WO2012053297A1 - レーザ加工機制御装置およびレーザ加工機制御方法 - Google Patents
レーザ加工機制御装置およびレーザ加工機制御方法 Download PDFInfo
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- WO2012053297A1 WO2012053297A1 PCT/JP2011/070898 JP2011070898W WO2012053297A1 WO 2012053297 A1 WO2012053297 A1 WO 2012053297A1 JP 2011070898 W JP2011070898 W JP 2011070898W WO 2012053297 A1 WO2012053297 A1 WO 2012053297A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/127—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an enclosure
- B23K26/128—Laser beam path enclosures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0401—Arrangements for thermal management of optical elements being part of laser resonator, e.g. windows, mirrors, lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0407—Liquid cooling, e.g. by water
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
Definitions
- the present invention relates to a laser processing machine control device and a laser processing machine control method for reducing the running cost of a laser processing machine.
- the laser blower, optical path purge, oscillator purge, and cooling device are always operated even during idle operation when laser processing is not performed, so the operator does not perform stop operation. In some cases, there was a situation where running costs were spent even though laser processing was not actually performed.
- the power supply units of the drive system power supply corresponding to the plurality of electric devices are brought out of the power-up state.
- a technique for gradually switching to a power-down state is disclosed (for example, see Patent Document 1).
- the stop time in the stepwise stop method is controlled by a predetermined time. Therefore, there is a problem that the stop is executed regardless of the business mode of the user (operator), and it is difficult to effectively reduce the running cost according to the characteristics of the laser processing machine.
- the present invention has been made in view of the above, and considers the characteristics of each functional element constituting the laser processing machine, and also copes with unexpected changes in the business mode of the user, and reduces running costs.
- An object of the present invention is to obtain a laser processing machine control device and a laser processing machine control method capable of performing the above.
- the present invention provides a laser processing machine comprising a plurality of element means including at least a laser blower means, an optical path purge means, and a temperature control means.
- Measuring means for measuring an elapsed time from the last trigger time when the machining operation is stopped and no user operation is performed on the laser processing machine, and after the last trigger time, based on the elapsed time, a plurality of the above-mentioned Control means for stopping the element means when a condition defined for each element means is satisfied is provided.
- FIG. 1 is a diagram showing the configuration of the laser beam machine according to the first to fourth embodiments.
- FIG. 2 is a flowchart showing a control method of the laser beam machine according to the first embodiment.
- FIG. 3 is a diagram showing the relationship between the time from purge stop and purge activation according to the second embodiment and the N 2 concentration in the optical path.
- FIG. 4 is a flowchart showing a control method of the laser beam machine according to the second embodiment.
- FIG. 5 is a diagram illustrating a change in the N 2 concentration in the optical path during the intermittent operation of the optical path purge according to the third embodiment.
- FIG. 6 is a flowchart showing a control method of the laser beam machine according to the third embodiment.
- FIG. 1 is a diagram showing a configuration of a laser beam machine 100 according to the first embodiment of the present invention.
- a laser processing machine 100 includes a laser oscillator 1, a discharge electrode 2 inside the laser oscillator 1, a gas circulation blower 3 (laser blower means) inside the laser oscillator 1 for circulating laser gas inside the laser oscillator 1, and a laser.
- a partial reflection mirror 4 that can reflect a part of the light 11 and transmit the other, a total reflection mirror 5 that totally reflects the laser light 11, and a heat exchanger 6 that performs heat exchange for controlling the temperature of the laser gas are provided.
- the laser oscillator 1 includes a vacuum vessel 7 that houses a gas circulation blower 3, a discharge electrode 2, and a heat exchanger 6.
- the vacuum vessel 7 is filled with a laser gas such as CO 2 having a sufficient pressure of about 1 atm (for example, 55 Torr) when the laser oscillator 1 is in operation.
- the laser processing machine 100 also includes a temperature control unit 8 (temperature control means).
- the temperature control unit 8 supplies cooling water (partial mirror 4, total reflection mirror 5, heat exchanger 6, discharge electrode 2 and the like to the cooling water ( It has a function of controlling the temperature of each part by sending heated water).
- the laser processing machine 100 is filled with a device (not shown) for generating a discharge in the discharge electrode unit 2, a device (not shown) for controlling the gas circulation blower 3, and a laser gas for laser oscillation of the laser oscillator 1.
- a control panel 10 for controlling the operation of the laser oscillator 1 and a power supply panel 9 in which equipment (not shown) for evacuating the vacuum container 7 is housed.
- the control means 10 can control each functional block of the laser processing machine 100 including the gas circulation blower 3, the temperature control unit 8, and the optical path purge function described below, either directly or via the power supply panel 9 or the like.
- Connected to the control means 10 is an input terminal 18 such as a personal computer through which an operator can input various set values.
- the control means 10 also has a function of measuring the elapsed time from the last trigger when the user's operation on the laser beam machine 100 is lost.
- a laser beam 11 taken out from the laser oscillator 1 is irradiated onto a workpiece (not shown) through an optical path 20 purged with N 2 (nitrogen).
- the regulator 25 is connected to the high pressure of N 2, the optical path purge with N 2, the optical path 20 through a valve 24 which decompressed N 2 becomes "open” to a higher pressure than the atmospheric pressure by the regulator 25 It is executed by being filled in.
- the laser processing machine 100 includes a laser gas supply source 12, a pressure gauge 13, and a vacuum pump 14.
- the laser gas supply source 12 is, for example, a gas cylinder that supplies laser gas to the vacuum vessel 7.
- the pressure gauge 13 measures the pressure in the vacuum vessel 7.
- the vacuum pump 14 has a function of evacuating the vacuum container 7. Valves 15, 16, and 17 are provided between the vacuum vessel 7, the laser gas supply source 12, the pressure gauge 13, and the vacuum pump 14, respectively.
- the time from the last trigger (laser oscillation stop, screen operation, etc.) to automatic stop is set as the stop time for each functional element of the laser beam machine 100 in advance.
- Time counting is started (step S201: Yes).
- the count is reset when the above condition is not satisfied, such as when the operator performs some operation (step S201: No).
- step S202: Yes When the count is continued and the control (automatic stop function) of the present embodiment for the laser processing machine 100 is enabled (step S202: Yes), the process proceeds to step S203. In other cases (step S202: No), the count is reset.
- step S203 when the vacuum chamber 7 of the laser resonator 1 is evacuated (step S203: Yes), the gas circulation blower 3 and the optical path purge (valve 24 ") regardless of the elapsed time from the last trigger time. N 2 filled) into the optical path 20 by opening ", the temperature control unit 8 immediately all stops (step S210).
- step S203 when the stop time tb, tp, tc of each functional element is reached, the corresponding functional element is stopped.
- the gas circulation blower 3 laser blower means
- Step S205 When the elapsed time t from the time of the last trigger exceeds “optical path purge stop time: tp” (step S206: Yes), the valve 24 is set to “closed” and the N 2 purge of the optical path 20 is stopped (step S207). .
- step S208: Yes When the elapsed time t from the time of the last trigger exceeds “temperature control means stop time: tc” (step S208: Yes), the temperature control unit 8 (temperature control means) is stopped (step S209).
- the operator can set a stop time in advance for each functional element, it is possible to realize automatic stop as the operator intends.
- each function element is stopped for each function element.
- the useless operation can be reduced by automatically stopping according to the above. Thereby, the running cost of the whole laser beam machine can be reduced.
- FIG. The configuration of the laser beam machine 100 in the present embodiment is the same as that shown in FIG.
- the operator inputs in advance to the input terminal 18 a waiting time that is a time that the operator (user) can wait until the laser processing machine 100 is activated.
- the activation and stop of each functional element is controlled according to the magnitude relationship between the standby time and the required activation time of each functional element.
- gas circulation blower 3 (Rezaburowa means), N 2 filled in the optical path 20 by opening valve 24 (optical path purge unit), an oscillator purge means (not shown), the temperature control unit 8 (temperature control means)
- Each time (starting time) tb ′, tp ′, tr ′, tc ′ required from the stop state to the completion of preparation is physically determined and can be obtained by calculation or the like.
- the required optical path purge activation time tp ′ is such that the N 2 concentration in the optical path 20 becomes 100% after a sufficient time has elapsed since the optical path purge stopped (the optical path 20 is in the atmospheric state: N 2 concentration 78%).
- the time required for starting the temperature control means tc ′ can be obtained from the following equation based on the difference ⁇ Tc between the ready temperature and the current temperature.
- tc ' E ( ⁇ Tc)
- the function E is a function determined by the capability of the temperature control unit 8. Even if the absolute value of the temperature difference is the same, tc ′ may differ depending on the magnitude relationship between the ready temperature and the current temperature.
- the preparation completion temperature When the preparation completion temperature is lower than the current temperature, the temperature control unit 8 performs cooling, but when the preparation completion temperature is higher than the current temperature, the temperature control unit 8 performs heating. Examples of the preparation completion temperature include 15 ° C. (operating temperature 10 ° C.) and 25 ° C. (operating temperature 30 ° C.).
- the operator inputs in advance to the input terminal 18 a waiting time t ′ that is a time that the operator (user) can wait until the laser processing machine 100 is activated (step S401).
- step S403: Yes When the count is continued and a predetermined time has elapsed and the control (automatic control function) of the present embodiment for the laser beam machine 100 is enabled (step S403: Yes), the process proceeds to step S404. In other cases (step S403: No), the count is reset.
- step S404 when the inside of the vacuum container 7 of the laser resonator 1 is evacuated (step S404: Yes), the gas circulation blower 3 and the optical path purge (filling N 2 into the optical path 20 by opening the valve 24) All the temperature control units 8 are immediately stopped (step S413).
- step S404 If it is not during evacuation (step S404: No), the process proceeds to step 405. If the time required for starting the laser blower tb 'is shorter than the waiting time t' (step S405: Yes), the gas circulation blower 3 (laser blower means). Is stopped (step S406). When the laser blower activation required time tb 'is longer than the standby time t' (step S405: No), the activation state of the gas circulation blower 3 is maintained.
- step S407: Yes if the required time tp ′ for starting the optical path purge is shorter than the waiting time t ′ (step S407: Yes), the valve 24 is closed to stop or maintain the optical path purge (step S408), and start the optical path purge.
- step S407: No When the required time tp ′ is longer than the waiting time t ′ (step S407: No), the valve 24 is opened to activate or maintain the optical path purge (step S409).
- step S410: Yes when the temperature control means activation required time tc ′ is shorter than the standby time t ′ (step S410: Yes), the temperature control unit 8 is stopped or maintained (step S411), and the temperature control means activation required time is reached. If tc ′ is longer than the standby time t ′ (step S410: No), the temperature control means is activated or maintained (step S412). Thereafter, the process returns to step S407 and the control is maintained by the control means 10.
- the functional elements of the laser processing machine have clear parameters (for example, N 2 concentration, current temperature, etc.) that determine the required start time, such as an optical path purge unit and a temperature control unit.
- the time (starting time) required until a fully operable state is maintained within a certain range when an activation instruction is received during execution of intermittent operation that alternately repeats starting and stopping. Intermittent operation is performed for functional elements that can be used.
- the waiting time t ′ allowed by the operator is maintained.
- the structure of the laser beam machine 100 in this Embodiment is the same as that of FIG.
- the intermittent operation of the optical path purge will be described with reference to FIG. 5 showing the change in the N 2 concentration in the optical path 20 during the intermittent operation.
- the N 2 concentration in the optical path 20 decreases when the valve 24 is closed (optical path purge OFF).
- the N 2 concentration in the optical path 20 starts to increase when the valve 24 is opened (optical path purge ON).
- the valve 24 is closed again (optical path purge OFF). Thereafter, this intermittent operation is repeated.
- the point in the intermittent operation is the lowest concentration N 2 W that determines the longest startup required time tp′w. It is sufficient if the longest startup required time tp′w ⁇ waitable time t ′ determined by this is satisfied. Therefore, the valve 24 in the closed as long as to be immediately valve 24 at the time (optical path purge OFF) N 2 concentration is lowered to the lowest concentration N 2W in the open (the optical path purge ON), the optical path purge ON and OFF The period can vary. That is, the maximum concentration N 2b during the short operation can be arbitrarily set between N 2W and 100%. Therefore, it is possible to set the optimum intermittent operation that balances the responsiveness and the economical efficiency of the laser processing machine 100.
- the temperature control unit 8 measures the water temperature of the cooling water (heating water), and alternately starts and stops so that the difference from the preparation completion temperature, which is the target temperature, falls within a certain range. Perform intermittent operation.
- the temperature control means activation required time tc 'within the standby time t'.
- a control method of the laser beam machine 100 according to the present embodiment for executing the intermittent operation will be described with reference to the flowchart of FIG.
- the flowchart of FIG. 6 is the same as the flow of steps S401 to S406 and S413 of FIG.
- the optical path purge and temperature control means are intermittent in step S601. Run the operation.
- the intermittent operation may be executed only by either the optical path purge or the temperature control means, or may be executed by both.
- the activation required time of each element can be kept below the waiting time t ′ set by the user by the intermittent operation of the control method of the laser beam machine 100 according to the present embodiment.
- this method it is possible to always realize the required startup time that is equal to or shorter than the standby time desired by the operator while the running cost is suppressed by intermittent operation. That is, it is possible to set an optimal intermittent operation that balances the responsiveness and economic efficiency of the laser processing machine 100.
- Embodiment 4 The configuration of the laser beam machine 100 in the present embodiment is the same as that shown in FIG. As described in the second embodiment, for example, the gas circulation blower 3 (laser blower means), N 2 filling of the optical path 20 by opening the valve 24 (optical path purge means), and the temperature control unit 8 (temperature control means)
- the gas circulation blower 3 laser blower means
- N 2 filling of the optical path 20 by opening the valve 24
- temperature control unit 8 temperature control means
- Each time (starting required time) tb ′, tp ′, tc ′, etc. required from the stop state to the completion of preparation is physically determined and can be obtained by calculation or the like. As described above, these values vary for each functional element and further depending on the state at that time. Therefore, when the laser beam machine 100 is activated, the functional element having the longest activation time determines the overall activation time of the laser beam machine 100.
- the laser blower startup required time tb ′ when the user performs a startup operation from the input terminal 18 or the like to the laser processing machine 100, for example, the laser blower startup required time tb ′, the purge startup required time tp ′, and the temperature control means startup required
- the time tc ′ is calculated, and the operation is started so that the activation completion times of the respective functional elements become the same in order from the longest required activation time.
- control method of the laser beam machine according to the present embodiment is executed when a start-up operation is entered while each functional element of the laser beam machine 10 is stopped. It is possible to implement in combination with each. Thereby, the running cost of the laser beam machine can be further reduced.
- laser blower means optical path purge means, temperature control means, and the like have been described as examples of functional elements in the laser processing machine. It can be applied by calculating the required time. That is, the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the invention in the implementation stage. Further, the above embodiments include inventions at various stages, and various inventions can be extracted by appropriately combining a plurality of disclosed constituent requirements.
- the laser beam machine control device and the laser beam machine control method according to the present invention are useful for reducing the running cost of the laser beam machine, and particularly for reducing the running cost of the laser beam machine during idle operation. Is suitable.
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Abstract
Description
図1は、本発明にかかる実施の形態1のレーザ加工機100の構成を示す図である。図1において、レーザ加工機100は、レーザ発振器1、レーザ発振器1内部にある放電電極2、レーザ発振器1内部にあってレーザ発振器1内部のレーザガスを循環させるガス循環ブロア3(レーザブロワ手段)、レーザ光11の一部を反射し他を透過し得る部分反射鏡4、レーザ光11を全反射する全反射鏡5、レーザガスの温度制御のための熱交換をする熱交換器6を備える。
本実施の形態におけるレーザ加工機100の構成も図1と同様である。本実施の形態においては、レーザ加工機100が起動するまでにオペレータ(ユーザ)が待つことができる時間である待機可能時間を、例えば入力端末18にオペレータが予め入力する。この待機可能時間と各機能要素の起動所要時間との大小関係により各機能要素の起動および停止が制御される。
DN2=F(t)
DN2n=G(tn)
tp’=t*-g(DN2)=t*-g(F(t))
で表される。つまり、光路パージ起動所要時間tp’はパージ停止時間tより求めることができる。
tc’=E(△Tc)
関数Eは温度制御ユニット8の能力によって定まる関数であり、温度差の絶対値が同じでも準備完了温度と現在温度との大小関係によってtc’は異なる場合がある。準備完了温度が現在温度より低い場合は、温度制御ユニット8は冷却を行うが、準備完了温度が現在温度より高い場合は、温度制御ユニット8は加熱を行う。準備完了温度としては、例えば、15℃(稼働中温度10℃)、25℃(稼働中温度30℃)などがある。
実施の形態2において説明したように、レーザ加工機の機能要素には光路パージ手段、温度制御手段などのように起動所要時間を決定するパラメータ(例えばN2濃度、現在温度など)が明らかなものがある。本実施の形態においては、起動と停止を交互に繰り返す間欠運転実行中にいつ起動指示が来ても完全に稼動可能な状態になるまでに要する時間(起動所要時間)を一定範囲内に保つことが可能な機能要素については間欠運転を実行する。これによって、オペレータが許容する待機可能時間t’を維持する。なお、本実施の形態におけるレーザ加工機100の構成も図1と同様である。
本実施の形態におけるレーザ加工機100の構成も図1と同様である。実施の形態2において説明したように、例えば、ガス循環ブロワ3(レーザブロワ手段)、弁24を開くことによる光路20へのN2充填(光路パージ手段)、温度制御ユニット8(温度制御手段)の停止状態から準備完了までにかかるそれぞれの時間(起動所要時間)tb’、tp’、tc’などは、物理的に決定されるものであるから計算等により求めることができる。これらの値は上述したように機能要素ごとに、さらにはそのときの状態によって変化する。従って、レーザ加工機100の起動時には、最も長い起動所要時間の機能要素がレーザ加工機100全体の起動所要時間を決定することになる。
2 放電電極
3 ガス循環ブロア
4 部分反射鏡
5 全反射鏡
6 熱交換器
7 真空容器
8 温度制御ユニット
9 電源盤
10 制御手段
11 レーザ光
12 レーザガス供給源
13 圧力計
14 真空ポンプ
15、16、17、24 弁
18 入力端末
20 光路
25 レギュレータ
100 レーザ加工機
S201~S210、S401~S413、S601 ステップ
Claims (18)
- 少なくともレーザブロワ手段、光路パージ手段、温度制御手段を含んだ複数の要素手段を備えたレーザ加工機において、
前記レーザ加工機のレーザ加工動作が停止しており且つ当該レーザ加工機に対するユーザの操作が無くなった最終トリガ時からの経過時間を計測する計測手段と、
前記最終トリガ時の後、前記経過時間に基づいて、複数の前記要素手段を当該要素手段毎に定められた条件が満たされる場合に停止する制御手段と
を備えたことを特徴とするレーザ加工機制御装置。 - 前記制御手段は、前記経過時間が前記要素手段毎に予め定められた停止時間を越えた時に当該要素手段を別個に停止する
ことを特徴とする請求項1に記載のレーザ加工機制御装置。 - 前記制御手段は、
前記経過時間が第1停止時間を越えた時に、前記レーザブロワ手段を停止する第1停止手段と、
前記経過時間が第2停止時間を越えた時に、前記光路パージ手段を停止する第2停止手段と、
前記経過時間が第3停止時間を越えた時に、前記温度制御手段を停止する第3停止手段と
を含むことを特徴とする請求項1または2に記載のレーザ加工機制御装置。 - 前記レーザ加工機が起動するまでにユーザが待つことができる時間である待機可能時間を予め入力する待機可能時間受付手段をさらに備え、
前記制御手段は、前記経過時間が所定時間を越えた後に、
前記要素手段毎の起動所要時間が前記待機可能時間より短い場合は当該要素手段を停止し或いはその停止状態を維持し、
前記要素手段毎の起動所要時間が前記待機可能時間より長い場合は当該要素手段を起動し或いはその起動状態を維持する
ことを特徴とする請求項1に記載のレーザ加工機制御装置。 - 前記制御手段は、前記経過時間が所定時間を越えた後に、
一定値であるレーザブロワ起動所要時間が前記待機可能時間より短い場合は前記レーザブロワ手段を停止し、当該レーザブロワ起動所要時間が前記待機可能時間より長い場合は前記レーザブロワ手段の起動状態を維持し、
光路パージ起動所要時間が前記待機可能時間より短い場合は前記光路パージ手段を停止し或いはその停止状態を維持し、当該光路パージ起動所要時間が前記待機可能時間より長い場合は前記光路パージ手段を起動し或いはその起動状態を維持し、
温度制御手段起動所要時間が前記待機可能時間より短い場合は前記温度制御手段を停止し或いはその停止状態を維持し、当該温度制御手段起動所要時間が前記待機可能時間より長い場合は前記温度制御手段を起動し或いはその起動状態を維持する
ことを特徴とする請求項4に記載のレーザ加工機制御装置。 - 前記光路パージ起動所要時間が前記待機可能時間以下に維持されるように前記光路パージ手段の停止と起動を交互に繰り返す間欠運転を行う
ことを特徴とする請求項5に記載のレーザ加工機制御装置。 - 前記温度制御手段起動所要時間が前記待機可能時間以下に維持されるように前記温度制御手段の停止と起動を交互に繰り返す間欠運転を行う
ことを特徴とする請求項5に記載のレーザ加工機制御装置。 - 前記レーザ加工機に対するユーザの起動操作が入力された場合に、当該入力時における前記要素手段毎の起動に要する時間である初期起動所要時間の終了時刻が同時となるように、当該初期起動所要時間がより長い前記要素手段から順次前記要素手段を起動する
ことを特徴とする請求項1~7のいずれか1つに記載のレーザ加工機制御装置。 - レーザ共振器内を真空引きするときには、前記レーザブロワ手段、前記光路パージ手段、前記温度制御手段を全て停止する
ことを特徴とする請求項1~8のいずれか1つに記載のレーザ加工機制御装置。 - 少なくともレーザブロワ手段、光路パージ手段、温度制御手段を含んだ複数の要素手段を備えたレーザ加工機において、
前記レーザ加工機のレーザ加工動作が停止しており且つ当該レーザ加工機に対するユーザの操作が無くなった最終トリガ時からの経過時間を計測する工程と、
前記最終トリガ時の後、前記経過時間に基づいて、複数の前記要素手段を当該要素手段毎に定められた条件が満たされる場合に停止する工程と
を備えたことを特徴とするレーザ加工機制御方法。 - 前記停止する工程は、前記経過時間が前記要素手段毎に予め定められた停止時間を越えた時に当該要素手段を別個に停止する
ことを特徴とする請求項10に記載のレーザ加工機制御方法。 - 前記停止する工程は、
前記経過時間が第1停止時間を越えた時に、前記レーザブロワ手段を停止する工程と、
前記経過時間が第2停止時間を越えた時に、前記光路パージ手段を停止する工程と、
前記経過時間が第3停止時間を越えた時に、前記温度制御手段を停止する工程と
を含むことを特徴とする請求項10または11に記載のレーザ加工機制御方法。 - 少なくともレーザブロワ手段、光路パージ手段、温度制御手段を含んだ複数の要素手段を備えたレーザ加工機において、
前記レーザ加工機が起動するまでにユーザが待つことができる時間である待機可能時間を予め入力する工程と、
前記レーザ加工機のレーザ加工動作が停止しており且つ当該レーザ加工機に対するユーザの操作が無くなった最終トリガ時からの経過時間を計測する工程と、
前記経過時間が所定時間を越えた後に、
前記要素手段毎の起動所要時間が前記待機可能時間より短い場合は当該要素手段を停止し或いはその停止状態を維持する停止工程と、
前記要素手段毎の起動所要時間が前記待機可能時間より長い場合は当該要素手段を起動し或いはその起動状態を維持する起動工程と
を備えたことを特徴とするレーザ加工機制御方法。 - 前記停止工程は、一定値であるレーザブロワ起動所要時間が前記待機可能時間より短い場合は前記レーザブロワ手段を停止し、光路パージ起動所要時間が前記待機可能時間より短い場合は前記光路パージ手段を停止し或いはその停止状態を維持し、温度制御手段起動所要時間が前記待機可能時間より短い場合は前記温度制御手段を停止し或いはその停止状態を維持し、
前記起動工程は、前記レーザブロワ起動所要時間が前記待機可能時間より長い場合は前記レーザブロワ手段の起動状態を維持し、前記光路パージ起動所要時間が前記待機可能時間より長い場合は前記光路パージ手段を起動し或いはその起動状態を維持し、前記温度制御手段起動所要時間が前記待機可能時間より長い場合は前記温度制御手段を起動し或いはその起動状態を維持する
ことを特徴とする請求項13に記載のレーザ加工機制御方法。 - 少なくともレーザブロワ手段、光路パージ手段、温度制御手段を含んだ複数の要素手段を備えたレーザ加工機において、
前記レーザ加工機が起動するまでにユーザが待つことができる時間である待機可能時間を予め入力する工程と、
前記レーザ加工機のレーザ加工動作が停止しており且つ当該レーザ加工機に対するユーザの操作が無くなった最終トリガ時からの経過時間を計測する工程と、
前記経過時間が所定時間を越えた後に、
光路パージ起動所要時間が前記待機可能時間以下に維持されるように前記光路パージ手段の停止と起動を交互に繰り返す間欠運転を行う
ことを特徴とするレーザ加工機制御方法。 - 少なくともレーザブロワ手段、光路パージ手段、温度制御手段を含んだ複数の要素手段を備えたレーザ加工機において、
前記レーザ加工機が起動するまでにユーザが待つことができる時間である待機可能時間を予め入力する工程と、
前記レーザ加工機のレーザ加工動作が停止しており且つ当該レーザ加工機に対するユーザの操作が無くなった最終トリガ時からの経過時間を計測する工程と、
前記経過時間が所定時間を越えた後に、
温度制御手段起動所要時間が前記待機可能時間以下に維持されるように前記温度制御手段の停止と起動を交互に繰り返す間欠運転を行う
ことを特徴とするレーザ加工機制御方法。 - 前記レーザ加工機に対するユーザの起動操作が入力された場合に、当該入力時における前記要素手段毎の起動に要する時間である初期起動所要時間の終了時刻が同時となるように、当該初期起動所要時間がより長い前記要素手段から順次前記要素手段を起動する
ことを特徴とする請求項10~16のいずれか1つに記載のレーザ加工機制御方法。 - レーザ共振器内を真空引きするときには、前記レーザブロワ手段、前記光路パージ手段、前記温度制御手段を全て停止する
ことを特徴とする請求項10~17のいずれか1つに記載のレーザ加工機制御方法。
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JP5800929B2 (ja) * | 2014-01-31 | 2015-10-28 | ファナック株式会社 | 電力供給の復帰時に短時間で損傷なく再起動可能なガスレーザシステム |
JP5845307B2 (ja) | 2014-04-11 | 2016-01-20 | ファナック株式会社 | 電力低下時間の長さにより動作を変更するレーザ加工装置 |
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