WO2015139604A1 - 一种含硝基双肟酯类光引发剂及其制备方法和应用 - Google Patents

一种含硝基双肟酯类光引发剂及其制备方法和应用 Download PDF

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WO2015139604A1
WO2015139604A1 PCT/CN2015/074368 CN2015074368W WO2015139604A1 WO 2015139604 A1 WO2015139604 A1 WO 2015139604A1 CN 2015074368 W CN2015074368 W CN 2015074368W WO 2015139604 A1 WO2015139604 A1 WO 2015139604A1
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nitrobiguanide
nitro
linear
halogen
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PCT/CN2015/074368
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French (fr)
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钱晓春
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常州强力电子新材料股份有限公司
常州强力先端电子材料有限公司
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Priority to US15/116,356 priority Critical patent/US9630913B2/en
Priority to JP2016553290A priority patent/JP6301489B2/ja
Priority to KR1020167022359A priority patent/KR101798220B1/ko
Publication of WO2015139604A1 publication Critical patent/WO2015139604A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/91—Dibenzofurans; Hydrogenated dibenzofurans
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated

Definitions

  • the invention belongs to the technical field of photoinitiators, and in particular relates to a photoinitiator containing nitro biguanide and a preparation method and application thereof.
  • these existing oxime ester photoinitiators have significant limitations in the choice of suitable excitation source. They are usually activated by broad-spectrum ultraviolet (UV) illumination to function.
  • UV broad-spectrum ultraviolet
  • the light source for activating a photocuring system ie, emitting the above broad-spectrum ultraviolet light
  • the light source for activating a photocuring system is mainly a high-pressure mercury lamp whose emission spectrum is concentrated at 436 nm, 405 nm, 365 nm, 313 nm, and 302 nm, and most of the existing photoinitiators are The above short wavelength absorption is better.
  • such light sources have obvious disadvantages such as high energy consumption, long warm-up time, and no environmental protection. They are subject to more and more restrictions in application and are gradually being eliminated by the market.
  • UV-LED light source has the advantages of high light purity, low energy consumption, simple operation, environmental protection, etc. It has been widely used in the civilian field and is gradually known in the light curing industry. Compared with the UV mercury lamp system, UV-LED has great advantages in energy saving and emission reduction, improving production efficiency, and broadening the application range of photocuring technology. The UV-LED excitation mode is expected to become the next mainstream development direction of photocuring technology.
  • UV-LED source Due to the narrow luminescence spectrum of the UV-LED source itself, the application performance of the photo-initiator under its excitation is unsatisfactory. Therefore, research and development of photo-initiated light-matching with UV-LED source is excellent. The agent is especially important.
  • an object of the present invention to provide an oxime ester photoinitiator which exhibits excellent application properties under both a mercury lamp and a UV-LED lamp source. Designed to synthesize compounds containing nitro and diterpene ester structures through careful design and modification of chemical structures, which provide excellent performance in terms of storage stability, sensitivity, developability and pattern integrity, especially at single wavelengths. (eg 395 nm) UV-LED illumination exhibits significantly better photographic properties than existing photoinitiators.
  • X, Y independently of each other represents a carbonyl group (-CO-) or a single bond
  • Z is empty (ie, the left and right benzene rings are connected to each other only through A), a single bond or a C 1 -C 5 alkylene group;
  • A is an O, S or R 5 N- group, wherein R 5 represents hydrogen, a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 ring An alkylalkyl group or a C 4 -C 20 alkylcycloalkyl group;
  • R 1 represents hydrogen, halogen, nitro, hydroxy, carboxy, sulfonate, amino, cyano, alkoxy or, optionally, one or more selected from the group consisting of halogen, nitro, hydroxy, carboxy, sulfonic acid a C 1 -C 20 linear or branched alkyl group substituted with a group of a group, an amino group, a cyano group and an alkoxy group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group a C 4 -C 20 alkylcycloalkyl group;
  • R 2 and R 3 independently of each other represent hydrogen, a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, or a C 4 - An alkylcycloalkyl group of C 20 , a C 7 -C 20 aralkyl group, optionally, the hydrogen in the above group may be selected from the group consisting of halogen, nitro, hydroxy, carboxy, sulfonic acid, amino, cyano Substituted with alkoxy groups;
  • R 4 represents a C 1 -C 20 linear or branched alkyl group, a C 3 -C 20 cycloalkyl group, a C 4 -C 20 cycloalkylalkyl group, a C 4 -C 20 alkylcycloalkyl group a C 3 -C 20 heteroaryl group, a C 6 -C 20 aryl group, optionally, the hydrogen in the above group may be selected from the group consisting of halogen, phenyl, nitro, hydroxy, carboxyl, sulfonic acid groups, Substituents of amino, cyano and alkoxy groups are substituted.
  • Z is empty, single bond, methylene, ethylene or propylene
  • A is an O, S or R 5 N- group, wherein R 5 represents hydrogen, a C 1 -C 10 linear or branched alkyl group, a C 3 -C 15 cycloalkyl group, or a C 4 -C 15 Cycloalkylalkyl;
  • R 1 represents hydrogen, halogen, nitro, C 1 -C 15 straight or branched alkyl
  • R 2 and R 3 independently of each other represent hydrogen, a C 1 -C 15 linear or branched alkyl group, a C 3 -C 15 cycloalkyl group, a C 4 -C 15 cycloalkylalkyl group, or a C 4 - An alkylcycloalkyl group of C 15 , a C 7 -C 15 aralkyl group, optionally, a hydrogen in the above group may be substituted with a group selected from a halogen, a nitro group and an alkoxy group;
  • R 4 represents a C 1 -C 10 linear or branched alkyl group, a C 3 -C 10 cycloalkyl group, a C 4 -C 10 cycloalkylalkyl group, a C 4 -C 10 alkylcycloalkyl group C 3 -C 10 heteroaryl, C 6 -C 10 aryl.
  • the above nitrobiguanide-containing photoinitiator is selected from the following structures:
  • the present invention also relates to a method for preparing a nitrobiguanide-containing photoinitiator represented by the above formula (I): esterifying a compound containing a nitrobisindenyl structure with a corresponding acid anhydride or acid halide compound, The target product is obtained, and the specific reaction is as follows:
  • B represents a halogen such as F, Cl, Br or I.
  • the reaction raw materials are all known compounds in the prior art, and are commercially available or can be prepared by a known synthesis method.
  • a compound containing a nitrobisindenyl structure It can be synthesized by known techniques such as those disclosed in CN101565427B and CN102020727B.
  • the preparation method disclosed by the invention has simple process, no pollution waste, and high product purity, and is suitable for industrial production.
  • the present invention also relates to the use of the nitrobiguanide-containing photoinitiator represented by the above formula (I) in a photocurable composition (i.e., a photosensitive composition).
  • a photocurable composition i.e., a photosensitive composition
  • the photoinitiator can be applied to color resists (RGB), black photoresist (BM), photo-spacers, dry films, semiconductor photoresists, and inks.
  • the application properties of the photoinitiator of the formula (I) of the present invention were evaluated by formulating an exemplary photocurable composition, including storage stability, sensitivity, developability, and pattern integrity.
  • TMPTA Trimethylolpropane triacrylate
  • the photoinitiator is a nitrobiguanide-containing compound represented by the formula (I) of the present invention or a photoinitiator known in the prior art as a comparative example, each of which is a component.
  • a photoinitiator known in the prior art as a comparative example, each of which is a component.
  • the above-mentioned photocurable compositions A and B were respectively stirred in the light, and were taken up on a PET template, and coated with a wire bar, and dried at 90 ° C for 5 minutes to remove the solvent to form a film thickness of about 2 ⁇ m coating film.
  • the substrate on which the coating film was formed was cooled to room temperature, a mask was attached, and a long-wavelength radiation was realized by a FWHM filter using a high-pressure mercury lamp 1 PCS light source.
  • the coating film was exposed to ultraviolet light at a wavelength of 370 to 420 nm through a slit of a mask, and then immersed in a 2.5% sodium carbonate solution for 20 s at 25 ° C, washed with ultrapure water, air-dried, and hard baked at 220 ° C. Bake for 30 minutes to fix the pattern and evaluate the obtained pattern.
  • the above-mentioned photocurable compositions A and B were respectively stirred in the light, and were taken up on a PET template, and coated with a wire bar, and dried at 90 ° C for 5 minutes to remove the solvent to form a coating film having a film thickness of about 2 ⁇ m.
  • the substrate on which the coating film is formed is cooled to room temperature, and a mask is attached, which is irradiated with an LED point light source (Shenzhen Lanpu Rick Technology Co., Ltd. Model: UVEL-ET), through the slit of the mask at a wavelength of 395 nm.
  • an LED point light source Shenzhen Lanpu Rick Technology Co., Ltd. Model: UVEL-ET
  • the coating film was exposed, and then immersed in a 2.5% sodium carbonate solution at 25 ° C for 20 s, washed with ultrapure water, air-dried, and baked at 220 ° C for 30 min to fix the pattern, and the obtained pattern was evaluated.
  • the residual film rate after development in the light irradiation region in the exposure step is 90% or The minimum exposure amount above is evaluated as the exposure demand amount. The smaller the exposure demand, the higher the sensitivity.
  • the substrate pattern was observed with a scanning electron microscope (SEM) to evaluate developability and pattern integrity.
  • the developability was evaluated according to the following criteria:
  • Pattern integrity is evaluated according to the following criteria:
  • Comparative Compound 1 represents the photoinitiator 1- ⁇ 4-[4-(2-thienyl)phenylthio]phenyl ⁇ -(3-cyclopentyl)-propane disclosed in CN102492060A.
  • Comparative Compound 2 represents the photoinitiator 1-[6-(2-thienyl)-9-ethyloxazol-3-yl]-3-ring disclosed in CN103130919A pentyl-propane-1,2-dione-2-indole-O-acetate
  • comparative compound 3 represents the photoinitiator 1-(6-o-methylbenzoyl-9-ethylhydrazine) disclosed in CN101508744A Zyrid-3-yl)-(3-cyclopentylacetone)-1-indole-acetate
  • Comparative Compound 4 represents the photoinitiator 1-(4-phenylthio-phenyl)-octyl disclosed in CN1241562A 1,2-dione-2-indole-O-benzoate
  • comparative compound 5 represents CN1514845A
  • the photoinitiator disclosed herein is 1-(6-o-methylbenzoyl-9-ethyloxazol-3
  • the photocurable composition comprising the nitrobiguanide-containing photoinitiator represented by the general formula (I) of the present invention has excellent storage stability and is conventional. Under the conditions of high-pressure mercury lamp source, these photo-curing compositions (including colorless systems and pigment systems) exhibit excellent sensitivity, developability and pattern integrity under UV-LED light source conditions. .
  • the six existing photoinitiators used as contrasts are obviously insufficient, not only do not dominate under the excitation conditions of mercury lamps, but also hardly match the UV-LED source, so that polymerization cannot be initiated or the polymerization efficiency is particularly low.
  • the nitrobiguanide-containing photoinitiator represented by the general formula (I) of the present invention has a photosensitive property superior to that of the existing photoinitiator under single-wavelength UV-LED irradiation.
  • the nitrobiguanide-containing photoinitiator represented by the general formula (I) disclosed in the present invention has excellent application performance and has good compatibility with a UV-LED light source, and can not only greatly improve The performance of light curing products, and the promotion of UV-LED light source in the field of light curing is very good.

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Abstract

本发明公开了一种含硝基双肟酯类光引发剂，结构如通式（I）所示。该光引发剂在储存稳定性、感光度、显影性和图案完整性等方面应用性能优异，与单波长的UV-LED光源有很好的适配性，在UV-LED照射下表现出了明显优于现有光引发剂的感光性能。

Description

一种含硝基双肟酯类光引发剂及其制备方法和应用 技术领域
本发明属于光引发剂技术领域，特别涉及一种含硝基双肟酯类光引发剂及其制备方法和应用。
背景技术
具有咔唑、二苯硫醚等基团且连接有肟酯结构的化合物作为光引发剂的用途在本领域已被广泛知悉，设计和合成新型的、特别是具有更佳应用性能的肟酯类引发剂也一直是近年来光固化领域的热点。例如，公开号为CN1514845A、CN101508744A、CN101528694A等中国专利文献公开了多种肟酯类光引发剂，这些产品具有良好的感光性、储存稳定性等，在一定程度上满足和提高了光固化组合物的发展需求。
但是实践应用中发现，与传统的光引发剂类似，这些已有的肟酯类光引发剂在适用的激发光源的选择方面存在极大限制。它们通常要在宽谱紫外光(UV)照射下才能被激活从而发挥作用。当前，用于激活光固化体系(即，发射上述宽谱紫外光)的光源主要是高压汞灯，其发射光谱集中在436nm、405nm、365nm、313nm、302nm，现有的大多数光引发剂在上述短波长处吸收较好。但是，此类光源存在能耗大、预热时间长、不环保等明显缺点，在应用中受到了越来越多的限制，正逐渐被市场所淘汰。
UV-LED光源具有光纯度高、能耗低、操作简单、环保等优点，目前在民用领域已得到广泛应用，在光固化行业也逐渐为人所知。相比于UV汞灯体系，UV-LED在节能减排、提升生产效率、拓宽光固化技术应用范围等方面有着巨大优势。UV-LED激发模式非常有望成为光固化技术的下一个主流发展方向。
由于UV-LED光源本身发光光谱较窄，当前已有光引发剂在其激发下表现出的应用性能难以令人满意，因此，研究和开发与UV-LED光源相匹配的感光性能优异的光引发剂就显得尤为重要。
发明内容
针对现有光引发剂的不足，本发明的目的在于提供一种在汞灯和UV-LED灯光源下均表现出优异应用性能的肟酯类光引发剂。通过对化学结构的精心设计和修饰，设计合成出含有硝基和双肟酯结构的化合物，该产品在储存稳定性、感光度、显影性和图案完整性等方面性能优异，特别是在单波长(如395nm)的UV-LED照射下表现出了明显优于现有光引发剂的感光性能。
为了达到上述技术效果，本发明采用的技术方案如下：
一种含硝基双肟酯类光引发剂，其具有如通式(I)所示的结构：
Figure PCTCN2015074368-appb-000001
其中，
X、Y相互独立地代表羰基(-CO-)或单键；
Z为空(即，左右两个苯环仅通过A彼此相连)、单键或C1-C5的亚烷基；
A为O、S或R5N-基团，其中R5表示氢、C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基或C4-C20的烷基环烷基；
R1代表氢、卤素、硝基、羟基、羧基、磺酸基、氨基、氰基、烷氧基，或者是任选地被一个或多个选自卤素、硝基、羟基、羧基、磺酸基、氨基、氰基和烷氧基的基团取代的C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基；
R2、R3相互独立地表示氢、C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基、C7-C20的芳烷基，任选地，上述基团中的氢可以被选自卤素、硝基、羟基、羧基、磺酸基、氨基、氰基和烷氧基的基团取代；
R4代表C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基、C3-C20的杂芳基、C6-C20的芳基，任选地，上述基团中的氢可以被选自卤素、苯基、硝基、羟基、羧基、磺酸基、氨基、氰基和烷氧基的基团取代。
作为本发明的优选方案，上述通式(I)所示的含硝基双肟酯类光引发剂中：
Z为空、单键、亚甲基、亚乙基或亚丙基；
A为O、S或R5N-基团，其中R5表示氢、C1-C10的直链或支链烷基、C3-C15的环烷基、或C4-C15的环烷基烷基；
R1代表氢、卤素、硝基、C1-C15的直链或支链烷基；
R2、R3相互独立地表示氢、C1-C15的直链或支链烷基、C3-C15的环烷基、C4-C15的环烷基烷基、C4-C15的烷基环烷基、C7-C15的芳烷基，任选地，上述基团中的氢可以被选自卤素、硝基和烷氧基的基团取代；
R4代表C1-C10的直链或支链烷基、C3-C10的环烷基、C4-C10的环烷基烷基、C4-C10的烷基环烷基、C3-C10杂芳基、C6-C10芳基。
作为本发明的优选方案，上述含硝基双肟酯类光引发剂选自如下结构：
Figure PCTCN2015074368-appb-000002
Figure PCTCN2015074368-appb-000003
Figure PCTCN2015074368-appb-000004
Figure PCTCN2015074368-appb-000005
本发明还涉及上述通式(I)所示的含硝基双肟酯类光引发剂的制备方法：将含有硝基双肟基结构的化合物与相应的酸酐或酰卤化合物进行酯化反应，得目标产物，具体反应如下：
Figure PCTCN2015074368-appb-000006
式中，B代表卤素，如F、Cl、Br或I。
上述制备方法中，反应原料均是现有技术中的已知化合物，可商业购得或者通过已知的合成方法制备而成。其中，含有硝基双肟基结构的化合物
Figure PCTCN2015074368-appb-000007
可通过例如CN101565427B和CN102020727B中公开的已知技术合成。本发明公开的制备方法工艺简单，不产生污染性废弃物，且产品纯度高，适用于工业化生产。
本发明还涉及上述通式(I)所示的含硝基双肟酯类光引发剂在光固化组合物(即感光性组合物)中的应用。非限制性地，该光引发剂可应用在彩色光阻(RGB)、黑色光阻(BM)、空间障碍物(Photo-spacer)、干膜、半导体光刻胶及油墨等方面。
具体实施方式
以下将结合具体实施例对本发明作进一步说明，但不应将其理解为对本发明保护范围的限制。
制备实施例
实施例1：
1-硝基-3-(1-肟乙酸酯)丙基-6-(1-肟乙酸酯-3-环己基)丙基-9-乙基-咔唑的制备
Figure PCTCN2015074368-appb-000008
向250mL四口烧瓶中投入1-硝基-3-(1-酮肟)丙基-6-(1-酮肟-3-环己基)丙基-9-乙基-咔唑23.2g、100g二氯甲烷和5.1g三乙胺，室温下搅拌5min，然后滴加醋酐11.3g，约30min滴加完毕，继续室温搅拌2h，然后加入5％NaHCO3水溶液调pH值至中性，分液漏斗分出有机层，再用200mL水洗2遍，50g无水MgSO4干燥，旋转蒸出溶剂，得粘稠状液体，甲醇重结晶得到白色固体粉末，过滤，得产 品24.7g，收率90％，纯度99％。
产物结构通过核磁共振氢谱得到确认，具体表征结果如下：
1H-NMR(CDCl3，500MHz)：0.9015-1.0102(3H，t)，1.3918-1.4714(13H，m)，1.5073-1.5932(3H，t)，2.1022(6H，s)，2.5468-2.7029(4H,m)，3.8210-3.9421(2H，m)，7.0301-7.8127(3H，m)，8.4301-8.6127(2H，s)。
实施例2：
1，8-二硝基-3-(1，2-二酮-2-肟-O-苯甲酸酯-3-环丁基)丙基-6-(1,2-二酮-2-肟-O-苯甲酸酯)丙基-9-乙基-咔唑的制备
Figure PCTCN2015074368-appb-000009
向250ml四口烧瓶中投入1，8-二硝基-3-(1，2-二酮-2-肟-3-环丁基)丙基-6-(1,2-二酮-2-肟)丙基-9-乙基-咔唑24.8g、100g二氯甲烷和5.1g三乙胺，室温下搅拌5min，然后滴加苯甲酰氯14.3g，约30min滴加完毕，继续室温搅拌2h，然后加入5％NaHCO3水溶液调pH值至中性，分液漏斗分出有机层，再用200mL水洗2遍，50g无水MgSO4干燥，旋转蒸出溶剂，得粘稠状液体，甲醇重结晶得到白色固体粉末，过滤，得产品20.9g，收率87％，纯度99％。
产物结构通过核磁共振氢谱得到确认，具体表征结果如下：
1H-NMR(CDCl3，500MHz)：1.4908-1.5193(3H,t)， 1.9037-2.1823(7H,m)，2.5099-2.7629(5H，m)，3.90732-4.0231(2H,m)，7.4309-7.7098(6H,t)，8.1067-8.2319(4H,d)，8.3980-8.6678(4H,s)。
实施例3-15：
参照实施例1或2的方法，由相应的含硝基双肟基结构的化合物
Figure PCTCN2015074368-appb-000010
与酰卤化合物或酸酐制备实施例3-15所示的化合物3-15。
目标产物的结构及其1H-NMR数据列于表1：
表1
Figure PCTCN2015074368-appb-000011
Figure PCTCN2015074368-appb-000012
Figure PCTCN2015074368-appb-000013
性能评价
通过配制示例光固化组合物，对本发明式(Ⅰ)所示光引发剂的各项应用性能进行评价，包括储存稳定性、感光度、显影性和图案完整性等方面。
1.光固化组合物的配制
(1)未着色的光固化组合物A
丙烯酸酯共聚物                        100
(甲基丙烯酸卞酯/甲基丙烯酸/甲基丙烯酸羟乙酯(摩尔比为70/10/20)共聚物(Mw：10,000))
三羟甲基丙烷三丙烯酸酯(TMPTA)         100
光引发剂                              2
丁酮(溶剂)                            25
(2)着色的光固化组合物B
丙烯酸酯共聚物                        100
(甲基丙烯酸卞酯/甲基丙烯酸/甲基丙烯酸甲酯(摩尔比为50/15/30)共聚物(Mw：15,000))
Figure PCTCN2015074368-appb-000014
上述组合物A和B中，光引发剂为本发明的通式(Ⅰ)所示的含硝基双肟酯类化合物或作为对比的现有技术中已知的光引发剂，各组分均为质量份。
2.曝光显影
(1)汞灯光源下涂膜后曝光显影
将上述的光固化组合物A和B分别避光搅拌，取料于PET模板上，利用线棒涂膜，在90℃下干燥5min除去溶剂，形成膜厚度约 2μm的涂膜。将形成有涂膜的基板冷却至室温，附上掩膜板，用高压汞灯1PCS光源，通过FWHM滤光片实现长波长辐射。通过掩膜板的缝隙在370～420nm波长的紫外线对涂膜进行曝光，随后于25℃下在2.5％的碳酸钠溶液中浸渍20s显影，再用超纯水洗，风干，在220℃下硬烘烤30min使图形定影，对得到的图形进行评价。
(2)UV-LED光源下涂膜后曝光显影
将上述的光固化组合物A和B分别避光搅拌，取料于PET模板上，利用线棒涂膜，在90℃下干燥5min除去溶剂，形成膜厚度约2μm的涂膜。将形成有涂膜的基板冷却至室温，附上掩膜板，用LED点光源照射(深圳市蓝谱里克科技有限公司型号：UVEL-ET)，通过掩膜板的缝隙在395nm波长下对涂膜进行曝光，之后于25℃下在2.5％的碳酸钠溶液中浸渍20s显影，再用超纯水洗，风干，在220℃下硬烘烤30min使图形定影，对得到的图形进行评价。
3.光固化组合物的性能评价
(1)储存稳定性
将液态的光固化组合物在室温下自然储存1个月后，根据以下标准在视觉上评价物质的沉淀程度：
A：没有观察到沉淀；
B：略微观察到沉淀；
C：观察到明显沉淀。
(2)感光度
曝光时，将在曝光步骤中光辐照区域显影后残膜率在90％或以 上的最小曝光量评价为曝光需求量。曝光需求量越小表示灵敏度越高。
(3)显影性和图案完整性
用扫描电子显微镜(SEM)观察基板图案，以评价显影性和图案完整性。
显影性根据以下标准评价：
○：在未曝光部分未观察到残留物；
◎：在未曝光部分观察到少量残留物，但残留物可以接受；
●：在未曝光部分观察到明显残留物。
图案完整性根据以下标准评价：
◇：没有观察到图案缺陷；
□：观察到小部分图案有些许缺陷；
◆：明显观察到许多图案缺陷。
评价结果如表2-5中所示。
表2 光固化组合物A性能评价(汞灯光源照射条件下测定曝光需求量、显影性和图案完整性)
Figure PCTCN2015074368-appb-000015
Figure PCTCN2015074368-appb-000016
表3 光固化组合物A性能评价(LED光源照射)
Figure PCTCN2015074368-appb-000017
表4 光固化组合物B性能评价(汞灯光源照射条件下测定曝光需求量、显影性和图案完整性)
Figure PCTCN2015074368-appb-000018
Figure PCTCN2015074368-appb-000019
表5 光固化组合物B性能评价(LED光源照射)
Figure PCTCN2015074368-appb-000020
表2-5中，比较化合物1表示CN102492060A中公开的光引发剂1-{4-[4-(2-噻吩甲酰基)苯硫基]苯基}-(3-环戊基)-丙烷-1-酮肟-O-乙酸酯，比较化合物2表示CN103130919A中公开的光引发剂1-[6-(2-噻吩甲酰基)-9-乙基咔唑-3-基]-3-环戊基-丙烷-1，2-二酮-2-肟-O-乙酸酯，比较化合物3表示CN101508744A中公开的光引发剂1-(6-邻甲基苯甲酰基-9-乙基咔唑-3-基)-(3-环戊基丙酮)-1-肟-乙酸酯，比较化合物4表示CN1241562A中公开的光引发剂1-(4-苯硫基-苯基)-辛-1,2-二酮-2-肟-O-苯甲酸酯，比较化合物5表示CN1514845A 中公开的光引发剂1-(6-邻甲基苯甲酰基-9-乙基咔唑-3-基)-(3-乙酮)-1-肟乙酸酯，比较化合物6表示常用的光引发剂2-甲基-1-(4-甲硫基苯基)-2-吗啉基-丙烷-1-酮(俗称Irgacure907)。
由表2-5的结果可以看出，包含本发明通式(I)所示的含硝基双肟酯类光引发剂的光固化组合物具有很好的储存稳定性，并且无论是在常规的高压汞灯光源条件下，还是在UV-LED光源条件下，这些光固化组合物(包括无色体系和颜料体系)均表现出极佳的感光度、显影性及图案完整性，应用效果优异。而作为对比的六种现有光引发剂存在明显不足，不仅在汞灯激发条件下不占优势，而且几乎不能与UV-LED光源相匹配，从而不能引发聚合或引发聚合效率特别低。本发明的通式(I)所示的含硝基双肟酯类光引发剂在单波长的UV-LED照射下具有显著优于现有光引发剂的感光性能。
综上所述，本发明公开的通式(I)所示的含硝基双肟酯类光引发剂的应用性能优异，与UV-LED光源有很好的适配性，不仅可极大地提高光固化产品的性能，而且对UV-LED光源在光固化领域的推广应用有很好的推动作用。

Claims (9)

  1. 一种含硝基双肟酯类光引发剂，其具有如通式(I)所示的结构：
    Figure PCTCN2015074368-appb-100001
    其中，
    X、Y相互独立地代表羰基(-CO-)或单键；
    Z为空、单键或C1-C5的亚烷基；
    A为O、S或R5N-基团，其中R5表示氢、C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基或C4-C20的烷基环烷基；
    R1代表氢、卤素、硝基、羟基、羧基、磺酸基、氨基、氰基、烷氧基，或者是任选地被一个或多个选自卤素、硝基、羟基、羧基、磺酸基、氨基、氰基和烷氧基的基团取代的C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基；
    R2、R3相互独立地表示氢、C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基、C7-C20的芳烷基，任选地，上述基团中的氢可以被选自卤素、硝基、羟基、羧基、磺酸基、氨基、氰基和烷氧基的基团取代；
    R4代表C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基、C3-C20的杂芳基、C6-C20的芳基，任选地，上述基团中的氢可以被选自卤素、苯基、硝基、羟基、羧基、磺酸基、氨基、氰基和烷氧基的基团取代。
  2. 根据权利要求1所述的含硝基双肟酯类光引发剂，其特征在于：Z为空、单键、亚甲基、亚乙基或亚丙基。
  3. 根据权利要求1所述的含硝基双肟酯类光引发剂，其特征在于：A为O、S或R5N-基团，其中R5表示氢、C1-C10直链或支链烷基、C3-C15的环烷基或C4-C15的环烷基烷基。
  4. 根据权利要求1所述的含硝基双肟酯类光引发剂，其特征在于：R1代表氢、卤素、硝基、C1-C15的直链或支链烷基。
  5. 根据权利要求1所述的含硝基双肟酯类光引发剂，其特征在于：R2、R3相互独立地表示氢、C1-C15的直链或支链烷基、C3-C15的环烷基、C4-C15的环烷基烷基、C4-C15的烷基环烷基、C7-C15的芳烷基，任选地，上述基团中的氢可以被选自卤素、硝基和烷氧基的基团取代。
  6. 根据权利要求1所述的含硝基双肟酯类光引发剂，其特征在于：R4代表C1-C10的直链或支链烷基、C3-C10的环烷基、C4-C10的环烷基烷基、C4-C10的烷基环烷基、C3-C10的杂芳基或C6-C10的芳基。
  7. 根据权利要求1所述的含硝基双肟酯类光引发剂，其特征在于，所述含硝基双肟酯类光引发剂选自如下结构：
    Figure PCTCN2015074368-appb-100002
    Figure PCTCN2015074368-appb-100003
    Figure PCTCN2015074368-appb-100004
  8. 权利要求1所述的含硝基双肟酯类光引发剂的制备方法，包 括以下步骤：
    将含有硝基双肟基结构的化合物与相应的酸酐或酰卤化合物进行酯化反应，得目标产物，具体反应式如下：
    Figure PCTCN2015074368-appb-100005
    式中，B代表卤素。
  9. 权利要求1所述的含硝基双肟酯类光引发剂在光固化组合物中的应用。
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