WO2015198887A1 - 感エネルギー性樹脂組成物 - Google Patents
感エネルギー性樹脂組成物 Download PDFInfo
- Publication number
- WO2015198887A1 WO2015198887A1 PCT/JP2015/066935 JP2015066935W WO2015198887A1 WO 2015198887 A1 WO2015198887 A1 WO 2015198887A1 JP 2015066935 W JP2015066935 W JP 2015066935W WO 2015198887 A1 WO2015198887 A1 WO 2015198887A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- compound
- carbon atoms
- substituent
- resin composition
- Prior art date
Links
- 0 NC(*C(N)=O)=O Chemical compound NC(*C(N)=O)=O 0.000 description 4
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/22—Polybenzoxazoles
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Definitions
- the present invention relates to an energy-sensitive resin composition containing a polybenzoxazole precursor, a method for producing a polybenzoxazole film or a polybenzoxazole molded article using the energy-sensitive resin composition, and the energy-sensitive resin composition.
- the present invention relates to a pattern manufacturing method using
- Polybenzoxazole resin is excellent in heat resistance, mechanical strength, insulation, dimensional stability, etc., so it can be used not only in fibers and films, but also in electrical and electronic parts such as electronic devices such as various elements and multilayer wiring boards. Widely used as an insulating material and protective material.
- a polybenzoxazole resin is obtained by combining an aromatic diamine diol having an amino group and a hydroxyl group on adjacent carbon atoms in an aromatic ring, a dicarbonyl compound such as a dialdehyde compound or a dicarboxylic acid dihalide with N- A precursor polymer obtained by polymerization in an organic solvent such as methyl-2-pyrrolidone (NMP), dimethylacetamide (DMAc), and dimethylformamide (DMF) is formed by heat treatment at a high temperature of about 300 ° C.
- NMP methyl-2-pyrrolidone
- DMAc dimethylacetamide
- DMF dimethylformamide
- polybenzoxazole resin produced by such a method include an aromatic diamine diol having an amino group and a hydroxyl group on adjacent carbon atoms in the aromatic ring, and di (4-formylphenyl) alkane or A polybenzo compound formed by reacting a di (4-halocarbonylphenyl) alkane with a precursor polymer solution obtained in dimethylformamide by raising the temperature from 200 ° C. and finally heat treating at 300 ° C.
- Oxazole resins are known (see Patent Document 1).
- the present invention has been made in view of the above problems, and even when a polybenzoxazole precursor is heat-treated at a low temperature, it is excellent in mechanical properties such as tensile elongation and chemical resistance, and coloring is suppressed and transparent.
- -Sensitive resin composition giving highly polybenzoxazole resin, method for producing polybenzoxazole film or polybenzoxazole molded article using the energy-sensitive resin composition, and pattern using the energy-sensitive resin composition
- the inventors of the present invention have intensively studied to solve the above problems.
- the above problem can be solved by adding a compound that decomposes by at least one of light and heat to generate at least one of a base and an acid to a composition containing a polybenzoxazole precursor.
- the present invention has been completed. Specifically, the present invention provides the following.
- a first aspect of the present invention is a polybenzoxazole precursor obtained by reacting an aromatic diamine diol represented by the following formula (1) with a dicarbonyl compound represented by the following formula (2), and a solvent: And a compound (A) that decomposes by the action of at least one of light and heat to generate at least one of a base and an acid.
- R a1 is a tetravalent organic group containing one or more aromatic rings, and each of the combinations of two amino groups and hydroxyl groups contained in the aromatic diamine diol represented by the formula (1), In this combination, the amino group and the hydroxyl group are bonded to two adjacent carbon atoms on the aromatic ring contained in R a1 .
- R a2 represents a divalent organic group
- A represents a hydrogen atom or a halogen atom.
- a coating film comprising the energy-sensitive resin composition or A forming step for forming a molded body, an exposure step for selectively exposing the coated film or molded body, a developing step for developing the coated film or molded body after exposure, and the coated film or molded body after development It is a pattern manufacturing method including the heating process which heats.
- the present invention even when the polybenzoxazole precursor is heat-treated at a low temperature, the mechanical properties such as tensile elongation and chemical resistance are excellent, and coloring is suppressed, giving a highly transparent polybenzoxazole resin.
- An energy-sensitive resin composition, a method for producing a polybenzoxazole film or a polybenzoxazole molded product using the energy-sensitive resin composition, and a pattern production method using the energy-sensitive resin composition can be provided.
- the energy sensitive resin composition according to the present invention is a polybenzoxazole precursor obtained by reacting an aromatic diamine diol represented by the above formula (1) with a dicarbonyl compound represented by the above formula (2). , A solvent, and at least a compound (A) that decomposes by at least one of light and heat to generate at least one of a base and an acid.
- a polybenzoxazole precursor can be used individually or in mixture of 2 or more types.
- an aromatic diamine diol and a dicarbonyl compound having a specific structure are used as a synthesis raw material for the polybenzoxazole precursor.
- the aromatic diamine diol and the dicarbonyl compound will be described.
- aromatic diamine diol In the present invention, a compound represented by the following formula (1) is used as the aromatic diamine diol.
- One kind of aromatic diamine diol may be used alone, or two or more kinds may be used in combination.
- R a1 is a tetravalent organic group containing one or more aromatic rings, and each of the combinations of two amino groups and hydroxyl groups contained in the aromatic diamine diol represented by the formula (1), In this combination, the amino group and the hydroxyl group are bonded to two adjacent carbon atoms on the aromatic ring contained in R a1 .
- R a1 is a tetravalent organic group containing one or more aromatic rings, the number of carbon atoms is preferably from 6 to 50, 6 to 30 is more preferred.
- R a1 may be an aromatic group, and two or more aromatic groups may be an aliphatic hydrocarbon group or a halogenated aliphatic hydrocarbon group, or a hetero atom such as an oxygen atom, a sulfur atom, or a nitrogen atom. It may be a group bonded through a bond including.
- Examples of the bond containing a hetero atom such as an oxygen atom, a sulfur atom, and a nitrogen atom contained in R a1 include —CONH—, —NH—, —N ⁇ N—, —CH ⁇ N—, —COO—, — O—, —CO—, —SO—, —SO 2 —, —S—, —S—S— and the like can be mentioned, and —O—, —CO—, —SO—, —SO 2 —, —S -And -SS- are preferred.
- the aromatic ring contained in R a1 may be an aromatic heterocyclic ring.
- the aromatic ring bonded to the amino group and hydroxyl group in R a1 is preferably a benzene ring.
- the ring bonded to the amino group and hydroxyl group in R a1 is a condensed ring containing two or more rings, the ring bonded to the amino group and hydroxyl group in the condensed ring is preferably a benzene ring.
- R a1 include groups represented by any of the following formulas (1-1) to (1-9).
- X 1 represents an alkylene group having 1 to 10 carbon atoms, a fluorinated alkylene group having 1 to 10 carbon atoms, —O—, —S—, —SO—, —SO 2 —, One selected from the group consisting of —CO—, —COO—, —CONH—, and a single bond, wherein Y 1 s in the formulas (1-2) to (1-5) are the same or different; And may be one selected from the group consisting of —CH 2 —, —O—, —S—, —SO—, —SO 2 —, —CO—, and a single bond.
- the group represented by any one of the above formulas (1-1) to (1-9) may have one or more substituents on the aromatic ring.
- substituents include a fluorine atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a fluorinated alkyl group having 1 to 6 carbon atoms, and a fluorinated alkoxy having 1 to 6 carbon atoms. Groups are preferred.
- the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.
- the compound represented by the above formula (1) examples include 2,4-diamino-1,5-benzenediol, 2,5-diamino-1,4-benzenediol, 2,5-diamino-3- Fluoro-1,4-benzenediol, 2,5-diamino-3,6-difluoro-1,4-benzenediol, 2,6-diamino-1,5-dihydroxynaphthalene, 1,5-diamino-2,6 -Dihydroxynaphthalene, 2,6-diamino-3,7-dihydroxynaphthalene, 1,6-diamino-2,5-dihydroxynaphthalene, 4,4'-diamino-3,3'-dihydroxybiphenyl, 3,3'- Diamino-4,4'-dihydroxybiphenyl, 2,3'-diamino-3,2'-dihydroxybiphenyl, 3,4'-di
- 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane is preferable because a polybenzoxazole resin having excellent transparency can be formed.
- [Dicarbonyl compounds] As a synthesis raw material for the polybenzoxazole precursor, a dicarbonyl compound represented by the following formula (2) is used together with the aromatic diamine diol described above. A polybenzoxazole precursor is obtained by condensing the aromatic diamine diol and the dicarbonyl compound represented by the following formula (2). (In the formula, R a2 is a divalent organic group, and A represents a hydrogen atom or a halogen atom.)
- R a2 in the formula (2) may be an aromatic group, an aliphatic group, or a group in which an aromatic group and an aliphatic group are combined.
- R a2 is preferably a group containing an aromatic group and / or an alicyclic group from the viewpoint that the resulting polybenzoxazole resin has good heat resistance, mechanical properties, chemical resistance, and the like.
- the aromatic group contained in R a2 may be an aromatic hydrocarbon group or an aromatic heterocyclic group.
- R a2 may contain a halogen atom, an oxygen atom, and a sulfur atom in addition to the carbon atom and the hydrogen atom.
- R a2 contains an oxygen atom, a nitrogen atom, or a sulfur atom
- the oxygen atom, nitrogen atom, or sulfur atom is a divalent nitrogen-containing heterocyclic group, —CONH—, —NH—, —N ⁇ N—, Included in R a2 as a group selected from —CH ⁇ N—, —COO—, —O—, —CO—, —SO—, —SO 2 —, —S—, and —S—S—.
- R a2 is more preferably included as a group selected from —O—, —CO—, —SO—, —SO 2 —, —S—, and —S—S—.
- one of the two A may be a hydrogen atom and the other may be a halogen atom, but the two A are both hydrogen atoms or the two A are both halogen atoms. preferable.
- A is a halogen atom, as A, a chlorine atom, a bromine atom, and an iodine atom are preferable, and a chlorine atom is more preferable.
- dialdehyde compound and the dicarboxylic acid dihalide which are suitable compounds as the dicarbonyl compound, will be described.
- dialdehyde compound used as a raw material for the polybenzoxazole precursor is a compound represented by the following formula (2-1).
- a dialdehyde compound may be used individually by 1 type, and may be used in combination of 2 or more type. (In the formula, R a2 is the same as in formula (2).)
- Examples of the aromatic group or aromatic ring-containing group suitable as R a2 in formula (2-1) include the following groups.
- X 2 represents an alkylene group having 1 to 10 carbon atoms, a fluorinated alkylene group having 1 to 10 carbon atoms, —O—, —S—, —SO—, —SO 2 —, —CO—, -COO -, - CONH-, and if .X 2 is one selected from the group consisting of a single bond is more, a plurality of X 2 are optionally be the same or different .Y 2, respectively, They may be the same or different, and are one selected from the group consisting of —CH 2 —, —O—, —S—, —SO—, —SO 2 —, —CO—, and a single bond.
- q are each an integer of 0 to 3.
- the aromatic ring or alicyclic ring contained in a group suitable as R a2 may have one or more substituents on the ring.
- substituents include a fluorine atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a fluorinated alkyl group having 1 to 6 carbon atoms, and a fluorinated alkoxy having 1 to 6 carbon atoms. Groups are preferred.
- the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.
- dialdehyde compound represented by the formula (2-1) is an aromatic dialdehyde
- preferred examples thereof include benzenedialdehydes, pyridinedialdehydes, pyrazinedialdehydes, pyrimidinedialdehydes, naphthalene.
- benzenedialdehydes include phthalaldehyde, isophthalaldehyde, terephthalaldehyde, 3-fluorophthalaldehyde, 4-fluorophthalaldehyde, 2-fluoroisophthalaldehyde, 4-fluoroisophthalaldehyde, 5-fluoroisophthalaldehyde, 2 -Fluoroterephthalaldehyde, 3-trifluoromethylphthalaldehyde, 4-trifluoromethylphthalaldehyde, 2-trifluoromethylisophthalaldehyde, 4-trifluoromethylisophthalaldehyde, 5-trifluoromethylisophthalaldehyde, 2-trifluoromethyl Terephthalaldehyde, 3,4,5,6-tetrafluorophthalaldehyde, 2,4,5,6-tetrafluoroisophthalaldehyde, and 2,3 5,6-tetrafluoro terephthalalde
- pyridinedialdehydes include pyridine-2,3-dialdehyde, pyridine-3,4-dialdehyde, and pyridine-3,5-dialdehyde.
- pyrazine dialdehydes include pyrazine-2,3-dialdehyde, pyrazine-2,5-dialdehyde, pyrazine-2,6-dialdehyde and the like.
- pyrimidine dialdehydes include pyrimidine-2,4-dialdehyde, pyrimidine-4,5-dialdehyde, and pyrimidine-4,6-dialdehyde.
- naphthalenedialdehydes include naphthalene-1,5-dialdehyde, naphthalene-1,6-dialdehyde, naphthalene-2,6-dialdehyde, naphthalene-3,7-dialdehyde, 2,3, 4,6,7,8-hexafluoronaphthalene-1,5-dialdehyde, 2,3,4,5,6,8-hexafluoronaphthalene-1,6-dialdehyde, 1,3,4,5 7,8-hexafluoronaphthalene-2,6-dialdehyde, 1-trifluoromethylnaphthalene-2,6-dialdehyde, 1,5-bis (trifluoromethyl) naphthalene-2,6-dialdehyde, 1- Trifluoromethylnaphthalene-3,7-dialdehyde, 1,5-bis (trifluoromethyl) naphthalene-3,7-dialdehyde, 1-
- biphenyldialdehydes include biphenyl-2,2′-dialdehyde, biphenyl-2,4′-dialdehyde, biphenyl-3,3′-dialdehyde, biphenyl-4,4′-dialdehyde, 6,6′-difluorobiphenyl-3,4′-dialdehyde, 6,6′-difluorobiphenyl-2,4′-dialdehyde, 6,6′-difluorobiphenyl-3,3′-dialdehyde, 6, 6'-difluorobiphenyl-3,4'-dialdehyde, 6,6'-difluorobiphenyl-4,4'-dialdehyde, 6,6'-ditrifluoromethylbiphenyl-2,2'-dialdehyde, 6, 6′-ditrifluoromethylbiphenyl-2,4′-dialdehyde, 6,6′-ditrifluoromethylbipheny
- diphenyl ether dialdehydes include diphenyl ether-2,4′-dialdehyde, diphenyl ether-3,3′-dialdehyde, diphenyl ether-3,4′-dialdehyde, and diphenyl ether-4,4′-dialdehyde.
- diphenylsulfonedialdehydes include diphenylsulfone-3,3'-dialdehyde, diphenylsulfone-3,4'-dialdehyde, and diphenylsulfone-4,4'-dialdehyde.
- diphenyl sulfide dialdehydes include diphenyl sulfide-3,3'-dialdehyde, diphenyl sulfide-3,4'-dialdehyde, and diphenyl sulfide-4,4'-dialdehyde.
- diphenyl ketone dialdehydes include diphenyl ketone-3,3'-dialdehyde, diphenyl ketone-3,4'-dialdehyde, and diphenyl ketone-4,4'-dialdehyde.
- bis (formylphenoxy) benzenes include benzene 1,3-bis (3-formylphenoxy) benzene, 1,4-bis (3-formylphenoxy) benzene, and 1,4-bis (4-formyl). And phenoxy) benzene.
- [1,4-phenylenebis (1-methylethylidene)] bisbenzaldehydes include 3,3 ′-[1,4-phenylenebis (1-methylethylidene)] bisbenzaldehyde, 3,4′- [1,4-phenylenebis (1-methylethylidene)] bisbenzaldehyde, 4,4 ′-[1,4-phenylenebis (1-methylethylidene)] bisbenzaldehyde, and the like.
- 2,2-bis [4- (formylphenoxy) phenyl] propanes include 2,2-bis [4- (2-formylphenoxy) phenyl] propane, 2,2-bis [4- (3 -Formylphenoxy) phenyl] propane, 2,2-bis [4- (4-formylphenoxy) phenyl] propane, 2,2-bis [4- (3-formylphenoxy) phenyl] hexafluoropropane, and 2,2 -Bis [4- (4-formylphenoxy) phenyl] hexafluoropropane and the like.
- bis [4- (formylphenoxy) phenyl] sulfides include bis [4- (3-formylphenoxy) phenyl] sulfide and bis [4- (4-formylphenoxy) phenyl] sulfide. .
- bis [4- (formylphenoxy) phenyl] sulfone include bis [4- (3-formylphenoxy) phenyl] sulfone and bis [4- (4-formylphenoxy) phenyl] sulfone. .
- fluorinated aldehydes include fluorene-2,6-dialdehyde, fluorene-2,7-dialdehyde, dibenzofuran-3,7-dialdehyde, 9,9-bis (4-formylphenyl) fluorene, 9,9-bis (3-formylphenyl) fluorene, 9- (3-formylphenyl) -9- (4′-formylphenyl) fluorene, etc.
- diphenylalkanedialdehyde or diphenylfluoroalkanedialdehyde represented by the following formula can also be suitably used as the aromatic dialdehyde compound.
- a compound having an imide bond represented by the following formula can also be suitably used as the aromatic dialdehyde compound.
- dicarbonyl compound represented by the formula (2-1) is an alicyclic dialdehyde containing an alicyclic group
- preferred examples thereof include cyclohexane-1,4-dialdehyde, cyclohexane-1,3.
- isophthalaldehyde is preferred because it is easy to synthesize and obtain, and it is easy to obtain a polybenzoxazole resin having excellent heat resistance and mechanical properties.
- Dicarboxylic acid dihalide used as a raw material for the polybenzoxazole precursor is a compound represented by the following formula (2-2).
- Dicarboxylic acid dihalide may be used individually by 1 type, and may be used in combination of 2 or more type. (In the formula, R a2 is the same as in formula (2), and Hal is a halogen atom.)
- a chlorine atom, a bromine atom and an iodine atom are preferable, and a chlorine atom is more preferable.
- a compound suitable as the compound represented by the formula (2-2) a compound obtained by substituting two aldehyde groups of the aforementioned compound as a suitable example of a dialdehyde compound with a halocarbonyl group, preferably a chlorocarbonyl group. Is mentioned.
- terephthalic acid dichloride is preferred because it is easy to synthesize and obtain, and it is easy to obtain a polybenzoxazole resin excellent in heat resistance and mechanical properties.
- the polybenzoxazole precursor is produced by reacting the above-mentioned aromatic diamine diol with a dicarbonyl compound in a solvent according to a known method.
- a production method in the case where the dicarbonyl compound is a dialdehyde compound and a production method in the case where the dicarbonyl compound is a dicarboxylic acid halide will be described.
- reaction of aromatic diamine diol with dialdehyde compound The reaction between the aromatic diamine diol and the dialdehyde compound is performed in a solvent.
- the reaction between the aromatic diamine diol and the dialdehyde compound is a Schiff base formation reaction and can be performed according to a known method.
- the reaction temperature is not particularly limited, but is usually preferably 20 to 200 ° C, more preferably 20 to 160 ° C, and particularly preferably 100 to 160 ° C.
- the reaction between the aromatic diamine diol and the dialdehyde compound may be performed while adding an entrainer to the solvent and performing reflux dehydration.
- the entrainer is not particularly limited, and is appropriately selected from organic solvents that form an azeotrope with water and form a two-phase system with water at room temperature. Suitable examples of entrainers include esters such as isobutyl acetate, allyl acetate, propionate-n-propyl, isopropyl propionate, n-butyl propionate, and isobutyl propionate; dichloromethyl ether, ethyl isoamyl ether, etc. Ethers; ketones such as ethyl propyl ketone; and aromatic hydrocarbons such as toluene.
- reaction time between the aromatic diamine diol and the dialdehyde compound is not particularly limited, but it is typically preferably about 2 to 72 hours.
- the amount of the dialdehyde compound used in the production of the polybenzoxazole precursor is preferably 0.5 to 1.5 mol, preferably 0.7 to 1.3 mol per mol of aromatic diamine diol. More preferably, it is a mole.
- the amount of the solvent used is not particularly limited as long as the reaction between the aromatic diamine diol and the dialdehyde compound proceeds favorably.
- a solvent having a mass of 1 to 40 times, preferably 1.5 to 20 times the mass of the total mass of the aromatic diamine diol and the dialdehyde compound is used.
- the reaction between the aromatic diamine diol and the dialdehyde compound is preferably carried out until the polybenzoxazole precursor to be produced has a number average molecular weight of 1000 to 20000, preferably 1200 to 5000.
- reaction of aromatic diamine diol with dicarboxylic acid dihalide The reaction between the aromatic diamine diol and the dicarboxylic acid dihalide is carried out in a solvent.
- the reaction temperature is not particularly limited, but is usually preferably ⁇ 20 to 150 ° C., more preferably ⁇ 10 to 150 ° C., and particularly preferably ⁇ 5 to 70 ° C.
- hydrogen halide is by-produced.
- an organic base such as triethylamine, pyridine and N, N-dimethyl-4-aminopyridine, or an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is used as a reaction solution. A small amount may be added inside.
- reaction time between the aromatic diamine diol and the dicarboxylic acid dihalide is not particularly limited, but is typically preferably about 2 to 72 hours.
- the amount of dicarboxylic acid dihalide used in the production of the polybenzoxazole precursor is preferably 0.5 to 1.5 mol, preferably 0.7 to 1.3 mol per mol of aromatic diamine diol. More preferably, it is a mole.
- the amount of the solvent used is not particularly limited as long as the reaction between the aromatic diamine diol and the dicarboxylic acid dihalide proceeds favorably.
- the solvent is used in an amount of 1 to 40 times, preferably 1.5 to 20 times the weight of the sum of the weight of the aromatic diamine diol and the weight of the dicarboxylic acid dihalide.
- the reaction between the aromatic diamine diol and the dicarboxylic acid dihalide is preferably carried out until the number average molecular weight of the polybenzoxazole precursor to be produced is 1000 to 20000, preferably 1200 to 5000.
- a polybenzoxazole precursor solution can be obtained.
- a solution of a polybenzoxazole precursor can be used as it is.
- Precursor pastes or solids can also be used.
- an appropriate amount of a solvent or the like is added to the polybenzoxazole precursor solution obtained by the above reaction to adjust the solid concentration of the polybenzoxazole precursor solution to the energy-sensitive resin composition according to the present invention. It can also be used for the preparation of products.
- Examples of the organic solvent used in the reaction of the aromatic diamine diol with the dicarbonyl compound include N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N Nitrogen-containing polar solvents such as N, N-diethylformamide, N, N, 2-trimethylpropionamide, N-methylcaprolactam, and N, N, N ′, N′-tetramethylurea; ⁇ -propiolactone, ⁇ - Lactone polar solvents such as butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone, ⁇ -caprolactone, and ⁇ -caprolactone; dimethyl sulfoxide; acetonitrile; fatty acid esters such as ethyl lactate and butyl lactate; diethylene glycol dimethyl ether, diethylene glycol diethyl ether The Hexane, tetrahydr
- N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-diethylacetamide, N, N are used because of the solubility of the polybenzoxazole precursor and polybenzoxazole resin to be produced.
- Nitrogen-containing polar solvents such as dimethylformamide, N, N-diethylformamide, N, N, 2-trimethylpropionamide, N-methylcaprolactam, and N, N, N ′, N′-tetramethylurea are preferred.
- the energy-sensitive resin composition according to the present invention may be a paste containing a solvent and containing a solid in terms of applicability, may be a solution, and is preferably a solution.
- a solvent can be used individually or in mixture of 2 or more types. The type of the solvent is not particularly limited as long as the object of the present invention is not impaired. Examples of suitable solvents are the same as those used for the reaction of the aromatic diamine diol with the dicarbonyl compound.
- the solvent may contain alcohol solvents such as polyethylene glycol, ethylene glycol, diethylene glycol, propylene glycol, and dipropylene glycol. When the solvent contains an alcohol solvent, it is easy to form a pattern having excellent heat resistance.
- the content of the solvent in the energy sensitive resin composition is not particularly limited as long as the object of the present invention is not impaired.
- the content of the solvent in the energy sensitive resin composition is appropriately adjusted according to the solid content in the energy sensitive resin composition.
- the solid content in the energy-sensitive resin composition is preferably 5 to 70% by mass, more preferably 10 to 60% by mass.
- the energy sensitive resin composition according to the present invention contains a compound (A) that decomposes by at least one of light and heat to generate at least one of a base and an acid.
- a compound (A) can be used individually or in mixture of 2 or more types.
- the compound (A) in the energy sensitive resin composition is decomposed to generate at least one of a base and an acid.
- the base or acid thus generated acts on the polybenzoxazole precursor in the energy-sensitive resin composition and promotes conversion to a polybenzoxazole resin.
- the energy-sensitive resin composition contains the compound (A), so that even when the polybenzoxazole precursor is heat-treated at a low temperature, the transparency decreases due to the coloring of the resin when the polybenzoxazole precursor is heated. It is possible to provide a polybenzoxazole resin that is excellent in mechanical properties such as tensile elongation and chemical resistance.
- the energy sensitive resin composition which concerns on this invention contains a compound (A), when heating the said energy sensitive resin composition and manufacturing polybenzoxazole resin, in the surface of polybenzoxazole resin The occurrence of defects such as swelling, cracking and foaming can be suppressed. For this reason, when a film made of the above energy-sensitive resin composition is heated to produce a polybenzoxazole resin film, it is easy to produce a film having no defects such as cracks, blisters and pinholes and having an excellent appearance.
- a compound (A) when heating the said energy sensitive resin composition and manufacturing polybenzoxazole resin, in the surface of polybenzoxazole resin The occurrence of defects such as swelling, cracking and foaming can be suppressed. For this reason, when a film made of the above energy-sensitive resin composition is heated to produce a polybenzoxazole resin film, it is easy to produce a film having no defects such as cracks, blisters and pinholes and having an excellent appearance.
- Compound (A) is preferably a compound that decomposes at 120 to 180 ° C. to generate a base. If such a compound (A) has a heating temperature equal to or higher than its decomposition temperature, for example, it can be decomposed by heating to generate a base even at a low heating temperature of 220 ° C. or lower. Therefore, if an energy sensitive resin composition containing such a compound (A) is heated to a temperature higher than the decomposition temperature of the compound (A), it is generated due to the decomposition of the compound (A) even at a low temperature of 220 ° C. or lower.
- the converted base promotes the conversion from the polybenzoxazole precursor in the energy-sensitive resin composition to the polybenzoxazole resin, and the conversion to the polybenzoxazole resin also proceeds by heating itself. A resin is formed. Since the compound (A) is sufficiently decomposed by the above heating, the remaining amount of the compound (A) is kept low in the formed polybenzoxazole resin. Therefore, even if the polybenzoxazole resin is heated to, for example, a high temperature of 300 ° C. or higher, a decrease in weight due to decomposition of the compound (A) is suppressed, and the heat resistance is excellent.
- the compound (A) is preferably a compound that decomposes at least by the action of light to generate at least one of a base and an acid.
- an energy-sensitive resin composition containing such a compound (A) is exposed, the compound (A) is decomposed in the exposed area to generate at least one of a base and an acid.
- the base or acid thus generated promotes the conversion of the polybenzoxazole precursor into the polybenzoxazole resin in the energy-sensitive resin composition, and the exposed portion becomes insoluble in the developer.
- the unexposed portion is soluble in the developer, it can be removed by dissolving in the developer. Therefore, a desired pattern can be formed by selectively exposing the energy sensitive resin composition.
- Examples of the compound (A) include a compound (A-1) that decomposes by at least one of light and heat to generate an imidazole compound, and an oxime compound (A-2).
- A-1 that decomposes by at least one of light and heat to generate an imidazole compound
- A-2 an oxime compound
- the compounds (A-1) and (A-2) will be described.
- the imidazole compound generated from the compound (A-1) promotes the conversion of the polybenzoxazole precursor in the energy-sensitive resin composition according to the present invention to a polybenzoxazole resin.
- the imidazole compound generated from the compound (A-1) may be an imidazole or a compound in which part or all of the hydrogen atoms bonded to the carbon atoms in the imidazole are substituted with a substituent. It is preferable that it is an imidazole compound represented by (3).
- R 1 , R 2 , and R 3 are each independently a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphino group, (A phosphinyl group, a phosphonate group, or an organic group is shown.)
- Examples of the organic group represented by R 1 , R 2 , or R 3 include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, and an aralkyl group. This organic group may contain a hetero atom.
- the organic group may be linear, branched or cyclic. This organic group is usually monovalent, but may be divalent or higher when forming a cyclic structure.
- R 1 and R 2 may be bonded to each other to form a cyclic structure, and may include a hetero atom bond.
- Examples of the cyclic structure include a heterocycloalkyl group and a heteroaryl group, and may be a condensed ring.
- examples of the hetero atom include an oxygen atom, a nitrogen atom, and a silicon atom.
- an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, an imino bond, a carbonate bond, a sulfonyl bond, and a sulfinyl bond are preferable.
- a hydrogen atom contained in a group other than an organic group represented by R 1 , R 2 , or R 3 may be substituted with a hydrocarbon group.
- the hydrocarbon group may be linear, branched or cyclic.
- R 1 , R 2 , and R 3 are each independently preferably a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and a halogen atom.
- a hydrogen atom is more preferable. Since imidazole in which R 1 , R 2 , and R 3 are all hydrogen atoms has a simple structure with little steric hindrance, it can easily act on a polybenzoxazole precursor.
- Compound (A-1) is not particularly limited as long as it can decompose by at least one of light and heat to generate an imidazole compound, preferably an imidazole compound represented by the above formula (3).
- the skeleton derived from amines generated during exposure is an imidazole compound, preferably an imidazole compound represented by the above formula (3)
- the compound used as compound (A-1) is obtained by substituting the skeleton derived from
- Suitable compound (A-1) includes a compound represented by the following formula (4).
- R 1 , R 2 , and R 3 are each independently a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, phosphino group, sulfonate group
- R 4 and R 5 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, or a sulfino group.
- R 6 , R 7 , R 8 , R 9 , and R 10 are each independently a hydrogen atom or a halogen atom.
- R 6 , R 7 , R 8 , R 9 , and R 10 are two or more of them May be bonded to form a cyclic structure and may contain a bond of a hetero atom.
- R 1 , R 2 , and R 3 are the same as those described for the formula (3).
- examples of the organic group represented by R 4 or R 5 include those exemplified for R 1 , R 2 , and R 3 .
- This organic group may contain a hetero atom as in the case of R 1 , R 2 and R 3 .
- the organic group may be linear, branched or cyclic.
- R 4 and R 5 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, a cycloalkenyl group having 4 to 13 carbon atoms, or an aryl having 7 to 16 carbon atoms.
- Amino group is preferably a methylthio group. More preferably, both R 4 and R 5 are hydrogen atoms, or R 4
- examples of the organic group represented by R 6 , R 7 , R 8 , R 9 , or R 10 include those exemplified for R 1 , R 2 , and R 3 .
- This organic group may contain a hetero atom as in the case of R 1 and R 2 .
- the organic group may be linear, branched or cyclic.
- R 6 , R 7 , R 8 , R 9 , and R 10 may be bonded to form a cyclic structure, and may include a hetero atom bond.
- the cyclic structure include a heterocycloalkyl group and a heteroaryl group, and may be a condensed ring.
- R 6 , R 7 , R 8 , R 9 , and R 10 are two or more of them bonded to each other, and R 6 , R 7 , R 8 , R 9 , and R 10 are bonded to each other.
- a ring atom may be shared to form a condensed ring such as naphthalene, anthracene, phenanthrene, and indene.
- R 6 , R 7 , R 8 , R 9 and R 10 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, or a cyclohexane having 4 to 13 carbon atoms.
- R 6 , R 7 , R 8 , R 9 , and R 10 two or more of them are bonded, and R 6 , R 7 , R 8 , R 9 , and R 10 are bonded.
- a case where a condensed ring such as naphthalene, anthracene, phenanthrene, or indene is formed by sharing the atoms of the benzene ring is also preferable from the viewpoint of increasing the absorption wavelength.
- a compound represented by the following formula (5) is preferable.
- R 1 , R 2 , and R 3 have the same meanings as in formulas (3) and (4).
- R 4 to R 9 have the same meanings as in formula (4).
- R 11 is a hydrogen atom or Represents an organic group, and R 6 and R 7 do not become a hydroxyl group, and R 6 , R 7 , R 8 , and R 9 may combine with each other to form a cyclic structure. And may contain a heteroatom bond.
- the compound represented by the formula (5) has a substituent —O—R 11 , it has excellent solubility in an organic solvent.
- R 11 when R 11 is an organic group, examples of the organic group include those exemplified for R 1 , R 2 , and R 3 . This organic group may contain a hetero atom.
- the organic group may be linear, branched or cyclic.
- R 11 is preferably a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and more preferably a methyl group.
- Suitable compounds (A-1) also include compounds represented by the following formula (6).
- R 1 , R 2 , and R 3 are each independently a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, phosphino group, sulfonate group, (A phosphinyl group, a phosphonato group, or an organic group.
- R 12 represents an optionally substituted hydrocarbon group.
- R 1 , R 2 , and R 3 are the same as those described for Formula (3).
- R 12 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, or an optionally substituted 6 to 20 carbon atoms.
- Examples thereof include an aryl group and an optionally substituted aralkyl group having 7 to 20 carbon atoms, and an optionally substituted aralkyl group having 7 to 20 carbon atoms is preferable.
- the substituent include a halogen atom, a nitro group, an alkyl group having 1 to 4 carbon atoms, and an alkoxy group having 1 to 4 carbon atoms.
- the compound represented by the formula (6) is a reaction between an imidazole compound represented by the formula (3) and a chloroformate represented by the following formula (7), an imidazole compound represented by the formula (3) and the following: It can synthesize
- R 1 , R 2 , and R 3 have the same meaning as in formula (3).
- R 12 has the same meaning as in formula (6).
- the oxime compound (A-2) is decomposed by the action of at least one of light and heat to generate at least one of a base and an acid. Conversion from the polybenzoxazole precursor to the polybenzoxazole resin in the energy-sensitive resin composition according to the present invention is accelerated by the base or acid generated by the decomposition of the compound (A-2).
- Suitable compound (A-2) includes a compound represented by the following formula (D1).
- R d1 is an optionally substituted aliphatic hydrocarbon group having 1 to 10 carbon atoms, an optionally substituted aryl group, or an optionally substituted carbazolyl group.
- R d2 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms, or an aryl group which may have a substituent
- R d3 is a hydrogen atom or a group represented by —CO—R d5 in and, R d5 represents a hydrogen atom, an alkyl group, or an optionally substituted aryl group having 1 to 6 carbon atoms.
- R d1 in the above formula (D1) is an aryl group which may have a substituent
- examples of the aryl group which may have a substituent include a phenyl group which may have a substituent.
- a phenyl group which may have a substituent or a naphthyl group which may have a substituent is preferable, and a phenyl group which may have a substituent is more preferable.
- the number of substituents bonded to the aryl group is not particularly limited.
- the aryl group has a plurality of substituents, the plurality of substituents may be the same or different.
- the type of substituent that the aryl group may have is not particularly limited as long as the object of the present invention is not impaired.
- the substituent include an organic group, an amino group, a halogen atom, a nitro group, and a cyano group.
- the type of the organic group is not particularly limited as long as the object of the present invention is not impaired, and is appropriately selected from various organic groups.
- the organic group an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, a phenyl group which may have a substituent, It may have a phenoxy group that may have a substituent, a benzoyl group that may have a substituent, a phenoxycarbonyl group that may have a substituent, a benzoyloxy group that may have a substituent, and a substituent.
- An optionally substituted phenylalkyl group, an optionally substituted naphthyl group, an optionally substituted naphthoxy group, an optionally substituted naphthoyl group, and an optionally substituted naphtho An oxycarbonyl group, an optionally substituted naphthoyloxy group, an optionally substituted naphthylalkyl group, an optionally substituted heterocyclyl group, 1 or 2 organic groups; Conversion amino groups, morpholin-1-yl group, and piperazine-1-yl group.
- the carbon number of the substituent does not include the carbon number of the substituent that the substituent further has.
- the carbon number is preferably 1-20, and more preferably 1-6. Further, when the organic group is an alkyl group, it may be linear or branched. Specific examples when the organic group is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, and an n-pentyl group.
- the organic group is an alkyl group
- the alkyl group may contain an ether bond (—O—) in the carbon chain.
- alkyl group having an ether bond in the carbon chain examples include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, and a methoxypropyl group.
- the carbon number is preferably 1-20, and more preferably 1-6. Further, when the organic group is an alkoxy group, it may be linear or branched. Specific examples when the organic group is an alkoxy group include methoxy group, ethoxy group, n-propyloxy group, isopropyloxy group, n-butyloxy group, isobutyloxy group, sec-butyloxy group, tert-butyloxy group, n -Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group Tert-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, iso
- the alkoxy group may include an ether bond (—O—) in the carbon chain.
- the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, and a methoxypropyloxy group.
- the organic group is a cycloalkyl group or a cycloalkoxy group
- the carbon number thereof is preferably 3 to 10, more preferably 3 to 6.
- Specific examples of the organic cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group.
- organic group is a cycloalkoxy group
- organic group is a cycloalkoxy group
- examples when the organic group is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.
- the carbon number thereof is preferably 2 to 20, and more preferably 2 to 7.
- Specific examples when the organic group is a saturated aliphatic acyl group include acetyl group, propanoyl group, n-butanoyl group, 2-methylpropanoyl group, n-pentanoyl group, 2,2-dimethylpropanoyl group, n -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadecane group
- Examples include a noyl group and an n-hexadecanoyl
- organic group is a saturated aliphatic acyloxy group
- organic group is a saturated aliphatic acyloxy group
- examples when the organic group is a saturated aliphatic acyloxy group include acetyloxy group, propanoyloxy group, n-butanoyloxy group, 2-methylpropanoyloxy group, n-pentanoyloxy group, 2, 2-dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group and the
- the carbon number is preferably 2 to 20, and more preferably 2 to 7.
- Specific examples when the organic group is an alkoxycarbonyl group include methoxycarbonyl group, ethoxycarbonyl group, n-propyloxycarbonyl group, isopropyloxycarbonyl group, n-butyloxycarbonyl group, isobutyloxycarbonyl group, sec-butyl.
- the carbon number thereof is preferably 7-20, and more preferably 7-10.
- the organic group is a naphthylalkyl group
- the carbon number thereof is preferably 11-20, and more preferably 11-14.
- Specific examples in the case where the organic group is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group.
- the organic group is a naphthylalkyl group
- the organic group may further have a substituent on the phenyl group or naphthyl group.
- the heterocyclyl group is a 5-membered or 6-membered monocycle containing one or more N, S, and O, or such monocycles or such monocycles and a benzene ring are condensed. Heterocyclyl group.
- the heterocyclyl group is a condensed ring, the ring number is up to 3.
- heterocyclic ring constituting the heterocyclyl group examples include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indole, Examples include isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxaline.
- the organic group is a heterocyclyl group
- the heterocyclyl group may further have a substituent.
- organic group is an amino group substituted with one or two organic groups
- suitable examples of the organic group bonded to the nitrogen atom include alkyl groups having 1 to 20 carbon atoms and cycloalkyl groups having 3 to 10 carbon atoms.
- a saturated aliphatic acyl group having 2 to 20 carbon atoms a phenyl group which may have a substituent, a benzoyl group which may have a substituent, and a carbon group having 7 to 20 carbon atoms which may have a substituent.
- a phenylalkyl group a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, and a heterocyclyl group. It is done.
- Specific examples of these suitable organic groups are the same as the specific examples of the organic group that the aryl group may have as a substituent when R d1 is an aryl group that may have a substituent. .
- amino group substituted with one or two organic groups include a methylamino group, a dimethylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, and an isopropylamino group.
- R d1 is an aryl group which may have a substituent
- substitution in the case where the phenyl group, the naphthyl group, and the heterocyclyl group contained in the organic group bonded to the aryl group as a substituent further has a substituent
- the group include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a saturated aliphatic acyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, and an alkyl group having 2 to 7 carbon atoms.
- Saturated aliphatic acyloxy group monoalkylamino group having an alkyl group having 1 to 6 carbon atoms, dialkylamino group having an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, halogen An atom, a nitro group, a cyano group, etc. are mentioned.
- R d1 is an aryl group which may have a substituent
- the phenyl group, naphthyl group and heterocyclyl group contained in the organic group bonded as a substituent to the aryl group further has a substituent
- the number of substituents is not limited as long as the object of the present invention is not impaired, but 1 to 4 is preferable.
- R d1 is an aryl group which may have a substituent
- the phenyl group, the naphthyl group, and the heterocyclyl group included in the organic group bonded as a substituent to the aryl group have a plurality of substituents.
- the plurality of substituents may be the same or different.
- R d1 is an aryl group which may have a substituent
- the substituent that the aryl group has is that the substituent is chemically stable, has little steric hindrance, and has the formula (D1 )
- a compound represented by the formula (D1) has high solubility in a solvent, etc., so that a nitro group, an alkyl group having 1 to 6 carbon atoms, a carbon number of 1 Is preferably a group selected from the group consisting of an alkoxy group having 6 to 6 carbon atoms and a saturated aliphatic acyl group having 2 to 7 carbon atoms, more preferably a nitro group or an alkyl group having 1 to 6 carbon atoms, a nitro group or a methyl group Is particularly preferred.
- R d1 is an aryl group which may have a substituent
- R d1 is preferably represented by the following formula (D1-1).
- R d4 is a group selected from the group consisting of an organic group, an amino group, a halogen atom, a nitro group, and a cyano group, and q is an integer of 0 to 4.
- R d4 is an organic group
- a preferred example of the organic group is an organic group that the aryl group may have as a substituent when R d1 is an aryl group that may have a substituent. This is the same as the example.
- Position R d4 is bonded to the phenyl group, the phenyl group R d4 are attached the position of the bond to the main chain of the phenyl group and the oxime compound is the 1-position, in the case of a two-position the location of the methyl group
- the 4th or 5th position is preferable, and the 5th position is more preferable.
- q is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1.
- R d1 is an aliphatic hydrocarbon group which may have a substituent
- the carbon number thereof is 1 to 10. This carbon number does not include the carbon number of the substituent.
- the aliphatic hydrocarbon group preferably has 1 to 9 carbon atoms, and more preferably 1 to 8 carbon atoms.
- the aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or a hydrocarbon group having an unsaturated bond.
- the structure of the aliphatic hydrocarbon group may be linear, branched, cyclic, or a combination of these structures, and is linear. Is preferred.
- R d1 is a linear aliphatic hydrocarbon group
- R d1 is a linear aliphatic hydrocarbon group
- examples include an n-hexyl group, an n-heptyl group, an n-octyl group, an n-nonyl group, and an n-decyl group.
- R d1 is a cyclic aliphatic hydrocarbon group include a cyclopentyl group and a cyclohexyl group.
- R d1 is an aliphatic hydrocarbon group
- substituents that the aliphatic hydrocarbon group may have include a hydroxyl group, a halogen atom, a cyano group, an alkoxy group having 1 to 10 carbon atoms, 1-10 alkylthio groups, aryl groups optionally having substituents, aryloxy groups optionally having substituents, arylthio groups optionally having substituents, saturated aliphatic groups having 2 to 10 carbon atoms
- It may have an acyl group, an arylcarbonyl group which may have a substituent, an amino group, an amino group substituted with 1 or 2 alkyl having 1 to 2 carbon atoms, and a substituent having 1 or 2 An amino group substituted with an aryl group can be mentioned.
- the carbon number of these substituents is not included in the carbon number of the aliphatic hydrocarbon group.
- the substituent that the aliphatic hydrocarbon group has has an aryl group that may have a substituent, an aryloxy group that may have a substituent, an arylthio group that may have a substituent, and a substituent.
- the aryl group contained in these groups includes a phenyl group, a naphthyl group, An anthryl group and a phenanthryl group are mentioned, a phenyl group and a naphthyl group are preferable, and a phenyl group is more preferable.
- the substituent that the aliphatic hydrocarbon group has has an aryl group that may have a substituent, an aryloxy group that may have a substituent, an arylthio group that may have a substituent, and a substituent.
- the aryl group contained in these groups may have a substituent Examples thereof include a hydroxyl group, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a saturated aliphatic acyl group having 2 to 7 carbon atoms.
- R d1 is an aliphatic hydrocarbon group
- substituents that the aliphatic hydrocarbon group may have are as follows.
- d1 is an aryl group, it is the same as the substituent that the aryl group may have.
- R d1 is an optionally substituted carbazolyl group
- the type of substituent is not particularly limited as long as the object of the present invention is not impaired.
- suitable substituents that the carbazolyl group may have on the carbon atom include alkyl groups having 1 to 20 carbon atoms, alkoxy groups having 1 to 20 carbon atoms, cycloalkyl groups having 3 to 10 carbon atoms, carbon A cycloalkoxy group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, a saturated aliphatic acyloxy group having 2 to 20 carbon atoms, and a substituent.
- phenyl group optionally substituted phenoxy group, optionally substituted phenylthio group, optionally substituted phenylcarbonyl group, optionally substituted benzoyl group, substituted A phenoxycarbonyl group which may have a group, a benzoyloxy group which may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, and a naphthyl which may have a substituent Group, substitution A naphthoxy group which may have a substituent, a naphthylcarbonyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, and a substituent An optionally substituted naphthoyloxy group, an optionally substituted naphthylalkyl group having 11 to 20 carbon atoms, an optionally substituted heterocyclyl group, an optionally substituted hetero
- R d1 is a carbazolyl group which may have a substituent
- suitable substituents that the carbazolyl group may have on the nitrogen atom include an alkyl group having 1 to 20 carbon atoms, a carbon number of 3 A cycloalkyl group having 10 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, an optionally substituted phenyl group, and an optionally substituted benzoyl group A phenoxycarbonyl group which may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, and a substituent.
- It has a naphthoyl group, an optionally substituted naphthoxycarbonyl group, an optionally substituted naphthylalkyl group having 11 to 20 carbon atoms, an optionally substituted heterocyclyl group, and a substituent. Heterocycle And a rucarbonyl group. Among these substituents, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.
- R d1 is substituted for an optionally substituted phenylalkyl group, an optionally substituted naphthylalkyl group, an optionally substituted heterocyclyl group, and an amino group substituted with 1 or 2 organic groups.
- an aryl group that may have a group the examples are the same as the examples of the substituent that the aryl group has.
- Examples of the substituent in the case where the phenyl group, the naphthyl group, and the heterocyclyl group included in the substituent of R d1 further have a substituent include an alkyl group having 1 to 6 carbon atoms; An alkoxy group having 2 to 7 carbon atoms; an alkoxycarbonyl group having 2 to 7 carbon atoms; a saturated aliphatic acyloxy group having 2 to 7 carbon atoms; a phenyl group; a naphthyl group; a benzoyl group; A benzoyl group substituted by a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, and a phenyl group; an alkyl group having 1 to 6 carbon atoms; A monoalkylamino group having 1 to 6 carbon atoms; a morpholin-1-yl group; a piperazin-1-yl
- the number of the substituent is not limited as long as the object of the present invention is not impaired, but 1 to 4 is preferable.
- the phenyl group, naphthyl group, and heterocyclyl group have a plurality of substituents, the plurality of substituents may be the same or different.
- R d2 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms or an aryl group which may have a substituent.
- the aliphatic hydrocarbon group preferably has 1 to 6 carbon atoms, more preferably 1.
- the aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or a hydrocarbon group having an unsaturated bond.
- the structure of the aliphatic hydrocarbon group may be linear, branched, cyclic, or a combination of these structures, and is linear. Is preferred.
- R d2 is a linear aliphatic hydrocarbon group
- R d2 is a linear aliphatic hydrocarbon group
- methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, n- Examples include a heptyl group, an n-octyl group, an n-nonyl group, and an n-decyl group. Of these, a methyl group is particularly preferred.
- R d2 is an aryl group which may have a substituent
- a substituent examples include a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent.
- examples thereof include a good anthryl group and a phenanthrenyl group which may have a substituent.
- a phenyl group which may have a substituent or a naphthyl group which may have a substituent is preferable, and a phenyl group which may have a substituent is more preferable.
- the substituent that the aryl group has is not particularly limited as long as the object of the present invention is not impaired.
- suitable substituents that the aryl group may have on the carbon atom include alkyl groups having 1 to 20 carbon atoms, alkoxy groups having 1 to 20 carbon atoms, cycloalkyl groups having 3 to 10 carbon atoms, Having a cycloalkoxy group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, a saturated aliphatic acyloxy group having 2 to 20 carbon atoms, and a substituent.
- R d1 is substituted for an optionally substituted phenylalkyl group, an optionally substituted naphthylalkyl group, an optionally substituted heterocyclyl group, and an amino group substituted with 1 or 2 organic groups.
- an aryl group that may have a group it is the same as the examples of the substituent that the aryl group may have.
- Examples of the substituent when the phenyl group, naphthyl group, and heterocyclyl group included in the substituent of the aryl group in R d2 further have a substituent include an alkyl group having 1 to 6 carbon atoms; An alkoxy group having 2 to 7 carbon atoms; an alkoxycarbonyl group having 2 to 7 carbon atoms; a saturated aliphatic acyloxy group having 2 to 7 carbon atoms; a phenyl group; a naphthyl group; a benzoyl group; A benzoyl group substituted by a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, and a phenyl group; an alkyl group having 1 to 6 carbon atoms; A monoalkylamino group having an alkyl group having 1 to 6 carbon atoms; a morpholin-1-yl group; a
- the number of the substituent is not limited as long as the object of the present invention is not hindered. preferable.
- the phenyl group, naphthyl group, and heterocyclyl group have a plurality of substituents, the plurality of substituents may be the same or different.
- R d3 in the formula (D1) is a hydrogen atom or a group represented by —CO—R d5 .
- R d5 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aryl group which may have a substituent.
- R d5 is an aryl group that may have a substituent
- the substituent that the aryl group may have is the above when R d1 is an aryl group that may have a substituent. This is the same as the substituent that the aryl group may have.
- R d5 is an aryl group which may have a substituent, the aryl group may have two or more substituents.
- R d5 is preferably a hydrogen atom, an acetyl group, a propionyl group, or a benzoyl group, and more preferably a hydrogen atom, an acetyl group, or a benzoyl group.
- the compound represented by the formula (D1) is a fatty acid having 1 to 10 carbon atoms in which R d1 may have a substituent in the formula (D1) from the viewpoint of base generation efficiency or acid generation efficiency of this compound.
- R d6 is a group selected from the group consisting of a monovalent organic group, amino group, halogen atom, nitro group, and cyano group, A is S or O, r is an integer of 0 to 4.
- R d6 in the formula (D1-2) is an organic group
- it can be selected from various organic groups as long as the object of the present invention is not impaired.
- preferred examples include an alkyl group having 1 to 6 carbon atoms; an alkoxy group having 1 to 6 carbon atoms; and a saturated aliphatic acyl having 2 to 7 carbon atoms.
- alkoxy group having 2 to 7 carbon atoms saturated aliphatic acyloxy group having 2 to 7 carbon atoms
- R d6 substituted by a group selected from the group consisting of a benzoyl group; a naphthoyl group; an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, and a phenyl group
- Benzoyl group nitro group is preferred, benzoyl group; naphthoyl group; 2-methylphenylcarbonyl group; 4- (piperazin-1-yl) phenylcarbonyl group; 4- (phenyl) phenylcarbonyl group is more preferred.
- r is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1.
- the binding position of R d6 are, with respect to bond the phenyl group R d6 are attached is bonded to an oxygen atom or a sulfur atom, it is preferably in the para position.
- A is preferably S.
- examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and 2 to A saturated aliphatic acyl group having 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms, and 1 to 6 carbon atoms And a dialkylamino group having an alkyl group, a morpholin-1-yl group, a piperazin-1-yl group, a halogen atom, a nitro group, and a cyano group.
- the number of the substituent is not limited as long as the object of the present invention is not impaired, but is preferably 1 to 4.
- the phenyl group, naphthyl group, and heterocyclyl group included in R d6 have a plurality of substituents, the plurality of substituents may be the same or different.
- R d7 and R d8 are each a monovalent organic group, and s is 0 or 1.
- R d7 in formula (12) can be selected from various organic groups as long as the object of the present invention is not impaired .
- Preferable examples of R d7 include alkyl groups having 1 to 20 carbon atoms, cycloalkyl groups having 3 to 10 carbon atoms, saturated aliphatic acyl groups having 2 to 20 carbon atoms, alkoxycarbonyl groups having 2 to 20 carbon atoms, Phenyl group which may have a substituent, benzoyl group which may have a substituent, phenoxycarbonyl group which may have a substituent, phenylalkyl having 7 to 20 carbon atoms which may have a substituent Group, optionally substituted naphthyl group, optionally substituted naphthoyl group, optionally substituted naphthoxycarbonyl group, optionally substituted carbon number 11 to 20 Naphthylalkyl group, a heterocyclyl group which may have a substituent, a heterocyclylcarbonyl group which may have
- an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.
- R d8 in the formula (12) is not particularly limited as long as the object of the present invention is not impaired, and can be selected from various organic groups.
- Specific examples of the group suitable as R d8 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent. Or a heterocyclyl group that may be used.
- R d8 among these groups, a phenyl group which may have a substituent and a naphthyl group which may have a substituent are more preferable, and a 2-methylphenyl group and a naphthyl group are particularly preferable.
- examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, A saturated aliphatic acyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms, a carbon number
- Examples include a dialkylamino group having 1 to 6 alkyl groups, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, and a cyano group.
- the number of the substituent is not limited as long as the object of the present invention is not impaired, but 1 to 4 is preferable.
- the phenyl group, naphthyl group, and heterocyclyl group contained in R d7 or R d8 have a plurality of substituents, the plurality of substituents may be the same or different.
- the compound represented by the formula (D1) is synthesized according to the following scheme 1, for example, when p is 0, R d2 is an aryl group which may have a substituent, and R d3 is a hydrogen atom. be able to.
- an aromatic compound represented by the following formula (1-1) is acylated by a Friedel-Crafts reaction using a halocarbonyl compound represented by the following formula (1-2), and the following formula:
- a ketone compound represented by (1-3) is obtained, and the obtained ketone compound (1-3) is oximed with hydroxylamine to obtain an oxime compound represented by the following formula (1-4).
- Hal is a halogen atom.
- R d1 and R d2 is the same as in formula (D1).
- R d2 is an aryl group which may have a substituent
- R d3 is a group represented by —CO—R d5
- an oxime compound of the formula (1-4) obtained by the method described in Scheme 1 above
- an oxime ester compound represented by the following formula (1-7) can be obtained by reacting with an acid halide represented by the following formula (1-6) (R d5 COHal, Hal is a halogen atom).
- R d1 , R d2 , and R d5 are the same as those in formula (1).
- R d2 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms
- R d3 is a hydrogen atom
- R d2 —CO—R d1 the ketone compound represented by can be oximed with hydroxylamine to obtain a compound represented by R d2 —C ( ⁇ N—OH) —R d1 .
- R d2 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms
- R d3 is a group represented by —CO—R d5.
- the oxime compound represented by R d2 —C ( ⁇ N—OH) —R d1 is acylated according to the method described in Scheme 2 to yield R d2 —C ( ⁇ N—O—CO— It can be obtained as a compound represented by R d5 ) —R d1 .
- the compound represented by the formula (D1) can be synthesized according to the following scheme 3, for example. Specifically, a ketone compound represented by the following formula (2-1) is added to a nitrite ester (RONO, R represents a carbon number of 1 to 6) represented by the following formula (2-2) in the presence of hydrochloric acid. The alkyl group.) Is reacted to obtain a ketoxime compound represented by the following formula (2-3), and then a ketoxime compound represented by the following formula (2-3) is obtained.
- R d1 and R d2 are the same as those in the formula (D1).
- the compound represented by the formula (D1) can be synthesized according to the following scheme 4 when p is 1 and R d3 is a group represented by —CO—R d5 .
- an oxime compound of the formula (2-3) obtained by the method described in Scheme 3 above, an acid anhydride ((R d5 CO) 2 O) represented by the following formula (2-4),
- an oxime ester compound represented by the following formula (2-6) can be obtained by reacting with an acid halide represented by the following formula (2-5) (R d5 COHal, Hal is a halogen atom).
- R d1 , R d2 , and R d5 are the same as those in the formula (D1).
- oxime compounds represented by the formula (D1) particularly preferred compounds include compounds represented by the following formula.
- the content of the compound (A) in the energy sensitive resin composition is not particularly limited as long as the object of the present invention is not impaired.
- the content of the compound (A) in the energy-sensitive resin composition is preferably 1 to 50 parts by mass and more preferably 1 to 30 parts by mass with respect to 100 parts by mass of the polybenzoxazole precursor.
- the energy-sensitive resin composition according to the present invention may contain other components in addition to the above components as long as the object of the present invention is not impaired.
- other components include surfactants, plasticizers, viscosity modifiers, antifoaming agents, and colorants.
- membrane or polybenzoxazole molded object based on this invention is the formation process which forms the coating film or molded object which consists of an energy sensitive resin composition which concerns on this invention, and the said coating film or molded object And a decomposition step of decomposing the compound (A) in the coating film or molded article by exposing or heating the film.
- each step will be described.
- the energy sensitive resin composition according to the present invention is applied to the surface of an object to be coated, or the energy sensitive resin composition is molded by an appropriate molding method.
- a coating film or molded body made of a product is formed.
- the coating method include a dipping method, a spray method, a bar coating method, a roll coating method, a spin coating method, and a curtain coating method.
- the thickness of the coating film is not particularly limited. Typically, the thickness of the coating film is preferably 2 to 100 ⁇ m, more preferably 3 to 50 ⁇ m.
- the thickness of the coating film can be appropriately controlled by adjusting the coating method and the solid content concentration and viscosity of the energy-sensitive resin composition.
- the film or molded body may be heated for the purpose of removing the solvent in the coating film or molded body before shifting to the decomposition step.
- the heating temperature and the heating time are not particularly limited as long as the components contained in the energy sensitive resin composition are not thermally deteriorated or decomposed.
- the coating film or molded body may be heated under reduced pressure.
- the compound (A) in the coating film or molded body is decomposed by exposing or heating the coating film or molded body formed in the forming step. Conversion from the polybenzoxazole precursor in the coating film or molded product to the polybenzoxazole resin is promoted by the base or acid generated by the decomposition of the compound (A). Moreover, when heating the said coating film or a molded object, conversion to polybenzoxazole resin advances also by the heating. As a result of such conversion to a polybenzoxazole resin, a polybenzoxazole film or a polybenzoxazole molded product is formed.
- examples of the radiation used for the exposure include a low-pressure mercury lamp, a high-pressure mercury lamp, a metal halide lamp, a g-line stepper, and an i-line stepper. Can be mentioned.
- the amount of exposure varies depending on the light source used and the film thickness of the coating film, but is usually 1 to 1000 mJ / cm 2 , preferably 10 to 500 mJ / cm 2 .
- the heating temperature is appropriately adjusted according to the decomposition temperature of the compound (A) to be used, and is set to, for example, 120 to 350 ° C., preferably 150 to 350 ° C.
- The By heating the polybenzoxazole precursor at a temperature in such a range, a polybenzoxazole resin can be produced while suppressing thermal degradation and thermal decomposition of the polybenzoxazole resin to be produced.
- the upper limit of the temperature at which the polybenzoxazole precursor is heated is preferably 220 ° C. or less, more preferably 200 ° C. or less, and particularly preferably 190 ° C. or less.
- the pattern production method according to the present invention comprises a coating comprising the energy-sensitive resin composition according to the present invention when the compound (A) is a compound that decomposes at least by the action of light to generate at least one of a base and an acid.
- a heating step of heating the molded body is a heating step of heating the molded body.
- the formation step in the pattern production method described above except that the compound (A) is a compound that decomposes at least by the action of light to generate at least one of a base and an acid,
- the formation process in the method for producing the polybenzoxazole film or the polybenzoxazole molded body is the same as described.
- the coating film or molded body obtained in the formation step is selectively exposed to a predetermined pattern.
- the selective exposure is usually performed using a mask having a predetermined pattern.
- the radiation and exposure amount used for exposure are the same as described for the case where the coating film or molded body is exposed in the decomposition step in the method for producing the polybenzoxazole film or polybenzoxazole molded body.
- the unexposed portion is removed from the coating film or molded body that has been selectively exposed to a predetermined pattern in the exposure process, and the coating film or molded body is developed.
- the unexposed area is usually removed by dissolving in an alkaline developer.
- the developing method include shower developing method, spray developing method, immersion developing method, paddle developing method and the like.
- the alkali developer an aqueous solution containing one or more alkali compounds selected from inorganic alkali compounds and organic alkali compounds can be used.
- concentration of the alkali compound in a developing solution is not specifically limited as long as the coating film or molded object after exposure can be developed favorably.
- the concentration of the alkali compound in the developer is preferably 1 to 10% by mass.
- inorganic alkali compounds include lithium hydroxide, sodium hydroxide, potassium hydroxide, diammonium hydrogen phosphate, dipotassium hydrogen phosphate, disodium hydrogen phosphate, lithium silicate, sodium silicate, potassium silicate, Examples thereof include lithium carbonate, sodium carbonate, potassium carbonate, lithium borate, sodium borate, potassium borate, and ammonia.
- organic alkali compounds include tetramethylammonium hydroxide, tetraethylammonium hydroxide, trimethylhydroxyethylammonium hydroxide, methylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, n-propylamine, di-n- Examples include propylamine, isopropylamine, diisopropylamine, methyldiethylamine, dimethylethanolamine, ethanolamine, and triethanolamine.
- a water-soluble organic solvent such as methanol, ethanol, propanol, or ethylene glycol
- a surfactant such as methanol, ethanol, propanol, or ethylene glycol
- a storage stabilizer such as a surfactant, a storage stabilizer, a resin dissolution inhibitor, and the like
- the heating step the unexposed portion is removed in the development step, whereby the coating film or the molded body developed in a predetermined pattern is heated.
- the conversion from the polybenzoxazole precursor remaining in the coating film or molded product to the polybenzoxazole resin after the exposure process is further accelerated, and the conversion to the polybenzoxazole resin is more sufficient.
- the heating temperature is the same as that described for the case where the coating film or the molded body is heated in the decomposition step in the method for producing the polybenzoxazole film or the polybenzoxazole molded body.
- Aromatic diamine diol DA1 2,2'-bis (3-amino-4-hydroxyphenyl) hexafluoropropane DA2: 4,4'-diamino-3,3'-dihydroxybiphenyl dicarbonyl compound
- DC1 isophthalaldehyde
- DC2 terephthalic acid dichloride / solvent
- NMP N-methyl-2-pyrrolidone
- TMU N, N, N ′, N′-tetramethylurea
- DMIB N, N, 2-trimethylpropionamide / compounds E1 to E5, comparison Compound C1
- a polybenzoxazole precursor was prepared according to the following method. About the preparation method of a polybenzoxazole precursor, reaction of aromatic diamine diol and a dialdehyde compound (DC1) and reaction of aromatic diamine diol and dicarboxylic acid dihalide (DC2) are described below.
- reaction of aromatic diamine diol with dialdehyde compound After adding an aromatic diamine diol of the type and amount shown in Table 1 and a solvent of the type and amount shown in Table 1 to the Erlenmeyer flask containing the rotor, the contents 5 of the flask were added using a magnetic stirrer. Stir for minutes. Then, DC1 (isophthalaldehyde) of the quantity shown in Table 1 was put in the flask, and the contents of the flask were refluxed for 3 hours in a nitrogen atmosphere to carry out the reaction. Next, the reaction solution was dehydrated by distillation under reduced pressure to obtain a polybenzoxazole precursor solution. As an example, in Example 4, the number average molecular weight of the polybenzoxazole precursor was about 1500.
- a polybenzoxazole resin film is formed according to the following method using the energy-sensitive resin compositions obtained in each Example and Comparative Example, and the tensile elongation, film-forming property, and chemical resistance of the polybenzoxazole resin film Property (NMP), coloring, and patterning properties were evaluated. These evaluation results are shown in Table 1.
- the obtained energy sensitive resin composition was applied onto a wafer substrate by an applicator (manufactured by YOSHIMITSU SEIKI, TBA-7 type).
- the coating film on the wafer substrate was heated under the conditions shown in Table 1 to form a polybenzoxazole resin film having a thickness of about 10 ⁇ m.
- a dumbbell-shaped test piece having a shape according to the IEC450 standard was punched out to obtain a test piece for tensile elongation measurement.
- the breaking elongation of the polybenzoxazole resin was measured by a universal material testing machine (TENSILON, manufactured by Orientec Co., Ltd.) under the conditions of a distance between chucks of 20 mm and a tensile speed of 2 mm / min. A case where the elongation at break was 30% or more was judged as ⁇ , a case where it was 25% or more and less than 30% was judged as ⁇ , and a case where it was less than 25% was judged as x.
- TENSILON manufactured by Orientec Co., Ltd.
- a polybenzoxazole resin film having a thickness of about 10 ⁇ m was formed in the same manner as the tensile elongation evaluation.
- the obtained polybenzoxazole resin film is visually observed, and defects such as swelling, cracking and foaming are hardly observed in the polyimide film, or these defects are observed in a range of about 20% or less of the total area of the polyimide film.
- ⁇ defects such as swelling, cracking and foaming are hardly observed in the polyimide film, or these defects are observed in a range of about 20% or less of the total area of the polyimide film.
- ⁇ those in which these defects are observed in the range of more than 20% to 30% or less of the total area of the polyimide film are determined as ⁇ , and these defects are approximately 30% of the total area of the polyimide film. What was observed in the range over% was determined as x.
- a polybenzoxazole resin film having a thickness of about 10 ⁇ m was formed in the same manner as the tensile elongation evaluation.
- the total wavelength transmittance of the obtained polybenzoxazole resin film was measured using a spectrophotometer (trade name: MCPD-3000, manufactured by Otsuka Electronics Co., Ltd.). Those with a total wavelength transmittance of 95% or more are judged as ⁇ , those with 90% or more and less than 95% are judged as ⁇ , those with 80% or more and less than 90% are judged as ⁇ , and those with less than 80% X was determined.
- the obtained energy sensitive resin composition was applied onto a wafer substrate by a spin coater (Mikasa, 1H-360S) and pre-baked at 80 ° C. for 5 minutes to form a coating film having a thickness of 3 ⁇ m.
- a line and space pattern mask exposure was performed under a condition of 100 mJ / cm 2 with a high-pressure mercury lamp.
- the exposed coating film was heated on a hot plate at 120 ° C. for 5 minutes, and then immersed in a developer (a solution in which a 2.38 mass% tetramethylammonium hydroxide aqueous solution and isopropanol were mixed at 9: 1).
- the developed coating film was heated at 180 ° C. for 1 hour to convert the polybenzoxazole precursor into a polybenzoxazole resin.
- the coating film after the conversion was observed, and the patterning characteristics were evaluated according to the following criteria. A case where a line with a width of 5 ⁇ m can be formed is judged as good ( ⁇ ), and a line with a width of 5 ⁇ m cannot be formed, but a case where a line with a width of 10 ⁇ m can be formed is judged as good ( ⁇ ).
- ⁇ defective
- compound (A-1) particularly a compound represented by formula (4) or (6) or oxime which decomposes by the action of at least one of light and heat to generate an imidazole compound
- a polybenzoxazole resin excellent in mechanical properties such as tensile elongation and chemical resistance, suppressed in coloration, high in transparency and good in patterning properties can be obtained.
- Comparative Example 4 when the comparative compound C1 that does not generate an imidazole compound even when decomposed by the action of light or heat is used, the patterning characteristics are good, but mechanical characteristics such as tensile elongation and It turns out that it is inferior to chemical resistance, coloring tends to be suppressed and transparency tends to be low, and it is difficult to obtain a polybenzoxazole resin film free from defects such as blisters, cracks and pinholes.
- Comparative compound C1 used in Comparative Example 4 is a compound that decomposes at a high temperature of 250 ° C. to generate a base.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
本発明に係る感エネルギー性樹脂組成物は、上記式(1)で表される芳香族ジアミンジオールと上記式(2)で表されるジカルボニル化合物とを反応させて得られるポリベンゾオキサゾール前駆体、溶剤、並びに光及び熱の少なくとも一方の作用により分解して塩基及び酸の少なくとも一方を発生する化合物(A)を少なくとも含有する。
ポリベンゾオキサゾール前駆体は、単独で又は2種以上を混合して用いることができる。ポリベンゾオキサゾール前駆体の合成原料としては、芳香族ジアミンジオールと、特定の構造のジカルボニル化合物とを用いる。以下、芳香族ジアミンジオールと、ジカルボニル化合物とについて説明する。
本発明では、芳香族ジアミンジオールとして下記式(1)で表される化合物を用いる。芳香族ジアミンジオールは、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
ポリベンゾオキサゾール前駆体の合成原料としては、以上説明した芳香族ジアミンジオールとともに、下記式(2)で表されるジカルボニル化合物を用いる。前述の芳香族ジアミンジオールと、下記式(2)で表されるジカルボニル化合物とを縮合させることにより、ポリベンゾオキサゾール前駆体が得られる。
ポリベンゾオキサゾール前駆体の原料として用いるジアルデヒド化合物は、下記式(2-1)で表される化合物である。ジアルデヒド化合物は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
ピラジンジアルデヒド類の具体例としては、ピラジン-2,3-ジアルデヒド、ピラジン-2,5-ジアルデヒド、及びピラジン-2,6-ジアルデヒド等が挙げられる。
ピリミジンジアルデヒド類の具体例としては、ピリミジン-2,4-ジアルデヒド、ピリミジン-4,5-ジアルデヒド、及びピリミジン-4,6-ジアルデヒド等が挙げられる。
ポリベンゾオキサゾール前駆体の原料として用いるジカルボン酸ジハライドは、下記式(2-2)で表される化合物である。ジカルボン酸ジハライドは、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
本発明において、ポリベンゾオキサゾール前駆体は、前述の芳香族ジアミンジオールと、ジカルボニル化合物とを、溶剤中で、周知の方法に従って反応させることによって製造される。以下、ポリベンゾオキサゾール前駆体の製造方法の代表的な例として、ジカルボニル化合物がジアルデヒド化合物である場合の製造方法と、ジカルボニル化合物がジカルボン酸ハライドである場合の製造方法とについて説明する。
芳香族ジアミンジオールとジアルデヒド化合物との反応は、溶剤中で行われる。芳香族ジアミンジオールとジアルデヒド化合物との反応はシッフ塩基の形成反応であり、周知の方法に従って行うことができる。反応温度は特に限定されないが、通常、20~200℃が好ましく、20~160℃がより好ましく、100~160℃が特に好ましい。
芳香族ジアミンジオールとジカルボン酸ジハライドとの反応は、溶剤中で行われる。反応温度は特に限定されないが、通常、-20~150℃が好ましく、-10~150℃がより好ましく、-5~70℃が特に好ましい。芳香族ジアミンジオールとジカルボン酸ジハライドとの反応ではハロゲン化水素が副生する。かかるハロゲン化水素を中和するために、トリエチルアミン、ピリジン、及びN,N-ジメチル-4-アミノピリジン等の有機塩基や、水酸化ナトリウム及び水酸化カリウム等のアルカリ金属水酸化物を、反応液中に少量加えてもよい。
本発明に係る感エネルギー性樹脂組成物は、塗布性の点で溶剤を含有し、固体を含むペーストであってもよく、溶液であってもよく、溶液であるのが好ましい。溶剤は単独で又は2種以上を混合して用いることができる。溶剤の種類は、本発明の目的を阻害しない範囲で、特に限定されない。好適な溶剤の例は、前述の芳香族ジアミンジオールと、ジカルボニル化合物との反応に使用される溶剤の例と同様である。溶剤は、ポリエチレングリコール、エチレングリコール、ジエチレングリコール、プロピレングリコール、及びジプロピレングリコール等のアルコール系溶剤を含んでいてもよい。溶剤が、アルコール系溶剤を含む場合、耐熱性に優れるパターンを形成しやすい。
本発明に係る感エネルギー性樹脂組成物は、光及び熱の少なくとも一方の作用により分解して塩基及び酸の少なくとも一方を発生する化合物(A)を含有する。化合物(A)は単独で又は2種以上を混合して用いることができる。
化合物(A-1)が発生するイミダゾール化合物は、本発明に係る感エネルギー性樹脂組成物中のポリベンゾオキサゾール前駆体からポリベンゾオキサゾール樹脂への変換を促進する。化合物(A-1)が発生するイミダゾール化合物は、イミダゾールであっても、イミダゾール中の炭素原子に結合した水素原子の一部又は全部が置換基で置換された化合物であってもよく、下記式(3)で表されるイミダゾール化合物であることが好ましい。
オキシム化合物(A-2)は、光及び熱の少なくとも一方の作用により分解して塩基及び酸の少なくとも一方を発生する。化合物(A-2)が分解して発生した塩基又は酸により、本発明に係る感エネルギー性樹脂組成物中のポリベンゾオキサゾール前駆体からポリベンゾオキサゾール樹脂への変換が促進される。
Rd1が環状の脂肪族炭化水素基である場合の好適な例としてはシクロペンチル基、シクロへキシル基が挙げられる。
Rd1が直鎖状の脂肪族炭化水素基と環状の脂肪族炭化水素基とを組み合わせた構造である場合の好適な例としては、シクロヘキシルメチル基、シクロペンチルメチル基、2-シクロヘキシルエチル基、2-シクロペンチルエチル基、3-シクロヘキシル-n-プロピル基、及び3-シクロペンチル-n-プロピル基が挙げられ、これらの基の中では2-シクロヘキシルエチル基、及び2-シクロペンチルエチル基が好ましい。
Rd2が脂肪族炭化水素基である場合、当該脂肪族炭化水素基の炭素数は、1~6が好ましく、1がより好ましい。当該脂肪族炭化水素基は、飽和脂肪族炭化水素基であってもよく、不飽和結合を有する炭化水素基であってもよい。当該脂肪族炭化水素基の構造は、直鎖状であっても、分岐鎖状であっても、環状であっても、これらの構造を組み合わせた構造であってもよく、直鎖状であるのが好ましい。
式(D1-2)において、AはSであるのが好ましい。
また、式(D1)で表される化合物は、pが0であり、Rd2が炭素数1~10の脂肪族炭化水素基であり、Rd3が-CO-Rd5で表される基である場合、Rd2-C(=N-OH)-Rd1で表されるオキシム化合物を、スキーム2に記載される方法に従ってアシル化することで、Rd2-C(=N-O-CO-Rd5)-Rd1で表される化合物として得ることができる。
本発明に係る感エネルギー性樹脂組成物は、本発明の目的を阻害しない範囲で、上記成分以外にその他の成分を含んでいてもよい。その他の成分の例としては、界面活性剤、可塑剤、粘度調整剤、消泡剤、及び着色剤等が挙げられる。
本発明に係る、ポリベンゾオキサゾール膜又はポリベンゾオキサゾール成形体の製造方法は、本発明に係る感エネルギー性樹脂組成物からなる塗膜又は成形体を形成する形成工程と、上記塗膜又は成形体を露光又は加熱することにより上記塗膜又は成形体中の化合物(A)を分解する分解工程とを含むものである。以下、各工程について説明する。
形成工程では、本発明に係る感エネルギー性樹脂組成物を被塗布体の表面に塗布したり、上記感エネルギー性樹脂組成物を適当な成形方法で成形したりして、上記感エネルギー性樹脂組成物からなる塗膜又は成形体を形成する。塗布方法としては、例えば、ディッピング法、スプレー法、バーコート法、ロールコート法、スピンコート法、カーテンコート法等が挙げられる。塗膜の厚さは、特に限定されない。典型的には、塗膜の厚さは、2~100μmが好ましく、3~50μmがより好ましい。塗膜の厚さは、塗布方法や感エネルギー性樹脂組成物の固形分濃度や粘度を調節することにより、適宜制御することができる。
分解工程では、上記形成工程で形成された塗膜又は成形体を露光又は加熱することにより上記塗膜又は成形体中の化合物(A)を分解する。化合物(A)が分解して発生した塩基又は酸により、上記塗膜又は成形体中のポリベンゾオキサゾール前駆体からポリベンゾオキサゾール樹脂への変換が促進される。また、上記塗膜又は成形体を加熱する場合には、その加熱によってもポリベンゾオキサゾール樹脂への変換が進行する。このようなポリベンゾオキサゾール樹脂への変換の結果、ポリベンゾオキサゾール膜又はポリベンゾオキサゾール成形体が形成される。
本発明に係るパターン製造方法は、化合物(A)が少なくとも光の作用により分解して塩基及び酸の少なくとも一方を発生する化合物である場合において、本発明に係る感エネルギー性樹脂組成物からなる塗膜又は成形体を形成する形成工程と、上記塗膜又は成形体を選択的に露光する露光工程と、露光後の上記塗膜又は成形体を現像する現像工程と、現像後の上記塗膜又は成形体を加熱する加熱工程とを含むものである。
上記パターン製造方法における形成工程は、本発明に係る感エネルギー性樹脂組成物において、化合物(A)が少なくとも光の作用により分解して塩基及び酸の少なくとも一方を発生する化合物である点を除き、上記ポリベンゾオキサゾール膜又はポリベンゾオキサゾール成形体の製造方法における形成工程について、説明したのと同様である。
露光工程では、形成工程で得られる塗膜又は成形体を、所定のパターンに選択的に露光する。選択的露光は、通常、所定のパターンのマスクを用いて行われる。露光に用いられる放射線や露光量は、上記ポリベンゾオキサゾール膜又はポリベンゾオキサゾール成形体の製造方法における分解工程において、塗膜又は成形体を露光する場合について、説明したのと同様である。
現像工程では、露光工程において所定のパターンに選択的に露光された塗膜又は成形体から未露光部を除去して、上記塗膜又は成形体を現像する。未露光部は、通常、アルカリ現像液に溶解させて除去される。現像方法としては、例えば、シャワー現像法、スプレー現像法、浸漬現像法、パドル現像法等が挙げられる。アルカリ現像液としては、無機アルカリ化合物及び有機アルカリ化合物から選択される1種以上のアルカリ化合物を含有する水溶液を用いることができる。現像液中のアルカリ化合物の濃度は、露光後の塗膜又は成形体を良好に現像できる限り特に限定されない。典型的には、現像液中のアルカリ化合物の濃度は、1~10質量%が好ましい。
加熱工程では、現像工程において、未露光部が除去されることによって、所定のパターンに現像された塗膜又は成形体を加熱する。これにより、露光工程を経ても塗膜又は成形体中に残存していたポリベンゾオキサゾール前駆体からポリベンゾオキサゾール樹脂への変換が更に促進され、ポリベンゾオキサゾール樹脂への変換がより十分なものとなる。加熱温度は、上記ポリベンゾオキサゾール膜又はポリベンゾオキサゾール成形体の製造方法における分解工程において、塗膜又は成形体を加熱する場合について、説明したのと同様である。
実施例及び比較例では、以下に示す芳香族ジアミンジオール、ジカルボニル化合物、溶剤、化合物E1~E5、及び比較化合物C1を用いた。
・芳香族ジアミンジオール
DA1:2,2'-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン
DA2:4,4’-ジアミノ-3,3’-ジヒドロキシビフェニル
・ジカルボニル化合物
DC1:イソフタルアルデヒド
DC2:テレフタル酸二クロライド
・溶剤
NMP:N-メチル-2-ピロリドン
TMU:N,N,N’,N’-テトラメチルウレア
DMIB:N,N,2-トリメチルプロピオンアミド
・化合物E1~E5、比較化合物C1
ポリベンゾオキサゾール前駆体を以下の方法に従って調製した。ポリベンゾオキサゾール前駆体の調製方法について、芳香族ジアミンジオールとジアルデヒド化合物(DC1)との反応、及び芳香族ジアミンジオールとジカルボン酸ジハライド(DC2)との反応を以下に記す。
回転子を入れた三角フラスコに、表1に記載の種類及び量の芳香族ジアミンジオールと、表1に記載の種類及び量の溶剤を加えた後、マグネッチックスターラーを用いてフラスコの内容物5分間撹拌した。その後、表1に記載の量のDC1(イソフタルアルデヒド)をフラスコ内に入れ、窒素雰囲気下でフラスコの内容物を3時間還流させて反応を行った。次いで、減圧蒸留にて、反応液を脱水し、ポリベンゾオキサゾール前駆体の溶液を得た。一例として、実施例4では、ポリベンゾオキサゾール前駆体の数平均分子量は約1500であった。
回転子を入れた三角フラスコに、表1に記載の種類及び量の芳香族ジアミンジオールと、芳香族ジアミンジオールの2倍モル量のトリエチルアミンと、表1に記載の種類の溶剤(量は、表1に記載の量の半分)を加えた。次いで、表1に記載の量のDC2(テレフタル酸ジクロライド)を表1に記載の種類の溶剤(量は、表1に記載の量の半分)に溶解させた溶液を、窒素雰囲気下において、三角フラスコ内に0℃で30分かけて滴下した。滴下終了後、室温にて三角フラスコ内の反応液を更に5時間撹拌して、ポリベンゾオキサゾール前駆体の溶液を得た。
各実施例及び比較例で得られたポリベンゾオキサゾール前駆体の溶液に、化合物E1~E5及び比較化合物C1のいずれかを、表1に記載の量で添加し撹拌して、感エネルギー性樹脂組成物を調製した。
各実施例及び比較例で得られた感エネルギー性樹脂組成物を用いて下記の方法に従ってポリベンゾオキサゾール樹脂膜を形成し、ポリベンゾオキサゾール樹脂膜の引張伸度と、製膜性と、耐薬品性(NMP)と、着色と、パターニング特性とを評価した。これらの評価結果を表1に記す。
得られた感エネルギー性樹脂組成物をウエハ基板上に、アプリケーター(YOSHIMITSU SEIKI製、TBA-7型)により塗布した。ウエハ基板上の塗布膜を表1に記載の条件で加熱して、膜厚約10μmのポリベンゾオキサゾール樹脂膜を形成した。得られたポリベンゾオキサゾール樹脂膜から、IEC450規格に従った形状のダンベル型試験片を打ち抜いて、引張伸度測定用の試験片を得た。得られた試験片を用いて、チャック間距離20mm、引張速度2mm/分の条件で、万能材料試験機(TENSILON、株式会社オリエンテック製)によって、ポリベンゾオキサゾール樹脂の破断伸度を測定した。破断伸度が30%以上である場合を○と判定し、25%以上30%未満である場合を△と判定し、25%未満である場合を×と判定した。
引張伸度評価と同様にして膜厚約10μmのポリベンゾオキサゾール樹脂膜を形成した。得られたポリベンゾオキサゾール樹脂膜を目視観察し、ポリイミド膜に、膨れ、割れ、発泡等の不具合がほとんど観察されないか、これらの不具合がポリイミド膜の全面積の20%以下程度の範囲に観察されたものを○と判定し、これらの不具合がポリイミド膜の全面積の20%超30%以下程度の範囲に観察されたものを△と判定し、これらの不具合がポリイミド膜の全面積の約30%超の範囲に観察されたものを×と判定した。
引張伸度評価と同様にして膜厚約10μmのポリベンゾオキサゾール樹脂膜を形成した。形成された膜上にNMPを1cc滴下し、1分間又は2分間放置した後にNMPを除去した。NMP除去後の膜の表面状態を目視で観察し、2分間の放置でも膜表面に変化がなかったものを○と判定し、2分間の放置では膜表面に窪み等の痕が残ったが、1分間の放置では膜表面に変化がなかったものを△と判定し、1分間の放置でも膜表面に窪み等の痕が残ったものを×と判定した。
引張伸度評価と同様にして膜厚約10μmのポリベンゾオキサゾール樹脂膜を形成した。得られたポリベンゾオキサゾール樹脂膜の全波長透過率を、分光測定器(商品名:MCPD-3000、大塚電子製)を用いて測定した。全波長透過率が95%以上のものを◎と判定し、90%以上95%未満のものを○と判定し、80%以上90%未満のものを△と判定し、80%未満のものを×と判定した。
得られた感エネルギー性樹脂組成物をウエハ基板上に、スピンコーター(ミカサ製、1H-360S)により塗布し、80℃で5分間プリベークして、膜厚3μmの塗膜を形成した。ラインアンドスペースパターンのマスクを用いて、高圧水銀灯により100mJ/cm2の条件で露光した。露光された塗膜を、120℃のホットプレート上で5分間加熱した後、現像液(テトラメチルアンモニウムハイドロオキサイド2.38質量%水溶液とイソプロパノールを9:1で混合した溶液)に浸漬した。その結果、露光部が現像液に溶解せず残存したパターンを得ることができた。次いで、現像された塗膜を180℃で1時間加熱して、ポリベンゾオキサゾール前駆体からポリベンゾオキサゾール樹脂への変換を行った。上記変換後の塗膜を観察し、以下の基準に従い、パターニング特性を評価した。幅5μmのラインが形成可能であった場合を良(◎)と判定し、幅5μmのラインは形成不可であったが、幅10μmのラインは形成可能であった場合を良(○)と判定し、幅5μmのラインも幅10μmのラインも形成不可であった場合を不良(×)と判定した。
比較例5によれば、溶剤としてN,N,N’,N’-テトラメチルウレアを用い、化合物E1~E5を添加しない場合、着色が抑制され透明性が高くなるものの、引張伸度のような機械的特性や耐薬品性にやや劣り、パターニング特性に劣る傾向にあり、ブリスター、割れ、ピンホール等の欠陥の無いポリベンゾオキサゾール樹脂フィルムがやや得にくいことが分かる。
Claims (8)
- 下記式(1)で表される芳香族ジアミンジオールと下記式(2)で表されるジカルボニル化合物とを反応させて得られるポリベンゾオキサゾール前駆体と、溶剤と、光及び熱の少なくとも一方の作用により分解して塩基及び酸の少なくとも一方を発生する化合物(A)とを含有する感エネルギー性樹脂組成物。
- 前記化合物(A)は、光及び熱の少なくとも一方の作用により分解してイミダゾール化合物を発生する化合物(A-1)、及び、オキシム化合物(A-2)の少なくとも1種を含む請求項1記載の感エネルギー性樹脂組成物。
- 前記化合物(A-1)は、下記式(4)で表される化合物である請求項2又は3記載の感エネルギー性樹脂組成物。
- 前記化合物(A)は、120~180℃で分解して塩基を発生する化合物である請求項1から4のいずれか1項記載の感エネルギー性樹脂組成物。
- 前記化合物(A)は、少なくとも光の作用により分解して塩基及び酸の少なくとも一方を発生する化合物である請求項1から5のいずれか1項記載の感エネルギー性樹脂組成物。
- 請求項1から6のいずれか1項記載の感エネルギー性樹脂組成物からなる塗膜又は成形体を形成する形成工程と、
前記塗膜又は成形体を露光又は加熱することにより前記塗膜又は成形体中の化合物(A)を分解する分解工程とを含むポリベンゾオキサゾール膜又はポリベンゾオキサゾール成形体の製造方法。 - 請求項6記載の感エネルギー性樹脂組成物からなる塗膜又は成形体を形成する形成工程と、
前記塗膜又は成形体を選択的に露光する露光工程と、
露光後の前記塗膜又は成形体を現像する現像工程と、
現像後の前記塗膜又は成形体を加熱する加熱工程とを含むパターン製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020177001342A KR102417300B1 (ko) | 2014-06-27 | 2015-06-11 | 감에너지성 수지 조성물 |
US15/317,015 US20170115563A1 (en) | 2014-06-27 | 2015-06-11 | Energy-sensitive resin composition |
CN201580033498.4A CN106575080B (zh) | 2014-06-27 | 2015-06-11 | 能量敏感性树脂组合物 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-133088 | 2014-06-27 | ||
JP2014133088A JP6408802B2 (ja) | 2014-06-27 | 2014-06-27 | 感エネルギー性樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015198887A1 true WO2015198887A1 (ja) | 2015-12-30 |
Family
ID=54937978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2015/066935 WO2015198887A1 (ja) | 2014-06-27 | 2015-06-11 | 感エネルギー性樹脂組成物 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20170115563A1 (ja) |
JP (1) | JP6408802B2 (ja) |
KR (1) | KR102417300B1 (ja) |
CN (1) | CN106575080B (ja) |
TW (1) | TWI687480B (ja) |
WO (1) | WO2015198887A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110591094A (zh) * | 2018-06-13 | 2019-12-20 | 北京大学 | 基于2,5-二烯丙氧基对苯二胺单体的新型聚苯并噁唑高分子材料及其制备方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019003913A1 (ja) * | 2017-06-30 | 2019-01-03 | 住友ベークライト株式会社 | 感光性樹脂組成物、樹脂膜及び電子装置 |
KR20190113369A (ko) * | 2018-03-28 | 2019-10-08 | 동우 화인켐 주식회사 | 하드마스크용 조성물 및 이를 이용한 패턴 형성 방법 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004077551A (ja) * | 2002-08-09 | 2004-03-11 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物並びにそれを用いたレリーフパターンおよび耐熱性塗膜の製造方法およびそれらを有する電子部品 |
JP2009282084A (ja) * | 2008-05-20 | 2009-12-03 | Asahi Kasei E-Materials Corp | アルカリ現像可能なネガ型感光性樹脂組成物 |
JP2010254946A (ja) * | 2008-09-30 | 2010-11-11 | Dainippon Printing Co Ltd | 感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、パターン形成方法、及び当該感光性樹脂組成物を用いた物品、並びに光潜在性樹脂硬化促進剤 |
WO2011067998A1 (ja) * | 2009-12-04 | 2011-06-09 | 東レ株式会社 | 感光性樹脂組成物、それを用いた積層体および固体撮像装置 |
JP2012203359A (ja) * | 2011-03-28 | 2012-10-22 | Hitachi Chemical Dupont Microsystems Ltd | ネガ型感光性樹脂組成物、パターン形成方法及び電子部品 |
WO2012172793A1 (ja) * | 2011-06-15 | 2012-12-20 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 |
JP2014085635A (ja) * | 2012-10-26 | 2014-05-12 | Tokyo Ohka Kogyo Co Ltd | ポジ型感光性樹脂組成物、ポリイミド樹脂パターンの形成方法、及びパターン化されたポリイミド樹脂膜 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4399949B2 (ja) * | 1999-06-29 | 2010-01-20 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターンの製造法及び電子部品 |
TWI407255B (zh) * | 2005-09-22 | 2013-09-01 | Hitachi Chem Dupont Microsys | 負片型感光性樹脂組成物、圖案形成方法以及電子零件 |
WO2008069812A1 (en) * | 2006-12-03 | 2008-06-12 | Central Glass Co., Ltd. | Photosensitive polybenzoxazines and methods of making the same |
KR101552371B1 (ko) * | 2008-03-31 | 2015-09-10 | 다이니폰 인사츠 가부시키가이샤 | 염기 발생제, 감광성 수지 조성물, 당해 감광성 수지 조성물을 포함하는 패턴 형성용 재료, 당해 감광성 수지 조성물을 사용한 패턴 형성 방법 및 물품 |
US8071273B2 (en) * | 2008-03-31 | 2011-12-06 | Dai Nippon Printing Co., Ltd. | Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition |
CN101508744B (zh) * | 2009-03-11 | 2011-04-06 | 常州强力电子新材料有限公司 | 咔唑肟酯类光引发剂 |
KR20120024723A (ko) * | 2009-06-30 | 2012-03-14 | 히다치 가세고교 가부시끼가이샤 | 감광성 접착제, 및 그것을 이용한 필름상 접착제, 접착 시트, 접착제 패턴, 접착제층 부착 반도체 웨이퍼 및 반도체 장치 |
US20120183751A1 (en) * | 2009-09-30 | 2012-07-19 | Dai Nippon Printing Co., Ltd. | Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same |
JP4818458B2 (ja) * | 2009-11-27 | 2011-11-16 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
US9410055B2 (en) | 2011-04-08 | 2016-08-09 | Mitsubishi Gas Chemical Company, Inc. | Polybenzoxazole resin and precursor thereof |
US9188871B2 (en) * | 2012-05-17 | 2015-11-17 | Taiyo Ink Mfg. Co., Ltd. | Pattern forming method, alkali-developable thermosetting resin composition, printed circuit board and manufacturing method thereof |
WO2014097594A1 (ja) * | 2012-12-21 | 2014-06-26 | 日立化成デュポンマイクロシステムズ株式会社 | ポリイミド前駆体樹脂組成物 |
-
2014
- 2014-06-27 JP JP2014133088A patent/JP6408802B2/ja active Active
-
2015
- 2015-06-11 WO PCT/JP2015/066935 patent/WO2015198887A1/ja active Application Filing
- 2015-06-11 US US15/317,015 patent/US20170115563A1/en not_active Abandoned
- 2015-06-11 CN CN201580033498.4A patent/CN106575080B/zh active Active
- 2015-06-11 KR KR1020177001342A patent/KR102417300B1/ko active IP Right Grant
- 2015-06-18 TW TW104119813A patent/TWI687480B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004077551A (ja) * | 2002-08-09 | 2004-03-11 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物並びにそれを用いたレリーフパターンおよび耐熱性塗膜の製造方法およびそれらを有する電子部品 |
JP2009282084A (ja) * | 2008-05-20 | 2009-12-03 | Asahi Kasei E-Materials Corp | アルカリ現像可能なネガ型感光性樹脂組成物 |
JP2010254946A (ja) * | 2008-09-30 | 2010-11-11 | Dainippon Printing Co Ltd | 感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、パターン形成方法、及び当該感光性樹脂組成物を用いた物品、並びに光潜在性樹脂硬化促進剤 |
WO2011067998A1 (ja) * | 2009-12-04 | 2011-06-09 | 東レ株式会社 | 感光性樹脂組成物、それを用いた積層体および固体撮像装置 |
JP2012203359A (ja) * | 2011-03-28 | 2012-10-22 | Hitachi Chemical Dupont Microsystems Ltd | ネガ型感光性樹脂組成物、パターン形成方法及び電子部品 |
WO2012172793A1 (ja) * | 2011-06-15 | 2012-12-20 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 |
JP2014085635A (ja) * | 2012-10-26 | 2014-05-12 | Tokyo Ohka Kogyo Co Ltd | ポジ型感光性樹脂組成物、ポリイミド樹脂パターンの形成方法、及びパターン化されたポリイミド樹脂膜 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110591094A (zh) * | 2018-06-13 | 2019-12-20 | 北京大学 | 基于2,5-二烯丙氧基对苯二胺单体的新型聚苯并噁唑高分子材料及其制备方法 |
CN110591094B (zh) * | 2018-06-13 | 2020-11-20 | 北京大学 | 基于2,5-二烯丙氧基对苯二胺单体的聚苯并噁唑高分子材料及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
KR102417300B1 (ko) | 2022-07-05 |
TW201612234A (en) | 2016-04-01 |
KR20170023964A (ko) | 2017-03-06 |
US20170115563A1 (en) | 2017-04-27 |
JP2016012019A (ja) | 2016-01-21 |
TWI687480B (zh) | 2020-03-11 |
CN106575080A (zh) | 2017-04-19 |
JP6408802B2 (ja) | 2018-10-17 |
CN106575080B (zh) | 2020-08-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107429059B (zh) | 能量敏感性树脂组合物 | |
KR102189432B1 (ko) | 수지 조성물 및 그 응용 | |
CN105579907B (zh) | 感放射线性组合物及图案制造方法 | |
CN104737074B (zh) | 正型感光性树脂组合物、和图案形成方法 | |
US9529258B2 (en) | Energy-sensitive resin composition | |
CN102893214B (zh) | 用于oled器件的光敏有机绝缘组合物 | |
JP6408802B2 (ja) | 感エネルギー性樹脂組成物 | |
KR20180127376A (ko) | 전자 디바이스용 기판 제조용 폴리하이드록시아마이드 조성물 및 폴리벤조옥사졸 수지 필름 | |
JP6168884B2 (ja) | ネガ型感光性樹脂組成物 | |
CN116574254A (zh) | 双马来酰亚胺化合物、含有该化合物的组合物、聚苯并噁唑、及半导体元件 | |
JP7367049B2 (ja) | パターン形成方法、感光性樹脂組成物、積層体の製造方法、及び、半導体デバイスの製造方法 | |
TW202248205A (zh) | 樹脂組成物、硬化物、積層體、硬化物的製造方法及半導體裝置、以及化合物 | |
WO2019189110A1 (ja) | 感光性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、および半導体デバイス | |
TW201516571A (zh) | 正型感光性樹脂組成物、由其製備的感光性樹脂膜及顯示裝置 | |
TW202311240A (zh) | 樹脂組成物、硬化物、積層體、硬化物之製造方法、積層體之製造方法、半導體元件之製造方法、及半導體元件、以及化合物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15811725 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 15317015 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20177001342 Country of ref document: KR Kind code of ref document: A |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 15811725 Country of ref document: EP Kind code of ref document: A1 |