WO2011007442A1 - 2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 - Google Patents
2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 Download PDFInfo
- Publication number
- WO2011007442A1 WO2011007442A1 PCT/JP2009/062925 JP2009062925W WO2011007442A1 WO 2011007442 A1 WO2011007442 A1 WO 2011007442A1 JP 2009062925 W JP2009062925 W JP 2009062925W WO 2011007442 A1 WO2011007442 A1 WO 2011007442A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metal
- paste
- composite
- temperature
- filler particles
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/33—Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L24/36—Structure, shape, material or disposition of the strap connectors prior to the connecting process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L24/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L24/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/84—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a strap connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
- H01L2224/29111—Tin [Sn] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29139—Silver [Ag] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29339—Silver [Ag] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L2224/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
- H01L2224/4005—Shape
- H01L2224/4009—Loop shape
- H01L2224/40095—Kinked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L2224/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
- H01L2224/401—Disposition
- H01L2224/40151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/40221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/40245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/40247—Connecting the strap to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8384—Sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/84—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a strap connector
- H01L2224/848—Bonding techniques
- H01L2224/8485—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01023—Vanadium [V]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01044—Ruthenium [Ru]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01045—Rhodium [Rh]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01049—Indium [In]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01076—Osmium [Os]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01077—Iridium [Ir]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0133—Ternary Alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12896—Ag-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2996—Glass particles or spheres
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2998—Coated including synthetic resin or polymer
Definitions
- the present invention relates to a composite nanometal paste containing composite metal nanoparticles in which an organic coating layer is formed around a metal core, and in particular, the organic coating layer is diffused by heating to a predetermined temperature.
- the present invention relates to a composite nanometal paste for metallizing the composite nanometal paste, a bonding method, and an electronic component.
- semiconductors, electronic circuits, electronic devices, and the like ensure electrical conductivity by melting and fixing various electronic components to a substrate with solder.
- the conventional solder is an alloy of Sn and Pb, and the use of Pb is being banned as a recent environmental preservation measure. Therefore, a Pb-free alternative solder replacing the conventional solder is being developed.
- the eutectic solder of Sn and Pb has a melting point of 183 ° C., and the melting point of a typical Sn-based lead-free solder that is an alternative to the conventional solder is 219 ° C.
- the melting point of the conventional alternative solder is too high, which may damage the resin substrate, and a solder for low temperature has been demanded.
- solder does not contain Pb and has a low metallization temperature, but it also requires high safety, low corrosivity, and high electrical and thermal conductivity.
- Composite metal nanoparticles such as Cu, Ni, and Ag are being developed as materials that meet this expectation.
- Patent Document 1 proposes a nanometal paste having an average particle size of primary particles of silver nanoparticles of 200 nm or less and a sheet-like structure having a primary particle shape of the silver nanoparticles as a metal component. Yes.
- the present inventors made the above nanometal paste using commercially available silver nanoparticles having an average particle diameter of 200 nm.
- a diode chip was joined to the lead frame with the paste to form a diode assembly, and then sintered to change the paste layer to a metal layer, thereby producing a resin mold.
- a VF test (electrical conductivity test) and a ⁇ VF test (thermal conductivity test) of the resin mold body were performed.
- a similar resin mold body was prepared using a lead-containing solder, and a VF test and a ⁇ VF test were performed.
- the resin mold body joined with the composite nanosilver paste is deteriorated in the VF test (electric conductivity test) and the ⁇ VF test (thermal conductivity test) as compared with the resin mold body using the lead-rich solder.
- VF test electric conductivity test
- ⁇ VF test thermal conductivity test
- the silver nanoparticle paste of Patent Document 1 has lower performance in electrical and thermal data than lead-rich solder.
- electronic parts used at high temperatures are required to have higher electrical conductivity and higher thermal conductivity, and it has become clear that conventional nanometal pastes cannot be achieved at all.
- the silver nanoparticles In order to develop higher electrical conductivity and thermal conductivity than conventional lead-rich solders, it is necessary to improve silver nanoparticles.
- the silver nanoparticles In order to be said to be nanoparticles, the silver nanoparticles must have a particle size of 100 nm or less.
- the silver nanoparticles have an average particle size of 200 nm, which is too large for a metal component.
- the silver nanoparticles easily aggregate with each other, in the nanometal paste, the silver nanoparticles aggregate with each other to form large dumped silver particles. It is presumed that there are considerable gaps in the layer, and the electrical and thermal conductivity is reduced.
- it In order to prevent aggregation, it must be a silver nanoparticle that can be monodispersed in an organic solvent.
- Patent Documents 2 to 8 shown below are known as patent documents relating to composite metal nanoparticles, and the present invention has been completed by eliminating the disadvantages of these known documents. It was.
- Patent Document 2 Japanese Patent No. 3205793 (Japanese Patent Laid-Open No. 10-183207) was published as Patent Document 2.
- Silver organic compounds (especially silver organic complexes) were selected as starting materials. In an inert gas atmosphere in which air is shut off, the silver organic compound is heated at a temperature not lower than the decomposition start temperature and lower than the complete decomposition temperature, and the organic substance derived from the silver organic compound is placed around the decomposed and reduced silver core.
- Composite silver nanoparticles were produced as a coating layer. This process is a solid-gas reaction.
- the particle size of silver nuclei is 1 to 100 nm, and is therefore commonly referred to as composite silver nanoparticles. Specifically, when 100 g of solid silver stearate is heated at 250 ° C. for 4 hours in a flask under a nitrogen stream, composite silver nanoparticles having an organic coating layer of stearic acid groups around a silver core having a particle size of 5 nm are obtained. Generated.
- the generation temperature is as high as 250 ° C.
- the metallization temperature of the composite silver nanoparticles is as extremely high as 220 ° C.
- Silver nanoparticles having a high production temperature also have a high silveration temperature. Considering that the melting point of Sn—Pb eutectic solder is 183 ° C. and the metallization temperature of the desired composite silver nanoparticles is 200 ° C.
- the metallization temperature (silverization temperature) is high at 220 ° C. Therefore, it has been difficult to use as an alternative solder for low temperature. It is considered that the metallization temperature is high because of the large particles in a dumpling state and the decomposition temperature of the stearic acid group is high. Moreover, the inventor has confirmed that the silver nucleus is not a single crystal but a simple atomic group or a polycrystal. When silver nuclei are polycrystalline or disordered, electron scattering and heat scattering occur at many grain interfaces, resulting in a decrease in electrical conductivity and thermal conductivity.
- Patent Document 3 is an invention in which one of the inventors participated as an inventor. A metal organic compound was dissolved and dispersed in an organic solvent or water to successfully produce composite silver nanoparticles coated with the organic material derived from the metal organic compound. This process is a solid-liquid reaction. Moreover, when this composite silver nanoparticle was observed with a high-resolution transmission electron microscope, a lattice image was confirmed in the silver nucleus, and it was confirmed to be a single crystal silver nucleus.
- the metal organic compound is dissolved and dispersed as a molecule in a solvent, the molecule is reduced to precipitate silver atoms, and single crystals are formed by recombination of silver atoms. That is, the single crystallinity is considered to be caused by intermolecular reaction.
- silver nuclei are single crystals, there is an advantage of high electrical conductivity and thermal conductivity.
- the silvering temperature it is written in [0076] that the composite silver nanoparticles coated with stearic acid groups were heated at 250 ° C. for 10 minutes. That is, the weak point of Patent Document 2 is that the silvering temperature is as high as 250 ° C.
- the reason for the high silveration temperature is that the decomposition temperature of the organic acid group constituting the coating layer is high because it starts from a silver organic compound such as silver acetate, silver hexanoate, or silver octoate. Further ingenuity is required to reduce the metallization temperature to 200 ° C or lower.
- Patent Document 4 One of the inventors is one of the inventors of this international publication. In this publication, a plurality of inventions are disclosed. Among them, a method for treating a metal inorganic compound with a surfactant was first disclosed, and the way of starting with a metal inorganic compound was opened. That is, a first step of colloiding a metal inorganic compound with a surfactant in a non-aqueous solvent to form an ultrafine particle precursor, and a reducing agent is added to the colloidal solution to reduce the ultrafine particle precursor. And a second step of generating composite metal nanoparticles in which a surfactant shell is formed as a coating layer on the outer periphery of the metal core.
- the above-described method has a feature that since the metal inorganic compound is dissolved in a non-aqueous solvent, the produced composite metal nanoparticles are dispersed in the non-aqueous solvent and are not likely to be in a dumpling state.
- examples are copper oleate, silver abietate, silver acetate, nickel oleate, diethylhexaneindium, copper acetate, silver stearate, and only organometallic compounds are implemented.
- the metallization temperature of the composite silver nanoparticles produced from silver stearate was found to be as high as 220 ° C. Further ingenuity is required to reduce the metallization temperature to 200 ° C or lower.
- Patent Document 5 discloses composite metal nanoparticles in which a coating layer made of an organic compound containing an alcoholic hydroxyl group having 4 or more carbon atoms is formed around a metal core having a particle diameter of 1 to 100 nm obtained from a metal salt. ing. Moreover, higher alcohols having 6 or more carbon atoms are described as organic compounds containing an adsorbing functional group.
- Patent Document 6 discloses a composite metal nanoparticle having a central portion composed of a metal nucleus and an organic coating layer having a thermal desorption start temperature of 140 ° C. or higher and lower than 190 ° C. around the core.
- a manufacturing method it is described that a composite metal nanoparticle having an inorganic metal salt and an organic substance coexisting, an inorganic metal salt is decomposed to form a metal nucleus, and an organic coating layer is formed around the metal core is described. Yes.
- composite metal nanoparticles in which an organic coating layer is formed around an inorganic metal salt or a decomposed inorganic metal compound are also disclosed.
- Patent Document 7 Japanese Patent Application Laid-Open No. 2007-95510 is disclosed as Patent Document 7.
- Claim 1 of Patent Document 7 includes a metal core composed of a metal component derived from a metal salt represented by a chemical formula of (RA) n -M, and an organic coating layer derived from the metal salt.
- a conductive paste made of composite metal nanoparticles and an organic solvent is disclosed.
- R is a hydrocarbon group having 4 to 9 carbon atoms
- A is COO, OSO 3 , SO 3 or OPO 3
- M is a silver, gold or platinum group.
- composite silver nanoparticles are included.
- Patent Document 8 Japanese Patent Application Laid-Open No. 2004-107728 is disclosed as Patent Document 8.
- Claim 1 of Patent Document 8 describes composite metal nanoparticles having an organic coating layer mainly composed of C, H and / or O around a metal core having an average particle size of 100 nm or less. Is produced from an organic acid metal salt.
- JP 2007-297671 A Japanese Patent No. 3205793 (Japanese Patent Laid-Open No. 10-183207) JP 2003-342605 A WO00 / 076699 WO01 / 070435 WO2005 / 075132 JP 2007-95510 A JP 2004-107728 A
- Patent Document 1 does not disclose any conditions for forming a dense metal film having high electrical conductivity and high thermal conductivity when the nanometal paste layer is sintered. Therefore, the present inventors made a nano metal paste according to the usual paste preparation procedure. That is, a paste obtained by kneading silver nanoparticles having an average particle diameter of 200 nm described in Patent Document 1 with a viscosity-imparting agent and a solvent. As described above, this paste has lower electrical conductivity and thermal conductivity than the conventional lead-rich solder. As a result of considering the reason, the following can be considered.
- the present inventors In order to fill the gap, the present inventors contain two kinds of large and small metal component particles, and when the large particles and small particles have specific particle size conditions, they exhibit extremely dense sintering characteristics. It was. Furthermore, the inventors have discovered that the compounding ratio of the large particles and the small particles has a higher density when the mixing ratio is within a specific range, thereby completing the present invention. It was confirmed that a dense metal film having high electrical conductivity and high thermal conductivity could be realized by using the nanometal paste having such composite metal nanoparticles, and the present invention was completed. Moreover, composite metal nanoparticles that can be metallized at a low temperature of 200 ° C.
- Patent Document 5 describes that in the case of composite silver nanoparticles having a particle size of 5 to 10 nm, if the decomposition temperature of the organic compound is 80 ° C. or lower, the silver film forming temperature is 80 ° C., and the decomposition temperature is 80 ° C. It is described that a silver film can be formed by heating to the decomposition temperature if it is at or above.
- the above description is merely a wishful observation, and no such example is described in the embodiment. The following is a concrete description.
- Example 1 when copper formate and 1-decanol are reacted, the solution is discolored from around 185 ° C. to form composite copper nanoparticles, and the sintering temperature is 200 to 350 ° C., and 250 to 300 ° C. Preferred is described.
- Example 2 describes that composite silver nanoparticles were formed from solution of silver carbonate and myristic acid (C number of 14) at 230 ° C by solution discoloration. In air sintering, a silver coating film was formed at 250 ° C. Yes.
- Example 3 formation of composite silver nanoparticles was confirmed from silver carbonate and stearyl alcohol (C number is 18) by solution discoloration by heating at 150 ° C. for 1 hour, but the silvering temperature in a nitrogen atmosphere was confirmed.
- Example 4 formation of composite silver nanoparticles was confirmed from silver carbonate and phenol (C number is 6) by solution discoloration by heating at 180 ° C. for 1 hour, and the silvering temperature is described as 300 ° C.
- Example 5 generation of composite silver nanoparticles was confirmed from copper acetate and lauryl alcohol (C number: 12) by solution discoloration by heating at 100 ° C. for 1 hour, but silveration was performed in an atmosphere of hydrogenated nitrogen. The temperature was 250 ° C.
- Example 6 formation of composite platinum nanoparticles was confirmed by solution discoloration from platinum chloride and ethylene glycol (C number is 2) by heating at 180 ° C. for 1 hour, but the heat treatment temperature was 300 ° C. there were.
- Example 7 formation of composite copper nanoparticles was confirmed by solution discoloration at 110 ° C. from copper acetate and lauryl alcohol (C number: 12), but the copperization temperature in a nitrogen atmosphere was 300 ° C. there were.
- Example 8 formation of composite copper nanoparticles was confirmed by solution discoloration at 150 ° C. from copper acetate, ethanol (C number is 2) and nonionic surfactant (sorbitan tristearate). However, the copperization temperature in a nitrogen atmosphere was 300 ° C.
- any of the composite silver nanoparticles has a metallization temperature much higher than 200 ° C., and no composite metal nanoparticles that achieve the desired metallization temperature of 200 ° C. or less have been generated.
- the composite silver nanoparticles that can be used in the present invention must be composite silver nanoparticles capable of realizing metallization at 200 ° C. or less, more preferably metallization at 150 ° C. or less.
- Only a composite silver nanoparticle having an alcohol-derived organic coating layer developed by some of the present inventors has realized this. That is, it is a composite silver nanoparticle having an organic coating layer composed of one or more alcohol molecule derivatives, alcohol molecule residues, or alcohol molecules having 1 to 12 carbon atoms.
- the conventional literature does not describe or even suggest such composite silver nanoparticles.
- Patent Document 6 describes that it cannot be understood. It is described that when an inorganic metal salt and an organic substance are allowed to coexist, an organic coating layer is formed around the central core containing the inorganic metal salt or the decomposed inorganic metal compound.
- page 6 shows that when a mixture of silver carbonate (inorganic metal salt) and myristyl alcohol (organic substance, C number is 14) is reacted at 120 ° C. for 2 hours, the organic substance is physically adsorbed on silver or silver carbonate. It is described that nanoparticles are produced. It is clear from the following reaction formula that when an organic substance adheres around silver carbonate, the thermal decomposition temperature at which silver is precipitated from silver carbonate exceeds 400 ° C.
- myristyl alcohol has a C number of 14 and a large molecular weight, increases the weight of the organic coating layer with respect to the silver core, increases the sintering temperature, and at the same time increases the amount of exhaust gas during sintering, resulting in a large amount during bonding. Voids are generated, and the eligibility as a bonding paste is reduced.
- the composite metal nanoparticles of Patent Document 7 are different from the present invention in that a metal nucleus and an organic coating layer are formed as a decomposition product obtained by decomposing a metal salt, and start from an organic metal compound.
- a silver nucleus is formed from silver carbonate and an organic coating layer is formed from alcohol, and the manufacturing method is completely different.
- the organic coating layer is a bonding group of a hydrocarbon group and COO, OSO 3 , SO 3, or OPO 3 , has a complicated structure, and has a high decomposition temperature.
- SO X which is an air pollution component, is generated by sintering and does not meet environmental standards.
- the organic coating layer is an organic acid group, and the aeration temperature is considerably high.
- the melting point is 210 ° C.
- [0068] describes that sintering is performed in a temperature range of 210 to 250 ° C. Therefore, the metallization of 200 ° C. or lower, preferably 150 ° C. or lower, which is the object of the present invention, cannot be realized by Patent Document 8. Moreover, it is impossible to judge whether the bonding strength, electrical conductivity, and thermal conductivity are good or bad.
- the present invention has been made in view of the above problems.
- the metal component of the nanometal paste is divided into two types of metal components having a large and small average particle size, That is, it consists of small particles and large particles, and when the small particle size has a specific relationship with the large particle size in the average particle size, the gaps between the large particles can be closely packed with small particles, and there are few gaps after sintering A dense metal layer is formed, and as a result, high electrical conductivity and thermal conductivity are achieved.
- a composite metal nanoparticle having an average particle diameter d (nm) which is a small particle and a metal filler particle having an average particle diameter D (nm) which is a large particle are contained as metal components, and d
- d A first relationship of ⁇ D and a second relationship of d ⁇ 100 (nm), and when the organic coating layer is diffused by sintering to form a metal layer, the average particle diameters d and D
- the size relationship indicates that the composite metal nanoparticles can be embedded in a hollow four pocket formed when it is assumed that four metal filler particles are arranged in contact with a regular tetrahedron.
- the present invention has been completed by discovering that the composite metal nanoparticles and the metal filler particles are densely sintered.
- the four pocket condition is satisfied when the size relationship between the average particle diameters d and D is 0 ⁇ d ⁇ ( ⁇ 3 / ⁇ 2-1) D.
- the present inventors are the first.
- a dense metal layer can be formed when the mixing ratio of the small particles and large particles is in a specific range, and higher electrical conductivity and thermal conductivity can be realized than conventional lead-rich solder.
- the compounding weight w (wt%) of the composite metal nanoparticles and the compounding weight W (wt%) of the metal filler particles are used as the lower limit conditions, k in the range of 0 ⁇ k ⁇ 1 is used.
- the lower limit value of w / (w + W) is set to k times the volume ratio of the four pockets to the volume of the tetrahedron formed by the centers of the four metal filler particles arranged in contact with each other.
- Precious metals such as Au, Pt, Ag, Pd, Rh, Ru, Os, Ir, and base metals such as Cu and Ni can be used as the metal.
- Ag (silver) the composite metal nanoparticles are stable at a low price. It became clear that can be provided.
- the alcohol-derived organic coating layer is composed of one or more of alcohol molecule derivatives, alcohol molecule residues or alcohol molecules, only H 2 O and CO 2 are produced even when sintered, Fits. Moreover, since it is metalized at 200 ° C. or lower, it can be used as an alternative solder for the Pb—Sn eutectic solder.
- composite silver nanoparticles capable of low-temperature sintering can be used.
- the generation temperature PT (° C.) of such composite silver nanoparticles can be lower than the metallization temperature T3, a composite nano metal paste using composite silver nanoparticles satisfying PT ⁇ T3 ⁇ 200 ° C. can be provided.
- This composite nanometal paste was used to establish a method for joining electronic components.
- the alcohol-derived substance is specifically an alcohol derivative, an alcohol residue, or an alcohol molecule, and only H 2 O and CO 2 are generated by sintering. It can be effectively applied to the joining of electronic parts such as semiconductors.
- Alcohol derivatives include carboxylic acids and carboxylic acid groups, as well as alkoxides and alkoxide groups, and include all compounds derived from alcohols by chemical reactions.
- the first embodiment of the present invention is a composite metal nanoparticle having an organic coating layer formed around a metal core having an average particle diameter d (nm), It contains two components of metal filler particles having an average particle diameter D (nm) as a metal component, has a first relationship of d ⁇ D and a second relationship of d ⁇ 100 (nm), and the organic coating layer is formed by sintering.
- the metal layer is formed by being diffused, the magnitude relationship between the average particle diameters d and D is formed on the assumption that the four metal filler particles are arranged in contact with the regular tetrahedron.
- Two kinds of metal component type composite nano-particles which are set so that the composite metal nanoparticles can be embedded in a hollow four pocket, and the composite metal nanoparticles and the metal filler particles are densely sintered. It is a metal paste.
- the second embodiment of the present invention is a two-metal component type composite nanometal paste in which the magnitude relationship between the average particle diameters d and D is 0 ⁇ d ⁇ ( ⁇ 3 / ⁇ 2-1) D.
- the third embodiment of the present invention uses k in the range of 0 ⁇ k ⁇ 1 when the blending weight w (wt%) of the composite metal nanoparticles and the blending weight W (wt%) of the metal filler particles are used.
- the lower limit value of w / (w + W) is set to two times the volume ratio of the four pockets to the volume of the regular tetrahedron formed by the centers of the four metal filler particles arranged in contact with each other. It is a metal component type composite nano metal paste.
- a two-component metal composite nanostructure in which the lower limit of w / (w + W) is set to a value of k ⁇ 1-3 ⁇ 2cos ⁇ 1 (1/3) + ⁇ 2 ⁇ . It is a metal paste.
- the fifth embodiment of the present invention is a two-metal component type composite nanometal paste in which the value of k is selected from the range of 0.45 ⁇ k ⁇ 1.
- the compounding weight w ( wt%) and the upper limit value of w / (w + W) as the blending weight W (wt%) of the metal filler particles is such that other metal filler particles enter the four pockets from the outside of the enlarged tetrahedron. It is a two-metal component type composite nanometal paste that is determined from the conditions that cannot be applied.
- the average particle diameter of the metal filler particles is R
- the separation distance between the metal filler particles is 2 ⁇
- ⁇ / R x
- the values of x are 0 ⁇ x
- the upper limit value of w / (w + W) is set to a value of 1-3 ⁇ 2 ⁇ cos ⁇ 1 (1/3) ⁇ / 3 ⁇ / (1 + x) 3 It is a component type composite nano metal paste.
- the value of w / (w + W) is 0.10. It is a two-metal component type composite nanometal paste adjusted to a range of ⁇ 0.90.
- the ninth aspect of the present invention is a two-metal component type composite nanometal paste to which a solvent and / or a viscosity imparting agent is added.
- Type composite nanometal paste
- the paste metallization temperature Tp3 (VT) Is a two-metal component type composite nanometal paste satisfying Tp3 (VT) ⁇ Tp3 (1 ° C./min)+100.
- the paste decomposition start temperature Tp1 (VT) and a paste decomposition temperature Tp2 (VT) satisfying Tp2 (VT) -100 ⁇ Tp1 (VT) ⁇ Tp2 (VT).
- the paste decomposition start temperature Tp1 (VT) And paste decomposition temperature Tp2 (VT) and paste metallization temperature Tp3 (VT) increase as the temperature increase rate VT increases while satisfying the relationship of Tp1 (VT) ⁇ Tp2 (VT) ⁇ Tp3 (VT). It is a seed metal component type composite nano metal paste.
- a two-metal component type composite nanometal paste according to any one of the first to fourteenth aspects is prepared, and a paste layer is formed between the lower body and the upper body by the composite nanometal paste,
- the paste layer is sintered into a metal layer by heating to join the lower body and the upper body.
- the electrical resistance at the time of current application and the heat conduction to the lower body at the time of heat generation of the upper body are reduced as compared with the case where the joining is performed with a conventional lead-containing solder.
- the seventeenth aspect of the present invention is an electronic component manufactured by the bonding method according to the fifteenth or sixteenth aspect.
- the metal component of the nanometal paste is composed of two types of metal components having an average particle size of large and small, that is, large particles and small particles, and the gaps between the large particles are filled with small particles.
- the composite metal nanoparticles (metal core average particle size: d (nm)) which are small particles and metal filler particles (metal average particle size: D (nm)) which are large particles.
- d (nm) metal core average particle size
- D (nm) metal filler particles
- the diameter condition the first relationship of d ⁇ D and the second relationship of d ⁇ 100 (nm) are satisfied.
- the average particle diameters d and D have a size relationship that four metal filler particles are tetrahedral. It is set so that the composite metal nanoparticles can be embedded in a hollow four pocket formed when it is assumed to be placed in contact with the body.
- a two-metal component type composite nanometal paste in which the composite metal nanoparticles and the metal filler particles are densely sintered is provided. Since the composite metal nanoparticles with an average particle size of 100 nm or less are distributed around the average particle size, there are many small-sized particles (fine particles) smaller than the average particle size. Can be densely filled with composite metal nanoparticles, and when sintered, a dense metal layer with few gaps can be realized. This metal layer becomes a bonding metal layer for electronic components and semiconductors, and can exhibit good electrical and mechanical characteristics. Since the small particles are composed of composite metal nanoparticles, they move in a monodispersed manner in the paste and are arranged so as to fill the gaps, and a dense metal layer can be formed by sintering.
- the second embodiment of the present invention it is possible to provide a two-metal component type composite nanometal paste in which the magnitude relationship between the average particle diameters d and D is 0 ⁇ d ⁇ ( ⁇ 3 / ⁇ 2-1) D. .
- the diameter of the inscribed sphere to the four pockets is mathematically ( ⁇ 3 / ⁇ 2-1) D Proven to be. Therefore, if the metal core average particle diameter d of the composite metal nanoparticles is smaller than the inscribed sphere diameter, the composite metal nanoparticles are embedded in the four pockets, and the binder action that bonds the four metal filler particles to each other.
- the fine particles can densely fill the four pockets, thereby achieving a dense metal layer, and having good electrical characteristics and Thermal characteristics can be expressed.
- k is in the range of 0 ⁇ k ⁇ 1 when the blending weight w (wt%) of the composite metal nanoparticles and the blending weight W (wt%) of the metal filler particles are used.
- the lower limit value of w / (w + W) is set to k times the volume ratio of the four pockets to the volume of the tetrahedron formed by the centers of the four metal filler particles arranged in contact with each other.
- a two-metal component type composite nanometal paste is provided.
- a lower limit value of the weight ratio of the composite metal nanoparticles to the total metal components is provided.
- the total metal component weight is given by the sum (W + w) of the metal filler particle weight W and the composite metal nanoparticle weight w, and the ratio w / (w + W) of the composite metal nanoparticle weight w to the total weight (W + w) is a regular tetrahedron. It means that the volume ratio of the four pocket volume to the body volume is adjusted to k times.
- the tetrahedral volume corresponds to the total metal component weight (w + W), and the four pocket volume corresponds to the weight w of the composite metal nanoparticles filled in the four pocket.
- the composite metal nanoparticles need to be interposed between the metal filler particles. In this case, even if the four pockets are somewhat vacant, the metal filler particles are securely bonded using the composite metal nanoparticles as a binder, so high electrical conductivity And high thermal conductivity.
- intervening bonding between metal filler particles is more important than complete filling, and the best high electrical conductivity and high thermal conductivity may be realized by adjusting in the range of 0 ⁇ k ⁇ 1. Therefore, while appropriately determining the value of k, the filling amount of the composite metal nanoparticles is adjusted, and a high degree of electrical conductivity and thermal conductivity are experimentally determined.
- the two-metal component type in which the lower limit value of w / (w + W) is set to a value of k ⁇ 1-3 ⁇ 2cos ⁇ 1 (1/3) + ⁇ 2 ⁇ .
- a composite nanometal paste is provided.
- the range of k ⁇ 1-3 ⁇ 2 cos ⁇ 1 (1/3) + ⁇ 2 ⁇ is distributed in the range of 0 to 0.22036, and an appropriate ratio is determined from this range.
- the lower limit of w / (w + W) is appropriately selected for each paste from the range of 0 to 0.22036, and achieves the desired high level of electrical and thermal conductivity depending on the object to be joined. To do. The idea of mathematically deriving the filling rate and using it in the joining technique was first achieved by the present invention.
- a two-metal component type composite nanometal paste in which the value of k is selected from the range of 0.45 ⁇ k ⁇ 1.
- the range of k shown by 0.45 ⁇ k ⁇ 1 means that 45% to 100% filling of the four pockets realizes high electrical conductivity and high thermal conductivity.
- the compounded weight of the composite metal nanoparticles when the four metal filler particles are spaced apart from each other to form an enlarged tetrahedron at the center of the four metal filler particles, the compounded weight of the composite metal nanoparticles
- the upper limit value of w / (w + W), where w (wt%) and the blending weight W (wt%) of the metal filler particles is within the four pockets from the outside of the enlarged tetrahedron.
- a two-metal-component composite nanometal paste determined from conditions that cannot be applied is provided.
- an upper limit value of w / (w + W) needs to be defined as a condition for performing good bonding.
- the upper limit of w / (w + W) is the limit at which the center gap of the regular triangle of the enlarged regular tetrahedron forms an opening having a diameter D. This restriction allows the expanded tetrahedral four pockets to be filled with composite metal nanoparticles alone.
- the average particle diameter of the metal filler particles is R
- the separation distance between the metal filler particles is 2 ⁇
- the upper limit value of w / (w + W) is set to a value of 1-3 ⁇ 2 ⁇ cos ⁇ 1 (1/3) ⁇ / 3 ⁇ / (1 + x) 3
- a seed metal component-type composite nanometal paste is provided.
- the present inventors are the first to establish the joining technique by mathematically deriving the filling rate of the composite metal nanoparticles in the actual metal layer.
- the value of w / (w + W) is 0.
- a two-metal component type composite nanometal paste adjusted to a range of .10 to 0.90 is provided. It has been experimentally clarified by the present inventors that the metal layer has high electrical conductivity and high thermal conductivity when the blending ratio w / (w + W) is in the range of 0.10 to 0.90.
- a two-metal component type composite nanometal paste to which a solvent and / or a viscosity imparting agent is added.
- the solvent is a material in which the two kinds of metal component particles used in the present invention are dispersed to form a solution.
- the viscosity-imparting agent is a material that imparts a viscosity that is easily applied by adding to the solution. Alcohol that is solid at room temperature of C14 or higher can be used.
- terpene derivatives include 1,8-terpine monoacetate and 1,8-terpine diacetate.
- IBCH is rosin-like, glycerin is syrup-like, and alcohols of C14 or higher have a solid-liquid change property, and are non-flowing at 10 ° C. or less. If the two metal component particles of the present invention are mixed and dispersed in the non-flowable viscosity imparting agent to form a non-flowable paste, the composite silver nanoparticles are fixed in a dispersed state at a low temperature of 10 ° C. or lower. Aggregation of seed metal component particles does not occur.
- the non-flowable paste If the non-flowable paste is heated immediately before use, it can be fluidized and applied as a paste, and the function as a paste can be exhibited. Needless to say, if the solvent is added to the non-flowable paste immediately before use, the paste becomes a flowable paste without heating, and can function as a paste.
- the evaporation temperature or decomposition temperature of the solvent and / or the viscosity-imparting agent is set as low as possible. Therefore, the sintering temperature of the paste is not determined only by the metallization temperature of the composite silver nanoparticles, but also depends on the evaporation temperature and decomposition temperature of the solvent and / or viscosity imparting agent.
- the paste which added only the solvent, the paste which added only the viscosity imparting agent, and the paste which added both the solvent and the viscosity imparting agent can be utilized as a usage form.
- the paste nanometal paste temperature Tp3 (° C.) is 300 ° C. or less.
- a metal paste can be provided.
- DTA differential thermal analysis
- the organic coating layer of the composite metal nanoparticles is oxidized to generate reaction heat, and a large DTA peak is formed.
- this DTA peak is composed of a single peak, the temperature at which this single peak ends is the paste metallization temperature Tp3 (° C.).
- the temperature at which the final peak ends is the paste metallization temperature Tp3 (° C.).
- the final peak is a steep peak, there is almost no difference between the steep peak temperature and its end temperature, and either may be used, but here it is defined as the final peak temperature.
- the decrease end temperature of the TG curve corresponds to the paste metallization temperature Tp3 (° C.).
- the paste metalization temperature Tp3 is within 300 ° C., the composite nanometal paste can be sintered at a low temperature.
- the temperature increase rate VT at the time of DTA measurement increases, the temperature Tp3 also increases.
- the composite nanometal paste of the present invention contains composite metal nanoparticles having a metallization temperature T3 of T3 ⁇ 200 ° C. measured at 1 ° C./min. As a result, the paste metal at 1 ° C./min as a whole is obtained. It has become possible to set the temperature Tp3 (° C.) to 300 ° C. or lower. Since the paste metallization temperature Tp3 is 1 ° C./min and 300 ° C. or less, the cost of the manufacturing apparatus and manufacturing equipment can be greatly reduced.
- the composite nano silver paste of the present invention is composed of electronic materials such as printed wiring, bonding materials, and conductive materials, magnetic materials such as magnetic recording media, electromagnetic wave absorbers, and electromagnetic resonators, far infrared materials, and composite film forming materials. It can be applied to various applications such as structural materials such as ceramics, metal materials such as sintering aids and coating materials, and medical materials.
- the paste metallization temperature Tp3 ( (VT) can provide a composite nanometal paste satisfying Tp3 (VT) ⁇ Tp3 (1 ° C./min)+100.
- the paste metallization temperature Tp3 (VT) is 100 than the paste metallization temperature Tp3 (1 ° C./min) at 1 ° C./min. It means that °C does not rise either. Since Tp3 (1 ° C./min) ⁇ 300° C.
- Tp3 (VT) ⁇ 400 ° C. in the present invention.
- the paste metallization temperature Tp3 (VT) can be set low, so that the paste layer can be sintered to the metal layer by low-temperature sintering.
- Tp3 paste metalization temperature
- the paste decomposition start temperature Tp1 (VT) can be measured by the decrease start temperature of the TG curve.
- the change point that is, the deviation point from the straight line can be defined as the paste decomposition start temperature Tp1 (VT).
- Tp1 paste decomposition start temperature
- the paste decomposition temperature Tp2 (VT) at which the organic coating layer undergoes strong oxidative decomposition is defined as the peak temperature when the DTA peak is a single peak, and the initial peak temperature when the DTA peak is a plurality of peaks. . Whether this first peak gives the maximum peak depends on the thing.
- the inequality of Tp2 (VT) -100 ⁇ Tp1 (VT) ⁇ Tp2 (VT) indicates that the paste decomposition start temperature Tp1 (VT) is the paste decomposition temperature Tp2 (VT ) In the range of 100 ° C. below. It is one of the characteristics of the composite nano metal paste according to the present invention.
- the paste decomposition start temperature Tp1 ( VT), paste decomposition temperature Tp2 (VT), and paste metallization temperature Tp3 (VT) increase as the temperature increase rate VT increases while satisfying the relationship of Tp1 (VT) ⁇ Tp2 (VT) ⁇ Tp3 (VT).
- the composite nano metal paste can be provided.
- the definitions of the paste decomposition start temperature Tp1 (VT), paste decomposition temperature Tp2 (VT), and paste metallization temperature Tp3 (VT) of the composite nanometal paste of the present invention are the start of decomposition in the composite silver nanoparticles used in the present invention.
- the TG curve and the DTA curve are preceded by the solvent and / or viscosity-imparting curve, followed by the curve of the composite silver nanoparticles. That is, the first rapid decrease that appears in the TG curve forms the first deep valley in the DTG curve that is the differential curve, and the temperature at which the DTG curve becomes almost zero after the valley is restored starts paste decomposition.
- Tp1 Tp1 (VT).
- Tp1 VT
- Tp2 paste decomposition temperature
- a composite nanometal paste in which one or more of T3 (VT) ⁇ Tp3 (VT) ⁇ T3 (VT) +100 is established can be provided.
- a two-component metal composite nanometal paste according to any one of the first to fourteenth aspects is prepared, and a paste layer is formed between the lower body and the upper body by the composite nanometal paste.
- a bonding method is provided in which the paste layer is sintered into a metal layer by heating to bond the lower body and the upper body.
- This embodiment is a method of joining two objects using a composite nanometal paste.
- One object is referred to as a lower body and the other object is referred to as an upper body.
- the metal film is excellent in electrical conductivity, thermal conductivity, and bonding strength, and can be sintered at a low temperature, so that low melting point objects can be bonded together.
- the upper body and the lower body when the lower body and the upper body are joined via the metal layer under no load or under load and in the air or inert gas, the upper body and the lower body A bonding method is provided in which the electrical resistance during current application and the heat conduction to the lower body during heating of the upper body are smaller than when the bonding is performed with a conventional lead-rich solder.
- the electrical resistance and the upper body heat generation during current application between the upper body and the lower body when the joined body was subjected to various tests of high temperature environment, low temperature environment, and long time operation, the electrical resistance and the upper body heat generation during current application between the upper body and the lower body.
- the heat conduction to the lower body at the time was judged to be durable and able to withstand repetitive operation tests if it becomes smaller compared to the case where the joining is performed with a conventional lead-rich solder. .
- a joining test was performed using the composite nanometal paste of the present invention, it became clear that the electrical conductivity and the thermal conductivity exceeded the case where a conventional lead-rich solder was used. Therefore, it became clear that high electrical conductivity and high thermal conductivity can be imparted by the present invention.
- an electronic component manufactured by the joining method according to the fifteenth or sixteenth aspect can be provided. Since the electronic component provided by this embodiment has high electrical conductivity and high thermal conductivity, it has a long life and can perform stable normal operation even in a harsh environment.
- FIG. 1 is an explanatory diagram of a first step of a low-temperature generation reaction of composite silver nanoparticles according to the present invention.
- FIG. 2 is an explanatory diagram of the second step of the low-temperature generation reaction of the composite silver nanoparticles according to the present invention.
- FIG. 3 is a flow diagram showing a low temperature generation procedure of composite silver nanoparticles according to the present invention.
- FIG. 4 is a thermal analysis diagram (temperature increase rate: 1 ° C./min) of C 6 AgAl produced at 110 ° C. according to the present invention.
- FIG. 5 is a relationship diagram of the characteristic temperatures T1, T2, T3, PT and C number of the composite silver nanoparticles according to the present invention at a heating rate of 1 ° C./min.
- FIG. 6 is a temperature range diagram of the decomposition start temperature T1 of the composite silver nanoparticles according to the present invention at a rate of temperature increase of 1 ° C./min.
- FIG. 7 is a correlation diagram of characteristic temperatures T1, T2, and T3 of the composite silver nanoparticles according to the present invention.
- FIG. 8 is a particle size relationship diagram of the two metal components of the composite nanometal paste according to the present invention.
- FIG. 9 is a particle size condition diagram for densely sintering the metal layer in the composite nanometal paste according to the present invention.
- FIG. 10 is a four pocket diagram formed at the center of a regular tetrahedron in which four metal filler particles are in contact with each other.
- FIG. 10 is a four pocket diagram formed at the center of a regular tetrahedron in which four metal filler particles are in contact with each other.
- FIG. 11 is a geometric configuration diagram of a regular tetrahedron in the present invention.
- FIG. 12 is an explanatory diagram of the diameter of an inscribed sphere inscribed in the four pocket according to the present invention.
- FIG. 13 is an explanatory diagram of the range of the average particle diameter d of the metal nuclei of the composite metal nanoparticles filled in the four pockets.
- FIG. 14 is an explanatory diagram of the volume ratio of the four pocket volume to the regular tetrahedral volume.
- FIG. 15 is an explanatory diagram for calculating the volume of a regular tetrahedron.
- FIG. 16 is a geometric configuration diagram of a solid AKLN that is a part of metal filler particles at the apex of a regular tetrahedron.
- FIG. 17 is a volume proof diagram of the four pockets existing inside the regular tetrahedron.
- FIG. 18 is a calculation diagram of the filling rate of the enlarged four pockets of the enlarged tetrahedron in which the metal filler particles are separated from each other.
- FIG. 19 is a geometric explanatory diagram of an enlarged regular tetrahedron that prevents intrusion of other metal filler particles.
- FIG. 20 is an explanatory diagram of the theoretical range of the filling rate of the composite metal nanoparticles into the four pockets.
- FIG. 21 is an explanatory diagram of the minimum elastic filling rate into the four pockets of the composite metal nanoparticles.
- FIG. 22 is a thermal analysis diagram (temperature increase rate: 5 ° C./min) of Example 602 of PC6AgAL according to the present invention.
- FIG. 23 is a relationship diagram of characteristic temperatures of CnAgAL and PCnAgAL according to the present invention.
- FIG. 24 is a manufacturing process diagram of a diode resin mold for a bonding test.
- FIG. 25 is a test measurement diagram of VF and ⁇ VF of the diode resin mold body.
- FIG. 1 is an explanatory diagram of a first step of a low-temperature generation reaction of composite silver nanoparticles according to the present invention.
- the inorganic compound used as a raw material is the silver compound (1).
- inorganic silver salts and organic silver salts can be used.
- Inorganic silver salts include silver carbonate, silver chloride, silver nitrate, silver phosphate, silver sulfate, and silver borate.
- silver fluoride, and organic silver salts include fatty acid salts such as silver formate and silver acetate, sulfonates, and silver salts of hydroxy, thiol and enol groups.
- silver salts composed of C, H, O, Ag silver salts composed of C, H, Ag, silver salts composed of H, O, Ag, silver salts composed of C, O, Ag, O
- a silver salt made of Ag is preferable in that it contains no impurities. The reason is that only H 2 O, CO 2 , O 2, and the like are generated by sintering even when a silver salt is mixed as an impurity in the generated composite silver nanoparticles.
- silver carbonate Ag 2 CO 3 will be described later as a suitable silver salt, but it goes without saying that other silver salts are similarly used.
- R n in the formula (3) represents a hydrocarbon group of alcohol.
- the carbon number n is limited to 1-12.
- the silver salt fine particles are insoluble in alcohol, but the hydrophilic group OH of the alcohol has a property of easily binding to the surface of the silver salt fine particles.
- the hydrophobic group R n of the alcohol has a high affinity with alcohol solvent. Therefore, as shown in the formula (4), when the silver salt fine particles are dispersed in the alcohol solvent, the alcohol is adsorbed on the surface of the silver salt fine particles and floats in the alcohol solution. When the particle diameter of the silver salt fine particles is small, a stable silver salt fine particle colloid is formed. On the other hand, when the silver salt fine particles have a large particle size, they may precipitate, but if the floating state continues for several tens of minutes, there is no problem, and the reaction may be carried out with gentle stirring.
- FIG. 2 is an explanatory diagram of the second step of the low-temperature generation reaction of the composite silver nanoparticles according to the present invention.
- silver carbonate is described as an example here as a silver salt, but the same applies to other silver salts.
- Silver carbonate on the surface of the silver carbonate fine particles reacts with alcohol to form aldehyde R n-1 CHO simultaneously with silveration, as shown in formula (5).
- aldehyde R n-1 CHO simultaneously with silveration, as shown in formula (5).
- Formula (6) there is also a reaction route in which silver alkoxide AgOR n is immediately generated without forming an aldehyde.
- the aldehyde has a strong reducing action, and as shown in formula (7), silver carbonate is reduced to form carboxylic acid R n-1 COOH simultaneously with silveration.
- the intermediately produced Ag, AgOR n , and R n-1 COOH aggregate with each other by the reactions shown in the formulas (8) and (9), the inside is Ag, and the surface is derived from alcohols such as alkoxides and carboxylates.
- Composite silver nanoparticles with an organic coating layer are produced. Ag k + m (OR n ) m and Ag k + m (OR n ) m R n-1 COOH are produced as composite silver nanoparticles. These composite silver nanoparticles are illustrated in equations (10) and (11).
- the reaction is a surface reaction of silver carbonate fine particles.
- the reaction continues while gradually penetrating from the surface into the interior, and the silver carbonate fine particles serving as the central nucleus are converted into silver nuclei.
- composite silver nanoparticles represented by formula (10) and formula (11) are produced.
- Formula (10) and Formula (11) show the constitutive formula of the silver coating and the organic coating layer formed around it.
- the organic coating layer may be an alkoxide group OR n or a carboxylic acid R n-1 COOH.
- R n-1 COO there may be a carboxylic acid group R n-1 COO in which H is eliminated from a carboxylic acid (fatty acid).
- the organic coating layer also has an alkoxide, an alkoxide group, a carboxylic acid, a carboxylic acid group, or a mixed form thereof.
- Table 1 shows the types of raw materials (silver carbonate and alcohol) of composite silver nanoparticles, their masses, and the molar ratio of excess alcohol solution.
- Table 2 shows the molecular weight of the raw material of the composite silver nanoparticles and the number of moles per 100 g.
- C number carbon number
- Tables 1 and 2 are as follows.
- FIG. 3 is a flowchart showing a low-temperature generation procedure of composite silver nanoparticles according to the present invention.
- step s 3 the ultrafine silver salt is dispersed in an excess amount of alcohol.
- This alcohol solution is charged into a reactor, and heated for a predetermined time (reaction time) at a production temperature (reaction temperature) to produce composite silver nanoparticles (CnAgAL).
- reaction time a predetermined time
- reaction temperature a production temperature
- the production reaction is stopped by lowering the temperature with a cooler.
- Table 3 is a relationship table between the bead particle size and the silver salt ultrafine particle size including Ag 2 CO 3 .
- the particle diameter of the beads is from 1 mm to 0.03 mm, so that the ultrafine particle diameter can be freely controlled in the range of 5000 nm to 10 nm.
- Table 4 is a list of production conditions (reaction conditions) and particle constants of C1 to C12 composite silver nanoparticles C1AgAL to C12AgAL.
- the production time is shortened from 237 minutes to 18 minutes, and conversely, the production temperature increases from 40 ° C. to 149 ° C.
- the average particle diameter X (nm) of the metal nuclei decreases from 52 to 11, and the average particle diameter X tends to increase as the C number decreases.
- the particle size distribution tends to be smaller as the C number increases, but the maximum value of the distribution was smaller than 100 nm.
- the maximum value of the distribution becomes smaller when the generation time is shortened. Further, the metal content decreases as the C number increases, but shows a large value of 91.3% at the minimum. This means that the organic matter content increases with the C number.
- the distribution is widely distributed from 11 to 92 nm, and a large amount of ultrafine particles considerably smaller than the average particle diameter are contained. It is a fact.
- the range of the average particle diameter is determined under the four pocket conditions. However, since there are a large number of ultrafine particles that are considerably smaller than the average particle diameter, these ultrafine particles are in the small gaps of the four pockets. It is also the reason for densifying the metal layer in which the particle group is embedded and formed by sintering. This is a fact common to all composite silver nanoparticles.
- FIG. 4 is a thermal analysis diagram obtained by thermal analysis of C6AgAL (Example 6) generated at 110 ° C. at a heating rate of 1 ° C./min.
- T1 represents a decomposition start temperature
- T2 represents a decomposition temperature
- T3 represents a metallization temperature (silverization temperature).
- the decomposition start temperature T1 is defined by the TG decrease start temperature, but can also be defined by the DTA increase start temperature.
- the decomposition temperature T2 is defined by the initial peak temperature (first peak temperature). In this DTA, there are two peaks, and the maximum peak is the second peak, so the maximum peak temperature does not give the decomposition temperature T2.
- the present inventors currently believe that the first peak corresponds to the decomposition temperature of fine particles in the composite silver nanoparticles, and the second peak corresponds to the decomposition temperature of large particles or aggregated particles in the composite silver nanoparticles. ing.
- the metallization temperature T3 is defined by the end temperature of the final peak, but when the final peak is a steep peak, it is not so different even if defined by the steep peak temperature.
- This final peak is considered to give a temperature at which a fine metal layer (silver layer) is formed while the silver nuclei of the fine particles, large particles, or agglomerated particles that have become naked move relative to each other.
- T1 95 ° C.
- T2 132 ° C.
- T3 157 ° C. were obtained.
- Table 5 is a relationship table of the characteristic temperatures T1, T2, T3, PT, alcohol boiling point BT, and carbon number of the composite silver nanoparticles.
- the generation temperature PT is set to a temperature not higher than the boiling point BT of the corresponding alcohol.
- the metallization temperature T3 varies from 121 ° C. to 198 ° C., T3 ⁇ 200 ° C. is established, indicating that the present invention can use composite silver nanoparticles that can be sintered at low temperature. From this table, it was also demonstrated that T1 ⁇ T2 ⁇ T3, PT ⁇ T3, and T3 ⁇ 200 ° C.
- FIG. 5 is a graph showing the relationship between the characteristic temperature and C number of composite silver nanoparticles.
- FIG. 5 is a graph of PT, T1, T2, T3, and BT shown in Table 5 with respect to the C number. This graph also shows that T1 ⁇ T2 ⁇ T3, PT ⁇ T3, and T3 ⁇ 200 ° C. are satisfied.
- Table 6 is a relationship table between the number of C shown in Table 5 and T1, and is a relationship table that proves that T2-100 ⁇ T1 ⁇ T2.
- the third to fifth columns indicate values of T2-100, T1, and T2.
- the inequality of T2-100 ⁇ T1 ⁇ T2 holds.
- FIG. 6 is a graph of Table 6 and is a range diagram of the decomposition temperature T1 of the composite silver nanoparticles. It is illustrated that the decomposition start temperature T1 exists within 100 ° C. below the decomposition temperature T2. As a mathematical formula, the relationship of T2-100 ⁇ T1 ⁇ T2 is proved. This relational expression is first known in the present invention and gives the characteristic temperature property of the composite silver nanoparticles.
- FIG. 7 is a correlation diagram of characteristic temperatures T1, T2, and T3 of the composite silver nanoparticles according to the present invention.
- the mutual relationship between the characteristic temperatures T1, T2, and T3 obtained by the present invention will be summarized.
- the composite silver nanoparticles obtained in the present invention were C1AgAL to C12AgAL, and they were subjected to thermal analysis in the atmosphere and TG curve and DTA curve were measured, and the following matters were found.
- the decomposition start temperature T1 (° C.) can be defined by a TG decrease start temperature or a DTA increase start temperature.
- the decomposition temperature T2 (° C.) is the DTA peak temperature, but when it is composed of a plurality of peaks, it is initially defined as the peak temperature, but may be defined as the DTA maximum peak temperature.
- the silvering temperature (metalization temperature) T3 (° C.) is defined by the DTA final peak temperature, but may be defined by the DTA final peak end temperature, and is defined as the TG stabilization temperature from the TG curve.
- PT (° C.) is the formation temperature (reaction temperature) of the composite silver nanoparticles.
- T2 (VT) ⁇ 100 ⁇ T1 (VT) ⁇ T2 (VT) is obtained, and the relationship of the equation (C2) is established at an arbitrary temperature increase rate VT.
- FIG. 8 is a particle size relationship diagram of the two metal components of the composite nanometal paste according to the present invention.
- the composite nanometal paste of the present invention is composed of two kinds of metal components.
- the first particles are composite metal nanoparticles NS (described in Table 4) in which an organic coating layer is formed around metal nuclei having an average particle diameter d (nm), which become small particles.
- the second particles are metal filler particles F having an average particle diameter D (nm), which correspond to large particles and use commercially available silver fine particles.
- the first relationship of formula (12): d ⁇ D and the second relationship of formula (13): d ⁇ 100 nm are necessary. become.
- D 100 nm will be required.
- a gap called “four pockets” by the inventors exists at the center of the regular tetrahedron.
- FIG. 9 is a particle diameter condition diagram for dense sintering of the metal layer in the present invention.
- a regular tetrahedron is constituted by four metal filler particles F having an average radius R, and more specifically, a regular tetrahedron whose centers A, B, C, and D are 2R on one side is considered.
- the four pockets P are vacant at the center, and the inscribed sphere NSmax having the radius r 0 is disposed in the four pockets. Therefore, when the average radius r of the metal nuclei of the composite metal nanoparticles is used, it is clear that the condition of the formula (17) becomes the embedding condition.
- FIG. 10 is a four pocket diagram formed at the center of a regular tetrahedron in which four metal filler particles are in contact with each other.
- the four pocket theory is specifically applied in order to further increase the filling rate of two types of metal particles. That is, four metal filler particles F are three-dimensionally arranged in a contact state (three-dimensional close packed arrangement). The gap at the center becomes a four pocket P.
- An inscribed circle NSmax inscribed in the four metal filler particles F is formed in the four pockets P, and a radius r 0 of the inscribed circle NSmax is obtained. If the average particle diameter d of the metal nuclei of the composite metal nanoparticles satisfies d ⁇ 2r 0 , the metal nuclei of the composite metal nanoparticles are filled in the three pockets P.
- FIG. 11 is a geometric configuration diagram of a regular tetrahedron in the present invention.
- a regular tetrahedron ABCD is formed by the centers A, B, C, and D of the four metal filler particles F. All four surfaces are equilateral triangles, and when the perpendicular AO is dropped from the point D to the equilateral triangle ABC, the point O coincides with the center of gravity of the equilateral triangle ABC.
- FIG. 12 is an explanatory diagram of the diameter of an inscribed sphere inscribed in the four pocket according to the present invention.
- x is the sum of the inscribed sphere radius r 0 and the metal filler particle radius R.
- the triangle ODB is a right triangle, and from the Pythagorean theorem, equation (21), and therefore equation (22) holds. From Expression (22), H is obtained as Expression (23).
- FIG. 13 is an explanatory diagram of the range of the average particle diameter d of the metal nuclei of the composite metal nanoparticles filled in the four pockets.
- Expression (17) is a radius filling condition
- Expression (30) obtained by doubling this is a particle diameter filling condition.
- From 0 ⁇ d ⁇ 2r 0 and equations (28) and (29), Expressions (33) and (34) are established.
- 0 ⁇ d ⁇ ( ⁇ 3 / ⁇ 2-1) D or 0 ⁇ d ⁇ 0.2247D is a condition in which the metal core of the composite metal nanoparticle is embedded (embedded) in the four pockets P. .
- the filling rate of the composite metal nanoparticles into the four pockets P will be considered.
- the organic components in the paste layer are decomposed and evaporated, and the remaining metal components are sintered together and changed into a macro metal body.
- the regular tetrahedron described above becomes a sintered body of the metal filler F and the metal core of the composite metal nanoparticles.
- the volume of the entire regular tetrahedron corresponds to the total weight (W + w) of the metal filler W and the metal core w.
- the volume of the four pockets is considered to correspond to the weight of the metal core w.
- the ratio w / (W + w) of the metal core weight of the composite metal nanoparticles to the total metal weight (W + w) matches the ratio v 0 / V 0 of the four pocket volume v 0 to the tetrahedral volume V 0 , the ratio w / (W + w) is determined below as a ratio v 0 / V 0 .
- the lower limit of the ratio w / (W + w) can be calculated from the ratio v 0 / V 0 of tetrahedrons in which the metal filler particles are in contact with each other, and the upper limit value of the ratio w / (W + w) is the distance between the metal filler particles. It can be calculated from the ratio v / V of the enlarged regular tetrahedron. The following is derived from the lower limit value.
- FIG. 14 is an explanatory diagram of the volume ratio of the four pocket volume to the regular tetrahedral volume.
- the volume of the entire regular tetrahedron is V 0, and the volume of the four pocket is v 0 .
- FIG. 15 is an explanatory diagram of calculation of the volume of a regular tetrahedron, and gives proof of the equation (36) of FIG. Since the regular tetrahedron is a pyramid, the volume is expressed by equation (40) by the base area ⁇ height / 3. Referring to FIG. 11, the area of the triangle ABC is represented by Equation (41) by the base ⁇ height / 2. The height H is already given by equation (23). Accordingly, the regular tetrahedral volume V 0 is given by the equation (36) by substituting the equations (41) and (23) into the equation (40).
- FIG. 16 is a geometric configuration diagram of a solid AKLN that is a part of metal filler particles at the apex of a regular tetrahedron.
- the solid AKLN exists at each of the vertices A, B, C, and D, and is a part of a sphere of radius R having a spherical triangle KLN. Therefore, it is necessary to use the spherical trigonometry to obtain the volume vv 0 of the solid AKLN. Further, if 4 ⁇ vv 0 is subtracted from the volume V 0 of the regular tetrahedron, the four pocket volume v 0 is theoretically obtained.
- FIG. 17 is a volume proof diagram of the four pockets existing inside the regular tetrahedron.
- Expression (44) which is a cosine theorem of spherical trigonometry is used.
- equation (48) area S 0 is obtained as equation (48).
- Expression (49) is established. That is, since the area 4 ⁇ R 2 of the spherical surface corresponds to the spherical volume (4 ⁇ / 3) R 3 , the proportional expression (49) is established. From this, vv 0 becomes Formula (50). As shown in the equation (51), the four volume volumes are 4 ⁇ vv 0 , and eventually the equation (52) is established.
- FIG. 18 is a calculation diagram of the filling rate of the enlarged four pockets of the enlarged tetrahedron in which the metal filler particles are separated from each other.
- Four metal filler particles F having an average radius R are separated from each other by an interval 2 ⁇ to form an enlarged regular tetrahedron.
- the volume of the four metal filler particles at the apex of the enlarged tetrahedron is the same as described above, and the four pockets swell and change to the enlarged four pockets.
- FIG. 19 is a geometric explanatory diagram of an enlarged regular tetrahedron that prevents intrusion of other metal filler particles.
- the condition for preventing this penetration is ⁇ ⁇ R. That is, if the gap on the side surface is smaller than the metal filler particles F, the metal filler particles F cannot enter the enlarged four pockets.
- FIG. 20 is an explanatory diagram of the theoretical range of the filling rate of the composite metal nanoparticles into the enlarged four pockets.
- Expression (63) and Expression (64) are established under the condition of an enlarged regular tetrahedron, that is, x ⁇ 0.
- the volume ratio of the enlarged four pocket to the enlarged regular tetrahedron is 0.90254.
- the filling factor X is 0.22036 ⁇ X ⁇ 0.90254 according to the equation (69).
- the filling rate becomes 0.22036, and the composite metal nanoparticles are placed in the enlarged four pockets with a side of 4R (separation distance 2R).
- the upper limit of 0.90 is consistent with experimental rules of thumb. However, according to our experimental rule of thumb, the lower limit of the filling rate is allowed to 0.10, and it is our secret that high electrical conductivity and high thermal conductivity are manifested at this 0.10. It exists as knowledge. I will explain this next.
- FIG. 21 is an explanatory diagram of the minimum elastic filling rate of the composite metal nanoparticles into the four pockets. It is considered that there are few cases where the entire four pockets of the contact type tetrahedron are filled with the composite metal nanoparticles without gaps. When actually observed with an electron microscope, high electrical conductivity and high thermal conductivity often appear even if there are some gaps.
- the radius r 0 of the inscribed sphere is expressed by the formula (28), and the volume nv is calculated using the formula (70) to obtain the formula (71). Since the volume V 0 of the regular tetrahedron is given by the equation (36), the volume ratio of one inscribed sphere to the regular tetrahedron is the equation (72), and the decimal is 0.0504 of the equation (73).
- the volume ratio Xmin of the four pockets P to the regular tetrahedron is 0.22036 as shown in the equation (39). This value corresponds to 4.3722 times the inscribed sphere. Therefore, the above-mentioned empirical value 0.10 is about 1/2 of 0.22036, which means that it is sufficient to fill about half of the four pockets.
- Table 7 is a numerical particle size condition table of the two metal component composite nanometal paste.
- the average particle diameter of the metal filler particles is D (nm) and the average metal particle diameter of the composite metal nanoparticles is d (nm)
- the equations (12), (13), and (16) are established.
- the average particle diameter D is 100 nm to 1000 nm
- the average particle diameter d (nm) is set so as to satisfy the inequality relationship shown in Table 7. It goes without saying that the four pocket condition is satisfied within this numerical range.
- the particle size condition No when the particle size D is 100 nm to 1000 nm is as shown in the table. This is used in the table described later, and indicates which four pocket conditions the composite nanosilver paste described later satisfies.
- Table 8 is a specific composition table of the two metal component composite nanosilver pastes PC1AgAL to PC6AgAL.
- the composite silver nanoparticles are represented by CnAgAL, while the two metal component composite nanosilver paste is represented by PCnAgAL.
- the two metal components are CnAgAL and silver filler.
- CnAgAL is a composite silver nanoparticle given in Table 4, and its w weight% (wt%) and average particle diameter d (nm) of the metal core are shown.
- the silver filler is a commercially available silver fine particle, and its W weight% (wt%) and average particle diameter D (nm) are shown.
- the particle size condition is a particle size condition given in Table 7 and shows a specific four pocket condition.
- Various solvents can be used as the solvent for reducing the viscosity, but here, methanol, ethanol, butanol, xylene, and toluene are used.
- the viscosity imparting agent for increasing the viscosity various viscosity imparting agents can be used, and here, terpine oil and terpine derivatives are used.
- the paste viscosity can be freely adjusted by the ratio of the solvent and the viscosity-imparting agent, but here the solvent is fixed at 6.0 wt% and the viscosity-imparting agent is fixed at 4.0 wt%.
- Table 9 is a specific composition table of the two metal component composite nanosilver pastes PC7AgAL to PC12AgAL.
- the composite silver nanoparticles are represented by CnAgAL
- the two metal component composite nanosilver paste is represented by PCnAgAL.
- the two metal components are CnAgAL and silver filler.
- CnAgAL is a composite silver nanoparticle given in Table 4, and its w weight% (wt%) and average particle diameter d (nm) of the metal core are shown.
- the silver filler is a commercially available silver fine particle, and its W weight% (wt%) and average particle diameter D (nm) are shown.
- the particle size condition is a particle size condition given in Table 7 and indicates a specific three pocket condition.
- Various solvents can be used as the solvent for reducing the viscosity, but butanol, ethanol, and hexane are used here.
- the viscosity imparting agent for increasing the viscosity various viscosity imparting agents can be used, and here, terpine oil and terpine derivatives are used.
- the paste viscosity can be freely adjusted by the ratio of the solvent and the viscosity-imparting agent, the solvent is fixed at 6.0 wt% and the viscosity-imparting agent is fixed at 4.0 wt%.
- FIG. 22 is a thermal analysis diagram obtained by performing thermal analysis on PC6AgAL (Example 602) at a heating rate of 5 ° C./min.
- Tp1 indicates the paste decomposition start temperature
- Tp2 indicates the paste decomposition temperature
- Tp3 indicates the paste metallization temperature (silverization temperature).
- the paste decomposition start temperature Tp1 is defined by the DTA increase start temperature.
- the first decrease in the TG curve is the evaporation of alcohol, and the next decrease means a decrease in viscosity imparting agent. Therefore, if the paste decomposition start temperature Tp1 is defined by TG, it can be defined by the TG decrease start temperature after the viscosity imparting agent has completely evaporated.
- the paste decomposition temperature Tp2 is defined by the initial peak temperature (first peak temperature). In this DTA, there are two peaks, and the maximum peak is the first peak, so the maximum peak temperature gives the decomposition temperature Tp2. In FIG. 22, the second peak is higher than the first peak, but the second peak may be lower. Accordingly, here, the paste decomposition temperature Tp2 is defined as the initial peak temperature (first peak temperature). The present inventors currently believe that the first peak corresponds to the decomposition temperature of fine particles in the composite silver nanoparticles, and the second peak corresponds to the decomposition temperature of large particles or aggregated particles of the composite silver nanoparticles. .
- the paste metallization temperature Tp3 is defined by the end temperature of the final peak, but when the final peak is a steep peak, it is not so different even if defined by the steep peak temperature.
- This final peak is considered to give a temperature for forming a dense metal layer (silver layer) while the silver nuclei and silver filler particles of the fine particles, large particles, or agglomerated particles that have become naked move relative to each other.
- Tp1 130 ° C.
- Tp2 162 ° C.
- Tp3 203 ° C. were obtained.
- Table 10 is a relationship table of characteristic temperatures Tp1, Tp2, and Tp3 of the composite nanosilver pastes PC1AgAL to PC6AgAL.
- Tp1, Tp2, and Tp3 characteristic temperatures
- the metallization temperature Tp3 increases with the C number, and specifically varies from 153 ° C. to 204 ° C.
- Tp3 ⁇ 300 ° C. is established, indicating that the present invention is a composite nanosilver paste that can be sintered at a low temperature. From this table, it was demonstrated that Tp1 ⁇ Tp2 ⁇ Tp3 and Tp3 ⁇ 300 ° C. were established.
- Table 11 is a relationship table of characteristic temperatures Tp1, Tp2, and Tp3 of the composite nanosilver pastes PC7AgAL to PC12AgAL.
- the metallization temperature Tp3 increases with the C number, and specifically changes from 215 ° C. to 275 ° C.
- Tp3 ⁇ 300 ° C. is established, indicating that the present invention is a composite nanosilver paste that can be sintered at a low temperature. From this table, it was demonstrated that Tp1 ⁇ Tp2 ⁇ Tp3 and Tp3 ⁇ 300 ° C. were established.
- VT is selected from the range of 1 (° C./min) ⁇ VT ⁇ 20 (° C./min).
- FIG. 23 is a relationship diagram of characteristic temperatures of CnAgAL and PCnAgAL according to the present invention.
- the following formulas (P7) to (P9) are described.
- the correlation between the characteristic temperatures of CnAgAL powder and PCnAgAL paste is shown.
- What these formulas mean is that the paste characteristic temperatures Tp1, Tp2, and Tp3 exist within 100 ° C. above the powder characteristic temperatures T1, T2, and T3, respectively.
- FIG. 24 is a production process diagram of a diode resin mold for a bonding test.
- the composite nanosilver paste layers 6 and 12 are applied onto the lead frames 2 and 4, respectively.
- the diode chip 8 is placed on the composite nanosilver paste layer 6, and the composite nanosilver paste layer 10 is applied on the diode chip 8.
- both ends of the connection terminal 14 are placed on the composite nanosilver paste layers 10 and 12 to complete the diode assembly 1.
- the diode assembly 1 is sintered in an electric furnace 16, and the composite nanosilver paste layers 6, 10, 12 are changed to silver layers 6a, 10a, 12a.
- the sintered diode assembly 1 is sealed with a resin mold 20 to complete a diode resin mold body 18, and the diode resin mold body 18 is transferred to a VF test and a ⁇ VF test described later.
- the lead frames protruding from the left and right serve as an anode 22 and a cathode 24 as electrodes.
- FIG. 25 is a test measurement diagram of VF and ⁇ VF of the diode resin mold body.
- a DC power source 26 is connected in series with an ammeter 28 between the anode 22 and the cathode 24, and a DC voltage is applied variably.
- (25B) is an explanatory diagram of the VF test. The forward voltage VF through which the rated current IO flows is measured. It can be seen that the smaller the forward voltage VF is, the smaller the electrical resistance of the joint surface is, and thus a better joined state.
- (25C) is an explanatory diagram of the ⁇ VF test. It is important that the electrical resistance at the joint surface has good thermal conductivity because Joule heat is generated when the forward current is increased and the diode characteristics are deteriorated.
- a ⁇ VF test is performed. First, a forward current VF is measured by passing a minute current, and then a predetermined large current is passed for a certain time, and the forward voltage VF immediately after that is measured. When the difference ⁇ VF is small, heat is efficiently conducted through the joint surface, indicating that the joint state is good. That is, the electrical conductivity is measured by the VF test, and the thermal conductivity is measured by the ⁇ VF test.
- Table 13 is a list of VF values and ⁇ VF values of the two metal component composite nano silver pastes PC1AgAL to PC6AgAL under no load in nitrogen.
- a VF value and a ⁇ VF value when a conventional high lead content solder is used are also shown as reference values.
- Each value is normalized with the value of the lead-rich solder as 1.000.
- the VF value and the ⁇ VF value are smaller than the reference value, it means that it is good. It is judged as ⁇ if it is quite small, ⁇ if it is a little small, ⁇ if it is comparable, and x if both are large.
- Table 14 is a list of VF values and ⁇ VF values of the two kinds of metal component composite nano silver pastes PC7AgAL to PC12AgAL under no load in nitrogen.
- the VF value and the ⁇ VF value when a conventional lead-rich solder is used are also shown as reference values.
- the determination criterion is determined to be good when the VF value and the ⁇ VF value are smaller than the reference value. It is judged as ⁇ if it is quite small, ⁇ if it is a little small, ⁇ if it is comparable, and x if both are large. In the pastes of Examples 701 to 123, it was confirmed that the VF value and the ⁇ VF value were smaller than the reference value.
- the two-component metal composite nanometal paste of the present invention exhibits high electrical conductivity and high thermal conductivity comparable to or higher than conventional lead-rich solder that is exceptionally approved for use. It has been done. Therefore, not only general lead-free solder but also lead-free solder that can be used as a substitute for lead-rich solder that is specifically permitted by the RoHS Directive.
- its range of use is extremely wide, such as electronic materials such as bonding materials, printed wiring, and conductive materials, magnetic materials such as magnetic recording media, electromagnetic wave absorbers, and electromagnetic resonators, far infrared materials, and composite film forming materials. It can be applied to various applications such as structural materials, ceramics and metal materials such as sintering aids and coating materials, and medical materials.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Powder Metallurgy (AREA)
- Conductive Materials (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
Description
た。この国際公開公報には、金属塩から得られる粒径が1~100nmの金属核の周囲に炭素数4以上のアルコール性水酸基を含む有機化合物からなる被覆層を形成した複合金属ナノ粒子が開示されている。しかも、吸着性を有する官能基を含む有機化合物として、炭素数6以上の高級アルコールが記載されている。
しかも、上記複合金属ナノ粒子として200℃以下の低温で金属化が可能な複合金属ナノ粒子を開発し、この低温焼結用の複合金属ナノ粒子を本発明のナノ金属ペーストに応用したものである。このような技術思想は、特許文献1には記載もされず、示唆さえされていない。上記複合金属ナノ粒子の重要性を確認するために、特許文献5~8と対比説明する。
Ag2CO3→Ag2O+CO2 (150℃<T<210℃) (A)
Ag2O→2Ag+1/2O2 (T>400℃) (B)
まず、式(A)の反応が生起するが、式(B)の分解温度は400℃以上であり、200℃以下の金属化を達成できず、融点183℃のSn-Pb共晶はんだの代替品としても不適格である。しかも、銀核の結晶性は全く記載されておらず、電気伝導性と熱伝導性の良否の判定は全く不能である。また、ミリスチルアルコールはC数が14と分子量が大きく、銀核に対する有機被覆層の重量が増大して、焼結温度が高くなると同時に、焼結時の排ガス量が増大して、接合時に大量のボイドが生じ、接合用ペーストとしての適格性が低下する欠点を有する。
平均粒径が100nm以下の複合金属ナノ粒子は、サイズが平均粒径の周りに分布しているから、平均粒径よりも小さな小径粒子(微細粒子)が多数あるため、金属フィラー粒子間の隙間を複合金属ナノ粒子で緻密に充填することが可能であり、焼結したときに、隙間が少ない緻密な金属層を実現できる。この金属層は電子部品や半導体などの接合金属層となり、良好な電気的特性と機械的特性を発現できる。小粒子を複合金属ナノ粒子で構成するから、ペースト中を単分散して動き回り、隙間を充填するように配置され、焼結により緻密な金属層を形成できる。
本発明の複合ナノ金属ペーストでは、前記溶剤及び/又は粘性付与剤の蒸発温度或いは分解温度は極力低く設定されることが望ましい。従って、ペーストの焼結温度は複合銀ナノ粒子の金属化温度だけでは決まらず、溶剤及び/又は粘性付与剤の蒸発温度や分解温度にも依存する。また、加熱により蒸発・分解気散する必要があり、炭化して残留するものは除かれる。また、使用形態として、溶剤だけ添加したペースト、粘性付与剤だけ添加したペースト、溶剤と粘性付与剤の両者を添加したペーストが利用できる。
本発明の複合ナノ金属ペーストは、1℃/min測定で金属化温度T3がT3≦200℃の複合金属ナノ粒子を含有することにより、その結果、ペースト全体として、1℃/minでのペースト金属化温度Tp3(℃)を300℃以下に設定することが可能になった。ペースト金属化温度Tp3が1℃/minで300℃以下であるから、製造装置や製造設備のコストも大幅に低減できる。従って、本発明の複合ナノ銀ペーストは、プリント配線・接合材料・導電性材料などの電子材料、磁気記録媒体・電磁波吸収体・電磁波共鳴器などの磁性材料、遠赤外材料・複合皮膜形成材などの構造材料、焼結助剤・コーティング材料などのセラミックス・金属材料、医療材料などの各種用途に適用できる。
T1(VT)<Tp1(VT)<T1(VT)+100 (P7)
T2(VT)<Tp2(VT)<T2(VT)+100 (P8)
T3(VT)<Tp3(VT)<T3(VT)+100 (P9)
この不等式により、複合銀ナノ粒子の特性温度T1、T2、T3を測定することによって、その複合ナノ金属ペーストの特性温度のTp1、Tp2、Tp3を推定することが可能になった。
式(10)及び式(11)は、銀核とその周囲に形成される有機被覆層の構成式を示す。有機被覆層はアルコキシド基ORnの場合もあれば、カルボン酸Rn-1COOHの場合もある。勿論、カルボン酸(脂肪酸)からHが脱離したカルボン酸基Rn-1COOの場合も有る。従って、有機被覆層は、アルコキシド、アルコキシド基、カルボン酸、カルボン酸基、又はそれらの混合形も存在する。
表4は、C1~C12の複合銀ナノ粒子C1AgAL~C12AgALの生成条件(反応条件)と粒子定数の一覧表である。C1からC12へと炭素数が増加すると、生成時間は237分から18分へと短縮され、逆に生成温度は40℃から149℃へと増加する。また、金属核の平均粒径X(nm)は52から11へと減少し、C数が少ないほど平均粒径Xは大きくなる傾向を示す。粒径分布は、C数の増加に応じて小さくなる傾向にあるが、分布の最大値でも100nmより小さかった。分布の最大値は生成時間を短縮すると小さくなる。更に、金属含有率は、C数の増加とともに小さくなるが、最小でも91.3%と大きな値を示す。このことは逆に有機物含有率がC数とともに増加することを意味する。特に注目すべきは、例えばC1AgALの金属核平均粒径がX=52nmであっても、分布は11~92nmまで広く分布し、平均粒径よりもかなり小さな極微細粒子が大量に含有されている事実である。本発明では、前述したようにフォーポケット条件で平均粒径の範囲を決定したが、その平均粒径よりもかなり小さな極微細粒子が大量に存在するため、フォーポケットの小さな隙間にこれらの極微細粒子群が埋設され、焼結により形成される金属層を緻密化する理由にもなっている。この事情は全ての複合銀ナノ粒子に共通する事実である。
式(33)及び式(34)が成立する。最終的に、0<d≦(√3/√2-1)D又は0<d≦0.2247Dが、複合金属ナノ粒子の金属核がフォーポケットPに内入(埋設)される条件である。
表8は、2種金属成分複合ナノ銀ペーストPC1AgAL~PC6AgALの具体的組成表である。複合銀ナノ粒子はCnAgALで表記されるが、2種金属成分複合ナノ銀ペーストはPCnAgALで表現される。2種金属成分とは、CnAgALと銀フィラーである。CnAgALは表4で与えられる複合銀ナノ粒子で、そのw重量%(wt%)と金属核の平均粒径d(nm)が示されている。銀フィラーとは市販されている銀微粒子で、そのW重量%(wt%)と平均粒径D(nm)が示されている。粒径条件とは、表7で与えられる粒径条件であり、具体的なフォーポケット条件を示している。粘度を低下させる溶剤としては、各種溶剤が利用できるが、ここではメタノール、エタノール、ブタノール、キシレン、トルエンが利用されている。また、粘度を増加させる粘性付与剤としては、各種粘性付与剤が利用できるが、ここではテレピンオイル、テルピン誘導体が使用されている。溶剤と粘度付与剤の割合によってペースト粘度を自在に調整できるが、ここでは、溶剤は6.0wt%、粘度付与剤は4.0wt%に固定されている。
表9は、2種金属成分複合ナノ銀ペーストPC7AgAL~PC12AgALの具体的組成表である。複合銀ナノ粒子はCnAgALで表記され、2種金属成分複合ナノ銀ペーストはPCnAgALで表現されている。2種金属成分とは、CnAgALと銀フィラーである。CnAgALは表4で与えられる複合銀ナノ粒子で、そのw重量%(wt%)と金属核の平均粒径d(nm)が示されている。銀フィラーとは市販されている銀微粒子で、そのW重量%(wt%)と平均粒径D(nm)が示されている。粒径条件とは、表7で与えられる粒径条件であり、具体的なスリーポケット条件を示している。粘度を低下させる溶剤としては、各種溶剤が利用できるが、ここではブタノール、エタノール、ヘキサンが利用されている。また、粘度を増加させる粘性付与剤としては、各種粘性付与剤が利用できるが、ここではテレピンオイル、テルピン誘導体が使用されている。溶剤と粘度付与剤の割合によってペースト粘度を自在に調整できるが、ここでも、溶剤は6.0wt%、粘度付与剤は4.0wt%に固定されている。
Tp1<Tp2<Tp3 (P1)
Tp2-100<Tp1<Tp2 (P2)
Tp3≦300 (P3)
以上の結果は、CnAgAL粉体と同様である。
更に、昇温速度VTを1~20(℃/min)で変化させた試験から次の結果が得られた。VTは1(℃/min)≦VT≦20(℃/min)の範囲から選択される。
Tp1(VT)<Tp2(VT)<Tp3(VT) (P4)
Tp2(VT)-100<Tp1(VT)<Tp2(VT)(P5)
Tp3(VT)<Tp3(1℃/min)+100 (P6)
T1(VT)<Tp1(VT)<T1(VT)+100 (P7)
T2(VT)<Tp2(VT)<T2(VT)+100 (P8)
T3(VT)<Tp3(VT)<T3(VT)+100 (P9)
これらの式が意味することは、ペーストの特性温度Tp1、Tp2、Tp3は、粉体の特性温度T1、T2、T3の夫々上側100℃以内に存在する、ということである。
2・・・・リードフレーム
4・・・・リードフレーム
6・・・・複合銀ナノペート層
6a・・・銀層
8・・・・ダイオードチップ
10・・・複合銀ナノペート層
10a・・銀導体層
12・・・複合銀ナノペート層
12a・・銀導体層
14・・・接続端子
16・・・電気炉
18・・・ダイオード樹脂モールド体
20・・・樹脂モールド
22・・・アノード
24・・・カソード
26・・・直流電源
28・・・電流計
VF・・・順方向電圧
ΔVF・・順方向電圧差
Claims (17)
- 平均粒径d(nm)の金属核の周囲に有機被覆層を形成した複合金属ナノ粒子と、平均粒径D(nm)の金属フィラー粒子の2成分を金属成分として含有し、d<Dの第1関係及びd<100(nm)の第2関係を有し、焼結により前記有機被覆層が気散して金属層が形成されるときに、前記平均粒径d及びDの大小関係は、4個の前記金属フィラー粒子が正四面体に接触配置されると仮定した場合に形成される中空のフォーポケットの中に、前記複合金属ナノ粒子が埋設されることが可能であるように設定され、前記複合金属ナノ粒子と前記金属フィラー粒子が緻密に焼結することを特徴とする2種金属成分型複合ナノ金属ペースト。
- 前記平均粒径d及びDの大小関係が、0<d<(√3/√2-1)Dである請求項1に記載の2種金属成分型複合ナノ金属ペースト。
- 前記複合金属ナノ粒子の配合重量w(wt%)と前記金属フィラー粒子の配合重量W(wt%)としたとき、0<k≦1の範囲にあるkを用いて、w/(w+W)の下限値が、接触配置されている4個の前記金属フィラー粒子の中心が形成する正四面体の体積に対する前記フォーポケットの体積比のk倍に設定される請求項1又は2に記載の2種金属成分型複合ナノ金属ペースト。
- 前記w/(w+W)の下限値が、k{1-3√2cos-1(1/3)+π√2}の値に設定される請求項3に記載の2種金属成分型複合ナノ金属ペースト。
- 前記kの値が、0.45≦k≦1の範囲から選択される請求項3又は4に記載の2種金属成分型複合ナノ金属ペースト。
- 4個の前記金属フィラー粒子を相互に離間させて前記4個の金属フィラー粒子の中心により拡大正四面体を形成するとき、前記複合金属ナノ粒子の配合重量w(wt%)と前記金属フィラー粒子の配合重量W(wt%)とするw/(w+W)の上限値が、前記拡大正四面体の外部からそのフォーポケットに他の金属フィラー粒子を内入させることができない条件から決定される請求項1~5のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 前記拡大正四面体において、前記金属フィラー粒子の平均粒径をR、前記金属フィラー粒子間の離間距離を2Δ、Δ/R=x及びxの値が0<x≦1とするとき、前記w/(w+W)の上限値が、1-3√2{cos-1(1/3)―π/3}/(1+x)3の値に設定される請求項6に記載の2種金属成分型複合ナノ金属ペースト。
- 前記複合金属ナノ粒子の配合重量w(wt%)と前記金属フィラー粒子の配合重量W(wt%)としたとき、w/(w+W)の値が、0.10~0.90の範囲に調整される請求項1又は2に記載の2種金属成分型複合ナノ金属ペースト。
- 溶剤及び/又は粘性付与剤を添加した請求項1~8のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 前記複合ナノ金属ペーストを昇温速度VT=1℃/minで大気中熱分析した場合に、ペースト金属化温度Tp3(℃)が300℃以下である請求項1~9のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 前記複合ナノ金属ペーストを昇温速度VT=1~20℃/minで大気中熱分析した場合に、温度単位を℃とするとき、ペースト金属化温度Tp3(VT)が、Tp3(VT)<Tp3(1℃/min)+100を満足する請求項1~9のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 前記複合ナノ金属ペーストを昇温速度VT=1~20℃/minで大気中熱分析した場合に、温度単位を℃とするとき、ペースト分解開始温度Tp1(VT)とペースト分解温度Tp2(VT)が、Tp2(VT)-100<Tp1(VT)<Tp2(VT)を満足する請求項1~9のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 前記複合ナノ金属ペーストを昇温速度VT=1~20℃/minで大気中熱分析した場合に、温度単位を℃とするとき、ペースト分解開始温度Tp1(VT)とペースト分解温度Tp2(VT)とペースト金属化温度Tp3(VT)が、Tp1(VT)<Tp2(VT)<Tp3(VT)の関係を満足しながら前記昇温速度VTの増加に従って増加する請求項1~9のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 温度単位を℃とするとき、昇温速度VT(℃/min)で大気中熱分析した場合における複合金属ナノ粒子の分解開始温度T1(VT)、分解温度T2(VT)及び金属化温度T3(VT)とし、昇温速度VT(℃/min)で大気中熱分析した場合における複合ナノ金属ペーストのペースト分解開始温度Tp1(VT)、ペースト分解温度Tp2(VT)及びペースト金属化温度Tp3(VT)としたとき、T1(VT)<Tp1(VT)<T1(VT)+100、T2(VT)<Tp2(VT)<T2(VT)+100又はT3(VT)<Tp3(VT)<T3(VT)+100の一つ以上が成立する請求項1~9のいずれかに記載の2種金属成分型複合ナノ金属ペースト。
- 請求項1~14のいずれかに記載の2種金属成分型複合ナノ金属ペーストを用意し、前記複合ナノ金属ペーストにより下体と上体の間にペースト層を形成し、加熱により前記ペースト層を金属層に焼結して前記下体と前記上体を接合することを特徴とする接合方法。
- 無荷重下又は荷重下、且つ大気中又は不活性ガス中で、前記下体と前記上体を前記金属層を介して接合したとき、前記上体と前記下体の間に電流印加時における電気抵抗及び前記上体発熱時における前記下体への熱伝導が、前記接合を従来の鉛高含有はんだで行った場合と比較して、小さくなる請求項15に記載の接合方法。
- 請求項15又は16に記載の接合方法により製造されたことを特徴とする電子部品。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2009/062925 WO2011007442A1 (ja) | 2009-07-16 | 2009-07-16 | 2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 |
JP2011522666A JPWO2011007442A1 (ja) | 2009-07-16 | 2009-07-16 | 2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 |
CN2009801605117A CN102438776A (zh) | 2009-07-16 | 2009-07-16 | 二类金属成分型复合纳米金属软膏剂、接合方法及电子部件 |
US13/383,814 US8491998B2 (en) | 2009-07-16 | 2009-07-16 | Composite nanometal paste of two-metallic-component type, bonding method, and electronic part |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2009/062925 WO2011007442A1 (ja) | 2009-07-16 | 2009-07-16 | 2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011007442A1 true WO2011007442A1 (ja) | 2011-01-20 |
Family
ID=43449058
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/062925 WO2011007442A1 (ja) | 2009-07-16 | 2009-07-16 | 2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8491998B2 (ja) |
JP (1) | JPWO2011007442A1 (ja) |
CN (1) | CN102438776A (ja) |
WO (1) | WO2011007442A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102651248A (zh) * | 2011-02-28 | 2012-08-29 | 三星电机株式会社 | 导电金属膏组合物及其制造方法,以及利用其的电子装置的电极和导电电路 |
CN104137192A (zh) * | 2012-02-20 | 2014-11-05 | 株式会社应用纳米粒子研究所 | 含氧供给源的复合纳米金属糊及接合方法 |
CN104203457A (zh) * | 2012-03-30 | 2014-12-10 | 应用纳米粒子研究所株式会社 | 含铜填料复合纳米金属软膏剂及其接合方法 |
JP2016148089A (ja) * | 2015-02-13 | 2016-08-18 | 三菱マテリアル株式会社 | 銀粉及びペースト状組成物並びに銀粉の製造方法 |
WO2017169534A1 (ja) * | 2016-03-30 | 2017-10-05 | 株式会社大阪ソーダ | 導電性接着剤 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6118192B2 (ja) * | 2013-06-21 | 2017-04-19 | Dowaエレクトロニクス株式会社 | 接合材およびそれを用いた接合方法 |
JP6508193B2 (ja) * | 2014-03-11 | 2019-05-08 | 富士電機株式会社 | 半導体装置の製造方法および半導体装置 |
CN103978320B (zh) * | 2014-05-27 | 2016-05-25 | 北京理工大学 | 一种颗粒添加的低银系无铅焊料 |
US10894302B2 (en) * | 2014-06-23 | 2021-01-19 | Alpha Assembly Solutions Inc. | Multilayered metal nano and micron particles |
KR20180055757A (ko) * | 2015-01-09 | 2018-05-25 | 유니버시티 오브 매사추세츠 | Pb-프리 나노솔더의 제조 및 용도 |
US10727186B2 (en) * | 2016-08-05 | 2020-07-28 | Mitsubishi Electric Corporation | Power semiconductor device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06215617A (ja) * | 1993-01-14 | 1994-08-05 | Asahi Chem Ind Co Ltd | 焼成用導電性ペースト |
JP2001176325A (ja) * | 1999-12-21 | 2001-06-29 | Dowa Mining Co Ltd | 導電フイラーおよび導電ペースト |
JP2005203304A (ja) * | 2004-01-19 | 2005-07-28 | Hitachi Chem Co Ltd | 混合導電粉 |
JP2009138242A (ja) * | 2007-12-07 | 2009-06-25 | Dowa Electronics Materials Co Ltd | 低温焼結性銀微粉および銀塗料ならびにそれらの製造法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3205793B2 (ja) | 1996-12-19 | 2001-09-04 | 株式会社巴製作所 | 超微粒子及びその製造方法 |
US6620344B2 (en) * | 1999-05-28 | 2003-09-16 | Dowa Mining Co., Ltd. | Copper particle clusters and powder containing the same suitable as conductive filler of conductive paste |
AU5248600A (en) | 1999-06-15 | 2001-01-02 | Kimoto, Masaaki | Ultrafine composite metal powder and method for producing the same |
US6743395B2 (en) | 2000-03-22 | 2004-06-01 | Ebara Corporation | Composite metallic ultrafine particles and process for producing the same |
JP2003342605A (ja) | 2002-05-21 | 2003-12-03 | Akio Komatsu | 超微粒子、超微粒子結晶膜及び超微粒子結晶の製造方法 |
JP2004107728A (ja) | 2002-09-18 | 2004-04-08 | Ebara Corp | 接合材料及び接合方法 |
US7799425B2 (en) | 2004-02-04 | 2010-09-21 | Ebara Corporation | Composite nanoparticles method for producing the same |
JP4494145B2 (ja) * | 2004-09-16 | 2010-06-30 | 大研化学工業株式会社 | 誘電体前駆溶液、金属複合粒子及び導電性ペースト |
JP4801958B2 (ja) | 2005-09-29 | 2011-10-26 | 東海ゴム工業株式会社 | 導電性ペースト |
JP4614101B2 (ja) | 2006-04-28 | 2011-01-19 | 戸田工業株式会社 | 銀粉及びその製造方法、該銀粉を含有する導電性ペースト |
WO2008065728A1 (fr) * | 2006-11-29 | 2008-06-05 | Nihon Handa Co., Ltd. | Composition de particules métalliques de frittage ayant une plasticité, procédé de production de celle-ci, agent de liaison et procédé de liaison |
JP4872663B2 (ja) * | 2006-12-28 | 2012-02-08 | 株式会社日立製作所 | 接合用材料及び接合方法 |
-
2009
- 2009-07-16 US US13/383,814 patent/US8491998B2/en active Active
- 2009-07-16 CN CN2009801605117A patent/CN102438776A/zh active Pending
- 2009-07-16 WO PCT/JP2009/062925 patent/WO2011007442A1/ja active Application Filing
- 2009-07-16 JP JP2011522666A patent/JPWO2011007442A1/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06215617A (ja) * | 1993-01-14 | 1994-08-05 | Asahi Chem Ind Co Ltd | 焼成用導電性ペースト |
JP2001176325A (ja) * | 1999-12-21 | 2001-06-29 | Dowa Mining Co Ltd | 導電フイラーおよび導電ペースト |
JP2005203304A (ja) * | 2004-01-19 | 2005-07-28 | Hitachi Chem Co Ltd | 混合導電粉 |
JP2009138242A (ja) * | 2007-12-07 | 2009-06-25 | Dowa Electronics Materials Co Ltd | 低温焼結性銀微粉および銀塗料ならびにそれらの製造法 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102651248A (zh) * | 2011-02-28 | 2012-08-29 | 三星电机株式会社 | 导电金属膏组合物及其制造方法,以及利用其的电子装置的电极和导电电路 |
JP2012182111A (ja) * | 2011-02-28 | 2012-09-20 | Samsung Electro-Mechanics Co Ltd | 導電性金属ペースト組成物及びその製造方法 |
CN104137192A (zh) * | 2012-02-20 | 2014-11-05 | 株式会社应用纳米粒子研究所 | 含氧供给源的复合纳米金属糊及接合方法 |
CN104203457A (zh) * | 2012-03-30 | 2014-12-10 | 应用纳米粒子研究所株式会社 | 含铜填料复合纳米金属软膏剂及其接合方法 |
EP2832472A4 (en) * | 2012-03-30 | 2015-07-29 | Applied Nanoparticle Lab Corp | COMPOSITE NANOMETAL PASTE WITH A COPPER FILL AND COMPOUND PROCESS |
JP2016148089A (ja) * | 2015-02-13 | 2016-08-18 | 三菱マテリアル株式会社 | 銀粉及びペースト状組成物並びに銀粉の製造方法 |
WO2017169534A1 (ja) * | 2016-03-30 | 2017-10-05 | 株式会社大阪ソーダ | 導電性接着剤 |
JPWO2017169534A1 (ja) * | 2016-03-30 | 2019-02-28 | 株式会社大阪ソーダ | 導電性接着剤 |
Also Published As
Publication number | Publication date |
---|---|
US8491998B2 (en) | 2013-07-23 |
US20120114972A1 (en) | 2012-05-10 |
JPWO2011007442A1 (ja) | 2012-12-20 |
CN102438776A (zh) | 2012-05-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2011007442A1 (ja) | 2種金属成分型複合ナノ金属ペースト、接合方法及び電子部品 | |
WO2011007608A1 (ja) | 3金属成分型複合ナノ金属ペースト、接合方法及び電子部品 | |
JP4973830B2 (ja) | 導電性組成物、導電性ペースト及び導電性皮膜 | |
Tian et al. | Sintering mechanism of the Cu–Ag core–shell nanoparticle paste at low temperature in ambient air | |
EP2906027B1 (en) | Lead solder-free electronics | |
JP5256281B2 (ja) | 複合銀ナノペースト、その製法及びナノペースト接合方法 | |
JP6349310B2 (ja) | 金属接合用組成物 | |
KR101387374B1 (ko) | 은 입자 분말 및 이의 제조법 | |
JP4680313B2 (ja) | 複合銀ナノ粒子、複合銀ナノペースト、その製法、製造装置、接合方法及びパターン形成方法 | |
JP2015004122A (ja) | 金属ナノ粒子ペースト、それを含有する接合材料、およびそれを用いた半導体装置 | |
WO2019188511A1 (ja) | 銅ペースト、接合方法および接合体の製造方法 | |
US20110031001A1 (en) | Composite metal fine particle material, metal film and manufacturing method of the metal film, and printed wiring board and cable | |
JP6153076B2 (ja) | 金属ナノ粒子ペースト、それを含有する接合材料、及びそれを用いた半導体装置 | |
JP5750259B2 (ja) | 導電性金属ペースト | |
JP6270241B2 (ja) | 接合材料及びそれを用いた半導体装置 | |
WO2019142633A1 (ja) | 接合用組成物 | |
JP2015056392A (ja) | 導電性ペースト材料の製造と製造方法 | |
JP5124822B2 (ja) | 複合金属粉体およびその分散液の製造法 | |
WO2015159480A1 (ja) | 接合用組成物及びそれを用いた金属接合体 | |
JP2021059770A (ja) | 複合金属粒子及びその製造方法、複合金属粒子含有組成物、並びに物品 | |
JP2019200867A (ja) | アスペクト比と形状との各々が自在に変えられる導電性膜の製造方法 | |
JP5306322B2 (ja) | 複合銀ナノペースト、その製法、接合方法及びパターン形成方法 | |
WO2016038965A1 (ja) | 金属材料、及びそれを用いた電子部品 | |
JP2015194415A (ja) | ニッケル微粒子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200980160511.7 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09847340 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13383814 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2011522666 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 09847340 Country of ref document: EP Kind code of ref document: A1 |