Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/3244—Gas supply means
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/26—Plasma torches
  • H05H1/32—Plasma torches using an arc
  • H05H1/34—Details, e.g. electrodes, nozzles
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
  • C23C16/45561—Gas plumbing upstream of the reaction chamber
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
  • C23C16/45563—Gas nozzles
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
  • C23C16/45563—Gas nozzles
  • C23C16/45578—Elongated nozzles, tubes with holes
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/3244—Gas supply means
  • H01J37/32449—Gas control, e.g. control of the gas flow

Definitions

• the disclosure is related to process gas distribution in a plasma reactor for processing a
• Control of process gas distribution in the chamber of a plasma reactor affects process control of etch rate distribution or deposition rate distribution on a workpiece during plasma processing.
• Gas injection nozzles can be located at the center and periphery of the chamber. It is desirable to control gas injection at both the chamber center and at the periphery.
• One problem is that systems that control radial distribution of process gas flow rate generally do not control azimuthal distribution of process gas flow rate.
• azimuthal refers to the circumferential direction in a cylindrical processing chamber.
• systems that control azimuthal distribution of gas flow rate using gas injectors near the side wall suffer from pressure drops along the azimuthal direction.
• a related problem is how to feed process gas to different zones of gas injectors in such a manner as to avoid asymmetries in gas distribution while at the same time providing full control of both radial and azimuthal gas distributions.
• Another problem is how to provide a gas
• gas distribution passages in one layer has generally limited the location of the gas injectors of the chamber to that one layer, which is typically flat and has no particular effect upon gas flow within the chamber.
• a plasma reactor having a chamber interior, a workpiece support and a tunable gas nozzle includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M- way gas flow ratio controller having M outputs,
• the tunable gas nozzle has two gas input, and N is four and M is three.
• the reactor may further include a gas supply panel coupled to a gas input of the three-way gas flow controller.
• a process controller is coupled to the M-way gas flow ratio controller and to the N-way gas flow ratio controller, and a user interface is coupled to the process controller.
• the side gas plenum includes plural sets of gas flow channels, and each one of the sets of gas flow channels includes: (a) an arcuate gas distribution channel having a pair of ends coupled to a corresponding pair of the plural side gas outlets, and
• the plural sets of gas flow channels are of equal path lengths between
• the cylindrical side wall includes a liner edge
• the plasma reactor further
• a gas delivery ring over the liner edge, the plural sets of gas flow channels being formed in the gas delivery ring, and (b) a top liner ring over the gas delivery ring, the plural side gas outlets extending into the top liner ring, the top liner ring including a top liner ring surface facing the chamber interior.
• each of the plural side gas outlets includes: (a) a side gas injection nozzle extending radially in the top liner ring toward the chamber interior and including an axially extending gas delivery insert-receiving hole, and (b) a gas
• the plasma reactor may further include an axial internal gas flow passage in the gas delivery insert and a radial internal gas flow nozzle passage through a side wall of the axially extending gas delivery insert hole, the axial internal gas flow passage being in registration with the radial internal gas flow nozzle passage.
• the top liner ring includes plural nozzle pockets in the top liner ring surface, the side gas injection nozzle extending into a corresponding one of the nozzle pockets.
• the side gas injection nozzle includes plural O-ring nozzle grooves concentric with the side gas injection nozzle, the plasma reactor further including first plural O-rings in the plural O-ring nozzle grooves compressed against an interior side wall of a corresponding one of the nozzle pockets .
• the side gas injection nozzle further includes: (a) a cylindrical outer nozzle surface, wherein the O-ring nozzle grooves define nozzle groove surfaces indented with respect to the cylindrical outer nozzle surface, and (b) an axial evacuation slot including slot sections in the cylindrical outer nozzle surface beginning at an end of the side gas injection nozzle inside the nozzle pocket, and slot sections in the nozzle groove surfaces.
• the top liner ring further includes plural gas delivery insert pockets facing the gas delivery ring, a portion of the gas delivery insert extending into a corresponding one of the gas delivery insert pockets.
• the gas delivery inert includes plural O-ring insert grooves concentric with the gas delivery insert, the plasma reactor further including second plural O-rings in the plural O-ring insert grooves compressed against an interior side wall of a corresponding one of the plural gas delivery insert pockets .
• each of the plural gas outlets further includes an axial port in the gas
• the side gas injection nozzle includes a ceramic material
• the gas delivery ring and the gas delivery insert include steel
• the top liner surface and the cylindrical side wall includes a protective layer including an anodized material or
• a side gas injection kit including: a top liner ring including plural nozzle pockets, plural side gas injection nozzles
• each of the plural side gas injection nozzles including: (a) an outer nozzle surface and plural O-ring nozzle grooves in the outer nozzle surface and concentric with the side gas injection nozzle, and (b) first plural O-rings in the plural O-ring nozzle grooves compressed against an interior side wall of a corresponding one of the nozzle pockets.
• the side gas injection nozzle further includes: (a) nozzle groove surfaces indented with respect to the outer nozzle surface and formed in the O-ring nozzle grooves, and (b) an axial evacuation slot including slot sections in the
• the side gas injection kit further includes a gap between the cylindrical outer nozzle surface and an interior side wall of a
• the side gas injection kit further comprises: (a) plural gas delivery insert pockets in the top liner ring, (b) plural gas delivery extending into the gas delivery insert pockets, and (c) each of the gas delivery inserts including plural O-ring insert grooves concentric with the gas delivery insert, and second plural O-rings in the plural O-ring insert grooves compressed against an interior side wall of a corresponding one of the plural gas delivery insert pockets .
• FIG. 1 is a simplified block diagram of one embodiment .
• FIG. 2 is an elevational view corresponding to FIG. 1.
• FIG. 3 depicts an embodiment having eight gas outlets .
• FIG. 4 depicts a side gas delivery kit for the embodiment of FIG. 3.
• FIG. 5 is a cut-away cross-sectional view of the side gas delivery kit of FIG. 4.
• FIG. 6 is an enlarged view of a portion of FIG. 5.
• FIG. 7 depicts the bottom liner.
• FIG. 8 illustrates the workpiece support pedestal enclosed by the bottom liner.
• FIG. 9 depicts a view of the top liner ring from the top.
• FIG. 10 depicts a view of the top liner ring from the bottom.
• FIG. 11 is an enlarged view of a portion of FIG. 10.
• FIGS. 12 and 13 are top and bottom views, respectively, of the gas delivery ring.
• FIG. 14 is an enlarged cross-sectional view taken along lines 14-14 of FIG. 12.
• FIG. 15 is an enlarged view of the injection nozzle of FIG. 6.
• FIG. 16 is a cross-sectional view corresponding to FIG. 15.
• FIG. 17 is an enlarged view of the gas delivery insert of FIG. 6.
• FIG. 18 is a cross-sectional view corresponding to FIG. 17.
• FIG. 19 depicts a gas delivery block employed in the embodiment of FIG. 4.
• FIG. 20 is a cross-sectional view corresponding to FIG. 19.
• FIG. 21 depicts an exploded assembly of the gas distribution ring, the top liner ring 144, the injection nozzles and the gas distribution inserts of FIG. 4.
• FIG. 22 is an enlarged view of a portion of FIG. 21.
• FIG. 1 is a simplified block diagram of one embodiment.
• a plasma reactor chamber 100 depicted in elevational view in FIG. 2, is enclosed by a cylindrical side wall 102 defining a chamber volume 104.
• a workpiece support pedestal 106 is inside the chamber volume and rests on a pedestal lift mechanism 108 shown in FIG. 2.
• a tunable gas nozzle 110 is mounted on a ceiling 112 of the chamber 100, and has a center gas nozzle 114 and a side gas nozzle 116 that inject gas toward the center and side, respectively, of the chamber 100.
• the center and side gas nozzles 114, 116 are independently fed by gas supply lines 114a, 116a which are labeled "nozzle 1" and "nozzle 2",
• a circular side gas injection plenum 118 receives process gas at four gas inlets 120 and injects process gas into the chamber at plural gas outlets 122.
• the four gas inlets 120 are connected respectively to four supply lines labeled "side gas 1", “side gas 2", “side gas 3” and “side gas 4" in FIG. 1, which are fed by four outputs of a four-way gas flow ratio controller 124.
• the input of the four-way gas flow ratio controller 124 and the gas supply lines 114a and 116a receive process gas from respective outputs of a three-way gas flow ratio controller 126.
• a gas supply panel 128 furnishes process gas to the input of the three-way gas flow ratio controller 126.
• controller 130 having a user interface 132 governs the gas flow ratio controllers 124 and 126.
• the gas injection pattern in the chamber 100 has three concentric zones including a center zone governed by the center gas nozzle 114, an inner zone governed by the side gas nozzle 116 and a peripheral zone governed by the gas outlets 122.
• the user may adjust the gas flow ratios among the three concentric zones by controlling the three-way gas flow ratio controller 126.
• the user may govern azimuthal
• a further advantage is that the gas outlets 122 at the chamber periphery are fed in parallel, and the pressure losses are uniformly distributed in the
• FIG. 3 depicts an embodiment in which there are eight gas outlets 122. Any other suitable number of gas outlets may be employed in other embodiments.
• the plenum 118 of FIG. 1 is embodied in four pairs of recursive gas flow channels, each pair including an arcuate gas distribution channel 136 and an arcuate gas supply channel 138.
• the four pairs of recursive gas flow channels 136, 138 provide parallel paths between the gas inlets 120 and the gas outlets 122.
• Each pair of the eight gas outlets 122 of FIG. 3 is fed from a corresponding gas inlet 120 via a corresponding pair of the recursive gas flow channels 136, 138.
• Each gas distribution channel 136 has a pair of ends connected to the corresponding pair of gas outlets 122, and is fed at its center by one end of the corresponding arcuate gas supply channel 138, the other end of the gas supply channel 138 connected to the corresponding gas inlet 120.
• FIG. 4 depicts a side gas delivery kit for the embodiment of FIG. 3, including a top liner ring 140, a bottom liner 142, and a gas delivery ring 144 between the top liner ring 140 and the bottom liner 142.
• the bottom liner 142 includes the side wall 102 of FIG. 3.
• the gas delivery ring 144 contains the recursive gas flow
• FIG. 5 is a cut-away cross-sectional view of the side gas delivery kit of FIG. 4, showing a gas delivery insert 146 extending from the gas delivery ring 144 into the top liner ring 140, and further showing a injection nozzle 148 in the top liner ring 140.
• FIG. 6 is an enlarged view of a portion of FIG. 5, showing in greater detail the gas delivery insert 146 and the injection nozzle 148.
• the gas delivery insert 146 is supported on the gas delivery ring 144.
• the gas delivery insert 146 has an internal axial insert gas flow passage 150 coupled to one end of a corresponding gas distribution channel 136, as will be described in greater detail below.
• the top of the gas delivery insert 146 is received inside the injection nozzle 148 near a radially outer end of the injection nozzle 148.
• the injection nozzle 148 has an internal radial nozzle gas flow passage 152 in communication with the internal axial insert gas flow passage 150. The radially inner end of the
• injection nozzle 148 is open to the interior of the chamber 100.
• Each gas outlet 122 in the embodiment of FIG. 3 is implemented by a corresponding injection nozzle 148 and a corresponding gas delivery insert 146 of FIG. 6.
• FIG. 7 depicts the bottom liner 142.
• FIG. 8 shows how the workpiece support pedestal is enclosed by the bottom liner 142.
• the bottom liner 142 has three symmetrically disposed slit openings 154 for wafer transfer .
• FIG. 9 depicts a view of the top liner ring 140 from the top
• FIG. 10 depicts a view of the top liner ring 140 from the bottom.
• the top liner ring 140 has an annular bottom surface 156 from which the
• the annular bottom surface 156 is concave and provides a transition between the radius of a ridge 158 conforming to the bottom liner 142 and an inner radius of an opening 160 at the top of the top liner ring 140.
• the curvature of the annular bottom surface 156 can promote gas flow from each injection nozzle 148 toward the workpiece.
• FIG. 11 is an enlarged view of a portion of FIG. 10, showing one of eight hollow nozzle pockets 164 formed in the top liner ring 140 and one of eight hollow gas delivery insert pockets 166 formed in the top liner ring 140.
• the injection nozzle 148 shown in FIG. 6 is held inside the nozzle pocket 164, as will be described below.
• a portion of the gas delivery inert 146 shown in FIG. 6 is held inside the gas delivery insert pocket 166, as will be described below.
• the nozzle pocket 164 is cylindrically shaped, extends in a radial direction and forms an opening 164a in the annular bottom surface 156.
• the gas delivery insert pocket 166 is formed in a shelf 170 extending outwardly from a circumferential periphery 172 of the top liner ring 140.
• FIGS. 12 and 13 are top and bottom views, respectively, of the gas delivery ring 144.
• FIG. 12 shows the formation of the four gas distribution channels 136 and the four gas supply channels 138 in the gas delivery ring 144.
• Each gas supply channel 138 receives gas from the corresponding gas inlet 120.
• Each gas inlet 120 (FIG. 3) includes an axial port 120-1 (FIG. 13) formed in a tab 144-1 extending from a periphery 144-2 of the gas delivery ring 144.
• the axial port 120-1 opens through a bottom surface of the tab 144-1.
• a radially extending gas inlet channel 120-2 (FIG. 12) is coupled between the axial port 120-1 and one end 138-1 of the gas supply channel 138.
• An opposite end 138-2 of the gas supply channel 138 is coupled to the middle of the gas distribution channel 136.
• Each end 136-1 and 136-2 of the gas distribution channel 136 terminates at an axial gas outlet 122' .
• the axial gas outlet 122' is coupled to the bottom of the internal axial insert gas flow passage 150 of a gas delivery insert 146, as shown in FIG. 6. In this manner, the four gas distribution channels 136 feed eight gas delivery inserts 146.
• the gas distribution channels 136, 138 follow arcuate paths that are concentric with the cylindrical side wall 102.
• the gas distribution channels 136, the gas supply channels 138 and the radial gas inlet channel 120-2 provide respective paths between the gas inlets 120 and the gas outlets 122 that are of equal length.
• An advantage of the equal path lengths is a reduction in non-uniformity in gas flow resistance among the various paths, affording better process control.
• FIG. 14 is an enlarged cross-sectional view taken along lines 14-14 of FIG. 12, and shows one of the gas distribution channels 136 formed in the gas delivery ring 144 and covered by a gas channel cover 171.
• FIG. 14 further shows the intersection between one end of the gas distribution channel 136 and the gas outlet 122'.
• the injection nozzle 148 of FIG. 6 is depicted in detail in FIG. 15 and in cross-section in FIG. 16.
• the injection nozzle 148 has a cylindrical body 180 through which the internal radial nozzle gas flow passage 152 extends to a gas injection passage 182 forming an orifice 184 at the radially inner end 180a of the
• a first O-ring groove 188 concentric with the cylindrical body 180 is formed near the radially outer end 180b of the cylindrical body 180 and defines a first O-ring groove inner surface 188a.
• a second O-ring groove 190 concentric with the cylindrical body 180 is formed in the cylindrical body 180 between the first O-ring groove 188 and the radially inner end 180a, and defines a second O-ring groove inner surface 190a.
• An axial evacuation slot 192 is formed in the surface of the cylindrical body 180, and includes a first slot section 192-1 between the radial outer end 180b and the first O-ring groove 188, a second slot section 192-2 between the first and second 0- ring grooves 188 and 190, and a third slot section 192-3 extending for a short distance from the second O-ring groove 190 toward the radially inner end 180a.
• the axial slot 192 further includes a first groove axial slot section 192-4 in the first O-ring groove inner surface 188a and a second groove axial slot section 192-5 in the second O-ring groove inner surface 190b.
• O-rings 194 are inserted into the first and second O-ring grooves 188 and 190.
• the axial slot 192 enables the evacuation through the nozzle-to-pocket gap of gas trapped between the radial outer end 180b of the injection nozzle 148 and the back wall 164b (FIG. 11) of the nozzle pocket 164.
• the axial slot 192 enables the evacuated air to bypass the 0- rings 194.
• FIG. 17 depicts the gas delivery insert 146 shown in FIG. 6.
• FIG. 18 is a cross-sectional view corresponding to FIG. 17.
• the gas delivery insert 146 includes a cylindrical insert post 202 supported on a generally flat insert base 204.
• the internal axial insert gas flow passage 150 shown in FIG. 6 extends through the cylindrical insert post 202.
• Gas outlets 205a and 205b through the cylindrical insert post 202 intersect the internal axial insert gas flow passage 150.
• the cylindrical insert post 202 (FIG. 18) is inserted into the gas delivery insert hole 186 of the injection nozzle 148 of FIG. 16 until the gas outlets 205a and 205b are in registration with the internal radial nozzle gas flow passage 152 of FIG. 6.
• the cylindrical insert post 202 has O-ring grooves 206, 208 concentric with the cylindrical insert post 202 in which O-rings 209 (FIG. 6) are received.
• Interior surface 186a of the gas inlet hole 186 is an O-ring sealing surface against which the O-ring 209 is pressed upon insertion of the insert post 202 into the gas inlet hole 186.
• An O-ring groove 210 (FIG. 18) is formed in the top surface of the insert base 204 around the bottom of the cylindrical insert post 202.
• An O-ring groove 212 (FIG. 18) is formed in the bottom surface of the insert base 204 concentric with the cylindrical insert post 202.
• An O-ring 216 (FIG. 6) is held in the O-ring groove 212 for fitting the gas delivery insert 146 against the top liner ring 140.
• An O-ring 214 (FIG. 6) is held in the O-ring groove 210 for fitting the insert base 204 onto the gas delivery ring 144.
• FIGS. 12 and 13 refers to two tabs 144-1 of the gas delivery ring 144, each tab 144-1 supporting a pair of gas inlet ports 120-1 open at the bottom surface of the tab 144-1.
• FIGS. 19 and 20 depict a gas delivery block 220 for fastening to the bottom surface of a tab 144-1 and having a pair of gas inlet stems 222 that meet the pair of gas inlet ports 120-1 upon joining of the gas delivery block 220 to the tab 144-1.
• the illustrated pair of gas inlet stems 222 provide connection to two outputs of the four-way gas flow ratio controller 124.
• Radial distribution of gas flow is adjusted by controlling the three-way gas flow ratio controller 126. Independently, azimuthal gas distribution is adjusted controlling the four-way gas flow ratio controller 124.
• An advantage is that the gas flow ratio controllers 124 and 126 provide simultaneous independent control of both radial distribution of gas flow and azimuthal
• a further advantage is that the gas outlets 122 at the chamber periphery are fed in parallel, and the pressure losses are uniformly
• the gas injection inserts 146 facilitate the location of the injection nozzles 148 in the concave surface 156 of the top gas ring 140. Gas injection from the side is optimized because the injection nozzles 148 are located in the concave surface 156 of the top liner ring 140, and the injected gas is guided by the concave surface 156.
• the top gas ring 140 and the injection nozzles 148 are located in a plane above the gas delivery ring 144 containing the four pairs of recursive gas flow channels 136, 138. Gas flow paths spanning the gap between the plane of the injection nozzles 148 and the gas delivery ring 144 are provided by the gas delivery inserts 146.
• the top liner ring 140, the gas delivery ring 144, the eight gas delivery inserts 146 and the eight injection nozzles 148 are separate pieces, which enables the selection of materials to be optimized for each individual piece, and facilitates an efficient modular assembly.
• the gas delivery ring 144 comes into contact with process gases but not with plasma. They are
• the injection nozzles 148 face the plasma processing zone of the chamber, and therefore are formed of a material, such as a ceramic material, that is compatible with exposure to plasma.
• the top liner ring 140 and the bottom liner 142 may be formed of a material which is not generally compatible with exposure to plasma. To avoid exposure of the material to plasma, the interior surface of the side wall 102 and the annular bottom surface 156 of the top liner ring 140 are covered with a protective layer compatible with exposure to plasma.
• the side wall 102 and the top liner ring 140 may be formed of aluminum, and their protective coatings may comprise Yttria or may be formed by anodization.
• the modular parts may be conveniently and repetitively assembled and disassembled in the manner depicted in FIGS. 21 and 22 without damage to the various parts, while permitting a close fitting between parts, due in part to the protection afforded by the O-rings referred to above.
• the O-rings 194 of FIG. 6 protect the injection nozzles 148 during their
• the O-rings 209 on the gas delivery inserts 146 protect the injection nozzles 148 from the gas delivery inserts during
• the O-rings 194 and 209 are elastically compressible in one embodiment.
• Assembly procedure in FIGS. 21 and 22 entails inserting the injection nozzles 148 into the nozzle pockets 164 in the top liner ring 140, mounting the gas delivery inserts 146 on the gas delivery ring 140, and then bringing the gas delivery ring 144 and the top liner ring 144 together so as to insert the gas delivery inserts 146 into the respective insert-receiving holes 186.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
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• Analytical Chemistry (AREA)
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• 2014
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