WO2015004392A1 - Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs - Google Patents
Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs Download PDFInfo
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- WO2015004392A1 WO2015004392A1 PCT/FR2014/051771 FR2014051771W WO2015004392A1 WO 2015004392 A1 WO2015004392 A1 WO 2015004392A1 FR 2014051771 W FR2014051771 W FR 2014051771W WO 2015004392 A1 WO2015004392 A1 WO 2015004392A1
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- copolymer
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- 239000007777 multifunctional material Substances 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical class CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 238000005329 nanolithography Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical class [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- VVRQVWSVLMGPRN-UHFFFAOYSA-N oxotungsten Chemical class [W]=O VVRQVWSVLMGPRN-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229920000885 poly(2-vinylpyridine) Polymers 0.000 description 1
- 229920005589 poly(ferrocenylsilane) Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005553 polystyrene-acrylate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000001542 size-exclusion chromatography Methods 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
- 238000000654 solvent vapour annealing Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Graft Or Block Polymers (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020167003522A KR101779729B1 (ko) | 2013-07-11 | 2014-07-10 | 블락 공중합체의 블락 각각에 존재하는 것들과 적어도 부분적으로 상이한 단량체의, 통계 또는 구배 공중합체를 이용한, 블락 공중합체의 나노도메인 수직배향 방법 |
SG11201600135PA SG11201600135PA (en) | 2013-07-11 | 2014-07-10 | Method for the perpendicular orientation of nanodomains of block copolymers, using statistical or gradient copolymers, the monomers of which differ at least in part from those present in each of the blocks of the block copolymer |
JP2016524877A JP6143955B2 (ja) | 2013-07-11 | 2014-07-10 | ブロックコポリマーのそれぞれのブロック中に存在するモノマーとは少なくとも部分的に異なるモノマーのランダムコポリマーまたはグラジエントコポリマーを使ったブロックコポリマー・ナノドメインの垂直配向方法 |
US14/904,325 US20160154302A1 (en) | 2013-07-11 | 2014-07-10 | Method for the perpendicular orientation of nanodomains of block copolymers, using statistical or gradient copolymers, the monomers of which differ at least in part from those present in each of the blocks of the block copolymer |
CN201480047816.8A CN105492971B (zh) | 2013-07-11 | 2014-07-10 | 通过无规共聚物控制嵌段共聚物介观结构的取向的方法 |
EP14747091.8A EP3019915A1 (fr) | 2013-07-11 | 2014-07-10 | Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR13.56831 | 2013-07-11 | ||
FR1356831A FR3008413B1 (fr) | 2013-07-11 | 2013-07-11 | Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015004392A1 true WO2015004392A1 (fr) | 2015-01-15 |
Family
ID=49293706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2014/051771 WO2015004392A1 (fr) | 2013-07-11 | 2014-07-10 | Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs |
Country Status (8)
Country | Link |
---|---|
US (1) | US20160154302A1 (fr) |
EP (1) | EP3019915A1 (fr) |
JP (1) | JP6143955B2 (fr) |
KR (1) | KR101779729B1 (fr) |
CN (1) | CN105492971B (fr) |
FR (1) | FR3008413B1 (fr) |
SG (1) | SG11201600135PA (fr) |
WO (1) | WO2015004392A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108369374A (zh) * | 2015-12-18 | 2018-08-03 | 阿科玛法国公司 | 改进嵌段共聚物的有序膜的临界尺寸均匀性的方法 |
CN108369373A (zh) * | 2015-12-18 | 2018-08-03 | 阿科玛法国公司 | 获得具有提高的周期的包含嵌段共聚物的厚有序膜的方法 |
CN108463772A (zh) * | 2015-12-18 | 2018-08-28 | 阿科玛法国公司 | 减少嵌段共聚物的有序膜中的缺陷的方法 |
CN108475009A (zh) * | 2015-12-18 | 2018-08-31 | 阿科玛法国公司 | 减少嵌段共聚物的有序膜的结构化时间的方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102396957B1 (ko) | 2017-08-22 | 2022-05-13 | 에스케이이노베이션 주식회사 | 중성층 형성용 랜덤 공중합체 및 이를 포함하는 패턴 형성용 적층체, 이를 이용한 패턴 형성 방법 |
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CN1412220A (zh) * | 2002-07-12 | 2003-04-23 | 天津大学 | 聚乙二醇-b-聚乳酸两亲性二嵌段共聚物的制备方法 |
US20080318005A1 (en) * | 2007-06-19 | 2008-12-25 | Millward Dan B | Crosslinkable Graft Polymer Non-Preferentially Wetted by Polystyrene and Polyethylene Oxide |
US7521094B1 (en) * | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
US20090181171A1 (en) * | 2008-01-11 | 2009-07-16 | International Business Machines Corporation | Method of Controlling Orientation of Domains in Block Copolymer Films |
US20100147984A1 (en) * | 2008-12-15 | 2010-06-17 | Loftness Specialized Equipment, Inc. | Rotor for tree mulching machine |
US20100167214A1 (en) * | 2008-12-31 | 2010-07-01 | Dong Ki Yoon | Method of forming fine pattern using block copolymer |
WO2012084558A1 (fr) * | 2010-12-23 | 2012-06-28 | Asml Netherlands B.V. | Procédés pour fournir des gabarits d'orientation à motifs pour des polymères auto-assemblables destinés à être utilisés dans un dispositif lithographique |
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FR2784111B1 (fr) * | 1998-10-06 | 2003-08-01 | Atochem Elf Sa | Polymerisatin radicalaire en presence de plusieurs radicaux libres stables |
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US9028859B2 (en) * | 2006-07-07 | 2015-05-12 | Advanced Cardiovascular Systems, Inc. | Phase-separated block copolymer coatings for implantable medical devices |
US7989026B2 (en) * | 2008-01-12 | 2011-08-02 | International Business Machines Corporation | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films |
US8623458B2 (en) * | 2009-12-18 | 2014-01-07 | International Business Machines Corporation | Methods of directed self-assembly, and layered structures formed therefrom |
JP6035017B2 (ja) * | 2010-10-04 | 2016-11-30 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | 下層組成物および下層を像形成する方法 |
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JP5973763B2 (ja) * | 2012-03-28 | 2016-08-23 | 東京エレクトロン株式会社 | 自己組織化可能なブロック・コポリマーを用いて周期パターン形成する方法及び装置 |
-
2013
- 2013-07-11 FR FR1356831A patent/FR3008413B1/fr not_active Expired - Fee Related
-
2014
- 2014-07-10 EP EP14747091.8A patent/EP3019915A1/fr not_active Withdrawn
- 2014-07-10 KR KR1020167003522A patent/KR101779729B1/ko active IP Right Grant
- 2014-07-10 WO PCT/FR2014/051771 patent/WO2015004392A1/fr active Application Filing
- 2014-07-10 US US14/904,325 patent/US20160154302A1/en not_active Abandoned
- 2014-07-10 SG SG11201600135PA patent/SG11201600135PA/en unknown
- 2014-07-10 CN CN201480047816.8A patent/CN105492971B/zh not_active Expired - Fee Related
- 2014-07-10 JP JP2016524877A patent/JP6143955B2/ja not_active Expired - Fee Related
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US20090181171A1 (en) * | 2008-01-11 | 2009-07-16 | International Business Machines Corporation | Method of Controlling Orientation of Domains in Block Copolymer Films |
US7521094B1 (en) * | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108369374A (zh) * | 2015-12-18 | 2018-08-03 | 阿科玛法国公司 | 改进嵌段共聚物的有序膜的临界尺寸均匀性的方法 |
CN108369373A (zh) * | 2015-12-18 | 2018-08-03 | 阿科玛法国公司 | 获得具有提高的周期的包含嵌段共聚物的厚有序膜的方法 |
CN108463772A (zh) * | 2015-12-18 | 2018-08-28 | 阿科玛法国公司 | 减少嵌段共聚物的有序膜中的缺陷的方法 |
CN108475009A (zh) * | 2015-12-18 | 2018-08-31 | 阿科玛法国公司 | 减少嵌段共聚物的有序膜的结构化时间的方法 |
Also Published As
Publication number | Publication date |
---|---|
JP6143955B2 (ja) | 2017-06-07 |
CN105492971B (zh) | 2019-09-10 |
US20160154302A1 (en) | 2016-06-02 |
SG11201600135PA (en) | 2016-02-26 |
KR20160040579A (ko) | 2016-04-14 |
JP2016525592A (ja) | 2016-08-25 |
EP3019915A1 (fr) | 2016-05-18 |
FR3008413B1 (fr) | 2015-08-07 |
CN105492971A (zh) | 2016-04-13 |
KR101779729B1 (ko) | 2017-09-18 |
FR3008413A1 (fr) | 2015-01-16 |
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