WO2012090699A1 - テトラアルキルアンモニウム塩の製造方法、及びそれを原料とした水酸化テトラアルキルアンモニウムの製造方法 - Google Patents
テトラアルキルアンモニウム塩の製造方法、及びそれを原料とした水酸化テトラアルキルアンモニウムの製造方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/82—Purification; Separation; Stabilisation; Use of additives
- C07C209/84—Purification
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/04—Processes using organic exchangers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J49/00—Regeneration or reactivation of ion-exchangers; Apparatus therefor
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/62—Quaternary ammonium compounds
- C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
- C02F2001/422—Treatment of water, waste water, or sewage by ion-exchange using anionic exchangers
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
- C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/38—Organic compounds containing nitrogen
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/05—Conductivity or salinity
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
Definitions
- the present invention relates to a novel method for producing a tetraalkylammonium salt using a cation exchange resin, and a method for producing a tetraalkylammonium hydroxide using the same as a raw material.
- Tetraalkylammonium hydroxide (hereinafter abbreviated as TAAH) is a useful compound as a standard solution for bases in non-aqueous solution titration and organic alkaline agents in organic synthesis, including phase transfer catalysts. In addition, it is used as a processing agent for cleaning a semiconductor substrate, etching, developing a photoresist, etc. in the manufacture of integrated circuits and large scale integrated circuits. In particular, in semiconductor applications, high purity TAAH containing as little impurities as possible is required because the semiconductor substrate is contaminated.
- waste liquid used for developing the photoresist as described above contains metal ions and TAAH in addition to the photoresist.
- TAAH is recovered from the waste liquid and reused.
- Photoresist development waste liquid waste liquid containing photoresist and TAAH
- methods for treating photoresist developing waste liquid have mainly been concentrated by evaporation or reverse osmosis membrane method and disposed of (incinerated or collected by a contractor), and biodegraded by activated sludge and discharged. .
- many attempts have been proposed to recover TAAH from the waste liquid and reuse it for environmental consideration.
- TAA ions tetraalkylammonium ions
- hydrochloric acid is passed through the cation exchange resin to collect the TAA salt, and perchloric acid is added to the resulting solution to obtain a tetraalkylammonium perchlorate (TAA perchlorate).
- TAA perchlorate is purified by crystallization, and then the obtained perchlorate is contacted with an anion exchange resin to recover TAAH.
- Patent Documents 5 and 6 a technique for producing TAAH by adsorbing TAA ions to an ion exchange resin, recovering TAA salt from a dilute developing waste solution, and electrolyzing it is disclosed.
- Patent Documents 5 and 6 since the conditions for eluting the TAA salt from the ion exchange resin are not controlled, metal ions are mixed in the obtained TAA salt solution, and as a result, the metal ions are relatively contained in the TAAH solution after electrolysis. There was a problem of mixing in a high concentration.
- TAA ions can be recovered with high yield, but according to the study by the present inventors, it has been found that there is room for improvement in the following points.
- the concentration of TAA ions is measured, and since recovery is performed until the concentration of TAA ions is as low as 2000 ppm, the TAA ions are adsorbed on the cation exchange resin. Most TAA ions can be recovered. However, at the time of recovery, the concentration of TAA ions decreases and at the same time, a large amount of hydrochloric acid used for recovery is mixed, and metal ions adsorbed on the resin are also mixed. Therefore, the obtained TAA salt has a large amount of impurities. There was a problem of being included.
- the present inventors have intensively studied to solve the above problems.
- a solution containing metal ions and tetraalkylammonium hydroxide (TAAH) is passed through an adsorption tower packed with a cation exchange resin, and the tetraalkylammonium ions are adsorbed on the cation exchange resin.
- TAAH tetraalkylammonium hydroxide
- the pH and / or electric conductivity of the recovered liquid flowing out is adjusted.
- a method for producing a tetraalkylammonium (TAA) salt characterized in that a recovery amount of a recovered liquid is determined by measurement.
- a TAAH solution having a high purity can be obtained by bringing the TAA salt thus obtained into contact with an anion exchange resin that has been previously made OH type or by performing electrolysis.
- TAAH tetraalkylammonium hydroxide
- the recovery amount of the TAA salt solution recovered by a simple method such as pH measurement and / or electrical conductivity measurement is determined, a highly pure TAA salt can be obtained efficiently. Therefore, it is not necessary to provide a metal removal step using a chelate resin or the like in the previous and subsequent steps, the configuration of the apparatus is simplified, and the cost is reduced.
- a high-purity TAAH solution can be obtained by bringing the TAA salt into contact with an anion exchange resin or by performing electrolysis.
- the present invention relates to a method for producing a tetraalkylammonium salt (TAA salt) from a solution containing metal ions and tetraalkylammonium hydroxide (TAAH), wherein the TAAH solution is contacted with a cation exchange resin, and TAA After the ions are adsorbed on the cation exchange resin, the acid solution is passed through the adsorption tower and the pH and / or electrical conductivity of the recovered liquid flowing out from the adsorption tower is measured to stop recovery of the recovered liquid. This is a method for determining the timing and obtaining the TAA salt.
- TAA salt tetraalkylammonium salt
- the solution containing metal ions and tetraalkylammonium hydroxide is not particularly limited as long as it contains these components (hereinafter also referred to as “raw material solution”). Since these components are contained and are generated in a large amount in the semiconductor manufacturing process, the liquid crystal display manufacturing process, and the like, the photoresist developing waste liquid discharged from the process is preferable.
- waste liquids are waste liquids that are discharged when developing the exposed photoresist with an alkaline developer, and mainly contain photoresist, TAAH, and metal ions.
- Photoresist developing waste liquid usually exhibits an alkalinity with a pH of 10 to 14.
- acid groups such as carboxyl groups and phenolic hydroxyl groups are dissolved by acid dissociation.
- main photoresist include indenecarboxylic acid produced by photolysis of the photosensitizing agent o-diazonaphthoquinone and phenols derived from novolac resin.
- eliminated a part or all of the said photoresist component previously can also be made into object.
- the composition of the waste liquid discharged in this development step is such that TAAH is about 0.001 to 1% by mass, resist is about 10 to 100 ppm, and surfactant is about 0 to several tens of ppm. Become.
- waste liquids from other processes may be mixed, and the TAAH concentration may be further lowered within the above range. Specifically, it may be 0.05% by mass or less (about 0.001 to 0.05% by mass).
- the photoresist developing waste liquid discharged from the liquid crystal display manufacturing process often has a TAAH concentration of 0.001 to 0.5% by mass, and the method of the present invention uses such a photoresist developing waste liquid from the TAA salt. It can employ
- the photoresist developing waste liquid contains a plurality of metal ions.
- metal ions for example, monovalent ions such as sodium and potassium, divalent ions such as calcium and zinc, and other polyvalent ions such as aluminum, nickel, copper, chromium and iron in the photoresist developing waste liquid. It is a metal that is typically contained in large quantities.
- TAAH in the photoresist development waste liquid is an alkali used in a photoresist developer used in the production of various electronic components.
- Specific examples of TAAH include tetramethylammonium hydroxide (hereinafter abbreviated as TMAH), tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, methyltriethylammonium hydroxide, trimethylethylammonium hydroxide, water Dimethyldiethylammonium oxide, trimethyl (2-hydroxyethyl) ammonium hydroxide, triethyl (2-hydroxyethyl) ammonium hydroxide, dimethyldi (2-hydroxyethyl) ammonium hydroxide, diethyldi (2-hydroxyethyl) ammonium hydroxide, water Examples include methyl tri (2-hydroxyethyl) ammonium oxide, ethyl tri (2-
- Step of adsorbing tetraalkylammonium ions to cation exchange resin the raw material solution as described above is passed through an adsorption tower packed with a cation exchange resin of hydrogen ion type (hereinafter also referred to as “H type”) to adsorb TAA to the cation exchange resin. .
- H type hydrogen ion type
- TAA ions are cations, they are adsorbed on the resin by causing ion exchange with hydrogen ions of the cation exchange resin by contacting with the H-type cation exchange resin. Therefore, TAA ions can be efficiently recovered from the waste liquid. In particular, TAA ions can be recovered at a low cost even in a waste liquid when the concentration of TAAH is low.
- metal ions and TAA ions that have been adsorbed on such a cation exchange resin are efficiently separated. Even metal ions are difficult to be adsorbed by cation exchange resins when the ion species containing the metal itself is an anion due to a chemical equilibrium reaction such as complex formation in the raw material solution. Discharged from the tower.
- the raw material solution is a photoresist waste solution
- the dissolved organic component derived from the photoresist is usually in the form of an anion, it is hardly adsorbed by the cation exchange resin and most of it is removed. Even when nonionic components are present, most of the components can be removed because they are discharged (outflow) without being adsorbed by the cation exchange resin in this step.
- the resist remaining slightly on the cation exchange resin may be washed by flowing it with ultrapure water or a highly pure TAAH solution.
- the cation exchange resin is not particularly limited, and known ones can be used. Specifically, both a strongly acidic cation exchange resin whose ion exchange group is a sulfonic acid group and a weakly acidic cation exchange resin whose ion exchange group is a carboxyl group can be used. Among them, it is preferable to use a weakly acidic cation exchange resin because many of them have a large ion exchange capacity and can reduce the amount of resin used. Further, in the case of a weakly acidic cation exchange resin, elution of TAA ions described later is easy.
- the resin structure may be a gel type or an MR type (macroporous type).
- the shape of the resin may be any of powder, granule, film, fiber and the like. In view of processing efficiency, operability, economy and the like, it is preferable to use granular styrene-based or acrylic-based cation exchange resins.
- the counter ion of the cation exchange resin is usually marketed as a hydrogen ion (H type) or sodium ion (Na type), but it prevents the final mixing of the TAAH solution with sodium ions, and TAA In order to improve the adsorption efficiency of ions, the H type in which counter ions are hydrogen ions is preferable.
- H type hydrogen ion
- Na type sodium ion
- the H type in which counter ions are hydrogen ions is preferable.
- an acid such as hydrochloric acid or sulfuric acid through the cation exchange resin and thoroughly wash with ultrapure water before use. Are used as hydrogen ions.
- strongly acidic cation exchange resins include Amberlite IR120B and Amberlite IR124 manufactured by Rohm and Haas, Diaion SK1B, Diaion PK228 manufactured by Mitsubishi Chemical, Duolite C255LFH manufactured by Sumika Chemtex, and LANXESS Examples include Lebatit Monoplus S100, Purolite Purolite C160, and the like.
- Specific examples of the weakly acidic cation exchange resin include Amberlite IRC76 manufactured by Rohm and Haas, Diaion WK40L manufactured by Mitsubishi Chemical, Duolite C433LF, Duolite C476 manufactured by Sumika Chemtex, and Lebanchit CNP80WS manufactured by LANXESS. And Purolite Purolite C104.
- the TAA ions are adsorbed on the cation exchange resin by passing the raw material solution through the adsorption tower packed with the H-type cation exchange resin and bringing it into contact with the cation exchange resin.
- a method of passing the raw material solution through an adsorption tower filled with a cation exchange resin a conventionally known method can be appropriately employed depending on the type and shape of the cation exchange resin.
- a cylindrical adsorption tower having an inflow hole in the upper part and an outflow hole in the lower end part is used.
- the adsorption tower is filled with a cation exchange resin, and the raw material solution is continuously applied using gravity.
- the method of letting it pass through is preferable.
- the size of the adsorption tower may be appropriately determined according to the performance of the cation exchange resin.
- the photoresist waste liquid has a TAAH content of 0.001 to 1% by mass
- the amount of the raw material liquid to be passed is an amount that does not allow the cation exchange resin packed in the adsorption tower to break through, so that the TAA salt can be produced efficiently.
- TAA ions flow out (breakthrough) without being adsorbed by passing a raw material solution containing an amount of cation more than the exchange capacity of the cation exchange resin.
- This can be confirmed by analyzing the TAA ion concentration in the liquid flowing out through the ion chromatography method. More simply, the height occupied by the cation exchange resin in the adsorption tower may be measured.
- the counter ion of the cation exchange resin is changed from a hydrogen ion to a TAA ion, the volume swells to about 2 times depending on the kind of the cation exchange resin. Therefore, the adsorption of TAA ions can be confirmed by measuring the volume of the cation exchange resin.
- the pH of the raw material solution is 10 or more
- the pH of the liquid that has passed through becomes alkaline, so it can also be confirmed by a pH meter.
- the electric conductivity of the liquid is increased, so that it can also be confirmed by the electric conductivity.
- Step of recovering tetraalkylammonium salt from cation exchange resin adsorbed tetraalkylammonium ion In the present invention, after the TAA ions are adsorbed on the cation exchange resin by the above method, the acid solution is passed through the adsorption tower filled with the cation exchange resin, and the recovered liquid flowing out from the adsorption tower is recovered. To produce a tetraalkylammonium salt.
- the acid solution is preferably an aqueous solution in consideration of cost and the like.
- the acid that can be used include hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, acetic acid, and the like, but strong acid such as hydrochloric acid, sulfuric acid, Nitric acid is preferred.
- hydrochloric acid is most preferable in that it is easy to remove excess acid by concentration under reduced pressure, and has a low oxidizing power and is not easily damaged.
- the concentration of the acid solution can be appropriately selected in the range of 0.1N to 10N, but the range of 0.5N to 4N is easy in that high-concentration TAA salt flows out and prevents metal impurities from being mixed. Particularly preferred.
- the flow rate of the acid solution can be appropriately set according to the size of the adsorption tower, the type and amount of the cation exchange resin, the concentration of the acid solution, etc., but preferably the acid space velocity is 1 or more and 50. It is as follows. If it is smaller than this, processing takes time.
- TAA ions flow out (elute) from one end of the adsorption tower as a TAA salt using an acid radical (for example, Cl 2 ⁇ ) corresponding to the acid used as a counter ion. Is recovered in a storage tank, and the recovered liquid is subjected to electrolysis described later.
- an acid radical for example, Cl 2 ⁇
- the feature of the present invention is that the pH and / or electrical conductivity of the effluent is measured, and the recovery to the storage tank is stopped when a predetermined measured value is reached.
- the cation exchange resin in the adsorption tower adsorbs metal ions in addition to TAA ions as described above, but the time point when the pH of the effluent reaches a predetermined value and / or the electrical conductivity is specified. By stopping recovery before the width changes, the amount of mixed metal ions can be kept low.
- the effluent from the adsorption tower may be stopped, but the flow path such as a switching valve may be changed. It is preferable that a means is provided, and when the predetermined value is reached, it is recovered to a storage tank or the like different from the storage tank.
- the predetermined pH value varies depending on the type of acid used. For example, when hydrochloric acid, which is a strong acid, is used as acid, TAA chloride (hereinafter referred to as “TAAC”), which is an outflowing salt, is neutral. Therefore, in the state where TAA ions are sufficiently present in the adsorption tower, outflow The liquid is almost neutral (in the case of a strong acid cation exchange resin) or weakly basic to neutral (in the case of a weak acid cation exchange resin), but gradually begins to become acidic as the TAA ion decreases.
- TAA chloride which is an outflowing salt
- TAA ions In the equilibrium state, even if the effluent is weakly acidic, TAA ions (TAAC) are contained in the effluent, but it gradually decreases. On the other hand, as the acid flowing through the adsorption tower becomes more acidic. The elution amount of metal ions that are strongly adsorbed on the cation exchange resin gradually increases.
- the pH of the recovered liquid flowing out from the adsorption tower is measured, and the recovery is stopped when the pH reaches a predetermined value in the range of 3 to 8.
- a liquid having a low concentration of metal ions contained in the prepared TAA salt solution can be obtained.
- the predetermined value is preferably set to pH 5 or more.
- the strong acid means an acid dissociation constant pKa at 25 ° C. of 3 or less.
- the acid to be used is a weak acid such as acetic acid or carbonic acid
- the resulting TAA salt solution exhibits weak alkalinity, and therefore the preferred pH range for reducing the amount of metal ion contamination is 4-9.
- the weak acid means an acid dissociation constant pKa at 25 ° C. higher than 3.
- a conventionally known method can be appropriately employed. Specifically, for example, a certain amount of the effluent flowing out from the adsorption tower is sampled and the pH is measured using a pH test paper or an electrode-type pH meter, or in-line in the middle of the piping that leads the effluent to storage or the like. There is a method of measuring by installing a type pH meter. If an in-line type pH meter is used, the recovery can be stopped at the moment when the pH is out of the specified value without taking out the liquid halfway, and the loss of the recovered liquid can be suppressed, which is preferable.
- the pH measurement means measuring the pH of the fluid in-line using a general glass electrode type pH meter, due to its characteristics and non-uniformity of the resin packed state in the adsorption tower, etc. Depending on the factor, blurring often occurs at about ⁇ 0.2.
- the pH value indicated by the pH meter is statistically processed, and recovery of the effluent into the storage tank may be stopped when the statistical value reaches a predetermined value.
- a known processing method may be adopted as appropriate. For example, a value is obtained every predetermined time (for example, 0.1 seconds), and an arithmetic average of the predetermined time (for example, 2 seconds) is obtained. Alternatively, if the geometric average value is a predetermined value, a predetermined pH value may be used. Some commercially available pH meters are equipped with such statistical processing means and have a function of displaying the pH after statistical processing. In the present invention, such a pH meter can be used as it is.
- the time interval for statistical processing must be changed mainly by the flow rate (flow velocity) of the effluent.
- flow rate flow velocity
- the pH of the effluent changes rapidly, so that it is necessary to shorten the measurement interval in order to obtain a liquid having a desired property (metal ion concentration).
- the rate of change in electrical conductivity varies depending on the type of acid used as well as pH, and also varies depending on the concentration of acid flowing through the adsorption tower. That is, the TAA salt concentration contained in the effluent from the adsorption tower is high when the acid concentration is high, and thin when it is thin.
- concentration maintenance state When sufficient TAA ions are present in the adsorption tower, the concentration state is maintained (if the outflow rate is kept constant) and the outflow is performed (hereinafter also referred to as “concentration maintenance state”).
- the concentration of TAA salt contained in the effluent gradually decreases and the concentration of free acid and metal salt increases.
- the timing at which the free acid and metal salt start to be mixed is detected by measuring the electrical conductivity. It becomes possible.
- TAA tetramethylammonium
- 2N hydrochloric acid is used as the acid
- SV flow rate 1
- the liquid flowing out from the column is tetramethylammonium chloride containing no hydrochloric acid.
- TMAC tetramethylammonium
- it is about 80 mS / cm, and rises up to about 500 mS / cm (2N hydrochloric acid) with mixing of hydrochloric acid.
- the electrical conductivity indicated by the electrical conductivity meter is statistically processed, and when the statistical value becomes 5% or more larger than the electrical conductivity in the concentration maintaining state, What is necessary is just to stop collection
- a known processing method may be adopted as appropriate. For example, a value is obtained every predetermined time (for example, 0.1 seconds), and an arithmetic average of the predetermined time (for example, 2 seconds) is obtained. Alternatively, the geometric average value may be used as electric conductivity.
- Some commercially available electric conductivity meters are equipped with such statistical processing means and have a function of displaying the electric conductivity after statistical processing. In the present invention, such an electric conductivity meter is used as it is. Is also possible.
- the time interval for statistical processing must be changed mainly by the flow rate (flow velocity) of the effluent.
- flow rate flow velocity
- the electrical conductivity of the effluent changes rapidly, so that it is necessary to shorten the measurement interval in order to obtain a liquid having a desired property (metal ion concentration).
- TAAH can be produced by subjecting the TAA salt contained in the solution recovered from the waste liquid to electrolysis or contact with an anion exchange resin having hydroxide ions as a counter ion by the above method.
- TAA salt electrolysis process The electrolysis process of electrolyzing the obtained TAA salt to make TAAH is not particularly limited, and a known method can be used. Among them, the anode, cathode, and cation exchange described in Patent No. 2059769 It is preferable to produce by electrolysis using a membrane.
- TAAH contact process between TAA salt and anion exchange resin
- a method for producing TAAH by bringing a TAA salt contained in a solution recovered from waste liquid into contact with an anion exchange resin methods described in JP-A-52-003009 and Japanese Patent Application No. 2009-197778 are employed.
- the This method is a method for producing TAAH from TAAC by contacting an anion exchange resin (OH type anion exchange resin) having a hydroxide ion as a counter ion with a TAA salt.
- an anion exchange resin OH type anion exchange resin having a hydroxide ion as a counter ion with a TAA salt.
- high-purity TAAH can be easily produced from TAAC without electrodialysis or electrolysis.
- a highly pure TAA salt can be obtained. Further, compared to the conventional method, a metal ion removing step such as a chelate resin is not necessary, so that the total cost for processing can be reduced. Further, when the TAA salt is recovered from the photoresist developing waste liquid, the amount of metal impurities can be reduced to 1/10 or less of the original amount. Further, when TAAH is produced by the above method using this, the obtained TAAH can be suitably used as a developer for a liquid crystal display.
- TMAH Tetramethylammonium hydroxide
- TMAC tetramethylammonium chloride
- ICS2000 manufactured by Dionex is used, the column is ION-pac CS12A for cation analysis, ION-pac AS15 is used for anion analysis, and the eluent is methanesulfonic acid for cation analysis.
- Anion analysis was performed using potassium hydroxide.
- the metal ion concentration contained in the solution was determined by the high frequency inductively coupled plasma mass spectrometry (ICP-MS) method (measuring device: HP-4500 (manufactured by Agilent)) and the high frequency inductively coupled plasma emission analysis (ICP-OES) method ( Measuring apparatus: Measured with iCAP 6500 DUO (manufactured by Thermo Electron Co., Ltd.).
- ICP-MS high frequency inductively coupled plasma mass spectrometry
- ICP-OES high frequency inductively coupled plasma emission analysis
- the pH of the solution was measured by a pH electrode method (measuring device: HM-30R, manufactured by Toa DKK Corporation).
- the electrical conductivity was measured using an SC meter (model number: SC72-21JAA) manufactured by Yokogawa Electric.
- Example 1 100 ml of weakly acidic cation exchange resin Diaion WK40L (manufactured by Mitsubishi Chemical Corporation) was packed in a glass column having a diameter of 22 mm ⁇ 750 mm, and the above regeneration treatment was performed.
- TMAH waste solution photoresist development waste solution, photoresist content, COD conversion 42 ppm, metal ion concentration Na: 9.0 ppb, Al: 4.4 ppb, K: 1.1 ppb, Ca: 12.2. 9 ppb, Cr: 5.5 ppb, Fe: 16.4 ppb, Ni: 1.2 ppb, Cu: 0.14 ppb
- SV space velocity
- the metal ion concentration increased from F-3 whose pH was 7 or less.
- the total concentration of metal ions from fractions B to F-2 was 10 ppb or less for all metals
- the TMAC concentration was 7.8% by mass (0.71 mol / l)
- no HCl was contained.
- the TMAC recovery rate at this time was 90.0%.
- Example 2 TMAC was obtained in the same manner as in Example 1 except that 2N hydrochloric acid was used as the acid used for elution and the operation of the contact step with hydrochloric acid was performed under the following conditions. The results are shown in Table 2.
- Table 2 shows that the metal ion concentration increases when the pH is 7 or less.
- Example 3 TMAC was obtained in the same manner as in Example 1 except that 4N hydrochloric acid was used as the acid used for elution and the operation of the contact step with hydrochloric acid was performed under the following conditions. The results are shown in Table 3.
- Table 3 shows that the metal ion concentration increases when the pH is 7 or less.
- Example 4 The TMAC obtained by the method of Example 1 was evaporated and concentrated to prepare a 27.5% by mass TMAC solution. The obtained concentrated TMAC solution was subjected to the following electrolysis step to produce TAAH.
- a three-chamber type electrolytic cell in which one anion exchange membrane and one cation exchange membrane (both Nafion 90209 (manufactured by DuPont)) were arranged in order from the anode was used.
- the effective membrane area of the ion exchange membrane was 2 dm 2 , and the Nafion membrane was placed with the surface having a carboxylic acid group facing the cathode side.
- the anode was a titanium plate plated with platinum, and the cathode was SUS316.
- 0.5N sulfuric acid was circulated in the anode chamber of the electrolytic cell, the TMA chloride solution was circulated between the anion exchange membrane and the cation exchange membrane on the cathode side, and pure water was circulated in the cathode chamber to obtain a current density of 18A.
- Electrolysis was continuously performed while maintaining the temperature at 40 ° C./dm 2 .
- the concentration of tetramethylammonium hydroxide in the cathode chamber was set to 18% by mass.
- pure water was added when the concentration increased, and the components were added when the concentration decreased, so that the concentration of the liquid circulating in each chamber became constant.
- Table 4 shows the analysis results of the TAAH solution obtained after the start of electrolysis, after 12 hours of operation (stable), and after 3 months of continuous operation.
- Example 5 was manufactured by electrolyzing TMAC obtained by the method of Example 2 by the method similar to Example 4.
- FIG. The results are shown in Table 4.
- Example 6 Regeneration treatment of cation exchange resin (H-type cation exchange resin)
- a cation exchange resin 1000 ml is packed into a vinyl chloride column with a diameter of 50 mm ⁇ 2000 mm, and the space velocity SV when passing ultrapure water, 1N HCl (hydrochloric acid), etc. is 4 (l / hour).
- a regeneration treatment was performed in the same manner as in Example 1 except that the amount of liquid used was changed to 5 L / L-resin.
- the metal ion concentration increased from J-6 where the pH was 7 or less. Further, from the results in Table 6, the metal ion concentration of the combined liquid of fractionation liquids B to J-5 is 3.5 ppb or less for all metals, and the TMAC concentration is 7.7% by mass (0.71 mol / l). It was confirmed that HCl was not contained. The TMAC recovery rate at this time was 87.8%.
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Abstract
Description
特に、半導体向けの用途においては、半導体基板が汚染されるため、不純物を出来るだけ含有しない高純度のTAAHが要求されている。
(金属イオン、及び水酸化テトラアルキルアンモニウムを含む溶液)
本発明において、金属イオン、及び水酸化テトラアルキルアンモニウムを含む溶液については、これら成分を含んでいるものであれば特に制限されるものではない(以下、「原料溶液」ともいう)。これら成分を含んでおり、かつ半導体製造工程、液晶ディスプレイ製造工程等で多量に発生することから、該工程から排出されるフォトレジスト現像廃液であることが好ましい。これら廃液は、露光後のフォトレジストをアルカリ現像液で現像する際に排出される廃液であり、フォトレジスト、TAAH、及び、金属イオンを主として含んでいる。
本発明においては、上記の如き原料溶液を水素イオン型(以下「H型」とも称す)の陽イオン交換樹脂が充填された吸着塔に通液して、該陽イオン交換樹脂にTAAを吸着させる。
本発明において、上記陽イオン交換樹脂としては、特に限定されず、公知のものを用いることができる。具体的には、イオン交換基がスルホン酸基である強酸性陽イオン交換樹脂、イオン交換基がカルボキシル基である弱酸性陽イオン交換樹脂のいずれも使用することができる。中でも、イオン交換容量が大きいものが多く、使用する樹脂量を低減できるという点から弱酸性陽イオン交換樹脂を使用することが好ましい。さらに、弱酸性陽イオン交換樹脂の場合、後述するTAAイオンの溶離も容易である。
本発明においては、上記のH型の陽イオン交換樹脂を充填した吸着塔へ、原料溶液を通液させて陽イオン交換樹脂に接触させることによって、TAAイオンを陽イオン交換樹脂に吸着させる。
本発明においては、上記方法によりTAAイオンを陽イオン交換樹脂に吸着させた後、該陽イオン交換樹脂を充填した吸着塔に酸溶液を通液して、吸着塔から流出する回収液を回収してテトラアルキルアンモニウム塩を製造する。
上述の酸溶液の通液により、吸着塔の一端からTAAイオンが、用いた酸に応じた酸根(例えばCl-など)を対イオンとしてTAA塩として流出(溶離)してくるので、当該流出液を貯留槽に回収し、該回収液を後述する電気分解に供する。
pHの所定値は、用いる酸の種類により異なる。例えば、酸として強酸である塩酸を用いた場合、流出してくる塩である塩化TAA(以下「TAAC」)は中性であるため、吸着塔中にTAAイオンが十分に存在する状態では、流出液はほぼ中性(強酸性陽イオン交換樹脂の場合)又は弱塩基性~中性(弱酸性陽イオン交換樹脂の場合)であるが、TAAイオンが少なくなるにつれて、徐々に酸性を呈し始める。
電気伝導度の変化率は、pHと同様に用いる酸の種類によって異なると共に、吸着塔に流す酸濃度によっても異なる。即ち、吸着塔からの流出液に含まれるTAA塩濃度は、酸濃度が濃ければ濃く、薄ければ薄い状態となっている。そして吸着塔内に十分にTAAイオンが存在する場合には、(流出速度を一定に保っていれば)その濃度状態を保持して流出してくる(以下「濃度維持状態」ともいう)。
本発明においては、上記の方法にて、廃液から回収した溶液に含まれるTAA塩を電解又は、対イオンとして水酸化物イオンを有する陰イオン交換樹脂に接触させることによりTAAHを製造することが出来る。
得られたTAA塩を電解してTAAHにする電解工程については、特に制限されるものではなく、公知の方法を用いることができるが、なかでも特許2059769号に記載の陽極、陰極、陽イオン交換膜を使用した電気分解により製造することが好ましい。
また、廃液から回収した溶液に含まれるTAA塩と、陰イオン交換樹脂とを接触させることによりTAAHを製造する方法については、特開昭52-003009や特願2009-197778記載の方法が採用される。この方法は、TAA塩と対イオンとして水酸化物イオンを有する陰イオン交換樹脂(OH型陰イオン交換樹脂)を接触させることによりTAACからTAAHを製造する方法である。この方法では、電気透析、又は電気分解を行わなくてもTAACから容易に純度の高いTAAHを製造することができる。
用いた陽イオン交換樹脂は、使用に際して、ガラス塔に充填し、超純水、1N-HCl(塩酸)、及び超純水をこの順で通液させて、対イオンを水素イオンとした。各液は、空間速度SV 5(l/時間)で通液させ、各液の使用液量は、10L/L-樹脂とした。
水酸化テトラメチルアンモニウム(TMAH)、塩化テトラメチルアンモニウム(TMAC)濃度、塩化物イオンはイオンクロマトグラフィー法より分析した。
弱酸性陽イオン交換樹脂ダイヤイオンWK40L(三菱化学社製)100mlを直径22mm×750mmのガラスカラムに充填し、上記の再生処理を行った。
このカラムに8000mlの0.5質量%TMAH廃液(フォトレジスト現像廃液 フォトレジスト含有量 COD換算42ppm、金属イオン濃度 Na:9.0ppb、Al:4.4ppb、K:1.1ppb、Ca:12.9ppb、Cr:5.5ppb、Fe:16.4ppb、Ni:1.2ppb、Cu:0.14ppb )を空間速度SV=20(l/時間)で通液した。
次いで、100mlの0.5質量%TMAHを空間速度SV=1(l/時間)で通液し、レジスト分を洗浄した。
次に、溶離液として800mlの1N―HClを空間速度SV=1(l/時間)で通液し、吸着したTMAイオンをTMACとして溶出させた。溶出液は、順次、分取して以下に示す12つの液に分別した。0から500mlまでは100mlずつ5つ(分別液A~E)、500から600mlまでは20mlずつ5つ(分別液F-1~5)、600から800mlまでは100mlずつ2つ(分別液G、H)の計12つに分けた。これらの分別液をイオンクロマト法にてTMAC濃度を、ICP質量分析法にて金属イオン濃度を、pHメーターにてpHをそれぞれ測定した。その結果を表1、図2および図3に示す。
溶離する際に使用する酸として2Nの塩酸を使用し、塩酸との接触工程の操作を下記の条件で行った以外は実施例1と同様の操作により、TMACを得た。結果を表2に示す。
次に、溶離液として600mlの2N―HClを空間速度SV=1(l/時間)で通液し、吸着したTMAイオンをTMACとして溶出させた。溶出液は、順次、分取して以下に示す12つの液に分別した。0から400mlまでは80mlずつ5つ(分別液A~E)、400から500mlまでは20mlずつ5つ(分別液F-1~5)、500から600mlまでは50mlずつ2つ(分別液G、H)の計12つに分けた。これらの分別液をイオンクロマト法にてTMAC濃度を、ICP質量分析法にて金属イオン濃度を、pHメーターにてpHをそれぞれ測定した。その結果を表2に示す。
溶離する際に使用する酸として4Nの塩酸を使用し、塩酸との接触工程の操作を下記の条件で行った以外は実施例1と同様の操作により、TMACを得た。結果を表3に示す。
次に、溶離液として600mlの4N―HClを空間速度SV=1(l/時間)で通液し、吸着したTMAイオンをTMACとして溶出させた。溶出液は、順次、分取して以下に示す12つの液に分別した。0から250mlまでは50mlずつ5つ(分別液A~E)、250から500mlまでは50mlずつ5つ(分別液F-1~5)、500から600mlまでは50mlずつ2つ(分別液G、H)の計12つに分けた。これらの分別液をイオンクロマト法にてTMAC濃度を、ICP質量分析法にて金属イオン濃度を、pHメーターにてpHをそれぞれ測定した。その結果を表3に示す。
実施例1の方法により得られたTMACを蒸発濃縮し、27.5質量%のTMAC溶液を調製した。得られた濃縮TMAC溶液を以下の電解工程に付し、TAAHの製造を行った。
実施例2の方法で得られたTMACを実施例4と同様の方法により電解することでTMAHを製造した。結果を表4に示す。
(陽イオン交換樹脂の再生処理(H型陽イオン交換樹脂))
陽イオン交換樹脂1000mlを直径50mm×2000mmの塩ビ製カラムに充填し、超純水、1N-HCl(塩酸)等を通液する際の空間速度SVを4(l/時間)とし、各液の使用液量を5L/L-樹脂とした以外は、実施例1と同様にして再生処理を行った。
このカラムに80lの実施例1と同じ組成の0.5質量%TMAH廃液を空間速度SV=20(l/時間)で通液した。
次いで、2lの0.5質量%TMAHを空間速度SV=5(l/時間)で通液し、レジスト分を洗浄した。
次に、溶離液として8000mlの1N―HClを空間速度SV=5(l/時間)で通液し、吸着したTMAイオンをTMACとして溶出させた。溶出液は、順次、分取して以下に示す23つの液に分別した。まず、0~1000mlを分別し(分別液A)、1000から5000mlまでは500mlずつ8つ(分別液B~I)、5000から6000mlまでは100mlずつ10つ(分別液J-1~J-10)、6000から8000mlまでは500mlずつ4つ(分別液K~N)の計23つに分けた。これらの分別液をイオンクロマト法にてTMAC濃度を、ICP質量分析法にて金属イオン濃度を、pHメーターにてpHをそれぞれ測定した。その結果を表5、図4および図5に示す。また、分別液B~J-5の合算液のpH、電気伝導度、TMAC濃度、金属イオン濃度を表6に示す。
Claims (5)
- 金属イオン及び水酸化テトラアルキルアンモニウムを含有する溶液より、テトラアルキルアンモニウム塩を含有する溶液を得るテトラアルキルアンモニウム塩溶液の製造方法であって、
(1)水素イオン型の陽イオン交換樹脂が充填された吸着塔に、金属イオン及び水酸化テトラアルキルアンモニウムを含有する溶液を通液させて、該溶液中のテトラアルキルアンモニウムイオンを、陽イオン交換樹脂に吸着させる吸着工程、
(2)前記吸着工程にて、テトラアルキルアンモニウムイオンが吸着された陽イオン交換樹脂が充填された吸着塔に、酸溶液を通液させて、該樹脂に吸着されたテトラアルキルアンモニウムイオンを前記酸塩として溶離させ、該吸着塔より流出する流出液を貯留槽に回収する回収工程、
の各工程を含んでなり、且つ、前記回収工程において、吸着塔からの流出液のpH、および/または電気伝導度を測定し、該流出液のpHが所定のpHとなった時点および/または電気伝導度が所定の変化量だけ変化した時点で、前記貯留槽への流出液の回収を停止することを特徴とするテトラアルキルアンモニウム塩溶液の製造方法。 - 前記回収工程における、前記酸溶液が強酸であり、貯留槽への流出液の回収を停止させる流出液の所定のpHが3~8の範囲にある請求項1記載のテトラアルキルアンモニウム塩溶液の製造方法。
- 前記回収工程における、貯留槽への流出液の回収を停止させる流出液の所定の電気伝導度の変化量が、テトラアルキルアンモニウム塩濃度が一定の状態を維持している状態で流出している時点の電気伝導度に対して5%である請求項1記載のテトラアルキルアンモニウム塩溶液の製造方法。
- 請求項1乃至3の何れかに記載の方法でテトラアルキルアンモニウム塩を製造した後、得られたテトラアルキルアンモニウム塩を原料として水酸化テトラアルキルアンモニウムを製造することを特徴とする水酸化テトラアルキルアンモニウムの製造方法。
- 水酸化テトラアルキルアンモニウム溶液からテトラアルキルアンモニウム塩溶液を製造するための製造装置であって、
陽イオン交換樹脂が充填された吸着塔、該吸着塔より流出された流出液を回収する貯留槽、及び、該流出液のpHおよび/または電気伝導度を測定するためのpH測定手段および/または電気伝導度測定手段を備えることを特徴とする前記製造装置。
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CN114147052B (zh) * | 2020-09-05 | 2023-01-24 | 中国石油化工股份有限公司 | 一种高沸物金属离子吸附可再生系统及工艺 |
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JPWO2012090699A1 (ja) | 2014-06-05 |
KR20130138191A (ko) | 2013-12-18 |
TW201228729A (en) | 2012-07-16 |
KR101879370B1 (ko) | 2018-07-18 |
CN103080070A (zh) | 2013-05-01 |
CN103080070B (zh) | 2015-02-25 |
TWI495509B (zh) | 2015-08-11 |
JP5887279B2 (ja) | 2016-03-16 |
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