WO2010082686A1 - Appareil et procédé d'exposition de formation sous vide et sous pression - Google Patents

Appareil et procédé d'exposition de formation sous vide et sous pression Download PDF

Info

Publication number
WO2010082686A1
WO2010082686A1 PCT/JP2010/050743 JP2010050743W WO2010082686A1 WO 2010082686 A1 WO2010082686 A1 WO 2010082686A1 JP 2010050743 W JP2010050743 W JP 2010050743W WO 2010082686 A1 WO2010082686 A1 WO 2010082686A1
Authority
WO
WIPO (PCT)
Prior art keywords
sheet
pedestal
vacuum
mold
exposure
Prior art date
Application number
PCT/JP2010/050743
Other languages
English (en)
Japanese (ja)
Inventor
石森裕一
福地弘
伊藤靖尚
河合弘仁
Original Assignee
新日本製鐵株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 新日本製鐵株式会社 filed Critical 新日本製鐵株式会社
Publication of WO2010082686A1 publication Critical patent/WO2010082686A1/fr

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D26/00—Shaping without cutting otherwise than using rigid devices or tools or yieldable or resilient pads, i.e. applying fluid pressure or magnetic forces
    • B21D26/02—Shaping without cutting otherwise than using rigid devices or tools or yieldable or resilient pads, i.e. applying fluid pressure or magnetic forces by applying fluid pressure
    • B21D26/021—Deforming sheet bodies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/08—Deep drawing or matched-mould forming, i.e. using mechanical means only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/18—Thermoforming apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2791/00—Shaping characteristics in general
    • B29C2791/004—Shaping under special conditions
    • B29C2791/006—Using vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/26—Component parts, details or accessories; Auxiliary operations
    • B29C51/42—Heating or cooling
    • B29C51/421—Heating or cooling of preforms, specially adapted for thermoforming
    • B29C51/425—Heating or cooling of preforms, specially adapted for thermoforming using movable heating devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Blow-Moulding Or Thermoforming Of Plastics Or The Like (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Press Drives And Press Lines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

L'invention porte sur un appareil d'exposition qui a une précision de positionnement hautement reproductible et dans lequel un photomasque avec une adhésion élevée, même à un moule de formation ayant une forme pleine compliquée, peut être facilement fabriqué et une exposition répétitive peut être effectuée. Un appareil d'exposition de formation sous vide et sous pression dans lequel un motif prédéterminé est transféré sur un film de résist formé sur une surface d'un moule de formage par pression à chaud par exposition est composé d'un contenant hermétique dans lequel un moule de formage ayant un film de résist formé sur la surface de celui-ci est hermétiquement reçu, une base de mise en place sur laquelle le moule de formage est placé, un mécanisme de chauffage qui chauffe et ramollit une feuille ayant un motif prédéterminé formé sur celle-ci, une partie d'aspiration qui maintient une surface inférieure de la feuille ramollie sur la base de mise en place en raison de l'aspiration lorsque la feuille ramolli est appliquée sur le moule de formage, un mécanisme d'aspiration relié à la partie d'aspiration, un mécanisme d'exposition qui est apte à exposer le motif sur la feuille à une lumière pour transférer celui-ci sur le film de résist, et une partie d'alimentation en gaz qui alimente un gaz pour pressuriser le contenant hermétique.
PCT/JP2010/050743 2009-01-19 2010-01-15 Appareil et procédé d'exposition de formation sous vide et sous pression WO2010082686A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009-008831 2009-01-19
JP2009008831 2009-01-19

Publications (1)

Publication Number Publication Date
WO2010082686A1 true WO2010082686A1 (fr) 2010-07-22

Family

ID=42339931

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2010/050743 WO2010082686A1 (fr) 2009-01-19 2010-01-15 Appareil et procédé d'exposition de formation sous vide et sous pression

Country Status (3)

Country Link
JP (1) JP5153797B2 (fr)
TW (1) TWI424277B (fr)
WO (1) WO2010082686A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104309105A (zh) * 2014-01-14 2015-01-28 郑州精益达汽车零部件有限公司 一种吸塑装置及吸塑方法
JP6033477B1 (ja) * 2016-01-06 2016-11-30 テクノアルファ株式会社 フォトレジストでパターンを形成した曲面体の製造方法及び露光装置
EP3473407A1 (fr) * 2017-10-17 2019-04-24 MULTIVAC Sepp Haggenmüller SE & Co. KG Poste de formage pourvu de dispositif de chauffage et procédé correspondant
CN109808157A (zh) * 2019-03-20 2019-05-28 浙江隐齿丽医学技术有限公司 脱膜装置、脱膜方法及一站式牙套生产系统

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102773325B (zh) * 2011-12-22 2016-05-25 黄启瑞 金属板材的成型系统及其成型方法
JP6142120B2 (ja) * 2012-01-11 2017-06-07 Ｓｃｉｖａｘ株式会社 成形方法及び成形装置
KR101446105B1 (ko) 2013-07-10 2014-10-07 에스씨티공업 주식회사 입체형상제품 전사용 전사장치
GB2547183B (en) 2015-12-14 2021-08-25 Trichord Ltd Printing on to a 3-dimensional article

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001242634A (ja) * 2000-02-29 2001-09-07 Takeo Kuroda フォトエッチング方法、フォトエッチング装置
JP2004184872A (ja) * 2002-12-05 2004-07-02 Mitsui Chemicals Inc フォトマスクとその製造方法
JP2004345286A (ja) * 2003-05-23 2004-12-09 Sony Corp 金型表面装飾方法及び金型
JP2005169394A (ja) * 2003-10-02 2005-06-30 Nippon Steel Corp 金属板材の熱間プレス成形装置及び熱間プレス成形方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001022634A (ja) * 1999-07-02 2001-01-26 Canon Inc メモリ制御装置
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
JP4574240B2 (ja) * 2004-06-11 2010-11-04 キヤノン株式会社 加工装置、加工方法、デバイス製造方法
KR100817101B1 (ko) * 2007-04-04 2008-03-26 한국과학기술원 폴리머 또는 레지스트 패턴과 이를 이용한 몰드, 금속 박막패턴, 금속 패턴 및 이들의 형성 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001242634A (ja) * 2000-02-29 2001-09-07 Takeo Kuroda フォトエッチング方法、フォトエッチング装置
JP2004184872A (ja) * 2002-12-05 2004-07-02 Mitsui Chemicals Inc フォトマスクとその製造方法
JP2004345286A (ja) * 2003-05-23 2004-12-09 Sony Corp 金型表面装飾方法及び金型
JP2005169394A (ja) * 2003-10-02 2005-06-30 Nippon Steel Corp 金属板材の熱間プレス成形装置及び熱間プレス成形方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104309105A (zh) * 2014-01-14 2015-01-28 郑州精益达汽车零部件有限公司 一种吸塑装置及吸塑方法
JP6033477B1 (ja) * 2016-01-06 2016-11-30 テクノアルファ株式会社 フォトレジストでパターンを形成した曲面体の製造方法及び露光装置
EP3473407A1 (fr) * 2017-10-17 2019-04-24 MULTIVAC Sepp Haggenmüller SE & Co. KG Poste de formage pourvu de dispositif de chauffage et procédé correspondant
CN109808157A (zh) * 2019-03-20 2019-05-28 浙江隐齿丽医学技术有限公司 脱膜装置、脱膜方法及一站式牙套生产系统

Also Published As

Publication number Publication date
TW201035695A (en) 2010-10-01
JP5153797B2 (ja) 2013-02-27
JP2010186178A (ja) 2010-08-26
TWI424277B (zh) 2014-01-21

Similar Documents

Publication Publication Date Title
JP5153797B2 (ja) 真空圧空成形露光装置及び露光方法
TWI447080B (zh) 曲面玻璃板之成型方法與其採用之成型設備
JP5930622B2 (ja) インプリント装置、及び、物品の製造方法
CN102765240B (zh) 真空压印装置、真空压合装置及层状光学元件的制造方法
JP6050103B2 (ja) 真空加熱加圧封止成形装置及び真空加熱加圧封止成形方法
JP2013058517A (ja) インプリント装置、それを用いた物品の製造方法
KR102221933B1 (ko) 잉크 패턴-함유 곡면형 유리의 제조 방법
KR101518045B1 (ko) 곡면 유리 제조용 원형 흑연성형치구를 가공하기 위한 원형 공압지그
US10409156B2 (en) Mold, imprint apparatus, and method of manufacturing article
CN212160346U (zh) 一种加压加热的防褶皱3d纳米压印装置
TW200520934A (en) Nanoimprinting apparatus and method
KR100319836B1 (ko) 글라스용기의제조방법및제조장치
KR20080046476A (ko) 미세패턴 형성장치 및 이를 이용한 미세패턴 형성방법
JP2021533071A (ja) シートを曲げるための方法及び装置
JP2008111969A (ja) 露光装置
KR100874756B1 (ko) 미세 임프린팅 장치
CN114210866A (zh) 一种不带翻边封头割边划线方法
JP2007176037A (ja) 転写装置および転写方法
JP2011025531A (ja) 成形同時加飾用金型
JP4907316B2 (ja) 成形装置および成形方法
CN219706439U (zh) 一种热升华转印装置
CN101842889A (zh) 用于支撑工件的装置
JP4944938B2 (ja) 真空成形装置及び真空成形方法
KR100950745B1 (ko) 미세 패턴 임프린트 공정용 스탬프 공급 장치 및 방법
JPS6345138A (ja) ガラス板の曲げ加工方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10731350

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10731350

Country of ref document: EP

Kind code of ref document: A1