WO2013155729A1 - 温控针支撑基板进行配向膜预干燥的装置及方法 - Google Patents

温控针支撑基板进行配向膜预干燥的装置及方法 Download PDF

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Publication number
WO2013155729A1
WO2013155729A1 PCT/CN2012/074634 CN2012074634W WO2013155729A1 WO 2013155729 A1 WO2013155729 A1 WO 2013155729A1 CN 2012074634 W CN2012074634 W CN 2012074634W WO 2013155729 A1 WO2013155729 A1 WO 2013155729A1
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WIPO (PCT)
Prior art keywords
substrate
temperature control
needle
drying
heater
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PCT/CN2012/074634
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English (en)
French (fr)
Inventor
朱美娜
赵建君
施翔尹
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深圳市华星光电技术有限公司
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Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US13/515,806 priority Critical patent/US9075266B2/en
Publication of WO2013155729A1 publication Critical patent/WO2013155729A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Definitions

  • the present invention relates to an alignment film pre-drying technique, and more particularly to an apparatus and method for pre-drying an alignment film by a temperature-controlled needle supporting substrate. Background technique
  • the alignment film (PI, ie, polyimide) pre-drying is performed in the PI liquid after the PI material is applied to the substrate (coating method or inkjet printing) and curing (maincure).
  • the solvent is subjected to a volatilization step (80% of the solvent is volatilized), and the main components of the PI solution are polyimide, N-methylpyrrolidone (NMP), ethylene glycol butyl ether (BC), and the like.
  • NMP N-methylpyrrolidone
  • BC ethylene glycol butyl ether
  • the purpose of pre-drying is to volatilize NMP, BC and other solvents in the PI solution to smooth the PI film.
  • the pre-drying method of PI the current industry mainly heats the substrate by infrared radiation, causing the solvent to volatilize.
  • the biggest process problem of this drying technology is uneven heating and volatilization during the drying process: First, the contact between the support pin (pin) and the substrate causes uneven heating of the contact position and the non-contact position, resulting in no needle caused by the needle. Uniform (Pin Mura); Second, the solvent evaporation rate in the edge region and the middle region is uneven, which will result in uneven film thickness, called Halo Area or Edge Area; Product.
  • FIG. 1 it is a schematic diagram of Pin Mura generated in the prior art prebaking and contact needle process, and the pre-dried substrate 1 has a pin Mura 10 in a ring-shaped area.
  • Pin Mura is caused by the fact that the contact pin of the support substrate is not completely insulated, so that during prebake, the uneven heating of the support portion and the unsupported portion may occur, thereby affecting the evaporation of the PI liquid on the substrate surface. Uniformity results in the production of Pin Mura on the surface of the substrate.
  • Pin Mura there are two main ways to reduce Pin Mura in the prior art: one is to improve the pin material, and the material with better heat insulation such as polyetheretherketone (PEEK) and the new material polysulfone (PSF) is selected; the second is to improve the proximity.
  • Support mode there are lift pin and move pin.
  • FIG. 2 it is a schematic diagram of the working state of the moving needle supporting mode in the prior art.
  • the substrate 2 is supported by the moving needle 21 and the fixed needle 22. By moving the needle 21, the position of the substrate 2 is changed to the origin. The state of ascending, advancing, descending and retreating. As shown in FIG.
  • FIG. 3 it is a schematic diagram of the working state of the thimble supporting mode in the prior art, and the substrate 3 is alternately jacked up by the thimble 31 and the thimble 32.
  • the specific implementation structures of the support modes shown in FIG. 2 and FIG. 3 are well known to those skilled in the art, and are not described herein again. Although these methods can reduce Pin Mura to some extent, Still can not be completely eliminated. Summary of the invention
  • Still another object of the present invention is to provide a method for pre-drying an alignment film by a temperature-controlled needle supporting substrate which reduces Pin Mura and improves substrate quality.
  • the present invention provides a device for pre-drying an alignment film by a temperature-controlled needle supporting substrate, comprising a heater for pre-drying the substrate from below the substrate, a plurality of temperature-controlled needles for supporting the substrate upward, and a temperature control system
  • the temperature control needle is connected to the temperature control system, and each of the temperature control needles can be individually controlled by the temperature control system to uniformly heat the support position of the temperature control needle on the substrate and the periphery of the support position.
  • the heater has a planar radiation surface for heating the substrate parallel to the surface of the substrate, the temperature control needle passing up and down the planar radiation surface.
  • the substrate is a glass substrate.
  • the temperature control needle supports the substrate in a moving needle support manner.
  • the temperature control needle supports the substrate in a thimble supporting manner.
  • the heater is an infrared radiant heater.
  • the heater is a hot air heater.
  • the temperature control needle comprises at least a temperature controllable end for supporting the substrate upward.
  • the invention also provides a method for pre-drying the alignment film by the temperature control needle supporting substrate, comprising: Step 1: using a plurality of temperature control pins to support the substrate upward;
  • Step 2 preheating the substrate from below the substrate by using a heater
  • Step 3 The temperature of each of the temperature control needles is separately controlled by a temperature control system, so that the support position of the temperature control needle on the substrate and the surrounding of the support position are uniformly heated.
  • the heater has a planar radiation surface for heating the substrate parallel to the surface of the substrate, the temperature control needle passing up and down the planar radiation surface.
  • the apparatus and method for pre-drying the alignment film of the temperature control needle supporting substrate of the present invention can reduce uneven heating on the surface of the glass substrate and reduce Pin Mura.
  • FIG. 1 is a schematic view of a Pin Mura produced in a pre-drying and contact pin process in the prior art
  • FIG. 2 is a schematic view showing a working state of a moving needle supporting mode in the prior art
  • FIG. 3 is a schematic view showing the working state of the thimble supporting mode in the prior art
  • FIG. 4 is a schematic structural view of a preferred embodiment of a device for pre-drying an alignment film of a temperature control needle supporting substrate according to the present invention
  • Fig. 5 is a flow chart showing a preferred embodiment of the method for pre-drying the alignment film of the temperature control needle supporting substrate of the present invention. detailed description
  • the apparatus for pre-drying the alignment film of the temperature control needle supporting substrate of the preferred embodiment comprises a heater 41 for pre-drying the substrate 4 from below the substrate 4, a plurality of temperature control pins 42 for supporting the substrate 4 upward, and temperature control
  • the temperature control pin 42 is connected to the temperature control system 43, and each of the temperature control pins 42 can be individually controlled by the temperature control system 43 so that the support position of the temperature control pin 42 on the substrate 4 is The surrounding of the support position is heated evenly.
  • the uniform temperature of the temperature control needle 42 and the temperatureless needle 42 are uniformly '1', so that the Pin Mura is reduced or disappeared.
  • the heater 41 may be a heater commonly used in the art, such as an infrared radiant heater or a hot air heater, and the heat source may be a thermal resistance wire or the like.
  • heater 41 has a planar radiating surface 44 for heating substrate 4 parallel to the surface of substrate 4, with temperature control pins 42 passing up and down through planar radiating surface 44.
  • the substrate 4 may be a glass substrate.
  • the present invention can be combined with the existing contact pin support to further reduce the Pin Mura, for example, the temperature control pin 42 supports the substrate 4 in a movable needle support manner, or the temperature control needle 42 supports the substrate 4 in a thimble support manner.
  • the temperature control of the temperature control needle 42 by the temperature control system 43 can be realized by a feedback control mechanism.
  • the temperature control needle 42 is provided with a temperature sensor to detect its support position on the substrate 4 and the temperature around the support position on the substrate 4.
  • the temperature control system 43 controls the temperature of the temperature control needle 42 according to the result of the temperature comparison.
  • the specific structure of the temperature control pin 42 in addition to the functional structure of the existing contact pins for supporting the substrate, at least the end 45 for supporting the substrate 4 upward is temperature controllable.
  • a flow chart of a preferred embodiment of the method for pre-drying the alignment film of the temperature-controlled needle supporting substrate of the present invention For the apparatus for pre-drying the alignment film of the temperature-controlled needle supporting substrate of the present invention, the present invention further provides a method for pre-drying the alignment film by the temperature-controlled needle supporting substrate, which comprises:
  • Step 51 Supporting the substrate upward by using a plurality of temperature control pins
  • the method of the present invention may be prior art
  • the method is implemented on the basis of a pre-drying and contact needle process, and a temperature-controllable temperature-controlled needle is used instead of the contact pin in the prior art to support the substrate;
  • Step 52 preheating the substrate from below the substrate by using a heater
  • Step 53 Using a temperature control system to separately control the temperature of each of the temperature control needles, so that the support position of the temperature control needle on the substrate and the support position are heated, and the temperature control needle portion and the temperatureless control needle are obtained.
  • the heat of the part is uniform, so that Pin Mura is reduced or disappeared.
  • each temperature control needle of the apparatus and method for pre-drying the alignment film of the temperature control needle supporting substrate of the present invention can be separately controlled, and the temperature of the temperature control needle is adjusted to make it uniform with the surrounding heat, thereby avoiding heat generation. Inconsistent formation of Pin Mura.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Drying Of Solid Materials (AREA)
  • Liquid Crystal (AREA)

Abstract

一种温控针（42）支撑基板（4）进行配向膜预干燥的装置及方法。该装置包括用于从基板（4）下方预干燥基板（4）的加热器（41）、用于向上支撑基板（4）的若干温控针（42）以及温控系统（43），温控针（42）连接至温控系统（43），每个温控针（42）可由温控系统（43）单独控制温度，以使基板（4）上温控针（42）的支撑位置与支撑位置的周围受热均匀。该温控针（42）支撑基板（4）进行配向膜预干燥的装置及方法可以减少玻璃基板表面的受热不均。

Description

温控针支撑基板进行配向膜预干燥的装置及方法 技术领域
本发明涉及配向膜预干燥技术， 特别涉及一种温控针支撑基板进行配 向膜预干燥的装置及方法。 背景技术
配向膜（PI, 即聚酰亚胺）预干燥是 PI材料在涂布于基板之后 （涂布 ( coating ) 法或喷墨印刷 （ inkjet法） ） 、 固化（ Maincure )之前进行的对 PI液内的溶剂进行挥发处理的步骤（将 80%的溶剂挥发出来） ， PI液的主 要成分是聚酰亚胺、 N-甲基吡咯烷酮 （NMP ) 、 乙二醇丁醚（BC ) 等。 预干燥的目的是将 PI液里面的 NMP、 BC等溶剂挥发出来， 使 PI膜平整 化。 PI预干燥的手段， 目前业界内主要是通过红外线辐射加热基板， 致使 溶剂挥发。 此干燥技术的最大制程问题是干燥过程中的受热不均和挥发不 均： 一是支撑针（pin )与基板的接触会造成接触位置与没接触位置的受热 不均， 造成由针引起的不均匀 （Pin Mura ) ； 二是边缘区域与中间区域的 溶剂挥发速度不均， 会造成膜厚不均区域， 称之为光晕区 （Halo Area )或 边缘区 （Edge Area ) ； 进而会影响产品品 。
目前业界均是采用预干燥（prebake )加接触针（proximity )制程的方 式。 如图 1所示， 其为现有技术中预烘烤加接触针制程中产生的 Pin Mura 示意图， 经预干燥的基板 1上以环形标出的区域中具有 Pin Mura 10。 Pin Mura 的产生原因是支撑基板的接触针（proximity ) 不是完全绝热的， 因 而在预烘烤（prebake ) 时候会造成支撑部位与不支撑部位的受热不均， 进 而影响到基板表面的 PI液挥发的均一性， 致使基板表面产生 Pin Mura。
现有技术中减小 Pin Mura的方式主要有两种： 一是改良 pin材质， 选 取绝热性较好的材质如聚醚醚酮 （PEEK )和新材质聚砜 (PSF); 二是改良 proximity 的支撑方式, 有顶针 ( lift pin )和移动针 ( move pin )方式。 如 图 2所示， 其为现有技术中的移动针支撑方式的工作状态示意图， 基板 2 由移动针 21和固定针 22支撑， 通过移动针 21的移动， 引起基板 2的位 置变化为原点、 上升、 前进、 下降及后退的状态。 如图 3所示， 其为现有 技术中的顶针支撑方式的工作状态示意图， 基板 3由顶针 31和顶针 32交 替顶起。 图 2及图 3所示支撑方式的具体实现结构为本领域技术人员所熟 知， 在此不再赘述。 虽然这几种方式都能在一定程度上减少 Pin Mura, 但 还是不能完全消除。 发明内容
因此， 本发明的目的在于提供一种减少 Pin Mura、 提高基板品质的温 控针支撑基板进行配向膜预干燥的装置。
本发明的又一目的在于提供一种减少 Pin Mura、 提高基板品质的温控 针支撑基板进行配向膜预干燥的方法。
为实现上述目的， 本发明提供一种温控针支撑基板进行配向膜预干燥 的装置， 包括用于从基板下方预干燥基板的加热器、 用于向上支撑基板的 若干温控针以及温控系统， 所述温控针连接至所述温控系统， 每个所述温 控针可由所述温控系统单独控制温度， 以使基板上温控针的支撑位置与支 撑位置的周围受热均匀。
其中， 所述加热器具有与基板表面平行的用于加热基板的平面辐射表 面， 所述温控针上下穿过所述平面辐射表面。
其中， 所述基板为玻璃基板。
其中， 所述温控针以移动针支撑方式支撑基板。
其中， 所述温控针以顶针支撑方式支撑基板。
其中， 所述加热器为红外线辐射加热器。
其中， 所述加热器为热气流加热器。
其中， 所述温控针至少包括温度可控制的用于向上支撑基板的末端。 本发明还提供一种温控针支撑基板进行配向膜预干燥的方法， 包括： 步骤一、 采用若干温控针向上支撑基板；
步骤二、 采用加热器从基板下方预干燥基板；
步骤三、 采用温控系统单独控制每个所述温控针的温度， 以使基板上 温控针的支撑位置与支撑位置的周围受热均匀。
其中， 所述加热器具有与基板表面平行的用于加热基板的平面辐射表 面， 所述温控针上下穿过所述平面辐射表面。
本发明的温控针支撑基板进行配向膜预干燥的装置及方法可以减少玻 璃基板表面的受热不均， 减少 Pin Mura。 附图说明
下面结合附图， 通过对本发明的具体实施方式详细描述， 将使本发明 的技术方案及其他有益效果显而易见。
附图中， 图 1为现有技术中预干燥加接触针制程中产生的 Pin Mura示意图； 图 2为现有技术中的移动针支撑方式的工作状态示意图；
图 3为现有技术中的顶针支撑方式的工作状态示意图；
图 4为本发明温控针支撑基板进行配向膜预干燥的装置一较佳实施例 的结构示意图；
图 5 为本发明温控针支撑基板进行配向膜预干燥的方法一较佳实施例 的流程图。 具体实施方式
参见图 4, 其为本发明温控针支撑基板进行配向膜预干燥的装置一较 佳实施例的结构示意图。 该较佳实施例的温控针支撑基板进行配向膜预干 燥的装置， 包括用于从基板 4下方预干燥基板 4的加热器 41、 用于向上支 撑基板 4的若干温控针 42以及温控系统 43 , 所述温控针 42连接至所述温 控系统 43 , 每个所述温控针 42可由所述温控系统 43单独控制温度， 以使 基板 4上温控针 42 的支撑位置与支撑位置的周围受热均匀。 加热时， 通 过调节温控针 42的温度， 达到有温控针 42部位和无温控针 42部位受热 的均一' 1 "生， 从而使 Pin Mura减少或消失。
加热器 41 可以为本领域中常用的加热器， 例如红外线辐射加热器或 热气流加热器， 其热源可以是热电阻丝等。 在此较佳实施例中， 加热器 41 具有与基板 4表面平行的用于加热基板 4的平面辐射表面 44, 温控针 42 上下穿过平面辐射表面 44。 基板 4可以为玻璃基板。 本发明可以与现有的 接触针支撑方式结合， 以进一步减少 Pin Mura, 例如温控针 42 以移动针 支撑方式支撑基板 4, 或者温控针 42以顶针支撑方式支撑基板 4。
温控系统 43对温控针 42的温度控制可以通过反馈控制机制来实现， 例如， 温控针 42设有温度传感器以探测其在基板 4上的支撑位置及基板 4 上该支撑位置周围的温度， 温控系统 43 根据温度比较的结果控制对温控 针 42的温度进行补偿。 对于温控针 42的具体结构， 其除可以包括现有接 触针用于支撑基板的功能结构外， 至少其用于向上支撑基板 4 的末端 45 为温度可控制的。
参见图 5 , 其为本发明温控针支撑基板进行配向膜预干燥的方法一较 佳实施例的流程图。 对于本发明的温控针支撑基板进行配向膜预干燥的装 置， 本发明还相应提供了温控针支撑基板进行配向膜预干燥的方法， 包 括：
步骤 51、 采用若干温控针向上支撑基板， 本发明的方法可以在现有技 术采用预干燥加接触针制程的方式的基础上实现， 采用了温度可控制的温 控针代替现有技术中的接触针来支撑基板；
步骤 52、 采用加热器从基板下方预干燥基板；
步骤 53、 采用温控系统来单独控制每个所述温控针的温度， 以使基板 上温控针的支撑位置与支撑位置的周围受热均勾， 达到有温控针部位和无 温控针部位受热的均一性， 从而使 Pin Mura减少或消失。
综上所述， 本发明温控针支撑基板进行配向膜预干燥的装置及方法的 每个温控针可单独控制， 通过调节温控针的温度， 使其与周围的受热均 匀， 避免由于受热不均形成 Pin Mura。
以上所述， 对于本领域的普通技术人员来说， 可以根据本发明的技术 方案和技术构思作出其他各种相应的改变和变形， 而所有这些改变和变形 都应属于本发明后附的权利要求的保护范围。

Claims

权 利 要 求
1、 一种温控针支撑基板进行配向膜预干燥的装置， 包括用于从基板 下方预干燥基板的加热器、 用于向上支撑基板的若干温控针以及温控系 统， 所述温控针连接至所述温控系统， 每个所述温控针可由所述温控系统 单独控制温度， 以使基板上温控针的支撑位置与支撑位置的周围受热均 匀。
2、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述加热器具有与基板表面平行的用于加热基板的平面辐射表面， 所述温控针上下穿过所述平面辐射表面。
3、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述基板为玻璃基板。
4、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述温控针以移动针支撑方式支撑基板。
5、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述温控针以顶针支撑方式支撑基板。
6、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述加热器为红外线辐射加热器。
7、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述加热器为热气流加热器。
8、 如权利要求 1 所述的温控针支撑基板进行配向膜预干燥的装置， 其中， 所述温控针至少包括温度可控制的用于向上支撑基板的末端。
9、 一种温控针支撑基板进行配向膜预干燥的装置， 包括用于从基板 下方预干燥基板的加热器、 用于向上支撑基板的若干温控针以及温控系 统， 所述温控针连接至所述温控系统， 每个所述温控针可由所述温控系统 单独控制温度， 以使基板上温控针的支撑位置与支撑位置的周围受热均 匀；
其中， 所述加热器具有与基板表面平行的用于加热基板的平面辐射表 面， 所述温控针上下穿过所述平面辐射表面；
其中， 所述基板为玻璃基板；
其中， 所述温控针以移动针支撑方式支撑基板；
其中， 所述加热器为红外线辐射加热器；
其中， 所述温控针至少包括温度可控制的用于向上支撑基板的末端。
10、 一种温控针支撑基板进行配向膜预干燥的方法， 包括：
步骤一、 采用若干温控针向上支撑基板；
步骤二、 采用加热器从基板下方预干燥基板；
步骤三、 采用温控系统单独控制每个所述温控针的温度， 以使基板上 温控针的支撑位置与支撑位置的周围受热均匀。
11、 如权利要求 10 所述的温控针支撑基板进行配向膜预干燥的方 法， 其中， 所述加热器具有与基板表面平行的用于加热基板的平面辐射表 面， 所述温控针上下穿过所述平面辐射表面。
PCT/CN2012/074634 2012-04-19 2012-04-25 温控针支撑基板进行配向膜预干燥的装置及方法 WO2013155729A1 (zh)

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