WO2013008751A1 - Procédé de production d'un composite de céramique pour photoconversion - Google Patents
Procédé de production d'un composite de céramique pour photoconversion Download PDFInfo
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- WO2013008751A1 WO2013008751A1 PCT/JP2012/067342 JP2012067342W WO2013008751A1 WO 2013008751 A1 WO2013008751 A1 WO 2013008751A1 JP 2012067342 W JP2012067342 W JP 2012067342W WO 2013008751 A1 WO2013008751 A1 WO 2013008751A1
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- Prior art keywords
- phase
- ceramic composite
- light conversion
- solidified body
- dry etching
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- 239000002131 composite material Substances 0.000 title claims abstract description 106
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 46
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 6
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- B24—GRINDING; POLISHING
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Definitions
- the present invention relates to a method for producing a ceramic composite for light conversion used for a light emitting diode used for a display, illumination, backlight light source and the like.
- white light emitting devices using a blue light emitting element as a light source have been actively conducted.
- white light-emitting devices using blue light-emitting elements have a long life span and not only consume less power than incandescent and fluorescent lamps, but also do not use harmful substances such as mercury.
- the used lighting equipment is being put into practical use.
- the most common method for obtaining white light using blue light from a blue light emitting element as a light source is to obtain a pseudo white color by mixing yellow having a complementary color relationship with blue.
- a transparent resin containing a phosphor that emits yellow light by blue light emitted from a blue light emitting element for example, a YAG (Y 3 Al 5 O 12 ) phosphor containing Ce.
- the blue light emitting element is sealed by. Blue light (wavelength 450 to 460 nm) is emitted from the blue light emitting element, YAG is excited by a part of the blue light, and yellow light is emitted from the phosphor.
- the present inventors have formed a plurality of oxide crystal phases including a Ce-containing YAG phosphor phase that emits fluorescence and an Al 2 O 3 phase continuously and intertwined with each other three-dimensionally.
- the white light-emitting device comprised using the ceramic composite for light conversion which consists of the solidified body and the blue light emitting element which have been proposed is proposed (patent documents 1, 2).
- the ceramic composite for light conversion can stably obtain homogeneous yellow fluorescence because the phosphor phase is uniformly distributed, and it is excellent in durability because it is a ceramic, and occurs when encapsulated with an epoxy resin or the like. It is possible to solve the problem and provide a highly reliable white light emitting device.
- the configuration of the white light emitting device using the ceramic composite for light conversion is, for example, a circuit board on which a blue light emitting element that is flip-chip mounted and a wiring pattern that receives and supplies power to the blue light emitting element are formed. And a ceramic composite for light conversion directly bonded to the blue light emitting element.
- a single crystal layer capable of forming a light emitting diode element and at least two oxide crystal phases selected from a single metal oxide and a composite metal oxide have been continuously and three-dimensionally interconnected so far.
- a light emitting diode substrate in which a ceramic composite layer for light conversion composed of a solidified body entangled with each other is laminated Patent Document 3
- a single crystal substrate such as sapphire is generally used (Patent Document 4).
- abrasive particles such as diamond particles that are harder than the workpiece are used.
- MP mechanical polishing
- CMP Chemical Mechanical Polishing
- the surface of the single crystal substrate can be a smooth surface with an Ra (arithmetic mean roughness) of less than 1 nm by polishing such as MP processing and CMP processing.
- Patent Document 3 discloses a method of directly bonding at a high temperature and a method of interposing a very small amount of a low melting point material as a bonding layer in order to laminate a single crystal layer and a ceramic composite layer for light conversion.
- the bonding surface between the single crystal layer and the ceramic composite layer for light conversion is flat, not only the above method, but also the direct contact between the ceramic composite layer for light conversion and the single crystal layer by the surface activated bonding method, etc. Since bonding is possible, it is important that the bonding surface is flat.
- the present invention has been made in view of the above problems, and has a structure in which an Al 2 O 3 phase and an oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally entangled with each other.
- An object of the present invention is to provide a method for producing a ceramic composite for light conversion capable of efficiently flattening the surface of the ceramic composite.
- the present inventors have intensively studied, and as a result, the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally entangled with each other.
- an interphase step is formed so that the oxide crystal phase other than the Al 2 O 3 on the surface of the solidified body has a convex shape with respect to the Al 2 O 3 phase.
- the solidified body after the dry etching process is subjected to CMP process or MP process, thereby reducing the phase difference between the phases.
- the present invention has been found to be able to be manufactured in an efficient manner.
- the present invention performs dry etching processing on the surface of a solidified body having a structure in which an Al 2 O 3 phase and an oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally entangled with each other, A first step of forming an interphase step so that an oxide crystal phase other than Al 2 O 3 on the surface of the solidified body has a convex shape with respect to the Al 2 O 3 phase; and solidification after the dry etching process And a second step of reducing the interphase difference by subjecting the body to CMP processing or MP processing.
- the oxide crystal phase other than the Al 2 O 3 is a fluorescent substance that emits fluorescence, and contains a YAG (Y 3 Al 5 O 12 ) phase containing Ce, or Ce and Gd. it is a manufacturing method of the light converting ceramic composite for which is a YAG (Y 3 Al 5 O 12 ) phase.
- the interphase step after processing in the second step is 0.005 ⁇ m or less.
- the process for reducing the inter-phase step in the second step is a CMP process.
- the slurry containing 0.1% by mass or more and less than 5% by mass of silica particles is used as a polishing liquid when performing the CMP process.
- a unit load of 10 to 50 kPa is applied when performing the CMP process.
- the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally formed from a solidified body having a structure intertwined with each other.
- a method for producing a ceramic composite for light conversion capable of efficiently planarizing the surface. That is, according to the production method of the present invention, a ceramic composite for light conversion having a flat surface can be efficiently obtained.
- FIG. 1 It is typical sectional drawing which shows the light-emitting device using the ceramic composite for light conversion which concerns on this invention. It is a top view which shows an example of the measuring point of each inter-step difference in the surface of the solidification body which comprises the ceramic composite for light conversion which concerns on this invention. It is a perspective view which shows the surface shape of the solidified body after the lapping process in the reference example of this invention. It is a perspective view which shows the surface shape of the solidified body after the dry etching process in Example 1 of this invention. It is a perspective view which shows the surface shape of the solidification body after CMP process in Example 1 of this invention. It is a perspective view which shows the surface shape of the solidified body after the CMP process in the comparative example 1 of this invention.
- a solidified body having a structure in which an Al 2 O 3 phase and an oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally entangled with each other is produced by melting and solidifying a raw material oxide.
- a solidified body can be obtained by a simple method of cooling and condensing a melt charged in a crucible held at a predetermined temperature while controlling a cooling temperature.
- Preferred as the light conversion ceramic composite is a solidified body produced by a unidirectional solidification method. This is because by performing unidirectional solidification, the crystal phase contained in the solidified body continuously grows in a single crystal state, and the attenuation of light in the member is reduced.
- Japanese Patent Application Laid-Open Nos. 7-149597 and 7-187893 filed previously by the present applicant are disclosed.
- No. 8-81257, JP-A-8-253389, JP-A-8-253390, and JP-A-9-67194 and corresponding US applications US Pat. No. 5,569,547, No. 1).
- No. 5,484,752, No. 5,902,963 and the like can be used.
- an oxide crystal phase other than the Al 2 O 3 is a fluorescent material that emits fluorescence, and a Ce-containing YAG phase (hereinafter referred to as YAG: Ce phase). Or a YAG phase containing Ce and Gd (hereinafter referred to as YAG: Gd, Ce phase).
- the oxide crystal phase other than Al 2 O 3 is a YAG: Ce phase or a YAG: Gd, Ce phase
- the Al 2 O 3 phase is A part of the blue light is transmitted, and the oxide crystal phase other than the Al 2 O 3 absorbs a part of the blue light and emits yellow fluorescence, whereby the blue light and the yellow light are mixed to generate white light emission. It is because it is obtained.
- the ceramic composite for light conversion in which the oxide crystal phase other than the Al 2 O 3 is a fluorescent substance that emits fluorescence and is a YAG: Ce phase or a YAG: Gd, Ce phase is known, and the present applicant Is disclosed in WO2008-041566 and the like filed earlier.
- the YAG: Ce phase absorbs violet to blue excitation light of 400 nm to 500 nm and emits fluorescence with a peak wavelength of 530 nm to 560 nm
- the YAG: Gd Ce phase absorbs violet to blue excitation light of 400 nm to 500 nm. Since it emits fluorescence having a peak wavelength of 540 nm to 580 nm, the solidified body in which the oxide crystal phase other than Al 2 O 3 is YAG: Ce phase or YAG: Gd, Ce phase is blue light or violet light. It is suitable as a light conversion member for a white light emitting device used in combination with a light emitting element.
- the boundaries of the Al 2 O 3 phase of the solidified body to be used in the present invention and the other than Al 2 O 3 oxide crystal phase is not present boundary layer of an amorphous phase such as, the said Al 2 O 3 phase
- the oxide crystal phase other than Al 2 O 3 is in direct contact.
- the ceramic composite for light conversion obtained by the present invention has little loss of light inside and high light transmittance.
- the oxide crystal phase that emits fluorescence has a structure that is continuously and three-dimensionally entangled with each other, and the two phases as a whole are uniformly distributed in the ceramic composite for light conversion. No homogeneous fluorescence can be obtained.
- the oxide crystal phase is a YAG: Ce phase or a YAG: Gd, Ce phase
- the violet to blue light is incident on the ceramic composite for light conversion, and thus the fluorescence from the phosphor phase is increased.
- the light transmitted through the transmitted light phase can be obtained at the same time.
- blue light or violet light can be efficiently incident on the ceramic composite for light conversion, and strong white light is obtained. be able to.
- the bonding surface of the ceramic composite for light conversion and the blue light emitting element can be made extremely flat, for example, the ceramic composite for light conversion and the blue light emission can be obtained by a surface activated bonding method or the like. Direct bonding with the element can be applied.
- the solidified body used in the present invention is composed entirely of an inorganic oxide ceramic, it has excellent heat resistance and durability, and is not deteriorated by light. Therefore, it is possible to provide a ceramic composite for light conversion suitable for constituting a highly reliable white light emitting device with high reliability in combination with a light emitting element of blue light or violet light.
- a plate-shaped solid body having a structure in which an Al 2 O 3 phase and an oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally intertwined is dry-etched. It is a process to process.
- the plate-like solidified body to be dry-etched any of a solidified body sliced to a predetermined thickness, and a solidified body whose surface has been previously ground, lapped, or polished can be used. Is not to be done. However, if a solidified body in which the interphase step and the surface roughness in the phase are adjusted not to be extremely large by grinding, lapping, or polishing, the time required for the first step and the second step is further increased.
- a solidified body whose surface is ground, lapped, or polished. Grinding, lapping, or polishing of the solidified body surface is performed by, for example, surface grinding, gliding, single-sided lapping, double-sided lapping, buffing, CMP, or the like. Is not to be done.
- a general dry etching apparatus is used for the dry etching process in the first step of the present invention.
- the etching selectivity ratio of the etching rate of the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3
- the dry etching apparatus for example, a general dry etching apparatus such as an RIE (Reactive Ion Etching) type, a CCP (Capacitive Coupled Plasma) type, or an ICP (Inductive Coupled Plasma) type can be used.
- Examples of the gas for dry etching include Cl 2 , SiCl 4 , BCl 3 , HBr, SF 6 , CHF 3 , C 4 F 8 , CF 4 , Ar, etc., which are generally used in semiconductor and liquid crystal manufacturing. These gases can be used alone or in combination.
- the oxide crystal phase other than the Al 2 O 3 which has a higher polishing rate than the Al 2 O 3 phase, is processed so as to have a convex shape, and the height thereof is adjusted, whereby the second When performing CMP processing or MP processing in the process, the step difference between the surfaces of the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 can be reduced to 0.005 ⁇ m or less in a short time.
- the other than Al 2 O 3 phase step as the convex oxide crystal phase relative to the Al 2 O 3 phase is not more than 0.500 ⁇ m preferable.
- the interphase step is larger than 0.500 ⁇ m, the interphase step on the surface of the Al 2 O 3 phase and the oxide crystal phase other than the Al 2 O 3 is reduced when CMP processing or MP processing is performed in the second step. Since processing time becomes long to make it 0.005 micrometer or less, it is not preferable.
- CMP processing or MP processing is performed to reduce the step difference between the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 on the surface of the solidified body after the dry etching processing that has undergone the first step.
- the CMP process generally increases the mechanical polishing effect generated on the surface of the abrasive grains and the workpiece by the chemical reaction action on the solid surface of the abrasive grains and the workpiece or the chemical etching action by the chemical liquid in the polishing liquid. It is a technique for flattening the surface of the workpiece at high speed, and it is easy to precisely control the interphase step, and generally the surface roughness of the workpiece is smaller than that of MP processing. Therefore, it is preferable to use CMP processing in the second step.
- a slurry containing silica particles, Al 2 O 3 particles, CeO 2 particles, Mn 2 O 3 particles, diamond particles, etc. is used as the polishing liquid.
- a slurry containing silica particles is preferably used.
- the content of silica particles in the slurry used is the Al 2 O 3 phase on the surface of the solidified body formed by dry etching in the first step.
- an oxide crystal phase other than Al 2 O 3 need to be appropriately adjusted depending on the interphase step and the polishing rate selection ratio.
- the silica particles are contained in an amount of 1% by mass to less than 5% by mass. It is preferable to use a polishing liquid containing, and it is preferable to use a polishing liquid containing 2% by mass or more and less than 3% by mass of silica particles.
- the silica particles are contained in an amount of 0.1% by mass or more and 1% by mass.
- polishing liquid containing less than 0.3% by mass It is preferable to use a polishing liquid containing less than 0.3% by mass, and it is more preferable to use a polishing liquid containing 0.2% by mass or more and less than 0.3% by mass of silica particles.
- the content of silica particles in the polishing liquid is set based on a step difference between the Al 2 O 3 phase to be subjected to CMP and an oxide crystal phase other than the Al 2 O 3 , the stability of the polishing liquid, and the like.
- the polishing rate of the oxide crystal phase other than the Al 2 O 3 becomes excessively large, and it becomes difficult to control the processing time. This is because if a polishing liquid having an amount of less than 0.1% by mass is used, the polishing rate is lowered and the time required for polishing may be increased.
- polishing liquid used in the CMP process for example, a polishing liquid obtained by diluting a slurry containing silica particles with pure water can be used.
- a commercially available polishing slurry for example, “Quartron (registered trademark) PL series” of colloidal silica polishing slurry manufactured by Fuso Chemical Industry Co., Ltd. can be used.
- a polishing liquid adjusted to a desired concentration can be obtained.
- a general polishing slurry for CMP processing can be used for the polishing liquid in that case, and it does not matter whether or not the pH and additives are contained.
- a difference occurs in the polishing rate between the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 , but the polishing conditions may be appropriately adjusted depending on the pH.
- a general polishing slurry for CMP processing is used in a flattening process of semiconductor or liquid crystal production, and is a polishing agent, an organic compound (surfactant, color-preventing agent), an oxidizing agent, a pH adjuster (inorganic acid or alkali). )
- Such polishing slurries are very expensive and contain various chemicals as solid abrasive grains and additives, and problems such as complicated drainage are pointed out.
- a polishing liquid composition containing an alkanolamine compound and a fluorine-based compound having a perfluoroalkyl group is known (Patent Document 4).
- Patent Document 4 a polishing liquid composition containing an alkanolamine compound and a fluorine-based compound having a perfluoroalkyl group is known (Patent Document 4).
- Patent Document 4 a polishing liquid composition containing an alkanolamine compound and a fluorine-based compound having a perfluoroalkyl group is known (Patent Document 4).
- polishing liquid containing a special additive or the like is not required for the CMP process in the second step, it is possible to provide a manufacturing method with a low environmental load and a low cost even in wastewater treatment.
- limiting in using the polishing slurry containing the said additive The polishing slurry containing the said additive can be used without a problem.
- the unit load applied to the solidified body after the dry etching processing is preferably 10 to 50 kPa, and more preferably 10 to 33 kPa. preferable.
- the unit load is less than 10 kPa, the polishing rate is reduced, and when it exceeds 50 kPa, the step difference between the Al 2 O 3 phase and the oxide crystal phase other than the Al 2 O 3 on the surface to be polished can be precisely adjusted. It becomes difficult.
- a general polishing apparatus can be used for the CMP processing in the second step. It is preferable that CMP processing is performed by attaching the solidified body after dry etching to a rotating polishing head, and the solidified body after dry etching processing attached to a polishing head rotating at about 50 rpm (rotation / minute) is about 50 rpm.
- the CMP process can be performed by pressing against the rotating polishing pad.
- the manufacturing method of a ceramic composite for light conversion of the present invention in a first step, so that the oxide crystal phase other than Al 2 O 3 is larger polishing rate than Al 2 O 3 phase is convex
- the Al 2 O 3 phase and Al 2 on the surface of the solidified body are processed.
- the step difference between the oxide crystal phase other than O 3 can be made 0.005 ⁇ m or less in a short time. Since the dry etching processing time of the first step required for the implementation of the present invention is also short, according to the present invention, the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 are very efficiently formed.
- the level difference between phases can be reduced. Further, depending on the combination of the dry etching process conditions and the CMP process or MP process conditions, the Al 2 O 3 phase may be changed to an oxide crystal phase other than the Al 2 O 3 after the CMP process or the MP process. On the other hand, it may be convex.
- reducing the interphase step may be a step of reducing the absolute value of the interphase step formed in the first step, and the Al 2 O 3 phase is an oxide other than the Al 2 O 3 . It may be convex with respect to the crystal phase.
- the ceramic composite for light conversion obtained by the present invention is composed of a solidified body having a structure in which an Al 2 O 3 phase and an oxide crystal phase other than Al 2 O 3 are continuously and three-dimensionally entangled with each other.
- the Al 2 O 3 phase transmits part of the received light, and the oxide crystal phase other than the Al 2 O 3 can absorb part of the light and emit fluorescence.
- a ceramic composite having a step difference between the Al 2 O 3 phase on the light receiving surface and an oxide crystal phase other than the Al 2 O 3 of 0.005 ⁇ m or less.
- the step difference between the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 on the surface of the solidified body constituting the ceramic composite for light conversion obtained by the present invention is one crystal constituting a convex shape.
- An arbitrary point on the surface of the phase and an arbitrary point on the surface of the other crystal phase constituting the concave shape, and an arbitrary surface parallel to the surface to be processed as a reference plane, the two points The height is obtained, and the difference between the two heights is obtained as an absolute value.
- an arbitrary point on the surface of the crystal phase constituting such a convex shape and an arbitrary point on the surface of the crystal phase constituting the concave shape constitute a concave shape with the crystal phase constituting the convex shape.
- the points close to each other across the interface of the crystal phase to be used are preferable. Furthermore, in the present invention, twelve measurement points including two points are set, and the step difference between the phases is an average value of the measurement results. . Therefore, the phase difference between the Al 2 O 3 phase and the oxide crystal phase other than Al 2 O 3 is 0.005 ⁇ m or less means that the measurement results of the individual phase differences at any 12 locations according to the above method are used. The average value is 0.005 ⁇ m or less.
- bonding can be performed even when the phase difference exceeds 0.005 ⁇ m.
- the bonding strength decreases, and unevenness may occur on the bonding surface. Therefore, it is possible to obtain a bonding strength having no practical problem by setting the interphase step to 0.005 ⁇ m or less.
- the light emitting device includes a light emitting element 2 that emits light having a peak at a wavelength of 400 nm to 500 nm, and a ceramic composite 1 for light conversion including an oxide crystal phase that emits yellow fluorescence having a peak at a wavelength of 550 nm to 560 nm.
- Light emitted from the light-emitting element 2 is applied to the ceramic composite 1 for light conversion, and light transmitted through the ceramic composite 1 for light conversion and light emitted from the light-emitting element 2 are subjected to yellow fluorescence contained in the ceramic composite 1 for light conversion. Fluorescence whose wavelength is converted by the emitted oxide crystal phase is used.
- reference numeral 3 is a flip chip electrode terminal
- reference numeral 4 is an anode electrode
- reference numeral 5 is a cathode electrode.
- a light emitting element that emits light having a peak at a wavelength of 400 nm to 500 nm is an element that emits violet to blue light.
- violet to blue light emitted from a light emitting diode element or an element that generates laser light is used for the wavelength.
- the light enters the ceramic composite for light conversion whose chromaticity is adjusted so that white color is obtained. Due to the structure in which the yellow fluorescence from the phosphor phase excited thereby and the violet to blue transmitted light from the non-phosphor phase are uniformly entangled with each other in a continuous and three-dimensional manner. By mixing uniformly, white light with small color unevenness can be obtained.
- a white light emitting device in which a light emitting diode element is used as the light emitting element is referred to as a white light emitting diode.
- this raw material was directly charged into a molybdenum crucible and set in a unidirectional solidification apparatus, and the raw material was melted under a pressure of 1.33 ⁇ 10 ⁇ 3 Pa (10 ⁇ 5 Torr).
- the crucible is lowered at a rate of 5 mm / hour in the same atmosphere, and the solidification has a structure in which the Al 2 O 3 phase and the fluorescent YAG: Ce phase are continuously and three-dimensionally entangled with each other.
- Got the body The solidified body was cut into a wafer shape having a diameter of 2 inches with a multi-wire saw, and a disk-shaped sample was cut out.
- the cut surface of the disk-shaped sample was a satin surface having an Ra (arithmetic mean roughness) of about 65 nm.
- FIG. 3 shows a surface shape diagram of the disk-shaped sample after the lapping process. It was confirmed that an inter-step difference of 0.020 ⁇ m was formed on the surface of the disk-shaped sample after the lapping process so that the Al 2 O 3 phase was convex with respect to the YAG: Ce phase.
- the surface of the disk-shaped sample after the lapping was a mirror surface with an Ra (arithmetic mean roughness) of about 5.7 nm.
- the present invention is not limited to this, and in the present invention, a multi-wire saw or the like is used. Any of a sample cut and processed by, a sample whose surface is ground, or a sample whose surface is polished can be used. However, if a solidified body in which the interphase step and the surface roughness in the phase are adjusted not to be extremely large by grinding, lapping, or polishing, the time required for the first step and the second step is further increased. Since it can be shortened, it is preferable to use a solidified body whose surface is ground, lapped, or polished.
- the measurement of the step difference between the Al 2 O 3 phase and the YAG: Ce phase of the solidified body according to this example is performed by measuring the disk-shaped sample after lapping, the solidified body after dry etching, and the solidification after CMP processing.
- an AFM atomic force microscope
- Example 1 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed using the ICP type dry etching apparatus.
- As the etching gas a mixed gas of BCl 3 and Ar was used. Further, dry etching was performed for 1 minute under the conditions of antenna power: 700 W and bias power: 300 W.
- antenna power 700 W
- bias power 300 W.
- the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the processed surface shape of the solidified body after dry etching is shown in FIG.
- CMP processing was performed by the following method to obtain a ceramic composite for light conversion according to Example 1.
- “Quartron (registered trademark) PL-2L” a colloidal silica polishing slurry manufactured by Fuso Chemical Industry Co., Ltd., which has a silica particle content of 20 mass%, has a silica particle content of 2 mass%.
- a slurry obtained by diluting with pure water was used.
- the solidified body (disk sample) after the dry etching is attached to a polishing head of a CMP apparatus, and then the polishing liquid is supplied while rotating the polishing head at about 50 rpm (rotation / min).
- the CMP process was performed by pressing the polishing pad against a 15-inch diameter polishing pad rotating at about 50 rpm (rotation / min).
- a 15-inch diameter polishing pad rotating at about 50 rpm (rotation / min).
- the unit load applied to the solidified body (disk sample) after the dry etching was 33 kPa
- the supply amount of the polishing liquid was 10 mL / min
- the processing time was 2 minutes.
- Example 1 When the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Example 1 after CMP were measured using an AFM (atomic force microscope), the Al 2 O 3 phase and the YAG: It was confirmed that the step difference with the Ce phase was 0.003 ⁇ m.
- the shape of the surface of the ceramic composite for light conversion according to Example 1 is shown in FIG.
- Table 1 shows the polishing conditions and the measurement results of the interphase steps on the surface of the obtained ceramic composite for light conversion.
- Example 2 of the ceramic composite for light conversion according to the present invention.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- Example 1 of the obtained solidified body (disk-shaped sample) after the dry etching was obtained except that the unit load applied to the solidified body after the dry etching was 13 kPa and the time of CMP was 5 minutes.
- the ceramic composite for light conversion which concerns on Example 2 was produced by carrying out CMP processing by the same method.
- the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Example 2 after CMP were measured using an AFM (atomic force microscope), the Al 2 O 3 phase and the YAG: It was confirmed that the step difference with the Ce phase was 0.002 ⁇ m.
- Example 3 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- a unit load applied to the obtained solidified body (disk-shaped sample) after the dry etching process is applied to the solidified body (disk-shaped sample) after the dry etching process is 46 kPa, and a CMP processing time is 1.5.
- a ceramic composite for light conversion according to Example 3 was fabricated by CMP in the same manner as in Example 1 except that the time was changed to minutes.
- the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Example 3 after CMP were measured using an AFM (atomic force microscope), the Al 2 O 3 phase and the YAG: It was confirmed that the step difference with the Ce phase was 0.005 ⁇ m.
- Example 4 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- polishing liquid “Quartron (registered trademark) PL-2L”, a colloidal silica polishing slurry manufactured by Fuso Chemical Industry Co., Ltd., which has a silica particle content of 20 mass%, has a silica particle content of 0.2 mass%.
- Example 5 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- polishing liquid “Quartron (registered trademark) PL-2L”, a colloidal silica polishing slurry manufactured by Fuso Chemical Industry Co., Ltd., which has a silica particle content of 20 mass%, has a silica particle content of 4 mass%.
- the CMP processing was performed in the same manner as in Example 1 except that the CMP processing time was set to 1 minute, so that the ceramic composite for light conversion according to Example 5 was obtained. Produced.
- Example 6 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- a colloidal silica polishing slurry “COMPOL (registered trademark) Type 20” manufactured by Fujimi Incorporated with a silica particle content of 40% by mass is pure so that the silica particle content is 2% by mass.
- Example 7 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- the ceramic composite for light conversion which concerns on Example 7 was produced by CMP process.
- Example 8 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- Example 9 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- the ceramic composite for light conversion according to Example 9 was subjected to CMP processing in the same manner as in Example 1 except that the unit load applied to the solidified body after dry etching was 8 kPa and the CMP processing time was 30 minutes. The body was made.
- the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Example 9 after CMP were measured using an AFM (atomic force microscope), the Al 2 O 3 phase and the YAG: It was confirmed that the step difference with the Ce phase was 0.003 ⁇ m.
- Example 10 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after the dry etching was subjected to CMP by the following method.
- polishing liquid “Quartron (registered trademark) PL-2L”, a colloidal silica polishing slurry manufactured by Fuso Chemical Industry Co., Ltd., which has a silica particle content of 20 mass%, has a silica particle content of 0.05 mass%.
- a ceramic composite was prepared.
- Example 11 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1.
- FIG. When the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope), the YAG: Ce phase was convex with respect to the Al 2 O 3 phase, and the step difference between the phases was about 0.100 ⁇ m. Met.
- the obtained solidified body (disk sample) after dry etching was subjected to MP processing by the following method.
- an oil-based dispersion medium polishing slurry having a content of diamond particles having an average particle diameter of about 20 nm of 0.1% by mass and additionally containing a nonionic surfactant was used.
- the solidified body (disk-shaped sample) after the dry etching process is attached to a work holder of an MP apparatus, and then the surface of the solidified body is pressed against the surface of a surface plate, and the work holder is rotated at about 30 rpm (rotation / minute).
- MP processing was performed by pressing against a tin plate with a diameter of 15 inches rotating at about 30 rpm (rotation / minute) to which the polishing liquid was supplied.
- the unit load applied to the solidified body (disk sample) after the dry etching was 10 kPa, the supply amount of the polishing liquid was 2 mL / min, and the processing time was 1 minute.
- the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Example 11 after MP processing were measured using an AFM (atomic force microscope), the Al 2 O 3 phase and the YAG: It was confirmed that the step difference with the Ce phase was 0.004 ⁇ m.
- Example 12 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed by the method similar to Example 1 except having made etching time into 6 minutes.
- the surface shape of the solidified body after dry etching was measured with an AFM (atomic force microscope)
- the YAG: Ce phase was convex with respect to the Al 2 O 3 phase
- the step difference between the phases was about 0.400 ⁇ m. Met.
- the CMP processing was performed in the same manner as in Example 1 except that the CMP processing time was set to 10 minutes, and the ceramic composite for light conversion according to Example 12 was obtained.
- Example 13 of the ceramic composite for light conversion according to the present invention will be described.
- the dry etching process was performed using the RIE type dry etching apparatus. CF 4 gas was used as an etching gas. Further, dry etching was performed for 30 minutes under the conditions of RF power: 200 W, gas flow rate: 20 sccm, and gas pressure: 2.0 Pa.
- RF power 200 W
- gas flow rate 20 sccm
- gas pressure 2.0 Pa.
- Example 13 CMP was performed in the same manner as in Example 1 to obtain a ceramic composite for light conversion according to Example 13.
- the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Example 13 after CMP were measured using an AFM (atomic force microscope), the Al 2 O 3 phase and the YAG: It was confirmed that the step difference with the Ce phase was 0.003 ⁇ m.
- Comparative Example 1 of the ceramic composite for light conversion according to the present invention will be described.
- the disc-shaped sample after lapping manufactured according to the reference example was subjected to CMP processing in the same manner as in Example 1 except that dry etching processing was not performed, and the ceramic composite for light conversion according to Comparative Example 1 was obtained. Obtained. Thereafter, even if the processing time is further added, the step difference between the Al 2 O 3 phase and the YAG: Ce phase was not reduced.
- the surface shape and interphase step measurement of the ceramic composite for light conversion according to Comparative Example 1 after the CMP processing were performed using an AFM (atomic force microscope), an Al 2 O 3 phase and a YAG: Ce phase were measured. It was confirmed that the Al 2 O 3 phase was convex with respect to the YAG: Ce phase on the surface of the ceramic composite for light conversion according to Comparative Example 1.
- the shape of the surface of the ceramic composite for light conversion according to Comparative Example 1 is shown in FIG.
- Comparative Example 2 of the ceramic composite for light conversion according to the present invention will be described.
- the disk-shaped sample after lapping manufactured by the reference example dry etching is not performed, the unit load is 50 kPa, the content of diamond particles in the polishing liquid is 1% by mass, and the processing time is 360 minutes.
- MP processing was performed in the same manner as in Example 11 to produce a ceramic composite for light conversion according to Comparative Example 2.
- the surface shape of the ceramic composite for light conversion and the step difference between the phases according to Comparative Example 2 after MP processing were measured using an AFM (atomic force microscope), the Al 2 O 3 phase was compared with the YAG: Ce phase. It was confirmed that the phase difference between the Al 2 O 3 phase and the YAG: Ce phase was 0.011 ⁇ m.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Composite Materials (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Luminescent Compositions (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Led Device Packages (AREA)
- Ceramic Products (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12810625.9A EP2730369A1 (fr) | 2011-07-08 | 2012-07-06 | Procédé de production d'un composite de céramique pour photoconversion |
CN201280033953.7A CN103732354B (zh) | 2011-07-08 | 2012-07-06 | 光转换用陶瓷复合体的制造方法 |
KR1020147000337A KR20140051209A (ko) | 2011-07-08 | 2012-07-06 | 광변환용 세라믹 복합체의 제조방법 |
JP2013523932A JP5510614B2 (ja) | 2011-07-08 | 2012-07-06 | 光変換用セラミック複合体の製造方法 |
US14/131,057 US9334197B2 (en) | 2011-07-08 | 2012-07-06 | Method for producing ceramic composite for light conversion |
Applications Claiming Priority (2)
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JP2011152257 | 2011-07-08 | ||
JP2011-152257 | 2011-07-08 |
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WO2013008751A1 true WO2013008751A1 (fr) | 2013-01-17 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2012/067342 WO2013008751A1 (fr) | 2011-07-08 | 2012-07-06 | Procédé de production d'un composite de céramique pour photoconversion |
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Country | Link |
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US (1) | US9334197B2 (fr) |
EP (1) | EP2730369A1 (fr) |
JP (1) | JP5510614B2 (fr) |
KR (1) | KR20140051209A (fr) |
CN (1) | CN103732354B (fr) |
MY (1) | MY163271A (fr) |
TW (1) | TWI540764B (fr) |
WO (1) | WO2013008751A1 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015023291A (ja) * | 2013-07-22 | 2015-02-02 | 中国科学院福建物質構造研究所Fujian Institute Of Research On The Structure Of Matter, Chinese Academyof Sciences | GaN系LEDエピタキシャル構造およびその製造方法 |
JP2020029472A (ja) * | 2018-08-20 | 2020-02-27 | 株式会社ダイセル | 多結晶yag研磨用スラリー組成物 |
JP2021084849A (ja) * | 2019-11-29 | 2021-06-03 | 日亜化学工業株式会社 | セラミックス複合体の製造方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2012077599A1 (fr) * | 2010-12-10 | 2012-06-14 | 宇部興産株式会社 | Composite céramique de photoconversion et son procédé de fabrication |
JP2017107071A (ja) * | 2015-12-10 | 2017-06-15 | 日本電気硝子株式会社 | 波長変換部材及び波長変換素子、並びにそれらを用いた発光装置 |
CN108610023B (zh) | 2016-12-09 | 2021-07-23 | 深圳光峰科技股份有限公司 | 陶瓷复合材料的制备方法、陶瓷复合材料及波长转换器 |
US11011671B2 (en) | 2018-06-14 | 2021-05-18 | Nichia Corporation | Light emitting device |
CN108838745B (zh) * | 2018-06-27 | 2019-08-13 | 大连理工大学 | 一种钇铝石榴石晶体的高效化学机械抛光方法 |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07149597A (ja) | 1993-10-08 | 1995-06-13 | Ube Ind Ltd | セラミックス複合材料 |
JPH07187893A (ja) | 1993-11-12 | 1995-07-25 | Ube Ind Ltd | セラミックス複合材料 |
US5484752A (en) | 1993-11-12 | 1996-01-16 | Ube Industries, Ltd. | Ceramic composite material |
JPH0881257A (ja) | 1993-11-12 | 1996-03-26 | Ube Ind Ltd | セラミックス複合材料 |
JPH08253390A (ja) | 1995-01-19 | 1996-10-01 | Ube Ind Ltd | セラミックス複合材料 |
JPH08253389A (ja) | 1995-01-19 | 1996-10-01 | Ube Ind Ltd | セラミックス複合材料 |
JPH0967194A (ja) | 1995-01-19 | 1997-03-11 | Ube Ind Ltd | セラミックス複合材料 |
US5902963A (en) | 1996-09-18 | 1999-05-11 | Schneider Electric | High voltage insulator |
WO2004065324A1 (fr) | 2003-01-20 | 2004-08-05 | Ube Industries, Ltd. | Materiau composite ceramique pour conversion optique et utilisation associee |
JP2004335722A (ja) * | 2003-05-07 | 2004-11-25 | Rodel Nitta Co | 半導体ウェハ研磨用組成物 |
JP2006173433A (ja) | 2004-12-17 | 2006-06-29 | Ube Ind Ltd | 光変換用セラミック複合体およびそれを用いた発光装置 |
WO2007018222A1 (fr) | 2005-08-10 | 2007-02-15 | Ube Industries, Ltd. | Substrat pour diode électroluminescente et diode électroluminescente |
WO2007148829A1 (fr) * | 2006-06-22 | 2007-12-27 | Ube Industries, Ltd. | Composite pour la conversion de lumière, dispositif électroluminescent l'utilisant, et procédé de contrôle de la nuance de couleur |
WO2008041566A1 (fr) | 2006-09-25 | 2008-04-10 | Ube Industries, Ltd. | Composite céramique pour phototransformation et dispositif d'émission de lumière utilisant celui-ci |
JP2009297818A (ja) | 2008-06-11 | 2009-12-24 | Yamaguchi Seiken Kogyo Kk | サファイア基板用研磨液組成物、及びサファイア基板の研磨方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1246408C (zh) * | 2003-11-26 | 2006-03-22 | 中国科学院金属研究所 | 一种化学机械抛光液 |
US7320897B2 (en) * | 2005-03-23 | 2008-01-22 | Sharp Laboratories Of Amrica, Inc. | Electroluminescence device with nanotip diodes |
JP4957557B2 (ja) * | 2006-01-19 | 2012-06-20 | 宇部興産株式会社 | セラミックス複合体光変換部材およびそれを用いた発光装置 |
DE102006027306B4 (de) * | 2006-06-06 | 2013-10-17 | Schott Ag | Verfahren zur Herstellung einer Glaskeramik mit einer Granatphase und Verwendung der danach hergestellten Glaskeramik |
DE102006054330A1 (de) * | 2006-11-17 | 2008-05-21 | Merck Patent Gmbh | Leuchtstoffplättchen für LEDs aus strukturierten Folien |
CN101716745B (zh) * | 2009-11-09 | 2011-06-29 | 清华大学 | 一种超声辅助化学机械抛光蓝宝石衬底材料的装置及方法 |
WO2012077599A1 (fr) * | 2010-12-10 | 2012-06-14 | 宇部興産株式会社 | Composite céramique de photoconversion et son procédé de fabrication |
-
2012
- 2012-07-06 WO PCT/JP2012/067342 patent/WO2013008751A1/fr active Application Filing
- 2012-07-06 CN CN201280033953.7A patent/CN103732354B/zh not_active Expired - Fee Related
- 2012-07-06 EP EP12810625.9A patent/EP2730369A1/fr not_active Withdrawn
- 2012-07-06 KR KR1020147000337A patent/KR20140051209A/ko not_active Application Discontinuation
- 2012-07-06 MY MYPI2013702571A patent/MY163271A/en unknown
- 2012-07-06 US US14/131,057 patent/US9334197B2/en not_active Expired - Fee Related
- 2012-07-06 JP JP2013523932A patent/JP5510614B2/ja not_active Expired - Fee Related
- 2012-07-09 TW TW101124603A patent/TWI540764B/zh not_active IP Right Cessation
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07149597A (ja) | 1993-10-08 | 1995-06-13 | Ube Ind Ltd | セラミックス複合材料 |
US5569547A (en) | 1993-10-08 | 1996-10-29 | Ube Industries, Ltd. | Ceramic composite material |
JPH07187893A (ja) | 1993-11-12 | 1995-07-25 | Ube Ind Ltd | セラミックス複合材料 |
US5484752A (en) | 1993-11-12 | 1996-01-16 | Ube Industries, Ltd. | Ceramic composite material |
JPH0881257A (ja) | 1993-11-12 | 1996-03-26 | Ube Ind Ltd | セラミックス複合材料 |
JPH08253390A (ja) | 1995-01-19 | 1996-10-01 | Ube Ind Ltd | セラミックス複合材料 |
JPH08253389A (ja) | 1995-01-19 | 1996-10-01 | Ube Ind Ltd | セラミックス複合材料 |
JPH0967194A (ja) | 1995-01-19 | 1997-03-11 | Ube Ind Ltd | セラミックス複合材料 |
US5902963A (en) | 1996-09-18 | 1999-05-11 | Schneider Electric | High voltage insulator |
WO2004065324A1 (fr) | 2003-01-20 | 2004-08-05 | Ube Industries, Ltd. | Materiau composite ceramique pour conversion optique et utilisation associee |
JP2004335722A (ja) * | 2003-05-07 | 2004-11-25 | Rodel Nitta Co | 半導体ウェハ研磨用組成物 |
JP2006173433A (ja) | 2004-12-17 | 2006-06-29 | Ube Ind Ltd | 光変換用セラミック複合体およびそれを用いた発光装置 |
WO2007018222A1 (fr) | 2005-08-10 | 2007-02-15 | Ube Industries, Ltd. | Substrat pour diode électroluminescente et diode électroluminescente |
WO2007148829A1 (fr) * | 2006-06-22 | 2007-12-27 | Ube Industries, Ltd. | Composite pour la conversion de lumière, dispositif électroluminescent l'utilisant, et procédé de contrôle de la nuance de couleur |
WO2008041566A1 (fr) | 2006-09-25 | 2008-04-10 | Ube Industries, Ltd. | Composite céramique pour phototransformation et dispositif d'émission de lumière utilisant celui-ci |
JP2009297818A (ja) | 2008-06-11 | 2009-12-24 | Yamaguchi Seiken Kogyo Kk | サファイア基板用研磨液組成物、及びサファイア基板の研磨方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2730369A4 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015023291A (ja) * | 2013-07-22 | 2015-02-02 | 中国科学院福建物質構造研究所Fujian Institute Of Research On The Structure Of Matter, Chinese Academyof Sciences | GaN系LEDエピタキシャル構造およびその製造方法 |
JP2020029472A (ja) * | 2018-08-20 | 2020-02-27 | 株式会社ダイセル | 多結晶yag研磨用スラリー組成物 |
JP2021084849A (ja) * | 2019-11-29 | 2021-06-03 | 日亜化学工業株式会社 | セラミックス複合体の製造方法 |
US11498883B2 (en) | 2019-11-29 | 2022-11-15 | Nichia Corporation | Method for producing ceramic composite |
JP7335506B2 (ja) | 2019-11-29 | 2023-08-30 | 日亜化学工業株式会社 | セラミックス複合体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI540764B (zh) | 2016-07-01 |
CN103732354A (zh) | 2014-04-16 |
CN103732354B (zh) | 2016-05-25 |
MY163271A (en) | 2017-08-30 |
EP2730369A4 (fr) | 2014-05-14 |
JPWO2013008751A1 (ja) | 2015-02-23 |
US9334197B2 (en) | 2016-05-10 |
TW201308695A (zh) | 2013-02-16 |
JP5510614B2 (ja) | 2014-06-04 |
US20140138348A1 (en) | 2014-05-22 |
KR20140051209A (ko) | 2014-04-30 |
EP2730369A1 (fr) | 2014-05-14 |
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