WO2015000576A1 - Tib2 schichten und ihre herstellung - Google Patents

Tib2 schichten und ihre herstellung Download PDF

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Publication number
WO2015000576A1
WO2015000576A1 PCT/EP2014/001781 EP2014001781W WO2015000576A1 WO 2015000576 A1 WO2015000576 A1 WO 2015000576A1 EP 2014001781 W EP2014001781 W EP 2014001781W WO 2015000576 A1 WO2015000576 A1 WO 2015000576A1
Authority
WO
WIPO (PCT)
Prior art keywords
workpiece
coating
tib
layer
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2014/001781
Other languages
German (de)
English (en)
French (fr)
Inventor
Denis Kurapov
Siegfried Krassnitzer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Trading AG Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to PL14735472T priority Critical patent/PL3017078T3/pl
Priority to RU2016103250A priority patent/RU2016103250A/ru
Priority to EP14735472.4A priority patent/EP3017078B1/de
Priority to CA2916769A priority patent/CA2916769C/en
Priority to CN201480038313.4A priority patent/CN105492652B/zh
Priority to MX2016000044A priority patent/MX374908B/es
Priority to US14/902,628 priority patent/US10378095B2/en
Priority to BR112015032908-0A priority patent/BR112015032908B1/pt
Priority to JP2016522327A priority patent/JP6561048B2/ja
Application filed by Oerlikon Trading AG Truebbach filed Critical Oerlikon Trading AG Truebbach
Priority to KR1020167002709A priority patent/KR102234455B1/ko
Priority to SG11201510769SA priority patent/SG11201510769SA/en
Priority to MYPI2015704821A priority patent/MY186024A/en
Publication of WO2015000576A1 publication Critical patent/WO2015000576A1/de
Priority to PH12015502841A priority patent/PH12015502841A1/en
Priority to IL243433A priority patent/IL243433B/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material

Definitions

  • the present invention relates to a coating comprising at least one TiB 2 layer.
  • TiB 2 As a layer material for tools.
  • US Pat. No. 4,820,392 describes how a TiB 2 layer is applied to tools by means of a sputtering process.
  • the material applied in this way is distinguished by good mechanical and tribological properties, in practice a higher density and even greater hardness are desired.
  • ⁇ 2 is a material with a very high melting point, so-called arc evaporation, which would lead to denser and therefore harder layers, can not be used economically.
  • HiPIMS High Power Impulse Magnetron Sputtering
  • the sputter cathode must be pulsed with power to give it time to dissipate the heat input associated with the power.
  • the HiPIMS method therefore requires a pulse generator as the power source.
  • This pulse generator must be able to deliver very high power pulses, but they are very short.
  • the pulse generators available today show little flexibility in terms of, for example, pulse height and / or pulse duration. Ideally, a square pulse should be delivered. In most cases, however, the power output within a pulse is highly time-dependent, which has an immediate effect on the layer properties, such as hardness, adhesion, residual stress, etc. In addition, the coating rate is adversely affected by the deviation from the rectangular profile. In particular, these difficulties raise questions regarding the reproduction quarket.
  • the layers are produced by means of a sputtering method in which the power output of the power source is constantly high.
  • a sputtering method in which the power output of the power source is constantly high.
  • Several sputtering cathodes are used. Unlike the conventional HiPIMS method, no pulse generator is used, but at first only a first sputtering cathode is charged with the full power of the power source and thus with high power density. Subsequently, a second sputtering cathode is connected to the outputs of the power source.
  • the inventors have now found that when such a method with ceramic targets, eg with TiB 2 targets are operated as sputtering cathodes, it is possible to reproducibly produce layers with very good mechanical properties. Furthermore, the inventors have found that in such a non-reactive process by adjusting the partial pressure of the working gas, the layer roughness can be directly influenced without significant adverse influence on the above-mentioned mechanical properties.
  • TiB 2 layers were produced. These layers have a texture that leads to distinct peaks in the XRD spectrum, indicating a pronounced (001) orientation. Such an orientation proves to be very advantageous in many applications in which hard material layers are needed.
  • the present invention has disclosed a method for the efficient and economical production of TiB 2 layers.
  • This process results in TiB 2 layers of previously unknown hardness combined with very low roughness values. This is very interesting especially in the context of applications on sliding surfaces.
  • the previous conventional PVD sputtering processes did not allow the production of such hard TiB 2 layers.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
PCT/EP2014/001781 2013-07-03 2014-06-30 Tib2 schichten und ihre herstellung Ceased WO2015000576A1 (de)

Priority Applications (14)

Application Number Priority Date Filing Date Title
JP2016522327A JP6561048B2 (ja) 2013-07-03 2014-06-30 ＴｉＢ２を含有する層で工作物をコーティングする方法
EP14735472.4A EP3017078B1 (de) 2013-07-03 2014-06-30 Tib2-schichten und ihre herstellung
CA2916769A CA2916769C (en) 2013-07-03 2014-06-30 Tib2 layers and manufacture thereof
CN201480038313.4A CN105492652B (zh) 2013-07-03 2014-06-30 TiB2层及其制造
MX2016000044A MX374908B (es) 2013-07-03 2014-06-30 CAPAS DE TiB2 Y USO DE LAS MISMAS.
US14/902,628 US10378095B2 (en) 2013-07-03 2014-06-30 TiB2 layers and manufacture thereof
BR112015032908-0A BR112015032908B1 (pt) 2013-07-03 2014-06-30 Método para o revestimento de pelo menos uma peça de trabalho tendo uma camada de tib2
PL14735472T PL3017078T3 (pl) 2013-07-03 2014-06-30 WARSTWY TiB2 I ICH WYTWARZANIE
KR1020167002709A KR102234455B1 (ko) 2013-07-03 2014-06-30 Tib2 층 및 그의 사용
RU2016103250A RU2016103250A (ru) 2013-07-03 2014-06-30 СЛОИ TiB2 И ИХ ИЗГОТОВЛЕНИЕ
SG11201510769SA SG11201510769SA (en) 2013-07-03 2014-06-30 Tib2 layers and use thereof
MYPI2015704821A MY186024A (en) 2013-07-03 2014-06-30 Tib2 layers and manufacture thereof
PH12015502841A PH12015502841A1 (en) 2013-07-03 2015-12-21 Tib2 layers and use thereof
IL243433A IL243433B (en) 2013-07-03 2015-12-31 Titanium bibory layers and their production

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013011075.0A DE102013011075A1 (de) 2013-07-03 2013-07-03 TiB2 Schichten und ihre Herstellung
DE102013011075.0 2013-07-03

Publications (1)

Publication Number Publication Date
WO2015000576A1 true WO2015000576A1 (de) 2015-01-08

Family

ID=51063397

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2014/001781 Ceased WO2015000576A1 (de) 2013-07-03 2014-06-30 Tib2 schichten und ihre herstellung

Country Status (17)

Country Link
US (1) US10378095B2 (enExample)
EP (1) EP3017078B1 (enExample)
JP (1) JP6561048B2 (enExample)
KR (1) KR102234455B1 (enExample)
CN (1) CN105492652B (enExample)
BR (1) BR112015032908B1 (enExample)
CA (1) CA2916769C (enExample)
DE (1) DE102013011075A1 (enExample)
HU (1) HUE053539T2 (enExample)
IL (1) IL243433B (enExample)
MX (1) MX374908B (enExample)
MY (1) MY186024A (enExample)
PH (1) PH12015502841A1 (enExample)
PL (1) PL3017078T3 (enExample)
RU (1) RU2016103250A (enExample)
SG (1) SG11201510769SA (enExample)
WO (1) WO2015000576A1 (enExample)

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CN105755440B (zh) * 2016-04-19 2019-04-02 中国科学院宁波材料技术与工程研究所 一种耐海水腐蚀的硬质涂层及其制备方法
CN108251803B (zh) * 2016-12-29 2020-06-02 深圳先进技术研究院 TiB2自润滑涂层及其制备方法和耐磨构件
CN107740043B (zh) * 2017-10-25 2019-08-23 深圳先进技术研究院 掺杂CaF2的TiB2涂层、CaF2和TiB2复合涂层、其制备方法和应用及刀具
CN109136608B (zh) * 2018-08-22 2020-06-09 北京理工大学 一种取向可控的TiB晶须增强钛基复合材料的制备方法
CN110484881B (zh) * 2019-08-15 2021-09-07 广东工业大学 一种致密二硼化钛涂层及其制备方法和应用
CN112359395B (zh) * 2020-10-15 2021-09-24 安徽工业大学 一种金属硼化物涂层的制备方法
CN113981369A (zh) * 2021-10-28 2022-01-28 赣州澳克泰工具技术有限公司 多层涂层系统及其制备方法
CN115612984B (zh) * 2022-09-09 2024-09-20 中国科学院金属研究所 一种应力和结构梯度的二硼化钛涂层及其制备方法

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Also Published As

Publication number Publication date
US10378095B2 (en) 2019-08-13
CN105492652A (zh) 2016-04-13
MX2016000044A (es) 2016-05-31
EP3017078B1 (de) 2020-12-16
BR112015032908B1 (pt) 2022-03-15
KR102234455B1 (ko) 2021-04-01
US20160186306A1 (en) 2016-06-30
CA2916769C (en) 2022-03-08
MY186024A (en) 2021-06-15
RU2016103250A (ru) 2017-08-09
JP2016527392A (ja) 2016-09-08
SG11201510769SA (en) 2016-02-26
IL243433B (en) 2019-06-30
PL3017078T3 (pl) 2021-06-28
CN105492652B (zh) 2018-09-28
JP6561048B2 (ja) 2019-08-14
EP3017078A1 (de) 2016-05-11
KR20160029815A (ko) 2016-03-15
PH12015502841A1 (en) 2018-08-20
DE102013011075A1 (de) 2015-01-08
CA2916769A1 (en) 2015-01-08
MX374908B (es) 2025-03-06
IL243433A0 (en) 2016-02-29
BR112015032908A2 (enExample) 2017-07-25
HUE053539T2 (hu) 2021-07-28

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