WO2013100558A1 - 폴리아믹산 용액 - Google Patents
폴리아믹산 용액 Download PDFInfo
- Publication number
- WO2013100558A1 WO2013100558A1 PCT/KR2012/011460 KR2012011460W WO2013100558A1 WO 2013100558 A1 WO2013100558 A1 WO 2013100558A1 KR 2012011460 W KR2012011460 W KR 2012011460W WO 2013100558 A1 WO2013100558 A1 WO 2013100558A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid solution
- polyamic acid
- reaction product
- display device
- protective layer
- Prior art date
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- 229920005575 poly(amic acid) Polymers 0.000 title claims abstract description 67
- 239000010410 layer Substances 0.000 claims abstract description 24
- 239000011241 protective layer Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims description 70
- 238000004519 manufacturing process Methods 0.000 claims description 38
- 239000007795 chemical reaction product Substances 0.000 claims description 23
- 229920001721 polyimide Polymers 0.000 claims description 21
- 239000004642 Polyimide Substances 0.000 claims description 19
- 238000003756 stirring Methods 0.000 claims description 17
- 239000011247 coating layer Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 238000000197 pyrolysis Methods 0.000 claims description 16
- 239000011261 inert gas Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 12
- 239000002994 raw material Substances 0.000 claims description 12
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 11
- 238000004090 dissolution Methods 0.000 claims description 10
- 239000000843 powder Substances 0.000 claims description 10
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 9
- 150000004984 aromatic diamines Chemical class 0.000 claims description 9
- 238000006116 polymerization reaction Methods 0.000 claims description 8
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 230000005587 bubbling Effects 0.000 claims description 5
- 239000007810 chemical reaction solvent Substances 0.000 claims description 4
- 230000004580 weight loss Effects 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000007664 blowing Methods 0.000 claims description 2
- 238000005979 thermal decomposition reaction Methods 0.000 abstract description 5
- 239000000243 solution Substances 0.000 description 83
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- 238000001914 filtration Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 150000004985 diamines Chemical class 0.000 description 8
- 239000002861 polymer material Substances 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000012024 dehydrating agents Substances 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 125000006159 dianhydride group Chemical group 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000006358 imidation reaction Methods 0.000 description 3
- 150000003949 imides Chemical class 0.000 description 3
- 229920000307 polymer substrate Polymers 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UMGYJGHIMRFYSP-UHFFFAOYSA-N 2-(4-aminophenyl)-1,3-benzoxazol-5-amine Chemical compound C1=CC(N)=CC=C1C1=NC2=CC(N)=CC=C2O1 UMGYJGHIMRFYSP-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000011978 dissolution method Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- KORYHPJSAJZSST-UHFFFAOYSA-N 2-n-phenyl-1,3-benzoxazole-2,4-diamine Chemical compound N=1C=2C(N)=CC=CC=2OC=1NC1=CC=CC=C1 KORYHPJSAJZSST-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- -1 diethyl acetate Chemical compound 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/08—Stabilised against heat, light or radiation or oxydation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
Definitions
- the present invention relates to a polyamic acid solution and a method of manufacturing the same, and to a polyamic acid solution that can be used as a base layer or a protective layer of various display elements.
- the type of flexible display currently developed is being developed in the same manner as LCD, OLED, and EPD based on passive or active driving elements. These are methods in which a display is driven by mounting a passive or active driving element on a flexible polymer substrate as a structure, and attention is gradually shifting to active type with precise pixel implementation rather than passive type.
- the active flexible display constitutes a unit device of a display by structuring a gate, an insulating film, a source, and a drain on a polymer material substrate and finally mounting an electrode and a display element.
- the active display device since most of the manufacturing processes are often performed at high temperature, if a polymer substrate material having no heat resistance is used, the dimensions of the polymer substrate are easily deformed and thermally deformed during device fabrication. There is a problem in that the alignment of the pattern does not match or changes in the surface properties of the polymer substrate, so that the pattern may be used as a display substrate.
- PEN polyethylene naphthalate
- PES polyether sulfone
- PC polycarbonate
- Tg glass transition temperature
- Tg coefficient of thermal expansion
- the plastic film of the material when used, there is no supporting force, so that the display device is manufactured by adhering on the metal foil or the glass plate.
- the adhesive and the peeling process of the plastic film and the metal foil or the glass plate using the adhesive are additionally generated. If you do not have a smooth adhesion, you may have problems with smoothness.
- the present invention is to provide a polymer material which can be used as a substrate material or a protective layer of a display device having excellent thermal resistance and low thermal expansion rate as a polymer material for flexible display having excellent dimensional stability even at a high temperature of 500 ° C. or higher.
- the polyamic acid to be provided in the present invention is provided in the liquid form, which is provided in the form of a film, since the film itself does not have a supporting force to maintain its shape, the display element must be manufactured by adhering on a metal foil or a glass plate and in this case an adhesive
- an adhesive This is because there is a disadvantage in that the adhesion and peeling process of the polymer film and the metal foil or glass plate is additionally used, and if the adhesion is not smooth, problems may occur in the smoothness.
- the process temperature is 450 ° C., which is a high temperature process.
- the adhesive is not suitable for the actual process because the adhesive does not exist at the high temperature.
- the polyamic acid to be provided in the present invention is provided in a liquid form, not in a film form, and is applied to a pretreated ceramic support or a glass plate (of course, other supports may be used), and then dried to form an imidized film. This is to maintain a shape on a pretreated ceramic support or a glass plate (of course, other supports may be used) and to facilitate a process for manufacturing a display element.
- the present invention is to provide a manufacturing method for the commercialization of the material to be provided from a plastic material having a high thermal decomposition temperature and low thermal expansion coefficient.
- the manufacturing method for commercialization refers to a manufacturing method on a scale applicable to an actual display device manufacturing process, not a manufacturing on a laboratory scale.
- a scale of 50L solution standard
- the present invention is a reaction product of aromatic dianhydrides and aromatic diamines as a preferred first embodiment, and the thermal expansion coefficient (thermal expansion coefficient) in the temperature range of 50 ⁇ 450 °C when the imidization film is formed 5ppm / °C or less
- the present invention provides a polyamic acid solution for forming a base layer or a protective layer of a display device having a pyrolysis temperature of 500 ° C. or more, which is defined as a temperature at which a weight loss ratio reaches 1% when pyrolysis is measured by a thermogravimetric analyzer.
- the polyamic acid solution according to the embodiment may have a viscosity of 50 to 5,000 poise.
- the reaction product is -O-, -CO-, -NHCO-, -S-, -SO 2- , -CO-O-, -CH 2 -and -C (CH 3 ) between the aromatic rings. It is preferable that it is a reaction product of hard aromatic dianhydrides and hard aromatic diamines which do not contain a 2 -chain.
- the reaction product is a reaction product of para-phenylenediamine as aromatic diamines and pyromellitic anhydride with biphenyltetracarboxylic acid anhydride as aromatic dianhydrides, and in one preferred embodiment, the reaction product.
- the reaction product Is biphenyltetracarboxylic acid anhydride containing at most 40 mol% in aromatic dianhydrides.
- the reaction product involves commercial consideration that the production scale is at least 5 L in one polymerization.
- the reaction product is divided into the required amount of the reaction solvent, the cosmetic residue remaining in the reactor wall and the stirrer, etc. after the addition of the raw material of the aromatic dianhydrides and aromatic diamines in powder form It may be obtained by including a showering step of washing off the raw material in the form of a sea salt and dissolved in a solution.
- reaction product may be obtained by including a step of heating and stirring the temperature of the reactor to about 40 ⁇ 80 °C after the showering process.
- reaction product may be obtained by adding a bubbling process by blowing an inert gas at the bottom of the reactor during the dissolution process after input of raw materials.
- In one embodiment of the present invention provides a polyimide coating layer formed from the polyamic acid solution obtained from the above embodiments.
- An exemplary embodiment of the present invention provides a display device including the polyimide coating layer as a protective layer or a display device including the polyimide coating layer as a base layer.
- the present invention is a reaction product of an aromatic dianhydride and an aromatic diamine as a preferred embodiment, the thermal expansion coefficient is 5ppm / °C or less in the temperature range of 50 ⁇ 450 °C after forming the imidization film, the pyrolysis temperature is It provides a polyamic acid solution that is at least 500 °C.
- the pyrolysis temperature is defined as the temperature at which the weight loss ratio reaches 1% in the pyrolysis measurement by the thermogravimetric analyzer, that is, Td 1%.
- Thermal expansion coefficient and thermal decomposition temperature within the temperature range is a thermal environmental change that occurs during the manufacturing process of the display device when applying the imidized film after applying the polyamic acid solution as a base layer or a protective layer of the display device
- This model simulates dimensional stability and pyrolysis stability at high temperature.
- the substrate layer is repeatedly exposed to a high temperature environment during the manufacturing process of the display device.
- the smaller the thermal expansion the more favorable the manufacturing of the display device, and in order to easily design the manufacturing process, volatile decomposition material within the process temperature range. Should not cause
- the polyamic acid solution has a thermal expansion coefficient of 5 ppm / ° C. or lower measured at 50 to 450 ° C. when an imidized film is formed.
- the polymer material generates volatile organic substances by pyrolysis while undergoing a high temperature process, the manufacturing process itself may become impossible because it contaminates manufacturing facilities. Therefore, the device can be manufactured at a high temperature only by using a polymer material having a high pyrolysis temperature on the premise of reducing the pyrolysis temperature, especially a small amount of weight.
- the circuit work may not be possible during the manufacturing process of the display device, and even if the work is possible, the foreign material may act as a defect, resulting in a defect of the final display.
- the polymer material itself must be accompanied by special compositions, conditions and processes that can reduce or eliminate foreign matter during the manufacturing process.
- the polyamic acid solution may be obtained from polymerization of dianhydride and diamine monomers (hereinafter hard monomers) in which no flexible chain exists between aromatic rings.
- hard monomers dianhydride and diamine monomers
- the hard monomer is specifically -O-, -CO-, -NHCO-, -S-, -SO 2- , -CO-O-, -CH 2- , -C (CH) between the aromatic rings. 3
- It can be defined as a monomer having no two -chains, ie soft chains.
- biphenyltetracarboxylic dianhydride (3,3 ', 4,4'-Biphenyltetracarboxylic Dianhydride, BPDA
- pyromellitic dianhydride (1,2,4,5) -benzenetetracarboxylic dianhydride (PMDA)
- diamines include p-phenylenediamine (pPDA) and aminophenylaminobenzoxazole (2- (4-aminophenyl) -5-aminobenzoxazole (APAB)).
- p-phenylenediamine is preferable.
- diamine and dianhydride may be used in a molar ratio of 1: 0.9 to 0.9: 1, and one or more dianhydrides and diamines may be used as long as they are within the monomer molar ratio to satisfy the above-described purpose, or dianhydrides may be 2
- One or more diamines may be used, or two or more diamines and one or more dianhydrides may be used.
- biphenyltetracarboxylic dianhydride in an amount of up to 40 mol% in aromatic dianhydrides.
- the polyamic acid solution which is a precursor of the polyimide
- the polyamic acid solution can be prepared by dissolving and reacting the dianhydride component and the diamine component in an organic solvent in an almost equimolar amount.
- the reaction temperature is preferably -20 to 80 ° C, and the reaction time is preferably 2 to 48 hours. Moreover, it is more preferable that it is inert atmosphere, such as argon and nitrogen, at the time of reaction.
- the organic solvent for the polymerization reaction of the polyamic acid solution is not particularly limited as long as it is a solvent in which the polyamic acid is dissolved.
- Known reaction solvents selected from m-cresol, N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), acetone, diethyl acetate
- NMP N-methyl-2-pyrrolidone
- DMF dimethylformamide
- DMAc dimethylacetamide
- DMSO dimethyl sulfoxide
- acetone diethyl acetate
- low boiling point solutions such as tetrahydrofuran (THF), chloroform or low absorbing solvents such as gamma-butyrolactone may be used.
- the organic solvent in order to obtain the molecular weight and viscosity of the appropriate polyamic acid solution, is preferably 50 to 95% by weight of the total polyamic acid solution, more preferably 70 to 90% by weight It is more preferable.
- the polyimide resin prepared by imidating the polyamic acid solution prepared as described above preferably has a glass transition temperature of 300 ° C. or higher in consideration of thermal stability.
- polyimide-based polymer is a well-known high heat-resistant material, and has high Tg and low thermal expansion rate, so that TFTs can be manufactured at a temperature of 400 ° C. or higher, and is advantageous for pattern formation if the polyamic acid solution is applied and cured. Since it can be fixed on the support without having to do it, the smoothness can be easily maintained, which can be a very advantageous material for implementing a flexible display.
- the filler is added to the polyamic acid solution for the purpose of improving various properties such as surface properties and thermal conductivity of the polyimide coating layer.
- the present invention is limited to not adding any filler because it may act as a serious defect and finally bring about a defect or a decrease in yield of a display.
- the solution of the foreign matters may be a filtering process.
- the filtering process can be used as a conventional process and is not particularly limited.
- the pore size of the filter must be less than 10 ⁇ m, preferably it is advantageous to use less than 1 ⁇ m.
- the method which simulates the flexible display manufacturing process can be used,
- coating a polyamic acid solution uniformly to a support body is mentioned. That is, the display device manufacturing process generally proceeds in the order of sequentially stacking electrodes and display parts on the upper surface of the base layer.
- the polyamic acid solution is coated on a separate support.
- the method of imidizing and manufacturing an imidation film, performing a display element lamination process according to a conventional method on an imidation film, and finally peeling a support body is mentioned.
- the plastic material in the form of a film may be advantageous in terms of improving the flatness of the substrate layer compared with the substrate.
- the method of applying the polyamic acid solution to the support according to the present invention will be the only method.
- the polyimide coating layer imidized by applying the polyamic acid solution on a component laminated on the display device may be applied as a protective layer.
- the viscosity of the polyamic acid solution may be preferably 50 to 5,000 poise.
- This viscosity can be determined by the application method and the required imidization film thickness.
- the present invention provides a method for producing a scale capable of polymerizing at least 5L (solution standard) at a time in a batch type as a method for producing a commercially available scale.
- all of the required amount of the reaction solvent is not initially added, but only an amount except a certain amount is initially added.
- the raw materials in the undissolved powder form remaining in the reactor wall and agitator are washed and dissolved in the solution.
- This process is called a showering process.
- the temperature of the said reactor is heated and stirred by about 40-80 degreeC by the further method.
- undissolved water may exist at the lowest part of the reactor. It is added as a bubble to the solution inside the reactor to add the lowest stirring performance of the reactor, which is a blind spot of the stirring performance. This is called a bubbling process.
- the amount of inert gas at this time can be used in various ways depending on the type of the inlet valve and the viscosity of the solution.
- Dissolution methods such as the reactor heating, showering process and inert gas bubbling process as described above may all proceed according to the dissolved state of the solution, only one or more methods may be used, or both may be used.
- the polyamic acid solution thus obtained had 30 or less foreign substances of 0.5 ⁇ m or more, based on 40 g of the solution, with almost no foreign substances.
- foreign matters are foreign matters measured with the naked eye through an optical microscope (magnification of 50 to 500 times).
- the polyimide coating layer may be formed by coating and imidating such a polyamic acid solution.
- the imidization method applicable to the imidization layer may be a thermal imidization method, a chemical imidization method, or a thermal imidization method and a chemical imide. It can be applied in combination.
- the chemical imidization method is a method of imidizing a polyamic acid solution by imidizing a dehydrating agent represented by an acid anhydride such as acetic anhydride and an imidization catalyst represented by tertiary amines such as isoquinoline, beta-picolin and pyridine.
- the heating conditions of the polyamic acid solution may vary depending on the kind of the polyamic acid solution, the required imidization film thickness, and the like.
- the imidization film formation method After the dehydrating agent and the imidization catalyst are added to the polyamic acid solution and cast on a separate support, 80 to 200
- the imidized film can be obtained by heating at 100 ° C, preferably 100-180 ° C, activating the dehydrating agent and the imidization catalyst, partially curing and drying, and then heating at 200-400 ° C for 1-120 minutes.
- the display device components and the like may be sequentially stacked on the imidization film as described above, and a solution in which a dehydrating agent and an imidization catalyst is added to the polyamic acid solution is applied onto the display device components, and then an imidization film is formed. It can be applied as a protective layer.
- the polyamic acid solution As described above, by applying the polyamic acid solution to the display device, a display device having excellent thermal stability and appropriate flexibility and mechanical strength can be provided.
- N, N-dimethylacetamide (DMAc) As the reactor was charged with 39,000 g of N, N-dimethylacetamide (DMAc) while passing nitrogen through a 50L reactor equipped with a stirrer, a nitrogen injection device, a differential injection device, a temperature controller, a cooler, and a filtering system, the temperature of the reactor was 25 ° C.
- P-PDA para-Phenylene Diamine] 2,013.55g (18.62mol) is added using a differential injector. Thereafter, stirring was performed to dissolve and the solution was kept at 25 ° C. Then, 1,000 g of N, N-dimethylacetamide (DMAc) was used to wash away undissolved p-PDA remaining in the reactor wall and agitator and dissolved in the solution.
- the temperature of the reactor is raised to about 40 ⁇ 80 °C stirred for smooth and sure dissolution of the solution.
- inert gas such as argon or nitrogen is blown at the bottom of the reactor. It is added as a bubble to the solution inside the reactor to add the lowest stirring performance of the reactor, which is a blind spot of the stirring performance.
- the temperature of the reactor was adjusted to 25 ° C. again, and 2,814.52 g (12.90 mol) of PMDA [Pyromellitic Dianhydride] was added using a fine powder injector.
- PMDA Polyromellitic Dianhydride
- the above amount may be introduced at a time, or may be divided into 2 to 5 times at regular time intervals (10 minutes to 3 hours).
- the reaction progress or polymerization degree is indirectly tested through the viscosity, etc., and surplus amount is added step by step by 0.5wt%.
- the method is advantageous.
- N, N-dimethylacetamide (DMAc) is used to wash out undissolved PMDA remaining in the reactor wall and agitator and dissolve in solution.
- the total amount of N, N-dimethylacetamide (DMAc) required during each showering step is 1,500 g.
- the temperature of the reactor is raised to about 40 ⁇ 80 °C stirred.
- an inert gas such as argon or nitrogen is blown to the bottom of the reactor so that the solution inside the reactor is bubbled.
- the polymerized solution is subjected to a filtering process, which is a foreign matter removing process, through a filter having a pore size of 1 ⁇ m.
- a filtering process which is a foreign matter removing process, through a filter having a pore size of 1 ⁇ m.
- the filter type, material and shape of the present filtering process are not particularly limited.
- the obtained polyamic acid solution was vacuum degassed, cooled to room temperature, cast to a thickness of 60-100 ⁇ m on a stainless plate and dried for 10 minutes with hot air at 150 ° C. Then, the mixture was heated up to 450 ° C., heated for 30 minutes, and slowly cooled to separate from the support to obtain a polyimide membrane having a thickness of 10 to 15 ⁇ m.
- Example 1 As in Example 1, the composition was changed to 3,288.28 g (15.07 mol) of PMDA [Pyromellitic Dianhydride] and 1,108.88 g (3.77 mol) of BPDA [3,3 ', 4,4'-Biphenyltetracarboxylic Dianhydride].
- Example 2 As in Example 1, the composition was changed to 3,783.63 g (17.35 mol) of PMDA [Pyromellitic Dianhydride] and 567.08 g (1.93 mol) of BPDA [3,3 ', 4,4'-Biphenyltetracarboxylic Dianhydride].
- the filter size was changed to a filter having a 0.5 ⁇ m specification.
- Example 2 As in Example 1, the composition was changed to 2,360.98 g (10.82 mol) of PMDA [Pyromellitic Dianhydride] and 2,123.14 g (7.22 mol) of BPDA [3,3 ', 4,4'-Biphenyltetracarboxylic Dianhydride].
- N, N-dimethylacetamide As the reactor was charged with 39,000 g of N, N-dimethylacetamide (DMAc) while passing nitrogen through a 50L reactor equipped with a stirrer, a nitrogen injection device, a differential injection device, a temperature controller, a cooler, and a filtering system, the temperature of the reactor was 25 ° C.
- P-PDA para-Phenylene Diamine] 2,013.55g (18.62mol) is added using a differential injector. Thereafter, stirring was performed to dissolve and the solution was kept at 25 ° C. Then, 1,000 g of N, N-dimethylacetamide (DMAc) is used to wash away the undissolved p-PDA remaining in the reactor wall and the stirrer and dissolve in the solution.
- the temperature of the reactor is raised to about 40 ⁇ 80 °C stirred for smooth and sure dissolution of the solution.
- inert gas such as argon or nitrogen is blown at the bottom of the reactor. It is added as a bubble to the solution inside the reactor to add the lowest stirring performance of the reactor, which is a blind spot of the stirring performance.
- the temperature of the reactor was adjusted to 25 ° C., and 1,926.38 g (8.83 mol) of PMDA [Pyromellitic Dianhydride] was added using a fine powder injector.
- PMDA Polyromellitic Dianhydride
- the above amount may be introduced at a time, or may be divided into 2 to 5 times at regular time intervals (10 minutes to 3 hours).
- the reaction progress or polymerization degree is indirectly tested through the viscosity, etc., and surplus amount is added step by step by 0.5wt%.
- the method is advantageous.
- N, N-dimethylacetamide (DMAc) is used to wash away the undissolved PMDA remaining in the reactor wall and agitator and dissolve in solution.
- the total amount of N, N-dimethylacetamide (DMAc) required during each showering step is 1,500 g.
- the temperature of the reactor is raised to about 40 ⁇ 80 °C stirred.
- an inert gas such as argon or nitrogen is blown to the bottom of the reactor so that the solution inside the reactor is bubbled.
- the polymerized solution is subjected to a filtering process, which is a foreign matter removing process, through a filter having a pore size of 1 ⁇ m.
- the filter type, material and shape of the present filtering process are not particularly limited.
- the obtained polyamic acid solution was vacuum degassed, cooled to room temperature, cast to a thickness of 60-100 ⁇ m on a stainless plate and dried for 10 minutes with hot air at 150 ° C. Then, the mixture was heated up to 450 ° C., heated for 30 minutes, and slowly cooled to separate from the support to obtain a polyimide membrane having a thickness of 10 to 15 ⁇ m.
- the composition was changed to 725.11 g (3.32 mol) of PMDA [Pyromellitic Dianhydride] and 3,912.39 g (13.30 mol) of BPDA [3,3 ', 4,4'-Biphenyltetracarboxylic Dianhydride].
- the composition was changed to 355.57 g (1.63 mol) of PMDA [Pyromellitic Dianhydride] and 4,316.59 g (14.67 mol) of BPDA [3,3 ', 4,4'-Biphenyltetracarboxylic Dianhydride].
- the filter size was changed to a filter having a 3 ⁇ m specification.
- Example 1 Same as Example 1 above, but the inert gas bubble process was not performed during the dissolution process after the raw material input.
- the sample Prior to measuring the thermal expansion rate, the sample was annealed at 450 ° C. for 10 minutes.
- the method of measuring the coefficient of thermal expansion was performed by cutting a portion of the polyimide coating layer sample into a width of 4mm ⁇ length 24mm and measuring the coefficient of thermal expansion (Coefficient of thermal expansion) using a Thermo Mechanical Apparatus of TA.
- the sample was placed on a support and subjected to a force of 50 mN, and then heated at a temperature increase rate of 5 ° C./min from 50 ° C. to 450 ° C. in a nitrogen atmosphere to measure thermal expansion rate.
- the coefficient of thermal expansion was calculated to the first decimal place within the range of 50 ° C to 450 ° C and the unit is expressed as [ppm / ° C].
- Pyrolysis temperature was measured by using a TGA measuring device of Perkin Elmer. After cutting the imide membrane into the size of 3mm ⁇ 3mm and placing it on the pre-treated and weighed fan, it was insulated for 30 minutes at 110 ° C, cooled to room temperature, and again heated to 600 ° C at a rate of 5 ° C per minute to measure the weight loss . The pyrolysis temperature was calculated by setting the weight reduction ratio to 1% of the weight of the first loaded imide membrane.
- the diluted 400 g solution was added with vacuum and filtered through a 0.5 ⁇ m filter.
- the filter is dried at about 80 ° C. oven. However, at this time, the sealing should be carried out as much as possible so that no foreign matter is introduced.
- the dried filter is counted by using an optical microscope.
- Example 1 70 30 100 0 0 1, 1 time 0.98 525 12 21
- Example 2 80 20 100 0 0 1, 1 time 1.58 533 12 24
- Example 3 90 10 100 0 0 1, 1 time -2.50 535 10 17
- Example 4 70 30 100 0 0 1, 2 times 0.98 525 11 9
- Example 5 70 30 100 0 0 0.5, once 0.98 525 12 5
- Example 6 60 40 100 0 0 1, 1 time 2.54 522 11 20
- Reference Example 1 50 100 0 0 1, 1 time 6.35 520 11 18
- Reference Example 2 40 60 100 0 0 1, 1 time 13.6 515 10 21
- Reference Example 3 30 70 100 0 0 1, 1 time 16.69 513 11 10 Reference Example 4 20 80 100 0 0 1, 1 time 17.68 505
- the polyamic acid solution according to the embodiment of the present invention had no problem in imidization and coating.
- the polyimide coating layer obtained from the polyamic acid solution according to Examples 1 to 6 has a thermal expansion coefficient measurement value of 5 ppm / ° C. or lower and a pyrolysis temperature of 500 ° C. or higher in a temperature range of 50 to 450 ° C., thus ensuring volatilization while maintaining excellent dimensional stability in a high temperature process. It can be expected not to cause a substance.
- the polyimide coating layer formed of the polyamic acid solution according to Reference Examples 1 to 5 to Reference Examples 8 to 9 has a satisfactory thermal decomposition temperature, but the thermal expansion rate exceeds 5 ppm / ° C. It can be seen that it will be less optimal when used in the formation of the base layer or the protective layer.
- the polyimide coating layer according to Reference Examples 6 to 7 has more than 30 foreign matters, which is very likely to cause deterioration of display properties or defects during display manufacturing. It will be appreciated that it will be less optimal in use.
- the polyamic acid solution can be applied to the substrate layer or the protective layer for a display device that requires flexibility, in particular, it can be seen that the polyamic acid solution according to the embodiments is optimal.
- the polyimide coating layer formed of the polyamic acid solution does not need to use an adhesive on a support plate (metal foil, glass plate, etc.) used for fixing, it can be seen that an additional process for adhesion does not occur, thereby simplifying the process.
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Abstract
Description
구분 | 조성(몰비%) | 필터링 | 열팽창율[ppm/℃] | 열분해온도[℃] | 두께[㎛] | 이물[ea] | ||||
디안하이드라이드 | 디아민 | |||||||||
PMDA | BPDA | p-PDA | APAB | ODA | ||||||
실시예 1 | 70 | 30 | 100 | 0 | 0 | 1, 1회 | 0.98 | 525 | 12 | 21 |
실시예 2 | 80 | 20 | 100 | 0 | 0 | 1, 1회 | 1.58 | 533 | 12 | 24 |
실시예 3 | 90 | 10 | 100 | 0 | 0 | 1, 1회 | -2.50 | 535 | 10 | 17 |
실시예 4 | 70 | 30 | 100 | 0 | 0 | 1, 2회 | 0.98 | 525 | 11 | 9 |
실시예 5 | 70 | 30 | 100 | 0 | 0 | 0.5, 1회 | 0.98 | 525 | 12 | 5 |
실시예 6 | 60 | 40 | 100 | 0 | 0 | 1, 1회 | 2.54 | 522 | 11 | 20 |
참고예 1 | 50 | 50 | 100 | 0 | 0 | 1, 1회 | 6.35 | 520 | 11 | 18 |
참고예 2 | 40 | 60 | 100 | 0 | 0 | 1, 1회 | 13.6 | 515 | 10 | 21 |
참고예 3 | 30 | 70 | 100 | 0 | 0 | 1, 1회 | 16.69 | 513 | 11 | 10 |
참고예 4 | 20 | 80 | 100 | 0 | 0 | 1, 1회 | 17.68 | 505 | 11 | 27 |
참고예 5 | 10 | 90 | 100 | 0 | 0 | 1, 1회 | 17.73 | 495 | 11 | 13 |
참고예 6 | 70 | 30 | 100 | 0 | 0 | X | 0.98 | 525 | 12 | 50개 이상 |
참고예 7 | 70 | 30 | 100 | 0 | 0 | 3, 1회 | 0.98 | 525 | 12 | 50개이상 |
참고예 8 | 70 | 30 | 0 | 100 | 0 | 1, 1회 | 9.88 | 540 | 11 | 25 |
참고예 9 | 70 | 30 | 0 | 0 | 100 | 1, 1회 | 50.33 | 525 | 12 | 19 |
참고예 10 | 70 | 30 | 100 | 0 | 0 | 샤워링 과정 X 중합 X (50 poise 이하) | ||||
참고예 11 | 70 | 30 | 100 | 0 | 0 | 불활성 가스 버블 과정 X 중합 X (50 poise 이하) |
Claims (12)
- 방향족 디안하이드라이드류와 방향족 디아민류의 반응 생성물이고,이미드화막 형성시 50~450℃의 온도범위에서의 열팽창율(Thermal Expansion Coefficient)이 5ppm/℃ 이하이고, 열중량분석기에 의해 열분해 측정시 중량감소비율이 1%에 도달되는 시점의 온도로 정의되는 열분해온도가 500℃ 이상인,표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제1항에 있어서, 반응 생성물은 방향족 환 사이에 -O-, -CO-, -NHCO-, -S-, -SO2-, -CO-O-, -CH2- 및 -C(CH3)2- 사슬을 포함하지 않는 경성 방향족 디안하이드라이드류와 경성 방향족 디아민류의 반응 생성물인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제1항 또는 제2항에 있어서, 반응 생성물은 방향족 디아민류로 파라-페닐렌디아민, 방향족 디안하이드라이드류로 파이로멜리트산 이무수물과 비페닐테트라카르복실산 이무수물과의 반응 생성물인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제3항에 있어서, 반응 생성물은 비페닐테트라카르복실산 이무수물을 방향족 디안하이드라이드류 중 최대 40몰%로 포함하는 것인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제1항에 있어서, 점도가 50~5,000 poise인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제1항에 있어서, 반응 생성물은 제조 스케일이 한번 중합 시 5L 이상인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제6항에 있어서, 반응 생성물은 반응 용매의 필요량을 분할 투입하여, 분말형태의 방향족 디안하이드라이드류 또는 방향족 디아민류 원료 투입 후에 반응기 벽면 및 교반기 등에 잔존해 있는 미용해 분말형태의 원료를 씻어 내리며 용액에 용해시키는 샤워링 공정을 포함하여 얻어진 것인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제6항에 있어서, 반응 생성물은 샤워링 공정 이후로 반응기의 온도를 40~80℃가량으로 승온하여 교반하는 공정을 포함하여 얻어진 것인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제6항 내지 제8항 중 어느 한 항에 있어서, 반응 생성물은 원료 투입 후 용해과정 중에 반응기 최하단에 불활성 가스를 불어 넣어 버블링하는 버블링 공정을 포함하여 얻어진 것인, 표시소자의 기재층 또는 보호층 형성용 폴리아믹산 용액.
- 제1항의 폴리아믹산 용액으로부터 형성된 폴리이미드 코팅층.
- 제10항의 폴리이미드 코팅층을 보호층으로 포함하는 표시소자.
- 제10항의 폴리이미드 코팅층을 기재층으로 포함하는 표시소자.
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JP2018506611A (ja) * | 2014-12-30 | 2018-03-08 | コーロン インダストリーズ インク | ポリアミド−イミド前駆体、ポリアミド−イミドフィルム及びこれを含む表示素子 |
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KR101845148B1 (ko) | 2016-03-16 | 2018-04-03 | 삼성에스디아이 주식회사 | 폴리아믹산의 제조방법, 이로부터 제조된 폴리이미드 및 이를 포함하는 디스플레이용 소자 |
KR20180093203A (ko) | 2017-02-10 | 2018-08-21 | 삼성디스플레이 주식회사 | 폴리아믹산, 폴리이미드 필름 및 폴리이미드 필름의 제조 방법 |
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CN109423047A (zh) * | 2017-08-28 | 2019-03-05 | 苏州聚萃材料科技有限公司 | 耐热聚酰亚胺薄膜及其制备的显示器基板 |
KR102264420B1 (ko) | 2017-11-03 | 2021-06-11 | 주식회사 엘지화학 | 디스플레이 기판용 폴리이미드 필름 |
JPWO2019189483A1 (ja) * | 2018-03-28 | 2021-05-13 | 住友化学株式会社 | 透明ポリイミド系高分子と溶媒とを含むワニス |
JP7361479B2 (ja) * | 2018-03-28 | 2023-10-16 | 住友化学株式会社 | 透明ポリイミド系高分子を含む光学フィルム |
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CN109796761A (zh) * | 2018-12-25 | 2019-05-24 | 努比亚技术有限公司 | 显示屏组件、其制备方法和显示终端 |
KR102013535B1 (ko) * | 2018-12-31 | 2019-08-22 | 에스케이씨코오롱피아이 주식회사 | 저장 안정성 및 점도 안정성이 향상된 폴리이미드 전구체 조성물의 제조방법, 이를 이용하여 제조된 폴리이미드 전구체 조성물 |
CN111363151A (zh) * | 2020-04-22 | 2020-07-03 | 江苏奥神新材料股份有限公司 | 一种工业化聚酰胺酸聚合粘度的控制方法 |
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- 2011-12-27 KR KR1020110143786A patent/KR101646283B1/ko active IP Right Grant
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- 2012-12-26 US US14/369,084 patent/US20140364564A1/en not_active Abandoned
- 2012-12-26 CN CN201280070024.3A patent/CN104114644A/zh active Pending
- 2012-12-26 EP EP12862118.2A patent/EP2799494A4/en not_active Withdrawn
- 2012-12-26 JP JP2014549989A patent/JP5976839B2/ja active Active
- 2012-12-26 TW TW101150191A patent/TW201331267A/zh unknown
- 2012-12-26 WO PCT/KR2012/011460 patent/WO2013100558A1/ko active Application Filing
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Cited By (1)
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JP2018506611A (ja) * | 2014-12-30 | 2018-03-08 | コーロン インダストリーズ インク | ポリアミド−イミド前駆体、ポリアミド−イミドフィルム及びこれを含む表示素子 |
Also Published As
Publication number | Publication date |
---|---|
EP2799494A4 (en) | 2015-08-12 |
KR101646283B1 (ko) | 2016-08-08 |
EP2799494A1 (en) | 2014-11-05 |
CN104114644A (zh) | 2014-10-22 |
JP5976839B2 (ja) | 2016-08-24 |
JP2015503652A (ja) | 2015-02-02 |
US20140364564A1 (en) | 2014-12-11 |
KR20130075423A (ko) | 2013-07-05 |
TW201331267A (zh) | 2013-08-01 |
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