WO2011129254A1 - 研磨パッド - Google Patents
研磨パッド Download PDFInfo
- Publication number
- WO2011129254A1 WO2011129254A1 PCT/JP2011/058778 JP2011058778W WO2011129254A1 WO 2011129254 A1 WO2011129254 A1 WO 2011129254A1 JP 2011058778 W JP2011058778 W JP 2011058778W WO 2011129254 A1 WO2011129254 A1 WO 2011129254A1
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- WO
- WIPO (PCT)
- Prior art keywords
- polishing
- polishing pad
- layer
- region
- double
- Prior art date
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
Definitions
- the present invention relates to a polishing pad for use in planarizing unevenness on a surface of an object to be polished such as a semiconductor wafer by chemical mechanical polishing (CMP), and more specifically, a window for detecting a polishing state or the like by optical means.
- CMP chemical mechanical polishing
- the present invention relates to a polishing pad having (light transmission region) and a method for manufacturing a semiconductor device using the polishing pad.
- a conductive film is formed on the surface of a semiconductor wafer (hereinafter also referred to as a wafer), and a wiring layer is formed by photolithography, etching, or the like.
- a process for forming an interlayer insulating film is performed on the surface of the wafer, and these processes cause irregularities made of a conductor such as metal or an insulator on the wafer surface.
- miniaturization of wiring and multilayer wiring have been advanced for the purpose of increasing the density of semiconductor integrated circuits, and along with this, technology for flattening the irregularities on the wafer surface has become important.
- CMP is a technique of polishing using a slurry-like abrasive (hereinafter referred to as slurry) in which abrasive grains are dispersed in a state where the surface to be polished of a wafer is pressed against the polishing surface of a polishing pad.
- slurry a slurry-like abrasive
- a polishing apparatus generally used in CMP includes a polishing surface plate 2 that supports a polishing pad 1 and a support base (polishing head) 5 that supports a material to be polished (wafer or the like) 4. And a backing material for uniformly pressing the wafer and a supply mechanism for the abrasive 3.
- the polishing pad 1 is attached to the polishing surface plate 2 by attaching it with a double-sided tape, for example.
- the polishing surface plate 2 and the support base 5 are disposed so that the polishing pad 1 and the material to be polished 4 supported by each of the polishing surface plate 2 and the support base 5 are opposed to each other, and are provided with rotating shafts 6 and 7 respectively. Further, a pressurizing mechanism for pressing the workpiece 4 against the polishing pad 1 is provided on the support base 5 side.
- the optical detection means is a method of detecting an end point of polishing by irradiating a wafer with a light beam through a window (light transmission region) through a polishing pad and monitoring an interference signal generated by the reflection. It is.
- a polishing pad having a polishing layer and one or more light-transmitting window members for optically measuring a polishing state formed integrally with a part of the polishing layer, the light-transmitting window The member is formed by laminating at least a soft light-transmitting layer having a micro rubber A hardness of 60 degrees or less and a hard light-transmitting layer having a micro rubber A hardness of 80 degrees or more, and the soft light transmitting layer is positioned on the outermost layer on the polishing surface side.
- Patent Document 1 A polishing pad characterized by the above has been proposed (Patent Document 1).
- the polishing layer includes a first window member that transmits light in a thickness direction.
- a polishing pad in which a second window member that transmits light in the thickness direction is formed in the formation corresponding to the first window member (Patent Document 2).
- a polishing pad has been proposed in which a transparent sheet is disposed between these pad layers so as to cover the opening in the lower layer of the pad and the opening in the upper layer of the pad (Patent Document 3).
- Patent Document 4 a polishing pad in which a transparent film is disposed between an upper layer pad and a lower layer pad has been proposed.
- a sheet (film) having an adhesive layer on both sides is used as the transparent sheet (transparent film).
- a sheet (film) is interposed between a polishing layer having a light transmission region and a cushion layer.
- the present invention provides a polishing pad that enables high-precision optical end point detection in the state of polishing, and prevents slurry leakage from the polishing layer side to the cushion layer side even when used for a long period of time.
- the purpose is to provide. Moreover, it aims at providing the manufacturing method of the semiconductor device using this polishing pad.
- the present invention provides a polishing pad in which a polishing layer having a polishing region and a light transmission region and a cushion layer having a through hole are laminated via a double-sided adhesive sheet so that the light transmission region and the through hole overlap. And a polishing pad, wherein a translucent member is attached to the adhesive layer of the double-sided adhesive sheet in the through-hole.
- FIG. 2 is a schematic sectional view showing the structure of a conventional polishing pad.
- the polishing layer 10 having the polishing region 8 and the light transmission region 9 and the cushion layer 12 having the through hole 11 are interposed via the double-sided adhesive sheet 15 so that the light transmission region 9 and the through hole 11 overlap.
- the double-sided adhesive sheet 15 has an adhesive layer 14 on both sides of the transparent sheet 13, and a release sheet is provided on the surface of the adhesive layer 14 before normal use.
- the conventional polishing pad 1 is manufactured by peeling the release sheet provided on the surface of each adhesive layer 14 of the double-sided adhesive sheet 15 and bonding the exposed adhesive layers 14 to the polishing layer 10 and the cushion layer 12. Has been.
- the reason why the optical end point detection accuracy of such a conventional polishing pad is poor is considered as follows. Since the adhesive surface of the adhesive layer 14 in the through-hole 11 is exposed, fine dust or the like adheres to the adhesive surface during the preparation of the polishing pad and during the polishing operation, thereby reducing the light transmittance or reducing the light transmittance. It is considered that the optical end point detection accuracy deteriorates. Further, when the polishing pad is affixed to the platen, it is considered that the optical end point detection accuracy deteriorates due to the adhesive surface touching the platen and the adhesive surface becoming rough.
- the polishing pad of the present invention does not have the above-mentioned problem because the translucent member 16 is adhered to the adhesive layer 14 in the through hole 11, and the optical end point detection accuracy is high. A decrease can be prevented.
- the translucent member is preferably a resin film that has been subjected to antireflection treatment and / or light scattering treatment.
- the resin film By using the resin film, direct reflection of the incident measurement light can be prevented, so that the optical end point detection accuracy can be kept high.
- the translucent member is a resin film subjected to antifouling treatment.
- Use of the resin film makes it difficult for dust to adhere to the film surface, so that the optical end point detection accuracy can be maintained high.
- a resin film having a bandpass function may be used as the translucent member if necessary. Use of the resin film cuts off light having an unnecessary wavelength and allows only light having a required wavelength to pass therethrough, so that only light having a required wavelength can be detected in optical end point detection. Is good.
- the present invention relates to a semiconductor device manufacturing method including a step of polishing a surface of a semiconductor wafer using the polishing pad.
- FIG. 3 is a schematic cross-sectional view showing the structure of the polishing pad of the present invention.
- the polishing pad 1 of the present invention includes a polishing layer 10 having a polishing region 8 and a light transmission region 9, and a cushion layer 12 having a through hole 11, and the light transmission region 9 and the through hole 11.
- a polishing layer 10 having a polishing region 8 and a light transmission region 9
- a cushion layer 12 having a through hole 11, and the light transmission region 9 and the through hole 11.
- a translucent member 16 is adhered to the adhesive layer 14 in the through hole 11.
- the material for forming the light transmission region is not particularly limited, but it is possible to detect the optical end point with high accuracy while polishing and use a material having a light transmittance of 20% or more over the entire wavelength range of 400 to 700 nm. It is preferable that the material has a light transmittance of 50% or more.
- Such materials include polyurethane resins, polyester resins, phenol resins, urea resins, melamine resins, epoxy resins, and acrylic resins, and other thermosetting resins, polyurethane resins, polyester resins, polyamide resins, cellulose resins, Acrylic resins, polycarbonate resins, halogen resins (polyvinyl chloride, polytetrafluoroethylene, polyvinylidene fluoride, etc.), polystyrene, olefin resins (polyethylene, polypropylene, etc.), thermoplastic resins, butadiene rubber, isoprene rubber, etc.
- thermosetting resin is preferably one that cures at a relatively low temperature.
- photocurable resin it is preferable to use a photopolymerization initiator in combination.
- the photocurable resin is not particularly limited as long as it is a resin that is cured by reaction with light.
- the resin which has an ethylenically unsaturated hydrocarbon group is mentioned.
- Polyhydric alcohol-based (meth) acrylates such as dipentaerythritol pentaacrylate, trimethylolpropane trimethacrylate, and oligobutadienediol diacrylate, 2,2-bis (4- (meth) acryloxyethoxyphenyl) propane, bisphenol A or Epoxy (meth) acrylates such as (meth) acrylic acid adducts of epichlorohydrin-
- a photopolymerization initiator or a sensitizer can be added. These are not particularly limited, and are selected and used according to the light source and wavelength range to be used.
- ultraviolet rays near i-line 365 nm
- benzophenone 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4-methoxy-4′- Aromatic ketones such as dimethylaminobenzophenone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, 2-ethylanthraquinone, and phenanthrenequinone, methylbenzoin, ethylbenzoin, etc.
- Benzoins such as benzyldimethyl ketal, 2- (o-chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) imidazole 2-mer, 2- (o-fluorophenyl) -4,5 Phenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (2,4 -Dimethoxyphenyl) -4,5-diphenylimidazole dimer and other imidazoles, 9-phenylacridine, acridine derivatives such as 1,7-bis (9,9'-acridinyl) heptane, N-phenylglycine and the like It is done. These may be used alone
- the photosensitive resin is not particularly limited as long as it is a resin that chemically reacts with light.
- a compound containing an active ethylene group or an aromatic polycyclic compound is added to a polymer main chain or side chain.
- polyvinyl cinnamate unsaturated polyester obtained by polycondensation of p-phenylenediacrylic acid with glycol, cinnamylidene acetic acid esterified with polyvinyl alcohol, cinnamoyl group, cinnamylidene group, chalcone residue, isocoumarin residue, 2 , 5-dimethoxystilbene residue, styrylpyridinium residue, thymine residue, ⁇ -phenylmaleimide, anthracene residue, and 2-pyrone or other photosensitive functional groups introduced into the main chain or side chain of the polymer, etc.
- Diazo group or azido group introduced into the main chain or side chain of the polymer paraformaldehyde condensate of p-diazodiphenylamine, formaldehyde condensate of benzenediazodium-4- (phenylamino) -phosphate, methoxy
- Examples include a formaldehyde condensate of a salt addition product of benzenediazodium-4- (phenylamino), polyvinyl-p-azidobenzal resin, and azidoacrylate.
- polymers having a phenol ester introduced into the main chain or side chain polymers having an unsaturated carbon-carbon double bond such as a (meth) acryloyl group, unsaturated polyesters, unsaturated polyurethanes, unsaturated polymers Examples thereof include saturated polyamide, poly (meth) acrylic acid in which an unsaturated carbon-carbon double bond is introduced as an ester bond in the side chain, epoxy (meth) acrylate, and novolak (meth) acrylate.
- photosensitive polyimides photosensitive polyamic acids, photosensitive polyamideimides, and combinations of phenolic resins and azide compounds can be used. Further, it can be used in combination with an epoxy resin or a polyamide introduced with a chemically cross-linked site and a photocationic polymerization initiator. Furthermore, natural rubber, synthetic rubber, or a combination of a cyclized rubber and a bisazide compound can be used.
- the material used for the light transmission region is preferably the same or larger in grindability than the material used for the polishing region.
- Grindability refers to the degree to which a material to be polished is ground during polishing. In such a case, the light transmission region does not protrude from the polishing region, and scratches on the material to be polished and dechucking errors during polishing can be prevented.
- a material similar to the material used for the polishing region and the physical properties of the polishing region is preferable to use a material similar to the material used for the polishing region and the physical properties of the polishing region.
- a highly abrasion-resistant polyurethane resin that can suppress light scattering in the light transmission region due to dressing marks during polishing is desirable.
- the polyurethane resin comprises an isocyanate component, a polyol component (such as a high molecular weight polyol or a low molecular weight polyol), and a chain extender.
- isocyanate component 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 2,2′-diphenylmethane diisocyanate, 2,4′-diphenylmethane diisocyanate, 4,4′-diphenylmethane diisocyanate, 1,5-naphthalene diisocyanate,
- examples include p-phenylene diisocyanate, m-phenylene diisocyanate, p-xylylene diisocyanate, m-xylylene diisocyanate, hexamethylene diisocyanate, 1,4-cyclohexane diisocyanate, 4,4′-dicyclohexylmethane diisocyanate, isophorone diisocyanate, and the like. . These may be used alone or in combination of two or more.
- the high molecular weight polyol examples include a polyether polyol typified by polytetramethylene ether glycol, a polyester polyol typified by polybutylene adipate, a polycaprolactone polyol, a reaction product of a polyester glycol such as polycaprolactone and an alkylene carbonate, and the like.
- a polyether polyol typified by polytetramethylene ether glycol
- a polyester polyol typified by polybutylene adipate a polycaprolactone polyol
- a reaction product of a polyester glycol such as polycaprolactone and an alkylene carbonate
- Exemplified polyester polycarbonate polyol, polyester polycarbonate polyol obtained by reacting ethylene carbonate with polyhydric alcohol and then reacting the obtained reaction mixture with organic dicarboxylic acid, and polycarbonate obtained by transesterification reaction between polyhydroxyl compound and aryl carbonate A polyol etc. are mentioned.
- chain extenders include ethylene glycol, 1,2-propylene glycol, 1,3-propylene glycol, 1,4-butanediol, 1,6-hexanediol, neopentyl glycol, 1,4-cyclohexanedimethanol, 3 -Low molecular weight polyols such as methyl-1,5-pentanediol, diethylene glycol, triethylene glycol, 1,4-bis (2-hydroxyethoxy) benzene, or 2,4-toluenediamine, 2,6-toluenediamine, 3, 5 -diethyl-2, 4 -toluenediamine, 4,4'-di-sec-butyl-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,3'-dichloro-4,4'-diaminodiphenylmethane, 2,2 ', 3,3'-tetrachloro
- polyamines are often colored themselves or resins formed using these are colored in many cases, it is preferable to blend them so as not to impair the physical properties and light transmittance.
- a compound having an aromatic hydrocarbon group when used, the light transmittance on the short wavelength side tends to be lowered. Therefore, it is particularly preferable not to use such a compound.
- a compound in which an electron donating group such as a halogen group or a thio group or an electron withdrawing group is bonded to an aromatic ring or the like tends to decrease the light transmittance. Therefore, such a compound may not be used. Particularly preferred. However, you may mix
- the ratio of the isocyanate component, the polyol component, and the chain extender in the polyurethane resin can be appropriately changed depending on the molecular weight of each and the desired physical properties of the light transmission region produced therefrom.
- the number of isocyanate groups of the organic isocyanate relative to the total number of functional groups (hydroxyl group + amino group) of the polyol and the chain extender is preferably 0.95 to 1.15, more preferably 0.99 to 1.10.
- the polyurethane resin can be manufactured by applying a known urethanization technique such as a melting method or a solution method, but it is preferable to manufacture the polyurethane resin by a melting method in consideration of cost, working environment, and the like.
- the polymerization procedure of the polyurethane resin either a prepolymer method or a one-shot method is possible.
- an isocyanate-terminated prepolymer from an organic isocyanate and a polyol in advance. Is preferably synthesized, and a prepolymer method in which a chain extender is reacted with this is preferred.
- the NCO wt% of the prepolymer is preferably about 2 to 8 wt%, more preferably about 3 to 7 wt%. If the NCO wt% is less than 2 wt%, the reaction curing tends to take too much time and the productivity tends to decrease.
- the reaction rate becomes too fast.
- air entrainment or the like occurs, and physical properties such as transparency and light transmittance of the polyurethane resin tend to deteriorate.
- the attenuation of the reflected light increases due to light scattering, and the polishing end point detection accuracy and the film thickness measurement accuracy tend to decrease. Therefore, in order to remove such bubbles and make the light transmission region non-foamed, it is preferable to sufficiently remove the gas contained in the material by reducing the pressure to 10 Torr or less before mixing the material. .
- the stirring process after mixing in the case of the stirring blade type mixer normally used, it is preferable to stir at the rotation speed of 100 rpm or less so that bubbles may not mix.
- the stirring step is preferably performed under reduced pressure.
- the rotation and revolution type mixer is difficult to mix bubbles even at high rotation, it is also preferable to perform stirring and defoaming using the mixer.
- the production method of the light transmission region is not particularly limited, and can be produced by a known method.
- a polyurethane resin block produced by the above method can be made to have a predetermined thickness using a band saw type or canna type slicer, a method of pouring the resin into a mold having a cavity of a predetermined thickness, a coating technique, A method using a sheet forming technique is used.
- the shape and size of the light transmission region are not particularly limited, but are preferably the same shape and size as the opening of the polishing region.
- the light transmission region may be the same size as the through hole of the cushion layer, may be larger than the through hole, or may be smaller than the through hole.
- the thickness of the light transmission region is not particularly limited, but is preferably the same as or less than the thickness of the polishing region.
- the material to be polished may be damaged by the protruding portion during polishing. Further, the light transmission region is deformed by the stress applied during polishing, and is greatly distorted optically, so that there is a possibility that the optical end point detection accuracy of polishing is lowered.
- the thickness is too thin, the durability may be insufficient, or a large recess may be formed on the upper surface of the light transmission region, and a large amount of slurry may accumulate, resulting in a decrease in optical end point detection accuracy.
- the Asker D hardness in the light transmission region is preferably 30 to 75 degrees. By using the light transmission region having the hardness, the generation of scratches on the wafer surface and the deformation of the light transmission region can be suppressed. In addition, it is possible to suppress the occurrence of scratches on the surface of the light transmission region, thereby enabling highly accurate optical end point detection to be performed stably.
- the Asker D hardness in the light transmission region is preferably 40 to 60 degrees.
- Examples of the material for forming the polishing region include polyurethane resin, polyester resin, polyamide resin, acrylic resin, polycarbonate resin, halogen resin (polyvinyl chloride, polytetrafluoroethylene, polyvinylidene fluoride, etc.), polystyrene, olefin resin ( Polyethylene, polypropylene, etc.), epoxy resins, and photosensitive resins. These may be used alone or in combination of two or more.
- the material for forming the polishing region may be the same or different from that of the light transmission region, but it is preferable to use the same type of material as that used for the light transmission region.
- Polyurethane resin is a particularly preferable material as a material for forming a polishing region because it has excellent abrasion resistance and a polymer having desired physical properties can be easily obtained by variously changing the raw material composition.
- the isocyanate component to be used is not particularly limited, and examples thereof include the isocyanate component.
- the high molecular weight polyol to be used is not particularly limited, and examples thereof include the high molecular weight polyol.
- the number average molecular weight of these high molecular weight polyols is not particularly limited, but is preferably 500 to 2000 from the viewpoint of the elastic properties of the resulting polyurethane. If the number average molecular weight is less than 500, a polyurethane using the number average molecular weight does not have sufficient elastic properties and becomes a brittle polymer. For this reason, the polishing region produced from this polyurethane becomes too hard, which causes scratches on the wafer surface. Moreover, since it becomes easy to wear, it is not preferable from the viewpoint of the pad life. On the other hand, when the number average molecular weight exceeds 2,000, polyurethane using this is too soft, and the polishing region produced from this polyurethane tends to have poor planarization characteristics.
- the low molecular weight polyol in addition to the high molecular weight polyol, the low molecular weight polyol can be used in combination.
- chain extenders examples include 4,4′-methylenebis (o-chloroaniline) (MOCA), 2,6-dichloro-p-phenylenediamine, 4,4′-methylenebis (2,3-dichloroaniline), 3, 5-bis (methylthio) -2,4-toluenediamine, 3,5-bis (methylthio) -2,6-toluenediamine, 3,5-diethyltoluene-2,4-diamine, 3,5-diethyltoluene- 2,6-diamine, trimethylene glycol-di-p-aminobenzoate, polytetramethylene oxide-di-p-aminobenzoate, 1,2-bis (2-aminophenylthio) ethane, 4,4′-diamino- 3,3′-diethyl-5,5′-dimethyldiphenylmethane, N, N′-di-sec-butyl-4,4′-diaminodipheny
- the ratio of the isocyanate component, the polyol component, and the chain extender in the polyurethane resin can be variously changed depending on the molecular weight of each and the desired physical properties of the polishing region produced from these.
- the number of isocyanate groups in the isocyanate component relative to the total number of functional groups (hydroxyl group + amino group) of the polyol component and the chain extender is preferably 0.95 to 1.15. Preferably it is 0.99 to 1.10.
- the polyurethane resin can be produced by the same method as the above method.
- stabilizers such as antioxidants, surfactants, lubricants, pigments, solid beads, fillers such as water-soluble particles and emulsion particles, antistatic agents, abrasive grains, and other materials as necessary. Additives may be added.
- the polishing region is preferably a fine foam.
- a fine foam By using a fine foam, the slurry can be held in the fine pores on the surface, and the polishing rate can be increased.
- the method of finely foaming the polyurethane resin is not particularly limited, and examples thereof include a method of adding hollow beads, a method of foaming by a mechanical foaming method, a chemical foaming method, and the like.
- the mechanical foaming method using the silicon type surfactant which is a copolymer of polyalkylsiloxane and polyether is especially preferable.
- the silicon-based surfactant SH-192, L-5340 (manufactured by Toray Dow Corning Silicon) and the like are exemplified as suitable compounds.
- the manufacturing method of this polyurethane foam has the following processes. 1) Foaming process for producing a cell dispersion of isocyanate-terminated prepolymer A silicon-based surfactant is added to the isocyanate-terminated prepolymer (first component), and the mixture is stirred in the presence of a non-reactive gas to remove the non-reactive gas. Disperse as fine bubbles to obtain a cell dispersion. When the prepolymer is solid at normal temperature, it is preheated to an appropriate temperature and melted before use.
- non-reactive gas used to form the fine bubbles non-flammable gases are preferable, and specific examples include nitrogen, oxygen, carbon dioxide, rare gases such as helium and argon, and mixed gases thereof.
- nitrogen, oxygen, carbon dioxide, rare gases such as helium and argon, and mixed gases thereof are preferable.
- air that has been dried to remove moisture is most preferable in terms of cost.
- a stirring device for making non-reactive gas into fine bubbles and dispersing it in an isocyanate-terminated prepolymer containing a silicon-based surfactant a known stirring device can be used without particular limitation. Specifically, a homogenizer, a dissolver, A two-axis planetary mixer (planetary mixer) is exemplified.
- the shape of the stirring blade of the stirring device is not particularly limited, but it is preferable to use a whipper-type stirring blade because fine bubbles can be obtained.
- stirring in the mixing step may not be stirring that forms bubbles, and it is preferable to use a stirring device that does not involve large bubbles.
- a planetary mixer is suitable. There is no problem even if the same stirring device is used as the stirring device for the stirring step and the mixing step, and it is also preferable to adjust the stirring conditions such as adjusting the rotation speed of the stirring blade as necessary. .
- heating and post-curing the foam reacted until the foaming reaction liquid is poured into the mold and no longer flows has the effect of improving the physical properties of the foam.
- the foam reaction solution may be poured into the mold and immediately put into a heating oven for post cure, and heat is not immediately transferred to the reaction components under such conditions, so the bubble size does not increase.
- the curing reaction is preferably performed at normal pressure because the bubble shape is stable.
- a known catalyst for promoting a polyurethane reaction such as a tertiary amine type or an organic tin type may be used.
- the type and addition amount of the catalyst are selected in consideration of the flow time for pouring into a mold having a predetermined shape after the mixing step.
- the production of the polyurethane foam may be a batch method in which each component is metered into a container and stirred, and each component and a non-reactive gas are continuously supplied to the stirring device and stirred. It may be a continuous production method in which a cell dispersion is sent out to produce a molded product.
- the polishing region is manufactured by cutting the polyurethane foam produced as described above into a predetermined size.
- a concavo-convex structure for holding and renewing the slurry is provided on the polishing side surface in contact with the wafer.
- the polishing region is formed of fine foam, it has many openings on the polishing surface and has the function of holding the slurry, but in order to more efficiently maintain the slurry and renew the slurry.
- the concavo-convex structure is not particularly limited as long as it is a surface shape that holds and renews slurry.
- XY lattice grooves For example, XY lattice grooves, concentric grooves, through holes, non-through holes, polygonal columns, cylinders, spiral grooves , Eccentric circular grooves, radial grooves, and combinations of these grooves.
- the groove pitch, groove width, groove depth and the like are not particularly limited and are appropriately selected and formed.
- these uneven structures are generally regular, but in order to make the slurry retention and renewability desirable, the groove pitch, groove width, groove depth, etc. should be changed for each range. Is also possible.
- the thickness of the polishing region is not particularly limited, but is usually about 0.8 to 4 mm, preferably 1.5 to 2.5 mm.
- a method of producing the polishing region of the thickness a method of making the block of the fine foam a predetermined thickness using a band saw type or a canna type slicer, pouring resin into a mold having a cavity of a predetermined thickness, and curing And a method using a coating technique or a sheet forming technique.
- the cushion layer supplements the characteristics of the polishing area.
- the cushion layer is necessary in order to achieve both planarity and uniformity in a trade-off relationship in CMP.
- Planarity refers to the flatness of a pattern portion when a material having fine irregularities generated during pattern formation is polished, and uniformity refers to the uniformity of the entire material to be polished.
- the planarity is improved by the characteristics of the polishing region, and the uniformity is improved by the characteristics of the cushion layer.
- a material for forming the cushion layer is not particularly limited.
- a fiber nonwoven fabric such as a polyester nonwoven fabric, a nylon nonwoven fabric, and an acrylic nonwoven fabric
- a resin-impregnated nonwoven fabric such as a polyester nonwoven fabric impregnated with polyurethane
- examples thereof include rubber resins such as foam, butadiene rubber and isoprene rubber, and photosensitive resins.
- the manufacturing method of the polishing pad of the present invention is not particularly limited.
- a polishing region provided with an opening and a cushion layer provided with a through-hole are bonded to the adhesive layer of the double-sided adhesive sheet so that the opening and the through-hole overlap each other, and then bonded within the opening in the polishing region.
- the light transmitting region can be bonded to the agent layer, and the light transmitting member can be bonded to the adhesive layer in the through hole of the cushion layer.
- means for forming the opening in the polishing region and the through hole in the cushion layer are not particularly limited.
- a method of pressing or grinding with a cutting tool, a laser using a carbonic acid laser or the like And a method in which a raw material is poured into a mold having the shape of an opening or a through-hole and cured.
- the size and shape of the opening and the through hole are not particularly limited.
- the double-sided adhesive sheet has a general configuration in which an adhesive layer is provided on both sides of a substrate such as a nonwoven fabric or a film, and is generally called a double-sided tape.
- a substrate such as a nonwoven fabric or a film
- the composition of the adhesive layer include rubber adhesives and acrylic adhesives.
- a release sheet is provided on the adhesive layer of the double-sided adhesive sheet.
- the translucent member is preferably formed of a material having a light transmittance equivalent to that of the light transmissive region so as not to lower the optical end point detection accuracy.
- Examples thereof include glass and a resin film that transmits light. It is done. In particular, it is preferable to use a resin film formed of the same material as the light transmission region.
- the thickness of the translucent member is not particularly limited, but is preferably as thin as possible in consideration of the light transmittance.
- the antireflection treatment can be performed, for example, by providing an antireflection film having a lower refractive index than the film on the film.
- the material for forming the antireflection film include resin materials such as ultraviolet curable acrylic resins, hybrid materials in which inorganic fine particles such as colloidal silica are dispersed in the resin, metals such as tetraethoxysilane and titanium tetraethoxide. Examples thereof include sol-gel materials using alkoxides.
- each material may contain a fluorine group for imparting antifouling properties to the film surface.
- the light scattering treatment can be performed by imparting a fine concavo-convex structure to the surface of the film by an appropriate method such as a roughening method using a sand blasting method or an embossing method, or a blending method of transparent fine particles.
- the fine particles include inorganic fine particles such as silica, alumina, titania, zirconia, tin oxide, indium oxide, cadmium oxide, and antimony oxide having a mean particle size of 0.5 to 50 ⁇ m, a crosslinked or uncrosslinked polymer, and the like. And organic fine particles (including beads).
- a resin film that has been subjected to antifouling treatment may be used as the translucent member.
- the antifouling treatment can be performed, for example, by applying a fluororesin film on the film.
- a resin film having a bandpass function may be used as the light transmitting member.
- the band pass function refers to a function of selectively transmitting light of a specific wavelength from multicolor light and blocking (reflecting / absorbing) light of other wavelengths.
- Examples of the resin film having a bandpass function include colored films such as cellophane.
- a double-sided tape may be provided on the surface of the cushion layer that adheres to the platen.
- the semiconductor device is manufactured through a process of polishing the surface of the semiconductor wafer using the polishing pad.
- a semiconductor wafer is generally a laminate of a wiring metal and an oxide film on a silicon wafer.
- the method and apparatus for polishing the semiconductor wafer are not particularly limited.
- a polishing surface plate 2 that supports the polishing pad 1
- a support table 5 that supports the semiconductor wafer 4
- This is performed using a backing material for performing uniform pressurization and a polishing apparatus equipped with a polishing agent 3 supply mechanism.
- the polishing pad 1 is attached to the polishing surface plate 2 by attaching it with a double-sided tape, for example.
- the polishing surface plate 2 and the support base 5 are disposed so that the polishing pad 1 and the semiconductor wafer 4 supported on each of the polishing surface plate 2 and the support table 5 face each other, and are provided with rotating shafts 6 and 7 respectively. Further, a pressurizing mechanism for pressing the semiconductor wafer 4 against the polishing pad 1 is provided on the support base 5 side. In polishing, the semiconductor wafer 4 is pressed against the polishing pad 1 while rotating the polishing surface plate 2 and the support base 5, and polishing is performed while supplying slurry.
- the flow rate of the slurry, the polishing load, the polishing platen rotation speed, and the wafer rotation speed are not particularly limited and are appropriately adjusted.
- the protruding portion of the surface of the semiconductor wafer 4 is removed and polished flat. Thereafter, a semiconductor device is manufactured by dicing, bonding, packaging, or the like. The semiconductor device is used for an arithmetic processing device, a memory, and the like.
- Example 1 [Production of light transmission region] 128 parts by weight of a polyester polyol (number average molecular weight 2400) composed of adipic acid, hexanediol and ethylene glycol and 30 parts by weight of 1,4-butanediol were mixed, and the temperature was adjusted to 70 ° C. To this mixed solution, 100 parts by weight of 4,4′-diphenylmethane diisocyanate previously adjusted to 70 ° C. was added and stirred for about 1 minute. Then, the mixed solution was poured into a container kept at 100 ° C. and post-cured at 100 ° C. for 8 hours to produce a polyurethane resin. Using the produced polyurethane resin, a light transmission region (length 56 mm, width 20 mm, thickness 1.25 mm) was prepared by injection molding.
- a polyester polyol number average molecular weight 2400
- 1,4-butanediol 1,4-butanediol
- Concentric groove processing (groove width: 0.25 mm, groove depth: 0.45 mm, groove pitch: 1.5 mm) on the surface of the buffed sheet using a groove processing machine (manufactured by Toho Koki Co., Ltd.) ) This sheet was punched to a size of 60 cm in diameter, and then an opening (56 mm ⁇ 20 mm) was formed at a position of about 12 cm from the center of the punched sheet to prepare a polishing region.
- a polishing surface plate A double-sided tape for laminating was laminated and punched out to a size of 60 cm in diameter to produce a cushion layer with double-sided tape.
- a through hole 50 mm ⁇ 14 mm was formed at a position of about 12 cm from the center of the cushion layer with the double-sided tape.
- the polishing region with double-sided tape and the cushion layer with double-sided tape were bonded together so that the opening and the through hole overlap, and the produced light transmission region was bonded to the adhesive layer in the opening. Thereafter, a light-transmissive member (polyethylene terephthalate film, 50 mm long, 14 mm wide, 50 ⁇ m thick) was bonded to the adhesive layer in the through hole to prepare a polishing pad.
- a light-transmissive member polyethylene terephthalate film, 50 mm long, 14 mm wide, 50 ⁇ m thick
- Example 2 [Production of polishing pad]
- a double-sided tape (Sekisui Chemical Co., Ltd., double tack tape) having a release film (thickness 38 ⁇ m) made of polyethylene terephthalate on both sides is peeled off to expose the adhesive layer, and the adhesive layer Were bonded to the surface opposite to the groove processed surface of the polishing region prepared in Example 1 using a laminator to prepare a polishing region with a double-sided tape.
- region produced in Example 1 was bonded together to the adhesive bond layer in the opening part of the grinding
- a light transmitting member (50 mm ⁇ 14 mm) is formed by using a Thomson blade in a portion corresponding to the light transmitting region of the release film on the other surface of the double-sided tape, and a separation member other than the light transmitting member is formed.
- the mold film was peeled to expose the adhesive layer.
- a polishing surface plate A double-sided tape for laminating was laminated and punched out to a size of 60 cm in diameter to produce a cushion layer with double-sided tape.
- a through hole 50 mm ⁇ 14 mm was formed at a position of about 12 cm from the center of the cushion layer with the double-sided tape.
- the cushion layer with the double-sided tape was bonded to the exposed adhesive layer of the polishing layer with the double-sided tape so that the translucent member and the through hole overlapped to prepare a polishing pad.
- Example 3 A polishing pad was produced in the same manner as in Example 1 except that an anti-reflection film (manufactured by NOF Corporation, Realak) was used as the translucent member.
- an anti-reflection film manufactured by NOF Corporation, Realak
- Comparative Example 1 A polishing pad was produced in the same manner as in Example 1 except that the translucent member was not bonded to the adhesive layer in the through hole.
- An SPP600S manufactured by Okamoto Machine Tool Co., Ltd. was used as a polishing apparatus, and the produced polishing pad was bonded to a polishing surface plate. Then, the 8-inch dummy wafer was polished for 1 hour.
- silica slurry (SS12, manufactured by Cabot Corporation) was added as a slurry at a flow rate of 150 ml / min.
- the polishing load was 350 g / cm 2
- the polishing platen rotation number was 35 rpm
- the wafer rotation number was 30 rpm.
- the polishing pad is peeled off from the polishing surface plate, and whether the dust is attached to the light transmitting member or the adhesive layer in the through hole of the cushion layer and whether the surface thereof is rough are visually observed. did. In the polishing pads of Examples 1 to 3, no adhesion of dust or rough surface was observed. On the other hand, dust adhesion and surface roughness were observed on the polishing pad of Comparative Example 1. It is considered that fine dust or the like adhered to the adhesive layer during the preparation of the polishing pad and during the polishing operation. In addition, when the polishing pad is attached to the polishing surface plate or during the polishing operation, it is considered that the adhesive layer touches or adheres to the polishing surface plate and the surface thereof is roughened.
- the polishing pad of the present invention is used for flattening optical materials such as lenses and reflecting mirrors, silicon wafers, glass substrates for hard disks, aluminum substrates, and materials that require high surface flatness such as general metal polishing. Used for processing.
- the polishing pad of the present invention is particularly suitable for a step of planarizing a silicon wafer and a device having an oxide layer, a metal layer, etc. formed thereon, before further laminating and forming these oxide layers and metal layers. Used for.
- Polishing pad 2 Polishing surface plate 3: Abrasive (slurry) 4: Material to be polished (semiconductor wafer) 5: Support base (polishing head) 6, 7: Rotating shaft 8: Polishing region 9: Light transmission region 10: Polishing layer 11: Through hole 12: Cushion layer 13: Transparent sheet 14: Adhesive layer 15: Double-sided adhesive sheet 16: Translucent member
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Abstract
Description
(2)ジアゾ基やアジド基を高分子の主鎖や側鎖に導入したもの;p-ジアゾジフェニルアミンのパラホルムアルデヒド縮合物、ベンゼンジアゾジウム-4-(フェニルアミノ)-ホスフェートのホルムアルデヒド縮合物、メトキシベンゼンジアゾジウム-4-(フェニルアミノ)の塩付加物のホルムアルデヒド縮合物、ポリビニル-p-アジドベンザル樹脂、アジドアクリレートなどが挙げられる。
(3)主鎖または側鎖中にフェノールエステルが導入された高分子;(メタ)アクリロイル基等の不飽和炭素-炭素二重結合が導入された高分子、不飽和ポリエステル、不飽和ポリウレタン、不飽和ポリアミド、側鎖にエステル結合で不飽和炭素-炭素二重結合が導入されたポリ(メタ)アクリル酸、エポキシ(メタ)アクリレート、及びノボラック(メタ)アクリレートなどが挙げられる。
1)イソシアネート末端プレポリマーの気泡分散液を作製する発泡工程
イソシアネート末端プレポリマー(第1成分)にシリコン系界面活性剤を添加し、非反応性気体の存在下で撹拌し、非反応性気体を微細気泡として分散させて気泡分散液とする。前記プレポリマーが常温で固体の場合には適宜の温度に予熱し、溶融して使用する。
2)硬化剤(鎖延長剤)混合工程
上記の気泡分散液に鎖延長剤(第2成分)を添加、混合、撹拌して発泡反応液とする。
3)注型工程
上記の発泡反応液を金型に流し込む。
4)硬化工程
金型に流し込まれた発泡反応液を加熱し、反応硬化させる。
〔光透過領域の作製〕
アジピン酸とヘキサンジオールとエチレングリコールからなるポリエステルポリオール(数平均分子量2400)128重量部、及び1,4-ブタンジオール30重量部を混合し、70℃に温調した。この混合液に、予め70℃に温調した4,4’-ジフェニルメタンジイソシアネート100重量部を加え、約1分間撹拌した。そして、100℃に保温した容器中に該混合液を流し込み、100℃で8時間ポストキュアを行ってポリウレタン樹脂を作製した。作製したポリウレタン樹脂を用い、インジェクション成型にて光透過領域(縦56mm、横20mm、厚さ1.25mm)を作製した。
反応容器内に、ポリエーテル系プレポリマー(ユニロイヤル社製、アジプレンL-325、NCO濃度:2.22meq/g)100重量部、及びシリコン系界面活性剤(東レダウコーニングシリコーン社製、SH-192)3重量部を混合し、温度を80℃に調整した。撹拌翼を用いて、回転数900rpmで反応系内に気泡を取り込むように約4分間激しく撹拌を行った。そこへ予め120℃で溶融した4,4’-メチレンビス(o-クロロアニリン)(イハラケミカル社製、イハラキュアミンMT)26重量部を添加した。その後、約1分間撹拌を続けてパン型のオープンモールドへ反応溶液を流し込んだ。この反応溶液の流動性がなくなった時点でオーブン内に入れ、110℃で6時間ポストキュアを行い、ポリウレタン発泡体ブロックを得た。このポリウレタン発泡体ブロックをバンドソータイプのスライサー(フェッケン社製)を用いてスライスし、ポリウレタン発泡体シート(比重:0.86、D硬度:52度)を得た。次にこのシートをバフ機(アミテック社製)を使用して、所定の厚さに表面バフをし、厚み精度を整えたシートとした(シート厚み:1.27mm)。このバフ処理をしたシートの表面に、溝加工機(東邦鋼機社製)を用いて同心円状の溝加工(溝幅:0.25mm、溝深さ:0.45mm、溝ピッチ:1.5mm)を行った。このシートを直径60cmの大きさに打ち抜き、次に、打ち抜いたシートの中心から約12cmの位置に開口部(56mm×20mm)を形成して研磨領域を作製した。
作製した研磨領域の溝加工面と反対側の面にラミ機を使用して、両面テープ(積水化学工業社製、ダブルタックテープ)を貼り合わせて両面テープ付き研磨領域を作製した。
〔研磨パッドの作製〕
両面にポリエチレンテレフタレートからなる離型フィルム(厚さ38μm)を有する両面テープ(積水化学工業社製、ダブルタックテープ)の片面の離型フィルムを剥離して接着剤層を露出させ、該接着剤層を実施例1で作製した研磨領域の溝加工面と反対側の面にラミ機を使用して貼り合わせて両面テープ付き研磨領域を作製した。両面テープ付き研磨領域の開口部内の接着剤層に、実施例1で作製した光透過領域を貼り合わせて両面テープ付き研磨層を作製した。その後、前記両面テープの他面の離型フィルムの前記光透過領域に対応する部分に、トムソン刃を用いて切れ込みを入れて透光部材(50mm×14mm)を形成し、透光部材以外の離型フィルムを剥離して接着剤層を露出させた。
透光部材として、アンチリフレクションフィルム(日油(株)社製、リアルック)を用いた以外は実施例1と同様の方法で研磨パッドを作製した。
透光部材を貫通孔内の接着剤層に貼り合わせなかった以外は実施例1と同様の方法で研磨パッドを作製した。
研磨装置としてSPP600S(岡本工作機械社製)を用い、作製した研磨パッドを研磨定盤に貼り合わせた。そして、8インチのダミーウエハを1時間研磨した。研磨条件としては、スラリーとして、シリカスラリー(SS12、キャボット社製)を研磨中に流量150ml/min添加した。研磨荷重としては350g/cm2、研磨定盤回転数35rpm、ウエハ回転数30rpmとした。その後、研磨パッドを研磨定盤から剥離し、クッション層の貫通孔内の透光部材又は接着剤層にごみが付着しているか否か、及びその表面が荒れているか否かを目視にて観察した。実施例1~3の研磨パッドには、ごみの付着又は表面の荒れは認められなかった。一方、比較例1の研磨パッドには、ごみの付着及び表面の荒れが認められた。研磨パッド作製時及び研磨操作時に接着剤層に細かな埃などが付着したと考えられる。また、研磨パッドを研磨定盤に貼り付けるとき又は研磨操作中に、接着剤層が研磨定盤に触れたり又は張り付いて、その表面が荒れたと考えられる。
2:研磨定盤
3:研磨剤(スラリー)
4:被研磨材(半導体ウエハ)
5:支持台(ポリシングヘッド)
6、7:回転軸
8:研磨領域
9:光透過領域
10:研磨層
11:貫通孔
12:クッション層
13:透明シート
14:接着剤層
15:両面接着シート
16:透光部材
Claims (5)
- 研磨領域及び光透過領域を有する研磨層と貫通孔を有するクッション層とが、前記光透過領域と前記貫通孔とが重なるように両面接着シートを介して積層されている研磨パッドにおいて、前記貫通孔内の両面接着シートの接着剤層に透光部材が貼付されていることを特徴とする研磨パッド。
- 前記透光部材は、反射防止処理及び/又は光散乱処理された樹脂フィルムである請求項1記載の研磨パッド。
- 前記透光部材は、防汚処理された樹脂フィルムである請求項1記載の研磨パッド。
- 前記透光部材は、バンドパス機能を有する樹脂フィルムである請求項1記載の研磨パッド。
- 請求項1記載の研磨パッドを用いて半導体ウエハの表面を研磨する工程を含む半導体デバイスの製造方法。
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SG2012073318A SG184410A1 (en) | 2010-04-15 | 2011-04-07 | Polishing pad |
US13/639,475 US9126304B2 (en) | 2010-04-15 | 2011-04-07 | Polishing pad |
CN201180006998.0A CN102712074B (zh) | 2010-04-15 | 2011-04-07 | 抛光垫 |
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JP2010094318A JP5620141B2 (ja) | 2010-04-15 | 2010-04-15 | 研磨パッド |
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JP (1) | JP5620141B2 (ja) |
KR (1) | KR20120096059A (ja) |
CN (1) | CN102712074B (ja) |
MY (1) | MY164221A (ja) |
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JP5620141B2 (ja) | 2014-11-05 |
KR20120096059A (ko) | 2012-08-29 |
TWI474893B (zh) | 2015-03-01 |
US9126304B2 (en) | 2015-09-08 |
SG184410A1 (en) | 2012-11-29 |
MY164221A (en) | 2017-11-30 |
CN102712074A (zh) | 2012-10-03 |
CN102712074B (zh) | 2016-01-20 |
US20130017769A1 (en) | 2013-01-17 |
JP2011228358A (ja) | 2011-11-10 |
TW201141661A (en) | 2011-12-01 |
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