WO2010082686A1 - Vacuum and pressure forming exposure apparatus and exposure method - Google Patents

Vacuum and pressure forming exposure apparatus and exposure method Download PDF

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Publication number
WO2010082686A1
WO2010082686A1 PCT/JP2010/050743 JP2010050743W WO2010082686A1 WO 2010082686 A1 WO2010082686 A1 WO 2010082686A1 JP 2010050743 W JP2010050743 W JP 2010050743W WO 2010082686 A1 WO2010082686 A1 WO 2010082686A1
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sheet
pedestal
vacuum
mold
exposure
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PCT/JP2010/050743
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French (fr)
Japanese (ja)
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石森裕一
福地弘
伊藤靖尚
河合弘仁
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新日本製鐵株式会社
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Publication of WO2010082686A1 publication Critical patent/WO2010082686A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D26/00—Shaping without cutting otherwise than using rigid devices or tools or yieldable or resilient pads, i.e. applying fluid pressure or magnetic forces
    • B21D26/02—Shaping without cutting otherwise than using rigid devices or tools or yieldable or resilient pads, i.e. applying fluid pressure or magnetic forces by applying fluid pressure
    • B21D26/021—Deforming sheet bodies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/08—Deep drawing or matched-mould forming, i.e. using mechanical means only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/18—Thermoforming apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2791/00—Shaping characteristics in general
    • B29C2791/004—Shaping under special conditions
    • B29C2791/006—Using vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/26—Component parts, details or accessories; Auxiliary operations
    • B29C51/42—Heating or cooling
    • B29C51/421—Heating or cooling of preforms, specially adapted for thermoforming
    • B29C51/425—Heating or cooling of preforms, specially adapted for thermoforming using movable heating devices

Abstract

Disclosed is an exposure apparatus which has a highly reproducible positioning precision and in which a photomask with high adhesion even to a forming die having a complicated solid shape can be easily manufactured and a repetitive exposure can be performed. A vacuum and pressure forming exposure apparatus in which a predetermined pattern is transferred onto a resist film formed on a surface of a hot press forming die by exposure is comprised of a hermetic container in which a forming die having a resist film formed on the surface thereof is hermetically received, a placement base on which the forming die is placed, a heating mechanism which heats and softens a sheet having a predetermined patter formed thereon, a suction portion which holds a lower surface of the softened sheet on the placement base due to suction when the softened sheet is applied onto the forming die, a suction mechanism connected to the suction portion, an exposure mechanism which is adapted to expose the pattern on the sheet to light to transfer the same onto the resist film, and a gas supply portion which supplies a gas for pressurizing the hermetic container.

Description

真空圧空成形露光装置及び露光方法Vacuum / pressure forming exposure apparatus and exposure method
　本発明は、熱間プレス成形用金型の表面に成膜されたレジスト膜を露光し、レジスト膜に所定のパターンを転写する装置及び露光方法に関する。 The present invention relates to an apparatus and an exposure method for exposing a resist film formed on the surface of a hot press mold and transferring a predetermined pattern onto the resist film.
　金属板材のプレス成形は、生産性が高く、高精度に加工できることから、自動車、産業機械、電気機器、輸送用機器などの製造に広く用いられている。また、例えば室温など冷間でのプレス加工性に劣る高強度鋼や合金などの金属板材を加工する方法としては、熱間プレス成形方法が用いられている。 プ レ ス Metal plate press molding is widely used for manufacturing automobiles, industrial machines, electrical equipment, transportation equipment, etc. because it is highly productive and can be processed with high precision. Further, a hot press forming method is used as a method of processing a metal plate material such as high-strength steel or alloy that is inferior in cold press workability such as room temperature.
　熱間プレス成形方法では、先ず所定温度に加熱された金属板材をダイス上に載置した状態でポンチを下死点まで降下し、次いで金属板材の冷却を一定時間行う。これにより、所望する強度の成形品を得ることができる。そして、プレス成形された金属板材がダイスから取り除かれると、所定温度に加熱された新しい鋼板がダイス上に載置される。このように、加熱された鋼板をダイス上に連続的に載置して、プレス成形することにより、大量の製品を、形状安定性が良好に連続生産することができる。したがって、熱間プレス成形においては、成形後の金属板材の冷却時間を短縮することが生産性の観点から重要である。 In the hot press forming method, a metal plate heated to a predetermined temperature is first placed on a die, the punch is lowered to the bottom dead center, and then the metal plate is cooled for a certain time. Thereby, a molded product having a desired strength can be obtained. Then, when the press-formed metal plate material is removed from the die, a new steel plate heated to a predetermined temperature is placed on the die. Thus, by continuously placing the heated steel plate on the die and press-molding it, it is possible to continuously produce a large amount of products with good shape stability. Therefore, in hot press forming, it is important from the viewpoint of productivity to shorten the cooling time of the metal sheet after forming.
　成形後の金属板材の冷却を短時間で行うための成形用金型としては、例えば図１０に示すような成形用金型１０１が用いられる。成形用金型１０１は、ダイス１０２とポンチ１０３とから構成されており、ポンチ１０３を下死点まで降下して金属板材１０４を熱間プレス成形する。このとき、金属板材１０４に対して冷媒を供給する冷媒供給機構１０５がダイス１０２の内側に設けられている。ダイス１０２の表面には、図１１及び図１２に示すように、一定の高さの複数の凸部１０６が設けられている。凸部１０６と金属板材１０４とによって形成される隙間は、冷媒供給機構１０５の噴射口１０７と連通している。この隙間により、熱間プレス成形後の金属板材１０４に対して供給される冷媒及び冷媒の蒸気が流れるため、短時間で金属板材１０４の冷却を行うことができる（特許文献１）。 For example, a molding die 101 as shown in FIG. 10 is used as a molding die for cooling the metal plate material after molding in a short time. The molding die 101 is composed of a die 102 and a punch 103, and the punch 103 is lowered to the bottom dead center to hot press-mold the metal plate material 104. At this time, a refrigerant supply mechanism 105 that supplies a refrigerant to the metal plate member 104 is provided inside the die 102. As shown in FIGS. 11 and 12, a plurality of convex portions 106 having a constant height are provided on the surface of the die 102. A gap formed by the convex portion 106 and the metal plate material 104 communicates with the injection port 107 of the refrigerant supply mechanism 105. Because the gap and the refrigerant supplied to the metal plate material 104 after hot press molding flow through the gap, the metal plate material 104 can be cooled in a short time (Patent Document 1).
　ところで、この凸部１０６の配置は、金属板材１０４プレスして変形させることにより得られる成形品の立体形状に崩れが生じないように、形状面サイズに対し充分に小さいことが要求される。そのため、ダイス１０２の表面には、多数の凸部１０６を設ける必要がある。また、冷媒を金属板材１０４の全体に均一に流すためには凸部１０６の形状を均一にする必要がある。多数の凸部１０６の加工方法として特許文献１には、例えば高精度加工に用いられる放電加工により凸部１０６の周囲を除去する方法が記載されている。 By the way, the arrangement of the convex portions 106 is required to be sufficiently small with respect to the shape surface size so that the three-dimensional shape of the molded product obtained by pressing and deforming the metal plate 104 is not collapsed. Therefore, it is necessary to provide a large number of convex portions 106 on the surface of the die 102. Further, in order to allow the coolant to flow uniformly over the entire metal plate 104, the shape of the convex portion 106 needs to be uniform. As a method for processing a large number of convex portions 106, Patent Document 1 describes a method of removing the periphery of the convex portions 106 by, for example, electric discharge machining used for high-precision machining.
　放電加工の場合は、金型と反対の形状の電極を製作し、その電極表面に金型凸部に対応する凹部を設けることで、高精度な凹凸形状のパターンを加工できる。しかしながら、当該電極を製作するため、金型そのものを作るのと同等な時間と労力がかかり、経済的でないという問題がある。 In the case of electric discharge machining, an electrode having a shape opposite to that of the mold is manufactured, and a concave and convex shape corresponding to the mold convex portion is provided on the surface of the electrode, so that a highly accurate uneven pattern can be processed. However, since the electrodes are manufactured, there is a problem that it takes time and labor equivalent to making the mold itself and is not economical.
　この放電加工に代わる立体形状金型の加工方法として次のものがある。例えば、特許文献２に、フォトリソ技術を用いて立体形状金型の表面にパターンを転写し、エッチングにより、金型表面に所定の模様を形成する方法が開示されている。即ち、先ず所定のパターンを印刷した汎用ポリエステルフィルムを、金型と同形状の成形用の型に真空成形法を用いて密着させ、立体形状のフォトマスクを成形する。次いで、表面にフォトレジストを塗布した金型に、成形用の型から取り外したフォトマスクを密着させ、その後に露光、現像及びエッチングを行う。これにより、金型表面に凹凸を付与し、所定の模様を装飾することができる。 There are the following three-dimensional mold machining methods to replace this electric discharge machining. For example, Patent Document 2 discloses a method in which a pattern is transferred to the surface of a three-dimensional mold using a photolithographic technique, and a predetermined pattern is formed on the mold surface by etching. That is, first, a general-purpose polyester film on which a predetermined pattern is printed is brought into close contact with a mold for molding having the same shape as a mold by using a vacuum molding method to form a three-dimensional photomask. Next, the photomask removed from the mold for molding is brought into close contact with a mold having a photoresist applied on the surface, and then exposure, development and etching are performed. Thereby, an unevenness | corrugation can be provided to the metal mold | die surface and a predetermined pattern can be decorated.
特開２００５−１６９３９４JP-A-2005-169394 特開２００４−３４５２８６JP 2004-345286 A 特開２００４−１８４８７２JP 2004-184872 A
　特許文献２には、被加工材となる金型（以下、特に断らない限り、単に「金型」という。）と同形状になるように、真空成形法によりフォトマスク用シート（以下、特に断らない限り、成形前のフォトマスクシートを単に「シート」という。）を成形し、その成形したフォトマスク用シート（以下、成形後のフォトマスクシートを単に「フォトマスク」という。）を金型に被せるように密着させて露光させることが記載されている。しかし、特許文献２には、金型と立体形状のフォトマスクを密着させる方法が具体的に記載されていない。即ち、露光の際に金型と立体形状のフォトマスクの密着性については言及していない。
　また、特許文献２の方法では、例えば図１３に示すように、金型１１０の表面に凹に窪んだ窪み部１１１や、オーバーハングするような逆バンク部１１２が形成されたものである場合、真空成形では窪み部１１１や逆バンク部１１２においてシート１１３が充分に密着しないという問題がある。そのため、金型の形状に沿った立体形状のフォトマスクを形成することができず、窪み部１１１に正確に適合したフォトマスクによる露光を行うことができなくない。 In Patent Document 2, a photomask sheet (hereinafter, specifically refused) is formed by a vacuum forming method so as to have the same shape as a mold (hereinafter, simply referred to as “die” unless otherwise specified) as a workpiece. Unless otherwise specified, a pre-molded photomask sheet is simply referred to as “sheet”), and the molded photomask sheet (hereinafter, the molded photomask sheet is simply referred to as “photomask”) is used as a mold. It is described that the exposure is performed in close contact with the cover. However, Patent Document 2 does not specifically describe a method of closely attaching a mold and a three-dimensional photomask. That is, there is no mention of the adhesion between the mold and the three-dimensional photomask during exposure.
Further, in the method of Patent Document 2, for example, as shown in FIG. 13, when a recessed portion 111 that is recessed in the surface of the mold 110 or an inverted bank portion 112 that overhangs is formed, In vacuum forming, there is a problem that the sheet 113 does not sufficiently adhere to the recessed portion 111 and the reverse bank portion 112. Therefore, a three-dimensional photomask that conforms to the shape of the mold cannot be formed, and it is not possible to perform exposure using a photomask that is accurately adapted to the depression 111.
　さらに、立体形状のフォトマスクが加工対象の金型とは別の成形用の型を用いて真空成形されているため、フォトマスクを成形用の型から一旦取り外し、その後加工対象の金型に被せる必要がある。そのため、加工対象の金型とマスク成形用の型の形状が完全に一致させないと、金型に立体形状フォトマスクが密着せず、露光不良となることがある。
　特許文献３には、特許文献２と同様、真空成形法によるフォトマスクの成形方法が記載されている。特許文献３では、真空成形すると同時に、シートの成形金型とは反対側を加圧し、シートを成形金型に密着させ、成形することが記載されている。しかし、特許文献２と同様、成形加工したフォトマスクと被加工材となる金型との密着方法が記載されていない。そのため、金型の窪み部やオーバーハング部とフォトマスクの密着性が得られず、露光不良が発生する。
　また、凸部の高さにもよるが、通常、アスペクト比の高い（より急峻な）凸部をエッチングで得るためには、エッチングを数回（２~４回）繰り返さないといけない。そのため、同一のフォトマスクを数回使用することになり、フォトマスクの金型へ密着性とともに、再現性の高い位置決め精度が要求される。 Further, since the three-dimensional photomask is vacuum-formed using a mold for molding different from the mold to be processed, the photomask is once removed from the mold for molding and then covered with the mold to be processed. There is a need. For this reason, if the shape of the mold to be processed and the shape of the mask molding die are not completely matched, the three-dimensional photomask may not be in close contact with the mold, resulting in poor exposure.
Patent Document 3 describes a photomask forming method using a vacuum forming method as in Patent Document 2. In Patent Document 3, it is described that, simultaneously with vacuum forming, pressure is applied to the opposite side of the sheet from the mold so that the sheet is brought into close contact with the mold and molded. However, as in Patent Document 2, there is no description of an adhesion method between a molded photomask and a mold as a workpiece. For this reason, the adhesiveness between the depression and overhang of the mold and the photomask cannot be obtained, resulting in an exposure failure.
In addition, although depending on the height of the convex portion, in general, in order to obtain a convex portion having a high aspect ratio (steeper) by etching, the etching must be repeated several times (2 to 4 times). For this reason, the same photomask is used several times, and high reproducible positioning accuracy is required as well as adhesion to the photomask mold.
　以上のように、フォトマスク用シートの成形と金型への露光を別工程で行う現行の方法では、フォトマスクと金型との密着性と、再現性の高い位置決め精度の確保が課題となる。
　本発明はかかる課題に鑑みてなされたものである。即ち、複雑な立体形状を有する金型であっても、密着性のよいフォトマスクが容易に作成でき、しかも繰り返し露光を可能とする再現性の高い位置決め精度を有する露光装置を提供することを目的としている。 As described above, in the current method in which the molding of the photomask sheet and the exposure to the mold are performed in separate processes, there is a problem of ensuring the adhesion between the photomask and the mold and highly accurate positioning accuracy. .
The present invention has been made in view of such problems. That is, an object of the present invention is to provide an exposure apparatus having a highly reproducible positioning accuracy capable of easily producing a photomask having good adhesion even for a mold having a complicated three-dimensional shape and enabling repeated exposure. It is said.
　本発明者らは鋭意検討の結果、上記課題を解決するために以下の事項を見出し、本発明をなすに至った。
即ち、
　（ａ）フォトマスク成形の際の成形用金型を、被加工材としての金型そのものを使うことにより、形状の同一性が得られること、
　（ｂ）真空成形法だけではなく、雰囲気加圧成形法を併せること（両者併用することを「真空圧空成形」という）により、金型への密着性を高めることができ、その再現性も高いこと、
　（ｃ）機械的位置決め機構により、再現性の高い位置決め精度が得られること、
である。
　そして、本発明の要旨は、以下のとおりである。　熱間プレス成形用金型の表面に成膜したレジスト膜に、露光により所定のパターンを転写する真空圧空成形露光装置であって、レジスト膜が表面に成膜された成形用金型を気密に収容する気密容器と、前記成形用金型を載置する台座と、所定のパターンが形成されたシートを加熱して軟化する加熱機構と、前記台座の載置面に形成され、軟化したシートを金型に被せた際にシート下面を台座に吸着させる吸引部と、前記吸引部に接続された吸引機構と、軟化したシートを前記成形用金型に吸着させた状態で当該シートにおける前記パターンをレジスト膜に露光する露光機構と、前記気密容器内を加圧する気体を供給する気体供給部と、を有していることを特徴とする。 As a result of intensive studies, the present inventors have found the following matters in order to solve the above-mentioned problems, and have made the present invention.
That is,
(A) The same shape can be obtained by using a mold as a workpiece itself as a mold for photomask molding,
(B) By combining not only the vacuum forming method but also the atmospheric pressure forming method (the combination of both is referred to as “vacuum / pressure forming”), the adhesion to the mold can be enhanced and the reproducibility is also high. thing,
(C) A highly reproducible positioning accuracy can be obtained by the mechanical positioning mechanism.
It is.
And the summary of this invention is as follows. A vacuum / pressure forming exposure apparatus for transferring a predetermined pattern to a resist film formed on the surface of a hot press molding die by exposure, wherein the molding die on which the resist film is formed is airtight. An airtight container to be accommodated, a pedestal on which the molding die is placed, a heating mechanism for heating and softening a sheet on which a predetermined pattern is formed, and a softened sheet formed on the placement surface of the pedestal A suction part for adsorbing the lower surface of the sheet to the pedestal when it is put on the mold, a suction mechanism connected to the suction part, and the pattern on the sheet in a state where the softened sheet is adsorbed to the molding die An exposure mechanism that exposes the resist film and a gas supply unit that supplies gas for pressurizing the inside of the hermetic container are provided.
　本発明によれば、軟化したシートを金型に被せた際にシート下面を台座に吸着させる吸引部と、レジスト膜が表面に成膜された成形用金型を気密に収容する気密容器と、軟化したシートを前記成形用金型に吸着させた状態で当該シートにおける前記パターンをレジスト膜に露光する露光機構と、を有しているので、シートを加工対象の金型に吸着させた状態でさらにシートを加圧して成形を行う、いわゆる真空圧空成形を行った後、立体形状に成形されたシートを金型に圧着したままの状態で露光を行うことができる。これにより、真空成形に比べてより高い圧力でシート４を伸長させることができるので、金型２の形状が複雑な起伏を有する場合であってもシート４を金型２と同一の形状に成形することができ、また、露光中に金型と立体形状のフォトマスクとの密着が崩れることを防止できるので、露光により高い精度で所定のパターンを金型表面のレジスト膜に転写することができる。また、圧空成形装置と、露光装置を別々に設ける必要がないため、装置全体をコンパクトに構成できる。さらには、加工対象の金型を用いて立体形状のフォトマスクを成形するので、フォトマスク成形用の別の型を使用する必要がなく、フォトマスク成形用の型と加工対象の金型との製作誤差により、立体形状のフォトマスクと金型の密着が崩れることを防止することができる。 According to the present invention, when the softened sheet is placed on the mold, the suction part that adsorbs the lower surface of the sheet to the pedestal, the airtight container that hermetically accommodates the molding mold on which the resist film is formed, and An exposure mechanism that exposes the pattern on the sheet to the resist film in a state where the softened sheet is adsorbed to the molding die, so that the sheet is adsorbed to the mold to be processed. Furthermore, after performing the so-called vacuum / pressure forming, in which the sheet is pressed to form, the sheet can be exposed in a state in which the sheet formed into a three-dimensional shape is pressed against the mold. Thereby, since the sheet 4 can be stretched at a higher pressure than in vacuum forming, the sheet 4 is formed in the same shape as the mold 2 even when the shape of the mold 2 has complicated undulations. In addition, since it is possible to prevent the adhesion between the mold and the three-dimensional photomask during exposure, the predetermined pattern can be transferred to the resist film on the mold surface with high accuracy. . In addition, since it is not necessary to separately provide a pressure forming apparatus and an exposure apparatus, the entire apparatus can be configured compactly. Furthermore, since a three-dimensional photomask is formed using a mold to be processed, there is no need to use another mold for forming a photomask, and there is no need to use a mold for forming a photomask and a mold to be processed. It is possible to prevent the close contact between the three-dimensional photomask and the mold due to manufacturing errors.
　開口部が前記台座部と対向する位置に形成された筐体を有し、前記気密容器は、前記台座が前記筐体の開口部と接合することにより構成されていてもよく、前記筐体は、前記台座方向に移動自在に構成されていてもよい。 The opening may have a housing formed at a position facing the pedestal portion, and the airtight container may be configured by joining the pedestal to the opening of the housing, Further, it may be configured to be movable in the pedestal direction.
　また、開口部が前記台座部と対向する位置に形成され、前記移動機構を介して前記台座方向に移動可能な筐体と、前記筐体と前記台座の間に設けられ、前記移動機構を介して前記台座方向に移動可能な枠体と、を有し、前記移動機構は前記台座の載置面と垂直に設けられ、前記把持機構は前記枠体の内側に設けられ、前記気密容器は、前記筐体の開口部と前記枠体の前記筐体側の面、及び前記枠体の前記台座の載置面側と前記台座の載置面とが互いに接合することにより構成されていてもよい。 An opening is formed at a position facing the pedestal, and is provided between the housing and the pedestal, the housing being movable in the pedestal direction via the moving mechanism, and via the moving mechanism. A frame body movable in the pedestal direction, the moving mechanism is provided perpendicular to the mounting surface of the pedestal, the gripping mechanism is provided inside the frame body, the airtight container is The opening of the housing and the surface of the frame on the housing side, and the mounting surface side of the pedestal of the frame and the mounting surface of the pedestal may be joined to each other.
　前記所定のパターンを形成したシートを前記台座に対して平行に把持する把持機構と、前記把持機構を前記台座方向に移動させる移動機構と、を有していてもよい。 A gripping mechanism that grips the sheet on which the predetermined pattern is formed in parallel with the pedestal, and a moving mechanism that moves the gripping mechanism in the pedestal direction may be provided.
　前記加熱機構を移動させる他の移動機構を有し、前記加熱機構は、前記露光機構と前記台座の間に設けられ、前記加熱機構は前記他の移動機構を介して前記露光機構と前記台座の間から退避可能に構成されていてもよい。 A second moving mechanism for moving the heating mechanism; the heating mechanism is provided between the exposure mechanism and the pedestal; and the heating mechanism is connected to the exposure mechanism and the pedestal via the other moving mechanism. You may be comprised so that retraction | saving is possible from between.
　前記真空吸引機構による吸引圧力Ｐ１と、前記気密容器内に供給される気体の圧力Ｐ２は、下記式（１）及び式（２）を満たすことが望ましい。
Ｐ１≦−０．００５ＭＰａ・・・式（１）
０．０１ＭＰａ≦Ｐ２≦１．０ＭＰａ・・・式（２）
但し、Ｐ１、Ｐ２は大気圧に対するゲージ圧とする。 It is desirable that the suction pressure P1 by the vacuum suction mechanism and the pressure P2 of the gas supplied into the hermetic container satisfy the following expressions (1) and (2).
P1 ≦ −0.005 MPa Formula (1)
0.01 MPa ≦ P2 ≦ 1.0 MPa Formula (2)
However, P1 and P2 are gauge pressures relative to atmospheric pressure.
　別な観点による本発明は、前記真空圧空成形露光装置を用いて、成形用金型の表面に成膜したレジスト膜に、所定の光を照射して露光する方法であって、前記所定のパターンを形成したシートを加熱して軟化する軟化工程と、前記軟化したシートを前記成形用金型に被せ、前記吸引部による吸引によって前記軟化したシートと金型の間を減圧して、前記シートを前記成形用金型に吸着させる真空成形工程と、を有し、真空成形工程の間に前記気密容器に気体を供給し、前記気密容器内を加圧して、前記シートと前記成形用金型とを圧着した状態で露光を行うことを特徴としている。 Another aspect of the present invention is a method for exposing a resist film formed on the surface of a molding die by irradiating predetermined light using the vacuum / pressure forming exposure apparatus, wherein the predetermined pattern is exposed to light. A softening step of heating and softening the sheet formed, covering the softened sheet on the molding die, reducing the pressure between the softened sheet and the die by suction by the suction part, and A vacuum forming step for adsorbing to the molding die, supplying gas to the airtight container during the vacuum forming step, pressurizing the inside of the airtight container, and the sheet and the molding die It is characterized in that the exposure is performed in a state in which is pressed.
　本発明によれば、立体形状の金型の表面に成膜されたレジスト膜に、露光により高い精度で所定のパターンを転写することができる。さらに、再現性の高い位置決め精度により、同じフォトマスクによる繰り返し露光が可能となる。 According to the present invention, a predetermined pattern can be transferred to a resist film formed on the surface of a three-dimensional mold with high accuracy by exposure. Furthermore, repeated exposure using the same photomask is possible with highly reproducible positioning accuracy.
　図１は、本実施の形態にかかる真空圧空成形露光装置の構成の概略を示す縦断面図である。
　図２ａは、本実施の形態にかかる把持機構がシートを把持した状態を示す平面図である。
　図２ｂは、本実施の形態にかかる把持機構に合致するシートを示す平面図である。
　図２ｃは、本実施の形態にかかる把持機構がシートを把持した状態を示す側面図である。
　図３は、本実施の形態にかかる把持機構近傍の構成の概略を示す平面図である。
　図４は、本実施の形態にかかる加熱機構の構成の概略を示す平面図である。
　図５は、枠体を台座まで降下させたときの状態を示す説明図である。
　図６は、筐体を枠体まで降下させて気密容器を形成した状態を示す説明図である。
　図７は、気密容器の他の実施の形態の説明図である。
　図８は、本発明の適用対象となる熱間プレス成形用金型の縦断面図である。
　図９は、実施例に用いる金型の側面図である。
　図１０は、実施例に用いる金型の平面図である。
　図１１は、本発明の適用対象となる熱間プレス成形用金型のダイス表面の拡大図である。
　図１２は、本発明の適用対象となる熱間プレス成形用金型のダイスの説明図である。
　図１３は、従来技術による立体形状のフォトマスク成形の説明図である。 FIG. 1 is a longitudinal sectional view showing an outline of a configuration of a vacuum / pressure forming exposure apparatus according to this embodiment.
FIG. 2A is a plan view showing a state in which the gripping mechanism according to the present embodiment grips the sheet.
FIG. 2B is a plan view showing a sheet that matches the gripping mechanism according to the present embodiment.
FIG. 2C is a side view showing a state in which the gripping mechanism according to the present embodiment grips the sheet.
FIG. 3 is a plan view schematically showing the configuration in the vicinity of the gripping mechanism according to the present embodiment.
FIG. 4 is a plan view schematically showing the configuration of the heating mechanism according to the present embodiment.
FIG. 5 is an explanatory diagram showing a state when the frame is lowered to the pedestal.
FIG. 6 is an explanatory view showing a state in which an airtight container is formed by lowering the housing to the frame.
FIG. 7 is an explanatory view of another embodiment of an airtight container.
FIG. 8 is a longitudinal sectional view of a hot press molding die to which the present invention is applied.
FIG. 9 is a side view of a mold used in the embodiment.
FIG. 10 is a plan view of a mold used in the embodiment.
FIG. 11 is an enlarged view of a die surface of a hot press molding die to which the present invention is applied.
FIG. 12 is an explanatory view of a die for hot press molding die to which the present invention is applied.
FIG. 13 is an explanatory diagram of a three-dimensional photomask molding according to the prior art.
　以下、本発明の実施の形態について説明する。図１は実施の形態にかかる真空圧空成形露光装置１の構成の概略を示す縦断面図である。 Hereinafter, embodiments of the present invention will be described. FIG. 1 is a longitudinal sectional view showing an outline of the configuration of a vacuum / pressure forming exposure apparatus 1 according to an embodiment.
　真空圧空成形露光装置１は、レジスト膜が表面に成膜された熱間プレス成形用の金型２を載置する台座３と、予め所定のパターンが形成されたシート４を台座３の上方で、台座３に平行に把持する把持機構５と、把持機構５の上方にで、シート４を加熱して軟化させる加熱機構６と、加熱機構６の上方で、金型２表面のレジスト膜を露光する露光機構７とを有している。金型２の形状は、特に限定しない。例えば金型２には、上面が凹に窪んだ窪み部２ａ、及び側面が凹状に窪み、上方がオーバーハングするような逆バンク部１１２（図１０）が形成された形状のものが用いられてもよい。また、シート４には、例えば透明の塩化ビニールシートが用いられる。
　シート４にパターンを形成するにあたっては、さまざまな方法が考えられるが、例えばレジスト膜の露光反応に必要な波長の光を透過しない塗料により、加工形状と同一の所定のパターンを印刷により形成する方法がある。 A vacuum / pressure forming exposure apparatus 1 includes a pedestal 3 on which a hot press-molding die 2 having a resist film formed on a surface is placed and a sheet 4 on which a predetermined pattern is formed in advance above the pedestal 3. , A holding mechanism 5 that holds the pedestal 3 in parallel, a heating mechanism 6 that heats and softens the sheet 4 above the holding mechanism 5, and a resist film on the surface of the mold 2 is exposed above the heating mechanism 6. And an exposure mechanism 7 to be used. The shape of the mold 2 is not particularly limited. For example, the mold 2 has a shape in which a recessed portion 2a whose upper surface is recessed and an inverted bank portion 112 (FIG. 10) in which the side surface is recessed and the upper portion overhangs are formed. Also good. For the sheet 4, for example, a transparent vinyl chloride sheet is used.
Various methods are conceivable for forming the pattern on the sheet 4. For example, a method of forming a predetermined pattern identical to the processed shape by printing with a paint that does not transmit light having a wavelength necessary for the exposure reaction of the resist film. There is.
　台座３は、上方から見て略方形状に形成されており、台座３の内部には、真空空間Ｓが形成されている。台座３の載置面１０には、真空空間Ｓと連通する吸引口１１が形成されている。台座３の下面には台車１２が設けられている。台車１２には吸引機構としての、例えば吸引ブロワ１３が設置されている。吸引ブロワ１３は、台座３の真空空間Ｓに接続されており、これにより、真空空間Ｓの圧力を、大気圧より低い圧力に減圧することが可能である。したがって、軟化したシート４を載置面１０に載置された金型２及び載置面１０に被せると、シート４、金型２と載置面１０の間の空気が吸引口１１から吸引され、シート４と金型２とが密着する、いわゆる真空成形が行われる。その結果、シート４が金型２と同じ立体形状に成形される。 The pedestal 3 is formed in a substantially rectangular shape when viewed from above, and a vacuum space S is formed inside the pedestal 3. A suction port 11 communicating with the vacuum space S is formed on the mounting surface 10 of the base 3. A carriage 12 is provided on the lower surface of the pedestal 3. The carriage 12 is provided with, for example, a suction blower 13 as a suction mechanism. The suction blower 13 is connected to the vacuum space S of the pedestal 3, whereby the pressure in the vacuum space S can be reduced to a pressure lower than atmospheric pressure. Therefore, when the softened sheet 4 is placed on the mold 2 and the placement surface 10 placed on the placement surface 10, the air between the sheet 4 and the mold 2 and the placement surface 10 is sucked from the suction port 11. The sheet 4 and the mold 2 are in close contact with each other, so-called vacuum forming is performed. As a result, the sheet 4 is formed into the same three-dimensional shape as the mold 2.
　台車１２の下方にはチャネルベース１４が設けられており、台車１２はチャネルベース１４の上面に設けられたレール１５上を水平方向（図１のＸ方向）に自在に移動することができる。また、チャネルベース１４の上面には、把持機構５及び露光機構７を、後述する枠体２１及び筐体３２を介して台座３の上下方向（図１のＹ方向）に移動させる移動機構１６が設けられている。移動機構１６は、台座３の載置面１０に垂直に設置されたシャフト１７と、把持機構５及び露光機構７をシャフト１７に沿って移動させる図示しない駆動部を有している。 A channel base 14 is provided below the carriage 12, and the carriage 12 can freely move in the horizontal direction (X direction in FIG. 1) on a rail 15 provided on the upper surface of the channel base 14. Further, on the upper surface of the channel base 14, there is a moving mechanism 16 that moves the gripping mechanism 5 and the exposure mechanism 7 in the vertical direction (Y direction in FIG. 1) of the pedestal 3 via a frame body 21 and a casing 32 described later. Is provided. The moving mechanism 16 has a shaft 17 installed perpendicularly to the mounting surface 10 of the pedestal 3, and a drive unit (not shown) that moves the gripping mechanism 5 and the exposure mechanism 7 along the shaft 17.
　把持機構５は、シート４を枠体２１の下面に沿って任意に把持及び離脱すことができる。図２ａに示すように、把持機構５は、台座３の載置面１０に対向するに位置に、略方形状の開口部２０が形成された枠体２１の内側に設置されている。枠体２１は上面から見て略方形状に形成されている。図３に示すように、把持機構５の設置位置が、平面視において載置面１０の吸引口１１が形成された領域よりも外側になるように、枠体２１の開口部２０の各寸法（ｈ及びｗ）が設定されている。なお、図示の都合上、図３にはシート４は描図されていない。枠体２１の外側には、シャフト１７が連通するスライド部２２が設けられている。シャフト１７とスライド部２２は摺動自在に構成されており、枠体２１は、移動機構１６の駆動部により上下方向に自在に移動することができる。枠体２１の下面であって、台座３の外周縁部に対向する位置には、シール部材２３が設けられており、枠体２１の下面と台座３の上面の外周縁部とが接触した際に、当該接触部を気密な状態にすることができる。 The gripping mechanism 5 can arbitrarily grip and detach the sheet 4 along the lower surface of the frame body 21. As shown in FIG. 2 a, the gripping mechanism 5 is installed inside a frame body 21 in which a substantially rectangular opening 20 is formed at a position facing the mounting surface 10 of the pedestal 3. The frame body 21 is formed in a substantially rectangular shape when viewed from above. As shown in FIG. 3, each dimension of the opening 20 of the frame body 21 is set so that the installation position of the gripping mechanism 5 is outside the region where the suction port 11 of the mounting surface 10 is formed in a plan view. h and w) are set. For convenience of illustration, the sheet 4 is not depicted in FIG. A slide portion 22 that communicates with the shaft 17 is provided outside the frame body 21. The shaft 17 and the slide part 22 are configured to be slidable, and the frame body 21 can be freely moved in the vertical direction by the drive part of the moving mechanism 16. A seal member 23 is provided on the lower surface of the frame body 21 at a position facing the outer peripheral edge portion of the pedestal 3, and the lower surface of the frame body 21 and the outer peripheral edge portion of the upper surface of the pedestal 3 are in contact with each other. In addition, the contact portion can be kept airtight.
　露光機構７は、図１に示すように金型２表面に成膜されたレジスト膜を露光するための露光ランプ３０と、露光ランプ３０の光を反射する反射板３１を有している。露光ランプ３０と反射板３１は、下面が開口した筐体３２の内側に設けられている。筐体３２は上面から見て略方形状に形成されており、筐体３２の外側には、枠体２１と同様に、シャフト１７と摺動自在なスライド部３３が設けられている。それにより、筐体３２は、移動機構１６の駆動部により上下方向に自在に移動することができる。また、筐体３２の下面の外周縁部であって、把持機構５の枠体２１に対向する位置にはシール部材３５が設けられ、筐体３２の下面と枠体２１の上面とを気密に接触させることができる。 The exposure mechanism 7 has an exposure lamp 30 for exposing a resist film formed on the surface of the mold 2 as shown in FIG. 1 and a reflecting plate 31 for reflecting the light from the exposure lamp 30. The exposure lamp 30 and the reflection plate 31 are provided inside a housing 32 whose bottom surface is open. The housing 32 is formed in a substantially square shape when viewed from above, and a slide portion 33 slidable with the shaft 17 is provided on the outer side of the housing 32, similarly to the frame body 21. Accordingly, the housing 32 can be freely moved in the vertical direction by the drive unit of the moving mechanism 16. Further, a seal member 35 is provided at the outer peripheral edge portion of the lower surface of the housing 32 and facing the frame body 21 of the gripping mechanism 5 so that the lower surface of the housing 32 and the upper surface of the frame body 21 are airtight. Can be contacted.
　加熱機構６は、図４に示すように、シート４に対応する位置に設けられシート４を加熱して軟化させる複数のヒータ４０を有している。また、加熱機構６はチャネルベース１４の上面に設けられた移動機構としての退避機構４１の上面に設置されている。退避機構４１の上面に設けられた駆動機構４２によって台座３に対して水平方向に（図１のＸ方向）移動できるように構成されている。このため、加熱機構６は、把持機構５に把持されたシート４を加熱して軟化させた後は、加熱機構６を把持機構５と露光機構７との間から移動させ、図１に破線で示す位置まで退避させることができる。これにより、加熱機構６が露光ランプ３０の光を遮蔽することなく、また露光機構７を加熱機構６と干渉することもなく、移動機構１６により上下に移動させることができる。なお、ヒータ４０は、シート４を所定の温度で適切に加熱できるものであれば、どのようなヒータを使用してもよく、特に限定されるものではない。例えば石英ガス管ヒータや電気ヒータ等でよい。 As shown in FIG. 4, the heating mechanism 6 has a plurality of heaters 40 provided at positions corresponding to the sheet 4 to heat and soften the sheet 4. The heating mechanism 6 is installed on the upper surface of a retracting mechanism 41 as a moving mechanism provided on the upper surface of the channel base 14. The drive mechanism 42 provided on the upper surface of the retracting mechanism 41 is configured to be movable in the horizontal direction (X direction in FIG. 1) with respect to the base 3. For this reason, the heating mechanism 6 moves the heating mechanism 6 from between the gripping mechanism 5 and the exposure mechanism 7 after heating and softening the sheet 4 gripped by the gripping mechanism 5. It can be retracted to the position shown. Thereby, the heating mechanism 6 can be moved up and down by the moving mechanism 16 without shielding the light of the exposure lamp 30 and without interfering with the exposure mechanism 7. The heater 40 may be any heater as long as it can appropriately heat the sheet 4 at a predetermined temperature, and is not particularly limited. For example, a quartz gas tube heater or an electric heater may be used.
　次に、金型２を気密に収容する気密容器５０について説明する。気密容器５０は本実施の形態では、台座３と、枠体２１と、筐体３２とによって構成される。具体的には、図５に示すように、先ず台座３の吸引ブロワ１３により吸引口１１を減圧した状態で、加熱装置６によりシート４を軟化させた後、加熱機構６を退避させ、次いで軟化したシート４を把持する把持機構５を枠体２１とともに移動機構１６により降下させる。そして、枠体２１の下面のシール部材と台座３の外周縁部とを当接させるとともに、シート４と金型２の上面を接触させる。こうすることにより、シート４と台座３の載置面１０及び金型２の間の空気が、吸引口１１により吸引されるので、軟化したシート４と金型２及び載置面１０とが吸着し、シート４が金型に沿うように立体形状に成形される。 Next, the airtight container 50 for accommodating the mold 2 in an airtight manner will be described. In the present embodiment, the airtight container 50 includes the pedestal 3, the frame body 21, and the housing 32. Specifically, as shown in FIG. 5, the sheet 4 is first softened by the heating device 6 while the suction port 11 is decompressed by the suction blower 13 of the base 3, and then the heating mechanism 6 is retracted and then softened. The gripping mechanism 5 that grips the sheet 4 is lowered by the moving mechanism 16 together with the frame body 21. Then, the seal member on the lower surface of the frame body 21 and the outer peripheral edge of the pedestal 3 are brought into contact with each other, and the sheet 4 and the upper surface of the mold 2 are brought into contact with each other. By doing so, air between the sheet 4 and the mounting surface 10 of the pedestal 3 and the mold 2 is sucked by the suction port 11, so that the softened sheet 4, the mold 2 and the mounting surface 10 are adsorbed. Then, the sheet 4 is formed into a three-dimensional shape along the mold.
　次いで、図６に示すように、露光機構７を筐体３２とともに移動機構１６により降下させ、筐体３２の下面のシール部材３５と、枠体２１の上面とを当接させる。このとき、筐体３２も枠体２１と同様に下面にシール部材３５を有しているので、筐体３２と、枠体２１と、シート４が吸着した載置面１０とに囲まれた空間は気密に維持され、気密容器５０を形成する。この際、載置面１０の吸引口１１は、シート４により塞がれているので、気密容器５０内の雰囲気が吸引口１１により吸引されることはない。そして、この状態で、筐体３２に設けられた気体供給部としての気体供給管５１から加圧用の気体を供給し、気密容器５０内を加圧してシート４を金型２及び載置面１０に圧着させる。これにより、金型２と立体形状に成形されたシート４との密着度を高めることができる。また、図５に破線で示されるように、真空成形ではシート４を完全に密着させることができなかった金型２の窪み部２ａ及び逆バンク部２ｂも、加圧を行うことで図６に示すように金型２に沿った形状に圧着することができる。なお、気体供給管５１を介して供給する気体は、金型２表面のレジスト膜に影響を与えないものであればよく、例えば、汎用の空気圧縮機から供給される０．６ＭＰａ程度の圧縮空気等が使用できる。供給圧力は、軟化したシート４が過剰な押圧により破れることを防止するため、金型２の形状やシート４の厚み毎に適切に調整されることが望ましい。また、気体供給管５１の接続先は筐体３２に限定されるものではなく、気密容器５０内に加圧用の気体を供給できる位置であれば、例えば枠体２１の側面に接続されていても良い。 Next, as shown in FIG. 6, the exposure mechanism 7 is moved down together with the housing 32 by the moving mechanism 16, and the seal member 35 on the lower surface of the housing 32 and the upper surface of the frame body 21 are brought into contact with each other. At this time, since the casing 32 also has the sealing member 35 on the lower surface like the frame body 21, the space surrounded by the casing 32, the frame body 21, and the placement surface 10 to which the sheet 4 is attracted. Are kept airtight and form an airtight container 50. At this time, since the suction port 11 of the mounting surface 10 is closed by the sheet 4, the atmosphere in the airtight container 50 is not sucked by the suction port 11. In this state, a gas for pressurization is supplied from a gas supply pipe 51 serving as a gas supply unit provided in the housing 32, and the inside of the airtight container 50 is pressurized to attach the sheet 4 to the mold 2 and the mounting surface 10. Crimp to. Thereby, the adhesiveness of the metal mold | die 2 and the sheet | seat 4 shape | molded by the solid shape can be raised. Further, as shown by a broken line in FIG. 5, the recess 2a and the reverse bank 2b of the mold 2 that could not completely adhere the sheet 4 by the vacuum forming are also applied to the FIG. As shown, it can be crimped to a shape along the mold 2. Note that the gas supplied through the gas supply pipe 51 may be any gas that does not affect the resist film on the surface of the mold 2. For example, compressed air of about 0.6 MPa supplied from a general-purpose air compressor. Etc. can be used. The supply pressure is preferably adjusted appropriately for each shape of the mold 2 and the thickness of the sheet 4 in order to prevent the softened sheet 4 from being broken by excessive pressing. Further, the connection destination of the gas supply pipe 51 is not limited to the housing 32, and may be connected to the side surface of the frame body 21, for example, as long as the gas for pressurization can be supplied into the airtight container 50. good.
　本実施の形態にかかる真空圧空成形露光装置１は以上のように構成されており、次にこの真空圧空成形露光装置１で行われる金型２表面に成膜したレジスト膜の露光について説明する。 The vacuum / pressure forming exposure apparatus 1 according to this embodiment is configured as described above. Next, exposure of the resist film formed on the surface of the mold 2 performed by the vacuum / pressure forming exposure apparatus 1 will be described.
　先ず、予め所定のパターンが印刷などにより形成された厚さ約０．５ｍｍの透明の塩化ビニールシートからなるシート４を、把持機構５により把持する。枠体２１または把持機構５には、シート４の位置合わせ用の基準点がマーキングされており、この基準点を合わせるようシート４を設置することで、シート間の位置ずれを防止できる。さらに、同パターンを描いたシートを取り替えながら使用する場合に、位置決め精度を高めるため、例えば図２ａ~図２ｃに示すように、シートに開けた穴７０と同径サイズの突起７１を把持機構５または枠体２１の対応する位置に複数個所設け、その突起をシートの孔に通すことにより、シート４を枠体２１の同じ位置に固定することができようにしてもよい。このシートの固定は、たとえば、高さの高い立体成形形状などの場合には、真空加圧成形の最中にその成形高さに応じたある時点で解除することでもよい。こうすることにより、シートを都度交換して繰り返しパターン露光するときに、常に同じ位置に同じパターンが露光されることとなり、高い再現性が得られる。
　なお、このように位置合わせを行う場合、シート４は、シートに印刷されるパターンの範囲や金型２の大きさによらず、同じ寸法のものを用いることが好ましい。また、シート４の厚み及び材質は本実施の形態の記載に限定されるものではなく、立体形状に成形でき且つ露光ランプ３０の光を透過するものであればよい。
　また、シートの位置合わせ機構は、本態様に限定するものでなく、シートに印刷されたパターンを精度よく位置決めできるものであればよい。 First, the gripping mechanism 5 grips a sheet 4 made of a transparent vinyl chloride sheet having a thickness of about 0.5 mm, on which a predetermined pattern is formed in advance by printing or the like. A reference point for alignment of the sheet 4 is marked on the frame body 21 or the gripping mechanism 5, and by disposing the sheet 4 so as to match this reference point, it is possible to prevent positional deviation between the sheets. Further, in order to increase the positioning accuracy when the sheet depicting the same pattern is used while being replaced, for example, as shown in FIGS. 2a to 2c, a protrusion 71 having the same diameter as the hole 70 formed in the sheet is provided. Alternatively, the sheet 4 may be fixed at the same position of the frame body 21 by providing a plurality of positions at corresponding positions of the frame body 21 and passing the protrusions through the holes of the sheet. For example, in the case of a three-dimensional molded shape having a high height, the fixing of the sheet may be released at a certain point according to the molding height during vacuum pressure molding. By doing so, the same pattern is always exposed at the same position when the sheet is exchanged and repeated pattern exposure is performed, and high reproducibility is obtained.
In addition, when performing alignment in this way, it is preferable to use the sheet 4 having the same dimensions regardless of the range of the pattern printed on the sheet and the size of the mold 2. Further, the thickness and material of the sheet 4 are not limited to those described in the present embodiment, and any material can be used as long as it can be formed into a three-dimensional shape and transmits the light from the exposure lamp 30.
Further, the sheet alignment mechanism is not limited to this mode, and any mechanism that can accurately position the pattern printed on the sheet may be used.
　次いで、図１に示すように、台座３を把持機構５の下方から退避させた状態で、予めレジスト膜を成膜した金型２を載置面１０に載置する。そして金型２を載置した台座３を、把持機構５の直下、すなわち図１に破線で示される位置まで移動させる。
　なお、載置面１０には、金型２の位置合わせ用の基準点がマーキングされており、同じく金型２にマーキングされた基準点と載置面１０の基準点とが合致するように金型２の載置面１０上の配置を調整することで、金型２の載置面１０上での配置の再現性を持たせることができる。さらに、金型の位置決め精度を上げるために、例えば突起状の位置決めブロック６４を台座３の載置面１０上に固定し、金型２を接触固定することもできる。
　載置面１０および台座３に連結固定されている台車１２は、移動機構１６を介した枠体２１や筺体３２との平面での相対位置を精度よく位置決めするとよい。例えば、台車１２に固定された位置決めブロック６３と移動機構１６と連結固定されている位置決めブロック６１を位置決めロッド６２で貫通することにより、ロッドと両ブロックに開いた穴径の嵌め合い精度で位置決めすることができる。
　これら位置決め機構は例示であり、これらの方法に限定されるものではない。 Next, as shown in FIG. 1, the mold 2 on which a resist film is formed in advance is placed on the placement surface 10 with the pedestal 3 retracted from below the gripping mechanism 5. Then, the pedestal 3 on which the mold 2 is placed is moved to a position directly below the gripping mechanism 5, that is, a position indicated by a broken line in FIG.
The placement surface 10 is marked with a reference point for alignment of the mold 2. Similarly, the reference point marked on the mold 2 and the reference point of the placement surface 10 coincide with each other. By adjusting the arrangement of the mold 2 on the mounting surface 10, the reproducibility of the arrangement of the mold 2 on the mounting surface 10 can be provided. Further, in order to increase the positioning accuracy of the mold, for example, a protruding positioning block 64 can be fixed on the mounting surface 10 of the base 3 and the mold 2 can be fixed by contact.
The carriage 12 connected and fixed to the mounting surface 10 and the pedestal 3 may be accurately positioned relative to the frame body 21 and the housing 32 via the moving mechanism 16 in a plane. For example, by positioning the positioning block 63 fixed to the carriage 12 and the positioning block 61 connected and fixed to the moving mechanism 16 with the positioning rod 62, positioning is performed with the fitting accuracy of the hole diameter opened in the rod and both blocks. be able to.
These positioning mechanisms are examples, and are not limited to these methods.
　その後、把持機構５に把持されたシート４を、加熱機構６のヒータ４０により所定の温度で一定時間加熱して軟化させる。この、所定の温度及び一定の加熱時間は、シート４と同じものを用いて予め試験を行い、最適な条件が求めておくとよい。そして、シート４を軟化させた後、加熱機構６を退避機構４１の駆動部４２により露光機構７の下方から退避させる。加熱機構６を退避させた後に、枠体２１を軟化したシート４と共に載置面１０の上面にシール部材２３が当接するまで降下し、シート４を金型２に吸着させる。そして、金型２とシート４とを吸着させた状態で、筐体３２を露光機構７とともに枠体２１の上面にシール部材３５が当接するまで降下し、気密容器５０を形成する。 Thereafter, the sheet 4 gripped by the gripping mechanism 5 is heated and softened at a predetermined temperature by the heater 40 of the heating mechanism 6 for a certain period of time. The predetermined temperature and the constant heating time are preferably tested in advance using the same material as that of the sheet 4 to obtain optimum conditions. After the sheet 4 is softened, the heating mechanism 6 is retracted from below the exposure mechanism 7 by the drive unit 42 of the retracting mechanism 41. After retracting the heating mechanism 6, the frame 21 is lowered together with the softened sheet 4 until the seal member 23 comes into contact with the upper surface of the mounting surface 10, and the sheet 4 is attracted to the mold 2. Then, in a state where the mold 2 and the sheet 4 are adsorbed, the casing 32 is lowered together with the exposure mechanism 7 until the seal member 35 comes into contact with the upper surface of the frame body 21 to form an airtight container 50.
　気密容器５０を形成した後、気体供給管５１を介して気密容器５０内に圧縮空気を供給し、金型２とシート４とを圧着させる。そして、金型２とシート４とを圧着させた状態で、露光機構７の露光ランプ３０と反射板３１により、金型２の全面に光を照射し、シート４のパターンが印刷されていない部分を均一に露光する。 After forming the airtight container 50, compressed air is supplied into the airtight container 50 through the gas supply pipe 51, and the mold 2 and the sheet 4 are pressure-bonded. In a state where the mold 2 and the sheet 4 are pressure-bonded, the entire surface of the mold 2 is irradiated with light by the exposure lamp 30 and the reflecting plate 31 of the exposure mechanism 7, and the pattern of the sheet 4 is not printed. Is uniformly exposed.
　露光終了後は、枠体２１及び筐体３２を移動機構１６により上方へ移動させ、台座３を図１に示す位置まで退避させる。そして、金型２を台座３から取り外した後に、金型２表面のレジスト膜を現像し、現像後の金型２にエッチングを施せば、表面に所定の凹凸のパターンが形成された金型２が完成する。 After the exposure is completed, the frame body 21 and the housing 32 are moved upward by the moving mechanism 16 to retract the pedestal 3 to the position shown in FIG. Then, after removing the mold 2 from the pedestal 3, the resist film on the surface of the mold 2 is developed, and if the developed mold 2 is etched, the mold 2 having a predetermined uneven pattern formed on the surface. Is completed.
　以上の実施の形態によれば、表面にレジスト膜が成膜された熱間プレス成形用の金型２が気密容器５０に収容されているので、加熱して軟化したシート４を金型２の形状に真空圧空成形した後、シート４と金型２を圧着させたままの状態でレジスト膜の露光を行うことができる。また、真空成形に比べてより高い圧力でシート４を密着させることができるので、金型２の形状が複雑な起伏を有する場合であっても、シート４を金型２と同一の形状に成形することができる。このため、金型２表面のレジスト膜を、金型２とシート４との密着が崩れることなく露光することができ、これにより、高い精度で所定のパターンを金型２表面のレジスト膜に露光により転写することができる。また、圧空成形装置と、露光装置を別々に設ける必要がないため、装置全体をコンパクトにできる。さらには、加工対象の金型を用いてフォトマスクを成形するので、フォトマスク成形用の金型を使用する必要がない。このため、フォトマスク成形用の金型と加工対象の金型２との製作誤差もなく、一旦フォトマスク成形用の金型から取り外すことによる微小なフォトマスクの伸びや歪みもなく、立体形状のフォトマスクと金型２の密着性が維持される。 According to the above embodiment, since the hot press-molding mold 2 having a resist film formed on the surface is housed in the airtight container 50, the heated and softened sheet 4 is removed from the mold 2. After vacuum-pressure forming into a shape, the resist film can be exposed in a state where the sheet 4 and the mold 2 are pressed. Further, since the sheet 4 can be brought into close contact with a higher pressure than vacuum forming, the sheet 4 is formed in the same shape as the mold 2 even when the shape of the mold 2 has complicated undulations. can do. Therefore, the resist film on the surface of the mold 2 can be exposed without breaking the adhesion between the mold 2 and the sheet 4, thereby exposing a predetermined pattern on the resist film on the surface of the mold 2 with high accuracy. Can be transferred. In addition, since it is not necessary to separately provide a pressure forming apparatus and an exposure apparatus, the entire apparatus can be made compact. Furthermore, since the photomask is formed using the mold to be processed, it is not necessary to use a mold for forming the photomask. For this reason, there is no manufacturing error between the mold for photomask molding and the mold 2 to be processed, and there is no elongation or distortion of the microphotomask once removed from the mold for photomask molding. Adhesion between the photomask and the mold 2 is maintained.
　また、以上の実施の形態によれば、シート４を台座３の載置面１０に対して平行に把持する把持機構５と、把持機構５の移動機構１６を有しているので、シート４と金型２とが接触する位置、及びシート４と載置面１０との位置関係の再現性を確保することができる。
　例えば金型２の凹部を深くエッチング行う場合、オーバーエッチングを避けるために繰り返しエッチング処理が必要なときがある。その際、金型２へのレジスト塗布、パターニング露光、エッチングを繰り返すことになる。再現性の高い位置決め精度を有する本発明に係る装置を使用すれば、位置ずれ無く金型２にパターンを繰り返し転写することができる。
　この繰り返し処理による方法は、パターンはそのままで深さだけ任意の深さまで深くエッチング加工できるため、アスペクト比の高い凸部をエッチングで得るような場合に効果がある。金型２に繰り返しパターニングを行う場合、予め同じパターニング描いた。シート４を都度取り替えて使用する場合と、一旦成形されたシート４を繰り返し使用する場合がある。いずれの場合も、シート４および金型２の相対位置は、前述の位置決め機構により、高い精度で再現され、繰り返しのレジストパターン作成に有効である。 Further, according to the above embodiment, since the gripping mechanism 5 for gripping the sheet 4 in parallel with the mounting surface 10 of the base 3 and the moving mechanism 16 of the gripping mechanism 5 are provided, The reproducibility of the position where the mold 2 contacts and the positional relationship between the sheet 4 and the placement surface 10 can be ensured.
For example, when the concave portion of the mold 2 is etched deeply, repeated etching may be necessary to avoid overetching. At that time, resist coating, patterning exposure, and etching on the mold 2 are repeated. If the apparatus according to the present invention having highly reproducible positioning accuracy is used, the pattern can be repeatedly transferred to the mold 2 without misalignment.
This method by repeated processing is effective when a convex portion having a high aspect ratio is obtained by etching since the pattern can be etched deeply to an arbitrary depth without changing the pattern. When patterning was repeatedly performed on the mold 2, the same patterning was drawn in advance. There is a case where the sheet 4 is used after being replaced, and a case where the sheet 4 once formed is used repeatedly. In any case, the relative position of the sheet 4 and the mold 2 is reproduced with high accuracy by the above-described positioning mechanism, and is effective for creating a repeated resist pattern.
　加熱機構６は把持機構５と露光機構７との間に設けられている例を説明したが、把持機構５の下方に設けられていてもよい。また、シート４を均一に加熱できれば、把持機構５に把持されたシート４に対向して設けられている必要はなく、例えば把持機構５の斜め上方や斜め下方に設けられていてもよい。 Although the example in which the heating mechanism 6 is provided between the gripping mechanism 5 and the exposure mechanism 7 has been described, the heating mechanism 6 may be provided below the gripping mechanism 5. Further, as long as the sheet 4 can be heated uniformly, it is not necessary to be provided facing the sheet 4 held by the holding mechanism 5, and for example, it may be provided obliquely above or below the holding mechanism 5.
　また、露光機構７は筐体３２の内側に設けられている例を説明したが、筐体３２に光を透過するための窓を設けるなどして、筐体３２の外側から露光できるような構成としていれば、露光機構７は筐体３２の外側に設けられていてもよい。 Further, the example in which the exposure mechanism 7 is provided inside the housing 32 has been described. However, the exposure mechanism 7 can be exposed from the outside of the housing 32 by providing a window for transmitting light in the housing 32. If so, the exposure mechanism 7 may be provided outside the housing 32.
　気密容器５０は、枠体２１と、筐体３２と、台座３の載置面１０とにより形成されていたが、気密容器５０は、例えば台座３全体を金型２とともに覆うような別の密閉容器であってもよい。この場合、枠体２１及び筐体３２は、気密容器５０を形成する必要がないので、把持機構５及び露光機構６を固定することだけを考慮した形状としてよい。また、図７に示すように、把持機構５を筐体３２の下面に設けるように筐体３２を構成し、筐体３２と台座３とによって気密容器５０を形成してもよい。 The airtight container 50 is formed by the frame body 21, the housing 32, and the mounting surface 10 of the pedestal 3, but the airtight container 50 is another hermetic seal that covers the entire pedestal 3 together with the mold 2, for example. It may be a container. In this case, the frame body 21 and the housing 32 do not need to form the airtight container 50, and therefore may have a shape that only considers fixing the gripping mechanism 5 and the exposure mechanism 6. Further, as shown in FIG. 7, the housing 32 may be configured such that the gripping mechanism 5 is provided on the lower surface of the housing 32, and the airtight container 50 may be formed by the housing 32 and the pedestal 3.
　以上の実施の形態で用いるシート４に印刷されるパターンは、試験により事前に金型２の形状に成形した際の伸び率を求め、その伸び率に基づき印刷パターンの形状を変化させていてもよい。この伸び率は、事前にシート４と同じ材質のものに伸び率計測用の模様を印刷し、真空圧空成形露光装置１を用いて３次元成形することで求められる。この予め伸び率を考慮したパターン印刷を行えば、金型２の形状が複雑で、金型２の場所ごとにシート４の伸び率が変化する場合であっても、所定のパターンを得ることができる。また、金型２のレジストを実際に上述の方法で露光した後、現像を行い、その結果を上記の伸び率に反映させれば、さらに精度よく金型２表面にパターンを形成することができる。 Even if the pattern printed on the sheet 4 used in the above-described embodiment is obtained in advance by the test to obtain the elongation rate when it is molded into the shape of the mold 2 and the shape of the printing pattern is changed based on the elongation rate. Good. This elongation rate is obtained by printing a pattern for measuring the elongation rate on the same material as the sheet 4 in advance and three-dimensionally forming it using the vacuum / pressure forming exposure apparatus 1. If pattern printing in consideration of the elongation rate is performed in advance, a predetermined pattern can be obtained even when the shape of the mold 2 is complicated and the elongation rate of the sheet 4 changes for each location of the mold 2. it can. Further, if the resist of the mold 2 is actually exposed by the above-described method, development is performed, and the result is reflected in the elongation rate, the pattern can be formed on the surface of the mold 2 with higher accuracy. .
　以下、本発明の真空圧空成形露光装置を用い、立体形状の金型の表面に成膜されたレジスト膜に、露光により所定のパターンを転写した実施例について説明する。本実施例を行うに際しては、真空圧空成形露光装置として、先に図１に示した真空圧空成形露光装置１を用いた。 Hereinafter, an embodiment in which a predetermined pattern is transferred by exposure to a resist film formed on the surface of a three-dimensional mold using the vacuum / pressure forming exposure apparatus of the present invention will be described. In carrying out this example, the vacuum / pressure forming exposure apparatus 1 previously shown in FIG. 1 was used as the vacuum / pressure forming exposure apparatus.
　実施例に用いた立体形状の金型６０の形状は、側面視においては図８に示すように、上面が上方に凸に突出し、平面視においては図９に示すように方形である。そして、金型６０の凸に突出した部分の中央には、図８に破線で示すように、凹に窪んだ方形の窪みが形成されている。金型６０の各寸法は、平面での一辺長さａ＝２００ｍｍ、突出部の幅ｂ＝１２０ｍｍ、突出部の高さｃ＝７０、窪み部の深さｄ＝１５ｍｍ、窪みの一辺長さｅ＝８０ｍｍである。シートには、直径２ｍｍ、ピッチ３ｍｍのパターンが千鳥に配置された厚さ１ｍｍの塩化ビニールシートを用いた。 The shape of the three-dimensional mold 60 used in the example is convex as shown in FIG. 8 when viewed from the side, and has a square shape as shown in FIG. Then, at the center of the projecting portion of the mold 60, a square recess recessed in a recess is formed as shown by a broken line in FIG. The dimensions of the mold 60 are as follows: one side length a = 200 mm in the plane, the width b = 120 mm of the protrusion, the height c = 70 of the protrusion, the depth d = 15 mm of the recess, and the side length e of the recess e = 80 mm. As the sheet, a vinyl chloride sheet having a thickness of 1 mm in which patterns having a diameter of 2 mm and a pitch of 3 mm are arranged in a staggered manner was used.
　本実施例では、気密容器５０内の圧力Ｐ２を０．０１ＭＰａ≦Ｐ２≦１．０ＭＰａの範囲で、真空空間Ｓの圧力Ｐ１をＰ１≦−０．００５ＭＰａの範囲で、夫々変化させた場合について３通りの実験を行い、従来技術として真空空間Ｓの圧力Ｐ１をＰ１≦−０．００５ＭＰａの範囲で変化させた場合について２通りの実験を行った。その結果を表１に示す。評価としては、露光によるパターン転写後の金型６０表面のレジスト膜を現像し、転写対象面全てにレジストパターンが形成された場合は○、転写対象面に１箇所以上のパターンの欠落があった場合は×とした。なお、表１及び上記に記載の圧力は真空空間Ｓの雰囲気圧力Ｐ１も、気密容器５０の雰囲気圧力Ｐ２のいずれについてもゲージ圧（すなわち大気圧は０ＭＰａ、絶対真空は−１．０１３ＭＰａとなる）で表示している。 In this embodiment, the pressure P2 in the hermetic container 50 is changed within the range of 0.01 MPa ≦ P2 ≦ 1.0 MPa, and the pressure P1 of the vacuum space S is changed within the range of P1 ≦ −0.005 MPa. As a conventional technique, two experiments were performed for the case where the pressure P1 of the vacuum space S was changed in the range of P1 ≦ −0.005 MPa. The results are shown in Table 1. As an evaluation, when the resist film on the surface of the mold 60 after pattern transfer by exposure was developed and a resist pattern was formed on the entire transfer target surface, there was omission of one or more patterns on the transfer target surface In the case, it was set as x. The pressures listed in Table 1 and the above are gauge pressures for both the atmospheric pressure P1 in the vacuum space S and the atmospheric pressure P2 in the hermetic container 50 (that is, atmospheric pressure is 0 MPa, absolute vacuum is -1.013 MPa). Is displayed.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
　表１に示した結果によれば、真空空間Ｓの圧力Ｐ１を減圧したのみ、すなわち従来のように真空成形法のみで露光を行った場合は、いずれの場合も一部のパターンに欠落が見られた。これに対して、本発明の真空圧空成形露光装置１を用いて、０．０１ＭＰａ≦Ｐ２≦１．０ＭＰａ、Ｐ１≦−０．００５ＭＰａの条件で真空圧空成形により露光を行った場合は、いずれの場合もシートのパターンが適切にレジスト膜に転写されることが分かった。したがって、本発明の真空圧空成形露光装置１を用いて露光を行うと、立体形状の金型の表面に成膜されたレジスト膜に高い精度でパターンを転写できることが分かった。また、表１の実施例１においてはＰ１とＰ２との差圧が、従来技術におけるＰ１とＰ２との差圧より小さい、すなわちシートを金型６０に押圧する力が小さいにも関わらず、パターンの転写は適切に行われ、しかもこの結果には再現性があった。したがって、パターン転写を適切に行うにあたっては、シートを金型６０に押圧する圧力、すなわちＰ２とＰ１との差圧の大きさではなく、真空空間Ｓを減圧すると共に、気密容器５０内を加圧することが重要であることが新たな知見として得られた。 According to the results shown in Table 1, when only the pressure P1 in the vacuum space S is reduced, that is, when exposure is performed only by the vacuum forming method as in the prior art, in some cases, there is a missing pattern in some patterns. It was. On the other hand, when exposure is performed by vacuum / pressure forming under the conditions of 0.01 MPa ≦ P2 ≦ 1.0 MPa and P1 ≦ −0.005 MPa using the vacuum / pressure forming apparatus 1 of the present invention, In this case, it was found that the sheet pattern was appropriately transferred to the resist film. Accordingly, it has been found that when exposure is performed using the vacuum / pressure forming apparatus 1 of the present invention, a pattern can be transferred with high accuracy to a resist film formed on the surface of a three-dimensional mold. Moreover, in Example 1 of Table 1, although the differential pressure between P1 and P2 is smaller than the differential pressure between P1 and P2 in the prior art, that is, the force pressing the sheet against the mold 60 is small, the pattern The transfer was performed properly and the results were reproducible. Therefore, when performing pattern transfer appropriately, not only the pressure for pressing the sheet against the mold 60, that is, the pressure difference between P2 and P1, but also the vacuum space S is reduced and the inside of the airtight container 50 is pressurized. It was a new finding that this is important.
　次に、本発明の真空圧空成形露光装置を用い、金型表面にφ１ｍｍ、ピッチ１．５ｍｍの凸部を千鳥配置したパターンを転写した実施例について説明する。パターンの形状精度として、φ１ｍｍの径がφ０．８ｍｍ以下になった場合をパターン崩れが有りと判定した。
　また、１回のレジスト膜のパターニングでエッチングする深さは、従来技術でパターン崩れが発生しない０．３ｍｍとした。この条件で、レジスト膜のパターニングとエッチングを複数回繰り返し、深くエッチングする試験を行い、パターン崩れがなく０．６ｍｍ以上深くエッチングできた場合を合格（○）とし、できない場合を不合格（×）として評価した。
　表２にその結果を示す。従来技術では、レジスト膜のパターンニング１回のみで０．６ｍｍ深さのエッチングを行った場合に、パターン崩れが発生した。しかし、本発明による方法と装置を用いた場合には、パターン崩れが発生することなく、０．６ｍｍ深さ、０．９ｍｍ深さまでエッチングすることができた。繰り返しエッチングに対し、再現性の高い位置決め精度を有する本発明に係る装置の効果が発揮されたことがわかる。 Next, an embodiment in which a pattern in which convex portions having a diameter of 1 mm and a pitch of 1.5 mm are arranged in a staggered manner on the mold surface will be described using the vacuum / pressure forming exposure apparatus of the present invention. As the pattern shape accuracy, it was determined that there was pattern collapse when the diameter of φ1 mm was equal to or less than φ0.8 mm.
In addition, the depth of etching by patterning the resist film once was set to 0.3 mm at which pattern breakage does not occur in the conventional technique. Under these conditions, patterning and etching of the resist film are repeated multiple times, and a deep etching test is performed. If the pattern can be etched deeply by 0.6 mm or more without passing through the pattern, it is determined to pass (○), and if not, it is rejected (×). As evaluated.
Table 2 shows the results. In the prior art, pattern collapse occurred when etching with a depth of 0.6 mm was performed only once by patterning of the resist film. However, when the method and apparatus according to the present invention were used, it was possible to etch to a depth of 0.6 mm and a depth of 0.9 mm without causing pattern collapse. It can be seen that the effect of the apparatus according to the present invention having highly reproducible positioning accuracy was exhibited against repeated etching.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
　本発明は、例えば熱間プレス用金型の製造において良好な凹凸表面を有する金型を製造する際に有用である。 The present invention is useful, for example, in producing a mold having a good uneven surface in the production of a hot press mold.
　１　　真空圧空成形露光装置
　２　　金型
　２ａ　窪み部
　２ｂ　逆バンク部
　３　　台座
　４　　シート
　５　　把持機構
　６　　加熱機構
　７　　露光機構
　１０　載置面
　１１　吸引口
　１２　台車
　１３　吸引ブロワ
　１４　チャネルベース
　１５　レール
　１６　移動機構
　１７　シャフト
　２０　開口部
　２１　枠体
　２２　スライド部
　２３　シール部材
　３０　露光ランプ
　３１　反射板
　３２　筐体
　３３　スライド部
　３４　開口部
　３５　シール部材
　４０　ヒータ
　４１　退避機構
　４２　駆動機構
　５０　気密容器
　５１　気体供給管
　６０　金型
　Ｓ　　真空空間 DESCRIPTION OF SYMBOLS 1 Vacuum pressure forming exposure apparatus 2 Mold 2a Indentation part 2b Reverse bank part 3 Base 4 Sheet 5 Grasp mechanism 6 Heating mechanism 7 Exposure mechanism 10 Mounting surface 11 Suction port 12 Carriage 13 Suction blower 14 Channel base 15 Rail 16 Movement mechanism 17 Shaft 20 Opening 21 Frame 22 Slider 23 Sealing member 30 Exposure lamp 31 Reflector plate 32 Housing 33 Slider 34 Opening 35 Sealing member 40 Heater 41 Retraction mechanism 42 Drive mechanism 50 Airtight container 51 Gas supply pipe 60 Mold S Vacuum space

Claims (9)

  1. 　熱間プレス成形用金型の表面に成膜したレジスト膜に、露光により所定のパターンを転写する真空圧空成形露光装置であって、レジスト膜が表面に成膜された成形用金型を気密に収容する気密容器と、前記成形用金型を載置する台座と、所定のパターンが形成されたシートを加熱して軟化する加熱機構と、前記台座の載置面に形成され、軟化したシートを金型に被せた際にシート下面を台座に吸着させる吸引部と、前記吸引部に接続された吸引機構と、軟化したシートを前記成形用金型に吸着させた状態で当該シートにおける前記パターンをレジスト膜に露光する露光機構と、前記気密容器内を加圧する気体を供給する気体供給部とを有していることを特徴とする真空圧空成形露光装置。 A vacuum / pressure forming exposure apparatus for transferring a predetermined pattern to a resist film formed on the surface of a hot press molding die by exposure, wherein the molding die on which the resist film is formed is airtight. An airtight container to be accommodated, a pedestal on which the molding die is placed, a heating mechanism for heating and softening a sheet on which a predetermined pattern is formed, and a softened sheet formed on the placement surface of the pedestal A suction part for adsorbing the lower surface of the sheet to the pedestal when it is put on the mold, a suction mechanism connected to the suction part, and the pattern on the sheet in a state where the softened sheet is adsorbed to the molding die A vacuum / pressure forming exposure apparatus comprising: an exposure mechanism for exposing a resist film; and a gas supply unit for supplying a gas for pressurizing the inside of the hermetic container.
  2. 　前記所定のパターンを形成したシートを前記台座に対して平行に把持する把持機構と、
    前記把持機構を前記台座方向に移動させる移動機構を有することを特徴とする請求項１に記載の真空圧空成形露光装置。     A gripping mechanism for gripping the sheet on which the predetermined pattern is formed in parallel to the pedestal;
    The vacuum / pressure forming apparatus according to claim 1, further comprising a moving mechanism that moves the gripping mechanism in the pedestal direction.
  3. 　前記シートが複数の開孔部を有し、前記把持機構または前記把持機構が設置された枠体の少なくともどちらかが、前記シートの開孔部に対応する位置に突起を有し、当該突起を、前記シートの対応する孔に通してシートを把持することを特徴とする請求項２に記載の真空圧空成形露光装置。 The sheet has a plurality of apertures, and at least one of the gripping mechanism or the frame on which the gripping mechanism is installed has a projection at a position corresponding to the aperture of the sheet, and the projection 3. A vacuum / pressure forming exposure apparatus according to claim 2, wherein the sheet is held through a corresponding hole of the sheet.
  4. 　開口部が前記台座部と対向する位置に形成された筐体を有し、前記気密容器は、前記台座が前記筐体の開口部と接合することにより構成されることを特徴とする請求項１~３のいずれか１項に記載の真空圧空成形露光装置。 2. The housing having an opening formed at a position facing the pedestal, and the hermetic container is configured by joining the pedestal to the opening of the housing. 4. A vacuum / pressure forming exposure apparatus according to any one of [1] to [3].
  5. 　前記筐体は、前記台座方向に移動自在に構成されていることを特徴とする請求項４に記載の真空圧空成形露光装置。 5. The vacuum / pressure forming exposure apparatus according to claim 4, wherein the casing is configured to be movable in the pedestal direction.
  6. 　開口部が前記台座部と対向する位置に形成され、前記移動機構を介して前記台座方向に移動可能な筐体と、前記筐体と前記台座の間に設けられ、前記移動機構を介して前記台座方向に移動可能な枠体を有し、前記移動機構は前記台座の載置面と垂直に設けられ、前記把持機構は前記枠体の内側に設けられ、前記気密容器は、前記筐体の開口部と前記枠体の前記筐体側の面、及び前記枠体の前記台座の載置面側と前記台座の載置面とが互いに接合することにより構成されることを特徴とする請求項２または３に記載の真空圧空成形露光装置。 An opening is formed at a position facing the pedestal, and is provided between the housing and the pedestal through the moving mechanism, and is movable between the housing and the pedestal. A frame that is movable in a pedestal direction, the moving mechanism is provided perpendicular to the mounting surface of the pedestal, the gripping mechanism is provided inside the frame, and the airtight container 3. The opening and the frame-side surface of the frame body, and the mounting surface side of the pedestal of the frame body and the mounting surface of the pedestal are joined to each other. Or the vacuum / pressure forming exposure apparatus according to 3.
  7. 　前記加熱機構を移動させる他の移動機構を有し、前記加熱機構は、前記露光機構と前記台座の間に設けられ、前記加熱機構は前記他の移動機構を介して前記露光機構と前記台座の間から退避可能に構成されていることを特徴とする請求項１~７のいずれか１項に記載の真空圧空成形露光装置。 A second moving mechanism for moving the heating mechanism; the heating mechanism is provided between the exposure mechanism and the pedestal; and the heating mechanism is connected to the exposure mechanism and the pedestal via the other moving mechanism. 8. The vacuum / pressure forming exposure apparatus according to claim 1, wherein the vacuum / pressure forming exposure apparatus is configured to be retractable from between.
  8. 　前記真空吸引機構による吸引圧力Ｐ１と、前記気密容器内に供給される気体の圧力Ｐ２は、下記式（１）及び式（２）を満たすことを特徴とする、請求項１~７のいずれか１項に記載の真空圧空成形露光装置。
    　Ｐ１≦−０．００５ＭＰａ・・・式（１）
    　０．０１ＭＰａ≦Ｐ２≦１．０ＭＰａ・・・式（２）
    　但し、Ｐ１、Ｐ２は大気圧に対するゲージ圧とする。     The suction pressure P1 by the vacuum suction mechanism and the pressure P2 of the gas supplied into the hermetic container satisfy the following formulas (1) and (2), respectively: 2. A vacuum / pressure forming exposure apparatus according to item 1.
    P1 ≦ −0.005 MPa Formula (1)
    0.01 MPa ≦ P2 ≦ 1.0 MPa Formula (2)
    However, P1 and P2 are gauge pressures relative to atmospheric pressure.
  9. 　請求項１~８のいずれか１項に記載の真空圧空成形露光装置を用いて、成形用金型の表面に成膜したレジスト膜に、所定のパターンの光を照射して露光する方法であって、前記所定のパターンを形成したシートを加熱して軟化する軟化工程と、前記軟化したシートを前記成形用金型に被せ、前記吸引部による吸引によって前記軟化したシートと金型の間を減圧して、前記シートを前記成形用金型に吸着させる真空成形工程とを有し、真空成形工程の間に前記気密容器に気体を供給し、前記気密容器内を加圧して、前記シートと前記成形用金型を圧着した状態で露光を行うことを特徴とする露光方法。 A method for exposing a resist film formed on the surface of a molding die by irradiating with a predetermined pattern of light using the vacuum / pressure forming exposure apparatus according to any one of claims 1 to 8. A softening step of heating and softening the sheet on which the predetermined pattern is formed, covering the softened sheet on the molding die, and reducing the pressure between the softened sheet and the die by suction by the suction part A vacuum forming step of adsorbing the sheet to the molding die, supplying gas to the airtight container during the vacuum forming step, pressurizing the inside of the airtight container, and An exposure method comprising performing exposure in a state where a molding die is pressure-bonded.
PCT/JP2010/050743 2009-01-19 2010-01-15 Vacuum and pressure forming exposure apparatus and exposure method WO2010082686A1 (en)

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CN109808157A (en) * 2019-03-20 2019-05-28 浙江隐齿丽医学技术有限公司 Device for removing scum, method for demoulding and one-stop facing production system

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CN104309105A (en) * 2014-01-14 2015-01-28 郑州精益达汽车零部件有限公司 Blister device and blister method
JP6033477B1 (en) * 2016-01-06 2016-11-30 テクノアルファ株式会社 Method for manufacturing curved body having pattern formed with photoresist and exposure apparatus
EP3473407A1 (en) * 2017-10-17 2019-04-24 MULTIVAC Sepp Haggenmüller SE & Co. KG Moulding station with a heating device and corresponding method of fabrication
CN109808157A (en) * 2019-03-20 2019-05-28 浙江隐齿丽医学技术有限公司 Device for removing scum, method for demoulding and one-stop facing production system

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