WO2012144574A1 - 被覆切削工具 - Google Patents
被覆切削工具 Download PDFInfo
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- WO2012144574A1 WO2012144574A1 PCT/JP2012/060651 JP2012060651W WO2012144574A1 WO 2012144574 A1 WO2012144574 A1 WO 2012144574A1 JP 2012060651 W JP2012060651 W JP 2012060651W WO 2012144574 A1 WO2012144574 A1 WO 2012144574A1
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- film
- cutting tool
- coated cutting
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- tool according
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
Definitions
- the present invention relates to a coated cutting tool which has excellent chipping resistance and wear resistance, and has excellent wear resistance even when used for milling and interrupted cutting as well as continuous cutting of, for example, steel and cast iron. .
- the conventional technology of coated cutting tools is composed of two or more alternating layers of titanium nitride and titanium carbonitride layers with an average layer thickness of 3 to 10 ⁇ m and a granular crystal structure on the surface of a tungsten carbide base cemented carbide substrate. And a surface-coated tungsten carbide based cemented carbide cutting tool in which at least one of the titanium carbonitride layers has a vertically elongated crystal structure (see, for example, Patent Document 1).
- the tool edge position was frequently corrected in order to correct deviations in the machining dimensions of the work material.
- the correction of the tool edge position lowers the machining efficiency, there has been a demand for a cutting tool that is less likely to cause the tool edge position to be retracted than before.
- an object of the present invention is to provide a coated cutting tool having excellent wear resistance and chipping resistance, in which the tool tip position is not easily retracted due to wear or chipping.
- the present inventor conducted research and development to reduce the wear of the coated cutting tool and the retraction of the tool edge position due to chipping.
- TiN having an average film thickness of 10 to 300 nm was formed on the surface of the cemented carbide substrate by chemical vapor deposition.
- the tool edge position is prevented from retreating due to wear or chipping, thereby suppressing changes in the machining dimensions of the work material. Therefore, the number of times of correcting the tool edge position, which has been performed in order to suppress the change in the machining dimension, is reduced.
- the gist of the present invention is as follows. (1) A coated cutting tool comprising a cemented carbide substrate and a coating formed on the surface of the substrate by chemical vapor deposition, wherein the coating has an average film thickness of 3 to 20 ⁇ m, A lower film having an average film thickness of 2 to 15 ⁇ m formed on the surface of the base material, and an upper film having an average film thickness of 1 to 10 ⁇ m formed on the surface of the lower film opposite to the surface in contact with the base material The lower film has an alternately laminated film in which TiN films having an average film thickness of 10 to 300 nm and TiCN films having an average film thickness of 0.1 to 0.5 ⁇ m are alternately laminated. Coated cutting tool having an aluminum oxide film.
- At least the upper film is selected from the group consisting of Ti carbide, Ti carbonate, Ti carbonitride oxide, carbonate containing Ti and Al, and carbonitride oxide containing Ti and Al.
- the coated cutting tool according to (1) comprising an intermediate film made of one type of metal compound, and the intermediate film is in contact with the lower film.
- the coated cutting tool of the present invention exhibits excellent wear resistance and chipping resistance.
- the coated cutting tool of the present invention is used, in the cutting apparatus to which the tool is attached, the tool edge position is prevented from retreating due to wear or chipping, and the machining dimension of the work material is unlikely to change. This leads to an improvement in the productivity of various processed products.
- the coated cutting tool of the present invention includes a cemented carbide substrate and a coating formed on the surface of the cemented carbide substrate by chemical vapor deposition.
- the cemented carbide substrate is, for example, selected from the group consisting of WC and carbides, nitrides, carbonitrides, and mutual solid solutions of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, or W. It is a cemented carbide obtained by sintering a mixed powder of at least one kind of hard phase forming powder and Co binder phase forming powder.
- the cemented carbide thus obtained includes a WC hard phase and a Co-based binder phase, or a WC hard phase and Ti, Zr, Hf, V, Nb, Ta, Cr, Mo or It is comprised by the hard phase which consists of at least 1 sort (s) chosen from the group which consists of the carbide
- a hard phase ( ⁇ phase) consisting of at least one selected from the group consisting of mutual solid solutions and a binder phase containing Co as a main component
- a hard phase of WC and Co When a ⁇ -free layer composed of a binder phase containing as a main component is formed, the coated cutting tool of the present invention exhibits excellent toughness and is excellent over a long period of use without occurrence of uneven wear, fracture, etc. Demonstrate wear resistance.
- the average thickness of the de- ⁇ layer is preferably 1 to 30 ⁇ m, and among them, the average thickness of the de- ⁇ layer is more preferably 5 to 25 ⁇ m from the viewpoint of improving the fracture resistance.
- the thickness of the cemented carbide substrate described above is not particularly limited, but is usually 1 to 120 mm.
- the coating film constituting the coated cutting tool of the present invention is formed by chemical vapor deposition.
- the adhesion strength between the substrate and the coating can be increased. This is presumably because the temperature of the chemical vapor deposition method is high and diffusion of the cemented carbide base material component occurs at the interface between the base material and the coating. Therefore, when the coating film is formed by the chemical vapor deposition method, a coated cutting tool having excellent peeling resistance and chipping resistance can be obtained as compared with the case of forming by the physical vapor deposition method.
- the average film thickness of the coating film constituting the coated cutting tool of the present invention is less than 3 ⁇ m, the wear resistance of the coated cutting tool is lowered, whereas when it exceeds 20 ⁇ m, the cutting edge is likely to be chipped. Therefore, in the present invention, the average film thickness is 3 to 20 ⁇ m.
- the average film thickness is obtained as an average value obtained by measuring the thickness at any five locations from the cross section of the film using a transmission electron microscope. The same applies hereinafter.
- the average film thickness of the coating is preferably 3.5 to 18 ⁇ m.
- the coating is composed of a lower film and an upper film, and the lower film is formed on the surface of the cemented carbide substrate by chemical vapor deposition.
- the average film thickness of the lower film is set to 2 to 15 ⁇ m.
- the average film thickness of the lower film is preferably 2 to 13 ⁇ m.
- Such a lower film has an alternately laminated film in which TiN films having an average film thickness of 10 to 300 nm and TiCN films having an average film thickness of 0.1 to 0.5 ⁇ m are alternately laminated. Since the TiN film is excellent in toughness and the TiCN film is excellent in wear resistance, both the toughness and wear resistance of the coated cutting tool of the present invention can be improved by using these alternate laminated films.
- the average film thickness of the alternately laminated TiN film is set to 10 to 300 nm. From the viewpoint of wear resistance of the coated cutting tool, the average thickness of the TiN film is preferably 10 to 250 nm.
- the average film thickness of the TiCN film in the alternate laminated film is set to 0.1 to 0.5 ⁇ m.
- the average film thickness of the TiCN film is preferably 0.15 to 0.4 ⁇ m.
- the average film thickness of the entire alternating laminated film formed by alternately laminating the TiN film and the TiCN film described above is less than 2 ⁇ m, the wear resistance of the coated cutting tool of the present invention is lowered, while the average film thickness is 15 ⁇ m. If it exceeds 1, chipping starting from peeling of the film tends to occur. For this reason, the average film thickness of the entire alternate laminated film is preferably 2 to 15 ⁇ m.
- the number of TiN films and TiCN films in the alternately laminated film is usually 4 to 120 layers, preferably 10 to 100 layers, from the viewpoint of wear resistance of the coated cutting tool of the present invention.
- the number of stacked layers indicates how many layers are present when the TiN film is counted as one layer and the TiCN film is counted as one layer.
- either the TiN film or the TiCN film may be in contact with the base material.
- the TiN film is preferably in contact with the substrate.
- an upper film is formed on the lower film.
- either the TiN film or the TiCN film may be in contact with the upper film. From the viewpoint of adhesion, it is preferable that the TiCN film is in contact with the upper film.
- the hardness of the alternating laminated film exceeds 40 GPa, the toughness of the alternating laminated film is lowered, and there is a tendency that chipping starting from the peeling of the alternating laminated film tends to occur.
- the hardness of the alternately laminated film is low and less than 28 GPa, the wear resistance of the coated cutting tool of the present invention tends to be lowered. Therefore, the hardness of the alternately laminated film is preferably 28 GPa to 40 GPa.
- the hardness of the alternating laminated film can be adjusted by the average film thickness of the TiN film and the TiCN film of the alternating laminated film. Specifically, the hardness of the alternately laminated film can be increased by reducing the average film thickness of each of the TiN film and the TiCN film. Note that the hardness of the alternating laminated film is such that the surface of the alternating laminated film obtained by removing the film (upper film etc.) coated on the surface side of the alternating laminated film by polishing in the coated cutting tool according to the present invention It can be measured by applying an indenter.
- the thermal expansion coefficient of the alternating laminated film is larger than the thermal expansion coefficient of the cemented carbide base material, tensile residual stress is generated in the alternating laminated film when the coated cutting tool of the present invention is manufactured. Furthermore, since TiN and TiCN have different thermal expansion coefficients, the tensile residual stress of the TiN film and the tensile residual stress of the TiCN film are different.
- the tensile residual stress of the TiCN film of the alternately laminated film of the present invention is preferably 400 MPa or less.
- the tensile residual stress of the TiCN film is usually 100 MPa to 600 MPa.
- the tensile residual stress of the TiCN film of the alternately laminated film can be measured by a conventionally known sin 2 ⁇ method of X-ray diffraction measurement. Further, the Young's modulus of the TiCN film necessary for calculating the tensile residual stress by the sin 2 ⁇ method is measured with a dynamic hardness meter or the like. The PoCN ratio of the TiCN film is 0.2. Note that a TiCN film not included in the alternating laminated film is formed on the side closer to the surface opposite to the base material in the coated cutting tool of the present invention than the alternating laminated film, and the TiCN film in the alternating laminated film is pulled. If the residual stress cannot be measured, the TiCN film not included in the alternate laminated film may be removed by polishing or the like.
- an TiN film having an average film thickness of 10 to 300 nm and an TiCN film having an average film thickness of 0.1 to 0.5 ⁇ m are alternately stacked. What is necessary is just composition.
- ⁇ Upper membrane> An upper film is formed on the surface of the lower film constituting the coated cutting tool of the present invention on the side opposite to the surface in contact with the cemented carbide substrate. Since the upper film of the present invention has an aluminum oxide film, the crater wear resistance of the coated cutting tool is improved.
- the average film thickness of the upper film is set to 1 to 10 ⁇ m.
- the crystal type of the aluminum oxide film in the upper film is not particularly limited such as ⁇ -type, ⁇ -type, and ⁇ -type, but is preferably ⁇ -type that is stable at high temperatures.
- ⁇ -type such as high-speed cutting of carbon steel or alloy steel
- ⁇ -type aluminum oxide film
- chipping and chipping hardly occur.
- the average thickness of the aluminum oxide film is preferably 0.5 to 10 ⁇ m, and more preferably 0.5 to 8 ⁇ m.
- the coated cutting tool of the present invention comprises Ti carbide, Ti carbonate, Ti carbonitride, carbonate containing Ti and Al, and carbonitride oxidation containing Ti and Al as the layers constituting the upper film. It is preferable that an intermediate film made of at least one metal compound selected from the group consisting of materials is provided, and the intermediate film is in contact with the lower film.
- the intermediate film having such a structure When the intermediate film having such a structure is present, the adhesion between the lower film and the upper film is improved.
- the average film thickness of the intermediate film is usually 0.1 to 2 ⁇ m, more preferably 0.3 to 1.0 ⁇ m.
- the intermediate film may be a plurality of laminated films made of the various metal compounds mentioned above.
- the intermediate film include a film made of TiC, TiCO, TiCNO, TiAlCO, or TiAlCNO.
- a film made of oxycarbonitride containing Ti and Al is more preferable.
- TiAlCNO can be cited as an intermediate film made of oxycarbonitride containing Ti and Al.
- the aluminum oxide film is more preferable because the adhesion between the film and the lower film is improved.
- the surface film may be a laminated film of a film made of Ti carbonitride and a film made of Ti nitride. Moreover, the formation method of this surface film is well-known, and various well-known conditions of chemical vapor deposition are employable. The average film thickness of such a surface film is usually 0.1 to 5 ⁇ m.
- the TiN film constituting the alternate laminated film of the lower film has a raw material gas composition of TiCl 4 : 5.0 to 10.0 mol%, N 2 : 20 to 60 mol%, H 2 : remaining, temperature: 850 to 920 ° C., It can be formed by chemical vapor deposition with a pressure of 100 to 350 hPa.
- the TiCN film constituting the alternately laminated film has a raw material gas composition of TiCl 4 : 10 to 15 mol%, CH 3 CN: 1 to 3 mol%, N 2 : 0 to 20 mol%, H 2 : remaining, temperature: 850 It can be formed by a chemical vapor deposition method at ⁇ 920 ° C. and pressure: 60 ⁇ 100 hPa.
- the ⁇ -type aluminum oxide film in the upper film has a raw material gas composition of AlCl 3 : 2.1 to 5.0 mol%, CO 2 : 2.5 to 4.0 mol%, HCl: 2.0 to 3.0 mol%, It can be formed by chemical vapor deposition using H 2 S: 0.28 to 0.45 mol%, H 2 : remaining, temperature: 900 to 1000 ° C., pressure: 60 to 80 hPa.
- the ⁇ -type aluminum oxide film has a raw material gas composition of AlCl 3 : 2.0 to 5.0 mol%, CO 2 : 4.2 to 6.0 mol%, CO: 3.0 to 6.0 mol%, HCl: 3.5 to 5.0 mol%, H 2 S: 0.3 to 0.5 mol%, H 2 : remaining, temperature: 900 to 1020 ° C., pressure: 60 to 80 hPa, formed by chemical vapor deposition. it can.
- a TiAlCNO film, a TiC film, a TiCO film, a TiCNO film, and a TiAlCO film, which are examples of the intermediate film, can be formed as follows.
- the TiAlCNO film has a raw material gas composition of TiCl 4 : 3.0 to 5.0 mol%, AlCl 3 : 1.0 to 2.0 mol%, CO: 0.4 to 1.0 mol%, N 2 : 30 to 40 mol%. , H 2 : the remainder, temperature: 975 to 1025 ° C., pressure: 90 to 110 hPa.
- the TiC film has a raw material gas composition of TiCl 4 : 1.0 to 3.0 mol%, CH 4 : 4.0 to 6.0 mol%, H 2 : remaining, temperature: 990 to 1030 ° C., pressure: 50 to It can be formed by a chemical vapor deposition method of 100 hPa.
- the TiCO film has a raw material gas composition of TiCl 4 : 1.2 to 3.2 mol%, CO: 3.0 to 5.0 mol%, H 2 : remaining, temperature: 960 to 1025 ° C., pressure: 170 to 210 hPa. It can be formed by the chemical vapor deposition method.
- the TiAlCO film has a raw material gas composition of TiCl 4 : 0.5 to 1.5 mol%, AlCl 3 : 3.0 to 5.0 mol%, CO: 2.0 to 4.0 mol%, H 2 : remaining, It can be formed by a chemical vapor deposition method at a temperature of 975 to 1025 ° C. and a pressure of 60 to 100 hPa.
- the surface of the coated cutting tool more specifically, the surface in contact with the lower film of the upper film in the tool is adjusted by adjusting the surface roughness of the cemented carbide substrate constituting the coated cutting tool of the present invention and the conditions for forming the film. It is possible to adjust the arithmetic average roughness Ra of the surface on the opposite side. Thereby, welding of the work material to a covering cutting tool can be controlled.
- the arithmetic average roughness Ra of the surface of the coated cutting tool is usually 0.03 to 0.5 ⁇ m, preferably 0.03 to 0.3 ⁇ m.
- the surface of the coated cutting tool is subjected to a surface treatment such as a grinding treatment with a grindstone or a polishing treatment with a wet blast to adjust the arithmetic average roughness Ra of the surface of the coated cutting tool to 0.03 to 0.3 ⁇ m. It is also preferable to do this.
- the arithmetic average roughness Ra is measured according to JIS B0601 (2001).
- a WC— (Ti, W, Ta, Nb) (C, N) —Co cemented carbide was obtained by sintering a mixed powder comprising Co powder having an average particle size of 1.5 ⁇ m: 7% by weight.
- the cemented carbide was processed into an ISO standard CNMG120212-shaped insert to obtain a cemented carbide substrate.
- a de- ⁇ layer composed of WC and Co was formed near the surface of the cemented carbide substrate.
- the average thickness of the de- ⁇ layer on the flank face of the cemented carbide substrate was 15 ⁇ m.
- a film having a film configuration shown in Table 1 below was formed on this cemented carbide substrate by chemical vapor deposition (excluding comparative product 10).
- the TiN film in the alternately laminated film is in contact with the cemented carbide substrate, the TiCN film in the alternately laminated film is in contact with the intermediate film, the intermediate film is in contact with the aluminum oxide film, and the aluminum oxide A TiCN film and / or a TiN film as a surface film are laminated in this order on the surface of the film opposite to the surface in contact with the intermediate film.
- the number of laminated layers in the alternately laminated film represents how many layers are formed in total when counting one TiN film and one TiCN film.
- the alternately laminated TiN films were formed under the conditions that the raw material gas composition was TiCl 4 : 9.0 mol%, N 2 : 40 mol%, H 2 : remaining, temperature: 900 ° C., and pressure: 160 hPa.
- TiCN film of alternate lamination film a raw material gas composition TiCl 4: 10.8mol%, CH 3 CN: 1.3mol%, N 2: 13.5mol%, H 2: the remainder, temperature: 900 ° C., pressure: The film was formed under the condition of 90 hPa.
- TiN films and TiCN films were alternately laminated until the predetermined number of layers was reached under these coating conditions. Note that the lower film of the invention product and the comparative product is composed only of alternating laminated films.
- the TiAlCNO film of the intermediate film has a raw material gas composition of TiCl 4 : 4.0 mol%, AlCl 3 : 1.2 mol%, CO: 0.6 mol%, N 2 : 34 mol%, H 2 : remaining, temperature: 1000 ° C. And pressure: 100 hPa.
- the ⁇ -type aluminum oxide film of the upper film has a raw material gas composition of AlCl 3 : 2.3 mol%, CO 2 : 3.6 mol%, HCl: 2.0 mol%, H 2 S: 0.3 mol%, H 2 : remaining And a temperature: 1000 ° C. and a pressure: 70 hPa.
- the upper film of ⁇ -type aluminum oxide film (Invention 8) has a raw material gas composition of AlCl 3 : 2.5 mol%, CO 2 : 4.5 mol%, CO: 4.4 mol%, HCl: 4.0 mol%, H 2 S: 0.4 mol%, H 2 : The rest, temperature: 1000 ° C., pressure: 70 hPa.
- the upper TiCN film is composed of TiCl 4 : 7.3 mol%, N 2 : 11.6 mol%, CH 3 CN: 1.2 mol%, H 2 : remaining, temperature: 1000 ° C., pressure: 90 hPa.
- the film was formed under the following conditions.
- the upper TiN film was formed under the conditions that the source gas composition was TiCl 4 : 9.0 mol%, N 2 : 40 mol%, H 2 : remaining, temperature: 1000 ° C., and pressure: 160 hPa.
- Comparative product 10 a TiAlN film was formed by physical vapor deposition, but the cutting performance could not be evaluated because the TiAlN film was peeled off from the cemented carbide substrate before the cutting test was performed with the cutting edge of the coated cutting tool. Further, the measurement of the arithmetic average roughness Ra and the like of the sample surface shown below was not performed. The reason why the TiAlN film naturally peeled before the cutting test is considered to be that the adhesion strength between the TiAlN film and the substrate was not sufficient and the compressive residual stress of the TiAlN film was very high.
- the tensile residual stress of the TiCN film in the alternately laminated film was measured by the sin 2 ⁇ method using an X-ray diffractometer (RINT-TTRIII) manufactured by RIGAKU.
- the composition of the coating was measured with an energy dispersive X-ray analyzer attached to a transmission electron microscope. Moreover, when the average film thickness (average value of 5 places) of each film was measured from the cross section of the film using a transmission electron microscope, all showed the same value as the target film thickness (value shown in Table 1). . Furthermore, when the crystal form of the aluminum oxide film was examined using an X-ray diffractometer, the target crystal form (shown in Table 1) was obtained in all cases.
- flank wear width was measured to check for chipping.
- the cutting test was performed twice. Table 3 below shows the average flank wear width of the sample and the number of samples with chipping.
- the inventive product (the coated cutting tool of the present invention) is superior in wear resistance and chipping resistance to the comparative product.
- the comparative product has an average value of the flank wear width of 0.25 mm or more, and is less wear resistant than the invention product.
- the comparative products 3 and 6 to 9 in which chipping occurred have an average value of the flank wear width of 0.54 mm or more, and it can be seen that the wear resistance is particularly low.
- the coated cutting tool of the present invention When the coated cutting tool of the present invention is used for cutting, the tool cutting edge position is prevented from retreating due to chipping or wear in the cutting apparatus to which the tool is attached. Therefore, according to the present invention, it is possible to reduce the change in the machining dimension of the work material and the number of times of correction work of the tool edge position that has been frequently performed in the past in order to suppress the change, thereby improving machining productivity. Leads to.
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Abstract
Description
(1)超硬合金基材と、該基材の表面に化学蒸着法によって形成された被膜とを備える被覆切削工具であって、前記被膜の平均膜厚は3~20μmであり、該被膜は、前記基材の表面に形成された平均膜厚2~15μmの下部膜と、該下部膜の前記基材と接する面とは反対側の表面に形成された平均膜厚1~10μmの上部膜とから構成され、前記下部膜は、平均膜厚10~300nmのTiN膜と平均膜厚0.1~0.5μmのTiCN膜とを交互に積層した交互積層膜を有し、前記上部膜は酸化アルミニウム膜を有する被覆切削工具。
(2)前記上部膜が、Tiの炭化物、Tiの炭酸化物、Tiの炭窒酸化物、TiとAlとを含む炭酸化物及びTiとAlとを含む炭窒酸化物からなる群より選ばれる少なくとも1種の金属化合物からなる中間膜を備え、該中間膜が前記下部膜に接している(1)に記載の被覆切削工具。
(3)前記交互積層膜の硬度が28GPa~40GPaである(1)または(2)に記載の被覆切削工具。
(4)前記交互積層膜中のTiCN膜のX線回折測定のsin2Ψ法により測定した引張残留応力が400MPa以下である(1)~(3)のいずれかに記載の被覆切削工具。
(5)前記酸化アルミニウム膜がα型酸化アルミニウム膜である(1)~(4)のいずれかに記載の被覆切削工具。
(6)前記被覆切削工具において、前記上部膜の前記下部膜と接する面と反対側の表面の算術平均粗さRaが、0.03~0.3μmである(1)~(5)のいずれかに記載の被覆切削工具。
(7)前記被膜の平均膜厚が3.5~18μmである(1)~(6)のいずれかに記載の被覆切削工具。
(8)前記下部膜の平均膜厚が2~13μmである(1)~(7)のいずれかに記載の被覆切削工具。
(9)前記交互積層膜中のTiN膜の平均膜厚が10~250nmである(1)~(8)のいずれかに記載の被覆切削工具。
(10)前記交互積層膜中のTiCN膜の平均膜厚が0.15~0.4μmである(1)~(9)のいずれかに記載の被覆切削工具。
(11)前記交互積層膜の平均膜厚が2~15μmである(1)~(10)のいずれかに記載の被覆切削工具。
(12)前記交互積層膜におけるTiN膜及びTiCN膜の積層数が4~120層である(1)~(11)のいずれかに記載の被覆切削工具。
(13)前記中間膜の平均膜厚が0.1~2μmである(2)~(12)のいずれかに記載の被覆切削工具。
(14)前記中間膜が、TiC、TiCO、TiCNO、TiAlCO又はTiAlCNOからなる膜である(2)~(13)のいずれかに記載の被覆切削工具。
本発明の被覆切削工具は、超硬合金基材と、化学蒸着法によって当該超硬合金基材の表面に形成された被膜とを備える。
前記超硬合金基材は、例えば、WCおよび、Ti、Zr、Hf、V、Nb、Ta、Cr、MoもしくはWの炭化物、窒化物、炭窒化物ならびにこれらの相互固溶体からなる群より選ばれる少なくとも1種からなる硬質相形成粉末と、Coの結合相形成粉末との混合粉末を焼結して得られる超硬合金である。
本発明の被覆切削工具を構成する被膜は化学蒸着法によって形成される。化学蒸着法によって形成すると、前記基材と被膜との密着強度を高くすることができる。これは、化学蒸着法の温度が高く、前記基材と被膜との界面で超硬合金基材成分の拡散が生じるためと考えられる。そのため前記被膜を化学蒸着法によって形成すると、物理蒸着法で形成した場合に比べて耐剥離性および耐チッピング性に優れた被覆切削工具が得られる。
前記被膜は下部膜と上部膜とから構成されるが、該下部膜は超硬合金基材の表面に化学蒸着法によって形成される。前記下部膜の平均膜厚は、2μm未満であると被覆切削工具の耐摩耗性が低下し、15μmを超えると被膜の剥離を起点としたチッピングが発生しやすくなる。そのため本発明においては、前記下部膜の平均膜厚を2~15μmとする。
このような下部膜は、平均膜厚10~300nmのTiN膜と平均膜厚0.1~0.5μmのTiCN膜とを交互に積層した交互積層膜を有する。TiN膜は靭性に優れ、TiCN膜は耐摩耗性に優れるので、これらの交互積層膜を使用することで、本発明の被覆切削工具の靭性及び耐摩耗性の両方を向上させることができる。
本発明の被覆切削工具を構成する下部膜の、超硬合金基材と接する面と反対側の表面には、上部膜が形成されている。本発明の上部膜は酸化アルミニウム膜を有するので、被覆切削工具の耐クレーター摩耗性が向上する。
本発明の被覆切削工具は、上部膜を構成する層として、Tiの炭化物、Tiの炭酸化物、Tiの炭窒酸化物、TiとAlとを含む炭酸化物及びTiとAlとを含む炭窒酸化物からなる群より選ばれる少なくとも1種の金属化合物からなる中間膜を備え、当該中間膜が上記下部膜に接していることが好ましい。
また、被覆切削工具の使用コーナーの識別を容易にするために、酸化アルミニウム膜の中間膜と接する面と反対側の表面に、Tiの炭窒化物及び窒化物からなる群より選ばれる少なくとも1種からなる表面膜を形成すると、さらに好ましい。
本発明の被覆切削工具における被膜を構成する各膜の製造方法として、例えば、以下の方法を挙げることができる。
本発明の被覆切削工具を構成する超硬合金基材の表面粗さと被膜の形成条件とを調整して、被覆切削工具の表面、より具体的には当該工具における上部膜の下部膜と接する面と反対側の表面の算術平均粗さRaを調整することができる。これにより、被覆切削工具への被削材の溶着を抑制することができる
平均粒径4.5μmのWC粉:89重量%と、平均粒径1.5μmのTiCN粉:2重量%と、平均粒径1.5μmの(Ta,Nb)C粉:2重量%と、平均粒径1.5μmのCo粉:7重量%とからなる混合粉末を焼結してWC-(Ti,W,Ta,Nb)(C,N)-Co系超硬合金を得た。
*得られた被膜において、交互積層膜中のTiN膜が超硬合金基材と接し、前記交互積層膜中のTiCN膜が中間膜と接し、該中間膜は酸化アルミニウム膜と接し、該酸化アルミニウム膜の中間膜と接する面と反対側の面に、表面膜であるTiCN膜および/またはTiN膜がこの順に積層されている。
以上の化学蒸着法で得られた被覆切削工具試料表面(上部膜の下部膜と接する面と反対側の表面)の算術平均粗さRaを、Mitutoyo製の表面性状測定機(SURFPAK-SV)を用いて測定した。
切削試験として、1試料当たり2個のサンプルを用意し、直径120mm×長さ400mmの円柱状のS53C(硬さ:HB270)を被削材として使用して、下記の切削条件で端面切削を行った。
切削速度:200m/min、
切込み:2mm、
送り:0.3mm/rev、
切削雰囲気:湿式(水溶性エマルジョン使用)、
1回の切削時間:15min、
試験回数:2回
Claims (14)
- 超硬合金基材と、該基材の表面に化学蒸着法によって形成された被膜とを備える被覆切削工具であって、
前記被膜の平均膜厚は3~20μmであり、該被膜は、前記基材の表面に形成された平均膜厚2~15μmの下部膜と、該下部膜の前記基材と接する面とは反対側の表面に形成された平均膜厚1~10μmの上部膜とから構成され、
前記下部膜は、平均膜厚10~300nmのTiN膜と平均膜厚0.1~0.5μmのTiCN膜とを交互に積層した交互積層膜を有し、
前記上部膜は酸化アルミニウム膜を有する被覆切削工具。 - 前記上部膜が、Tiの炭化物、Tiの炭酸化物、Tiの炭窒酸化物、TiとAlとを含む炭酸化物及びTiとAlとを含む炭窒酸化物からなる群より選ばれる少なくとも1種の金属化合物からなる中間膜を備え、
該中間膜が前記下部膜に接している請求項1に記載の被覆切削工具。 - 前記交互積層膜の硬度が28GPa~40GPaである請求項1または2に記載の被覆切削工具。
- 前記交互積層膜中のTiCN膜のX線回折測定のsin2Ψ法により測定した引張残留応力が400MPa以下である請求項1~3のいずれか1項に記載の被覆切削工具。
- 前記酸化アルミニウム膜がα型酸化アルミニウム膜である請求項1~4のいずれか1項に記載の被覆切削工具。
- 前記被覆切削工具において、前記上部膜の前記下部膜と接する面と反対側の表面の算術平均粗さRaが、0.03~0.3μmである請求項1~5のいずれか1項に記載の被覆切削工具。
- 前記被膜の平均膜厚が3.5~18μmである請求項1~6のいずれか1項に記載の被覆切削工具。
- 前記下部膜の平均膜厚が2~13μmである請求項1~7のいずれか1項に記載の被覆切削工具。
- 前記交互積層膜中のTiN膜の平均膜厚が10~250nmである請求項1~8のいずれか1項に記載の被覆切削工具。
- 前記交互積層膜中のTiCN膜の平均膜厚が0.15~0.4μmである請求項1~9のいずれか1項に記載の被覆切削工具。
- 前記交互積層膜の平均膜厚が2~15μmである請求項1~10のいずれか1項に記載の被覆切削工具。
- 前記交互積層膜におけるTiN膜及びTiCN膜の積層数が4~120層である請求項1~11のいずれか1項に記載の被覆切削工具。
- 前記中間膜の平均膜厚が0.1~2μmである請求項2~12のいずれか1項に記載の被覆切削工具。
- 前記中間膜が、TiC、TiCO、TiCNO、TiAlCO又はTiAlCNOからなる膜である請求項2~13のいずれか1項に記載の被覆切削工具。
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CN104884200A (zh) * | 2012-12-28 | 2015-09-02 | 住友电工硬质合金株式会社 | 表面被覆部件及其制造方法 |
EP2939769A4 (en) * | 2012-12-28 | 2016-08-03 | Sumitomo Elec Hardmetal Corp | SURFACE COATING ELEMENT AND METHOD FOR MANUFACTURING THE SAME |
US9777367B2 (en) | 2012-12-28 | 2017-10-03 | Sumitomo Electric Hardmetal Corp. | Surface coated member and method for manufacturing same |
WO2015098393A1 (ja) * | 2013-12-26 | 2015-07-02 | 住友電工ハードメタル株式会社 | 切削工具 |
JP2015123530A (ja) * | 2013-12-26 | 2015-07-06 | 住友電工ハードメタル株式会社 | 切削工具 |
US9884790B2 (en) | 2013-12-26 | 2018-02-06 | Sumitomo Electric Hardmetal Corp. | Cutting tool |
JP2015168047A (ja) * | 2014-03-11 | 2015-09-28 | 三菱日立ツール株式会社 | 被覆切削工具およびNi基超耐熱合金の切削方法 |
JPWO2015147241A1 (ja) * | 2014-03-27 | 2017-04-13 | 株式会社タンガロイ | 被覆工具 |
Also Published As
Publication number | Publication date |
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EP2700460A1 (en) | 2014-02-26 |
US20140044946A1 (en) | 2014-02-13 |
EP2700460A4 (en) | 2014-11-19 |
JP5679048B2 (ja) | 2015-03-04 |
JPWO2012144574A1 (ja) | 2014-07-28 |
EP2700460B1 (en) | 2018-11-07 |
US9199311B2 (en) | 2015-12-01 |
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