WO2010146998A1 - Dispositif de revêtement d'un substrat - Google Patents

Dispositif de revêtement d'un substrat Download PDF

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Publication number
WO2010146998A1
WO2010146998A1 PCT/JP2010/059428 JP2010059428W WO2010146998A1 WO 2010146998 A1 WO2010146998 A1 WO 2010146998A1 JP 2010059428 W JP2010059428 W JP 2010059428W WO 2010146998 A1 WO2010146998 A1 WO 2010146998A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
coating
nozzle
mask film
coating liquid
Prior art date
Application number
PCT/JP2010/059428
Other languages
English (en)
Japanese (ja)
Inventor
五十川良則
織田光徳
山本稔
川口敬史
田辺雅明
平田英生
Original Assignee
タツモ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by タツモ株式会社 filed Critical タツモ株式会社
Publication of WO2010146998A1 publication Critical patent/WO2010146998A1/fr

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • B05B12/22Masking elements, i.e. elements defining uncoated areas on an object to be coated movable relative to the spray area
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • B05B12/24Masking elements, i.e. elements defining uncoated areas on an object to be coated made at least partly of flexible material, e.g. sheets of paper or fabric
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • B05C5/0229Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet the valve being a gate valve or a sliding valve
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0245Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
    • B05C5/025Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web only at particular part of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • B05C5/0262Coating heads with slot-shaped outlet adjustable in width, i.e. having lips movable relative to each other in order to modify the slot width, e.g. to close it
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • B05C5/0266Coating heads with slot-shaped outlet adjustable in length, e.g. for coating webs of different width

Definitions

  • a nozzle is scanned relative to a plate-like substrate such as a glass substrate in one direction within a horizontal plane while maintaining a constant interval, and a coating solution such as a resist solution is ejected from the nozzle.
  • the present invention relates to a substrate coating apparatus for coating a coating liquid on a coating surface.
  • a slit-like nozzle is provided along a predetermined scanning direction perpendicular to the longitudinal direction of the nozzle with a gap provided between the surface of the substrate.
  • a substrate coating apparatus that scans relative to the surface of the substrate is used.
  • the pressure of the pump that supplies the coating liquid to the nozzle and the mechanical vibration applied to the substrate are measured, and the beat shape of the coating liquid is estimated based on this measurement result, so that an appropriate beat shape is obtained.
  • the coating liquid may be applied to a part of the surface of the substrate.
  • the coating liquid is intermittently discharged from a nozzle that moves relative to the surface of the substrate.
  • each of the plurality of supply paths arranged along the longitudinal direction of the nozzle can be opened and closed, and only the supply path arranged at a position not facing the coating area is closed. There was a thing.
  • the plurality of supply paths leading to the nozzles are arranged at predetermined intervals. For this reason, when applying the coating liquid to a plurality of application areas divided along the longitudinal direction of the nozzle on the surface of the substrate, the boundary position of the application area and the arrangement interval of the supply path do not always coincide with each other. It was difficult to accurately apply the coating liquid to the predetermined coating area without excess or deficiency.
  • An object of the present invention is to apply a coating solution to a plurality of coating areas divided along the longitudinal direction of the nozzle on the surface of the substrate without discontinuity by arranging a sheet-like mask between the nozzle and the surface of the substrate.
  • An object of the present invention is to provide a coating apparatus for a substrate that can be used.
  • the substrate coating apparatus includes a nozzle and a mask film.
  • the nozzle should move relative to the surface of the substrate along a predetermined scanning direction at a position where a predetermined gap is provided between the surface and the surface of the plate-shaped substrate, and should be applied to the surface of the plate-shaped substrate.
  • the coating liquid is discharged.
  • the mask film is disposed in contact with the nozzle, and an opening is formed opposite the coating area where the coating liquid is to be applied on the surface of the substrate.
  • ⁇ Mask film with an opening formed partially contacts the nozzle The nozzle is partially closed by a mask film, and the coating liquid is applied to the surface of the substrate only from the range facing the opening of the nozzle.
  • the opening is formed in a range facing the coating area on the surface of the substrate in the mask film. Therefore, the coating solution is applied without excess or deficiency only to the coating region on the surface of the substrate.
  • pressure control means for controlling the air pressure between the mask film and the surface of the substrate on the upstream side in the scanning direction.
  • a plurality of types of openings having different widths in the direction orthogonal to the scanning direction are formed in the mask film along the scanning direction, and a mechanism for moving the mask film along the scanning direction is provided so as to be orthogonal to the scanning direction.
  • the coating liquid can be accurately applied to a plurality of application regions having different widths in the direction.
  • the coating liquid can be applied to the plurality of coating areas divided along the direction orthogonal to the nozzle scanning direction on the surface of the substrate without excess or deficiency.
  • FIG. 1 is a perspective view showing a schematic configuration of a substrate coating apparatus according to a first embodiment of the present invention. It is side surface sectional drawing which shows the application
  • a substrate coating apparatus 10 includes a slit nozzle 1, a table 2, a mask film 3, and a pressure regulating chamber 4.
  • the slit nozzle 1 is a nozzle of the present invention, and discharges the coating liquid from a slit parallel to the arrow X direction provided on the bottom surface.
  • the table 2 has a plate-like substrate 100 placed on the upper surface.
  • the slit nozzle 1 moves relative to the substrate 100 along the scanning direction of the present invention orthogonal to the arrow X direction.
  • the table 2 moves in the arrow Y1 direction via a drive mechanism (not shown).
  • the slit nozzle 1 is supplied with a coating liquid from a pump (not shown).
  • the discharge amount of the coating liquid from the slit nozzle 1 is controlled by the supply amount of the coating liquid from the pump.
  • the pump is a plunger-type or syringe-type metering pump capable of strictly controlling the discharge amount of the coating liquid.
  • the mask film 3 is formed by cutting out the openings 31 and 32 using a sheet-like resin as a material.
  • the mask film 3 is disposed so as to contact the bottom surface of the slit nozzle 1 from below.
  • the mask film 3 may be made of a silk screen mesh that is shielded from portions other than the openings 31 and 32 by screen printing plate making technology.
  • the coating liquid is discharged onto the surface of the substrate 100 only from the range where the openings 31 and 32 of the mask film 3 in the slit 11 face each other.
  • application areas 101 and 102 to which the application liquid is to be applied are set in advance.
  • the openings 31 and 32 are formed in portions facing the application regions 101 and 102.
  • the pressure regulating chamber 4 is a pressure control means of the present invention, and is arranged close to the upstream side in the direction of arrow Y1, which is the relative movement direction of the slit nozzle 1 with respect to the substrate 100, and the slit nozzle 1, the mask film 3, and the substrate. Control the air pressure between 100 surfaces.
  • the gap between the slit nozzle 1 on the upstream side in the arrow Y1 direction and the surface of the substrate 100 is Control the atmospheric pressure.
  • the beat shape of the coating liquid 12 discharged from the slit nozzle 1 can be adjusted, and the coating state of the coating liquid on the surface of the substrate 100 can be made appropriate.
  • FIG. 2 only the opening 31 is shown, and the opening 32 is not shown. Further, when it is not necessary to adjust the beat shape of the coating liquid 12, the pressure regulating chamber 4 can be omitted.
  • openings 31 and 32 are formed in the mask film 3.
  • the coating liquid is applied to the substrate 100 using the mask film 3 to the coating areas 101 and 102 on the surface of the substrate 100 as shown in FIG. Further, by stopping the discharge of the coating liquid from the temporary slit nozzle 1 while the table 2 is moving, the coating liquid is applied to the coating areas 111 to 114 on the surface of the substrate 110 as shown in FIG. Is done.
  • the formation positions of the openings 31 and 32 in the mask film 3 coincide with the application areas 101 and 102 or the application areas 111 to 114 set in advance on the surface of the substrate 100 or 110. .
  • the coating liquid can be applied to the coating regions 101 and 102 or the coating regions 111 to 114 without excess or deficiency, and the boundary between the coating regions 101 and 102 or the coating regions 111 to 114 can be accurately formed.
  • a substrate coating apparatus 300 includes rollers 311 and 312 in addition to the substrate coating apparatus 10 shown in FIG.
  • the rollers 311 and 312 are rotatably supported by a frame (not shown), and the end portion 300A side and the end portion 300B side of the mask film 300 are fixed to the respective peripheral surfaces.
  • the rollers 311 and 312 are supplied with rotations in the directions of arrows K and L from motors 321 and 322, respectively.
  • the motors 321 and 322 are driven alternatively.
  • rotation in the arrow K direction is supplied to the roller 311, the end portion 300 ⁇ / b> A side of the mask film 300 is wound around the peripheral surface of the roller 311, and the mask film 300 moves in the arrow M direction.
  • the motor 322 is driven, the rotation in the arrow L direction is supplied to the roller 312, the end portion 300 ⁇ / b> B side of the mask film 300 is wound around the peripheral surface of the roller 312, and the mask film 300 moves in the arrow N direction.
  • the mask film 300 has openings 301 to 303 formed therein.
  • the openings 301 and 302 are formed side by side in the arrow X direction.
  • the opening 303 is formed side by side in the arrow Y direction with respect to the openings 301 and 302, and has a width comparable to the entire area of the openings 301 and 302 in the arrow X direction.
  • the motor 321 is driven in advance so that the opening 303 faces the bottom surface of the slit nozzle 1. deep.
  • the table 2 is moved in the direction of the arrow Y1, and the slit nozzle 1 starts applying the coating liquid from the coating area slit nozzle 1 on the substrate surface.
  • the coating liquid is applied to the coating region 123 on the downstream side in the arrow Y1 direction on the surface of the substrate 120.
  • the discharge of the coating liquid is once stopped, the motor 322 is driven to move the mask film 300 in the direction of arrow N, and the bottom surface of the slit nozzle 1 The openings 301 and 302 are opposed to each other. Thereafter, the discharge of the coating liquid from the slit nozzle 1 is resumed when the slit nozzle 1 reaches the downstream end of the coating areas 121 and 122.
  • the discharge of the application liquid is stopped.
  • the coating solution can be applied to the coating regions 121 to 123 on the surface of the substrate 120.
  • the rollers 311 and 312 may supply rotation from a single motor via a belt or gear.
  • the mask film 300 can be supported by using a member other than the rollers 311 and 312 on the condition that the mask film 300 can be moved in the arrow M direction and the arrow N direction.

Landscapes

  • Coating Apparatus (AREA)

Abstract

L'invention concerne un dispositif de revêtement de substrat (10) qui est équipé d'une buse fendue (1) et d'un film de masquage (3). Le film de masquage (3) vient en butée par le dessous contre la fente au bas de la buse fendue (1). Des sections ouvertes (31, 32) sont formées dans le film de masquage (3). La position des sections ouvertes (31, 32) dans la direction de la flèche X correspond à la position des régions de revêtement prédéterminées (101, 102) sur la surface d'un substrat (100). La fente de la buse fendue (1) est fermée au niveau de sections du film de masquage (3) qui sont à l'extérieur des sections ouvertes (31, 32). Un liquide de revêtement revêt exclusivement les régions de revêtement (101, 102) sur la surface du substrat (100) lorsque le liquide de revêtement est appliqué par la buse fendue (1).
PCT/JP2010/059428 2009-06-19 2010-06-03 Dispositif de revêtement d'un substrat WO2010146998A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009146781 2009-06-19
JP2009-146781 2009-06-19

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WO2010146998A1 true WO2010146998A1 (fr) 2010-12-23

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WO (1) WO2010146998A1 (fr)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014022545A (ja) * 2012-07-18 2014-02-03 Tokyo Electron Ltd 塗布装置及び塗布方法
US11203037B2 (en) * 2013-12-31 2021-12-21 Johnson & Johnson Consumer Inc. Apparatus for forming a shaped film product
US11241708B2 (en) 2019-04-12 2022-02-08 Airbus Operations Gmbh Device for lacquer transfer
US11247226B2 (en) 2013-12-31 2022-02-15 Johnson & Johnson Consumer Inc. Process for forming a multilayered shaped film product
US11267014B2 (en) 2019-03-29 2022-03-08 Airbus Operations Gmbh Device for lacquer transfer
DE102020006845A1 (de) 2020-11-06 2022-05-12 Mühlbauer Gmbh & Co. Kg Verfahren und Vorrichtung zur Herstellung einer Membran-Elektroden-Anordnung
US11331688B2 (en) 2019-03-29 2022-05-17 Airbus Operations Gmbh Device for lacquer transfer
US11369987B2 (en) 2019-03-29 2022-06-28 Airbus Operations Gmbh Device and system
US11413650B2 (en) 2019-04-11 2022-08-16 Airbus Operations Gmbh Lacquer transfer device
CN115069467A (zh) * 2021-09-07 2022-09-20 裕晨科技股份有限公司 液态金属喷涂装置及其喷涂方法
US11504739B2 (en) 2019-03-29 2022-11-22 Airbus Operations Gmbh Device for lacquer transfer

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103246165B (zh) * 2013-04-25 2015-03-25 深圳市华星光电技术有限公司 一种光阻涂布装置及其涂布方法
CN114700237B (zh) * 2022-03-30 2023-06-02 合肥维信诺科技有限公司 一种涂布机以及涂布方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0857396A (ja) * 1994-08-26 1996-03-05 Chugai Ro Co Ltd ダイコータ
JPH09286955A (ja) * 1996-04-22 1997-11-04 Dainippon Printing Co Ltd パターン形成用ペーストおよびパターン形成方法
JPH11172169A (ja) * 1997-12-11 1999-06-29 Dainippon Printing Co Ltd パターン形成用ペースト及びパターン形成方法
JPH11245368A (ja) * 1998-02-27 1999-09-14 Canon Inc 印刷機及び画像形成装置の製造方法
JP2003191588A (ja) * 2001-12-25 2003-07-09 Shinji Kanda パターン印刷方法及び装置
JP2003257654A (ja) * 2001-12-25 2003-09-12 Hitachi Ltd 画像表示装置およびその製造方法
JP2005095757A (ja) * 2003-09-24 2005-04-14 Dainippon Printing Co Ltd ペ−スト塗布方法及びペ−スト塗布装置
JP2007160643A (ja) * 2005-12-13 2007-06-28 Micro-Tec Co Ltd スクリーン印刷用具及びスクリーン印刷機及びスクリーン印刷方法
JP2009073005A (ja) * 2007-09-20 2009-04-09 Nec Corp スクリーン印刷方法及びスクリーン印刷装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0857396A (ja) * 1994-08-26 1996-03-05 Chugai Ro Co Ltd ダイコータ
JPH09286955A (ja) * 1996-04-22 1997-11-04 Dainippon Printing Co Ltd パターン形成用ペーストおよびパターン形成方法
JPH11172169A (ja) * 1997-12-11 1999-06-29 Dainippon Printing Co Ltd パターン形成用ペースト及びパターン形成方法
JPH11245368A (ja) * 1998-02-27 1999-09-14 Canon Inc 印刷機及び画像形成装置の製造方法
JP2003191588A (ja) * 2001-12-25 2003-07-09 Shinji Kanda パターン印刷方法及び装置
JP2003257654A (ja) * 2001-12-25 2003-09-12 Hitachi Ltd 画像表示装置およびその製造方法
JP2005095757A (ja) * 2003-09-24 2005-04-14 Dainippon Printing Co Ltd ペ−スト塗布方法及びペ−スト塗布装置
JP2007160643A (ja) * 2005-12-13 2007-06-28 Micro-Tec Co Ltd スクリーン印刷用具及びスクリーン印刷機及びスクリーン印刷方法
JP2009073005A (ja) * 2007-09-20 2009-04-09 Nec Corp スクリーン印刷方法及びスクリーン印刷装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014022545A (ja) * 2012-07-18 2014-02-03 Tokyo Electron Ltd 塗布装置及び塗布方法
US11203037B2 (en) * 2013-12-31 2021-12-21 Johnson & Johnson Consumer Inc. Apparatus for forming a shaped film product
US11247226B2 (en) 2013-12-31 2022-02-15 Johnson & Johnson Consumer Inc. Process for forming a multilayered shaped film product
US11267014B2 (en) 2019-03-29 2022-03-08 Airbus Operations Gmbh Device for lacquer transfer
US11331688B2 (en) 2019-03-29 2022-05-17 Airbus Operations Gmbh Device for lacquer transfer
US11369987B2 (en) 2019-03-29 2022-06-28 Airbus Operations Gmbh Device and system
US11504739B2 (en) 2019-03-29 2022-11-22 Airbus Operations Gmbh Device for lacquer transfer
US11413650B2 (en) 2019-04-11 2022-08-16 Airbus Operations Gmbh Lacquer transfer device
US11241708B2 (en) 2019-04-12 2022-02-08 Airbus Operations Gmbh Device for lacquer transfer
DE102020006845A1 (de) 2020-11-06 2022-05-12 Mühlbauer Gmbh & Co. Kg Verfahren und Vorrichtung zur Herstellung einer Membran-Elektroden-Anordnung
WO2022096552A1 (fr) 2020-11-06 2022-05-12 Muehlbauer GmbH & Co. KG Procédé et dispositif de fabrication d'un assemblage membrane-électrodes
CN115069467A (zh) * 2021-09-07 2022-09-20 裕晨科技股份有限公司 液态金属喷涂装置及其喷涂方法

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