WO2010053048A1 - 軟磁性膜用Co-Fe系合金、軟磁性膜および垂直磁気記録媒体 - Google Patents
軟磁性膜用Co-Fe系合金、軟磁性膜および垂直磁気記録媒体 Download PDFInfo
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- WO2010053048A1 WO2010053048A1 PCT/JP2009/068652 JP2009068652W WO2010053048A1 WO 2010053048 A1 WO2010053048 A1 WO 2010053048A1 JP 2009068652 W JP2009068652 W JP 2009068652W WO 2010053048 A1 WO2010053048 A1 WO 2010053048A1
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- WIPO (PCT)
- Prior art keywords
- soft magnetic
- alloy
- based alloy
- film
- recording medium
- Prior art date
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 67
- 239000000956 alloy Substances 0.000 title claims abstract description 67
- 229910020598 Co Fe Inorganic materials 0.000 title claims abstract description 60
- 229910002519 Co-Fe Inorganic materials 0.000 title claims abstract description 60
- 239000000203 mixture Substances 0.000 claims abstract description 19
- 239000012535 impurity Substances 0.000 claims abstract description 5
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 5
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 5
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 230000005415 magnetization Effects 0.000 claims description 13
- 239000013077 target material Substances 0.000 claims description 10
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000005477 sputtering target Methods 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 27
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 229910052804 chromium Inorganic materials 0.000 description 7
- 238000005266 casting Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000005245 sintering Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000013585 weight reducing agent Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000009689 gas atomisation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Definitions
- the present invention relates to a Co—Fe-based alloy for forming a soft magnetic film, the soft magnetic film, and a perpendicular magnetic recording medium having the soft magnetic film.
- Perpendicular magnetic recording is a method in which the magnetic film of a perpendicular magnetic recording medium is formed so that the axis of easy magnetization is oriented perpendicularly to the medium surface. This is a method suitable for high recording density with a small decrease in recording and reproduction characteristics.
- a recording medium having a magnetic recording film layer and a soft magnetic film layer with improved recording sensitivity has been developed.
- the soft magnetic film of such a magnetic recording medium is required to have a high saturation magnetic flux density, and a Co—Fe alloy having a high saturation magnetic flux density is preferably used.
- a Co—Fe alloy having a high saturation magnetic flux density is preferably used.
- As the soft magnetic film of the magnetic recording medium an amorphous film having excellent soft magnetic characteristics is required. Therefore, an element that promotes amorphization is required for the Co—Fe alloy.
- Zr, Ta, or the like is employed.
- the soft magnetic film as described above is generally formed by magnetron sputtering using a target material having the same composition.
- a target material in which Al or Cr is added to a Co—Fe based alloy has been proposed (for example, Patent Document 1).
- the target material for forming a soft magnetic film disclosed in Patent Document 1 described above has a certain effect of improving weather resistance by adding 0.2 to 5 atomic% of Al or Cr to a Co—Fe alloy. It is valid. However, according to the study of the present inventors, it has been confirmed that the weather resistance may not be sufficiently obtained with the addition of Al or Cr.
- An object of the present invention is to provide a Co—Fe based alloy for a soft magnetic film which is used for a perpendicular magnetic recording medium and the like having excellent weather resistance while solving the above problems and maintaining high soft magnetic characteristics. is there.
- the present invention provides a composition formula in the atomic ratio ((Co 100-X -Fe X ) 100-Y -Ni Y) 100- (a + b + C) -M1 a -M2 b -Ti c, 5 ⁇ X ⁇ 80,
- M2 element of the above composition formula is one or two elements selected from (Ta, Nb).
- Fe-based alloy The Co—Fe based alloy for soft magnetic films of the present invention can contain B in a range of 5 atomic% or less.
- the Co—Fe based alloy for soft magnetic films of the present invention can be applied to a sputtering target material or a soft magnetic film layer of a perpendicular magnetic recording medium.
- the Co—Fe based alloy for soft magnetic films of the present invention preferably has a saturation magnetization of 1.0 (T) or more.
- Ti is selected as the optimum element in the Co—Fe-based alloy for the soft magnetic film so as to effectively improve the weather resistance without significantly deteriorating the soft magnetic properties
- the optimum addition amount for realizing the above effect is found.
- the Co—Fe alloy used as the base of the present invention is represented by ((Co 100-X —Fe X ) 100-Y —Ni Y ), 5 ⁇ X ⁇ 80, 0 ⁇ Y ⁇ 25. Composition. This is because a Co—Fe alloy in this composition range has a large saturation magnetization and is suitable as a soft magnetic film. Further, a part of the Co—Fe alloy can be replaced in a range where the addition amount Y of Ni satisfies 0 ⁇ Y ⁇ 25. This is because it is effective in improving the soft magnetic characteristics without greatly reducing the saturation magnetization.
- Co—Fe alloy 2 to 6 atomic% of one or more elements selected from (Zr, Hf, Y) as the M1 element and 1 (Ta, Nb) as the M2 element are selected. Add 2-10 atom% of seeds or two elements. This is because the inclusion of the M1 element and the M2 element in the above range can make the sputtered film amorphous and improve the magnetic characteristics without significantly impairing the saturation magnetization of the Co—Fe alloy.
- the Co—Fe based alloy of the present invention contains 0.5 to 10 atomic% of Ti as an essential element for effectively improving the weather resistance in the above Co—Fe based alloy. From the potential-pH diagram, it is confirmed that Ti has a passive region in a wide pH range, so Ti was selected as an additive element effective for improving the weather resistance. When the above effect is less than 0.5 atomic%, the weather resistance improving effect is low, and when it exceeds 10 atomic%, the magnetization decreases, so that 0.5 to 10 atomic%. It is important to control. In order to further suppress the decrease in magnetization, the Ti content is desirably 5 atomic% or less.
- the Co—Fe-based alloy of the present invention has a composition formula in the atomic ratio of ((Co 100 ⁇ X ⁇ Fe X ) 100 ⁇ Y ⁇ Ni Y ) 100 ⁇ (a + b + c) ⁇ M1 a ⁇ M2 b ⁇ Ti. c ⁇ Co ⁇ Fe ⁇ 5 ⁇ X ⁇ 80, 0 ⁇ Y ⁇ 25, 2 ⁇ a ⁇ 6, 2 ⁇ b ⁇ 10, 0.5 ⁇ c ⁇ 10.
- Inevitable impurities may be included within a range not detracting from.
- the purity of the Co—Fe alloy represented by the above composition formula may be 99.9% or more.
- the Co—Fe based alloy of the present invention can further contain B in a range of 5 atomic% or less. Addition of B at 5 atomic% or less can improve the mechanical properties of the alloy, particularly the hardness, without significantly degrading the weather resistance and magnetization.
- a melt casting method or a powder sintering method can be applied.
- the melt casting method it is possible to produce a cast ingot or a bulk body obtained by applying plastic processing or pressure processing to the cast ingot.
- the powder sintering method an alloy powder having the final composition of the Co—Fe based alloy is manufactured by a gas atomizing method and used as a raw material powder.
- the mixed powder thus mixed can be used as a raw material powder.
- pressure sintering such as hot isostatic pressing, hot pressing, discharge plasma sintering, and extrusion press sintering.
- the Co—Fe-based alloy of the present invention can be processed into a target material suitable for the type of various sputtering apparatuses and sputtered to form a soft magnetic film having excellent weather resistance.
- a casting ingot having a Co—Fe based alloy composition shown in Table 1 was produced.
- the cast ingot was heated and melted in a high-frequency heating furnace in vacuum using a raw material having a purity of 99.9% or higher, and then cast into an iron mold to produce an ingot having a diameter of 220 mm ⁇ 45 mm.
- the produced ingot was processed to produce a Co—Fe based alloy bulk body having a diameter of 180 mm ⁇ thickness of 7 mm.
- a sample having a diameter of 10 mm ⁇ 20 mm was prepared from a cast ingot, immersed in 10% hydrochloric acid at 50 ° C.
- the Co—Fe alloy (sample 1) containing 0.5 to 10 atomic% of Ti of the present invention is a Co—Fe alloy (sample 3) to which no Ti is added and Co to which Al or Cr is added. It can be seen that it has higher weather resistance than the Fe-based alloy (Sample 2). From Table 2, the sample 1 of the present invention and the sample 2 of the Co—Fe-based alloy to which Al or Cr are added show the same value of magnetization as the bulk body. The alloy is effective as a target material or a soft magnetic film having excellent weather resistance.
- a casting ingot having a Co—Fe based alloy composition shown in Table 3 was produced.
- the casting ingot was heated and melted in a high-frequency heating furnace in vacuum using a raw material having a purity of 99.9% or higher, and then cast into an iron mold to produce an ingot having a diameter of 200 mm ⁇ 25 mm.
- the produced ingot was processed to produce a Co—Fe based alloy bulk body having a diameter of 180 mm ⁇ thickness of 7 mm.
- a sample having a diameter of 10 mm ⁇ 20 mm was prepared from a cast ingot, immersed in 10% sulfuric acid at 50 ° C. for 24 hours, and the weight reduction rate was measured to evaluate the weather resistance of the bulk body.
- Table 3 shows the measurement results.
- a sample of 30 mm ⁇ 10 mm ⁇ 5 mm was prepared from a cast ingot, and magnetized at an external magnetic field of 160 k (A / m) using a DC magnetic property measuring apparatus (TRF5A manufactured by Toei Kogyo).
- TRF5A DC magnetic property measuring apparatus manufactured by Toei Kogyo
- Table 4 shows the results.
- a hardness evaluation of the bulk body a 10 mm ⁇ 10 mm ⁇ 5 mm sample was prepared from a cast ingot, and the hardness was measured on a C scale using a Rockwell hardness meter. The results are shown in Table 5.
- the Co—Fe based alloys (samples 4, 5 and 6) containing 0.5 to 10 atomic% of Ti of the present invention are Co—Fe based alloys to which Al and Cr are added (samples 7 and 8). It can be seen that it has higher weather resistance.
- Samples 4, 5 and 6 of the present invention show values similar to those of Co-Fe alloy samples 7 and 8 to which Al or Cr is added and magnetization as a bulk body.
- Table 5 shows that the hardness of the Co—Fe-based alloy (sample 4) containing 0.5 to 10 atomic percent of Ti of the present invention and containing 5 atomic percent or less of B is improved. .
- a casting ingot having a Co—Fe alloy composition shown in Table 6 was prepared.
- the cast ingot was heated and melted in a high-frequency heating furnace in vacuum using a raw material having a purity of 99.9% or higher, and then cast into an iron mold to produce an ingot having a diameter of 200 mm ⁇ 25 mm.
- the produced ingot was processed to produce a Co—Fe-based alloy target material having a diameter of 180 mm ⁇ thickness of 7 mm.
- a Co—Fe alloy thin film was formed on the substrate by magnetron sputtering, and the following test evaluation was performed. In all cases, sputtering conditions were Ar pressure 0.6 Pa and input power 500 W.
- Weather resistance test Table 6 shows the results of a weather resistance test in which each sample formed with a film thickness of 200 nm on a glass substrate was immersed in pure water for 24 hours and the corrosion area was visually observed. In Table 6, the case where the corrosion area is not visually observed is indicated by ⁇ , and the case where the corrosion area is visually observed is indicated by ⁇ .
- Magnetization evaluation Table 6 shows the results of evaluation of saturation magnetization of each sample after determining each sample formed with a film thickness of 300 nm on a Si wafer to 10 ⁇ 10 mm. The measurement was performed by applying an external magnetic field of 800,000 (A / m) using a vibrating sample magnetometer VSM-3 manufactured by Toei Kogyo Co., Ltd.
- Hardness evaluation A thin film having a thickness of 4 ⁇ m was formed on an aluminum substrate. Table 6 shows the results of measuring the hardness of each of the deposited samples. In addition, hardness measurement measured 5 points
- the Co—Fe based alloy containing 0.5 to 10 atomic% of Ti of the present invention is an alloy having excellent weather resistance even when formed into a thin film by sputtering.
- the Co—Fe-based alloy for soft magnetic films of the present invention is excellent in weather resistance while maintaining soft magnetic properties, and thus can be stably applied to the formation of soft magnetic films such as perpendicular magnetic recording media.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Magnetic Record Carriers (AREA)
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Abstract
Description
垂直磁気記録方式とは、垂直磁気記録媒体の磁性膜を媒体面に対して磁化容易軸が垂直方向に配向するように形成したものであり、記録密度を上げて行ってもビット内の反磁界が小さく、記録再生特性の低下が少ない高記録密度に適した方法である。そして、垂直磁気記録方式においては、記録感度を高めた磁気記録膜層と軟磁性膜層とを有する記録媒体が開発されている。
そして、上記のような軟磁性膜は、一般的に同一組成のターゲット材を利用したマグネトロンスパッタリングによって形成されている。一方で、このようなCo-Fe系合金のターゲット材では、耐候性に課題を有していることからCo-Fe系合金にAlやCrを添加したターゲット材などが提案されている(例えば、特許文献1参照)。
本発明のCo-Fe系合金のベースとなるCo-Fe合金は、((Co100-X-FeX)100-Y-NiY)、5≦X≦80、0≦Y≦25で表される組成である。それは、この組成範囲にあるCo-Fe合金は飽和磁化が大きく軟磁性膜として適切であるためである。また、Co-Fe合金の一部は、Niの添加量Yが0≦Y≦25となる範囲で置換可能である。それは、飽和磁化を大きく低減することなく、軟磁気特性の改善に有効なためである。
上記のCo-Fe合金には、M1元素として(Zr、Hf、Y)から選ばれる1種もしくは2種以上の元素を2~6原子%、およびM2元素として(Ta、Nb)から選ばれる1種もしくは2種の元素を2~10原子%添加する。それは、M1元素とM2元素とを上記範囲で含有することで、Co-Fe合金の飽和磁化を大きく損なうことなく、スパッタ膜としてのアモルファス化や磁気特性の改善を行えるためである。
まず、表1に示すCo-Fe系合金組成の鋳造インゴットを作製した。なお、鋳造インゴットは、純度99.9%以上の原料を用い真空中の高周波加熱炉で加熱・溶解したのち、鉄製の鋳型に鋳造し直径220mm×45mmのインゴットを作製した。作製したインゴットを加工して、直径180mm×厚さ7mmのCo-Fe系合金バルク体を作製した。
バルク体の耐候性評価として、鋳造インゴットから直径10mm×20mmの試料を作製し、50℃の10%塩酸に24時間浸漬し重量の減少率を測定して、バルク体の耐候性を評価した。測定結果を表1に示す。
また、バルク体の磁性評価として、鋳造インゴットから30mm×10mm×5mmの試料を作製し、直流磁気特性測定装置(東英工業製TRF5A)を用いて、外部磁場160k(A/m)時の磁化を測定した。その結果を表2に示す。
バルク体の耐候性評価として、鋳造インゴットから直径10mm×20mmの試料を作製し50℃の10%硫酸に24時間浸漬し重量の減少率を測定して、バルク体の耐候性を評価した。測定結果を表3に示す。
また、バルク体の磁性評価として、鋳造インゴットから30mm×10mm×5mmの試料を作製し、直流磁気特性測定装置(東英工業製TRF5A)を用いて、外部磁場160k(A/m)時の磁化を測定した。その結果を表4に示す。
さらに、バルク体の硬度評価として、鋳造インゴットから10mm×10mm×5mmの試料を作製し、ロックウェル硬度計を用いて、Cスケールで硬度を測定した。その結果を表5に示す。
ガラス基板上に膜厚200nmで成膜した各試料を純水中に24時間浸漬した耐候性試験を行い、腐食領域を目視観察した結果を表6に示す。なお、表6では、腐食領域が目視で観察されないものを○、目視で観察されるものを×と表示している。
(2)磁化評価
Siウェハー上に膜厚300nmで成膜した各試料を10×10mmに割り出した後、各試料の飽和磁化評価を行った結果を表6に示す。なお、測定は東英工業(株)製振動試料型磁力計VSM-3を用いて、外部磁場800000(A/m)を印加して測定をした。
(3)硬度評価
アルミ基板上に膜厚4μmの薄膜を成膜した。成膜した各試料を硬度測定した結果を表6に示す。なお、硬度測定は、マイクロビッカースを用いて、25(g)の印加荷重で5点を測定し、その平均値を硬度として表6に示した。
Claims (8)
- 原子比における組成式が((Co100-X-FeX)100-Y-NiY)100-(a+b+c)-M1a-M2b-Tic、5≦X≦80、0≦Y≦25、2≦a≦6、2≦b≦10、0.5≦c≦10で表され、残部不可避的不純物からなるCo-Fe系合金であって、前記組成式のM1元素が(Zr、Hf、Y)から選ばれる1種もしくは2種以上の元素、前記組成式のM2元素が(Ta、Nb)から選ばれる1種もしくは2種の元素であることを特徴とする軟磁性膜用Co-Fe系合金。
- さらに、Bを含み、原子比における組成式が((Fe100-X-CoX)100-Y-NiY)100-(a+b+c+d)-M1a-M2b-Tic-Bd、5≦X≦80、0≦Y≦25、2≦a≦6、2≦b≦10、0.5≦c≦10、d≦5で表され、残部不可避的不純物からなるCo-Fe系合金であることを特徴とする請求項1に記載の軟磁性膜用Co-Fe系合金。
- スパッタリングターゲット材として使用されることを特徴とする請求項1または2に記載の軟磁性膜用Co-Fe系合金。
- 垂直磁気記録媒体の軟磁性膜層を形成することを特徴とする請求項1または2に記載の軟磁性膜用Co-Fe系合金。
- 飽和磁化が1.0(T)以上であることを特徴とする請求項1または2に記載の軟磁性膜用Co-Fe系合金。
- スパッタリング成膜により形成された請求項1または2に記載の軟磁性膜用Co-Fe系合金であることを特徴とする軟磁性膜。
- 請求項1または2に記載の軟磁性膜用Co-Fe系合金からなる膜を磁気記録膜層の下地層として少なくとも1層以上用いたことを特徴とする垂直磁気記録媒体。
- スパッタリング成膜により形成された請求項1または2に記載の軟磁性膜用Co-Fe系合金である軟磁性膜を磁気記録膜層の下地層として少なくとも1層以上用いたことを特徴とする垂直磁気記録媒体。
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US13/058,119 US20110143168A1 (en) | 2008-11-05 | 2009-10-30 | Co-fe alloy for soft magnetic films, soft magnetic film, and perpendicular magnetic recording medium |
JP2010510572A JP4721126B2 (ja) | 2008-11-05 | 2009-10-30 | 軟磁性膜用Co−Fe系合金、軟磁性膜および垂直磁気記録媒体 |
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US (1) | US20110143168A1 (ja) |
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Cited By (4)
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WO2010143602A1 (ja) * | 2009-06-10 | 2010-12-16 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用CoFeNi系合金およびスパッタリングターゲット材、垂直磁気記録媒体 |
CN102485948A (zh) * | 2010-12-06 | 2012-06-06 | 北京有色金属研究总院 | 一种FeCoTaZr系合金溅射靶材及其制造方法 |
WO2013047328A1 (ja) * | 2011-09-28 | 2013-04-04 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性薄膜層用合金およびスパッタリングターゲット材並びに軟磁性薄膜層を有する垂直磁気記録媒体 |
JP2014240515A (ja) * | 2013-06-12 | 2014-12-25 | 日立金属株式会社 | Fe−Co系合金スパッタリングターゲット材およびその製造方法 |
Families Citing this family (2)
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JP5066136B2 (ja) * | 2009-06-05 | 2012-11-07 | 光洋應用材料科技股▲分▼有限公司 | 磁場透過率の高いコバルト鉄合金スパッタリングターゲット材 |
US9064519B2 (en) | 2011-07-06 | 2015-06-23 | Hitachi Metals, Ltd. | Soft magnetic under layer |
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- 2009-10-30 WO PCT/JP2009/068652 patent/WO2010053048A1/ja active Application Filing
- 2009-10-30 US US13/058,119 patent/US20110143168A1/en not_active Abandoned
- 2009-10-30 JP JP2010510572A patent/JP4721126B2/ja active Active
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JP2008115461A (ja) * | 2006-10-10 | 2008-05-22 | Hitachi Metals Ltd | Co−Fe−Zr系合金スパッタリングターゲット材およびその製造方法 |
JP2008121071A (ja) * | 2006-11-13 | 2008-05-29 | Sanyo Special Steel Co Ltd | 軟磁性FeCo系ターゲット材 |
JP2009191359A (ja) * | 2008-01-15 | 2009-08-27 | Hitachi Metals Ltd | Fe−Co−Zr系合金ターゲット材 |
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WO2010143602A1 (ja) * | 2009-06-10 | 2010-12-16 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用CoFeNi系合金およびスパッタリングターゲット材、垂直磁気記録媒体 |
JP2010287269A (ja) * | 2009-06-10 | 2010-12-24 | Sanyo Special Steel Co Ltd | 垂直磁気記録媒体における軟磁性膜層用CoFeNi系合金およびスパッタリングターゲット材 |
CN102485948A (zh) * | 2010-12-06 | 2012-06-06 | 北京有色金属研究总院 | 一种FeCoTaZr系合金溅射靶材及其制造方法 |
WO2013047328A1 (ja) * | 2011-09-28 | 2013-04-04 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性薄膜層用合金およびスパッタリングターゲット材並びに軟磁性薄膜層を有する垂直磁気記録媒体 |
JP2013072114A (ja) * | 2011-09-28 | 2013-04-22 | Sanyo Special Steel Co Ltd | 垂直磁気記録媒体における軟磁性薄膜層用合金およびスパッタリングターゲット材並びに軟磁性薄膜層を有する垂直磁気記録媒体。 |
CN103842549A (zh) * | 2011-09-28 | 2014-06-04 | 山阳特殊制钢株式会社 | 在垂直磁记录介质上的软磁性薄膜层中使用的合金,溅射靶材,以及具有软磁性薄膜层的垂直磁记录介质 |
JP2014240515A (ja) * | 2013-06-12 | 2014-12-25 | 日立金属株式会社 | Fe−Co系合金スパッタリングターゲット材およびその製造方法 |
Also Published As
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JP2011099166A (ja) | 2011-05-19 |
JPWO2010053048A1 (ja) | 2012-04-05 |
US20110143168A1 (en) | 2011-06-16 |
JP5477724B2 (ja) | 2014-04-23 |
JP4721126B2 (ja) | 2011-07-13 |
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