WO2016019643A1 - 有机电致发光显示面板、其制作方法及显示装置 - Google Patents

有机电致发光显示面板、其制作方法及显示装置 Download PDF

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Publication number
WO2016019643A1
WO2016019643A1 PCT/CN2014/090290 CN2014090290W WO2016019643A1 WO 2016019643 A1 WO2016019643 A1 WO 2016019643A1 CN 2014090290 W CN2014090290 W CN 2014090290W WO 2016019643 A1 WO2016019643 A1 WO 2016019643A1
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Prior art keywords
defining layer
pixel defining
layer structure
display panel
substrate
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PCT/CN2014/090290
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English (en)
French (fr)
Inventor
宋莹莹
洪晓雯
洪豪志
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京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/768,993 priority Critical patent/US9691830B2/en
Priority to EP14882128.3A priority patent/EP3179513B1/en
Publication of WO2016019643A1 publication Critical patent/WO2016019643A1/zh

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/191Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/1201Manufacture or treatment

Definitions

  • At least one embodiment of the present invention is directed to an organic electroluminescence display panel, a method of fabricating the same, and a display device.
  • OLED organic electroluminescence display
  • the basic structure of the OLED includes a substrate, an anode, an illuminating layer and a cathode which are sequentially disposed on the substrate, and the illuminating principle is: when the voltage is respectively applied to the anode and the cathode to form a current, the electrons in the cathode and the anode The holes combine to form excitons in the light-emitting layer, and the organic material in the light-emitting layer is excited to emit light.
  • the luminescent layer can be fabricated by inkjet printing technology.
  • a pixel defining layer can be formed on the substrate substrate on which the anode is formed to define the position of each pixel region, and then corresponding to each pixel region in the pixel defining layer.
  • a light-emitting layer is formed in the opening region, and finally a film layer of the cathode is formed on the light-emitting layer.
  • At least one embodiment of the present invention provides an organic electroluminescence display panel, a method of fabricating the same, and a display device, so that a film layer formed after a pixel defining layer has better uniformity, thereby improving luminescent properties of the OLED.
  • At least one embodiment of the present invention provides an organic electroluminescence display panel comprising: a substrate substrate, and a pixel defining layer on the substrate substrate; the pixel defining layer having the organic electro An opening area corresponding to a pixel area of the light emitting display panel, wherein an opening of each opening area is larger than a bottom surface of the opening area; an upper surface of the pixel defining layer is a liquid repellency material, and an inclined surface of the pixel defining layer corresponding to the opening area It is a lyophilic material.
  • At least one embodiment of the present invention further provides a method for fabricating the above-described organic electroluminescent display panel according to an embodiment of the present invention, the method comprising: forming a pixel defining layer on a substrate; Having the pixel defining layer have an opening area corresponding to the pixel area of the organic electroluminescent display panel, the opening of each opening area is larger than the bottom surface of the opening area, and the upper surface of the pixel defining layer is a liquid repellency material, the pixel defining layer The inclined surface corresponding to the opening region is a lyophilic material.
  • At least one embodiment of the present invention also provides a display device including the above-described organic electroluminescent display panel provided by the embodiment of the present invention.
  • FIG. 1a and 1b are schematic structural views of an organic electroluminescent display panel of a pixel defining layer, respectively;
  • FIG. 2a is a top view of an organic electroluminescent display panel according to an embodiment of the present invention.
  • Figure 2b is a schematic cross-sectional view of Figure 2a along the A-A' direction;
  • FIG. 3 is a flow chart of a method for fabricating an organic electroluminescence display panel according to an embodiment of the present invention
  • FIG. 4 is a flow chart of a method for fabricating an organic electroluminescence display panel according to an embodiment of the present invention
  • FIG. 5 is a flowchart of a method for fabricating an organic electroluminescence display panel according to an embodiment of the present invention
  • FIG. 6 is a schematic structural diagram of a method for fabricating an organic electroluminescence display panel according to an embodiment of the present invention after each step is performed;
  • FIG. 7 is a schematic structural diagram of a method for fabricating an organic electroluminescence display panel according to an embodiment of the present invention after each step is performed.
  • the pixel defining layer in the OLED there are mainly two structures for the pixel defining layer in the OLED.
  • One is to use a pixel defining layer having a positive trapezoidal cross section with an upper bottom side smaller than the lower bottom side, as shown in FIG. 1a (only a part is shown in the figure); generally, the positive trapezoidal pixel defining layer 10 is completed after the fabrication is completed. The problem of color mixing of adjacent pixel regions is avoided, and the surface of the pixel defining layer is hydrophobic by hydrophobic treatment.
  • the inventors of the present application have noticed that it is easy to cause uneven spreading of the light-emitting layer 20 which is subsequently formed in the opening region of the pixel defining layer, resulting in the occurrence of minute voids 30 in the light-emitting layer 20, so that It is easy to short-circuit the cathode 40 formed later and the anode 50 located under the light-emitting layer at the minute gap 30.
  • the other is to use a pixel-defining layer having an inverted trapezoidal cross section with an upper base side larger than the lower base side, as shown in FIG.
  • the inverted trapezoidal pixel defining layer 60 can avoid the cathode 70 and The anode 80 is short-circuited, but the inventors of the present application have noticed that the inverted trapezoidal pixel defining layer 60 easily causes the cathode 70 to be formed to be broken.
  • the structure of the above-mentioned pixel defining layer affects the uniformity of the film layer formed later, and affects the luminescent properties of the OLED.
  • each film layer in the drawings do not reflect the true proportion of the organic electroluminescent display panel, and the purpose is merely to illustrate the contents of the present invention.
  • At least one embodiment of the present invention provides an organic electroluminescence display panel, as shown in FIGS. 2a and 2b, the organic electroluminescent display panel comprising: a substrate substrate 100, and pixels on the substrate substrate 100 Layer 200 is defined.
  • the pixel defining layer 200 has an opening region 300 corresponding to a pixel region of the organic electroluminescent display panel, and an opening of each of the opening regions 300 is larger than a bottom surface of the opening region.
  • the opening of the opening region 300 in a section perpendicular to the substrate substrate is larger than the bottom edge, and the width of the cross section increases first and then decreases from the opening to the bottom edge, and can be regarded as a structure similar to an inverted trapezoid, that is, the pixel defining layer 200 is perpendicular to
  • the upper base of the cross section of the base substrate 100 is smaller than the lower base, and the width of the cross section is first decreased from the upper base to the lower base and then increased, and may be regarded as a structure similar to a positive trapezoid; or, for example, the open area 300
  • the opening in the section perpendicular to the substrate substrate is larger than the bottom edge, and the width of the section gradually decreases from the opening to the bottom side, and is an inverted trapezoidal structure, that is, the upper boundary of the section of the pixel defining layer 200 perpendicular to the substrate substrate 100 is smaller than The lower bottom edge, and the width of the cross section gradually increases from the upper bottom edge to the
  • the pixel defining layer provided in the above-mentioned organic electroluminescent display panel provided by the embodiment of the invention has an opening area corresponding to the pixel area of the organic electroluminescent display panel, and the opening of each opening area is larger than the bottom surface of the opening area, so that The problem that the pattern of the cathode formed later is broken is avoided; the upper surface of the pixel defining layer is made of a lyophobic material, so that the subsequently coated luminescent material is less likely to remain on the upper surface of the pixel defining layer, thereby avoiding the occurrence of adjacent
  • the problem of color mixing in the pixel area, while the inclined surface corresponding to the pixel defining layer and the opening area is made of a lyophilic material, which can ensure that the subsequently applied luminescent material is uniformly filled in the opening area, and does not occur due to uneven spreading of the luminescent material.
  • the micro-cavity further causes a problem that the cathode and the anode are short-circuited. Therefore, the above-mentioned organic electroluminescent display panel provided by the embodiment of the present invention can ensure uniformity of the film layer formed after the pixel defining layer to enhance the organic electroluminescent display panel. Luminescence performance.
  • the structure of the pixel defining layer 200 may include: a first pixel defining layer structure 210 formed of a lyophobic material, and a first layer formed of a lyophilic material
  • the two pixels define a layer structure 220, and a side surface of the second pixel defining layer structure is attached to the side surface c of the first pixel defining layer structure.
  • the pixel defining layer 200 thus formed by the first pixel defining layer structure 210 and the second pixel defining layer structure 220 may have lyophobic properties on the upper surface a, so that the subsequently applied luminescent material does not easily remain on the upper surface a, avoiding The problem of color mixing of adjacent pixel regions occurs, and the inclined surface b of the pixel defining layer 200 has lyophilic properties, which can ensure that the subsequently coated luminescent material is uniformly filled in the opening region 300 without causing uneven spreading due to the luminescent material. There is a problem with tiny gaps.
  • the first pixel defining layer structure 210 may adopt an inverted trapezoidal structure in a cross section perpendicular to the substrate substrate 100;
  • the second pixel defining layer structure 220 may have a triangular structure in a cross section perpendicular to the substrate substrate 100.
  • the material of the first pixel defining layer structure 210 may be made of a lyophobic material having a negative photoresist property to produce a first cross-sectional structure having an inverted trapezoidal structure.
  • the pixel defines a layer structure 210.
  • the first pixel defining layer structure may have an inverted trapezoidal structure in a cross section perpendicular to the substrate.
  • the material of the second pixel defining layer structure 220 can employ a lyophilic material having positive photoresist properties to effect fabrication of the second pixel defining layer structure 220 having a triangular cross-sectional structure.
  • the positive photoresist material itself is insoluble in the developer, and is formed into a material soluble in the developer after being irradiated, so that a structure having a triangular cross section is easily formed.
  • the height of the second pixel defining layer structure in a cross section perpendicular to the substrate substrate can be set to be lower than or equal to the height of the first pixel defining layer structure in a cross section perpendicular to the substrate substrate.
  • the height of the first pixel defining layer structure in a cross section perpendicular to the substrate substrate can be controlled to be 0.1 ⁇ m to 100 ⁇ m, for example, the height of the first pixel defining layer structure in the cross section perpendicular to the substrate substrate is controlled to 0.5.
  • the pixel defining layer is perpendicular to the substrate
  • the cross section of the substrate is a structure similar to a positive trapezoid; when the height of the formed second pixel defining layer structure is perpendicular to the cross section perpendicular to the substrate substrate, the pixel defining layer is equal to the height of the first pixel defining layer in a cross section perpendicular to the substrate substrate
  • the cross section perpendicular to the substrate is a positive trapezoidal structure.
  • the opening area is a structure similar to an inverted trapezoid in a section perpendicular to the substrate; when the pixel defining layer is perpendicular to the substrate
  • the cross section is a trapezoidal structure, the opening region has an inverted trapezoidal shape in a cross section perpendicular to the substrate.
  • the organic electroluminescent display panel provided by the embodiment of the present invention generally has other film layers such as a light-emitting layer, a cathode, and an anode, and a thin film transistor and a gate line are generally formed on the substrate. Structures such as data lines, and the specific structures may be implemented in various manners, and are not limited herein.
  • At least one embodiment of the present invention further provides a method for fabricating the above-described organic electroluminescent display panel according to an embodiment of the present invention, the method comprising: forming a pixel defining layer on a substrate
  • the pixel defining layer has an opening area corresponding to the pixel area of the organic electroluminescent display panel, the opening of each opening area is larger than the bottom surface of the opening area, and the upper surface of the pixel defining layer is a liquid repellency material, and the pixel defining layer corresponds to The inclined surface of the open area is a lyophilic material.
  • the method for fabricating the organic electroluminescent display panel provided by the embodiment of the present invention may include the following steps:
  • the step S101 forms a pattern of the first pixel defining layer structure on the substrate, for example, the following manner can be implemented: Depositing a layer of liquefied material with negative photoresist properties on the substrate; then, using a first mask to pattern the liquefied material of negative photoresist properties to form a first pixel defining layer structure Graphics.
  • the first pixel defining layer structure may have an inverted trapezoidal structure in a cross section perpendicular to the substrate.
  • step S102 forms a pattern of the second pixel defining layer structure on the substrate formed with the first pixel defining layer structure.
  • the following manner may be adopted: first, depositing a layer of a lyophilic material having a positive photoresist property on a substrate formed with a first pixel defining layer structure; and then, using the first pixel to define a layer structure as a mask The film plate processes the lyophilic material of the positive photoresist property to form a pattern of the second pixel defining layer structure.
  • the second pixel defining layer structure may have a triangular structure in a cross section perpendicular to the substrate.
  • the fabrication process of the first pixel defining layer structure and the second pixel defining layer structure may use only one mask (ie, the first pixel defining layer structure and the second pixel defining layer structure use the same mask during fabrication).
  • Membrane plate such that the fabrication process of the pixel defining layer with respect to the single layer does not increase the number of the mask plates; and, since the photosensitive properties of the material forming the second pixel defining layer structure and the first pixel defining layer structure are opposite,
  • a pattern defining the layer structure of the first pixel formed in the first pixel may be used as a mask, thereby avoiding When the mask is aligned with the substrate, an error occurs to affect the accuracy of pattern formation.
  • Example 1 As shown in FIG. 4, the steps of fabricating the organic electroluminescence display panel may be as shown in the following steps S201 to S204, and the steps are specifically described below.
  • the first pixel defining layer since the first pixel defining layer has an inverted trapezoidal structure whose opening is larger than the bottom side in a section perpendicular to the substrate, the first pixel defines the layer structure 210 as a mask, and the positive photoresist property is pro-
  • the liquid material is patterned by exposure and development etching to form a pattern of the second pixel defining layer structure 220. Since the material of the second pixel defining layer structure 220 is a lyophilic material having positive photoresist properties, The second pixel defining layer structure 220 has a triangular structure in a cross section perpendicular to the substrate substrate, as shown in FIG. 6d.
  • the pixel defining layer of the above-mentioned organic electroluminescent display panel provided by the embodiment of the present invention is produced by the above steps S201 to S204 provided in the first embodiment.
  • Example 2 As shown in FIG. 5, the step of fabricating the pixel defining layer of the organic electroluminescent display panel may be as shown in the following steps S301 to S304. These steps are specifically described below.
  • Steps S301 and S302 are identical to the first steps S201 and S202, and are not described herein.
  • the pixel defining layer of the above organic electroluminescent display panel provided by the embodiment of the present invention is produced by the above steps S301 to S304 provided in the second embodiment.
  • the method for fabricating the organic electroluminescent display panel provided by the embodiment of the present invention may further include: forming another film layer structure such as a light emitting layer, a cathode, and an anode on the substrate, and on the substrate.
  • another film layer structure such as a light emitting layer, a cathode, and an anode on the substrate, and on the substrate.
  • the structure of the thin film transistor, the gate line, the data line, and the like are also formed; the specific structure may be implemented in various manners, which is not limited herein.
  • At least one embodiment of the present invention further provides a display device including any of the above-described organic electroluminescent display panels provided by the embodiments of the present invention.
  • the display device can be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • Other indispensable components of the display device are understood by those skilled in the art, and are not described herein, nor should they be construed as limiting the invention.
  • the pixel defining layer disposed in the organic electroluminescent display panel has an opening corresponding to the pixel region of the organic electroluminescent display panel a region, and an opening of each of the opening regions is larger than a bottom surface of the opening region, that is, a cross-section of the pixel defining layer perpendicular to the substrate substrate is a positive trapezoidal structure or a structure similar to a positive trapezoid, so as to avoid the problem that the pattern of the cathode formed later is broken.
  • the opaque material is used on the upper surface of the pixel defining layer, so that the subsequently coated luminescent material does not easily remain on the upper surface of the pixel defining layer, so that the problem of color mixing of adjacent pixel regions can be avoided, and the pixel defining layer is correspondingly
  • the inclined surface of the open area is made of a lyophilic material, which can ensure that the subsequently applied luminescent material is uniformly filled in the open area without causing minute voids due to uneven spreading of the luminescent material. Therefore, the above-described organic electroluminescent display panel provided by the embodiment of the present invention can ensure uniformity of the film layer formed after the pixel defining layer to improve the luminescent property of the organic electroluminescent display panel.

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Abstract

一种有机电致发光显示面板、其制作方法及显示装置,在有机电致发光显示面板中设置的像素界定层(200)具有与OLED的像素区域对应的开口区域(300),且各开口区域(300)的开口大于开口区域(300)的底面;像素界定层(200)的上表面(a)采用疏液性材料,同时像素界定层(200)的对应开口区域(300)的倾斜面(b)采用亲液性材料。上述OLED可以保证在像素界定层(200)之后形成的膜层均匀性,以提升OLED的发光性能。

Description

有机电致发光显示面板、其制作方法及显示装置 技术领域
本发明的至少一个实施例涉及一种有机电致发光显示面板、其制作方法及显示装置。
背景技术
目前,有机电致发光显示面板(Organic Electroluminesecent Display,OLED)凭借其低功耗、高色饱和度、广视角、薄厚度、不需背光源、能实现柔性化等特点,已经逐渐成为显示领域的主流。
OLED的基本结构包括衬底基板,依次设置在衬底基板上的阳极、发光层和阴极,其发光原理为:在分别对阳极和阴极通电压以形成电流时,阴极中的电子和阳极中的空穴会在发光层复合形成激子,激发发光层中有机材料进行发光。发光层可以采用喷墨打印技术制作,一般在制作发光层之前,可以在形成有阳极的衬底基板上制作像素界定层以限定各像素区域的位置,之后在像素界定层中对应各像素区域的开口区域制作发光层,最后在发光层上制作阴极的膜层。
发明内容
本发明的至少一个实施例提供一种有机电致发光显示面板、其制作方法及显示装置,以使在像素界定层之后形成的膜层具有较好的均匀性,从而提高OLED的发光性能。
本发明的至少一个实施例提供了一种有机电致发光显示面板,其包括:衬底基板,以及位于所述衬底基板上的像素界定层;所述像素界定层具有与所述有机电致发光显示面板的像素区域对应的开口区域,各开口区域的开口大于开口区域的底面;所述像素界定层的上表面为疏液性材料,所述像素界定层的对应所述开口区域的倾斜面为亲液性材料。
本发明的至少一个实施例还提供了一种本发明实施例提供的上述有机电致发光显示面板的制作方法,该方法包括:在衬底基板上形成像素界定层, 使像素界定层具有与所述有机电致发光显示面板的像素区域对应的开口区域,各开口区域的开口大于开口区域的底面,并且像素界定层的上表面为疏液性材料,像素界定层的对应所述开口区域的倾斜面为亲液性材料。
本发明的至少一个实施例还提供了一种显示装置,其包括本发明实施例提供的上述有机电致发光显示面板。
附图说明
为了更清楚地说明本发明实施例的技术方案,下面将对实施例的附图作简单地介绍,显而易见地,下面描述中的附图仅仅涉及本发明的一些实施例,而非对本发明的限制。
图1a和图1b分别为一种像素界定层的有机电致发光显示面板的结构示意图;
图2a为本发明实施例提供的有机电致发光显示面板的俯视图;
图2b为图2a沿A-A’方向的剖面结构示意图;
图3为本发明实施例提供的有机电致发光显示面板的制作方法流程图;
图4为本发明实施例提供的实例一的有机电致发光显示面板的制作方法流程图;
图5为本发明实施例提供的实例二的有机电致发光显示面板的制作方法流程图;
图6a至图6d分别为本发明实施例提供的实例一中有机电致发光显示面板的制作方法在各步骤执行后的结构示意图;
图7a至图7b分别为本发明实施例提供的实例二中有机电致发光显示面板的制作方法在各步骤执行后的结构示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例的附图,对本发明实施例的技术方案进行清楚、完整地描述。显然,所描述的实施例是本发明的一部分实施例,而不是全部的实施例。基于所描述的本发明的实施例,本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例,都属于本发明保护的范围。
目前,OLED中像素界定层主要有两种结构。一种是采用截面为上底边小于下底边的正梯形的像素界定层,如图1a所示(图中仅示出了部分);一般正梯形的像素界定层10在制作完成后,为了避免发生相邻像素区域的混色问题,需经过疏水处理使像素界定层的表面具有疏水性质。这样虽然能避免混色问题,但是本申请的发明人注意到,容易使之后在像素界定层的开口区域制作的发光层20出现铺展不均的现象,而导致发光层20中出现微小空隙30,这样,容易使之后形成的阴极40与位于发光层下方的阳极50在该微小空隙30处发生短路。另一种是采用截面为上底边大于下底边的倒梯形的像素界定层,如图1b所示(图中仅示出了部分),虽然倒梯形的像素界定层60可以避免阴极70和阳极80短路,但是本申请的发明人注意到,倒梯形的像素界定层60容易使之后形成的阴极70发生断开的问题。
因此,上述像素界定层的结构都会影响之后形成的膜层的均匀性,而影响OLED的发光性能。
下面结合附图,对本发明实施例提供的有机电致发光显示面板、其制作方法及显示装置的具体实施方式进行详细地说明。
附图中各膜层的厚度和形状不反映有机电致发光显示面板的真实比例,目的只是示意说明本发明内容。
本发明的至少一个实施例提供了一种有机电致发光显示面板,如图2a和图2b所示,该有机电致发光显示面板包括:衬底基板100,以及位于衬底基板100上的像素界定层200。该像素界定层200具有与有机电致发光显示面板的像素区域对应的开口区域300,各开口区域300的开口大于开口区域的底面。例如,开口区域300在垂直于衬底基板的截面的开口大于底边,且截面的宽度从开口到底边先增大后减小,可以视为类似倒梯形的结构,即像素界定层200垂直于衬底基板100的截面的上底边小于下底边,且截面的宽度从上底边到下底边先减小后增大,可以视为类似正梯形的结构;或者,例如,开口区域300在垂直于衬底基板的截面的开口大于底边,且截面的宽度从开口到底边逐渐减小,为倒梯形的结构,即像素界定层200垂直于衬底基板100的截面的上底边小于下底边,且截面的宽度从上底边到下底边逐渐增大,为正梯形的结构。该像素界定层200的上表面a为疏液性材料,该像素界定层200的对应开口区域300的倾斜面b为亲液性材料。
在本发明实施例提供的上述有机电致发光显示面板中设置的像素界定层具有与有机电致发光显示面板的像素区域对应的开口区域,且各开口区域的开口大于开口区域的底面,这样可以避免之后形成的阴极的图案发生断开的问题;将像素界定层的上表面采用疏液性材料,可以使之后涂覆的发光材料不易残留在像素界定层的上表面,因此可以避免发生相邻像素区域的混色问题,同时像素界定层与开口区域对应的倾斜面采用亲液性材料,可以保证之后涂覆的发光材料均匀地填充在开口区域内,不会造成由于发光材料铺展不均而出现微小空隙进而导致阴极和阳极发生短路的问题,因此,本发明实施例提供的上述有机电致发光显示面板可以保证在像素界定层之后形成的膜层均匀性,以提升有机电致发光显示面板的发光性能。
在具体实施时,在本发明实施例提供的上述有机电致发光显示面板中,为了能够使像素界定层200具有上表面a为疏液性材料且与开口区域对应的倾斜面b为亲液性材料的结构,如图2b所示,在一个实施例中,该像素界定层200的结构可以包括:由疏液性材料形成的第一像素界定层结构210,以及由亲液性材料形成的第二像素界定层结构220,第二像素界定层结构的侧表面与所述第一像素界定层结构的侧表面c相贴。这样由第一像素界定层结构210和第二像素界定层结构220形成的像素界定层200可以在上表面a具有疏液性质,可以使之后涂覆的发光材料不易残留在上表面a上,避免发生相邻像素区域的混色问题,同时像素界定层200的倾斜面b具有亲液性质,可以保证之后涂覆的发光材料均匀地填充在开口区域300内,不会造成由于发光材料铺展不均而出现微小空隙的问题。
在具体实施时,在本发明实施例提供的上述有机电致发光显示面板的至少一个实施例中,第一像素界定层结构210在垂直于衬底基板100的截面可以采用倒梯形结构;在至少一个实施例中,第二像素界定层结构220在垂直于衬底基板100的截面可以采用三角形结构。在制作像素界定层200时,在至少一个实施例中,第一像素界定层结构210的材料可以采用具有负性光刻胶性质的疏液性材料来实现制作出截面为倒梯形结构的第一像素界定层结构210。因为负性光刻胶性质的材料,曝光后形成为不溶于显影液的材料,而未曝光的材料在显影液中溶解,从而形成第一像素界定层结构的图形;又因为随着负性光刻胶厚度的增加,越靠近衬底基板的光刻胶材料接受的光强越小, 因此,第一像素界定层结构在垂直于衬底基板的截面可以为倒梯形结构。在至少一个实施例中,第二像素界定层结构220的材料可以采用具有正性光刻胶性质的亲液性材料,来实现制作出截面为三角形结构的第二像素界定层结构220。正性光刻胶材料本身不溶于显影液,经光照后形成为溶于显影液的材料,因此容易形成截面为三角形的结构。
在具体实施时,在本发明实施例提供的上述有机电致发光显示面板中,为了使亲液性材料的第二像素界定层结构不会影响到像素界定层的上表面的疏液性质,在至少一个实施例中,可以将第二像素界定层结构在垂直于衬底基板的截面的高度设置为低于或等于第一像素界定层结构在垂直于衬底基板的截面的高度。在至少一个示例中,第一像素界定层结构在垂直于衬底基板的截面的高度可以控制为0.1μm至100μm,例如第一像素界定层结构在垂直于衬底基板的截面的高度控制为0.5μm至5μm,当形成的第二像素界定层结构在垂直于衬底基板的截面的高度低于第一像素界定层在垂直于衬底基板的截面的高度时,像素界定层在垂直于衬底基板的截面为类似正梯形的结构;当形成的第二像素界定层结构在垂直于衬底基板的截面的高度等于第一像素界定层在垂直于衬底基板的截面的高度时,像素界定层在垂直于衬底基板的截面为正梯形结构。相应地,当像素界定层在垂直于衬底基板的截面为类似正梯形的结构时,开口区域在垂直于衬底基板的截面为类似倒梯形的结构;当像素界定层在垂直于衬底基板的截面为正梯形的结构时,开口区域在垂直于衬底基板的截面为倒梯形的结构。
在具体实施时,本发明实施例提供的有机电致发光显示面板中一般还会具有诸如发光层、阴极和阳极等其他膜层结构,以及在衬底基板上还一般形成有薄膜晶体管、栅线、数据线等结构,这些具体结构可以有多种实现方式,在此不做限定。
基于同一发明构思,本发明的至少一个实施例还提供了一种本发明实施例提供的上述有机电致发光显示面板的制作方法,该制作方法包括:在衬底基板上形成像素界定层,使像素界定层具有与所述有机电致发光显示面板的像素区域对应的开口区域,各开口区域的开口大于开口区域的底面,并且像素界定层的上表面为疏液性材料,像素界定层的对应所述开口区域的倾斜面为亲液性材料。由于该方法解决问题的原理与前述一种有机电致发光显示面 板相似,因此该方法的实施可以参见有机电致发光显示面板的实施,重复之处不再赘述。
在具体实施时,本发明实施例提供的有机电致发光显示面板的制作方法,如图3所示,例如可以包括以下步骤:
S101、在衬底基板上形成第一像素界定层结构的图形;
S102、在形成有第一像素界定层结构的衬底基板上形成第二像素界定层结构的图形。
在具体实施时,在本发明实施例提供的上述有机电致发光显示面板的制作方法中,步骤S101在衬底基板上形成第一像素界定层结构的图形,例如可以采用如下方式实现:首先在衬底基板上沉积一层负性光刻胶性质的疏液性材料;然后,利用第一掩膜板对负性光刻胶性质的疏液性材料进行构图工艺,形成第一像素界定层结构的图形。
在具体实施时,由于第一像素界定层结构的材料采用具有负性光刻胶性质的疏液性材料,因此,第一像素界定层结构在垂直于衬底基板的截面可以为倒梯形结构。
在具体实施时,在本发明实施例提供的上述有机电致发光显示面板的制作方法中,步骤S102在形成有第一像素界定层结构的衬底基板上形成第二像素界定层结构的图形,例如可以采用如下方式:首先,在形成有第一像素界定层结构的衬底基板上沉积一层正性光刻胶性质的亲液性材料;然后,利用第一像素界定层结构的图形作为掩膜板对正性光刻胶性质的亲液性材料进行构图工艺,形成第二像素界定层结构的图形。
在具体实施时,由于第二像素界定层结构的材料采用具有正性光刻胶性质的亲液性材料,因此,第二像素界定层结构在垂直于衬底基板的截面可以为三角形结构。
在具体实施时,第一像素界定层结构和第二像素界定层结构的制作工艺可以只使用一块掩膜板(即第一像素界定层结构和第二像素界定层结构在制作时使用相同的掩膜板),这样相对于单层的像素界定层的制作工艺不会增加掩膜板的数量;并且,由于形成第二像素界定层结构和第一像素界定层结构的材料的感光特性相反,因此,第二像素界定层结构的制作工艺中还可以采用以在先形成的第一像素界定层结构的图形作为掩膜板,这样还可以避免 掩膜板与基板进行对位时产生误差而影响形成图形的精准性。
下面以两个具体的实例详细的说明本发明实施例提供的有机电致发光显示面板的制作方法。
实例一:如图4所示,制作有机电致发光显示面板的步骤可以如以下下步骤S201至步骤S204所示,下面具体介绍这些步骤。
S201、在衬底基板100上涂覆一层负性光刻胶性质的疏液性材料,如图6a所示。
S202、利用第一掩膜板对负性光刻胶性质的疏液性材料采用曝光、显影、刻蚀的方式进行构图,形成第一像素界定层结构210的图形,此时,因为具有负性光刻胶性质的疏液性材料,曝光后形成为不溶于显影液的材料,而未曝光的材料在显影液中溶解,从而形成第一像素界定层结构的图形,又因为随着负性光刻胶厚度的增加,越靠近衬底基板的光刻胶材料接受的光强越小,因此形成的第一像素界定层结构210的图形在垂直于衬底基板的截面为倒梯形结构,如图6b所示。
S203、在形成有第一像素界定层结构210的衬底基板100上涂覆一层正性光刻胶性质的亲液性材料,涂覆厚度小于第一像素界定层结构210的高度,即正性光刻胶性质的亲液性材料只涂覆在像素界定层的开口区域中,如图6c所示。
S204、由于第一像素界定层在垂直于衬底基板的截面为开口大于底边的倒梯形结构,利用第一像素界定层结构210的图形作为掩膜板,对正性光刻胶性质的亲液性材料采用曝光显影刻蚀的方式进行构图,形成第二像素界定层结构220的图形,由于第二像素界定层结构220的材料采用具有正性光刻胶性质的亲液性材料,此时,第二像素界定层结构220在垂直于衬底基板的截面为三角形结构,如图6d所示。
至此,经过实例一提供的上述步骤S201至S204制作出了本发明实施例提供的上述有机电致发光显示面板的像素界定层。
实例二:如图5所示,制作有机电致发光显示面板的像素界定层的步骤可以如以下步骤S301至步骤304所示,下面具体介绍这些步骤。
步骤S301和S302与实例一步骤S201和S202完全相同,在此不作赘述。
S303、在形成有第一像素界定层结构210的衬底基板100上涂覆一层正 性光刻胶性质的亲液性材料,此时亲液性材料完全覆盖住第一像素界定层结构210,即在第一像素界定层结构210的上表面也覆盖了亲液性材料,如图7a所示。
S304、对正性光刻胶性质的亲液性材料进行构图,采用曝光、显影、刻蚀的方式形成第二像素界定层结构220的图形。在刻蚀时,刻蚀掉覆盖在第一像素界定层结构210上表面的亲液性材料以暴露出所述第一像素界定层结构的上表面,以及刻蚀掉部分在各第一像素界定层结构210之间的亲液性材料,如图7b所示。
至此,经过实例二提供的上述步骤S301至S304制作出了本发明实施例提供的上述有机电致发光显示面板的像素界定层。
在具体实施时,本发明实施例提供的有机电致发光显示面板的制作方法还可以包括:在衬底基板上形成具有诸如发光层、阴极和阳极等其他膜层结构,以及在衬底基板上还形成薄膜晶体管、栅线、数据线等结构;这些具体结构可以有多种实现方式,在此不做限定。
基于同一发明构思,本发明的至少一个实施例还提供了一种显示装置,其包括本发明实施例提供的上述任一种有机电致发光显示面板。该显示装置可以为:手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。对于该显示装置的其它必不可少的组成部分均为本领域的普通技术人员应该理解具有的,在此不做赘述,也不应作为对本发明的限制。该显示装置的实施可以参见上述有机电致发光显示面板的实施例,重复之处不再赘述。
本发明实施例提供的一种有机电致发光显示面板、其制作方法及显示装置中,在有机电致发光显示面板中设置的像素界定层具有与有机电致发光显示面板的像素区域对应的开口区域,且各开口区域的开口大于开口区域的底面,即像素界定层垂直于衬底基板的截面为正梯形结构或者类似正梯形的结构,这样可以避免之后形成的阴极的图案发生断开的问题;将像素界定层的上表面采用疏液性材料,可以使之后涂覆的发光材料不易残留在像素界定层的上表面,因此可以避免发生相邻像素区域的混色问题,同时像素界定层的对应开口区域的倾斜面采用亲液性材料,可以保证之后涂覆的发光材料均匀地填充在开口区域内,不会造成由于发光材料铺展不均而出现微小空隙的问 题,因此,本发明实施例提供的上述有机电致发光显示面板可以保证在像素界定层之后形成的膜层均匀性,以提升有机电致发光显示面板的发光性能。
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。
本申请要求于2014年8月8日递交的中国专利申请第201410389844.X号的优先权,在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (14)

  1. 一种有机电致发光显示面板,包括:衬底基板以及位于所述衬底基板上的像素界定层,其中:
    所述像素界定层具有与所述有机电致发光显示面板的像素区域对应的开口区域,各开口区域的开口大于开口区域的底面;
    所述像素界定层的上表面为疏液性材料,所述像素界定层的对应所述开口区域的倾斜面为亲液性材料。
  2. 如权利要求1所述的有机电致发光显示面板,其中,所述像素界定层包括:由疏液性材料形成的第一像素界定层结构以及由亲液性材料形成的第二像素界定层结构,所述第二像素界定层结构的侧表面与所述第一像素界定层结构的侧表面相贴。
  3. 如权利要求2所述的有机电致发光显示面板,其中,所述第一像素界定层结构在垂直于所述衬底基板的截面为倒梯形结构。
  4. 如权利要求2或3所述的有机电致发光显示面板,其中,所述第二像素界定层结构在垂直于所述衬底基板的截面为三角形结构。
  5. 如权利要求2-4任一所述的有机电致发光显示面板,其中,所述第二像素界定层结构在垂直于所述衬底基板的截面的高度低于或等于第一像素界定层结构在垂直于所述衬底基板的截面的高度。
  6. 如权利要求2-5任一项所述的有机电致发光显示面板,其中,所述第一像素界定层结构的材料为负性光刻胶性质的疏液性材料。
  7. 如权利要求2-6任一所述的有机电致发光显示面板,其中,所述第二像素界定层结构的材料为正性光刻胶性质的亲液性材料。
  8. 一种如权利要求1-7任一项所述有机电致发光显示面板的制作方法,包括:
    在衬底基板上形成像素界定层,其中,像素界定层具有与所述有机电致发光显示面板的像素区域对应的开口区域,各开口区域的开口大于开口区域的底面;像素界定层的上表面为疏液性材料,像素界定层的对应所述开口区域的倾斜面为亲液性材料。
  9. 如权利要求8所述的制作方法,其中,所述在衬底基板上形成像素界 定层,包括:
    在衬底基板上形成第一像素界定层结构的图形;
    在形成有所述第一像素界定层结构的衬底基板上形成第二像素界定层结构的图形。
  10. 如权利要求9所述的制作方法,其中,
    在所述衬底基板上沉积一层负性光刻胶性质的疏液性材料;
    利用第一掩膜板对所述负性光刻胶性质的疏液性材料进行构图工艺,以形成所述第一像素界定层结构的图形。
  11. 如权利要求9或10所述的制作方法,其中,
    在形成有所述第一像素界定层结构的衬底基板上沉积一层正性光刻胶性质的亲液性材料;
    利用所述第一像素界定层结构的图形作为掩膜板或者利用在形成所述第一像素界定层结构时所使用的掩膜板对所述正性光刻胶性质的亲液性材料进行构图工艺,以形成所述第二像素界定层结构的图形。
  12. 如权利要求11所述的制作方法,其中,在沉积所述亲液性材料时,
    使所述亲液性材料的涂覆厚度小于所述第一像素界定层结构的高度。
  13. 如权利要求11所述的制作方法,其中,在沉积所述亲液性材料时,使所述亲液性材料完全覆盖住第一像素界定层结构,在形成所述第二像素界定层结构的图形时,刻蚀掉覆盖所述第一像素界定层结构的顶部的所述亲液性材料以暴露出所述第一像素界定层结构的上表面。
  14. 一种显示装置,包括如权利要求1-7任一项所述的有机电致发光显示面板。
PCT/CN2014/090290 2014-08-08 2014-11-05 有机电致发光显示面板、其制作方法及显示装置 WO2016019643A1 (zh)

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