WO2015062404A1 - 光敏无砂目印版 - Google Patents

光敏无砂目印版 Download PDF

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Publication number
WO2015062404A1
WO2015062404A1 PCT/CN2014/088397 CN2014088397W WO2015062404A1 WO 2015062404 A1 WO2015062404 A1 WO 2015062404A1 CN 2014088397 W CN2014088397 W CN 2014088397W WO 2015062404 A1 WO2015062404 A1 WO 2015062404A1
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Prior art keywords
photosensitive
resin
nano
sized
micro
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PCT/CN2014/088397
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English (en)
French (fr)
Inventor
宋延林
杨明
沙栩正
刘云霞
吴为
王坤婵
Original Assignee
北京中科纳新印刷技术有限公司
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Publication of WO2015062404A1 publication Critical patent/WO2015062404A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Definitions

  • the invention belongs to the technical field of printing plate preparation, and particularly relates to a photosensitive non-sanding printing plate and a preparation method thereof, and is applied to the field of printing.
  • CTP technology With the wide application of computer technology in the printing industry, CTP technology has gradually gained the attention of printing companies. For CTP technology, the quality and application of CTP plates is the key to ensuring plate quality. After more than ten years of development, CTP technology has gradually formed three major categories: thermal CTP plate, silver salt CTP plate and photosensitive CTP plate.
  • the production process of the photosensitive plate is: plate cleaning - degreasing - cleaning - electrolysis sand - washing - ash - washing - oxidation - washing - sealing - washing - drying - coating - drying - cutting - packaging .
  • the main features of the photosensitive CTP plate include: the shorter wavelength of the violet laser (405nm), which can form sharp and precise dots; low cost, no need for extra step packaging for the cleaning of the plate, the cost of the process is low; the operator uses Yellow safety light can be more convenient; high chemical resistance, normal use of cleaning paste, dampening solution, ink cleaning agent and other printing accessories; plate making speed is fast, mainly because photosensitive CTP plate is more than thermal CTP plate
  • the material is more sensitive.
  • the basic composition of the photosensitive plate is an aluminum plate base and a photosensitive layer. In order to improve the printing durability and resolution of the aluminum plate, the aluminum plate is usually anodized and grained (see CN85100875), so that the surface of the metal plate has a certain roughness. When anodizing, a large amount of acid and alkali must be used to pretreat the aluminum plate, and the acid and alkali waste liquid not only causes large pollution to the environment, but also increases the overall cost of the plate.
  • the present invention provides a photosensitive sand-free printing plate and a preparation method thereof, and is applied to the field of printing.
  • the photosensitive non-sand printing plate prepared by the invention can realize the similar performance after electrolytic sanding and anodizing treatment, and can replace the plate base after electrolytic sanding and anodizing.
  • the photosensitive sand-free printing plate prepared by the invention comprises a plate base, a hydrophilic layer and a photosensitive layer, and the hydrophilic layer and the photosensitive layer are sequentially coated on the plate base.
  • the above-mentioned plate base is selected from a metal plate, a plastic plate, or a composite plate.
  • the hydrophilic layer described above contains nanoscale and/or micron-sized particles.
  • the hydrophilic layer described above comprises uniformly dispersed nanoscale and/or micron-sized particles and a resin.
  • the above hydrophilic layer is obtained by mixing, grinding and dispersing a composition comprising uniformly dispersed nano-sized and/or micro-sized particles, a resin and a solvent, and coating the substrate.
  • the above hydrophilic layer is obtained by uniformly dispersing nano-sized and/or micro-sized particles, a resin, a crosslinking agent and a solvent, and grinding and dispersing and coating on a plate.
  • nano-scale and/or micro-scale particles are one of nano- or micro-scale clay, silica sol, zinc oxide, aluminum oxide, titanium dioxide, silicon dioxide, cadmium oxide, vanadium oxide, cerium oxide, zirconium oxide or Several.
  • the mass ratio of the above crosslinking agent to the nano-sized and/or micro-sized particles is (1:5)-(1:25), and the above-mentioned crosslinking agent is a polyepoxy monomer-based crosslinking agent, an epoxy resin, A thermosetting phenol resin, a polyurethane crosslinking agent, or a vinyl ether crosslinking agent.
  • the above polyepoxy monomer-based crosslinking agent is specifically selected from the group consisting of: bicyclic oxidized butadiene, 2,2'-[1,4-phenylenebis(oxymethylene)]diethylene oxide, 9,9 - bis[(2,3-epoxypropoxy)phenyl]indole, pentaerythritol glycidyl ether, 2,2-bis-(4-glycine oxyphenyl)propane, 1,4-bis[(glycidyloxy) Methyl]cyclohexane;
  • the above polyurethane-based crosslinking agent is specifically selected from the group consisting of toluene diisocyanate, 4,4-diphenylmethane diisocyanate, aromatic isocyanate, isophorone isocyanate, hexamethylene diisocyanate 1,12-dodecane diisocyanate;
  • the above vinyl ether crosslinking agent is specifically selected from the group consisting
  • the mass ratio of the above resin to the nano-scale and/or micro-scale particles is (1:10)-(10:1),
  • the above resin is selected from the group consisting of an acrylate resin, a phenol resin, an epoxy resin, a polyurethane, a polyester, a urea resin, a polyvinyl formal, a polyvinyl butyral, an amino resin, an acrylic resin, an alkyd resin, a pitch resin, and One or several of gum arabic.
  • the mass ratio of the above solvent to the nano-scale and/or micro-scale particles is (1:1)-(10:1), and the solvent is selected from the group consisting of esters, petroleum ether, acetone, methyl ethyl ketone, methanol, ethanol, and 1 -propanol, 2-propanol, 2-butanol, 2-methyl-2-propanol, alkanes, toluene, ethylene glycol monoethyl ether, ethylene glycol methyl ether, propylene glycol methyl ether, diethyl ether, N-methyl At least one selected from the group consisting of pyrrolidone, tetrahydrofuran, water, and ionic liquid; the ester is selected from the group consisting of methyl acetate, ethyl formate, propyl formate, isopropyl formate, ethyl acetate, and gamma One or more of an ester and a butyl acetate
  • the above photosensitive layer is obtained by coating a photosensitive liquid on a hydrophilic layer; the photosensitive liquid is composed of 8-12 parts by mass of a photoactive compound, 0.2-0.5 parts by mass of a background dye, and 15-25 parts by mass of a film-forming resin. 60-80 parts by mass of solvent composition.
  • the photoactive compound is a product obtained by reacting 2-diazo-1-naphthol-4-sulfonyl chloride or 2-diazo-1-naphthol-5-sulfonyl chloride with an alcohol compound or a phenol compound, or a product obtained by reacting 2-diazo-1-naphthol-4-sulfonyl chloride or 2-diazo-1-naphthol-5-sulfonyl chloride with a polymer containing an alcoholic hydroxyl group and/or a phenolic hydroxyl group; - the molar ratio of diazo-1-naphthol-4-sulfonyl chloride or 2-diazo-1-naphthol-5-sulfonyl chloride to the alcoholic hydroxyl group of the alcohol compound is (1:20)-(1:1) The molar ratio of the 2-diazo-1-naphthol-4-sulfonyl chloride or 2-di
  • the solvent in the photosensitive liquid is propylene glycol monomethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monoethyl ether, methyl ethyl ketone, butyl acetate, dioxane, N-methylpyrrole One or more of an alkyl ketone, methanol, and tetrahydrofuran.
  • the film-forming resin is a water-insoluble polymer, specifically one or more of an epoxy resin, a polyvinyl acetal resin, and a polyurethane resin.
  • the background dye is one or more of basic brilliant blue, crystal violet, Victoria pure blue, indigo, methyl violet, malachite green, and oil-soluble blue.
  • the alcohol compound is a C 1 -C 14 compound containing one or more alcoholic hydroxyl groups.
  • the alcohol compound is specifically selected from one or more of methanol, butanol, tert-butanol, glycerin, trimethylolethane, pentaerythritol, xylitol, and sorbitol.
  • the phenolic compound is a C 1 -C 20 compound containing one or more phenolic hydroxyl groups.
  • the phenolic compound is specifically selected from one or more of phenol, p-hydroxyphenol, pyrogallol, phloroglucinol, and trihydroxybenzophenone.
  • the polymer containing an alcoholic hydroxyl group and/or a phenolic hydroxyl group is a phenol resin having a number average molecular weight of 1,000 to 10,000, a polyvinyl alcohol having a number average molecular weight of 10,000 to 200,000, or a poly(p-hydroxystyrene) having a number average molecular weight of 1,000 to 10,000.
  • the polymer containing an alcoholic hydroxyl group and/or a phenolic hydroxyl group is specifically selected from the group consisting of BTB225 phenolic resin, BTB17 phenolic resin, BX-20 phenolic resin, 17-99 polyvinyl alcohol, and 17-88 polyvinyl alcohol.
  • the above photosensitive liquid further contains 0.01 to 0.1 part by mass of a leveling agent.
  • the leveling agent is an organosilicon compound.
  • the leveling agent is specifically selected from the group consisting of polydimethylsiloxane, polyether polyester modified organosiloxane, and alkyl modified organosiloxane.
  • the photosensitive non-sanding plate prepared above was applied to the field of printing.
  • the present invention coats nanoscale and/or micron-sized particles or compositions containing nanoscale and/or micron-sized particles on the surface of a substrate to obtain a hydrophilic coating, by observing the contact angle of water droplets on the surface of the coating, coating
  • the hydrophilicity is close to or better than the ordinary PS version.
  • the hydrophilic layer prepared by the invention has suitable roughness, so that the surface of the plate base has certain hydrophilicity and water retention, avoids electrolytic graining and anodizing treatment, and at the same time has the same with electrolytic sanding and anode. Similar properties of the oxidized aluminum plate.
  • the presence of nano-sized and/or micro-sized hydrophilic particles in the hydrophilic layer enables the plate to have a high specific surface energy, which not only satisfies the requirements of ink absorption and environmental protection, but also improves the wear resistance of the surface of the substrate while The hydrophilic layer has good adhesion to both the substrate and the photosensitive layer.
  • the photosensitive non-sanding plate printing process of the invention is: plate cleaning-deoiling-cleaning-drying-coating liquid-drying-cutting-packaging.
  • the preparation method has the advantages of simple preparation process, low cost, energy saving and environmental protection.
  • the production of a photosensitive printing plate 1m water consumption is about 18Kg, power consumption of about 2.5 kwh; the present invention is not photosensitive plate production graining water consumption is about 1m 2 of 6Kg, power consumption of about 1.2 kwh Compared with the existing photosensitive plate, the water consumption is saved by 70%, and the electricity consumption is saved by about 50%.
  • the invention not only improves the performance of the existing photosensitive plate, but also avoids the environmental pollution caused by the waste acid solution and the waste alkali solution after the anodizing treatment of the aluminum plate of the existing photosensitive plate, and protects the environment.
  • the zinc oxide having a particle diameter of 3000 nm is uniformly sprayed on the aluminum plate, and then a photosensitive liquid is applied thereon by spin coating, and dried to obtain a photosensitive non-sand plate.
  • the photosensitive liquid obtained by the reaction of 2-diazo-1-naphthol-4-sulfonyl chloride and BTB225 phenolic resin 8g (hydroxyl 2-naphthyl-1-naphthol-4-sulfonyl chloride and hydroxyl group of BTB225 phenolic resin)
  • the functional group has a molar ratio of 1:1), 0.5 g of oil-soluble blue, 20 g of epoxy resin, 35 g of ethylene glycol monomethyl ether, and 35 g of ethylene glycol monoethyl ether.
  • the cerium oxide having a particle diameter of 200 nm is uniformly sprayed on the aluminum plate, and then a photosensitive liquid is applied thereon by spin coating, and dried to obtain a photosensitive non-sanding plate.
  • the photosensitive liquid obtained by reacting 2-diazo-1-naphthol-4-sulfonyl chloride with butanol 8g (2-diazo-1-naphthol-4-sulfonyl chloride and butanol molar ratio 1:20), 0.5g oil-soluble blue, 20g epoxy resin, 35g methyl ethyl ketone, 35g dioxygen Six rings.
  • the alumina having a particle diameter of 3000 nm is uniformly dispersed in a phenol resin, and then coated on a copper plate, and the mass ratio of the alumina to the phenol resin is 1:10; finally, a layer of the photosensitive liquid is applied by spin coating, and dried. , that is, the photosensitive no sand printing plate.
  • the photosensitive liquid is a product obtained by reacting 2-diazo-1-naphthol-4-sulfonyl chloride with polyparaxyl styrene having a number average molecular weight of 1000-10000 (10 g (2-diazo-1-naphthol-4)
  • the molar ratio of the sulfonyl chloride to the hydroxy functional group of the poly(p-hydroxystyrene) is 1:5), 0.4 g of Victoria Pure Blue, 15 g of polyvinyl formal resin, and 80 g of the solvent dioxane.
  • the titanium dioxide having a particle diameter of 500 nm is uniformly dispersed in an acrylic resin, and then coated on a copper plate, and the mass ratio of titanium dioxide to acrylic resin is 1:10; finally, a photosensitive liquid is applied thereon by spin coating, and dried. Photosensitive sand-free printing plate.
  • the photosensitive liquid obtained by the reaction of 2-diazo-1-naphthol-4-sulfonyl chloride and phenol 10g (the molar ratio of 2-diazo-1-naphthol-4-sulfonyl chloride to phenol is 1: 10), 0.4 g of Victoria Pure Blue, 15 g of polyvinyl formal resin, and 80 g of solvent tetrahydrofuran.
  • the zinc oxide having a particle diameter of 200 nm is uniformly dispersed in an acrylate resin, and then coated on an aluminum plate, and the mass ratio of the zinc oxide to the acrylate resin is 1:6; finally, a layer of the photosensitive liquid is applied by spin coating. Drying, that is, photosensitive photosensitive sand-free printing plate.
  • the molar ratio of hydroxy functional groups of benzophenone is 1:8), 0.2 g of indigo, 0.2 g of methyl violet, and 15 g of polyurethane tree Fat, 40 g of methyl ethyl ketone, 30 g of butyl acetate.
  • the vanadium oxide with a particle size of 200 nm is uniformly dispersed in gum arabic and then coated on an aluminum plate.
  • the mass ratio of vanadium oxide to gum arabic is 1:5; finally, a layer of photosensitive liquid is applied by spin coating, and dried. , that is, the photosensitive no sand printing plate.
  • the photosensitive liquid obtained by reacting 2-diazo-1-naphthol-4-sulfonyl chloride with p-hydroxyphenol 12g (2-diazo-1-naphthol-4-sulfonyl chloride and hydroxyl group of p-hydroxyphenol)
  • the molar ratio of the functional groups was 1:15), 0.2 g of indigo, 0.2 g of methyl violet, 15 g of a polyurethane resin, 40 g of ethylene glycol monomethyl ether, and 30 g of N-methylpyrrolidone.
  • the silica sol and the alkyd resin having a particle diameter of 500 nm are uniformly dispersed in water, and then coated on a PP plastic plate, the mass ratio of the silica sol to the alkyd resin is 1:1, and the mass ratio of the silica sol to water is 1:1; Finally, a layer of photosensitive liquid is coated on the surface by spin coating, and dried to obtain a photosensitive non-sand plate.
  • the photosensitive liquid obtained by reacting 2-diazo-1-naphthol-5-sulfonyl chloride with methanol has a molar ratio of 2 g (2-diazo-1-naphthol-5-sulfonyl chloride to methanol) of 1: 18), consisting of 0.4 g of basic brilliant blue, 10 g of epoxy resin, 10 g of polyurethane resin, 40 g of methanol, and 40 g of tetrahydrofuran.
  • Silica and alkyd resin with a particle size of 500 nm are uniformly dispersed in water and then coated on a PP plastic plate.
  • the mass ratio of silica to alkyd resin is 1:1, and the mass ratio of silica to water is 1. :1;
  • a layer of photosensitive liquid is coated on the surface by spin coating, and dried to obtain a photosensitive non-sand plate.
  • the photopolymer obtained from the reaction of 2-diazo-1-naphthol-5-sulfonyl chloride and xylitol 9g (2-diazo-1-naphthol-5-sulfonyl chloride and hydroxyl group of xylitol) Molar ratio of functional groups It is 1:16), 0.4 g of basic brilliant blue, 10 g of epoxy resin, 10 g of polyurethane resin, 40 g of methanol, and 40 g of tetrahydrofuran.
  • Titanium dioxide and epoxy resin with a particle size of 200 nm were uniformly dispersed in a solvent of propyl formate and then coated on a PVC plastic plate.
  • the mass ratio of titanium dioxide to epoxy resin was 4:1, and the mass ratio of titanium dioxide to propyl formate was 1. :5;
  • a layer of photosensitive liquid is coated on the surface by spin coating, and dried to obtain a photosensitive no-sand plate.
  • the photopolymer is obtained by reacting 2-diazo-1-naphthol-5-sulfonyl chloride with 17-99 polyvinyl alcohol, 12 g (2-diazo-1-naphthol-5-sulfonyl chloride and 17).
  • the molar ratio of the hydroxyl group of the -99 type polyvinyl alcohol is 1:12), 0.3 g of indigo, 25 g of the epoxy resin, and 60 g of the solvent N-methylpyrrolidone.
  • Zirconium oxide and polyvinyl butyral with a particle size of 100 nm were uniformly dispersed in a solvent of propyl formate and then coated on a PVC plastic plate.
  • the mass ratio of zirconia to polyvinyl butyral was 4:1, zirconia.
  • the mass ratio of propyl formate is 1:5; finally, a layer of photosensitive liquid is coated on the surface by spin coating, and dried to obtain a photosensitive non-sand plate.
  • the phenolic resin has a hydroxyl functional group molar ratio of 1:6), 0.3 g of indigo, 25 g of an epoxy resin, and 60 g of a solvent N-methylpyrrolidone.
  • Cadmium oxide, bis(a) oxidized butadiene and polyester, urea-formaldehyde resin with a particle size of 1000 nm were uniformly dispersed in a solvent of tetrahydrofuran, and then coated on a copper plate.
  • the mass ratio of cadmium oxide to bicyclooxybutadiene was 25:1, cadmium oxide.
  • the mass ratio to polyester is 1:3, the mass ratio of cadmium oxide to urea-formaldehyde resin is 1:3, and the mass ratio of cadmium oxide to tetrahydrofuran is 1:8;
  • the coating method is coated with a layer of photosensitive liquid and dried to obtain a photosensitive and no-sand plate.
  • the photosensitive liquid obtained by reacting 2-diazo-1-naphthol-5-sulfonyl chloride with poly(p-hydroxystyrene) 8g (2-diazo-1-naphthol-5-sulfonyl chloride and poly-p-hydroxyl)
  • the molar ratio of hydroxy functional groups of styrene is 1:2), 0.2 g of malachite green, 20 g of epoxy resin, 70 g of solvent methyl ethyl ketone, and 0.06 g of polydimethylsiloxane.
  • the clay having a particle diameter of 500 nm, isophorone isocyanate and acrylic resin, and amino resin are uniformly dispersed in a solvent of tetrahydrofuran, and then coated on a copper plate.
  • the mass ratio of clay to isophorone isocyanate is 25:1, clay and acrylic resin.
  • the mass ratio is 1:3, the mass ratio of clay to amino resin is 1:3, and the mass ratio of clay to tetrahydrofuran is 1:8; finally, a layer of photosensitive liquid is applied by spin coating, and dried. Photosensitive sand-free printing plate.
  • the molar ratio of the hydroxyl functional group of methylethane is 1:10), 0.2 g of malachite green, 20 g of epoxy resin, 70 g of solvent methyl ethyl ketone, and 0.06 g of alkyl-modified organosiloxane.
  • the zirconia and titania having a particle size of 500 nm, the triethylene glycol divinyl ether and the phenol resin, and the epoxy resin are uniformly dispersed in a mixed solvent of ethylene glycol methyl ether and acetone, and then coated on an aluminum plate, zirconia and titania.
  • the mass ratio of the sum of mass to triethylene glycol divinyl ether is 5:1, the mass ratio of the sum of the mass of zirconia and titania to the phenolic resin is 5:1, the sum of the masses of zirconia and titania and the epoxy resin
  • the mass ratio is 5:1
  • the mass ratio of the sum of the mass of zirconia and titania to ethylene glycol methyl ether is 5:1
  • the mass ratio of the mass of zirconia and titania to acetone is 5:1
  • the ratio is 1:1; finally, a layer of photosensitive liquid is applied on the surface by spin coating, and dried to obtain a photosensitive non-sand plate.
  • the photosensitive liquid is obtained by reacting 2-diazo-1-naphthol-5-sulfonyl chloride with p-hydroxyphenol.
  • the product 8g (molar ratio of 2-diazo-1-naphthol-5-sulfonyl chloride to hydroxy functional group of p-hydroxyphenol is 1:3), 0.5g of crystal violet, 15g of epoxy resin, 60g of propylene glycol alone Methyl ether, 0.03 g of polyether polyester modified organosiloxane.
  • the zinc oxide and titanium dioxide having a particle diameter of 500 nm, the cross-linking thermosetting phenolic resin, the asphalt resin and the epoxy resin are uniformly dispersed in a mixed solvent of petroleum ether and 2-butanol, and then coated on an aluminum plate, and the quality of zinc oxide and titanium oxide is
  • the mass ratio of the cross-linking agent thermosetting phenolic resin is 5:1
  • the mass ratio of the mass of zinc oxide and titanium dioxide to the pitch resin is 5:1
  • the mass ratio of the sum of the mass of zinc oxide and titanium dioxide to the epoxy resin is 5 :1
  • the mass ratio of the sum of the mass of zinc oxide and titanium dioxide to petroleum ether is 5:1
  • the mass ratio of the mass of zinc oxide and titanium dioxide to the mass ratio of 2-butanol is 5:1
  • the mass ratio of zinc oxide to titanium dioxide is 1: 1
  • a layer of photosensitive liquid is coated on the surface by spin coating, and dried to obtain a photosensitive non-sand plate.
  • the benzoic ketone has a hydroxyl group molar ratio of 1:4), 0.5 g of crystal violet, 15 g of an epoxy resin, 60 g of propylene glycol monomethyl ether, and 0.03 g of polydimethylsiloxane.

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  • Spectroscopy & Molecular Physics (AREA)
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Abstract

一种光敏无砂目印版，由版基、亲水层和光敏层组成，亲水层、光敏层依次涂覆在版基之上。其中，将纳米级和/或微米级颗粒或含有纳米级和/或微米级颗粒的组合物涂布在版基表面得到亲水性涂层，由此制得的亲水层具有适宜的粗糙度，使版基的表面具有亲水性和保水性。亲水层中的纳米级和/或微米级亲水物颗粒的存在不仅使印版满足了吸墨性的要求，还提高了版基表面的耐磨性，同时保持了亲水层与版基和光敏层较好的粘结力。与现有的光敏版相比，避免了对铝版进行电解和氧化产生的废酸、废碱液对环境造成的污染，同时节省了用水量以及用电量。

Description

[根据细则37.2由ISA制定的发明名称]　光敏无砂目印版 技术领域
本发明属于印版制备技术领域，特别涉及一种光敏无砂目印版及其制备方法，并将其应用于印刷领域。
背景技术
随着计算机技术在印刷业的广泛应用，CTP技术逐渐获得了印刷企业的关注。对CTP技术来说，CTP版材的质量和应用是保证制版质量的关键。CTP技术经过十几年的发展，逐渐形成了三大类：热敏CTP版材、银盐CTP版材和光敏CTP版材。光敏版的制作流程为：版基清洗-除油-清洗-电解砂目-水洗-除灰-水洗-氧化-水洗-封孔-水洗-烘干-涂布液-烘干-裁切-包装。光敏CTP版材的主要特点包括：紫激光波长较短(405nm)，能够形成锐利、精确的网点；成本低，版材的冲洗不需要额外步骤包装安全，处理流程的成本较低；操作者使用黄色安全灯即可，更加方便；耐化学性高，可正常使用洁版膏、润版液、油墨清洗剂等印刷辅材；制版速度快，这主要是由于光敏CTP版材比热敏CTP版材更敏感。光敏版的基本组成为铝版基和感光层。为了使铝版基的耐印力及分辨力提高，通常要对铝版进行阳极氧化及砂目化处理(见CN85100875)，使金属版基的表面具有一定的粗糙度。阳极氧化时须使用大量的酸、碱对铝版进行预处理，而酸、碱的废液不仅对环境易造成较大污染，而且使版材整体的造价提高。
发明内容
为解决上述现有技术中出现的问题，本发明提供一种光敏无砂目印版及其制备方法，并将其应用于印刷领域。本发明制备的光敏无砂目印版，其涂覆的亲水层可实现具有与电解砂目化及阳极氧化处理后相似的性能，即可代替经电解砂目化及阳极氧化处理后的版基，从而 达到避免阳极氧化产生的废酸及废碱污染环境的目的。
本发明制备的光敏无砂目印版由版基、亲水层和光敏层组成，亲水层、光敏层依次涂覆在版基之上。
上述的版基选自金属板、塑料板、或复合材料板。
上述的亲水层含有纳米级和/或微米级颗粒。
上述的亲水层包含均匀分散的纳米级和/或微米级颗粒和树脂。
上述的亲水层由包含均匀分散的纳米级和/或微米级颗粒、树脂和溶剂的组合物混合并研磨分散后涂覆在版基上得到。
上述的亲水层由均匀分散的纳米级和/或微米级颗粒、树脂、交联剂和溶剂混合并研磨分散后涂覆在版基上得到。
上述的纳米级和/或微米级颗粒为纳米级或微米级粘土、硅溶胶、氧化锌、氧化铝、二氧化钛、二氧化硅、氧化镉、氧化钒、二氧化铈、氧化锆中的一种或几种。
上述的交联剂与纳米级和/或微米级颗粒的质量比为(1:5)-(1:25)，上述的交联剂为多环氧单体类交联剂、环氧树脂、热固性酚醛树脂、聚氨酯类交联剂、或乙烯基醚类交联剂。
上述的多环氧单体类交联剂具体选自：双环氧化丁二烯、2,2’-[1,4-亚苯基双(氧甲烯)]双环氧乙烷、9,9-二[(2,3-环氧丙氧基)苯基]芴、季戊四醇缩水甘油醚、2,2-双-(4-甘胺氧苯)丙烷、1,4-双[(缩水甘油氧)甲基]环己烷；上述的聚氨酯类交联剂具体选自：甲苯二异氰酸酯、4,4-二苯基甲烷二异氰酸酯、芳香族异氰酸酯、异佛尔酮异氰酸酯、六次甲基二异氰酸酯、1,12-十二烷二异氰酸酯；上述的乙烯基醚类交联剂具体选自：1,4-环己烷二甲醇二乙烯醚、三乙二醇二乙烯基醚、1,6-己二醇二乙烯醚。
上述的树脂与纳米级和/或微米级颗粒的质量比为(1:10)-(10:1)， 上述的树脂选自丙烯酸酯树脂、酚醛树脂、环氧树脂、聚氨酯、聚酯、脲醛树脂、聚乙烯醇缩甲醛、聚乙烯醇缩丁醛、氨基树脂、丙烯酸树脂、醇酸树脂、沥青树脂和阿拉伯树胶中的一种或几种。
上述的溶剂与纳米级和/或微米级颗粒的质量比为(1:1)-(10:1)，所述的溶剂选自酯类、石油醚、丙酮、丁酮、甲醇、乙醇、1-丙醇、2-丙醇、2-丁醇、2-甲基-2-丙醇、烷烃、甲苯、乙二醇独乙醚、乙二醇甲醚、丙二醇甲醚、乙醚、N-甲基吡咯烷酮、四氢呋喃、水、离子液体所组成的组中的至少一种；所述的酯类选自乙酸甲酯、甲酸乙酯、甲酸丙酯、甲酸异丙酯、乙酸乙酯、伽马丁内酯和乙酸丁酯中的一种或几种；所述的烷烃选自正庚烷、正己烷、正戊烷、环己烷中的一种或几种。
上述的光敏层由感光液涂覆在亲水层上得到；所述的感光液由8-12质量份的光活性化合物，0.2-0.5质量份的背景染料，15-25质量份的成膜树脂，60-80质量份的溶剂组成。
所述的光活性化合物为2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与醇类化合物或酚类化合物反应得到的产物，或者2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与含醇羟基和/或酚羟基的高分子反应得到的产物；所述的2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与醇类化合物的醇羟基的摩尔比为(1:20)-(1:1)，所述的2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与酚类化合物的酚羟基的摩尔比为(1:20)-(1:1)，所述的2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与含醇羟基和/或酚羟基的高分子的羟基官能团的摩尔比为(1:20)-(1:1)。
所述的感光液中的溶剂为丙二醇独甲醚、乙二醇单甲醚、乙二醇单乙醚、丙二醇单乙醚、甲乙酮、醋酸丁酯、二氧六环、N-甲基吡咯 烷酮、甲醇、四氢呋喃中的一种或几种。
所述的成膜树脂为不溶于水的聚合物，具体为环氧树脂、聚乙烯醇缩醛树脂、聚氨酯树脂中的一种或几种。
所述的背景染料为碱性艳蓝、结晶紫、维多利亚纯蓝、靛蓝、甲基紫、孔雀石绿、油溶蓝中的一种或几种。
所述的醇类化合物为含有一个或者多个醇羟基的C1-C14化合物。
所述的醇类化合物具体选自甲醇、丁醇，叔丁醇、甘油、三羟甲基乙烷、季戊四醇、木糖醇、山梨醇中的一种或几种。
所述的酚类化合物为含有一个或者多个酚羟基的C1-C20化合物。
所述的酚类化合物具体选自苯酚、对羟基苯酚、连苯三酚、间苯三酚、三羟基二苯甲酮中的一种或几种。
所述的含醇羟基和/或酚羟基的高分子为数均分子量1000-10000的酚醛树脂、数均分子量10000-200000的聚乙烯醇、或数均分子量1000-10000的聚对羟基苯乙烯。
所述的含醇羟基和/或酚羟基的高分子具体选自BTB225酚醛树脂、BTB17酚醛树脂、BX-20酚醛树脂、17-99型聚乙烯醇、17-88型聚乙烯醇。
上述的感光液还含有0.01-0.1质量份的流平剂。
所述的流平剂为有机硅化合物。
所述的流平剂具体选自聚二甲基硅氧烷、聚醚聚酯改性有机硅氧烷、烷基改性有机硅氧烷。
将上述制备的光敏无砂目印版应用于印刷领域。
本发明将纳米级和/或微米级颗粒或含有纳米级和/或微米级颗粒的组合物涂布在版基表面得到亲水性涂层，通过观察水滴在涂层表面的接触角，涂层的亲水性接近或优于普通PS版。本发明制得的亲 水层具有适宜的粗糙度，使版基的表面具有一定的亲水性和保水性，避免电解砂目化及阳极氧化处理，同时使其具有与电解砂目化及阳极氧化处理的铝版基相似的性能。亲水层中的纳米级和/或微米级亲水物颗粒的存在可使版基具有高比表面能，不仅满足吸墨性和环保的要求，还提高了版基表面的耐磨性，同时亲水层与版基和光敏层的粘结力均很好。本发明的光敏无砂目印版制作流程为：版基清洗-除油-清洗-烘干-涂布液-烘干-裁切-包装。本发明制备工艺简单，成本低廉，节能环保。现有技术中生产1m2的光敏版耗水量约为18Kg，耗电量约2.5千瓦时；而本发明的光敏无砂目印版生产1m2的耗水量约为6Kg，耗电量约1.2千瓦时，比现有的光敏版用水量节约70％，用电量节省约50％。本发明不仅对现有的光敏版进行了改进提高了其性能，同时避免了现有光敏版的铝版进行阳极氧化处理后的废酸液、废碱液对环境造成的污染问题，保护环境。
具体实施方式
实施例1
将粒径3000nm的氧化锌均匀喷涂在铝板上，然后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-4-磺酰氯和BTB225酚醛树脂反应得到的产物8g(2-重氮-1-萘酚-4-磺酰氯和BTB225酚醛树脂的羟基官能团的摩尔比为1:1)，0.5g的油溶蓝，20g的环氧树脂，35g的乙二醇单甲醚、35g的乙二醇单乙醚组成。
实施例2
将粒径200nm的二氧化铈均匀喷涂在铝板上，然后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-4-磺酰氯和丁醇反应得到的产 物8g(2-重氮-1-萘酚-4-磺酰氯和丁醇的摩尔比为1:20)，0.5g的油溶蓝，20g的环氧树脂，35g的甲乙酮、35g的二氧六环组成。
实施例3
将粒径3000nm的氧化铝均匀分散在酚醛树脂中，然后涂在铜板上，氧化铝和酚醛树脂的质量比为1:10；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-4-磺酰氯和数均分子量1000-10000的聚对羟基苯乙烯反应得到的产物10g(2-重氮-1-萘酚-4-磺酰氯和聚对羟基苯乙烯的羟基官能团的摩尔比为1:5)，0.4g的维多利亚纯蓝，15g的聚乙烯醇缩甲醛树脂，80g的溶剂二氧六环组成。
实施例4
将粒径500nm的二氧化钛均匀分散在丙烯酸树脂中，然后涂在铜板上，二氧化钛和丙烯酸树脂的质量比为1:10；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-4-磺酰氯和苯酚反应得到的产物10g(2-重氮-1-萘酚-4-磺酰氯和苯酚的摩尔比为1:10)，0.4g的维多利亚纯蓝，15g的聚乙烯醇缩甲醛树脂，80g的溶剂四氢呋喃组成。
实施例5
将粒径200nm的氧化锌均匀分散在丙烯酸酯树脂中，然后涂在铝板上，氧化锌和丙烯酸酯树脂的质量比为1:6；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-4-磺酰氯和三羟基二苯甲酮反应得到的产物12g(2-重氮-1-萘酚-4-磺酰氯和三羟基二苯甲酮的羟基官能团的摩尔比为1:8)，0.2g的靛蓝、0.2g的甲基紫，15g的聚氨酯树 脂，40g的甲乙酮、30g的醋酸丁酯组成。
实施例6
将粒径200nm的氧化钒均匀分散在阿拉伯树胶中，然后涂在铝板上，氧化钒和阿拉伯树胶的质量比为1:5；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-4-磺酰氯和对羟基苯酚反应得到的产物12g(2-重氮-1-萘酚-4-磺酰氯和对羟基苯酚的羟基官能团的摩尔比为1:15)，0.2g的靛蓝、0.2g的甲基紫，15g的聚氨酯树脂，40g的乙二醇单甲醚、30g的N-甲基吡咯烷酮组成。
实施例7
将粒径500nm的硅溶胶和醇酸树脂均匀分散在水中，然后涂在PP塑料板上，硅溶胶和醇酸树脂的质量比为1:1，硅溶胶和水的质量比为1:1；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和甲醇反应得到的产物9g(2-重氮-1-萘酚-5-磺酰氯和甲醇的摩尔比为1:18)，0.4g的碱性艳蓝，10g的环氧树脂，10g的聚氨酯树脂，40g的甲醇、40g的四氢呋喃组成。
实施例8
将粒径500nm的二氧化硅和醇酸树脂均匀分散在水中，然后涂在PP塑料板上，二氧化硅和醇酸树脂的质量比为1:1，二氧化硅和水的质量比为1:1；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和木糖醇反应得到的产物9g(2-重氮-1-萘酚-5-磺酰氯和木糖醇的羟基官能团的摩尔比 为1:16)，0.4g的碱性艳蓝，10g的环氧树脂，10g的聚氨酯树脂，40g的甲醇、40g的四氢呋喃组成。
实施例9
将粒径200nm的二氧化钛和环氧树脂均匀分散在溶剂甲酸丙酯中，然后涂在PVC塑料板上，二氧化钛和环氧树脂的质量比为4:1，二氧化钛和甲酸丙酯的质量比为1:5；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和17-99型聚乙烯醇反应得到的产物12g(2-重氮-1-萘酚-5-磺酰氯和17-99型聚乙烯醇的羟基官能团的摩尔比为1:12)，0.3g的靛蓝，25g的环氧树脂，60g的溶剂N-甲基吡咯烷酮组成。
实施例10
将粒径100nm的氧化锆和聚乙烯醇缩丁醛均匀分散在溶剂甲酸丙酯中，然后涂在PVC塑料板上，氧化锆和聚乙烯醇缩丁醛的质量比为4:1，氧化锆和甲酸丙酯的质量比为1:5；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和BX-20酚醛树脂反应得到的产物12g(2-重氮-1-萘酚-5-磺酰氯和BX-20酚醛树脂的羟基官能团的摩尔比为1:6)，0.3g的靛蓝，25g的环氧树脂，60g的溶剂N-甲基吡咯烷酮组成。
实施例11
将粒径1000nm的氧化镉、双环氧化丁二烯和聚酯、脲醛树脂均匀分散在溶剂四氢呋喃中，然后涂在铜板上，氧化镉与双环氧化丁二烯的质量比为25:1，氧化镉与聚酯的质量比为1:3，氧化镉与脲醛树脂的质量比为1:3，氧化镉与四氢呋喃的质量比为1:8；最后再以旋 涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和聚对羟基苯乙烯反应得到的产物8g(2-重氮-1-萘酚-5-磺酰氯和聚对羟基苯乙烯的羟基官能团的摩尔比为1:2)，0.2g的孔雀石绿，20g的环氧树脂，70g的溶剂甲乙酮，0.06g聚二甲基硅氧烷组成。
实施例12
将粒径500nm的粘土、异佛尔酮异氰酸酯和丙烯酸树脂、氨基树脂均匀分散在溶剂四氢呋喃中，然后涂在铜板上，粘土与异佛尔酮异氰酸酯的质量比为25:1，粘土与丙烯酸树脂的质量比为1:3，粘土与氨基树脂的质量比为1:3，粘土与四氢呋喃的质量比为1:8；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和三羟甲基乙烷反应得到的产物8g(2-重氮-1-萘酚-5-磺酰氯和三羟甲基乙烷的羟基官能团的摩尔比为1:10)，0.2g的孔雀石绿，20g的环氧树脂，70g的溶剂甲乙酮，0.06g烷基改性有机硅氧烷组成。
实施例13
将粒径500nm的氧化锆和二氧化钛、三乙二醇二乙烯基醚和酚醛树脂、环氧树脂均匀分散在乙二醇甲醚和丙酮的混合溶剂中，然后涂在铝板上，氧化锆和二氧化钛质量之和与三乙二醇二乙烯基醚的质量比为5:1，氧化锆和二氧化钛质量之和与酚醛树脂的质量比为5:1，氧化锆和二氧化钛质量之和与环氧树脂的质量比为5:1，氧化锆和二氧化钛质量之和与乙二醇甲醚的质量比为5:1，氧化锆和二氧化钛质量之和与丙酮的质量比为5:1，氧化锆和二氧化钛质量比为1:1；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和对羟基苯酚反应得到 的产物8g(2-重氮-1-萘酚-5-磺酰氯和对羟基苯酚的羟基官能团的摩尔比为1:3)，0.5g的结晶紫，15g的环氧树脂，60g的丙二醇独甲醚，0.03g聚醚聚酯改性有机硅氧烷组成。
实施例14
将粒径500nm的氧化锌和二氧化钛、交联剂热固性酚醛树脂和沥青树脂、环氧树脂均匀分散在石油醚和2-丁醇的混合溶剂中，然后涂在铝板上，氧化锌和二氧化钛质量之和与交联剂热固性酚醛树脂的质量比为5:1，氧化锌和二氧化钛质量之和与沥青树脂的质量比为5:1，氧化锌和二氧化钛质量之和与环氧树脂的质量比为5:1，氧化锌和二氧化钛质量之和与石油醚的质量比为5:1，氧化锌和二氧化钛质量之和与2-丁醇的质量比为5:1，氧化锌和二氧化钛质量比为1:1；最后再以旋涂法在上面涂覆一层感光液，烘干，即得光敏无砂目印版。
所述的感光液由2-重氮-1-萘酚-5-磺酰氯和三羟基二苯甲酮反应得到的产物8g(2-重氮-1-萘酚-5-磺酰氯和三羟基二苯甲酮的羟基官能团的摩尔比为1:4)，0.5g的结晶紫，15g的环氧树脂，60g的丙二醇独甲醚，0.03g聚二甲基硅氧烷组成。

Claims (10)

  1. 一种光敏无砂目印版，其特征在于，该印版由版基、亲水层和光敏层组成，亲水层、光敏层依次涂覆在版基之上。
  2. 根据权利要求1所述的光敏无砂目印版，其特征在于，所述的版基选自金属板、塑料板、或复合材料板。
  3. 根据权利要求1所述的光敏无砂目印版，其特征在于，所述的亲水层含有纳米级和/或微米级颗粒，所述的纳米级和/或微米级颗粒为纳米级或微米级粘土、硅溶胶、氧化锌、氧化铝、二氧化钛、二氧化硅、氧化镉、氧化钒、二氧化铈、氧化锆中的一种或几种。
  4. 根据权利要求1所述的光敏无砂目印版，其特征在于，所述的亲水层包含均匀分散的纳米级和/或微米级颗粒和树脂；所述的纳米级和/或微米级颗粒为纳米级或微米级粘土、硅溶胶、氧化锌、氧化铝、二氧化钛、二氧化硅、氧化镉、氧化钒、二氧化铈、氧化锆中的一种或几种。
  5. 根据权利要求1所述的光敏无砂目印版，其特征在于，所述的亲水层由包含均匀分散的纳米级和/或微米级颗粒、树脂和溶剂的组合物混合并研磨分散后涂覆在版基上得到；所述的纳米级和/或微米级颗粒为纳米级或微米级粘土、硅溶胶、氧化锌、氧化铝、二氧化钛、二氧化硅、氧化镉、氧化钒、二氧化铈、氧化锆中的一种或几种。
  6. 根据权利要求1所述的光敏无砂目印版，其特征在于，所述的亲水层由均匀分散的纳米级和/或微米级颗粒、树脂、交联剂和溶剂混合并研磨分散后涂覆在版基上得到；
    所述的纳米级和/或微米级颗粒为纳米级或微米级粘土、硅溶胶、氧化锌、氧化铝、二氧化钛、二氧化硅、氧化镉、氧化钒、二氧化铈、 氧化锆中的一种或几种；
    所述的交联剂与纳米级和/或微米级颗粒的质量比为(1:5)-(1:25)，所述的交联剂为多环氧单体类交联剂、环氧树脂、热固性酚醛树脂、聚氨酯类交联剂、或乙烯基醚类交联剂。
  7. 根据权利要求4-6任一所述的光敏无砂目印版，其特征在于，所述的树脂与纳米级和/或微米级颗粒的质量比为(1:10)-(10:1)，所述的树脂选自丙烯酸酯树脂、酚醛树脂、环氧树脂、聚氨酯、聚酯、脲醛树脂、聚乙烯醇缩甲醛、聚乙烯醇缩丁醛、氨基树脂、丙烯酸树脂、醇酸树脂、沥青树脂和阿拉伯树胶中的一种或几种。
  8. 根据权利要求5或6所述的光敏无砂目印版，其特征在于，所述的溶剂与纳米级和/或微米级颗粒的质量比为(1:1)-(10:1)，所述的溶剂选自酯类、石油醚、丙酮、丁酮、甲醇、乙醇、1-丙醇、2-丙醇、2-丁醇、2-甲基-2-丙醇、烷烃、甲苯、乙二醇独乙醚、乙二醇甲醚、丙二醇甲醚、乙醚、N-甲基吡咯烷酮、四氢呋喃、水、离子液体所组成的组中的至少一种；所述的酯类选自乙酸甲酯、甲酸乙酯、甲酸丙酯、甲酸异丙酯、乙酸乙酯、伽马丁内酯和乙酸丁酯中的一种或几种；所述的烷烃选自正庚烷、正己烷、正戊烷、环己烷中的一种或几种。
  9. 根据权利要求1所述的光敏无砂目印版，其特征在于，所述的光敏层由感光液涂覆在亲水层上得到；所述的感光液由8-12质量份的光活性化合物，0.2-0.5质量份的背景染料，15-25质量份的成膜树脂，60-80质量份的溶剂组成；
    所述的光活性化合物为2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与醇类化合物或酚类化合物反应得到的产物，或者2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与含醇羟基和/或酚羟基的高分子反应得到的产物；所述的2-重氮-1-萘酚-4-磺酰氯或2-重 氮-1-萘酚-5-磺酰氯与醇类化合物的醇羟基的摩尔比为(1:20)-(1:1)，所述的2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与酚类化合物的酚羟基的摩尔比为(1:20)-(1:1)，所述的2-重氮-1-萘酚-4-磺酰氯或2-重氮-1-萘酚-5-磺酰氯与含醇羟基和/或酚羟基的高分子的羟基官能团的摩尔比为(1:20)-(1:1)；
    所述的溶剂为丙二醇独甲醚、乙二醇单甲醚、乙二醇单乙醚、丙二醇单乙醚、甲乙酮、醋酸丁酯、二氧六环、N-甲基吡咯烷酮、甲醇、四氢呋喃中的一种或几种；
    所述的成膜树脂为不溶于水的聚合物，具体为环氧树脂、聚乙烯醇缩醛树脂、聚氨酯树脂中的一种或几种；
    所述的背景染料为碱性艳蓝、结晶紫、维多利亚纯蓝、靛蓝、甲基紫、孔雀石绿、油溶蓝中的一种或几种。
  10. 根据权利要求9所述的光敏无砂目印版，其特征在于，所述的感光液还含有0.01-0.1质量份的流平剂。
PCT/CN2014/088397 2013-11-04 2014-10-11 光敏无砂目印版 WO2015062404A1 (zh)

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