WO2010113611A1 - Dispositif de génération de gaz de fluor - Google Patents

Dispositif de génération de gaz de fluor Download PDF

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Publication number
WO2010113611A1
WO2010113611A1 PCT/JP2010/054061 JP2010054061W WO2010113611A1 WO 2010113611 A1 WO2010113611 A1 WO 2010113611A1 JP 2010054061 W JP2010054061 W JP 2010054061W WO 2010113611 A1 WO2010113611 A1 WO 2010113611A1
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Prior art keywords
gas
fluorine gas
hydrogen fluoride
fluorine
inner tube
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Application number
PCT/JP2010/054061
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English (en)
Japanese (ja)
Inventor
毛利勇
八尾章史
宮崎達夫
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セントラル硝子株式会社
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Application filed by セントラル硝子株式会社 filed Critical セントラル硝子株式会社
Priority to CN2010800147025A priority Critical patent/CN102369311A/zh
Priority to EP10758387A priority patent/EP2415906A4/fr
Publication of WO2010113611A1 publication Critical patent/WO2010113611A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C25B15/021—Process control or regulation of heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features

Definitions

  • the present invention relates to a fluorine gas generator.
  • JP2004-43885A includes an electrolytic bath for electrolyzing hydrogen fluoride in an electrolytic bath made of a molten salt containing hydrogen fluoride, and generates a product gas containing fluorine gas as a main component in the first gas phase portion on the anode side.
  • a fluorine gas generation device that generates a by-product gas mainly containing hydrogen gas in a second gas phase portion on the cathode side is disclosed.
  • hydrogen fluoride gas vaporized from molten salt is mixed into fluorine gas generated from the anode of the electrolytic cell.
  • JP 2004-39740A discloses that a fluorine gas component and a component other than the fluorine gas component are cooled using liquid nitrogen or the like, and the fluorine gas is separated using the difference between the boiling points of the two.
  • the solidification amount of the component other than the fluorine gas component solidified by cooling is a predetermined amount or more. In that case, it was necessary to stop the fluorine gas generator itself in order to remove the solidified component. Since it takes time to remove the solidified component and time to restart the fluorine gas generation device from when the fluorine gas generation device is stopped to restart, the fluorine gas generation device takes a considerable amount of time. Must be stopped. While the fluorine gas generator is stopped, the fluorine gas cannot be supplied to the external device that consumes the fluorine gas.
  • the present invention has been made in view of the above problems, and an object of the present invention is to provide a fluorine gas generation device capable of stably supplying fluorine gas to an external device.
  • the present invention relates to a fluorine gas generating device that generates fluorine gas by electrolyzing hydrogen fluoride in a molten salt, the fluorine generated at an anode in which the molten salt is stored and immersed in the molten salt.
  • the first gas chamber in which main gas mainly composed of gas is guided and the second chamber in which by-product gas mainly composed of hydrogen gas generated at the cathode immersed in the molten salt is guided are melted.
  • Purify fluorine gas by collecting electrolytic cells separated on the surface of the salt solution and collecting hydrogen fluoride gas that is vaporized from the molten salt in the electrolytic cell and mixed in the main gas generated from the anode.
  • the purification apparatus stopped by the operation switching supplies fluorine gas to the gas inflow part after hydrogen fluoride is discharged from the gas inflow part. Since it is in a standby state, it can be driven anytime. For this reason, the accumulated amount of solidified hydrogen fluoride in the operating purification apparatus increases, and the standby purification apparatus can be started even when the purification apparatus is stopped. Therefore, it is not necessary to stop the fluorine gas generation device itself, and the fluorine gas can be stably supplied to the external device.
  • FIG. 1 is a system diagram of a fluorine gas generation device according to an embodiment of the present invention.
  • FIG. 2 is a system diagram of the purification apparatus.
  • FIG. 3 is a graph showing changes in pressure and temperature in the inner tube of the refining device with time, a solid line indicates the pressure, and a one-dot chain line indicates the temperature.
  • the fluorine gas generation device 100 generates fluorine gas by electrolysis and supplies the generated fluorine gas to the external device 4.
  • the external device 4 is, for example, a semiconductor manufacturing device. In that case, the fluorine gas is used as a cleaning gas in, for example, a semiconductor manufacturing process.
  • the fluorine gas generation device 100 includes an electrolytic cell 1 that generates fluorine gas by electrolysis, a fluorine gas supply system 2 that supplies the fluorine gas generated from the electrolytic cell 1 to the external device 4, and the generation of fluorine gas.
  • the electrolytic bath 1 stores a molten salt containing hydrogen fluoride (HF).
  • HF hydrogen fluoride
  • KF potassium fluoride
  • the inside of the electrolytic cell 1 is partitioned into an anode chamber 11 and a cathode chamber 12 by a partition wall 6 immersed in the molten salt.
  • the anode 7 and the cathode 8 are immersed, respectively.
  • the first air chamber 11a and the second air chamber 12a are completely separated by the partition wall 6 in order to prevent a reaction due to the contact of fluorine gas and hydrogen gas.
  • the molten salt in the anode chamber 11 and the cathode chamber 12 is not separated by the partition wall 6 but communicates through the lower portion of the partition wall 6. Since the melting point of KF ⁇ 2HF is 71.7 ° C., the temperature of the molten salt is adjusted to 90 to 100 ° C. In each of the fluorine gas and the hydrogen gas generated from the anode 7 and the cathode 8 of the electrolytic cell 1, hydrogen fluoride is vaporized from the molten salt by the vapor pressure and mixed.
  • each of the fluorine gas generated at the anode 7 and guided to the first air chamber 11a and the hydrogen gas generated at the cathode 8 and guided to the second air chamber 12a includes hydrogen fluoride gas.
  • the electrolytic cell 1 is provided with a first pressure gauge 13 for detecting the pressure in the first air chamber 11a and a second pressure gauge 14 for detecting the pressure in the second air chamber 12a.
  • the detection results of the first pressure gauge 13 and the second pressure gauge 14 are output to the controllers 10a and 10b.
  • the fluorine gas supply system 2 will be described.
  • a first main passage 15 for supplying fluorine gas to the external device 4 is connected to the first air chamber 11a.
  • the first main passage 15 is provided with a first pump 17 for deriving and transporting fluorine gas from the first air chamber 11a.
  • a positive displacement pump such as a bellows pump or a diaphragm pump is used.
  • a first return passage 18 Connected to the first main passage 15 is a first return passage 18 that connects the discharge side and the suction side of the first pump 17.
  • the first reflux passage 18 is provided with a first pressure adjusting valve 19 for returning the fluorine gas discharged from the first pump 17 to the suction side of the first pump 17.
  • the opening degree of the first pressure regulating valve 19 is controlled by a signal output from the controller 10a.
  • the controller 10a controls the opening degree of the first pressure regulating valve 19 based on the detection result of the first pressure gauge 13 so that the pressure in the first air chamber 11a becomes a predetermined set value. Control.
  • the downstream end of the first return passage 18 is connected to the vicinity of the first pump 17 in the first main passage 15, but the downstream end of the first return passage 18 is connected to the first air chamber 11a. You may make it do. That is, you may make it return the fluorine gas discharged from the 1st pump 17 in the 1st air chamber 11a.
  • a purification device 16 is provided upstream of the first pump 17 in the first main passage 15 to collect the hydrogen fluoride gas mixed in the main raw gas and purify the fluorine gas.
  • the refining device 16 is a deep-cooling refining device that separates and removes hydrogen fluoride gas from fluorine gas using the difference in boiling point between fluorine and hydrogen fluoride.
  • the purifier 16 includes two systems, a first purifier 16a and a second purifier 16b, provided in parallel, and is switched so that the fluorine gas passes through only one of the systems. That is, when one of the first refining device 16a and the second refining device 16b is in an operating state, the other is stopped or in a standby state.
  • two purification apparatuses 16 are arranged in parallel and configured in two systems, but three or more purification apparatuses 16 are arranged in parallel and configured in three or more systems. Good.
  • a first buffer tank 21 for storing the fluorine gas transported by the first pump 17 is provided downstream of the first pump 17 in the first main passage 15.
  • the fluorine gas stored in the first buffer tank 21 is supplied to the external device 4.
  • a flow meter 26 that detects the flow rate of the fluorine gas supplied to the external device 4 is provided downstream of the first buffer tank 21.
  • the detection result of the flow meter 26 is output to the controller 10c.
  • the controller 10 c controls the current value supplied between the anode 7 and the cathode 8 from the power source 9 based on the detection result of the flow meter 26.
  • the amount of fluorine gas generated in the anode 7 is controlled so that the amount of fluorine gas supplied from the first buffer tank 21 to the external device 4 is replenished to the first buffer tank 21.
  • the amount of fluorine gas generated at the anode 7 is controlled so as to supplement the amount of fluorine gas supplied to the external device 4, so that the internal pressure of the first buffer tank 21 is higher than atmospheric pressure. Maintained.
  • the external device 4 side where fluorine gas is used is atmospheric pressure, if the valve provided in the external device 4 is opened, the pressure difference between the first buffer tank 21 and the external device 4 As a result, the fluorine gas is supplied from the first buffer tank 21 to the external device 4.
  • a branch passage 22 is connected to the first buffer tank 21, and a pressure regulating valve 23 that controls the internal pressure of the first buffer tank 21 is provided in the branch passage 22.
  • the first buffer tank 21 is provided with a pressure gauge 24 that detects the internal pressure. The detection result of the pressure gauge 24 is output to the controller 10d.
  • the controller 10d opens the pressure regulating valve 23 when the internal pressure of the first buffer tank 21 exceeds a predetermined set value, specifically 1.0 MPa, and the fluorine in the first buffer tank 21 is opened. Exhaust the gas.
  • the pressure adjustment valve 23 controls the internal pressure of the first buffer tank 21 so as not to exceed the predetermined pressure.
  • a second buffer tank 50 for storing the fluorine gas discharged from the first buffer tank 21 is provided downstream of the pressure regulating valve 23 in the branch passage 22. That is, when the internal pressure of the first buffer tank 21 exceeds a predetermined pressure, the fluorine gas in the first buffer tank 21 is discharged through the pressure adjustment valve 23, and the discharged fluorine gas is discharged to the second buffer tank 50. Led to.
  • the second buffer tank 50 has a smaller volume than the first buffer tank 21.
  • a pressure regulating valve 51 that controls the internal pressure of the second buffer tank 50 is provided downstream of the second buffer tank 50 in the branch passage 22.
  • the second buffer tank 50 is provided with a pressure gauge 52 that detects the internal pressure. The detection result of the pressure gauge 52 is output to the controller 10f.
  • the controller 10f controls the opening degree of the pressure adjustment valve 51 so that the internal pressure of the second buffer tank 50 becomes a predetermined set value.
  • the fluorine gas discharged from the second buffer tank 50 through the pressure regulating valve 51 is rendered harmless by the abatement part 53 and released.
  • the pressure adjustment valve 51 controls the internal pressure of the second buffer tank 50 to be the set value.
  • Connected to the second buffer tank 50 is a fluorine gas supply passage 54 for supplying fluorine gas to the purifier 16.
  • a second main passage 30 for discharging hydrogen gas to the outside is connected to the second air chamber 12a.
  • the second main passage 30 is provided with a second pump 31 for deriving and transporting hydrogen gas from the second air chamber 12a.
  • the second main passage 30 is connected to a second recirculation passage 32 that connects the discharge side and the suction side of the second pump 31.
  • the second reflux passage 32 is provided with a second pressure adjusting valve 33 for returning the hydrogen gas discharged from the second pump 31 to the suction side of the second pump 31.
  • the opening degree of the second pressure regulating valve 33 is controlled by a signal output from the controller 10b. Specifically, the controller 10b sets the opening of the second pressure regulating valve 33 based on the detection result of the second pressure gauge 14 so that the pressure in the second air chamber 12a becomes a predetermined set value. Control.
  • the pressures in the first air chamber 11a and the second air chamber 12a are controlled so as to have preset values by the first pressure adjusting valve 19 and the second pressure adjusting valve 33, respectively.
  • the set pressure of the first air chamber 11a and the second air chamber 12a is set so that a liquid level difference between the liquid level of the molten salt in the first air chamber 11a and the liquid level of the molten salt in the second air chamber 12a does not occur. It is desirable to control to an equivalent pressure.
  • An abatement part 34 is provided downstream of the second pump 31 in the second main passage 30, and the hydrogen gas transported by the second pump 31 is rendered harmless by the abatement part 34 and released.
  • the fluorine gas generation device 100 also includes a raw material supply system 5 that supplies hydrogen fluoride, which is a raw material of fluorine gas, into the molten salt of the electrolytic cell 1.
  • the raw material supply system 5 will be described.
  • a raw material supply passage 41 that guides hydrogen fluoride supplied from a hydrogen fluoride supply source 40 into the molten salt of the electrolytic cell 1 is connected to the electrolytic cell 1.
  • the raw material supply passage 41 is provided with a flow rate control valve 42 for controlling the supply flow rate of hydrogen fluoride.
  • a current integrator 43 that integrates the current supplied between the anode 7 and the cathode 8 is attached to the power source 9. The current accumulated by the current accumulator 43 is output to the controller 10e.
  • the controller 10e controls the supply flow rate of hydrogen fluoride guided into the molten salt by opening and closing the flow rate control valve 42 based on the signal input from the current accumulator 43. Specifically, the supply flow rate of hydrogen fluoride is controlled so as to supply hydrogen fluoride electrolyzed in the molten salt. More specifically, the supply flow rate of hydrogen fluoride is controlled so that the concentration of hydrogen fluoride in the molten salt falls within a predetermined range.
  • the raw material supply passage 41 is connected to a carrier gas supply passage 46 that guides the carrier gas supplied from the carrier gas supply source 45 into the raw material supply passage 41.
  • the carrier gas supply passage 46 is provided with a cutoff valve 47 that switches between supply and cutoff of the carrier gas.
  • the carrier gas is a gas for introducing hydrogen fluoride into the molten salt, and nitrogen gas which is an inert gas is used.
  • the shut-off valve 47 is basically open, and nitrogen gas is supplied into the molten salt in the cathode chamber 12 of the electrolytic cell 1.
  • the nitrogen gas is hardly dissolved in the molten salt and is discharged from the second air chamber 12a through the byproduct gas processing system 3.
  • nitrogen gas since nitrogen gas is supplied into the molten salt of the electrolytic cell 1, the molten salt liquid level of the electrolytic cell 1 may be pushed up by the nitrogen gas.
  • the shutoff valve 47 may be controlled to open and close. That is, when the molten salt liquid level in the electrolytic cell 1 reaches the upper limit of the variable range, the shutoff valve 47 may be closed. Instead of the shutoff valve 47, a flow rate control valve capable of controlling the flow rate of nitrogen gas may be provided. Next, overall control of the fluorine gas generation device 100 configured as described above will be described. The flow rate of the fluorine gas used in the external device 4 is detected by a flow meter 26 provided between the first buffer tank 21 and the external device 4.
  • the voltage applied between the anode 7 and the cathode 8 is controlled, and the amount of fluorine gas generated at the anode 7 is controlled.
  • the hydrogen fluoride in the molten salt reduced by electrolysis is supplied from the hydrogen fluoride supply source 40.
  • the hydrogen fluoride in the molten salt is controlled so as to be replenished according to the amount of fluorine gas used in the external device 4, the liquid level of the molten salt usually changes greatly. There is no.
  • the first air chamber 11a and the second air chamber The pressure of 12a changes greatly, and the liquid level of the anode chamber 11 and the cathode chamber 12 changes greatly.
  • the liquid level in the anode chamber 11 and the cathode chamber 12 fluctuates greatly and the liquid level falls below the partition wall 6, the first air chamber 11a and the second air chamber 12a communicate with each other. . In that case, fluorine gas and hydrogen gas come into contact and cause a reaction.
  • the pressures in the first air chamber 11a and the second air chamber 12a are detected by the first pressure gauge 13 and the second pressure gauge 14, respectively. Based on the above, control is performed so that a predetermined set value is obtained. As described above, the liquid level in the anode chamber 11 and the cathode chamber 12 is controlled by keeping the pressure in the first air chamber 11a and the second air chamber 12a constant. Next, the purification apparatus 16 will be described with reference to FIG.
  • purification apparatus 16b are the same structures, below, it demonstrates centering around the 1st refinement
  • the configuration of the first refining device 16a is identified by the symbol “a”, and the configuration of the second refining device 16b is identified by the symbol “b”.
  • the first refining device 16a includes an inner tube 61a as a gas inflow portion into which main raw gas containing hydrogen fluoride gas flows in, and hydrogen fluoride gas mixed in the main raw gas coagulates, while fluorine gas flows into the inner tube 61a. And a cooling device 70a for cooling the inner tube 61a at a temperature not lower than the boiling point of fluorine and not higher than the melting point of hydrogen fluoride.
  • the inner tube 61a is a bottomed cylindrical member, and the upper opening is sealed with a lid member 62a. Connected to the lid member 62a of the inner tube 61a is an inlet passage 63a for guiding the main gas generated in the anode 7 into the inner tube 61a.
  • the inlet passage 63a is one of the two branches of the first main passage 15, and the other inlet passage 63b is connected to the inner tube 61b of the second purification device 16b.
  • the inlet passage 63a is provided with an inlet valve 64a that allows or blocks the main raw gas from flowing into the inner tube 61a.
  • the inner surface of the lid member 62a of the inner tube 61a is connected to a conduit 67a provided to hang down in the inner tube 61a.
  • the conduit 67a is formed in such a length that the lower end opening is located near the bottom of the inner tube 61a.
  • the upper end portion of the conduit 67a is connected to the lid member 62a and is connected to an outlet passage 65a for discharging the fluorine gas from the inner tube 61a. Therefore, the fluorine gas in the inner tube 61a flows out through the conduit 67a and the outlet passage 65a.
  • the outlet passage 65a is provided with an outlet valve 66a that allows or blocks the outflow of fluorine gas from the inner tube 61a.
  • the outlet passage 65a merges with the outlet passage 65b of the second refining device 16b and is connected to the first pump 17.
  • the main raw gas generated in the anode 7 flows into the inner tube 61a through the inlet passage 63a, and flows out of the inner tube 61a through the conduit 67a and the outlet passage 65a.
  • the inlet valve 64a and the outlet valve 66a are in an open state, and when the first purification device 16a is in a stopped or standby state, the inlet valve 64a and the outlet valve 66a. Is closed.
  • the inner tube 61a is provided with a thermometer 68a that detects the internal temperature through the lid member 62a.
  • the inlet passage 63a is provided with a pressure gauge 69a that detects the internal pressure of the inner tube 61a.
  • the cooling device 70a can partially accommodate the inner tube 61a, and a jacket tube 71a that can store liquid nitrogen as a cooling medium therein, and a liquid nitrogen supply / discharge unit that supplies and discharges liquid nitrogen to and from the jacket tube 71a.
  • a system 72a The jacket tube 71a is a bottomed cylindrical member, and the upper opening is sealed with a lid member 73a.
  • the inner tube 61a is accommodated coaxially in the jacket tube 71a with the upper side protruding from the lid member 73a. Specifically, about 80 to 90% of the inner tube 61a is accommodated in the jacket tube 71a.
  • the liquid nitrogen supply / discharge system 72a will be described.
  • a liquid nitrogen supply passage 77a that guides liquid nitrogen supplied from the liquid nitrogen supply source 76 into the jacket tube 71a is connected to the lid member 73a of the jacket tube 71a.
  • the inner surface of the cover member 73a of the jacket tube 71a is connected to a conduit 82a provided in a manner hanging down in the jacket tube 71a, and the upper end of the conduit 82a is connected to the liquid nitrogen supply passage 77a. Accordingly, the liquid nitrogen supplied from the liquid nitrogen supply source 76 is guided into the jacket tube 71a through the liquid nitrogen supply passage 77a and the conduit 82a.
  • the conduit 82a is formed in such a length that the lower end opening is located near the bottom of the jacket tube 71a.
  • the liquid nitrogen supply passage 77a is provided with a flow rate control valve 78a for controlling the supply flow rate of liquid nitrogen.
  • a pressure gauge 80a for detecting the internal pressure of the jacket tube 71a is provided downstream of the flow rate control valve 78a in the liquid nitrogen supply passage 77a.
  • the inside of the jacket tube 71a consists of two layers of liquid nitrogen and vaporized nitrogen gas, and the liquid level of the liquid nitrogen is detected by a liquid level gauge 74a provided through the lid member 73a.
  • a nitrogen gas discharge passage 79a for discharging the nitrogen gas in the jacket tube 71a is connected to the lid member 73a of the jacket tube 71a.
  • the nitrogen gas discharge passage 79a is provided with a pressure adjustment valve 81a for controlling the internal pressure of the jacket tube 71a.
  • the pressure regulating valve 81a controls the internal pressure of the jacket tube 71a to be a predetermined pressure based on the detection result of the pressure gauge 80a.
  • This predetermined pressure is determined so that the temperature of the liquid nitrogen in the jacket tube 71a is not less than the boiling point of fluorine ( ⁇ 188 ° C.) and not more than the melting point of hydrogen fluoride ( ⁇ 84 ° C.).
  • the pressure is set to 0.4 MPa so that the temperature of the liquid nitrogen in the jacket tube 71a is about ⁇ 180 ° C.
  • the pressure regulating valve 81a controls the internal pressure of the jacket tube 71a to 0.4 MPa so that the temperature of the liquid nitrogen in the jacket tube 71a is maintained at about ⁇ 180 ° C. Nitrogen gas discharged through the pressure regulating valve 81a is released to the outside. As the liquid nitrogen in the jacket tube 71a is vaporized and released to the outside, the liquid nitrogen in the jacket tube 71a decreases. Therefore, the flow rate control valve 78a is supplied from the liquid nitrogen supply source 76 to the jacket tube 71a based on the detection result of the liquid level gauge 74a so that the liquid level of the liquid nitrogen in the jacket tube 71a is maintained constant. Control the supply flow rate of liquid nitrogen.
  • a heat insulating material or a heat insulating layer for heat insulation may be provided outside the jacket tube 71a. Since the inner tube 61a is cooled by the jacket tube 71a to a temperature not lower than the boiling point of fluorine and not higher than the melting point of hydrogen fluoride, only the hydrogen fluoride gas mixed in the main gas is solidified in the inner tube 61a, The gas passes through the inner tube 61a. Since the main raw gas is continuously led from the electrolytic cell 1 into the inner tube 61a, the solidified hydrogen fluoride is accumulated in the inner tube 61a as time passes.
  • the operation of the first purification device 16a is stopped, the second purification device 16b in the standby state is activated, and the operation of the purification device 16 is switched. .
  • the operation switching will be described in detail later. Whether or not the accumulation amount of the solidified hydrogen fluoride has reached a predetermined amount is determined by the detection result of the differential pressure gauge 86a provided across the inlet passage 63a and the outlet passage 65a of the inner tube 61a, that is, the inner tube 61a. It is determined based on the differential pressure between the inlet and outlet.
  • the differential pressure gauge 86a corresponds to an accumulation state detector that detects the accumulation state of hydrogen fluoride in the inner tube 61a. Instead of the differential pressure gauge, the accumulation state of hydrogen fluoride in the inner tube 61a may be detected by the pressure gauge 69a.
  • the first refining device 16a is stopped by closing the inlet valve 64a and the outlet valve 66a of the inner tube 61a.
  • a discharge valve 91a capable of discharging the liquid nitrogen in the jacket tube 71a to the external tank 90a is provided.
  • a nitrogen gas supply passage 93a that guides nitrogen gas supplied from the nitrogen gas supply source 92 into the jacket tube 71a is connected downstream of the flow rate control valve 78a in the liquid nitrogen supply passage 77a.
  • the nitrogen gas supply passage 93a is provided with a shutoff valve 94a for switching between supply and shutoff of nitrogen gas to the jacket tube 71a.
  • the supply of nitrogen gas from the nitrogen gas supply source 92 to the jacket tube 71a is performed in a state where the discharge valve 91a is fully opened and the flow rate control valve 78a is fully closed.
  • Nitrogen gas is a normal temperature gas.
  • the jacket tube 71a is supplied with room temperature nitrogen gas while discharging liquid nitrogen.
  • a discharge passage 95a for discharging the dissolved hydrogen fluoride to the outside is connected to the inlet passage 63a downstream of the inlet valve 64a.
  • the discharge passage 95a is provided with a discharge pump 96 for sucking and transporting the dissolved hydrogen fluoride in the jacket tube 71a.
  • a discharge valve 97a that opens when the hydrogen fluoride is discharged is provided upstream of the discharge pump 96.
  • an abatement part 98 is provided downstream of the discharge pump 96 in the discharge passage 95a, and the hydrogen fluoride transported by the discharge pump 96 is rendered harmless by the abatement part 98 and released.
  • a nitrogen gas supply passage 99a that guides the nitrogen gas supplied from the nitrogen gas supply source 92 into the inner tube 61a is connected to the outlet passage 65a upstream of the outlet valve 66a.
  • the nitrogen gas supply passage 99a is provided with a shutoff valve 87a for switching between supply and shutoff of nitrogen gas to the inner tube 61a.
  • the supply of nitrogen gas from the nitrogen gas supply source 92 to the inner tube 61a is performed with the discharge valve 97a fully opened and the discharge pump 96 activated.
  • the discharge pump 96 activated.
  • the dissolved hydrogen fluoride is sucked in by the discharge pump 96 while supplying nitrogen gas at room temperature.
  • the exhaust pump 96 exhausts the inner tube 61a until the internal pressure of the inner tube 61a detected by the pressure gauge 69a is equal to or lower than the atmospheric pressure.
  • the hydrogen fluoride in the inner tube 61a discharged by the discharge pump 96 may be returned to the hydrogen fluoride supply source 40 and reused, or returned to the electrolytic cell 1 and reused. Also good. After the hydrogen fluoride in the inner tube 61a is discharged, the inner tube 61a is filled with fluorine gas. This is because when the second purifier 16b is in operation and the accumulated amount of solidified hydrogen fluoride in the inner tube 61b reaches a predetermined amount, the first purifier 16a is quickly switched to. This is to make it possible.
  • a fluorine gas supply passage 54 connected to the second buffer tank 50 and having a downstream end connected downstream of the inlet valve 64a in the inlet passage 63a.
  • the fluorine gas supply passage 54 is provided with a shut-off valve 88a that opens when the inner tube 61a is filled with fluorine gas. Since the internal pressure of the second buffer tank 50 is controlled to a pressure higher than the atmospheric pressure by the pressure adjustment valve 51, the internal pressure is stored in the second buffer tank 50 by the differential pressure between the second buffer tank 50 and the inner tube 61a. The fluorine gas thus supplied is supplied to the inner tube 61a.
  • the fluorine gas stored in the second buffer tank 50 is used for filling the inner tube 61a with the fluorine gas.
  • purifier 16 comprised as mentioned above is demonstrated.
  • the following operations of the purification device 16 are controlled by a controller (not shown) as a control device mounted on the fluorine gas generation device 100.
  • the controller controls the operation of each valve and each pump based on the detection results of the thermometer 68a, the pressure gauge 69a, the liquid level gauge 74a, the pressure gauge 80a, and the differential pressure gauge 86a.
  • purifier 16a is a driving
  • the inlet valve 64a and the outlet valve 66a of the inner tube 61a are in an open state, and the main raw gas is continuously led from the electrolytic cell 1 into the inner tube 61a.
  • the second refining device 16b the inlet valve 64b and the outlet valve 66b of the inner tube 61b are closed, and the inner tube 61b is filled with fluorine gas.
  • generated in the electrolytic cell 1 is supplied only to the 1st refinement
  • purification apparatus 16a which is a driving
  • Liquid nitrogen introduced through the liquid nitrogen supply passage 77a is stored in the jacket tube 71a of the first refining device 16a, and the inner tube 61a is cooled by the liquid nitrogen.
  • the internal pressure of the jacket tube 71a is controlled to 0.4 MPa by the pressure adjustment valve 81a.
  • the temperature of the liquid nitrogen in the jacket tube 71a is maintained at about ⁇ 180 ° C., which is a temperature not lower than the boiling point of fluorine and not higher than the melting point of hydrogen fluoride, so that only hydrogen fluoride solidifies in the inner tube 61a.
  • the fluorine gas passes through the inner tube 61 a and is conveyed to the first buffer tank 21 by the first pump 17.
  • the main raw gas generated in the electrolytic cell 1 flows into the inner tube 61a through the inlet passage 63a, and flows out of the inner tube 61a through the conduit 67a and the outlet passage 65a. Since the lower end opening of the conduit 67a is located near the bottom of the inner tube 61a, the main raw gas flows in from the upper part of the inner tube 61a and flows out from the lower part of the inner tube 61a. Accordingly, the main raw gas is sufficiently cooled while passing through the inner tube 61a, so that the hydrogen fluoride gas in the main raw gas can be solidified and removed completely.
  • the liquid nitrogen in the jacket tube 71a for cooling the main raw gas is also continuously vaporized.
  • the vaporized nitrogen gas is released to the outside through the pressure regulating valve 81a.
  • FIG. 3 is a graph showing the temporal change in pressure and temperature in the inner tube 61a of the first refining device 16a, where the solid line indicates the pressure and the alternate long and short dash line indicates the temperature.
  • the pressure shown in FIG. 3 is detected by the pressure gauge 69a, and the temperature is detected by the thermometer 68a.
  • the accumulation amount of hydrogen fluoride solidified in the inner tube 61a increases, the internal pressure of the inner tube 61a increases.
  • the first purification device 16a makes a second purification. Operation switching to the device 16b is performed (time t1). Specifically, after the inlet valve 64b and the outlet valve 66b of the inner tube 61b of the second purification device 16b are opened, the inlet valve 64a and the outlet valve 66a of the inner tube 61a of the first purification device 16a are closed.
  • purifier 16a stops and the main raw gas from the electrolytic cell 1 is guide
  • the stopped first refining device 16a liquid nitrogen is discharged from the jacket tube 71a.
  • the flow control valve 78a of the liquid nitrogen supply passage 77a is fully closed and the supply of liquid nitrogen to the jacket tube 71a is stopped, the discharge valve 91a is fully opened and the liquid nitrogen is discharged.
  • the shut-off valve 94a of the nitrogen gas supply passage 93a is opened, and normal temperature nitrogen gas is supplied to the jacket tube 71a.
  • the temperature in the inner tube 61a rises to about room temperature, and the hydrogen fluoride in the inner tube 61a is dissolved.
  • the discharge valve 97a of the discharge passage 95a is opened and the discharge pump 96 is started.
  • the dissolved hydrogen fluoride in the inner tube 61 a is sucked by the discharge pump 96 and conveyed to the abatement part 98.
  • the shutoff valve 87a of the nitrogen gas supply passage 99a is opened to supply room temperature nitrogen gas into the inner tube 61a.
  • the dissolved hydrogen fluoride is discharged while supplying nitrogen gas at room temperature.
  • the flow rate control valve 78a of the liquid nitrogen supply passage 77a is opened again to supply liquid nitrogen into the jacket tube 71a. (Time t3). Thereby, the internal temperature of the inner tube 61a falls. Since the internal pressure of the jacket tube 71a is controlled to 0.4 MPa by the pressure adjusting valve 81a, the internal temperature of the inner tube 61a is maintained down to about -180 ° C.
  • the shutoff valve 88a of the fluorine gas supply passage 54 is opened, and the fluorine gas in the second buffer tank 50 is supplied into the inner tube 61a (time t4).
  • the supply of fluorine gas into the inner tube 61a increases the internal pressure of the inner tube 61a.
  • the shutoff valve 88a is closed and supply of fluorine gas is stopped. In this manner, the fluorine gas is filled into the inner tube 61a.
  • the regeneration process of the first purification device 16a is completed, and the first purification device enters a standby state (time t5).
  • the fluorine gas supplied from the second buffer tank 50 is used as the fluorine gas supplied into the inner tube 61a in the regeneration process.
  • the second buffer tank 50 is a tank that stores the fluorine gas discharged as the internal pressure of the first buffer tank 21 is controlled. That is, in the regeneration process, fluorine gas that has been conventionally released from the first buffer tank 21 to the outside is stored in the second buffer tank 50, and the stored fluorine gas is used.
  • a gas that has been conventionally released to the outside is used as the fluorine gas supplied into the inner tube 61a in the regeneration process.
  • the stopped first refining device 16a is in a standby state in which the inner tube 61a is cooled to -180 ° C and the inner tube 61a is filled with fluorine gas. Therefore, when the differential pressure between the inlet and the outlet of the inner tube 61b in the operating second purifier 16b reaches a predetermined value, the operation of the second purifier 16b is stopped and the first purifier 16a is quickly activated. And the operation of the refining device 16 can be switched. According to the above embodiment, there exist the effects shown below.
  • At least two or more purification apparatuses 16 are arranged in parallel, and the purification apparatus 16 of the system that has been stopped by the operation switching is in a standby state after fluorine gas is supplied from the inner tube 61 and then fluorine gas is supplied. , Ready to drive anytime. For this reason, even when it is necessary to stop the purification device 16 due to an increase in the amount of hydrogen fluoride solidified in the purification device 16 of the operating system, the system purification device 16 in the standby state can be promptly operated. Can be activated. Therefore, it is not necessary to stop the fluorine gas generation device 100 itself, and the fluorine gas can be stably supplied to the external device 4.
  • the fluorine gas supplied into the inner tube 61 in the regeneration process of the purification apparatus 16 is a fluorine gas that has been conventionally released to the outside, the fluorine gas can be used effectively.
  • the amount of fluorine gas released to the outside is reduced and the amount of fluorine gas to be processed in the abatement part 53 is reduced.
  • the load on the harm part 53 can be reduced.
  • the gas stored in the second buffer tank 50 is used as the fluorine gas used in the regeneration process.
  • the fluorine gas stored in the first buffer tank 21 may be used as the fluorine gas used in the regeneration step.
  • the fluorine gas supply passage 54 is connected to the first buffer tank 21.
  • the pressure of the first buffer tank 21 is likely to fluctuate, and the pressure of the fluorine gas supplied to the external device 4 may fluctuate. Therefore, it is preferable to use the fluorine gas stored in the second buffer tank 50 as the fluorine gas used in the regeneration process as in the above embodiment.
  • the present invention is not limited to the above-described embodiment, and it is obvious that various modifications can be made within the scope of the technical idea. Regarding the above explanation, the contents of Japanese Patent Application No. 2009-89444 in Japan, filed on April 1, 2009, are incorporated herein by reference.
  • the present invention can be applied to an apparatus that generates fluorine gas.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Abstract

L'invention met en œuvre un dispositif de purification consistant à extraire du gaz de fluorure d'hydrogène mélangé à un gaz principal généré par une anode (7), et par évaporation à partir d'un sel fondu. Un dispositif de purification met en œuvre d'une part une partie d'écoulement entrant de gaz, disposée en alignement sur au moins deux groupes, et dont le gaz principal comprend un gaz de fluorure d'hydrogène; d'autre part un dispositif de refroidissement, refroidissant une partie d'écoulement entrant de gaz dans lequel se solidifie un gaz de fluorure d'hydrogène mélangé à un gaz principal, et tel qu'un gaz de fluor traverse une partie d'écoulement entrant de gaz. Un dispositif de commande, en fonction des résultats de détection d'un appareil de détection d'état d'accumulation, qui détecte l'état d'accumulation de fluorure d'hydrogène dans une partie d'écoulement entrant de gaz, réalise une bascule de fonctionnement d'un dispositif de purification de façon à guider un gaz de fluor vers un dispositif de purification en état de veille; puis expulse du fluorure d'hydrogène, à partir d'une partie d'écoulement entrant de gaz d'un dispositif de purification mis en arrêt par une bascule de fonctionnement. Grâce à une alimentation en gaz de fluor dans une partie d'écoulement entrant de gaz, un dispositif de purification en arrêt est mis en état de veille.
PCT/JP2010/054061 2009-04-01 2010-03-04 Dispositif de génération de gaz de fluor WO2010113611A1 (fr)

Priority Applications (2)

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CN2010800147025A CN102369311A (zh) 2009-04-01 2010-03-04 氟气生成装置
EP10758387A EP2415906A4 (fr) 2009-04-01 2010-03-04 Dispositif de génération de gaz de fluor

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JP2009-089444 2009-04-01
JP2009089444A JP5572981B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置

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KR101198350B1 (ko) 2011-04-05 2012-11-08 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제용기
CN117160179B (zh) * 2023-10-26 2024-02-13 福建德尔科技股份有限公司 一种电子级三氟化氯制备用原材料纯化设备

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EP2415906A4 (fr) 2012-08-29
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CN102369311A (zh) 2012-03-07
EP2415906A1 (fr) 2012-02-08
JP2010242127A (ja) 2010-10-28

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