WO2012133776A1 - 金属系粒子集合体 - Google Patents
金属系粒子集合体 Download PDFInfo
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- WO2012133776A1 WO2012133776A1 PCT/JP2012/058597 JP2012058597W WO2012133776A1 WO 2012133776 A1 WO2012133776 A1 WO 2012133776A1 JP 2012058597 W JP2012058597 W JP 2012058597W WO 2012133776 A1 WO2012133776 A1 WO 2012133776A1
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- metal
- particle assembly
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Images
Classifications
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- G02B5/008—Surface plasmon devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
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- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/056—Submicron particles having a size above 100 nm up to 300 nm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/148—Agglomerating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/055—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means where light is absorbed and re-emitted at a different wavelength by the optical element directly associated or integrated with the PV cell, e.g. by using luminescent material, fluorescent concentrators or up-conversion arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
- H05B33/24—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers of metallic reflective layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
-
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Definitions
- Plasmon is a free-electron rough wave generated by collective oscillation of free electrons in a metal nanostructure.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2007-139540
- Patent Document 2 Japanese Patent Application Laid-Open No. 08-271431
- Patent Document 3 International Publication No. 2005/033335
- Patent Document 3 utilize the localized plasmon resonance phenomenon.
- a technique for enhancing fluorescence is disclosed.
- T. Fukuura and M. Kawasaki “Long Range Enhancement of Molecular Fluorescence by Closely Packed Submicro-scale Ag Islands”, e-Journal of Surface Science and Nanotechnology, 2009, 7, 653
- Non-Patent Document 1 Studies on localized plasmon resonance by silver nanoparticles are shown.
- JP 2007-139540 A Japanese Patent Application Laid-Open No. 08-271431 International Publication No. 2005/033335
- the distance between the metal nanoparticle and the molecule to be excited is within a range where energy transfer by the Dexter mechanism, which is direct electron transfer, does not occur. It is required that energy transfer Rusuta mechanism is within the range expressed (1nm ⁇ 10nm). This is because the occurrence of the luminescence-induced dipole is based on Förster energy transfer theory (see Non-Patent Document 1 above).
- a light-emitting element or a photoelectric conversion element usually has an active layer (for example, a light-emitting layer of a light-emitting element or a light absorption layer of a photoelectric conversion element) having a thickness of several tens of nm or more. Even if it can be arranged close to or in the active layer, the direct enhancement effect by localized plasmon resonance can be obtained only in a small part of the active layer.
- the present invention has been made in view of the above problems, and an object thereof is to provide a novel plasmon material (plasmonic material) that exhibits extremely strong plasmon resonance and whose plasmon resonance action range is extended to a very long distance. There is to do.
- plasmonic material plasmonic material
- the present invention includes the following.
- a particle aggregate in which 30 or more metal particles are two-dimensionally arranged apart from each other,
- the metal-based particles have an average particle diameter in the range of 200 to 1600 nm, an average height in the range of 55 to 500 nm, and an aspect ratio defined by a ratio of the average particle diameter to the average height of 1 to 8 In the range of
- the metal-based particles are arranged such that the average distance between the metal-based particles and the adjacent metal-based particles is within a range of 1 to 150 nm.
- a metal-based particle assembly film multilayer substrate comprising a substrate and a film made of the metal-based particle assembly according to any one of [1] to [4], which is stacked on the substrate.
- the metal-based particle assembly and the metal-based particle assembly film-laminated substrate of the present invention exhibit extremely strong plasmon resonance as compared with conventional plasmon materials, and the range of action of plasmon resonance (the range in which the plasmon enhances) Is significantly elongated.
- Such metal-based particle assembly and metal-based particle assembly film laminated substrate of the present invention are extremely useful as an enhancement element for optical elements including light-emitting elements, photoelectric conversion elements (solar cell elements), and the like. Luminous efficiency and conversion efficiency can be significantly improved.
- FIG. 6 is an SEM image (10,000 times scale) when the metal-based particle assembly film in the metal-based particle assembly film laminated substrate obtained in Comparative Example 3-1 is viewed from directly above.
- 3 is an AFM image of a metal-based particle assembly film in a metal-based particle assembly film laminated substrate obtained in Comparative Example 3-1.
- FIG. 6 is an absorption spectrum of the metal-based particle assembly film laminated substrate obtained in Example 3-1 and Comparative Example 3-1.
- FIG. 6 is an SEM image (10,000 times and 50000 times scale) when the metal-based particle assembly film in the metal-based particle assembly film laminated substrate obtained in Comparative Example 9-1 is viewed from directly above.
- the metal-based particle assembly and the metal-based particle assembly film-laminated substrate of the present invention are two-dimensionally arranged with a specific interval over a specific number of relatively large metal-based particles having a specific shape as described above.
- the plasmon resonance has the following special features due to having the structure arranged in FIG.
- the extension of the plasmon resonance operating range as described above is extremely advantageous for enhancing optical elements such as light emitting elements and photoelectric conversion elements (solar electronic elements). That is, it is possible to reinforce the entire active layer (such as a light emitting layer in a light emitting element or a light absorbing layer in a photoelectric conversion element) having a thickness of usually several tens of nanometers or more by greatly extending the working range. Thereby, the enhancement effect (emission efficiency, conversion efficiency, etc.) of the optical element can be remarkably improved.
- the plasmon material has to be arranged so that the distance from the active layer is within the range of the Förster distance.
- the distance from the active layer is within the range of the Förster distance.
- 10 nm Can be enhanced by plasmon resonance even if they are arranged at a position several tens of nm (for example, 20 nm) or even several hundred nm apart.
- a plasmon material metal particle aggregate
- the plasmon material In a conventional light emitting device using a plasmon material, the plasmon material has to be disposed very close to the light emitting layer, and the distance between the plasmon material and the light extraction surface is greatly separated, so that the generated light is incident on the light extraction surface. In the meantime, most of the light is totally reflected at the interfaces of the various light-emitting element constituent layers that pass therethrough, and the light extraction efficiency may become extremely small.
- the present invention alone uses such a large metal particle (predetermined in spite of the use of a relatively large metal particle in which a dipole-type localized plasmon hardly occurs in the visible light region. It is possible to realize a significantly strong plasmon resonance and a significant extension of the plasmon resonance's operating range by closely arranging a certain number or more of them with a specific interval) It is a thing.
- metal-based particle assembly and the metal-based particle assembly film laminated substrate of the present invention have the following special features.
- the maximum wavelength of the plasmon peak shows a unique shift depending on the average particle diameter of the metal-based particles and the average distance between the particles. Specifically, the maximum wavelength of the plasmon peak on the longest wavelength side in the visible light region shifts to the short wavelength side (blue shift) as the average particle size of the metal-based particles is increased with a constant average distance between the particles. ) Similarly, as the average particle size of the large metal particles is kept constant and the average distance between the particles is reduced (when the metal particles are arranged more densely), the plasmon peak on the longest wavelength side in the visible light region is reduced. The maximum wavelength shifts to the short wavelength side. This unique phenomenon is due to the Mie scattering theory generally accepted for plasmon materials (according to this theory, the maximum wavelength of the plasmon peak shifts to the longer wavelength side (red shift) as the particle size increases). It is contrary.
- the unique blue shift as described above also has a structure in which the metal-based particle assembly of the present invention has a structure in which large-sized metal particles are densely arranged at specific intervals. This is thought to be due to the interaction between the localized plasmons of.
- the metal-based particle aggregate of the present invention (stacked on a glass substrate) has the longest absorption spectrum in the visible light region measured by absorptiometry depending on the shape of the metal-based particles and the distance between the particles.
- the plasmon peak on the wavelength side can exhibit a maximum wavelength in a wavelength region of 350 to 550 nm, for example.
- the metal-based particle assembly of the present invention typically has a size of about 30 to 500 nm (for example 30 to 30 nm) as compared with the case where the metal-based particles are arranged with a sufficiently long inter-particle distance (for example 1 ⁇ m). 250 nm).
- the plasmon material of the present invention in which the maximum wavelength of the plasmon peak is blue-shifted compared with the conventional one is extremely advantageous in the following points. That is, while there is a strong demand for a blue (or near-wavelength region, hereinafter the same) luminescent material (especially a blue phosphorescent material) that exhibits high luminous efficiency, development of such a material that can withstand practical use is currently underway. Even when using a blue light emitting material having a relatively low luminous efficiency by applying the plasmon material of the present invention having a plasmon peak in a blue wavelength region as an enhancement element to a light emitting element, for example, The luminous efficiency can be increased to a sufficient level. Further, when applied to a photoelectric conversion element (solar cell element), for example, by blue shifting the resonance wavelength, a wavelength region that could not be used in the active layer itself can be used effectively, and conversion efficiency can be improved. .
- a photoelectric conversion element solar cell element
- the metal-based particles constituting the metal-based particle assembly and the metal-based particle assembly film laminated substrate are nanoparticles or aggregates thereof, a plasmon peak is observed in the ultraviolet to visible region in the absorption spectrum measurement by absorptiometry.
- a plasmon peak is observed in the ultraviolet to visible region in the absorption spectrum measurement by absorptiometry.
- noble metals such as gold, silver, copper, platinum, and palladium are preferable, and silver is more preferable because it is inexpensive and has low absorption (small imaginary part of dielectric function at visible light wavelength).
- the average particle diameter of the metal-based particles is in the range of 200 to 1600 nm.
- 200 to 1200 nm more preferably 250 to 500 nm. More preferably, it is in the range of 300 to 500 nm.
- large metal particles having an average particle diameter of 500 nm alone hardly show the enhancement effect by localized plasmons.
- by arranging a predetermined number (30) or more of such large-sized metal particles densely at a predetermined interval it is possible to realize extremely strong plasmon resonance and a significant extension of the plasmon resonance operating range. is there.
- the average particle size of the metal-based particles referred to here is a random selection of 10 particles in the SEM observation image directly above the metal-based particle aggregate (film) in which the metal-based particles are two-dimensionally arranged.
- Randomly draw 5 tangent diameters in each particle image (however, any straight line with a tangent diameter can only pass through the inside of the particle image, one of which goes only inside the particle and is the longest drawn straight line)
- the average value of the 10 selected particle sizes when the average value is the particle size of each particle.
- the tangent diameter is defined as a perpendicular line connecting the interval (projection image) of a particle between two parallel lines in contact with it (Nikkan Kogyo Shimbun, “Particle Measurement Technology”, 1994, page 5). .
- the average height of the metal-based particles is in the range of 55 to 500 nm. In order to effectively obtain the characteristics (effects) of (1) to (3) above, preferably 55 to 300 nm, more preferably 70 to 150 nm. Is within the range.
- the average height of the metal-based particles is 10 particles when 10 particles are randomly selected in the AFM observation image of the metal-based particle aggregate (film) and the heights of these 10 particles are measured. It is an average value of measured values.
- the aspect ratio of the metal-based particles is in the range of 1 to 8, and in order to effectively obtain the characteristics (effects) of (1) to (3) above, preferably 2 to 8, more preferably 2.5 to It is within the range of 8.
- the aspect ratio of the metal-based particles is defined by the ratio of the average particle diameter to the average height (average particle diameter / average height).
- the metallic particles may be spherical, but preferably have a flat shape with an aspect ratio exceeding 1.
- the metal particles preferably have a smooth curved surface, and more preferably have a flat shape with a smooth curved surface. Some minute irregularities (roughness) may be included, and in this sense, the metal-based particles may be indefinite.
- the size variation between the metal-based particles is as small as possible.
- the distance between the large particles is increased, and it is preferable that the interaction between the large particles is facilitated by filling the space between the small particles.
- the metal-based particles have an average distance (hereinafter also referred to as an average inter-particle distance) of 1 to 150 nm with the adjacent metal-based particles. Arranged to be inside. Thus, by arranging the metal-based particles densely, the characteristics (effects) of (1) to (3) are exhibited.
- the average distance is preferably in the range of 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 1 to 20 nm in order to effectively obtain the characteristics (effects) of (1) to (3) above. .
- the average interparticle distance is less than 1 nm, electron transfer based on the Dexter mechanism occurs between particles, which is disadvantageous in terms of deactivation of localized plasmons.
- the average inter-particle distance here is selected by selecting 30 particles at random in an SEM observation image from directly above a metal particle aggregate (film) in which metal particles are two-dimensionally arranged. For each particle, it is the average value of the interparticle distances of these 30 particles when the interparticle distance between adjacent particles is determined.
- the inter-particle distance between adjacent particles is a value obtained by measuring the distances between all adjacent particles (the distance between the surfaces) and averaging them.
- the number of metal particles contained in the metal particle aggregate (film) is 30 or more, preferably 50 or more.
- the number of metal particles contained in the metal particle aggregate in light of the general element area of the optical element can be, for example, 300 or more, or even 17500 or more.
- the number density of the metal particles in the metal particle aggregate (film) is preferably 7 particles / ⁇ m 2 or more, and more preferably 15 particles / ⁇ m 2 or more.
- the metal-based particles are insulated from each other, in other words, non-conductive (non-conductive as a metal-based particle assembly film) between adjacent metal-based particles.
- non-conductive non-conductive as a metal-based particle assembly film
- the metal-based particles are reliably separated from each other and no conductive substance is interposed between the metal-based particles.
- the metal-based particle assembly film laminated substrate further includes an insulating layer covering the surface of each metal-based particle.
- an insulating layer is preferable not only for ensuring the non-conductivity (non-conductivity between metal-based particles) of the metal-based particle assembly film described above, but also for the following reasons. It is also preferable when applied to. That is, in an optical element such as a light-emitting element driven by electric energy, a current flows in each layer constituting the light-emitting element. However, if a current flows in the metal-based particle assembly film, a light emission enhancement effect by plasmon resonance can be sufficiently obtained. There is a risk of not being able to.
- the material constituting the insulating layer is not particularly limited as long as it has good insulating properties.
- SiO 2 or Si 3 N 4 Etc. can be used.
- the thickness of the insulating layer is not particularly limited as long as desired insulating properties are ensured, but an active layer when applied to an optical element as described later (for example, a light emitting layer of a light emitting element or a light absorbing layer of a photoelectric conversion element). Since the distance between the metal particle aggregate film and the metal-based particle assembly film is preferably as short as possible, the thinner the film, the better as long as the desired insulation is ensured.
- the plasmon material (metal particle aggregate and metal particle aggregate film laminated substrate) of the present invention is extremely useful as an enhancement element for optical elements such as light emitting elements and photoelectric conversion elements (solar cell elements).
- optical elements such as light emitting elements and photoelectric conversion elements (solar cell elements).
- the plasmon material of the present invention exhibits extremely strong plasmon resonance, and further, since the action range of plasmon resonance (range where the plasmon enhances the effect) is significantly extended, for example, 10 nm or more, It is possible to enhance the entire active layer (e.g., a light emitting layer in a light emitting element or a light absorbing layer in a photoelectric conversion element) having a thickness of 20 nm or more and even more. Further, as described above, the active layer disposed at a position separated by, for example, 10 nm, further several tens of nm (for example, 20 nm), or even several hundred nm or more can be enhanced extremely effectively.
- the active layer e.g., a light emitting layer in a light emitting element or a light absorbing layer in a photoelectric conversion element
- the maximum wavelength of the emission wavelength (for example, in the case of a light-emitting element) or the absorption wavelength (for example in the case of a photoelectric conversion element) exhibited by the active layer matches or is close to the maximum wavelength of the plasmon peak of the metal-based particle assembly film. .
- the maximum wavelength of the plasmon peak of the metal-based particle assembly film can be controlled by adjusting the metal species, average particle diameter, average height, aspect ratio, and / or average interparticle distance of the metal-based particles constituting the metal-based particle assembly film.
- the light emitting layer of 2) can be obtained by a method of removing a solvent after spin-coating a liquid containing a dye molecule and a matrix material.
- a transparent polymer such as polyvinyl alcohol or polymethyl methacrylate can be used.
- Specific examples of the dye molecule can be the same as those in the light emitting layer of 1).
- a step of growing metal-based particles (hereinafter also referred to as a particle growth step) on a substrate adjusted to a predetermined temperature at a very low speed.
- a particle growth step a step of growing metal-based particles (hereinafter also referred to as a particle growth step) on a substrate adjusted to a predetermined temperature at a very low speed.
- 30 or more metal-based particles are two-dimensionally arranged apart from each other, and the metal-based particles have a shape within a predetermined range (average particle diameter of 200 to 1600 nm, average height of 55 to 500 nm and aspect ratio of 1 to 8), more preferably a metal particle aggregate layer (thin film) having an average interparticle distance (1 to 150 nm) within a predetermined range can be obtained with good control. it can.
- the rate at which the metal-based particles are grown on the substrate is preferably less than 1 nm / min, more preferably 0.5 nm / min or less in terms of average height growth rate.
- the average height growth rate here can also be referred to as an average deposition rate or an average thickness growth rate of metal-based particles.
- Average height of metal particles / Metal particle growth time (metal material supply time) Defined by The definition of “average height of metal particles” is as described above.
- the temperature of the substrate in the grain growth step is preferably in the range of 100 to 450 ° C., more preferably 200 to 450 ° C., further preferably 250 to 350 ° C., particularly preferably 300 ° C. or in the vicinity thereof (about 300 ° C. ⁇ 10 ° C. ).
- a production method including a particle growth step of growing metal-based particles at an average height growth rate of less than 1 nm / min on a substrate whose temperature is adjusted within a range of 100 to 450 ° C., it is supplied at the initial stage of particle growth.
- a plurality of island-shaped structures made of metal-based materials are formed, and these island-shaped structures grow together with the supply of further metal-based materials, and merge with surrounding island-shaped structures.
- a metal particle aggregate layer in which particles having a relatively large average particle diameter are densely arranged is formed. Therefore, a metal-based particle assembly layer comprising metal-based particles controlled to have a shape within a predetermined range (average particle diameter, average height, and aspect ratio), and more preferably with an average interparticle distance within a predetermined range. It can be manufactured.
- the average height growth rate, substrate temperature, and / or metal-based particle growth time (metal-based material supply time)
- the average particle diameter, average height, and aspect of the metal-based particles grown on the substrate It is also possible to control the ratio and / or the average interparticle distance within a predetermined range.
- conditions other than the substrate temperature and the average height growth rate in the particle growth step can be selected relatively freely.
- the metal-based particle assembly layer can be formed efficiently.
- the average height growth rate is 1 nm / min or more, or when the substrate temperature is lower than 100 ° C. or higher than 450 ° C., the surrounding island-like structure and the continuum are formed before the island-like structure grows greatly. It is not possible to obtain a metal-based aggregate composed of large-sized metal particles that are formed and completely separated from each other, or a metal-based aggregate composed of metal-based particles having a desired shape cannot be obtained. (For example, the average height, average interparticle distance, and aspect ratio deviate from the desired ranges).
- the pressure at the time of growing metal-based particles is not particularly limited as long as it is a pressure capable of particle growth, but is usually less than atmospheric pressure.
- the lower limit of the pressure is not particularly limited, but is preferably 6 Pa or more, more preferably 10 Pa or more, and further preferably 30 Pa or more because the average height growth rate can be easily adjusted within the above range.
- a specific method for growing metal-based particles on the substrate is not particularly limited as long as the particles can be grown at an average height growth rate of less than 1 nm / min. it can.
- a metal-based particle assembly layer can be grown relatively easily, and an average height growth rate of less than 1 nm / min can be easily maintained. Therefore, direct current (DC) sputtering is used. It is preferable.
- the sputtering method is not particularly limited, and a direct current argon ion sputtering method in which argon ions generated by an ion gun or plasma discharge are accelerated by an electric field and irradiated onto a target can be used. Other conditions such as a current value, a voltage value, and a substrate-target distance in the sputtering method are appropriately adjusted so that particle growth is performed at an average height growth rate of less than 1 nm / min.
- the growth time of metal-based particles in the particle growth step is at least a shape in which the metal-based particles supported on the substrate are in a predetermined range, and more preferably an average interparticle distance within the predetermined range. It is the time to reach and less than the time within which the shape within the predetermined range and the average interparticle distance start to deviate. For example, even if particle growth is performed at an average height growth rate and a substrate temperature within the above predetermined range, if the growth time is extremely long, the amount of the metal-based material loaded becomes too large and separated from each other. It does not become an aggregate of arranged metal-based particles, but becomes a continuous film, or the average particle diameter and average height of the metal-based particles become too large.
- the average particle diameter based on the above definition of the silver particles constituting the metal-based particle assembly of this example was determined to be 335 nm, and the average interparticle distance was 16.7 nm.
- the average height was determined to be 96.2 nm. From these, the aspect ratio (average particle diameter / average height) of the silver particles is calculated to be 3.48, and it can be seen from the acquired image that the silver particles have a flat shape. Furthermore, it can be seen from the SEM image that the metal-based particle aggregate of this example has about 6.25 ⁇ 10 10 (about 25 particles / ⁇ m 2 ) silver particles.
- FIG. 5 is an absorption spectrum measured by absorptiometry of the metal-based particle assembly film laminated substrate obtained in Example 1 and Comparative Examples 1 and 2.
- Non-patent literature K. Lance Kelly, et al., "The Optical Properties of Metal Nanoparticles: The Influence of Size, Shape, and Dielectric Environment", The Journal of Physical Chemistry B, 2003, 107, 668)
- the flat silver particles as in Example 1 generally have a plasmon peak around 550 nm when the average particle size is 200 nm, and around 650 nm when the average particle size is 300 nm. (All are silver particles alone).
- a coumarin-based light emitting layer solution was spin-coated at 3000 rpm on the metal-based particle assembly film to form an extremely thin (monomolecular film scale) coumarin-based light emitting layer, thereby obtaining a light emitting device.
- a solution for a coumarin-based light emitting layer was prepared as follows. First, a coumarin dye (Exciton Coumarin 503) was dissolved in ethanol to obtain a 5 mM coumarin solution. Separately, an organic spin-on-glass (SOG) material (“OCD T-7 5500T” manufactured by Tokyo Ohka Kogyo Co., Ltd.) was diluted to 33% by volume with ethanol. The 33 volume% organic SOG material diluted solution, 5 mM coumarin solution, and ethanol were mixed so that the volume ratio was 1: 5: 5 to obtain a coumarin light emitting layer solution.
- SOG organic spin-on-glass
- ⁇ Comparative Example 3-1> A silver nanoparticle aqueous dispersion (manufactured by Mitsubishi Paper Industries, Ltd., silver nanoparticle concentration: 25 wt%) was diluted with pure water so that the silver nanoparticle concentration was 6 wt%. Next, 1% by volume of a surfactant was added to the silver nanoparticle aqueous dispersion and stirred well, and then 80% by volume of acetone was added to the obtained silver nanoparticle aqueous dispersion at room temperature. And sufficiently mixed to prepare a silver nanoparticle coating solution.
- FIG. 7 is an SEM image of the metal-based particle assembly film in the metal-based particle assembly film laminated substrate obtained in Comparative Example 3-1, viewed from directly above, and is an enlarged image on a 10000 times scale.
- FIG. 8 is an AFM image showing the metal-based particle assembly film in the metal-based particle assembly film laminated substrate obtained in Comparative Example 3-1. The size of the image shown in FIG. 8 is 5 ⁇ m ⁇ 5 ⁇ m.
- an F8BT light emitting layer solution was spin-coated on the metal particle aggregate film, and then baked on a hot plate at 170 ° C. for 30 minutes to form an F8BT light emitting layer having an average thickness of 30 nm.
- the solution for the F8BT light-emitting layer was prepared by dissolving F8BT (Luminescence Technology) in chlorobenzene so as to have a concentration of 1% by weight.
- a wavelength cut filter 8 (sigma optical machine) that collects the light emission 6 from the optical excitation light emitting element 1 emitted in the direction of 40 ° with respect to the optical axis of the excitation light 3 by the lens 7 and cuts the light having the wavelength of the excitation light. Detection was performed with a spectrophotometer 8 (MCPD-3000, manufactured by Otsuka Electronics Co., Ltd.) through SCF-50S-44Y (manufactured by KK).
- FIG. 13B is a schematic cross-sectional view showing the photoexcited light-emitting element 1 including the metal-based particle assembly film 200, the insulating layer 300, and the light-emitting layer 2 in this order on the soda glass substrate 100 manufactured in the examples and comparative examples. is there.
- FIG. 16 is a graph in which the value obtained by dividing the integrated value obtained from the emission spectrum measured for the light emitting element is “emission enhancement magnification”, and this is taken as the vertical axis.
- 1 light excitation light emitting element 1 light excitation light emitting element, 2 light emitting layer, 3 excitation light, 4 excitation light source, 5, 7 lens, 7 light emission from light excitation light emitting element, 8 wavelength cut filter, 9 spectrophotometer, 100 soda glass substrate, 200 metal particle aggregate Body membrane, 300 insulating layer.
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Abstract
Description
[1] 30個以上の金属系粒子が互いに離間して二次元的に配置されてなる粒子集合体であって、
前記金属系粒子は、その平均粒径が200~1600nmの範囲内、平均高さが55~500nmの範囲内、前記平均高さに対する前記平均粒径の比で定義されるアスペクト比が1~8の範囲内にあり、
前記金属系粒子は、その隣り合う金属系粒子との平均距離が1~150nmの範囲内となるように配置されている金属系粒子集合体。
本発明の金属系粒子集合体は、30個以上の金属系粒子が互いに離間して二次元的に配置されてなる粒子集合体である。該集合体を構成する金属系粒子は、その平均粒径が200~1600nmの範囲内、平均高さが55~500nmの範囲内、平均高さに対する平均粒径の比で定義されるアスペクト比が1~8の範囲内とされる。そして、該集合体を構成する金属系粒子は、その隣り合う金属系粒子との平均距離が1~150nmの範囲内となるように配置されている。また、本発明の金属系粒子集合体膜積層基板は、上記金属系粒子集合体を基板上に積層(担持)させてなるものである。
本発明のプラズモン材料(金属系粒子集合体および金属系粒子集合体膜積層基板)は、次のような方法によって作製することができる。
(2)所定の形状を有する金属系粒子を所定の厚みを有する両親媒性材料からなる保護層で被覆した後、LB(Langmuir Blodgett)膜法により、これを基板上にフィルム化する方法、
(3)その他、蒸着またはスパッタリングにより作製した薄膜を後処理する方法、レジスト加工、エッチング加工、金属系粒子が分散された分散液を用いたキャスト法など。
金属系粒子の平均高さ/金属系粒子成長時間(金属系材料の供給時間)
で定義される。「金属系粒子の平均高さ」の定義は上述のとおりである。
金属系粒子の平均粒径/金属系粒子成長時間(金属系材料の供給時間)
で定義される。「金属系粒子の平均粒径」の定義は上述のとおりである。
<実施例1>
直流マグネトロンスパッタリング装置を用いて、下記の条件で、ソーダガラス基板上に、銀粒子を極めてゆっくりと成長させ、基板表面の全面に金属系粒子集合体の薄膜を形成して、金属系粒子集合体層積層基板を得た。
チャンバ内圧力(スパッタガス圧):10Pa、
基板・ターゲット間距離:100mm、
スパッタ電力:4W、
平均粒径成長速度(平均粒径/スパッタ時間):0.9nm/分、
平均高さ成長速度(=平均堆積速度=平均高さ/スパッタ時間):0.25nm/分、
基板温度:300℃、
基板サイズおよび形状:一辺が5cmの正方形。
銀ナノ粒子水分散物(三菱製紙社製、銀ナノ粒子濃度:25重量%)を純水で、銀ナノ粒子濃度が2重量%となるように希釈した。次いで、この銀ナノ粒子水分散物に対して1体積%の界面活性剤を添加して良く攪拌した後、得られた銀ナノ粒子水分散物に対して80体積%のアセトンを添加して常温で十分撹拌し、銀ナノ粒子塗工液を調製した。
直流マグネトロンスパッタリング法における堆積時間を変更することにより、比較例1および2の金属系粒子集合体膜積層基板を得た。比較例1の金属系粒子集合体膜積層基板は、金属系粒子の平均高さが約10nmであること以外は実施例1と略同じ粒子形状、アスペクト比および平均粒子間距離を有し、比較例2の金属系粒子集合体膜積層基板は、金属系粒子の平均高さが約30nmであること以外は実施例1と略同じ粒子形状、アスペクト比および平均粒子間距離を有するものであった。
図5は、実施例1および比較例1~2で得られた金属系粒子集合体膜積層基板の吸光光度法により測定された吸光スペクトルである。非特許文献(K. Lance Kelly, et al., "The Optical Properties of Metal Nanoparticles: The Influence of Size, Shape, and Dielectric Environment", The Journal of Physical Chemistry B, 2003, 107, 668)に示されているように、実施例1のような扁平形状の銀粒子は、平均粒径が200nmのとき約550nm付近に、平均粒径が300nmのときは650nm付近にプラズモンピークを持つことが一般的である(いずれも銀粒子単独の場合である)。
吸光度=-log10(I/I0)
で表される。
<実施例3-1>
実施例1とほぼ同じ条件で銀粒子を成長させることにより、0.5mm厚のソーダガラス基板上に実施例1と同様の金属系粒子集合体膜を形成した。この金属系粒子集合体膜は、金属系粒子の平均高さが66.1nmであること以外は実施例1と同じ粒子形状および平均粒子間距離を有するものであった。
実施例3-1と同条件で銀粒子を成長させることにより、0.5mm厚のソーダガラス基板上に実施例3-1に記載の金属系粒子集合体膜を形成した。その後直ちに、SOG溶液を金属系粒子集合体膜上にスピンコートして、平均厚み10nmの絶縁層を積層した。SOG溶液には、有機系SOG材料である東京応化工業株式会社製「OCD T-7 5500T」をエタノールで希釈したものを用いた。「平均厚み」とは、表面凹凸を有する金属系粒子集合体膜上に形成されたときの平均厚みを意味しており、SOG溶液をソーダガラス基板上に直接スピンコートしたときの厚みとして測定した(以下の実施例、比較例についても同様)。平均厚みが比較的小さい値のときは金属系粒子集合体膜の谷部分にのみ絶縁層が形成され、金属系粒子集合体膜の最表面全体を被覆できないことがある。
絶縁層の平均厚みを30nmとしたこと以外は実施例3-2と同様にして、発光素子を得た。
絶縁層の平均厚みを80nmとしたこと以外は実施例3-2と同様にして、発光素子を得た。
絶縁層の平均厚みを150nmとしたこと以外は実施例3-2と同様にして、発光素子を得た。
絶縁層の平均厚みを350nmとしたこと以外は実施例3-2と同様にして、発光素子を得た。
銀ナノ粒子水分散物(三菱製紙社製、銀ナノ粒子濃度:25重量%)を純水で、銀ナノ粒子濃度が6重量%となるように希釈した。次いで、この銀ナノ粒子水分散物に対して1体積%の界面活性剤を添加して良く攪拌した後、得られた銀ナノ粒子水分散物に対して80体積%のアセトンを添加して常温で十分振り混ぜ、銀ナノ粒子塗工液を調製した。
比較例3-1と同じ方法で、1mm厚のソーダガラス基板上に比較例3-1に記載の金属系粒子集合体膜を形成した。その後直ちに、SOG溶液を金属系粒子集合体膜上にスピンコートして、平均厚み10nmの絶縁層を積層した。SOG溶液には、有機系SOG材料である東京応化工業株式会社製「OCD T-7 5500T」をエタノールで希釈したものを用いた。
絶縁層の平均厚みを30nmとしたこと以外は比較例3-2と同様にして、発光素子を得た。
絶縁層の平均厚みを80nmとしたこと以外は比較例3-2と同様にして、発光素子を得た。
絶縁層の平均厚みを150nmとしたこと以外は比較例3-2と同様にして、発光素子を得た。
絶縁層の平均厚みを350nmとしたこと以外は比較例3-2と同様にして、発光素子を得た。
金属系粒子集合体膜を形成しないこと以外は実施例3-1と同様にして発光素子を得た。
実施例3-1と同じ方法で、0.5mm厚のソーダガラス基板上に実施例3-1に記載の金属系粒子集合体膜を形成した。
実施例3-2と同じ方法で、平均厚み10nmの絶縁層を有する金属系粒子集合体膜を形成した後、実施例4-1と同じ方法で平均厚み30nmのAlq3発光層を形成して、発光素子を得た。
絶縁層の平均厚みを30nmとしたこと以外は実施例4-2と同様にして、発光素子を得た。
絶縁層の平均厚みを80nmとしたこと以外は実施例4-2と同様にして、発光素子を得た。
絶縁層の平均厚みを150nmとしたこと以外は実施例4-2と同様にして、発光素子を得た。
比較例3-1と同じ方法で、1mm厚のソーダガラス基板上に比較例3-1に記載の金属系粒子集合体膜を形成した後、実施例4-1と同じ方法で平均厚み30nmのAlq3発光層を形成して、発光素子を得た。
比較例3-2と同じ方法で、平均厚み10nmの絶縁層を有する金属系粒子集合体膜を形成した後、実施例4-1と同じ方法で平均厚み30nmのAlq3発光層を形成して、発光素子を得た。
絶縁層の平均厚みを30nmとしたこと以外は比較例5-2と同様にして、発光素子を得た。
絶縁層の平均厚みを80nmとしたこと以外は比較例5-2と同様にして、発光素子を得た。
絶縁層の平均厚みを150nmとしたこと以外は比較例5-2と同様にして、発光素子を得た。
金属系粒子集合体膜を形成しないこと以外は実施例4-1と同様にして発光素子を得た。
実施例3-1と同じ方法で、0.5mm厚のソーダガラス基板上に実施例3-1に記載の金属系粒子集合体膜を形成した。
実施例3-2と同じ方法で、平均厚み10nmの絶縁層を有する金属系粒子集合体膜を形成した後、実施例5-1と同じ方法で平均厚み30nmのF8BT発光層を形成して、発光素子を得た。
絶縁層の平均厚みを30nmとしたこと以外は実施例5-2と同様にして、発光素子を得た。
比較例3-1と同じ方法で、1mm厚のソーダガラス基板上に比較例3-1に記載の金属系粒子集合体膜を形成した後、実施例5-1と同じ方法で平均厚み30nmのF8BT発光層を形成して、発光素子を得た。
比較例3-2と同じ方法で、平均厚み10nmの絶縁層を有する金属系粒子集合体膜積層基板を形成した後、実施例5-1と同じ方法で平均厚み30nmのF8BT発光層を形成して、発光素子を得た。
絶縁層の平均厚みを30nmとしたこと以外は比較例7-2と同様にして、発光素子を得た。
金属系粒子集合体膜を形成しないこと以外は実施例5-1と同様にして発光素子を得た。
1mm厚のソーダガラス基板上に、真空蒸着法によって膜厚13nmの導電性銀薄膜を成膜した。成膜の際のチャンバ内圧力は3×10-3Paとした。次に、導電性銀薄膜が成膜された基板を400℃の電気炉内で10分間焼成し、金属系粒子集合体膜積層基板を得た。
比較例9-1と同じ方法で、1mm厚のソーダガラス基板上に比較例9-1に記載の金属系粒子集合体膜を形成した。その後直ちに、SOG溶液を金属系粒子集合体膜上にスピンコートして、平均厚み10nmの絶縁層を積層した。SOG溶液には、有機系SOG材料である東京応化工業株式会社製「OCD T-7 5500T」をエタノールで希釈したものを用いた。その後、実施例4-1と同じ方法で平均厚み30nmのAlq3発光層を形成して、発光素子を得た。
絶縁層の平均厚みを30nmとしたこと以外は比較例9-2と同様にして、発光素子を得た。
絶縁層の平均厚みを80nmとしたこと以外は比較例9-2と同様にして、発光素子を得た。
絶縁層の平均厚みを150nmとしたこと以外は比較例9-2と同様にして、発光素子を得た。
<実施例6>
実施例1と同条件で銀粒子を成長させることにより、0.5mm厚のソーダガラス基板上に実施例1に記載の金属系粒子集合体膜を形成した。その後直ちに、スピンオングラス(SOG)溶液を金属系粒子集合体膜上にスピンコートして、平均厚み80nmの絶縁層を積層した。SOG溶液には、有機系SOG材料である東京応化工業株式会社製「OCD T-7 5500T」をエタノールで希釈したものを用いた。
金属系粒子集合体膜を形成しないこと以外は実施例6と同様にして有機EL素子を作製した。
実施例1と同条件で銀粒子を成長させることにより、0.5mm厚のソーダガラス基板上に実施例1に記載の金属系粒子集合体膜を形成した。その後直ちに、スピンオングラス(SOG)溶液を金属系粒子集合体膜上にスピンコートして、平均厚み30nmの絶縁層を積層した。SOG溶液には、有機系SOG材料である東京応化工業株式会社製「OCD T-7 5500T」をエタノールで希釈したものを用いた。
金属系粒子集合体膜を形成しないこと以外は実施例7と同様にして有機EL素子を作製した。
Claims (10)
- 30個以上の金属系粒子が互いに離間して二次元的に配置されてなる粒子集合体であって、
前記金属系粒子は、その平均粒径が200~1600nmの範囲内、平均高さが55~500nmの範囲内、前記平均高さに対する前記平均粒径の比で定義されるアスペクト比が1~8の範囲内にあり、
前記金属系粒子は、その隣り合う金属系粒子との平均距離が1~150nmの範囲内となるように配置されている金属系粒子集合体。 - 前記金属系粒子は、前記アスペクト比が1を超える扁平状の粒子である請求項1に記載の金属系粒子集合体。
- 前記金属系粒子は、銀からなる請求項1に記載の金属系粒子集合体。
- 前記金属系粒子は、その隣り合う金属系粒子との間に関して非導電性である請求項1に記載の金属系粒子集合体。
- 基板と、前記基板上に積層される請求項1に記載の金属系粒子集合体からなる膜とを備える金属系粒子集合体膜積層基板。
- 可視光領域における吸光スペクトルにおいて、最も長波長側にあるピークが350~550nmの範囲内に極大波長を有する請求項5に記載の金属系粒子集合体膜積層基板。
- 可視光領域における吸光スペクトルにおいて、最も長波長側にあるピークの極大波長における吸光度が1以上である請求項5に記載の金属系粒子集合体膜積層基板。
- 前記膜を構成するそれぞれの金属系粒子の表面を覆う絶縁層をさらに備える請求項5に記載の金属系粒子集合体膜積層基板。
- 10nm以上の厚みを有する光吸収層と、請求項1に記載の金属系粒子集合体または請求項5に記載の金属系粒子集合体膜積層基板とを備える光学素子。
- 10nm以上の厚みを有する発光層と、請求項1に記載の金属系粒子集合体または請求項5に記載の金属系粒子集合体膜積層基板とを備える光学素子。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/007,107 US9693423B2 (en) | 2011-03-31 | 2012-03-30 | Metal-based particle assembly |
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JP2014058730A (ja) * | 2012-09-19 | 2014-04-03 | Sumitomo Chemical Co Ltd | 金属系粒子集合体の製造方法 |
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US20140037977A1 (en) | 2014-02-06 |
CN103460808B (zh) | 2018-06-01 |
JP2013177665A (ja) | 2013-09-09 |
JP6018774B2 (ja) | 2016-11-02 |
CN103460808A (zh) | 2013-12-18 |
KR20140016340A (ko) | 2014-02-07 |
TWI587526B (zh) | 2017-06-11 |
US20170097447A1 (en) | 2017-04-06 |
US10379267B2 (en) | 2019-08-13 |
EP2693846A1 (en) | 2014-02-05 |
EP2693846A4 (en) | 2014-11-12 |
TW201251034A (en) | 2012-12-16 |
KR102086860B1 (ko) | 2020-03-09 |
US9693423B2 (en) | 2017-06-27 |
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