WO2011071269A2 - Procédé de préparation d'une solution de revêtement pour augmenter la transmittance optique d'un verre de module de cellule solaire, et composition de solution de revêtement préparée par le procédé - Google Patents

Procédé de préparation d'une solution de revêtement pour augmenter la transmittance optique d'un verre de module de cellule solaire, et composition de solution de revêtement préparée par le procédé Download PDF

Info

Publication number
WO2011071269A2
WO2011071269A2 PCT/KR2010/008557 KR2010008557W WO2011071269A2 WO 2011071269 A2 WO2011071269 A2 WO 2011071269A2 KR 2010008557 W KR2010008557 W KR 2010008557W WO 2011071269 A2 WO2011071269 A2 WO 2011071269A2
Authority
WO
WIPO (PCT)
Prior art keywords
sol
solar cell
cell module
light transmittance
coating
Prior art date
Application number
PCT/KR2010/008557
Other languages
English (en)
Korean (ko)
Other versions
WO2011071269A3 (fr
Inventor
김육중
장진호
Original Assignee
주식회사 에이치와이티씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 에이치와이티씨 filed Critical 주식회사 에이치와이티씨
Priority to JP2012543016A priority Critical patent/JP5686138B2/ja
Priority to EP10836165.0A priority patent/EP2511349A4/fr
Publication of WO2011071269A2 publication Critical patent/WO2011071269A2/fr
Publication of WO2011071269A3 publication Critical patent/WO2011071269A3/fr

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C03C1/008—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/30—Additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/30—Additives
    • C03C2203/32—Catalysts
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Definitions

  • the present invention relates to the production of a coating solution for increasing the transmittance by coating the glass used in the solar cell module manufacturing.
  • the present invention relates to the production of a coating solution for increasing the transmittance by coating the glass used in the solar cell module manufacturing.
  • the reflected wave is extinguished in a specific wavelength range.
  • An example of this is an antireflective layer on architectural glass from Schott Glastechnike, which is produced by the sol-gel method and applied by dip coating.
  • the frequency band width of these antireflective coatings is physically limited to one octave and only suitable for antireflective coatings in the visible region, but also for antireflective coatings in the broad band solar spectrum. Not.
  • Republic of Korea Patent Application Publication No. 10-2008-0023888 'reflective functional coating glass' is a coating layer made of two or more different refractive index material, etc. by subtracting the amount of light reflected by absorbing or optically interfering light in the visible region
  • a multi-layer coating method was specifically used to make several layers by using vapor deposition.
  • the size of glass that can be deposited is limited, and mass production is difficult to control the film thickness of each layer with high precision. It has been difficult to apply to products due to the difficulty and low economical problem.
  • Korean Patent No. 10-0653585 'Anti-reflective coating, a method for preparing an anti-reflective coating, and an anti-reflective glass' is used to prepare an anti-reflection coating containing fluorine atoms.
  • Polysiloxane solutions were prepared and allowed to coat by conventional coating methods.
  • fluoroalkylsilanes are expensive raw materials compared to alkoxy silanes and are difficult to be applied to the price of solar cell modules currently applied in the market.
  • the present invention has been made to overcome the above disadvantages, the present invention is to increase the transmittance by using the filling arrangement of nano-inorganic particles, to maintain the hardness in the thickness of the optical thin film, to minimize the manufacturing cost due to the single layer wet coating method It is an object to provide an optical coating composition that can be.
  • It provides a method for producing a coating liquid for increasing the light transmittance for use in a solar cell module to achieve the object as described above. It may include the first step of inducing agglomeration due to the sol-gel reaction to generate particles of several tens to hundreds of nanometers by introducing a flocculation inducing agent to cause a sol-gel reaction with aluminum alkoxide which is rapidly reactive. have.
  • the aggregation inducing agent may be any one or more materials selected from silica sol and alumina sol.
  • a second step of stabilizing the particles by adding a dispersion stabilizer to the sol prepared through the first step After the first step, a second step of stabilizing the particles by adding a dispersion stabilizer to the sol prepared through the first step.
  • the method may further include a third step of reacting the metal alkoxide sol-gel again using the sol prepared through the second step.
  • the method may further include mixing 10 to 40 parts by weight of the alumina sol relative to 100 parts by weight of the silica sol.
  • the coagulant inducing agent is to be in the form of an acidic sol (sol), if the coagulant inducing agent is basic, and further comprising the step of changing the pH to an acid using an acid catalyst and the sol-gel reaction is 50 to 80 degrees Celsius It can be to get up.
  • sol acidic sol
  • Particles of the silica sol can be reacted using a size of 10nm to 200nm.
  • Particles of alumina sol can be used to the 100 to 200nm size.
  • the aggregated particles may have a size of 100nm to 500nm.
  • It may also be an anti-reflective coating composition comprising a sol compound (Si (OR) 4) which is a sol formed above and a metal alkoxide, water, an organic solvent, and a catalyst.
  • a sol compound Si (OR) 4
  • a metal alkoxide water, an organic solvent, and a catalyst
  • the antireflection coating When the antireflection coating is applied to the outermost glass of the solar cell module, the efficiency is increased, but it is difficult to apply due to the problem of manufacturing cost and reliability due to the existing multilayer thin film design.
  • the arrangement has an effect of providing an optical coating composition that can increase the transmittance, maintain the hardness even in the optical film thickness, minimizing the manufacturing cost due to the single layer wet coating method.
  • 1 and 2 are graphs showing the light transmittance after applying the coating liquid according to the present invention.
  • Figure 3 is an enlarged photograph of a plane coated with a coating liquid according to the present invention
  • Figure 4 is a side photograph of the coating layer containing the coating liquid according to the present invention.
  • the present invention is to provide an antireflection film having a hardness and reliability suitable for use for solar cells in the production of an antireflection film using a single layer as a wet coating method.
  • the reflection is diffused to improve the antireflection, but the light transmittance rapidly decreases, which is not suitable for solar cells.
  • the size of the inorganic particles is reduced from the micro size to the nano unit, the light transmittance is increased and the hardness is increased by the ballast caused by the inorganic particles.
  • agglomeration is induced by the reaction of aluminum alkoxide, which has a high reactivity, and an agglomeration inducing agent having an acidic pH.
  • the inducing agent has a first step in which the pH is in the form of an sol in which the pH is acidic, and when the pH of the coagulant inducing agent is a base, the pH is changed to acidic by using an acidic catalyst and the reaction occurs at 50 to 80 degrees Celsius.
  • the flocculating inducing agent may be an aqueous silica sol, and in the case of silica sol, particles having a size of about 10 nm to about 200 nm may be used.
  • an aqueous alumina sol (Alumina-sol) may be used as the flocculating agent, and the particles of the alumina sol may be about 10 to 500 nm in size, and preferably about 10 to 200 nm in size.
  • an aqueous alumina sol together with an aqueous silica sol as a flocculant.
  • a second step of stabilizing the particles by adding a dispersion stabilizer to the sol prepared through the first step and a third step of metal alkoxide sol-gel reaction again using the sol prepared through the second step As the metal alkoxide used to, the following chemical formulas may be used. Where, R is a C 10 or lower alkyl group.
  • the jacket reactor temperature at 25 ° C. and mix 12.8 g of methanol, 7.9 g of methyl cellulsolve, and 0.015 g of acetic acid, and then stir for 10 minutes to prepare a mixture.
  • the mixture containing the surfactant was prepared by adding 0.05 g of polyvinylpyrrolidone (MW: 40,000) and 0.05 g of brij-56 (poly (oxyethylene) nonionic surfactant).
  • 2.8 g of Aluminum tri-sec-butoxide was added to the mixture, followed by high speed mixing. Then, 36 g of isopropyl alcohol was mixed to prepare an aluminum alkoxide mixture.
  • Grace's Ludox colloidal silica, HS-40 is passed through a cation exchange resin to an acidic silica sol with a pH of 2 to 3, and then dropping into an aluminum alkoxide mixture prepared at a ratio of 3 to 10% by weight to the total weight of the mixture. After slowly dropping the mixture, the mixture was polymerized for 1 to 10 hours using a sol-gel reaction.
  • the dispersion composition stabilizer DBTDL (Di butyl tin Laurate) 0.1 ⁇ 0.5mol, a leveling additive BYK300 is added to prepare a coating composition.
  • Example 1 aluminum tri-sec-butoxide was replaced with A [Al (OC 3 H 7) 3] to proceed in the same manner as in Example 1.
  • Example 1 the acidic colloidal silica was added and then heated to maintain the jacket reactor temperature at 50 to 70 ° C., and then cooled to 30 ° C. for 1 to 10 hours to proceed with the sol-gel reaction for 1 to 3 hours.
  • Example 1 When preparing an acidic silica sol in Example 1, cation exchange after mixing Grace-40 Ludox colloidal silica HS-40, AS, TM and Eschemte's silica sol SS-SOL 100 in a percentage of 10, 20, 20, 50%, respectively Pass the resin to prepare an acidic colloidal silica of pH 2-3. It prepared in the same manner as in Example 1 using the acidic colloidal silica prepared.
  • Example 4 the acidic colloidal silica was added and then heated to maintain the jacket reactor temperature at 50 to 70 ° C., followed by cooling at 30 ° C. for 1 to 10 hours, and sol-gel reaction for 1 to 3 hours.
  • Example 1 a coating composition was prepared using NANOBYK-3600 (BYK), an alumina sol instead of acidic colloidal silica.
  • Example 6 after the addition of the alumina sol, the temperature was increased to maintain the jacket reactor temperature at 50 to 70 ° C. and the reaction proceeds for 1 to 10 hours, followed by cooling to 30 ° C. for 1 to 3 hours.
  • the NANOBYK-3600 an aluminum sol, was added dropwise to the acidic silica in a ratio of 10 to 40% by weight based on 100 parts by weight of the acidic colloidal silica sol to prepare an acidic hybrid nanosol.
  • Example 8 after adding the hybrid nanosol, the temperature was increased, the jacket reactor temperature was maintained at 50 to 70 ° C., and the reaction proceeded for 1 to 10 hours, and then cooled to 30 ° C. to perform the sol-gel reaction for 1 to 3 hours.
  • Example 2 30 minutes after the acidic silica sol was added in Example 1, 1.3g, 0.8g, 1.5g, and 0.03 of Aldrich's tetramethoxysilane (TMOS), tetraethoxysilane (TEOS), distilled water and Itaconic acid (Aldrich), respectively, were added. After adding g, the sol-gel reaction is performed for 1 to 5 hours.
  • TMOS tetramethoxysilane
  • TEOS tetraethoxysilane
  • Aldrich Itaconic acid
  • Example 3 the jacket reactor temperature was maintained at 50-70 ° C. and the reaction proceeded for 1-10 hours, followed by cooling to 30 ° C., to which Tetramethoxysilane (TMOS), Tetraethoxysilane (TEOS), distilled water, Itaconic acid ( Aldrich) was added 1.3g, 0.8g, 1.5g, 0.03g, respectively, followed by sol-gel reaction for 1-5 hours.
  • TMOS Tetramethoxysilane
  • TEOS Tetraethoxysilane
  • Aldrich Aldrich
  • Example 5 the jacket reactor temperature was maintained at 50 to 70 ° C., and the reaction was carried out for 1 to 10 hours, followed by cooling to 30 ° C., to which tetramethoxysilane (TMOS), tetraethoxysilane (TEOS), distilled water, and Itaconic acid (Aldrich) were manufactured. Aldrich) was added 1.3g, 0.8g, 1.5g, 0.03g, respectively, followed by sol-gel reaction for 1-5 hours.
  • TMOS tetramethoxysilane
  • TEOS tetraethoxysilane
  • Aldrich Itaconic acid
  • Example 7 the jacket reactor temperature was maintained at 50-70 ° C. and the reaction proceeded for 1-10 hours, followed by cooling to 30 ° C., to which tetramethoxysilane (TMOS), tetraethoxysilane (TEOS), distilled water, Itaconic acid ( Aldrich) was added 1.3g, 0.8g, 1.5g, 0.03g, respectively, followed by sol-gel reaction for 1-5 hours.
  • TMOS tetramethoxysilane
  • TEOS tetraethoxysilane
  • Aldrich Aldrich
  • Example 9 the jacket reactor temperature was maintained at 50 to 70 ° C., and the reaction was performed for 1 to 10 hours, followed by cooling to 30 ° C., to which Tetramethoxysilane (TMOS), Tetraethoxysilane (TEOS), distilled water, and Itaconic acid (Aldrich) were manufactured. Aldrich) was added 1.3g, 0.8g, 1.5g, 0.03g, respectively, followed by sol-gel reaction for 1-5 hours.
  • TMOS Tetramethoxysilane
  • TEOS Tetraethoxysilane
  • Aldrich Itaconic acid
  • TEOS tetra-ethoxysilane
  • GPTMS (3-glycidoxypropyl) trimethoxysilane] to perform sol-gel reaction.
  • GPTMS has excellent hardness and adhesion of coatings, but one of the OR groups in the alkoxy silane is R only.
  • R has a structure in which the functional group has an epoxy structure, which prevents the formation of a porous structure and thus has no effect on the increase in transmittance. It can be seen from the table that the transmittance of Comparative Example 1 is not good. In other words, when compared with the present invention, what kind of silane is used in the process of making the porous structure shows different results.
  • the coating composition formed an optical thin film layer by forming a coating film thickness of 500 nm or less on silica glass (1T).
  • Visible light transmittance was measured in the range of 380 ⁇ 800nm using JASCO Model V-570, hardness was measured by KS M ISO 15184: 2002.
  • the transmittance of the silica glass was 90.2%, and the coating composition prepared according to the Example was coated with an optical thin film to cure at 200 ° C., and the results are shown in the following table.
  • the light transmittance was increased due to the filling arrangement effect of the nanoparticles, and the light transmittance was increased by 1.0 to 2.5% when coating on one side and 2 to 5% when coating on both sides.
  • the strength of the coating film was measured to be higher than H, and the hardness decrease due to the porous structure could be solved.
  • Example 1 shows a graph comparing the transmittance of the antireflective coated glass of Example 14 with that of ordinary glass. It can be seen that the antireflection coating on the cross-section shows a difference in transmittance of about 2%.
  • Figure 2 compares the transmittance of the glass with the antireflective coating of Example 14 on both sides and the transmittance of ordinary glass. It can be seen that there is a transmittance difference of about 3% to 5% depending on the wavelength.
  • Figure 3 is a photograph of the surface of the anti-reflective coating by the FE-SEM of Example 14 and Figure 4 is a photograph of the surface of the side by the FE-SEM. 3 and 4, it can be seen that it is formed by one layer rather than a multilayer.
  • 3 is a surface measurement by FE-SEM to indicate that the surface is a porous structure and
  • Figure 4 is a side (side) of the surface (side) (measured by surface) shows the unevenness of the surface due to the porous structure.

Abstract

La présente invention porte sur un procédé de préparation d'un liquide de revêtement destiné à augmenter la transmittance d'un verre utilisé dans la fabrication d'un module de cellule solaire lorsqu'il est déposé en couche sur ledit verre, et sur une composition de solution de revêtement préparée par le procédé. Dans l'état de la technique, pour augmenter la transmittance optique, des couches à indices de réfraction élevé et faible sont alternativement empilées, un revêtement de catalyseur optique antireflet est mis en œuvre, ou une structure d'alcoxysilane poreuse est utilisée. Toutefois, ces procédés sont difficiles à employer en raison de leurs inconvénients, tels que la difficulté d'empilement de précision, des coûts élevés, ou la stabilité au stockage limitée du liquide de revêtement. En conséquence, la présente invention est proposée pour surmonter ces inconvénients par remplissage et agencement de particules inorganiques, dont la taille va de plusieurs dizaines à plusieurs centaines de nanomètres, de telle manière que les particules inorganiques forment une structure de réseau similaire à une structure poreuse afin de présenter la propriété d'une structure poreuse de transmittance améliorée, tout en améliorant la dureté en raison des caractéristiques mécaniques des particules inorganiques remplies.
PCT/KR2010/008557 2009-12-07 2010-12-01 Procédé de préparation d'une solution de revêtement pour augmenter la transmittance optique d'un verre de module de cellule solaire, et composition de solution de revêtement préparée par le procédé WO2011071269A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012543016A JP5686138B2 (ja) 2009-12-07 2010-12-01 太陽電池モジュール用のガラスに使用するための光透過率を増大させるコーティング液を製造する方法とそれによって製造されたコーティング液組成物
EP10836165.0A EP2511349A4 (fr) 2009-12-07 2010-12-01 Procédé de préparation d'une solution de revêtement pour augmenter la transmittance optique d'un verre de module de cellule solaire, et composition de solution de revêtement préparée par le procédé

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020090120735A KR101021659B1 (ko) 2009-12-07 2009-12-07 태양전지 모듈용 글래스에 사용하기 위하여 광투과율을 증대시켜 주는 코팅액을 제조하는 방법과 이에 의하여 제조된 코팅액 조성물
KR10-2009-0120735 2009-12-07

Publications (2)

Publication Number Publication Date
WO2011071269A2 true WO2011071269A2 (fr) 2011-06-16
WO2011071269A3 WO2011071269A3 (fr) 2011-11-17

Family

ID=43938816

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/008557 WO2011071269A2 (fr) 2009-12-07 2010-12-01 Procédé de préparation d'une solution de revêtement pour augmenter la transmittance optique d'un verre de module de cellule solaire, et composition de solution de revêtement préparée par le procédé

Country Status (6)

Country Link
US (1) US9284214B2 (fr)
EP (1) EP2511349A4 (fr)
JP (1) JP5686138B2 (fr)
KR (1) KR101021659B1 (fr)
CN (1) CN102086093B (fr)
WO (1) WO2011071269A2 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130319493A1 (en) * 2010-10-06 2013-12-05 3M Innovative Properties Company Coatings for optical components of solar energy systems
CN103154152B (zh) 2010-10-06 2018-04-13 3M创新有限公司 涂料组合物及其制备和使用方法
KR101121207B1 (ko) * 2011-05-03 2012-03-22 윤택진 내식성이 우수한 저굴절 특성의 반사 방지 코팅 조성물, 및 이의 제조방법
CN104169745B (zh) * 2012-11-08 2018-08-17 Ppg工业俄亥俄公司 具有耐磨性的玻璃状涂层的涂覆的制品
CN103265884A (zh) * 2013-06-06 2013-08-28 苏州禾川化工新材料科技有限公司 一种镜片加硬增透液
JP6295673B2 (ja) * 2014-01-17 2018-03-20 日立化成株式会社 パッシベーション層付半導体基板、パッシベーション層形成用塗布型材料及び太陽電池素子
JP6771383B2 (ja) * 2014-09-30 2020-10-21 日本板硝子株式会社 低反射コーティング、低反射コーティングを製造する方法、ガラス板、ガラス基板、及び光電変換装置
WO2018184793A1 (fr) * 2017-04-04 2018-10-11 Asml Holding N.V. Revêtement antireflet
CN111989375B (zh) * 2018-05-11 2022-03-01 富士胶片株式会社 涂层剂、防雾膜、防雾膜的制造方法及层叠体
CN111362589B (zh) * 2020-04-29 2022-07-01 东莞南玻太阳能玻璃有限公司 一种耐候双层高增透镀膜玻璃及其制备方法
EP3978453B1 (fr) * 2020-09-30 2023-08-16 Saint-Gobain Glass France Vitrage de contrôle solaire pour automobile et sa fabrication

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040035832A (ko) 2001-09-21 2004-04-29 메르크 파텐트 게엠베하 내마모성 ｓｉｏ2 반사방지 층을 제조하기 위한 신규하이브리드 졸
KR100653585B1 (ko) 1999-12-14 2006-12-04 닛산 가가쿠 고교 가부시키 가이샤 반사방지 막, 반사방지 막의 제조 방법, 및 반사방지 유리
KR20080023888A (ko) 2006-09-12 2008-03-17 코리아 오토글라스 주식회사 반사방지 기능성 코팅유리
KR100870213B1 (ko) 2007-09-21 2008-11-25 (주)켐웰텍 반사방지 광촉매 조성물 및 이를 적용한 유리기재

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3342705B2 (ja) * 1991-07-31 2002-11-11 旭硝子株式会社 記録シート用塗布液
KR100265777B1 (ko) * 1993-08-05 2000-09-15 김순택 화상표시장치의 반사방지막 제조방법, 및 이를 채용한 화상표시장치
JPH09202649A (ja) * 1996-01-24 1997-08-05 Central Glass Co Ltd 花弁状透明アルミナ膜及びその形成法
JPH11322325A (ja) * 1998-05-21 1999-11-24 Oji Paper Co Ltd シリカ複合粒子及びその製造方法並びにインクジェット記録シート
JP2000275819A (ja) * 1999-03-24 2000-10-06 Dainippon Ink & Chem Inc 平版印刷版原版およびそれを用いた印刷刷版作製方法
EP1167313B1 (fr) * 1999-12-13 2015-09-23 Nippon Sheet Glass Co., Ltd. Article en verre a faible reflexion
JP4527272B2 (ja) * 1999-12-13 2010-08-18 日本板硝子株式会社 低反射ガラス物品
KR100405302B1 (ko) * 2000-07-27 2003-11-12 주식회사 엘지화학 부착성, 광택성, 저장 및 작업 안정성을 향상시킨실록산계 고굴절 및 초고굴절 피복 조성물
JP2002182006A (ja) * 2000-12-19 2002-06-26 Nippon Sheet Glass Co Ltd 反射防止膜、それを備えた基材および光電変換装置
JP2002365403A (ja) * 2001-06-11 2002-12-18 Nippon Sheet Glass Co Ltd 低反射膜およびこれを用いた透明積層体
JP2003026422A (ja) * 2001-07-11 2003-01-29 Fm Giken Kk 金属酸化物及び／又は金属過酸化物の微粒子分散ゾルとその製造方法並びに微粒子粉体
KR20030023833A (ko) * 2001-09-14 2003-03-20 전증남 차체 앞선,후선을 시각하는 잠망경형 빽밀러
KR100533073B1 (ko) * 2003-04-15 2005-12-01 (주) 유니플라텍 고온용 및 일반용 카본 잉크, 카본지 제조용 연속형 딥코팅 장치, 및 고온용 및 일반용 면상 발열체와 그 제조방법
JP2004352524A (ja) 2003-05-27 2004-12-16 Central Glass Co Ltd 低反射物品及びその製法
JP2005352121A (ja) * 2004-06-10 2005-12-22 Asahi Kasei Corp 反射防止膜
JP2007063477A (ja) * 2005-09-01 2007-03-15 Asahi Glass Co Ltd 無機塗料組成物、親水性塗膜及び農業用フィルム
JP2007213780A (ja) * 2006-01-11 2007-08-23 Pentax Corp 反射防止膜を有する光学素子
US7767253B2 (en) * 2007-03-09 2010-08-03 Guardian Industries Corp. Method of making a photovoltaic device with antireflective coating
JP5096933B2 (ja) 2008-01-07 2012-12-12 ペンタックスリコーイメージング株式会社 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100653585B1 (ko) 1999-12-14 2006-12-04 닛산 가가쿠 고교 가부시키 가이샤 반사방지 막, 반사방지 막의 제조 방법, 및 반사방지 유리
KR20040035832A (ko) 2001-09-21 2004-04-29 메르크 파텐트 게엠베하 내마모성 ｓｉｏ2 반사방지 층을 제조하기 위한 신규하이브리드 졸
KR20080023888A (ko) 2006-09-12 2008-03-17 코리아 오토글라스 주식회사 반사방지 기능성 코팅유리
KR100870213B1 (ko) 2007-09-21 2008-11-25 (주)켐웰텍 반사방지 광촉매 조성물 및 이를 적용한 유리기재

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2511349A4

Also Published As

Publication number Publication date
JP5686138B2 (ja) 2015-03-18
CN102086093A (zh) 2011-06-08
US20110133138A1 (en) 2011-06-09
EP2511349A4 (fr) 2016-05-11
US9284214B2 (en) 2016-03-15
WO2011071269A3 (fr) 2011-11-17
CN102086093B (zh) 2014-05-14
JP2013512853A (ja) 2013-04-18
EP2511349A2 (fr) 2012-10-17
KR101021659B1 (ko) 2011-03-17

Similar Documents

Publication Publication Date Title
WO2011071269A2 (fr) Procédé de préparation d'une solution de revêtement pour augmenter la transmittance optique d'un verre de module de cellule solaire, et composition de solution de revêtement préparée par le procédé
CN1294219C (zh) 高强有机/无机纳米复合透明膜层材料及制备方法
KR101864458B1 (ko) 저굴절률막 형성용 조성물 및 이것을 사용한 저굴절률막의 형성 방법
JP6360836B2 (ja) シロキサン化合物を含む反射防止コーティング組成物、それを用いて表面エネルギーが調節された反射防止フィルム
US9657178B2 (en) Anti-reflective coating composition comprising siloxane compound, and anti-reflective film using same
WO2013115974A2 (fr) Article recouvert doté d'un revêtement antireflet qui comprend des nanoparticules poreuses et/ou procédé de fabrication de ce dernier
JP4279064B2 (ja) 多孔性シリカ膜、それを有する積層体
WO2010050263A1 (fr) Particule creuse, son procédé de fabrication, composition de revêtement et article
US20140302325A1 (en) Surface-covered inorganic powder
US20170217832A1 (en) Transparent substrate, in particular a glass substrate, coated with at least bifunctional porous layer, manufacturing method and uses thereof
US9194986B2 (en) Optical filters, their production and use
CN109592908A (zh) 一种改性多孔二氧化硅防潮增透涂层的制备方法
WO2014073815A1 (fr) Composition de revêtement antireflet ultra-hydrophile comprenant un composé siloxane, film antireflet ultra-hydrophile l'utilisant et procédé de préparation de film antireflet ultra-hydrophile
WO2013116000A2 (fr) Objet revêtu par un revêtement antireflet incluant des structures fullerène et/ou ses procédés de fabrication
US20140182670A1 (en) Light trapping and antireflective coatings
JP4246589B2 (ja) プラズマディスプレーパネルの製造方法
Lin et al. Preparation of antireflective coatings with moisture resistance and a widely tunable refractive index by combining the sol-gel method with evaporation concentration
Liu et al. Hydrophobic anti-reflective silica hybrid film with tunable refractive index
JP6451424B2 (ja) 高耐久性低屈折率膜
Han et al. Preparation of highly transparent and wear-resistant SiO2 coating by alkali/acid dual catalyzed sol–gel method
JP6123432B2 (ja) 低屈折率膜形成用組成物の製造方法及び低屈折率膜の形成方法
KR20170055134A (ko) 반사방지용 코팅조성물 및 그 제조방법
CN101935456A (zh) 一种高折射率纳米复合有机硅杂化材料及其涂层的制备方法
KR100495566B1 (ko) 플라즈마 디스플레이 패널용 유전체 및 그 제조방법
KR20020038968A (ko) 내구성이 우수한 발수유리의 제조방법

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10836165

Country of ref document: EP

Kind code of ref document: A1

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10836165

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2012543016

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

REEP Request for entry into the european phase

Ref document number: 2010836165

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2010836165

Country of ref document: EP