WO2010024629A3 - 양자점 태양광 소자 및 그 제조방법 - Google Patents

양자점 태양광 소자 및 그 제조방법 Download PDF

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Publication number
WO2010024629A3
WO2010024629A3 PCT/KR2009/004852 KR2009004852W WO2010024629A3 WO 2010024629 A3 WO2010024629 A3 WO 2010024629A3 KR 2009004852 W KR2009004852 W KR 2009004852W WO 2010024629 A3 WO2010024629 A3 WO 2010024629A3
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semiconductor
quantum dot
photovoltaic device
forming
manufacturing
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PCT/KR2009/004852
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English (en)
French (fr)
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WO2010024629A2 (ko
Inventor
김경중
이우
김용성
김영헌
홍승휘
윤완수
강상우
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한국표준과학연구원
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Priority to DE112009002124T priority Critical patent/DE112009002124T5/de
Priority to JP2011524911A priority patent/JP5223010B2/ja
Priority to CN2009801381281A priority patent/CN102165605B/zh
Priority to US13/061,297 priority patent/US8603849B2/en
Publication of WO2010024629A2 publication Critical patent/WO2010024629A2/ko
Publication of WO2010024629A3 publication Critical patent/WO2010024629A3/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0352Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
    • H01L31/035209Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
    • H01L31/035218Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures the quantum structure being quantum dots
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)

Abstract

본 발명은 넓은 파장 대역의 광 흡수가 가능하며, 높은 전자-정공 쌍 분리 효율을 가져 높은 광전 변환 효율을 갖는 반도체 기반 태양광 소자 및 그 제조방법을 제공하는 것이며, 상세하게 본 발명에 따른 태양광 소자의 제조방법은 a) p형 또는 n형 반도체 기판 상부에, 상기 반도체 기판과 동일 형의 불순물이 도핑된 매질 내부에 반도체 양자점이 형성된 반도체 양자점 박막을 형성하는 단계; b) 부분 에칭을 통하여 상기 반도체 양자점 박막을 관통하는 기공 어레이를 형성하는 단계; c) 상기 기공 어레이가 형성된 반도체 양자점 박막에 상기 반도체 기판과 상보적 불순물이 도핑된 반도체를 증착하는 단계; d) 상기 상보적 불순물이 도핑된 반도체 상에 투명전도막 및 상부전극을 순차적으로 형성하고, 상기 반도체 기판 하부에 하부전극을 형성하는 단계;를 포함하여 수행되는 특징이 있다.
PCT/KR2009/004852 2008-08-28 2009-08-28 양자점 태양광 소자 및 그 제조방법 WO2010024629A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE112009002124T DE112009002124T5 (de) 2008-08-28 2009-08-28 Quantenpunkt-Photovoltaikvorrichtung und deren Herstellungsverfahren
JP2011524911A JP5223010B2 (ja) 2008-08-28 2009-08-28 量子ドット太陽光素子及びその製造方法
CN2009801381281A CN102165605B (zh) 2008-08-28 2009-08-28 量子点光伏器件及其制造方法
US13/061,297 US8603849B2 (en) 2008-08-28 2009-08-28 Quantum dot photovoltaic device and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0084695 2008-08-28
KR20080084695 2008-08-28

Publications (2)

Publication Number Publication Date
WO2010024629A2 WO2010024629A2 (ko) 2010-03-04
WO2010024629A3 true WO2010024629A3 (ko) 2010-04-29

Family

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PCT/KR2009/004852 WO2010024629A2 (ko) 2008-08-28 2009-08-28 양자점 태양광 소자 및 그 제조방법

Country Status (6)

Country Link
US (1) US8603849B2 (ko)
JP (1) JP5223010B2 (ko)
KR (1) KR101060014B1 (ko)
CN (1) CN102165605B (ko)
DE (1) DE112009002124T5 (ko)
WO (1) WO2010024629A2 (ko)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101005803B1 (ko) * 2008-08-11 2011-01-05 한국표준과학연구원 양자점나노선 어레이 태양광 소자 및 그 제조 방법
US9382474B2 (en) 2010-04-06 2016-07-05 The Governing Council Of The University Of Toronto Photovoltaic devices with depleted heterojunctions and shell-passivated nanoparticles
KR101144034B1 (ko) 2010-04-27 2012-05-23 현대자동차주식회사 이온빔 처리된 플렉시블 유기박막 태양전지의 제조방법, 및 이에 의해 제조되는 태양전지
KR101103330B1 (ko) * 2010-06-25 2012-01-11 한국표준과학연구원 InP의 강제도핑에 의한 고농도 P 도핑 양자점 태양전지 및 제조방법
JP5555602B2 (ja) * 2010-10-25 2014-07-23 シャープ株式会社 太陽電池
US9955148B2 (en) 2011-01-17 2018-04-24 3D Labs Co., Ltd. Method and system for reproducing and watching a video
KR101189686B1 (ko) 2011-03-22 2012-10-10 한국표준과학연구원 실리콘 양자점에 의한 광활성층 및 이의 제조방법
US20120244969A1 (en) 2011-03-25 2012-09-27 May Patents Ltd. System and Method for a Motion Sensing Device
JP5664416B2 (ja) * 2011-03-31 2015-02-04 富士通株式会社 シリコン量子ドット装置とその製造方法
KR101309110B1 (ko) * 2011-08-24 2013-09-17 삼성전자주식회사 양자점 발광 소자 및 그 제조 방법
US8492746B2 (en) 2011-09-12 2013-07-23 SemiLEDs Optoelectronics Co., Ltd. Light emitting diode (LED) dice having wavelength conversion layers
KR20130041699A (ko) * 2011-10-17 2013-04-25 엘지전자 주식회사 투명 발광 시트 및 그 제조 방법
JP5791470B2 (ja) * 2011-11-15 2015-10-07 京セラ株式会社 太陽電池
JP5802833B2 (ja) * 2012-06-20 2015-11-04 株式会社日立製作所 太陽電池セルおよびその製造方法
WO2014045333A1 (ja) 2012-09-18 2014-03-27 富士通株式会社 太陽電池及びその製造方法
CN102916082B (zh) * 2012-10-22 2015-02-18 中国科学院上海技术物理研究所 不同量子点沿一维纳米线分段组装的方法
JP6030971B2 (ja) * 2013-02-13 2016-11-24 シャープ株式会社 受光素子および受光素子を備えた太陽電池
JP6239830B2 (ja) * 2013-02-16 2017-11-29 京セラ株式会社 太陽電池
CN104409214A (zh) * 2014-11-19 2015-03-11 上海纳米技术及应用国家工程研究中心有限公司 一种量子点修饰太阳电池光阳极的制备方法
KR101670286B1 (ko) * 2015-08-25 2016-10-28 한국표준과학연구원 양자점 광활성층 및 이의 제조방법
US10256355B2 (en) 2015-08-28 2019-04-09 Kyocera Corporation Photoelectric converter with a multi-layered quantum dot film
US9978594B1 (en) * 2016-11-15 2018-05-22 Taiwan Semiconductor Manufacturing Co., Ltd. Formation method of semiconductor device structure using patterning stacks
US10210999B2 (en) * 2016-12-27 2019-02-19 Imam Abdulrahman Bin Faisal University Dye-sensitized solar cell including a semiconducting nanocomposite
US10957807B2 (en) * 2017-04-19 2021-03-23 The Board Of Trustees Of The University Of Alabama PLZT thin film capacitors apparatus with enhanced photocurrent and power conversion efficiency and method thereof
US11621395B2 (en) * 2019-04-26 2023-04-04 Intel Corporation Resistive random-access memory devices and methods of fabrication
US20240105868A1 (en) * 2019-10-07 2024-03-28 Arbell Energy Ltd Improved superlattice structure for thin film solar cells
KR20240039774A (ko) * 2022-09-20 2024-03-27 울산과학기술원 이차원 반도체 양자점 어레이의 제조방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030137023A1 (en) * 2002-01-09 2003-07-24 Bernhard Stegmuller Optoelectronic device, and method for producing an optoelectronic device
US20060011904A1 (en) * 2004-06-04 2006-01-19 Snyder Gary E Layered composite film incorporating quantum dots as programmable dopants
US20080011349A1 (en) * 2006-05-03 2008-01-17 Rochester Institute Of Technology Nanostructured quantum dots or dashes in photovoltaic devices and methods thereof
US20080092953A1 (en) * 2006-05-15 2008-04-24 Stion Corporation Method and structure for thin film photovoltaic materials using bulk semiconductor materials

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3753605B2 (ja) * 2000-11-01 2006-03-08 シャープ株式会社 太陽電池およびその製造方法
JP4246424B2 (ja) * 2001-10-11 2009-04-02 財団法人ファインセラミックスセンター 量子井戸構造を有するSi系半導体デバイスおよびその製造方法
US7511217B1 (en) * 2003-04-19 2009-03-31 Nanosolar, Inc. Inter facial architecture for nanostructured optoelectronic devices
US7462774B2 (en) * 2003-05-21 2008-12-09 Nanosolar, Inc. Photovoltaic devices fabricated from insulating nanostructured template
JP2005064246A (ja) * 2003-08-12 2005-03-10 Canon Inc 光電変換素子、その製造方法および太陽電池
WO2007098378A1 (en) * 2006-02-16 2007-08-30 Solexant Corp. Nanoparticle sensitized nanostructured solar cells
US9105776B2 (en) * 2006-05-15 2015-08-11 Stion Corporation Method and structure for thin film photovoltaic materials using semiconductor materials
TWI431784B (zh) * 2006-05-15 2014-03-21 Stion Corp 使用半導體材料之用於薄膜光伏材料的方法和結構
JP4349456B2 (ja) * 2006-10-23 2009-10-21 ソニー株式会社 固体撮像素子
KR101005803B1 (ko) * 2008-08-11 2011-01-05 한국표준과학연구원 양자점나노선 어레이 태양광 소자 및 그 제조 방법
JP5582638B2 (ja) * 2010-02-25 2014-09-03 独立行政法人産業技術総合研究所 太陽電池

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030137023A1 (en) * 2002-01-09 2003-07-24 Bernhard Stegmuller Optoelectronic device, and method for producing an optoelectronic device
US20060011904A1 (en) * 2004-06-04 2006-01-19 Snyder Gary E Layered composite film incorporating quantum dots as programmable dopants
US20080011349A1 (en) * 2006-05-03 2008-01-17 Rochester Institute Of Technology Nanostructured quantum dots or dashes in photovoltaic devices and methods thereof
US20080092953A1 (en) * 2006-05-15 2008-04-24 Stion Corporation Method and structure for thin film photovoltaic materials using bulk semiconductor materials

Also Published As

Publication number Publication date
JP5223010B2 (ja) 2013-06-26
US8603849B2 (en) 2013-12-10
JP2012501536A (ja) 2012-01-19
CN102165605A (zh) 2011-08-24
WO2010024629A2 (ko) 2010-03-04
KR20100027016A (ko) 2010-03-10
KR101060014B1 (ko) 2011-08-26
CN102165605B (zh) 2013-04-10
DE112009002124T5 (de) 2012-01-26
US20110146775A1 (en) 2011-06-23

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