WO2014199583A1 - 赤外線センサ - Google Patents
赤外線センサ Download PDFInfo
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- WO2014199583A1 WO2014199583A1 PCT/JP2014/002866 JP2014002866W WO2014199583A1 WO 2014199583 A1 WO2014199583 A1 WO 2014199583A1 JP 2014002866 W JP2014002866 W JP 2014002866W WO 2014199583 A1 WO2014199583 A1 WO 2014199583A1
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- infrared
- slit
- protrusions
- infrared sensor
- sensor according
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0022—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiation of moving bodies
- G01J5/0025—Living bodies
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- G—PHYSICS
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
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- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/041—Mountings in enclosures or in a particular environment
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- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/12—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using thermoelectric elements, e.g. thermocouples
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
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- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J2005/202—Arrays
Definitions
- the present invention relates to an infrared sensor that detects infrared rays.
- An infrared sensor includes a film-like infrared absorber formed on a semiconductor substrate such as silicon, a detection element formed on the infrared absorber, and a switching element for reading the output of the detector (Patent) Reference 1).
- the infrared absorbing portion has a multilayer structure in which materials, film thicknesses, and the like are determined so as to reduce residual stress in order to reduce breakage and to reduce abnormal operation of the switching element.
- Patent Documents 2 and 3 are disclosed.
- an infrared sensor having an infrared absorbing film such as a metal oxide film requires a special film forming apparatus, and thus the manufacturing cost increases. Further, since the infrared absorbing film is porous, there is a fear that the processing resistance is insufficient. In addition, since the infrared absorbing film has a thickness of several ⁇ m or more, the heat capacity of the infrared absorbing portion increases, and the response speed may decrease.
- an object of the present invention is to reduce manufacturing costs. It is another object of the present invention to provide a highly sensitive infrared sensor. Moreover, it aims at providing the infrared sensor which can reduce a heat capacity.
- the first infrared absorption unit the infrared detection unit that detects infrared rays based on the infrared rays absorbed by the first infrared absorption unit, and the metal or silicon nitride film, the first infrared absorption unit
- An infrared sensor is provided that includes a plurality of protrusions arranged on the surface thereof so as to be separated from each other.
- an infrared sensor that is low in manufacturing cost, is highly sensitive, or reduces an increase in heat capacity.
- the sensitivity of the infrared detection unit is illustrated. is there. It is an equivalent circuit diagram of a sensor chip provided in the infrared sensor according to the embodiment. It is the schematic of arrangement
- the infrared sensor As shown in FIG. 1, the infrared sensor according to the embodiment includes a substrate 11, a sensor chip 2, an integrated circuit (IC) 15, a shield cover 16, a lens 17, and a case 18.
- the infrared sensor which concerns on embodiment receives infrared rays, for example, detects the temperature distribution in a visual field, the position of a heat source, etc.
- the substrate 11 is generally a rectangular flat plate, and is composed of a multilayer substrate such as a ceramic substrate or a resin-based printed substrate.
- the substrate 11 is formed with circuit wiring connected to the sensor chip 2, the IC 15 and the like.
- the substrate 11 is connected to a ground potential, and is connected to a case 18 with a bonding electrode 12, a thermistor 13 that detects a temperature for correcting the temperature detected by the sensor chip 2, and a circuit element 14 such as a resistor. Is provided on the upper surface.
- the bonding electrode 12 is formed in a frame shape so as to border the upper surface of the substrate 11.
- the sensor chip 2 is roughly a rectangular flat plate shape and has a light receiving surface on the upper surface.
- the sensor chip 2 and the IC 15 are arranged side by side along the longitudinal direction of the substrate 11 and are mounted on the upper surface of the substrate 11 by die bonding, for example.
- the sensor chip 2 and the IC 15 are electrically connected to each other by a wire 82 formed by wire bonding (see FIG. 2).
- the IC 15 is electrically connected to the circuit wiring of the substrate 11 by a wire 83 such as gold (Au) or aluminum (Al) formed by wire bonding.
- the sensor chip 2 and the IC 15 may be electrically connected to the circuit wiring of the substrate 11 by flip chip or the like.
- the shield cover 16 blocks infrared rays that are about to enter the sensor chip 2 and infrared rays that are about to enter the IC 15 from outside the field of view.
- the shield cover 16 is generally rectangular parallelepiped box-shaped, and opens on the entire lower surface.
- the shield cover 16 shields infrared rays together with the shield layer formed on the substrate 11 by bonding the lower end portion of the side wall portion to the substrate 11 with a conductive resin or the like so as to cover the sensor chip 2 and the IC 15.
- the shield cover 16 is made of a metal material such as Kovar, for example.
- the shield cover 16 has a rectangular incident window 161 on a part of the upper surface above the sensor chip 2.
- the incident window 161 is transparent to infrared rays, and is, for example, a through hole.
- the incident window 161 makes infrared light incident on the light receiving surface of the sensor chip 2.
- the lens 17 is generally a rectangular flat plate, and is a convex lens in which one surface (upper surface) is a flat surface and the other surface (lower surface) is a convex surface.
- the lens 17 is disposed above the sensor chip 2 in parallel with the light receiving surface of the sensor chip 2.
- the lens 17 is configured to form an infrared image on the light receiving surface of the sensor chip 2.
- the lens 17 only needs to have a function of forming an infrared image on the light receiving surface of the sensor chip 2.
- both surfaces of the lens 17 may be formed as convex surfaces, or one surface may be formed as a concave surface and the other surface may be formed as a convex surface having a larger curvature than the concave surface.
- the convex surface and concave surface of the lens 17 may have various curvatures such as a paraboloid.
- the case 18 is generally a rectangular parallelepiped box shape, and the entire lower surface is opened. Case 18 is made of metal.
- the case 18 is installed on the substrate 11 by bonding the lower end portion of the side wall portion to the bonding electrode 12 of the substrate 11 with a conductive resin or the like so as to cover the shield cover 16.
- the case 18 has a rectangular incident window 181 on a part of the upper surface above the sensor chip 2.
- the incident window 181 is transparent to infrared rays, and is, for example, a through hole.
- the incident window 181 has a rectangular shape along the lens 17 so that the upper surface of the lens 17 can be joined to the periphery of the incident window 181 from below the case 18.
- the entrance window 181 holds the lens 17 by bonding the upper surface of the lens 17 to the periphery.
- the incident window 181 causes infrared rays to enter the sensor chip 2 through the lens 17.
- the lens 17 is bonded around the entrance window 181 with resin or the like, and the lower end portion of the side wall portion is bonded to the bonding electrode 12 of the substrate 11, thereby sealing the inside.
- the inside of the case 18 is filled with an inert gas such as nitrogen gas or is in a vacuum atmosphere.
- the infrared sensor receives infrared rays emitted from a target P such as a person on the light receiving surface of the sensor chip 2 via the lens 17.
- the IC 15 can read the output of the sensor chip 2 based on the received infrared rays and output it as a two-dimensional thermal image.
- the sensor chip 2 includes a plurality of pixel units 21 arranged in, for example, an 8 ⁇ 8 grid, and a plurality of pad units 80 connected to the pixel unit 21.
- the plurality of pixel units 21 constitute a light receiving surface of the sensor chip 2 and output signals corresponding to the received infrared rays.
- the plurality of pad portions 80 are electrodes for inputting and outputting signals to the pixel portion 21.
- the pixel unit 21 includes a frame-shaped support unit 22, a plurality of temperature sensing units 23 supported by the support unit 22, and a MOSFET 4 formed on one side of the support unit 22, respectively. Is provided.
- One pixel unit 21 corresponds to one pixel of a thermal image processed by the infrared sensor according to the embodiment.
- the pixel unit 21 is configured by, for example, a semiconductor substrate 201 such as silicon, a thin film layer (202, 203), an interlayer insulating film 204, and a passivation film 205 that are sequentially stacked.
- the thin film layers (202, 203) are, for example, a silicon oxide film (SiO 2 ) 202 having a thickness of about 0.3 ⁇ m and a silicon nitride film having a thickness of about 0.25 ⁇ m formed on the upper surface of the silicon oxide film 202. And a film (Si 3 N 4 ) 203.
- the interlayer insulating film 204 is made of, for example, boron phosphorus silicate glass (BPSG) and has a thickness of about 0.8 ⁇ m.
- the passivation film 205 is made of, for example, a non-doped silicate glass (NSG) film or a phosphorus silicate glass (PSG), and has a thickness of about 0.5 ⁇ m.
- the pixel portion 21 has a gap portion 20 formed by selectively removing the upper portion of the semiconductor substrate 201 so as to leave the support portion 22 at the peripheral portion.
- Each of the temperature sensing parts 23 has a generally rectangular flat plate shape, and is formed, for example, so as to extend three by two from two opposite sides of the support part 22.
- the temperature sensing part 23 is disposed above the gap part 20 so as to close the gap part 20 and is supported by connecting one side by the support part 22.
- the temperature sensing unit 23 is divided into a first slit and a third slit 28 that penetrate from the upper surface of the passivation film 205 to the lower surface of the thin film layers (202, 203).
- the extending direction of the first slit is perpendicular to the extending direction of the infrared detecting unit 31 on the infrared absorbing unit 24.
- the extending direction of the third slit is perpendicular to the extending direction of the first slit.
- vertical includes “substantially vertical” allowing design errors.
- angular part of the temperature sensing part 23 which mutually adjoins is mutually connected by the X-shaped connection piece 25.
- the temperature sensing part 23 has a second slit 29 formed in a U shape in a plan view and penetrating from the upper surface of the passivation film 205 to the lower surface of the thin film layer (202, 203).
- the temperature sensing part 23 has an infrared absorption part 24 having a cantilever structure by the second slit 29.
- the infrared absorbing unit 24 is connected to the tip side of the temperature sensing unit 23 that is not connected to the support unit 22.
- an infrared detection part 31 that is a thermopile composed of a plurality of thermocouples connected in series is formed.
- the infrared detectors 31 are all connected in series with respect to one pixel unit 21.
- the infrared detector 31 includes a polysilicon layer 300 having a thickness of about 0.45 ⁇ m, a hot junction T1, and a cold junction T2 formed on the upper surface of the thin film layers (202, 203).
- the polysilicon layer 300 is located between the thin film layers (202, 203) and the interlayer insulating film 204.
- the temperature contact point T1 is formed on the tip side of the temperature sensing part 23 so as to be away from the two sides of the support part 22 connected to the temperature sensing part 23. Since the hot junction T1 is disposed so as to be separated from the support portion 22 in the central portion in the region of the plurality of temperature sensing portions 23, the temperature change of the hot junction T1 can be increased. Can be improved.
- the cold junction T ⁇ b> 2 is formed on the support part 22 on the two sides connected to the temperature sensing part 23.
- the polysilicon layer 300 of the infrared detecting unit 31 that alternately connects a plurality of hot junctions T1 and cold junctions T2 in series is doped so as to be alternately n-type and p-type.
- the n-type and p-type polysilicon layers 300 constituting the infrared detecting unit 31 are separated at the hot junction T1 and the cold junction T2, and at the hot junction T1 and the cold junction T2, the connection portion made of a metal material containing Al or the like is used. Electrically connected.
- the polysilicon layer 300 of the infrared detection unit 31 in the vicinity of the hot junction T1 is an infrared absorption layer 34 formed so as to have a larger area than other parts, and easily absorbs infrared rays.
- the polysilicon layer 300 is formed in the infrared absorption part 26 which is the front-end
- the polysilicon layer 300 formed in the infrared absorbing portion 24 is an n-type infrared absorbing layer 32
- the polysilicon layer 300 formed in the infrared absorbing portion 26 is an n-type infrared absorbing layer 33.
- the corners of the infrared absorbing layers 33 adjacent to each other are connected to each other by a reinforcing layer 35 that is an n-type doped X-shaped polysilicon layer 300 in the connecting piece 25.
- the sensor chip 2 includes a diagnostic heater 36 that is an n-type doped polysilicon layer 300 that is routed over one side of all the temperature sensing parts 23 and all the support parts 22. By energizing the diagnostic heater 36, it is possible to detect the presence or absence of breakage of the temperature sensing portion 23, the support portion 22, and the like.
- the infrared absorbing parts 24 and 26 are composed of a first infrared absorbing part which is a thin film layer (202, 203), a polysilicon layer 300 and an interlayer insulating film 204, and a second infrared absorbing part which is a passivation film 205.
- the infrared absorbers 24 and 26 include a plurality of protrusions 6 having a metal or silicon nitride film on the upper surface of the first infrared absorber and arranged so as to be separated from each other.
- the plurality of protrusions 6 are preferably arranged periodically.
- the protrusion 6 is made of a metal including, for example, aluminum (Al), titanium (Ti), tungsten (W), gold (Au), copper (Cu), or the like.
- the protrusion 6 may be an aluminum alloy such as Al—Si, Al—Si—Cu, or Al—Cu, a metal nitride such as TiN, or a silicon nitride film.
- the passivation film 205 that is the second infrared absorbing portion is formed on the upper surfaces of the first infrared absorbing portion and the plurality of protruding portions 6 so as to cover the plurality of protruding portions 6.
- the plurality of protrusions 6 are arranged in a two-dimensional array with a period T shorter than the wavelength ⁇ of infrared rays absorbed by the infrared absorbing portions 24 and 26.
- the wavelength ⁇ is an infrared target wavelength desired to be detected by the infrared sensor according to the embodiment.
- the wavelength ⁇ can be set to 10 ⁇ m.
- the planar dimensions of the projections 6 in the square lattice line direction can be 2 ⁇ m
- the gap can be 2 ⁇ m
- the period T can be 4 ⁇ m.
- the plurality of protrusions 6 Since the plurality of protrusions 6 have periodicity corresponding to the wavelength ⁇ , they have a standing wave mode corresponding to the period T in the gap between them. In the case where the standing wave mode corresponds to the wavelength of infrared rays from the target P, the first infrared absorbing portion in which the protrusions 6 are formed has an improved absorption (emission) rate with respect to the received infrared rays.
- the plurality of protrusions 6 have plasmons which are collective vibrations of free electrons of metal constituting the protrusions 6, which are influenced by the periodicity and resonate with infrared rays, and the surface of the protrusions 6 corresponds to the period T. A specific plasmon is excited.
- the first infrared absorbing portion in which the protrusion 6 is formed has an improved absorption (emission) rate with respect to the received infrared ray.
- the sensitivity of the infrared detection unit 31 of the sensor chip 2 including the protrusion 6 formed of Al is higher than that in the case where the sensor chip 2 does not include the protrusion 6.
- the sensitivity of the infrared detection unit 31 of the sensor chip 2 including the protrusion 6 formed of Al is higher than that of the case of including the protrusion 6 formed of Si 3 N 4 , polysilicon, and SiO 2 , respectively. It is high.
- the protrusion 6 made of metal can improve the sensitivity of the infrared detection unit 31.
- the absorption by the standing wave becomes remarkable when the height of the protrusion 6 is deep, and the absorption by the plasmon becomes remarkable when the height of the protrusion 6 is shallow.
- the height of the protrusion 6 may be determined so that the absorption by the standing wave and the absorption by the plasmon are maximized.
- the thickness can be about 1 ⁇ m.
- the plurality of protrusions 6 are formed on the infrared absorption parts 24 and 26 in accordance with the infrared wavelength ⁇ , so that the infrared absorption parts 24 and 26 have an improved infrared absorption rate.
- the plurality of hot junctions T1 are arranged on the infrared absorbing portions 24 and 26, respectively, so that the temperature change of the hot junction T1 can be increased, and infrared rays are detected based on the infrared rays absorbed by the infrared absorbing portions 24 and 26. It is possible to improve the sensitivity of the infrared detecting unit 31 that performs.
- Each MOSFET 4 is a field effect transistor formed in a p + type well region 41 embedded on the upper surface side of the semiconductor substrate 201 of the support portion 22 as shown in FIG. 5A.
- Each MOSFET 4 is n + type, and has a drain region 42 and a source region 43 that are formed apart from each other on a part of the upper surface side of the well region 41.
- a p ++ type channel stopper region 44 formed so as to surround the drain region 42 and the source region 43 is formed.
- a gate insulating film 45 made of a silicon oxide film (thermal oxide film) is formed on the upper surface of the well region 41 located between the drain region 42 and the source region 43, and an n-type is formed on the upper surface of the gate insulating film 45.
- a gate electrode 46 made of polysilicon is formed.
- a drain electrode 47 and a source electrode 48 made of a metal containing Al or the like are formed on the upper surfaces of the drain region 42 and the source region 43, respectively.
- an electrode 49 made of a metal containing Al or the like is formed on the upper surface of the channel stopper region 44.
- the gate electrode 46, the drain electrode 47, the source electrode 48, and the electrode 49 are each formed so as to fill a contact hole (not shown) formed in the interlayer insulating film 204.
- the pixel unit 21 includes a first wiring 51, a second wiring 52, a third wiring 53, and a fourth wiring 54 formed on one side of the support unit 22.
- the first wiring 51, the third wiring 53, and the fourth wiring 54 are formed on one side where the MOSFET 4 is formed, and the second wiring 52 is formed on one side orthogonal to the one side where the MOSFET 4 is formed.
- the first wiring 51 is connected to the output pads Vout 1 to Vout 8 and connected to the drain electrode 47 of the MOSFET 4 for each column of the pixel unit 21.
- the second wiring 52 is connected to the selection pads Vsel1 to Vsel8 and connected to the gate electrode 46 of the MOSFET 4 for each row of the pixel unit 21.
- the third wiring 53 is connected to the common pad Vch and connected to the well region 41 of the MOSFET 4 of each pixel unit 21.
- the fourth wiring 54 is connected to the reference pad Vref and is connected to one end of the infrared detection unit 31 of each pixel unit 21.
- the reference pad Vref is connected to a reference potential.
- the other end of the infrared detector 31 is connected to the source electrode 48.
- the sensor chip 2 includes a substrate pad Vsu connected to the semiconductor substrate 201.
- the potentials of the selection pads Vsel1 to Vsel8 are controlled by the IC 15 so that the MOSFETs 4 are sequentially turned on, so that the output pads Vout1 to Vout8 can output the output voltages of the pixel units 21 to the IC 15 sequentially.
- the sensor chip 2 includes a plurality of Zener diodes ZD that prevent an overvoltage from being applied between the gate electrode 46 and the source electrode 48 of each MOSFET 4.
- the cathode of each Zener diode ZD is connected to the second wiring 52, and the anode is connected to the protective pad Vzd.
- the infrared sensor by providing the plurality of protrusions 6 arranged so as to be separated from each other, the infrared absorption rate of the infrared absorption parts 24 and 26 is improved, so that the sensitivity is high. be able to. Moreover, the increase in heat capacity can be reduced.
- the some projection part 6 is arrange
- the material of the projection part 6 is a metal, it is possible to increase sensitivity.
- the material of the protrusion 6 is a silicon nitride film, it is possible to apply a tensile stress and maintain the stress balance of the entire film. Further, as the protrusion 6, a film containing both a metal and a material having a tensile stress such as a silicon nitride film may be used.
- the manufacturing cost can be reduced by forming the protrusion 6 from a metal containing Al.
- the protrusion 6 is arranged at a cycle shorter than the wavelength of the infrared ray to be absorbed, whereby the infrared absorption rate can be further improved.
- the process in which the protrusion part 6 does not have tolerance in a manufacturing process can be employ
- FIGS. 5A and 5B an arrangement in which a part of the plurality of protrusions 6 is along the linear first slit 28 is disclosed. Further, as shown in FIGS. 5A and 5B, an arrangement is disclosed in which a part of the plurality of protrusions 6 is surrounded by a C-shaped second slit 29.
- FIG. 9 and FIG. 10 show schematic views of the arrangement of slits and protrusions arranged in the infrared absorption unit.
- the protrusion 6 may be disposed along the linear third slit 28.
- the protrusion 6 is surrounded by the C-shaped second slit 29, and the protrusion 6 is disposed along the C-shaped second slit.
- the present invention is not limited to this.
- the protrusion 6 may not be along all of the C-shaped second slit.
- the infrared detection part is not disclosed in FIGS. 9 and 10, it may be arranged so as not to overlap the plurality of protrusions 6.
- the infrared absorbers 24 and 26 may be configured not to include the passivation film 205 as the second infrared absorber as shown in FIG.
- FIG. 11 is a schematic sectional view taken along line AA in FIG.
- FIGS. 12A and 12B may be used.
- 12A is a schematic plan view of the infrared sensor
- FIG. 12B is a schematic cross-sectional view taken along line A-A ′ in FIG. 12A.
- the infrared absorbing portion 24 having the polysilicon layer 300 surrounded by the slits 30 is disposed on the gap portion 20.
- the protrusion 6 is arranged so as to be surrounded by the slit 30.
- the protrusions 6 are periodically arranged so as to be substantially equidistant from the adjacent protrusions 6.
- the distance between the protrusion 6 and the slit 30 is longer than the distance between the adjacent protrusions 6.
- positioned between the slits 30 will be sent outside.
- planar pattern of the protrusion 6 is not limited to a square, and may be a rectangle, another polygon, a circle, an ellipse, or the like.
- FIGS. 13A to 16B correspond to the AA sectional view of FIG. 5A. Although FIG. 5B and FIG. 15B correspond, it may not completely correspond.
- a step of forming an insulating layer on one surface side of the semiconductor substrate 201 using an n-type silicon substrate is performed.
- the insulating layer can be formed by a laminated film of the silicon oxide film 202 and the silicon nitride film 203.
- the silicon oxide film 202 can be formed, for example, by heating the semiconductor substrate 201 to 1100 ° C. and thermally oxidizing the semiconductor substrate 201.
- the film thickness of the silicon oxide film 202 can be set to 0.3 ⁇ m, for example.
- the silicon nitride film 203 can be formed by LPCVD (Low Pressure Chemical Vapor deposition) method.
- the film thickness of the silicon nitride film 203 can be set to 0.1 ⁇ m, for example.
- the silicon nitride film 203 can function as a first stress layer that generates a tensile stress on the semiconductor substrate 201 side with respect to the film thickness center of the infrared absorption portions 24 and 26 including the silicon nitride film 203.
- a step of patterning and removing the portion of the insulating layer corresponding to the region for forming the MOSFET 4 is performed.
- the structure shown in FIG. 13A is obtained.
- a portion corresponding to the region for forming the infrared detecting unit 31 is left in the insulating layer.
- a method for forming the structure shown in FIG. 13B will be described.
- a step of forming a first thermal oxide film 61 made of a silicon oxide film and a p-type (p +) well region 41 on one surface side of the semiconductor substrate 201 is performed.
- a p-type (p ++) channel stopper region 44 is formed in the well region 41 on the one surface side of the semiconductor substrate 201, and a second thermal oxide film 62 made of a silicon oxide film is formed on the one surface side of the semiconductor substrate 201.
- the process of forming is performed.
- a step of implanting ions for controlling the threshold voltage of the MOSFET 4 is performed.
- As a p-type impurity for forming the well region 41 and the channel stopper region 44 for example, boron can be used. As described above, the structure shown in FIG. 13B is obtained.
- an n-type (n +) drain region 42 and an n-type (n +) source region 43 are formed in the well region 41.
- an n-type impurity for forming the drain region 42 and the source region 43 for example, an n-type impurity such as phosphorus can be used.
- a step of forming a gate insulating film 45 made of a silicon oxide film having a predetermined thickness by, for example, thermal oxidation on one surface side of the semiconductor substrate 201 is performed.
- the gate insulating film 45 can be formed of, for example, a thermal oxide film having a thickness of 60 nm.
- a step of forming a gate electrode 46, infrared absorption layers 32, 33, and 34 and a non-doped polycrystalline silicon layer serving as the basis of the infrared detector 31 on the entire surface of one surface side of the semiconductor substrate 201 is performed by LPCVD.
- a patterning process using the photolithography technique and the etching technique so that the portions corresponding to the gate electrode 46, the infrared absorption layers 32, 33, and 34, and the infrared detection unit 31 remain in the non-doped polycrystalline silicon layer. I do.
- n-type impurity ions are implanted into portions of the non-doped polycrystalline silicon layer corresponding to the gate electrode 46, the predetermined infrared absorption layers 32, 33, and 34, and the infrared detector 31, and then drive-in is performed.
- phosphorus can be used as an n-type impurity for ion implantation.
- the gate electrode 46, the infrared absorption layers 32, 33, and 34, and the infrared detector 31 made of n-type polycrystalline silicon can be formed.
- drive-in is performed after ion implantation of p-type impurities is performed on portions of the non-doped polycrystalline silicon layer corresponding to the predetermined infrared absorption layers 32, 33, and 34 and the infrared detector 31.
- boron can be used as the p-type impurity for ion implantation.
- the infrared absorption layers 32, 33, and 34 and the infrared detector 31 made of p-type polycrystalline silicon can be formed. As described above, the structure shown in FIG. 14A is obtained.
- the interlayer insulating film 204 is formed so as to cover the infrared detection unit 31 and the infrared absorption layers 32, 33, and 34 on one surface side of the semiconductor substrate 201.
- a method for forming the interlayer insulating film 204 for example, a CVD method can be used, and a BPSG film can be used as a material.
- a contact hole 50A for the hot junction T1 and a contact hole 50F for the electrode 49 are formed in the interlayer insulating film 204 by using a photolithography technique and an etching technique.
- the electrode 49 is used as a ground electrode, for example.
- a contact hole 50E for the source electrode 48 and a contact hole 50D for the drain electrode 47 are formed in the interlayer insulating film 204 by using a photolithography technique and an etching technique. As described above, the structure shown in FIG. 14B is obtained.
- a base metal film such as a hot junction T1, a cold junction T2, a reference bias line, an electrode 49, a source electrode 48, and a drain electrode 47 is formed on the entire surface on one surface side of the semiconductor substrate 201.
- the method for forming the metal film include a sputtering method, a CVD method, and a vapor deposition method.
- the material of the metal film for example, Al—Si can be used.
- the metal film may have a film thickness of 2 ⁇ m, for example.
- the metal film is patterned to form the hot junction T1, the reference bias line, the electrode 49, the source electrode 48, the drain electrode 47, and the like.
- the patterning method for example, a photolithography technique and an etching technique such as RIE (Reactive Ion Etching) can be used.
- the protrusion 6 is formed on the opposite side of the semiconductor substrate 201 with respect to the film thickness centers of the infrared absorbing portions 24 and 26.
- the protrusion 6 can function as a second stress layer that generates a tensile stress.
- a film for forming the protrusion 6 is formed on the BPSG film constituting a part of the interlayer insulating film 204.
- a material of the film for forming the protruding portion 6 for example, a metal including aluminum (Al), titanium (Ti), tungsten (W), gold (Au), copper (Cu), or the like, or It is preferably composed of an aluminum alloy such as Al—Si, Al—Si—Cu, or Al—Cu, a metal nitride such as TiN, or a silicon nitride film.
- a metal including aluminum (Al), titanium (Ti), tungsten (W), gold (Au), copper (Cu), or the like, or It is preferably composed of an aluminum alloy such as Al—Si, Al—Si—Cu, or Al—Cu, a metal nitride such as TiN, or a silicon nitride film.
- a metal nitride such as TiN, or a silicon nitride film.
- the film is patterned so as to form a plurality of islands at predetermined intervals in a plan view of the infrared absorption parts 24 and 26, and the protrusions 6 Form.
- the structure shown in FIG. 15A is obtained.
- the protrusion 6 is formed in a square shape in plan view.
- the protrusion part 6 can be made into various shapes, such as not only a square but a rectangle, a rhombus, a triangle, a polygon more than a pentagon, a circle, an ellipse, and a star shape.
- the projections 6 are formed in a triangular shape in plan view, it is easy to form the projections 6 without any gaps according to the outer shape of the infrared absorption unit 24.
- the film can be formed by, for example, an LPCVD method or a sputtering method.
- the tensile stress of the film itself can be adjusted by adjusting the film forming method and film forming conditions.
- the stress of the film can be measured by using UV Raman spectroscopy or the like.
- a passivation film 205 made of a laminated film of a PSG film and an NSG film is formed on one surface side of the semiconductor substrate 201.
- the PSG film can be formed to 0.5 ⁇ m, for example.
- the NSG film can be formed to 0.5 ⁇ m, for example.
- the passivation film 205 is formed by a CVD method. Thus, the structure shown in FIG. 15B is obtained.
- openings to be first and third slits 28 and second slits 29 are formed in a multilayer film including a silicon oxide film 202, a silicon nitride film 203, an interlayer insulating film 204, a passivation film 205, and the like.
- a forming method for example, an etching technique such as a photolithography technique and RIE can be used.
- RIE etching technique
- the etching solution is introduced using the openings serving as the first and third slits 28 and the second slit 29 as etching solution introduction holes, and the semiconductor substrate 201 is anisotropically etched.
- the gap 20 can be formed in the semiconductor substrate 201.
- a TMAH (Tetramethyl Ammonium Hydroxide) liquid heated to 85 ° C. can be used as the etching liquid, but the etching liquid is not limited to this.
- the etching solution for example, another alkaline solution such as a KOH solution may be used.
- the structure shown in FIG. 16B is obtained.
- a plurality of chip-shaped infrared sensors can be formed by separating them into a plurality of infrared sensors.
- the infrared sensor of the present invention is useful because the manufacturing cost is low, the sensitivity is high, or the increase in heat capacity can be reduced.
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Abstract
Description
図1に示すように、実施の形態に係る赤外線センサは、基板11と、センサチップ2と、集積回路(IC)15と、シールドカバー16と、レンズ17と、ケース18とを備える。実施の形態に係る赤外線センサは、赤外線を受信して、例えば視野内の温度分布や熱源の位置等を検知する。
上記のように、実施の形態を説明したが、この開示の一部をなす論述及び図面は本発明を限定するものではない。
以下、赤外線センサの製造方法の一例について、図13A~図16Bを参照して説明する。なお、図13A~図16Bは、図5AのA-A断面図に対応している。図5Bと図15Bは対応しているが、完全に一致していないこともある。
6 突起部
24,26 赤外線吸収部
31 赤外線検知部
202 シリコン酸化膜(第1赤外線吸収部)
203 シリコン窒化膜(第1赤外線吸収部)
204 層間絶縁膜(第1赤外線吸収部)
205 パッシベーション膜(第2赤外線吸収部)
Claims (14)
- 第1赤外線吸収部と、
前記第1赤外線吸収部が吸収する赤外線に基づいて赤外線を検知する赤外線検知部と、
金属又はシリコン窒化膜を有し、前記第1赤外線吸収部の表面に、互いに離間するように配置される複数の突起部と
を備えることを特徴とする赤外線センサ。 - 前記第1赤外線吸収部には、平面視においてスリットが配置されており、
前記複数の突起部の全てが前記スリットにより囲まれていることを特徴とする請求項1に記載の赤外線センサ。 - 隣接する前記突起部間の距離よりも前記突起部と前記スリットとの間の距離の方が長いことを特徴とする請求項2に記載の赤外線センサ。
- 前記第1赤外線吸収部には、平面視において線状の第1のスリットが配置されており、
前記複数の突起部の一部は、前記第1のスリットに沿って配置されていることを特徴とする請求項1に記載の赤外線センサ。 - 前記第1赤外線吸収部には、平面視においてC字状の第2のスリットが配置されており、
前記複数の突起部の一部は、前記第2のスリットに囲まれるように配置されていることを特徴とする請求項1又は4に記載の赤外線センサ。 - 前記複数の突起部の一部は、前記第2のスリットに沿って配置されていることを特徴とする請求項5に記載の赤外線センサ。
- 前記第1赤外線吸収部には、平面視において線状の第3のスリットが配置されており、
前記第1のスリットの延伸方向は、前記第3のスリットの延伸方向に対して垂直であり、
前記複数の突起部の一部は、前記第3のスリットに沿って配置されていることを特徴とする請求項4~6のいずれか1つに記載の赤外線センサ。 - 前記赤外線検知部は、前記第1赤外線吸収部上に配置されており、
平面視において前記赤外線検知部と前記複数の突起部はオーバーラップしていないことを特徴とする請求項1~6のいずれか1項に記載の赤外線センサ。 - 前記第1赤外線吸収部は、シリコン酸化膜とシリコン窒化膜の積層構造を有することを特徴とする請求項1~8のいずれか1つに記載の赤外線センサ。
- 前記第1赤外線吸収部は半導体基板の表面に形成された空隙部上に配置されていることを特徴とする請求項1~9のいずれか1項に記載の赤外線センサ。
- 前記複数の突起部は、アルミニウムを含む金属からなることを特徴とする請求項1~10のいずれか1項に記載の赤外線センサ。
- 前記複数の突起部は、前記第1赤外線吸収部が吸収する赤外線の波長より短い周期で配置されることを特徴とする請求項1~11のいずれか1項に記載の赤外線センサ。
- 前記第1赤外線吸収部及び前記複数の突起部の上面に、前記複数の突起部を覆うように形成された薄膜状の第2赤外線吸収部を更に備えることを特徴とする請求項1~12のいずれか1項に記載の赤外線センサ。
- 前記赤外線検知部は、複数の熱電対から構成され、
前記複数の熱電対の温接点は、それぞれ、前記第1赤外線吸収部の上に配置されることを特徴とする請求項1~13のいずれか1項に記載の赤外線センサ。
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Also Published As
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US10119865B2 (en) | 2018-11-06 |
US20160153837A1 (en) | 2016-06-02 |
JPWO2014199583A1 (ja) | 2017-02-23 |
JP6458250B2 (ja) | 2019-01-30 |
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