WO2014119677A1 - 赤外線反射フィルム - Google Patents
赤外線反射フィルム Download PDFInfo
- Publication number
- WO2014119677A1 WO2014119677A1 PCT/JP2014/052147 JP2014052147W WO2014119677A1 WO 2014119677 A1 WO2014119677 A1 WO 2014119677A1 JP 2014052147 W JP2014052147 W JP 2014052147W WO 2014119677 A1 WO2014119677 A1 WO 2014119677A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- transparent protective
- protective layer
- infrared reflective
- metal oxide
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 4
- 239000010410 layer Substances 0.000 claims abstract description 232
- 239000011241 protective layer Substances 0.000 claims abstract description 107
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 92
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 92
- 229910052751 metal Inorganic materials 0.000 claims abstract description 81
- 239000002184 metal Substances 0.000 claims abstract description 81
- -1 ester compound Chemical class 0.000 claims abstract description 55
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 34
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 18
- 239000011787 zinc oxide Substances 0.000 claims abstract description 18
- 229910052709 silver Inorganic materials 0.000 claims abstract description 17
- 239000004332 silver Substances 0.000 claims abstract description 17
- 230000002378 acidificating effect Effects 0.000 claims abstract description 12
- 125000000524 functional group Chemical group 0.000 claims abstract description 11
- 239000002131 composite material Substances 0.000 claims abstract description 10
- 239000012044 organic layer Substances 0.000 claims abstract 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 27
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 16
- 150000007524 organic acids Chemical class 0.000 claims description 3
- 239000010408 film Substances 0.000 description 122
- 230000015572 biosynthetic process Effects 0.000 description 28
- 238000002834 transmittance Methods 0.000 description 23
- 239000000463 material Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 20
- 229910019142 PO4 Inorganic materials 0.000 description 15
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 15
- 239000010452 phosphate Substances 0.000 description 15
- 230000001965 increasing effect Effects 0.000 description 14
- 239000012790 adhesive layer Substances 0.000 description 13
- 238000004544 sputter deposition Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 238000009413 insulation Methods 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 8
- 239000003431 cross linking reagent Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229910052733 gallium Inorganic materials 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 239000011368 organic material Substances 0.000 description 5
- 238000005477 sputtering target Methods 0.000 description 5
- 229910001316 Ag alloy Inorganic materials 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 229910018487 Ni—Cr Inorganic materials 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910001252 Pd alloy Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 230000002708 enhancing effect Effects 0.000 description 3
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- 239000010931 gold Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910003437 indium oxide Inorganic materials 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
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- 150000003839 salts Chemical class 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 229910002696 Ag-Au Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 150000005691 triesters Chemical class 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- IOKZQYBPJYHIIW-UHFFFAOYSA-N aluminum zinc indium(3+) oxygen(2-) tin(4+) Chemical compound [O-2].[Zn+2].[Al+3].[Sn+4].[In+3].[O-2].[O-2].[O-2].[O-2].[O-2] IOKZQYBPJYHIIW-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- MIIYXHJRTPQMMY-UHFFFAOYSA-N butanedioic acid prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)CCC(O)=O MIIYXHJRTPQMMY-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
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- 238000003851 corona treatment Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 239000012788 optical film Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- E—FIXED CONSTRUCTIONS
- E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
- E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
- E06B3/00—Window sashes, door leaves, or like elements for closing wall or like openings; Layout of fixed or moving closures, e.g. windows in wall or like openings; Features of rigidly-mounted outer frames relating to the mounting of wing frames
- E06B3/66—Units comprising two or more parallel glass or like panes permanently secured together
- E06B3/67—Units comprising two or more parallel glass or like panes permanently secured together characterised by additional arrangements or devices for heat or sound insulation or for controlled passage of light
- E06B3/6715—Units comprising two or more parallel glass or like panes permanently secured together characterised by additional arrangements or devices for heat or sound insulation or for controlled passage of light specially adapted for increased thermal insulation or for controlled passage of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/041—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/304—Insulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/416—Reflective
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
Definitions
- the present invention relates to an infrared reflecting film that is mainly used by being arranged on the indoor side such as a glass window.
- the present invention relates to an infrared reflective film having excellent heat insulation and durability in practical use.
- an infrared reflecting substrate having an infrared reflecting layer on a substrate such as glass or film is known.
- the infrared reflection layer a layer in which metal layers and metal oxide layers are alternately laminated is widely used, and heat insulation can be provided by reflecting near infrared rays such as sunlight.
- the metal layer silver or the like is widely used from the viewpoint of enhancing the selective reflectivity of infrared rays, and indium tin oxide (ITO) or the like is widely used as the metal oxide layer.
- ITO indium tin oxide
- These metal layers and metal oxide layers do not have sufficient physical strength such as scratch resistance, and further deteriorate due to external environmental factors such as heat, ultraviolet rays, oxygen, moisture, and chlorine (chloride ions). easy. Therefore, in general, a protective layer is provided on the opposite side of the base of the infrared reflective layer for the purpose of protecting the infrared reflective layer.
- films used as protective layers for infrared reflective films and curable resin layers generally contain many compounds containing C ⁇ C bonds, C ⁇ O bonds, C—O bonds, aromatic rings, and the like. Infrared vibrational absorption and absorption in the far infrared region with a wavelength of 5 ⁇ m to 25 ⁇ m is large.
- Patent Document 1 For the purpose of reducing the emissivity of the infrared reflective film, Patent Document 1 uses a cured product layer such as fluorosilane as the transparent protective layer, and the thickness thereof is 500 nm or less, thereby absorbing far infrared rays in the protective layer. A method of reducing the amount has been proposed.
- Patent Document 1 when the thickness of the transparent protective layer is several hundred nm, the optical film thickness of the transparent protective layer overlaps the wavelength range of visible light. For this reason, it has been found that a problem (iris phenomenon) that the infrared reflection film is visually recognized in a rainbow pattern due to multiple interference at the interface. In order to prevent the iris phenomenon, it is effective to make the thickness of the transparent protective layer smaller than the wavelength range of visible light.
- the thickness of the transparent protective layer is reduced to several tens of nanometers, the protective effect of the protective layer is lowered, the durability of the infrared reflecting layer, particularly the metal layer is lowered, and deterioration such as oxidation is likely to occur.
- the metal layer is deteriorated, there is a tendency that the heat insulating property of the infrared reflective film is lowered and the visible light transmittance is lowered.
- Patent Document 1 discloses an example in which the transparent protective layer is thinned to about 50 nm.
- a highly durable metal layer such as a Ni—Cr alloy is provided on the metal layer such as silver in the infrared reflecting layer. Durability is imparted to the metal layer by arranging them adjacent to each other. If a Ni—Cr alloy layer or the like is added to the metal layer, an infrared reflection film having both durability in addition to heat insulation by reflection of near infrared rays and heat insulation by reflection of far infrared rays can be obtained.
- Ni—Cr alloy or the like has a low visible light transmittance, there is a problem that the visible light transmittance of the infrared reflective film is reduced to about 50%.
- curable organic substances for forming a transparent protective layer generally have low adhesion to the metal oxide layer. Therefore, when the film thickness of the transparent protective layer is small, there is a problem that delamination between the metal oxide layer and the transparent protective layer is likely to occur. In order to prevent delamination, it is conceivable to separately provide an adhesive layer, a primer layer, etc. However, when a new layer is added, the amount of far-infrared absorption increases, so that the heat insulation of the infrared reflective film is increased. Another problem is that it will drop.
- the present invention provides a highly durable and highly durable infrared reflective film by using a transparent protective layer having sufficient durability and a protective effect on the infrared reflective layer even when the thickness is small.
- the purpose is to provide.
- the metal oxide layer disposed on the metal layer a composite metal oxide containing zinc oxide and tin oxide is used, and the transparent protective layer contains a predetermined compound, The inventors have found that an infrared reflective film satisfying both durability and heat insulation can be obtained, and have reached the present invention.
- the infrared reflective film of the present invention includes an infrared reflective layer and a transparent protective layer in this order on a transparent film substrate.
- the infrared reflective layer comprises, from the transparent film substrate side, a first metal oxide layer; a metal layer mainly composed of silver; and a second metal oxide layer composed of a composite metal oxide containing zinc oxide and tin oxide. Prepare in this order.
- the transparent protective layer is in direct contact with the second metal oxide layer.
- the transparent protective layer is an organic material layer having a crosslinked structure, and the crosslinked structure is preferably derived from an ester compound having an acidic group and a polymerizable functional group in the same molecule.
- an ester compound of phosphoric acid and an organic acid having a polymerizable functional group is preferably used.
- the content of the structure derived from the ester compound in the transparent protective layer is preferably 1% by weight to 40% by weight. Further, the thickness of the transparent protective layer is preferably 30 nm to 150 nm.
- the infrared reflective film of the present invention preferably has a vertical emissivity measured from the transparent protective layer side of 0.2 or less. If the vertical emissivity is within the above range, far infrared rays from the room are reflected indoors by the metal layer, and thus the infrared reflective film has high heat insulation.
- the infrared reflective film of the present invention since the thickness of the transparent protective layer is as small as 150 nm or less, the occurrence of an iris phenomenon is suppressed, and the appearance and visibility are excellent. Moreover, since the thickness of the transparent protective layer is small and the absorption of far infrared rays by the transparent protective layer is small, the infrared reflective film of the present invention reflects far infrared rays indoors in addition to the heat shielding property by reflection of near infrared rays. It has excellent heat insulation and can exhibit energy saving effect throughout the year. Furthermore, since the infrared reflective film of the present invention uses a predetermined material for the infrared reflective layer and the transparent protective layer, it is excellent in adhesion between the two and high durability despite the small thickness of the transparent protective layer. Have sex.
- FIG. 1 is a cross-sectional view schematically showing a usage pattern of the infrared reflective film.
- the infrared reflective film 100 of the present invention includes an infrared reflective layer 20 and a transparent protective layer 30 on a transparent film substrate 10.
- the infrared reflective film 100 is used by being attached to the window 50 on the transparent film substrate 10 side via an appropriate adhesive layer 60 or the like, and disposed on the indoor side of the window 50 of a building or an automobile.
- the transparent protective layer 30 is disposed on the indoor side.
- the infrared reflective film 100 of the present invention transmits visible light (VIS) from the outside and introduces it into the room, and transmits near infrared (NIR) from the infrared reflective layer 20. Reflect on.
- the near-infrared reflection suppresses the inflow of heat from the outside due to sunlight or the like into the room (a heat shielding effect is exhibited), so that the cooling efficiency in summer can be improved.
- the infrared reflective layer 20 reflects indoor far infrared rays (FIR) radiated from the heating appliance 80 or the like, a heat insulating effect is exhibited, and heating efficiency in winter can be enhanced.
- FIR far infrared rays
- the infrared reflective film 100 includes an infrared reflective layer 20 and a transparent protective layer 30 in this order on one main surface of the transparent film substrate 10.
- the infrared reflective layer 20 includes a first metal oxide layer 21, a metal layer 25, and a second metal oxide layer 22 in this order from the transparent film substrate 10 side.
- the transparent protective layer 30 is in direct contact with the second metal oxide layer 22 of the infrared reflective layer 20.
- the transparent protective layer 30 In order to reflect far infrared rays in the room by the infrared reflecting layer 20, it is important that the amount of far infrared rays absorbed by the transparent protective layer 30 is small. On the other hand, in order to prevent the infrared reflective layer 20 from being scratched or deteriorated, the transparent protective layer 30 is required to have mechanical strength and chemical strength.
- the infrared reflective film of the present invention can have both heat insulation and durability by infrared reflection by having a predetermined laminated structure. Hereinafter, each layer which comprises an infrared reflective film is demonstrated sequentially.
- Transparent film substrate As the transparent film substrate 10, a flexible transparent resin film or the like is used. As the transparent film substrate, those having a visible light transmittance of 80% or more are preferably used. In this specification, the visible light transmittance is measured according to JIS A5759-2008 (architectural window glass film).
- the thickness of the transparent film substrate 10 is not particularly limited, but a range of about 10 ⁇ m to 300 ⁇ m is preferable. Moreover, when the infrared reflective layer 20 is formed on the transparent film base material 10, since processing at high temperature may be performed, the resin material constituting the transparent film base material is preferably excellent in heat resistance. Examples of the resin material constituting the transparent film substrate include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyetheretherketone (PEEK), and polycarbonate (PC).
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- PEEK polyetheretherketone
- PC polycarbonate
- a hard coat layer is provided on the surface of the transparent film substrate 10 on the side where the infrared reflective layer 20 is formed.
- the hard coat layer can be formed by, for example, a method of attaching a cured film of an appropriate ultraviolet curable resin such as acrylic or silicone to a transparent film substrate.
- an appropriate ultraviolet curable resin such as acrylic or silicone
- Surface modification treatment such as saponification treatment or treatment with a coupling agent may be performed.
- the infrared reflection layer 20 transmits visible light and reflects near infrared rays and far infrared rays, and from the transparent film substrate 10 side, the first metal oxide layer 21, the metal layer 25, and the second metal oxide layer. 22 are provided in this order.
- the metal layer 25 has a central role of infrared reflection.
- a silver layer or a silver alloy layer containing silver as a main component is preferably used. Since silver has a high free electron density, it can achieve high reflectivity of near infrared rays and far infrared rays, and is excellent in heat shielding effect and heat insulating effect even when the number of layers constituting the infrared reflection layer 20 is small. An infrared reflective film is obtained.
- the silver content in the metal layer 25 is preferably 90% by weight or more, more preferably 93% by weight or more, still more preferably 95% by weight or more, and particularly preferably 96% by weight or more.
- the metal layer 25 may be a silver alloy layer containing a metal other than silver.
- a silver alloy may be used to increase the durability of the metal layer.
- the metal added for the purpose of enhancing the durability of the metal layer palladium (Pd), gold (Au), copper (Cu), bismuth (Bi), germanium (Ge), gallium (Ga) and the like are preferable.
- Pd is most preferably used from the viewpoint of imparting high durability to silver. When the addition amount of Pd or the like is increased, the durability of the metal layer tends to be improved.
- the content of the metal layer 25 is preferably 0.3% by weight or more, more preferably 0.5% by weight or more, and further preferably 1% by weight or more. A weight percent or more is particularly preferred.
- the content of metals other than silver in the metal layer 25 is preferably 10% by weight or less, more preferably 7% by weight or less, further preferably 5% by weight or less, and particularly preferably 4% by weight or less.
- the metal oxide layers 21 and 22 are provided for the purpose of controlling the amount of visible light reflection at the interface with the metal layer 25 to achieve both high visible light transmittance and infrared reflectance.
- the metal oxide layer can also function as a protective layer for preventing the metal layer 25 from deteriorating.
- the refractive index of the metal oxide layers 21 and 22 with respect to visible light is preferably 1.5 or more, more preferably 1.6 or more, and 1.7 or more. Is more preferable.
- the material having the above refractive index examples include oxides of metals such as Ti, Zr, Hf, Nb, Zn, Al, Ga, In, Tl, Ga, and Sn, or composite oxides of these metals.
- a composite metal oxide containing zinc oxide and tin oxide is preferably used as the second metal oxide layer 22 provided on the transparent protective layer 30 side of the metal layer 25.
- the metal oxide containing zinc oxide and tin oxide is excellent in chemical stability (durability against acids, alkalis, chloride ions, etc.) and has excellent adhesion to the transparent protective layer 30 described later.
- the oxide layer 22 and the transparent protective layer 30 act synergistically to enhance the protective effect on the metal layer 25.
- the content of zinc atoms in the second metal oxide layer 22 is preferably 10 atomic percent to 60 atomic percent, more preferably 15 atomic percent to 50 atomic percent, and more preferably 20 atomic percent to 40 atomic percent with respect to the total amount of metal atoms. % Is more preferable.
- the content of zinc atoms (zinc oxide) is small, the metal oxide layer becomes crystalline and durability may be lowered.
- the resistance of the sputtering target used for film formation tends to be high, and film formation by DC sputtering tends to be difficult.
- the zinc atom content is excessively large, the durability of the infrared reflecting layer may be lowered, the adhesion between the second metal oxide layer 22 and the metal layer 25 may be lowered, and the like.
- the content of tin atoms in the second metal oxide layer 22 is preferably 30 atomic% to 90 atomic%, more preferably 40 atomic% to 85 atomic%, and more preferably 50 atomic% to 80 atomic% with respect to the total amount of metal atoms. Is more preferable. If the content of tin atoms (tin oxide) is excessively small, the chemical durability of the metal oxide layer tends to decrease. On the other hand, if the content of tin atoms (tin oxide) is excessively large, the resistance of the sputtering target used for film formation tends to be high, and film formation by DC sputtering tends to be difficult.
- the second metal oxide layer may contain, in addition to zinc oxide and tin oxide, metals such as Ti, Zr, Hf, Nb, Al, Ga, In, Tl, and Ga, or these metal oxides. These metals or metal oxides can be added for the purpose of increasing the conductivity of the target during sputtering film formation to increase the film formation rate, or for increasing the transparency of the metal oxide layer.
- the total content of zinc atoms and tin atoms in the second metal oxide layer is preferably 40 atomic percent or more, more preferably 50 atomic percent or more, and further preferably 60 atomic percent or more with respect to the total amount of metal atoms. preferable.
- the material constituting the first metal oxide layer 21 various metal oxides can be used. From the viewpoint of improving durability and improving productivity, it is preferable to use a composite metal oxide containing zinc oxide and tin oxide in the same manner as the second metal oxide layer.
- the thicknesses of the metal layer 25 and the metal oxide layers 21 and 22 are appropriately set in consideration of the refractive index of the material so that the infrared reflection layer transmits visible light and selectively reflects near infrared light. .
- the thickness of the metal layer 25 can be adjusted, for example, in the range of 3 nm to 50 nm. Further, the thickness of the metal oxide layers 21 and 22 can be adjusted, for example, in the range of 3 nm to 80 nm.
- the method for forming the metal layer and the metal oxide layer is not particularly limited, but film formation by a dry process such as sputtering, vacuum evaporation, CVD, or electron beam evaporation is preferable.
- the metal oxide layers 21 and 22 are preferably formed by a DC sputtering method using a target containing a metal and a metal oxide. Since ZTO has low conductivity, a sintered target containing only zinc oxide and tin oxide has high resistivity, and it is difficult to form a film by DC sputtering. In addition, since reactive sputtering using a metal target containing zinc and tin is performed in an oxygen atmosphere, when forming ZTO on the metal layer, the metal layer serving as the film formation underlayer is excessive. Oxidation by oxygen may cause a problem that the properties of the infrared reflecting layer are deteriorated.
- a metal oxide layer made of ZTO is formed as the second metal oxide layer 22 on the metal layer 25
- DC using a target obtained by sintering zinc oxide, tin oxide, and metal is used.
- Film formation is preferably performed by sputtering.
- the target is preferably formed by sintering 0.1 wt% to 20 wt%, more preferably 0.2 wt% to 15 wt% of metal with zinc oxide and / or tin oxide. preferable. If the metal content at the time of target formation is excessively small, the conductivity of the target becomes insufficient, so that it is difficult to form a film by DC sputtering, or the adhesion to the metal layer may be reduced.
- the metal content at the time of target formation is excessively large, the amount of residual metal that is not oxidized during film formation and the amount of metal oxide whose oxygen content is less than the stoichiometric composition will increase, and the visible light transmittance of the metal oxide layer will increase. Tends to decrease.
- the metal contained in the target zinc and / or tin are preferable, but other metals may be contained.
- the oxygen introduction amount into the film formation chamber is 8% by volume or less with respect to the total introduced gas flow rate. It is preferably 5% by volume or less, more preferably 4% by volume or less.
- the amount of oxygen introduced is the amount (% by volume) of oxygen relative to the total amount of gas introduced into the deposition chamber in which the target used for deposition of the metal oxide layer is disposed.
- the infrared reflective layer 20 may be composed of three layers of the first metal oxide layer 21, the metal layer 25, and the second metal oxide layer 22, or may include other layers. For example, for the purpose of improving the adhesion between the metal layer 25 and the metal oxide layers 21 and 22 and imparting durability to the metal layer, there are other metal layers or metal oxide layers between them. You may do it. In addition, a metal layer and a metal oxide layer are further added to the first metal oxide layer 21 on the transparent film substrate 10 side, and the infrared reflection layer 20 has a five-layer structure, a seven-layer structure, etc. It is also possible to improve the wavelength selectivity of transmission and reflection of visible light and near infrared light.
- the infrared reflective layer 20 is preferably composed of three layers, a first metal oxide layer 21, a metal layer 25, and a second metal oxide layer 22.
- the infrared reflective layer has a three-layer structure. However, it is possible to obtain an infrared reflective film having sufficient durability to withstand practical use.
- a transparent protective layer 30 is provided on the second metal oxide layer 22 of the infrared reflective layer 20 for the purpose of preventing scratches and deterioration of the infrared reflective layer.
- the transparent protective layer 30 is in direct contact with the second metal oxide layer 22.
- the material of the transparent protective layer 30 is preferably a material having a high visible light transmittance and excellent mechanical strength and chemical strength.
- an organic material is used as the material of the transparent protective layer 30.
- organic substances fluorine-based, acrylic-based, urethane-based, ester-based and epoxy-based actinic ray curable or thermosetting organic resins, and organic / inorganic hybrid materials in which organic and inorganic components are chemically bonded are preferably used. It is done.
- the transparent protective layer 30 preferably has a crosslinked structure derived from an ester compound having an acidic group and a polymerizable functional group in the same molecule in addition to the organic substance.
- ester compounds having an acidic group and a polymerizable functional group in the same molecule include polyvalent acids such as phosphoric acid, sulfuric acid, oxalic acid, succinic acid, phthalic acid, fumaric acid, and maleic acid; And an ester of a compound having a polymerizable functional group such as a group, silanol group or epoxy group and a hydroxyl group in the molecule.
- the said ester compound may be polyvalent esters, such as a diester and a triester, it is preferable that at least 1 in the acidic group of a polyvalent acid is not esterified.
- the transparent protective layer 30 has a crosslinked structure derived from the above ester compound, the mechanical strength and chemical strength of the transparent protective layer are increased, and the transparent protective layer 30 and the second metal oxide layer 22 Adhesion can be improved and the durability of the infrared reflective layer can be increased.
- an ester compound (phosphate ester compound) of phosphoric acid and an organic acid having a polymerizable functional group is preferable for improving the adhesion between the transparent protective layer and the metal oxide layer.
- the improvement in the adhesion between the transparent protective layer and the metal oxide layer is derived from the fact that the acidic group in the ester compound shows high affinity with the metal oxide, and in particular, the phosphate hydroxy group in the phosphate ester compound is a metal. Since the affinity with the oxide layer is excellent, it is estimated that the adhesion is improved.
- the ester compound preferably contains a (meth) acryloyl group as a polymerizable functional group.
- the ester compound may have a plurality of polymerizable functional groups in the molecule.
- a phosphoric acid monoester compound or a phosphoric acid diester compound represented by the following formula (1) is preferably used.
- phosphoric acid monoester and phosphoric acid diester can also be used together.
- X represents a hydrogen atom or a methyl group
- (Y) represents an —OCO (CH 2 ) 5 — group
- n is 0 or 1
- p is 1 or 2.
- the content of the structure derived from the ester compound in the transparent protective layer is preferably 1% by weight to 40% by weight, more preferably 1.5% by weight to 35% by weight, and further preferably 2% by weight to 20% by weight. More preferably, the content is 2.5% by weight to 17.5% by weight. In a particularly preferred embodiment, the content of the structure derived from the ester compound in the transparent protective layer is 2.5 to 15% by weight, alternatively 2.5 to 12.5% by weight. If the content of the ester compound-derived structure is excessively small, the effect of improving strength and adhesion may not be sufficiently obtained.
- the content of the ester compound-derived structure is excessively large, the curing rate at the time of forming the transparent protective layer is reduced and the hardness is lowered, or the slipping property of the surface of the transparent protective layer is lowered and the scratch resistance is lowered.
- Content of the structure derived from the ester compound in a transparent protective layer can be made into a desired range by adjusting content of the said ester compound in a composition at the time of transparent protective layer formation.
- the method for forming the transparent protective layer 30 is not particularly limited.
- the transparent protective layer is prepared by, for example, dissolving the above organic material, or a curable monomer or oligomer of the organic material and the above ester compound in a solvent to prepare a solution, and this solution is the second metal oxide layer 22 of the infrared reflecting layer. It is preferably formed by a method in which it is applied onto the substrate and the solvent is dried, followed by curing by irradiation with ultraviolet rays or electron beams or application of thermal energy.
- the transparent protective layer 30 is made of a coupling agent such as a silane coupling agent or a titanium coupling agent, a leveling agent, an ultraviolet absorber, an antioxidant, or a heat stabilizer.
- a coupling agent such as a silane coupling agent or a titanium coupling agent
- a leveling agent such as a silane coupling agent or a titanium coupling agent
- an ultraviolet absorber such as an antioxidant
- a heat stabilizer such as lubricants, plasticizers, anti-coloring agents, flame retardants and antistatic agents may be included. The content of these additives can be appropriately adjusted within a range not impairing the object of the present invention.
- the thickness of the transparent protective layer 30 is preferably 30 nm to 150 nm, more preferably 35 nm to 130 nm, still more preferably 40 nm to 110 nm, and particularly preferably 45 nm to 100 nm.
- the thickness of the transparent protective layer is excessively large, the heat insulating property of the infrared reflective film tends to be lowered due to an increase in far-infrared absorption in the transparent protective layer.
- the optical thickness of the transparent protective layer overlaps the wavelength range of visible light, an iris phenomenon due to multiple reflection interference at the interface occurs, so that the thickness of the transparent protective layer is preferably small.
- the transparent protective layer 30 has a crosslinked structure derived from a predetermined ester compound, and a composite metal oxide containing zinc oxide and tin oxide is used as a material for the second metal oxide layer 22. Durability is increased. Therefore, even when the thickness of the transparent protective layer is 150 nm or less, an infrared reflective film having excellent durability can be obtained. Further, as described above, since the durability can be enhanced by adopting a silver alloy containing a metal such as Pd as the metal layer 25, the thickness of the transparent protective layer can be reduced while maintaining the durability. Can do.
- the infrared reflective film 100 of the present invention has the infrared reflective layer 20 including the metal layer and the metal oxide layer, and the transparent protective layer 30 on one main surface of the transparent film substrate 10.
- the transparent protective layer 30 is formed directly on the second metal oxide layer 22.
- a hard coat layer, an easy-adhesion layer, or the like is provided between the transparent film base material 10 and the infrared reflective layer 20, for the purpose of increasing the adhesion of each layer or the strength of the infrared reflective film. Also good.
- a transparent material having a high visible light transmittance is preferably used.
- the surface of the transparent film substrate 10 opposite to the infrared reflective layer 20 may be provided with an adhesive layer or the like for use in bonding the infrared reflective film and window glass or the like.
- an adhesive layer those having a high visible light transmittance and a small refractive index difference from the transparent film substrate 10 are preferably used.
- an acrylic pressure-sensitive adhesive pressure-sensitive adhesive
- the adhesive layer preferably has a high visible light transmittance and a low ultraviolet transmittance.
- the adhesive layer By reducing the ultraviolet transmittance of the adhesive layer, it is possible to suppress the deterioration of the infrared reflecting layer due to ultraviolet rays such as sunlight.
- the adhesive layer preferably contains an ultraviolet absorber.
- deterioration of the infrared reflective layer resulting from the ultraviolet rays from the outdoors can also be suppressed by using a transparent film substrate containing an ultraviolet absorber.
- the exposed surface of the adhesive layer is preferably covered with a separator temporarily for the purpose of preventing contamination of the exposed surface until the infrared reflective film is put to practical use. Thereby, the contamination by the contact with the exterior of the exposed surface of an adhesive bond layer can be prevented in the usual handling state.
- the vertical emissivity measured from the transparent protective layer 30 side is preferably 0.20 or less, more preferably 0.15 or less, and preferably 0.12 or less. More preferably, it is particularly preferably 0.10 or less.
- the vertical emissivity is measured according to JlS R3106: 2008 (test method for transmittance, reflectance, emissivity, and solar heat gain of plate glass).
- the change in emissivity after the infrared reflective film is immersed in a 5 wt% sodium chloride aqueous solution for 5 days is preferably 0.02 or less, and more preferably 0.01 or less.
- the visible light transmittance of the infrared reflective film is preferably 60% or more, more preferably 65% or more, and still more preferably 67% or more.
- the infrared ray having the above visible light transmittance, vertical emissivity and durability at the same time. A reflective film is obtained.
- the infrared reflective film of the present invention is preferably used in order to adhere to windows of buildings and vehicles, transparent cases into which plants are placed, frozen or refrigerated showcases, etc., and to improve the heating / cooling effect and prevent rapid temperature changes.
- each layer constituting the infrared reflecting layer is determined by processing a sample by a focused ion beam (FIB) method using a focused ion beam processing observation apparatus (product name “FB-2100” manufactured by Hitachi, Ltd.) They were obtained by observation with a field emission transmission electron microscope (product name “HF-2000”, manufactured by Hitachi, Ltd.).
- the thickness of the hard coat layer formed on the substrate and the transparent protective layer is visible light when light is incident from the measuring object side using an instantaneous multi-photometry system (product name “MCPD3000” manufactured by Otsuka Electronics). It calculated
- thickness of a transparent protective layer is small and it is difficult to observe the interference pattern of a visible light region (thickness of about 150 nm or less)
- thickness was calculated
- the vertical emissivity is infrared light with a wavelength of 5 ⁇ m to 25 ⁇ m when infrared light is irradiated from the protective layer side using a Fourier transform infrared spectroscopic (FT-IR) apparatus (manufactured by Varian) equipped with a variable angle reflection accessory.
- FT-IR Fourier transform infrared spectroscopic
- the specular reflectance was measured and determined according to JIS R3106-2008 (Testing method of transmittance, reflectance, emissivity, and solar heat gain of plate glass).
- ⁇ Salt water resistance test> A sample obtained by bonding the surface of the infrared reflective film on the transparent film substrate side to a 3 cm ⁇ 3 cm glass plate via a 25 ⁇ m thick adhesive layer was used as a sample. This sample is immersed in a 5% by weight sodium chloride aqueous solution, and the container containing the sample and the sodium chloride aqueous solution is placed in a dryer at 50 ° C., and after 5 and 10 days, changes in emissivity and appearance are confirmed. Evaluation was performed according to the following evaluation criteria.
- Example 1 (Formation of hard coat layer on substrate) On one side of a polyethylene terephthalate film (product name “Lumirror U48”, manufactured by Toray, 93% visible light transmittance 93%) with a thickness of 50 ⁇ m, an acrylic UV curable hard coat layer (product name “NH2000G” manufactured by Nippon Soda) ) With a thickness of 2 ⁇ m. Specifically, a hard coat solution was applied by a gravure coater, dried at 80 ° C., and then irradiated with ultraviolet light with an integrated light amount of 300 mJ / cm 2 by an ultrahigh pressure mercury lamp to be cured.
- infrared reflective layer was formed on the hard coat layer of the polyethylene terephthalate film substrate using a winding type sputtering apparatus. Specifically, by DC magnetron sputtering, a 30 nm-thick first metal oxide layer made of zinc-tin composite oxide (ZTO), a 15 nm-thick metal layer made of an Ag—Pd alloy, and a 30 nm-thickness made of ZTO. The second metal oxide layers were sequentially formed.
- ZTO metal oxide layer a target obtained by sintering zinc oxide, tin oxide and metal zinc powder at a weight ratio of 10: 82.5: 7.5 is used, and the power density is 2.67 W.
- Sputtering was performed under the conditions of / cm 2 and a substrate temperature of 80 ° C. At this time, the amount of gas introduced into the sputter deposition chamber was adjusted so that Ar: O 2 was 98: 2 (volume ratio).
- Ar: O 2 was 98: 2 (volume ratio).
- a metal target containing silver: palladium in a weight ratio of 96: 4 was used.
- a protective layer made of a fluorine-based ultraviolet curable resin having a cross-linked structure derived from a phosphate ester compound was formed on the infrared reflective layer with a thickness of 60 nm.
- 5 phosphoric acid ester compounds (trade name “KAYAMER PM-21”, manufactured by Nippon Kayaku Co., Ltd.) are added to 100 parts by weight of the solid content of the fluorine-based hard coat resin solution (trade name “JUA204”, manufactured by JSR). The solution added with parts by weight was applied using an applicator, dried at 60 ° C.
- Example 2 and Example 3 An infrared reflective film was produced in the same manner as in Example 1 except that the thickness of the transparent protective layer was changed as shown in Table 1.
- Example 4 In forming the transparent protective layer, an acrylic hard coat resin solution (manufactured by JSR, trade name “Z7535”) was used instead of the fluorine hard coat resin solution. Other than that was carried out similarly to Example 1, and produced the infrared reflective film.
- Example 5 to 8 An infrared reflective film was produced in the same manner as in Example 1 except that the addition amount of the phosphate ester compound during the formation of the transparent protective layer was changed as shown in Table 1.
- Example 9 An infrared reflective film was produced in the same manner as in Example 1 except that indium tin aluminum zinc oxide (ITAZO) was used as the first metal oxide layer and the second metal oxide layer instead of ZTO. .
- ITAZO indium tin aluminum zinc oxide
- an oxide target obtained by sintering indium oxide, tin oxide, aluminum oxide, and zinc oxide at a weight ratio of 45: 5: 1: 49 was used as a sputtering target.
- Example 10 As an additive material (crosslinking agent) for forming the transparent protective layer, instead of KAYAMER PM-21, a phosphoric acid monoester compound having one acryloyl group in the molecule (manufactured by Kyoeisha Chemical Co., Ltd., trade name “Light Acrylate P-1A”) )) was used. Other than that was carried out similarly to Example 1, and produced the infrared reflective film.
- Example 11 As an additive material (crosslinking agent) at the time of forming the transparent protective layer, dipentaerythritol pentaacrylate-succinic acid modified product (manufactured by Kyoeisha Chemical Co., Ltd., trade name “Light Acrylate DPE-6A-MS”) is used instead of the phosphate ester compound. Used. Other than that was carried out similarly to Example 1, and produced the infrared reflective film.
- Example 12 In forming the metal layer, a metal target containing silver: gold at a weight ratio of 90:10 was used instead of the Ag—Pd alloy, and a metal layer made of an Ag—Au alloy was formed. Other than that was carried out similarly to Example 1, and produced the infrared reflective film.
- Example 4 An infrared reflective film was produced in the same manner as in Example 1 except that the phosphate ester compound was not added during the formation of the transparent protective layer.
- Example 5 An infrared reflective film was produced in the same manner as in Example 1 except that the addition amount of the phosphate ester compound during the formation of the transparent protective layer was changed as shown in Table 1.
- Comparative Examples 7 and 8 As an additive material (crosslinking agent) for forming the transparent protective layer, a phosphate triester compound having three (meth) acryloyl groups in the molecule was used instead of KAYAMER PM-21. Other than that was carried out similarly to Example 1, and produced the infrared reflective film. In Comparative Example 7, trismethacryloyloxyethyl phosphate (manufactured by Osaka Organic Chemicals, trade name “Biscoat # 3PMA”) is used as a crosslinking agent.
- Example 9 An infrared reflective film was produced in the same manner as in Example 1 except that indium tin oxide (ITO) was used instead of ZTO as the first metal oxide layer and the second metal oxide layer.
- ITO indium tin oxide
- ZTO zinc titanium oxide
- an oxide target obtained by sintering indium oxide and tin oxide at a weight ratio of 90:10 was used as a sputtering target.
- Example 10 An infrared reflective film was produced in the same manner as in Example 1 except that indium zinc oxide (IZO) was used as the first metal oxide layer and the second metal oxide layer instead of ZTO.
- IZO indium zinc oxide
- ZTO zinc oxide
- an oxide target obtained by sintering indium oxide and zinc oxide at a weight ratio of 90:10 was used as a sputtering target.
- Table 1 shows the structures (instances of the metal oxide layer, the thickness of the transparent protective layer, and the type / addition amount of the crosslinking agent) and the evaluation results of the infrared reflective films of the above Examples and Comparative Examples.
- the infrared reflective films of Examples 1 to 12 have a low emissivity, scratch resistance and salt water resistance, and the iris phenomenon is suppressed.
- Examples 1 to 3 and Comparative Examples 1 to 3 in which the thickness of the transparent protective layer was changed When comparing Examples 1 to 3 and Comparative Examples 1 to 3 in which the thickness of the transparent protective layer was changed, a remarkable iris phenomenon was observed in Comparative Examples 2 and 3 in which the thickness of the transparent protective layer was large. In Comparative Example 3, the increase in emissivity due to the increase in the thickness of the transparent protective layer was significant. On the other hand, in Comparative Example 1 in which the thickness of the transparent protective layer is 20 nm, the scratch resistance is x, and the physical strength is insufficient because the thickness is small. In contrast, Examples 1 to 3 all showed good results. In particular, it is particularly preferable to adjust the thickness of the transparent protective layer within a range of about 45 nm to 100 nm as in Example 1 in order to have excellent scratch resistance and prevent the iris phenomenon from being observed. .
- Example 4 in which an acrylic curable polymer was used as the curable oil that is the main component of the transparent protective layer showed the same durability as Example 1 in which a fluorinated curable polymer was used. It was. From this result, it is understood that introduction of a crosslinked structure derived from the ester compound is important for imparting durability and adhesion to the infrared reflective film.
- Example 12 in which an Ag—Au alloy was formed instead of the Ag—Pd alloy as the metal layer of the infrared reflecting layer, the same durability as in Example 1 was exhibited.
- Example 9 in which ITAZO was used as the metal oxide layer of the infrared reflective layer also showed the same durability as Example 1.
- Comparative Example 9 using ITO and Comparative Example 9 using IZO it can be seen that the salt water resistance is lowered and the chemical stability is low. From these results, it can be seen that, in the present invention, the durability of the infrared reflective layer can be improved by using a composite metal oxide containing both zinc oxide and tin oxide as the metal oxide layer.
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Abstract
Description
図2に示すように、赤外線反射フィルム100は、透明フィルム基材10の一主面上に、赤外線反射層20および透明保護層30をこの順に備える。赤外線反射層20は、透明フィルム基材10側から、第一金属酸化物層21、金属層25および第二金属酸化物層22をこの順に備える。透明保護層30は、赤外線反射層20の第二金属酸化物層22に直接接している。
透明フィルム基材10としては、可撓性の透明樹脂フィルム等が用いられる。透明フィルム基材としては、可視光線透過率が80%以上のものが好適に用いられる。なお、本明細書において、可視光線透過率は、JIS A5759-2008(建築窓ガラスフィルム)に準じて測定される。
赤外線反射層20は、可視光を透過し、近赤外線および遠赤外線を反射するものであり、透明フィルム基材10側から、第一金属酸化物層21、金属層25および第二金属酸化物層22をこの順に備える。
金属層25は、赤外線反射の中心的な役割を有する。本発明においては、可視光線透過率と赤外線反射率を高める観点から、銀を主成分とする、銀層または銀合金層が好適に用いられる。銀は高い自由電子密度を有するため、近赤外線・遠赤外線の高い反射率を実現することができ、赤外線反射層20を構成する層の積層数が少ない場合でも、遮熱効果および断熱効果に優れる赤外線反射フィルムが得られる。
金属酸化物層21,22は、金属層25との界面における可視光線の反射量を制御して、高い可視光線透過率と赤外線反射率とを両立させる等の目的で設けられる。また、金属酸化物層は、金属層25の劣化を防止するための保護層としても機能し得る。赤外線反射層における反射および透過の波長選択性を高める観点から、金属酸化物層21,22の可視光に対する屈折率は、1.5以上が好ましく、1.6以上がより好ましく、1.7以上がさらに好ましい。
赤外線反射層20は、第一金属酸化物層21、金属層25および第二金属酸化物層22の3層からなるものであってもよく、これら以外の層を含むものであってもよい。例えば、金属層25と金属酸化物層21,22との密着性の向上や、金属層への耐久性の付与等を目的として、両者の間に他の金属層や金属酸化物層等を有していてもよい。また、第一金属酸化物層21の透明フィルム基材10側に、さらに金属層および金属酸化物層を追加して、赤外線反射層20を、5層構成、7層構成…として積層数を増大させ、可視光線や近赤外線の透過および反射の波長選択性を向上することもできる。
赤外線反射層20の第二金属酸化物層22上には、赤外線反射層の擦傷や劣化を防止する目的で、透明保護層30が設けられる。本発明において、透明保護層30は、第二金属酸化物層22と直接接している。
上記のように、本発明の赤外線反射フィルム100は、透明フィルム基材10の一主面上に、金属層および金属酸化物層を含む赤外線反射層20、ならびに透明保護層30を有する。透明保護層30は、第二金属酸化物層22上に直接形成されている。透明フィルム基材10と赤外線反射層20との間には、各層の密着性を高める目的や、赤外線反射フィルムの強度を高める等の目的で、ハードコート層や易接着層等が設けられていてもよい。易接着層やハードコート層等の材料や形成方法は特に限定されないが、可視光線透過率の高い透明な材料が好適に用いられる。
本発明の赤外線反射フィルムは、透明保護層30側から測定した垂直放射率が、0.20以下であることが好ましく、0.15以下であることがより好ましく、0.12以下であることがさらに好ましく、0.10以下であることが特に好ましい。なお、本明細書において、垂直放射率は、JlS R3106:2008(板ガラス類の透過率・反射率・放射率・日射熱取得率の試験方法)に準じて測定される。赤外線反射フィルムが5重量%の塩化ナトリウム水溶液に5日間浸漬された後の放射率の変化は、0.02以下が好ましく、0.01以下がより好ましい。赤外線反射フィルムの可視光線透過率は、60%以上が好ましく、65%以上がより好ましく、67%以上がさらに好ましい。上述のように、本発明においては、赤外線反射層20を構成する各層および透明保護層30の材料や厚みを調整することにより、上記の可視光線透過率、垂直放射率および耐久性を同時に兼ね備える赤外線反射フィルムが得られる。
本発明の赤外線反射フィルムは、建物や乗り物等の窓、植物等を入れる透明ケース、冷凍もしくは冷蔵のショーケース等に貼着し、冷暖房効果の向上や急激な温度変化を防ぐために、好ましく使用される。
<各層の厚み>
赤外線反射層を構成する各層の厚みは、集束イオンビーム加工観察装置(日立製作所製、製品名「FB-2100」)を用いて、集束イオンビーム(FIB)法により試料を加工し、その断面を、電界放出形透過電子顕微鏡(日立製作所製、製品名「HF-2000」)により観察して求めた。基材上に形成されたハードコート層、および透明保護層の厚みは、瞬間マルチ測光システム(大塚電子製、製品名「MCPD3000」)を用い、測定対象側から光を入射させた際の可視光の反射率の干渉パターンから、計算により求めた。なお、透明保護層の厚みが小さく、可視光域の干渉パターンの観察が困難なもの(厚み約150nm以下)については、上記赤外線反射層の各層と同様に、透過電子顕微鏡観察により厚みを求めた。
垂直放射率は、角度可変反射アクセサリを備えるフーリエ変換型赤外分光(FT-IR)装置(Varian製)を用いて、保護層側から赤外線を照射した場合の、波長5μm~25μmの赤外光の正反射率を測定し、JIS R3106-2008(板ガラス類の透過率・反射率・放射率・日射熱取得率の試験方法)に準じて求めた。
12cm×3cmにカットした赤外線反射フィルムの透明フィルム基材側の面を、厚み25μmの粘着剤層を介してアルミ板に貼り合わせたものを試料として用いた。学振型染色物摩擦堅ろう度試験機(安田精機製作所製)を用いて、アルコールタイプのウェットティッシュ(コーナン商事製)で500gの荷重を加えながら、アルミ板上の赤外線反射フィルムの透明保護層側の面の10cmの長さの範囲を1000往復擦った。試験後の試料の保護層への傷、剥離の有無を目視で評価し、以下の評価基準に従い、評価した。
A:表面に傷が認められないもの
B:表面に細い傷が認められるが剥離は生じていないもの
C:表面に多数の傷や剥離が認められるもの
赤外線反射フィルムの透明フィルム基材側の面を、厚み25μmの粘着剤層を介して3cm×3cmのガラス板に貼り合わせたものを試料として用いた。この試料を5重量%の塩化ナトリウム水溶液に浸漬し、試料および塩化ナトリウム水溶液が入った容器を50℃の乾燥機に入れ、5日後および10日後に放射率の変化および外観の変化を確認し、以下の評価基準に従って評価した。
A:10日間浸漬後も外観変化がなく、かつ放射率の変化が0.02以下であるもの
B:5日間浸漬後は外観変化がなく、かつ放射率の変化が0.02以下であるが、10日間浸漬後は、外観変化が確認されるもの
C:5日間浸漬後に、外観の変化が確認されるが、放射率の変化が0.02以下であるもの
D:5日間浸漬後に、外観の変化が確認され、放射率の変化が0.02以上であるもの
蛍光灯の下で、赤外線反射フィルムの透明保護層側表面の反射色を目視で確認し、以下の評価基準に従って評価した。
A:虹彩現象が生じていないもの
B:虹彩現象によるわずかな色付きが確認されるもの
C:虹彩現象により表面に虹模様が確認されるもの
(基材へのハードコート層の形成)
厚みが50μmのポリエチレンテレフタレートフィルム(東レ製、商品名「ルミラー U48」、可視光線透過率93%)の一方の面に、アクリル系の紫外線硬化型ハードコート層(日本曹達製、商品名「NH2000G」)が2μmの厚みで形成された。詳しくは、グラビアコーターにより、ハードコート溶液が塗布され、80℃で乾燥後、超高圧水銀ランプにより積算光量300mJ/cm2の紫外線が照射され、硬化が行われた。
ポリエチレンテレフタレートフィルム基材のハードコート層上に、巻取式スパッタ装置を用いて、赤外線反射層が形成された。詳しくは、DCマグネトロンスパッタ法により、亜鉛-錫複合酸化物(ZTO)からなる膜厚30nmの第一金属酸化物層、Ag-Pd合金からなる膜厚15nmの金属層、ZTOからなる膜厚30nmの第二金属酸化物層が順次形成された。ZTO金属酸化物層の形成には、酸化亜鉛と酸化錫と金属亜鉛粉末とを、10:82.5:7.5の重量比で焼結させたターゲットが用いられ、電力密度:2.67W/cm2、基板温度80℃の条件でスパッタが行われた。この際、スパッタ製膜室へのガス導入量は、Ar:O2が98:2(体積比)となるように調整された。金属層の形成には、銀:パラジウムを96:4の重量比で含有する金属ターゲットが用いられた。
赤外線反射層上に、リン酸エステル化合物に由来する架橋構造を有するフッ素系の紫外線硬化型樹脂からなる保護層が60nmの厚みで形成された。詳しくは、フッ素系ハードコート樹脂溶液(JSR製、商品名「JUA204」)の固形分100重量部に対して、リン酸エステル化合物(日本化薬製、商品名「KAYAMER PM-21」)を5重量部添加した溶液を、アプリケーターを用いて塗布し、60℃で1分間乾燥後、窒素雰囲気下で超高圧水銀ランプにより積算光量400mJ/cm2の紫外線が照射され、硬化が行われた。なお、上記リン酸エステル化合物は、分子中に1個のアクリロイル基を有するリン酸モノエステル化合物(前記の式(1)において、Xがメチル基、n=0、p=1である化合物)と分子中に2個のアクリロイル基を有するリン酸ジエステル化合物(前記の式(1)において、Xがメチル基、n=0、p=2である化合物)との混合物である。
透明保護層の厚みが表1に示すように変更されたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層の形成において、フッ素系ハードコート樹脂溶液に代えて、アクリル系ハードコート樹脂溶液(JSR製、商品名「Z7535」)が用いられた。それ以外は実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層形成時のリン酸エステル化合物の添加量が表1に示すように変更されたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。
第一金属酸化物層および第二金属酸化物層として、ZTOに代えて、酸化インジウム錫アルミニウム亜鉛(ITAZO)が用いられたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。ITAZO層の形成には、スパッタターゲットとして、酸化インジウム、酸化錫、酸化アルミニウム、および酸化亜鉛を、45:5:1:49の重量比で焼結させた酸化物ターゲットが用いられた。
透明保護層形成時の添加材料(架橋剤)として、KAYAMER PM-21に代えて、分子中に1個のアクリロイル基を有するリン酸モノエステル化合物(共栄社化学製、商品名「ライトアクリレート P-1A」)が用いられた。それ以外は、実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層形成時の添加材料(架橋剤)として、リン酸エステル化合物に代えて、ジペンタエリスリトールペンタアクリレート-コハク酸変性物(共栄社化学製、商品名「ライトアクリレート DPE-6A-MS」)が用いられた。それ以外は、実施例1と同様にして赤外線反射フィルムが作製された。
金属層の形成において、Ag-Pd合金に代えて、銀:金を90:10の重量比で含有する金属ターゲットが用いられ、Ag-Au合金からなる金属層が形成された。それ以外は実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層の厚みが表1に示すように変更されたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層形成時にリン酸エステル化合物が添加されなかったこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層形成時のリン酸エステル化合物の添加量が表1に示すように変更されたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。
透明保護層形成時の添加材料(架橋剤)として、KAYAMER PM-21に代えて、分子中に3個の(メタ)アクリロイル基を有するリン酸トリエステル化合物が用いられた。それ以外は、実施例1と同様にして赤外線反射フィルムが作製された。架橋剤として、比較例7では、トリスメタクリロイルオキシエチルフォスフェート(大阪有機化学製、商品名「ビスコート #3PMA」)が用いられ、比較例8では、トリスアクリロイルオキシエチルフォスフェート(大阪有機化学製、商品名「ビスコート #3PA」が用いられた。これらのリン酸エステルは、リン酸の由来の酸性基(O=P-OH)の全てがエステル化されたトリエステルであり、分子中に酸性基を有していない。
第一金属酸化物層および第二金属酸化物層として、ZTOに代えて、酸化インジウム錫(ITO)が用いられたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。ITO層の形成には、スパッタターゲットとして、酸化インジウムと酸化錫を、90:10の重量比で焼結させた酸化物ターゲットが用いられた。
第一金属酸化物層および第二金属酸化物層として、ZTOに代えて、酸化インジウム亜鉛(IZO)が用いられたこと以外は、実施例1と同様にして赤外線反射フィルムが作製された。ITO層の形成には、スパッタターゲットとして、酸化インジウムと酸化亜鉛を、90:10の重量比で焼結させた酸化物ターゲットが用いられた。
10: 透明フィルム基材
20: 赤外線反射層
21,22: 金属酸化物層
25: 金属層
30: 保護層
60: 接着剤層
Claims (3)
- 透明フィルム基材上に、赤外線反射層および透明保護層をこの順に備える赤外線反射フィルムであって、
前記赤外線反射層は、前記透明フィルム基材側から、第一金属酸化物層;銀を主成分とする金属層;および酸化亜鉛と酸化錫を含む複合金属酸化物からなる第二金属酸化物層、をこの順に備え、
前記透明保護層は、前記第二金属酸化物層に直接接しており;厚みが30nm~150nmであり;酸性基と重合性官能基とを同一分子中に有するエステル化合物に由来する架橋構造を有する有機物層であり、
前記透明保護層中の、前記エステル化合物に由来する構造の含有量が1重量%~40重量%である、赤外線反射フィルム。 - 前記エステル化合物が、リン酸と重合性官能基を有する有機酸とのエステル化合物である、請求項1に記載の赤外線反射フィルム。
- 前記透明保護層側から測定した垂直放射率が0.2以下である、請求項1または2に記載の赤外線反射フィルム。
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US10288782B2 (en) | 2019-05-14 |
AU2017200942B2 (en) | 2017-12-21 |
SG11201505976WA (en) | 2015-09-29 |
EP3175982A1 (en) | 2017-06-07 |
CN105584120A (zh) | 2016-05-18 |
JP6000991B2 (ja) | 2016-10-05 |
EP2952343A4 (en) | 2016-02-10 |
AU2017200942A1 (en) | 2017-03-02 |
CN106739242A (zh) | 2017-05-31 |
KR20150115851A (ko) | 2015-10-14 |
EP3175982B1 (en) | 2018-11-07 |
CA2899694C (en) | 2017-03-21 |
TW201434628A (zh) | 2014-09-16 |
US20160003989A1 (en) | 2016-01-07 |
AU2016202194A1 (en) | 2016-05-05 |
KR101860282B1 (ko) | 2018-05-21 |
KR101767801B1 (ko) | 2017-08-11 |
TWI516367B (zh) | 2016-01-11 |
EP2952343B1 (en) | 2017-03-01 |
AU2016202194B2 (en) | 2016-11-10 |
AU2014213392A1 (en) | 2015-08-27 |
CA2899694A1 (en) | 2014-08-07 |
CN103963401B (zh) | 2017-04-12 |
KR20170086689A (ko) | 2017-07-26 |
HK1213529A1 (zh) | 2016-07-08 |
HK1218735A1 (zh) | 2017-03-10 |
CN103963401A (zh) | 2014-08-06 |
AU2017200930A1 (en) | 2017-03-02 |
AU2014213392B2 (en) | 2016-03-17 |
EP2952343A1 (en) | 2015-12-09 |
JP2014167617A (ja) | 2014-09-11 |
SG10201700401XA (en) | 2017-03-30 |
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