WO2015076175A1 - フィラー及びガラス組成物、並びに六方晶リン酸塩系化合物の製造方法 - Google Patents
フィラー及びガラス組成物、並びに六方晶リン酸塩系化合物の製造方法 Download PDFInfo
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- WO2015076175A1 WO2015076175A1 PCT/JP2014/080057 JP2014080057W WO2015076175A1 WO 2015076175 A1 WO2015076175 A1 WO 2015076175A1 JP 2014080057 W JP2014080057 W JP 2014080057W WO 2015076175 A1 WO2015076175 A1 WO 2015076175A1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/16—Oxyacids of phosphorus; Salts thereof
- C01B25/26—Phosphates
- C01B25/37—Phosphates of heavy metals
- C01B25/372—Phosphates of heavy metals of titanium, vanadium, zirconium, niobium, hafnium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/16—Oxyacids of phosphorus; Salts thereof
- C01B25/26—Phosphates
- C01B25/45—Phosphates containing plural metal, or metal and ammonium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
- C03C14/006—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of microcrystallites, e.g. of optically or electrically active material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
- C03C3/142—Silica-free oxide glass compositions containing boron containing lead
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
- C03C3/145—Silica-free oxide glass compositions containing boron containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/21—Silica-free oxide glass compositions containing phosphorus containing titanium, zirconium, vanadium, tungsten or molybdenum
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/20—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing titanium compounds; containing zirconium compounds
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2205/00—Compositions applicable for the manufacture of vitreous enamels or glazes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/16—Microcrystallites, e.g. of optically or electrically active material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/20—Glass-ceramics matrix
Definitions
- the present invention relates to a filler, a glass composition, and a method for producing a hexagonal phosphate compound.
- the phosphate compounds include amorphous ones and crystalline ones having a two-dimensional layered structure or a three-dimensional network structure.
- crystalline phosphate compounds that take a three-dimensional network structure are excellent in heat resistance, chemical resistance, radiation resistance, and low thermal expansion, and are used for fixing radioactive waste, solid electrolytes, and gas adsorption. ⁇ Applications to separation agents, catalysts, antibacterial agent raw materials, low thermal expansion fillers, etc. are being studied.
- Patent Document 1 discloses a sealing made of a mixture of a low melting glass powder and a low thermal expansion material powder such as NaZr 2 (PO 4 ) 3 , CaZr 2 (PO 4 ) 3 , KZr 2 (PO 4 ) 3. Materials are disclosed, and Patent Document 2 discloses NbZr 2 (PO 4 ) 3 powder as a filler powder for lead-free glass, and Patent Document 3 discloses Zr 2 (WO 4 ) (PO 4 ) 2. A powder is disclosed.
- these zirconium phosphates are synthesized by a firing method (for example, Patent Document 2) in which raw materials are mixed in a dry process and then fired at 1,000 ° C. or higher using a firing furnace (for example, Patent Document 2),
- a firing method for example, Patent Document 2
- the present invention has been made in view of the above-mentioned problems, can suppress the thermal expansion of the glass composition with a small amount of addition, and is excellent in fluidity when the glass composition is melted, And it aims at providing the glass composition containing a filler.
- Another object of the present invention is to provide a production method capable of producing a hexagonal phosphate compound that can be suitably used as the filler by a simple and industrially advantageous method.
- the present inventors have found that the flowability at the time of melting is excellent when the ionic compound in the filler is a predetermined amount or less. .
- a specific hexagonal phosphate compound is produced using a layered zirconium phosphate, a compound containing potassium, and a compound containing zirconium, a hexagonal phosphate compound having a small particle size can be easily produced.
- the present invention has been completed. That is, the present invention is as follows.
- ⁇ 1> It is composed of a hexagonal phosphate compound represented by the following formula 1 having a purity of 90% or more, and the content of the ionic compound is 1.0% by weight or less, Filler, K a Zr b (PO 4 ) 3 (1)
- a is a positive number in the range of 0.8 to 1.2
- ⁇ 3> The filler according to ⁇ 1> or ⁇ 2>, wherein the volume-based median diameter measured by a laser diffraction particle size distribution analyzer is 0.05 to 10 ⁇ m
- ⁇ 4> The filler according to any one of ⁇ 1> to ⁇ 3>, wherein a volume-based maximum particle size measured by a laser diffraction particle size distribution analyzer is 50 ⁇ m or less
- ⁇ 5> A glass composition comprising the filler according to any one of ⁇ 1> to ⁇ 4>, ⁇ 6>
- a step of preparing a compound containing layered zirconium phosphate, a compound containing potassium, and a compound containing zirconium other than the layered zirconium phosphate, a step of firing the mixture, and a step of grinding after the firing step A process for producing a hexagonal phosphate compound represented by the following formula 1, K a Zr b (PO 4 ) 3 (1)
- Equation 1 a is a positive number in the range
- ⁇ 7> The method for producing a hexagonal phosphate compound according to ⁇ 6>, wherein the layered zirconium phosphate is a particle having a median diameter of 0.05 to 10 ⁇ m on a volume basis by a laser diffraction particle size distribution analyzer.
- ⁇ 8> The compounding amount of the compound containing potassium with respect to 1 mol of the layered zirconium phosphate is 0.8 to 1.2 times mol of the theoretical amount of the hexagonal phosphate compound to be produced.
- ⁇ 6> Or a method for producing a hexagonal phosphate compound according to ⁇ 7>, ⁇ 9> The method for producing a hexagonal phosphate compound according to any one of ⁇ 6> to ⁇ 8>, wherein the firing temperature is 650 to 1,500 ° C.
- the filler according to the present invention comprises a hexagonal phosphate compound represented by the formula 1 having a purity of not less than a predetermined value, and the content of ionic impurities is 1.0% by weight or less.
- the thermal expansion of the glass composition can be suppressed, and excellent low thermal expansion performance is exhibited.
- the glass composition containing the said filler is excellent in the fluidity
- the filler of the present invention is characterized in that there are very few ionic compounds that adversely affect the fluidity of the glass composition, and has not been realized as a low thermal expansion filler.
- a filler is obtained through a step of mixing, firing and pulverizing, using raw materials of layered zirconium phosphate, a compound containing potassium, and a compound containing zirconium as raw materials.
- the glass composition using the filler of the present invention can correspond to a fine shape and exhibits excellent low thermal expansion performance.
- the filler of the present invention is also referred to as “the low thermal expansion filler of the present invention”.
- the filler of the present invention is composed of a hexagonal phosphate compound represented by the following formula 1 having a purity of 90% or more, and the content of the ionic compound is 1.0% by weight or less. It is characterized by being.
- K a Zr b (PO 4 ) 3 (1)
- a is a positive number in the range of 0.8 to 1.2
- a is more preferably from 0.9 to 1.1, and still more preferably from 0.92 to 1.05.
- the filler exhibits excellent low thermal expansion.
- the composition containing the filler of the present invention has a low coefficient of thermal expansion, it is mainly used as a sealing material for electronic parts such as cathode ray tubes, plasma display panels (PDP), fluorescent display tubes, organic EL, and IC ceramic packages. Can do. Moreover, it can be used for thermal expansion suppression of IC sealing resin and resin adhesive.
- the filler of the present invention comprises a high-purity hexagonal phosphate salt compound represented by Formula 1 having a purity of 90% by weight or more. Since the crystal purity and chemical purity are high and it is uniformly crystallized, when it is heated and melted with glass, there is little alteration due to erosion of the glass, and thermal expansion can be controlled efficiently.
- the purity of the hexagonal phosphate compound represented by Formula 1 is determined as the product of the crystal purity and the chemical purity.
- the purity of the hexagonal phosphate compound represented by Formula 1 needs to be 90% by weight or more.
- the purity is preferably 93% by weight or more. Needless to say, the upper limit of purity is 100% by weight.
- the crystal purity of the hexagonal phosphate compound as a filler is due to powder X-ray diffraction, comparison of the intensity of the main peak with the standard X-ray diffraction pattern, and other crystal components other than the hexagonal phosphate compound. This is possible by checking the presence or absence of impurity peaks.
- Chemical purity can also be analyzed by non-destructive analysis such as fluorescent X-rays, or crystals can be dissolved with strong acid containing oxidant or hydrofluoric acid, and inductively coupled plasma (ICP) emission spectrometry It is also possible to measure the absolute contents of metals and phosphorus components contained in the water, and to measure moisture such as crystal water and adhering water by thermal analysis such as differential thermal and thermogravimetric simultaneous measurement (TG-DTA). Can do.
- non-destructive analysis such as fluorescent X-rays
- crystals can be dissolved with strong acid containing oxidant or hydrofluoric acid, and inductively coupled plasma (ICP) emission spectrometry
- ICP inductively coupled plasma
- the main peak intensity of the desired hexagonal phosphate compound is preferably 90% or more, more preferably 95% or more (peak intensity is proportional to weight%).
- the desired hexagonal phosphate compound is preferably 90% by weight or more, more preferably 95% by weight or more, based on the solid content.
- the content of the ionic compound in the filler needs to be 1.0% by weight or less.
- the content is preferably 0.6% by weight or less, and more preferably 0.3% by weight or less.
- the ionic compound means an ionic compound that elutes when the filler is immersed in hot water, and specifically, is an ionic compound derived from raw materials such as potassium ion, zirconium ion, and phosphate ion. .
- These ionic compounds can be quantified by ICP emission analysis. A detailed analysis method will be described later.
- the content of the ionic compound in the filler can be adjusted by a blending ratio of the raw material layered zirconium phosphate, a compound containing potassium, and a compound containing zirconium other than the layered zirconium phosphate.
- the mechanism by which the content of the ionic compound decreases the fluidity of the glass composition is estimated as follows.
- the ionic compound is detached from the filler and reacts with the glass component to change the glass composition.
- the softening point increases and partial crystallization occurs, and the fluidity of the glass composition decreases.
- the particle diameter of the filler in the present invention can be defined by a laser diffraction particle size distribution meter, measured in a state dispersed in deionized water, and the median diameter analyzed on a volume basis is used as a representative value of the particle diameter. Can do.
- the median diameter is preferably 0.05 to 10 ⁇ m, more preferably 0.1 to 5 ⁇ m, and still more preferably 0.5 to 3 ⁇ m.
- the median diameter is 0.05 ⁇ m or more, the viscosity of the composition is suppressed from becoming too high, and the handling is easy.
- it when it is 10 ⁇ m or less, it can also be suitably used for applications in which fine gaps such as semiconductor elements are filled.
- the maximum particle diameter of the filler is preferably 50 ⁇ m or less, more preferably 20 ⁇ m or less, and more preferably 10 ⁇ m. More preferably, it is as follows.
- the lower limit is preferably 0.05 ⁇ m or more.
- the usage form of the filler of the present invention is not particularly limited, and can be appropriately mixed with other components or combined with other materials depending on the application.
- it can be used in various forms such as powder, powder-containing dispersion, powder-containing particles, powder-containing paint, powder-containing fiber, powder-containing plastic, and powder-containing film. It can be used as appropriate.
- the filler of the present invention can be mixed with other fillers as necessary in order to adjust processability and thermal expansion.
- low thermal expansion filler cordierite zirconium phosphotungstate, zirconium tungstate, ⁇ -spodumene, ⁇ -eucryptite, lead titanate, aluminum titanate, mullite, zircon, silica, celsian, willemite, and Alumina etc. are mentioned.
- the filler of the present invention is not particularly limited in its production method, but hexagonal phosphorus produced by the method for producing a hexagonal phosphate-based compound of the present invention.
- An acid salt compound is preferred.
- the method for producing a hexagonal phosphate-based compound of the present invention comprises a step of preparing a mixture by preparing a layered zirconium phosphate, a compound containing potassium, and a compound containing zirconium other than the layered zirconium phosphate (hereinafter referred to as “preparation step”).
- a step of firing the mixture (hereinafter referred to as “baking step”) and a step of grinding after the firing step (hereinafter referred to as “grinding step”).
- the hexagonal phosphate compound obtained by this production method can be used as a filler for a composition such as glass or resin, the coefficient of thermal expansion of the cured product can be lowered. It can be applied to sealing materials for electronic parts such as PDP), fluorescent display tubes, organic EL, and IC ceramic packages. Moreover, it can be used for thermal expansion suppression of IC sealing resin and resin adhesive.
- the raw materials used for the production of the hexagonal phosphate compound of the present invention are layered zirconium phosphate, a compound containing potassium, and a compound containing zirconium other than the layered zirconium phosphate.
- the layered zirconium phosphate as the main raw material is a layered crystal having a two-dimensional layered space, and depending on the type of phosphate group and crystal water constituting the ⁇ -type crystal, ⁇ -type crystal containing its anhydride, and ⁇ -type There are crystals, etc., which are known as ion exchangers.
- layered zirconium phosphate used as a raw material, an ⁇ -type crystal and a ⁇ -type crystal are preferable, and an ⁇ -type crystal is more preferable because a fine filler is easily obtained. Specifically, it is the following compound.
- ⁇ -layered zirconium phosphate Zr (HPO 4 ) 2 .H 2 O
- ⁇ -layered zirconium phosphate Zr (H 2 PO 4 ) (PO 4 ) ⁇ 2H 2 O
- the particle diameter of the layered zirconium phosphate affects the particle diameter of the obtained hexagonal phosphate compound, it is preferable to select the particle diameter of the layered zirconium phosphate used in accordance with the particle diameter to be obtained.
- the particle diameter of layered zirconium phosphate used as a raw material can be measured with a laser diffraction particle size distribution meter, measured in a state dispersed in deionized water, and the median diameter analyzed on a volume basis is a representative value of the particle diameter.
- the hexagonal phosphate compound obtained by the production method of the present invention is used as a filler component of a composition such as glass or resin, the composition is used for filling or molding corresponding to fine shapes and gaps.
- the median diameter is preferably small. However, if the median diameter is too small, the specific surface area may increase and the fluidity may decrease. Since the median diameter preferable as the filler is as described above, the median diameter of the layered zirconium phosphate used as the raw material is preferably 0.05 to 10 ⁇ m, more preferably 0.1 to 5 ⁇ m, and More preferably, it is 5 to 3 ⁇ m. Further, if the median diameter of the layered zirconium phosphate is in the range of 0.05 to 10 ⁇ m, it can be easily pulverized in the pulverization step described later.
- Other raw materials used for the production of hexagonal phosphate compounds include compounds containing potassium and compounds containing zirconium other than the above layered zirconium phosphate. These compounds are raw materials for adjusting the amount of potassium and zirconium in the hexagonal phosphate compound.
- Examples of the compound containing potassium include KOH, K 2 (CO 3 ), KH (CO 3 ), KCl, KNO 3 , and K 2 SO 4 .
- KOH, K 2 (CO 3 ), and KH (CO 3 ) are preferable from the viewpoint of easy reaction.
- the compound containing these potassium may be used individually by 1 type, and may use 2 or more types together.
- Examples of the compound containing zirconium other than layered zirconium phosphate include Zr (OH) 2 , ZrO 2 , Zr 2 (CO 3 ) (OH) 2 O 2 , ZrOCl 2 .8H 2 O, and Zr (SO 4 ) 2 ⁇ 4H 2 O and the like.
- Zr (OH) 2 and Zr 2 (CO 3 ) (OH) 2 O 2 are preferable from the viewpoint of easy reaction.
- These zirconium-containing compounds may be used alone or in combination of two or more.
- composition ratio of raw materials when synthesizing a hexagonal phosphate compound by the production method of the present invention is based on the theoretical composition of the hexagonal phosphate compound to be synthesized (composition ratio that matches the composition formula). , It doesn't have to be exactly the same. For example, for a compound containing potassium, crystallization is likely to occur at a low temperature during firing by adding a slight excess of the formula amount of the hexagonal phosphate compound to be synthesized, and other than layered zirconium phosphate About the compound containing zirconium, it is preferable to add a slight excess of the formula amount of the hexagonal phosphate to be synthesized because pyrophosphate which is likely to be generated as a by-product becomes difficult to precipitate.
- a preferable blending amount of the compound containing potassium with respect to 1 mol of layered zirconium phosphate as a raw material is 0.8 to 1.2 times mol of the theoretical amount calculated from the formula amount of the hexagonal phosphate compound to be synthesized. More preferably, it is 0.9 to 1.1 times mol, and still more preferably 0.95 to 1.05 times mol.
- the preferable blending amount of the compound containing zirconium other than the layered zirconium phosphate with respect to 1 mol of the layered zirconium phosphate as the raw material is a theoretical amount of 0. 0 calculated from the formula amount of the hexagonal phosphate compound to be synthesized. The amount is 3 to 1.7 times mol, more preferably 0.5 to 1.5 times mol, and still more preferably 0.8 to 1.2 times mol.
- the raw material mixing method in the preparation step is not particularly limited as long as it can be uniformly mixed, and either a dry method or a wet method can be selected.
- the mixing apparatus include a Laedige mixer, a Henschel mixer, a V-type mixer and the like for dry mixing, and a kneader, a cement mixer, and a three roll for wet mixing.
- the firing temperature in the firing step depends on the raw material composition, it needs to be not less than the temperature at which the layered zirconium phosphate is transferred to the hexagonal phosphate, and is preferably not less than 650 ° C. More preferably, it is 700 degreeC or more, More preferably, it is 750 degreeC or more. Moreover, since a particle diameter will enlarge when a calcination temperature is too high, 1500 degrees C or less is preferable. More preferably, it is 1,450 degrees C or less, More preferably, it is 1,400 degrees C or less.
- the firing time depends on the amount of raw material input and the ability of the firing furnace, but if it is too short, the quality of the filler will not be stable, and if it is too long, the productivity will be poor.
- the firing apparatus is not particularly limited as long as the mixture of raw materials can be heated at a predetermined temperature, and a method of putting the mixture of raw materials into a mortar and firing it in an electric furnace or a gas furnace, or flowing the mixture of raw materials in a rotary kiln Any method can be used such as firing.
- the pulverization step is not particularly limited as long as it is a method capable of pulverizing the fired product into primary particles, but a dry jet mill or a wet jet mill is preferable because primary particles having a narrow particle size distribution range can be easily obtained.
- the fired product may be roughly crushed with a ball mill or a pin mill before the jet mill.
- the glass composition of the present invention is a glass composition containing the filler of the present invention, and is composed of a blend of glass, more preferably a low-melting glass that is sealing glass and the filler of the present invention. It is preferable to become. Since the low-melting glass has a higher thermal expansibility than the glass to be sealed, it is generally performed to adjust the thermal expansibility by adding a low thermal expansive filler.
- a conventionally well-known composition can be used for the main component of low melting glass powder. Examples of the glass composition include the following, but a lead-free glass composition is preferable in consideration of the influence on the environment.
- the blending ratio of the filler is preferably 5% by volume or more, more preferably 10% by volume or more because the effect tends to appear when the filler content is large. Moreover, since there exists a tendency for the fluidity
- the glass composition for sealing is often used as a paste composition by mixing with a vehicle.
- the vehicle is preferably composed of 0.5 to 2% by weight of nitrocellulose as a solute and 98 to 99.5% by weight of isoamyl acetate or butyl acetate as a solvent.
- any known method can be adopted as a method of blending the filler of the present invention into the sealing glass.
- a method of directly mixing glass powder and low thermal expansion filler with a mixer a method of adding low thermal expansion filler together when pulverizing bulk glass, and simultaneously performing pulverization and mixing, and paste materials such as vehicles
- a method of adding and mixing glass powder and a low thermal expansion filler separately is a known method.
- the thermal expansion coefficient of the glass composition of the present invention can be measured using a thermomechanical analyzer.
- the coefficient of thermal expansion is preferably 1 ⁇ 10 ⁇ 7 to 150 ⁇ 10 ⁇ 7 (/ K), although depending on the type of low-melting glass to be used, 1 ⁇ 10 ⁇ 7 to 120 ⁇ 10 ⁇ 7 ( / K) is more preferable. If the thermal expansion coefficient is 1 ⁇ 10 ⁇ 7 to 120 ⁇ 10 ⁇ 7 (/ K), it can be effectively used as a sealing glass.
- the filler of the present invention can be used to seal electronic components such as high-reliability packages equipped with elements such as cathode ray tubes, plasma display panels, fluorescent display tubes, organic EL, FED, semiconductor integrated circuits, crystal resonators, SAW filters, etc. It can be effectively used for sealing glass as a bonding material. It is often used as a paste composition by mixing a glass composition containing the filler of the present invention and a sealing glass and a vehicle.
- the purity of the filler in the present invention is a value obtained by multiplying the crystal purity and the chemical purity.
- the chemical purity was determined from the calculated composition formula by measuring the contents of the metal and phosphorus components contained in the filler by fluorescent X-ray analysis. For those containing crystal water, TG-DTA analysis was performed to determine the water content, and the content was determined from the calculated composition formula.
- O Powder X-ray diffraction The crystal system of the hexagonal phosphate compound obtained by the production method of the present invention can be confirmed by powder X-ray diffraction analysis. The powder X-ray diffraction analysis can be performed, for example, in accordance with JIS K 0131 (established in 1996).
- the applied voltage to the X-ray tube using a Cu target is 40 kv
- the current value is 150 mA
- Thermal expansion coefficient of glass composition The surface of the glass lump produced by the above-described evaluation of fluidity is smoothed, and the thermal expansion at 30 to 300 ° C. is performed by a thermomechanical measuring device (model name “TMA2940” manufactured by TA Instruments). The coefficient was measured.
- the lead-free glass powder had a thermal expansion coefficient of 160 ⁇ 10 ⁇ 7 / K.
- Example 2 ⁇ -layered zirconium phosphate (Zr (HPO 4 ) 2 .H 2 O) having a median diameter of 2 ⁇ m, manufactured by Toagosei Co., Ltd., trade name “NS-10TZ” 1,506 g, zirconium oxyhydroxide (ZrO (OH)) 2 ⁇ H 2 O) 260 g (1.0 times the molar amount of theoretical amount), 335 g of potassium bicarbonate (1.0 molar amount of theoretical amount), and 750 g of pure water were mixed in a 20 L Henschel mixer for 5 minutes. . The mixture was dried at 250 ° C. for 15 hours. Next, the dried mixture was heated to 1,250 ° C.
- Example 3 ⁇ -layered zirconium phosphate (Zr (HPO 4 ) 2 .H 2 O) having a median diameter of 2 ⁇ m, manufactured by Toagosei Co., Ltd., trade name “NS-10TZ” 1,506 g, zirconium oxyhydroxide (ZrO (OH)) 2 ⁇ H 2 O) 246g (1.0 times mole of the theoretical amount) and 938g of 20wt% potassium hydroxide aqueous solution (1.0 times mole of the theoretical amount) were mixed for 5 minutes with a 20L Henschel mixer. did. The mixture was dried at 250 ° C. for 15 hours. Next, the dried mixture was heated to 1,250 ° C.
- Example 4 ⁇ -layered zirconium phosphate (Zr (HPO 4 ) 2 .H 2 O) having a median diameter of 2 ⁇ m, manufactured by Toagosei Co., Ltd., trade name “NS-10TZ” 1,506 g, zirconium oxyhydroxide (ZrO (OH)) 2 ⁇ H 2 O) (123 g, 0.5 times mol of the theoretical amount) and 231 g of potassium carbonate (1.1 times mol of the theoretical amount) were mixed in a 20 L Henschel mixer for 5 minutes. The mixture was heated to 1,250 ° C. in a firing furnace for 6 hours and then fired at 1,250 ° C. for 6 hours. Next, the mass after firing was roughly crushed with a ball mill, and further pulverized into primary particles with a dry jet mill to obtain hexagonal phosphate-based compound D. This hexagonal phosphate compound was evaluated in the same manner as in Example 1.
- the glass composition containing the filler has excellent low thermal expansibility and fluidity. High nature.
- the fillers of Comparative Examples 1 to 5 have an ionic compound content outside the range of the present invention, the flowability of the glass composition is low.
- the manufacturing method of the hexagonal phosphate compound of the present invention can lower the firing temperature than the firing method shown in Comparative Example 4, and it was easy to make the median diameter 10 ⁇ m or less.
- the filler of the present invention is excellent in thermal expansion control when applied to lead-free glass and the like, and is excellent in fluidity when glass is melted. Therefore, it is mainly a cathode ray tube, PDP, fluorescent display tube, organic EL, IC ceramic package, etc. It can be used as a sealing agent composition for electronic parts.
- the method for producing a hexagonal phosphate compound of the present invention is excellent in productivity and processability, and a hexagonal phosphate compound having a controlled particle size can be obtained.
- Crystalline phosphate can be used as a filler for sealing glass for electronic parts such as cathode ray tubes, PDPs, fluorescent display tubes, organic EL, and IC ceramic packages.
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Abstract
Description
また、本発明の他の目的は、上記フィラーとして好適に用いることができる六方晶リン酸塩系化合物を、簡便で工業的に有利な方法で造ることができる製造方法を提供することである。
すなわち、本発明は次のとおりである。
<1> 純度が90%以上である下記式1で表される六方晶リン酸塩系化合物からなり、かつ、イオン性化合物の含有量が1.0重量%以下であることを特徴とする、フィラー、
KaZrb(PO4)3 (1)
式1中、aは0.8~1.2の正数であり、bはa+4b=9を満たす正数である。
<2> 上記イオン性化合物が、カリウムイオン、ジルコニウムイオン及びリン酸イオンである、<1>に記載のフィラー、
<3> レーザー回折式粒度分布計による体積基準のメジアン径が、0.05~10μmである、<1>又は<2>に記載のフィラー、
<4> レーザー回折式粒度分布計による体積基準の最大粒径が、50μm以下である、<1>~<3>のいずれか1つに記載のフィラー、
<5> <1>~<4>のいずれか1つに記載のフィラーを含有することを特徴とする、ガラス組成物、
<6> 層状リン酸ジルコニウム、カリウムを含む化合物、及び上記層状リン酸ジルコニウム以外のジルコニウムを含む化合物を調合し混合物を得る工程、上記混合物を焼成する工程、並びに、上記焼成工程後に粉砕する工程を含むことを特徴とする下記式1で表される六方晶リン酸塩系化合物の製造方法、
KaZrb(PO4)3 (1)
式1中、aは0.8~1.2の正数であり、bはa+4b=9を満たす正数である。
<7> 上記層状リン酸ジルコニウムが、レーザー回折式粒度分布計による体積基準で0.05~10μmのメジアン径を有する粒子である、<6>に記載の六方晶リン酸塩系化合物の製造方法、
<8> 上記層状リン酸ジルコニウム1モルに対する上記カリウムを含む化合物の配合量が、製造する六方晶リン酸塩系化合物の理論量の0.8~1.2倍量モルである、<6>又は<7>に記載の六方晶リン酸塩系化合物の製造方法、
<9> 焼成温度が、650~1,500℃である、<6>~<8>のいずれか1つに記載の六方晶リン酸塩系化合物の製造方法。
本発明の六方晶リン酸塩系化合物の製造方法は、高純度で、かつ、小粒径の六方晶リン酸塩系化合物を得ることができる。
また、数値範囲を表す「~」の記載は、その前後の数値を含む数値範囲を意味する。
本発明のフィラーは、ガラス組成物の流動性に悪影響を与えるイオン性化合物が極めて少ない点に特徴があり、低熱膨張性フィラーとして従来実現されていなかったものである。このようなフィラーは、原料として、層状リン酸ジルコニウム、カリウムを含む化合物、及びジルコニウムを含む化合物を使用し、混合、焼成及び粉砕する工程を経て得られるものである。本発明のフィラーを用いたガラス組成物は、微細な形状に対応することができ、優れた低熱膨張性能を示す。また、以下、本発明のフィラーを、「本発明の低熱膨張性フィラー」ともいう。
本発明のフィラーは、純度が90%以上である下記式1で表される六方晶リン酸塩系化合物からなり、かつ、イオン性化合物の含有量が1.0重量%以下であることを特徴とする。
KaZrb(PO4)3 (1)
式1中、aは0.8~1.2の正数であり、bはa+4b=9を満たす正数である。aは0.9~1.1であることがより好ましく、0.92~1.05であることが更に好ましい。aが0.8~1.2の正数であれば、フィラーは優れた低熱膨張性を示す。
本発明のフィラーを含む組成物は熱膨張率が低いので、主にブラウン管、プラズマディスプレイパネル(PDP)、蛍光表示管、有機EL、及びICセラミックパッケージ等の電子部品の封着材料に使用することができる。また、IC封止樹脂や樹脂接着剤の熱膨張抑制に使用することができる。
本発明において、式1で表される六方晶リン酸塩系化合物の純度は、結晶的純度と化学的純度との積として求められる。式1で表される六方晶リン酸塩系化合物の純度は、90重量%以上であることが必要である。当該純度は、93重量%以上であることが好ましい。なお、純度の上限は、100重量%であることは言うまでもない。
フィラー中のイオン性化合物の含有量は、原料である層状リン酸ジルコニウムと、カリウムを含む化合物及び上記層状リン酸ジルコニウム以外のジルコニウムを含む化合物との配合比等で調製することができる。
また、各種製品への加工性を考慮すればメジアン径のみでなく、最大粒径も重要であり、フィラーの最大粒径は50μm以下であることが好ましく、20μm以下であることがより好ましく、10μm以下であることが更に好ましい。下限値は、0.05μm以上であることが好ましい。
本発明のフィラーは、その製造方法には特に制限はないが、本発明の六方晶リン酸塩系化合物の製造方法により製造された六方晶リン酸塩系化合物であることが好ましい。
本発明の六方晶リン酸塩系化合物の製造方法は、層状リン酸ジルコニウム、カリウムを含む化合物、及び上記層状リン酸ジルコニウム以外のジルコニウムを含む化合物を調合し混合物を得る工程(以下、「調合工程」という)、上記混合物を焼成する工程(以下、「焼成工程」という)、並びに、上記焼成工程後に粉砕する工程(以下、「粉砕工程」という)を含むことを特徴とする。
本製造方法で得られる六方晶リン酸塩系化合物は、ガラスや樹脂等の組成物のフィラーとして用いることにより、硬化物の熱膨張率を下げることができるので、主にブラウン管、プラズマディスプレイパネル(PDP)、蛍光表示管、有機EL、及びICセラミックパッケージ等の電子部品の封着材料に応用できるものである。また、IC封止樹脂や樹脂接着剤の熱膨張抑制に使用することができる。
主原料である層状リン酸ジルコニウムは、2次元の層状空間を有する層状結晶であり、構成するリン酸基と結晶水の種類によって、α型結晶、その無水物を含むβ型結晶、及びγ型結晶等があり、イオン交換体として知られている。これらの結晶系の違いによって層間の距離が異なるため、イオン交換しやすい陽イオンの種類に選択性があることなどが研究されてきたが、これらの層状リン酸ジルコニウムを原料にして六方晶リン酸塩系化合物を製造したときに低熱膨張性に特徴あるものが得られることは、今まで知られていなかった。
α層状リン酸ジルコニウム:Zr(HPO4)2・H2O
γ層状リン酸ジルコニウム:Zr(H2PO4)(PO4)・2H2O
同様に、原料の層状リン酸ジルコニウム1モルに対する層状リン酸ジルコニウム以外のジルコニウムを含む化合物の好ましい配合量については、合成する六方晶リン酸塩系化合物の式量から算出される理論量の0.3~1.7倍量モルであり、より好ましくは0.5~1.5倍量モル、更に好ましくは0.8~1.2倍量モルである。
焼成時間は、原料投入量や焼成炉の能力にもよるが、短すぎるとフィラーの品質が安定せず、長すぎると生産性が悪いため、30分以上24時間以下が好ましい。
焼成装置は、原料の混合物を所定の温度で加熱できるものであれば特に限定されず、匣鉢に原料の混合物を入れて電気炉やガス炉で焼成する方法や、ロータリーキルンで原料の混合物を流動させながら焼成する方法などいずれでも用いることができる。
本発明のガラス組成物は、本発明のフィラーを含有するガラス組成物であり、ガラス、より好ましくは封着用ガラスである低融点ガラスと本発明のフィラーとの配合物からなることが好ましい。上記低融点ガラスは、封着対象となるガラス等よりも熱膨張性が大きいことから、一般に低熱膨張性のフィラーを添加して熱膨張性を調整することが行われている。低融点ガラス粉の主成分は、従来公知の組成が使用できる。ガラス組成としては、次のものが例示されるが、環境への影響を考慮すると無鉛のガラス組成が好ましい。
・Bi2O3(50~85重量%)-ZnO(10~25重量%)-Al2O3(0.1~5重量%)-B2O3(2~20重量%)-MO(0.2~20重量%、Mはアルカリ土類金属である。)
・SnO(30~70重量%)-ZnO(0~20重量%)-Al2O3(0~10重量%)-B2O3(0~30重量%)-P2O5(5~45重量%)
・PbO(70~85重量%)-ZnO(7~12重量%)-SiO2(0.5~3重量%)-B2O3(7~10重量%)-BaO(0~3重量%)
・V2O5(28~56重量%)-ZnO(0~40重量%)-P2O5(20~40重量%)-BaO(7~42重量%)
・P2O5(20~60重量%)-Al2O3(5~40重量%)-M2O(5~40重量%、Mはアルカリ金属である。)
・P2O5(20~60重量%)-ZnO(5~40重量%)-BaO(5~40重量%)-Al2O3(1~10重量%)
(1)フィラーの純度
本発明におけるフィラーの純度は、結晶的純度と化学的純度とを乗じた値である。結晶的純度は、粉末X線回折によって六方晶結晶相の生成を確認し、不純物とのピーク強度の比により決定した。具体的には、六方晶結晶相の主要ピーク(2θ=20.3°)の強度と、不純物の主要ピーク(2θ=9.8°、21.5°及び/又は28.3°)の強度の和に対する六方晶結晶相の主要ピークの強度の割合を結晶的純度とした。また、化学的純度は、蛍光X線分析によりフィラーに含まれる金属とリン成分の含有量を測定し、算出した組成式より決定した。結晶水を含むものについてはTG-DTA分析を行って含有水分量を測定し、算出した組成式より決定した。
○粉末X線回折
本発明の製造方法によって得られる六方晶リン酸塩系化合物の結晶系は、粉末X線回折分析によって確認することができる。粉末X線回折分析は、例えばJIS K 0131(1996年制定)の規定に従って行うことができる。JISの規定にはX線管球の印加電圧の定めはないが、今回はCuターゲットを用いたX線管球への印加電圧40kv、電流値150mAで、発生するCuKα線を用いてX線回折測定を行った。もし試料に結晶質の物質が含まれていた場合は、X線回折図に鋭角の形状を有する回折ピークが表れるので、得られた粉末X線回折図から、回折ピークの回折角2θを決定し、λ=2dsinθの関係に基づいて結晶の面間隔dを算出し、結晶系の同定をすることができる。なお、CuKα線のλは1.5418オングストロームである。
フィラーのメジアン径及び最大粒径は、レーザー回折式粒度分布計により測定し、体積基準で解析して算出した。
純水100gにフィラー1gを入れて95℃で20時間静置後、メンブレンフィルター(0.1μm)でろ過し、ろ液を得た。このろ液中のP、K、Zr濃度をICP発光分析により定量し、イオン性化合物量に換算した。P濃度は、すべてリン酸イオン由来の元素とした。これらの分析結果は表1に示した。
無鉛系ガラス粉末である日本フリット(株)製 商品名「VY-144」(組成:P2O5-Al2O3-Li2O-Na2O-K2O)に、合成したフィラーを30体積%となるように混合して直径10mm×高さ6mmの円柱状に成型後、電気炉にて540℃で10分加熱した。これにより得たガラス塊の直径をデジタルノギスで測定し、流動径とした。この流動径が、ガラスに近いものほど、流動性が良好であると判断した。なお、上記無鉛系ガラス粉末の流動径は、10.8mmであった。
上記流動性の評価で作製したガラス塊の表面を平滑化し、熱機械測定装置(TA Instruments社製 型式名「TMA2940」)により、30~300℃の熱膨張係数を測定した。なお、上記無鉛系ガラス粉末の熱膨張係数は、160×10-7/Kであった。
(実施例1)
メジアン径2μmのα層状リン酸ジルコニウム(Zr(HPO4)2・H2O)である、東亞合成(株)製 商品名「NS-10TZ」1,506g、オキシ水酸化ジルコニウム(ZrO(OH)2・H2O)246g(理論量の1.0倍量モル)、及び、炭酸カリウム231g(理論量の1.0倍量モル)を20Lのヘンシェルミキサーで5分間混合した。この混合物を、焼成炉にて6時間で1,350℃まで昇温後、1,350℃で6時間焼成した。次いで、焼成後の塊をボールミルで粗砕し、更に乾式ジェットミルで1次粒子に粉砕して、六方晶リン酸塩系化合物Aを得た。この六方晶リン酸塩系化合物の純度、メジアン径、及びイオン性化合物量、並びにガラス組成物の流動性及び熱膨張係数を上記の方法で測定し、結果を表1及び2に示した。
メジアン径2μmのα層状リン酸ジルコニウム(Zr(HPO4)2・H2O)である、東亞合成(株)製 商品名「NS-10TZ」1,506g、オキシ水酸化ジルコニウム(ZrO(OH)2・H2O)260g(理論量の1.0倍量モル)、炭酸水素カリウム335g(理論量の1.0倍量モル)、及び、純水750gを20Lのヘンシェルミキサーで5分間混合した。この混合物を、250℃で15時間乾燥した。次いで、乾燥した混合物を、焼成炉にて6時間で1,250℃まで昇温後、1,250℃で12時間焼成した。焼成後の塊をボールミルで粗砕し、更に乾式ジェットミルで1次粒子に粉砕して、六方晶リン酸塩系化合物Bを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
メジアン径2μmのα層状リン酸ジルコニウム(Zr(HPO4)2・H2O)である、東亞合成(株)製 商品名「NS-10TZ」1,506g、オキシ水酸化ジルコニウム(ZrO(OH)2・H2O)246g(理論量の1.0倍量モル)、及び、20重量%の水酸化カリウム水溶液938g(理論量の1.0倍量モル)を20Lのヘンシェルミキサーで5分間混合した。この混合物を、250℃で15時間乾燥した。次いで、乾燥した混合物を、焼成炉にて6時間で1,250℃まで昇温後、1,250℃で6時間焼成した。焼成後の塊をボールミルで粗砕し、更に乾式ジェットミルで1次粒子に粉砕して、六方晶リン酸塩系化合物Cを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
メジアン径2μmのα層状リン酸ジルコニウム(Zr(HPO4)2・H2O)である、東亞合成(株)製 商品名「NS-10TZ」1,506g、オキシ水酸化ジルコニウム(ZrO(OH)2・H2O)123g(理論量の0.5倍量モル)、及び、炭酸カリウム231g(理論量の1.1倍量モル)を20Lのヘンシェルミキサーで5分間混合した。この混合物を、焼成炉にて6時間で1,250℃まで昇温後、1,250℃で6時間焼成した。次いで、焼成後の塊をボールミルで粗砕し、更に乾式ジェットミルで1次粒子に粉砕して、六方晶リン酸塩系化合物Dを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
純水7Lに、シュウ酸2水和物290g、及び、20重量%オキシ塩化ジルコニウム水溶液2,787gを溶解し、撹拌しながら75重量%リン酸水溶液897gを添加した。この溶液に、20重量%水酸化カリウム水溶液をpHが2.7になるまで添加し、98℃で6時間反応させた。その後、セラミックフィルターを用いて純水でろ過洗浄し、固形分を250℃で15時間乾燥して六方晶リン酸塩系化合物Eを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
純水7Lに、炭酸ナトリウム319g、及び、炭酸水素ナトリウム556gを溶解し、撹拌しながら20重量%オキシ塩化ジルコニウム水溶液3,592gを添加して、30℃で15時間反応させた。その後、セラミックフィルターを用いて純水でろ過洗浄した。このスラリーに、75重量%リン酸水溶液1,030g、及び、20重量%水酸化カリウム水溶液931gを添加し、98℃で2時間反応させた。その後、セラミックフィルターを用いて純水でろ過洗浄し、固形分を250℃で15時間乾燥した。次いで、この乾燥した反応物を焼成炉にて6時間で1,250℃まで昇温後、1,250℃で6時間焼成した。乾式ボールミルで粗砕した後、更に乾式ジェットミルにより粉砕して六方晶リン酸塩系化合物Fを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
純水7Lに、炭酸カリウム240g、及び、炭酸水素ナトリウム372gを溶解し、撹拌しながら20重量%オキシ塩化ジルコニウム水溶液1,960gを添加した。これに75重量%リン酸水溶液562g、及び、20重量%水酸化カリウム水溶液448gを添加し、98℃で2時間反応させた。その後、セラミックフィルターを用いて純水でろ過洗浄し、固形分を250℃で15時間乾燥した。次いで、この乾燥した反応物を焼成炉にて6時間で1,350℃まで昇温後、1,350℃で6時間焼成した。乾式ボールミルで粗砕した後、更に乾式ジェットミルにより粉砕して六方晶リン酸塩系化合物Gを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
炭酸カリウム138g、酸化ジルコニウム246g、リン酸水素二アンモニウム396g、及び焼結助剤として酸化マグネシウム15gを20Lのヘンシェルミキサーで5分間混合した。次いで、この混合物を焼成炉にて6時間で1,450℃まで昇温後、1,450℃で6時間焼成した。乾式ボールミルで粗砕した後、更に乾式ジェットミルにより粉砕して六方晶リン酸塩系化合物Hを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
なお、同様の操作で焼成温度を1,350℃とした場合は酸化ジルコニウムが多く残り、目的物である六方晶リン酸塩系化合物はほとんど得られなかった。
メジアン径2μmのα層状リン酸ジルコニウム(Zr(HPO4)2・H2O)である、東亞合成(株)製 商品名「NS-10TZ」1,506g、オキシ水酸化ジルコニウム(ZrO(OH)2・H2O)246g(理論量の1.0倍量モル)、及び、炭酸カリウム307g(理論量の1.3倍量モル)を20Lのヘンシェルミキサーで5分間混合した。この混合物を、焼成炉にて6時間で1,250℃まで昇温後、1,250℃で6時間焼成した。次いで、焼成後の塊をボールミルで粗砕し、更に乾式ジェットミルで1次粒子に粉砕して、六方晶リン酸塩系化合物Iを得た。この六方晶リン酸塩系化合物を実施例1と同様に評価した。
本発明の六方晶リン酸塩系化合物の製造方法は、生産性、加工性に優れており、粒径の制御された六方晶リン酸塩系化合物が得られるので、本発明の製造方法による六方晶リン酸塩は、ブラウン管、PDP、蛍光表示管、有機EL、ICセラミックパッケージ等の電子部品用の封着ガラス等のフィラーとして使用できる。
Claims (9)
- 純度が90%以上である下記式1で表される六方晶リン酸塩系化合物からなり、かつ、イオン性化合物の含有量が1.0重量%以下であることを特徴とする、
フィラー。
KaZrb(PO4)3 (1)
式1中、aは0.8~1.2の正数であり、bはa+4b=9を満たす正数である。 - 前記イオン性化合物が、カリウムイオン、ジルコニウムイオン及びリン酸イオンである、請求項1に記載のフィラー。
- レーザー回折式粒度分布計による体積基準のメジアン径が、0.05~10μmである、請求項1又は2に記載のフィラー。
- レーザー回折式粒度分布計による体積基準の最大粒径が、50μm以下である、請求項1~3のいずれか1項に記載のフィラー。
- 請求項1~4のいずれか1項に記載のフィラーを含有することを特徴とする、ガラス組成物。
- 層状リン酸ジルコニウム、カリウムを含む化合物、及び前記層状リン酸ジルコニウム以外のジルコニウムを含む化合物を調合し混合物を得る工程、
前記混合物を焼成する工程、並びに、
前記焼成工程後に粉砕する工程を含むことを特徴とする
下記式1で表される六方晶リン酸塩系化合物の製造方法。
KaZrb(PO4)3 (1)
式1中、aは0.8~1.2の正数であり、bはa+4b=9を満たす正数である。 - 前記層状リン酸ジルコニウムが、レーザー回折式粒度分布計による体積基準で0.05~10μmのメジアン径を有する粒子である、請求項6に記載の六方晶リン酸塩系化合物の製造方法。
- 前記層状リン酸ジルコニウム1モルに対する前記カリウムを含む化合物の配合量が、製造する六方晶リン酸塩系化合物の理論量の0.8~1.2倍量モルである、請求項6又は7に記載の六方晶リン酸塩系化合物の製造方法。
- 焼成温度が、650~1,500℃である、請求項6~8のいずれか1項に記載の六方晶リン酸塩系化合物の製造方法。
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0517112A (ja) * | 1991-07-12 | 1993-01-26 | Toagosei Chem Ind Co Ltd | 結晶質リン酸ジルコニウム化合物の製造方法 |
JP2005162570A (ja) * | 2003-12-05 | 2005-06-23 | Nippon Electric Glass Co Ltd | 封着用複合材料 |
JP2006111463A (ja) * | 2004-10-12 | 2006-04-27 | Nippon Electric Glass Co Ltd | Pdp封着用粉末およびそれを用いてなるpdp封着用ペースト |
JP2006306677A (ja) * | 2005-04-28 | 2006-11-09 | Toagosei Co Ltd | 新規リン酸ジルコニウム |
WO2010131731A1 (ja) * | 2009-05-15 | 2010-11-18 | 東亞合成株式会社 | 低熱膨張性フィラーおよびその製造方法、ならびにガラス組成物 |
JP2011136871A (ja) * | 2009-12-28 | 2011-07-14 | Jgc Catalysts & Chemicals Ltd | リン含有金属酸化物微粒子およびその製造方法、該リン含有金属酸化物微粒子を含む透明被膜形成用塗布液ならびに透明被膜付基材 |
JP2011168491A (ja) * | 2011-05-13 | 2011-09-01 | Toagosei Co Ltd | 低熱膨張性フィラー及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4112194A (en) * | 1976-11-08 | 1978-09-05 | Gte Sylvania Incorporated | Hexagonal hafnium, zirconium phosphate luminescent material, method of preparation, and x-ray intensifying screen containing the same |
JP2767276B2 (ja) | 1989-04-06 | 1998-06-18 | 株式会社日立製作所 | 封着材料 |
JP3852239B2 (ja) | 1999-04-07 | 2006-11-29 | 日本電気硝子株式会社 | フィラー粉末の製造方法 |
JP2005035840A (ja) | 2003-07-15 | 2005-02-10 | Kcm Corp | 封着材料 |
JP4957073B2 (ja) | 2006-05-12 | 2012-06-20 | 東亞合成株式会社 | 低熱膨張性フィラーを含有する、ガラス組成物 |
US8066810B2 (en) * | 2006-10-27 | 2011-11-29 | Toagosei Co., Ltd. | Lamellar zirconium phosphate |
US8603929B2 (en) * | 2007-11-14 | 2013-12-10 | Fujifilm Corporation | Process for producing hexagonal zirconium phosphate powder |
-
2014
- 2014-11-13 US US15/037,220 patent/US9714170B2/en active Active
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0517112A (ja) * | 1991-07-12 | 1993-01-26 | Toagosei Chem Ind Co Ltd | 結晶質リン酸ジルコニウム化合物の製造方法 |
JP2005162570A (ja) * | 2003-12-05 | 2005-06-23 | Nippon Electric Glass Co Ltd | 封着用複合材料 |
JP2006111463A (ja) * | 2004-10-12 | 2006-04-27 | Nippon Electric Glass Co Ltd | Pdp封着用粉末およびそれを用いてなるpdp封着用ペースト |
JP2006306677A (ja) * | 2005-04-28 | 2006-11-09 | Toagosei Co Ltd | 新規リン酸ジルコニウム |
WO2010131731A1 (ja) * | 2009-05-15 | 2010-11-18 | 東亞合成株式会社 | 低熱膨張性フィラーおよびその製造方法、ならびにガラス組成物 |
JP2011136871A (ja) * | 2009-12-28 | 2011-07-14 | Jgc Catalysts & Chemicals Ltd | リン含有金属酸化物微粒子およびその製造方法、該リン含有金属酸化物微粒子を含む透明被膜形成用塗布液ならびに透明被膜付基材 |
JP2011168491A (ja) * | 2011-05-13 | 2011-09-01 | Toagosei Co Ltd | 低熱膨張性フィラー及びその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200024011A (ko) * | 2018-08-27 | 2020-03-06 | 한국세라믹기술원 | Las계 결정화 유리 및 그 제조 방법 |
KR102137875B1 (ko) | 2018-08-27 | 2020-07-27 | 한국세라믹기술원 | Las계 결정화 유리 및 그 제조 방법 |
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