WO2013117098A1 - 3d显示装置及其制造方法 - Google Patents
3d显示装置及其制造方法 Download PDFInfo
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- WO2013117098A1 WO2013117098A1 PCT/CN2012/085982 CN2012085982W WO2013117098A1 WO 2013117098 A1 WO2013117098 A1 WO 2013117098A1 CN 2012085982 W CN2012085982 W CN 2012085982W WO 2013117098 A1 WO2013117098 A1 WO 2013117098A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
- G02B30/26—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
- G02B30/27—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type involving lenticular arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
- G02B30/26—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
- G02B30/30—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type involving parallax barriers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133526—Lenses, e.g. microlenses or Fresnel lenses
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134345—Subdivided pixels, e.g. for grey scale or redundancy
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13624—Active matrix addressed cells having more than one switching element per pixel
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/124—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode interdigital
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/813—Anodes characterised by their shape
Definitions
- Embodiments of the present invention relate to a 3D display device and a method of fabricating the same. Background technique
- Three Dimensions (3D) display devices typically require a specific grating layer to be added compared to a two-dimensional (2D) display device.
- the implementation methods of the grating layer of the mainstream 3D display device are mainly divided into two types: a parallax barrier method and a lens grating method.
- the basic principle of the parallax barrier method is shown in Figure 1.
- the left field of view pixel 11 on the display panel 1 displays the left eye image
- the right field of view pixel 12 displays the right eye image.
- a parallax barrier 13 is placed in front of the display panel 1 as a grating layer, and the parallax barrier 13 is composed of a pair of light-shielding stripes and light-transmitting stripes.
- the light-shielding strip of the parallax barrier 13 is the light that blocks the image of the right eye from the left eye of the viewer, and blocks the light emitted by the image of the left eye for the right eye.
- the viewer sees different images from the left and right eyes, and finally combines the images to obtain a stereoscopic feeling.
- the distance between the eyes of a general viewer is the human's interpupillary distance T, which is about 60 mm.
- T the human's interpupillary distance
- the lens grating method is to place a cylindrical lens in front of the display panel as a grating layer, the left field sub-pixel on the display panel displays the left eye image, and the right field sub-pixel displays the right eye image, and the left and right field pixels emit light through the cylindrical lens.
- the grating because of its refraction, deflects the direction of light propagation, so that the light of the left field pixel is incident on the left eye of the viewer, and the light of the right field pixel is incident on the right eye of the viewer for the final 3D effect.
- Figure 2 is a simplified cylindrical lens grating 3D display structure. Display list The luminous point of the element is located on the focal plane of the cylindrical lens, and the focal length is f.
- the width of each field of view pixel is P, and the pitch is approximately equal to 2P.
- the refractive index of the lens is n2, and the refractive index outside the lens is nl.
- the radius of the lens is r and the height of the lens is g.
- the arch height g of the lens is an important parameter.
- the width P of each field of view pixel is about 60 ⁇
- ⁇ 2 is the refractive index of a general resin, about 1.5
- nl is the refractive index of air 1
- H is generally the thickness of the upper glass, about 0.5 mm
- Equation 2 It can be calculated by Equation 2 that, under the existing structure, the arch height g of the lens is at least ⁇ ⁇ or more.
- the higher the arch height of the lens means the greater the thickness of the lens grating layer, and the existing patterning process makes it difficult to fabricate a lens grating having a large thickness.
- new processes must be added to existing production methods or new production equipment must be used, resulting in higher production costs for 3D display devices.
- the existing 3D display device is difficult to solve the problem that in the process of fabricating the grating layer, the production cost is increased due to the need to additionally manufacture a parallax barrier on the display device that has been formed on the box, or because the arch height of the lens is increased. problem. Summary of the invention
- Embodiments of the present invention provide a 3D display device and a method of fabricating the same, which can be used in a display device to avoid adding new processes or using new production equipment, thereby reducing production costs.
- An aspect of the present invention provides a 3D liquid crystal display device, including: a grating layer, an array substrate, and an opposite substrate, wherein the array substrate and the opposite substrate are disposed opposite to each other to form a liquid crystal cell, and the grating layer includes a parallax barrier Or a lens grating, the array substrate and the opposite substrate are filled with liquid crystal, the array substrate comprises a plurality of pixel units divided by horizontally intersecting gate lines and data lines, each pixel unit including a pixel electrode And a control circuit, wherein the pixel electrode of each pixel unit includes at least two left-view pixel electrodes and at least two right-field pixel electrodes spaced apart from each other; a control circuit of each pixel unit includes the left-field pixel electrode A first sub-control circuit is coupled to the second sub-control circuit coupled to the right field pixel electrode.
- a 3D-OLED display device including: a grating layer, an array a substrate and an encapsulation layer, wherein the grating layer comprises a parallax barrier or a lens grating, the array substrate comprising a plurality of pixel units divided by horizontally and vertically intersecting gate lines and data lines, each pixel unit comprising an electroluminescence EL a layer and a control circuit, the EL layer comprising a metal cathode, a pixel electrode, and an organic light emitting material between the metal cathode and the pixel electrode, wherein a pixel electrode of each pixel unit includes at least two left field pixels spaced apart from each other An electrode and at least two right-view pixel electrodes; a control circuit of each pixel unit including a first sub-control circuit coupled to the left-field pixel electrode and a second sub-control circuit coupled to the right-field pixel electrode .
- Another aspect of the present invention provides a method of fabricating a three-dimensional (3D) liquid crystal display device, comprising: forming a control circuit and a pixel electrode on a lower substrate, wherein a pixel electrode of each pixel unit includes at least two left views spaced apart from each other a field pixel electrode and at least two right field pixel electrodes; a control circuit of each pixel unit including a first sub-control circuit coupled to the left field pixel electrode and a second sub-unit coupled to the right field pixel electrode a control circuit; forming a grating layer on the upper substrate, the grating layer comprising a parallax barrier or a lens grating; opposing the upper substrate and the lower substrate, and filling the upper and lower substrates with liquid crystal.
- Another aspect of the present invention provides a method of fabricating a 3D-OLED display device, comprising: forming a control circuit on a lower substrate; forming an EL layer on the lower substrate on which the control circuit is formed, wherein the EL layer includes a metal a cathode, a pixel electrode, and an organic luminescent material between the metal cathode and the pixel electrode, the pixel electrode of each pixel unit including at least two left field pixel electrodes and at least two right field pixel electrodes spaced apart from each other; a control circuit of the pixel unit includes a first sub-control circuit connected to the left field pixel electrode and a second sub-control circuit connected to the right field pixel electrode; a grating layer is formed on the encapsulation layer, the grating The layer includes a parallax barrier or a lens grating; and the encapsulation layer formed with the grating layer is overlaid on the lower substrate.
- the EL layer includes a metal a cathode
- a 3D display device including a grating layer and an array substrate, the array substrate including a plurality of pixel units, each of the pixel units including a pixel electrode and a control circuit, and the pixel electrodes of each of the pixel units include each other At least two left field of view pixel electrodes and at least two right field of view pixel electrodes; the control circuit of each pixel unit includes a first sub-control circuit coupled to the left field of view pixel electrode and to the right field of view pixel electrode The second sub-control circuit.
- the 3D display device may be a liquid crystal display device, and may further include an opposite substrate, the opposite substrate and the array substrate being opposed to form a liquid crystal cell; the 3D display device may also be an OLED display device, and thus may further include a package a layer for encapsulating an EL light emitting structure formed on the array substrate.
- the 3D display device and the manufacturing method thereof are provided by the embodiment of the present invention, by changing a sub-pixel electrode for displaying a specific field of view in one pixel unit in the prior art into a plurality of left-view pixel electrodes and The right field pixel electrode greatly reduces the width of the single field pixel electrode. The reduction of the width of the single-field pixel electrode can reduce the thickness of the grating layer.
- the thickness of the parallax barrier can be reduced so that the parallax barrier can be directly fabricated in the box of the display device without being An additional layer of parallax barrier is formed on the box-shaped display device.
- the grating layer is a lens grating
- the reduction in the thickness of the lens grating can lower the arch height of the lenticular lens. In this way, the existing production process can meet the production requirements of the product, avoiding the addition of new processes or the use of new production equipment, thereby reducing production costs.
- FIG. 1 is a schematic diagram of the principle of a parallax barrier method in the prior art
- FIG. 2 is a schematic diagram of the principle of the lens grating method in the prior art
- FIG. 3 is a schematic structural diagram of a 3D liquid crystal display device according to an embodiment of the present invention
- FIG. 4 is a schematic structural diagram of a TFT array substrate of a 3D liquid crystal display device according to an embodiment of the present invention
- FIG. 5 is a comparison diagram of pixel display effects of a 3D liquid crystal display device and a conventional liquid crystal display device according to an embodiment of the present invention
- FIG. 6 is a schematic structural diagram of another 3D liquid crystal display device according to an embodiment of the present invention
- FIG. 7 is a schematic structural diagram of another 3D liquid crystal display device according to an embodiment of the present invention
- FIG. 8 is another 3D according to an embodiment of the present invention.
- FIG. 9 is a schematic structural diagram of a TFT array substrate of a display device according to an embodiment of the present invention
- FIG. 10a is a schematic structural diagram of a 3D-OLED display device according to an embodiment of the present invention
- a schematic structural diagram of a TFT array substrate of a 3D-OLED display device provided by an embodiment of the invention
- FIG. 11 is a schematic structural diagram of another 3D-OLED display device according to an embodiment of the present invention
- FIG. 12 is a schematic structural diagram of another 3D-OLED display device according to an embodiment of the present invention
- FIG. 13 is a schematic structural diagram of another 3D-OLED display device according to an embodiment of the present invention.
- Connected or “connected,” and the like are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up”, “Down”, “Left” “Right” or the like is only used to indicate a relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may also change accordingly.
- the liquid crystal display device includes a grating layer 31, a TFT array substrate 32, and a color filter substrate 33.
- the TFT array substrate 32 and the color filter substrate 33 are disposed opposite to each other to thereby form a liquid crystal cell in which a liquid crystal material is housed.
- the TFT array substrate 32 is an example of the array substrate in the present invention;
- the color filter substrate 33 is an example of the opposite substrate opposite to the array substrate in the present invention.
- the opposite substrate may be colored.
- the film that is, no longer a color film substrate.
- the grating layer 31 may include a parallax barrier or a lens grating;
- the color filter substrate 33 includes a transparent substrate 331 and a color film 332, and the color film 332 includes, for example, red, green, and blue sub-pixel units, which are spaced apart from each other by a black matrix
- the TFT array substrate 32 and the color filter substrate 33 are filled with liquid crystal; as shown in FIG. 4, the TFT array substrate 32 includes a plurality of pixel units 43 divided by horizontally and vertically intersecting gate lines 41 and data lines 42.
- the pixel unit 43 includes a pixel electrode 431 and a TFT circuit 432.
- the TFT circuit is an example of the pixel control circuit in the present invention.
- the pixel electrode 431 of each pixel unit 43 includes at least two left field pixel electrodes 4311 and at least two right field pixel electrodes 4312 spaced apart from each other.
- the TFT circuit 432 of each pixel unit 43 includes a first sub-TFT circuit 4321 connected to the left-view pixel electrode 4311 and a second sub-TFT circuit 4322 connected to the right-view pixel electrode 4312. That is, all of the left field pixel electrodes 4311 are connected to the first sub TFT circuit 4321, and all of the right field pixel electrodes 4312 are connected to the second sub TFT circuit 4322.
- Each of the left field of view pixel electrodes 4311 can be connected to the first sub-TFT circuit 4321 by any structure (for example, via) that can achieve circuit conduction, and each of the right-view field pixel electrodes 4312 can pass any structure that can achieve circuit conduction. (e.g., via) is connected over the second sub-TFT circuit 4322.
- the 3D liquid crystal display device converts a plurality of left-view pixel electrodes and a right field of view which are mutually spaced by a sub-pixel electrode for displaying a specific field of view in one pixel unit in the prior art.
- the pixel electrode greatly reduces the width of the single field of view pixel electrode.
- the reduction in the width of the single field of view pixel electrode reduces the thickness of the grating layer.
- the thickness of the parallax barrier is reduced such that the parallax barrier can be directly fabricated in the casing of the display device without additionally forming a layer of parallax barrier on the display device that has been formed on the cartridge;
- the grating layer is a lens grating
- the reduction in the thickness of the lens grating can lower the arch height of the lenticular lens. In this way, the existing production process can meet the production requirements of the product, avoiding the addition of new processes or the use of new production equipment, thereby reducing production costs.
- At least two left field pixel electrodes 4311 and at least two right field pixel electrodes 4312 spaced apart from each other may be elongated strip electrodes.
- the mutually spaced at least two left-view pixel electrodes 4311 and at least two right-view pixel electrodes 4312 may be parallel to the gate line 41 or may be parallel to the data line 42.
- At least two left-view pixel electrodes 4311 and at least two right-view pixel electrodes 4312 spaced apart from each other are parallel to the data line 42 as an example.
- the transparent substrate may be a transparent material substrate for packaging a liquid crystal display device.
- the transparent substrate may be a glass substrate or a transparent resin substrate.
- all the left field pixel electrodes 4311 constitute a first comb structure
- all The right field pixel electrode 4312 constitutes a second comb structure
- the first comb structure and the second comb structure are arranged to cross each other; that is, all the left field pixel electrodes 4311 and all the right field pixel electrodes 4312 can be integrated.
- the upper is a comb structure that is spaced apart from each other.
- the widths of the left field pixel electrode 4311 and the right field pixel electrode 4312 are equal; in this embodiment, both have a width a, and a may be 1-20 ⁇ m.
- the widths of the left field pixel electrode 4311 and the right field pixel electrode 4312 may not be equal.
- the number of the left field pixel electrode 4311 and the right field pixel electrode 4312 are equal, and a better display effect can be achieved at this time.
- the left field pixel electrode 4311 and the right field pixel electrode 4312 are eight.
- the block-shaped single-view sub-pixel electrodes in the two adjacent pixel units are changed to be mutually inserted comb-shaped left-view pixel electrodes and right field of view in the same pixel unit.
- Pixel electrode When the two fields of view pixels display different colors, if the influence of the micro electric field existing between the two field of view pixel electrodes on the liquid crystal is ignored, the dual field of view liquid crystal display device provided by the embodiment of the present invention and the existing liquid crystal display device The pixel display effect comparison can be as shown in Figure 5. It can be clearly seen that the liquid crystal display device provided by the embodiment of the present invention substantially reduces the width of the single field of view pixel electrode with respect to the prior art. Since the width of the unilateral field of view pixel electrode in such a pixel structure is much smaller than that of the prior art sub-pixel electrode structure, such a pixel structure can be named "micro-pixel structure".
- the gate 441 of the first sub-TFT circuit 4321 and the gate 451 of the second sub-TFT circuit 4322 may be connected to the same gate line 41; the source 442 of the first sub-TFT circuit 4321 and The source 452 of the second sub-TFT circuit 4322 may be respectively connected to the data lines 421 and 422 at both ends of one pixel unit; the drain 443 of the first sub-TFT circuit 4321 may be connected to the left-view pixel electrode 4311, and the second sub-TFT circuit The drain 453 of 4322 can be connected to the right field pixel electrode 4312.
- the pixel electrodes of the same field of view share the same data line, the gate line and the same TFT, so that the pixel aperture ratio is limitedly reduced, thereby avoiding the problem that the aperture ratio of the liquid crystal display device is greatly reduced.
- the parallax barrier may be located between the transparent substrate 331 and the TFT array substrate 32, and the parallax barrier may be located above or below the color film 332. And the distance from the color film 332 is 1-100 ⁇ m.
- the parallax barrier may be located between the transparent substrate 331 and the TFT array substrate 32, and the parallax barrier may be located between the transparent substrate 321 of the TFT array substrate 32 and the TFT array layer 322.
- the lens grating may be positioned above the transparent substrate 331.
- the grating layer 31 is a parallax barrier and the parallax barrier is located above the color film 332, as shown in FIG. 3, a transparent layer 34 having a thickness of 1-100 ⁇ m may be disposed between the parallax barrier and the color film 332.
- the transparent layer 34 may be a transparent film formed using any one of light-transmitting materials, for example, a transparent layer formed of a plastic film or a silicone rubber film.
- the transparent layer 34 is mainly used to separate a certain height between the grating layer 31 and the color film 332.
- the thickness of the transparent layer 34 is the distance between the parallax barrier and the light-emitting point of the display unit.
- the grating layer 31 is a parallax barrier and the parallax barrier is located below the color film 332, as shown in FIG.
- the parallax barrier may be directly on the upper surface of the TFT array substrate 32.
- the distance from the surface of the TFT array substrate to the parallax barrier generally includes the color film thickness, the array thickness, and the liquid crystal alignment film thickness, the sum of these thicknesses is usually 4-7 ⁇ m. In this way, in the case where the transparent layer is not used as the spacer, the distance between the baffle and the light-emitting point of the color film can be satisfied within the range of 1-100 ⁇ m, thereby simplifying the process and saving the cost.
- the width ⁇ of one pixel is 2 ⁇ m
- the distance ⁇ of the person is 60 mm
- the distance H between the parallax barrier and the light-emitting point of the display unit can be calculated by Equation 1 to be 10 ⁇ m. Obviously, this distance can be made in the box of the display device.
- the lens grating may include a liquid crystal lens or a cylindrical lens grating.
- the liquid crystal lens 70 includes an upper electrode 71 and a lower electrode 72, and a liquid crystal is formed between the upper electrode 71 and the lower electrode 72 to form a liquid crystal layer 73.
- the thickness g is the arch height of the lenticular lens.
- the display device can display the 2D state; when the upper electrode 71 and the lower electrode 72 are energized, the liquid crystal molecules are deflected, and the display device can Perform the display of the 3D status.
- the cylindrical lens grating 80 can pass through A transparent photoresist is deposited on the transparent substrate 331, and then exposed and developed by using a gray scale exposure mask, which is obtained by using different exposure amounts, and the height of the lens is g.
- the width P of one pixel is ⁇
- ⁇ 2 is a refractive index of a general resin, about 1.5
- nl is a refractive index of air 1
- H is a thickness of a transparent substrate, about 0.5 mm.
- the height of the lens can be calculated by Equation 2 to be about 5 ⁇ m. Obviously, the above structure can achieve a reduction in the thickness of the display device.
- the center line of the grating layer 31 may coincide with the center line of the display region 40 of the display device at a straight line m.
- the slit center line at the center of the parallax barrier coincides with the slit between the left field pixel electrode and the right field pixel electrode at the center of the display screen. Further, the number of slits of the parallax barrier is half of the sum of the number of the left field pixel electrode and the right field pixel electrode.
- the display device may include: a grating layer 101, a TFT array substrate 102, and an encapsulation layer 103.
- the grating layer 101 may include a parallax barrier or a lens grating;
- the TFT array substrate 102 is an example of an array substrate, as shown in FIG. 10b, including a plurality of pixel units 106 divided by horizontally intersecting gate lines 104 and data lines 105, Each pixel unit 106 includes an EL layer 107 and a control circuit 108.
- the EL layer 107 may include a metal cathode 109, a pixel electrode 100, and an organic light-emitting material 110 between the metal cathode 109 and the pixel electrode 100.
- the pixel electrode 100 of each pixel unit 106 includes at least two left field pixel electrodes 1001 and at least two right field pixel electrodes 1002 spaced apart from each other.
- the control circuit 108 of each pixel unit 106 includes a first sub-control circuit 1081 coupled to the left field of view pixel electrode 1001 and a second sub-control circuit 1082 coupled to the right field of view pixel electrode 1002.
- a 3D-OLED display device provided by an embodiment of the present invention is configured to change a plurality of left-view pixel electrodes and a right view of a sub-pixel electrode for displaying a specific field of view in a pixel unit in the prior art.
- the field pixel electrode greatly reduces the width of the single field of view pixel electrode. A reduction in the width of the single field of view pixel electrode can reduce the thickness of the grating layer.
- the thickness of the parallax barrier is reduced such that the parallax barrier can be directly fabricated in the casing of the display device without additionally creating a layer of parallax barrier on the display device that has been formed on the cartridge;
- the grating layer is a lens grating
- the reduction in the thickness of the lens grating can lower the arch height of the lenticular lens. In this way, using the existing system The process can meet the production requirements of the product, avoiding the addition of new processes or the use of new production equipment, thereby reducing production costs.
- At least two left-view pixel electrodes 1001 and at least two right-view pixel electrodes 1002 spaced apart from each other may be elongated strip electrodes.
- the mutually spaced at least two left-view pixel electrodes 1001 and at least two right-view pixel electrodes 1002 may be parallel to the gate line 104 or may be parallel to the data line 105.
- at least two left-view pixel electrodes 1001 and at least two right-view pixel electrodes 1002 spaced apart from each other are parallel to the data line 105 as an example for description. .
- the control circuit involved in the embodiment of the present invention refers to a partial TFT circuit for controlling a pixel electrode.
- the control circuit may include a switching transistor TFT circuit for controlling the on and off of the pixel electrode and a driving transistor TFT circuit for controlling the potential change of the pixel electrode.
- each pixel unit 106 all of the left field pixel electrodes 1001 constitute a first comb structure, and all right field pixel electrodes 1002 constitute a second comb structure, the first comb
- the second structure and the second comb structure are disposed to intersect each other; that is, all of the left field pixel electrode 1001 and all of the right field pixel electrodes 1002 are entirely spaced apart comb structures.
- the widths of the left field pixel electrode 1001 and the right field pixel electrode 1002 may be equal; in this embodiment, both of the widths are b, and b may be 1-20 ⁇ m.
- the widths of the left field pixel electrode 1001 and the right field pixel electrode 1002 may not be equal.
- each of the pixel units 106 the number of the left field pixel electrode 1001 and the right field pixel electrode 1002 are equal, and a better display effect can be achieved at this time.
- the number of the left field pixel electrode 1001 and the right field pixel electrode 1002 are equal, and a better display effect can be achieved at this time.
- the first sub-control circuit 1081 and the second sub-control circuit 1082 in FIG. 10b are merely schematic and do not represent the true structure of the two; for example, numerals 811, 812, and 813 (or 821, 822, and 823). It is not necessarily a TFT (switch or drive) gate, source, or drain, but may belong to a different TFT.
- TFT switch or drive
- the gate 811 of the switch tube of the first sub-control circuit 1081 and the gate 821 of the switch tube of the second sub-control circuit 1082 may be connected to the same gate line 104; the first sub-control circuit 1081 switches the source 812 and the second sub-tube The source 822 of the switching transistor of the control circuit 1082 can be respectively connected to one end of one pixel unit
- the data lines 1051 and 1052 are connected; the drain 813 of the first sub-control circuit 1081 driving the tube may be connected to the left-view pixel electrode 1001, and the second sub-control circuit 1082 driving the drain 813 of the tube may be the right-view pixel electrode 1002 connection.
- the connection relationship between the switch tube and the drive tube of the first sub-control circuit, and the connection relationship between the switch tube and the drive tube of the second control circuit can be arbitrarily set according to the prior art under the premise of satisfying the OLED driving condition, Narration.
- the pixel electrodes of the same field of view share the same data line, the gate line and the same sub-control circuit, so that the pixel aperture ratio is limitedly reduced, thereby avoiding the problem that the aperture ratio of the liquid crystal display device is greatly reduced.
- the parallax barrier may be located above or below the encapsulation layer 103 and at a distance of 1-100 ⁇ m from the EL layer 107.
- the lens grating may be located above the encapsulation layer 103.
- the grating layer 31 is a parallax barrier and the parallax barrier is located below the encapsulation layer 103, as shown in the figure
- a transparent layer having a thickness of 1-100 ⁇ m may be provided between the parallax barrier and the pixel electrode 100.
- the transparent layer 1011 may be a vacuum layer or a gas layer, or a transparent spacer (such as a plastic film) may be used as the transparent layer.
- a transparent film can be formed using a plastic film or a silicone rubber film.
- the transparent layer 1011 is mainly used for spacing between the grating layer 101 and the EL layer 107.
- the thickness of the transparent layer 1011 is the distance between the parallax barrier and the light-emitting point of the display unit.
- the grating layer 31 is a parallax barrier and the parallax barrier is located above the encapsulation layer 103, as shown in Fig. 10a.
- the parallax barrier may be directly on the upper surface of the encapsulation layer 103, and the large separation between the parallax barrier and the illumination point of the display unit is H.
- the lens grating may include a liquid crystal lens or a cylindrical lens grating.
- the liquid crystal lens 120 includes an upper electrode 121 and a lower electrode 122, and a liquid crystal is formed between the upper electrode 121 and the lower electrode 122 to form a liquid crystal layer 123.
- the thickness g is the arch height of the lenticular lens.
- the deflection of the liquid crystal molecules at different positions can be controlled by controlling the voltage distribution on the electrodes to produce a cylindrical lens. In this way, when the upper electrode 121 and the lower electrode 122 are not energized, the liquid crystal molecules are not deflected, and the display device can perform the 2D state display. When the upper electrode 121 and the lower electrode 122 are energized, the liquid crystal molecules are deflected, and the display device can display the 3D state.
- the cylindrical lens grating 130 may be formed by first depositing a transparent photoresist on the encapsulation layer 103, and then using gray. The exposure mask is exposed and developed using different exposure amounts, and the arch height of the lens is g.
- the center line of the grating layer 101 coincides with the center line of the display area of the display device.
- the slit center line at the center of the parallax barrier may coincide with the slit between the left field pixel electrode and the right field pixel electrode at the center of the display screen.
- the number of slits of the parallax barrier is half the sum of the number of the left field pixel electrode and the right field pixel electrode.
- the structure and the connection relationship between the pixel electrode and the control circuit in the 3D-OLED display device can refer to the pixel electrode and the TFT circuit in the foregoing 3D liquid crystal display device (in combination with the characteristics of the OLED display in the prior art), respectively.
- the beneficial effects produced by the structure have been described in detail in the dual field of view liquid crystal display device and will not be described here.
- a method for manufacturing a 3D liquid crystal display device includes the following steps.
- a TFT circuit and a pixel electrode on a lower substrate for example, by a patterning process, wherein a pixel electrode of each pixel unit includes at least two left-view pixel electrodes and at least two right-view pixel electrodes spaced apart from each other;
- the TFT circuit of the pixel unit includes a first sub-TFT circuit connected to the left-field pixel electrode and a second sub-TFT circuit connected to the right-field pixel electrode.
- the TFT circuit is an example of a pixel control circuit in the present invention.
- all of the left-view pixel electrodes 4311 are connected to the first sub-TFT circuit 4321, and all of the right-view pixel electrodes 4312 are connected to the second sub-TFT circuit 4322.
- Each of the left field of view pixel electrodes 4311 can be connected to the first sub-TFT circuit 4321 by any structure that can achieve circuit conduction, and each of the right-view field pixel electrodes 4312 can be connected to the second sub-section through any structure that can achieve circuit conduction.
- Above the TFT circuit 4322 is described in FIG. 4, all of the left-view pixel electrodes 4311 are connected to the first sub-TFT circuit 4321, and all of the right-view pixel electrodes 4312 are connected to the second sub-TFT circuit 4322.
- a method for manufacturing a 3D liquid crystal display device by changing a sub-pixel electrode for displaying a specific field of view in one pixel unit in the prior art into a plurality of left spaces spaced apart from each other
- the field of view pixel electrode and the right field of view pixel electrode greatly reduce the width of the single field of view pixel electrode.
- the reduction of the width of the single-field pixel electrode can reduce the thickness of the grating layer.
- the grating layer is a parallax barrier
- the thickness of the parallax barrier can be reduced so that the parallax barrier can be directly fabricated in the box of the display device without being
- An additional layer of parallax barrier is formed on the box-shaped display device.
- the grating layer is a lens grating
- the reduction in the thickness of the lens grating can lower the arch height of the lenticular lens. In this way, the existing production process can meet the production requirements of the product, avoiding the addition of new processes or the use of new production equipment, thereby reducing production costs.
- At least two left field pixel electrodes and at least two right field pixel electrodes spaced apart from each other are elongated strip electrodes.
- the mutually spaced at least two left field of view pixel electrodes and at least two right field of view pixel electrodes may be parallel to the gate lines or may be parallel to the data lines.
- at least two left-view pixel electrodes and at least two right-view pixel electrodes spaced apart from each other are parallel to the data line as an example.
- all of the left field pixel electrodes constitute a first comb structure
- all right field pixel electrodes constitute a second comb structure
- the first comb structure and the second comb structure are mutually
- the cross setting; that is, all of the left field pixel electrodes and all of the right field pixel electrodes may be a comb structure that is spaced apart from each other as a whole.
- the left field pixel electrode and the right field pixel electrode may have a width of 1-20 ⁇ m.
- the gate of the first sub-TFT circuit and the gate of the second sub-TFT circuit may be connected to the same gate line; the source of the first sub-TFT circuit and the source of the second sub-TFT circuit may be respectively connected to one end of one pixel unit The data line is connected; the drain of the first sub-TFT circuit may be connected to the left field pixel electrode, and the drain of the second sub-TFT circuit may be connected to the right field pixel electrode.
- the pixel electrodes of the same field of view share the same data line, the gate line and the same TFT, so that the pixel aperture ratio is limitedly reduced, thereby avoiding the problem that the aperture ratio of the liquid crystal display device is greatly reduced.
- the parallax barrier may be located above or below the color film of the upper substrate, and the distance from the color film is 1-100 ⁇ m.
- the lens grating may be located above the transparent substrate.
- an example of step S1402 may include: forming a transparent layer having a thickness of 1-100 ⁇ m on the color film after forming a color film on the upper substrate. ; forming a parallax barrier on the transparent layer.
- the transparent layer may be a transparent film formed using any one of light-transmitting materials, for example, a transparent film may be formed using a plastic film or a silicone rubber film.
- the transparent layer is mainly used for spacing a certain height between the grating layer and the color film, and the thickness of the transparent layer is the distance between the parallax barrier and the light-emitting point of the display unit.
- the parallax barrier may be directly on the upper surface of the TFT array substrate.
- the lens grating may include a liquid crystal lens or a cylindrical lens grating.
- the liquid crystal lens includes an upper electrode and a lower electrode, and a liquid crystal is filled between the upper electrode and the lower electrode to form a liquid crystal layer.
- the display device can display the 2D state; when the upper electrode and the lower electrode are energized, the liquid crystal molecules are deflected, and the display device can perform the 3D state. display.
- the cylindrical lens grating can be obtained by depositing a transparent photoresist on a transparent substrate and then performing exposure and development using a gray scale exposure mask, using different exposure amounts.
- the centerline of the grating layer may coincide with the centerline of the display area of the display device.
- the method for manufacturing a 3D-OLED display device may include the following steps. S1501, forming a control circuit on the lower substrate, for example, by a patterning process.
- an EL layer on a lower substrate formed with a control circuit, wherein the EL layer includes a metal cathode, a pixel electrode, and an organic luminescent material between the metal cathode and the pixel electrode, and the pixel electrodes of each pixel unit are spaced apart from each other. At least two left field pixel electrodes and at least two right field pixel electrodes; a control circuit of each pixel unit including a first sub-control circuit coupled to the left field pixel electrode and a second connection to the right field pixel electrode Sub control circuit.
- the encapsulation layer formed with the grating layer is overlaid on the lower substrate.
- a method for manufacturing a 3D-OLED display device by changing a sub-pixel electrode for displaying a specific field of view in one pixel unit in the prior art into a plurality of left-view pixel electrodes and
- the right field pixel electrode greatly reduces the width of the single field pixel electrode.
- the reduction of the width of the single-field pixel electrode can reduce the thickness of the grating layer.
- the grating layer is a parallax barrier
- the thickness of the parallax barrier can be reduced so that the parallax barrier can be directly fabricated in the box of the display device without being
- An additional layer of parallax barrier is formed on the box-shaped display device.
- the grating layer is a lens grating
- the reduction in the thickness of the lens grating can lower the arch height of the lenticular lens. In this way, the existing production process can meet the production requirements of the product, avoiding the addition of new processes or the use of new production equipment, thereby reducing production costs.
- At least two left field pixel electrodes and at least two right field pixel electrodes spaced apart from each other are elongated strip electrodes.
- the mutually spaced at least two left field of view pixel electrodes and at least two right field of view pixel electrodes may be parallel to the gate lines or may be parallel to the data lines.
- at least two left-view pixel electrodes and at least two right-view pixel electrodes spaced apart from each other are parallel to the data line as an example.
- the control circuit involved in the embodiment of the present invention refers to a partial TFT circuit for controlling the pixel electrodes.
- the control circuit may include a switching transistor TFT circuit for controlling the on and off of the pixel electrode and a driving transistor TFT circuit for controlling the potential change of the pixel electrode.
- all of the left field pixel electrodes constitute a first comb structure
- all right field pixel electrodes constitute a second comb structure
- the first comb structure and the second comb structure are mutually Cross setting; that is, all left field pixel electrodes and all right field pixel electrodes are entirely comb-like structures spaced apart from each other.
- the widths of the left field pixel electrode and the right field pixel electrode are equal; in this embodiment, the width of the two may be 1-20 ⁇ m. Of course, the widths of the left field pixel electrode and the right field pixel electrode may not be equal.
- the number of left field pixel electrodes and right field pixel electrodes is equal, and a better display effect can be achieved at this time.
- the gate of the first sub-control circuit switch tube and the gate of the second sub-control circuit switch tube may be connected to the same gate line; the source of the first sub-control circuit switch tube and the source of the second sub-control circuit switch tube
- the data may be respectively connected to the data lines at both ends of one pixel unit; the drain of the first sub-control circuit driving tube may be connected to the left-field pixel electrode, and the drain of the second sub-control circuit driving tube may be connected to the right-field pixel electrode.
- the pixel electrodes of the same field of view share the same data line, the gate line and the same control, so that the pixel aperture ratio is limitedly reduced, thereby avoiding the problem that the aperture ratio of the liquid crystal display device is greatly reduced.
- the parallax barrier may be located above or below the encapsulation layer and at a distance of 1-100 ⁇ m from the EL layer.
- the lens grating may be located above the encapsulation layer.
- the 3D-OLED display device manufacturing method may further include: on the EL layer A transparent layer having a thickness of 1-100 ⁇ m is formed.
- the transparent layer may be a vacuum layer or a gas layer, or a transparent spacer (such as a plastic film) may be used as the transparent layer.
- a transparent layer formed of a plastic film or a silicone rubber film can be used.
- the transparent layer is mainly used to separate a certain height between the grating layer and the EL layer, and the thickness of the transparent layer is the distance between the parallax barrier and the light-emitting point of the display unit.
- the parallax barrier can be directly located on the upper surface of the encapsulation layer.
- the lens grating may include a liquid crystal lens or a cylindrical lens grating.
- the liquid crystal lens includes an upper electrode and a lower electrode, and a liquid crystal is filled between the upper electrode and the lower electrode to form a liquid crystal layer.
- the deflection of liquid crystal molecules at different positions can be controlled by controlling the voltage distribution on the electrodes to produce a cylindrical lens.
- the display device can display the 2D state; when the upper electrode and the lower electrode are energized, the liquid crystal molecules are deflected, and the display device can perform the 3D state. display.
- the cylindrical lens grating can be obtained by first depositing a transparent photoresist on the encapsulation layer and then performing exposure and development using a gray scale exposure mask, using different exposure amounts.
- the centerline of the grating layer may coincide with the centerline of the display area of the display device.
- the upper substrate involved in the method for manufacturing the dual-view OLED display device may refer to an encapsulation layer for packaging the OLED display device.
Abstract
Description
Claims
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US13/824,738 US9310616B2 (en) | 2012-02-09 | 2012-12-05 | 3D display device and manufacturing method thereof |
EP12832731.9A EP2813886B1 (en) | 2012-02-09 | 2012-12-05 | 3d display device and manufacturing method therefor |
JP2014555923A JP6139567B2 (ja) | 2012-02-09 | 2012-12-05 | 3d表示装置及びその製造方法 |
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Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102629607B (zh) | 2012-02-09 | 2016-02-10 | 京东方科技集团股份有限公司 | 阵列基板和双视场显示装置及其制造方法 |
CN102629041B (zh) * | 2012-02-09 | 2014-04-16 | 京东方科技集团股份有限公司 | 一种3d显示装置及其制造方法 |
CN102981316B (zh) * | 2012-11-02 | 2015-01-21 | 京东方科技集团股份有限公司 | 显示面板及其制造方法、显示装置 |
CN103018996A (zh) | 2012-11-27 | 2013-04-03 | 京东方科技集团股份有限公司 | 一种3d显示装置及其驱动方法 |
CN103149730A (zh) * | 2013-03-04 | 2013-06-12 | 京东方科技集团股份有限公司 | 彩膜基板及其制作方法、液晶显示屏 |
CN103413495A (zh) * | 2013-07-17 | 2013-11-27 | 京东方科技集团股份有限公司 | 一种显示装置 |
CN103454807B (zh) * | 2013-09-02 | 2016-07-27 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、3d显示装置 |
CN103698889A (zh) * | 2013-12-18 | 2014-04-02 | 京东方科技集团股份有限公司 | 一种显示面板及显示装置 |
CN103984181B (zh) | 2014-03-12 | 2017-02-15 | 京东方科技集团股份有限公司 | 一种液晶透镜及显示装置 |
CN103941469B (zh) * | 2014-04-09 | 2023-03-03 | 京东方科技集团股份有限公司 | 显示面板及其制作方法、显示装置 |
CN104317135B (zh) * | 2014-11-19 | 2018-09-11 | 京东方科技集团股份有限公司 | 光栅装置、显示装置及其驱动方法 |
CN104516044B (zh) * | 2015-01-12 | 2017-07-28 | 京东方科技集团股份有限公司 | 偏光片及显示装置 |
KR20160122345A (ko) * | 2015-04-13 | 2016-10-24 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
CN104793394B (zh) * | 2015-04-29 | 2018-06-05 | 京东方科技集团股份有限公司 | 光栅装置、显示装置及其驱动方法 |
CN104849937A (zh) * | 2015-05-19 | 2015-08-19 | 汕头超声显示器(二厂)有限公司 | 一种用于裸眼立体显示的电驱动液晶透镜及其裸眼立体显示装置 |
CN105068354A (zh) * | 2015-08-11 | 2015-11-18 | 重庆卓美华视光电有限公司 | 裸眼3d显示装置 |
US10375379B2 (en) * | 2015-09-17 | 2019-08-06 | Innolux Corporation | 3D display device |
CN113325598B (zh) * | 2016-01-04 | 2023-05-09 | 奥崔迪合作公司 | 3d显示装置 |
CN106959525A (zh) * | 2016-01-08 | 2017-07-18 | 京东方科技集团股份有限公司 | 一种双视裸眼3d显示器件及其制作方法、液晶显示装置 |
CN106154683A (zh) | 2016-08-31 | 2016-11-23 | 京东方科技集团股份有限公司 | 一种液晶棱镜及其制作方法、显示装置 |
CN106125446A (zh) * | 2016-09-09 | 2016-11-16 | 万维云视(上海)数码科技有限公司 | 一种3d液晶显示面板和3d显示装置 |
CN106526942B (zh) | 2017-01-06 | 2018-12-11 | 京东方科技集团股份有限公司 | 显示面板和显示装置 |
CN106773379B (zh) | 2017-02-06 | 2020-02-07 | 京东方科技集团股份有限公司 | 显示面板、显示装置及其控制方法 |
CN106851256A (zh) * | 2017-03-30 | 2017-06-13 | 宁波万维显示科技有限公司 | 一种实现2d3d共融显示的方法、装置及2d3d显示系统 |
CN106959557B (zh) | 2017-04-11 | 2020-02-18 | 重庆京东方光电科技有限公司 | 一种显示基板及其制作方法、显示装置 |
CN107037641B (zh) | 2017-05-12 | 2020-04-24 | 京东方科技集团股份有限公司 | 阵列基板、显示面板和显示装置 |
CN107291230B (zh) * | 2017-06-19 | 2019-08-16 | 京东方科技集团股份有限公司 | 脑电波控制方法及装置、显示装置 |
CN109307946B (zh) * | 2017-07-27 | 2020-12-04 | 京东方科技集团股份有限公司 | 一种显示装置及其制备方法 |
CN107367883A (zh) | 2017-09-15 | 2017-11-21 | 京东方科技集团股份有限公司 | 液晶光栅、显示面板及显示装置 |
CN107976727A (zh) * | 2017-12-21 | 2018-05-01 | 深圳市光科全息技术有限公司 | 一种led画质增强薄膜 |
CN107945760B (zh) | 2018-01-02 | 2020-08-14 | 京东方科技集团股份有限公司 | 液晶显示面板及其驱动方法、显示装置 |
CN108231811A (zh) * | 2018-01-23 | 2018-06-29 | 中国电子科技集团公司第四十四研究所 | 能降低偏振成像器件像元间光串扰的微透镜阵列 |
CN110444125B (zh) * | 2019-06-25 | 2022-03-08 | 荣耀终端有限公司 | 显示屏、终端 |
TWI795632B (zh) * | 2020-03-02 | 2023-03-11 | 友達光電股份有限公司 | 陣列基板 |
CN111752052B (zh) * | 2020-07-29 | 2022-07-12 | 京东方科技集团股份有限公司 | 一种显示面板、显示装置及其驱动方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005134663A (ja) * | 2003-10-30 | 2005-05-26 | Asahi Glass Co Ltd | 多機能表示装置および同装置に用いられるスリットマスク形成用のスイッチング液晶パネル |
CN101609638A (zh) * | 2008-06-16 | 2009-12-23 | 精工爱普生株式会社 | 显示装置 |
CN102162958A (zh) * | 2011-04-07 | 2011-08-24 | 昆山龙腾光电有限公司 | 立体显示系统 |
CN102289113A (zh) * | 2011-07-20 | 2011-12-21 | 深圳超多维光电子有限公司 | 液晶显示装置、液晶显示装置的制造方法及其驱动方法 |
CN102629041A (zh) * | 2012-02-09 | 2012-08-08 | 京东方科技集团股份有限公司 | 一种3d显示装置及其制造方法 |
CN202443185U (zh) * | 2012-02-09 | 2012-09-19 | 京东方科技集团股份有限公司 | 一种3d显示装置 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101110969A (zh) * | 2003-02-28 | 2008-01-23 | 日本电气株式会社 | 图像显示设备及其制造方法 |
JP4572095B2 (ja) * | 2004-07-15 | 2010-10-27 | Nec液晶テクノロジー株式会社 | 液晶表示装置、携帯機器及び液晶表示装置の駆動方法 |
WO2006109498A1 (ja) | 2005-04-08 | 2006-10-19 | Sharp Kabushiki Kaisha | 表示装置 |
KR100932977B1 (ko) * | 2005-07-05 | 2009-12-21 | 삼성모바일디스플레이주식회사 | 입체 영상 표시 장치 |
US7847904B2 (en) * | 2006-06-02 | 2010-12-07 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and electronic appliance |
JP2009008912A (ja) * | 2007-06-28 | 2009-01-15 | Seiko Epson Corp | 画像表示装置及びそのための画像表示用遮光基板 |
JP5665255B2 (ja) * | 2007-10-15 | 2015-02-04 | Nltテクノロジー株式会社 | 表示装置とその駆動方法、端末装置及び表示パネル |
KR100914785B1 (ko) | 2007-12-26 | 2009-08-31 | 엘지디스플레이 주식회사 | 액정표시장치 |
KR100922355B1 (ko) * | 2008-03-07 | 2009-10-21 | 삼성모바일디스플레이주식회사 | 전자 영상 기기 |
JP4730410B2 (ja) | 2008-03-27 | 2011-07-20 | エプソンイメージングデバイス株式会社 | 電気光学装置及び電子機器 |
KR101494205B1 (ko) * | 2008-05-08 | 2015-03-02 | 삼성디스플레이 주식회사 | 표시기판, 이의 제조방법 및 이를 갖는 표시장치 |
KR20090129805A (ko) * | 2008-06-13 | 2009-12-17 | 엘지디스플레이 주식회사 | 횡전계형 액정표시장치용 어레이 기판 |
JP5178831B2 (ja) * | 2008-06-27 | 2013-04-10 | シャープ株式会社 | 液晶表示装置 |
TWI427383B (zh) * | 2009-03-24 | 2014-02-21 | Au Optronics Corp | 主動陣列基板、液晶顯示面板及其驅動方法 |
RU2011132280A (ru) | 2009-05-29 | 2013-07-10 | Шарп Кабушики Каиша | Элемент жидкокристаллического дисплея, жидкокристаллическое дисплейное устройство и способ отображения с помощью элемента жидкокристаллического дисплея |
CN101957527B (zh) | 2009-07-20 | 2013-02-13 | 北京京东方光电科技有限公司 | Ffs型tft-lcd阵列基板及其制造方法 |
CN101988998B (zh) | 2009-07-30 | 2015-10-07 | 群创光电股份有限公司 | 液晶显示装置 |
KR101286498B1 (ko) * | 2009-12-11 | 2013-07-16 | 엘지디스플레이 주식회사 | 블루상 액정표시장치 |
KR101324436B1 (ko) * | 2010-04-02 | 2013-10-31 | 엘지디스플레이 주식회사 | 입체영상 표시장치, 입체영상 표시장치용 모기판 및 그 모기판의 제조방법 |
CN101923257B (zh) * | 2010-08-06 | 2011-12-14 | 友达光电股份有限公司 | 视差控制元件、显示装置及自动立体影像的形成方法 |
US8937699B2 (en) * | 2010-08-12 | 2015-01-20 | Samsung Display Co., Ltd. | Liquid crystal display |
CN102629607B (zh) | 2012-02-09 | 2016-02-10 | 京东方科技集团股份有限公司 | 阵列基板和双视场显示装置及其制造方法 |
TWI494675B (zh) * | 2012-08-17 | 2015-08-01 | Au Optronics Corp | 立體顯示面板、顯示面板及其驅動方法 |
-
2012
- 2012-02-09 CN CN201210028990.0A patent/CN102629041B/zh active Active
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- 2012-12-05 US US13/824,738 patent/US9310616B2/en active Active
- 2012-12-05 KR KR1020137010105A patent/KR101447398B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005134663A (ja) * | 2003-10-30 | 2005-05-26 | Asahi Glass Co Ltd | 多機能表示装置および同装置に用いられるスリットマスク形成用のスイッチング液晶パネル |
CN101609638A (zh) * | 2008-06-16 | 2009-12-23 | 精工爱普生株式会社 | 显示装置 |
CN102162958A (zh) * | 2011-04-07 | 2011-08-24 | 昆山龙腾光电有限公司 | 立体显示系统 |
CN102289113A (zh) * | 2011-07-20 | 2011-12-21 | 深圳超多维光电子有限公司 | 液晶显示装置、液晶显示装置的制造方法及其驱动方法 |
CN102629041A (zh) * | 2012-02-09 | 2012-08-08 | 京东方科技集团股份有限公司 | 一种3d显示装置及其制造方法 |
CN202443185U (zh) * | 2012-02-09 | 2012-09-19 | 京东方科技集团股份有限公司 | 一种3d显示装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2813886A4 * |
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CN102629041B (zh) | 2014-04-16 |
EP2813886A1 (en) | 2014-12-17 |
KR20130115260A (ko) | 2013-10-21 |
EP2813886B1 (en) | 2019-02-06 |
JP6139567B2 (ja) | 2017-05-31 |
KR101447398B1 (ko) | 2014-10-06 |
US9310616B2 (en) | 2016-04-12 |
EP2813886A4 (en) | 2015-11-18 |
CN102629041A (zh) | 2012-08-08 |
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US20140063382A1 (en) | 2014-03-06 |
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