WO2012036179A1 - 液体自動供給機構およびこれを備える塗布装置 - Google Patents

液体自動供給機構およびこれを備える塗布装置 Download PDF

Info

Publication number
WO2012036179A1
WO2012036179A1 PCT/JP2011/070920 JP2011070920W WO2012036179A1 WO 2012036179 A1 WO2012036179 A1 WO 2012036179A1 JP 2011070920 W JP2011070920 W JP 2011070920W WO 2012036179 A1 WO2012036179 A1 WO 2012036179A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid
supply
liquid material
receiving
unit
Prior art date
Application number
PCT/JP2011/070920
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
生島　和正
Original Assignee
武蔵エンジニアリング株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武蔵エンジニアリング株式会社 filed Critical 武蔵エンジニアリング株式会社
Priority to KR1020137006402A priority Critical patent/KR101795612B1/ko
Priority to CN201180042922.3A priority patent/CN103118802B/zh
Publication of WO2012036179A1 publication Critical patent/WO2012036179A1/ja

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells

Definitions

  • the present invention relates to an automatic liquid supply mechanism capable of preventing bubbles and particles from being mixed in a liquid, and a coating apparatus including the same.
  • a panel process also referred to as a cell process
  • a dropping injection method in which a liquid crystal is dropped on one substrate before being bonded and then bonded is performed.
  • a dispenser that has a container for storing liquid crystal and that discharges liquid crystal by a predetermined amount from a nozzle provided in the container by the action of gas pressure or mechanical pressure. It is used.
  • Patent Literature 1 an apparatus main body, a placement unit on which a workpiece can be placed, a head unit having a plurality of droplet ejection heads that eject droplets onto the workpiece, and a head unit that supports the head unit
  • a support mechanism, a moving mechanism that relatively moves the workpiece placement unit and the head unit support body, and a discharge liquid discharged from each droplet discharge head is stored, and can be exchanged and / or replenished with the discharge liquid.
  • a primary tank system having one primary tank, a secondary tank that is fixedly attached to the head unit support, and in which discharge liquid flows from the primary tank, and the primary tank system and the secondary tank are connected to each other.
  • Patent Document 2 a stage on which a substrate is positioned, a dispenser head provided with a syringe and a nozzle so that liquid crystal can be dropped or applied to the substrate, and a head support member provided around the stage to support the dispenser head
  • a foreign matter prevention cap for preventing foreign matters from flowing in when the lines are connected to or separated from each other, and the head support member and the dispenser head are separated from the upper part of the stage on the side where the supply line is located.
  • the apparatus of Document 2 since the apparatus of Document 2 is configured so that it can be separated and connected in the middle of the piping, there is no problem with the liquid supply flow path (tube), but it is a mechanism that makes contact at the connecting portion. In addition, there is a problem that it is rubbed at this portion and causes generation of particles. In addition, the parts such as hinges and cams constituting the foreign matter prevention cap are rubbed by the moving parts, which causes the generation of particles. Furthermore, in the apparatus of Document 2, since the liquid is poured directly from above into the syringe at the connecting portion, the liquid poured from above is tapped against the liquid surface, and at this time, the bubbles There was a problem of mixing.
  • an object of the present invention is to provide an automatic liquid supply mechanism that solves the above-described problems and a coating apparatus including the same.
  • the inventor has adopted a configuration in which the liquid material storage unit and the discharge device are always separated in order to eliminate the adverse effects of temporarily or constantly physically connecting the liquid material storage unit and the discharge device. Furthermore, an automatic liquid supply mechanism that prevents bubbles from flowing into the discharge device by providing a bubble removal mechanism that eliminates the adverse effects of bubbles caused by always separating the liquid material storage unit and the discharge device, and a coating apparatus including the same Made it possible to provide.
  • the first invention is a liquid storage unit that stores liquid material, a supply unit that has a supply port that supplies the liquid material stored in the liquid storage unit, and a receiving port that receives the liquid material discharged from the supply unit And a receiving unit having a bubble removing mechanism, and a receiving unit driving device for moving the receiving unit, and the receiving unit moves to a receiving position where the receiving port is located immediately below the supplying port, so that the liquid material is dropped from the supplying port.
  • the present invention relates to an automatic liquid supply mechanism that supplies a liquid material from which bubbles have been removed by a bubble removal mechanism to a discharge device.
  • the bubble removal mechanism includes a bubble removal container that stores the liquid material, one end immersed in the liquid stored in the bubble removal container, and the other end that is a receiving port. It is characterized by comprising an inflow pipe communicated with and an outflow pipe having one end immersed in a liquid stored in a bubble removing container and the other end communicated with a discharge device.
  • the bubble removing mechanism has a pump device that depressurizes the bubble removing container, one end connected to the pump device, and the other end arranged in a space in the bubble removing container. And a working gas supply pipe.
  • a detection device for detecting the amount of the liquid material in the liquid storage section and / or the bubble removing container is provided.
  • a fifth invention is characterized in that, in any one of the first to fourth inventions, the receiving port has an opening having an enlarged diameter and is capable of temporarily storing a certain amount of liquid material.
  • a liquid material receiving member that moves forward and backward between a first position immediately below the supply port and a second position different from the first position is provided. It is characterized by.
  • a pinch valve for controlling a supply amount of the liquid material from the liquid storage unit to the supply unit and / or a supply amount of the liquid material from the receiving unit to the discharge device It is characterized by comprising a pinch valve for controlling the above.
  • a gantry having a table for holding a workpiece, a discharge device having a nozzle for discharging a liquid material, a drive device for relatively moving the discharge device and the table, and any one of the first to seventh items.
  • the present invention relates to a coating apparatus including the automatic liquid supply mechanism according to the invention.
  • a ninth invention comprises the beam according to the eighth invention, comprising: a beam on which a plurality of discharge devices are disposed; and a discharge unit driving device that allows each discharge device to move along the extending direction of the beam. The number of the parts is the same as that of the discharge device.
  • a tenth invention is characterized in that, in the ninth invention, a plurality of the supply sections are arranged.
  • An eleventh invention is characterized in that in any of the eighth to tenth inventions, a cover for covering the table and the discharge device is provided. In a twelfth aspect based on the eleventh aspect, the liquid storage section is disposed outside the cover.
  • the present invention there is no need to physically connect the liquid material storage unit and the discharge device, and no liquid supply flow channel (tube) whose shape is variable with the movement of the discharge device is provided.
  • the problem of the space at the time of disposing the liquid and the problem of deterioration of the liquid supply flow path can be solved.
  • the liquid material is supplied without bringing the liquid material storage unit side and the discharge device side into contact with each other, generation and mixing of particles can be effectively prevented.
  • the bubble removing mechanism is provided, it is possible to prevent bubbles from flowing into the discharge device.
  • FIG. 1 is a schematic diagram for explaining an automatic liquid supply mechanism according to the present invention.
  • a black arrow indicates a liquid flow
  • a white arrow indicates a gas flow.
  • the automatic liquid supply mechanism 1 includes a tank (liquid material storage unit) 4 having a large capacity for storing a liquid material 26, a supply unit 2 including a supply port 12 for discharging the liquid material 26 delivered from the tank 4, and a discharge device.
  • the receiving unit 3 that is provided integrally with the discharge device 24 at the upper portion 24 and receives the liquid material 26 discharged from the supplying unit 2 and the receiving unit driving device that moves the receiving unit 3 are main components.
  • the tank 4 to the supply unit 2 are connected by a pipe 8A
  • the receiving unit 3 to the discharge device 24 are connected by pipes 8B and 8C.
  • the supply unit 2 and the receiving unit 3 are separated to such an extent that the shutter 15 can pass freely.
  • a valve A9 for controlling the flow to the supply unit 2 is provided near the supply unit 2 in the pipe 8A on the way between the tank 4 and the supply unit 2, and the remaining amount of the liquid material 26 in the tank 4 is provided in the tank 4. Is provided.
  • the detection device 7 for example, a load cell that performs detection by weight can be used.
  • an ultrasonic sensor that detects the liquid level with ultrasonic waves
  • an optical sensor that detects the presence or absence of liquid by the difference in the amount of light, and the like can also be used.
  • the supply unit 2 is provided with a supply pipe 13 having a supply port 12 for discharging the liquid material 26 sent from the tank 4.
  • the supply pipe 13 is bent downward at the discharge-side end, and supplies the liquid material 26 to the receiving unit 3 by dropping (supply supply).
  • the supply part 2 and the receiving part 3 are not connected by piping, and the supply part 2 does not descend or the receiving part 3 does not rise. That is, by supplying the liquid material in a non-contact state from a remote position without connecting the supply port 12 to the receiving port 16, the generation of particles is prevented and the particles are prevented from being mixed into the liquid material 26. It is out.
  • a shutter 15 is provided below the supply pipe 13 to receive excess liquid material 26 from the supply port 12 when it drops.
  • the shutter 15 has a storage concave portion whose upper surface is open, slides in the horizontal direction, and is positioned directly below the supply port 12 except during supply.
  • the shutter 15 is not in contact with the supply port 12 and the receiving port 16. This is also because no particles are generated as described above.
  • the receiving unit 3 includes a funnel 17 having a receiving port 16 that receives the liquid material 26 supplied from the supply unit 2, a bubble removing bottle 18 that temporarily stores the supplied liquid material 26 to remove bubbles, and a liquid flow A valve B10 and a valve C11 that control the above are disposed, and each is connected by a pipe 8.
  • a pinch valve that opens and closes the flow path by elastically deforming the pipe by sandwiching the pipe in consideration of maintainability. Since the valve itself does not touch the liquid, the pinch valve is easy to work when replacing the piping. Further, particles that may be generated by the valve operation are not mixed.
  • the valve B10 controls the inflow into the bottle 18, and the valve C11 controls the outflow from the bottle 18.
  • the liquid material 26 flows from the funnel 17 into the bottle 18 through the inflow pipe 19, and the liquid material 26 is delivered from the bottle 18 to the discharge device 24 through the outflow pipe 20. Further, since the funnel 17 is arranged at a position higher than the bottle 18, the liquid material 26 flows down naturally without the aid of pressure or the like, and the bottle (bubble removing container) 18 having a smaller capacity than the tank 4. Can be stored.
  • the bottle 18 for removing bubbles constitutes a bubble removing mechanism 41 together with a pressure increasing / decreasing pump (not shown) connected to the working gas supply pipe 21.
  • the pressure-reducing pump supplies a compressed gas that acts when the liquid material 26 is delivered from the bottle 18 to the discharge device 24 and a vacuum that acts when the bubbles of the liquid material 26 in the bottle 18 are removed.
  • the pressure increasing / decreasing pump can be used in combination as a vacuum source for adsorbing the work on the table.
  • a pressure reducing pump may be used instead of the pressure increasing / decreasing pump.
  • the bottle 18 is made of a transparent material such as glass or hard resin, and can confirm the liquid surface position of the liquid material filled inside and the state of air bubble mixing. Further, in the vicinity of the outer surface of the bottle 18, sensors for detecting the liquid level in the bottle 18 are provided at the upper limit position (reference numeral 22) and the lower limit position (reference numeral 23).
  • the sensor an optical sensor that detects the presence or absence of a liquid based on a difference in the amount of light can be used. As will be described later, it is preferable that the position of the liquid level be accurately captured because of various pipes connected to the bottle 18.
  • the receiving unit 3 can be moved in the horizontal direction by the receiving unit driving device, and can take a supply position in which the center of the receiving port 16 is located immediately below the supplying port 12.
  • a discharge device 24 is disposed below the receiving unit 3, and is connected to the receiving unit 3 by a pipe 8C. The discharge device 24 is supplied with the liquid material 26 from which bubbles are removed by the receiving unit 3, and discharges the liquid material 26 from the nozzle 38.
  • the tank 4 is filled with the liquid material 26, and the compressed gas supply pipe 5 and the liquid delivery pipe 6 are connected (STEP 1). Instead of filling the tank 4 with the liquid material 26 directly, the tank 4 filled with the liquid material 26 may be installed.
  • compressed air is supplied to the tank 4 and pressurized (STEP 2).
  • the valve A9 is closed.
  • the receiving part 3 and the discharge apparatus 24 are moved to the supply position under the supply part 2 (STEP3).
  • the shutter 15 is retracted and the valve A9 is opened (STEP 4).
  • the liquid material 26 is discharged from the supply port 12 and poured into the funnel 17 through the receiving port 16 of the receiving unit 3 (STEP 5).
  • the valve B10 and the valve C11 are kept open. Thereafter, the liquid material 26 passes through the valve B10 and flows into the bottle 18 from the inflow pipe 19 (STEP 6).
  • the liquid material 26 flows down naturally, but if the valve C11 is closed and the bottle 18 is evacuated, the supply speed can be increased.
  • the valve A9, the valve B10, and the valve C11 are closed, the shutter 15 is advanced, and the pressurization to the tank 4 is turned off (STEP 7). Then, evacuation is performed from the working gas supply pipe 21, and bubbles of the liquid material 26 in the bottle 18 are removed (STEP 8).
  • the present invention can be applied to a liquid material having a viscosity of 10,000 cps or less, such as a liquid crystal, ink, organic EL material, solvent (alcohol, acetone, etc.), ultraviolet curable resin, etc., and particularly suitable for a liquid material having a viscosity of 1000 cps or less. is there.
  • a negative pressure of about 50 to 90 kPa is applied for about 1 to 5 minutes depending on the type of liquid material.
  • FIG. 2 is a schematic perspective view of a coating apparatus including an automatic liquid supply mechanism according to the embodiment
  • FIG. 3 is an enlarged view of a main part of the automatic supply mechanism according to the embodiment.
  • the side on which the tank 4 is provided is “left”, the opposite side (reference numeral 9 side) is “right”, and the side on which the discharge device 24 is provided is “front”. The other side is sometimes called “rear”.
  • the left-right direction is the “X direction” and the front-back direction is the “Y direction”.
  • the coating device 25 includes a table 28 on which a coating object 27 (hereinafter referred to as a workpiece) for coating the liquid material 26 is placed on a gantry 29, and the ejection device 24 that ejects the liquid material 26.
  • a coating object 27 hereinafter referred to as a workpiece
  • the ejection device 24 that ejects the liquid material 26.
  • a beam drive device (Y drive device) 44 and a receiving portion drive device (X drive device) 43 that move the lens relative to the table 28.
  • the Y drive device 44 has a slider that supports the beam 30 and a slide base disposed on the mount 29, and allows the beam 30 to move in the front-rear direction (reference numeral 31) on the table 28.
  • the ejection device 24 can be moved in the left-right direction (reference numeral 32) on the beam 30 by an X driving device 43 installed on the beam 30.
  • the ejection device 24 includes a plurality of the same devices, and all the ejection devices are movable along the beam. Note that the number of the ejection devices 24 is determined by the manner of application to the workpiece 27, and is not limited to the number shown in FIG.
  • the coating device 25 includes a cover 33 that covers the outer periphery of each of these devices.
  • the cover 33 shown by a dotted line is provided with a door (not shown) on the front side for an operator to enter inside, and is used when maintenance work for the discharge device 24 and the like is performed.
  • An air cleaning device 34 is provided on the ceiling portion of the cover 33 and supplies air from which particles have been removed to the cover 33.
  • a fan filter unit that is, a small blower including a HEPA, a ULPA filter, or the like can be used. Thereby, the cleanliness is maintained in the cover 33, particularly in the space above the table 28.
  • the coating device 25 when installed in a clean room, or when installed in a clean space equivalent to the coating device 25, the ceiling is greatly opened or removed without providing the air cleaning device 34, and the It is also possible to take in air that has been maintained.
  • the cover 33 and the gantry 29 may be integrally configured so as to cover each element on the gantry 29.
  • the automatic liquid supply mechanism 1 has the above-described configuration of FIG. 1, and includes a tank 4 that stores the liquid material 26, and a supply unit 2 that includes a supply port 12 that discharges the liquid material 26 delivered from the tank 4.
  • the receiving unit 3 that is provided integrally with the discharging unit 24 on the upper side of the discharging unit 24 and receives the liquid material 26 discharged from the supplying unit 2, and the X driving unit 43 and the Y driving unit that relatively move the receiving unit 3 and the discharging unit 24
  • the apparatus 44 is a main component.
  • the tank 4 for storing the liquid material 26 is detachably fixed to the outside of the cover 33, and the supply unit 2 including the supply port 12 for discharging the liquid material 26 is fixed to the inside of the cover 33.
  • the receiving unit 3 that receives the liquid material 26 discharged from the supply unit 2 is provided integrally with the discharging device 24 above the discharging device 24, and is moved integrally by the X driving device 43. Is done.
  • the receiving unit 3 Receives the supply of the liquid material 26 from the supply unit 2.
  • the receiving unit 3 is provided for each ejection device 24.
  • the pipe 4A is connected from the tank 4 to the supply unit 2, the pipes 8B and 8C are connected from the receiving unit 3 to the discharge device 24, and the supply unit 2 and the receiving unit 3 are separated from each other.
  • a valve A9 for controlling the flow to the supply unit 2 is fixed between the tank 4 and the supply unit 2 near the corresponding supply unit 2 inside the cover 33.
  • a detection device 7 for detecting the remaining amount of the liquid material 26 in the tank 4 is provided below the tank 4, a detection device 7 for detecting the remaining amount of the liquid material 26 in the tank 4 is provided.
  • the pipe 8 from the tank 4 to the supply unit 2 passes through the cover 33 in the immediate vicinity of the tank 4 and enters the cover 33. That is, only the tank 4 and the detection device 7 are installed outside the cover 33. By installing the tank 4 that is frequently filled or exchanged outside the cover 33, it is possible to reduce the number of particles brought into the cover 33 as much as possible. In addition, the work on the tank 4 can be performed even when the coating device 25 is performing the coating operation.
  • the number of supply ports 12 in the automatic liquid supply mechanism 1 is preferably changed according to the number of discharge devices 24. This is because when the total width when a plurality of ejection devices 24 are arranged on one side of the beam 30 exceeds half of the stroke length in the left-right direction, the supply port 12 is provided at one position on the beam. This is because not all of the discharge devices 24 can be moved to the supply port 12. In this case, two or more supply ports 12 are provided so that the plurality of ejection devices 24 can move to any one of the supply ports 12.
  • the supply unit 2 and the receiving unit 3 are separated from each other, so that the pipe 8 does not move together with the discharge device 24 and the discharge unit driving device. Therefore, there is no problem that the piping is arranged longer for smooth driving or that the deterioration is accelerated by moving the piping.
  • a supply pipe 13 having a supply port 12 for discharging the liquid material 26 sent from the tank 4 is installed in the supply unit 2.
  • the supply pipe 13 is supported by the support member 14 in the middle, and is bent downward in the vicinity of the supply port 12.
  • the portion from the supply port 12 to the support member 14 is made of a material that can maintain a shape such as metal.
  • the shutter 15 is shaped like a handle with an open upper surface (a container with a handle), and is slid so as to be positioned directly below the supply port 12 except during supply.
  • the receiving unit 3 is composed of three locations, the funnel 17 having the receiving port 16 for receiving the liquid material 26 supplied from the supply unit 3 at the highest position, and the liquid supplied at the lowest position.
  • a bottle 18 for temporarily storing the material 26 and removing bubbles is provided.
  • a valve B10 and a valve C11 that control the flow of the liquid are arranged side by side at a position intermediate between the funnel 17 and the bottle 18.
  • the funnel 17 is opened so that the upper end becomes the receiving port 16, and the liquid material 26 is supplied dropwise from the supply port 12.
  • the degree of cleanliness is maintained in the cover 33, there is no possibility that particles are mixed even if the receiving port 16 is opened upward.
  • the bubble-removing bottle 18 constitutes a bubble-removing mechanism 41 together with a pressure-reducing pump (not shown) connected to the working gas supply pipe 21.
  • the pressure-reducing pump supplies a compressed gas that acts when the liquid material 26 is delivered from the bottle 18 to the discharge device 24 and a vacuum that acts when the bubbles of the liquid material 26 in the bottle 18 are removed.
  • sensors for detecting the liquid level in the bottle 18 are provided at the upper limit position (reference numeral 22) and the lower limit position (reference numeral 23).
  • the upper limit sensor 22 is disposed at a position below the outlet of the working gas supply pipe 21, and the lower limit sensor 23 is disposed at a position above the inlet of the outflow pipe 20.
  • the receiving unit 3 is provided at a position that is lower than the supplying unit 2 and that does not come into contact with the supplying unit 2 when the supplying unit 2 moves below the receiving unit 3.
  • a discharge device 24 is integrally provided below the receiving unit 3.
  • the discharge device 24 is supplied with the liquid material 26 from which bubbles are removed by the receiving unit 3, and discharges the work 27.
  • a plunger-type discharge device is illustrated as the discharge device 24, but it is needless to say that a discharge device other than the plunger-type discharge device can be used.
  • Applicable discharge devices include air type that applies a regulated air to a liquid material in a syringe having a nozzle at the tip for a desired time, a tubing type that has a flat tubing mechanism or a rotary tubing mechanism, and a liquid by rotating a screw.
  • Examples include a screw type that discharges a material and a valve type that controls discharge of a liquid material to which a desired pressure is applied by opening and closing a valve.
  • the plunger-type discharge device 24 includes a pipe-shaped measuring unit 36, a plunger 35 that is inscribed in the measuring unit 36, a nozzle 38 that includes a discharge port 39, a measuring unit 36, a nozzle 38, and a measuring unit 36. And a switching valve 37 for switching the communication of the inlet 40. Then, the plunger 35 that moves forward and backward in close contact with the inside of the measuring portion 36 is advanced and moved at a high speed, and the liquid material 26 is ejected and discharged from the discharge port 39.
  • a plurality of bubble removal mechanisms 41 may be provided to reliably prevent bubbles from being mixed. Moreover, it may replace with or use together with the bubble removal mechanism 41 of a present Example, and you may make it provide the simple bubble removal mechanism which does not have the pressurization / decompression pump shown in FIG. Providing the inlet of the outflow pipe 20 at an upper position away from the bottom surface of the bubble removing container 18 can prevent inhalation of particles 42 that accumulate on the bottom surface or float near the bottom surface. Such a simple bubble removal mechanism is effective when it is necessary to reduce the size of the receiving unit 3.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Coating Apparatus (AREA)
  • Mathematical Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Liquid Crystal (AREA)
PCT/JP2011/070920 2010-09-16 2011-09-14 液体自動供給機構およびこれを備える塗布装置 WO2012036179A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020137006402A KR101795612B1 (ko) 2010-09-16 2011-09-14 액체 자동 공급 기구 및 이것을 구비하는 도포 장치
CN201180042922.3A CN103118802B (zh) 2010-09-16 2011-09-14 液体自动供给机构和具备其的涂布装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-207775 2010-09-16
JP2010207775A JP5566829B2 (ja) 2010-09-16 2010-09-16 液体自動供給機構およびこれを備える塗布装置

Publications (1)

Publication Number Publication Date
WO2012036179A1 true WO2012036179A1 (ja) 2012-03-22

Family

ID=45831636

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2011/070920 WO2012036179A1 (ja) 2010-09-16 2011-09-14 液体自動供給機構およびこれを備える塗布装置

Country Status (5)

Country Link
JP (1) JP5566829B2 (enrdf_load_stackoverflow)
KR (1) KR101795612B1 (enrdf_load_stackoverflow)
CN (1) CN103118802B (enrdf_load_stackoverflow)
TW (1) TWI573628B (enrdf_load_stackoverflow)
WO (1) WO2012036179A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116273729A (zh) * 2023-01-28 2023-06-23 中山市美速光电技术有限公司 一种用于超微间距光纤阵列的点胶装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6218219B2 (ja) * 2013-07-12 2017-10-25 東レエンジニアリング株式会社 エアベントシステム
JP2015182039A (ja) * 2014-03-25 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および脱泡方法
PL2954958T3 (pl) * 2014-06-11 2018-07-31 Umicore Ag & Co. Kg Urządzenie do powlekania podłoża
JP6244421B1 (ja) * 2016-07-27 2017-12-06 株式会社キャタラー 排ガス浄化用触媒の製造方法及び製造装置
JP6993276B2 (ja) * 2018-03-27 2022-01-13 株式会社Ｉｈｉ回転機械エンジニアリング 液材供給装置
JP7277127B2 (ja) * 2018-04-11 2023-05-18 キヤノン株式会社 吐出材充填方法、吐出材吐出装置、およびインプリント装置
CN111036442B (zh) * 2019-10-08 2023-04-11 吉林大学 一种用于动物试验脱毛过程的棉签处理器
CN111290178B (zh) * 2020-02-25 2022-08-05 深圳市华星光电半导体显示技术有限公司 液晶滴注装置
CN113198643B (zh) * 2021-04-25 2022-04-22 浙江中聚材料有限公司 一种太阳能背板涂布装置
JP2024126892A (ja) * 2023-03-08 2024-09-20 東レエンジニアリング株式会社 ベントタンク

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05200203A (ja) * 1992-01-23 1993-08-10 Casio Comput Co Ltd 液状樹脂の脱泡方法およびその装置
JP2001267339A (ja) * 2000-03-15 2001-09-28 Sanyu Rec Co Ltd 電子部品の製造装置及び製造方法
JP2003080149A (ja) * 2001-09-10 2003-03-18 Dainippon Printing Co Ltd ペースト塗布システム
JP2005209778A (ja) * 2004-01-21 2005-08-04 Hitachi Maxell Ltd レジスト塗布装置、フォトレジストの塗布方法及び光ディスクの製造方法
JP2008072096A (ja) * 2006-08-15 2008-03-27 Tokyo Electron Ltd バッファタンク、中間貯留装置、液処理装置及び処理液の供給方法
JP2008512272A (ja) * 2004-09-07 2008-04-24 フジフィルム ディマティックス，インコーポレイテッド 流体から溶存ガスを除去し得る流体液滴噴出システム
JP2008289988A (ja) * 2007-05-23 2008-12-04 Musashi Eng Co Ltd ガントリー型作業装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6431670B1 (en) * 2000-02-14 2002-08-13 Hewlett-Packard Company Ink level sensing method and apparatus
JP2001267399A (ja) * 2000-03-14 2001-09-28 Canon Inc 基板有無検知方法及び基板保管装置
PL1656863T3 (pl) * 2004-11-11 2011-07-29 Nestec Sa Samoczyszcząca głowica mieszająca do przygotowywania mieszaniny na bazie mleka oraz maszyny do przygotowywania napojów zawierające taką głowicę mieszającą

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05200203A (ja) * 1992-01-23 1993-08-10 Casio Comput Co Ltd 液状樹脂の脱泡方法およびその装置
JP2001267339A (ja) * 2000-03-15 2001-09-28 Sanyu Rec Co Ltd 電子部品の製造装置及び製造方法
JP2003080149A (ja) * 2001-09-10 2003-03-18 Dainippon Printing Co Ltd ペースト塗布システム
JP2005209778A (ja) * 2004-01-21 2005-08-04 Hitachi Maxell Ltd レジスト塗布装置、フォトレジストの塗布方法及び光ディスクの製造方法
JP2008512272A (ja) * 2004-09-07 2008-04-24 フジフィルム ディマティックス，インコーポレイテッド 流体から溶存ガスを除去し得る流体液滴噴出システム
JP2008072096A (ja) * 2006-08-15 2008-03-27 Tokyo Electron Ltd バッファタンク、中間貯留装置、液処理装置及び処理液の供給方法
JP2008289988A (ja) * 2007-05-23 2008-12-04 Musashi Eng Co Ltd ガントリー型作業装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116273729A (zh) * 2023-01-28 2023-06-23 中山市美速光电技术有限公司 一种用于超微间距光纤阵列的点胶装置
CN116273729B (zh) * 2023-01-28 2023-10-20 中山市美速光电技术有限公司 一种用于超微间距光纤阵列的点胶装置

Also Published As

Publication number Publication date
JP5566829B2 (ja) 2014-08-06
TW201221229A (en) 2012-06-01
CN103118802A (zh) 2013-05-22
TWI573628B (zh) 2017-03-11
JP2012061424A (ja) 2012-03-29
KR101795612B1 (ko) 2017-11-08
CN103118802B (zh) 2017-04-26
KR20130143560A (ko) 2013-12-31

Similar Documents

Publication Publication Date Title
JP5566829B2 (ja) 液体自動供給機構およびこれを備える塗布装置
US10600647B2 (en) Coating apparatus
JP6512894B2 (ja) 処理液供給装置および処理液供給装置の制御方法
TWI521209B (zh) Dispensing device and liquid dispensing device and liquid dispensing method
TWI424885B (zh) A liquid discharge device having a defoaming mechanism
JP2007196109A (ja) 液状物質供給装置及び液状物質供給方法
KR101544521B1 (ko) 필터 어셈블리를 상태조절하기 위한 시스템 및 방법
KR20100116666A (ko) 액체 재료의 토출 장치, 및 그 도포 장치 및 도포 방법
KR20160067088A (ko) 액체 재료 충전 장치 및 방법
JP6827713B2 (ja) 液体吐出装置、インプリント装置および部品の製造方法
JP5947953B2 (ja) 分注装置および分注システム
JP2012196600A (ja) ペースト塗布ヘッド，ペースト塗布装置及びペースト塗布方法
CN202224309U (zh) 点胶装置
KR101261217B1 (ko) 디스펜서용 레진 공급 장치
KR101417491B1 (ko) 크린 도포 시스템 및 클린 도포 건
CN201780435U (zh) 液晶滴落装置
HK1181001A (en) Automated liquid supply mechanism and coater provided with same
HK1181001B (en) Automated liquid supply mechanism and coater provided with same
JP5690542B2 (ja) 塗布装置
CN111290178B (zh) 液晶滴注装置
CN101850659B (zh) 具有内压调整的连续供液装置
KR101255743B1 (ko) 원료 공급 유닛 및 이를 이용한 원료 공급 방법
JP2013202609A (ja) 塗布液塗布装置
HK1124009B (en) Liquid material discharge device with debubbling mechanism
KR20120025736A (ko) 선택적으로 액정 탱크의 액정을 모으거나 기포를 제거하는 장치, 액정 탱크의 액정을 모으는 장치, 및 액정 탱크의 기포를 제거하는 장치

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201180042922.3

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11825179

Country of ref document: EP

Kind code of ref document: A1

DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
ENP Entry into the national phase

Ref document number: 20137006402

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 11825179

Country of ref document: EP

Kind code of ref document: A1