WO2010113612A1 - Dispositif de génération de gaz de fluor - Google Patents

Dispositif de génération de gaz de fluor Download PDF

Info

Publication number
WO2010113612A1
WO2010113612A1 PCT/JP2010/054066 JP2010054066W WO2010113612A1 WO 2010113612 A1 WO2010113612 A1 WO 2010113612A1 JP 2010054066 W JP2010054066 W JP 2010054066W WO 2010113612 A1 WO2010113612 A1 WO 2010113612A1
Authority
WO
WIPO (PCT)
Prior art keywords
fluorine gas
air chamber
pump
pressure
flow rate
Prior art date
Application number
PCT/JP2010/054066
Other languages
English (en)
Japanese (ja)
Inventor
毛利勇
八尾章史
Original Assignee
セントラル硝子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by セントラル硝子株式会社 filed Critical セントラル硝子株式会社
Publication of WO2010113612A1 publication Critical patent/WO2010113612A1/fr

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof

Definitions

  • the present invention relates to a fluorine gas generator.
  • JP2004-43885A generates a product gas mainly composed of fluorine gas in the first gas phase part on the anode side and a by-product gas mainly composed of hydrogen gas in the second gas phase part on the cathode side.
  • An electrolytic cell first and second pressure gauges for measuring pressures of the first and second gas phase portions, first and second pipes for deriving product gas and by-product gas, and first And first and second flow rate control valves disposed in the second pipe, and first and second suction means for sucking the first and second pipes downstream of the first and second flow rate control valves.
  • a fluorine gas generator is disclosed.
  • the first and second gas pressure portions are maintained at the set values based on the measurement results of the first and second pressure gauges.
  • the level of the electrolytic cell is controlled by adjusting the opening of the flow rate control valve so that fluorine gas and hydrogen gas are not mixed.
  • the present invention relates to a fluorine gas generating device that generates fluorine gas by electrolyzing hydrogen fluoride in a molten salt, the fluorine generated at an anode in which the molten salt is stored and immersed in the molten salt.
  • An electrolytic cell separated on the surface of the salt solution a main passage connected to the first air chamber, a pressure detector for detecting the pressure of the first air chamber, and the main passage;
  • a pump for deriving and transporting fluorine gas from the first air chamber;
  • a reflux passage connecting the discharge side and the suction side of the pump; and the fluorine gas discharged from the pump provided in the reflux passage.
  • Pressure regulating valve for returning to the suction side of the Based on the detection result of the output unit, wherein as the pressure in the first gas chamber is predetermined set value, and a control device for controlling the opening of the pressure regulating valve.
  • the liquid level control on the anode side of the electrolytic cell is performed by setting the pressure in the first air chamber to the set value by the pressure adjusting valve for returning the fluorine gas discharged from the pump to the suction side of the pump. Done by controlling.
  • a part of the fluorine gas generated from the anode is recirculated to the suction side of the pump by the pressure regulating valve, and the liquid level level control on the anode side is performed by controlling the pressure in the first air chamber to the set value. Is called.
  • the fluorine gas passing through the pressure regulating valve is a part of the flow rate generated from the electrolytic cell, even if the opening degree of the pressure regulating valve changes, the flow rate variation of the fluorine gas does not become large. Therefore, the amount of fluctuation in the liquid level on the anode side accompanying the change in the opening of the pressure regulating valve is small, and stable liquid level control can be performed.
  • FIG. 1 is a system diagram of a fluorine gas generator according to a first embodiment of the present invention.
  • FIG. 2 is a system diagram of a fluorine gas generation device according to the second embodiment of the present invention.
  • FIG. 3 is a map showing the relationship between the fluorine gas flow rate Q detected by the flow meter and the rotational speed N of the motor.
  • FIG. 4 is a map diagram showing the relationship between the fluorine gas flow rate Q detected by the flow meter and the rotational speed N of the motor.
  • the fluorine gas generation device 100 generates fluorine gas by electrolysis and supplies the generated fluorine gas to the external device 4.
  • the external device 4 is, for example, a semiconductor manufacturing device.
  • the fluorine gas is used as a cleaning gas in, for example, a semiconductor manufacturing process.
  • the fluorine gas generation device 100 includes an electrolytic cell 1 that generates fluorine gas by electrolysis, a fluorine gas supply system 2 that supplies the fluorine gas generated from the electrolytic cell 1 to the external device 4, and the generation of fluorine gas.
  • the electrolytic bath 1 stores a molten salt containing hydrogen fluoride (HF).
  • HF hydrogen fluoride
  • KF potassium fluoride
  • the inside of the electrolytic cell 1 is partitioned into an anode chamber 11 and a cathode chamber 12 by a partition wall 6 immersed in the molten salt.
  • the anode 7 and the cathode 8 are immersed, respectively.
  • a main gas mainly composed of fluorine gas (F 2 ) is generated at the anode 7, and hydrogen gas (H 2 ) is generated at the cathode 8.
  • F 2 fluorine gas
  • H 2 hydrogen gas
  • By-product gas as a main component is generated.
  • a carbon electrode is used for the anode 7, and soft iron, monel, or nickel is used for the cathode 8.
  • a first gas chamber 11a into which fluorine gas generated at the anode 7 is guided, and a second gas chamber 12a into which hydrogen gas generated at the cathode 8 is guided. Are partitioned by the partition wall 6 so that the mutual gas cannot pass.
  • the first air chamber 11a and the second air chamber 12a are completely separated by the partition wall 6 in order to prevent a reaction due to the contact of fluorine gas and hydrogen gas.
  • the molten salt in the anode chamber 11 and the cathode chamber 12 is not separated by the partition wall 6 but communicates through the lower portion of the partition wall 6. Since the melting point of KF ⁇ 2HF is 71.7 ° C., the temperature of the molten salt is adjusted to 90 to 100 ° C. In each of the fluorine gas and the hydrogen gas generated from the anode 7 and the cathode 8 of the electrolytic cell 1, hydrogen fluoride is vaporized from the molten salt by the vapor pressure and mixed.
  • each of the fluorine gas generated at the anode 7 and guided to the first air chamber 11a and the hydrogen gas generated at the cathode 8 and guided to the second air chamber 12a includes hydrogen fluoride gas.
  • the electrolytic cell 1 includes a first pressure gauge 13 as a first pressure detector that detects the pressure in the first air chamber 11a and a second pressure as a second pressure detector that detects the pressure in the second air chamber 12a.
  • a total of 14 is provided.
  • the detection results of the first pressure gauge 13 and the second pressure gauge 14 are output to the controllers 10a and 10b as control devices.
  • a first main passage 15 for supplying fluorine gas to the external device 4 is connected to the first air chamber 11a.
  • the first main passage 15 is provided with a first pump 17 for deriving and transporting fluorine gas from the first air chamber 11a.
  • a positive displacement pump such as a bellows pump or a diaphragm pump is used.
  • a first return passage 18 Connected to the first main passage 15 is a first return passage 18 that connects the discharge side and the suction side of the first pump 17.
  • the first reflux passage 18 is provided with a first pressure adjusting valve 19 for returning the fluorine gas discharged from the first pump 17 to the suction side of the first pump 17.
  • the opening degree of the first pressure regulating valve 19 is controlled by a signal output from the controller 10a.
  • the controller 10a controls the opening degree of the first pressure regulating valve 19 based on the detection result of the first pressure gauge 13 so that the pressure in the first air chamber 11a becomes a predetermined set value. Control.
  • the downstream end of the first return passage 18 is connected to the vicinity of the first pump 17 in the first main passage 15, but the downstream end of the first return passage 18 is connected to the first air chamber 11a. You may make it do. That is, you may make it return the fluorine gas discharged from the 1st pump 17 in the 1st air chamber 11a.
  • a purification device 16 is provided upstream of the first pump 17 in the first main passage 15 to collect the hydrogen fluoride gas mixed in the main raw gas and purify the fluorine gas.
  • the purification device 16 includes a cartridge 16a through which fluorine gas passes, and an adsorbent that adsorbs hydrogen fluoride is accommodated in the cartridge 16a.
  • a number of porous beads made of sodium fluoride (NaF) are used as the adsorbent. Since sodium fluoride has an adsorption capacity that varies with temperature, a heater 16b for adjusting the temperature in the cartridge 16a is provided around the cartridge 16a. Thus, since the purification device 16 is provided upstream of the first pump 17, the fluorine gas from which the hydrogen fluoride gas has been removed is guided to the first pump 17.
  • a refrigeration apparatus that separates and removes the hydrogen fluoride gas from the fluorine gas may be used as the purifier 16 by utilizing the difference in boiling point between fluorine and hydrogen fluoride.
  • a buffer tank 21 for storing the fluorine gas transferred by the first pump 17 is provided downstream of the first pump 17 in the first main passage 15.
  • the fluorine gas stored in the buffer tank 21 is supplied to the external device 4.
  • a flow meter 26 as a flow rate detector that detects the flow rate of the fluorine gas supplied to the external device 4 is provided downstream of the buffer tank 21. The detection result of the flow meter 26 is output to the controller 10c.
  • the controller 10 c controls the current value supplied between the anode 7 and the cathode 8 from the power source 9 based on the detection result of the flow meter 26. Specifically, the amount of fluorine gas generated at the anode 7 is controlled so that the amount of fluorine gas supplied from the buffer tank 21 to the external device 4 is replenished to the buffer tank 21. In this way, the amount of fluorine gas generated at the anode 7 is controlled so as to supplement the amount of fluorine gas supplied to the external device 4, so that the internal pressure of the buffer tank 21 is maintained at a pressure higher than atmospheric pressure. Is done.
  • the external device 4 side where fluorine gas is used is atmospheric pressure
  • the valve provided in the external device 4 is opened, the pressure difference between the buffer tank 21 and the external device 4 Fluorine gas is supplied from the buffer tank 21 to the external device 4.
  • a branch passage 22 is connected to the buffer tank 21, and a pressure regulating valve 23 that controls the internal pressure of the buffer tank 21 is provided in the branch passage 22.
  • the buffer tank 21 is provided with a pressure gauge 24 that detects the internal pressure. The detection result of the pressure gauge 24 is output to the controller 10d.
  • the controller 10d opens the pressure adjustment valve 23 and discharges the fluorine gas in the buffer tank 21. .
  • a second main passage 30 for discharging hydrogen gas to the outside is connected to the second air chamber 12a.
  • the second main passage 30 is provided with a second pump 31 for deriving and transporting hydrogen gas from the second air chamber 12a.
  • the second main passage 30 is connected to a second recirculation passage 32 that connects the discharge side and the suction side of the second pump 31.
  • the second reflux passage 32 is provided with a second pressure adjusting valve 33 for returning the hydrogen gas discharged from the second pump 31 to the suction side of the second pump 31.
  • the opening degree of the second pressure regulating valve 33 is controlled by a signal output from the controller 10b. Specifically, the controller 10b sets the opening of the second pressure regulating valve 33 based on the detection result of the second pressure gauge 14 so that the pressure in the second air chamber 12a becomes a predetermined set value. Control. In this manner, the pressures in the first air chamber 11a and the second air chamber 12a are controlled so as to have preset values by the first pressure adjusting valve 19 and the second pressure adjusting valve 33, respectively.
  • the set pressure of the first air chamber 11a and the second air chamber 12a is set so that a liquid level difference between the liquid level of the molten salt in the first air chamber 11a and the liquid level of the molten salt in the second air chamber 12a does not occur.
  • the fluorine gas generation device 100 also includes a raw material supply system 5 that supplies hydrogen fluoride, which is a raw material of fluorine gas, into the molten salt of the electrolytic cell 1.
  • the raw material supply system 5 will be described.
  • a raw material supply passage 41 that guides hydrogen fluoride supplied from a hydrogen fluoride supply source 40 into the molten salt of the electrolytic cell 1 is connected to the electrolytic cell 1.
  • the raw material supply passage 41 is provided with a flow rate control valve 42 for controlling the supply flow rate of hydrogen fluoride.
  • a current integrator 43 that integrates the current supplied between the anode 7 and the cathode 8 is attached to the power source 9.
  • the current accumulated by the current accumulator 43 is output to the controller 10e.
  • the controller 10e controls the supply flow rate of hydrogen fluoride guided into the molten salt by opening and closing the flow rate control valve 42 based on the signal input from the current accumulator 43.
  • the supply flow rate of hydrogen fluoride is controlled so as to supply hydrogen fluoride electrolyzed in the molten salt. More specifically, the supply flow rate of hydrogen fluoride is controlled so that the concentration of hydrogen fluoride in the molten salt falls within a predetermined range.
  • a carrier gas supply passage 46 that guides the carrier gas supplied from the carrier gas supply source 45 into the raw material supply passage 41 is connected to the raw material supply passage 41.
  • the carrier gas supply passage 46 is provided with a cutoff valve 47 for switching between supply and cutoff of the carrier gas.
  • the carrier gas is a gas for introducing hydrogen fluoride into the molten salt, and nitrogen gas which is an inert gas is used.
  • the shut-off valve 47 is basically open, and nitrogen gas is supplied into the molten salt in the cathode chamber 12 of the electrolytic cell 1. The nitrogen gas is hardly dissolved in the molten salt and is discharged from the second air chamber 12a through the byproduct gas processing system 3.
  • the molten salt liquid level of the electrolytic cell 1 may be pushed up by the nitrogen gas. Therefore, after providing a level gauge for detecting the liquid level in the electrolytic cell 1, a variable width is set for the molten salt liquid level in the electrolytic cell 1, and the molten salt liquid level is within the variable range.
  • the shutoff valve 47 may be controlled to open and close. That is, when the molten salt liquid level in the electrolytic cell 1 reaches the upper limit of the variable range, the shutoff valve 47 may be closed.
  • a flow rate control valve capable of controlling the flow rate of nitrogen gas may be provided, and the opening degree of the flow rate control valve may be controlled according to the liquid level of the electrolytic cell 1.
  • the flow rate of the fluorine gas used in the external device 4 is detected by a flow meter 26 provided between the buffer tank 21 and the external device 4. Based on the detection result of the flow meter 26, the voltage applied between the anode 7 and the cathode 8 is controlled, and the amount of fluorine gas generated at the anode 7 is controlled.
  • the hydrogen fluoride in the molten salt reduced by electrolysis is supplied from the hydrogen fluoride supply source 40.
  • the liquid level of the molten salt usually changes greatly. There is no.
  • the amount of fluorine gas used in the external device 4 changes abruptly or when the pressure of hydrogen gas changes abruptly in the byproduct gas processing system 3, the first air chamber 11a and the second air chamber The pressure of 12a changes greatly, and the liquid level of the anode chamber 11 and the cathode chamber 12 changes greatly.
  • the liquid level in the anode chamber 11 and the cathode chamber 12 fluctuates greatly and the liquid level falls below the partition wall 6, the first air chamber 11a and the second air chamber 12a communicate with each other. .
  • the pressures in the first air chamber 11a and the second air chamber 12a are detected by the first pressure gauge 13 and the second pressure gauge 14, respectively. Based on the above, control is performed so that a predetermined set value is obtained. As described above, the liquid level in the anode chamber 11 and the cathode chamber 12 is controlled by keeping the pressure in the first air chamber 11a and the second air chamber 12a constant.
  • the pressure control of the first air chamber 11a and the second air chamber 12a will be described in detail.
  • the controller 10a controls the opening of the first pressure regulating valve 19 so that the pressure of the first air chamber 11a becomes a predetermined set value. That is, the first pressure regulating valve 19 controls the flow rate of the fluorine gas discharged from the first pump 17 and returning to the suction side of the first pump 17, and the pressure in the first air chamber 11a is the first pressure. It is controlled by adjusting the flow rate of the fluorine gas that flows back through the regulating valve 19.
  • the opening degree of the first pressure regulating valve 19 is set so that the flow rate of the fluorine gas recirculated to the suction side of the first pump 17 increases. Is set larger. As a result, the flow rate of the fluorine gas supplied from the first pump 17 to the buffer tank 21 decreases, and the pressure in the first air chamber 11a increases. Further, when the pressure in the first air chamber 11a is larger than the set value, the opening of the first pressure regulating valve 19 is set small so that the flow rate of the fluorine gas recirculated to the suction side of the first pump 17 is reduced. Is done.
  • the flow rate of the fluorine gas supplied from the first pump 17 to the buffer tank 21 increases, and the pressure in the first air chamber 11a decreases.
  • the suction resistance of the first recirculation passage 18 is smaller than the suction resistance of the first main passage 15, the first pump 17 cannot efficiently suck the fluorine gas in the first air chamber 11a. Therefore, the diameter of the first recirculation passage 18 is made smaller than the diameter of the first main passage 15 so that the suction resistance of the first recirculation passage 18 is larger than the suction resistance of the first main passage 15. Is done.
  • the pressure in the first air chamber 11a is set to the set value by returning a part of the fluorine gas discharged from the first pump 17 to the suction side of the first pump 17 and adjusting the reflux flow rate. Be controlled.
  • the pressure in the first air chamber 11a is always controlled by the first pressure regulating valve 19, fluctuations in the liquid level in the anode chamber 11 can be suppressed.
  • the fluorine gas generator 100 is configured to remove a part of fluorine gas and hydrogen gas generated from the electrolytic cell 1 by the first pressure adjustment valve 19 and the second pressure adjustment valve 33 on the suction side of the first pump 17 and the second pump 31.
  • the pressure in the first air chamber 11a and the second air chamber 12a is controlled to a set value by adjusting the recirculation flow rate. Therefore, fluctuations in the liquid level of the anode chamber 11 and the cathode chamber 12 can be suppressed, and stable liquid level control can be performed.
  • the first pressure regulating valve 19 is a part of the amount of fluorine gas generated by the passing fluorine gas at the anode 7 of the electrolytic cell 1, and is similar to a conventional pressure regulating valve provided in the first main passage 15. In addition, the total amount of fluorine gas generated at the anode 7 is not controlled. Thus, the flow rate of the fluorine gas controlled by the first pressure regulating valve 19 is small.
  • the change in the opening degree of the first pressure regulating valve 19 is not large and the controllability is good. Even if the opening degree of the first pressure regulating valve 19 is changed, the flow rate change of the fluorine gas supplied from the first air chamber 11a to the buffer tank 21 is not large. The amount of fluctuation of the liquid level in the anode chamber 11 accompanying this is small. For this reason, stable liquid level control can be performed, and even when the opening of the first pressure regulating valve 19 is hunted, the fluctuation of the liquid level in the anode chamber 11 does not become so large.
  • the flow rate of the fluorine gas controlled by the first pressure regulating valve 19 is small, and even if the opening of the first pressure regulating valve 19 changes, the first pressure regulating valve 19 is supplied from the first air chamber 11a to the buffer tank 21. Since the flow rate change of the fluorine gas is not large, the pressure fluctuation of the buffer tank 21 does not increase. Further, as described above, the fluorine gas passing through the first pressure regulating valve 19 is a part of the amount of fluorine gas generated at the anode 7 of the electrolytic cell 1, and the fluorine controlled by the first pressure regulating valve 19.
  • both the liquid level of the anode chamber 11 and the cathode chamber 12 are controlled by returning the gas discharged from the pump to the pump suction side.
  • the liquid level of the anode chamber 11 that generates the fluorine gas is affected by the amount of fluorine gas used in the external device 4, and is therefore less stable than the liquid level of the cathode chamber 12.
  • the above control is applied only to the fluorine gas supply system 2, and the by-product gas processing system 3 is provided with a pressure regulating valve in the second main passage 30 as in the prior art, and the liquid in the cathode chamber 12 is provided by the pressure regulating valve.
  • the surface level may be controlled.
  • the first pressure regulating valve 19 is provided in the first recirculation passage 18 and is not provided in the first main passage 15. Therefore, the suction side of the first pump is pressure-adjusted. This leads directly to the first air chamber 11a without going through a valve.
  • a fluorine gas generation apparatus 200 according to a second embodiment of the present invention will be described. Below, it demonstrates centering on a different point from the said 1st Embodiment, and attaches
  • the first pump 17 is driven by a motor 51 whose rotational speed is controlled by the output frequency of the inverter 50.
  • the discharge flow rate of the fluorine gas can be adjusted.
  • the inverter 50 controls the rotational speed of the motor 51 by changing the frequency output to the motor 51 based on the detection result of the flow meter 26.
  • FIG. 3 is a graph showing the relationship between the fluorine gas flow rate Q detected by the flow meter 26 and the rotational speed N, which is the rotational speed of the motor 51.
  • the control map shown in FIG. 3 is stored in a controller (not shown) built in the inverter 50.
  • the rotation speed of the motor 51 is controlled to increase as the fluorine gas flow rate detected by the flow meter 26 increases.
  • the rotational speed of the motor 51 is constantly controlled according to the fluorine gas flow rate detected by the flow meter 26.
  • the rotational speed of the motor 51 is controlled in this way, the rotational speed of the motor 51 is increased when the flow rate of fluorine gas detected by the flow meter 26 is large and the amount of fluorine gas generated at the anode 7 is large.
  • the flow rate of the fluorine gas that is controlled and sucked by the first pump 17 increases.
  • the rotational speed of the motor 51 is controlled to be small, and the flow rate of the fluorine gas sucked by the first pump 17. Will be less.
  • FIG. 3 shows a control map in which the rotation speed of the motor 51 changes linearly with respect to the fluorine gas flow rate, a control map that changes stepwise may be used.
  • a control method different from the method for controlling the rotation speed of the motor 51 described above will be described.
  • the rotational speed of the motor 51 is controlled based on the control map shown in FIG. 4 as well as the control map shown in FIG.
  • FIG. 4 is a diagram showing the relationship between the fluorine gas flow rate Q detected by the flow meter 26 and the rotational speed N, which is the rotational speed of the motor 51, and is a control map used during normal operation.
  • the control map shown in FIG. 4 is also stored in a controller (not shown) built in the inverter 50. As shown in FIG.
  • the rotation speed of the motor 51 is controlled to be constant regardless of the fluorine gas flow rate detected by the flow meter 26. Therefore, at the normal time, the pressure in the first air chamber 11a is controlled by the first pressure regulating valve 19 as in the first embodiment.
  • the normal time refers to a time of operation in which the change rate of the fluorine gas flow rate detected by the flow meter 26 is less than a predetermined speed.
  • the first pressure regulating valve 19 stably controls the pressure in the first air chamber 11a.
  • the first pump 17 suppresses the pressure fluctuation in the first air chamber 11a, and the first The pressure control of the first air chamber 11a by the pressure adjustment valve 19 is assisted.
  • fluctuations in the liquid level of the anode chamber 11 are suppressed, and stable liquid level control is performed.
  • the fluorine gas supply system 2 has been described. That is, the case where the first pump 17 is driven by the motor 51 having a variable rotation speed has been described.
  • the second pump 31 of the by-product gas processing system 3 may be similarly driven by a motor having a variable rotation speed.
  • a flow meter for detecting the flow rate of hydrogen gas is provided downstream of the second pump 31 in the second main passage 30, and based on the detection result of the flow meter, The rotational speed of the motor that drives the two pumps 31 may be controlled.
  • the present invention is not limited to the above-described embodiment, and various modifications and changes can be made within the scope of the technical idea, and it is obvious that these are also included in the technical scope of the present invention. .
  • the controllers 10a to 10e are provided separately, but all the control may be performed by one controller.
  • the contents of Japanese Patent Application No. 2009-89431 in Japan whose application date is April 1, 2009 are incorporated herein by reference.
  • the present invention can be applied to an apparatus that generates fluorine gas.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Abstract

L'invention concerne un dispositif de génération de gaz de fluor générant un gaz de fluor grâce à l'électrolyse d'un fluorure d'hydrogène; et met en œuvre un récipient d'électrolyse dans lequel, à la surface d'une solution de sel fondu, sont séparées et compartimentées une première chambre à air dans laquelle est guidé un gaz principal, ayant pour principal ingrédient du gaz de fluor généré par une cathode, et une seconde chambre à air dans laquelle est guidé un gaz secondaire ayant pour principal ingrédient un gaz d'hydrogène généré par une anode; un chemin d'écoulement principal raccordé à une première chambre à air; une jauge de pression qui détecte la pression d'une première chambre à air; une pompe qui, disposée sur un chemin d'écoulement principal, extrait et achemine un gaz de fluor depuis une première chambre à air; un chemin de recirculation qui raccorde un côté d'expulsion d'une pompe et un côté d'aspiration d'une pompe; une soupape de régulation de pression qui, disposée sur un chemin de recirculation, sert à faire revenir un gaz de fluor expulsé par une pompe vers un côté d'aspiration d'une pompe; un dispositif de commande qui, en fonction des résultats de détection de la jauge de pression, commande le degré d'ouverture d'une soupape de régulation de pression de sorte à ce que la pression d'une première chambre à air corresponde à une valeur de définition préalablement déterminée.
PCT/JP2010/054066 2009-04-01 2010-03-04 Dispositif de génération de gaz de fluor WO2010113612A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009-089431 2009-04-01
JP2009089431A JP5556047B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置

Publications (1)

Publication Number Publication Date
WO2010113612A1 true WO2010113612A1 (fr) 2010-10-07

Family

ID=42827912

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2010/054066 WO2010113612A1 (fr) 2009-04-01 2010-03-04 Dispositif de génération de gaz de fluor

Country Status (3)

Country Link
JP (1) JP5556047B2 (fr)
TW (1) TW201100592A (fr)
WO (1) WO2010113612A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114405438B (zh) * 2022-03-01 2022-11-11 中山大学 一种光电催化反应系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004124148A (ja) * 2002-10-01 2004-04-22 Mitsubishi Heavy Ind Ltd 発生水素の圧力制御方法及び水素発生装置
JP2009024222A (ja) * 2007-07-20 2009-02-05 Toyo Tanso Kk フッ素系ガス及び水素ガス発生装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004124148A (ja) * 2002-10-01 2004-04-22 Mitsubishi Heavy Ind Ltd 発生水素の圧力制御方法及び水素発生装置
JP2009024222A (ja) * 2007-07-20 2009-02-05 Toyo Tanso Kk フッ素系ガス及び水素ガス発生装置

Also Published As

Publication number Publication date
JP2010242125A (ja) 2010-10-28
JP5556047B2 (ja) 2014-07-23
TW201100592A (en) 2011-01-01

Similar Documents

Publication Publication Date Title
US9139918B2 (en) Fluorine gas generating apparatus
JP2004043885A (ja) フッ素ガス生成装置
JP2002339090A (ja) フッ素ガス発生装置
WO2020085434A1 (fr) Système de génération d'hydrogène/oxygène et procédé de génération d'hydrogène/oxygène
US8864961B2 (en) Fluorine gas generating apparatus
WO2010113612A1 (fr) Dispositif de génération de gaz de fluor
WO2011090014A1 (fr) Dispositif de génération de gaz fluor
JP2005097667A (ja) フッ素ガス生成装置
US8864960B2 (en) Fluorine gas generating apparatus
WO2010113611A1 (fr) Dispositif de génération de gaz de fluor
CN102834549B (zh) 气体产生装置以及气体产生方法
JP5332829B2 (ja) フッ素ガス生成装置
JP5375673B2 (ja) フッ素ガス生成装置
JP5716288B2 (ja) フッ素ガス生成装置
WO2015162868A1 (fr) Dispositif de réaction
JP2021041342A (ja) ガス溶解水製造装置及び方法
JP2010215968A (ja) 気体発生装置
JP2010215932A (ja) 気体発生装置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10758388

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10758388

Country of ref document: EP

Kind code of ref document: A1