WO2013161187A1 - 半導体製造装置のガス分流供給装置 - Google Patents
半導体製造装置のガス分流供給装置 Download PDFInfo
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- WO2013161187A1 WO2013161187A1 PCT/JP2013/002257 JP2013002257W WO2013161187A1 WO 2013161187 A1 WO2013161187 A1 WO 2013161187A1 JP 2013002257 W JP2013002257 W JP 2013002257W WO 2013161187 A1 WO2013161187 A1 WO 2013161187A1
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- flow rate
- gas
- control unit
- pressure
- orifices
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0664—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87708—With common valve operator
- Y10T137/87772—With electrical actuation
Definitions
- the present invention relates to an improvement of a gas supply apparatus for a semiconductor manufacturing apparatus, and by providing a plurality of orifices connected in parallel to the orifice of a pressure type flow rate control apparatus, a required amount to a plurality of process chambers performing the same process.
- the process gas can be accurately supplied in a split flow, and the actual flow rate of the process gas during the split flow supply can be arbitrarily checked by organically combining this pressure type flow control device with a thermal mass flow control device.
- the present invention relates to a gas shunt supply device for a semiconductor manufacturing apparatus.
- FIG. 5 shows a configuration of a pressure type flow rate control device used in a gas supply device of a semiconductor manufacturing apparatus.
- the pressure type flow rate control device FCS includes a control valve CV, a temperature detector T, and a pressure detector P. , The orifice OL and the calculation control unit CD.
- the calculation control unit CD includes a temperature correction / flow rate calculation circuit CDa, a comparison circuit CDb, an input / output circuit CDc, an output circuit CDd, and the like.
- the detected values from the pressure detector P and the temperature detector T are converted into digital signals and input to the temperature correction / flow rate calculation circuit CDa, where the temperature of the detected pressure is detected.
- the flow rate calculation value Qt is input to the comparison circuit CDb.
- the set flow rate signal Qs is input from the terminal In, converted into a digital value by the input / output circuit CDc, and then input to the comparison circuit CDb, where it is compared with the flow rate calculation value Qt from the temperature correction / flow rate calculation circuit CDa. Is done.
- the control signal Pd is output to the drive portion of the control valve CV, and the control valve CV is driven in the closing direction via the drive mechanism CVa. That is, the valve is driven in the valve closing direction until the difference (Qt ⁇ Qs) between the calculated flow rate value Qt and the flow rate setting signal Qs becomes zero.
- the pressure type flow rate control device FCS itself is a known one, and the downstream pressure P 2 of the orifice OL (that is, the pressure P 2 on the process chamber side) and the upstream pressure P 1 of the orifice OL (that is, the control valve).
- the downstream pressure P 2 of the orifice OL that is, the pressure P 2 on the process chamber side
- the upstream pressure P 1 of the orifice OL that is, the control valve
- the supply lines GL 1 , GL 2 are respectively provided with pressure-type flow rate control devices FCS 1 and FCS 2 , thereby adjusting the gas flow rates Q 1 and Q 2 of the supply lines GL 1 and GL 2 . Therefore, it is necessary to install a pressure type flow rate control device for each process gas branch flow path, and there is a basic problem that it is difficult to reduce the size and cost of the gas supply device for semiconductor manufacturing equipment.
- FCS 1 and FCS 2 pressure-type flow rate control devices
- S is a gas supply source
- G is a process gas
- C is a chamber
- D is a two-part gas discharger
- H is a wafer
- I is a wafer holder
- 7 RG is a pressure regulator
- MFM 1 and MFM 2 are thermal flow meters
- P 2 A, P 2 B, and P 1 are pressure gauges
- V 1 , V 2 , V 3 , V 4 , VV 1 , VV 2 is a valve
- VP 1 and VP 2 are exhaust pumps (Japanese Patent Laid-Open No. 2000-305630).
- each branch gas supply line GL 1 , GL 2 includes a sonic nozzle or orifice SN 1 .
- An automatic pressure regulator ACP provided on the gas supply source side via SN 2 is adjusted by the control unit ACQ, and the primary pressure P 1 of each of the orifices SN 1 and SN 2 is changed to the secondary side of the orifices SN 1 and SN 2.
- a diversion supply device has been developed that is capable of obtaining predetermined divided flow rates Q 1 and Q 2 determined by the diameters of the orifices SN 1 and SN 2 by maintaining the pressure P 2 at about three times (Japanese Patent Laid-Open No. 2003-2003). 323217).
- the automatic pressure regulator ACP, the control unit ACQ, and the orifices SN 1 and SN 2 are individually installed, and the flow rates Q 1 and Q 2 are set separately.
- the hold the primary pressure P 1 to a flow rate in proportion to the primary pressure P 1 to 3 times the secondary pressure P 2, the flow of critical state the gas stream flowing through the orifices SN 1, SN 2 Like to do.
- control system of the control unit ACQ and the automatic pressure regulator ACP does not employ so-called feedback control, and as a result, the automatic pressure regulator changes fluctuations in the primary pressure P 1 caused by the opening / closing operation of the on-off valves V 1 and V 2. It becomes difficult for the ACP to adjust quickly, and as a result, there is a problem that the opening / closing operation of the on-off valves V 1 , V 2 causes fluctuations in the flow rates Q 1 , Q 2 (or the flow rate Q).
- the primary pressure P 1 is adjusted by the automatic pressure regulator ACP, and the partial flow rate is maintained while the ratio P 1 / P 2 between the primary pressure P 1 and the secondary pressure P 2 of the orifice is maintained at about 3 or more. Since Q 1 and Q 2 are controlled, when the value of P 1 / P 2 approaches 2 and the gas flow becomes a gas flow under the so-called non-critical expansion condition, There is a problem that the partial flow rate control becomes difficult.
- the present invention relates to the above-mentioned problem in the gas shunt supply device using the conventional pressure flow control device, that is, (i) when the pressure flow control device is provided in each gas supply line (each shunt line). miniaturization of the gas supply apparatus, it hardly cost reduction aims, also (ii) to adjust the primary pressure P 1 of the orifice by an automatic pressure controller provided in the gas supply side, the pressure P 1 through each orifice
- an automatic pressure controller provided in the gas supply side
- the process gas can be economically and highly accurately controlled to multiple process chambers that perform the same process with the gas shunt supply device.
- the invention of claim 1 of the present application includes a control valve 3 constituting a pressure type flow rate control unit 1 a connected to a process gas inlet 11, a gas supply main pipe 8 communicating with the downstream side of the control valve 3, and a downstream of the gas supply main pipe 8.
- the temperature sensor 4 provided in the vicinity of the process gas passage between the control valve 3 and the orifices 6a and 6n, and the process gas passage between the control valve 3 and the orifices 6a and 6n.
- the pressure sensor 5, the diverted gas outlets 11a and 11n provided on the outlet side of the orifices 6a and 6n, the pressure signal from the pressure sensor 5 and the temperature signal from the temperature sensor 4 are input.
- the control signal Pd for opening and closing the control valve 3 in a direction in which the difference between the calculated flow rate value and the flow rate set value decreases is calculated while calculating the total flow rate Q of the process gas flowing through the orifices 6a and 6n.
- a calculation control unit 7 including a pressure type flow rate calculation control unit 7a that outputs to the drive unit 3a, and the pressure type flow control unit 1a controls the flow rate of the process gas flowing through each of the orifices 6a and 6n. This is a basic configuration of the invention.
- the invention of claim 2 is a thermal flow sensor constituting a control valve 3 constituting a pressure type flow rate control unit 1a connected to a process gas inlet 11 and a thermal mass control unit 1b connected to a downstream side of the control valve 3.
- a gas supply main pipe 8 communicating with the downstream side of the thermal flow sensor 2
- a plurality of branch pipes 9 a, 9 n connected in parallel to the downstream side of the gas supply main pipe 8
- the branch pipes 9 a, 9 n Branch pipe on / off valves 10a and 10n
- orifices 6a and 6n provided downstream of the branch pipe on / off valves 10a and 10n, and the vicinity of the process gas passage between the control valve 3 and the orifices 6a and 6n
- a pressure sensor 5 provided in a process gas passage between the control valve 3 and the orifices 6a and 6n, and a diverted gas outlet 1 provided on the outlet side of the orifices 6a and 6n.
- the pressure signal from the pressure sensor 5 and the temperature signal from the temperature sensor 4 are input to calculate the total flow rate Q of the process gas flowing through the orifices 6a, 6n, and the calculated flow value and flow rate.
- the flow rate signal 2c from the pressure type flow rate calculation control unit 7a for outputting the control signal Pd for opening and closing the control valve 3 to the valve drive unit 3a and the thermal type flow sensor 2 are input in the direction in which the difference from the set value decreases.
- a calculation control unit 7 including a thermal flow rate calculation control unit 7b for calculating and displaying the total flow rate Q of the process gas flowing through the orifices 6a and 6n from the flow rate signal 2c, and flowing through the orifices 6a and 6b.
- the pressure type flow rate control unit 1a controls the flow rate of the process gas, and the process gas flow When the gas flow does not satisfy the field expansion condition in which the basic configuration of the invention that it has to perform flow control of the process gas by the thermal mass flow controller 1b.
- the plurality of orifices 6a, 6n have the same diameter, and the process gas Qa, Qn having the same flow rate is supplied to the branch pipes 9a, 9n. It is a thing.
- the process gas is circulated only to any of the plurality of branch lines 9a, 9n.
- control valve 3 the orifices 6a and 6n, the pressure sensor 5, the temperature sensor 4, the branch pipes 9a and 9n, the branch pipe open / close 10a and 10n, and the gas supply main pipe 8 are provided.
- a single body is integrally assembled and formed.
- the invention of claim 6 is the control valve 3, thermal flow sensor 2, orifice 6a, 6n, pressure sensor 5, temperature sensor 4, gas supply main pipe 8, branch pipes 9a, 9b, branch in the invention of claim 2.
- the pipe opening / closing valves 10a and 10n are integrally assembled to one body body.
- the invention of claim 7 is the invention of claim 2, wherein the flow rate control of the process gas is controlled by the pressure type flow rate control unit 1a and the actual flow rate of the process gas is displayed by the thermal type flow rate control unit 1b. is there.
- the invention of claim 8 is the invention of claim 2, wherein the pressure sensor 5 is provided between the outlet side of the control valve 3 and the inlet side of the thermal flow sensor 2.
- the operation control unit 7 performs the following.
- process gas is supplied to a plurality of process chambers through a plurality of orifices connected in parallel by one pressure type flow rate control unit, or one pressure type flow rate control unit and one thermal type flow rate control unit. Since the supply structure is adopted, the structure of the gas shunt supply device can be greatly simplified and reduced in size and size. In addition, when a plurality of orifices are used as the same orifice, it is possible to supply the same flow of process gas to a plurality of process chambers performing the same process at the same time, thereby further reducing the size of the gas distribution supply device. Become.
- each member constituting the gas shunt supply device is integrally assembled in one body body, the gas shunt supply device can be greatly reduced in size.
- the operation control unit is configured to control the opening / closing of each branch pipe on / off valve, the process gas can be supplied only to an arbitrary branch pipe, and the branch pipes that supply gas can be switched between each other. Easy to do.
- the thermal flow rate control unit since the thermal flow rate control unit is provided, even if the process gas is under non-critical expansion conditions, the thermal flow rate control unit can control the flow rate with high accuracy, and the pressure type under critical expansion conditions. Even while the flow rate control is performed by the flow rate control unit, the actual flow rate can be appropriately checked using the thermal flow rate control unit.
- 1 is a configuration system diagram of a gas shunt supply device of a semiconductor manufacturing apparatus according to an embodiment of the present invention. It is a systematic block diagram of the gas shunt supply apparatus of the other semiconductor manufacturing apparatus which concerns on embodiment of this invention.
- 1 is a configuration system diagram showing a first embodiment of a gas shunt supply device. It is a systematic diagram which shows 2nd Example of a gas shunt supply apparatus. It is composition explanatory drawing of the conventional pressure type flow control apparatus. It is composition explanatory drawing of the gas shunt supply apparatus using the conventional pressure type flow control apparatus. It is structure explanatory drawing of the other gas shunt supply apparatus using the conventional pressure type flow control apparatus. It is a schematic diagram of a flow control system using a conventional automatic pressure regulator.
- FIG. 1 is a configuration system diagram according to a first embodiment of a gas shunt supply device of a semiconductor manufacturing apparatus according to the present invention, and the gas shunt supply device has two parts, a pressure type flow control unit and a thermal type flow control unit. It is composed of
- the gas shunt supply device 1 is formed of a pressure type flow rate control unit 1a and a thermal type flow rate control unit 1b.
- the pressure type flow rate control unit 1a includes a control valve 3, a temperature sensor 4, a pressure sensor 5, a plurality of orifices 6a and 6n, a pressure type flow rate calculation control unit 7a forming a calculation control unit 7, a gas supply main pipe 8, and the like.
- the thermal flow rate control unit 1b includes a thermal flow rate sensor unit 2 and a thermal flow rate calculation control unit 7b that forms the calculation control unit 7, and the gas flowing through the control unit orifices 6a and 6n is critically expanded.
- the diverted gas having the flow rates Qa and Qn is supplied to the respective chambers CHa and CHn while performing the flow control by the thermal flow control unit 1b.
- FIG. 2 is a configuration system diagram according to the second embodiment of the present invention, except that the position of the thermal flow sensor 2 in the first embodiment moves to the upstream side of the control valve 3.
- Other configurations are exactly the same as those in FIG.
- 3a is a piezo-type valve drive section
- 8 is a gas supply main pipe
- 9a and 9n are branch pipes
- 10 1 and 10n are branch pipe opening / closing valves
- 11 is a process gas inlet.
- 11a and 11n branch gas outlets
- 12 purge gas inlets
- 13 signal input / output terminals
- F filters, 14a and 14n automatic open / close valves 15 process gases, 15a automatic open / close valves, 16 purge gases, 16a Is an automatic open / close valve
- 17 is an input / output signal.
- FIG. 3 shows a first embodiment of the present invention, and the gas shunt supply device 1 is composed of two parts, a pressure type flow rate control unit 1a and a thermal type flow rate control unit 1b.
- the pressure type flow rate control unit 1a includes a control valve 3, a temperature sensor 4, a pressure sensor 5, a plurality of orifices 6a and 6n, and a pressure type flow rate calculation control unit 7a that forms a calculation control unit 7.
- the thermal flow rate control unit 1b is composed of a thermal flow rate sensor 2 and a thermal flow rate calculation control unit 7b forming the calculation control unit 7.
- the pressure type flow rate control unit 1a is described as control valve 3, temperature sensor 4, the pressure sensor 5, the orifice 6a, are composed of 6n and the pressure type flow rate calculation control unit 7a and the like, the flow rate setting signal from the input terminal 7a 1 but also, the orifice 6a computed by the pressure type flow rate control unit 1a from the output terminal 7a 2, the total process gas flow rate flowing through 6n (i.e., process gas flow rate Q flowing through the gas supply main pipe 8) is the flow rate output signal of the output Is done.
- the orifices 6a and 6n are provided.
- the number of diversion supply paths (that is, the number of orifices) is usually two or more.
- the diameter of each orifice 6a, 6n is appropriately determined according to the required gas supply flow rate to each process chamber CHa, CHn, but the diameter of each orifice 6a, 6n is the same, and each process chamber CHa, It is desirable to supply the shunt gases Qa and Qn at the same flow rate to CHn.
- the pressure-type flow rate control unit 1a itself using the orifices 6a and 6n is a well-known technique such as Japanese Patent No. 3291161, and the pressure detected by the pressure sensor 5 is the flow rate of the fluid flowing through the orifice under critical expansion conditions.
- the pressure type flow rate calculation control unit 7a Based on the pressure type flow rate calculation control unit 7a based on the control signal Pd proportional to the difference between the flow rate setting signal input from the input terminal 7a 1 and the calculated flow rate signal to the valve drive unit 3a of the control valve 3. Output.
- the pressure type flow rate control unit 1a is provided with various attachment mechanisms such as a known zero point adjustment mechanism, a flow rate abnormality detection mechanism, and a gas type conversion mechanism (CF value conversion mechanism).
- CF value conversion mechanism gas type conversion mechanism
- 11 is a process gas inlet
- 10a and 10n are shunt gas outlets
- 8 is a gas supply main pipe in the instrument body.
- the thermal flow rate control unit 1b constituting the gas shunt supply device 1 includes a thermal flow rate sensor 2 and a thermal flow rate calculation control unit 7b.
- the thermal flow rate calculation control unit 7b includes an input terminal 7b 1. and the output terminal 7b 2 are provided respectively. Then, from the input terminal 7b 1 is input flow rate setting signal, from the output terminal 7b 2 are output flow signal detected by the thermal flow sensor 2 (actual flow rate signal).
- thermal flow control unit 1b itself is known, detailed description thereof is omitted here.
- thermal type flow rate calculation control unit 1b used in the FCS-T1000 series manufactured by Fujikin Co., Ltd. is used.
- the actual flow rate signal and the calculated flow rate signal are appropriately input / output between the thermal flow rate calculation control unit 7b and the pressure type flow rate calculation control unit 7a.
- the difference between the two and the magnitude of the difference can be monitored, or a warning can be issued when the difference between the two exceeds a certain value.
- FIG. 4 shows a second embodiment of the gas shunt supply device 1 according to the present invention, in which the mounting positions of the control valve 3 and the thermal flow sensor 2 are reversed from those in the first embodiment. .
- a pressure sensor is separately provided on the downstream side of each orifice to monitor whether or not the fluid flowing through the orifices 6a and 6n is under critical expansion conditions.
- the flow rate control can be automatically switched from the pressure type flow rate control unit 1a to the control by the thermal type flow rate control unit 1b. Further, it is a matter of course that each of the branch pipe opening / closing valves 10a and 10n is appropriately opened / closed by a signal from the arithmetic control unit 7.
- FIGS. 1 and 2 the positions of the thermal flow sensor 2 and the control valve 3 are interchanged, but the influence of pressure fluctuations on the supply side of the process gas 15 is reduced. Tests have confirmed that it is desirable to have a configuration (FIGS. 1 and 3) in which the thermal flow sensor 2 is disposed downstream of the control valve 3 in order to perform flow control with higher accuracy.
- the mounting positions (detection positions) of the temperature sensor 4 and the pressure sensor 5 are changed, but the mounting positions of the temperature sensor 4 and the pressure sensor 5 are changed. Since there is almost no fluctuation in the flow control accuracy due to the temperature sensor 4, the temperature sensor 4 may be installed at any location on the gas supply main pipe 8 as long as it is downstream of the control valve 3 or the thermal flow sensor 2. This has been confirmed by testing.
- valves 10a and 10n, the process gas inlet 11, the diverted gas outlets 11a and 11n, etc. are shown as being independent of each other, in reality, one body body (not shown) has a pressure type flow control unit 1a and The above-mentioned members forming the thermal flow rate controller 1b are integrally formed and assembled and fixed.
- FIGS. 1 and 3 first, a purge process is performed inside the gas shunt supply device 1 with the purge gas 16, and when this is completed, the on-off valves 15a and 16a are closed and the branch pipe on-off valves 10a and 10n are opened.
- the chambers CHa and CHn are depressurized.
- the set flow rate signal is input from the input terminal 7a 1 of the pressure type flow rate calculation control unit 7a of the calculation control unit 7, and the predetermined set flow rate signal is also input to the input terminal 7b 1 of the thermal type flow rate calculation control unit 7b. .
- the gas diversion supply device 1 is mainly used when supplying a process gas to a plurality of process chambers CHa and CHn performing the same process. For this reason, the orifices 6a and 6n are usually selected to have the same diameter.
- the orifice 6a when the critical expansion condition is satisfied between the primary side pressure P 1 of 6n and the secondary side pressure P 2, flow rate control is performed by the pressure type flow rate control unit 1a.
- the thermal flow rate controller 1b is operated when necessary, and the actual flow rate of the process gas Q flowing through the gas supply main pipe 8 is checked and displayed.
- the process gas flow is supplied to all of the plurality of branch flow lines 9a and 9n.
- only the necessary flow branch lines for example, an orifice 6a is provided.
- both the pressure type flow rate control unit 1a and the thermal type flow rate control unit 1b are provided.
- the thermal type flow rate control unit 1b is deleted and the pressure type flow rate control unit 1b is deleted. It is also possible to provide a gas diversion supply device including only the portion 1b.
- the present invention can be widely applied not only as a gas shunt supply facility of a semiconductor manufacturing apparatus but also to a fluid supply apparatus such as a chemical manufacturing apparatus as long as the fluid under a critical expansion condition is shunted.
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Abstract
Description
図5は、半導体製造装置のガス供給装置に用いられている圧力式流量制御装置の構成を示すものであり、この圧力式流量制御装置FCSはコントロール弁CV、温度検出器T、圧力検出器P、オリフィスOL及び演算制御部CD等から構成されており、また、演算制御部CDは温度補正・流量演算回路CDa、比較回路CDb、入出力回路CDc及び出力回路CDd等から構成されている。
一方、設定流量信号Qsが端子Inから入力され、入出力回路CDcでディジタル値に変換されたあと比較回路CDbへ入力され、ここで前記温度補正・流量演算回路CDaからの流量演算値Qtと比較される。そして、流量演算値Qtが流量設定信号Qsより大きい場合には、コントロール弁CVの駆動部へ制御信号Pdが出力され、コントロール弁CVがその駆動機構CVaを介して閉鎖方向へ駆動される。即ち、演算流量値Qtと流量設定信号Qsとの差(Qt-Qs)が零となるまで閉弁方向へ駆動される。
そのため、プロセスガスの分流路毎に圧力式流量制御装置を設置する必要があり、半導体製造装置用ガス供給装置の小型化や低コスト化を図り難いと云う基本的な問題がある。
尚、図6においてSはガス供給源、Gはプロセスガス、Cはチャンバ、Dは2区分型ガス放出器、Hはウエハ、Iはウエハ保持台であり(特開2008-009554号)、また、図7においてRGは圧力調整器、MFM1,MFM2は熱式流量計、P2A,P2B,P1は圧力計、V1,V2,V3,V4,VV1,VV2はバルブ、VP1,VP2は排気ポンプである(特開2000-305630)。
図1は、本発明に係る半導体製造装置のガス分流供給装置の第1実施形態に係る構成系統図であり、当該ガス分流供給装置は圧力式流量制御部と熱式流量制御部の二つの部分から構成されている。
また、熱式流量制御部1bは熱式流量センサ部2と演算制御部7を形成する熱式流量演算制御部7b等から構成されており、制御部オリフィス6a・6nを流通するガスが臨界膨張条件外の状態にある場合には、熱式流量制御部1bによって流量制御を行いつつ流量Qa・Qnの分流ガスが各チャンバCHa、CHnへ供給されて行く。
また、各オリフィス6a、6nの口径は必要とする各プロセスチャンバCHa、CHnへのガス供給流量に応じて適宜に決定されるが、各オリフィス6a、6nの口径を同一として、各プロセスチャンバCHa、CHnへ同流量の分流ガスQa、Qnを供給する構成とするのが望ましい。
また、この圧力式流量制御部1aには、公知の零点調整機構や流量異常検出機構、ガス種変換機構(CF値変換機構)等の各種付属機構が設けられていることは勿論である。
更に、図3に於いて11はプロセスガス入口、10a・10nは分流ガス出口、8は器械本体内のガス供給主管である。
また、本実施例では、熱式流量演算制御部1bとして株式会社フジキン製のFCS-T1000シリーズに搭載されているものを使用している。
更に、各分流管路開閉弁10a・10nは演算制御部7からの信号により適宜に開閉駆動されることは勿論である。
その結果、オリフィス6a、6nを流通するプロセスガス流が臨界膨張条件外の状態となっても、前記P1/P2の圧力条件に関係なしに高精度な流量制御を行うことが出来る。
Q 全プロセスガス流量
Qa,Qn 分流ガス
P1 オリフィス上流側圧力
P2 オリフィス下流側圧力
1 半導体製造装置のガス分流供給装置
1a 圧力式流量制御部
1b 熱式流量制御部
2 熱式流量センサ
3 コントロール弁
3a ピエゾ型弁駆動部
4 温度センサ
5 圧力センサ
6a,6n オリフィス
7 演算制御部
7a 圧力式流量演算制御部
7b 熱式流量演算制御部
8 ガス供給主管
9a,9n 分岐管路
10a,10n 分岐管路開閉弁
11 プロセスガス入口
11a,11n 分流ガス出口
12 パージガス入口
13 信号入出力
14a,14n 開閉弁
15 プロセスガス
15a 開閉弁
16 パージガス
16a 開閉弁
17 入・出力信号
Claims (9)
- プロセスガス入口(11)に接続した圧力式流量制御部(1a)を構成するコントロール弁(3)と,コントロール弁(3)の下流側に連通するガス供給主管(8)と,ガス供給主管(8)の下流側に並列状に接続した複数の分岐管路(9a)、(9n)と,各分岐管路(9a)、(9n)に介設した分岐管路開閉弁(10a)、(10n)と,分岐管路開閉弁(10a)、(10n)の下流側に設けたオリフィス(6a)、(6n)と,前記コントロール弁(3)とオリフィス(6a)、(6n)の間のプロセスガス通路近傍に設けた温度センサ(4)と,前記コントロール弁(3)とオリフィス(6a)、(6n)の間のプロセスガス通路に設けた圧力センサ(5)と,前記オリフィス(6a)、(6n)の出口側に設けた分流ガス出口(11a)、(11n)と,前記圧力センサ(5)からの圧力信号及び温度センサ(4)からの温度信号が入力され、前記オリフィス(6a)、(6n)を流通するプロセスガスの総流量Qを演算すると共に、演算した流量値と流量設定値との差が減少する方向に前記コントロール弁(3)を開閉作動させる制御信号(Pd)を弁駆動部(3a)へ出力する圧力式流量演算制御部(7a)からなる演算制御部(7)とを具備し、前記圧力式流量制御部(1a)により各オリフィス(6a)、(6n)を流通するプロセスガス流量制御を行う構成としたことを特徴とする半導体製造装置のガス分流供給装置。
- プロセスガス入口(11)に接続した圧力式流量制御部(1a)を構成するコントロール弁(3)と,コントロール弁(3)の下流側に接続した熱式質量制御部(1b)を構成する熱式流量センサ(2)と,熱式流量センサ(2)の下流側に連通するガス供給主管(8)と,ガス供給主管(8)の下流側に並列状に接続した複数の分岐管路(9a)、(9n)と,各分岐管路(9a)、(9n)に介設した分岐管路開閉弁(10a)、(10n)と,分岐管路開閉弁(10a)、(10n)の下流側に設けたオリフィス(6a)、(6n)と,前記コントロール弁(3)とオリフィス(6a)、(6n)の間のプロセスガス通路近傍に設けた温度センサ(4)と,前記コントロール弁(3)とオリフィス(6a)、(6n)の間のプロセスガス通路に設けた圧力センサ(5)と,前記オリフィス(6a)、(6n)の出口側に設けた分流ガス出口(11a)、(11n)と,前記圧力センサ(5)からの圧力信号及び温度センサ(4)からの温度信号が入力され、前記オリフィス(6a)、(6n)を流通するプロセスガスの総流量Qを演算すると共に、演算した流量値と流量設定値との差が減少する方向に前記コントロール弁(3)を開閉作動させる制御信号(Pd)を弁駆動部(3a)へ出力する圧力式流量演算制御部(7a)及び前記熱式流量センサ(2)からの流量信号(2c)が入力され当該流量信号(2c)からオリフィス(6a)、(6n)を流通するプロセスガスの総流量(Q)を演算表示する熱式流量演算制御部(7b)とからなる演算制御部(7)と,を具備し、各オリフィス(6a)、(6b)を流通するプロセスガス流が臨界膨張条件を満たすガス流のときは前記圧力式流量制御部(1a)によりプロセスガスの流量制御を行うと共に、プロセスガス流が臨界膨張条件を満たさないガス流のときは前記熱式質量流量制御部(1b)によりプロセスガスの流量制御を行う構成としたことを特徴とする半導体製造装置のガス分流供給装置。
- 複数のオリフィス(6a)、(6n)の口径を同一とし、各分岐管路(9a)、(9n)に同流量のプロセスガス(Qa)、(Qn)を供給するようにした請求項1又は請求項2に記載の半導体製造装置のガス分流供給装置。
- 複数の分岐管路(9a)、(9n)の内の任意の分岐管路のみへプロセスガスを流通させる構成とした請求項1又は請求項2に記載の半導体製造装置のガス分流供給装置。
- コントロール弁(3),オリフィス(6a)、(6n),圧力センサ(5),温度センサ(4),分岐管路(9a)、(9n),分岐管開閉(10a)、(10n),ガス供給主管(8)を一つのボディ体に一体的に組み付け形成するようにした請求項1に記載の半導体製造装置のガス分流供給装置。
- コントロール弁(3),熱式流量センサ(2),オリフィス(6a)、(6n),圧力センサ(5),温度センサ(4),ガス供給主管(8),分岐管路(9a)、(9b),分岐管路開閉弁(10a)、(10n)を一つのボディ体に一体的に組み付け形成するようにした請求項2に記載の半導体製造装置のガス分流供給装置。
- 圧力式流量制御部(1a)によりプロセスガスの流量制御を行うと共に、熱式流量制御部(1b)によりプロセスガスの実流量を表示する構成とした請求項2に記載の半導体製造装置のガス分流供給装置。
- 圧力センサ(5)を、コントロール弁(3)の出口側と熱式流量センサ(2)の入口側の間に設けるようにした請求項2に記載の半導体製造装置のガス分流供給装置。
- 圧力式流量演算制御部(7a)で演算した流体流量と熱式質量演算制御部(7b)で演算した流体流量間の差が設定値を越えると警報表示を行う演算制御部(7)とした請求項2に記載の半導体製造装置のガス分流供給装置。
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KR1020147026268A KR101632602B1 (ko) | 2012-04-27 | 2013-04-01 | 반도체 제조 장치의 가스 분류 공급 장치 |
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KR20200054994A (ko) * | 2017-09-29 | 2020-05-20 | 히타치 긴조쿠 가부시키가이샤 | 질량 유량 제어 시스템 및 당해 시스템을 포함하는 반도체 제조 장치 및 기화기 |
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