is first formed on the base substrate 1.
  • the material of the transparent conductive layer 4 may be Indium Tin Oxides (ITO) or Indium Zinc Oxides (IZO). ) A highly transparent conductive material.
  • the transparent conductive layer 4 can be formed by magnetron sputtering or chemical vapor deposition.
  • a black color resist layer 5 is formed over the formed transparent conductive layer 4.
  • the black color resist layer 5 can be formed by coating a black resin polymer.
  • Step S103 performing a patterning process on the black color resist layer by using a photomask forming the touch electrode to form a black matrix.
  • the pattern of the black matrix 3 is completely the same as that of the touch electrode 2, and the black matrix 3 completely overlaps with the touch electrode 2.
  • the black color resist layer 5 is located on the transparent conductive layer 4, so it is first necessary to form a black matrix 3 by patterning the black color resist layer 5.
  • the process of patterning the black color resist layer 5 is as follows:
  • Photoresist also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer (see spectral sensitizing dye) and solvent.
  • the photoresist is a mixed liquid, it is necessary to pre-baking the photoresist at a certain temperature to cure the photoresist before exposing the photoresist to the photoresist. Thereafter, the photoresist is exposed to light using the photomask forming the touch electrode 2. Specifically, the photoresist is applied by using ultraviolet light having a wavelength of 200 nm to 450 nm. Exposure processing. The exposure time depends on the thickness and type of the photoresist, and the control varies from 20 seconds to 180 seconds.
  • the exposed photoresist is subjected to development processing. Due to the action of the reticle, the photoresist portion is exposed and partially unexposed. If the photoresist is a positive photoresist, the exposed portion is easily dissolved in the developer due to a change in chemical composition. Therefore, after the development process, the photoresist remains unexposed portions, which corresponds to the non-transmissive regions on the mask. That is, the photoresist is exposed and developed in order to transfer the pattern of the non-transmissive region on the photomask to the photoresist.
  • the black color resist layer 5 is no longer completely covered by the photoresist, but is partially covered by the photoresist.
  • the black color resist layer 5 may be subjected to an etching process based on the pattern of the photoresist formed after the development process. Specifically, the black color resist layer 5 covered by the photoresist cannot be in contact with the etching liquid and is completely retained; and the black color resist layer 5 not covered by the photoresist is corroded by the etching liquid and completely removed. .
  • the pattern on the photomask is transferred to the black color resist layer 5 via the photoresist to form the black matrix 3 required by the embodiment of the present invention, as shown in FIG.
  • Step S104 Perform an etching process on the transparent conductive layer based on the formed pattern of the black matrix to form a touch electrode.
  • the black matrix 3 not only has a light shielding effect, but also serves as a mask for the transparent conductive layer 4 in the subsequent step. That is, the engineer can etch the transparent conductive layer 4 directly based on the pattern of the formed black matrix 3. Since the material of the transparent conductive layer 4 is different from that of the black matrix 3, the etching liquid for etching the transparent conductive layer 4 cannot etch the black matrix 3 and further contact the portion of the transparent conductive layer 4 covered by the black matrix 3, and can only act on the The portion of the transparent conductive layer 4 covered with the black matrix 3 is covered. Therefore, the transparent conductive layer 4 can be directly etched based on the pattern of the formed black matrix 3 to form the touch electrode 2, as shown in FIG.
  • the manufacturing process of the touch panel omits the mask of the touch electrode 2 or the black matrix 3 on the one hand, simplifies the process flow, saves the processing time, improves the production efficiency, and reduces the production cost.
  • the black matrix 3 can be used as a mask for etching the touch electrode 2 to realize self-alignment of the black matrix 3 and the touch electrode 2, improve the alignment accuracy, and effectively avoid the occurrence of the moiré problem.

Abstract

一种触控面板及其制备方法，该触控面板包括衬底基板（1），设置于所述衬底基板（1）之上的触控电极（2）、位于所述触控电极（2）之上的黑矩阵（3），所述黑矩阵（3）与所述触控电极（2）的图案相同，且所述黑矩阵（3）与所述触控电极（2）完全重合。其属于显示技术领域，可提高触控面板的生产效率，降低触控面板的生产成本。

Description

一种触控面板及其制备方法
本申请要求享有2015年9月15日提交的名称为“一种触控面板及其制备方法”的中国专利申请CN201510586624.0的优先权，其全部内容通过引用并入本文中。
技术领域
本发明涉及显示技术领域，具体地说，涉及一种触控面板及其制备方法。
背景技术
触控面板(Touch Panel，简称TP)作为一种人机交互的输入装置，被广泛应用在手机、掌上电脑(Personal Digital Assistant，简称PDA)、多媒体、公共信息查询系统等。用户可以通过手指或专用笔接触触控面板，对位于触控面板后面的显示面板所显示的文字、符号、菜单等进行识别与选择操作，从而实现输入功能。
目前，使用较为广泛的触控面板为电容式触控面板。现有技术中，电容式触控面板一般是通过在衬底基板上形成透明导电层，再使用对应的光罩对透明导电层进行曝光、刻蚀等工艺，来实现触控电极的制备。之后，在透明导电层之上形成黑色色阻层，利用与黑矩阵对应的光罩，经过曝光、刻蚀等工艺形成黑矩阵。
由于透明导电层和黑色色阻层的曝光工艺是分开进行的，分别对应不同的光罩。更换光罩产生的误差将影响触控电极和黑矩阵的相对位置。并且，光罩制程中需要进行光刻胶涂布、软烤、硬烤、曝光、显影、刻蚀及移除光刻胶等步骤，需花费较多制程时间，降低了触控面板的生产效率，提高了触控面板的生产成本。
发明内容
本发明的目的在于提供一种触控面板及其制备方法，可提高触控面板的生产效率，降低触控面板的生产成本。
本发明第一方面提供了一种触控面板，该触控面板包括衬底基板，还包括：
设置于所述衬底基板之上的触控电极、位于所述触控电极之上的黑矩阵，所述黑矩阵与所述触控电极的图案相同，且所述黑矩阵与所述触控电极完全重合。
可选的，所述黑矩阵和所述触控电极包括横排与纵列，横排与纵列相互垂直。
可选的，所述触控电极连续的地方，所述黑矩阵连续设置；所述触控电极间断的地方，所述黑矩阵间断设置。
可选的，所述黑矩阵和/或所述触控电极间断的地方，位于横排与纵列连接之处。
本发明带来了以下有益效果：本发明实施例中，由于黑矩阵位于触控电极之上、与触控电极的图案相同且完全重合，并且黑矩阵的材质与触控电极不相同。因此，黑矩阵不仅具有遮光作用，还可在形成触控电极时，作为触控电极的掩膜使用。这样不仅可以提高黑矩阵和触控电极的对位精度，还可省去黑矩阵或触控电极的光罩。因此，本发明实施例提供的技术方案有利于简化触控面板的制备工艺、节省触控面板的制备成本，还有利于提高触控面板的生产效率。
本发明第二方面提供了一种触控面板制备方法，该方法包括：
提供一衬底基板；
在所述衬底基板之上依次形成透明导电层和黑色色阻层；
利用形成触控电极的光罩，对所述黑色色阻层进行构图工艺，形成黑矩阵；
基于所形成的黑矩阵的图案，对透明导电层进行刻蚀工艺，形成所述触控电极。
可选的，利用形成触控电极的光罩，对所述黑色色阻层进行构图工艺，形成黑矩阵包括：
在所述黑色色阻层之上形成光刻胶；
利用形成触控电极的光罩，对光刻胶进行曝光处理；
对曝光处理后的光刻胶进行显影处理；
基于显影处理后形成的光刻胶的图案，对黑色色阻层进行刻蚀工艺，形成黑矩阵。
可选的，所述黑矩阵和所述触控电极包括横排与纵列，横排与纵列相互垂直。
可选的，所述触控电极连续的地方，所述黑矩阵连续设置；所述触控电极间断的地方，所述黑矩阵间断设置。
可选的，所述黑矩阵和/或所述触控电极间断的地方，位于横排与纵列连接之处。
本发明的其它特征和优点将在随后的说明书中阐述，并且，部分地从说明书中变得显而易见，或者通过实施本发明而了解。本发明的目的和其他优点可通过在说明书、权利要求书以及附图中所特别指出的结构来实现和获得。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要的附图做简单的介绍：
图1是本发明实施例提供的触控面板的结构示意图；
图2是本发明实施例提供的黑矩阵的图案示意图；
图3是本发明实施例提供的触控面板的制备方法的流程示意图；
图4至图6是本发明实施例提供的触控面板的制备过程示意图。
具体实施方式
以下将结合附图及实施例来详细说明本发明的实施方式，借此对本发明如何应用技术手段来解决技术问题，并达成技术效果的实现过程能充分理解并据以实施。需要说明的是，只要不构成冲突，本发明中的各个实施例以及各实施例中的各个特征可以相互结合，所形成的技术方案均在本发明的保护范围之内。
在薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display，简称TFT-LCD)等平板显示装置中，触控面板可设计成内嵌结构，从而触控面板能够与显示面板集成在一起。这样的结构可以一定程度上减少整个显示装置的厚度，并简化生产工艺。
对于TFT-LCD而言，其通常包括TFT阵列基板、与TFT阵列基板贴合的彩膜基板(Color Filter，简称CF)及配置于二者之间的液晶层。由于TFT阵列基板上布设有大量的导电结构，因此一般是将触控面板的结构设置于彩膜基板上。
基于上述前提，本发明实施例提供了一种配置于彩膜基板上的触控面板，该触控面板包括衬底基板1、触控电极2和黑矩阵3，其中，触控电极2位于衬底基板1之上，黑矩阵3位于触控电极2之上。具体的，如图1所示，黑矩阵3与触控电极2的图案相同，且黑矩阵3与触控电极2完全重合。
本发明实施例中，触控电极2包括相互垂直的横排与纵列。本发明实施例采用的触控面板为自容式的，因此触控电极2并不是处处连续的。在触控电极2断开的地方，两个相对的触控电极2的断面形成电容。当用户有触控动作时，电容中的电荷会发生变化，触控面板以此来检测用户的触控动作。
由于本发明实施例中的黑矩阵3与触控电极2的图案相同且完全重合。因此，黑矩阵3同样包括横排与纵列，横排与纵列相互垂直。本发明实施例中，触控电极2连续的地方，黑矩阵3也连续设置；相应的，触控电极2间断的地方，黑矩阵3也间断设置。
本发明实施例中，触控电极2间断的地方，位于横排与纵列连接之处。因此，如图2的虚线框内所示，黑矩阵3中断的地方，也同样位于横排与纵列连接之处。
显然，本发明实施例中，由于黑矩阵3位于触控电极2之上、与触控电极2的图案相同且完全重合，并且黑矩阵3的材质与触控电极2不相同。因此，黑矩阵3不仅具有遮光作用，还可在形成触控电极2时，作为触控电极2的掩膜使用。这样不仅可以提高黑矩阵3和触控电极2的对位精度，还可省去黑矩阵3或触控电极2的光罩。因此，本发明实施例提供的技术方案有利于简化触控面板的制备工艺、节省触控面板的制备成本，还有利于提高触控面板的生产效率。
具体的，本发明实施例还提供了一种触控面板的制备方法，如图3所示，该方法包括：
步骤S101、提供一衬底基板。
该衬底基板1即为彩膜基板的衬底基板1，可采用钢化玻璃等透明度高、成本低、易获得的材质制备。
步骤S102、在衬底基板之上依次形成透明导电层和黑色色阻层。
如图4所示，首先在衬底基板1之上形成透明导电层4，透明导电层4的材料可为氧化铟锡(Indium Tin Oxides，简称ITO)、氧化铟锌(Indium Zinc Oxides，简称IZO)等透明度较高的导电材料。透明导电层4可通过磁控溅射法或化学气相沉积法形成。
之后，如图5所示，在所形成的透明导电层4之上形成黑色色阻层5。黑色色阻层5可通过涂覆黑色树脂聚合物形成。
步骤S103、利用形成触控电极的光罩，对黑色色阻层进行构图工艺，形成黑矩阵。
由于本发明实施例中，黑矩阵3的图案与触控电极2完全相同，且黑矩阵3与触控电极2完全重合。而黑色色阻层5位于透明导电层4之上，因此首先需要对黑色色阻层5进行构图工艺形成黑矩阵3。
其中，对黑色色阻层5的构图工艺的过程大致如下：
首先，在黑色色阻层5之上通过涂覆的方法形成一定厚度的光刻胶。光刻胶又称光致抗蚀剂，由感光树脂、增感剂(见光谱增感染料)和溶剂三种主要成分组成的对光敏感的混合液体。
由于光刻胶是一种混合液体，因此在利用光罩对光刻胶进行曝光处理之前，需要以一定的温度、对光刻胶进行预烘烤，以固化光刻胶。之后，再利用形成触控电极2的光罩，对光刻胶进行曝光处理。具体的，采用波长为200nm至450nm的紫外光，对光刻胶进行 曝光处理。曝光时长视光刻胶的厚度和类型而定，控制在20秒至180秒不等。
之后，对曝光处理后的光刻胶进行显影处理。由于光罩的作用，光刻胶部分受到曝光，部分未受到曝光。若光刻胶为正性光刻胶，受到曝光的部分由于化学成分发生了变化，易溶于显影液。因此，显影处理之后，光刻胶残留下未受到曝光的部分，这一部分正对应着光罩上的非透光区域。即对光刻胶进行曝光显影，是为了将光罩上的非透光区域的图案转移到光刻胶上。
显影处理后，黑色色阻层5不再完全被光刻胶覆盖，而是部分被光刻胶覆盖。此时，可基于显影处理后形成的光刻胶的图案，对黑色色阻层5进行刻蚀工艺。具体的，被光刻胶覆盖的黑色色阻层5无法接触到刻蚀液，被完全保留下来；而未被光刻胶覆盖的黑色色阻层5则受到刻蚀液的腐蚀，被完全去除。相当于光罩上的图案经由光刻胶，转移到了黑色色阻层5上，形成本发明实施例所需的黑矩阵3，如图6所示。
在形成黑矩阵3之后，黑矩阵3之上还残留有部分光刻胶，因此，需要通过剥离工艺，去除黑矩阵3之上的光刻胶。
步骤S104、基于所形成的黑矩阵的图案，对透明导电层进行刻蚀工艺，形成触控电极。
在本发明实施例中，黑矩阵3不仅具有遮光作用，还能作为后续步骤中透明导电层4的掩膜。即工程人员可直接基于所形成的黑矩阵3的图案，对透明导电层4进行刻蚀。由于透明导电层4的材料与黑矩阵3不同，因此刻蚀透明导电层4的刻蚀液无法刻蚀黑矩阵3进而接触到由黑矩阵3覆盖的透明导电层4部分，只能作用于未覆盖有黑矩阵3的透明导电层4部分。所以，可以基于所形成的黑矩阵3的图案，直接刻蚀透明导电层4，形成触控电极2，如图1所示。
本发明实施例提供的触控面板的制备工艺，一方面省去了触控电极2或黑矩阵3专用的光罩，简化了工艺流程，节省了制程时间，提高了生产效率，降低了生产成本；另一方面可将黑矩阵3作为刻蚀触控电极2的掩膜，实现黑矩阵3和触控电极2的自对位，提高对位精度，有效避免摩尔纹问题的发生。
虽然本发明所公开的实施方式如上，但所述的内容只是为了便于理解本发明而采用的实施方式，并非用以限定本发明。任何本发明所属技术领域内的技术人员，在不脱离本发明所公开的精神和范围的前提下，可以在实施的形式上及细节上作任何的修改与变化，但本发明的专利保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (9)

  1. 一种触控面板，包括衬底基板，还包括：
    设置于所述衬底基板之上的触控电极、位于所述触控电极之上的黑矩阵，所述黑矩阵与所述触控电极的图案相同，且所述黑矩阵与所述触控电极完全重合。
  2. 根据权利要求1所述的触控面板，其中所述黑矩阵和所述触控电极包括横排与纵列，横排与纵列相互垂直。
  3. 根据权利要求2所述的触控面板，其中，
    所述触控电极连续的地方，所述黑矩阵连续设置；
    所述触控电极间断的地方，所述黑矩阵间断设置。
  4. 根据权利要求3所述的触控面板，其中，
    所述黑矩阵和/或所述触控电极间断的地方，位于横排与纵列连接之处。
  5. 一种触控面板的制备方法，包括：
    提供一衬底基板；
    在所述衬底基板之上依次形成透明导电层和黑色色阻层；
    利用形成触控电极的光罩，对所述黑色色阻层进行构图工艺，形成黑矩阵；
    基于所形成的黑矩阵的图案，对透明导电层进行刻蚀工艺，形成所述触控电极。
  6. 根据权利要求5所述的方法，其中，利用形成触控电极的光罩，对所述黑色色阻层进行构图工艺，形成黑矩阵包括：
    在所述黑色色阻层之上形成光刻胶；
    利用形成触控电极的光罩，对光刻胶进行曝光处理；
    对曝光处理后的光刻胶进行显影处理；
    基于显影处理后形成的光刻胶的图案，对黑色色阻层进行刻蚀工艺，形成黑矩阵。
  7. 根据权利要求6所述的方法，其中，
    所述黑矩阵和所述触控电极包括横排与纵列，横排与纵列相互垂直。
  8. 根据权利要求7所述的方法，其中，
    所述触控电极连续的地方，所述黑矩阵连续设置；
    所述触控电极间断的地方，所述黑矩阵间断设置。
  9. 根据权利要求8所述的方法，其中，
    所述黑矩阵和/或所述触控电极间断的地方，位于横排与纵列连接之处。
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