WO2013099276A1 - 有機el表示パネルとその製造方法 - Google Patents
有機el表示パネルとその製造方法 Download PDFInfo
- Publication number
- WO2013099276A1 WO2013099276A1 PCT/JP2012/008414 JP2012008414W WO2013099276A1 WO 2013099276 A1 WO2013099276 A1 WO 2013099276A1 JP 2012008414 W JP2012008414 W JP 2012008414W WO 2013099276 A1 WO2013099276 A1 WO 2013099276A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- opening
- organic
- light emitting
- column
- openings
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8423—Metallic sealing arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
Definitions
- the present invention relates to an organic EL display panel using an organic electroluminescent element (hereinafter referred to as “organic EL element”), which is an electroluminescent element, and a method for manufacturing the same.
- organic EL element organic electroluminescent element
- the present invention particularly relates to a coating technique using an inkjet head.
- the organic EL element is a current-driven light-emitting element, and has a basic structure in which an organic light-emitting layer is disposed between a pair of an anode and a cathode. During driving, a voltage is applied between a pair of electrodes, and holes injected from the anode side and electrons injected from the cathode side are recombined in the organic light emitting layer, and the electroluminescence phenomenon generated at this time is utilized.
- the organic EL element is self-luminous and has high visibility. Moreover, since it is a complete solid-state device, it has characteristics such as excellent impact resistance.
- organic EL element As a type of organic EL element, a coating type in which an organic light emitting layer or a charge injection layer is formed by applying an ink containing a high molecular weight material or a low molecular weight material with good thin film formability by a wet process (application process) and drying the ink. There is an organic EL element.
- An organic EL display panel in which a large number of coating type organic EL elements are arranged in a matrix direction on a substrate has been developed.
- the wet process there is a method such as an ink jet method.
- an organic EL display panel manufacturing intermediate (application target substrate) is placed on a table, and the inkjet head is scanned with respect to the application target substrate.
- a plurality of nozzles of an ink jet head are supplied with ink droplets containing an organic light emitting material or a charge injection material, a solvent, and the like with respect to an opening (an area where an organic EL element is to be formed) partitioned on a bank layer on a substrate to be coated (See Patent Document 1).
- a method for driving the ink jet head there is a method such as a piezo method that controls ejection of ink with a piezoelectric element.
- FIG. 19B is a partially enlarged view showing the positional relationship between the application target substrate 100PX and the inkjet head 30 in the conventional application process.
- Reference numerals 13R, 13G, and 13B in FIG. 19B denote openings, which repeatedly exist in the row (X) direction on the coating target substrate 100PX.
- Ink droplets of red (R), green (G), and blue (B) organic light emitting materials are ejected in the same order through the openings 13R, 13G, and 13B.
- the inkjet head 30 includes nozzle groups arranged in a row.
- FIG. 19B shows a nozzle group including nozzles with consecutive numbers n 1 to n 11 .
- black circles indicate nozzles that eject ink
- white circles indicate nozzles that do not eject ink.
- nozzles of numbers n 4 to n 9 are used.
- the row (X) direction is set as the drawing direction, and the inkjet head 30 is scanned in the same direction.
- Ink liquid is supplied from a nozzle group (nozzles numbered n 4 to n 9 ) to any one of the openings 13R, 13G, 13B arranged in each row (Y) direction line L R1 , L G1 , L B1 ,.
- Discharge drops in the coating target substrate 100PX having a plurality of openings in the matrix (XY) direction, if a certain nozzle group is assigned to each specific opening arranged in the column (Y) direction, this nozzle group is arranged in a row ( X) is also commonly assigned to the openings arranged in the direction.
- FIG. 19C is a partial cross-sectional view along the column (Y) direction of the completed organic EL display panel 100X.
- the substrate 1, the TFT layer 2, the feeding electrode 3, and the planarization film 4 are provided, and are formed between a pair of electrodes (first electrode 6 and second electrode 10).
- Three organic EL elements 11Ra, 11Rb, and 11Rc each having the organic light emitting layer 9 (here, red (R) color) are shown.
- the organic EL elements 11Ra, 11Rb, and 11Rc are formed inside the openings 13R on the column (Y) direction lines L R1 , L R2 , L R3 , L R4 ,... In FIG.
- the characteristics of each organic EL element are uniform. For this reason, it is required that the amount of ink ejected to each opening in the coating process is made uniform and the film thicknesses of the organic light emitting layer and the charge injection layer are made uniform. Therefore, when setting the ink jet, for example, the volume of ink ejected from each nozzle (hereinafter referred to as “droplet volume”) is made uniform so that the droplet volume of ink ejected to each opening is uniform. It is done.
- FIG. 19A shows a front view of an organic EL display panel 100X in a conventional organic EL display device.
- streak unevenness streaky luminance unevenness
- FIGS. 19B and 19C The cause of the occurrence of streak unevenness will be described with reference to FIGS. 19B and 19C.
- the processing accuracy of a liquid chamber, a nozzle, or the like provided inside the inkjet head may vary.
- ink components may adhere to the liquid chamber and nozzles, and the ink flow rate may fluctuate. For these reasons, errors may occur in the droplet discharge characteristics between the nozzles of the inkjet head. Accordingly, the ink droplet volumes can also vary from one nozzle number n 4 to n 9 shown in FIG. 19B.
- nozzles with numbers n 4 to n 9 include nozzles having an error with a large amount of ejected droplets.
- the nozzle groups of numbers n 4 to n 9 are used for forming the organic light emitting layer 9 shown in FIG.
- the nozzles of the numbers n 4 to n 9 along the row (X) direction discharge to the respective opening portions 13R on the column (Y) direction lines L R1 , L R2 , L R3 , L R4 ,. All ink droplet volumes contain the same amount of error.
- the film thickness D 2 of each organic EL element 11Rb arranged in the row (X) direction is larger than the film thicknesses D 1 and D 3 of the organic light emitting layers 9 of the organic EL elements 11Ra and 11Rc arranged in another row (X) direction.
- the film thickness may be different (here, the film thickness becomes thicker).
- the organic EL element 11Rb having the thick organic light emitting layer 9 is continuously arranged in the row (X) direction on the organic EL display panel 100X.
- the organic EL display panel 100X as shown in FIG. 19A, streak unevenness due to the film thickness difference of the organic light emitting layer 9 occurs on the screen. Streaky irregularities may appear periodically on the screen and become noticeable when the screen is viewed, which is a cause of reducing the image display performance of the organic EL display panel.
- the present invention has been made in view of the above problems, and includes an organic EL display panel including an organic light emitting layer formed by an ink jet method and capable of effectively suppressing a decrease in image display performance due to the occurrence of streak unevenness. It aims to provide a method.
- At least a part of a plurality of first electrodes is formed above a substrate along a matrix direction of the surface of the substrate.
- a second electrode forming step, and in the bank layer forming step, among the plurality of openings, an opening group in a first row and an opening group in a second row are arranged along the column direction.
- the bank layer is formed so as to be shifted from each other by a distance difference of half or less of the pitch of the openings, and the plurality of nozzles includes a first nozzle group and a second nozzle group, and the organic light emitting layer formation
- the ink droplets are ejected from the first nozzle group when the inkjet head moves over the openings included in the opening group of the first row, and the opening portions of the second row
- the first nozzle group and the second nozzle group are switched so that the ink droplets are ejected from the second nozzle group when the inkjet head moves over the openings included in the group. Shall be used.
- each opening group in the first and second columns is arranged in the column direction with a distance difference of half or less of the opening pitch in the column direction. Adjust the arrangement so that they deviate from each other.
- the nozzle group of the inkjet head assigned to each opening in the column direction is changed to the first column. It can be used by switching between the first nozzle group and the second nozzle group in accordance with the position of each opening in the second row.
- nozzles having an error in the ink discharge amount are switched, correspondingly to the openings arranged in the row direction, the same one after another.
- An error amount of ink can be prevented from being discharged.
- the error of the ink droplet volume of the nozzles can be distributed differently between the openings arranged in the first row and the openings arranged in the second row.
- an organic EL display panel that includes an organic light emitting layer formed by an ink jet method and that can effectively suppress deterioration in image display performance due to the occurrence of streak unevenness and a method for manufacturing the same.
- FIG. 1 is a perspective view showing a main configuration of an inkjet apparatus system 1000.
- FIG. 2 is a functional block diagram of an inkjet apparatus system 1000.
- FIG. 4A is a cross-sectional view along the longitudinal direction of the head portion 301.
- (B) is a cross-sectional view taken along the line W 0 -W 0 ′ (cross-sectional view of the head portion 301 in the short direction) of (a). It is a figure which shows the arrangement
- 5 is a diagram showing a manufacturing process of the organic EL display panel 100.
- FIG. It is a cross-sectional perspective view of the application target substrate 100P showing a state immediately after ink application. It is a figure which shows the manufacturing process of an organic electroluminescence display panel.
- FIG. (A) is an enlarged front view of the application
- FIG. (B) is an enlarged front view of the coating target substrate 100P 1 illustrating an organic light emitting layer forming step according to the second embodiment.
- (A) is an enlarged front view of the coating target substrate 100P 2 for explaining the organic light-emitting layer forming step according to the third embodiment.
- (B) is an enlarged front view of the coating target substrate 100P 3 for explaining the organic light-emitting layer forming step according to the fourth embodiment.
- (A) is an enlarged front view of the coating target substrate 100P 4 for explaining the organic light-emitting layer forming step according to the fifth embodiment.
- FIG. 5 is a diagram (schematic mapping diagram of streaks) showing the results of the effect confirmation test of the first embodiment.
- FIG. 6 is a graph showing a result of an effect confirmation test of Embodiment 1 (an ink volume variation amount between openings in a column direction).
- FIG. 10 is a partial enlarged view showing a configuration around an organic EL element 11, 11 ′ of an organic EL display panel according to Embodiment 7.
- FIG. 10A is a partial cross-sectional view showing a configuration around an organic EL element 11R of an organic EL display panel according to Embodiment 7 and a partial cross-sectional view showing a configuration around an organic EL element 11R ′.
- FIG. 16 is a partial enlarged view showing a configuration around an organic EL element 11, 11 ′ of an organic EL display panel according to Embodiment 8.
- FIG. 10 is a partial cross-sectional view (a) showing a configuration around an organic EL element 11R of an organic EL display panel according to Embodiment 8, and a partial cross-sectional view (b) showing a configuration around an organic EL element 11R ′. It is a figure for demonstrating generation
- a method for manufacturing an organic EL display panel includes: a first electrode forming step of forming a plurality of first electrodes along a matrix direction of a surface of the substrate above the substrate; A bank layer forming step of forming a bank layer in the presence of a plurality of openings that individually expose the first electrodes, and moving at least one of the inkjet head having a plurality of nozzles and the substrate, When the inkjet head and the substrate are moved relative to each other in the row direction, and each nozzle faces any of the openings, ink droplets are ejected from the nozzles into the facing openings.
- the bank layer is formed, and the plurality of nozzles include a first nozzle group and a second nozzle group, and in the organic light emitting layer forming step, the bank included in the opening group of the first row
- the inkjet head moves on each opening, the ink droplets are ejected from the first nozzle group, and the inkjet head moves on each opening included in the opening group in the second row.
- the first nozzle group and the second nozzle group are switched and used so that the ink droplets are ejected from the second nozzle group.
- the opening group in the first row and the opening group in the second row are half the pitch of the openings along the column direction. They are shifted from each other by the following distance difference.
- the nozzles assigned to the openings have the first nozzle groups corresponding to the openings in the first row and the openings in the second row when the substrate and the inkjet head are relatively moved along the row direction. It switches to the 2nd nozzle group corresponding to a section group, and is used.
- the distance difference may be a distance difference of 10% to 50% of the opening pitch in the column direction.
- the organic light emitting layer forming step first, by ejecting the ink droplets having different emission colors in the same order to the insides of the openings adjacent in the row direction, Second and third organic light emitting layers are formed, and each of the first, second, and third organic light emitting layers is provided in each of the first opening group and the second opening group. Of the layers, the organic light emitting layer having the same light emission color can be formed.
- the first row of opening groups and the second row are formed in the openings where the first, second, and third organic light emitting layers are to be formed.
- the bank layer may be formed so that the openings are arranged in the set.
- the one set of the openings in the bank layer forming step, can be continuously present in the row direction over 2 to 100 sets.
- the opening group of the first column and the opening group of the second column can be adjacent to each other in the row direction.
- the opening group of the first column and the opening group of the second column are repeatedly present in the row direction, and the opening group of the first column
- the openings in the second row and the openings in the second row of openings may be staggered with respect to each other.
- the opening group of the first column and the opening group of the second column are repeatedly present in the row direction, and the opening group of the first column
- the openings in the second row and the openings in the opening group in the second row may be present so as to be shifted stepwise.
- the opening group of the first column and the opening group of the second column are repeatedly present in the row direction, and the opening group of the first column
- the openings in the opening and the openings in the opening group in the second row may be present so as to be randomly displaced from each other.
- the inkjet head used in the organic light emitting layer forming step has a configuration in which the number of nozzles belonging to the first nozzle group and the second nozzle group is 10 or less, respectively. You can also.
- the plurality of nozzles are arranged in a line along one direction, and in the organic light emitting layer forming step, the one direction intersects the column direction.
- the inkjet head and the substrate can be moved while the inkjet head is tilted.
- a pixel restricting layer that restricts the light emitting region in each opening is formed by being partially overlapped with each first electrode.
- a pixel restricting layer forming step wherein in the pixel restricting layer forming step, the position of the first light emitting region inside each opening in the first opening group, and the second opening group.
- the pixel made of an insulating material in a region which is at least one end of both ends of the peripheral edge along the column direction of each opening so that the positions of the second light emitting regions inside each opening are aligned in the row direction.
- a regulation layer can also be formed.
- each length of the first light emitting region and the second light emitting region in the opening is at least of the opening along the column direction.
- the pixel regulation layer may be formed so as to be 30% or more of the length.
- a sealing layer forming step for forming a sealing layer above the second electrode, and a second substrate disposing step for disposing a second substrate above the sealing layer.
- the second substrate includes a translucent region that exists at a position facing the opening, and a black matrix that exists around each translucent region, and the translucent region includes the translucent region, The position of the first light emitting region inside each opening in the first opening group and the position of the second light emitting region inside each opening in the second opening group are aligned in the row direction. Can also be present.
- each length of the first light emitting region and the second light emitting region in the opening along the column direction may be present so as to be at least 30% of the length of the opening.
- An organic EL display panel which is one embodiment of the present invention includes a substrate, a TFT layer formed over the substrate, a plurality of first electrodes formed in a matrix direction above the TFT layer, and each first electrode A bank layer formed to have a plurality of openings in the matrix direction to expose the electrodes individually, an organic light emitting layer formed inside each opening, and a first layer formed above the organic light emitting layer And the plurality of openings include a first row opening group and a second row opening group, and the first row opening group and the second row opening group, Are arranged so as to be shifted from each other by a distance difference of half or less of the pitch of the openings along the column direction.
- the distance difference may be a distance difference of 10% to 50% of the opening pitch in the column direction.
- each of the first, second, and third organics is formed by ejecting the ink droplets having different emission colors in the same order into the openings adjacent in the row direction.
- a light emitting layer is formed, and each of the first, second, and third organic light emitting layers emits the same light in each of the first opening group and the second opening group. It can also be set as the structure in which the said organic light emitting layer of a color is formed.
- the first row of opening groups and the second row of opening groups for each opening in which the first, second, and third organic light emitting layers are formed are formed. And the first, second, and third organic light emitting layers are to be formed in the same order in the same order, and the three openings adjacent in the row direction are set as one set. Then, it can also be set as the structure by which the said bank layer is formed so that arrangement
- the one set of the openings may be continuously present in the row direction over 2 to 100 pairs.
- the opening group of the first column and the opening group of the second column may be adjacent to each other in the row direction.
- the opening group of the first column and the opening group of the second column are repeatedly present in the row direction, and each of the openings in the opening group of the first column And the openings in the opening group in the second row may be staggered with respect to each other.
- the opening group of the first column and the opening group of the second column are repeatedly present in the row direction, and each of the openings in the opening group of the first column It can also be set as the structure which exists so that each said opening part in the said opening part group of the said 2nd row may mutually shift
- the opening group of the first column and the opening group of the second column are repeatedly present in the row direction, and each of the openings in the opening group of the first column It can be set as the structure which exists so that each said opening part in the said opening part group of the said 2nd row may mutually shift
- a pixel restricting layer that restricts a light emitting region in each opening by being partially overlapped with each first electrode, and the pixel restricting layer includes The position of the first light emitting region inside each opening in the first opening group and the position of the second light emitting region inside each opening in the second opening group are aligned in the row direction.
- it may be configured to be formed of an insulating material in at least one end side of both ends of the peripheral edge along the column direction of each opening.
- the pixel regulating layer has at least the length of the opening along the column direction so that each length of the first light emitting region and the second light emitting region in the opening is at least the length of the opening. It can also be set as the structure currently formed so that it may become 30% or more.
- a sealing layer formed above the second electrode, and a second substrate disposed above the sealing layer, the second substrate includes the opening.
- a translucent region that exists at a position facing the portion and a black matrix that exists around each translucent region, and the translucent region includes each of the openings in the first aperture group.
- the position of the first light emitting region inside the portion and the position of the second light emitting region inside each opening in the second opening group may be aligned in the row direction. it can.
- each length of the first light emitting region and the second light emitting region in the opening is at least the length of the opening along the column direction. It is also possible to adopt a configuration in which the translucent region is present so as to be 30% or more.
- FIG. 1A is a cross-sectional view schematically showing the configuration of the organic EL display panel 100 according to Embodiment 1 of the present invention.
- FIG. 1A shows a configuration of three organic EL elements 11 ⁇ / b> R of the same color (red) formed adjacent to each other in the column (Y) direction on the organic EL display panel 100.
- the configuration of the organic EL element 11R is a TFT substrate 1 (hereinafter simply referred to as “substrate 1”) and a TFT wiring portion (sequentially laminated on one main surface of the TFT substrate 1 (the upper surface in FIG. 1A)).
- the TFT layer 2), the planarizing film 4, the first electrode 6, the organic light emitting layer 9, and the second electrode (cathode) 10 are provided.
- the organic EL display panel 100 when the organic EL display panel 100 is viewed from the front, as shown in a partial front view of the organic EL display panel 100 (FIG. 1B), it corresponds to red (R), green (G), and blue (B).
- the organic EL elements 11R, 11G, and 11B are formed as sub-pixels (light emitting units) with respect to the openings 13R, 13G, and 13B that are adjacent to each other in the row (X) direction.
- the organic EL elements 11R, 11G, and 11B have different emission colors of the organic light emitting layer 9 from each other.
- FIG. 1B illustrates the first pixel Pix 1 and the second pixel Pix 2 adjacent thereto in the row (X) direction.
- the second pixel Pix 2 is constituted by a set of organic EL elements 11R ′, 11G ′, and 11B ′.
- red (R), green (G), or blue (B) sub-pixels having the same emission color are formed as shown in FIG. ing.
- organic EL elements 11R and 11G are arranged in a matrix along the matrix (XY) direction (hereinafter, when the emission color and the pixel are not distinguished, the organic EL elements 11R and 11G are arranged).
- XY matrix
- 11B, 11R ′, 11G ′, and 11B ′ are simply referred to as “organic EL element 11”
- the openings 13R, 13G, and 13B are simply referred to as “opening 13”.
- a bank layer 7 having an opening 13 is formed on each first electrode 6 like the opening 13R of the organic EL element 11R shown in FIG. 1A (FIG. 1B).
- the opening 13 exists so as to partition the element formation scheduled region.
- an organic light emitting layer 9 and a second electrode (cathode) 10 are sequentially stacked above the first electrode 6.
- the substrate 1 is a base portion of the organic EL display panel 100.
- Substrate 1 is made of alkali-free glass, soda glass, non-fluorescent glass, phosphate glass, borate glass, quartz, acrylic resin, styrene resin, polycarbonate resin, epoxy resin, polyethylene, polyester, silicone resin, or It is formed using any insulating material such as alumina.
- the TFT layer 2 is provided to drive all the organic EL elements 11 of the organic EL display panel 100 by an active matrix method.
- the TFT layer 2 is formed using a conductive material, a semiconductor material, and an insulating material.
- the planarizing film 4 is an interlayer insulating film made of an organic material having excellent insulating properties, and is provided to cover the surface of the TFT layer 2 flatly.
- the planarizing film 4 has a circular hole (contact hole 5) by penetrating the region between the openings 13 adjacent in the row (Y) direction in the thickness direction (Z direction). (FIG. 1 (a)). Inside the contact hole 5, the TFT layer is electrically connected to the first electrode 6 through the feeding electrode 3.
- the first electrode 6 is an anode and forms a pair of electrodes with the second electrode 10.
- the first electrode 6 is, for example, APC (alloy of silver, palladium, copper), ARA (alloy of silver, rubidium, gold), MoCr (alloy of molybdenum and chromium), NiCr (of nickel and chromium). Alloy), and the like.
- APC alloy of silver, palladium, copper
- ARA alloy of silver, rubidium, gold
- MoCr alloy of molybdenum and chromium
- NiCr of nickel and chromium
- a plurality of first electrodes 6 are formed above the substrate 1 in a matrix (XY) direction in accordance with the positions of the openings 13 (element formation scheduled regions).
- the bank layer 7 is provided mainly for partitioning each element formation scheduled region of the organic EL display panel 100.
- the bank layer 7 is made of an insulating organic material (for example, acrylic resin, polyimide resin, novolac type phenol resin, etc.) and has water repellency at least on the surface.
- the pattern of the bank layer 7 can be adjusted as appropriate. However, in the organic EL display panel 100, the pattern is in the form of a cross (pixel bank).
- the bank layer 7 generally has a trapezoidal cross-sectional shape along the XY plane or the YZ plane.
- the bank material falls into the inside of the contact hole 5, and the hollow part 12 formed by shrinking (shrinking) exists (FIG. 1A).
- FIG. 1B shows two pixels (first pixel Pix 1 and second pixel Pix 2 ) adjacent to each other in the row (X) direction, which are partitioned by the bank layer 7.
- the aperture groups of RGB colors arranged in the column (Y) direction at the second pixel Pix 2 are arranged so as to be shifted from each other in the column (Y) direction.
- the opening group consisting of a plurality of opening parts 13R is aligned with each other along the line (Y) direction, and the opening pitch of 10% to 50% of the opening pitch in the column (Y) direction. It is arranged so as to be displaced by the difference in distance.
- each first column of the RGB color opening group in the first pixel Pix 1 and each second column of the RGB color color opening group in the second pixel Pix 2 are mutually in the column (Y) direction.
- the arrangement of the openings 13R, 13G, and 13B in each pixel in the column (Y) direction is set to be the same position.
- Such an arrangement of the openings 13 is to prevent streak unevenness that may occur when the organic EL display panel 100 is driven.
- the hollow part 12 is abbreviate
- the displacement amount of each opening group in the column (Y) direction at each pixel adjacent in the row (X) direction may be a distance that is at least half of the opening pitch in the column (Y) direction. Specifically, a distance difference of 10% to 50% of the opening pitch in the row (Y) direction is desirable.
- the number of nozzles in a nozzle group used corresponding to one opening is about 10 or less (in the first embodiment, 6) and maintaining the balance of the arrangement of the sub-pixels constituting one pixel.
- Organic light emitting layer 9 is a light emitting portion in the organic EL element 11.
- the organic light emitting layer 9 is formed so as to emit light in red (R), green (G), and blue (B) in the same order above the first electrode 6 in the openings 13R, 13G, and 13B.
- the organic light emitting layer 9 is configured to include a predetermined organic material, and a known material can be used as the material.
- the second electrode 10 is a cathode.
- the second electrode 10 is configured using a conductive material such as ITO or IZO (indium zinc oxide).
- a conductive material such as ITO or IZO (indium zinc oxide).
- a light transmissive material is used.
- a bottom emission type a light reflective material is used.
- a known sealing layer is provided above the second electrode 10.
- the sealing layer is formed of a material such as SiN (silicon nitride) or SiON (silicon oxynitride), for example, and suppresses deterioration of the organic light emitting layer 9 due to contact with moisture or air.
- the sealing layer is made of a light transmissive material.
- a black matrix is arranged so as to partition each organic EL element 11, and a color filter layer is provided on the surface facing each organic EL element 11. It is also possible to provide a color filter substrate provided with a so as to face the second electrode 10.
- the organic light emitting layer 9 is formed directly on the first electrode 6, but a known functional layer (for example, a hole) is formed between the first electrode 6 and the organic light emitting layer 9. Any of a transport layer, a hole injection layer, a buffer layer, etc.) may be disposed. Further, between the organic light emitting layer 9 and the second electrode 10, any other known layer such as a known electron transport layer or an electron injection layer may be disposed. (Effects produced by the organic EL display panel 100) In the organic EL display panel 100, as shown in FIG. 1B, for each pixel adjacent in the row (X) direction, the position along the column (Y) direction of the openings 13R, 13G, and 13B in each pixel. Are arranged so as to be deviated from each other at regular intervals.
- the ink droplets 8 are applied to the openings 13R, 13G, and 13B by relatively scanning the inkjet head 30 in the row (X) direction (see FIG. 6)
- the nozzle group of the nozzle 3030 used corresponding to the openings 13R, 13G, and 13B arranged in the row (X) direction can be switched for each pixel.
- the nozzle 3030 having an error in the ink droplet volume is switched when the nozzle group is switched.
- the openings 13R, 13G, and 13B of the same color arranged in the row (X) direction it is possible to prevent the ink of the same volume of droplets from being ejected continuously. That is, the ink droplet volume errors of the individual nozzles 3030 are distributed differently for each pixel in the openings 13R, 13G, and 13B of the same color arranged in the row (X) direction.
- the substrate 1 is prepared and placed in the chamber of the sputter deposition apparatus.
- a predetermined sputtering gas is introduced into the chamber.
- a conductive material is sputtered onto the substrate 1 through a pattern mask based on, for example, reactive sputtering.
- the TFT layer 2 and the feeding electrode 3 are formed, respectively (FIG. 2A).
- the TFT layer 2 and the feeding electrode 3 are formed at predetermined patterning and arrangement positions when film formation is performed by the reactive sputtering method.
- a planarizing film 4 having a thickness of about 4 ⁇ m is formed on the TFT layer 2 and the feeding electrode 3 using a known organic material having excellent insulating properties based on the photoresist method (FIG. 2B).
- a contact hole 5 for electrically connecting the first electrode 6 and the feeding electrode 3 to be formed on the planarizing film 4 is positioned between the openings 13 adjacent in the column (Y) direction.
- the planarization film 4 and the contact hole 5 can be formed simultaneously.
- the method of forming the contact hole 5 is not limited to this. For example, after the flattening film 4 is uniformly formed, the contact hole 5 can be present by penetrating the flattening film 4 at a predetermined position.
- the first electrode 6 made of a metal material having a thickness of about 50 nm is formed on the planarizing film 4 formed above, for example, based on a vacuum deposition method or a sputtering method. At this time, the first electrode 6 is formed so as to have a desired shape (for example, a shape corresponding to each element formation scheduled region) while being electrically connected to the power supply electrode 3 (FIG. 2C).
- a hole injection layer is uniformly formed along the surface of the substrate 1 from above the first electrode 6 and the feeding electrode 3 based on the reactive sputtering method.
- a metal material such as molybdenum or tungsten is used as a sputtering source (target), and argon gas as a sputtering gas and oxygen gas as a reactive gas are introduced into the chamber.
- argon gas as a sputtering gas and oxygen gas as a reactive gas
- a pixel regulation layer may be provided so as to partially overlap the first electrode 6.
- the pixel regulating layer forming step can be performed by applying and patterning a paste containing an insulating material or the like based on a photoresist method.
- a bank layer forming process is performed.
- the bank material for example, a photosensitive resist material or a resist material containing a fluorine-based or acrylic-based material is prepared.
- the bank layer forming step can be performed based on a photoresist method. That is, the bank material is uniformly applied from above the first electrode 6 along the surface of the substrate 1, and a photoresist is applied thereon in an overlapping manner.
- a mask corresponding to the pattern of the bank layer 7 to be formed is overlaid on the applied photoresist.
- a known halftone mask can be used as the mask.
- the bank layer 7 is patterned in the presence of the opening 13 so that at least a part of each first electrode 6 is exposed from the opening 13.
- the photoresist is exposed through a mask to form a resist pattern.
- Excess bank material and uncured photoresist are washed out with an aqueous or non-aqueous etchant (release agent).
- release agent aqueous or non-aqueous etchant
- the patterning of the bank material is completed.
- the resist residue remaining around the patterned bank material is washed away with pure water.
- the element 13 is provided with the opening 13 (13R, 13G, and 13B exist for each color. In FIG. 2 (d), red corresponding 13R is shown).
- the bank layer 7 having at least a water-repellent surface is completed. As shown in FIG.
- the positions of the openings 13R, 13G, and 13B are arranged in the column (Y) direction for each pixel along the row (X) direction. Adjust so that it is displaced by a certain distance.
- the arrangement position of each opening 13 can be adjusted by adjusting the pattern shape of the mask.
- the bank material shrinks inside the contact hole 5. Therefore, a depression 12 is naturally formed at the top of the bank layer 7 (FIG. 2 (d)).
- the application target substrate 100P which is a manufacturing intermediate of the organic EL display panel 100, is completed.
- the contact angle of the bank layer 7 with respect to the ink scheduled to be discharged into the opening 13 in the organic light emitting layer forming step may be adjusted.
- water repellency may be imparted to at least the surface of the bank layer 7.
- an organic light emitting layer forming step is performed.
- the ink is prepared by mixing the organic material of the light emitting layer material and the solvent in a predetermined ratio.
- This ink is supplied to the inkjet head 30 equipped in the inkjet apparatus system 1000 of FIG.
- ink droplets 8 are applied to each opening 13 from the inkjet head 30 with the row (X) direction as the drawing direction (FIGS. 7A and 7B).
- at least one of the application target substrate 100P and the inkjet head 30 is moved so that the application target substrate 100P and the inkjet head 30 move relative to each other.
- FIG. 8 is a partial perspective view showing a state immediately after ink droplets are applied to the recess 12 ′ and the openings 13R, 13G, and 13B of the application target substrate 100P.
- Each of the ink droplets 8 in the openings 13R, 13G, and 13B is dripped at a high speed from a plurality of nozzles 3030 (nozzle group) of the inkjet head 30 during scanning.
- the organic light emitting layer 9 is formed in the opening 13R as shown in FIG.
- the organic light emitting layer 9 is also formed in the openings 13G and 13B.
- a film such as ITO or IZO is formed on the surface of the organic light emitting layer 9 by a vacuum deposition method. Thereby, the second electrode 10 is formed (FIG. 9B).
- a sealing layer (not shown) is formed on the surface of the second electrode 10 by depositing a material such as SiN (silicon nitride) or SiON (silicon oxynitride) by a vacuum deposition method.
- FIG. 3 is a perspective view showing a main configuration of an inkjet apparatus system 1000 (hereinafter simply referred to as “system 1000”).
- FIG. 4 is a functional block diagram of the system 1000.
- the system 1000 includes a control device (PC) 15, an inkjet table 20, and an inkjet head 30.
- PC control device
- the control device 15 includes a CPU 150, a storage unit 151, a display unit 153, and an input unit 152.
- the storage unit 151 is a large-capacity storage unit such as an HDD as an example.
- the display means 153 is a display as an example.
- the control device 15 is a personal computer (PC) as an example.
- the storage unit 151 stores a control program that the CPU 150 reads in order to drive and control the inkjet table 20. When the system 1000 is driven, the CPU 150 controls each drive of the inkjet table 20 and the inkjet head 30 based on the input instruction input by the operator through the input unit 152 and the control program stored in the storage unit 151.
- a droplet observation device for confirming the state of ink ejected from the inkjet head 30 may be connected to the system 1000 in a controllable manner to the CPU 150.
- the inkjet table 20 is a gantry work table as an example.
- a gantry section (moving mount) 210 horizontally mounted on the base 200 has a structure capable of reciprocating along a pair of guide shafts 203A and 203B (FIG. 3).
- the inkjet table 20 includes a base 200 having a rectangular main surface, four stands 201A, 201B, 202A, 202B, guide shafts 203A, 203B, linear motors 204, 205, and a gantry section. 210, the inkjet head 30, and the like.
- the stands 201A, 201B, 202A, 202B are columnar bodies, and are erected near the four corners of the upper surface in the Z direction of the plate-like base 200.
- the stationary stage ST for placing the substrate to be coated 100P and the ink are ejected in advance and stable before the wet process is performed.
- An ink pan (dish-like container) 60 used for converting the ink pan is provided (FIG. 3).
- the guide shaft 203A (203B) is pivotally supported by the stands 201A and 201B (202A and 202B) on both sides extending in the longitudinal (X) direction of the base 200.
- the linear motor 204 (205) is inserted through the guide shaft 203A (203B).
- the gantry unit 210 is mounted on the linear motors 204 and 205 so as to cross the short side (Y) direction of the base 200. With this configuration, when the system 1000 is driven, when the pair of linear motors 204 and 205 are driven at the same speed in the same direction, the gantry unit 210 slides precisely along the longitudinal (X) direction of the guide shafts 203A and 203B ( FIG. 3).
- the gantry unit 210 has a guide groove 211 along the longitudinal (Y) direction. Inside the guide groove 211, a fine rack (not shown) is formed along the longitudinal (Y) direction.
- the gantry unit 210 is provided with a moving body (carriage) 220 which is an L-shaped base.
- the moving body 220 is provided with a servo motor (moving body motor) 221, and a gear (not shown) is disposed at the tip of the motor shaft.
- the gear meshes with the rack of the guide groove 211.
- Reference numeral 212 in FIG. 3 is a guide groove for sliding the moving body 220 stably.
- the moving body 220 is equipped with the inkjet head 30 as shown in FIG.
- linear motors 204 and 205 and the servo motor 221 are connected to a control unit 206 for directly controlling and driving them individually as shown in FIG.
- the control unit 206 is connected to the CPU 150 in the control device 15.
- the linear motors 204 and 205 and the servo motor 221 are merely examples of mechanisms for moving the gantry unit 210 and the moving body 220, respectively, and these configurations are not essential.
- at least one of the gantry unit and the moving body may be moved using a timing belt mechanism or a ball screw mechanism.
- the inkjet head 30 includes a head unit 301 shown in FIG. 3, a main body unit 302, and a control unit 300 shown in FIG.
- the inkjet head 30 employs a piezo method.
- the main body 302 incorporates a servo motor 303 (FIG. 4) inside the casing.
- the housing is fixed to the moving body 220.
- the head portion 301 has a rectangular parallelepiped external shape, and is suspended from the tip of the motor shaft of the servo motor 303 in the vicinity of the center portion of the upper surface (FIG. 3). As a result, when the motor shaft of the servo motor 303 rotates, the angle between the head unit 301 and the fixed stage ST changes.
- FIG. 5 is a cross-sectional view showing an internal configuration of the head unit 301.
- FIG. 5A is a cross-sectional view of the head portion 301 along the longitudinal direction.
- FIG. 5B is a cross-sectional view taken along the line W 0 -W 0 ′ of FIG. 5A (cross-sectional view of the head portion 301 in the short direction).
- FIG. 5A only the five ink ejection mechanism portions 304a to 304e adjacent to each other in the head portion 301 are partially shown, but all the ink ejection mechanism portions existing in the head portion 301 have the same configuration.
- the configuration of the head unit 301 will be described by exemplifying the configuration shown in FIG.
- the head unit 301 includes a plurality of ink ejection mechanism units 304a to 304e.
- the ink ejection mechanism portions 304a to 304e are configured to include a frame portion 3050, a diaphragm 3040, and piezoelectric elements 3010 (3010a to 3010e).
- a plurality of ink discharge mechanism portions 304a to 304e are formed in a row along the longitudinal direction of the head portion 301 at a constant interval (one hundred to several thousand as an example, 128 as a specific example) (FIG. 5). (A)).
- the frame unit 3050 includes a liquid chamber 3020 (3020a to 3020e) and a nozzle 3030 (3030a to 3030e) inside.
- the frame portion 3050 is made of, for example, a metal material such as SUS or a ceramic material.
- the liquid chamber 3020 (3020a to 3020e) and the nozzle 3030 (3030a to 3030e) are integrally formed inside the frame portion 3050 by machining, etching, or electric discharge machining.
- the liquid chambers 3020 (3020a to 3020e) are ink storage spaces immediately before being ejected from the nozzles 3030 (3030a to 3030e).
- the volume of the liquid chamber 3020 (3020a to 3020e) is reduced when the piezoelectric element 3010 (3010a to 3010e) and the vibration plate 3040 are deformed to the liquid chamber 3020 (3020a to 3020e) side, and the piezoelectric element 3010 (3010a to 3010e) and the vibration are reduced.
- the shape of the plate 3040 is restored, it is restored.
- Each of the liquid chambers 3020a to 3020e is partitioned by a partition wall 3070 (FIGS. 5A and 5B).
- An infusion tube L 1 is connected to the ink flow path 3060 from the outside of the head portion 301 (FIG. 3).
- ink is supplied to the ink flow path 3060 from an external ink tank through the infusion tube L 1 .
- the liquid chambers 3020a to 3020e are filled with ink.
- the nozzles 3030 (3030a to 3030e) are ink ejection means.
- the nozzles 3030a to 3030e communicate with the liquid chambers 3020a to 3020e on the bottom surface of the frame portion 3050, and are formed in rows at a constant pitch.
- the pitch between the nozzles 3030a to 3030e in the head unit 301 is fixed, but the nozzle pitch relative to the coating target substrate 100P can be adjusted by adjusting the rotation angle of the motor shaft of the servo motor 303.
- the CPU 150 controls the rotation angle of the motor shaft of the servo motor 303, so that any nozzle group including a plurality of adjacent nozzles 3030 is positioned above the predetermined opening 13 on the application target substrate 100P. It is controlled to be scannable.
- the diaphragm 3040 is disposed so as to cover the upper part of each of the liquid chambers 3020a to 3020e. Above the diaphragm 3040, the piezoelectric elements 3010a to 3010e are stacked.
- the diaphragm 3040 is formed of a flexible thin plate made of stainless steel or nickel. Accordingly, the diaphragm 3040 is deformed along with the deformation of the piezoelectric elements 3010a to 3010e.
- the piezoelectric element 3010 (3010a to 3010e) is a piezo element.
- the piezoelectric element 3010d includes an element body 3012d and a pair of electrodes 3011d and 3013 that sandwich the element body 3012d (FIG. 5B).
- the element body 3012d is a plate-like body made of, for example, lead zirconate titanate.
- the drive circuit 4 includes a drive circuit that can individually drive each of the piezoelectric elements 3010 in the head unit 301.
- the control unit 300 illustrated in FIG. When the system 1000 is driven, a waveform voltage is applied to a specific piezoelectric element 3010 with a driving frequency of, for example, several hundred Hz.
- the diaphragm 3040 vibrates with the deformation of the piezoelectric element 3010 due to this voltage application, and the volume of the liquid chamber 3020 is reduced or restored.
- an applied voltage waveform of the piezoelectric element 3010 for example, a rectangular pulse voltage waveform can be used.
- the piezoelectric element 3010 is deformed in accordance with the rise of the pulse, and the diaphragm 3040 is deformed accordingly, and the volume of the liquid chamber 3020 is reduced.
- the shapes of the piezoelectric element 3010 and the diaphragm 3040 are restored in accordance with the fall of the pulse, and the volume of the liquid chamber 3020 is restored.
- Ink is ejected from the nozzle 3030 when the volume of the liquid chamber 3020 is decreased.
- the applied voltage waveform of the piezoelectric element 3010 is not limited to a rectangle, and may be a waveform having a stepped shape or a partially curved shape.
- the voltage applied to each piezoelectric element 3010 has any waveform of the piezoelectric element 3010 at a predetermined timing in consideration of the scanning speed of the head unit 301 with respect to the application target substrate 100P based on the control program. Adjustment is performed by instructing the controller 300 whether to apply a voltage. As an example of the initial setting, the CPU 150 performs control so that all the droplet volumes (volumes of droplets ejected from the nozzles) of each nozzle 3030 are aligned based on the control program.
- the arrangement of the nozzles 3030a to 3030e in the head unit 301 is not limited to one line, and may be arranged in a plurality of lines, or in a plurality of lines and in a staggered pattern.
- the head portion 301 provided in the inkjet head 30 is not limited to one, and may include two or more head portions 301.
- two head portions 301 can be arranged side by side and fixed to the shaft tip of the servo motor 303 of the main body portion 302.
- the nozzle pitch with respect to the application target substrate 100P is adjusted using a plurality of head portions 301 arranged in parallel, the actual ink pitch (landing ink pitch) is inclined with respect to the application target substrate 100P. Since each nozzle pitch of each head portion 301 is taken into consideration, the nozzle pitch on the coating target substrate 100P can be set more finely than when one head portion 301 is used.
- the number of ink flow paths 3060 provided inside the head portion 301 is not limited to one, and a plurality of ink flow paths 3060 may be formed. In this case, several ink ejection mechanism units may be divided into groups, and inks having different colors and components may be supplied from the outside through individual paths for each group. (Implementation of the organic light emitting layer formation process) A procedure for performing an organic light emitting layer forming process using the system 1000 will be described. [System 1000 settings] When the wet process is first executed using the system 1000, the operator operates the input unit 152 and performs the following settings for the system 1000, for example.
- the operator inputs the arrangement information of the openings 13 on the application target substrate 100P to the control device 15.
- the array information includes information such as the size of the openings 13 in the matrix (XY) direction, the pitch between the openings 13 in the matrix direction (XY), the number of the openings 13 in the matrix (XY) direction, etc. Contains information about group shifts.
- the CPU 150 can grasp the position of each opening 13 on the coating target substrate 100P and know which nozzle 3030 of the head portion 301 corresponds to which opening 13. Based on the arrangement information, according to the control program, the CPU 150 can set the nozzle 3030 for ejecting ink droplets and the nozzle 3030 for not ejecting ink in each row in the ink application to each opening group in the first row and the second row. Become.
- the number of nozzles for switching the ejection / non-ejection state can be appropriately adjusted.
- the openings 13 should be arranged within a range of deviation of 10% to 50% of the pitch of the openings 13 in the column (Y) direction.
- the number of nozzles to be switched during scanning can be adjusted according to the position of each opening 13.
- the nozzle groups are switched. It is possible to reduce the number of nozzles to be switched. Even in this case, the amount of deviation in the arrangement of the opening groups between the first row and the second row can be set to at least the landing pitch and 50% or less of the pitch of the openings 13 in the row (Y) direction. desirable.
- the CPU 150 rotates the motor shaft of the servo motor 303 at a constant angle via the control unit 300 to set the angle of the head unit 301 with respect to the fixed stage ST.
- FIG. 6 illustrates an arrangement relationship between the inkjet head 30 (head portion 301) and the application target substrate 100P when performing ink application.
- the longitudinal direction of the head portion 301 is inclined so as to intersect the column (Y) direction of the application target substrate 100P at a certain angle, and the head portion 301 is scanned in the row (X) direction to scan the ink liquid.
- the case where a drop is drawn is shown.
- the actual pitch (landing pitch) of the ink droplets with respect to each opening 13 can be adjusted narrowly.
- Such adjustment of the actual pitch (landing pitch) of the ink droplets can be appropriately performed in accordance with conditions such as the standard and size of the application target substrate 100P and the opening 13.
- timing for adjusting the angle of the head unit 301 with respect to the application target substrate 100P may be before the ink is actually applied to the application target substrate 100P.
- the operator stores the ink whose composition is adjusted in the ink tank and starts the pump. Through the infusion tube L 1 , the ink is tightly filled into the liquid chamber 3020 in the head portion 301.
- the operator operates the control device 15 to move the head unit 301 onto the ink pan 60.
- the operator applies a voltage to each piezoelectric element 3010 via the control unit 300 based on the control program in the CPU 150 to cause ink to be ejected from each nozzle 3030 to the ink pan 60.
- the state of ink ejected from the nozzle 3030 can be photographed with a CCD camera and displayed on the display means 153 in real time by the CPU 150.
- the operator confirms whether or not the ink is correctly ejected from all the nozzles on the display means 153, and continues the ejection until the ink ejection is stabilized.
- the operator sets the applied voltage value of each nozzle 3030 to a predetermined voltage value (initial voltage value) so that the droplet volume of ink ejected from the nozzle 3030 is constant based on a control program in the CPU 150. Let it be set.
- Application instruction for coating process After completing the preparation of the system 1000, the operator instructs the system 1000 to perform the application process.
- the CPU 150 drives and controls the linear motors 204 and 205 and the servo motor 221 via the control unit 206 based on the control program (FIG. 4). As a result, the CPU 150 scans the head portion 301 along the row (X) direction with respect to the application target substrate 100P as shown in FIG.
- the CPU 150 applies a pulse voltage to the specific nozzle 3030 in the head unit 301 during scanning at a predetermined timing, and intermittently ejects ink droplets to the openings 13.
- the CPU 150 scans the head unit 301 and ejects a predetermined amount of ink to all the openings 13 that should eject the same color ink.
- FIG. 10A is an enlarged front view which shows the mode of the application
- FIG. 10A the mode when using the nozzle groups (first nozzle group) of numbers n 4 to n 9 is referred to as “A”.
- L R ”, “L G ”, and “L B ” are referred to as an arrangement in the column (Y) direction of the aperture groups of the R, G, and B colors in the same order (hereinafter referred to as “column (Y) direction line”). ).
- column (Y) direction line the nozzle numbers show only a part of the portion shown in FIG.
- a black circle in FIG. 10A indicates a nozzle number for ejecting the ink droplet 8.
- the head portion 301 is scanned in the row (X) direction, and as shown in FIG. 7A, the position of each opening 13R crossed by the line W 1 -W 1 ′ (FIG. 10A).
- the CPU 150 uses the mode “A” nozzle 3030 based on the control program. That is, as shown in FIGS. 7A and 10A, nozzles 3030 with numbers n 4 to n 9 and n 14 to n 19 are assigned to the nozzles 3030 to be driven.
- the CPU 150 drives the nozzles 3030 with numbers n 4 to n 9 and n 14 to n 19 to apply a pulse voltage to discharge red (R) ink droplets 8 inside the opening 13R.
- the CPU 150 does not drive the other nozzles 3030 shown in FIG. Specifically, the nozzles 3030 of n 4 to n 9 and n 14 to n 19 are controlled to be ON, and the nozzles 3030 of n 1 to n 3 and n 10 to n 13 are controlled to be OFF.
- the CPU 150 uses the nozzle 3030 in mode “B” based on the control program. That is, as shown in FIGS. 7B and 10B, the nozzles 3030 with numbers n 5 to n 10 and n 15 to n 20 are assigned to the nozzles 3030 to be driven. The CPU 150 drives the nozzles 3030 with the numbers n 5 to n 10 and n 15 to n 20 to apply a pulse voltage to discharge the ink droplet 8 into the opening 13R.
- the CPU 150 does not drive the other nozzles 3030 shown in FIG. Specifically, the nozzles n 5 to n 10 and n 15 to n 20 are turned on, and the nozzles 3030 of n 1 to n 4 and n 11 to n 14 are turned off.
- each organic light emitting layer 9 is formed by drying and removing the solvent of the ink droplets 8 (FIG. 8) discharged to all the openings 13 on the application target substrate 100P (FIG. 9A).
- the usage state of the nozzles 3030 with numbers n 1 , n 4 , n 10 , n 14 , and n 20 is switched during scanning of the head unit 301. For this reason, when any of the nozzles 3030 of the numbers n 1 , n 4 , n 10 , n 14 , and n 20 has an error in the ink droplet volume, the mode “A” and the mode “B” In this case, the ink droplet volume error can be dispersed, and the same error amount of droplet volume ink is continuously ejected to the openings 13 of the same color arranged in the row (X) direction. Can be prevented.
- the organic light emitting layer 9 is formed by solvent drying.
- the openings 13 aligned in the row (X) direction correspond.
- the nozzle group of the nozzles 3030 to be used is switched for each row (Y) direction line. Accordingly, in the head unit 301, even when the nozzle 3030 having an error in the ink droplet volume exists, the nozzle 3030 having the error in the ink droplet volume is switched when the nozzle group is switched. Can reduce the continuous ejection of ink with the same error amount of the droplet volume corresponding to the openings 13 arranged in the row (X) direction. Thereby, the error of the ink droplet volume of the nozzle 3030 can be distributed so as to be different for each line (Y) direction line.
- the organic light emitting device having the same film thickness error is obtained by using the nozzle 3030 that has caused an error in the ink droplet volume. It is reduced that the layer 9 is continuously formed side by side on a certain line in the row (X) direction. As a result, the occurrence of streak unevenness during driving is suppressed, and good image display performance can be expected.
- ⁇ Effect confirmation test> A test for confirming the effect of the first embodiment by simulation was performed. This test content and result consideration will be described with reference to FIGS.
- an organic EL display panel (conventional example) in which the opening group in the first row and the opening group in the second row are arranged without being shifted from each other, and an organic EL display in which the nozzles of the inkjet head are arranged to be shifted.
- Evaluation of panel application example 1), organic EL display panel shifted by 2 nozzles of inkjet head (application example 2), and organic EL display panel shifted by 3 nozzles of inkjet head (application example 3) Targeted.
- Each panel has 100 pixels in the column (Y) direction and 200 pixels in the row (X) direction.
- the ink jet head was set to correspond to 10 nozzles per opening.
- the error variation of the ink droplet volume of all the nozzles (1500 in total) arranged in the ink jet head was set in a range of ⁇ 10%, and the average value was set as the reference value 1.
- the variation (relative deviation amount) of the droplet volume of each nozzle was normalized within the range of the ratio (0.91 to 1.08) with respect to the reference value 1.00, and was normally distributed.
- the ink jet head was used to apply ink to each panel. [Consideration of results] Next, the simulation results are considered.
- 13A to 13D show the result of schematically mapping the stripe unevenness generated in the range of each relative deviation amount on the panels of the conventional example and the application examples 1 to 3 in the same order.
- FIG. 14 shows the result of comparing the ink volume variation (numerical value indicating the degree of streak irregularity) between all 100 pixels in the column direction for each panel of the conventional example and each of the application examples 1 to 3.
- the average value of the ink discharge amount for each opening for 200 pixels in the same row direction is the ink volume of each pixel in the column direction, and the average value of the ink volumes of all 100 pixels in the column direction is A, 3 ⁇ ( ⁇ is the standard deviation) is B.
- B / A (%) can be shown as “ink volume variation”.
- the larger the ink volume variation (%) the larger the variation in the error of the ink discharge amount in the opening group in the column direction, that is, the worse the degree of stripe unevenness.
- the ink volume variation was the highest in the conventional example.
- the ink is applied by the nozzle group assigned to each of the openings arranged in the row direction, droplets are applied only to the openings at a specific position between the openings in the column direction. It is conceivable that ink containing a volume error is ejected. For this reason, when viewed from the opening group in the column direction, it is considered that the error variation of the ink droplet volume in each opening tends to be large.
- Embodiments 2 to 6 of the present invention relating to variations in the arrangement pattern of the openings will be described with reference to FIGS.
- the notation method of symbols in each figure is the same as that in FIG.
- “B”, “C”, and “D” are shifted in the same order by one nozzle, two nozzles, and three nozzles in the row (Y) direction with respect to the reference mode “A”.
- Each mode in which each nozzle group is switched to apply ink droplets is shown.
- the numbers on the lines in the figure indicate the number of nozzles 3030 displaced.
- FIG. 10B shows an arrangement pattern of openings according to the second embodiment.
- the openings 13R, 13G, and 13B are arranged and adjusted in a staggered manner.
- the modes “A” and “B” are changed to the column (Y) direction lines L R1 , L G1 , L B1 corresponding to each subpixel during the scanning of the head unit 301. ... Switch every time.
- FIG. 11A shows an arrangement pattern of openings according to the third embodiment.
- Embodiment 3 shown in FIG. 11A on the coating target substrate 100P 2 , two pixel units that are adjacent to each other in the row (X) direction are set as a set, and an opening portion is included in the set of sets.
- the organic light emitting layer forming step is performed by switching the two modes “A” and “B” for every two adjacent pixels based on a stepwise discharge process.
- the same effect as in the first embodiment can be expected.
- the position of the head unit 301 can be changed little by switching the mode during scanning, and ink can be ejected stably. There are advantages you can do.
- FIG. 11B shows an arrangement pattern of openings according to the fourth embodiment.
- Figure 11 (b) the fourth embodiment shown in, in the application target substrate 100P 3, gradually increased in three steps a nozzle shift number in pixels adjacent in the row (X) direction, then the nozzle shift number
- the apertures 13R, 13G, and 13B are arranged and adjusted as a stepped pattern that returns to 0 at a stroke and repeats the change in the number of nozzle shifts thereafter.
- the organic light emitting layer forming step is performed by sequentially switching the four modes “A” to “D” for each pixel based on a stepwise discharge process.
- FIG. 12A shows an arrangement pattern of openings according to the fifth embodiment.
- Figure 12 a fifth embodiment shown in (a), on the application target substrate 100P 4, in pixels adjacent in the row direction (X), randomly opening 13R, 13G, an example in which shifted position of 13B is there.
- the number of nozzle deviations is dispersed within a range of 3 or less.
- the organic light emitting layer forming step is performed by randomly switching the four modes “A” to “D” for each pixel based on a random ejection process.
- the number of nozzle deviations may be more than three.
- the range of the displacement amount of the arrangement positions of the openings 13R, 13G, and 13B is a range that is at least the landing pitch and 50% or less of the opening pitch in the row (Y) direction. Further, the method of shifting the openings arranged in the row (X) direction is not limited to pixel units, and can be performed in subpixel units.
- FIG. 12B shows an arrangement pattern of openings according to the sixth embodiment.
- the number of nozzle deviations is gradually increased to three stages in units of pixels adjacent in the row (X) direction on the application target substrate 100P 5 , and thereafter the number of nozzle deviations is increased.
- the organic light emitting layer forming step is based on a stepwise discharge process, and is performed by sequentially switching the four modes “A”, “B”, “C”, and “D” for each pixel, and then in reverse order, the modes “C”, “B”, and “ Switch “A”.
- FIG. 15 shows each organic EL element 11 (11R, 11G, 11B) of the first pixel Pix 1 formed corresponding to the opening group of the first column in the organic EL display panel 100A according to the seventh embodiment.
- FIG. 16A is a cross-sectional view taken along the arrow line Y 1 -Y 1 ′ around the organic EL element 11R in FIG.
- FIG. 16B is a cross-sectional view taken along arrow Y 2 -Y 2 ′ around the organic EL element 11R ′ in FIG.
- the difference between the organic EL display panel 100A and the organic EL display panel 100 is that in each organic EL element 11, 11 ′, at least one end side of both ends of the peripheral edge along the row (Y) direction of each opening 13R, 13G, 13B.
- the pixel restricting layer 14 (in FIG. 15, the periphery facing the light emitting regions 16A and 16B is indicated by a two-dot chain line) is disposed between the first electrode 2 and the organic light emitting layer 9. (FIG. 15, FIG. 16 (a), FIG. 16 (b)).
- the pixel regulation layer 14 is made of an organic or inorganic insulating material.
- the region having the pixel regulating layer 14 is a non-light emitting region, and the region having no pixel regulating layer 14 is the light emitting regions 16 A and 16 B in the same order.
- the pixel regulating layer 14 is provided corresponding to a position below the paper surface of the organic EL element 11 and above the paper surface of the organic EL element 11 ′ (FIG. 15).
- the light emitting regions (second light emitting regions) 16B of the second pixels Pix 2 are aligned at the same position in the column (Y) direction.
- the light emitting regions of all the pixels are aligned along the row (X) direction, like the light emitting regions of the first pixel Pix 1 and the second pixel Pix 2 .
- each of the openings 13R, 13G, and 13B has an elliptical periphery having the longitudinal direction in the row (Y) direction. Accordingly, the peripheral shape of the pixel regulating layer 14 adjacent to the light emitting regions 16A and 16B is also formed to be substantially the same shape as the peripheral shape of the openings 13R, 13G, and 13B. This is because the shapes of the light emitting regions 16A and 16B in the entire organic EL display panel 100A are made uniform to obtain good image display performance.
- the same effect as in the first embodiment can be expected. Further, even if the aperture groups of the first pixel Pix 1 and the second pixel Pix 2 are shifted from each other in the column (Y) direction, the positions of the light emitting regions 16A and 16B are held in an aligned state without being shifted. (FIG. 15). Therefore, it is possible to expect an excellent image display performance with little luminance unevenness by the organic EL elements 11 and 11 ′ having the light emitting regions 16A and 16B aligned in the matrix (XY) direction.
- the pixel regulating layer 14 is provided only on one end of the longitudinal (Y) direction of each organic EL element 11, 11 ′, but the longitudinal length of each organic EL element 11, 11 ′ ( The pixel restriction layers 14 may be provided at both ends in the Y) direction. In this case, however, care should be taken so that the sizes of the light emitting regions 16A and 16B along the longitudinal (Y) direction do not become excessively small.
- each opening 13 is formed based on a photoresist method.
- a paste containing the above-mentioned insulating organic material or insulating inorganic material is applied to a predetermined position and patterned. Thereby, the pixel regulating layer 14 can be disposed.
- the size of the opening 13 is reduced, the required luminance for causing the organic EL elements 11 and 11 'to emit light is increased accordingly.
- the element lifetime is shortened. Therefore, when setting the size of the opening 13, it is important to consider the balance between the element lifetime and the required luminance.
- the aperture ratio which is an effective light emitting area in a pixel
- the luminance per effective light emitting area is required to be twice.
- the luminance acceleration coefficient generally about 1.6 to 1.8
- it can be estimated that the element lifetime is about 29 to 33%.
- the lifetime of the element is in an acceptable range due to the improvement of the lifetime characteristics of the material used for the light emitting layer, that is, it is also acceptable to halve the area of the opening 13.
- the length of the pixel regulating layer 14 in the Y direction should be less than 70% of the length of each opening 13 in the column (Y) direction. Can do. In particular, a range of less than 40% of the length in the column (Y) direction of each opening 13 is preferable from the viewpoint of securing necessary luminance in the light emitting regions 16A and 16B.
- the lengths of the light emitting regions 16A and 16B in the openings 13 can be at least 30% or more of the length of the openings 13 along the column (Y) direction. In addition, it is preferable that the lengths of the light emitting regions 16A and 16B in the openings 13 be 60% or more of the length of the openings 13 along the column (Y) direction.
- FIG. 17 shows each organic EL element 11 (11R, 11G, 11B) of the first pixel Pix 1 formed corresponding to the opening group of the first column in the organic EL display panel 100B according to the eighth embodiment.
- FIG. 18A is a cross-sectional view taken along the arrow line Y 1 -Y 1 ′ around the organic EL element 11R in FIG.
- FIG. 17B is a Y 2 -Y 2 ′ arrow cross-sectional view around the organic EL element 11R ′ in FIG.
- the organic EL display panel 100B is different from the organic EL display panel 100 in that a sealing layer 17 is formed above the second electrode 10 and a CF substrate 18 is disposed above the sealing layer 17 (FIG. 18 (a), FIG. 18 (b)).
- the CF substrate 18 includes a light-transmitting region 19a disposed corresponding to the position of the organic EL element 11, and a light-shielding black matrix 19b disposed at a position other than the light-transmitting region 19a (FIG. 17). .
- each organic EL element 11 and 11 ' is surrounded by the black matrix 19b.
- the width Q 2 along the Y direction of the translucent region 19 a is set to be narrower than the length of each opening 13 in the column (Y) direction.
- the translucent regions 19a are provided in alignment on the CF substrate 18 at positions along the row (X) direction (FIGS. 18A and 18B).
- the translucent region 19a is covered with the translucent region 19a.
- the organic EL elements 11 and 11 ′ are covered with a translucent region 19 a in the same order in the lower area and the upper area.
- the peripheral shape of the translucent region 19a adjacent to the light emitting regions 16A, 16B is also formed to be substantially the same shape as the peripheral shape of the openings 13R, 13G, 13B.
- the specific value of the Y-direction length of the black matrix 19b that overlaps the openings 13R, 13G, and 13B is, for example, the same value as the Y-direction length of the pixel regulation layer 14 of the seventh embodiment. That is, the range is less than 70% of the length of each opening 13 in the row (Y) direction. In particular, a range of less than 40% of the length in the column (Y) direction of each opening 13 is suitable from the viewpoint of ensuring the necessary luminance.
- the lengths of the light emitting regions 16A and 16B in the openings 13 can be at least 30% or more of the length of the openings 13 along the row (Y) direction. Further, as a preferable value, the length of each of the light emitting regions 16A and 16B in the opening 13 can be 60% or more of the length of the opening 13 along the column (Y) direction.
- column (Y) has a width Q 2, and the same shape of the light emitting region 16A, 16B is , Arranged in the row (X) direction.
- the light emitting regions 16A and 16B of the organic EL elements 11 and 11 ′ are regulated by the light transmissive regions 19a and the black matrix 19b, and are aligned in the row (X) direction. The Therefore, substantially the same effect as that of the organic EL display panel 100A of the seventh embodiment can be expected.
- the organic EL display panel 100B can be configured by preparing a CF substrate 18 separately from the substrate 1 side. Therefore, for example, there is an advantage that it can be realized relatively easily using the already manufactured organic EL display panel 100. ⁇ Other matters>
- each position of the inkjet head 30 is fixed, the application target substrate is placed on an XY table, and the application target substrate is moved relative to the inkjet head 30 to apply the ink.
- the present invention can be used as a display device for a mobile phone, a display device such as a television, an organic EL device used for various light sources, an organic EL display panel using the organic EL device, and a manufacturing method thereof.
- a display device such as a television
- an organic EL device used for various light sources an organic EL display panel using the organic EL device
- a manufacturing method thereof it is possible to expect an organic EL element or an organic EL display panel that can exhibit good light emission characteristics or image display performance with little display unevenness.
Abstract
Description
本発明の一態様における有機EL表示パネルの製造方法は、基板の上方に、複数の第1電極を前記基板の表面の行列方向に沿って形成する第1電極形成工程と、前記基板の上方に、前記各第1電極を個別に露出する複数の開口部を存在させてバンク層を形成するバンク層形成工程と、複数のノズルを有するインクジェットヘッドと前記基板の少なくともいずれかを移動させることで、前記インクジェットヘッドと前記基板とを行方向に相対移動させ、各ノズルがいずれかの前記開口部と対向する際に、前記各ノズルより前記対向する前記開口部の内部にインク液滴を吐出し、前記インク液滴を乾燥させて有機発光層を形成する有機発光層形成工程と、前記各有機発光層の上方に第2電極を形成する第2電極形成工程とを有し、前記バンク層形成工程では、前記複数の開口部のうち、第1列の開口部群と第2列の開口部群とが、列方向に沿って前記開口部のピッチの半分以下の距離差で互いにずれて存在するように前記バンク層を形成し、前記複数のノズルには第1ノズル群と第2ノズル群とが含まれ、前記有機発光層形成工程では、前記第1列の開口部群に含まれる前記各開口部上を前記インクジェットヘッドが移動する際には前記第1ノズル群より前記インク液滴を吐出し、前記第2列の開口部群に含まれる前記各開口部上を前記インクジェットヘッドが移動する際には前記第2ノズル群より前記インク液滴を吐出するように、前記第1ノズル群と前記第2ノズル群とを切り換えて使用するものとする。
<実施の形態1>
(有機EL表示パネル100の構成)
図1(a)は、本発明の実施の形態1に係る有機EL表示パネル100の構成を模式的に示す断面図である。図1(a)では有機EL表示パネル100で列(Y)方向に隣接して形成された、同色(赤色)の3つの有機EL素子11Rの構成を示す。
[基板1]
基板1は有機EL表示パネル100のベース部分である。基板1は、無アルカリガラス、ソーダガラス、無蛍光ガラス、燐酸系ガラス、硼酸系ガラス、石英、アクリル系樹脂、スチレン系樹脂、ポリカーボネート系樹脂、エポキシ系樹脂、ポリエチレン、ポリエステル、シリコーン系樹脂、又はアルミナ等の絶縁性材料のいずれかを用いて形成される。
[TFT層2]
TFT層2は、有機EL表示パネル100の全ての有機EL素子11をアクティブマトリクス方式で駆動するために設けられる。TFT層2は、導電材料と半導体材料と絶縁性材料を用いて形成される。
[平坦化膜4]
平坦化膜4は、絶縁性に優れる有機材料からなる層間絶縁膜であって、TFT層2の表面を平坦に被覆するために設けられる。平坦化膜4には、列(Y)方向で隣接する各開口部13同士の間の領域を厚み方向(Z方向)に貫通させることで、円形の孔(コンタクトホール5)が存在している(図1(a))。コンタクトホール5の内部において、TFT層が給電電極3を介して第1電極6と電気的に接続される。
[第1電極6]
第1電極6は陽極であり、第2電極10と一対の電極対を構成する。第1電極6はAg(銀)の他、例えばAPC(銀、パラジウム、銅の合金)、ARA(銀、ルビジウム、金の合金)、MoCr(モリブデンとクロムの合金)、NiCr(ニッケルとクロムの合金)、等の導電性材料を用いて形成される。有機EL素子11をトップエミッション型とする場合、第1電極6は光反射性材料を用いて形成する。或いは有機EL素子11をボトムエミッション型とする場合、第1電極6は光透過性材料を用いて形成する。第1電極6は基板1の上方において、各開口部13(各素子形成予定領域)の位置に合わせ、行列(XY)方向に複数にわたり形成される。
[バンク層7]
バンク層7は、主として有機EL表示パネル100の各素子形成予定領域を区画するために設けられる。バンク層7は、絶縁性の有機材料(例えばアクリル系樹脂、ポリイミド系樹脂、ノボラック型フェノール樹脂等)からなり、少なくとも表面において撥水性を有する。バンク層7のパターンは適宜調節可能であるが、有機EL表示パネル100では井桁状(ピクセルバンク状)とする。すなわち、行列(XY)方向に沿って、各素子形成予定領域を個別に区画する開口部13を複数有する形状に形成される。バンク層7は、全体的にはXY平面またはYZ平面に沿った断面が台形の断面形状を有している。尚、コンタクトホール5に対応するバンク層7の位置には、バンク材料がコンタクトホール5の内部に落ち込み、シュリンク(収縮)してなる窪み部12が存在する(図1(a))。
[有機発光層9]
有機発光層9は、有機EL素子11における発光部分である。有機発光層9は、開口部13R、13G、13B内の第1電極6の上方において、同順に赤色(R)、緑色(G)、青色(B)で発光するように形成される。有機発光層9は所定の有機材料を含むように構成されているが、その材料には公知材料を利用できる。たとえば特開平5-163488号公報に記載のオキシノイド化合物、ペリレン化合物、クマリン化合物、アザクマリン化合物、オキサゾール化合物、オキサジアゾール化合物、ペリノン化合物、ピロロピロール化合物、ナフタレン化合物、アントラセン化合物、フルオレン化合物、フルオランテン化合物、テトラセン化合物、ピレン化合物、コロネン化合物、キノロン化合物及びアザキノロン化合物、ピラゾリン誘導体及びピラゾロン誘導体、ローダミン化合物、クリセン化合物、フェナントレン化合物、シクロペンタジエン化合物、スチルベン化合物、ジフェニルキノン化合物、スチリル化合物、ブタジエン化合物、ジシアノメチレンピラン化合物、ジシアノメチレンチオピラン化合物、フルオレセイン化合物、ピリリウム化合物、チアピリリウム化合物、セレナピリリウム化合物、テルロピリリウム化合物、芳香族アルダジエン化合物、オリゴフェニレン化合物、チオキサンテン化合物、アンスラセン化合物、シアニン化合物、アクリジン化合物、8-ヒドロキシキノリン化合物の金属錯体、2、2´-ビピリジン化合物の金属錯体、シッフ塩とIII族金属との錯体、オキシン金属錯体、希土類錯体等の蛍光物質等を挙げることができる。
[第2電極10]
第2電極10は陰極である。第2電極10は、例えばITO、IZO(酸化インジウム亜鉛)等の導電性材料を用いて構成される。有機EL素子11をトップエミッション型にする場合は、光透過性材料を用いる。或いは有機EL素子11をボトムエミッション型にする場合は、光反射性材料を用いる。
[その他の構成]
図1には図示しないが、第2電極10の上方には公知の封止層が設けられる。封止層は、例えばSiN(窒化シリコン)、SiON(酸窒化シリコン)等の材料で形成され、有機発光層9が水分や空気等に触れて劣化するのを抑制する。有機EL素子11をトップエミッション型にする場合、封止層は光透過性材料で構成する。
(有機EL表示パネル100で奏される効果)
有機EL表示パネル100では図1(b)に示したように、行(X)方向に隣接するピクセル毎に、各ピクセル内の開口部13R、13G、13Bの列(Y)方向に沿った位置が、互いに一定間隔でずれて配置されている。
(有機EL表示パネル100の全体的な製造方法)
有機EL表示パネル100の全体的な製造方法を図2、図6~図9等を用いて例示する。その後、有機発光層形成工程について詳細を説明する。
(有機発光層形成工程の詳細)
次に有機発光層形成工程について詳細を説明する。まず、有機発光層形成工程で使用するインクジェット装置システム1000について具体的に説明し、その後に有機発光層形成工程の実施内容を説明する。
(インクジェット装置システム1000)
図3は、インクジェット装置システム1000(以下、単に「システム1000」と称する。)の主要構成を示す斜視図である。図4は、システム1000の機能ブロック図である。
インクジェットテーブル20は一例としてガントリー式の作業テーブルである。全体構造として、基台200の上に横架されたガントリー部(移動架台)210が一対のガイドシャフト203A、203Bに沿って往復移動可能とされた構造を有する(図3)。
(インクジェットヘッド30)
インクジェットヘッド30は、図3に示すヘッド部301と、本体部302と、図4に示す制御部300とを有して構成される。インクジェットヘッド30はピエゾ方式を採用している。
(有機発光層形成工程の実施内容)
システム1000を用いて有機発光層形成工程を行う場合の手順を説明する。
[システム1000の設定]
システム1000を用いて最初にウェットプロセスを実行する場合、オペレータは入力手段152を操作し、システム1000に対して例えば以下の設定を行う。
b)塗布対象基板100P上の開口部群のずれを、行(X)方向に沿って周期的或いはランダム的のいずれで設定するかの情報(列(Y)方向で切り換えるノズル数の情報を含む)
ここで、行(X)方向へのヘッド部301の走査において、吐出/不吐出状態を切り換えるノズルの数は適宜調整が可能である。目安の一つとして、通常の有機発光層形成工程を考慮すると、列(Y)方向の各開口部13のピッチの10%以上50%以下のずれ量の範囲で各開口部13を配置することで、各開口部13の位置に合わせて走査時に切り換えるノズル数を調節できる。
[システム1000の準備]
システム1000の設定が完了したら、オペレータは固定ステージSTの上に塗布対象基板100Pを載置する。この際、オペレータはインクジェットテーブル20に対する塗布対象基板のアライメントを的確に行う。
[塗布工程の実行指示]
システム1000の準備を完了した後、オペレータはシステム1000に塗布工程を実行するように指示する。
[有機発光層形成工程]
システム1000を用いた有機発光層形成工程の実施の様子を図6~図8、図9(a)、図10(a)を用いて具体的に説明する。図7(a)、図7(b)は、同順に図6に示す第1列(W1-W1´線に沿った列)と、第2列(W2-W2´線上に沿った列)とにおける塗布対象基板100Pの断面図を示す。図7(a)、図7(b)はノズル番号n1~n22のノズル3030を制御する場合を例示するが、実際にはヘッド部301の全ノズル3030が制御対象とされる。図10(a)は塗布時の塗布対象基板100Pの様子を示す拡大正面図である。図10(a)では番号n4~n9のノズル群(第1ノズル群)を使用する場合のモードを「A」と称する。また番号n5~n10のノズル群(第2ノズル群)を使用する場合のモードを「B」と称する。「LR」、「LG」、「LB」は、同順にR、G、B各色の開口部群の列(Y)方向の配列(以下、「列(Y)方向ライン」と称する。)である。図10(a)では便宜上、ノズル番号は図6の図示分の一部のみを示す。図10(a)中の黒丸はインク液滴8を吐出するノズル番号を示す。
<効果確認試験>
実施の形態1の効果をシミュレーションで確認する試験を行った。この試験内容と結果考察について図13、図14を参照しながら説明する。
[試験内容]
本実験では、第1列の開口部群と第2列の開口部群を、互いにずらさないで配置した有機EL表示パネル(従来例)、インクジェットヘッドの1ノズル分だけずらして配置した有機EL表示パネル(適用例1)、インクジェットヘッドの2ノズル分だけずらして配置した有機EL表示パネル(適用例2)、インクジェットヘッドの3ノズル分だけずらして配置した有機EL表示パネル(適用例3)を評価対象とした。各パネルは、列(Y)方向に100ピクセル、行(X)方向に200ピクセルを有する構成とした。インクジェットヘッドは、1開口部当たり10個のノズルを対応させるように設定した。
[結果考察]
次にシミュレーション結果を考察する。
<開口部の配列パターンのバリエーションに係る実施の形態>
以下、開口部の配列パターンのバリエーションに係る本発明の実施の形態2~6について、図10(b)~図12を用いて説明する。各図の符号の表記方法は図10(a)と共通する。各図中、「B」、「C」、「D」は、それぞれ同順に、基準となるモード「A」に対して列(Y)方向にノズル1個分、2個分、3個分ずれた各ノズル群を切り換えてインク液滴を塗布する各モードを示す。図中のライン上にある数字はノズル3030のずれ個数を示す。
[実施の形態2]
図10(b)は実施の形態2に係る開口部の配列パターンを示す。図10(b)に示す実施の形態2は、塗布対象基板100P1上において、行(X)方向に赤色(R)、緑色(G)、青色(B)の各発光色に対応するサブピクセル毎で、互いに千鳥状に開口部13R、13G、13Bを配置調整させた例である。有機発光層形成工程では千鳥状吐出プロセスに基づき、ヘッド部301の走査中にモード「A」と「B」とを各サブピクセルに対応する列(Y)方向ラインLR1、LG1、LB1、・・・毎に切り換えて実施する。
[実施の形態3]
図11(a)は実施の形態3に係る開口部の配列パターンを示す。図11(a)に示す実施の形態3は、塗布対象基板100P2上において、行(X)方向で隣接して連続する2つのピクセル単位を一組とし、この一組の連続内では開口部13R、13G、13Bの各位置が揃うように調整し、隣接する一組間ではモード「A」とモード「B」とを切り換え、各開口部13R、13G、13Bの位置を互いに階段状に配置調整させた例である。有機発光層形成工程は階段状吐出プロセス基づき、2つのモード「A」と「B」とを隣接する2ピクセル毎に切り替えて実施する。
[実施の形態4]
図11(b)は、実施の形態4に係る開口部の配列パターンを示す。図11(b)に示す実施の形態4は、塗布対象基板100P3上において、行(X)方向に隣接するピクセル単位でノズルずれ個数を3段階で徐々に増加させ、その後はノズルずれ個数を一気に0まで戻し、以降はこのノズルずれ個数の変化を繰り返す階段状パターンとして各開口部13R、13G、13Bを配置調整させた例である。有機発光層形成工程は階段状吐出プロセスに基づき、1ピクセル毎に4つのモード「A」~「D」を順次切り換えて実施する。
[実施の形態5]
図12(a)は、実施の形態5に係る開口部の配列パターンを示す。図12(a)に示す実施の形態5は、塗布対象基板100P4上において、行(X)方向に隣接するピクセル単位で、ランダムに開口部13R、13G、13Bの配置位置をずらした例である。ここではノズルずれ個数を3個以内の範囲で分散させている。有機発光層形成工程はランダム吐出プロセスに基づき、1ピクセル毎に4つのモード「A」~「D」をランダムに切り換えて実施する。開口部13R、13G、13Bの配置位置のランダム性については特に限定されない。ノズルずれ個数も3個より多くてもよい。開口部13R、13G、13Bの配置位置のずれ量の範囲は、少なくとも着弾ピッチ以上、列(Y)方向の開口部ピッチの50%以下の範囲とする。また、行(X)方向に並ぶ開口部のずらし方についてもピクセル単位に限定されず、サブピクセル単位で行うことができる。
[実施の形態6]
図12(b)は、実施の形態6に係る開口部の配列パターンを示す。図12(b)に示す実施の形態6は、塗布対象基板100P5上において、行(X)方向に隣接するピクセル単位でノズルずれ個数を徐々に3段階まで増加させ、その後はノズルずれ個数を徐々に3段階まで減少させて0に戻し、以降はこのノズルずれ個数の変化を繰り返す階段状(波状)パターンとして各開口部13R、13G、13Bを配置調整させた例である。有機発光層形成工程は階段状吐出プロセスに基づき、1ピクセル毎に4つのモード「A」「B」「C」「D」を順に切り換えて実施した後、逆順にモード「C」「B」「A」を切り換えて実施する。
<その他の実施の形態>
[実施の形態7]
図15は、実施の形態7に係る有機EL表示パネル100Aにおいて第1列の開口部群に対応して形成された第1ピクセルPix1の各有機EL素子11(11R、11G、11B)と、第1列と行(X)方向で隣接する第2列の開口部群に対応して形成された第2ピクセルPix2の各有機EL素子11´(11R´、11G´、11B´)とを示す模式的な部分拡大図である。図16(a)は図15における有機EL素子11R周辺のY1-Y1´矢視断面図である。図16(b)は図15における有機EL素子11R´周辺のY2-Y2´矢視断面図である。
[実施の形態8]
図17は、実施の形態8に係る有機EL表示パネル100Bにおいて第1列の開口部群に対応して形成された第1ピクセルPix1の各有機EL素子11(11R、11G、11B)と、第1列と行(X)方向で隣接する第2列の開口部群に対応して形成された第2ピクセルPix2の各有機EL素子11´(11R´、11G´、11B´)とを示す模式的な部分拡大図である。図18(a)は図17における有機EL素子11R周辺のY1-Y1´矢視断面図である。図17(b)は図17における有機EL素子11R´周辺のY2-Y2´矢視断面図である。
<その他の事項>
上記実施の形態では、ガントリー式のインクジェットテーブル20を用いる例を示したが、本発明はこれに限定しない。例えばインクジェットヘッド30の各位置を固定し、塗布対象基板をXYテーブルに載置して、インクジェットヘッド30に対して相対的に塗布対象基板を移動させることにより、インクを塗布することもできる。
Pix1 第1ピクセル
Pix2 第2ピクセル
1 基板
2 TFT層
3 給電電極
4 平坦化膜
5 コンタクトホール
6 第1電極(陽極)
7 バンク層
8 インク液滴
9 有機発光層
10 第2電極(陰極)
11、11Ra~11Rc、11R、11G、11B、11R´、11G´、11B´ 有機EL素子(サブピクセル)
12、12´ 窪み部
13、13R、13G、13B 開口部(素子形成予定領域)
14 画素規制層
15 制御装置
16A、16B 発光領域
17 封止層
18 CF基板
19a 透光性領域
19b ブラックマトリクス
20 インクジェットテーブル
30 インクジェットヘッド
100、100A、100B 有機EL表示パネル
100P、100P1~100P5、100PX 塗布対象基板
150 CPU
151 記憶手段(メモリ)
152 表示手段(ディスプレイ)
200 基台
206、300 制御部
210 ガントリー部
220 移動体
301 ヘッド部
302 本体部
303 サーボモータ
304a~304e インク吐出機構部
1000 インクジェット装置システム
3010、3010a~3010e 圧電素子(ピエゾ素子)
3020、3020a~3020e 液室
3030、3030b~3030d ノズル
3050 フレーム部
3060 インク流路
3070 隔壁
Claims (28)
- 基板の上方に、複数の第1電極を前記基板の表面の行列方向に沿って形成する第1電極形成工程と、
前記基板の上方に、前記各第1電極の少なくとも一部を個別に露出する複数の開口部を存在させてバンク層を形成するバンク層形成工程と、
複数のノズルを有するインクジェットヘッドと前記基板の少なくともいずれかを移動させることで、前記インクジェットヘッドと前記基板とを行方向に相対移動させ、各ノズルがいずれかの前記開口部と対向する際に、前記各ノズルより前記対向する前記開口部の内部にインク液滴を吐出し、有機発光層を形成する有機発光層形成工程と、
前記各有機発光層の上方に第2電極を形成する第2電極形成工程とを有し、
前記バンク層形成工程では、前記複数の開口部のうち、第1列の開口部群と第2列の開口部群とが、列方向に沿って前記開口部のピッチの半分以下の距離差で互いにずれて存在するように前記バンク層を形成し、
前記複数のノズルには第1ノズル群と第2ノズル群とが含まれ、
前記有機発光層形成工程では、前記第1列の開口部群に含まれる前記各開口部上を前記インクジェットヘッドが移動する際には前記第1ノズル群より前記インク液滴を吐出し、
前記第2列の開口部群に含まれる前記各開口部上を前記インクジェットヘッドが移動する際には前記第2ノズル群より前記インク液滴を吐出するように、前記第1ノズル群と前記第2ノズル群とを切り換えて使用する
有機EL表示パネルの製造方法。 - 前記バンク層形成工程において、
前記距離差は、列方向の前記開口部ピッチの10%以上50%以下の距離の差とする
請求項1に記載の有機EL表示パネルの製造方法。 - 前記有機発光層形成工程では、
行方向で隣接する前記各開口部の内部に対し、互いに発光色が異なる前記インク液滴を吐出することにより第1、第2、第3の各有機発光層を形成し、
前記第1の開口部群と前記第2の開口部群の前記各開口部には、前記第1、第2、第3の各有機発光層のうち、いずれか同一発光色の前記有機発光層を形成する
請求項1に記載の有機EL表示パネルの製造方法。 - 前記バンク層形成工程では、
前記第1、第2、第3の各有機発光層を形成予定の各開口部に前記第1列の開口部群と前記第2列の開口部群とを存在させ、
且つ、内部に前記第1、第2、第3の各有機発光層を同順に形成予定で行方向に隣接する3つの前記各開口部を1組とするとき、前記1組内では前記各開口部の配置が揃うように前記バンク層を形成する
請求項3に記載の有機EL表示パネルの製造方法。 - 前記バンク層形成工程では、
前記1組の前記各開口部を行方向に2組以上100組以下にわたり連続して存在させる
請求項4に記載の有機EL表示パネルの製造方法。 - 前記バンク層形成工程では、
前記第1列の開口部群と前記第2列の開口部群とを行方向で隣接して存在させる
請求項1に記載の有機EL表示パネルの製造方法。 - 前記バンク層形成工程では、
前記第1列の開口部群と前記第2列の開口部群とを行方向に繰り返し存在させ、前記第1列の開口部群中の前記各開口部と前記第2列の開口部群中の前記各開口部とを互いに千鳥状にずれるように存在させる
請求項1に記載の有機EL表示パネルの製造方法。 - 前記バンク層形成工程では、
前記第1列の開口部群と前記第2列の開口部群とを行方向に繰り返し存在させ、前記第1列の開口部群中の前記各開口部と前記第2列の開口部群中の前記各開口部とを互いに階段状にずれるように存在させる
請求項1に記載の有機EL表示パネルの製造方法。 - 前記バンク層形成工程では、
前記第1列の開口部群と前記第2列の開口部群とを行方向に繰り返し存在させ、前記第1列の開口部群中の前記各開口部と前記第2列の開口部群中の前記各開口部とを互いにランダム状にずれるように存在させる
請求項1に記載の有機EL表示パネルの製造方法。 - 前記有機発光層形成工程で使用するインクジェットヘッドは、前記第1ノズル群と前記第2ノズル群とにそれぞれ属するノズルの個数が10個以下である
請求項1に記載の有機EL表示パネルの製造方法。 - 前記インクジェットヘッドにおいて、前記複数のノズルは一の方向に沿ってライン状に配設され、
前記有機発光層形成工程では、
前記一の方向を列方向と交差するように前記インクジェットヘッドを傾けた状態で、前記インクジェットヘッドと前記基板の少なくともいずれかを移動させる
請求項1に記載の有機EL表示パネルの製造方法。 - 少なくとも前記有機発光層形成工程前において、
前記各第1電極と部分的に重ねて配置することにより、前記各開口部内の発光領域を規制する画素規制層を形成する画素規制層形成工程を有し、
前記画素規制層形成工程では、
前記第1開口部群中の前記各開口部の内部における第1発光領域の位置と、前記第2開口部群中の前記各開口部の内部における第2発光領域の位置が互いに行方向で揃うように、前記各開口部の列方向に沿った周縁の両端の少なくとも一端側となる領域に、絶縁性材料からなる前記画素規制層を形成する
請求項1に記載の有機EL表示パネルの製造方法。 - 前記画素規制層形成工程では、
前記列方向に沿って、前記開口部内の前記第1発光領域及び前記第2発光領域の各長さが、少なくとも前記開口部の長さの30%以上となるように前記画素規制層を形成する
請求項12に記載の有機EL表示パネルの製造方法。 - 前記第2電極の上方に封止層を形成する封止層形成工程と、
前記封止層の上方に第2基板を配置する第2基板配置工程とを有し、
前記第2基板は、前記開口部との対向位置に存在する透光性領域と、前記各透光性領域の周囲に存在するブラックマトリクスとを有し、
前記透光性領域は、前記第1開口部群中の前記各開口部の内部における第1発光領域の位置と、前記第2開口部群中の前記各開口部の内部における第2発光領域の位置が互いに行方向で揃うように存在している
請求項1に記載の有機EL表示パネルの製造方法。 - 前記第2基板配置工程で配置する前記第2基板において、
前記列方向に沿って、前記開口部内の前記第1発光領域及び前記第2発光領域の各長さが、少なくとも前記開口部の長さの30%以上となるように前記透光性領域が存在している
請求項14に記載の有機EL表示パネルの製造方法。 - 基板と、
前記基板上に形成されたTFT層と、
前記TFT層の上方において、行列方向に複数にわたり形成された第1電極と、
各第1電極を個別に露出させる複数の開口部を行列方向に存在させるように形成されたバンク層と、
各開口部の内部に形成された有機発光層と、
前記有機発光層の上方に形成された第2電極とを有し、
前記複数の開口部には第1列の開口部群と第2列の開口部群とが含まれ、第1列の開口部群と第2列の開口部群とが列方向に沿って前記開口部のピッチの半分以下の距離差で互いにずれて存在している
有機EL表示パネル。 - 前記距離差は、列方向の前記開口部ピッチの10%以上50%以下の距離差である
請求項16に記載の有機EL表示パネル。 - 行方向で隣接する前記各開口部の内部に対し、同順に互いに発光色が異なる前記インク液滴を吐出することにより第1、第2、第3の各有機発光層が形成され、
前記第1の開口部群と前記第2の開口部群の前記各開口部には、前記第1、第2、第3の各有機発光層のうち、いずれか同一発光色の前記有機発光層が形成されている
請求項16に記載の有機EL表示パネル。 - 前記第1、第2、第3の各有機発光層が形成された各開口部毎に前記第1列の開口部群と前記第2列の開口部群とが存在し、
且つ、内部に前記第1、第2、第3の各有機発光層を同順に形成予定で行方向に隣接する3つの前記各開口部を1組とするとき、前記1組内では前記各開口部の配置が揃うように前記バンク層が形成されている
請求項18に記載の有機EL表示パネル。 - 前記1組の前記各開口部が行方向に2組以上100組以下にわたり連続して存在している
請求項19に記載の有機EL表示パネル。 - 前記第1列の開口部群と前記第2列の開口部群とが行方向で隣接して存在する
請求項16に記載の有機EL表示パネル。 - 前記第1列の開口部群と前記第2列の開口部群とが行方向に繰り返し存在し、前記第1列の開口部群中の前記各開口部と前記第2列の開口部群中の前記各開口部とが互いに千鳥状にずれるように存在している
請求項16に記載の有機EL表示パネル。 - 前記第1列の開口部群と前記第2列の開口部群とが行方向に繰り返し存在し、前記第1列の開口部群中の前記各開口部と前記第2列の開口部群中の前記各開口部とが互いに階段状にずれるように存在している
請求項16に記載の有機EL表示パネル。 - 前記第1列の開口部群と前記第2列の開口部群とが行方向に繰り返し存在し、前記第1列の開口部群中の前記各開口部と前記第2列の開口部群中の前記各開口部とが互いにランダム状にずれるように存在している
請求項16に記載の有機EL表示パネル。 - 前記各第1電極と部分的に重ねて配置されることにより、前記各開口部内の発光領域を規制する画素規制層を有し、
前記画素規制層は、前記第1開口部群中の前記各開口部の内部における第1発光領域の位置と、前記第2開口部群中の前記各開口部の内部における第2発光領域の位置が互いに行方向で揃うように、前記各開口部の列方向に沿った周縁の両端の少なくとも一端側となる領域に、絶縁性材料により形成されている
請求項16に記載の有機EL表示パネル。 - 前記画素規制層は、
前記列方向に沿って、前記開口部内の前記第1発光領域及び前記第2発光領域の各長さが、少なくとも前記開口部の長さの30%以上となるように形成されている
請求項16に記載の有機EL表示パネル。 - 前記第2電極の上方に形成された封止層と、
前記封止層の上方に配置された第2基板とを有し、
前記第2基板は、前記開口部との対向位置に存在する透光性領域と、前記各透光性領域の周囲に存在するブラックマトリクスとを有し、
前記透光性領域は、前記第1開口部群中の前記各開口部の内部における第1発光領域の位置と、前記第2開口部群中の前記各開口部の内部における第2発光領域の位置が互いに行方向で揃うように存在している
請求項16に記載の有機EL表示パネル。 - 前記第2基板において、
前記列方向に沿って、前記開口部内の前記第1発光領域及び前記第2発光領域の各長さが、少なくとも前記開口部の長さの30%以上となるように前記透光性領域が存在している
請求項27に記載の有機EL表示パネル。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/365,698 US9082732B2 (en) | 2011-12-28 | 2012-12-27 | Organic EL display panel and method for manufacturing same |
JP2013551477A JP6142324B2 (ja) | 2011-12-28 | 2012-12-27 | 有機el表示パネルとその製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-287328 | 2011-12-28 | ||
JP2011287328 | 2011-12-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013099276A1 true WO2013099276A1 (ja) | 2013-07-04 |
Family
ID=48696805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2012/008414 WO2013099276A1 (ja) | 2011-12-28 | 2012-12-27 | 有機el表示パネルとその製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9082732B2 (ja) |
JP (1) | JP6142324B2 (ja) |
WO (1) | WO2013099276A1 (ja) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104733494A (zh) * | 2013-12-24 | 2015-06-24 | 乐金显示有限公司 | 有机电致发光装置及其制造方法 |
KR20150075346A (ko) * | 2013-12-24 | 2015-07-03 | 엘지디스플레이 주식회사 | 유기전계 발광소자 및 그 제조방법 |
WO2017169961A1 (ja) * | 2016-03-31 | 2017-10-05 | ソニー株式会社 | 表示装置及び電子機器 |
EP3160750A4 (en) * | 2014-06-30 | 2018-05-16 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
JP2020520041A (ja) * | 2017-05-12 | 2020-07-02 | 京東方科技集團股▲ふん▼有限公司Boe Technology Group Co.,Ltd. | 表示基板、表示装置及び表示基板の製造方法 |
US10784470B2 (en) | 2012-12-27 | 2020-09-22 | Kateeva, Inc. | Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances |
US10811324B2 (en) | 2013-12-12 | 2020-10-20 | Kateeva, Inc. | Fabrication of thin-film encapsulation layer for light emitting device |
US11141752B2 (en) | 2012-12-27 | 2021-10-12 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
JP2022103406A (ja) * | 2020-12-08 | 2022-07-07 | パイオニア株式会社 | 発光装置 |
US11673155B2 (en) | 2012-12-27 | 2023-06-13 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160092110A (ko) * | 2015-01-26 | 2016-08-04 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
CN106298840B (zh) * | 2015-06-09 | 2019-08-02 | 群创光电股份有限公司 | 显示装置 |
US10476004B2 (en) * | 2017-08-25 | 2019-11-12 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Method of manufacturing flexible display panel |
CN108511492B (zh) * | 2018-04-02 | 2021-06-04 | 上海天马微电子有限公司 | 有机发光显示面板及其制作方法、有机发光显示装置 |
CN111192979B (zh) * | 2018-11-15 | 2023-02-07 | 株式会社日本有机雷特显示器 | 显示面板的制造方法及功能层形成装置 |
CN109860438B (zh) * | 2019-02-15 | 2020-12-15 | 京东方科技集团股份有限公司 | 一种显示基板及其制备方法、显示装置 |
US10561029B1 (en) * | 2019-04-10 | 2020-02-11 | Innolux Corporation | Electronic device |
KR20210133372A (ko) | 2020-04-28 | 2021-11-08 | 삼성디스플레이 주식회사 | 디스플레이 장치 |
KR20220014383A (ko) | 2020-07-24 | 2022-02-07 | 삼성디스플레이 주식회사 | 잉크젯 분사방법, 잉크젯 분사장치 및 이를 이용한 표시패널 제조방법 |
CN112103322B (zh) * | 2020-09-22 | 2022-12-09 | 京东方科技集团股份有限公司 | 显示面板及其制备方法、显示装置 |
CN113380969B (zh) * | 2021-06-08 | 2022-06-14 | 武汉天马微电子有限公司 | 一种显示面板及其制作方法和显示装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004014321A (ja) * | 2002-06-07 | 2004-01-15 | Hitachi Ltd | 画像表示装置とその製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05163488A (ja) | 1991-12-17 | 1993-06-29 | Konica Corp | 有機薄膜エレクトロルミネッセンス素子 |
US5443922A (en) | 1991-11-07 | 1995-08-22 | Konica Corporation | Organic thin film electroluminescence element |
JP3627739B2 (ja) | 2001-12-11 | 2005-03-09 | セイコーエプソン株式会社 | 表示装置及び電子機器 |
TW591971B (en) | 2001-12-11 | 2004-06-11 | Seiko Epson Corp | Display apparatus and electronic machine |
JP4595387B2 (ja) | 2004-05-27 | 2010-12-08 | セイコーエプソン株式会社 | 液滴吐出装置、液滴吐出方法、カラーフィルタ基板の製造方法、電気光学装置の製造方法 |
JP2008249781A (ja) | 2007-03-29 | 2008-10-16 | Toppan Printing Co Ltd | パターン形成方法及び光学素子の製造方法 |
KR101037037B1 (ko) | 2008-05-29 | 2011-05-25 | 파나소닉 주식회사 | 유기 el 디스플레이 및 그 제조 방법 |
CN102960063B (zh) | 2010-12-24 | 2016-04-27 | 株式会社日本有机雷特显示器 | 有机el元件及其制造方法 |
US9153782B2 (en) | 2011-01-19 | 2015-10-06 | Joled Inc. | Method for producing organic light-emitting element, organic display panel, organic light-emitting device, method for forming functional layer, ink, substrate, organic light-emitting element, organic display device, and inkjet device |
US9318722B2 (en) | 2011-01-19 | 2016-04-19 | Joled Inc. | Method for producing organic light-emitting element, organic display panel, organic light-emitting device, method for forming functional layer, ink, substrate, organic light-emitting element, organic display device, and inkjet device |
US8980678B2 (en) | 2011-01-19 | 2015-03-17 | Panasonic Corporation | Method for producing organic light-emitting element, organic display panel, organic light-emitting device, method for forming functional layer, ink, substrate, organic light-emitting element, organic display device, and inkjet device |
CN103026789B (zh) | 2011-06-03 | 2016-01-13 | 株式会社日本有机雷特显示器 | 有机el显示面板的制造方法以及有机el显示面板的制造装置 |
US8648337B2 (en) * | 2012-04-03 | 2014-02-11 | Au Optronics Corporation | Active matrix organic light-emitting diode |
CN103000661B (zh) * | 2012-12-12 | 2015-12-23 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置 |
CN103022049B (zh) * | 2012-12-12 | 2015-12-02 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置 |
CN103000641B (zh) * | 2012-12-12 | 2015-10-07 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置 |
-
2012
- 2012-12-27 WO PCT/JP2012/008414 patent/WO2013099276A1/ja active Application Filing
- 2012-12-27 JP JP2013551477A patent/JP6142324B2/ja active Active
- 2012-12-27 US US14/365,698 patent/US9082732B2/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004014321A (ja) * | 2002-06-07 | 2004-01-15 | Hitachi Ltd | 画像表示装置とその製造方法 |
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10950826B2 (en) | 2012-12-27 | 2021-03-16 | Kateeva, Inc. | Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances |
US11489146B2 (en) | 2012-12-27 | 2022-11-01 | Kateeva, Inc. | Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances |
US11673155B2 (en) | 2012-12-27 | 2023-06-13 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
US11678561B2 (en) | 2012-12-27 | 2023-06-13 | Kateeva, Inc. | Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances |
US11233226B2 (en) | 2012-12-27 | 2022-01-25 | Kateeva, Inc. | Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances |
US11167303B2 (en) | 2012-12-27 | 2021-11-09 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
US11141752B2 (en) | 2012-12-27 | 2021-10-12 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
US10784470B2 (en) | 2012-12-27 | 2020-09-22 | Kateeva, Inc. | Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances |
US10784472B2 (en) | 2012-12-27 | 2020-09-22 | Kateeva, Inc. | Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances |
US10797270B2 (en) | 2012-12-27 | 2020-10-06 | Kateeva, Inc. | Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances |
US10811324B2 (en) | 2013-12-12 | 2020-10-20 | Kateeva, Inc. | Fabrication of thin-film encapsulation layer for light emitting device |
US11551982B2 (en) | 2013-12-12 | 2023-01-10 | Kateeva, Inc. | Fabrication of thin-film encapsulation layer for light-emitting device |
US11088035B2 (en) | 2013-12-12 | 2021-08-10 | Kateeva, Inc. | Fabrication of thin-film encapsulation layer for light emitting device |
US11456220B2 (en) | 2013-12-12 | 2022-09-27 | Kateeva, Inc. | Techniques for layer fencing to improve edge linearity |
KR102257232B1 (ko) * | 2013-12-24 | 2021-05-28 | 엘지디스플레이 주식회사 | 유기전계 발광소자 및 그 제조방법 |
CN104733494A (zh) * | 2013-12-24 | 2015-06-24 | 乐金显示有限公司 | 有机电致发光装置及其制造方法 |
CN104733494B (zh) * | 2013-12-24 | 2018-06-05 | 乐金显示有限公司 | 有机电致发光装置及其制造方法 |
KR20150075346A (ko) * | 2013-12-24 | 2015-07-03 | 엘지디스플레이 주식회사 | 유기전계 발광소자 및 그 제조방법 |
EP3160750A4 (en) * | 2014-06-30 | 2018-05-16 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
US11107372B2 (en) | 2016-03-31 | 2021-08-31 | Sony Corporation | Display device and electronic apparatus |
JPWO2017169961A1 (ja) * | 2016-03-31 | 2019-02-14 | ソニー株式会社 | 表示装置及び電子機器 |
WO2017169961A1 (ja) * | 2016-03-31 | 2017-10-05 | ソニー株式会社 | 表示装置及び電子機器 |
JP2020520041A (ja) * | 2017-05-12 | 2020-07-02 | 京東方科技集團股▲ふん▼有限公司Boe Technology Group Co.,Ltd. | 表示基板、表示装置及び表示基板の製造方法 |
JP7103560B2 (ja) | 2017-05-12 | 2022-07-20 | 京東方科技集團股▲ふん▼有限公司 | 表示基板、表示装置及び表示基板の製造方法 |
JP2022103406A (ja) * | 2020-12-08 | 2022-07-07 | パイオニア株式会社 | 発光装置 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2013099276A1 (ja) | 2015-04-30 |
JP6142324B2 (ja) | 2017-06-07 |
US9082732B2 (en) | 2015-07-14 |
US20150001514A1 (en) | 2015-01-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6142324B2 (ja) | 有機el表示パネルとその製造方法 | |
JP5624047B2 (ja) | 有機el表示パネルとその製造方法 | |
JP5785935B2 (ja) | 有機el表示パネルの製造方法、および有機el表示パネルの製造装置 | |
JP5543597B2 (ja) | 有機el表示パネルの製造方法 | |
US9299959B2 (en) | Inkjet device and manufacturing method for organic el device | |
US10418427B2 (en) | Method for manufacturing organic EL display panel | |
JP6336044B2 (ja) | 有機el表示パネルの製造方法 | |
JP6688909B2 (ja) | 有機el表示パネルの製造方法、及びインク乾燥装置 | |
JP2011044340A (ja) | 有機el素子の製造方法 | |
JP2012252983A (ja) | 有機el表示パネルの製造方法、カラーフィルターの製造方法、有機el表示パネルの製造装置および有機el表示パネル | |
JP2015207527A (ja) | 有機発光デバイスの機能層の形成方法及び有機発光デバイスの製造方法 | |
US9555628B2 (en) | Inkjet device, and method for manufacturing organic EL device | |
JP2013172060A (ja) | 機能膜の塗布装置とこれを用いる製造方法 | |
JP6083589B2 (ja) | インクジェット装置および有機el表示パネルの製造方法 | |
JP2020087909A (ja) | 有機el表示パネルの製造方法及び機能層形成装置 | |
JP2019197617A (ja) | 有機el表示パネルの製造方法及び有機el表示パネル形成用インク |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12862796 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14365698 Country of ref document: US |
|
ENP | Entry into the national phase |
Ref document number: 2013551477 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 12862796 Country of ref document: EP Kind code of ref document: A1 |