WO2011053004A3 - 저반사 및 고접촉각을 갖는 기판 및 이의 제조방법 - Google Patents
저반사 및 고접촉각을 갖는 기판 및 이의 제조방법 Download PDFInfo
- Publication number
- WO2011053004A3 WO2011053004A3 PCT/KR2010/007457 KR2010007457W WO2011053004A3 WO 2011053004 A3 WO2011053004 A3 WO 2011053004A3 KR 2010007457 W KR2010007457 W KR 2010007457W WO 2011053004 A3 WO2011053004 A3 WO 2011053004A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- same
- pattern
- substrate
- production method
- contact angle
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
- B82B3/0009—Forming specific nanostructures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/46—Antireflective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0276—Photolithographic processes using an anti-reflective coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010800495930A CN102597815A (zh) | 2009-10-29 | 2010-10-28 | 具有低反射和高接触角的基板及其制备方法 |
JP2012536678A JP2013509610A (ja) | 2009-10-29 | 2010-10-28 | 低反射および高接触角を有する基板およびこの製造方法 |
EP10827088.5A EP2495586A4 (en) | 2009-10-29 | 2010-10-28 | SUBSTRATE WITH LOW REFLECTION AND HIGH CONTACT ANGLES AND MANUFACTURING METHOD THEREFOR |
US13/504,444 US9081134B2 (en) | 2009-10-29 | 2010-10-28 | Substrate having low reflection and high contact angle, and production method for same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0103694 | 2009-10-29 | ||
KR20090103694 | 2009-10-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011053004A2 WO2011053004A2 (ko) | 2011-05-05 |
WO2011053004A3 true WO2011053004A3 (ko) | 2011-11-03 |
Family
ID=43922836
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/007457 WO2011053004A2 (ko) | 2009-10-29 | 2010-10-28 | 저반사 및 고접촉각을 갖는 기판 및 이의 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9081134B2 (ko) |
EP (1) | EP2495586A4 (ko) |
JP (2) | JP2013509610A (ko) |
KR (1) | KR101229673B1 (ko) |
CN (1) | CN102597815A (ko) |
WO (1) | WO2011053004A2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103308960A (zh) * | 2012-03-14 | 2013-09-18 | 鸿富锦精密工业(深圳)有限公司 | 光学膜及其制备方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101306377B1 (ko) | 2011-09-29 | 2013-09-09 | 엘지전자 주식회사 | 상향링크 전송 방법 및 장치 |
TWI536036B (zh) | 2012-03-13 | 2016-06-01 | 鴻海精密工業股份有限公司 | 光學膜的製備方法 |
JP2014052432A (ja) * | 2012-09-05 | 2014-03-20 | Dexerials Corp | 防汚体、表示装置、入力装置および電子機器 |
JP6409497B2 (ja) * | 2014-10-24 | 2018-10-24 | 大日本印刷株式会社 | 撥水撥油性部材 |
EP3514580B1 (en) * | 2016-10-25 | 2023-03-01 | Daikin Industries, Ltd. | Functional film |
US11550184B2 (en) | 2019-08-26 | 2023-01-10 | Lg Chem, Ltd. | Polarizing plate laminate and display device comprising same |
US20210333717A1 (en) * | 2020-04-23 | 2021-10-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet mask and method of manufacturing the same |
KR102524138B1 (ko) * | 2021-02-17 | 2023-04-20 | (주)마이크로이미지 | 성장성 이물 및 헤이즈 발생이 억제된 펠리클이 부착된 포토마스크 |
Citations (4)
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JPH10152797A (ja) * | 1996-11-21 | 1998-06-09 | Matsushita Electric Ind Co Ltd | 微細パターンの製造方法及びそれを用いたカラーフィルタ並びに遮光パターンフィルタ |
JPH10273617A (ja) * | 1997-03-31 | 1998-10-13 | Toray Ind Inc | 撥水性コーティング膜 |
KR19990003633A (ko) * | 1997-06-26 | 1999-01-15 | 안기훈 | 내구성 발수유리와 그 제조방법 |
KR20030011885A (ko) * | 2000-06-12 | 2003-02-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 발수성 및 발유성 조성물 |
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US5742118A (en) * | 1988-09-09 | 1998-04-21 | Hitachi, Ltd. | Ultrafine particle film, process for producing the same, transparent plate and image display plate |
US5916735A (en) | 1996-11-21 | 1999-06-29 | Matsushita Electric Industrial Co., Ltd. | Method for manufacturing fine pattern |
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JP2003172808A (ja) * | 2001-12-06 | 2003-06-20 | Hitachi Maxell Ltd | 超撥水性プラスチック基板及び反射防止膜 |
JP2004219626A (ja) * | 2003-01-14 | 2004-08-05 | Sanyo Electric Co Ltd | 光学素子 |
KR101643112B1 (ko) * | 2003-02-26 | 2016-07-26 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
JP2004363049A (ja) * | 2003-06-06 | 2004-12-24 | Seiko Epson Corp | 有機エレクトロルミネッセンス表示装置の製造方法及び、有機エレクトロルミネッセンス表示装置並びに、有機エレクトロルミネッセンス表示装置を備える表示装置 |
JP4270968B2 (ja) | 2003-07-10 | 2009-06-03 | オリンパス株式会社 | 反射防止面付光学素子を持つ光学系を備えた光学機器 |
US20070253051A1 (en) * | 2003-09-29 | 2007-11-01 | Kunihiko Ishihara | Optical Device |
JP2006038928A (ja) * | 2004-07-22 | 2006-02-09 | National Institute Of Advanced Industrial & Technology | 無反射周期構造体及びその製造方法 |
JP2006098489A (ja) | 2004-09-28 | 2006-04-13 | Sanyo Electric Co Ltd | 微細パターンを有する光学素子の製造方法 |
JP2006178147A (ja) | 2004-12-22 | 2006-07-06 | Pentax Corp | 高精度で、耐久性及び耐湿性に優れたサブ波長構造光学素子 |
EP3079164A1 (en) * | 2005-01-31 | 2016-10-12 | Nikon Corporation | Exposure apparatus and method for producing device |
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JP2007187868A (ja) * | 2006-01-13 | 2007-07-26 | Nissan Motor Co Ltd | 濡れ制御性反射防止光学構造体及び自動車用ウインドウガラス |
US9134461B2 (en) * | 2006-03-27 | 2015-09-15 | Essilor International (Compagnie Generale D'optique) | Edging process of lens using transparent coating layer for protecting lens |
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KR100790899B1 (ko) * | 2006-12-01 | 2008-01-03 | 삼성전자주식회사 | 얼라인 마크가 형성된 템플릿 및 그 제조 방법 |
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JP2008203473A (ja) | 2007-02-20 | 2008-09-04 | Nissan Motor Co Ltd | 反射防止構造及び構造体 |
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-
2010
- 2010-10-28 CN CN2010800495930A patent/CN102597815A/zh active Pending
- 2010-10-28 US US13/504,444 patent/US9081134B2/en active Active
- 2010-10-28 WO PCT/KR2010/007457 patent/WO2011053004A2/ko active Application Filing
- 2010-10-28 KR KR1020100106214A patent/KR101229673B1/ko active IP Right Grant
- 2010-10-28 JP JP2012536678A patent/JP2013509610A/ja active Pending
- 2010-10-28 EP EP10827088.5A patent/EP2495586A4/en not_active Withdrawn
-
2014
- 2014-10-24 JP JP2014217564A patent/JP2015038630A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10152797A (ja) * | 1996-11-21 | 1998-06-09 | Matsushita Electric Ind Co Ltd | 微細パターンの製造方法及びそれを用いたカラーフィルタ並びに遮光パターンフィルタ |
JPH10273617A (ja) * | 1997-03-31 | 1998-10-13 | Toray Ind Inc | 撥水性コーティング膜 |
KR19990003633A (ko) * | 1997-06-26 | 1999-01-15 | 안기훈 | 내구성 발수유리와 그 제조방법 |
KR20030011885A (ko) * | 2000-06-12 | 2003-02-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 발수성 및 발유성 조성물 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103308960A (zh) * | 2012-03-14 | 2013-09-18 | 鸿富锦精密工业(深圳)有限公司 | 光学膜及其制备方法 |
CN103308960B (zh) * | 2012-03-14 | 2016-09-14 | 鸿富锦精密工业(深圳)有限公司 | 光学膜及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2495586A2 (en) | 2012-09-05 |
JP2013509610A (ja) | 2013-03-14 |
EP2495586A4 (en) | 2013-06-12 |
KR20110047154A (ko) | 2011-05-06 |
KR101229673B1 (ko) | 2013-02-04 |
US9081134B2 (en) | 2015-07-14 |
US20120212816A1 (en) | 2012-08-23 |
WO2011053004A2 (ko) | 2011-05-05 |
JP2015038630A (ja) | 2015-02-26 |
CN102597815A (zh) | 2012-07-18 |
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